UA111602C2 - Пристрій автоматичного живлення промислового генератора на парах металу - Google Patents

Пристрій автоматичного живлення промислового генератора на парах металу

Info

Publication number
UA111602C2
UA111602C2 UAA201310074A UAA201310074A UA111602C2 UA 111602 C2 UA111602 C2 UA 111602C2 UA A201310074 A UAA201310074 A UA A201310074A UA A201310074 A UAA201310074 A UA A201310074A UA 111602 C2 UA111602 C2 UA 111602C2
Authority
UA
Ukraine
Prior art keywords
metal
crucible
coating
melting
furnace
Prior art date
Application number
UAA201310074A
Other languages
English (en)
Inventor
П'єр Банажак
Дідьє Марнефф
Бруно Шмітц
Ерік Зільберберг
Люк ВАНЕ
Original Assignee
Арселормітталь Інвестіхасіон І Десаррольо
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Арселормітталь Інвестіхасіон І Десаррольо filed Critical Арселормітталь Інвестіхасіон І Десаррольо
Publication of UA111602C2 publication Critical patent/UA111602C2/uk

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Crucibles And Fluidized-Bed Furnaces (AREA)

Abstract

Винахід належить до установки для безперервного вакуумного осадження металевого покриття на рухому підкладку, яка містить камеру (24) вакуумного осадження, щонайменше одну головку (25, 26) для нанесення покриття струменевим осадженням пари, з'єднану з випарним тиглем (9), що містить метал покриття (11) в рідкому стані, за допомогою трубопроводу (20), що подає пару, який оснащено розподільним клапаном (19), і піч (1) для плавлення зазначеного металу, причому зазначена піч знаходиться під атмосферним тиском і розташована нижче рівня в найнижчій частині випарного тигля (9) і з'єднана з випарним тиглем (9) щонайменше одним трубопроводом (8) для автоматичного живлення випарного тигля (9), обладнаним насосом для живлення (6), і щонайменше одним трубопроводом (8А, 18) для повернення рідкого металу, факультативно забезпеченим клапаном (16, 17), причому додатково передбачені засоби регулювання насоса для живлення, що забезпечують регулювання певного рівня рідкого металу в випарному тиглі (9), яка відрізняється тим, що вона містить наявну в кожному із зазначених трубопроводів живлення і повернення (8, 8А, 18) зону (7, 13, 15), звану термоклапаном, яка забезпечена пристроєм нагрівання і пристроєм охолодження для одержання температури, що регулюється, незалежної від температури плавильної печі (1) і від температури в решті частини зазначених трубопроводів (8, 8А, 18) і в випарному тиглі (9), з метою розплавлення або затвердіння металу, що знаходиться в цьому місці.
UAA201310074A 2011-01-14 2012-12-01 Пристрій автоматичного живлення промислового генератора на парах металу UA111602C2 (uk)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP11151004 2011-01-14
PCT/EP2012/050432 WO2012095489A1 (fr) 2011-01-14 2012-01-12 Dispositif d'alimentation automatique d'un generateur de vapeur metallique industriel

Publications (1)

Publication Number Publication Date
UA111602C2 true UA111602C2 (uk) 2016-05-25

Family

ID=43711015

Family Applications (1)

Application Number Title Priority Date Filing Date
UAA201310074A UA111602C2 (uk) 2011-01-14 2012-12-01 Пристрій автоматичного живлення промислового генератора на парах металу

Country Status (17)

Country Link
US (1) US10011905B2 (uk)
EP (1) EP2663665B1 (uk)
JP (1) JP6046051B2 (uk)
KR (1) KR101786160B1 (uk)
CN (1) CN103328680B (uk)
AU (1) AU2012206581B2 (uk)
BR (1) BR112013018030B1 (uk)
CA (1) CA2824248C (uk)
ES (1) ES2538661T3 (uk)
HU (1) HUE026398T2 (uk)
IN (1) IN2013DN06279A (uk)
MX (1) MX342299B (uk)
PL (1) PL2663665T3 (uk)
RU (1) RU2584369C2 (uk)
UA (1) UA111602C2 (uk)
WO (1) WO2012095489A1 (uk)
ZA (1) ZA201305032B (uk)

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KR101461738B1 (ko) 2012-12-21 2014-11-14 주식회사 포스코 가열장치 및 이를 포함하는 코팅 시스템
US9240584B1 (en) * 2012-12-27 2016-01-19 Sakti3, Inc. Phase change material source for physical vapor deposition
US10131983B2 (en) * 2013-11-05 2018-11-20 Tata Steel Nederland Technology B.V. Method and apparatus for controlling the composition of liquid metal in an evaporator device
ES2787924T3 (es) * 2016-05-03 2020-10-19 Tata Steel Nederland Tech Bv Aparato para alimentar un metal líquido a un dispositivo evaporador
WO2018020296A1 (en) 2016-07-27 2018-02-01 Arcelormittal Apparatus and method for vacuum deposition
EP3735996B1 (de) * 2019-05-07 2023-09-27 Free Life Medical GmbH Bidirektionale perfusionskanüle
CN112505286B (zh) * 2019-09-16 2023-08-11 中国科学院上海光学精密机械研究所 一种锌致液态金属裂纹形成条件的检测装置及方法
CN113930738B (zh) * 2020-06-29 2023-09-12 宝山钢铁股份有限公司 一种真空镀膜用的金属蒸汽调制装置及其调制方法
CN113957389B (zh) * 2020-07-21 2023-08-11 宝山钢铁股份有限公司 一种具有多孔降噪及均匀化分配金属蒸汽的真空镀膜装置
US20220090256A1 (en) * 2020-09-18 2022-03-24 Applied Materials, Inc. Evaporation apparatus, vapor deposition apparatus, and evaporation method
CN114029001B (zh) * 2021-12-03 2023-11-24 上海镁源动力科技有限公司 一种用于液态金属原料自动上料的装置及上料方法

Family Cites Families (8)

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SU1505064A2 (ru) * 1987-08-04 1994-12-15 Специализированное конструкторско-технологическое бюро с опытным производством Института электроники им.У.А.Арифова Электродуговой испаритель
US5356673A (en) * 1991-03-18 1994-10-18 Jet Process Corporation Evaporation system and method for gas jet deposition of thin film materials
BE1010351A6 (fr) 1996-06-13 1998-06-02 Centre Rech Metallurgique Procede et dispositif pour revetir en continu un substrat en mouvement au moyen d'une vapeur metallique.
JP3901773B2 (ja) * 1996-11-26 2007-04-04 三菱重工業株式会社 真空蒸着装置
LV13383B (en) * 2004-05-27 2006-02-20 Sidrabe As Method and device for vacuum vaporization metals or alloys
EP1972699A1 (fr) * 2007-03-20 2008-09-24 ArcelorMittal France Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique
EP2048261A1 (fr) * 2007-10-12 2009-04-15 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique
EP2199425A1 (fr) * 2008-12-18 2010-06-23 ArcelorMittal France Générateur de vapeur industriel pour le dépôt d'un revêtement d'alliage sur une bande métallique (II)

Also Published As

Publication number Publication date
EP2663665A1 (fr) 2013-11-20
RU2013137228A (ru) 2015-02-20
WO2012095489A1 (fr) 2012-07-19
MX2013008174A (es) 2013-12-02
PL2663665T3 (pl) 2015-08-31
MX342299B (es) 2016-09-23
CA2824248C (en) 2019-11-05
KR20140041436A (ko) 2014-04-04
RU2584369C2 (ru) 2016-05-20
KR101786160B1 (ko) 2017-10-17
CA2824248A1 (en) 2012-07-19
US10011905B2 (en) 2018-07-03
ZA201305032B (en) 2014-07-30
JP2014505794A (ja) 2014-03-06
JP6046051B2 (ja) 2016-12-14
CN103328680A (zh) 2013-09-25
EP2663665B1 (fr) 2015-03-11
AU2012206581B2 (en) 2017-03-30
CN103328680B (zh) 2015-05-20
HUE026398T2 (en) 2016-06-28
BR112013018030A2 (pt) 2020-10-27
ES2538661T3 (es) 2015-06-23
BR112013018030B1 (pt) 2021-05-18
IN2013DN06279A (uk) 2015-08-14
US20140127406A1 (en) 2014-05-08

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