US20090178784A1

US20090178784A1 - Manufacturing Method of Isothermal Vapor Chamber And Product Thereof

Info

Publication number: US20090178784A1
Application number: US12/014,145
Authority: US
Inventors: Chin-Wen Wang
Original assignee: Individual
Current assignee: HYPER-GREEN INDUSTRIAL Co Ltd
Priority date: 2008-01-15
Filing date: 2008-01-15
Publication date: 2009-07-16

Abstract

A manufacturing method of a isothermal vapor chamber and a product thereof are to use an integrated manner to form an orifice directly on a plate body of a isothermal vapor chamber. Through the orifice, the operations of injecting working fluid and degassing or vacuating can be proceeded. The orifice is functionally similar to a degassing tube or a vacuating tube of the prior arts. However, since the orifice is integrated on the plate body of the isothermal vapor chamber body, it can be pressed to seal the isothermal vapor chamber after an operation of degassing. Therefore, the vacuity in the isothermal vapor chamber and the stored amount of the working fluid, and it is easier for manufacture.

Description

BACKGROUND OF THE INVENTION

1. Field of the Invention
The present invention generally relates to a cooling technique, in particular, to a heat pipe.
2. Description of Prior Art
An isothermal vapor chamber is a kind of heat pipes formed as a flat plate, which has a similar working principle as a common heat pipe. Namely, through an internal environment of vacuum, a working fluid contained therein can generate a phase change from liquid to vapor for transferring heat from a heated end to a cooling end. The working fluid condenses into liquid phase at the cooling end, flows back to the heated end and repeats the cycle.
However, an isothermal vapor chamber is different from a heat pipe in terms of manufacture process. The tube body of a heat pipe is usually formed as a tube configuration, one end of which can be sealed first, then another side of which can be processed with the operations of injecting working fluid and degassing. Immediately after the degassing is finished, the tube body is sealed so as to complete a manufacturing process of a heat pipe. Nonetheless, the plate body of an isothermal vapor chamber is form as a flat plate, which is constructed by closing two plates that are closed up. Not only do the circumferential edges of the closing two plates have to be sealed, but also an injection port has to be pre-made as well, such that it may process aforementioned operations, such as: an injection of working fluid, a de-aeration, or an evacuation, etc. During the manufacturing process of an isothermal vapor chamber according to the prior arts, a de-aerating tube or an evacuating tube has to be inserted into the injection port first, such that it is possible to process the operations of an injection of working fluid, a de-aeration, and an evacuation. After aforementioned operations are finished, the de-aerating tube or the evacuating tube has to be removed, so that it is possible to seal the injection port subsequently. Under such circumstance, the vacuity in the isothermal vapor chamber and the stored amount of the working fluid will be influenced and out of accurate control. In the meantime, the manufacturing process is more difficult.
Accordingly, aiming to solve aforementioned shortcomings, after a substantially devoted study, in cooperation with the application of relatively academic principles, the inventor has at last proposed the present invention that is designed reasonably to possess the capability to improve the prior arts significantly.

SUMMARY OF THE INVENTION

The invention is mainly to provide a manufacturing method of an isothermal vapor chamber and a product thereof. According to the invention, an integrating manner is applied to form an orifice directly on a plate body of an isothermal vapor chamber for being able to process the operations of an injection of working fluid, a de-aeration, and an evacuation. The orifice is functionally similar to a degassing tube or a vacuating tube in the prior arts but, since the orifice is integrated on the plate body of the isothermal vapor chamber, as soon as aforementioned operations have been processed, an immediate pressing and sealing operation can be subsequently processed, so it is possible to accurately control the vacuity in the isothermal vapor chamber and the stored amount of the working fluid. Furthermore, its manufacturing method is much easier.
To achieve the above-mentioned objects, the invention is to provide an isothermal vapor chamber, which includes a hollow plate body and a capillary structure attached on inner walls thereof. According to the invention, the plate body is constructed by closing two plates. There are sealing sides formed around the circumferences of the closing two plates. Particularly, a welding part is arranged at the outer edges between the sealing sides of the closing two plates, and a projected orifice is integrated on any one of the sealing sides.

BRIEF DESCRIPTION OF DRAWING

The features of the invention believed to be novel are set forth with particularity in the appended claims. The invention itself, however, may be best understood by reference to the following detailed description of the invention, which describes a number of exemplary embodiments of the invention, taken in conjunction with the accompanying drawings, in which:

FIG. 1 is a step flowchart of a method according to the present invention;

FIG. 2 is a perspective explosive view of the isothermal vapor chamber according to the present invention;

FIG. 3 is a perspective assembled view of the isothermal vapor chamber according to the present invention;

FIG. 4 is a partially enlarging view of the “A” part in FIG. 3;

FIG. 5 is an illustration of the isothermal vapor chamber in FIG. 4, in which the circumferential edges have been sealed;

FIG. 6 is a cross-sectional view of the isothermal vapor chamber in FIG. 5 sectioned along a “6-6” sectional line;

FIG. 7 is an illustration of the isothermal vapor chamber in FIG. 5, in which the orifice has been pressed to be sealed;

FIG. 8 is an illustration of the isothermal vapor chamber in FIG. 7, in which the orifice has been melted to be sealed;

FIG. 9 is an explosively perspective view of the isothermal vapor chamber according to another preferable embodiment of the present invention;

FIG. 10 is a partially enlarging view of a pressed and sealed orifice of the isothermal vapor chamber according to a further preferable embodiment of the present invention; and,

FIG. 11 is an illustration of the isothermal vapor chamber in FIG. 10, in which some parts of the orifice have been cut off.

DETAILED DESCRIPTION OF THE INVENTION

In cooperation with attached drawings, the technical contents and detailed description of the present invention are described thereinafter according to a number of preferable embodiments, being not used to limit its executing scope. Any equivalent variation and modification made according to appended claims is all covered by the claims claimed by the present invention.
Please refer to FIG. 1, which is a step flowchart of a method according to the present invention. The invention is to provide a manufacturing method of an isothermal vapor chamber and a product thereof, its method including following steps:
First, the method combines two plates to form a hollow plate body having an accommodating space in step S1. Secondly, the method forms a projected orifice on one of the plates in step S2. After step S2, the method seals circumferential edges of the plate body except the orifice in step S3. Next, the method vacuates the accommodating space via the orifice in step S4. Finally, the method press the orifice to close up in step S5.
As shown in FIG. 2, the two plates 10, 11 forming the plate body 1 of the isothermal vapor chamber are illustrated. The two plates 10, 11 are closed up to constitute the plate body 1, in which the accommodating space 12 is formed therein, as shown in FIG. 6. The closing two plates 10, 11 respectively shown as a substantially flat plate are all made of materials with good heat conductivity, such as: aluminum, copper, etc. According to the preferable embodiments of the present invention, the accommodating space 12 is formed by flatly projecting one plate 10 outwardly. Additionally, a capillary structure 2 is attached on inner walls of the accommodating space 12.
As shown in FIG. 3, there are sealing sides 100, 110 formed around the all circumferential edges of the closing two plates 10, 11. The sealing sides 100, 110 are to seal the accommodating space 12 in the plate body 1 after the two plates 10, 11 have been closed up. In this case, each contour of the closing two plates 10, 11 is all shown as a rectangular shape. At any intersection of two adjacent sealing sides 100, 110 of the closing two plates 10, 11, at least a beveled corner 101, 111 is reserved. Thereby, the projected orifice 13 is integrated at the comers 101, 111 of any one of the closing two plates 10, 11. In the meantime, the orifice 13 is communicated to the aforementioned accommodating space 12. The orifice 13 is located at the corner 101 of the upper closing plate 10. More specifically, as shown in FIG. 4, the orifice 13 includes: a shrunk tube 130 communicated to the accommodating space 12, an expanded tube 131 communicated to an end of the shrunk tube 130, and a through hole 132 sequentially penetrating the expanded tube 131 and the shrunk tube 130 from an outer edge of the corner 101 for being communicated to the accommodating space 12.
As shown in FIG. 5, after the two plates 10, 11 are closed up, their circumferential sides are sealed through a jointing or welding manner, for example, diffusive or plasma weld, while the orifice 13 is reserved not to seal. The accommodating space 12 can be processed with several operations via the expanded tube 131 of the orifice 13, for example, injecting working fluid and degassing or vacuating. It is easier for processing the operations, such as injecting working fluid, because the diameter of the expanded tube 131 is larger than that of the shrunk tube 130.
As shown in FIG. 6, immediately after a degassing or vacuating operation is finished, the shrunk tube 130 of the orifice 13 is pressed by means for die-stamping. It is easier to control the sealing quality of the isothermal vapor chamber during the sealing operation, because the diameter of the shrunk tube 130 is smaller than that of the expanded tube 131. Furthermore, as shown in FIG. 7, the pressed orifice 13 will seal the through hole 132 due to its deformation, by means of which the orifice 13 is sealed, and thus a vacuity of the accommodating space 12 may be maintained. In other words, a manufacturing process of the isothermal vapor chamber is preliminarily completed.
As shown in FIG. 8, in order to ensure a sealing effectiveness of the orifice 13, it is also possible to melt the expanded tube of the orifice 13 in a further step. Namely, after the expanded tube 131 of the orifice 13 is sealed through melting its own material, an outer edge of the through hole 132 of the orifice 13 may be furthermore sealed.
Furthermore, as shown in FIG. 9, each contour of the closing two plate 10, 11 may also be a circular shape, while the sealing sides 100, 110 of the two closing plates is correspondingly circulars surrounding the plates. More specifically, the sealing sides 100, 110 of the two closing plates 10, 11 are all a flat block 102, 112 projected outwardly, such that the orifice 13 is integrated on any one block of the two flat blocks 102, 112 of the closing two plates 10, 11. In this preferable embodiment, the orifice 13 is still located at the flat block 102 of the upper plate 10.
As shown in FIG. 10, the sealing process of the circumferential sides of the two closing plates 10, 11 and the pressing process of the orifice part 13 to be sealed are same as those steps described thereinbefore. However, after the shrunk tube 130 of the orifice 13 is pressed to be sealed, the flat blocks 102, 112 of the closing two plates are then cut off and, once again, the unsealed sealing sides 100, 110 of the closing two plates 10, 11 are sealed by means of jointing or welding, thus that a circular isothermal vapor chamber is obtained, just as shown in FIG. 11.
According to aforementioned step flowchart, it is possible to obtain a manufacturing method of the above-mentioned isothermal vapor chamber.
In addition, referring back to FIG. 6 and FIG. 7, the isothermal vapor chamber provided by the invention includes: a plate body 1; an accommodating space 12 formed in the plate body 1; and a capillary structure 2 attached on inner walls of the accommodating space 12. In this preferable embodiment, the plate body 1 is constructed by closing two plates 10, 11, on circumferential edges of which sealing sides 100, 110 are all formed, between which a welding portion 14 is formed due to a welding process, and a projected orifice 13 is integrated at any one of the two sealing sides 100, 110. At least one part of the orifice 13 is shown as a flat shape to be sealed. Or, as further shown in FIG. 8, an outer edge of a through hole 132 of the orifice part 13 is formed as a sealing side 133, resulting from a melting process.
According to aforementioned structure, an isothermal vapor chamber of the present invention is thereby obtained.
Summarizing aforementioned description, the invention is an indispensably novel structure for a compressor indeed, which may positively reach the expected usage objective for solving the drawbacks of the prior arts, and which extremely possesses the innovation and progressiveness to completely fulfill the applying merits of new type patent, according to which the invention is thereby applied. Please examine the application carefully and grant it as a formal patent for protecting the rights of the inventor.
However, the aforementioned description is only a preferable embodiment according to the present invention, being not used to limit the patent scope of the invention, so equivalently structural variation made to the contents of the present invention, for example, description and drawings, is all covered by the claims claimed thereinafter.

Claims

1. A manufacturing method of an isothermal vapor chamber, including following steps:

a) combining corresponding two plates to form a hollow plate body having an accommodating space therein;

b) integratedly forming a projected orifice on one of the plates, wherein the orifice communicates to the accommodating space;

c) sealing circumferential edges of the plate body except the orifice;

d) vacuating the accommodating space in the plate body via the orifice; and

e) pressing the orifice to close up.

2. The manufacturing method according to claim 1, wherein step c) further includes sealing the two plates by means of welding.

3. The manufacturing method of according to claim 2, wherein the welding means is meant by a diffusive or plasma welding process.

4. The manufacturing method according to claim 1, wherein step d) further includes injecting a working fluid into the plate body via the orifice.

5. The manufacturing method according to claim 1, further comprising a step f after the step e:

melting the orifice.

6. An isothermal vapor chamber, comprising:

a hollow plate body composed of two plates, having an accommodating space therein, wherein circumferential edges of the plate body are all formed as sealing sides, outer edges of the sealing sides are all arranged with welding portions, a projected orifice integratedly extends from one of the sealing sides, and one portion of the orifice is of a flat shape to be sealed; and

a capillary structure attached on inner walls of the plate body.

7. The isothermal vapor chamber according to claim 6, wherein each contour of the two plates is of a rectangular shape, and at least one beveled corner is reserved at an intersection of any two adjacent sealing sides of the two plate, while the orifice is located at the corner.

8. The isothermal vapor chamber according to claim 6, wherein each contour of the two plates is of a circular shape.

9. The isothermal vapor chamber according to claim 6, wherein the orifice includes a shrunk tube and an expanded tube communicated to one end of the shrunk tube, and the flat part of the orifice is just the shrunk tube.

10. The isothermal vapor chamber according to claim 9, wherein an outer edge of the expanded tube of the orifice is further formed as a sealing side.