US20100058568A1 - Multi-band filter module and method of fabricating the same - Google Patents
Multi-band filter module and method of fabricating the same Download PDFInfo
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- US20100058568A1 US20100058568A1 US12/620,264 US62026409A US2010058568A1 US 20100058568 A1 US20100058568 A1 US 20100058568A1 US 62026409 A US62026409 A US 62026409A US 2010058568 A1 US2010058568 A1 US 2010058568A1
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- 238000010897 surface acoustic wave method Methods 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 21
- 238000000151 deposition Methods 0.000 claims description 6
- 238000000059 patterning Methods 0.000 claims description 2
- 239000000126 substance Substances 0.000 description 14
- 238000004806 packaging method and process Methods 0.000 description 12
- 238000010276 construction Methods 0.000 description 8
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- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
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- 229910052763 palladium Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910003327 LiNbO3 Inorganic materials 0.000 description 1
- 229910012463 LiTaO3 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/64—Filters using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1007—Mounting in enclosures for bulk acoustic wave [BAW] devices
- H03H9/105—Mounting in enclosures for bulk acoustic wave [BAW] devices the enclosure being defined by a cover cap mounted on an element forming part of the BAW device
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/05—Holders; Supports
- H03H9/10—Mounting in enclosures
- H03H9/1064—Mounting in enclosures for surface acoustic wave [SAW] devices
- H03H9/1092—Mounting in enclosures for surface acoustic wave [SAW] devices the enclosure being defined by a cover cap mounted on an element forming part of the surface acoustic wave [SAW] device on the side of the IDT's
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H2003/0071—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks of bulk acoustic wave and surface acoustic wave elements in the same process
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
- H03H9/703—Networks using bulk acoustic wave devices
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
- H03H9/703—Networks using bulk acoustic wave devices
- H03H9/706—Duplexers
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
- H03H9/72—Networks using surface acoustic waves
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/70—Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
- H03H9/72—Networks using surface acoustic waves
- H03H9/725—Duplexers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Definitions
- the smallest device having a good frequency characteristic in the band of 2 GHz is the FBAR using the bulk acoustic characteristic
- the smallest device having a good performance in the band of 900 MHz is the SAW device using the surface acoustic characteristic.
- the FBAR has the advantages of mass production and miniaturization. Also, the FBAR has a high quality factor that is a major property of a filter, and can be used in a micro frequency band, in particular, in the bands of a PCS (Personal Communication System) and a DCS (Digital Cordless System).
- PCS Personal Communication System
- DCS Digital Cordless System
- Both the FBAR and the SAW device utilize the RF characteristic by use of the acoustic resonance.
- the SAW device can obtain a good characteristic by use of a specific piezoelectric substrate only.
- a silicon substrate is generally used so as to be inexpensive, integrated and compatible with IC.
- FIG. 1 is a cross-sectional view illustrating a multi-band filter module according to an embodiment of the present invention.
- the piezoelectric substrate 10 can be made of a specific single crystal piezoelectric substance, for example, LiTaO 3 or LiNbO 3 .
- Each of the electrode pads 23 and 24 is deposited on the upper portions of the first and second electrodes 22 a and 22 c to have a specific thickness.
- the electrode pads 23 and 24 may be made of the same conductive substance as that of the first and second electrodes 22 a and 22 c.
- Reference numeral 25 in FIG. 1 denotes a support pad formed under the electrode pad 24 which is patterned and formed at the same time when the first electrode 22 a is formed.
- the sacrificial layer 11 is removed, so that the air gap 21 is formed under the resonant part 22 with the first electrode 22 a, the piezoelectric film 22 b, and the second electric electrode 22 c deposited thereon.
- the fabricating process since the FBAR 20 and the SAW device 30 are concurrently formed on the same piezoelectric substrate 10 , the fabricating process can be simplified, and filters having different bands can be downsized and integrated.
- a duplexer can be implemented by properly combining a plurality of the FBARs 20 or the SAW devices 30 in parallel or series.
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- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
A multi-band filter module and a method of fabricating the same are provided. The multi-band filter module includes a piezoelectric substrate, a first filter provided on the piezoelectric substrate, and a second filter provided adjacent to the first filter on the piezoelectric substrate, and operating in a frequency band that is lower than that of the first filter.
Description
- This is a Divisional application of U.S. application Ser. No. 11/646,502 filed Dec. 28, 2006, which claims priority from Korean Patent Application No. 10-2006-0071079, filed Jul. 27, 2006, in the Korean Intellectual Property Office, the entire contents of which is incorporated herein by reference.
- 1. Field of the Invention
- Apparatuses and methods consistent with the present invention relate to a filter module, and more particularly to a multi-band filter module available in various frequency bands and a method of fabricating the same.
- 2. Description of the Related Art
- Recently, as telecommunication appliances represented by mobile phones are rapidly popularized, a demand for a thin and light filter for use in these appliances is also increased.
- In particular, as the telecommunication appliances are miniaturized and complicated, there is a necessity for a small-sized terminal available in various frequency bands. In order to utilize various frequency bands, a multi-band filter is acutely needed to filter only required frequencies among signals received through one antenna. An existing method of implementing a multi-band filter by use of a ceramic filter has weak competitiveness in comparison with an FBAR (Film Bulk Acoustic Resonator) or a SAW (Surface Acoustic Wave) device in view of its size and property.
- Up to now, the smallest device having a good frequency characteristic in the band of 2 GHz is the FBAR using the bulk acoustic characteristic, while the smallest device having a good performance in the band of 900 MHz is the SAW device using the surface acoustic characteristic.
- The FBAR has the advantages of mass production and miniaturization. Also, the FBAR has a high quality factor that is a major property of a filter, and can be used in a micro frequency band, in particular, in the bands of a PCS (Personal Communication System) and a DCS (Digital Cordless System).
- The FBAR is generally fabricated by sequentially depositing a lower electrode, a piezoelectric layer, and an upper electrode on a substrate. According to the operating principle of the BRAR device, an electric energy is applied to the electrodes to induce an electric field that is temporally varied in the piezoelectric layer, and then the electric field causes a bulk acoustic wave in the same direction as a vibration direction of a resonant part in the piezoelectric layer to generate resonance therein.
- Both the FBAR and the SAW device utilize the RF characteristic by use of the acoustic resonance. However, the SAW device can obtain a good characteristic by use of a specific piezoelectric substrate only. In the case of the FBAR, although it is not limited to a substrate, a silicon substrate is generally used so as to be inexpensive, integrated and compatible with IC.
- A common multi-band filter is generally fabricated by separately making the above filter devices and combining the same with chips and trimming circuits through additional package. The method of fabricating the multi-band filter by using a separate filter has the problems of a complicated construction, many defective factors such as a short circuit of a device, and an increased size thereof.
- Accordingly, a need exists for a development of a multi-band filter module having a thin and simple construction and fabricated by a simple method.
- An aspect of the present invention is to provide a multi-band filter module into which a FBAR and a SAW device are integrated, and a method of fabricating the same.
- The foregoing and other objects and advantages are substantially realized by providing a multi-band filter module, according to embodiments of the present invention, which comprises a piezoelectric substrate, a first filter provided on the piezoelectric substrate, and a second filter provided adjacent to the first filter on the piezoelectric substrate, and operating in a frequency band lower than that of the first filter.
- The first filter may comprise an FBAR (film Bulk Acoustic Resonator).
- The FBAR may comprise an air gap provided on the piezoelectric substrate, a resonant part located on the air gap and having a first electrode, a piezoelectric film, and a second electrode which are sequentially deposited, and an electrode pad connected to the first and second electrodes.
- The second filter may include a SAW (Surface Acoustic Wave) device, and a SAW electrode pad provided on an upper surface of the piezoelectric substrate.
- In another aspect of the present invention, there is provided a method of fabricating a multi-band filter module, which comprises (a) forming an FBAR on a piezoelectric substrate, and (b) forming a SAW device on the piezoelectric substrate, in which the steps (a) and (b) are concurrently performed.
- The step (a) may comprise (a1) forming a sacrificial layer to form an air gap to be recessed on a surface of the piezoelectric substrate, (a2) sequentially depositing a first electrode, a piezoelectric plate, and a second electrode on the piezoelectric substrate to form a resonant part, (a3) depositing an electrode pad to be connected to the first and second electrodes, and (a4) removing the sacrificial layer to form the air gap corresponding to the resonant part.
- The step (b) may comprise (b1) patterning the SAW device on the piezoelectric substrate, and (b 2 ) forming a SAW pad to be connected to the SAW device.
- The step (b1) may be performed at the same time when the first electrode is formed in the step (a 2 ).
- The step (b 2 ) may be performed concurrent with the step (a 3 ).
- The above and other aspects of the present invention will become more apparent by describing in detail exemplary embodiments thereof with reference to the attached drawing figures, wherein;
-
FIG. 1 is a cross-sectional view illustrating a multi-band filter module according to an embodiment of the present invention; -
FIGS. 2A to 2E are cross-sectional views explaining a process of fabricating the multi-band filter module inFIGS. 1 ; and -
FIG. 2F is a cross-sectional view illustrating a packaged state of the multi-band filter module inFIG. 1 . - Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawing figures.
- In the following description, same drawing reference numerals are used for the same elements even in different drawings. The matters defined in the description such as a detailed construction and elements are nothing but the ones provided to assist in a comprehensive understanding of the invention. Thus, it is apparent that the present invention can be carried out without those defined matters. Also, well-known functions or constructions are not described in detail since they would obscure the invention in unnecessary detail.
-
FIG. 1 is a cross-sectional view illustrating a multi-band filter module according to an embodiment of the present invention. - Referring to
FIG. 1 , the multi-band filter module of the present invention is to filter each required frequency among the signal received by one antenna. More specifically, there is shown a filter module fabricated by simultaneously integrating SAW for a cellular band and FBAR for PCS on the same substrate. - Referring to
FIG. 1 , the multi-band filter module includes apiezoelectric substrate 10, and first and second filters formed on thepiezoelectric substrate 10. - The
piezoelectric substrate 10 can be made of a specific single crystal piezoelectric substance, for example, LiTaO3 or LiNbO3. - The first filter includes an FBAR 20. The FBAR 20 has an
air gap 21 formed on the upper surface of thepiezoelectric substrate 10, aresonant part 22 formed on the upper surface of theair gap 21, and a pair ofelectrode pads - The
air gap 21 is formed to have a specific depth extending downwardly from the upper surface of thepiezoelectric substrate 10. Theair gap 21 is formed under theresonant part 22. Theair gap 21 can be created by forming a sacrificial layer to have a specific depth from the upper surface of thepiezoelectric substrate 10 and then removing the same. - The
resonant part 22 has afirst electrode 22 a, apiezoelectric film 22 b, and asecond electrode 22 c which are sequentially deposited so as to locate on the upper portion of theair gap 21. - The
resonant part 22 is to filter a RF signal by use of a piezoelectric effect of thepiezoelectric film 22 b. That is, the RF signal applied from thesecond electrode 22 c is output toward thefirst electrode 22 a through theresonant part 22. In this instance, since theresonant part 22 has a constant resonant frequency according to vibration generated by thepiezoelectric film 22 b, only the signal which corresponds to the resonant frequency of theresonance part 22, among the input RF signals is output. In this embodiment, theresonant part 22 can be used to filter a signal suitable for the PCS using a GHz band. - The
resonant part 22 is deposited on and supported by thepiezoelectric substrate 10 in such a way that thefirst electrode 22 a covers a portion of theair gap 21. Thepiezoelectric film 22 b is deposited on and supported by thepiezoelectric substrate 10 so as to cover thefirst electrode 22 a and the remaining upper surface of theair gap 21. Thesecond electrode 22 c is deposited and supported to cover the upper portion of thepiezoelectric film 22 b. - The first and
second electrodes second electrodes - The
piezoelectric film 22 b serves to cause a piezoelectric effect which converts an electric energy into a mechanical energy of an acoustic wave type, as described above. AN or ZnO may be used as a piezoelectric substance to form thepiezoelectric film 22 b. - Each of the
electrode pads second electrodes electrode pads second electrodes Reference numeral 25 inFIG. 1 denotes a support pad formed under theelectrode pad 24 which is patterned and formed at the same time when thefirst electrode 22 a is formed. - The second filter includes an
SAW device 30 having a good characteristic in the band of 900 MHz which is used for a cellular phone. TheSAW device 30 includes anSAW device 31 and anSAW electrode pad 32 which are formed on thepiezoelectric substrate 10. - The
SAW device 31 can be formed in such a way that a comb-like electrode (InterDigital Transducer; IDT) surface faces up on the upper surface of thepiezoelectric substrate 10. TheSAW device 31 may be formed by depositing a metal substance on thepiezoelectric substrate 10 in a desired pattern. In this embodiment, theSAW device 31 is made of the same substance as that of thefirst electrode 22 a, and is formed simultaneous with thefirst electrode 22 a. Therefore, theSAW device 31 may be made of Al, W, Au, Pt, Ni, Ti, Cr, Pd, or Mo. - The
SAW electrode pad 32 is deposited on the upper surface of thepiezoelectric substrate 10 in such a way that it is connected to theSAW device 31. TheSAW electrode pad 32 is made of the same substance as that of theelectrode pads FBAR 20, and is formed simultaneous with theelectrode pads FBAR 20 and theSAW device 30 are concurrently formed on singlepiezoelectric substrate 10. Consequently, it can simplify the process of fabricating the multi-band filter module, and downsize and integrate the construction of the filter module. - The process of fabricating the multi-band filter module according to an embodiment of the present invention will now be described in detail.
- A wafer level packaging method and a fabricating process of the multi-band filter module shown in
FIG. 1 will now be described with reference toFIGS. 2A to 2F . - As shown in
FIG. 2A , asacrificial layer 11 for forming an air gap is formed on the upper portion of thepiezoelectric substrate 10. After a groove is formed to have a specific depth at a point corresponding to theair gap 21 on thepiezoelectric substrate 10, the groove is filled with a desired sacrificial substance to form thesacrificial layer 11. The groove for forming theair gap 21 may be formed by dry etching the upper surface of thepiezoelectric substrate 10. - Next, as shown in
FIG. 2B , after a desired metal substance is deposited on thepiezoelectric substrate 10 and is patterned, thefirst electrode 22 a, thesupport pad 25, and theSAW device 31 are concurrently formed. Thefirst electrode 22 a is formed to cover a portion of thesacrificial layer 11. - As shown in
FIG. 2C , thepiezoelectric film 22 b is deposited on thepiezoelectric substrate 10 to cover thefirst electrode 22 a and thesacrificial layer 11. - Then, as shown in
FIG. 2D , a desired metal substance is deposited on the upper portion of thepiezoelectric film 22 b in a specific pattern to form thesecond electrode 22 c. Theupper electrode 22 c may be made of the same substance as that of thefirst electrode 22 a or made of a substance different from that of thefirst electrode 22 a. - As shown in
FIG. 2E , a desired conductive substance is deposited on the upper portion of thepiezoelectric substrate 10 in a specific pattern to concurrently form theelectrode pads SAW electrode pad 32. Each of theelectrode pads second electrodes SAW electrode pad 32 is formed on thepiezoelectric substrate 10 so that it is connected to theSAW device 31. - Next, the
sacrificial layer 11 is removed, so that theair gap 21 is formed under theresonant part 22 with thefirst electrode 22 a, thepiezoelectric film 22 b, and the secondelectric electrode 22 c deposited thereon. With the fabricating process, since theFBAR 20 and theSAW device 30 are concurrently formed on the samepiezoelectric substrate 10, the fabricating process can be simplified, and filters having different bands can be downsized and integrated. - The multi-band filter module can be subjected to the wafer level packaging through a series of processes, as shown in
FIG. 2F . That is, amulti-band filter module 100 fabricated by the above process is located under a packaging, as shown inFIG. 2F . More specifically, referring toFIG. 2F , themulti-band filter module 100 fabricated by the above method is provided under the packaging, and a waferlevel packaging cap 200 is packaged and coupled to the upper portion of thefilter module 100. - In
FIG. 2F ,reference numeral 41 and 42 denote a first sealing line provided on theelectrode pad 23 and theSAW electrode pad 32, andreference numeral packaging cap 200 corresponding to thefirst sealing lines 41 and 42. - The
packaging cap 200 includes acap wafer 210, a viaelectrode 220 penetrating through thecap wafer 210, andcoupling pads cap wafer 210. Thecoupling pads electrode 220. Thesecond sealing lines pad 250. - By connecting the
packaging cap 200 configured as described above with the upper portion of thefilter module 100, theFBAR 20 and theSAW device 30 can be packaged as one package. Since the first andsecond sealing lines 41 and 42; 43 and 44 are made of a conductive substance, thefilter module 100 is electrically connected to thecoupling pad 240 provided on the upper portion of thecap wafer 210. - In the construction of the filter module configured as described above, a duplexer can be implemented by properly combining a plurality of the
FBARs 20 or theSAW devices 30 in parallel or series. - The
packaging cap 200 does not characterize the present invention. The construction of a prior packaging cap for the wafer level packaging can be coupled to thefilter module 100 of the present invention to package the same. - Although not shown, the
SAW device 30 and theFBAR 20 are packaged into one chip through the same wafer level packaging. In case a trimming circuit is required to improve characteristics of the SAW device and FBAR, a trimming circuit can be integrated on thepiezoelectric substrate 10. - As described above, according to the present invention, the multi-band filter can be modularized by integrating the SAE device and the FBAR onto one substrate. Therefore, since some steps are partially concurrently performed in the process of fabricating the SAW device and the FBAR, the process can be simplified to reduce a manufacturing cost.
- In addition, since the SAW device and the FBAR are unitarily packaged, the downsized and integrated filter module can be provided.
- Additional connection is not required by directly fabricating the SAW and the FBAR on the piezoelectric substrate, thereby improving the signal loss characteristic the reliability.
- While the invention has been shown and described with reference to certain exemplary embodiments thereof, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (6)
1. A method of fabricating a multi-band filter module, the method comprising:
(a) forming a Film Bulk Acoustic Resonator (FBAR) on a piezoelectric substrate; and
(b) forming a Surface Acoustic Wave (SAW) device on the piezoelectric substrate;
wherein the steps (a) and (b) are concurrently performed.
2. The method of claim 1 , wherein step (a) comprises: (a 1 ) forming a sacrificial layer, wherein the sacrificial layer is used to form an air gap to be recessed on a surface of the piezoelectric substrate;
(a 2 ) sequentially depositing a first electrode, a piezoelectric plate, and a second electrode, on the piezoelectric substrate to form a resonant part;
(a 3 ) depositing an electrode pad, which connects to the first and second electrodes; and
(a 4 ) removing the sacrificial layer to form the air gap corresponding to the resonant part.
3. The method of claim 2 , wherein step (b) comprises:
(b1) patterning the SAW device on the piezoelectric substrate; and
(b 2 ) forming a SAW pad to be connected to the SAW device.
4. The method of claim 3 , wherein step (b1) is performed at the same time as when the first electrode is formed in the (a 2 ).
5. The method of claim 4 , wherein step (b 2 ) is performed concurrent with the step (a 3 ).
6. he method of claim 3 , wherein step (b 2 ) is performed concurrent with step (a 3 ).
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/620,264 US20100058568A1 (en) | 2006-07-27 | 2009-11-17 | Multi-band filter module and method of fabricating the same |
US14/327,151 US9628048B2 (en) | 2006-07-27 | 2014-07-09 | Multi-band filter module and electronic device comprising the same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060071079A KR100719123B1 (en) | 2006-07-27 | 2006-07-27 | Multi band filter module and manufacture method of the same |
KR10-2006-0071079 | 2006-07-27 | ||
US11/646,502 US7642882B2 (en) | 2006-07-27 | 2006-12-28 | Multi-band filter module and method of fabricating the same |
US12/620,264 US20100058568A1 (en) | 2006-07-27 | 2009-11-17 | Multi-band filter module and method of fabricating the same |
Related Parent Applications (2)
Application Number | Title | Priority Date | Filing Date |
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US11/646,502 Continuation US7642882B2 (en) | 2006-07-27 | 2006-12-28 | Multi-band filter module and method of fabricating the same |
US11/646,502 Division US7642882B2 (en) | 2006-07-27 | 2006-12-28 | Multi-band filter module and method of fabricating the same |
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Application Number | Title | Priority Date | Filing Date |
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US14/327,151 Continuation US9628048B2 (en) | 2006-07-27 | 2014-07-09 | Multi-band filter module and electronic device comprising the same |
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US20100058568A1 true US20100058568A1 (en) | 2010-03-11 |
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Application Number | Title | Priority Date | Filing Date |
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US11/646,502 Active 2027-06-04 US7642882B2 (en) | 2006-07-27 | 2006-12-28 | Multi-band filter module and method of fabricating the same |
US12/620,264 Abandoned US20100058568A1 (en) | 2006-07-27 | 2009-11-17 | Multi-band filter module and method of fabricating the same |
US14/327,151 Active 2027-07-05 US9628048B2 (en) | 2006-07-27 | 2014-07-09 | Multi-band filter module and electronic device comprising the same |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US10033443B2 (en) | 2016-04-15 | 2018-07-24 | Alcatel-Lucent Usa Inc. | MIMO transceiver suitable for a massive-MIMO system |
US10218400B2 (en) | 2013-01-31 | 2019-02-26 | Nokia Of America Corporation | Technique for filtering of clock signals |
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WO2021102640A1 (en) * | 2019-11-25 | 2021-06-03 | 开元通信技术(厦门)有限公司 | Acoustic wave device and fabrication method therefor |
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Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4361026A (en) * | 1980-06-24 | 1982-11-30 | Muller Richard S | Method and apparatus for sensing fluids using surface acoustic waves |
US5880552A (en) * | 1997-05-27 | 1999-03-09 | The United States Of America As Represented By The Secretary Of The Navy | Diamond or diamond like carbon coated chemical sensors and a method of making same |
US6060818A (en) * | 1998-06-02 | 2000-05-09 | Hewlett-Packard Company | SBAR structures and method of fabrication of SBAR.FBAR film processing techniques for the manufacturing of SBAR/BAR filters |
US6424238B1 (en) * | 2001-01-08 | 2002-07-23 | Motorola, Inc. | Acoustic wave filter and method of forming the same |
US6472954B1 (en) * | 2001-04-23 | 2002-10-29 | Agilent Technologies, Inc. | Controlled effective coupling coefficients for film bulk acoustic resonators |
US6580197B2 (en) * | 2001-01-05 | 2003-06-17 | Clarisay, Inc. | System and method for dissipating static charge generated in a surface acoustic wave device |
US6765456B2 (en) * | 2001-12-17 | 2004-07-20 | Oki Electric Industry Co., Ltd. | Surface acoustic wave duplexer and portable communication device using the same |
US20040207490A1 (en) * | 2003-04-21 | 2004-10-21 | Jun Chan-Bong | Film bulk acoustic resonator having an air gap and a method for manufacturing the same |
US6870440B2 (en) * | 1998-06-09 | 2005-03-22 | Oki Electric Industry Co., Ltd. | Saw branching filter with a branching filter circuit formed on the package |
US7078984B2 (en) * | 2002-02-27 | 2006-07-18 | Tdk Corporation | Duplexer and method of manufacturing same |
US7102460B2 (en) * | 2003-04-17 | 2006-09-05 | Epcos Ag | Duplexer with extended functionality |
US7439825B2 (en) * | 2005-07-27 | 2008-10-21 | Samsung Electronics Co., Ltd. | Integrated filter including FBAR and saw resonator and fabrication method therefor |
US7446629B2 (en) * | 2004-08-04 | 2008-11-04 | Matsushita Electric Industrial Co., Ltd. | Antenna duplexer, and RF module and communication apparatus using the same |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH036912A (en) * | 1989-06-02 | 1991-01-14 | Fujitsu Ltd | Surface acoustic wave element |
JP2589634B2 (en) | 1992-10-05 | 1997-03-12 | 松下電器産業株式会社 | Electroacoustic integrated circuit and manufacturing method thereof |
JPH09284093A (en) * | 1996-04-13 | 1997-10-31 | Toyo Commun Equip Co Ltd | Multi-band saw filter |
US6262637B1 (en) * | 1999-06-02 | 2001-07-17 | Agilent Technologies, Inc. | Duplexer incorporating thin-film bulk acoustic resonators (FBARs) |
US6407649B1 (en) * | 2001-01-05 | 2002-06-18 | Nokia Corporation | Monolithic FBAR duplexer and method of making the same |
US6518860B2 (en) * | 2001-01-05 | 2003-02-11 | Nokia Mobile Phones Ltd | BAW filters having different center frequencies on a single substrate and a method for providing same |
US6885260B2 (en) * | 2001-05-11 | 2005-04-26 | Ube Industries, Ltd. | Filter using film bulk acoustic resonator and transmission/reception switch |
KR100393774B1 (en) * | 2001-07-12 | 2003-08-02 | 엘지전자 주식회사 | Manufacturing method for bandpass filter using thin film bulk acoustic resonator |
KR100429972B1 (en) * | 2001-09-21 | 2004-05-03 | 엘지전자 주식회사 | Manufacturing method for duplexer using thin film bulk acoustic resonator |
JP3944372B2 (en) * | 2001-09-21 | 2007-07-11 | 株式会社東芝 | Piezoelectric thin film vibrator and frequency variable resonator using the same |
KR20030027430A (en) * | 2001-09-28 | 2003-04-07 | 엘지전자 주식회사 | Thin film bulk acoustic resonator and bandpass filter using the thin film bulk acoustic resonator and manufacturing method threrof |
TW540173B (en) * | 2002-05-03 | 2003-07-01 | Asia Pacific Microsystems Inc | Bulk acoustic device having integrated fine-tuning and trimming devices |
KR100506729B1 (en) * | 2002-05-21 | 2005-08-08 | 삼성전기주식회사 | Film bulk acoustic resonator and method for fabrication thereof |
DE20221966U1 (en) * | 2002-06-06 | 2010-02-25 | Epcos Ag | Acoustic wave device with a matching network |
KR100486627B1 (en) * | 2003-02-21 | 2005-05-03 | 엘지전자 주식회사 | Semiconductor package |
US7113055B2 (en) * | 2003-11-07 | 2006-09-26 | Matsushita Electric Industrial Co., Ltd. | Piezoelectric resonator, method of manufacturing piezoelectric resonator, and filter, duplexer, and communication device using piezoelectric resonator |
JP2005150990A (en) * | 2003-11-13 | 2005-06-09 | Tdk Corp | Thin film bulk wave resonator wafer and method for manufacturing thin film bulk wave resonator |
US7323805B2 (en) * | 2004-01-28 | 2008-01-29 | Kabushiki Kaisha Toshiba | Piezoelectric thin film device and method for manufacturing the same |
JP4280198B2 (en) * | 2004-04-30 | 2009-06-17 | 株式会社東芝 | Thin film piezoelectric resonator |
US20070210876A1 (en) * | 2004-06-17 | 2007-09-13 | Matsushita Electric Industrial Co., Ltd. | Fbar Filter |
ATE427582T1 (en) * | 2004-07-20 | 2009-04-15 | Murata Manufacturing Co | PIEZOELECTRIC FILTER |
KR100666693B1 (en) * | 2004-11-23 | 2007-01-11 | 삼성전자주식회사 | Monolithic duplexer |
JP2007036829A (en) * | 2005-07-28 | 2007-02-08 | Toshiba Corp | Thin film piezoelectric resonator, filter and method for manufacturing thin film piezoelectric resonator |
KR100719123B1 (en) * | 2006-07-27 | 2007-05-18 | 삼성전자주식회사 | Multi band filter module and manufacture method of the same |
-
2006
- 2006-07-27 KR KR1020060071079A patent/KR100719123B1/en active IP Right Grant
- 2006-12-28 US US11/646,502 patent/US7642882B2/en active Active
-
2009
- 2009-11-17 US US12/620,264 patent/US20100058568A1/en not_active Abandoned
-
2014
- 2014-07-09 US US14/327,151 patent/US9628048B2/en active Active
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4361026A (en) * | 1980-06-24 | 1982-11-30 | Muller Richard S | Method and apparatus for sensing fluids using surface acoustic waves |
US5880552A (en) * | 1997-05-27 | 1999-03-09 | The United States Of America As Represented By The Secretary Of The Navy | Diamond or diamond like carbon coated chemical sensors and a method of making same |
US6060818A (en) * | 1998-06-02 | 2000-05-09 | Hewlett-Packard Company | SBAR structures and method of fabrication of SBAR.FBAR film processing techniques for the manufacturing of SBAR/BAR filters |
US6870440B2 (en) * | 1998-06-09 | 2005-03-22 | Oki Electric Industry Co., Ltd. | Saw branching filter with a branching filter circuit formed on the package |
US6580197B2 (en) * | 2001-01-05 | 2003-06-17 | Clarisay, Inc. | System and method for dissipating static charge generated in a surface acoustic wave device |
US6424238B1 (en) * | 2001-01-08 | 2002-07-23 | Motorola, Inc. | Acoustic wave filter and method of forming the same |
US6472954B1 (en) * | 2001-04-23 | 2002-10-29 | Agilent Technologies, Inc. | Controlled effective coupling coefficients for film bulk acoustic resonators |
US6765456B2 (en) * | 2001-12-17 | 2004-07-20 | Oki Electric Industry Co., Ltd. | Surface acoustic wave duplexer and portable communication device using the same |
US7078984B2 (en) * | 2002-02-27 | 2006-07-18 | Tdk Corporation | Duplexer and method of manufacturing same |
US7102460B2 (en) * | 2003-04-17 | 2006-09-05 | Epcos Ag | Duplexer with extended functionality |
US20040207490A1 (en) * | 2003-04-21 | 2004-10-21 | Jun Chan-Bong | Film bulk acoustic resonator having an air gap and a method for manufacturing the same |
US7446629B2 (en) * | 2004-08-04 | 2008-11-04 | Matsushita Electric Industrial Co., Ltd. | Antenna duplexer, and RF module and communication apparatus using the same |
US7439825B2 (en) * | 2005-07-27 | 2008-10-21 | Samsung Electronics Co., Ltd. | Integrated filter including FBAR and saw resonator and fabrication method therefor |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10218400B2 (en) | 2013-01-31 | 2019-02-26 | Nokia Of America Corporation | Technique for filtering of clock signals |
US10033443B2 (en) | 2016-04-15 | 2018-07-24 | Alcatel-Lucent Usa Inc. | MIMO transceiver suitable for a massive-MIMO system |
WO2021102640A1 (en) * | 2019-11-25 | 2021-06-03 | 开元通信技术(厦门)有限公司 | Acoustic wave device and fabrication method therefor |
CN111817678A (en) * | 2020-07-03 | 2020-10-23 | 中国科学院上海微系统与信息技术研究所 | Monolithic hybrid integrated acoustic resonator array and preparation method thereof |
TWI831374B (en) * | 2022-09-15 | 2024-02-01 | 特崴光波導股份有限公司 | Multi-band filter |
Also Published As
Publication number | Publication date |
---|---|
US20140312993A1 (en) | 2014-10-23 |
US7642882B2 (en) | 2010-01-05 |
KR100719123B1 (en) | 2007-05-18 |
US20080024245A1 (en) | 2008-01-31 |
US9628048B2 (en) | 2017-04-18 |
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