TWM643512U - Anti-deposition object for use in vacuum environment - Google Patents

Abstract

An anti-deposition object for use in a vacuum environment comprises a main structure and a fluorinated coating layer, wherein the fluorinated coating layer covers at least one surface of the main structure, wherein the anti-deposition object is in contact with a process material used or exhausted by a process equipment during a process in the vacuum environment, the fluorinated coating layer has a higher water droplet contact angle to the process substances than the surface of the main structure, the fluorinated coating layer has an approximate or higher hardness than the surface of the main structure, and the fluorinated coating layer has a lower roughness than the surface of the main structure. The fluorinated coating layer has a lower roughness than the surface of the main structure. The invention is used in the vacuum environment to prevent the vacuum parts from being scratched by the impact of process substances such as particles, and to achieve the effect of self-cleaning and easy cleaning, so as to reduce the costs and manpower for frequent maintenance.

Description

Anti-deposition articles for vacuum environment

The invention relates to a vacuum component, in particular to an anti-deposition object used in a vacuum environment.

In recent years, due to the continuous vigorous development of semiconductor technology, technological products have made great strides. In the process of semiconductor wafers, wafers are usually placed in process equipment for related process operations, and a vacuum pump is used to extract air or gas from the process equipment to keep the process equipment in a negative pressure state, that is, to a certain degree of vacuum. However, in the semiconductor manufacturing process, process substances such as process gas or process exhaust gas are easily deposited or accumulated in the fluid channel, which leads to shorter and shorter maintenance cycles, thereby affecting manufacturing costs and schedules.

In view of this, one purpose of this creation is to provide an anti-deposition object used in a vacuum environment to solve the above-mentioned problems in the prior art.

In order to achieve the aforementioned purpose, the invention proposes an anti-deposition object used in a vacuum environment, comprising: a main structure having at least one surface; and a fluorine coating layer covering the surface of the main structure, wherein the anti-deposition object contacts a process substance used or discharged when a process equipment performs a process in a vacuum environment, and the fluorine coating layer has a higher water droplet contact angle for the process substance than the surface of the main structure, and the fluorine coating layer has a higher water droplet contact angle than the surface of the main structure The hardness is similar to or higher, and the fluorine coating layer has a lower roughness than the surface of the main structure.

Wherein, the main structure is an outlet pipe of the process equipment or a pipe or part of a peripheral equipment of the process equipment.

Wherein, the fluorine coating layer is located on the surface of a part of the main structure, and the part is an inclined part, a plane part or a curved part of the main structure.

Wherein, the fluorine coating layer has higher acid corrosion resistance and plasma etching resistance than the surface of the main structure.

Wherein, the surface of the main structure is roughened to form a rough surface with a rough structure to increase surface roughness.

Wherein, the surface of the main structure is roughened by pickling or sandblasting to increase the surface roughness.

Among them, the composition of the fluorine coating layer is composed of 0.01-20%wt of fluorocarbons (Fluoro-carbons), 5-50wt of alkoxysilanes, 0.01%-20%wt of catalytic additives and 10-90wt of solvents.

Wherein, the fluorocarbons are selected from the group consisting of perfluoroalkanes (PFAS), fluorochlorocarbons (CFCs), hemifluoroalkanes (HFCs), fluoropolymers (PTFE) and hydrofluorochlorocarbons (HCFCs). The main material is an organic/inorganic polymer copolymer of fluorine, nano-titanium, silicon, and silicon elastomer

Wherein, the fluorocarbon is a fluorine-containing monomer or polymer containing 1-20 carbon atoms.

Wherein, the alkoxysilanes are selected from alkoxysilane oligomer (Alkoxylsilane Oligomer), alkoxysilane compound (Alkoxylsilane compound), alkoxysilane polymer (Alkoxylsilane polymer), alkoxysiloxane oligomer (Alkoxylsiloxane Oligomer), alkoxylsiloxane compound (Alkoxylsiloxane compound), alkoxylsilane polymer (Alkoxylsil oxane polymer), alkoxylaminosiloxane oligomer, alkoxylaminosiloxane compound and alkoxylaminosiloxane polymer.

Wherein, the catalytic additive is selected from the group consisting of platinum, titanium, tin, zinc, aluminum, silver, calcium, magnesium, potassium, sodium, nickel, chromium, molybdenum, vanadium, copper, iron, cobalt, germanium, hafnium, lanthanum, lead, ruthenium, tantalum, tungsten, zirconium metal, metal oxide, phosphate and carboxylate.

Wherein, the solvent is selected from the group consisting of alcohols, ketones, esters, fluoroalcohols, fluoroethers and ethers.

Wherein, the alkoxysilanes have reactive functional groups, and the reactive functional groups perform self-condensation reaction at room temperature for 1-7 days or at 40-60 degrees Celsius for 1-24 hours.

Wherein, the process performed by the process equipment is an atomic layer deposition (ALD) process, and the process substance is titanium tetrachloride (TiCl ₄ ).

Wherein, the process performed by the process equipment is a metal organic chemical vapor deposition (MOCVD) process, and the process substance is process gas or process waste gas.

Wherein, the process performed by the process equipment is an Al-pad process, and the process substance is process gas reactant or process waste gas.

Wherein, the water droplet contact angle of the fluorine coating layer ranges from 100° to 120°.

Among them, the withstand temperature of the fluorine coating layer reaches 600 degrees Celsius.

Wherein, the hardness of the fluorine coating layer ranges from 8H to 9H.

Wherein, the adhesion force between the fluorine coating layer and the surface of the main body structure is in the range of 4B to 5B by a 100-grid test.

Based on the above, the anti-deposition object used in the vacuum environment of this creation has the following advantages:

(1) By coating the high-hardness fluorine coating layer on the vacuum parts, it can prevent the vacuum parts from being scratched by the impact of process substances such as particles.

(2) By coating the fluorine coating layer with a high water droplet contact angle on the vacuum parts, it can prevent the vacuum parts from depositing, and can achieve the effect of self-cleaning and easy cleaning.

(3) The fluorine coating layer has good adhesion to the main structure, which can avoid peeling during the manufacturing process.

(4) By providing an anti-deposition object with a fluorine coating layer, it is possible to save money and manpower for frequent maintenance.

In order to make Jun Shen have a further understanding and understanding of the technical characteristics of this creation and the technical effects that can be achieved, I would like to accompany it with a better embodiment and a detailed description as follows.

In order to facilitate the understanding of the technical features, content and advantages of this creation and the effects it can achieve, this creation is combined with the diagrams and described in detail in the form of embodiments as follows. The purpose of the diagrams used in it is only for illustration and auxiliary instructions, and may not be the true proportion and precise configuration of this creation after implementation. Therefore, the scale and configuration relationship of the attached diagrams should not be interpreted to limit the scope of rights of this creation in actual implementation. In addition, for ease of understanding, the same elements in the following embodiments are described with the same symbols.

In addition, the terms used in the entire specification and patent claims generally have the ordinary meanings of each term used in this field, in the disclosed content and in the special content, unless otherwise specified. Certain terms used to describe the invention are discussed below or elsewhere in this specification to provide those skilled in the art with additional guidance in describing the invention.

Regarding the use of "first", "second", "third", "fourth" etc. in this article, it is not intended to specifically refer to a sequence or order, nor is it used to limit the invention, but only to distinguish components or operations described with the same technical terms.

Secondly, if the words "comprising", "including", "having", "containing" etc. are used in this article, they are all open terms, meaning including but not limited to.

Please refer to Fig. 1 to Fig. 6, Fig. 1 is a partial structure diagram of the anti-deposition object used in the vacuum environment of the present invention. Fig. 2 is a schematic diagram of the application of the anti-deposition object for vacuum environment in the present invention to the process equipment. Fig. 3 is a schematic cross-sectional structure diagram of the first implementation example of the anti-deposition object used in the vacuum environment of the present invention. Fig. 4 is a schematic cross-sectional structure diagram of the second implementation example of the anti-deposition object used in the vacuum environment of the present invention. Fig. 5 is a schematic cross-sectional structure diagram of a third embodiment of the anti-deposition object used in a vacuum environment according to the present invention. Fig. 6 is a three-dimensional structure diagram of the fourth implementation example of the anti-deposition object used in the vacuum environment of the present invention.

As shown in FIGS. 1 to 6 , the anti-deposition object 10 used in a vacuum environment of the present invention includes a main structure 20 and a fluorine coating layer 30 , and the fluorine coating layer 30 covers the main structure 20 . The anti-deposition object 10 of the present invention is applied in a vacuum environment, and contacts the process substance 110 used or discharged during the process of the process equipment 100 in the vacuum environment. The above-mentioned vacuum environment is not limited to a specific vacuum degree, which can be determined according to the requirements of the process equipment 100. The fluorine coating layer 30 covers at least one surface 22 of the main structure 20 . The fluorine coating layer 30 of the anti-deposition object 10 of the present invention can, for example, cover all or part of the surface of the main structure 20 , such as the surface 22 of a portion 24 of the main structure 20 . Wherein, the portion 24 may be a position where deposition of process substances usually occurs, such as non-planar places such as bends or slopes, and is for example but not limited to the surface of the inner wall. Therefore, in this invention, the above-mentioned part 24 is, for example, the curved part (as shown in FIG. 3 ) or the inclined part (as shown in FIG. 4 ) of the main structure 20, but the present invention is not limited thereto, and the fluorine coating layer 30 of the present invention can also be covered on the plane part of the main structure 20 (as shown in FIG. 5 ). In addition, the main structure 20 of the anti-deposition object 10 of the present invention is, for example, the outlet pipe of the process equipment 100 (as shown in FIGS. 3 to 5 ) or the pipe fittings (as shown in FIGS. 3 to 5 ) or parts of the peripheral equipment (such as a vacuum pump) of the process equipment 100 (as shown in FIGS. 3 to 5 ) or parts (as shown in the Holweck pump part with the spiral guide groove 26 in FIG. 6 ). Although the above-mentioned forms of the main structure 20 of various anti-deposition objects 10 are listed, this creation is not limited thereto, and all forms of objects that can be applied in a vacuum environment belong to the protection scope of this creation. For example, the anti-deposition article 10 and its main structure 20 of the present invention can also be, for example, the cavity or parts of a vacuum pump, such as the rotor blade and/or stator blade of a turbomolecular vacuum pump (TMP). For example, the anti-sedimentation article 10 and its main structure 20 of the present invention can also be, for example, a cavity or components of a valve structure. In short, the present invention can selectively form the fluorine coating layer 30 on the surfaces of all objects that may contact the process substance 110 .

One of the characteristics of the anti-deposition object used in the vacuum environment of the present invention is that the surface 22 of the main structure 20 is covered by the fluorine coating layer 30, so the fluorine coating layer 30 can replace the surface 22 of the main structure 20 to contact the process substance 110 used or discharged during the process of the process equipment 100. Wherein, the fluorine coating layer 30 can cover the surface 22 of the main structure 20 by coating methods such as but not limited to spray coating, brush coating, dip coating or wiping coating. Wherein, the present invention can, for example, directly coat the liquid (fluid state) fluorine coating layer 30 on the surface 22 of the main structure 20, or before coating the liquid fluorine coating layer 30 on the surface 22 of the main structure 20, roughen the surface 22 of the main structure 20 to increase the surface roughness. The roughening treatment can be, for example but not limited to, pickling or sandblasting, so as to form a rough surface with more grooves or notches on the surface 22 of the main structure 20, so as to increase the adhesion between the fluorine coating layer 30 and the surface 22 of the main structure 20. This creation is not limited to specific pickling or sandblasting methods, that is, no matter what kind of technical means is used for roughening treatment, as long as the surface roughness of the main structure 20 can be increased, it belongs to the scope of protection of this creation, so it will not be repeated here.

In this invention, after the liquid (fluid state) fluorine coating layer 30 is coated on the surface 22 of the main structure 20, the self-condensation reaction can be carried out at room temperature for about 1 to 7 days or at a temperature of 40 to 60 degrees Celsius for about 1 to 24 hours, so that the fluorine coating layer 30 is cured on the surface 22 of the main structure 20, and the fluorine coating layer 30 in a cured state is formed. The thickness of the fluorine coating layer 30 can range from 1 μm to 3,000 μm, and can be any numerical range or upper and lower endpoints of this range, for example, from 10 μm to 300 μm. The physical and chemical properties of the fluorine coating layer 30 are better than the original physical and chemical properties of the surface 22 of the main structure 20 . For example, in a vacuum environment, the fluorine coating layer 30 has a higher water drop contact angle θ to the process substance 110 than the surface 22 of the main structure 20, that is, the water drop contact angle between the fluorine coating layer 30 and the process substance 110 (the range is about 100 degrees to 140 degrees, and can be any numerical interval or upper and lower limit endpoint value in this range, such as 106.5 degrees) is higher than the water drop contact between the process substance 110 and the process substance 110 angle (range approximately 89 to 95 degrees). In this invention, by coating the fluorine coating layer 30 with a high water droplet contact angle on the vacuum component, it can prevent the deposition phenomenon of the vacuum component, and can achieve the effect of self-cleaning and easy cleaning. The fluorine coating layer 30 has similar or higher hardness than the surface 22 of the main structure 20, that is, the hardness of the fluorine coating layer 30 (ranging from about 8H to 9H, and can be any numerical interval or upper and lower limit endpoint value in this range) is close to, equal to or higher than the hardness of the surface 22 of the main structure 20 (ranging from about 4H to 6.5H). In this invention, by coating the high-hardness fluorine coating layer 30 on the vacuum components, it can prevent the vacuum components from being scratched by the impact of process substances such as particles. The adhesion between the surface of the fluorine coating layer 30 and the surface of the main structure 20 (the range of the Cross-Cut Test is about 4B to 5B) higher than that of the process material 110 in the contact force (such as the force or adsorption force of the fluorine coating layer 30 when the process material 110 is discharged). The fluorine coating layer 30 has good denseness for the main structure 20, which can avoid the phenomenon of peeling in the process. Compared with the surface 22 of the main structure 20, the fluorine coating layer 30 has higher resistance to acid corrosion and plasma etching, so the fluorine coating layer 30 of the present invention can protect vacuum components from acid corrosion and free radical corrosion. The fluorine coating layer 30 has a lower roughness than the surface 22 of the main structure 20, that is, the roughness of the fluorine coating layer 30 (about 0.2) is lower than the roughness of the surface 22 of the main structure 20, and even the fluorine coating layer 30 can also provide the effect of filling or infiltrating the rough structure 120 such as grooves or nicks on the surface 22 of the main structure 20 to achieve the effect of leveling. In addition, the fluorine coating layer 30 of the present invention can withstand relatively high temperature, and its operating temperature range is quite wide, and the withstand temperature can be as high as about 600 degrees Celsius. The working temperature range of the fluorine coating layer 30 is, for example, less than or equal to about 600 degrees Celsius, preferably from about 260 degrees Celsius to 600 degrees Celsius, and can be any numerical range or upper and lower limit endpoints less than or equal to 600 degrees Celsius. In contrast, traditional water-repellent coatings or anti-fouling coatings usually cannot withstand high temperatures. For example, the use temperature of traditional Teflon is lower than 260 degrees Celsius. What's more, the hardness of traditional water-repellent coatings or antifouling coatings is only about 1H to 3H, for example, the hardness of traditional Teflon is 1H to 2H. It can be seen from this that the traditional water-repellent layer or anti-fouling layer cannot withstand the high temperature, high vacuum, high corrosion, high impact and high deposition environment when the process equipment 100 performs semiconductor manufacturing process. In other words, the anti-deposition article 10 of the present invention can save capital and manpower for frequent maintenance by combining the fluorine coating layer 30 and the main structure 20 .

The composition of the fluorine coating layer 30 of the present invention can be, for example, composed of about 0.01-20%wt of fluorocarbons, about 5-50wt of alkoxysilanes, about 0.01%-20%wt of catalytic additives, and about 10-90%wt of solvents. Fluorocarbons are, for example, fluorine-containing monomers or polymers containing 1-20 carbon atoms. Fluorocarbons are, for example, fluorine-containing monomers containing from about 3 to about 20 carbon atoms and at least one terminal trifluoromethyl group. For example, fluorocarbons are selected from the group consisting of perfluoroalkanes (PFAS), chlorofluorocarbons (CFC), hemifluorocarbons (HFC), fluoropolymers (PTFE) and hydrochlorofluorocarbons (HCFCs). Alkoxysilanes are, for example, selected from the group consisting of alkoxysilane oligomer (Alkoxylsilane Oligomer), alkoxysilane compound (Alkoxylsilane compound), alkoxysilane polymer (Alkoxylsilane polymer), alkoxysiloxane oligomer (Alkoxylsiloxane Oligomer), alkoxylsiloxane compound (Alkoxylsiloxane compound), alkoxysiloxane polymer (Alkoxylsilox ane polymer), alkoxylaminosiloxane oligomer, alkoxylaminosiloxane compound and alkoxylaminosiloxane polymer. Catalytic additives are selected from the group consisting of platinum, titanium, tin, zinc, aluminum, silver, calcium, magnesium, potassium, sodium, nickel, chromium, molybdenum, vanadium, copper, iron, cobalt, germanium, hafnium, lanthanum, lead, ruthenium, tantalum, tungsten, zirconium metals, metal oxides, phosphates and carboxylates. For example, the catalytic additive is selected from the group consisting of silicon oxide, aluminum oxide, titanium oxide, iron oxide, magnesium oxide, molybdenum oxide, calcium oxide and calcium chloride, and is, for example, nano-sized. But this creation is not limited to this. Catalyst additives or components with micronano-sized or even micron-sized all belong to the protection scope of this invention. The solvent is, for example, alcohols such as ethanol, propanol, or butanol. However, the invention is not limited thereto, and the solvent of the invention can be selected from the group consisting of alcohols, ketones, esters, fluoroalcohols, fluoroethers and ethers. The alkoxysilanes of the present invention have reactive functional groups, and the reactive functional groups perform self-condensation reactions at room temperature for 1 to 7 days (for example, 7 days) or at a temperature of 40 to 60 degrees Celsius for 1 to 24 hours (for example, 24 hours). Wherein, the above-mentioned reactive functional group is, for example, a hydrosilation reactive functional group (such as an alkenyl group, an acryl group, a hydrogen atom bonded to a silicon atom), a condensation reactive functional group (such as a hydroxyl group, an alkoxy group, an acyloxy group) or a peroxide hardening reactive functional group (such as an alkyl group, an alkenyl group, acryl group, a hydroxyl group). In addition, in a feasible embodiment, the composition of the fluorine coating layer 30 of the present invention can also be, for example, an organic/inorganic polymer copolymer composed of fluorine, nano-titanium, silicon and silicon elastomer. Because those with ordinary knowledge in the technical field of this creation should know how to select and adjust the anti-deposition object 10 of the fluorine coating layer 30 with the effect of this creation based on the foregoing content of this creation, so no further details are given here.

The method for testing the surface hardness of the invention uses a hardness pencil to test the surface hardness of the fluorine coating layer 30 . For example, load a hardness pencil (Mitsubishi standard pencil) on a trolley with a fixed load at an angle of 45 degrees, and then push the trolley by hand to slide over the surface of the fluorine coating layer 30 of the anti-deposition object 10 to confirm the surface hardness when scratched by the pencil. In the anti-deposition article 10 of this invention, the surface hardness test results of the fluorine coating layer 30 covering the surface 22 of the main structure 20 are all between 8H load 1Kg and 9H load 500g.

The Cross-Cut test of this creation is tested according to ASTM D3359 Method B (cross-cut method). The test method is to use a cross-cut knife to draw 10×10 (100) small grid lines of 1mm×1mm on the surface of the test sample. Hold the small grid line to be tested, and wipe the tape vigorously with an eraser to increase the contact area and strength between the tape and the area to be tested. Grab one end of the tape with your hand, and within 1.5 minutes plus or minus 30 seconds, quickly tear off the tape at an angle of 180 degrees, and observe the peeling state of the fluorine coating layer 30. In the anti-deposition article 10 of the present invention, the 100-grid test results of the fluorine coating layer 30 of the present invention coated on the surface 22 of the main structure 20 are all between 5B (the edge of the cut is completely smooth, and there is no peeling off at the edge of the grid) to 4B (there are small pieces of peeling at the intersection of the cut, and the actual damage in the cross-cut area is ≤ 5%). It can be seen from this that the adhesion (adhesion) of the fluorine coating layer 30 of the present invention to the surface 22 of the main structure 20 is quite high.

The acid corrosion resistance testing experiment of this creation uses 5% HCl (hydrochloric acid) 0.05ML, drops it on the test sample, and waits for the HCl solution to volatilize. After 24 hours of observation, the diffusion area was corroded. According to the test results, the corrosion area (mm²) of the surface 22 of the main structure 20 without the fluorine coating layer 30 is about 45.13mm, but the corrosion area (mm²) of the surface 22 of the main structure 20 coated with the fluorine coating layer 30 is only about 19.4mm.

In addition, this creation has also undergone a plasma etching test, and the results show that under the same etching conditions (CHF ₃ :Ar ratio of 1:1, 60 minutes, the etching rate of oxide is 750nm/30min), the fluorine coating layer 30 of this creation does have better plasma etching resistance than the surface 22 (anodized aluminum material) of the main structure 20. As far as the thermal stability test (Thermogravimetric Analyzer, TGA test) is concerned, under the test environment with a heating rate of 5 degrees Celsius/min and a test atmosphere of N ₂ , the weight of the fluorine coating layer 30 of the present invention decreases steadily and slowly within the test temperature range (600 degrees Celsius), and there is no sudden weight change, which shows that the fluorine coating layer 30 of the anti-deposition object 10 of the present invention does not crack.

The process performed by the process equipment 100 is, for example, a semiconductor process. For example, the process performed by the process equipment 100 is an atomic layer deposition (ALD) process, and the process substance is titanium tetrachloride (TiCl ₄ ), wherein the main structure 20 of the anti-deposition object 10 is, for example, a fluid delivery tube, but not limited thereto. For example, the process performed by the process equipment 100 is a metalorganic chemical vapor deposition (MOCVD) process, and the process substance is process gas or process exhaust gas, wherein the main structure 20 of the anti-deposition object 10 is, for example, an outlet pipe of a vacuum pump, but is not limited thereto. For example, the process performed by the process equipment 100 is an Al-pad process, and the process substance is a process gas reactant or a process waste gas, such as being selected from the group consisting of N ₂ , O ₂ , Ar, SF ₆ , He, HBr, CF ₄ , CH ₄ , Cl ₂ , BCl ₃ , and CHF ₃ . Parts and outlet pipes, but not limited thereto. The anti-deposition object used in vacuum environment has been tested in practice and has good results in the above-mentioned processes. For example, in the aluminum pad (Al-pad) process, the anti-deposition object of this creation can extend the maintenance cycle by about 20%, so it can reduce the capital and manpower for frequent maintenance.

To sum up, the anti-deposition object used in vacuum environment has the following advantages:

(1) By coating the high-hardness fluorine coating layer on the vacuum parts, it can prevent the vacuum parts from being scratched by the impact of process substances such as particles.

(2) By coating the fluorine coating layer with a high water droplet contact angle on the vacuum parts, it can prevent the vacuum parts from depositing, and can achieve the effect of self-cleaning and easy cleaning.

(3) The fluorine coating layer has good adhesion to the main structure, which can avoid peeling during the manufacturing process.

(4) By providing an anti-deposition object with a fluorine coating layer, the capital and manpower for frequent maintenance can be reduced.

The above descriptions are illustrative only, not restrictive. Any equivalent modification or change that does not deviate from the spirit and scope of this creation shall be included in the scope of the appended patent application.

10: Anti-sedimentation objects 20: Main structure 22: surface 24: part 26: Spiral diversion groove 30: Fluorine coating layer 100: Process equipment 110: Process substances 120: rough structure θ: water droplet contact angle

Fig. 1 is a partial structural schematic diagram of the anti-deposition object used in the vacuum environment of the present invention.

Fig. 2 is a schematic diagram of the application of the anti-deposition object for vacuum environment in the present invention to the process equipment.

Fig. 3 is a schematic cross-sectional structure diagram of the first implementation example of the anti-deposition object used in the vacuum environment of the present invention.

Fig. 4 is a schematic cross-sectional structure diagram of the second implementation example of the anti-deposition object used in the vacuum environment of the present invention.

Fig. 5 is a schematic cross-sectional structure diagram of a third embodiment of the anti-deposition object used in a vacuum environment according to the present invention.

Fig. 6 is a three-dimensional structure diagram of the fourth implementation example of the anti-deposition object used in the vacuum environment of the present invention.

10: Anti-sedimentation objects

20: Main structure

22: surface

30: Fluorine coating layer

110: Process substances

120: rough structure

θ: water droplet contact angle

Claims (20)

An anti-deposition article for a vacuum environment, comprising: a body structure having at least one surface; and A fluorine coating layer covering the surface of the main structure, wherein the anti-deposition object contacts a process substance used or discharged by a process equipment in a vacuum environment, and the fluorine coating layer has a higher water droplet contact angle compared with the surface of the main structure, the fluorine coating layer has a similar or higher hardness than the surface of the main structure, and the fluorine coating layer has a lower roughness than the surface of the main structure. The anti-deposition article for vacuum environment according to claim 1, wherein the main structure is an outlet pipe of the process equipment or a pipe or part of a peripheral equipment of the process equipment. The anti-deposition article for vacuum environment as described in claim 1, wherein the fluorine coating layer is located on the surface of a part of the main structure, and the part is an inclined part, a flat part or a curved part of the main structure. The anti-deposition article for vacuum environment as described in claim 1, wherein the fluorine coating layer has higher acid corrosion resistance and plasma etching resistance than the surface of the main structure. The anti-deposition article for vacuum environment as claimed in claim 1, wherein the surface of the main structure is roughened to form a rough surface with a rough structure to increase surface roughness. The anti-deposition article for vacuum environment as claimed in claim 1, wherein the surface of the main structure is roughened by pickling or sandblasting to increase surface roughness. The anti-deposition article for vacuum environment as described in claim 1, wherein the composition of the fluorine coating layer is composed of 0.01-20%wt of fluorocarbons (Fluoro-carbons), 5-50wt of alkoxysilanes, 0.01%-20%wt of catalytic additives and 10-90%wt of solvents. The anti-deposition article for vacuum environment as described in claim 7, wherein the fluorocarbon is selected from the group consisting of perfluoroalkane (PFAS), fluorochlorocarbon (CFC), hemifluoroalkane (HFC), fluoropolymer (PTFE) and hydrofluorochlorocarbon (HCFC). The anti-deposition article for vacuum environment as described in claim 7, wherein the fluorocarbon compound is a fluorine-containing monomer or polymer containing 1-20 carbon atoms. The anti-deposition article for vacuum environment as described in Claim 7, wherein the alkoxysilanes are selected from alkoxysilane oligomer (Alkoxylsilane Oligomer), alkoxysilane compound (Alkoxylsilane compound), alkoxylsilane polymer (Alkoxylsilane polymer), alkoxylsiloxane oligomer (Alkoxylsiloxane Oligomer), alkoxylsiloxane compound (Alkoxylsiloxane compound) , Alkoxylsiloxane polymer, Alkoxylaminosiloxane Oligomer, Alkoxylaminosiloxane compound and Alkoxylaminosiloxane polymer. The anti-deposition article for vacuum environment as described in claim 7, wherein the catalytic additive is selected from the group consisting of platinum, titanium, tin, zinc, aluminum, silver, calcium, magnesium, potassium, sodium, nickel, chromium, molybdenum, vanadium, copper, iron, cobalt, germanium, hafnium, lanthanum, lead, ruthenium, tantalum, tungsten, zirconium metal, metal oxide, phosphate and carboxylate. The anti-deposition article for vacuum environment as described in claim 7, wherein the solvent is selected from the group consisting of alcohols, ketones, esters, fluoroalcohols, fluoroethers and ethers. The anti-deposition article for vacuum environment as described in Claim 7, wherein the alkoxysilanes have reactive functional groups, and the reactive functional groups perform self-condensation reactions at room temperature for 1 to 7 days or at temperatures of 40 to 60 degrees Celsius for 1 to 24 hours. The anti-deposition article for vacuum environment as described in claim 1, wherein the process performed by the process equipment is an atomic layer deposition (ALD) process, and the process substance is titanium tetrachloride (TiCl ₄ ). The anti-deposition article for vacuum environment as described in Claim 1, wherein the process performed by the process equipment is a metalorganic chemical vapor deposition (MOCVD) process, and the process substance is process gas or process waste gas. The anti-deposition article for vacuum environment as described in claim 1, wherein the process performed by the process equipment is an Al-pad process, and the process substance is process gas reactant or process exhaust gas. The anti-deposition article for vacuum environment according to claim 1, wherein the water droplet contact angle of the fluorine coating layer ranges from 100° to 120°. The anti-deposition article for vacuum environment as described in Claim 1, wherein the withstand temperature of the fluorine coating layer reaches 600 degrees Celsius. The anti-deposition article for vacuum environment as described in claim 1, wherein the hardness of the fluorine coating layer is in the range of 8H to 9H. The anti-deposition article for vacuum environment as described in claim 1, wherein the adhesion force between the fluorine coating layer and the surface of the main structure is in the range of 4B to 5B in a hundred grid test.