US20010030986A1 - Discharge unit for a high repetition rate excimer or molecular fluorine laser - Google Patents
Discharge unit for a high repetition rate excimer or molecular fluorine laser Download PDFInfo
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- US20010030986A1 US20010030986A1 US09/826,296 US82629601A US2001030986A1 US 20010030986 A1 US20010030986 A1 US 20010030986A1 US 82629601 A US82629601 A US 82629601A US 2001030986 A1 US2001030986 A1 US 2001030986A1
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- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 title claims abstract description 13
- 239000000203 mixture Substances 0.000 claims description 24
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- 230000005684 electric field Effects 0.000 description 6
- 229910052736 halogen Inorganic materials 0.000 description 6
- 150000002367 halogens Chemical class 0.000 description 6
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- 229910052724 xenon Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
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- 229910052734 helium Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 229910052743 krypton Inorganic materials 0.000 description 2
- 229910052754 neon Inorganic materials 0.000 description 2
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 2
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- 238000009413 insulation Methods 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Definitions
- the present invention relates to a discharge unit for an excimer or molecular gas laser, particularly having a narrow discharge width and aerodynamic gas flow.
- Pulsed gas discharge lasers emitting in the deep ultraviolet region (DUV) and/or vacuum ultraviolet region (VUV), are important tools for a wide range of industrial applications.
- microlithography applications currently use a line narrowed excimer laser (e.g., ArF, KrF, XeCl, KrCl or XeF) or a molecular fluorine (F 2 ) laser having high efficiency and stability at high repetition rates (e.g., 1000 Hz or more).
- FIG. 1 An electrode chamber design and electrode configuration of a conventional discharge unit are illustrated in FIG. 1.
- the electrode chamber of FIG. 1 houses a pair of elongated main electrodes 2 , 4 .
- the main electrodes 2 , 4 are separated by a gap or discharge area 6 through which a gas mixture is flowed.
- a set of high voltage capacitors or “peaking” capacitors Cp is preferably positioned as close as possible to the main discharge electrodes 2 , 4 , and as uniformly as possible over the length of the electrodes 2 , 4 .
- One or two or more preionization units are used to preionize the gas mixture in the discharge area 6 prior to the main discharge.
- One of the main electrodes is connected to a pulsed high voltage generator.
- the high voltage generator typically includes a thyratron or a solid state switch for providing a fast and powerful charge to the peaking capacitors 8 up to the electrical breakdown voltage of the gas discharge gap 6 .
- the other main electrode 4 is usually connected to ground potential. Fast and powerful discharge of the peaking capacitors Cp, followed by electrical breakdown of the active laser gases in the gas mixture provides the necessary pumping of the gas mixture.
- the peaking capacitors in both cases are disposed outside of the electrode chamber (that is not necessary, but common, because it easily avoids exposure of the peaking capacitors to the aggressive halogen gas).
- One of the main discharge electrodes, the ground electrode is connected directly to the metal body of the electrode chamber.
- the other or high voltage electrode is connected to the peaking capacitors and is separated from the grounded metal body of the electrode chamber by means of a dielectric (e.g., ceramic) insulator.
- the gas mixture is characterized as being strongly electronegative and maintained at an elevated pressure (e.g., a few bars).
- the gas mixture for an excimer laser includes an active rare gas such as krypton, argon or xenon, a halogen containing species such as fluorine or HCl, and a buffer gas such as neon or helium.
- a molecular fluorine laser includes molecular fluorine and a buffer gas such as neon and/or helium.
- a typical preionization arrangement includes two preionization units 10 each including a conducting electrode inside a dielectric tube.
- the preionization units 10 are connected to a pulsed high voltage source and preionize the gas mixture by forming a uniform surface glow discharge.
- the preionization units 10 are typically positioned in the vicinity of the discharge area 6 between the main electrodes 2 , 4 and provide an initial ionization of the laser gas during the charging of the peaking capacitors Cp by the high voltage pulsed generator.
- UV-preionizers typically include arrays of electrical sparks, sometimes stabilized by dielectric surfaces, or other configurations of barrier or corona discharge sources. Soft x-ray radiation sources are also sometimes used.
- FIGS. 2 a and 2 b Examples of preionization arrangements which could be used for UV-preionization are shown in FIGS. 2 a and 2 b .
- FIG. 2 a shows a corona preionization arrangement including two corona units 10 a. Each corona unit 10 a shown includes an cylindrical electrode 16 surrounded by a dielectric tube 18 . An external electrode 20 a provides a potential difference for each preionization unit 10 a.
- the UV radiation emitted by the preionization units 10 a preionizes gaseous components within the discharge area 6 .
- FIG. 2 b shows a cross section of a UV-spark preionization arrangement wherein the preionization units 10 b include separate pins 22 surrounded by dielectrics 24 . These pins 22 are fed-through the chamber and connected to a pulsed power source outside the chamber. A plurality of spark gaps 26 are formed due to a potential difference between an electrode 20 b in proximity to the pins 22 and produces preionization of the gas in the discharge area 6 .
- the laser tube of the discharge unit further includes a gas vessel 11 having a gas flow system or blower 12 and a heat exchanger 14 as illustrated in FIG. 3.
- a vane 15 is also shown extending from the blower 12 generally to the electrode 4 of the discharge chamber.
- the blower 12 forces the gas to flow generally as indicated by the arrows in FIG. 3.
- the gas mixture is naturally heated as it is excited by the electrical discharge in the discharge area 6 .
- the heat exchanger 14 cools the heated gas after it exits the electrode chamber.
- the portion of the gas mixture which participates in a laser pulse is replaced by fresh gas before the next laser pulse occurs.
- a gas supply unit also typically supplies fresh gas to the system from outside gas containers to replenish each of the components of the gas mixture.
- halogen containing gas is typically supplied because the halogen concentration in the gas mixture tends to deplete rapidly during operation, while it is desired to maintain a constant or near constant halogen concentration in the gas mixture.
- Means for releasing some of the gas mixture is also typically provided so that the gas pressure can be controlled and to expel contaminated gases.
- the discharge unit illustrated at FIG. 4 a includes a dielectric frame or one or two or more dielectric insulators 28 (see Industrial Excimer Lasers: Fundamentals, Technolgy and Maintenance, Dirk Basting, Ed., 2 nd edition (1991); Litho laser tube of Lambda Physik, GmbH).
- Each dielectric insulator 28 is mechanically connected to the gas vessel 11 that is connected to the grounded discharge electrode 4 .
- the dielectric frame or insulator(s) 28 electrically isolate the high voltage electrode 2 . That is, the roof 31 connected to the high voltage electrode 2 is insulated from the grounded main electrode 4 by the dielectric insulator(s) 28 .
- an arrangement 30 of conducting ribs are connected electrically to the grounded electrode 4 .
- the rib arrangement 30 of the discharge unit includes several rectangular ribs 32 separated by openings to permit gas flow from the gas vessel 11 into the electrode chamber and into the discharge area 6 .
- the relationship between the rectangular ribs 32 and the opening separating them are illustrated at Fig.
- the ribs 32 serve as low inductive current conductors in the discharge circuitry.
- a lower inductivity of the discharge electrical current loop is advantageous as better matching may be provided between the wave impedance of the electrical discharge loop and the gas discharge impedance.
- the discharge unit of FIG. 4 a advantageously allows the discharge loop to exhibit a characteristically low inductivity.
- the gas flow through the discharge area 6 and especially near the grounded electrode 4 , has a high curvature producing turbulences that complicate the gas exchange in the discharge area 6 .
- dampers may be used as obstacles for the acoustical waves.
- the dampers can also have an adverse influence on the uniformity of the gas flow.
- the dampers would have large surface areas which are subject to attack by aggressive halogens in the gas mixture.
- FIG. 4 b shows an alternative discharge unit design to that illustrated at FIG. 4 a (see U.S. Pat. Nos. 4,891,818 to Levatter and 5,771,258 to Morton et al.).
- a dielectric insulator plate 33 separates the high voltage electrode from the metal walls of the electrode chamber.
- the main electrodes 2 , 4 are immersed in the gas flow vessel 11 .
- Electrical current return bars similar to the rectangular ribs 32 of the arrangement of FIG. 4 a may once again cross the gas flow and shorten the discharge loop from the grounded discharge electrode 4 to the walls of the laser tube.
- the gas exchange conditions are improved over those discussed above with respect to the arrangement of FIG. 4 a.
- the improved gas exchange conditions provided by the arrangement of FIG. 4 b are advantageous because satisfactory laser operation may be achieved at lower gas flow rates, and strong and uniform gas flow permits satisfactory operation at higher repetition rates (see U.S. Pat. No. 5,247,534 to Muller-Horsche, assigned to the same assignee as the present invention, and hereby incorporated by reference).
- the connection of the high voltage electrode 2 via the dielectric plate 33 implies the use of a plurality of concentrated feedthroughs 34 . This gives rise to an undesirably higher inductivity of the electrical discharge current loop.
- FIG. 4 f shows an alternative design.
- the insulators 128 shown in FIG. 4 f conform with the gas flow.
- main electrodes 2 , 4 themselves.
- features of the main electrodes 2 , 4 including their size, shape and proximity to each other and to other elements within the electrode chamber such as the preionization units determine important discharge conditions such as the shape and uniformity of the static electrical field in the discharge area 6 and the width of the discharge area 6 .
- the discharge width should be reduced to a value commensurate with the effective aperture size of the line narrowing resonator.
- an effective aperture of a linewidth narrowing resonator might be on the order of 3 to 4 mm or less, and is typically around 2 mm.
- the discharge width should be comparable to or less than this 3 to 4 mm specification.
- a narrower discharge width is also more suitable for laser operation at higher repetition rates (e.g., 1 kHz or more). Yet another advantage to having a narrow discharge width is that the exchange of gases in the discharge area is simplified.
- the electrodes 2 , 4 should have a minimized width to provide the most compact and least inductive design possible of the gas discharge electrical circuit.
- Analytical expressions for the shapes of the electrodes 2 , 4 have been proposed including a combination of implicit hyperbolic functions (see T. Y. Yang, Improved Uniform-Field Electrode Profiles for TEA Laser and High-Voltage Applications, The Review of Scientific Instruments, vol. 41, no. 4 (April 1973); G. J. Ernst, Uniform-Field Electrodes with Minimum Width, Optics Communications, vol. 49, no. 4 (Mar. 15, 1984); G. J.
- Typical approaches usually propose the electrodes 2 , 4 to be identical, each having a uniform regular shape with a minimal gap between the middle portions of the electrodes 2 , 4 and a gradually increasing gap away from the middle portions to the edges. During laser operation, the discharge will begin in these middle portions.
- the real width of the gas discharge is also less than the width of the electrodes 2 , 4 .
- the discharge width might be 11 mm while the width of each electrode 2 , 4 is around 30 mm.
- the actual discharge width depends on many factors including the gas mixture, the preionization technique used, the electrical circuitry and the static electric field distribution.
- the outer portions of the electrodes 2 , 4 although carrying little or no discharge current, contribute significantly to the electrical field distribution in the vicinity of the discharge area 6 .
- the fact that the outer portions of the electrodes 2 , 4 carry little or no discharge current may be used advantageously for other considerations in the design of the electrodes 2 , 4 .
- the outer portions of the electrodes 2 , 4 may comprise dielectric materials such as ceramics to thereby prevent parasitic discharge currents and to further restrict the discharge width (see H. Bucher and H. Frowein, Elektrode fur nie niethaneladungslaser, Academic De 4401892 A1 (Jul. 27, 1995)).
- FIG. 5 Another technique disclosed in the '629 and '233 patents is shown in FIG. 5.
- additional “easing” electrodes 36 are positioned on either side of the main discharge electrodes 2 , 4 .
- an electrode chamber of a laser for an excimer or molecular fluorine laser is connected with a gas flow vessel, and includes a pair of elongated main electrodes separated by a discharge area, and a preionization unit.
- the electrode chamber also includes a spoiler integrated with the chamber and spaced from each of the main electrodes.
- the spoiler is shaped to provide an aerodynamic gas flow through the discharge area.
- a spoiler unit may include a pair of opposed spoiler elements each integrated with the chamber on either side of the discharge area, wherein each spoiler element is spaced from the main discharge electrodes and shaped to provide an aerodynamic gas flow through the discharge area.
- a laser for an excimer or molecular fluorine laser including an electrode chamber having a pair of elongated main electrodes separated by a discharge area, and a preionization unit.
- at least one main electrode includes a base portion and a center portion which may be a nipple protruding from the base portion.
- the nipple substantially carries the periodic discharge current such that the discharge width is reduced to the width of the nipple which may be significantly less than the discharge width which would be provided by an electrode comprising only the base portion.
- the curvature of the base portion may be similar to the curvature of gas flow through the discharge chamber to improve aerodynamic performance.
- an electrode chamber of a discharge unit for an excimer or molecular fluorine laser in accord with the above objects is connected with a gas flow vessel and includes a pair of main electrodes and a preionization unit.
- a plurality of ribs connected to one of the main electrodes cross the gas flow preferably between the electrode chamber and the gas flow vessel.
- the ribs are separated by openings to permit gas flow and shaped to provide an aerodynamic flow of gases through the openings.
- the shape of the ribs provides a smooth and uniform gas flow between the gas flow vessel and the electrode chamber and thus a reduced aerodynamic resistance for the blower over conventional conducting ribs.
- the ribs preferably have widths which smoothly taper from the end which meets the gas flow to the opposite end.
- the ribs may be rounded and each end may have a different radius of curvature.
- an electrode chamber of a laser for an excimer or molecular laser is connected with a gas flow vessel, and includes a pair of elongated main electrodes separated by a discharge area, and a preionization unit.
- the electrode chamber includes a spoiler spaced from each of the main electrodes and positioned near a preionization electrode to thereby shield the preionization electrode from one of the main electrodes.
- the spoiler is also shaped to provide an aerodynamic gas flow through the discharge area.
- a spoiler unit may include a pair of opposed spoiler elements each positioned electrode on either side of the discharge area to shield one of two or more preionization electrodes from a main electrode, wherein each spoiler element is spaced from the main discharge electrodes and shaped to provide an aerodynamic gas flow through the discharge area.
- an electrode chamber of a laser for an excimer or molecular laser is connected with a gas flow vessel, and includes a pair of elongated main electrodes separated by a discharge area, and a preionization unit.
- the electrode chamber includes a spoiler shaped to reflect acoustical waves emanating from the discharge area into the gas flow.
- the spoiler is also shaped to provide an aerodynamic gas flow through the discharge area.
- a spoiler unit may include a pair of opposed spoiler elements positioned on either side of the discharge area shaped to reflect acoustical waves emanating from the discharge area into the gas flow vessel, wherein each spoiler element is shaped to provide an aerodynamic gas flow through the discharge area.
- FIG. 1 illustrates in a cross sectional view an electrode chamber of a typical discharge unit design and electrode configuration.
- FIG. 2 a illustrates in a cross section view a laser having an exemplary UV corona preionization unit design.
- FIG. 2 b illustrates in a cross sectional view a laser having an exemplary UV spark preionization unit design.
- FIG. 3 illustrates in a cross sectional view a laser tube including an electrode chamber connected with a gas flow vessel.
- FIG. 4 a illustrates in a cross section view a laser tube including an electrode chamber and a gas flow vessel, wherein the high voltage electrode is insulated by a dielectric insulator, and the discharge area is adjacent to the gas flow vessel.
- FIG. 4 b illustrates in a cross sectional view a laser tube including an electrode chamber and a gas flow vessel, wherein the high voltage electrode is insulated by a dielectric plate, and the discharge area is immersed in the gas flow vessel.
- FIG. 4 c illustrates in a top view low inductivity ribs crossing the gas flow and separated by openings to permit gas flow.
- FIG. 4 d illustrates a cross sectional side view of the ribs of FIG. 4 c separated by openings through which gas enters the electrode chamber from the gas flow vessel.
- FIG. 4 e illustrates a cross sectional side view of the ribs of FIG. 4 c separated by openings through which gas exits the discharge chamber and flows back into the gas flow vessel.
- FIG. 5 illustrates a gas discharge electrode arrangement of the prior art including a pair of easing electrodes around each main discharge electrode.
- FIG. 6 illustrates a laser having an electrode chamber in accord with first, fourth and fifth aspects of the present invention.
- FIG. 7 a illustrates a laser having an electrode chamber in accord with a second aspect of the present invention.
- FIG. 7 b illustrates a laser having an alternative electrode chamber in accord with the second aspect of the present invention.
- FIG. 8 illustrates a laser having another alternative electrode chamber in accord with the second aspect of the present invention.
- FIG. 9 a illustrates a laser tube is accord with a third aspect of the present invention.
- FIG. 9 b shows a cross sectional view of the ribs crossing the gas flow of the laser tube of FIG. 9 a where the gas flows into the electrode chamber from the gas flow vessel, wherein the ribs are separated by openings to permit the gas flow and shaped to provide aerodynamic gas flow and the ribs further serve as low inductivity current return bars.
- FIG. 9 c shows a cross sectional view of the ribs crossing the gas flow of FIG. 9 a separated by openings to permit gas flow from the electrode chamber back into the gas flow vessel, wherein the ribs are aerodynamically shaped and separated by openings through which gas exits the electrode chamber and flows back into the gas flow vessel.
- FIG. 10 illustrates a laser having an electrode chamber configuration in accord with an alternative embodiment of the present invention.
- FIG. 6 shows an aerodynamic discharge unit in accord with a first aspect of the present invention.
- the discharge unit of FIG. 6 includes a pair of main electrodes 2 , 4 separated by a discharge area 6 and connected with a set of peaking capacitors Cp.
- a pair of preionization units 10 are also shown and preferred. There may be only a single preionization unit or more than two. Preferred preionization units are described at U.S. patent application Ser. Nos. 09/247,887, 60/160,182 and 60/162,845, each of which is assigned to the same assignee, and at U.S. Pat. Nos. 5,337,330 and 5,719,896, all of which are hereby incorporated by reference.
- the discharge unit includes one or more dielectric insulators 38 preferably having a similar design as the dielectric insulators 28 discussed above with respect to FIG. 4 a.
- the dielectric insulators 38 of the preferred embodiment may also be curved, e.g., to provide a more aerodynamic electrode chamber.
- the insulators 38 may also be straight, but tilted such as to form a trapezoidally shaped electrode chamber (see FIG. 10, below).
- FIG. 6 a pair of preferred spoilers 40 in accord with the present invention are shown in FIG. 6.
- the spoilers 40 are preferably integrated with the chamber at the dielectric insulators on either side of the discharge area 6 .
- the spoilers 40 may be integrated parts of a single unit, single material dielectric assembly with the insulators 38 , or they may comprise different materials suited each to their particular functions. That is, the spoilers 40 and the dielecric insulators 38 may be formed together to provide an aerodynamic electrode chamber for improved gas flow uniformity and in accord with other features of the spoilers to be described below. Alternatively, the spoilers 40 may be attached to the insulating members 38 .
- the spoilers 40 are shaped and positioned for aerodynamic and uniform gas flow as the gas flows through the electrode chamber from the gas flow vessel 11 (partially shown), through the discharge area 6 and back into the gas flow vessel 11 .
- the spoilers 40 are symmetric in accord with a symmetric discharge chamber design.
- each of the spoilers 40 is preferably positioned to shield a preionization unit 10 from the main electrode 4 , and is shown in FIG. 6 extending underneath one of the pre-ionization units 10 between the preionization unit 10 and the main electrode 4 .
- These ends 42 of the spoilers 40 are preferably positioned close to the preionization units 10 .
- the ends 42 may be just a few millimeters from the preionization units 10 .
- the spoilers 40 serve to remove gas turbulence zones present in conventional discharge unit electrode chambers which occur due to the sharp curvature of the gas flow in the vicinity of the preionization units 10 and of the grounded discharge electrode 4 .
- Another advantageous function of the spoilers 40 according to the present invention is to reduce the level of acoustical disturbances within the discharge chamber.
- the spoilers 40 serve as “mirrors” to reflect the acoustical disturbances into the gas flow vessel 11 (partially shown here).
- shock waves propagating outwardly from the discharge area 6 impinge upon the oblique surfaces 44 of the spoilers 40 and reflect into the gas flow vessel 11 .
- internal components of the gas flow vessel 11 such as the heat exchanger 14 and the blower 12 , then efficiently damp the acoustical waves.
- This additional function of the spoilers 40 in accord with the present invention reduces the level of the acoustical disturbances discussed above with respect to the electrode chamber of FIG. 4 a .
- additional acoustical dampers are not used and the adverse impact on gas flow uniformity of using conventional dampers is avoided.
- FIG. 7 a illustrates a second aspect of the present invention relating to the shape of the main discharge electrodes 46 , 48 .
- the shapes of the discharge electrodes 46 , 48 significantly effect characteristics of the discharge area 50 .
- at least one, and preferably both, of the electrodes 46 , 48 includes two regions. One of these regions, the center portion 52 , substantially carries the discharge current and provides a uniform and narrow gas discharge width.
- the other region, or base portion 54 in collaboration with other conductive and dielectric elements within the discharge chamber, as discussed above, creates preferred electrical field conditions in and around the discharge area 50 and also contributes to the smoothness and uniformity of the gas flow in the vicinity of the discharge electrodes 46 , 48 .
- the center portion 52 and base portion 54 preferably form an electrode 46 having a single unit construction, and composed of a single material.
- the center and base portions 52 , 54 may also comprise different materials, but the different materials should have compatible mechanical and thermal properties such that mechanical stability and electrical conductivity therebetween is sufficiently maintained.
- the center portion 52 and the base portion 54 come together at a discontinuity or irregularity in the shape of the electrodes 46 , 48 . A significant deviation of the electrical field occurs at the location of the irregularity in such a way that gas discharge occurs substantially from/to the center portions 52 .
- the center portion 52 is shaped to provide a uniform gas discharge having a narrow width.
- the shape of a preferred center portion 52 is described by the formula:
- the base portions 54 of the main electrodes 46 , 48 have a width around 30 mm.
- the interelectrode gap is preferably 14 to 16 mm.
- the middle area has a width around 2 mm.
- the center portions 52 have a shape preferably as follows:
- x and y are in millimeters, y is in the direction of the interelectrode gap, x is orthogonal to y and is in the plane of the cross section of the discharge chamber shown in FIG. 7, m is preferably between 0.5 and 3, n is preferably between 8 and 13, a is preferably between 0.5 and 1.5, and b is preferably between 0.2 and 0.8.
- the base portions 54 have smooth, regular shapes.
- the center portions 52 are positioned between the base portions 54 and the discharge area 50 .
- the base portions 54 are shaped to provide a desired electric field distribution in and around the discharge area 50 .
- the base portions 54 of the electrodes 46 , 48 provide an aerodynamic channel for the flowing laser gas.
- the base portions 46 , 48 may be shaped according to any of a variety of smooth curves or a combination of several smooth curves including those described by circular, elliptical, parabolic, or hyperbolic functions.
- the curvatures of the base portions 54 of the electrodes 46 and 48 may be the same or different, and have the same direction of curvature with respect to the discharge area 50 , i.e., the base portions 54 each curve away from the discharge area 50 away from the center portion 52 .
- FIG. 7 b shows profiles of preferred center portions 52 .
- FIG. 7 c shows half profiles of the preferred center portions of FIG. 7 b.
- FIG. 7 d An alternative configuration in accord with the second aspect of the present invention is shown in FIG. 7 d.
- the discharge chamber of FIG. 7 d is preferably the same as that shown and described with respect to FIG. 7 a, except that the base portion 58 of the high voltage main electrode 56 of FIG. 7 d has opposite curvature to the base portion 54 of the electrode 46 shown in FIG. 7 a. That is, the base portion 58 of the electrode 56 curves toward the discharge area 60 away from its corresponding center portion 52 , while the base portion 54 of the electrode 48 curves away from the discharge area 60 away from its corresponding center portion 52 .
- the alternative configuration shown in FIG. 7 d provides an even more aerodynamic channel for gas flow through the discharge area 60 .
- FIG. 8 illustrates another alternative configuration of the main electrodes in accord with the second aspect of the present invention.
- the electrodes 55 , 57 have a regular shape and no discontinuity between base and center portions.
- the shape of the center portions of the electrodes 55 , 57 is preferably similar to that described above with respect to FIG. 7 a.
- the base portions taper to the center portions in a triangular shape where the apexes of the triangular shaped electrodes are the center portions and are rounded as described above.
- FIGS. 9 a - 9 c illustrate a third aspect of the present invention.
- the dielectric insulators 38 of the electrode chamber isolate the high voltage main electrode 46 .
- the gas flow is crossed by a first rib configuration 62 a where the gas flow enters the electrode chamber from the gas flow vessel 11 and by a second rib configuration 62 b where the gas flow exits the electrode chamber and returns the gas back into the gas flow vessel 11 .
- the ribs 62 a , 62 b , or current return bars, are separated by openings for the laser gas to flow into and out of the electrode chamber from/to the gas flow vessel 11 .
- the ribs are preferably rigid and conducting, and are connected to the grounded main discharge electrode 48 to provide a low inductivity current return path.
- the conducting ribs 64 a of the rib configuration 62 a are preferably substantially shaped as shown in FIG. 9 b.
- the conducting ribs 64 b of the rib configuration 62 b are preferably substantially shaped as shown in FIG. 9 c.
- the ribs 64 a and 64 b of the rib configurations 62 a and 62 b respectively, are asymmetrically shaped.
- the ribs 32 shown in cross-section in FIGS. 4 d and 4 e are rectangularly shaped.
- FIG. 9 b is a cross sectional view of the rib configuration 62 a through which the laser gas enters the electrode chamber from the gas flow vessel 11 .
- the ribs 64 a of the rib configuration 62 a each have a wide end 66 a which meets the laser gas as it flows from the gas flow vessel 11 , and a narrow end 68 a past which the laser gas flows as it enters the discharge chamber.
- the ribs 64 a are smoothly tapered, e.g., like an airplane wing, from the wide, upstream end 66 a to the narrow, downstream end 68 a to improve gas flow past the rib configuration 62 a.
- FIG. 9 c is a cross sectional view of the rib configuration 62 b through which the laser gas exits the electrode chamber and flows back into the gas flow vessel 11 .
- the ribs 64 b of the rib configuration 62 b each have a wide end 66 b which meets the laser gas as it flows from the electrode chamber, and a narrow end 68 b past which the laser gas flows as it enters the gas flow vessel 11 .
- the ribs 64 b are smoothly tapered, e.g., like an airplane wing, from the wide, upstream end 66 b to the narrow, downstream end 68 b to improve gas flow past the rib configuration 62 b.
- the aerodynamic ribs 64 a and 64 b each provide a reduced aerodynamic resistance to the flowing gas from that provided by the conventional rectangular ribs 32 of FIGS. 4 d and 4 e .
- the ribs 64 a and 64 b are thus shaped to improve the uniformity of the gas flow in accord with the above objects of the invention.
- a more homogeneous gas flow results from modifying the conventional ribs 32 into the ribs 64 a , 64 b of the present invention.
- the more homogeneous gas flow results in a more homogeneous gas density in the discharge area.
- the more homogeneous gas density in the discharge area results in a more homogeneous and stable discharge, ultimately and advantageously providing more stable output beam parameters.
- FIG. 10 illustrates an electrode chamber in accord with an alternative embodiment of the present invention.
- the laser tube shown includes an electrode chamber and a gas vessel 11 .
- the electrode chamber has a pair of main electrodes 2 , 4 separated by a discharge area 6 , and one or more (two are shown) preionization electrodes 10 .
- the electrodes 2 , 4 are connected to peaking capacitors Cp.
- the current return rib configurations 62 a and 62 b are preferably as shown and described above with respect to FIGS. 9 a - 9 c .
- the gas flow vessel 11 has a blower 12 and heat exchanger 14 also as described above.
- the high voltage main electrode 2 is isolated by a dielectric frame 128 that differs from that discussed above.
- the frame 128 has opposing walls inclined toward each other near the electrode 2 which is furthest from the gas flow vessel 11 . That is, the frame does not form a rectangular electrode chamber such as that shown in FIG. 4 a. Neither is the electrode chamber sunk into the gas flow vessel 11 like that shown in FIG. 4 b. Instead, the frame 128 shown is configured such that the electrode chamber forms a trapezoidal shape.
- the shape of the dielectric frame 128 is advantageous because in addition to isolating the main electrode 2 , the frame 128 provides a more uniform flow of the gas mixture through the discharge area 6 .
- acoustic waves generated in the discharge area are reflected from the frame 128 and into the gas flow vessel 11 , where the acoustic waves are preferably absorbed by the gas flow components 12 and 14 .
- the frame 128 may be configured to absorb some of the acoustic waves, as well.
- spoilers may be added similar to those shown and described at FIG. 6.
- the spoilers may be integrated with the frame 128 .
- the spoilers may be shaped to provide a still more uniform gas flow, and to inhibit dielectric breakdown between the preionization unit(s) 10 and the main electrode 4 .
- the spoilers may also serve to further dampen and/or reflect acoustic waves emanating from the discharge area 6 .
- a discharge chamber in accord with the preferred or alternative embodiments and any of the aspects described above in accord with the present invention will be particularly advantageous for use with an excimer or molecular fluorine laser.
- a KrF laser would have a gas mixture including Kr, F 2 and Ne and optionally a Xe or Ar additive.
- An ArF laser would have a gas mixture of Ar, F 2 and Ne and/or He, and optionally a Xe or Kr additive.
- a F 2 laser would a gas mixture of F 2 and Ne and/or He.
- a XeCl, XeF or KrCl laser would also benefit with the advantages described above.
- Preferred gas mixtures and gas control techniques are described at U.S.
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Abstract
Description
- This patent application is a divisional application which claims the benefit or priority to parent U.S. patent application Ser. No. 09/453,670, filed Dec. 3, 1999, which claims the benefit of priority to U.S. provisional patent application No. 60/128,227, filed Apr. 7, 1999.
- 1. Field of the Invention
- The present invention relates to a discharge unit for an excimer or molecular gas laser, particularly having a narrow discharge width and aerodynamic gas flow.
- 2. Discussion of the Related Art
- Pulsed gas discharge lasers, emitting in the deep ultraviolet region (DUV) and/or vacuum ultraviolet region (VUV), are important tools for a wide range of industrial applications. For example, microlithography applications currently use a line narrowed excimer laser (e.g., ArF, KrF, XeCl, KrCl or XeF) or a molecular fluorine (F2) laser having high efficiency and stability at high repetition rates (e.g., 1000 Hz or more).
- An electrode chamber design and electrode configuration of a conventional discharge unit are illustrated in FIG. 1. The electrode chamber of FIG. 1 houses a pair of elongated
main electrodes main electrodes discharge area 6 through which a gas mixture is flowed. A set of high voltage capacitors or “peaking” capacitors Cp is preferably positioned as close as possible to themain discharge electrodes electrodes discharge area 6 prior to the main discharge. - One of the main electrodes, in this
case electrode 2, is connected to a pulsed high voltage generator. The high voltage generator typically includes a thyratron or a solid state switch for providing a fast and powerful charge to the peaking capacitors 8 up to the electrical breakdown voltage of thegas discharge gap 6. The othermain electrode 4 is usually connected to ground potential. Fast and powerful discharge of the peaking capacitors Cp, followed by electrical breakdown of the active laser gases in the gas mixture provides the necessary pumping of the gas mixture. - The peaking capacitors in both cases are disposed outside of the electrode chamber (that is not necessary, but common, because it easily avoids exposure of the peaking capacitors to the aggressive halogen gas). One of the main discharge electrodes, the ground electrode, is connected directly to the metal body of the electrode chamber. The other or high voltage electrode is connected to the peaking capacitors and is separated from the grounded metal body of the electrode chamber by means of a dielectric (e.g., ceramic) insulator.
- The gas mixture is characterized as being strongly electronegative and maintained at an elevated pressure (e.g., a few bars). The gas mixture for an excimer laser includes an active rare gas such as krypton, argon or xenon, a halogen containing species such as fluorine or HCl, and a buffer gas such as neon or helium. A molecular fluorine laser includes molecular fluorine and a buffer gas such as neon and/or helium.
- A typical preionization arrangement includes two
preionization units 10 each including a conducting electrode inside a dielectric tube. Thepreionization units 10 are connected to a pulsed high voltage source and preionize the gas mixture by forming a uniform surface glow discharge. Thepreionization units 10 are typically positioned in the vicinity of thedischarge area 6 between themain electrodes - Examples of preionization arrangements which could be used for UV-preionization are shown in FIGS. 2a and 2 b. FIG. 2a shows a corona preionization arrangement including two
corona units 10 a. Eachcorona unit 10 a shown includes ancylindrical electrode 16 surrounded by adielectric tube 18. Anexternal electrode 20 a provides a potential difference for eachpreionization unit 10 a. The UV radiation emitted by thepreionization units 10 a preionizes gaseous components within thedischarge area 6. - FIG. 2b shows a cross section of a UV-spark preionization arrangement wherein the preionization units 10 b include
separate pins 22 surrounded bydielectrics 24. Thesepins 22 are fed-through the chamber and connected to a pulsed power source outside the chamber. A plurality ofspark gaps 26 are formed due to a potential difference between anelectrode 20 b in proximity to thepins 22 and produces preionization of the gas in thedischarge area 6. - Besides the discharge unit having a pulser circuit and a laser tube including an electrode chamber such as that illustrated in FIG. 1, the laser tube of the discharge unit further includes a
gas vessel 11 having a gas flow system orblower 12 and aheat exchanger 14 as illustrated in FIG. 3. Avane 15 is also shown extending from theblower 12 generally to theelectrode 4 of the discharge chamber. Theblower 12 forces the gas to flow generally as indicated by the arrows in FIG. 3. The gas mixture is naturally heated as it is excited by the electrical discharge in thedischarge area 6. Theheat exchanger 14 cools the heated gas after it exits the electrode chamber. The portion of the gas mixture which participates in a laser pulse is replaced by fresh gas before the next laser pulse occurs. Although not shown, a gas supply unit also typically supplies fresh gas to the system from outside gas containers to replenish each of the components of the gas mixture. In particular, halogen containing gas is typically supplied because the halogen concentration in the gas mixture tends to deplete rapidly during operation, while it is desired to maintain a constant or near constant halogen concentration in the gas mixture. Means for releasing some of the gas mixture is also typically provided so that the gas pressure can be controlled and to expel contaminated gases. - Above, various components of a pulsed gas discharge laser such as an excimer or molecular laser have been discussed with respect to their design and arrangement within the electrode chamber. The design and placement of the electrode chamber itself relative to the
gas vessel 11, the placement of the peaking capacitors Cp, and the insulation of thehigh voltage electrode 2 are further considerations in effective discharge unit design. Examples of laser designs are illustrated in cross-sectional views at the FIGS. 4a and 4 b. - The discharge unit illustrated at FIG. 4a includes a dielectric frame or one or two or more dielectric insulators 28 (see Industrial Excimer Lasers: Fundamentals, Technolgy and Maintenance, Dirk Basting, Ed., 2nd edition (1991); Litho laser tube of Lambda Physik, GmbH). Each
dielectric insulator 28 is mechanically connected to thegas vessel 11 that is connected to thegrounded discharge electrode 4. The dielectric frame or insulator(s) 28 electrically isolate thehigh voltage electrode 2. That is, the roof 31 connected to thehigh voltage electrode 2 is insulated from the groundedmain electrode 4 by the dielectric insulator(s) 28. - Where the electrode chamber, e.g., as shown in FIG. 4a, meets the
gas vessel 11, anarrangement 30 of conducting ribs are connected electrically to the groundedelectrode 4. Therib arrangement 30 of the discharge unit includes severalrectangular ribs 32 separated by openings to permit gas flow from thegas vessel 11 into the electrode chamber and into thedischarge area 6. The relationship between therectangular ribs 32 and the opening separating them are illustrated at Fig. Theribs 32 serve as low inductive current conductors in the discharge circuitry. A lower inductivity of the discharge electrical current loop is advantageous as better matching may be provided between the wave impedance of the electrical discharge loop and the gas discharge impedance. - The discharge unit of FIG. 4a advantageously allows the discharge loop to exhibit a characteristically low inductivity. However, the gas flow through the
discharge area 6, and especially near the groundedelectrode 4, has a high curvature producing turbulences that complicate the gas exchange in thedischarge area 6. - Another consideration arises with respect to the nearly rectangular interior shape of the electrode chamber. Powerful and symmetric energy dissipation in the
gas discharge area 6, particularly when the system is operating at a high repetition rate, can lead to acoustical resonances and amplification of the level of standing acoustical waves. Modulation of the gas density by the acoustical disturbances can have an adverse influence on the uniformity of the gas discharge and ultimately on significant laser output parameters. - One way to reduce the level of these acoustical disturbances is to introduce acoustical dampers into the field of the acoustical waves. These dampers may be used as obstacles for the acoustical waves. However, the dampers can also have an adverse influence on the uniformity of the gas flow. In addition, the dampers would have large surface areas which are subject to attack by aggressive halogens in the gas mixture.
- FIG. 4b shows an alternative discharge unit design to that illustrated at FIG. 4a (see U.S. Pat. Nos. 4,891,818 to Levatter and 5,771,258 to Morton et al.). A
dielectric insulator plate 33 separates the high voltage electrode from the metal walls of the electrode chamber. Themain electrodes gas flow vessel 11. Electrical current return bars similar to therectangular ribs 32 of the arrangement of FIG. 4a may once again cross the gas flow and shorten the discharge loop from the groundeddischarge electrode 4 to the walls of the laser tube. The gas exchange conditions are improved over those discussed above with respect to the arrangement of FIG. 4a. - The improved gas exchange conditions provided by the arrangement of FIG. 4b are advantageous because satisfactory laser operation may be achieved at lower gas flow rates, and strong and uniform gas flow permits satisfactory operation at higher repetition rates (see U.S. Pat. No. 5,247,534 to Muller-Horsche, assigned to the same assignee as the present invention, and hereby incorporated by reference). However, the connection of the
high voltage electrode 2 via thedielectric plate 33 implies the use of a plurality ofconcentrated feedthroughs 34. This gives rise to an undesirably higher inductivity of the electrical discharge current loop. - FIG. 4f shows an alternative design. The
insulators 128 shown in FIG. 4f conform with the gas flow. - Another consideration of discharge unit design is the
main electrodes main electrodes discharge area 6 and the width of thedischarge area 6. - In line narrowed lasers, used as illuminating sources for microlithography, some additional considerations amplify the desirability of minimizing the discharge width. One of these is the design of the resonator assembly. The discharge width should be reduced to a value commensurate with the effective aperture size of the line narrowing resonator. For example, an effective aperture of a linewidth narrowing resonator might be on the order of 3 to 4 mm or less, and is typically around 2 mm. Thus, the discharge width should be comparable to or less than this 3 to 4 mm specification.
- A narrower discharge width is also more suitable for laser operation at higher repetition rates (e.g., 1 kHz or more). Yet another advantage to having a narrow discharge width is that the exchange of gases in the discharge area is simplified.
- In combination with design considerations involving the static field and discharge width parameters as discussed above, the
electrodes electrodes - Typical approaches usually propose the
electrodes electrodes electrodes electrode - The outer portions of the
electrodes discharge area 6. The fact that the outer portions of theelectrodes electrodes electrodes -
- Another technique disclosed in the '629 and '233 patents is shown in FIG. 5. In the design shown in FIG. 5, additional “easing”
electrodes 36 are positioned on either side of themain discharge electrodes - It is an object of the present invention to provide an efficient discharge unit for line narrowed excimer or molecular fluorine lasers, operating at high repetition rates, such as are used as illumination sources in microlithography applications.
- It is also an object of the invention to provide a discharge unit wherein the discharge circuit design including the placement of peaking capacitors Cp exhibits a low inductivity.
- It is a further object of the invention to provide a discharge unit wherein gas flow conditions are optimized such that the laser gas may flow rapidly and uniformly through the discharge area between the main electrodes.
- In accord with the above objects, in a first aspect of the present invention, an electrode chamber of a laser for an excimer or molecular fluorine laser is connected with a gas flow vessel, and includes a pair of elongated main electrodes separated by a discharge area, and a preionization unit. The electrode chamber also includes a spoiler integrated with the chamber and spaced from each of the main electrodes. The spoiler is shaped to provide an aerodynamic gas flow through the discharge area. A spoiler unit may include a pair of opposed spoiler elements each integrated with the chamber on either side of the discharge area, wherein each spoiler element is spaced from the main discharge electrodes and shaped to provide an aerodynamic gas flow through the discharge area.
- Also in accord with the objects of the invention, in a second aspect of the present invention, a laser for an excimer or molecular fluorine laser is provided including an electrode chamber having a pair of elongated main electrodes separated by a discharge area, and a preionization unit. In the electrode chamber, at least one main electrode includes a base portion and a center portion which may be a nipple protruding from the base portion. The nipple substantially carries the periodic discharge current such that the discharge width is reduced to the width of the nipple which may be significantly less than the discharge width which would be provided by an electrode comprising only the base portion. The curvature of the base portion may be similar to the curvature of gas flow through the discharge chamber to improve aerodynamic performance.
- In a third aspect of the present invention, an electrode chamber of a discharge unit for an excimer or molecular fluorine laser in accord with the above objects is connected with a gas flow vessel and includes a pair of main electrodes and a preionization unit. A plurality of ribs connected to one of the main electrodes cross the gas flow preferably between the electrode chamber and the gas flow vessel. The ribs are separated by openings to permit gas flow and shaped to provide an aerodynamic flow of gases through the openings. The shape of the ribs provides a smooth and uniform gas flow between the gas flow vessel and the electrode chamber and thus a reduced aerodynamic resistance for the blower over conventional conducting ribs. The ribs preferably have widths which smoothly taper from the end which meets the gas flow to the opposite end. The ribs may be rounded and each end may have a different radius of curvature.
- In a fourth aspect of the invention, an electrode chamber of a laser for an excimer or molecular laser is connected with a gas flow vessel, and includes a pair of elongated main electrodes separated by a discharge area, and a preionization unit. The electrode chamber includes a spoiler spaced from each of the main electrodes and positioned near a preionization electrode to thereby shield the preionization electrode from one of the main electrodes. The spoiler is also shaped to provide an aerodynamic gas flow through the discharge area. A spoiler unit may include a pair of opposed spoiler elements each positioned electrode on either side of the discharge area to shield one of two or more preionization electrodes from a main electrode, wherein each spoiler element is spaced from the main discharge electrodes and shaped to provide an aerodynamic gas flow through the discharge area.
- In a fifth aspect of the invention, an electrode chamber of a laser for an excimer or molecular laser is connected with a gas flow vessel, and includes a pair of elongated main electrodes separated by a discharge area, and a preionization unit. The electrode chamber includes a spoiler shaped to reflect acoustical waves emanating from the discharge area into the gas flow. The spoiler is also shaped to provide an aerodynamic gas flow through the discharge area. A spoiler unit may include a pair of opposed spoiler elements positioned on either side of the discharge area shaped to reflect acoustical waves emanating from the discharge area into the gas flow vessel, wherein each spoiler element is shaped to provide an aerodynamic gas flow through the discharge area.
- Combinations of two or more of the features described above and below are also anticipated in the present invention. For example, a discharge chamber in accord with one, more than one or all three of the above aspects would be in accord with the present invention.
- FIG. 1 illustrates in a cross sectional view an electrode chamber of a typical discharge unit design and electrode configuration.
- FIG. 2a illustrates in a cross section view a laser having an exemplary UV corona preionization unit design.
- FIG. 2b illustrates in a cross sectional view a laser having an exemplary UV spark preionization unit design.
- FIG. 3 illustrates in a cross sectional view a laser tube including an electrode chamber connected with a gas flow vessel.
- FIG. 4a illustrates in a cross section view a laser tube including an electrode chamber and a gas flow vessel, wherein the high voltage electrode is insulated by a dielectric insulator, and the discharge area is adjacent to the gas flow vessel.
- FIG. 4b illustrates in a cross sectional view a laser tube including an electrode chamber and a gas flow vessel, wherein the high voltage electrode is insulated by a dielectric plate, and the discharge area is immersed in the gas flow vessel.
- FIG. 4c illustrates in a top view low inductivity ribs crossing the gas flow and separated by openings to permit gas flow.
- FIG. 4d illustrates a cross sectional side view of the ribs of FIG. 4c separated by openings through which gas enters the electrode chamber from the gas flow vessel.
- FIG. 4e illustrates a cross sectional side view of the ribs of FIG. 4c separated by openings through which gas exits the discharge chamber and flows back into the gas flow vessel.
- FIG. 5 illustrates a gas discharge electrode arrangement of the prior art including a pair of easing electrodes around each main discharge electrode.
- FIG. 6 illustrates a laser having an electrode chamber in accord with first, fourth and fifth aspects of the present invention.
- FIG. 7a illustrates a laser having an electrode chamber in accord with a second aspect of the present invention.
- FIG. 7b illustrates a laser having an alternative electrode chamber in accord with the second aspect of the present invention.
- FIG. 8 illustrates a laser having another alternative electrode chamber in accord with the second aspect of the present invention.
- FIG. 9a illustrates a laser tube is accord with a third aspect of the present invention.
- FIG. 9b shows a cross sectional view of the ribs crossing the gas flow of the laser tube of FIG. 9a where the gas flows into the electrode chamber from the gas flow vessel, wherein the ribs are separated by openings to permit the gas flow and shaped to provide aerodynamic gas flow and the ribs further serve as low inductivity current return bars.
- FIG. 9c shows a cross sectional view of the ribs crossing the gas flow of FIG. 9a separated by openings to permit gas flow from the electrode chamber back into the gas flow vessel, wherein the ribs are aerodynamically shaped and separated by openings through which gas exits the electrode chamber and flows back into the gas flow vessel.
- FIG. 10 illustrates a laser having an electrode chamber configuration in accord with an alternative embodiment of the present invention.
- FIG. 6 shows an aerodynamic discharge unit in accord with a first aspect of the present invention. The discharge unit of FIG. 6 includes a pair of
main electrodes discharge area 6 and connected with a set of peaking capacitors Cp. A pair ofpreionization units 10 are also shown and preferred. There may be only a single preionization unit or more than two. Preferred preionization units are described at U.S. patent application Ser. Nos. 09/247,887, 60/160,182 and 60/162,845, each of which is assigned to the same assignee, and at U.S. Pat. Nos. 5,337,330 and 5,719,896, all of which are hereby incorporated by reference. - The discharge unit includes one or more
dielectric insulators 38 preferably having a similar design as thedielectric insulators 28 discussed above with respect to FIG. 4a. Thedielectric insulators 38 of the preferred embodiment may also be curved, e.g., to provide a more aerodynamic electrode chamber. Theinsulators 38 may also be straight, but tilted such as to form a trapezoidally shaped electrode chamber (see FIG. 10, below). - In contrast with FIG. 4a, a pair of
preferred spoilers 40 in accord with the present invention are shown in FIG. 6. Thespoilers 40 are preferably integrated with the chamber at the dielectric insulators on either side of thedischarge area 6. Thespoilers 40 may be integrated parts of a single unit, single material dielectric assembly with theinsulators 38, or they may comprise different materials suited each to their particular functions. That is, thespoilers 40 and thedielecric insulators 38 may be formed together to provide an aerodynamic electrode chamber for improved gas flow uniformity and in accord with other features of the spoilers to be described below. Alternatively, thespoilers 40 may be attached to the insulatingmembers 38. - The
spoilers 40 are shaped and positioned for aerodynamic and uniform gas flow as the gas flows through the electrode chamber from the gas flow vessel 11 (partially shown), through thedischarge area 6 and back into thegas flow vessel 11. Preferably, thespoilers 40 are symmetric in accord with a symmetric discharge chamber design. - One
end 42 of each of thespoilers 40 is preferably positioned to shield apreionization unit 10 from themain electrode 4, and is shown in FIG. 6 extending underneath one of thepre-ionization units 10 between thepreionization unit 10 and themain electrode 4. These ends 42 of thespoilers 40 are preferably positioned close to thepreionization units 10. For example, the ends 42 may be just a few millimeters from thepreionization units 10. By shielding thepreionization units 10 from themain electrode 4, arcing or dielectric breakdown between thepreionization units 10 and themain electrode 4 is prevented. - The
spoilers 40 serve to remove gas turbulence zones present in conventional discharge unit electrode chambers which occur due to the sharp curvature of the gas flow in the vicinity of thepreionization units 10 and of the groundeddischarge electrode 4. - Another advantageous function of the
spoilers 40 according to the present invention is to reduce the level of acoustical disturbances within the discharge chamber. Thespoilers 40 serve as “mirrors” to reflect the acoustical disturbances into the gas flow vessel 11 (partially shown here). Thus, shock waves propagating outwardly from thedischarge area 6 impinge upon the oblique surfaces 44 of thespoilers 40 and reflect into thegas flow vessel 11. Referring back to FIG. 3, internal components of thegas flow vessel 11, such as theheat exchanger 14 and theblower 12, then efficiently damp the acoustical waves. - This additional function of the
spoilers 40 in accord with the present invention reduces the level of the acoustical disturbances discussed above with respect to the electrode chamber of FIG. 4a. Thus, additional acoustical dampers are not used and the adverse impact on gas flow uniformity of using conventional dampers is avoided. - FIG. 7a illustrates a second aspect of the present invention relating to the shape of the
main discharge electrodes discharge electrodes discharge area 50. In accord with the preferred embodiment which incorporates the second aspect of the present invention, at least one, and preferably both, of theelectrodes center portion 52, substantially carries the discharge current and provides a uniform and narrow gas discharge width. The other region, orbase portion 54, in collaboration with other conductive and dielectric elements within the discharge chamber, as discussed above, creates preferred electrical field conditions in and around thedischarge area 50 and also contributes to the smoothness and uniformity of the gas flow in the vicinity of thedischarge electrodes - The
center portion 52 andbase portion 54 preferably form anelectrode 46 having a single unit construction, and composed of a single material. The center andbase portions center portion 52 and thebase portion 54 come together at a discontinuity or irregularity in the shape of theelectrodes center portions 52. - The
center portion 52 is shaped to provide a uniform gas discharge having a narrow width. The shape of apreferred center portion 52 is described by the formula: - [x/a] m +[y/b] n=1, where m+n≧5. (1)
- Experiments performed using
electrodes center portions 52 having m=n=2 (see U.S. Pat. Nos. 5,557,629 and 5,535,233, above). - More specific details of the
preferred electrodes base portions 54 of themain electrodes center portions 52 have a shape preferably as follows: - [x/1]3 +[y/0.85]3=1,
high voltage electrode 46, (2) - [x/a] m +[y/b] n=1,
ground electrode 48, where (3) - where x and y are in millimeters, y is in the direction of the interelectrode gap, x is orthogonal to y and is in the plane of the cross section of the discharge chamber shown in FIG. 7, m is preferably between 0.5 and 3, n is preferably between 8 and 13, a is preferably between 0.5 and 1.5, and b is preferably between 0.2 and 0.8. The parameters of the shape of the
center portion 52 of thehigh voltage electrode 46 may be in a range around the specific values given above. Qualitatively speaking, thecenter portions 52 have a reduced curvature at their tips than those described above having m=n=2. - The
base portions 54 have smooth, regular shapes. Thecenter portions 52 are positioned between thebase portions 54 and thedischarge area 50. As discussed above, thebase portions 54 are shaped to provide a desired electric field distribution in and around thedischarge area 50. In addition and in combination with the shape and positioning of thedielectric spoilers 40 and thepreionization units 10, thebase portions 54 of theelectrodes base portions base portions 54 of theelectrodes discharge area 50, i.e., thebase portions 54 each curve away from thedischarge area 50 away from thecenter portion 52. - FIG. 7b shows profiles of
preferred center portions 52. Inplot 1, m+n=5 and inplot 2, m+n=12. FIG. 7c shows half profiles of the preferred center portions of FIG. 7b. - An alternative configuration in accord with the second aspect of the present invention is shown in FIG. 7d. The discharge chamber of FIG. 7d is preferably the same as that shown and described with respect to FIG. 7a, except that the
base portion 58 of the high voltagemain electrode 56 of FIG. 7d has opposite curvature to thebase portion 54 of theelectrode 46 shown in FIG. 7a. That is, thebase portion 58 of theelectrode 56 curves toward thedischarge area 60 away from itscorresponding center portion 52, while thebase portion 54 of theelectrode 48 curves away from thedischarge area 60 away from itscorresponding center portion 52. The alternative configuration shown in FIG. 7d provides an even more aerodynamic channel for gas flow through thedischarge area 60. - FIG. 8 illustrates another alternative configuration of the main electrodes in accord with the second aspect of the present invention. The
electrodes electrodes - FIGS. 9a-9 c illustrate a third aspect of the present invention. As discussed above, the
dielectric insulators 38 of the electrode chamber isolate the high voltagemain electrode 46. The gas flow is crossed by afirst rib configuration 62 a where the gas flow enters the electrode chamber from thegas flow vessel 11 and by asecond rib configuration 62 b where the gas flow exits the electrode chamber and returns the gas back into thegas flow vessel 11. Theribs gas flow vessel 11. The ribs are preferably rigid and conducting, and are connected to the groundedmain discharge electrode 48 to provide a low inductivity current return path. The conductingribs 64 a of therib configuration 62 a are preferably substantially shaped as shown in FIG. 9b. The conductingribs 64 b of therib configuration 62 b are preferably substantially shaped as shown in FIG. 9c. Theribs rib configurations ribs 32 shown in cross-section in FIGS. 4d and 4 e are rectangularly shaped. - FIG. 9b is a cross sectional view of the
rib configuration 62 a through which the laser gas enters the electrode chamber from thegas flow vessel 11. Theribs 64 a of therib configuration 62 a each have awide end 66 a which meets the laser gas as it flows from thegas flow vessel 11, and anarrow end 68 a past which the laser gas flows as it enters the discharge chamber. Preferably, theribs 64 a are smoothly tapered, e.g., like an airplane wing, from the wide,upstream end 66 a to the narrow,downstream end 68 a to improve gas flow past therib configuration 62 a. - FIG. 9c is a cross sectional view of the
rib configuration 62 b through which the laser gas exits the electrode chamber and flows back into thegas flow vessel 11. Theribs 64 b of therib configuration 62 b each have awide end 66 b which meets the laser gas as it flows from the electrode chamber, and anarrow end 68 b past which the laser gas flows as it enters thegas flow vessel 11. . Preferably, theribs 64 b are smoothly tapered, e.g., like an airplane wing, from the wide,upstream end 66 b to the narrow,downstream end 68 b to improve gas flow past therib configuration 62 b. - The
aerodynamic ribs rectangular ribs 32 of FIGS. 4d and 4 e. Theribs conventional ribs 32 into theribs - FIG. 10 illustrates an electrode chamber in accord with an alternative embodiment of the present invention. The laser tube shown includes an electrode chamber and a
gas vessel 11. The electrode chamber has a pair ofmain electrodes discharge area 6, and one or more (two are shown)preionization electrodes 10. Theelectrodes return rib configurations gas flow vessel 11 has ablower 12 andheat exchanger 14 also as described above. - The high voltage
main electrode 2 is isolated by adielectric frame 128 that differs from that discussed above. Theframe 128 has opposing walls inclined toward each other near theelectrode 2 which is furthest from thegas flow vessel 11. That is, the frame does not form a rectangular electrode chamber such as that shown in FIG. 4a. Neither is the electrode chamber sunk into thegas flow vessel 11 like that shown in FIG. 4b. Instead, theframe 128 shown is configured such that the electrode chamber forms a trapezoidal shape. - The shape of the
dielectric frame 128 is advantageous because in addition to isolating themain electrode 2, theframe 128 provides a more uniform flow of the gas mixture through thedischarge area 6. In addition, acoustic waves generated in the discharge area are reflected from theframe 128 and into thegas flow vessel 11, where the acoustic waves are preferably absorbed by thegas flow components frame 128 may be configured to absorb some of the acoustic waves, as well. - Although not shown, spoilers may be added similar to those shown and described at FIG. 6. The spoilers may be integrated with the
frame 128. The spoilers may be shaped to provide a still more uniform gas flow, and to inhibit dielectric breakdown between the preionization unit(s) 10 and themain electrode 4. The spoilers may also serve to further dampen and/or reflect acoustic waves emanating from thedischarge area 6. - It is anticipated that a discharge chamber in accord with the preferred or alternative embodiments and any of the aspects described above in accord with the present invention will be particularly advantageous for use with an excimer or molecular fluorine laser. For example, a KrF laser would have a gas mixture including Kr, F2 and Ne and optionally a Xe or Ar additive. An ArF laser would have a gas mixture of Ar, F2 and Ne and/or He, and optionally a Xe or Kr additive. A F2 laser would a gas mixture of F2 and Ne and/or He. A XeCl, XeF or KrCl laser would also benefit with the advantages described above. Preferred gas mixtures and gas control techniques are described at U.S. patent application Ser. Nos. 60/124,785, 09/418,052, 60/159,525, 09/379,034, 60/160,126, 09/317,526, and 60/127,062, and U.S. Pat. Nos. 4,393,505, 5,396,514 and 4,977,563, each of which is a assigned to the same assignee as the present application, and U.S. Pat. No. 5,978,406, all of which are hereby incorporated herein by reference.
- The specific embodiments described in the specification, drawings, summary of the invention and abstract of the disclosure are not intended to limit the scope of any of the claims, but are only meant to provide illustrative examples of the invention to which the claims are drawn. The scope of the present invention is understood to be encompassed by the language of the claims, and structural and functional equivalents thereof.
Claims (7)
Priority Applications (1)
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US09/826,296 US6414978B2 (en) | 1999-04-07 | 2001-04-03 | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
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Application Number | Priority Date | Filing Date | Title |
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US12822799P | 1999-04-07 | 1999-04-07 | |
US09/453,670 US6466599B1 (en) | 1999-04-07 | 1999-12-03 | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
US09/826,296 US6414978B2 (en) | 1999-04-07 | 2001-04-03 | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
Related Parent Applications (1)
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US09/453,670 Division US6466599B1 (en) | 1998-06-04 | 1999-12-03 | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
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US20010030986A1 true US20010030986A1 (en) | 2001-10-18 |
US6414978B2 US6414978B2 (en) | 2002-07-02 |
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US09/453,670 Expired - Lifetime US6466599B1 (en) | 1998-06-04 | 1999-12-03 | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
US09/826,372 Expired - Lifetime US6430205B2 (en) | 1999-04-07 | 2001-04-03 | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
US09/826,301 Expired - Lifetime US6556609B2 (en) | 1999-04-07 | 2001-04-03 | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
US09/826,296 Expired - Lifetime US6414978B2 (en) | 1999-04-07 | 2001-04-03 | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
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US09/453,670 Expired - Lifetime US6466599B1 (en) | 1998-06-04 | 1999-12-03 | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
US09/826,372 Expired - Lifetime US6430205B2 (en) | 1999-04-07 | 2001-04-03 | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
US09/826,301 Expired - Lifetime US6556609B2 (en) | 1999-04-07 | 2001-04-03 | Discharge unit for a high repetition rate excimer or molecular fluorine laser |
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JP (1) | JP2000315831A (en) |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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US6901422B1 (en) | 2001-03-21 | 2005-05-31 | Apple Computer, Inc. | Matrix multiplication in a vector processing system |
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CN103682954B (en) * | 2012-09-12 | 2016-04-06 | 中国科学院光电研究院 | A kind of new gas discharge cavity |
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RU2589471C1 (en) * | 2014-12-22 | 2016-07-10 | Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" | Method of forming spatial charge in pulse-periodic gas laser and device therefor |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4005374A (en) | 1975-03-31 | 1977-01-25 | Xonics, Inc. | Pulsed gas laser with low-inductance flow-through electrodes |
JPS61116889A (en) | 1984-11-13 | 1986-06-04 | Mitsubishi Electric Corp | Discharge excitation short pulse laser device |
US4686682A (en) | 1984-10-09 | 1987-08-11 | Mitsubishi Denki Kabushiki Kaisha | Discharge excitation type short pulse laser device |
JPS636886A (en) | 1986-06-27 | 1988-01-12 | Nec Corp | Lateral excitation type laser apparatus |
US4891818A (en) | 1987-08-31 | 1990-01-02 | Acculase, Inc. | Rare gas-halogen excimer laser |
GB8927209D0 (en) * | 1989-12-01 | 1990-01-31 | British Aerospace | Apparatus for controlling the composition of a laser gas or gas mixture |
JPH04218985A (en) * | 1990-07-06 | 1992-08-10 | Mitsubishi Electric Corp | Excimer laser device |
DE4113241C2 (en) | 1991-04-23 | 1994-08-11 | Lambda Physik Forschung | Pulsed gas discharge laser |
US5239553A (en) * | 1991-04-23 | 1993-08-24 | Matsushita Electric Industrial Co., Ltd. | Discharge-pumped gas laser with baffle partition for controlled laser gas flow at preionizers |
US5255282A (en) * | 1991-11-25 | 1993-10-19 | Quantametrics Inc. | Open waveguide excimer laser |
TW210357B (en) * | 1992-03-06 | 1993-08-01 | Daido Steel Co Ltd | |
US5557629A (en) | 1992-08-28 | 1996-09-17 | Kabushiki Kaisha Komatsu Seisakusho | Laser device having an electrode with auxiliary conductor members |
US5377215A (en) | 1992-11-13 | 1994-12-27 | Cymer Laser Technologies | Excimer laser |
DE4401892C2 (en) | 1994-01-24 | 1999-06-02 | Lambda Physik Forschung | Electrode for a gas discharge laser and method for forming an electrode for a gas discharge laser |
JP3874123B2 (en) | 1996-03-07 | 2007-01-31 | キヤノン株式会社 | Discharge electrode, excimer laser oscillation device and stepper |
US6183359B1 (en) | 1996-12-30 | 2001-02-06 | Larry R. Klein | Self opening flexible protective covering for heat registers |
US5771258A (en) | 1997-02-11 | 1998-06-23 | Cymer, Inc. | Aerodynamic chamber design for high pulse repetition rate excimer lasers |
US6128323A (en) * | 1997-04-23 | 2000-10-03 | Cymer, Inc. | Reliable modular production quality narrow-band high REP rate excimer laser |
US5978405A (en) | 1998-03-06 | 1999-11-02 | Cymer, Inc. | Laser chamber with minimized acoustic and shock wave disturbances |
US6061376A (en) * | 1998-08-28 | 2000-05-09 | Cymer, Inc. | Tangential fan for excimer laser |
US6212211B1 (en) | 1998-10-09 | 2001-04-03 | Cymer, Inc. | Shock wave dissipating laser chamber |
JP3428632B2 (en) | 1999-08-04 | 2003-07-22 | ウシオ電機株式会社 | Corona preionization electrode for gas laser equipment. |
JP3399517B2 (en) | 1999-12-08 | 2003-04-21 | ウシオ電機株式会社 | Gas laser device that emits ultraviolet light |
-
1999
- 1999-12-03 US US09/453,670 patent/US6466599B1/en not_active Expired - Lifetime
-
2000
- 2000-04-07 JP JP2000105895A patent/JP2000315831A/en active Pending
-
2001
- 2001-04-03 US US09/826,372 patent/US6430205B2/en not_active Expired - Lifetime
- 2001-04-03 US US09/826,301 patent/US6556609B2/en not_active Expired - Lifetime
- 2001-04-03 US US09/826,296 patent/US6414978B2/en not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
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US6414978B2 (en) | 2002-07-02 |
US20010050938A1 (en) | 2001-12-13 |
US6556609B2 (en) | 2003-04-29 |
US20010033594A1 (en) | 2001-10-25 |
US6430205B2 (en) | 2002-08-06 |
JP2000315831A (en) | 2000-11-14 |
US6466599B1 (en) | 2002-10-15 |
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