US10165699B2 - Oxidied and coated articles and methods of making same - Google Patents

Oxidied and coated articles and methods of making same Download PDF

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US10165699B2
US10165699B2 US15/518,522 US201515518522A US10165699B2 US 10165699 B2 US10165699 B2 US 10165699B2 US 201515518522 A US201515518522 A US 201515518522A US 10165699 B2 US10165699 B2 US 10165699B2
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substrate
oxidized
disposing
coating layer
housing
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US20170325347A1 (en
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Chalam Kashyap
Kuan-Ting Wu
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Hewlett Packard Development Co LP
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Hewlett Packard Development Co LP
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K5/00—Casings, cabinets or drawers for electric apparatus
    • H05K5/04—Metal casings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/026—Anodisation with spark discharge
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/26—Anodisation of refractory metals or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/30—Anodisation of magnesium or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/34—Anodisation of metals or alloys not provided for in groups C25D11/04 - C25D11/32
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/12—Electrophoretic coating characterised by the process characterised by the article coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/20—Pretreatment

Definitions

  • the housing/casing of an electronic device may comprise multiple Components.
  • the components may include covers in the case of a portable electronic device having a display, these covers may include a top cover (“A cover”), the display itself (“B cover”), the keyboard cover (“C cover”), and the bottom cover (“D cover”).
  • covers may comprise a variety of suitable materials.
  • FIG. 1 provides a flowchart showing the processes involved in one example of a method of manufacturing described herein.
  • FIG. 2 provides a flowchart showing the processes involved in another example of a method of manufacturing described herein.
  • FIG. 3 shows, in one example, a schematic of an electronic device comprising a housing structure described herein.
  • FIGS. 4A-4B show, in one example, schematic diagrams of the housing Structure as described herein: 4 A shows a schematic diagram of the structure with different surfaces and layers, and 4 B shows a schematic diagram of the components of a portion of the housing structure.
  • the housing of electronic devices is frequently subject to mechanical deformation due at least in part to its frequent contact with other objects (e.g., table, hand, ground, etc.).
  • These devices, particularly the housing thereof often need to have materials having high mechanical strength and high hardness, so as to withstand wear.
  • the housing structure often has certain cosmetic features that make the structure at least visually appealing to a consumer user.
  • the Inventors have recognized and appreciated the advantages of a housing structure, particularly one in the housing of an electronic device, as manufactured by the methods described herein. Following below are more detailed descriptions of various examples related to a housing structure, particularly the methods of making same. The various examples described herein may be implemented in any of numerous ways.
  • a method of manufacturing comprising: oxidizing, using plasma, a first surface of a substrate comprising a metal-material; cutting into the substrate through the oxidized first surface to expose a non-oxidized second surface of the substrate, the second surface not parallel to the first surface; and disposing, using electrophoretic deposition, a coating layer over the exposed second surface to form an article having the oxidized first surface and the coated second surface.
  • a method of manufacturing comprising: making a portion of a housing of an electronic device having an electrical circuit, wherein the making comprises: oxidizing, using micro-arc oxidation, a first surface of a substrate comprising a metal-material; cutting, using diamond cutting, into the substrate through the oxidized first surface to expose a non-oxidized second surface of the substrate, the second surface not parallel to the first surface; and disposing, using electrophoretic deposition, a coating layer over the exposed second surface to form the portion having the oxidized first surface and the coated second surface; and assembling the electrical circuit with the housing, the housing external to the electrical circuit.
  • an electronic device comprising: an electrical circuit; and a housing external to the electrical circuit, a portion of the housing comprising a substrate having: a core layer comprising a metal material; an oxide layer disposed over a first surface of the core layer, the oxide is a micro-arc oxide of the metal material; and a functional coating disposed over the oxide layer, the functional coating comprising a polymer; an edge of the substrate having a non-oxidized second surface not parallel to the first surface, the second surface cut by diamond cutting and having thereon an electrophoretically deposited coating layer comprising at least one of polyacrylic, epoxy, and nanoparticles.
  • MAO Micro-Arc Oxidation
  • MAO Micro-Arc Oxidation
  • plasma electrolytic oxidation is also known as plasma electrolytic oxidation.
  • MAO is an electrochemical process of oxidation that may generate an oxide coating layer on a conductive material, such as a metal material.
  • a “metal material” herein may refer to a pure metal, a metal alloy, an intermetallic, or a metal-containing composite. The metal material may comprise aluminium, magnesium, titanium, etc.
  • an MAO employs a high potential such that the discharges may occur and the resulting plasma may modify the structure of the oxide layer.
  • the MAO may involve creating micro-discharges on a surface of the metal material immersed in an electrolyte.
  • the MAO process may be employed to form relatively thick and mostly crystalline oxide coating.
  • the thickness of costing may be, for example, tens or hundreds of micrometers, but is not limited to any particular value.
  • a MAO coating of a larger or smaller thickness may be produced.
  • the resultant micro-arc oxide coating may be dense and/or ductile and may have a relatively high hardness, particularly in contrast to an oxide layer formed by anodization.
  • MAO is a chemical conversion process. Specifically, the oxide layer formed as a result of MAO is a result of oxidation of the underlying metal-material substrate, instead of an oxide layer being deposited onto the substrate. As a result, in comparison to a deposition-based process (e.g., spray coating), an MAO coating may have a higher adhesion to the underlying metal-material substrate.
  • diamond cutting herein may refer to the technique of cutting a materiel using a diamond blade.
  • the diamond blade may be a saw blade that has diamonds fixed on its edge for cutting a material, such as a hard and/or abrasive material. Any suitable type of diamond blade may be used, depending on the material to be cut.
  • Diamond cutting may be employed in a variety of applications. In one example, diamond cutting is employed to cut semiconductor material. In another example, diamond cutting is employed to cut a metal material, such as cutting through a protective layer (e.g., oxide layer) thereon and/or into the metal material itself to expose a portion of the underlying metal material. The exposed electrically conductive metal material of the substrate may allow processes such as electrophoretic deposition to proceed on the conductive metal material.
  • a protective layer e.g., oxide layer
  • ED electrophoretic deposition
  • An ED method may involve any suitable number of processes and any suitable number of materials.
  • ED may Involve disposing colloidal particles suspended in a liquid medium using an electric field over an electrically conducive surface.
  • the electrically conductive surface may be that of an electrode.
  • the migration of particles using the influence of an electric field is known as electrophoresis.
  • ED may involve aqueous processes or non-aqueous processes.
  • the processes and me processing parameters may vary, depending on the materials involved.
  • ED may be versatile with respect to the type of material being disposed over a substrate.
  • any colloidal particles that may be employed to form stable suspensions and that may carry an electrical charge may be employed in ED.
  • the substrate over which the material is disposed using ED is electrically conductive.
  • the material suitable for ED may include polymers, pigments, dyes, ceramics, metals, etc.
  • the type of suitable material may also depend on whether it is a cathodic or an anodic material for the ED.
  • the material to be disposed over a substrate comprises at least one of polyacrylic, epoxy, and nanoparticles.
  • the material to be disposed by ED comprises one of polyacrylic and epoxy.
  • nanoparticles are added to the polymer to be disposed by ED to control the surface profile, color performance, or both.
  • the nanoparticles may comprise a metal, a compound (e.g., a metal oxide, such as silica).
  • the material to be disposed by ED comprises a dye.
  • the housing structure, or a portion thereof, described herein may be manufactured by a method involving any suitable number of processes.
  • FIG. 1 shows the processes involved in one example of such a method.
  • the manufacturing method as shown in FIG. 1 may comprise oxidizing, using plasma, a first surface of a substrate comprising a metal-material (S 101 ).
  • the oxidation process may involve any suitable processes), such as MAO as described above.
  • any suitable oxidation parameters may be employed. It is noted that the terms “first,” “second,” “third,” etc. herein are merely employed to show the respective objects described by these terms as separate entities and are not meant to connote a sense of chronological order, unless stated explicitly herein.
  • the manufacturing method may further comprise cutting into the substrate through the oxidized first surface to expose a non-oxidized second surface of the substrates, the second surface not parallel to the first surface (S 102 ).
  • the cutting process may involve any suitable process, such as diamond cutting as descried above.
  • the second surface may be related to the first surface at any angle.
  • the second surface may be perpendicular to the first surface.
  • the second surface may be at any angle between 1° and 90° relative to the second surface.
  • the manufacturing method may further comprise disposing, using electrophoretic deposition, a coating layer over the exposed second surface to form en article having the oxidized first surface end the coated second surface (S 103 ).
  • the technique of electrophoretic deposition may be as described above.
  • the material to be disposed may be those described above.
  • FIG. 2 shows the processes involved in another example of a method of manufacturing an electronic device. As shown in FIG. 2 , this method may comprise making a portion of a housing of an electronic device having an electrical circuit (S 201 ). More than one electrical circuit is possible. An “electronic device” is described further below. This process of making the portion of the housing may comprise oxidizing, using micro-arc oxidation, a first surface of a substrate comprising a metal-material.
  • the process of making may further comprise cutting, using diamond cutting, into the substrate through the oxidized first surface to expose a non-oxidized second surface of the substrate, the second surface not parallel to the first surface.
  • the process of making may further comprise disposing, using electrophoretic deposition, a coating layer over the exposed second surface to form the portion having the oxidized first surface and the coated second surface.
  • the method of fabrication may further comprise assembling the electrical circuit with the housing, the housing external to the electrical circuit (S 202 ).
  • FIG. 3 shows, in one example, a schematic of an electronic device 30 comprising a housing 31 (only a portion thereof is shown in the figure) described herein.
  • the housing may comprise a portion 32 that has the substrate described herein.
  • the housing (or a part thereof) 31 is external to the electrical circuit 33 in the interior of the device 30 .
  • the electrical circuit 33 may be any type of electrical circuit having any suitable configuration and component. It is noted that while FIG. 3 shows that the structure is in a portion of the top cover, the structure may constitute the entire cover on one side, or multiple sides, as a part of the housing of the device.
  • FIGS. 4A-4B provide schematic diagrams to further illustrate one example of the housing structure described herein.
  • the substrate 40 has an first surface 41 to be oxidized and a second surface 42 to be ED coated. It is noted that while the first surface 41 and the second surface 42 in this figure are shown not to be perpendicular to each other, they may be, if desired.
  • the oxidized structure 43 in FIG. 4A is further shown in FIG. 4B . It is noted that the structure 43 is shown as only a portion of the surface 41 of the substrate 40 in FIG. 4A only to facilitate the illustration. The structure 43 may encompass a portion or the entire surface 41 of the substrate 40 .
  • the second surface 42 is coated with an ED coating layer 44 as described above.
  • the structure includes a substrate of the metal-material 431 .
  • the layer 431 may comprise one single layer of the metal Material. Alternatively, the layer 431 may comprise multiple sub-layers (not shown), at least one of which comprises the metal material.
  • An oxide layer 432 such as one formed by MAO, is disposed over the metal-material substrate 431 . As further noted below, in some examples, the oxide layer 432 is further coated with a functional coating 433 , although the functional coating need not be present.
  • the structure as shown in FIGS. 4A and 4B may be a portion of the housing structure of an electronic device.
  • the metal material (of the substrate) may comprise a pure metal, a metal alloy, an intermetallic, a metallic compound, or a metal-containing composite.
  • the substrate may comprise one single layer of the metal material or may comprise multiple layers of the same of different materials, at least some of which is the metal material.
  • the metal material may comprise at least one of aluminium, magnesium, lithium, zinc, titanium, niobium, iron, and copper.
  • an iron-containing metal material is steel, such as stainless steel.
  • the metal material comprises magnesium or an alloy thereof.
  • the metal material may comprise an alloy of any of the aforementioned metal elements or a combination of any of the aforementioned metal elements.
  • the equipment that may be employed for the manufacturing methods described herein is not limited. As long as the equipment may perform the processes as described herein, the equipment may be used.
  • the methods of manufacturing described herein may involve various processes as a part of, or other than, those described above.
  • the substrate is formed by any suitable method, such as one involving at least one of computer numerical control machining and forging.
  • the parameters of the processes may vary depending on the materials and processes involved, in another example, before the oxidation process, the surface to be oxidized (i.e., the first surface) is pre-treated. Examples of surface pre-treatment may involve at least one of decreasing and surface activation.
  • the de-greasing may involve application of pressure, solvent, temperature, etc, depending on the materials involved, to remove oil from the surface.
  • Surface activation may involve exposing the first surface to a bath before the oxidation.
  • the bath may be acidic or alkaline.
  • the methods of manufacturing described herein may further comprise disposing a functional coating layer over the oxidized (first) surface.
  • the functional coating may be disposed before or after the cutting process in one example, the functional coating is disposed over the oxidized surface before the cutting process.
  • the functional coating may be disposed by any suitable technique.
  • the functional coating may be disposed using spray coating or dipping the surface over which the functional coating is to be formed into a bath to coat the surface with the functional coating material.
  • the functional coating may be any suitable type of coating, depending on the application desired.
  • the functional coating may be one of: protective coating, anti-finger print coating, soft touch coating, anti-bacterial coating, anti-smudge coating, and insulation coating, in one example, the functional coating may provide soft touch feeling, particularly when the coating comprises polyurethane.
  • the functional coating may comprise any suitable material.
  • the functional coating may comprise a hydrophobic material.
  • the functional coating may comprise at least one polymer.
  • the polymer may be one of, for example, polystyrene, polyimide, polyarelene ether, polyurethane, methylsilsequioxane, polyethylene, polystyrene silicone, butyl rubber, polyamide, polycarbonate, styrene-butadiene rubber, polyacrylate, epoxy, and fluoropolymer.
  • Other types of polymers are also possible.
  • the polymer is a polyimide
  • the polymer is fluorinated polyimide, polyvinyl chloride polyimide, or Kapton® (available from E.I. du Pont de Nemours and Company, USA)
  • the polymer is a polyamide
  • the polymer is nylon.
  • the polymer is a polystyrene
  • the polymer is acrylonitrile butadiene styrene (“ABS”).
  • the functional coating comprises polyurethane.
  • the functional coating may also comprise other types of materials, including an anti-bacterial agent a filler, etc.
  • a filler may be any suitable material depending on the application.
  • the filter nay be an organic material or an inorganic material.
  • the filler may be a ceramic.
  • Examples of a suitable filter may include carbon black, titanium dioxide, clay, mica, talc, barium sulfate, calcium carbonate, synthetic pigment, metallic powder, aluminum oxide, an organic powder, an inorganic powder, graphene, graphite, and dispersed elastomers.
  • the methods of manufacturing described herein may further comprise disposing a powder coating layer over the oxidized surface after the cutting process.
  • the powder coating layer may also be disposed over the diamond-cut surface in some instances.
  • the powder coating may serve to protect the MAO oxide surface.
  • the powder coating may be disposed by any suitable techniques.
  • the powder coating may be disposed using electrostatic spray deposition. Other techniques are also possible.
  • the powder coating may comprise any suitable material or materials, depending on the application. Examples of a suitable material for the powder coating include epoxy, poly(vinyl chloride), polyamide, polyester, polyurethane, polyacrylic, etc. Additives, such as binders, may also be added, depending on the application. The aforementioned materials may be employed in the coating in any combination.
  • the methods of manufacturing described herein may further comprise preparation processes for any of the processes described herein.
  • the substrate after being subjected to the oxidation and cutting processes may be treated before being subjected to the ED process.
  • the treatment may involve any number of suitable processes, depending on the materials involved.
  • the surface that is cut, such as by diamond cutting, herein referred to as the second surface may be de-greased before the ED process.
  • the de-greased second surface may be further rinsed.
  • Any rinsing agent such as water, may be employed.
  • the rinsed second surface may be further polished, such as by chemical polishing.
  • any suitable chemical polishing agent may be employed.
  • the polishing agent may be an acid or a base.
  • the chemically polished second surface may be further rinsed again.
  • the rinsing may be carried by the same type of rinsing agent in the previous rinsing process or different type.
  • the rinsed second surface may be further de-smutted. Any suitable etching agent may be employed for the de-smutting, depending on the materials involved.
  • the de-smutted second surface may be further cleaned, such as by ultrasonic cleaning.
  • the methods of manufacturing described herein may further comprise post-deposition process(es), after an ED coating layer is formed on the substrate. Any suitable post-processing processes may be employed.
  • the methods of manufacturing may further comprise rinsing at least the coated surface of the substrate and dehydrating at least the rinsed coated surface.
  • the rinsing may involve any suitable rinsing agent, such as those described above.
  • the dehydration may involve any suitable process, depending on the application. Examples of dehydration may be the application of heat, air or both.
  • the methods of manufacturing described herein may further comprise inspection of the product after a particular process.
  • An inspection may involve any quality control process.
  • An inspection process may be applied after any of the processes described herein is completed.
  • an inspection process is employed for the substrate after at least one of the cutting (e.g., diamond cutting) and ED processes.
  • the housing structure descried herein may have certain beneficial properties.
  • the structure described herein may have a relatively high hardness, particularly in comparison to a structure made by an anodization process.
  • the housing structure described herein may have a pencil hardness of at least about 5 H—e.g., about 8 H, about 7 H, about 8 H, or about 9 H.
  • housing structure described herein may have a pencil hardness of between about 5 H and about 9 H—e.g., between about 6 H and about 8 H, etc.
  • the pencil hardness described herein may refer to any portion of the housing structure described herein, including the portion covered by an MAO oxide layer.
  • the different surfaces as a result of the manufacturing methods described herein allow a desirable surface finishing gloss and a metallic luster feeling, due at least in part to the use of electrophoretic deposition to create a coating layer
  • ED also provides an opportunity to introduce colors to the coating, rather than the black/gray coating of some other pre-existing coating techniques. These features may be particularly desirable in an electronic device, such as those described further below.
  • the coating layer as formed by ED may be further reworked to be beneficial to enhance production yield rate.
  • the use of ED also allows a shorter cycle time to have high productivity. In comparison to some other pre-existing coating methods.
  • the use of MAO process herein may reduce the surface reactivity of certain metal materials, particularly the magnesium alloys, and MAO is more environmentally friendly and may provide a higher throughput, particularly in comparison to an anodization process.
  • the housing structure described herein may be employed in various applications.
  • the housing structure may be an integral part of a structural component.
  • the component may be a part of the housing of an electronic device.
  • a housing of a device may refer to any structural component that encloses the interior of the device.
  • the housing structure described herein is a part of the housing of an electronic device.
  • me housing structure may be any part of the housing, including back cover, front cover, side cover, and the like, of the device.
  • An electronic device herein may refer to any device comprising at least one electrical circuit.
  • the housing that comprises the housing structure described herein may be external to the electrical circuit.
  • the electronic device may be a consume electronic device.
  • An electronic device may refer to portable/mobile electronic device.
  • An electronic device herein may refer to a computer, a memory storage, a display, a signal transmitting device, and the like.
  • a computer may refer to a desktop, a laptop, a tablet, a phablet a tablone, and the like.
  • a storage unit may refer to the hardware of a hard drive, a server, a processor, and the like.
  • a display may refer to a monitor, a liquid crystal display (“LCD”), a television, and the like.
  • a signal transmitting device may refer to a device transmitting any type of signal, including light, sound, heat, and the like.
  • the electronic device is a mobile phone.
  • a reference to “A and/or B”, when used in conjunction with open-ended language such as “comprising” can refer, in one example, to A only (optionally including elements other than B); in another example, to B only (optionally inducing elements other than A); in yet another example, to both A and B (optionally including other elements); etc.
  • the phrase “at least one,” in reference to a list of one or more elements, should be understood to mean at least one element selected from any one or more of the elements in the list of elements, but not necessarily including at least one of each and every element specifically listed within the list of elements and not excluding any combinations of elements in the list of elements.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Casings For Electric Apparatus (AREA)
  • Telephone Set Structure (AREA)
US15/518,522 2015-01-28 2015-01-28 Oxidied and coated articles and methods of making same Expired - Fee Related US10165699B2 (en)

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US20170325347A1 (en) 2017-11-09
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