TWM644538U - Double mask roller adjustment viewing angle exposure equipment - Google Patents

Abstract

The invention discloses a double-mask roller adjustment viewing angle exposure equipment, which includes a roller fixing device and a photolithography device arranged at intervals on the roller fixing device. The roller fixing device is used for fixing a metal roller coated with a photoresist layer. The lithography device comprises two exposure light sources and two photomasks installed on the two exposure light sources, and the two exposure light sources can be used to cooperate with the two photomasks to irradiate the same area of the photoresist layer with a first photolithography light and a second lithography light. The two photomasks are respectively formed with a plurality of sine wave patterns spaced apart from each other and parallel to each other, and the length direction of each sine wave pattern of one photomask is perpendicular to the length direction of each sine wave pattern of the other photomask, while the two The line width/line distance of any sine wave pattern of each mask is between 2/8-8/2.

Description

Double mask roller adjustment viewing angle exposure equipment

The invention relates to a photolithography equipment, in particular to an exposure equipment with double mask rollers to adjust the angle of view.

When exposing a photoresist layer on a metal roller in the existing roller lithography equipment, in order to form a complex holographic pattern on the photoresist layer, it is often necessary to cooperate with a photomask with a complex holographic pattern to form a complex holographic pattern. like pattern. However, such masks with complex holographic patterns are often expensive, which also increases the cost of the overall photolithography process.

Therefore, how to overcome the above-mentioned defects by improving the structural design has become one of the important issues to be solved by this project.

The embodiment of the present invention provides a double-mask roller adjustment viewing angle exposure device for the shortcomings of the existing technology, which can effectively improve the possible defects of the existing roller lithography equipment.

The embodiment of the invention discloses a double-mask roller adjustment viewing angle exposure equipment, which includes: a roller fixing device, used to fix a metal roller coated with a photoresist layer, and the length of the metal roller is between 1.6 meters and 1.8 meters between meters, and the metal roller is a chromium metal roller; and a photolithography device is arranged at intervals on the roller fixing device, and the photolithography device includes: two exposure light sources; and two photomasks, Installed on the two exposure light sources, and the two exposure light sources can be used to cooperate with the two photomasks to irradiate a first lithography light and a second lithography light to the same area of the photoresist layer ; wherein, the two reticles are respectively formed with a plurality of sine wave patterns spaced apart from each other and parallel to each other, and the length direction of any one of the sine wave patterns of one of the reticles is perpendicular to that of the other reticle The length direction of any one of the sine wave patterns, and the line width/line spacing of any one of the sine wave patterns of the two masks is between 2/8˜8/2.

One of the beneficial effects of this creation is that the double-mask roller adjustment viewing angle exposure equipment provided by this creation can form a plurality of sine waves spaced apart from each other and parallel to each other through "two said masks respectively. pattern, and the length direction of any one of the sine wave patterns of one of the reticles is perpendicular to the length direction of any one of the sine wave patterns of the other reticle, while the two reticles Any one of the sine wave patterns whose line width/line pitch is between 2/8 to 8/2" can reduce the manufacturing cost and reduce the working time.

In order to further understand the characteristics and technical content of this creation, please refer to the following detailed description and drawings about this creation. However, the provided drawings are only for reference and explanation, and are not used to limit this creation.

The following is a description of the implementation of the "dual mask roller adjustment viewing angle exposure device" disclosed in this creation through specific specific examples. Those skilled in the art can understand the advantages and effects of this creation from the content disclosed in this specification. This creation can be implemented or applied through other different specific embodiments, and the details in this specification can also be modified and changed based on different viewpoints and applications without departing from the idea of this creation. In addition, the drawings of this creation are only for simple illustration, not according to the actual size of the depiction, prior statement. In addition, if it is pointed out below that please refer to the specific drawing or as shown in the specific drawing, it is only used to emphasize the follow-up description. Most of the relevant content mentioned appears in the specific drawing, but not In this ensuing description, reference may be made to only the specific drawings described. The following embodiments will further describe the relevant technical content of this creation in detail, but the disclosed content is not intended to limit the protection scope of this creation.

It should be understood that although terms such as "first", "second", and "third" may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are mainly used to distinguish one element from another element, or one signal from another signal. In addition, the term "or" used herein may include any one or a combination of more of the associated listed items depending on the actual situation.

Please refer to Figures 1 to 10, which are the embodiments of this invention. It should be noted that the drawings corresponding to this embodiment and the relevant quantities and shapes mentioned are only used for specific illustrations. The implementation method of this creation is to facilitate understanding of the content of this creation, not to limit the scope of protection of this creation.

As shown in FIG. 1 , the embodiment of the invention provides a double mask roller adjustment viewing angle exposure equipment 100, which includes: a roller fixing device 1, a photolithography device 2, a rotating device 3, a moving device 4, and an infiltration device 5. A lifting device 6, a baking device 7 and a dust-free cavity 8, but the invention is not limited thereto. For example, in other embodiments not shown in this creation, the exposure device 100 for adjusting the angle of view with double mask rollers may also not include the baking device 7 and the clean chamber 8 .

For the convenience of description and understanding, the roller fixing device 1, the rotating device 3, the photolithography device 2, the moving device 4, the infiltration device 5, the lifting device 6, the The specific structure of the baking device 7 and the dust-free cavity 8 is described, and the mutual positional relationship and actuation relationship between the above-mentioned devices are described in due course.

As shown in Figures 1 to 5, the roller fixing device 1 is used to fix a metal roller 200 coated with a photoresist layer 300, and the rotating device 3 is installed on the roller fixing device 1, and the rotating The device 3 is used to rotate the metal roller 200 . Furthermore, in this embodiment, the roller fixing device 1 includes a clamping mechanism 11 , and the clamping mechanism 11 is installed on the rotating device 3 . Wherein, the clamping mechanism 11 is used to clamp the metal roller 200, and when the rotating device 3 operates, the rotating device 3 will rotate the clamping mechanism 11, so that the metal roller 200 is held The clamping mechanism 11 rotates.

It should be noted that the clamping mechanism 11 includes a circular elastic collet (not shown in the figure), and the clamping mechanism 11 is driven by hydraulic pressure, so that the circular elastic collet can clamp The metal roller 200, but the invention is not limited thereto. For example, the circular elastic collet can also be other fixtures such as lathe chucks, and the clamping mechanism 11 can also be driven by air pressure or manually, so that the circular elastic collet can clamp the Described metal roller 200.

It should be noted that the rotating device 3 includes a speed control mechanism (not shown in the figure), which can be used to make the metal roller 200 rotate at a drying speed between 2900 rpm and 4500 rpm, Alternatively, the metal roller 200 is rotated at a wetting speed ranging from 1 rpm to 120 rpm.

It should be noted that, in this embodiment, the photoresist layer 300 is formed of a positive photoresist, and the photoresist layer 300 is mainly made of phenol-formaldehyde resin, and the metal roller 200 It is preferably a chromium metal roller, and the length of the metal roller 200 is between 1.6 meters and 1.8 meters, and the photoresist layer 300 can also be made of positive photoresist materials such as epoxy resin.

The roller fixing device 1 and the rotating device 3 have been introduced so far, and the lithography device 2 will be introduced below. As shown in FIGS. 1 to 5 , the lithography apparatus 2 is arranged on the roller fixing device 1 at intervals, and the lithography apparatus 2 includes two exposure light sources 21 and two light sources installed on the two exposure light sources 21. The two photomasks 22 and the two exposure light sources 21 can be used to cooperate with the two photomasks 22 to illuminate the same area of the photoresist layer 300 with a first photolithography light (not shown) and a The second photolithography light (not drawn).

It should be noted that, as shown in FIG. 6 and FIG. 7 , the two reticles 22 are respectively formed with a plurality of sine wave patterns 221 spaced apart from each other and parallel to each other, and any one of the sine wave patterns 221 of one of the reticles 22 is The longitudinal direction of the wave pattern 221 is perpendicular to the longitudinal direction of any one of the sine wave patterns 221 of the other said reticle 22, and the linewidth of any one of the sine wave patterns 221 of the two reticles 22 / The line spacing is between 2/8 and 8/2. Wherein, as shown in FIG. 5 , FIG. 8 to FIG. 10 , after the first lithography light and the second lithography light irradiate the same area of the photoresist layer 300 , there will be correspondingly formed A plurality of photolithographic patterns 301 are perpendicular to each other, and each of the photolithographic patterns 301 actually has a sinusoidal waveform.

Further, as shown in FIG. 8, when the line width/line distance of any one of the sine wave patterns 221 of the two reticles 22 is 2/8, any two adjacent photolithography A lithographic pattern spacing 301A between the patterns 301 is between 0.8 microns and 1.2 microns; as shown in FIG. When it is 5/5, the distance 301B between any two adjacent photolithographic patterns 301 is about 0.3 micron to 0.7 micron; when any one of the two photomasks 22 When the line width/line spacing of the sine wave pattern 221 is 8/2, the distance 301C between any two adjacent photolithographic patterns 301 is between 0.05 μm and 0.2 μm.

In this way, the double-mask roller adjustment viewing angle exposure equipment 100 can use "the two exposure light sources 21 can be used to cooperate with the two photomasks 22 to illuminate the same area of the photoresist layer 300 respectively. A lithography light and the second lithography light" and "two reticles 22 are respectively formed with a plurality of sine wave patterns 221 spaced apart from each other and parallel to each other, and any one of the reticles 22 The longitudinal direction of the sine wave pattern 221 is perpendicular to the longitudinal direction of any one of the sine wave patterns 221 of the other said photomask 22, and the said sine wave pattern of any one of the two said photomasks 22 The technical means that the line width/line spacing of the pattern 221 is between 2/8 ~ 8/2", so that the photoresist between 0.05 micron and 1.2 micron is correspondingly formed on the photoresist layer 300 The pattern distances 301A, 301B, and 301C further enable the metal roller 200 to form various microstructures with various interference effects in the subsequent roller dry etching process.

The lithography apparatus 2 has been introduced so far, and the moving apparatus 4 will be introduced below. As shown in Figures 1 to 5, the moving device 4 is arranged at intervals on the roller fixing device 1, and the moving device 4 is connected and can be used to move the two exposure light sources 21 and the two light sources. The mask 22 enables the photolithography pattern to be evenly distributed on the photoresist layer 300 .

The moving device 4 has been introduced so far, and the infiltration device 5 and the lifting device 6 will be introduced below. As shown in Figures 1 to 5, the soaking device 5 includes a housing tank 51 and two covers 52 installed on the housing tank 51, and the housing tank 51 can be used to accommodate a developer agent 5A, and the two covers 52 can be used to prevent too much dust or impurities from entering the accommodating tank 51; the lifting device 6 includes a lifting mechanism 61 and a supporting mechanism installed on the lifting mechanism 61 62, and the support mechanism 62 is used to support the bottom of the accommodating tank 51 of the infiltration device 5, and the lifting mechanism 61 is used to make the accommodating tank 51 of the infiltration device 5 move along the vertical The axis of the metal roller 200 moves in one direction.

It should be noted that, as shown in FIGS. The developer 5A in the accommodating tank 51 of the device 5, and the metal roller 200 can be rotated at the wetting speed by the rotating device 3, so that the metal roller 200 can be evenly distributed with The developer 5A, and dissolve the exposed portion of the photoresist layer 300 in the developer 5A, thereby forming a patterned photoresist layer 400 .

In addition, after the metal roller 200 has soaked the developer 5A in the accommodating tank 51, the metal roller 200 can be rotated by the rotating device 3 at the drying speed, so that the remaining The developer 5A on the photoresist layer 300 is separated from the metal roller 200 .

It should be noted that the types and proportions of the constituent materials of the developer 5A correspond to the types and proportions of the constituent materials of the photoresist layer 300 . In other words, the types and ratios of the constituent materials contained in the developer 5A vary with the types and ratios of the constituent materials of the photoresist layer 300 . The developer 5A includes an aqueous alkali solution dissolved with tetramethylammonium hydroxide (TMAH) in this embodiment, but the present invention is not limited thereto. For example, in other embodiments, the aqueous alkali solution dissolved with tetramethylammonium hydroxide (TMAH) can also be replaced with dissolved tetraethylammonium hydroxide (TEAH), tetrapropylammonium hydroxide (TPAH), or an aqueous alkali solution of tetrabutylammonium hydroxide (TBAH).

The wetting device 5 and the lifting device 6 have been introduced so far, and the baking device 7 will be introduced below. As shown in Figures 1 to 5, the baking device 7 is used to remove excess solvent in the patterned photoresist layer 400, and the baking device 7 is an infrared lamp in this embodiment, separated by It is fixedly arranged on the side of the metal roller 200 relatively away from the infiltration device 5 , but the present invention is not limited thereto. For example, the baking device 7 can be spaced and movably arranged on the side of the metal roller 200 relatively away from the soaking device 5, and the baking device 7 can also be a near-infrared lamp or a xenon lamp; alternatively, the baking device 7 may be spaced and adjacently arranged on the soaking device 5 .

It should be noted that, when the baking device 7 bakes the patterned photoresist layer 400, the rotating device 3 can rotate the metal roller 200 at the wetting speed, so that the patterned photoresist layer 400 can be baked. The resist layer 400 can be evenly baked by the baking device 7 , so that the excess solvent in the patterned photoresist layer 400 can be completely removed.

The baking device 7 has been introduced so far, and the dust-free cavity 8 will be introduced below. As shown in Figures 1 to 5, the dust-free chamber 8 is used to prevent the metal roller 200 from being adhered to by pollution sources in the environment when developing, and the roller fixing device 1, the photolithography device 2, and the The rotating device 3 , the moving device 4 , the soaking device 5 , the lifting device 6 , and the baking device 7 are arranged in the dust-free cavity 8 . Wherein, the grade of the dust-free cavity 8 in this embodiment is US Federal Standard Class 1 to US Federal Standard Class 500.

[Advantageous Effects of Embodiment]

One of the beneficial effects of this creation is that the double-mask roller adjustment viewing angle exposure device 100 provided by this creation can pass through "the two masks 22 are respectively formed with a plurality of said A sine wave pattern 221, and the length direction of any one of the sine wave patterns 221 of one of the reticles 22 is perpendicular to the length direction of any one of the sine wave patterns 221 of the other reticle 22, And the technical means that the line width/line distance of the sine wave pattern 221 of any one of the two photomasks 22 is between 2/8-8/2" reduces the manufacturing cost and reduces the working time.

The content disclosed above is only the preferred feasible embodiment of this creation, and does not limit the scope of patent application for this creation. Therefore, all equivalent technical changes made by using the instructions and drawings of this creation are included in the application of this creation. within the scope of the patent.

100: Dual mask rollers to adjust viewing angle exposure equipment 1: Roller fixing device 11: Clamping mechanism 2: Photolithography device 21: Exposure light source 22: Mask 221: Sine wave pattern 3: Turning device 4:Mobile device 5: Infiltration device 51: storage tank 52: cover body 5A: Developer 6: Lifting device 61: Lifting mechanism 62: Support mechanism 7: Baking device 8: Dust-free cavity 200: metal roller 300: photoresist layer 301: Photolithography pattern 301A: Photolithographic pattern spacing 301B: Photolithographic pattern spacing 301C: Photolithographic pattern spacing 400: Patterned photoresist layer

FIG. 1 is a three-dimensional schematic diagram of an exposure device with dual mask rollers for adjusting viewing angles according to an embodiment of the present invention.

FIG. 2 is another schematic perspective view of an exposure device with dual mask rollers for adjusting viewing angles according to an embodiment of the present invention.

FIG. 3 is a schematic diagram (1) of the action of the dual-mask roller adjustment viewing angle exposure device of the present invention.

FIG. 4 is a schematic diagram (2) of the action of the exposure device with dual mask rollers to adjust the viewing angle in the embodiment of the present invention.

FIG. 5 is a schematic diagram (3) of the action of the exposure device with dual mask rollers for adjusting the viewing angle in the embodiment of the present invention.

FIG. 6 is a schematic top view of a photomask according to an embodiment of the present invention.

FIG. 7 is another schematic top view of the photomask of the present invention.

FIG. 8 is an enlarged schematic view of part VIII of FIG. 5 .

FIG. 9 is a schematic diagram (1) of another form of the photolithography pattern in FIG. 8 .

FIG. 10 is another schematic diagram (2) of the photolithography pattern in FIG. 8 .

100: Dual mask rollers to adjust viewing angle exposure equipment

1: Roller fixing device

11: Clamping mechanism

2: Photolithography device

21: Exposure light source

22: Mask

3: Turning device

4:Mobile device

5: Infiltration device

51: storage tank

52: cover body

6: Lifting device

61: Lifting mechanism

62: Support mechanism

7: Baking device

8: Dust-free cavity

200: metal roller

300: photoresist layer

Claims (10)

A double-mask roller adjustment viewing angle exposure device, which includes: A roller fixing device, used to fix a metal roller coated with a photoresist layer, and the length of the metal roller is between 1.6 meters and 1.8 meters, and the metal roller is a chrome metal roller; and A photolithography device is arranged on the roller fixing device at intervals, and the photolithography device includes: two exposure light sources; and Two photomasks are installed on the two exposure light sources, and the two exposure light sources can be used to cooperate with the two photomasks to irradiate the same area of the photoresist layer with a first photolithography light and a second lithography light; Wherein, the two photomasks are respectively formed with a plurality of sine wave patterns spaced apart from each other and parallel to each other, and the length direction of any one of the sine wave patterns of one said photomask is perpendicular to any of the other said photomasks. The length direction of one of the sine wave patterns, and the line width/space of any one of the sine wave patterns of the two masks is between 2/8˜8/2. According to claim 1, the double-mask roller adjustment viewing angle exposure equipment, wherein the double-mask roller adjustment viewing angle exposure equipment further includes a dust-free chamber, and the roller fixing device and the photolithography device are arranged in In the dust-free chamber. According to claim 1, the double-mask roller adjustment viewing angle exposure equipment, wherein the double-mask roller adjustment viewing angle exposure equipment further includes a moving device, which is connected and can be used to move the two exposure light sources and the two exposure light sources. The mask is described. According to claim 1, the double-mask roller adjustment viewing angle exposure equipment, wherein the double-mask roller adjustment viewing angle exposure equipment further includes an infiltration device, which includes a storage tank and two There are two covers, and the accommodating tank is used to accommodate a developer, and the two covers are used to prevent external dust from entering the accommodating tanks. The double-mask roller adjustment viewing angle exposure equipment as described in claim 4, wherein, the double-mask roller adjustment viewing angle exposure equipment further includes a lifting device, and the lifting device includes a lifting mechanism and a lifting mechanism installed on the lifting mechanism. A supporting mechanism; wherein, the supporting mechanism is used to support the bottom of the soaking device, and the lifting mechanism is used to move the soaking device along a direction perpendicular to the axis of the metal roller. The double-mask roller adjustment viewing angle exposure equipment according to claim 1, wherein the double-mask roller adjustment viewing angle exposure equipment further includes a rotating device, which is installed on the roller fixing device, and the rotating device is used to rotate The metal rollers. According to claim 6, the double-mask roller adjustment viewing angle exposure equipment, wherein the roller fixing device includes a clamping mechanism, the clamping mechanism is installed on the rotating device, and the clamping mechanism is used to clamp Hold the metal roller; Wherein, when the rotating device operates, the rotating device will rotate the clamping mechanism, so that the metal roller is rotated by the clamping mechanism. According to claim 6, the double-mask roller adjustment viewing angle exposure equipment, wherein the rotating device includes a speed control mechanism, which can be used to make the metal roller rotate at a speed between 1 rpm and 120 rpm Rotate at an infiltration speed. The double-mask roller adjustment angle exposure equipment as described in claim 6, wherein the rotating device includes a speed control mechanism, which can be used to make the metal roller rotate at a speed between 2900 rpm and 4500 rpm Spin at one spin speed. The double-mask roller adjustment viewing angle exposure equipment according to Claim 1, wherein the double-mask roller adjustment viewing angle exposure equipment further includes a baking device, and the baking device is arranged at intervals on the roller fixing device.