TWM645487U - Electrical conducting terminal - Google Patents
Electrical conducting terminal Download PDFInfo
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- TWM645487U TWM645487U TW111213723U TW111213723U TWM645487U TW M645487 U TWM645487 U TW M645487U TW 111213723 U TW111213723 U TW 111213723U TW 111213723 U TW111213723 U TW 111213723U TW M645487 U TWM645487 U TW M645487U
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 56
- 229910000990 Ni alloy Inorganic materials 0.000 claims abstract description 54
- 229910001260 Pt alloy Inorganic materials 0.000 claims abstract description 35
- 238000009713 electroplating Methods 0.000 claims abstract description 28
- 229910001252 Pd alloy Inorganic materials 0.000 claims abstract description 26
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 26
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910052802 copper Inorganic materials 0.000 claims abstract description 25
- 239000010949 copper Substances 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 10
- BSIDXUHWUKTRQL-UHFFFAOYSA-N nickel palladium Chemical compound [Ni].[Pd] BSIDXUHWUKTRQL-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 23
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 21
- 229910052737 gold Inorganic materials 0.000 claims description 21
- 239000010931 gold Substances 0.000 claims description 21
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 229910000531 Co alloy Inorganic materials 0.000 claims description 3
- 229910001096 P alloy Inorganic materials 0.000 claims description 3
- 229910000629 Rh alloy Inorganic materials 0.000 claims description 3
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 3
- 229910001080 W alloy Inorganic materials 0.000 claims description 3
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 claims description 3
- 238000005452 bending Methods 0.000 claims description 3
- CLDVQCMGOSGNIW-UHFFFAOYSA-N nickel tin Chemical compound [Ni].[Sn] CLDVQCMGOSGNIW-UHFFFAOYSA-N 0.000 claims description 3
- MOWMLACGTDMJRV-UHFFFAOYSA-N nickel tungsten Chemical group [Ni].[W] MOWMLACGTDMJRV-UHFFFAOYSA-N 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims description 3
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 claims description 3
- PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical group [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 239000010948 rhodium Substances 0.000 claims description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 3
- 229910000929 Ru alloy Inorganic materials 0.000 claims description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- CFQCIHVMOFOCGH-UHFFFAOYSA-N platinum ruthenium Chemical group [Ru].[Pt] CFQCIHVMOFOCGH-UHFFFAOYSA-N 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 238000003032 molecular docking Methods 0.000 abstract description 4
- 238000005260 corrosion Methods 0.000 description 13
- 230000007797 corrosion Effects 0.000 description 12
- 238000010586 diagram Methods 0.000 description 10
- 238000003466 welding Methods 0.000 description 7
- 238000007747 plating Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 210000004243 sweat Anatomy 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
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Abstract
Description
本新型創作是有關於一種導電端子。 The new invention relates to a conductive terminal.
在現有技術中,電連接器除了要滿足一般的性能要求外,特別重要的要求是電連接器必須達到接觸良好,工作可靠,維護方便,其工作可靠與否直接影響電路的正常工作,涉及應用該電連接器的整個電子裝置的安危。 In the existing technology, in addition to meeting general performance requirements, the most important requirement is that the electrical connector must have good contact, reliable operation, and easy maintenance. Whether its operation is reliable or not directly affects the normal operation of the circuit, involving applications. The electrical connector threatens the safety of the entire electronic device.
一般而言,以手機等電子裝置為例,由於使用時間長致耗電量快,經常需要充電。而端子的接觸區經常插拔或摩擦,人體的手汗或是空氣中的水氣都會沾負到靠近連接器介面的端子接觸區,導致端子的接觸區更容易受到腐蝕,再加上頻繁的插拔或摩擦,更是加速端子銅材的腐蝕情形,進而影響電子設備的使用壽命。由此可見,設計一款提高端子耐腐蝕性的電連接器尤其重要。 Generally speaking, taking electronic devices such as mobile phones as an example, due to long-term use, they consume power quickly and often need to be charged. The contact area of the terminal is often plugged, unplugged or rubbed. Human hand sweat or moisture in the air will be contaminated by the contact area of the terminal close to the connector interface, making the contact area of the terminal more susceptible to corrosion. In addition, frequent Plug and pull or friction will accelerate the corrosion of the terminal copper material, thereby affecting the service life of electronic equipment. It can be seen that it is particularly important to design an electrical connector that improves the corrosion resistance of the terminal.
本新型創作提供一種導電端子,其以多鍍層結構而兼具 導電性質、耐腐蝕性質以及耐磨性質。 This new invention provides a conductive terminal, which has a multi-plated structure and has Conductive properties, corrosion resistance and wear resistance.
本新型創作的導電端子,適用於電連接器。導電端子具有對接段,用以與另一電連接器的導電端子電性抵接。對接段包括基材與配置在基材上的多層電鍍層。多層電鍍層包括:銅層、鎳或鎳合金層、鉑合金層以及鈀合金或鎳合金層。銅層配置於基材的表面上。鎳或鎳合金層配置於銅層上方。鉑合金層配置於鎳或鎳合金層上方。鈀合金或鎳合金層配置於鉑合金層上方。 The conductive terminal created by this new type is suitable for electrical connectors. The conductive terminal has a butt section for electrically contacting the conductive terminal of another electrical connector. The docking section includes a base material and a multi-layer electroplating layer arranged on the base material. Multi-layer plating layers include: copper layer, nickel or nickel alloy layer, platinum alloy layer, and palladium alloy or nickel alloy layer. The copper layer is disposed on the surface of the substrate. The nickel or nickel alloy layer is disposed above the copper layer. The platinum alloy layer is disposed above the nickel or nickel alloy layer. The palladium alloy or nickel alloy layer is disposed above the platinum alloy layer.
在本新型創作的一實施例中,上述的多層電鍍層還包括多層金層,分別夾在鎳或鎳合金層、鉑合金層、鈀合金或鎳合金層中任意相鄰兩層之間。 In an embodiment of the present invention, the above-mentioned multi-layer electroplating layer also includes a multi-layer gold layer, respectively sandwiched between any two adjacent layers of nickel or nickel alloy layer, platinum alloy layer, palladium alloy or nickel alloy layer.
在本新型創作的一實施例中,上述的多層電鍍層還包括金層,是多層電鍍層中遠離基材的最外層,以成為導電端子的外觀層。 In an embodiment of the present invention, the above-mentioned multi-layer electroplating layer also includes a gold layer, which is the outermost layer of the multi-layer electroplating layer away from the base material and becomes the appearance layer of the conductive terminal.
在本新型創作的一實施例中,上述的金層的厚度是1μinch至40μinch。 In an embodiment of the present invention, the thickness of the above-mentioned gold layer is 1 μ inch to 40 μ inch.
在本新型創作的一實施例中,上述的鉑合金層是鉑銠合金層,其中銠含量是3%~5%。 In an embodiment of the present invention, the above-mentioned platinum alloy layer is a platinum-rhodium alloy layer, in which the rhodium content is 3% to 5%.
在本新型創作的一實施例中,上述的鉑合金層是鉑鈀合金層,其中鈀含量是15%~20%。 In an embodiment of the present invention, the above-mentioned platinum alloy layer is a platinum-palladium alloy layer, in which the palladium content is 15% to 20%.
在本新型創作的一實施例中,上述的鉑合金層的維氏硬度是HV500~HV650。 In an embodiment of the present invention, the Vickers hardness of the above-mentioned platinum alloy layer is HV500~HV650.
在本新型創作的一實施例中,上述的銅層的厚度是 10μinch至80μinch,鎳或鎳合金層的厚度是1μinch至600μinch,鈀合金或鎳合金層的厚度是1μinch至100μinch,鉑合金層的厚度是1μinch至100μinch。 In an embodiment of the present invention, the thickness of the above-mentioned copper layer is 10μinch to 80μinch, the thickness of the nickel or nickel alloy layer is 1μinch to 600μinch, the thickness of the palladium alloy or nickel alloy layer is 1μinch to 100μinch, and the thickness of the platinum alloy layer is 1μinch to 100μinch.
在本新型創作的一實施例中,上述的鎳或鎳合金層是鎳鎢合金層、鎳磷合金層、鎳鈷合金層、鎳鈀合金層或鎳錫合金層。 In an embodiment of the present invention, the above-mentioned nickel or nickel alloy layer is a nickel-tungsten alloy layer, a nickel-phosphorus alloy layer, a nickel-cobalt alloy layer, a nickel-palladium alloy layer or a nickel-tin alloy layer.
在本新型創作的一實施例中,上述的導電端子是下料式端子、折彎式端子、彈簧針端子或冠簧端子。 In an embodiment of the present invention, the above-mentioned conductive terminal is a blank terminal, a bending terminal, a spring pin terminal or a crown spring terminal.
在本新型創作的一實施例中,上述的基材的材質是銅或其合金。 In an embodiment of the present invention, the material of the above-mentioned base material is copper or its alloy.
基於上述,導電端子的對接段在基材表面上配置有銅層、鎳或鎳合金層、鉑合金層以及鈀合金或鎳合金層,除了簡化現有技術中多層電鍍層的結構特徵外,還進一步地提高導電端子的抗電解腐蝕、抗化學腐蝕與耐磨耗(耐磨擦耗損)。 Based on the above, the butt section of the conductive terminal is configured with a copper layer, a nickel or nickel alloy layer, a platinum alloy layer and a palladium alloy or nickel alloy layer on the surface of the base material. In addition to simplifying the structural features of the multi-layer electroplating layer in the prior art, it further It greatly improves the conductive terminal's resistance to electrolytic corrosion, chemical corrosion and wear (friction loss).
20、30:電連接器 20, 30: Electrical connector
21、31:絕緣本體 21, 31: Insulating body
22、32、100:導電端子 22, 32, 100: conductive terminals
110:基材 110:Substrate
120:銅層 120:Copper layer
130:鎳或鎳合金層 130: Nickel or nickel alloy layer
140:鈀合金或鎳合金層 140: Palladium alloy or nickel alloy layer
150:鉑合金層 150:Platinum alloy layer
160、170:金層 160, 170: gold layer
311:內側面 311: Medial side
A1、B1:銲接段 A1, B1: welding section
A2、B2:對接段 A2, B2: docking section
A21、B21:接觸區 A21, B21: contact area
A3、B3:連接段 A3, B3: connecting section
CT:多層電鍍層 CT: multi-layer electroplating
圖1是本新型創作一實施例的導電端子的鍍層結構示意圖。 Figure 1 is a schematic diagram of the plating structure of a conductive terminal according to an embodiment of the present invention.
圖2是本新型創作一實施例的電連接器的示意圖。 Figure 2 is a schematic diagram of an electrical connector according to an embodiment of the present invention.
圖3是圖2的電連接器的其中一端子的示意圖。 FIG. 3 is a schematic diagram of one of the terminals of the electrical connector of FIG. 2 .
圖4是本新型創作另一實施例的電連接器的示意圖。 Figure 4 is a schematic diagram of an electrical connector according to another embodiment of the present invention.
圖5是圖4的電連接器的其中一端子的示意圖。 FIG. 5 is a schematic diagram of one of the terminals of the electrical connector of FIG. 4 .
圖1是本新型創作一實施例的導電端子的鍍層結構示意圖。請參考圖1,在本實施例中,導電端子100適用於電連接器,其包括基材110與配置其上的多層電鍍層CT,其中所述多層電鍍層CT是由基材110的表面開始堆疊配置且包括:銅層120、鎳(元素)或鎳合金層130、鉑合金層150以及鈀合金或鎳合金層140,所述鈀合金或鎳合金層140是排除鈀鎳合金與鈀鎳合金。
Figure 1 is a schematic diagram of the plating structure of a conductive terminal according to an embodiment of the present invention. Please refer to Figure 1. In this embodiment, the
再者,本實施例的多層電鍍層CT還包括多層金層160,且這些金層160分別夾在鎳或鎳合金層130、鉑合金層150與鈀合金或鎳合金層140中的任意相鄰兩層之間。換句話說,本實施例存在兩層金層160,其中一層金層160位於鎳或鎳合金層130與鉑合金層150之間,而另一金層160位於鉑合金層150與鈀合金或鎳合金層140之間。此外,本實施例的多層電鍍層CT還包括金層170,是多層電鍍層CT中遠離基材110的最外層,以成為導電端子100的外觀層,並提供導電端子100於視覺上的美觀性。
Furthermore, the multilayer electroplating layer CT of this embodiment also includes multiple layers of
在本實施例中,銅層120的厚度是10μinch至80μinch,鎳或鎳合金層130的厚度是1μinch至600μinch,鈀合金或鎳合金層140的厚度是1μinch至100μinch,鉑合金層150的厚度是1μinch至100μinch。金層160的厚度分別是1μinch至40μinch,而作為外觀層的金層170的厚度是3μinch。
In this embodiment, the thickness of the
詳細來說,導電端子100的基材110的材質是銅或其合金,且例如是金屬銅所製成的板材或其他外形的結構件,其依據
導電端子100所適用的電連接器型式而定。再者,銅層120配置在基材110的表面,其用以初步對前述基材110提供表面填縫之用,且同時作為增進後續電鍍層附著強度之用。簡單來說,基材110需通過沖壓、彎折或鑄型等加工手段方能順利形成導電端子100的外形,因此在加工過程中容易因此對基材110的表面形成損傷,故而銅層120能先對基材110的表面提供初步修復的效果。
Specifically, the material of the
接著,導電端子100以鎳或鎳合金層130配置在前述銅層120上。在此,鎳或鎳合金層130是鎳鎢合金層、鎳磷合金層、鎳鈷合金層或鎳錫合金層,同時排除鎳鈀合金層與鈀鎳合金層,其所具有的抗腐蝕特性也能初步為被其所包覆的基材110與銅層120提供初步保護效果,也能為後續的電鍍層提供隔離效果,以避免基材110上的雜質影響後續電鍍層的鍍製製程及品質。
Next, the
接著,金層160配置在鎳或鎳合金層130上,而後以鉑合金層150配置在金層160上。金層160具良好的延展性,可以減小電鍍層之間的內應力或是作為緩衝層之用,以有效地提高多層電鍍層CT的結構強度,避免因電鍍層過厚而導致裂縫甚至脫落的情形發生,後續的金層160一如此處所描述的特徵而配置在鉑合金層150,接著再配置以鈀合金或鎳合金層140與另一層金層170。
Next, the
本實施例的鉑合金層150,特別是鉑釕合金層,其中釕含量是1%~3%,且其維氏硬度是HV500~HV650,也因此具備抗磨特性,以此特徵得以讓導電端子100應付與對手電連接器的導電
端子(未繪示)進行對接時的磨耗。
The
在另一實施例中,所述鉑合金層150也可以是鉑銠合金層,其中銠含量是3%~5%。在又一實施例中,所述鉑合金層150也可以是鉑鈀合金層,其中鈀含量是15%~20%。簡單地說,本新型創作的鉑合金層150可從上述三種選擇合適者。
In another embodiment, the
此外,上述鎳或鎳合金層130與鉑合金層150還能提高導電端子100所需的耐腐蝕效果。舉例來說,電連接器的使用環境可能存在水氣,甚或遇上使用者不小心造成的飲料打翻等情形,這些水氣或飲料容易在電連接器操作時因電性導通而對導電端子100產生電化學反應而造成腐蝕,故而使用本實施例上述多層電鍍層CT的導電端子100能因此有效提高其耐受性與使用壽命。
In addition, the above-mentioned nickel or
圖2是本新型創作一實施例的電連接器的示意圖。圖3是圖2的電連接器的其中一端子的示意圖。請同時參考圖2與圖3,本實施例是將前述多層電鍍層CT應用於電連接器20,如圖2所示,電連接器20包括絕緣本體21與配置其上的多個導電端子22,這些導電端子22例如是彎折式端子,且各導電端子22如圖3所示進一步地區分為銲接段B1、對接段B2與連接段B3,其中電連接器20例如是插座連接器,而銲接段B1例如用以銲接在電路板(未繪示)上,連接段B3連接在銲接段B1與對接段B2之間,且連接段B3實質上穿置於絕緣本體21內。據此,本實施例的多層電鍍層CT適於配置在對接段B2的接觸區B21,也就是暴露出絕
緣本體21的部分,以利於在與另一電連接器的另一導電端子對接時能讓接觸區B21在維持其電導通特性的前提下,還能因多層電鍍層CT而具備所需的抗磨性與抗腐蝕特性。
Figure 2 is a schematic diagram of an electrical connector according to an embodiment of the present invention. FIG. 3 is a schematic diagram of one of the terminals of the electrical connector of FIG. 2 . Please refer to Figures 2 and 3 at the same time. In this embodiment, the aforementioned multi-layer electroplating layer CT is applied to the
圖4是本新型創作另一實施例的電連接器的示意圖。圖5是圖4的電連接器的其中一端子的示意圖。請同時參考圖4與圖5,本實施例的電連接器30例如是插座連接器,其包括絕緣本體31與多個導電端子32,這些導電端子32例如是下料式端子,且各導電端子32進一步區分為銲接段A1、對接段A2與連接段A3,連接段A3連接在銲接段A1與對接段A2之間,對接段A2具有暴露出絕緣本體31的內側面311的接觸區A21,以順利與另一電連接器的另一導電端子電性連接,故而本實施例的接觸區A21配置有前述的多層電鍍層CT,以讓導電端子32在接觸區A21具備抗磨性與耐腐蝕性。
Figure 4 is a schematic diagram of an electrical connector according to another embodiment of the present invention. FIG. 5 is a schematic diagram of one of the terminals of the electrical connector of FIG. 4 . Please refer to FIGS. 4 and 5 at the same time. The
除上述圖2至圖5所示實施例之外,本新型創作所揭露的多層電鍍層CT還能進一步地適用於彈簧針端子(pogo pin)或冠簧端子(crown spring terminal),也就是在所述端子的電性抵接區域配置有前述的多層電鍍層CT。 In addition to the above embodiments shown in Figures 2 to 5, the multi-layer electroplated CT disclosed in the present invention can further be applied to pogo pins or crown spring terminals, that is, in The aforementioned multi-layer electroplating layer CT is disposed in the electrical contact area of the terminal.
綜上所述,在本新型創作的上述實施例中,導電端子的對接段在基材表面上配置有銅層、鎳或鎳合金層、鉑合金層以及鈀合金或鎳合金層,除了簡化現有技術中多層電鍍層的結構特徵外,還進一步地為導電端子提供較佳的抗電解腐蝕、抗化學腐蝕與耐磨耗(耐磨擦耗損)的功能。 To sum up, in the above embodiments of the present invention, the butt section of the conductive terminal is configured with a copper layer, a nickel or nickel alloy layer, a platinum alloy layer and a palladium alloy or nickel alloy layer on the surface of the base material. In addition to simplifying the existing In addition to the structural characteristics of the multi-layer electroplating layer in the technology, it also further provides the conductive terminal with better resistance to electrolytic corrosion, chemical corrosion and wear resistance (friction loss resistance).
100:導電端子 100:Conductive terminal
110:基材 110:Substrate
120:銅層 120:Copper layer
130:鎳或鎳合金層 130: Nickel or nickel alloy layer
140:鈀合金或鎳合金層 140: Palladium alloy or nickel alloy layer
150:鉑合金層 150:Platinum alloy layer
160、170:金層 160, 170: gold layer
CT:多層電鍍層 CT: multi-layer electroplating
Claims (12)
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CN202220316466.2U CN217607066U (en) | 2022-02-17 | 2022-02-17 | Conductive terminal |
CN202220316466.2 | 2022-02-17 |
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TWM645487U true TWM645487U (en) | 2023-09-01 |
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Application Number | Title | Priority Date | Filing Date |
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TW111213723U TWM645487U (en) | 2022-02-17 | 2022-12-12 | Electrical conducting terminal |
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CN (1) | CN217607066U (en) |
TW (1) | TWM645487U (en) |
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2022
- 2022-02-17 CN CN202220316466.2U patent/CN217607066U/en active Active
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