TWM645487U - Electrical conducting terminal - Google Patents

Electrical conducting terminal Download PDF

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Publication number
TWM645487U
TWM645487U TW111213723U TW111213723U TWM645487U TW M645487 U TWM645487 U TW M645487U TW 111213723 U TW111213723 U TW 111213723U TW 111213723 U TW111213723 U TW 111213723U TW M645487 U TWM645487 U TW M645487U
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layer
nickel
alloy layer
conductive terminal
alloy
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TW111213723U
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Chinese (zh)
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簡建智
簡敏隆
蒙大德
張明勇
李玉彬
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連展科技股份有限公司
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Abstract

An electrical conducting terminal for an electrical connector is provided. The electrical conducting terminal has an electrical docking section for electrically contacting to another electrical terminal of another electrical connector. The electrical docking section has a substrate and a plurality of electroplating layers disposed on the substrate, wherein the electroplating layers includes a copper layer, a nickel or nickel alloy layer, a platinum alloy layer, and a palladium alloy or nickel alloy layer. The copper layer is disposed on a surface of the substrate, the nickel or nickel alloy layer is disposed above the copper layer, the platinum alloy layer is disposed above the nickel or nickel alloy layer, and the palladium alloy or nickel alloy layer is disposed above the platinum alloy layer. The nickel or nickel alloy layer excludes palladium-nickel alloy and nickel-palladium alloy.

Description

導電端子 Conductive terminal

本新型創作是有關於一種導電端子。 The new invention relates to a conductive terminal.

在現有技術中,電連接器除了要滿足一般的性能要求外,特別重要的要求是電連接器必須達到接觸良好,工作可靠,維護方便,其工作可靠與否直接影響電路的正常工作,涉及應用該電連接器的整個電子裝置的安危。 In the existing technology, in addition to meeting general performance requirements, the most important requirement is that the electrical connector must have good contact, reliable operation, and easy maintenance. Whether its operation is reliable or not directly affects the normal operation of the circuit, involving applications. The electrical connector threatens the safety of the entire electronic device.

一般而言,以手機等電子裝置為例,由於使用時間長致耗電量快,經常需要充電。而端子的接觸區經常插拔或摩擦,人體的手汗或是空氣中的水氣都會沾負到靠近連接器介面的端子接觸區,導致端子的接觸區更容易受到腐蝕,再加上頻繁的插拔或摩擦,更是加速端子銅材的腐蝕情形,進而影響電子設備的使用壽命。由此可見,設計一款提高端子耐腐蝕性的電連接器尤其重要。 Generally speaking, taking electronic devices such as mobile phones as an example, due to long-term use, they consume power quickly and often need to be charged. The contact area of the terminal is often plugged, unplugged or rubbed. Human hand sweat or moisture in the air will be contaminated by the contact area of the terminal close to the connector interface, making the contact area of the terminal more susceptible to corrosion. In addition, frequent Plug and pull or friction will accelerate the corrosion of the terminal copper material, thereby affecting the service life of electronic equipment. It can be seen that it is particularly important to design an electrical connector that improves the corrosion resistance of the terminal.

本新型創作提供一種導電端子,其以多鍍層結構而兼具 導電性質、耐腐蝕性質以及耐磨性質。 This new invention provides a conductive terminal, which has a multi-plated structure and has Conductive properties, corrosion resistance and wear resistance.

本新型創作的導電端子,適用於電連接器。導電端子具有對接段,用以與另一電連接器的導電端子電性抵接。對接段包括基材與配置在基材上的多層電鍍層。多層電鍍層包括:銅層、鎳或鎳合金層、鉑合金層以及鈀合金或鎳合金層。銅層配置於基材的表面上。鎳或鎳合金層配置於銅層上方。鉑合金層配置於鎳或鎳合金層上方。鈀合金或鎳合金層配置於鉑合金層上方。 The conductive terminal created by this new type is suitable for electrical connectors. The conductive terminal has a butt section for electrically contacting the conductive terminal of another electrical connector. The docking section includes a base material and a multi-layer electroplating layer arranged on the base material. Multi-layer plating layers include: copper layer, nickel or nickel alloy layer, platinum alloy layer, and palladium alloy or nickel alloy layer. The copper layer is disposed on the surface of the substrate. The nickel or nickel alloy layer is disposed above the copper layer. The platinum alloy layer is disposed above the nickel or nickel alloy layer. The palladium alloy or nickel alloy layer is disposed above the platinum alloy layer.

在本新型創作的一實施例中,上述的多層電鍍層還包括多層金層,分別夾在鎳或鎳合金層、鉑合金層、鈀合金或鎳合金層中任意相鄰兩層之間。 In an embodiment of the present invention, the above-mentioned multi-layer electroplating layer also includes a multi-layer gold layer, respectively sandwiched between any two adjacent layers of nickel or nickel alloy layer, platinum alloy layer, palladium alloy or nickel alloy layer.

在本新型創作的一實施例中,上述的多層電鍍層還包括金層,是多層電鍍層中遠離基材的最外層,以成為導電端子的外觀層。 In an embodiment of the present invention, the above-mentioned multi-layer electroplating layer also includes a gold layer, which is the outermost layer of the multi-layer electroplating layer away from the base material and becomes the appearance layer of the conductive terminal.

在本新型創作的一實施例中,上述的金層的厚度是1μinch至40μinch。 In an embodiment of the present invention, the thickness of the above-mentioned gold layer is 1 μ inch to 40 μ inch.

在本新型創作的一實施例中,上述的鉑合金層是鉑銠合金層,其中銠含量是3%~5%。 In an embodiment of the present invention, the above-mentioned platinum alloy layer is a platinum-rhodium alloy layer, in which the rhodium content is 3% to 5%.

在本新型創作的一實施例中,上述的鉑合金層是鉑鈀合金層,其中鈀含量是15%~20%。 In an embodiment of the present invention, the above-mentioned platinum alloy layer is a platinum-palladium alloy layer, in which the palladium content is 15% to 20%.

在本新型創作的一實施例中,上述的鉑合金層的維氏硬度是HV500~HV650。 In an embodiment of the present invention, the Vickers hardness of the above-mentioned platinum alloy layer is HV500~HV650.

在本新型創作的一實施例中,上述的銅層的厚度是 10μinch至80μinch,鎳或鎳合金層的厚度是1μinch至600μinch,鈀合金或鎳合金層的厚度是1μinch至100μinch,鉑合金層的厚度是1μinch至100μinch。 In an embodiment of the present invention, the thickness of the above-mentioned copper layer is 10μinch to 80μinch, the thickness of the nickel or nickel alloy layer is 1μinch to 600μinch, the thickness of the palladium alloy or nickel alloy layer is 1μinch to 100μinch, and the thickness of the platinum alloy layer is 1μinch to 100μinch.

在本新型創作的一實施例中,上述的鎳或鎳合金層是鎳鎢合金層、鎳磷合金層、鎳鈷合金層、鎳鈀合金層或鎳錫合金層。 In an embodiment of the present invention, the above-mentioned nickel or nickel alloy layer is a nickel-tungsten alloy layer, a nickel-phosphorus alloy layer, a nickel-cobalt alloy layer, a nickel-palladium alloy layer or a nickel-tin alloy layer.

在本新型創作的一實施例中,上述的導電端子是下料式端子、折彎式端子、彈簧針端子或冠簧端子。 In an embodiment of the present invention, the above-mentioned conductive terminal is a blank terminal, a bending terminal, a spring pin terminal or a crown spring terminal.

在本新型創作的一實施例中,上述的基材的材質是銅或其合金。 In an embodiment of the present invention, the material of the above-mentioned base material is copper or its alloy.

基於上述,導電端子的對接段在基材表面上配置有銅層、鎳或鎳合金層、鉑合金層以及鈀合金或鎳合金層,除了簡化現有技術中多層電鍍層的結構特徵外,還進一步地提高導電端子的抗電解腐蝕、抗化學腐蝕與耐磨耗(耐磨擦耗損)。 Based on the above, the butt section of the conductive terminal is configured with a copper layer, a nickel or nickel alloy layer, a platinum alloy layer and a palladium alloy or nickel alloy layer on the surface of the base material. In addition to simplifying the structural features of the multi-layer electroplating layer in the prior art, it further It greatly improves the conductive terminal's resistance to electrolytic corrosion, chemical corrosion and wear (friction loss).

20、30:電連接器 20, 30: Electrical connector

21、31:絕緣本體 21, 31: Insulating body

22、32、100:導電端子 22, 32, 100: conductive terminals

110:基材 110:Substrate

120:銅層 120:Copper layer

130:鎳或鎳合金層 130: Nickel or nickel alloy layer

140:鈀合金或鎳合金層 140: Palladium alloy or nickel alloy layer

150:鉑合金層 150:Platinum alloy layer

160、170:金層 160, 170: gold layer

311:內側面 311: Medial side

A1、B1:銲接段 A1, B1: welding section

A2、B2:對接段 A2, B2: docking section

A21、B21:接觸區 A21, B21: contact area

A3、B3:連接段 A3, B3: connecting section

CT:多層電鍍層 CT: multi-layer electroplating

圖1是本新型創作一實施例的導電端子的鍍層結構示意圖。 Figure 1 is a schematic diagram of the plating structure of a conductive terminal according to an embodiment of the present invention.

圖2是本新型創作一實施例的電連接器的示意圖。 Figure 2 is a schematic diagram of an electrical connector according to an embodiment of the present invention.

圖3是圖2的電連接器的其中一端子的示意圖。 FIG. 3 is a schematic diagram of one of the terminals of the electrical connector of FIG. 2 .

圖4是本新型創作另一實施例的電連接器的示意圖。 Figure 4 is a schematic diagram of an electrical connector according to another embodiment of the present invention.

圖5是圖4的電連接器的其中一端子的示意圖。 FIG. 5 is a schematic diagram of one of the terminals of the electrical connector of FIG. 4 .

圖1是本新型創作一實施例的導電端子的鍍層結構示意圖。請參考圖1,在本實施例中,導電端子100適用於電連接器,其包括基材110與配置其上的多層電鍍層CT,其中所述多層電鍍層CT是由基材110的表面開始堆疊配置且包括:銅層120、鎳(元素)或鎳合金層130、鉑合金層150以及鈀合金或鎳合金層140,所述鈀合金或鎳合金層140是排除鈀鎳合金與鈀鎳合金。 Figure 1 is a schematic diagram of the plating structure of a conductive terminal according to an embodiment of the present invention. Please refer to Figure 1. In this embodiment, the conductive terminal 100 is suitable for an electrical connector, which includes a base material 110 and a multi-layer electroplating layer CT disposed thereon, wherein the multi-layer electroplating layer CT starts from the surface of the base material 110. The stack is configured and includes: a copper layer 120, a nickel (element) or nickel alloy layer 130, a platinum alloy layer 150, and a palladium alloy or nickel alloy layer 140, the palladium alloy or nickel alloy layer 140 being excluding palladium-nickel alloy and palladium-nickel alloy. .

再者,本實施例的多層電鍍層CT還包括多層金層160,且這些金層160分別夾在鎳或鎳合金層130、鉑合金層150與鈀合金或鎳合金層140中的任意相鄰兩層之間。換句話說,本實施例存在兩層金層160,其中一層金層160位於鎳或鎳合金層130與鉑合金層150之間,而另一金層160位於鉑合金層150與鈀合金或鎳合金層140之間。此外,本實施例的多層電鍍層CT還包括金層170,是多層電鍍層CT中遠離基材110的最外層,以成為導電端子100的外觀層,並提供導電端子100於視覺上的美觀性。 Furthermore, the multilayer electroplating layer CT of this embodiment also includes multiple layers of gold layers 160, and these gold layers 160 are respectively sandwiched between any adjacent ones of the nickel or nickel alloy layer 130, the platinum alloy layer 150, and the palladium alloy or nickel alloy layer 140. between two floors. In other words, there are two gold layers 160 in this embodiment, one gold layer 160 is located between the nickel or nickel alloy layer 130 and the platinum alloy layer 150, and the other gold layer 160 is located between the platinum alloy layer 150 and the palladium alloy or nickel alloy layer 150. between alloy layers 140. In addition, the multi-layer electroplating CT of this embodiment also includes a gold layer 170 , which is the outermost layer away from the base material 110 in the multi-layer electroplating CT to become the appearance layer of the conductive terminal 100 and provide the conductive terminal 100 with visual aesthetics. .

在本實施例中,銅層120的厚度是10μinch至80μinch,鎳或鎳合金層130的厚度是1μinch至600μinch,鈀合金或鎳合金層140的厚度是1μinch至100μinch,鉑合金層150的厚度是1μinch至100μinch。金層160的厚度分別是1μinch至40μinch,而作為外觀層的金層170的厚度是3μinch。 In this embodiment, the thickness of the copper layer 120 is 10 μinch to 80 μinch, the thickness of the nickel or nickel alloy layer 130 is 1 μinch to 600 μinch, the thickness of the palladium alloy or nickel alloy layer 140 is 1 μinch to 100 μinch, and the thickness of the platinum alloy layer 150 is 1μinch to 100μinch. The thickness of the gold layer 160 is 1 μ inch to 40 μ inch respectively, and the thickness of the gold layer 170 as the appearance layer is 3 μ inch.

詳細來說,導電端子100的基材110的材質是銅或其合金,且例如是金屬銅所製成的板材或其他外形的結構件,其依據 導電端子100所適用的電連接器型式而定。再者,銅層120配置在基材110的表面,其用以初步對前述基材110提供表面填縫之用,且同時作為增進後續電鍍層附著強度之用。簡單來說,基材110需通過沖壓、彎折或鑄型等加工手段方能順利形成導電端子100的外形,因此在加工過程中容易因此對基材110的表面形成損傷,故而銅層120能先對基材110的表面提供初步修復的效果。 Specifically, the material of the base material 110 of the conductive terminal 100 is copper or its alloy, and is, for example, a plate made of metallic copper or other shaped structural parts. The conductive terminal 100 depends on the type of electrical connector that the conductive terminal 100 is suitable for. Furthermore, the copper layer 120 is disposed on the surface of the base material 110, which is used to initially provide surface caulking for the aforementioned base material 110, and is also used to enhance the adhesion strength of the subsequent electroplating layer. To put it simply, the base material 110 needs to be processed by stamping, bending, or casting to smoothly form the shape of the conductive terminal 100. Therefore, the surface of the base material 110 is easily damaged during the processing, so the copper layer 120 can First, a preliminary repair effect is provided on the surface of the base material 110 .

接著,導電端子100以鎳或鎳合金層130配置在前述銅層120上。在此,鎳或鎳合金層130是鎳鎢合金層、鎳磷合金層、鎳鈷合金層或鎳錫合金層,同時排除鎳鈀合金層與鈀鎳合金層,其所具有的抗腐蝕特性也能初步為被其所包覆的基材110與銅層120提供初步保護效果,也能為後續的電鍍層提供隔離效果,以避免基材110上的雜質影響後續電鍍層的鍍製製程及品質。 Next, the conductive terminal 100 is disposed on the copper layer 120 with a nickel or nickel alloy layer 130 . Here, the nickel or nickel alloy layer 130 is a nickel-tungsten alloy layer, a nickel-phosphorus alloy layer, a nickel-cobalt alloy layer or a nickel-tin alloy layer, while excluding the nickel-palladium alloy layer and the palladium-nickel alloy layer, and its anti-corrosion properties are also It can initially provide a preliminary protective effect for the substrate 110 and copper layer 120 covered by it, and can also provide an isolation effect for the subsequent electroplating layer to prevent impurities on the substrate 110 from affecting the plating process and quality of the subsequent electroplating layer. .

接著,金層160配置在鎳或鎳合金層130上,而後以鉑合金層150配置在金層160上。金層160具良好的延展性,可以減小電鍍層之間的內應力或是作為緩衝層之用,以有效地提高多層電鍍層CT的結構強度,避免因電鍍層過厚而導致裂縫甚至脫落的情形發生,後續的金層160一如此處所描述的特徵而配置在鉑合金層150,接著再配置以鈀合金或鎳合金層140與另一層金層170。 Next, the gold layer 160 is disposed on the nickel or nickel alloy layer 130, and then the platinum alloy layer 150 is disposed on the gold layer 160. The gold layer 160 has good ductility, which can reduce the internal stress between the electroplated layers or serve as a buffer layer to effectively improve the structural strength of the multi-layer electroplated CT layer and avoid cracks or even falling off due to excessive thickness of the electroplated layer. This occurs when a subsequent gold layer 160 is disposed over the platinum alloy layer 150 as characterized here, followed by a palladium alloy or nickel alloy layer 140 and another gold layer 170 .

本實施例的鉑合金層150,特別是鉑釕合金層,其中釕含量是1%~3%,且其維氏硬度是HV500~HV650,也因此具備抗磨特性,以此特徵得以讓導電端子100應付與對手電連接器的導電 端子(未繪示)進行對接時的磨耗。 The platinum alloy layer 150 of this embodiment, especially the platinum-ruthenium alloy layer, has a ruthenium content of 1% to 3% and a Vickers hardness of HV500 to HV650. Therefore, it has anti-wear properties. This feature allows the conductive terminals to be 100 copes with the electrical conductivity of the flashlight connector Wear of terminals (not shown) during mating.

在另一實施例中,所述鉑合金層150也可以是鉑銠合金層,其中銠含量是3%~5%。在又一實施例中,所述鉑合金層150也可以是鉑鈀合金層,其中鈀含量是15%~20%。簡單地說,本新型創作的鉑合金層150可從上述三種選擇合適者。 In another embodiment, the platinum alloy layer 150 may also be a platinum-rhodium alloy layer, in which the rhodium content is 3% to 5%. In another embodiment, the platinum alloy layer 150 may also be a platinum-palladium alloy layer, in which the palladium content is 15% to 20%. Simply put, the platinum alloy layer 150 created in this new invention can be selected from the above three types.

此外,上述鎳或鎳合金層130與鉑合金層150還能提高導電端子100所需的耐腐蝕效果。舉例來說,電連接器的使用環境可能存在水氣,甚或遇上使用者不小心造成的飲料打翻等情形,這些水氣或飲料容易在電連接器操作時因電性導通而對導電端子100產生電化學反應而造成腐蝕,故而使用本實施例上述多層電鍍層CT的導電端子100能因此有效提高其耐受性與使用壽命。 In addition, the above-mentioned nickel or nickel alloy layer 130 and platinum alloy layer 150 can also improve the corrosion resistance required by the conductive terminal 100 . For example, there may be moisture in the environment where the electrical connector is used, or even if the user accidentally spills a drink. These moisture or drinks can easily damage the conductive terminals due to electrical conduction during operation of the electrical connector. 100 produces electrochemical reactions and causes corrosion. Therefore, the conductive terminal 100 using the multi-layer electroplating layer CT in this embodiment can effectively improve its tolerance and service life.

圖2是本新型創作一實施例的電連接器的示意圖。圖3是圖2的電連接器的其中一端子的示意圖。請同時參考圖2與圖3,本實施例是將前述多層電鍍層CT應用於電連接器20,如圖2所示,電連接器20包括絕緣本體21與配置其上的多個導電端子22,這些導電端子22例如是彎折式端子,且各導電端子22如圖3所示進一步地區分為銲接段B1、對接段B2與連接段B3,其中電連接器20例如是插座連接器,而銲接段B1例如用以銲接在電路板(未繪示)上,連接段B3連接在銲接段B1與對接段B2之間,且連接段B3實質上穿置於絕緣本體21內。據此,本實施例的多層電鍍層CT適於配置在對接段B2的接觸區B21,也就是暴露出絕 緣本體21的部分,以利於在與另一電連接器的另一導電端子對接時能讓接觸區B21在維持其電導通特性的前提下,還能因多層電鍍層CT而具備所需的抗磨性與抗腐蝕特性。 Figure 2 is a schematic diagram of an electrical connector according to an embodiment of the present invention. FIG. 3 is a schematic diagram of one of the terminals of the electrical connector of FIG. 2 . Please refer to Figures 2 and 3 at the same time. In this embodiment, the aforementioned multi-layer electroplating layer CT is applied to the electrical connector 20. As shown in Figure 2, the electrical connector 20 includes an insulating body 21 and a plurality of conductive terminals 22 arranged thereon. , these conductive terminals 22 are, for example, bend-type terminals, and each conductive terminal 22 is further divided into a welding section B1, a butt section B2 and a connecting section B3 as shown in FIG. 3, where the electrical connector 20 is, for example, a socket connector, and The welding section B1 is used for welding on a circuit board (not shown), for example. The connection section B3 is connected between the welding section B1 and the butt section B2, and the connection section B3 is substantially inserted into the insulating body 21 . Accordingly, the multi-layer electroplated layer CT of this embodiment is suitable to be disposed in the contact area B21 of the butt section B2, that is, the insulated part of the edge body 21, so that when it is connected to another conductive terminal of another electrical connector, the contact area B21 can maintain its electrical conduction characteristics and also have the required resistance due to the multi-layer electroplating layer CT. Abrasion and corrosion resistance properties.

圖4是本新型創作另一實施例的電連接器的示意圖。圖5是圖4的電連接器的其中一端子的示意圖。請同時參考圖4與圖5,本實施例的電連接器30例如是插座連接器,其包括絕緣本體31與多個導電端子32,這些導電端子32例如是下料式端子,且各導電端子32進一步區分為銲接段A1、對接段A2與連接段A3,連接段A3連接在銲接段A1與對接段A2之間,對接段A2具有暴露出絕緣本體31的內側面311的接觸區A21,以順利與另一電連接器的另一導電端子電性連接,故而本實施例的接觸區A21配置有前述的多層電鍍層CT,以讓導電端子32在接觸區A21具備抗磨性與耐腐蝕性。 Figure 4 is a schematic diagram of an electrical connector according to another embodiment of the present invention. FIG. 5 is a schematic diagram of one of the terminals of the electrical connector of FIG. 4 . Please refer to FIGS. 4 and 5 at the same time. The electrical connector 30 of this embodiment is, for example, a socket connector, which includes an insulating body 31 and a plurality of conductive terminals 32 . The conductive terminals 32 are, for example, blanking terminals, and each conductive terminal 32 is further divided into a welding section A1, a butt section A2 and a connection section A3. The connection section A3 is connected between the welding section A1 and the butt section A2. The butt section A2 has a contact area A21 that exposes the inner side 311 of the insulating body 31. It is successfully electrically connected to another conductive terminal of another electrical connector. Therefore, the contact area A21 of this embodiment is configured with the aforementioned multi-layer electroplating layer CT, so that the conductive terminal 32 has wear resistance and corrosion resistance in the contact area A21 .

除上述圖2至圖5所示實施例之外,本新型創作所揭露的多層電鍍層CT還能進一步地適用於彈簧針端子(pogo pin)或冠簧端子(crown spring terminal),也就是在所述端子的電性抵接區域配置有前述的多層電鍍層CT。 In addition to the above embodiments shown in Figures 2 to 5, the multi-layer electroplated CT disclosed in the present invention can further be applied to pogo pins or crown spring terminals, that is, in The aforementioned multi-layer electroplating layer CT is disposed in the electrical contact area of the terminal.

綜上所述,在本新型創作的上述實施例中,導電端子的對接段在基材表面上配置有銅層、鎳或鎳合金層、鉑合金層以及鈀合金或鎳合金層,除了簡化現有技術中多層電鍍層的結構特徵外,還進一步地為導電端子提供較佳的抗電解腐蝕、抗化學腐蝕與耐磨耗(耐磨擦耗損)的功能。 To sum up, in the above embodiments of the present invention, the butt section of the conductive terminal is configured with a copper layer, a nickel or nickel alloy layer, a platinum alloy layer and a palladium alloy or nickel alloy layer on the surface of the base material. In addition to simplifying the existing In addition to the structural characteristics of the multi-layer electroplating layer in the technology, it also further provides the conductive terminal with better resistance to electrolytic corrosion, chemical corrosion and wear resistance (friction loss resistance).

100:導電端子 100:Conductive terminal

110:基材 110:Substrate

120:銅層 120:Copper layer

130:鎳或鎳合金層 130: Nickel or nickel alloy layer

140:鈀合金或鎳合金層 140: Palladium alloy or nickel alloy layer

150:鉑合金層 150:Platinum alloy layer

160、170:金層 160, 170: gold layer

CT:多層電鍍層 CT: multi-layer electroplating

Claims (12)

一種導電端子,適用於電連接器,所述導電端子具有對接段,所述對接段用以與另一電連接器的導電端子電性抵接,所述對接段包括基材與配置在所述基材上的多層電鍍層,所述多層電鍍層包括: 銅層,配置於所述基材的表面上; 鎳或鎳合金層,配置於所述銅層上方,所述鎳或鎳合金層排除鈀鎳合金或鎳鈀合金; 鉑合金層,配置於所述鎳或鎳合金層上方;以及 鈀合金或鎳合金層,配置於所述鉑合金層上方。 A conductive terminal suitable for an electrical connector. The conductive terminal has a butt section. The butt section is used to electrically contact with a conductive terminal of another electrical connector. The butt section includes a base material and a base material arranged on the Multi-layer electroplating layers on the substrate, the multi-layer electroplating layers include: A copper layer, arranged on the surface of the substrate; A nickel or nickel alloy layer is arranged above the copper layer, and the nickel or nickel alloy layer excludes palladium-nickel alloy or nickel-palladium alloy; A platinum alloy layer disposed above the nickel or nickel alloy layer; and A palladium alloy or nickel alloy layer is disposed above the platinum alloy layer. 如請求項1所述的導電端子,所述多層電鍍層還包括多層金層,分別夾在所述鎳或鎳合金層、所述鉑合金層、所述鈀合金或鎳合金層中任意相鄰兩層之間。The conductive terminal according to claim 1, wherein the multi-layer electroplating layer further includes a multi-layer gold layer sandwiched between any adjacent layers of the nickel or nickel alloy layer, the platinum alloy layer, the palladium alloy or nickel alloy layer. between two floors. 如請求項1所述的導電端子,所述多層電鍍層還包括金層,是所述多層電鍍層中遠離所述基材的最外層,以成為所述導電端子的外觀層。As for the conductive terminal according to claim 1, the multi-layer electroplating layer further includes a gold layer, which is the outermost layer of the multi-layer electroplating layer away from the base material to become the appearance layer of the conductive terminal. 如請求項2或3所述的導電端子,各所述金層的厚度是1μinch至40μinch。As for the conductive terminal according to claim 2 or 3, the thickness of each gold layer is 1 μ inch to 40 μ inch. 如請求項1所述的導電端子,所述鉑合金層是鉑釕合金層,其中所述釕含量是1%~3%。As for the conductive terminal according to claim 1, the platinum alloy layer is a platinum-ruthenium alloy layer, wherein the ruthenium content is 1% to 3%. 如請求項1所述的導電端子,所述鉑合金層是鉑銠合金層,其中所述銠含量是3%~5%。As for the conductive terminal according to claim 1, the platinum alloy layer is a platinum-rhodium alloy layer, wherein the rhodium content is 3% to 5%. 如請求項1所述的導電端子,所述鉑合金層是鉑鈀合金層,其中所述鈀含量是15%~20%。As for the conductive terminal described in claim 1, the platinum alloy layer is a platinum-palladium alloy layer, wherein the palladium content is 15% to 20%. 如請求項1所述的導電端子,所述鉑合金層的維氏硬度是HV500~HV650。As for the conductive terminal according to claim 1, the Vickers hardness of the platinum alloy layer is HV500~HV650. 如請求項1所述的導電端子,所述銅層的厚度是10μinch至80μinch,所述鎳或鎳合金層的厚度是1μinch至600μinch,所述鈀合金或鎳合金層的厚度是1μinch至100μinch,所述鉑合金層的厚度是1μinch至100μinch。As for the conductive terminal according to claim 1, the thickness of the copper layer is 10 μinch to 80 μinch, the thickness of the nickel or nickel alloy layer is 1 μinch to 600 μinch, and the thickness of the palladium alloy or nickel alloy layer is 1 μinch to 100 μinch, The thickness of the platinum alloy layer is 1 μinch to 100 μinch. 如請求項1所述的導電端子,所述鎳或鎳合金層是鎳鎢合金層、鎳磷合金層、鎳鈷合金層或鎳錫合金層。As for the conductive terminal according to claim 1, the nickel or nickel alloy layer is a nickel-tungsten alloy layer, a nickel-phosphorus alloy layer, a nickel-cobalt alloy layer or a nickel-tin alloy layer. 如請求項1所述的導電端子,所述導電端子是下料式端子、折彎式端子、彈簧針端子或冠簧端子。The conductive terminal according to claim 1, which is a blanking terminal, a bending terminal, a spring pin terminal or a crown spring terminal. 如請求項1所述的導電端子,所述基材的材質是銅或其合金。As for the conductive terminal according to claim 1, the material of the base material is copper or its alloy.
TW111213723U 2022-02-17 2022-12-12 Electrical conducting terminal TWM645487U (en)

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CN202220316466.2 2022-02-17

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