TWM643850U - Interlaced dual-mask roller exposure equipment - Google Patents

Abstract

The invention discloses a staggered double-mask roller exposure equipment, which includes a roller fixing device and a photolithography device arranged at intervals on the roller fixing device. The roller fixing device is used to fix a metal roller coated with a photoresist layer, and the length of the metal roller is between 1.6 meters and 1.8 meters. The lithography device comprises two exposure light sources and two photomasks mounted on the two exposure light sources, and the two exposure light sources can be used to cooperate with the two photomasks to respectively irradiate a first lithography light and a second lithography light to any two adjacent regions of the photoresist layer. The two photomasks are respectively formed with a plurality of sine wave patterns spaced apart from each other and parallel to each other, and the length direction of each sine wave pattern of one photomask is perpendicular to the length direction of each sine wave pattern of the other photomask.

Description

Interlaced double mask roller exposure equipment

The invention relates to an exposure device, in particular to an interlaced double-mask roller exposure device.

In order to form a complex two-dimensional holographic pattern on the photoresist layer when exposing a photoresist layer on a metal roller in the existing roller lithography equipment, it is often necessary to cooperate with a mask with a complex two-dimensional holographic pattern to form a complex two-dimensional holographic pattern. However, such masks with complex two-dimensional holographic patterns are often expensive, which also increases the cost of the overall photolithography process.

Therefore, how to overcome the above-mentioned defects by improving the structural design has become one of the important issues to be solved by this project.

The embodiment of the present invention provides an interleaved double-mask roller exposure device for the deficiencies of the prior art, which can effectively improve the possible defects of the existing roller lithography equipment.

The embodiment of the invention discloses an interlaced double-mask roller exposure device, which includes: a roller fixing device for fixing a metal roller coated with a photoresist layer, and the length of the metal roller is between 1.6 meters and 1.8 meters, and the metal roller is a chromium metal roller; Any two adjacent regions of the photoresist layer are respectively irradiated with a first photolithography light and a second photolithography light; wherein, the two photomasks are respectively formed with a plurality of sine wave patterns spaced apart from each other and parallel to each other, and the length direction of any one of the sine wave patterns of one of the photomasks is perpendicular to the length direction of any one of the sine wave patterns of the other photomask.

One of the beneficial effects of this creation is that the interleaved double-mask roller exposure equipment provided by this creation can reduce process costs and reduce operating time through the technical means of "two said masks are installed on two said exposure light sources, and the two said exposure light sources can be used to cooperate with the two said masks to respectively irradiate the first photolithography light and the second photolithography light to any two adjacent regions of the photoresist layer".

In order to further understand the characteristics and technical content of this creation, please refer to the following detailed description and drawings about this creation. However, the provided drawings are only for reference and explanation, and are not used to limit this creation.

The following is a description of the implementation of the "interleaved double-mask roller exposure equipment" disclosed in this creation through specific specific examples. Those skilled in the art can understand the advantages and effects of this creation from the content disclosed in this specification. This creation can be implemented or applied through other different specific embodiments, and the details in this specification can also be modified and changed based on different viewpoints and applications without departing from the idea of this creation. In addition, the drawings of this creation are only for simple illustration, not according to the actual size of the depiction, prior statement. In addition, if it is pointed out below that please refer to the specific drawing or as shown in the specific drawing, it is only used to emphasize in the subsequent description, and most of the relevant content mentioned appears in the specific drawing, but it does not limit that the subsequent description can only refer to the specific drawing. The following embodiments will further describe the relevant technical content of this creation in detail, but the disclosed content is not intended to limit the protection scope of this creation.

It should be understood that although terms such as "first", "second", and "third" may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are mainly used to distinguish one element from another element, or one signal from another signal. In addition, the term "or" used herein may include any one or a combination of more of the associated listed items depending on the actual situation.

Please refer to Figures 1 to 7, which are examples of this creation. What needs to be explained first is that the drawings corresponding to this embodiment and the relevant quantities and shapes mentioned are only used to specifically illustrate the implementation of this creation, so as to facilitate understanding of the content of this creation, and are not used to limit the scope of protection of this creation.

As shown in FIG. 1 , the embodiment of the invention provides an interleaved double-mask roller exposure equipment 100, which includes: a roller fixing device 1, a photolithography device 2, a rotating device 3, a moving device 4, an infiltration device 5, a lifting device 6, a baking device 7 and a dust-free chamber 8, but the invention is not limited thereto. For example, in other embodiments not shown in this creation, the interleaved double-mask roller exposure equipment 100 may not include the baking device 7 and the dust-free chamber 8 .

For the convenience of description and understanding, the specific structures of the roller fixing device 1, the rotating device 3, the photolithography device 2, the moving device 4, the infiltration device 5, the lifting device 6, the baking device 7 and the dust-free cavity 8 will be described in sequence, and the mutual positional relationship and actuation relationship between the above-mentioned devices will be described in due course.

As shown in FIGS. 1 to 5 , the roller fixing device 1 is used to fix a metal roller 200 coated with a photoresist layer 300 , and the rotating device 3 is installed on the roller fixing device 1 , and the rotating device 3 is used to rotate the metal roller 200 . Furthermore, in this embodiment, the roller fixing device 1 includes a clamping mechanism 11 , and the clamping mechanism 11 is installed on the rotating device 3 . Wherein, the clamping mechanism 11 is used to clamp the metal roller 200 , and when the rotating device 3 operates, the rotating device 3 will rotate the clamping mechanism 11 so that the metal roller 200 is rotated by the clamping mechanism 11 .

It should be noted that the clamping mechanism 11 includes a circular elastic collet (not shown in the figure), and the clamping mechanism 11 is driven by hydraulic pressure, so that the circular elastic collet can clamp the metal roller 200, but the invention is not limited thereto. For example, the circular elastic collet can also be other fixtures such as lathe chucks, and the clamping mechanism 11 can also be driven by air pressure or manually, so that the circular elastic collet can clamp the metal roller 200 .

It should be noted that the rotating device 3 includes a speed control mechanism (not shown in the figure), which can be used to rotate the metal roller 200 at a drying speed ranging from 2900 rpm to 4500 rpm, or to rotate the metal roller 200 at a wetting speed ranging from 1 rpm to 120 rpm.

It should be noted that in this embodiment, the light resistance layer 300 is formed by a positive light resistant agent, and the light resistance layer 300 is mainly made of phenol-FormalDehyde Resin, and the metal roller 200 is better. And the light resistance layer 300 can also be made of positive light resistant agent materials such as epoxy resin.

The roller fixing device 1 and the rotating device 3 have been introduced so far, and the lithography device 2 will be introduced below. As shown in FIG. 1 to FIG. 5 , the lithography apparatus 2 is disposed on the roller fixing device 1 at intervals, and the lithography apparatus 2 includes two exposure light sources 21 and two photomasks 22 installed on the two exposure light sources 21, and the two exposure light sources 21 can be used to cooperate with the two photomasks 22 to respectively irradiate a first lithography light (not shown) and a second lithography light (not shown) on any two adjacent regions (not shown) of the photoresist layer 300 . That is to say, the first photolithography light and the second photolithography light irradiate any two adjacent regions of the photoresist layer 300 alternately and non-overlappingly. Wherein, the size of the area varies with the size of each mask 22 and the distance between each mask 22 and the metal roller 200 .

It should be noted that, as shown in FIGS. 6 and 7 , the two photomasks 22 are respectively formed with a plurality of sine wave patterns 221 spaced from each other and parallel to each other, and the longitudinal direction of any one of the sine wave patterns 221 of one of the photomasks 22 is perpendicular to the longitudinal direction of any one of the sine wave patterns 221 of the other photomask 22.

Thereby, the staggered double-mask roller exposure equipment 100 can pass "the two exposure light sources 21 can be used to cooperate with the two photomasks 22 to respectively irradiate the first photolithography light and the second photolithography light to any two adjacent regions of the photoresist layer 300" and "the two photomasks 22 are respectively formed with a plurality of the sine wave patterns 221 spaced from each other and parallel to each other, and the length direction of any one of the sine wave patterns 221 of one photomask 22 is perpendicular to the other photomask 2 2, so that a plurality of staggered photolithographic patterns (not shown in the figure) are formed on the photoresist layer 300.

The lithography apparatus 2 has been introduced so far, and the moving apparatus 4 will be introduced below. As shown in FIGS. 1 to 5 , the moving device 4 is arranged at intervals on the roller fixing device 1 , and the moving device 4 is connected and can be used to move the two exposure light sources 21 and the two photomasks 22 so that the photolithography pattern can be evenly distributed on the photoresist layer 300 .

The moving device 4 has been introduced so far, and the infiltration device 5 and the lifting device 6 will be introduced below. As shown in FIGS. 1 to 5 , the wetting device 5 includes an accommodating tank 51 and two covers 52 installed on the accommodating tank 51, and the accommodating tank 51 can be used to accommodate a developer 5A, and the two covers 52 can be used to prevent excessive dust or impurities from entering the accommodating tank 51; bottom, and the lifting mechanism 61 is used to move the accommodating tank 51 of the infiltration device 5 along a direction perpendicular to the axis of the metal roller 200 .

It should be noted that, as shown in FIGS. 1 to 5 , when the metal roller 200 is located in the accommodating tank 51 of the wetting device 5, the metal roller 200 can be used to soak the developer 5A in the accommodating tank 51 of the wetting device 5, and the metal roller 200 can be rotated by the rotating device 3 at the wetting speed, so that the metal roller 200 can be evenly distributed with the developer 5A, and the exposed part of the photoresist Layer 300 is dissolved in the developer 5A to form a patterned photoresist layer 400 .

In addition, after the metal roller 200 has soaked the developer 5A in the holding tank 51 , the metal roller 200 can be rotated by the rotating device 3 at the drying speed, so that the developer 5A remaining on the photoresist layer 300 is separated from the metal roller 200 .

It should be noted that the types and proportions of the constituent materials of the developer 5A correspond to the types and proportions of the constituent materials of the photoresist layer 300 . In other words, the types and ratios of the constituent materials contained in the developer 5A vary with the types and ratios of the constituent materials of the photoresist layer 300 . The developer 5A includes an aqueous alkali solution dissolved with tetramethylammonium hydroxide (TMAH) in this embodiment, but the present invention is not limited thereto. For example, in other embodiments, the aqueous alkali solution dissolved with tetramethylammonium hydroxide (TMAH) may also be replaced with an aqueous alkali solution dissolved with tetraethylammonium hydroxide (TEAH), tetrapropylammonium hydroxide (TPAH), or tetrabutylammonium hydroxide (TBAH).

The wetting device 5 and the lifting device 6 have been introduced so far, and the baking device 7 will be introduced below. As shown in FIGS. 1 to 5 , the baking device 7 is used to remove excess solvent in the patterned photoresist layer 400 , and the baking device 7 is an infrared lamp in this embodiment, which is spaced and fixedly arranged on the side of the metal roller 200 relatively far away from the wetting device 5 , but the invention is not limited thereto. For example, the baking device 7 can be spaced and movably arranged on the side of the metal roller 200 relatively away from the soaking device 5, and the roasting device 7 can also be a near-infrared lamp or a xenon lamp; or, the roasting device 7 can be spaced and adjacently arranged on the soaking device 5.

It should be noted that when the baking device 7 bakes the patterned photoresist layer 400, the rotating device 3 can rotate the metal roller 200 at the wetting speed, so that the patterned photoresist layer 400 can be evenly baked by the baking device 7, and then the excess solvent in the patterned photoresist layer 400 can be completely removed.

The baking device 7 has been introduced so far, and the dust-free cavity 8 will be introduced below. As shown in FIGS. 1 to 5 , the dust-free chamber 8 is used to prevent the metal roller 200 from being adhered by pollution sources in the environment when developing, and the roller fixing device 1 , the photolithography device 2 , the rotating device 3 , the moving device 4 , the infiltration device 5 , the lifting device 6 , and the baking device 7 are arranged in the dust-free chamber 8 . Wherein, the grade of the dust-free cavity 8 in this embodiment is US Federal Standard Class 1 to US Federal Standard Class 500.

[Advantageous Effects of Embodiment]

One of the beneficial effects of this invention is that the staggered double-mask roller exposure equipment 100 provided by this invention can reduce process costs and reduce operating time through the technical means of "two said masks 22 are installed on two said exposure light sources 21, and two said exposure light sources 21 can be used to cooperate with two said masks 22 to respectively irradiate said first photolithography light and said second photolithography light to any two adjacent regions of said photoresist layer 300".

The content disclosed above is only a preferred feasible embodiment of this creation, and does not limit the scope of patent application for this creation. Therefore, all equivalent technical changes made by using the contents of the instructions and drawings of this creation are included in the scope of patent application for this creation.

100:Interlaced double mask roller exposure equipment 1: Roller fixing device 11: Clamping mechanism 2: Photolithography device 21: Exposure light source 22: Mask 221: Sine wave pattern 3: Turning device 4:Mobile device 5: Infiltration device 51: storage tank 52: cover body 5A: Developer 6: Lifting device 61: Lifting mechanism 62: Support mechanism 7: Baking device 8: Dust-free cavity 200: metal roller 300: photoresist layer 400: Patterned photoresist layer

FIG. 1 is a three-dimensional schematic diagram of an interleaved double-mask roller exposure device according to an embodiment of the present invention.

FIG. 2 is another schematic perspective view of the interleaved double-mask roller exposure device of the present invention.

FIG. 3 is a schematic diagram (1) of the action of the interleaved double-mask roller exposure equipment of the present invention.

FIG. 4 is a schematic diagram (2) of the action of the interleaved double-mask roller exposure device of the present invention.

FIG. 5 is a schematic diagram (3) of the action of the interleaved double-mask roller exposure equipment of the present invention.

FIG. 6 is a schematic top view of a photomask according to an embodiment of the present invention.

FIG. 7 is another schematic top view of the photomask of the present invention.

100:Interlaced double mask roller exposure equipment

1: Roller fixing device

11: Clamping mechanism

2: Photolithography device

21: Exposure light source

22: Mask

3: Turning device

4:Mobile device

5: Infiltration device

51: storage tank

52: cover body

6: Lifting device

61: Lifting mechanism

62: Support mechanism

7: Baking device

8: Dust-free cavity

200: metal roller

400: Patterned photoresist layer

Claims (10)

An interlaced double-mask roller exposure device, which includes: A roller fixing device, used to fix a metal roller coated with a photoresist layer, and the length of the metal roller is between 1.6 meters and 1.8 meters, and the metal roller is a chrome metal roller; and A photolithography device is arranged on the roller fixing device at intervals, and the photolithography device includes: two exposure light sources; and Two photomasks, installed on the two exposure light sources, and the two exposure light sources can be used to cooperate with the two photomasks to respectively irradiate a first lithography light and a second lithography light to any two adjacent regions of the photoresist layer; Wherein, the two photomasks are respectively formed with a plurality of sine wave patterns spaced apart from each other and parallel to each other, and the length direction of any one of the sine wave patterns of one of the photomasks is perpendicular to the length direction of any one of the sine wave patterns of the other photomask. The staggered double-mask roller exposure equipment according to claim 1, wherein the staggered double-mask roller exposure equipment further includes a clean chamber, and the roller fixing device and the photolithography device are arranged in the dust-free chamber. The staggered double-mask roller exposure equipment according to claim 1, wherein the staggered double-mask roller exposure equipment further includes a moving device connected to and capable of moving the two exposure light sources and the two masks. The staggered double-mask roller exposure equipment as described in claim 1, wherein the staggered double-mask roller exposure equipment further includes a wetting device, which includes a storage tank and two covers installed in the storage tank, and the storage tank is used to accommodate a developer, and the two covers are used to prevent external dust from entering the storage tank. The staggered double-mask roller exposure equipment as described in claim 4, wherein the staggered double-mask roller exposure equipment further includes a lifting device, and the lifting device includes a lifting mechanism and a supporting mechanism installed on the lifting mechanism; wherein, the supporting mechanism is used to support the bottom of the immersion device, and the lifting mechanism is used to move the immersion device along a direction perpendicular to the axis of the metal roller. The staggered double-mask roller exposure equipment according to claim 1, wherein the staggered double-mask roller exposure equipment further includes a rotating device installed on the roller fixing device, and the rotating device is used to rotate the metal roller. The staggered double-mask roller exposure equipment as described in claim 6, wherein the roller fixing device includes a clamping mechanism, the clamping mechanism is installed on the rotating device, and the clamping mechanism is used to clamp the metal roller; wherein, when the rotating device operates, the rotating device will rotate the clamping mechanism, so that the metal roller is rotated by the clamping mechanism. The staggered double-mask roller exposure apparatus as claimed in claim 6, wherein the rotating device includes a speed control mechanism, which can be used to rotate the metal roller at an immersion speed ranging from 1 rpm to 120 rpm. The interlaced double-mask roller exposure equipment as claimed in claim 6, wherein the rotating device includes a speed control mechanism, which can be used to rotate the metal roller at a drying speed ranging from 2900 rpm to 4500 rpm. The staggered double-mask roller exposure equipment according to claim 1, wherein the staggered double-mask roller exposure equipment further includes a baking device, and the baking device is arranged at intervals on the roller fixing device.

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