TWM656981U - Cleaning base station and cleaning system - Google Patents

Abstract

Embodiments of the present application disclose a cleaning base station and a cleaning system, where the cleaning base station includes a liquid collection component and a sewage discharge component; the sewage discharge component includes a sewage discharge pipe and a sewage discharge tank, and the sewage discharge pipe includes a suction section and a check section. By setting a check section on the sewage discharge pipe, it is possible to avoid backflow of the sewage, thus making the liquid discharge in the sewage discharge section more thorough, reducing the residual liquid on the sewage discharge component, further greatly reducing the probability that the sewage remains in the narrow space at the bottom of the clean base station, breeds bacteria and produces odor, so that the use of the cleaning base station is cleaner and more hygienic, which can improve the user's experience.

Description

Cleaning base stations and cleaning systems

This embodiment of the case involves the field of smart home technology, and in particular, involves a cleaning base station and a cleaning system.

With the development of science and technology, various technological innovations are changing with each passing day, and various intelligent home appliances are being more and more widely used in various scenes of people's lives. In particular, intelligent robot technology has made rapid progress in recent years. Among them, sweeping robots have gradually entered the daily life of ordinary families with the help of artificial intelligence algorithms, integrated washing and mopping, intelligent dust collection, and intelligent water washing and cleaning. They can automatically complete cleaning operations instead of people and have won the favor of consumers. Usually, cleaning robot systems are equipped with cleaning base stations, which are used to charge, replenish water, clean, collect dust, etc. for cleaning robots. When the base station cleans the cleaning parts (such as rags, etc.) of the cleaning robot system, the cleaning liquid is first sprayed on the cleaning parts of the cleaning robot through the water supply device of the base station. After the cleaning parts are moistened with the cleaning liquid, the cleaning parts of the base station are used to clean the cleaning parts.

After sweeping and mopping the floor at home, the cleaning system in traditional technology returns to the cleaning base station to complete intelligent dust collection and intelligent water washing cleaning. The sewage will remain in the narrow space at the bottom of the cleaning base station, breed bacteria and produce odor, affecting the user experience.

(1) Purpose of invention

This case aims to solve at least one of the technical problems existing in existing technologies or related technologies.

(II) Technical solution

To this end, the first aspect of this case provides a cleaning base station.

The second aspect of the present invention provides a cleaning system.

In view of this, according to the first aspect of the embodiment of this case, a cleaning base station is provided, comprising: a liquid collecting part; a sewage discharge part, wherein the sewage discharge part comprises a sewage discharge trough and a sewage discharge pipe, one end of the sewage discharge pipe is connected to the sewage discharge trough, and the other end is connected to the liquid collecting part; wherein the sewage discharge pipe comprises a liquid suction section and a non-return section, the liquid suction section is connected to the sewage discharge trough and the liquid collecting part, and the non-return section is located in the middle section of the liquid suction section.

In some embodiments, the non-return section includes at least one bend.

In some embodiments, the bend includes at least one of an S-shaped bend, a V-shaped bend, and a U-shaped bend.

In some embodiments, the number of the non-return segments is two or more.

In some embodiments, the bottom surface of the drain trough is inclined, a drain outlet is formed on the drain trough, and the drain pipe is connected to the drain outlet.

In some embodiments, the cleaning base station further includes: a filter portion, the filter portion covers the sewage trough, and a plurality of through holes are formed on the filter portion.

In some embodiments, the density of the through holes is positively correlated with the depth of the drain tank.

In some embodiments, the cleaning base station further includes: a heating component, which is arranged on one side of the sewage trough to provide heat energy for the sewage trough.

In some embodiments, the heating assembly includes: a heat conducting plate, the heat conducting plate is arranged on one side of the drain tank, and the heat conducting plate is used to provide heat energy for the drain tank; a heat source, the heat source is arranged on the side of the heat conducting plate away from the drain tank, and the heat source is used to provide heat energy for the heat conducting plate.

In some embodiments, the drain tank is made of a heat-conducting material, and the heating assembly includes a heat source, which is disposed on one side of the drain tank to provide heat for the drain tank.

In some embodiments, the cleaning base station further includes: a heat insulation portion, which is arranged on a side of the heating component away from the sewage tank; and a bottom cover, which is arranged on a side of the heat insulation tank away from the heating component.

In some embodiments, the heat insulation part includes: a first heat insulation layer, which is arranged on a side of the heating component away from the sewage discharge part; wherein a relief part is formed on the first heat insulation layer, and the relief part is used to avoid the device on the heating component.

In some embodiments, the heat insulation part includes: a first air gap formed on a side of the heating assembly away from the sewage discharge part; a first heat dissipation hole opened on the side of the cleaning base station and connected to the first air gap.

In some embodiments, the heat insulation part includes: a second heat insulation layer, which is arranged on a side of the heating component away from the sewage discharge part; a second air gap, which is formed on a side of the second heat insulation layer away from the sewage discharge part; a second heat dissipation hole, which is opened on the side of the cleaning base station and connected to the second air gap; wherein a avoidance part is formed on the second heat insulation layer, and the avoidance part is used to avoid the device on the heating component.

In some embodiments, the cleaning base station further includes a liquid replenishing device, which includes a water supply connector, a pressure regulating mechanism and a liquid outlet device; the liquid outlet device includes a fluid channel, and the fluid channel is provided with a plurality of liquid outlets arranged along the length direction of the fluid; the water supply connector is connected to the fluid channel through the pressure regulating mechanism, and the pressure regulating mechanism is used to adjust the pressure of the liquid transported by the water supply connector, and transport the pressure-regulated liquid to the fluid channel, so that the liquid pressures of the liquid outlets are the same or similar.

In some embodiments, the pressure regulating mechanism includes a liquid storage mechanism provided with a liquid storage chamber, and the liquid storage mechanism is respectively connected to the water supply connector and the fluid channel.

In some embodiments, a fluid outlet is provided on the upper portion of the side wall of the liquid storage chamber, and the fluid outlet is connected to the fluid channel.

In some embodiments, a first fluid inlet is provided at the lower portion of the side wall of the liquid storage chamber, and the first fluid inlet is connected to the water supply connector.

In some embodiments, a second fluid inlet is provided on the upper portion of the side wall of the liquid storage chamber, and the second fluid inlet is connected to the water supply connector.

In some embodiments, a baffle is also provided in the liquid storage chamber to form a curved flow channel in the liquid storage chamber.

In some embodiments, the baffle is disposed opposite to the second fluid inlet, and the baffle is connected to the top wall and the side wall of the liquid storage chamber, and a gap is provided between the bottom of the baffle and the bottom surface of the liquid storage chamber.

In some embodiments, each of the liquid outlets is located above the side wall of the fluid channel.

In some embodiments, each of the liquid outlets is also provided with a liquid outlet conduit, and each of the liquid outlet conduits is inclined upward relative to the fluid channel.

In some embodiments, the water supply connector, the pressure regulating mechanism and the liquid outlet device are integrally formed.

According to the second aspect of the embodiment of this case, a cleaning system is proposed, comprising: a cleaning base station as described in any of the above technical solutions; a cleaning device, wherein the cleaning base station is used to clean the cleaning device.

In some embodiments, the cleaning device includes a cleaning robot, the cleaning robot includes a cleaning component, and the liquid replenishing device of the cleaning base station is used to spray liquid onto the cleaning component.

(III) Beneficial effects

Compared with the prior art, this case has at least the following beneficial effects: the cleaning base station provided by the embodiment of this case includes a liquid collecting part and a sewage discharge part, the sewage discharge part includes a sewage pipe and a sewage trough, and the sewage pipe includes a liquid suction section and a non-return section. During use, after completing the cleaning task, the cleaning equipment of the cleaning system can return to the cleaning base station for cleaning; the sewage after cleaning can be discharged into the liquid collecting part through the sewage discharge part, and the sewage can be uniformly stored through the liquid collecting part; the sewage generated by the cleaning can be better received through the sewage trough, which can avoid sewage overflow; the sewage can be easily discharged through the setting of the sewage pipe. To the liquid collection part; and a check section is set on the sewage pipe, which can prevent sewage from flowing back, making the liquid discharge of the sewage part more thorough, reducing the liquid residue on the sewage part, and greatly reducing the probability of sewage residue in the narrow space at the bottom of the cleaning base station, breeding bacteria and producing odor, making the use of the cleaning base station cleaner and more hygienic, and can improve the user experience.

The cleaning base station provided in the embodiment of this case uses a pressure regulating mechanism to adjust the pressure of the liquid delivered by the water supply joint, and delivers the pressure-regulated liquid to the fluid channel so that the liquid pressure of each liquid outlet is the same or similar, so that the liquid output of each liquid outlet can be the same or roughly similar, so that the cleaning liquid on the cleaning component is evenly distributed, and then the cleaning component can be evenly cleaned, thereby improving the cleaning effect of the cleaning component.

110: Sewage Drainage Department

111: Sewage pipe

1111: Liquid absorption section

1112: Check section

112: Sewage tank

120: Liquid collection section

130: Heating component

131: Heat conducting plate

132: Heat source

140: Insulation part

141: First heat dissipation hole

150: Bottom cover

160: Filter section

170: Shell

180: Cleaning components

190: Water Supply Department

200: Dust collection unit

210: Guide slope

1000: Clean base station

1100: Machine body/base station body

1200: Base station bottom plate

1300: Fluid replenishment device

1301: Liquid storage mechanism

13011: Liquid storage chamber

1302: Water supply connector

1303: Fluid channel

1304: Liquid outlet

1305: Fluid discharge catheter

1306: First fluid inlet

1307: Fluid outlet

1308: Second fluid inlet

1309:Block

1400: Recycling bin

1500: Liquid supply tank

1600: Dust collection box

1700: Water supply pipeline

2000: Cleaning equipment/sweeping robots

2100: Machine body

2110: Forward part

2120: Backward part

2200: Perception system

2210: Position determination device

2220: Front impact structure

2300: Control module

2400: Walking mechanism

2500: Cleaning system

2510: Dry cleaning system

2520:Side brush

2530: Wet cleaning system

2531: Cleaning parts

2532:Drive unit

2533:Driver Platform

2534: Support platform

2600:Energy system

2700: Human-computer interaction system

3000: Cleaning system

By reading the detailed description of the preferred embodiment below, various other advantages and benefits will become clear to ordinary technical personnel in this field. The accompanying drawings are only used to illustrate the purpose of the preferred embodiment and are not to be considered as limitations of the present case. Moreover, the same reference symbols are used to represent the same components throughout the accompanying drawings. In the accompanying drawings: Figure 1 is a schematic structural diagram of a cleaning base station of an embodiment provided in the present case; Figure 2 is a schematic structural diagram of a sewage pipe of a cleaning base station of an embodiment provided in the present case; Figure 3 is a schematic structural diagram of a working state of a sewage pipe of a cleaning base station of an embodiment provided in the present case; Figure 4 is a schematic structural diagram of another working state of the sewage pipe of a cleaning base station of an embodiment provided in the present case; Figure 5 is a schematic structural diagram of a cleaning base station of another embodiment provided in the present case. Figure 6 is a schematic structural diagram of a heating component of a cleaning base station according to an embodiment of the present invention; Figure 7 is a schematic structural diagram of a partial structure of a cleaning base station according to an embodiment of the present invention in a decomposed state; Figure 8 is a schematic structural diagram of a cross-section of a cleaning base station according to an embodiment of the present invention; Figure 9 is a schematic structural diagram of a sewage trough of a cleaning base station according to an embodiment of the present invention; Figure 10 is a schematic structural diagram of a filter portion of a cleaning base station according to an embodiment of the present invention. FIG11 is a schematic structural diagram of a filter portion of a cleaning base station according to another embodiment of the present invention; FIG12 is a structural diagram of a cleaning base station according to another embodiment of the present invention; FIG13 is a structural diagram of a liquid replenishing device and a water replenishing pipeline according to an embodiment of the present invention assembled together; FIG14 is a structural diagram of a liquid replenishing device according to an embodiment of the present invention; FIG15 is a partial cross-sectional diagram of FIG14; FIG16 is a partial cross-sectional diagram of a liquid replenishing device according to another embodiment of the present invention; FIG17 is a partial cross-sectional view of a liquid replenishing device of another embodiment provided in the present invention; FIG18 is a side cross-sectional view of a liquid replenishing device of an embodiment provided in the present invention; FIG19 is a three-dimensional schematic diagram of a sweeping robot of an embodiment provided in the present invention; FIG20 is a bottom view of a sweeping robot of an embodiment provided in the present invention; FIG21 is a three-dimensional diagram of a wet cleaning system of an embodiment provided in the present invention; FIG22 is a schematic diagram of a cleaning system of an embodiment provided in the present invention.

This case asserts priority to Chinese patent application 202223598654.8 filed on December 30, 2022 and Chinese patent application 202223598639.3 filed on December 30, 2022, the entire contents of which are incorporated herein by reference.

In the following description, a number of specific details are given to provide a more thorough understanding of the present invention. However, it is obvious to a person skilled in the art that the present invention can be implemented without one or more of these details. In other examples, some technical features known in the art are not described to avoid confusion with the present invention.

It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present case. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprising" and/or "including" are used in this specification, they indicate the presence of features, wholes, steps, operations, elements and/or components, but do not exclude the presence or addition of one or more other features, wholes, steps, operations, elements, components and/or combinations thereof.

In order to better understand the above technical solution, the technical solution of the embodiment of this case is described in detail below through the attached figures and specific embodiments. It should be understood that the embodiment of this case and the specific features in the embodiment are detailed descriptions of the technical solution of the embodiment of this case, rather than limitations on the technical solution of this case. In the absence of conflict, the embodiment of this case and the technical features in the embodiment can be combined with each other.

As shown in Figures 1 to 11, according to the first aspect of the embodiment of this case, a cleaning base station is proposed, including: a liquid collecting part 120; a sewage discharge part 110, the sewage discharge part 110 includes a sewage discharge tank 112 and a sewage discharge pipe 111, one end of the sewage discharge pipe 111 is connected to the sewage discharge tank 112, and the other end is connected to the liquid collecting part 120; wherein, the sewage discharge pipe 111 includes a liquid suction section 1111 and a check section 1112, the liquid suction section 1111 is connected to the sewage discharge tank 112 and the liquid collecting part 120, and the check section 1112 is located in the middle section of the liquid suction section 1111.

The cleaning base station provided in the embodiment of this case includes a liquid collecting part 120 and a sewage discharge part 110, the sewage discharge part 110 includes a sewage discharge pipe 111 and a sewage discharge tank 112, and the sewage discharge pipe 111 includes a liquid suction section 1111 and a non-return section 1112. During use, after completing the cleaning task, the cleaning device 2000 (see Figures 19 and 20) of the cleaning system 3000 can be returned to the cleaning base station for cleaning; the sewage after cleaning can be discharged into the liquid collecting part 120 through the sewage discharge part 110, and the sewage can be uniformly stored through the liquid collecting part 120; the sewage generated by the cleaning can be better received through the sewage discharge tank 112, and the sewage overflow can be avoided; the sewage discharge pipe 111 is set It is convenient to discharge sewage to the liquid collecting part 120; and a check section 1112 is set on the sewage pipe 111, and the check section 1112 can prevent sewage from flowing back, thereby making the liquid discharge of the sewage part 110 more thorough, reducing the liquid residue on the sewage part 110, and thus greatly reducing the probability of sewage residue in the narrow space at the bottom of the cleaning base station, breeding bacteria and producing odor, making the use of the cleaning base station cleaner and more hygienic, and improving the user experience.

As shown in Figures 3 and 4, the shadows in Figures 3 and 4 represent sewage. The pipe body on the right side of Figures 3 and 4 is used to connect with the liquid collecting part 120. In Figure 3, the working state of the sewage pipe is that the power source applies suction to the sewage, and the sewage is attracted; while in Figure 4, the power source stops attracting the sewage, the sewage loses suction, and the sewage will be stored in the non-return section 1112 under the action of gravity.

In some examples, in order to facilitate the full discharge of the liquid in the sewage tank 112, the cleaning base station may also include a pump body, through which the gas in the liquid collecting part 120 is extracted to form a negative pressure, thereby sucking the sewage in the sewage tank 112 into the liquid collecting part 120. By turning on the pump body, the sewage in the sewage tank 112 can be discharged by using negative pressure, and the sewage discharge effect is better.

It is understandable that in order to improve the mechanical strength of the sewage pipe 111, the liquid suction section 1111 and the check section 1112 of the sewage pipe 111 can be an integrated structure.

As shown in FIGS. 2 to 4 , in some embodiments, the non-return section 1112 includes at least one bend.

In this technical solution, a check section 1112 is further provided. The check section 1112 may include a bend. This configuration is based on the consideration that when the power source loses power when the traditional technology is used to pump sewage, the liquid stored in the sewage pipe 111 will flow back to the drainage tank under the action of gravity, thereby causing the liquid in the drainage tank to be incompletely discharged, making it impossible to completely drain the residual sewage and dirt when pumping sewage and dirt, resulting in more residuals and easy to produce a rotten odor.

In some embodiments, the bend includes at least one of an S-shaped bend, a V-shaped bend, or a U-shaped bend.

The sewage pipe 111 of the cleaning base station provided in the embodiment of this case is provided with one or more of the bent portion, S-shaped bend or U-shaped bend. When the power source loses power, the bent portion, S-shaped bend or U-shaped bend can store the backflowing liquid; on the one hand, the stored liquid will not backflow into the sewage tank 112, thereby making the sewage on the sewage tank 112 more thoroughly sucked, reducing the probability of liquid accumulation on the sewage tank 112; on the other hand, the liquid stored in the bent portion, S-shaped bend or U-shaped bend can play a role in blocking the sewage pipe 111, which can reduce the probability of odor emission, making the use of the cleaning base station more hygienic and tidy.

In some embodiments, there are two or more check segments 1112. By providing two or more check segments 1112, the check effect of the liquid can be further improved, and the backflow of the liquid to the drain tank 112 can be further suppressed.

As shown in FIG. 9 , in some embodiments, the bottom surface of the drain trough 112 is inclined, a drain outlet is formed on the drain trough 112, and the drain pipe 111 is connected to the drain outlet.

In this technical solution, the bottom surface of the sewage trough 112 is inclined, which is more conducive to the discharge of sewage into the sewage pipe 111, and is more convenient for the discharge of sewage. At the same time, it can reduce the total amount of sewage accumulation, thereby greatly inhibiting the growth of bacteria and greatly reducing the probability of producing odors, making the use of the cleaning base station cleaner and more hygienic, and can improve the user experience.

As shown in FIG. 9 , in some examples, the sewage tank 112 may be funnel-shaped, which makes it easier to discharge sewage.

As shown in FIG6 and FIG7, in some embodiments, the cleaning base station further includes a filter portion 160. The filter portion 160 covers the sewage discharge portion 110, and a plurality of through holes are formed on the filter portion 160.

In this technical solution, the cleaning base station may also include a filter 160. The filter 160 covers the sewage tank 112, and a plurality of through holes are formed on the filter 160. During the working process, the sewage generated after cleaning can first flow through the filter 160 for preliminary filtration, and then enter the sewage tank 112. Such a setting can make the particle garbage in the sewage be intercepted by the filter 160, and can avoid the sewage tank 112 and the sewage pipe 111 from being blocked.

As shown in FIG. 10 and FIG. 11 , in some embodiments, the density of the through holes is positively correlated with the depth of the drain groove 112.

In some examples, the through holes on the filter part 160 can, on the one hand, play a filtering role; on the other hand, it is convenient for the sewage in the sewage part 110 to generate water vapor after being heated, so the distribution of the through holes on the filter part 160 can be uneven. For example, the lower the water level of the sewage part 110, the denser the distribution of through holes. This setting takes into account that the deeper the depth of the sewage tank 112, the greater the liquid flow. Therefore, the denser the through holes are arranged, the better the filtering effect can be.

As shown in Figures 5 to 8, in some embodiments, the cleaning base station further includes a heating component 130. The heating component 130 is disposed on one side of the sewage trough 112 to provide heat energy for the sewage trough 112.

In this technical solution, considering that a small amount of liquid may be stored in the sewage tank 112, the cleaning base station provided in the embodiment of this case may also include a heating component 130. During operation, after completing the cleaning task, the cleaning device 2000 of the cleaning system 3000 can return to the cleaning base station for cleaning. The sewage after cleaning can be discharged into the liquid collecting part 120 through the sewage discharge part 110. The sewage can be uniformly stored through the liquid collecting part 120. However, some sewage will still be stored in the sewage discharge part 110, and the sewage tank 112 is often open, which is easy to breed bacteria and produce odor. Based on this, the cleaning base station provided by the embodiment of this case can turn on the heating component 130 to provide heat energy for the sewage tank 112, so that the liquid accumulated in the sewage tank 112 is dried, thereby greatly inhibiting the growth of bacteria and greatly reducing the probability of generating odor, making the use of the cleaning base station cleaner and more hygienic, and improving the user experience.

In this technical solution, the heating component 130 is arranged on one side of the drain tank 112. This arrangement allows the heating component 130 to be in contact with the drain tank 112, which is conducive to the heat energy of the heating component 130 directly acting on the drain tank 112, which can improve the heat transfer efficiency and thus improve the drying efficiency of the stored liquid.

As shown in FIG. 7 and FIG. 8 , in some embodiments, the heating assembly 130 includes: a heat conducting plate 131, which is disposed on one side of the drain trough 112 and is used to provide heat energy for the drain trough 112; a heat source 132, which is disposed on the side of the heat conducting plate 131 away from the drain trough 112 and is used to provide heat energy for the heat conducting plate 131; wherein the heat conducting plate 131 is made of metal material, and the thickness of the heat conducting plate 131 is 0.8 mm to 3 mm.

In this technical solution, a structural composition of a heating component 130 is further provided; the heating component 130 may include a heat conducting plate 131 and a heat source 132. The heat source 132 may provide heat energy to the heat conducting plate 131, and the heat energy may be transferred to the drain tank 112 through the heat conducting plate 131; based on this, the sewage in the drain tank 112 may be dried. By setting the heat conducting plate 131 and the heat source 132, the heat source 132 may be prevented from directly contacting the drain tank 112, and the permeate may be prevented from entering the heat source 132, thereby improving the stability of the base station cleaning operation.

In this technical solution, the heat conducting plate 131 is made of metal material, so that the heat conducting plate 131 can transfer heat energy to the drain tank 112.

In this technical solution, the heat conducting plate 131 is arranged on one side of the drain trough 112, and the heat source 132 is arranged on the side of the heat conducting plate 131 away from the drain trough 112. This arrangement allows the heat conducting plate 131 to contact the wall of the drain trough 112, which is conducive to the heat energy of the heat conducting plate 131 directly acting on the drain trough 112, which can improve the heat transfer efficiency and thus improve the drying efficiency of the stored liquid.

In this technical solution, the heat source 132 is arranged on the side of the heat conductive plate 131 away from the drain tank 112, so that the heat energy of the heat source 132 can directly act on the heat conductive plate 131; at the same time, the heat conductive plate 131 can be arranged to separate the heat source 132 and the heat conductive plate 131, so as to protect the heat source 132, prevent the heat source 132 from being contaminated by water vapor or dirt, and improve the service life of the heating component 130.

In this technical solution, the thickness of the heat conducting plate 131 is 0.8mm to 3mm, which can ensure the heat conduction efficiency and evenly supply the heat energy to the drain tank 112. If the thickness of the heat conducting plate 131 is less than 0.8mm, it may cause uneven heat output, and some areas of the drain tank 112 cannot effectively dry the sewage; if the thickness of the heat conducting plate 131 is greater than 3mm, the heat conduction efficiency will be reduced and the power consumption of the heat source 132 will increase.

In some examples, in order to further improve the heat conduction efficiency, the heat conducting plate 131 can be made of aluminum.

In some examples, the heat source 132 can be a point heating heat source 132 or a surface heating heat source 132. For example, the heat source 132 can be a heating film so that heat energy is evenly supplied to the heat conducting plate 131.

In some embodiments, the drain tank 112 is made of a heat-conducting material, and the heating assembly 130 includes a heat source 132, which is disposed on one side of the drain tank 112 to provide heat for the drain tank 112.

In this technical solution, the drain tank 112 can be made of a heat-conducting material. The heat energy of the heat source 132 can be directly transferred to the drain tank 112. This arrangement is conducive to simplifying the structure of the cleaning base station, especially the structure of the heating component 130, that is, the heating component 130 may not include the heat-conducting plate 131 but only include the heat source 132.

As shown in FIG8 and FIG9, in some embodiments, the cleaning base station further includes: a heat insulating portion 140, which is disposed on a side of the heating assembly 130 away from the sewage discharge portion 110.

In this technical solution, the cleaning base station may also include a heat insulation part 140. Through the provision of the heat insulation part 140, heat energy can be output to the sewage discharge part 110, greatly reducing the waste of heat energy, reducing the energy consumption of the cleaning base station, and thus improving the user experience.

In some embodiments, the heat insulation part 140 includes: a first heat insulation layer, which is arranged on a side of the heating assembly 130 away from the sewage discharge part 110; wherein a avoidance part is formed on the first heat insulation layer, and the avoidance part is used to avoid the device on the heating assembly 130.

In this technical solution, a structural composition of the heat insulation part 140 is further provided. The heat insulation part 140 may include a first heat insulation layer, and the first heat insulation layer may be attached to the side of the heating assembly 130 away from the sewage part 110. Based on this, the heat energy will be more easily output to the sewage part 110, which can greatly reduce the waste of heat energy, reduce the energy consumption of the cleaning base station, and thus improve the user experience. The liquid stored in the sewage part 110 can be dried, thereby greatly inhibiting the growth of bacteria, greatly reducing the probability of generating odor, making the use of the cleaning base station cleaner and more hygienic, and improving the user experience.

In this technology, an escape portion is formed on the first heat insulation layer. This arrangement can escape the components of the heating component 130; for example, the fuse, reserved NTC, and terminal glue protrusion on the heating component 130 can be escaped, making the operation of the heating component 130 more stable.

As shown in FIG. 9 , in some embodiments, the heat insulating portion 140 includes: a first air gap formed on a side of the heating assembly 130 away from the sewage discharge portion 110; and a first heat dissipation hole 141 opened on the side of the cleaning base station and connected to the first air gap.

In this technical solution, a structural composition of the heat insulation part 140 is further provided. The heat insulation part 140 may include a first air gap. The thermal conductivity of air is low, and the heat insulation cost is low through the formation of the first air gap, which can greatly reduce the waste of heat energy, reduce the energy consumption of the cleaning base station, and thus improve the user experience. The liquid stored in the sewage part 110 can be dried, thereby greatly inhibiting the growth of bacteria, greatly reducing the probability of generating odor, making the use of the cleaning base station cleaner and more hygienic, and improving the user experience.

In this technical solution, the heat insulation part 140 may also include a first heat dissipation hole 141. The first heat dissipation hole 141 is opened on the side of the cleaning base station and is connected to the air gap. Such a setting can play a role in heat dissipation, can avoid the heat energy being directly output to the user's floor, and can further improve the user experience.

In some embodiments, the heat insulating part 140 includes: a second heat insulating layer, which is disposed on the side of the heating component 130 away from the sewage discharge part 110; a second air gap, which is formed on the side of the heating component 130 away from the sewage discharge part 110; a second heat dissipation hole, which is opened on the side of the cleaning base station and connected to the air gap; wherein a avoidance part is formed on the second heat insulating layer, and the avoidance part is used to avoid the device on the heating component 130.

In this technical solution, a structural composition of the heat insulation part 140 is further provided. The heat insulation part 140 may include a second heat insulation layer and a second air gap. The heat insulation layer may be attached to the side of the heating assembly 130 away from the sewage discharge part 110; based on this, the heat energy will be more easily output to the sewage discharge part 110, which can greatly reduce the waste of heat energy, can reduce the energy consumption of the cleaning base station, and thus improve the user experience, can dry the liquid stored in the sewage discharge part 110, and thus greatly inhibit the growth of bacteria, greatly reduce the probability of generating odor, make the use of the cleaning base station cleaner and more hygienic, and can improve the user experience. The thermal conductivity of air is low, and the cost of heat insulation through the formation of the second air gap is low, which can greatly reduce the waste of heat energy, reduce the energy consumption of the cleaning base station, and thus improve the user experience. The liquid accumulated in the sewage discharge part 110 can be dried, thereby greatly inhibiting the growth of bacteria, greatly reducing the probability of producing odor, making the use of the cleaning base station cleaner and more hygienic, and improving the user experience. The heat insulation effect can be improved by setting the second insulation layer and the second air gap. The insulation part 140 can also include a second heat dissipation hole, which is opened on the side of the cleaning base station and connected to the second air gap. This setting can play a role in heat dissipation, preventing heat from being directly output to the user's floor, and further improving the user experience.

In this technology, an escape portion is formed on the second heat insulation layer. This arrangement can escape the components of the heating component 130; for example, the fuse, reserved NTC, and terminal glue protrusion on the heating component 130 can be escaped, making the operation of the heating component 130 more stable.

As shown in FIG5 , in some embodiments, the cleaning base station further includes: a housing 170, on which the sewage discharge part 110, the liquid collecting part 120 and the heating component 130 are arranged; a cleaning component 180, which is movably connected to the housing 170; a water supply part 190, which is connected to the cleaning component 180; a dust collecting part 200, which is arranged on the housing 170 and is connected to the sewage discharge part 110; and a guide slope 210, which is arranged on the housing 170, and one end of the guide slope 210 is directed to the cleaning component 180.

In this technical solution, the cleaning station can also include a housing 170, a cleaning component 180, a water supply unit 190, a dust collecting unit 200 and a guide slope 210. The housing 170 provides an installation location for the sewage discharge unit 110, the liquid collecting unit 120 and the heating component 130. During the working process, after the cleaning device 2000 of the cleaning system 3000 completes the cleaning task, the cleaning device 2000 returns to the cleaning station through the guide slope 210 to start the dust collection and cleaning action; at this time, the water supply unit 190 supplies water to the cleaning component 180, and the cleaning component 180 reciprocates to automatically clean the rag of the cleaning device 2000; the generated sewage passes through the sewage discharge unit 110. 0The air pump generates negative pressure to pump the sewage to the liquid collecting part 120, and a small amount of sewage remains in the sewage discharge part 110; the heating component 130 dries the residual sewage by heating and evaporation, and collects the dust through the dust collecting part 200, thereby greatly inhibiting the growth of bacteria and greatly reducing the probability of generating odor, making the use of the cleaning base station cleaner and more hygienic, which can improve the user experience.

As shown in FIG. 22 , according to the second aspect of the embodiment of the present case, a cleaning system 3000 is proposed, comprising: a cleaning base station 1000 as in any of the above-mentioned technical solutions; a cleaning device 2000, wherein the cleaning base station 1000 is used to clean the cleaning device 2000; wherein the cleaning device 2000 may be a sweeping robot. In one embodiment, after completing the cleaning task, the sweeping robot moves toward the cleaning base station 1000 until the sweeping robot is positioned above the guide slope 210 of the cleaning base station 1000 and contacts the cleaning component 180 of the cleaning device 2000, so that the cleaning component 180 can automatically clean the cleaning components of the cleaning device 2000, thereby realizing the cleaning of the cleaning device 2000 by the cleaning base station 1000.

The cleaning system 3000 provided in the embodiment of this case includes the cleaning base station of any of the above technical solutions, so the cleaning system 3000 has all the beneficial effects of the cleaning base station 1000 of the above technical solutions.

In some examples, the cleaning system 3000 may further include a cleaning device 2000, which may be a cleaning robot 2000. The cleaning base station 1000 of the cleaning system 3000 provided in the present embodiment includes a liquid collecting portion 120 and a sewage discharge portion 110, the sewage discharge portion 110 includes a sewage discharge pipe 111 and a sewage discharge tank 112, and the sewage discharge pipe 111 includes a liquid suction section and a check section 1112. During use, the cleaning device 2000 of the cleaning system 3000 can be returned to the cleaning base station for cleaning after completing the cleaning task; the sewage after cleaning can be discharged into the liquid collecting part 120 through the sewage discharge part 110, and the sewage can be uniformly stored through the liquid collecting part 120; the sewage generated by the cleaning can be better received by the sewage tank 112, and the sewage overflow can be avoided; the sewage can be easily discharged through the sewage pipe 111. The wastewater is discharged to the liquid collecting part 120; and a check section 1112 is provided on the wastewater discharge pipe 111. The check section 1112 can prevent the wastewater from flowing back, thereby making the liquid discharge of the wastewater discharge part 110 more thorough, reducing the liquid residue on the wastewater discharge part 110, and thus greatly reducing the probability of wastewater residue in the narrow space at the bottom of the cleaning base station, breeding bacteria and producing odor, making the use of the cleaning base station cleaner and more hygienic, and improving the user experience.

As shown in Figures 12 to 21, the embodiment of the present case also provides a cleaning base station 1000 and a cleaning robot system, wherein the cleaning robot system includes a cleaning robot and a cleaning base station 1000, the cleaning robot includes a cleaning component, and the liquid replenishing device 1300 of the cleaning base station 1000 is used to spray liquid to the cleaning component, that is, the cleaning base station 1000 is used in conjunction with the cleaning robot.

The cleaning robot can be a sweeping robot, a mopping robot, a floor polishing robot or a lawn mower robot. For ease of description, this embodiment takes the sweeping robot 2000 as an example to describe the technical solution of this case.

As shown in Figures 19 and 20, the sweeping robot 2000 may include a machine body 2100, a sensing module 2200, a controller, a driving module, a cleaning system 2500, an energy system, and a human-machine interaction module 2300. As shown in Figure 12, the machine body 2100 includes a forward portion 2110 and a rearward portion 2120, which have an approximately circular shape (both the front and rear are circular), and may also have other shapes, including but not limited to an approximately D-shaped shape with a front and rear circular shape and a rectangular or square shape with a front and rear.

As shown in FIG. 19 , the sensing module 2200 includes a position determination device 2210 located on the machine body 2100, a collision sensor disposed on the front collision structure 2220 of the front portion 2110 of the machine body 2100, a short-distance sensor (wall sensor) located on the side of the machine, a carpet detection device disposed at the bottom of the machine body 2100, and a magnetometer, accelerometer, gyroscope, odometer and other sensing devices disposed inside the machine body 2100, for providing various position information and motion status information of the machine to the controller. The position determination device 2210 includes but is not limited to a camera and a laser distance sensor (LDS, full name Laser Distance Sensor). In some preferred implementations, the position determination device 2210 (such as a camera or a laser sensor) is located at the front side of the machine body 2100, that is, at the front end of the forward portion 2110, so as to more accurately sense the environment in front of the cleaning robot and achieve precise positioning.

As shown in FIG19 , the forward portion 2110 of the machine body 2100 can carry the front collision structure 2220. During the cleaning process, the driving wheel module 2410 pushes the sweeping robot 2000 to walk on the ground. The front collision structure 2220 detects one or more events in the driving path of the sweeping robot 2000 through the sensor system arranged thereon, such as a collision sensor or a proximity sensor (infrared sensor). The sweeping robot 2000 can control the driving module to make the sweeping robot 2000 respond to the event, such as moving away from the obstacle and performing obstacle avoidance operations, etc., through the event detected by the front collision structure 2220, such as an obstacle or a wall.

The controller is disposed on a circuit board in the machine body 2100, and includes a computing processor, such as a central processing unit and an application processor, that communicates with a non-temporary storage device, such as a hard disk, a flash memory, or a random access memory. The application processor utilizes a positioning algorithm, such as a real-time positioning and mapping algorithm (SLAM, full name Simultaneous Localization And Mapping), based on obstacle information fed back from a laser ranging device to draw a real-time map of the environment in which the sweeping robot 2000 is located. In addition, the distance information and speed information fed back by the sensors, carpet detection devices, magnetometers, accelerometers, gyroscopes, odometers and other sensing devices installed on the front collision structure 2220 are comprehensively judged to determine the current working state and location of the sweeping robot 2000, as well as the current posture of the sweeping robot 2000, such as passing the threshold, being on the carpet, the dust box is full, being picked up, etc., and specific next action strategies are given for different situations, so that the sweeping robot 2000 has better cleaning performance and user experience.

As shown in FIG20 , the drive module can manipulate the machine body 2100 to travel across the ground based on the drive command with distance and angle information. The drive module includes a main drive wheel module, which can control the left wheel 2400 and the right wheel 2410. In order to more accurately control the movement of the machine, it is preferred that the main drive wheel module includes a left drive wheel module and a right drive wheel module. The left and right drive wheel modules are arranged along the transverse axis defined by the machine body 2100. In order to enable the sweeping robot 2000 to move more stably or have stronger movement ability on the ground, the sweeping robot 2000 may include one or more driven wheels 2420, and the driven wheels 2420 include but are not limited to universal wheels. The main driving wheel module includes a driving motor and a control circuit for controlling the driving motor. The main driving wheel module can also be connected to a circuit for measuring the driving current and an odometer. In addition, the left wheel 2400 and the right wheel 2410 may have a biased drop-type suspension system, which is fastened in a movable manner, for example, rotatably attached to the machine body 2100, and receives a spring bias that is biased downward and away from the machine body 2100. The spring bias allows the drive wheels to maintain contact and traction with the ground with a certain ground force, while the cleaning elements of the SweeperRobot 2000 also contact the ground with a certain pressure.

The energy system includes a rechargeable battery, such as a nickel-metal hydride battery and a lithium battery. The rechargeable battery can be connected to a charging control circuit, a battery pack charging temperature detection circuit, and a battery undervoltage monitoring circuit, and the charging control circuit, the battery pack charging temperature detection circuit, and the battery undervoltage monitoring circuit are further connected to the single-chip control circuit. The host is charged by connecting the charging pole 2600 disposed on the side or bottom of the fuselage to the charging pile.

The human-machine interaction module 2300 includes buttons on the host panel for users to select functions; it may also include a display screen and/or indicator lights and/or speakers, which display the current machine mode or function options to the user; it may also include a mobile client program. For the path navigation type automatic sweeping robot 2000, the mobile client can show the user a map of the environment where the device is located and the location of the machine, and can provide the user with more abundant and humanized functions. Specifically, the cleaning robot has multiple modes, such as working mode, self-cleaning mode, etc. The working mode refers to the mode in which the cleaning robot performs automatic cleaning operations, and the self-cleaning mode refers to the mode in which the cleaning robot removes dirt from the roller brush and the side brush 2520 on the base, automatically collects the dirt, and/or automatically washes and dries the mop.

The cleaning system 2500 may be a dry cleaning system 2510 and/or a wet cleaning system 2530.

As shown in FIG. 20 , the dry cleaning system 2510 provided in the embodiment of the present case may include, in addition to cleaning components (such as roller brushes), a dust box, a fan, and an air outlet. The roller brush that has a certain interference with the ground sweeps up the garbage on the ground and rolls it to the front of the dust suction port between the roller brush and the dust box, and then is sucked into the dust box by the suction gas generated by the fan and passing through the dust box. The dry cleaning system 2510 may also include a side brush 2520 with a rotating shaft, which is at a certain angle relative to the ground to move debris into the roller brush area of the cleaning system 2500.

As shown in Figures 20 and 21, the wet cleaning system 2530 provided in the embodiment of this case may include a driving unit 2532, a water supply mechanism, a liquid storage tank, etc., in addition to the cleaning component 2531. Among them, the cleaning component 2531 can be arranged below the liquid storage tank, and the cleaning liquid inside the liquid storage tank is transmitted to the cleaning component 2531 through the water supply mechanism, so that the cleaning component 2531 performs wet cleaning on the surface to be cleaned. In other embodiments of this case, the cleaning liquid inside the liquid storage tank can also be directly sprayed onto the surface to be cleaned, and the cleaning component 2531 cleans the surface by evenly applying the cleaning liquid.

Among them, the cleaning component 2531 is used to clean the surface to be cleaned, and the driving unit 2532 is used to drive the cleaning component 2531 to basically reciprocate along the target surface, and the target surface is a part of the surface to be cleaned. The cleaning component 2531 reciprocates along the surface to be cleaned, and a mop is provided on the contact surface between the cleaning component 2531 and the surface to be cleaned. The driving unit 2532 drives the mop of the cleaning component 2531 to reciprocate and generate high-frequency friction with the surface to be cleaned, thereby removing the dirt on the surface to be cleaned; or the mop can be arranged in a floating manner, and always maintains contact with the cleaning surface during the cleaning process, without the need for the driving unit 2532 to drive its reciprocating motion.

As shown in FIG. 21 , the driving unit 2532 may also include a driving platform 2533 and a supporting platform 2534. The driving platform 2533 is connected to the bottom surface of the machine body 1100 to provide driving force. The supporting platform 2534 is detachably connected to the driving platform 2533 to support the cleaning component 2531 and can be lifted and lowered under the drive of the driving platform 2533.

Among them, the wet cleaning system 2530 can be connected to the machine body 1100 through an active lifting module. When the wet cleaning system 2530 is not temporarily involved in the work, for example, the sweeping robot 2000 stops at the cleaning base station 1000 to clean the cleaning components 2531 of the wet cleaning system 2530 and fill the liquid storage tank with water; or when encountering a surface to be cleaned that cannot be cleaned by the wet cleaning system 2530, the wet cleaning system 2530 is lifted through the active lifting module.

In the embodiment provided in this case, as shown in FIG. 12, FIG. 13 and FIG. 14, the cleaning base station 1000 includes a liquid replenishing device 1300, and the liquid replenishing device 1300 includes a water supply connector 1302, a pressure regulating mechanism and a liquid outlet device; the liquid outlet device includes a fluid channel 1303, and the fluid channel 1303 is provided with a plurality of liquid outlets 1304 arranged along the length direction of the fluid; the water supply connector 1302 is connected to the fluid channel 1303 through the pressure regulating mechanism, and the pressure regulating mechanism is used to adjust the pressure of the liquid transported by the water supply connector 1302, and transport the pressure-regulated liquid to the fluid channel 1303, so that the liquid pressure of each liquid outlet 1304 is the same or similar.

In a specific application, the cleaning base station 1000 further includes a base station body 1100 and a base station bottom plate 1200, the front end of the base station bottom plate 1200 is connected to the base station body 1100, and the base station bottom plate 1200 includes an inclined portion arranged upwardly from the back to the front, wherein the front and rear direction of the cleaning base station 1000 is as shown by the arrow in FIG1, that is, the front and rear direction of the cleaning base station 1000 is consistent with the movement direction of the cleaning robot when it docks at the cleaning base station 1000. The inclined portion is used to guide the cleaning robot to move to a suitable position of the cleaning base station 1000 to perform other operations such as cleaning and charging. Among them, the front end of the base station bottom plate 1200 is connected to the base station body 1100. Specifically, the front end of the base station bottom plate 1200 can be connected to the base station body 1100 by welding, integral molding, or other methods that meet the requirements. This case does not make specific limitations.

As shown in Figures 12 and 13, the base station body 1100 is also provided with a dust box 1600, a liquid supply box 1500 and a recycling box 1400. Among them, the dust box 1600, the liquid supply box 1500 and the recycling box 1400 can be any shape such as a cylinder, a cuboid, a sphere, etc. When the cleaning robot is docked on the cleaning base station 1000 for charging/cleaning and other operations, the dust box of the cleaning robot is connected to the dust box 1600. The dust box 1600 is used to collect garbage in the dust box of the cleaning robot docked on the base station, so that the garbage cleaned by the cleaning robot after cleaning is transferred to the dust box 1600. The recycling box 1400 can collect the sewage generated by cleaning the cleaning components through suction components such as suction pumps.

The liquid replenishing device 1300 in this case is arranged on the base station bottom plate 1200, so as to spray the cleaning liquid onto the cleaning parts of the cleaning robot. The liquid supply tank 1500 can be connected to the water supply connector 1302 of the liquid replenishing device 1300 through the water replenishing pipeline 1700, so that the cleaning liquid in the liquid supply tank 1500 is transported to the pressure regulating mechanism through the water replenishing pipeline 1700 and the water supply connector 1302, and then the pressure regulating mechanism regulates the pressure of the transported cleaning liquid, so that the pressure of the cleaning liquid tends to be stable, and then transported to the fluid channel 1 of the liquid outlet device. 303, and discharged from each liquid outlet 1304, so that the cleaning liquid is treated by the pressure regulating mechanism to make the liquid pressure of each liquid outlet 1304 the same or similar, so that the liquid output of each liquid outlet 1304 can be the same or roughly similar, so that the cleaning liquid on the cleaning parts is evenly distributed, and then the cleaning parts can be evenly cleaned, improving the cleaning effect of the cleaning parts.

It is understandable that the water supply pipeline 1700 can be a flexible pipeline, so that the water supply pipeline 1700 can be bent according to the actual layout requirements to avoid other components. The cleaning liquid can be clean water, cleaning agent or a mixture of the two. The length of the fluid channel 1303 and the number of liquid outlets 1304 can be set by the staff according to the length of the cleaning component, and this embodiment does not strictly limit it. Furthermore, the intervals between the liquid outlets 1304 are the same, so that the cleaning liquid is sprayed more evenly.

Specifically, as shown in FIG14 , the pressure regulating mechanism includes a liquid storage mechanism 1301 having a liquid storage chamber 13011, and the liquid storage mechanism 1301 is connected to a water supply connector 1302 and a fluid channel 1303, respectively.

The cleaning liquid delivered by the water supply pipe 1700 and the water supply connector 1302 first flows into the liquid storage chamber 13011 of the liquid storage mechanism 1301, and the liquid storage chamber 13011 greatly reduces the liquid pressure of the cleaning liquid, thereby playing a role in stabilizing the pressure. Then, the cleaning liquid after the pressure stabilization enters the fluid channel 1303 and is discharged from each liquid outlet 1304. In this way, the cleaning liquid is stabilized by the pressure regulating mechanism, so that the liquid pressure of each liquid outlet 1304 is the same or similar, so that the liquid output of each liquid outlet 1304 can be the same or roughly similar, so that the cleaning liquid on the cleaning parts is evenly distributed, and then the cleaning parts can be evenly cleaned, thereby improving the cleaning effect of the cleaning parts.

Furthermore, as shown in Figures 15 to 17, a fluid outlet 1307 is provided on the upper portion of the side wall of the liquid storage chamber 13011, and the fluid outlet 1307 is connected to the fluid channel 1303.

The fluid outlet 1307 is arranged above the side wall of the liquid storage chamber 13011, so that when the liquid level of the cleaning liquid in the liquid storage chamber 13011 rises to the fluid outlet 1307, it can flow into the fluid channel 1303 through the fluid outlet 1307, so that the cleaning liquid can be fully pressure-stabilized in the liquid storage chamber 13011, thereby improving the pressure-stabilizing effect.

Furthermore, in some possible implementations, as shown in FIG15 , a first fluid inlet 1306 is provided at the lower portion of the side wall of the liquid storage chamber 13011, and the first fluid inlet 1306 is connected to the water supply connector 1302.

Placing the first fluid inlet 1306 at the lower part of the side wall of the liquid storage chamber 13011 can ensure that all the cleaning liquid flowing through the water supply connector 1302 and the first fluid inlet 1306 flows into the liquid storage chamber 13011 for pressure stabilization, thereby achieving a better pressure stabilization effect.

In some other possible implementations, as shown in FIG. 16 and FIG. 17 , a second fluid inlet 1308 is provided on the upper portion of the side wall of the liquid storage chamber 13011, and the second fluid inlet 1308 is connected to the water supply connector 1302.

The second fluid inlet 1308 is arranged at the upper part of the side wall of the liquid storage chamber 13011, so that the gravity of the cleaning liquid can be utilized to make it pass through the second fluid inlet 1308 faster and enter the liquid storage chamber 13011, thereby improving the pressure stabilization efficiency.

In this implementation, as shown in FIG17 , a baffle 1309 is also provided in the liquid storage chamber 13011 to form a curved flow channel in the liquid storage chamber 13011.

The curved flow channel can provide a certain resistance to the cleaning liquid flowing into the liquid storage chamber 13011, thereby slowing down the flow rate of the cleaning liquid and further playing a role in stabilizing pressure. Therefore, the curved flow channel formed in the liquid storage chamber 13011 can make the pressure stabilizing effect of the pressure stabilizing mechanism better.

Specifically, as shown in FIG. 17 , the baffle 1309 is disposed opposite to the second fluid inlet 1308 , and the baffle 1309 is connected to the top wall and the side wall of the liquid storage chamber 13011 , and a gap is provided between the bottom of the baffle 1309 and the bottom surface of the liquid storage chamber 13011 .

A gap is provided between the bottom of the baffle 1309 and the bottom surface of the liquid storage chamber 13011, so that the liquid storage chamber 13011 is divided into a connecting device with two sub-chambers. In this way, the curved flow channel formed by the baffle 1309 can be used to reduce the speed and stabilize the pressure of the cleaning liquid, and the liquid levels of the two sub-chambers can be ensured to be the same, thereby avoiding the obstruction of the baffle 1309, so that the liquid level of the sub-chamber where the second fluid inlet 1308 is located is high, while the liquid level of the sub-chamber where the outlet is located is low, resulting in the cleaning liquid after pressure stabilization being discharged from the fluid outlet 1307 into the fluid channel 1303 too slowly.

Furthermore, in the above embodiment, as shown in FIG. 18 , each liquid outlet 1304 is located above the side wall of the fluid channel 1303.

The liquid outlet 1304 is arranged above the side wall of the fluid channel 1303, and the fluid channel 1303 is used as a pressure stabilization cavity, so that the cleaning liquid entering the fluid channel 1303 is first pressure-stabilized again in the cavity formed by the fluid channel 1303, further improving the pressure stabilization effect. Then, when the liquid level of the cleaning liquid reaches the height of the liquid outlet 1304, the cleaning liquid that has undergone secondary pressure stabilization is discharged from each liquid outlet 1304.

Furthermore, as shown in FIG. 12 and FIG. 18 , each liquid outlet 1304 is also provided with a liquid outlet conduit 1305 , and each liquid outlet conduit 1305 is inclined upward relative to the fluid channel 1303 .

The liquid outlet conduit 1305 serves to drain the cleaning liquid discharged from the liquid outlet 1304, so that the cleaning liquid can be sprayed more accurately onto the cleaning parts of the cleaning robot, thereby improving the utilization rate of the cleaning liquid and the cleaning effect. In addition, the liquid outlet conduit 1305 also serves to re-regulate the pressure of the cleaning liquid to ensure that the cleaning liquid has a more stable flow rate when flowing out of the liquid outlet conduit 1305.

Furthermore, the water supply connector 1302, the pressure regulating mechanism and the liquid outlet device are integrally formed, thereby eliminating the assembly step, improving production efficiency, avoiding the occurrence of liquid leakage caused by seams, and improving sealing.

In this case, the terms "first", "second", and "third" are used only for descriptive purposes and cannot be understood as indicating or implying relative importance; the term "plurality" refers to two or more, unless otherwise clearly defined. The terms "installation", "connection", "connection", "fixation" and the like should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; "connection" can be a direct connection or an indirect connection through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in this case can be understood according to the specific circumstances.

In the description of this case, it should be understood that the directions or positional relationships indicated by the terms "upper", "lower", "left", "right", "front", "back", etc. are based on the directions or positional relationships shown in the attached figures, and are only for the convenience of describing this case and simplifying the description, rather than indicating or implying that the device or unit referred to must have a specific direction, be constructed and operated in a specific direction, and therefore, cannot be understood as a limitation on this case.

In the description of this specification, the description of the terms "one embodiment", "some embodiments", "specific embodiments", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the case. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in an appropriate manner.

The above is only a preferred embodiment of this case and is not intended to limit this case. For technical personnel in this field, this case can have various changes and modifications. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of this case should be included in the scope of protection of this case.

111: Sewage pipe

112: Sewage tank

120: Liquid collection section

170: Shell

210: Guide slope

1111: Liquid absorption section

1112: Check section

Claims (26)

A cleaning base station includes: a liquid collecting part; and a sewage discharge part, the sewage discharge part includes a sewage discharge trough and a sewage discharge pipe, one end of the sewage discharge pipe is connected to the sewage discharge trough, and the other end is connected to the liquid collecting part, wherein the sewage discharge pipe includes a liquid suction section and a non-return section, the liquid suction section is connected to the sewage discharge trough and the liquid collecting part, and the non-return section is located in the middle section of the liquid suction section. A cleaning base station as claimed in claim 1, wherein the non-return section includes at least one bend. A cleaning base station as claimed in claim 2, wherein the bend portion includes at least one of an S-shaped bend, a V-shaped bend and a U-shaped bend. A cleaning base station as in claim 2, wherein the number of the non-return segments is two or more. As in the cleaning base station of claim 1, the bottom surface of the sewage trough is inclined, a sewage outlet is formed on the sewage trough, and the sewage pipe is connected to the sewage outlet. The cleaning base station of any one of claims 1 to 5 further includes a filter portion, which covers the sewage trough and has a plurality of through holes formed on the filter portion. As in claim 6, the cleaning base station, wherein the density of the through holes is positively correlated with the depth of the drainage trough. The cleaning base station of any one of claims 1 to 5 further includes a heating component, which is arranged on one side of the sewage trough to provide heat energy for the sewage trough. As in claim 8, the cleaning base station, wherein the heating component comprises: a heat conducting plate, the heat conducting plate is arranged on one side of the drain tank, the heat conducting plate is used to provide heat energy for the drain tank; and a heat source, the heat source is arranged on the side of the heat conducting plate away from the drain tank, the heat source is used to provide heat energy for the heat conducting plate. As in claim 8, the cleaning base station, wherein the drain tank is made of a heat-conductive material, and the heating assembly includes a heat source, which is disposed on one side of the drain tank and is used to provide heat for the drain tank. The cleaning base station of claim 8 further comprises: a heat insulating portion disposed on a side of the heating component away from the drain tank; and a bottom cover disposed on a side of the heat insulating portion away from the heating component. As in claim 11, the cleaning base station, wherein the heat insulation part comprises: a first heat insulation layer, arranged on a side of the heating component away from the sewage discharge part, wherein a avoidance part is formed on the first heat insulation layer, and the avoidance part is used to avoid the device on the heating component. As in claim 11, the cleaning base station, wherein the heat insulating portion comprises: a first air gap formed on a side of the heating assembly away from the sewage discharge portion; and a first heat dissipation hole opened on a side of the cleaning base station and connected to the first air gap. As in claim 11, the cleaning base station, wherein the heat insulation part comprises: a second heat insulation layer, arranged on a side of the heating assembly away from the sewage discharge part; a second air gap, formed on a side of the second heat insulation layer away from the sewage discharge part; and a second heat dissipation hole, opened on the side of the cleaning base station, connected to the second air gap, wherein a avoidance part is formed on the second heat insulation layer, and the avoidance part is used to avoid the device on the heating assembly. The cleaning base station of any one of claims 1 to 5 further includes a liquid replenishing device, which includes a water supply connector, a pressure regulating mechanism and a liquid outlet device, wherein the liquid outlet device includes a fluid channel, the fluid channel is provided with a plurality of liquid outlets arranged along the length direction of the fluid, the water supply connector is connected to the fluid channel through the pressure regulating mechanism, the pressure regulating mechanism is used to adjust the pressure of the liquid transported by the water supply connector, and transport the pressure-regulated liquid to the fluid channel, so that the liquid pressures of each liquid outlet are the same or similar. As in claim 15, the cleaning base station, wherein the pressure regulating mechanism includes a liquid storage mechanism having a liquid storage chamber, and the liquid storage mechanism is respectively connected to the water supply connector and the fluid channel. As in claim 16, the cleaning base station, wherein the upper portion of the side wall of the liquid storage chamber is provided with a fluid outlet, and the fluid outlet is connected to the fluid channel. As in claim 17, the cleaning base station, wherein the lower part of the side wall of the liquid storage chamber is provided with a first fluid inlet, and the first fluid inlet is connected to the water supply connector. As in claim 17, the cleaning base station is provided with a second fluid inlet on the upper portion of the side wall of the liquid storage chamber, and the second fluid inlet is connected to the water supply connector. As in claim 19, the cleaning base station is provided with a baffle in the liquid storage chamber to form a curved flow channel in the liquid storage chamber. As in claim 20, the cleaning base station, wherein the baffle is arranged opposite to the second fluid inlet, and the baffle is connected to the top wall and the side wall of the liquid storage chamber, and a gap is provided between the bottom of the baffle and the bottom surface of the liquid storage chamber. As in claim 15, the cleaning base station, wherein each of the liquid outlets is located above the side wall of the fluid channel. For example, in the cleaning base station of claim 22, each of the liquid outlets is provided with a liquid outlet conduit, and each of the liquid outlet conduits is inclined upward relative to the fluid channel. As in claim 15, the cleaning base station, wherein the water supply connector, the pressure regulating mechanism and the liquid outlet device are integrally formed. A cleaning system, comprising: a cleaning base station as described in any one of claims 1 to 24, the cleaning base station comprising a guide slope and a cleaning component; and a cleaning device positioned above the guide slope and in contact with the cleaning component. A cleaning system as claimed in claim 25, wherein the cleaning device includes a cleaning robot, the cleaning robot includes a cleaning component, and the liquid replenishing device of the cleaning base station is used to spray liquid onto the cleaning component.