US20010003370A1 - High-frequency detecting elements and high-frequency heater using the same - Google Patents
High-frequency detecting elements and high-frequency heater using the same Download PDFInfo
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- US20010003370A1 US20010003370A1 US08/980,017 US98001797A US2001003370A1 US 20010003370 A1 US20010003370 A1 US 20010003370A1 US 98001797 A US98001797 A US 98001797A US 2001003370 A1 US2001003370 A1 US 2001003370A1
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- detecting element
- frequency detecting
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/6447—Method of operation or details of the microwave heating apparatus related to the use of detectors or sensors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/16—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements
- G01K7/22—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements the element being a non-linear resistance, e.g. thermistor
Definitions
- the present invention relates to a high-frequency detecting element and a high-frequency heater using the detecting element.
- a heater using high-frequency waves e.g., microwaves
- an object is heated mainly because water in the object absorbs the high-frequency waves.
- the object when it contains enough water, is properly heated, but the heating continues even after water in the object has completely evaporated.
- the methods discussed below are available to prevent the heating from continuing after completion of water evaporation so that the object is heated only to an appropriate temperature.
- the method disclosed in Japanese Published Unexamined Application No. 62-123226 uses a humidity sensor and an alcohol sensor.
- the humidity sensor and alcohol sensor are disposed in an exhaust duct and are used to sense water vapor and gas produced from an object in a heating chamber and exhausted from the chamber in order to select a particular cooking method.
- the method disclosed in Japanese Published Unexamined Application No. 5-172884 uses a microwave sensor and a temperature sensor.
- a bridge circuit comprising the microwave sensor and the temperature sensor, is disposed in a heating chamber.
- the microwave sensor is composed of a thermistor element for sensing the temperature of an electromagnetic-wave absorber as it heats up upon absorbing microwaves
- the temperature sensor is composed of an electromagnetic-wave reflector and a thermistor element.
- the electromagnetic-wave absorber and the electromagnetic-wave reflector face a heated object and the thermistor elements detect changes in the temperature of the electromagnetic-wave absorber and the electromagnetic-wave reflector during microwave heating.
- the method disclosed in Japanese Published Unexamined Application No. 60-170188 uses a thermistor. Water vapor and gas produced from a heated object in a heating chamber are detected with an absolute temperature sensor or a gas sensor to control an increase in heating chamber temperature due to a heater, using the thermistor to stop the heating operation.
- a first aspect of the present invention provides a high-frequency detecting element comprising semiconducting ceramic having positive resistance-temperature characteristics, i.e., electrical resistance increases with increased temperatures.
- a second aspect of the present invention provides a high-frequency detecting element comprising semiconducting ceramic with positive resistance-temperature characteristics, composed mainly of barium titanate.
- a third aspect of the present invention provides a high-frequency detecting element comprising semiconducting ceramic with positive resistance-temperature characteristics, on one main surface of which a pair of electrodes are formed.
- a fourth aspect of the present invention provides a high-frequency detecting element comprising semiconducting ceramic with positive resistance-temperature characteristics, the ceramic being 4 mm or less in thickness.
- a fifth aspect of the present invention provides a high-frequency detecting element comprising semiconducting ceramic with positive resistance-temperature characteristics, the ceramic having a Curie point of 150° or less.
- a sixth aspect of the present invention provides a high-frequency heater including a heating chamber, a high-frequency generating means for generating high-frequency waves in the heating chamber, and a high-frequency detecting element detecting the high-frequency waves generated in the heating chamber.
- a seventh aspect of the present invention provides a high-frequency heater whose high-frequency detecting element comprises semiconducting ceramic with positive resistance-temperature characteristics.
- a eighth aspect of the present invention provides high-frequency heater whose high-frequency detecting element is composed mainly of barium titanate.
- a ninth aspect of the present invention provides a high-frequency heater whose high-frequency detecting element comprises a semiconducting ceramic, on one main surface of which a pair of electrodes are formed.
- a tenth aspect of the present invention provides a high-frequency heater whose high-frequency detecting element comprises a semiconducting ceramic with positive resistance-temperature characteristics, which ceramic is 4 mm or less thick.
- a eleventh aspect of the present invention provides a high-frequency heater whose high-frequency detecting element comprises a semiconducting ceramic with a Curie point of 150° C. or less.
- a twelfth aspect of the present invention provides a high-frequency heater wherein a high-frequency detecting element is disposed so that the other main surface of semiconducting ceramic comprising the detecting element, on which surface no electrodes are formed, faces a heating chamber in which high-frequency waves are generated.
- a high-frequency detecting element of the present invention can be a semiconducting ceramic with positive resistance-temperature characteristics, composed mainly of barium titanate, which, when the high-frequency detecting element is exposed to high-frequency waves, generates heat and thus heats up the instant it absorbs the waves.
- a high-frequency heater of the present invention uses a high-frequency detecting element comprising a semiconducting ceramic with positive resistance-temperature characteristics and composed mainly of barium titanate, the detecting element detecting temperature under the same conditions as an object is heated with high-frequency waves, since the element is placed in a heating chamber containing the object.
- FIGS. 1 (A) and 1 (B) illustrate a high-frequency detecting element of the present invention, 1 (A) being a top view of the element, and 1 (B) being a side view of the element; and
- FIG. 2 is a cross-sectional view of a high-frequency heater of the present invention.
- FIGS. 1 (A) and 1 (B) are a top view of a thermistor with positive characteristics and a side view of a high-frequency detecting element.
- the high-frequency detecting element 4 comprises semiconducting ceramic 1 with positive resistance-temperature characteristics, composed mainly of barium titanate, on one main surface of which ceramic electrodes 2 a and 2 b , attached with leads 3 a and 3 b by soldering, are provided.
- the semiconducting ceramic 1 with positive resistance-temperature characteristics was prepared using the procedure below.
- Silver electrodes making an ohmic contact are formed on one main surface of the semiconducting ceramic. Leads are soldered to the electrodes to obtain a high-frequency detecting element.
- the amount of Sr contained in the semiconducting ceramic with positive resistance-temperature characteristics, x, and that of Pb contained in the semiconducting ceramic, y, are varied to change the Curie point in the range from ⁇ 20 to 200° C.
- FIG. 2 is a partially cross-sectional view of a high-frequency heater.
- the high-frequency heater 5 comprises a high-frequency detecting element 4 , high-frequency generating means 6 , and a heating chamber 7 .
- the high-frequency detecting element 4 is disposed so that a surface on which the electrodes 2 a and 2 b are not formed, faces inside the heating chamber 7 containing an object to be heated.
- water vapor from the object changes high-frequency output received by the high-frequency detecting element 4 . Due to the change in received high-frequency waves, the resistance of the detecting element changes.
- the rate of change in the resistance of the high-frequency detecting element 4 the heating condition of the object can be known.
- the rate of change in the resistance of the high-frequency detecting element 4 was measured when the output of high-frequency waves was changed by changing the amount of water 9 in a container 8 placed in the heating chamber 7 of the high-frequency heater 5 with the high-frequency generating means 6 producing 2450-MHz high-frequency waves.
- a time constant was obtained by measuring the time required for the resistance to be increased by 20% from the initial value after application of high-frequency waves to 50 ml of water in the container. The results are shown in Table 1.
- the time constant becomes one order of magnitude larger.
- An embodiment of the present invention can detect a high-frequency wave as a large resistance change, thus offering satisfactory high-frequency wave detection performance.
- a Curie point below 150° C. and a ceramic thickness of 4 mm or less cause good high-frequency detection characteristics, i.e., a large resistance change and a small time constant, to be offered.
- a high-frequency detecting element of the present invention comprises semiconducting ceramic with positive resistance-temperature characteristics, composed mainly of barium titanate.
- the semiconducting ceramic When the high-frequency detecting element is exposed to high-frequency waves, the semiconducting ceramic generates heat and thus heats up the instant it absorbs high-frequency waves, so that high-frequency waves can be detected with great precision and, with the time constant being small.
- one high-frequency detecting element can both absorb high-frequency waves and detect temperature, exhibiting a sharp response to high-frequency waves and correctly following temperature changes.
- a high-frequency heater of the present invention is positioned in a heating chamber containing a high-frequency detecting element, that is, the high-frequency heater is under the same conditions as an object to be heated, the temperature of the object can directly be measured.
- the high-frequency detecting element can both absorb high-frequency waves and detect temperature with a high sensitivity in a short time in response to heat, thus allowing proper temperature control to be exercised and a temperature detecting unit to be reduced in size.
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Electric Ovens (AREA)
- Control Of High-Frequency Heating Circuits (AREA)
- Measuring Temperature Or Quantity Of Heat (AREA)
- Radiation Pyrometers (AREA)
- Thermistors And Varistors (AREA)
- Compositions Of Oxide Ceramics (AREA)
Abstract
A high-frequency detecting element that can detect a temperature increase in an instant due to high-frequency wave absorption using semiconducting ceramic with positive resistance-temperature characteristics. The ceramic is composed mainly of barium titanate. A high-frequency heater incorporating the high-frequency detecting element is also disclosed. In the high-frequency detecting element, electrodes are provided on one main surface of semiconducting ceramic 1 with positive resistance-temperature characteristics and leads 3 a and 3 b are soldered to the electrodes 2 a and 2 b.
Description
- The present invention relates to a high-frequency detecting element and a high-frequency heater using the detecting element.
- In a heater using high-frequency waves (e.g., microwaves), an object is heated mainly because water in the object absorbs the high-frequency waves. The object, when it contains enough water, is properly heated, but the heating continues even after water in the object has completely evaporated. The methods discussed below are available to prevent the heating from continuing after completion of water evaporation so that the object is heated only to an appropriate temperature.
- The method disclosed in Japanese Published Unexamined Application No. 62-123226 uses a humidity sensor and an alcohol sensor. The humidity sensor and alcohol sensor are disposed in an exhaust duct and are used to sense water vapor and gas produced from an object in a heating chamber and exhausted from the chamber in order to select a particular cooking method.
- The method disclosed in Japanese Published Unexamined Application No. 5-172884 uses a microwave sensor and a temperature sensor. A bridge circuit, comprising the microwave sensor and the temperature sensor, is disposed in a heating chamber. The microwave sensor is composed of a thermistor element for sensing the temperature of an electromagnetic-wave absorber as it heats up upon absorbing microwaves, and the temperature sensor is composed of an electromagnetic-wave reflector and a thermistor element. The electromagnetic-wave absorber and the electromagnetic-wave reflector face a heated object and the thermistor elements detect changes in the temperature of the electromagnetic-wave absorber and the electromagnetic-wave reflector during microwave heating.
- The method disclosed in Japanese Published Unexamined Application No. 60-170188 uses a thermistor. Water vapor and gas produced from a heated object in a heating chamber are detected with an absolute temperature sensor or a gas sensor to control an increase in heating chamber temperature due to a heater, using the thermistor to stop the heating operation.
- However, all of these methods suffer problems. The method disclosed in Japanese Published Unexamined Application No. 62-123226 has a problem of temperature sensor performance deteriorating due to soiling. The method disclosed in Japanese Published Unexamined Application No. 5-172884 has a problem of the thermistor is slow in responding to an increase in the temperature. The method disclosed in Japanese Published Unexamined Application No. 60-170188 has a problem of a reduction in accuracy due to indirect measurement of the temperature of a heated object.
- It is an object of the present invention to provide both a high-frequency detecting element that can detect a temperature increase in an instant due to high-frequency wave absorption and a high-frequency heater using the detecting element.
- A first aspect of the present invention provides a high-frequency detecting element comprising semiconducting ceramic having positive resistance-temperature characteristics, i.e., electrical resistance increases with increased temperatures.
- A second aspect of the present invention provides a high-frequency detecting element comprising semiconducting ceramic with positive resistance-temperature characteristics, composed mainly of barium titanate.
- A third aspect of the present invention provides a high-frequency detecting element comprising semiconducting ceramic with positive resistance-temperature characteristics, on one main surface of which a pair of electrodes are formed.
- A fourth aspect of the present invention provides a high-frequency detecting element comprising semiconducting ceramic with positive resistance-temperature characteristics, the ceramic being 4 mm or less in thickness.
- A fifth aspect of the present invention provides a high-frequency detecting element comprising semiconducting ceramic with positive resistance-temperature characteristics, the ceramic having a Curie point of 150° or less.
- A sixth aspect of the present invention provides a high-frequency heater including a heating chamber, a high-frequency generating means for generating high-frequency waves in the heating chamber, and a high-frequency detecting element detecting the high-frequency waves generated in the heating chamber.
- A seventh aspect of the present invention provides a high-frequency heater whose high-frequency detecting element comprises semiconducting ceramic with positive resistance-temperature characteristics.
- A eighth aspect of the present invention provides high-frequency heater whose high-frequency detecting element is composed mainly of barium titanate.
- A ninth aspect of the present invention provides a high-frequency heater whose high-frequency detecting element comprises a semiconducting ceramic, on one main surface of which a pair of electrodes are formed.
- A tenth aspect of the present invention provides a high-frequency heater whose high-frequency detecting element comprises a semiconducting ceramic with positive resistance-temperature characteristics, which ceramic is 4 mm or less thick.
- A eleventh aspect of the present invention provides a high-frequency heater whose high-frequency detecting element comprises a semiconducting ceramic with a Curie point of 150° C. or less.
- A twelfth aspect of the present invention provides a high-frequency heater wherein a high-frequency detecting element is disposed so that the other main surface of semiconducting ceramic comprising the detecting element, on which surface no electrodes are formed, faces a heating chamber in which high-frequency waves are generated.
- A high-frequency detecting element of the present invention can be a semiconducting ceramic with positive resistance-temperature characteristics, composed mainly of barium titanate, which, when the high-frequency detecting element is exposed to high-frequency waves, generates heat and thus heats up the instant it absorbs the waves.
- A high-frequency heater of the present invention uses a high-frequency detecting element comprising a semiconducting ceramic with positive resistance-temperature characteristics and composed mainly of barium titanate, the detecting element detecting temperature under the same conditions as an object is heated with high-frequency waves, since the element is placed in a heating chamber containing the object.
- The present invention will now be described by way of exemplary embodiments with reference to the accompanying drawings in which:
- FIGS.1(A) and 1(B) illustrate a high-frequency detecting element of the present invention, 1(A) being a top view of the element, and 1(B) being a side view of the element; and
- FIG. 2 is a cross-sectional view of a high-frequency heater of the present invention.
- FIGS.1(A) and 1(B) are a top view of a thermistor with positive characteristics and a side view of a high-frequency detecting element. The high-
frequency detecting element 4 comprises semiconducting ceramic 1 with positive resistance-temperature characteristics, composed mainly of barium titanate, on one main surface of whichceramic electrodes 2 a and 2 b, attached withleads - The semiconducting ceramic1 with positive resistance-temperature characteristics was prepared using the procedure below.
- Measured is such an amount of barium carbonate, strontium carbonate, lead monoxide, lanthanum oxide, titanium oxide, silicon dioxide, and manganese monoxide that semiconducting ceramic of the composition 0.9798(Ba0.997-x-ySrxPbyLa0.003)1.01TiO3—0.02SiO2—0.0002Mn is obtained after a mixture of those substances is calcined. The substances measured are mixed together with pure water and milled with zirconia balls for five hours and incompletely calcined at 1000° C. for two hours. The resulting powder is mixed with an organic binder, pressed in dry condition, and calcined at 1400° C. for two hours to obtain rectangular semiconducting ceramic of 5 mm×5 mm×1 to 5 mm size.
- Silver electrodes making an ohmic contact are formed on one main surface of the semiconducting ceramic. Leads are soldered to the electrodes to obtain a high-frequency detecting element.
- The amount of Sr contained in the semiconducting ceramic with positive resistance-temperature characteristics, x, and that of Pb contained in the semiconducting ceramic, y, are varied to change the Curie point in the range from −20 to 200° C.
- FIG. 2 is a partially cross-sectional view of a high-frequency heater. The high-frequency heater5 comprises a high-
frequency detecting element 4, high-frequency generating means 6, and aheating chamber 7. The high-frequency detecting element 4 is disposed so that a surface on which theelectrodes 2 a and 2 b are not formed, faces inside theheating chamber 7 containing an object to be heated. When high-frequency waves are produced with the high-frequency generating means 6 to heat the object in theheating chamber 7, water vapor from the object changes high-frequency output received by the high-frequency detecting element 4. Due to the change in received high-frequency waves, the resistance of the detecting element changes. The rate of change in the resistance of the high-frequency detecting element 4, the heating condition of the object can be known. - To evaluate the high-
frequency detecting element 4, the rate of change in the resistance of the high-frequency detecting element 4 was measured when the output of high-frequency waves was changed by changing the amount ofwater 9 in a container 8 placed in theheating chamber 7 of the high-frequency heater 5 with the high-frequency generating means 6 producing 2450-MHz high-frequency waves. A time constant was obtained by measuring the time required for the resistance to be increased by 20% from the initial value after application of high-frequency waves to 50 ml of water in the container. The results are shown in Table 1.TABLE 1 Percentage of resistance change one minute after high-frequency wave Curie Element output started (%) Time Sample point thickness 50 ml of 100 ml of 200 ml of constant No. (° C.) (mm) water water water (sec.) 1 20 1.0 3.8 2.7 1.9 1.5 2 10 1.0 3.5 2.8 1.9 1.5 3 40 1.0 3.3 2.8 1.9 1.7 4 70 1.0 3.1 2.6 1.7 2.0 5 100 1.0 3.0 2.5 1.6 3.2 6 150 1.0 2.5 1.9 1.4 5.0 7 180 1.0 1.8 1.5 1.2 13 8 200 1.0 1.4 1.2 1.0 25 9 40 2.0 3.3 2.7 2.2 2.1 10 40 3.0 3.1 2.5 1.9 3.5 11 40 4.0 2.9 2.2 1.7 6.5 12 40 5.0 2.5 1.9 1.5 11 - If the ceramic thickness exceeds 4 mm or the Curie point exceeds 150° C., the time constant becomes one order of magnitude larger.
- When, for comparison purposes, a ferrite wave reflector with which a thermistor having negative characteristics was brought into contact according to Published Unexamined Application No. 5-172884 was tested in the same way as described above, it took about 10 seconds for the initial resistance of the thermistor to change by 20%.
- An embodiment of the present invention can detect a high-frequency wave as a large resistance change, thus offering satisfactory high-frequency wave detection performance.
- In particular, a Curie point below 150° C. and a ceramic thickness of 4 mm or less cause good high-frequency detection characteristics, i.e., a large resistance change and a small time constant, to be offered.
- A high-frequency detecting element of the present invention comprises semiconducting ceramic with positive resistance-temperature characteristics, composed mainly of barium titanate. When the high-frequency detecting element is exposed to high-frequency waves, the semiconducting ceramic generates heat and thus heats up the instant it absorbs high-frequency waves, so that high-frequency waves can be detected with great precision and, with the time constant being small. Furthermore, one high-frequency detecting element can both absorb high-frequency waves and detect temperature, exhibiting a sharp response to high-frequency waves and correctly following temperature changes.
- Since a high-frequency heater of the present invention is positioned in a heating chamber containing a high-frequency detecting element, that is, the high-frequency heater is under the same conditions as an object to be heated, the temperature of the object can directly be measured. Comprising semiconducting ceramic with positive resistance-temperature characteristics, composed mainly of barium titanate, the high-frequency detecting element can both absorb high-frequency waves and detect temperature with a high sensitivity in a short time in response to heat, thus allowing proper temperature control to be exercised and a temperature detecting unit to be reduced in size.
- It will be appreciated by those of ordinary skill in the art that the present invention can be embodied in other specific forms without departing from the scope thereof. The presently disclosed embodiments are therefore considered in all respects to be illustrative and not restrictive. The scope of the invention is indicated by the appended claims rather than the foregoing description and all changes which come within the meaning and range of equivalents thereof are intended to be embraced therein.
Claims (28)
1. A high-frequency detecting element comprising semiconducting ceramic with positive resistance-temperature characteristics.
2. The high-frequency detecting element according to , wherein said semiconducting ceramic includes barium titanate.
claim 1
3. The high-frequency detecting element according to , further comprising a pair of electrodes located on one main surface of said semiconducting ceramic.
claim 1
4. The high-frequency detecting element according to , further comprising a pair of electrodes located on one main surface of said semiconducting ceramic.
claim 2
5. The high-frequency detecting element according to , wherein said semiconducting ceramic is 4 mm or less in thickness.
claim 1
6. The high-frequency detecting element according to , wherein said semiconducting ceramic is 4 mm or less in thickness.
claim 2
7. The high-frequency detecting element according to , wherein said semiconducting ceramic is 4 mm or less in thickness.
claim 3
8. The high-frequency detecting element according to , wherein said semiconducting ceramic is 4 mm or less in thickness.
claim 4
9. The high-frequency detecting element according to , wherein said semiconducting ceramic has a Curie point of 150° C. or less.
claim 1
10. The high-frequency detecting element according to , wherein said semiconducting ceramic has a Curie point of 150° C. or less.
claim 2
11. The high-frequency detecting element according to , wherein said semiconducting ceramic has a Curie point of 150° C. or less.
claim 3
12. The high-frequency detecting element according to , wherein said semiconducting ceramic has a Curie point of 150° C. or less.
claim 4
13. The high-frequency detecting element according to , wherein said semiconducting ceramic has a Curie point of 150° C. or less.
claim 5
14. The high-frequency detecting element according to , wherein said semiconducting ceramic has a Curie point of 150° C. or less.
claim 6
15. The high-frequency detecting element according to , wherein said semiconducting ceramic has a Curie point of 150° C. or less.
claim 7
16. The high-frequency detecting element according to , wherein said semiconducting ceramic has a Curie point of 150° C. or less.
claim 8
17. A high-frequency heater comprising a heating chamber, a high-frequency generating means for producing high-frequency waves in said heating chamber, and a high-frequency detecting element detecting high-frequency waves produced in said heating chamber.
18. A high-frequency heater according to , wherein said high-frequency detecting element is semiconducting ceramic with positive resistance-temperature characteristics.
claim 17
19. The high-frequency heater according to , wherein said high-frequency detecting element includes barium titanate.
claim 18
20. The high-frequency heater according to , wherein said high-frequency detecting element includes a pair of electrodes located on one main surface of semiconducting ceramic.
claim 17
21. The high-frequency heater according to , wherein said high-frequency detecting element includes a pair of electrodes located on one main surface of semiconducting ceramic.
claim 18
22. The high-frequency heater according to , wherein said high-frequency detecting element comprises semiconducting ceramic with positive resistance-temperature characteristics having a thickness of 4 mm or less.
claim 17
23. The high-frequency heater according to , wherein said high-frequency detecting element comprises semiconducting ceramic with positive resistance-temperature characteristics having a thickness of 4 mm or less.
claim 19
24. The high-frequency heater according to , wherein said high-frequency detecting element comprises semiconducting ceramic with positive resistance-temperature characteristics having a thickness of 4 mm or less.
claim 20
25. The high-frequency heater according to , wherein said high-frequency detecting element comprises semiconducting ceramic with positive resistance-temperature characteristics having a Curie point of 150° C. or less.
claim 17
26. The high-frequency heater according to , wherein said high-frequency detecting element comprises semiconducting ceramic with positive resistance-temperature characteristics having a Curie point of 150° C. or less.
claim 19
27. The high-frequency heater according to , wherein said high-frequency detecting element comprises semiconducting ceramic with positive resistance-temperature characteristics having a Curie point of 150° C. or less.
claim 20
28. The high-frequency heater according to , wherein the other main surface of said high-frequency detecting element on which no electrodes are formed is disposed to face a heating chamber in which high-frequency waves are produced.
claim 20
Priority Applications (1)
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US08/980,017 US6271538B2 (en) | 1994-11-28 | 1997-11-26 | High-frequency detecting elements and high-frequency heater using the same |
Applications Claiming Priority (4)
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JP06293479A JP3106385B2 (en) | 1994-11-28 | 1994-11-28 | High frequency detecting element and high frequency heating device using the same |
JP6-293479 | 1994-11-28 | ||
US08/564,871 US5793025A (en) | 1994-11-28 | 1995-11-28 | High-frequency detecting elements and high-frequency heater using the same |
US08/980,017 US6271538B2 (en) | 1994-11-28 | 1997-11-26 | High-frequency detecting elements and high-frequency heater using the same |
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US08/564,871 Division US5793025A (en) | 1994-11-28 | 1995-11-28 | High-frequency detecting elements and high-frequency heater using the same |
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US20010003370A1 true US20010003370A1 (en) | 2001-06-14 |
US6271538B2 US6271538B2 (en) | 2001-08-07 |
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US08/980,017 Expired - Fee Related US6271538B2 (en) | 1994-11-28 | 1997-11-26 | High-frequency detecting elements and high-frequency heater using the same |
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US (2) | US5793025A (en) |
EP (1) | EP0715486B1 (en) |
JP (1) | JP3106385B2 (en) |
KR (1) | KR100224126B1 (en) |
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US20050107727A1 (en) * | 2003-11-14 | 2005-05-19 | Christian Hunt | Cervical traction device |
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DE112006000370T5 (en) * | 2005-02-07 | 2008-03-06 | Hochiki Corp. | Heat detector and method of manufacturing a heat sensing element |
JP4368380B2 (en) | 2005-04-19 | 2009-11-18 | 日本エー・シー・ピー株式会社 | Stethoscope head |
WO2011004561A1 (en) * | 2009-07-10 | 2011-01-13 | パナソニック株式会社 | Microwave heating device and microwave heating control method |
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JPS62123226A (en) * | 1985-11-22 | 1987-06-04 | Toshiba Corp | High-frequency heating cooker |
CA1264871A (en) * | 1986-02-27 | 1990-01-23 | Makoto Hori | Positive ceramic semiconductor device with silver/palladium alloy electrode |
JP2733667B2 (en) * | 1988-07-14 | 1998-03-30 | ティーディーケイ株式会社 | Semiconductor porcelain composition |
FR2636060A1 (en) * | 1988-09-02 | 1990-03-09 | Thomson Csf | PROCESS FOR PRODUCING HYBRID CHEMICAL CERAMIC MATERIAL AND MATERIAL OBTAINED |
US5110216A (en) * | 1989-03-30 | 1992-05-05 | Luxtron Corporation | Fiberoptic techniques for measuring the magnitude of local microwave fields and power |
JP2797657B2 (en) * | 1990-06-01 | 1998-09-17 | 松下電器産業株式会社 | High frequency heating equipment |
JPH05172884A (en) * | 1991-12-25 | 1993-07-13 | Mitsubishi Materials Corp | Microwave detector |
US5378875A (en) * | 1991-12-25 | 1995-01-03 | Mitsubishi Materials Corporation | Microwave oven with power detecting device |
US5294577A (en) * | 1992-06-25 | 1994-03-15 | Murata Manufacturing Co., Ltd. | Semiconductor ceramic composition for secondary electron multipliers |
DE4221309A1 (en) | 1992-06-29 | 1994-01-05 | Abb Research Ltd | Current limiting element |
-
1994
- 1994-11-28 JP JP06293479A patent/JP3106385B2/en not_active Expired - Fee Related
-
1995
- 1995-11-27 EP EP95118642A patent/EP0715486B1/en not_active Expired - Lifetime
- 1995-11-27 DE DE69519716T patent/DE69519716T2/en not_active Expired - Lifetime
- 1995-11-28 KR KR1019950044250A patent/KR100224126B1/en not_active IP Right Cessation
- 1995-11-28 US US08/564,871 patent/US5793025A/en not_active Expired - Lifetime
- 1995-11-29 TW TW089202923U patent/TW467467U/en not_active IP Right Cessation
-
1997
- 1997-11-26 US US08/980,017 patent/US6271538B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US5793025A (en) | 1998-08-11 |
JPH08152363A (en) | 1996-06-11 |
DE69519716D1 (en) | 2001-02-01 |
EP0715486A1 (en) | 1996-06-05 |
TW467467U (en) | 2001-12-01 |
JP3106385B2 (en) | 2000-11-06 |
DE69519716T2 (en) | 2001-06-28 |
US6271538B2 (en) | 2001-08-07 |
EP0715486B1 (en) | 2000-12-27 |
KR100224126B1 (en) | 1999-10-15 |
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