TWM639114U - Electrical conducting terminal - Google Patents
Electrical conducting terminal Download PDFInfo
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- TWM639114U TWM639114U TW111208385U TW111208385U TWM639114U TW M639114 U TWM639114 U TW M639114U TW 111208385 U TW111208385 U TW 111208385U TW 111208385 U TW111208385 U TW 111208385U TW M639114 U TWM639114 U TW M639114U
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本新型創作是有關於一種導電端子。 The present invention relates to a conductive terminal.
在現有技術中,電連接器除了要滿足一般的性能要求外,特別重要的要求是電連接器必須達到接觸良好,工作可靠,維護方便,其工作可靠與否直接影響電路的正常工作,涉及應用該電連接器的整個電子裝置的安危。 In the prior art, in addition to meeting the general performance requirements of the electrical connector, the particularly important requirement is that the electrical connector must achieve good contact, reliable operation, and convenient maintenance. Whether the electrical connector is reliable or not directly affects the normal operation of the circuit. The safety of the entire electronic device of the electrical connector.
一般而言,以手機等電子裝置為例,由於使用時間長致耗電量快,經常需要充電。而端子的接觸區經常插拔或摩擦,人體的手汗或是空氣中的水氣都會沾負到靠近連接器介面的端子接觸區,導致端子的接觸區更容易受到腐蝕,再加上頻繁的插拔或摩擦,更是加速端子銅材的腐蝕情形,進而影響電子設備的使用壽命。由此可見,設計一款提高端子耐腐蝕性的電連接器尤其重要。 Generally speaking, taking electronic devices such as mobile phones as an example, they often need to be recharged due to their high power consumption due to long usage times. The contact area of the terminal is often plugged or rubbed, and the sweat of the human body or the moisture in the air will stain the contact area of the terminal close to the connector interface, making the contact area of the terminal more susceptible to corrosion. Plugging or friction will accelerate the corrosion of the terminal copper, which in turn will affect the service life of electronic equipment. It can be seen that it is particularly important to design an electrical connector that improves the corrosion resistance of the terminals.
本新型創作提供一種導電端子,其以簡單鍍層結構而兼 具導電端子所需的導電性質、耐腐蝕性質以及更重要的耐磨性質。 This new creation provides a conductive terminal with a simple plating structure and It has the conductive properties required for conductive terminals, corrosion resistance properties and more importantly wear resistance properties.
本新型創作的導電端子,適用於電連接器。導電端子具有對接段,用以與另一電連接器的導電端子電性抵接。對接段包括基材與配置在基材上的多層電鍍層。多層電鍍層包括:銅層,配置於所述基材的表面上;至少一鎳元素或鎳合金層,配置於銅層上方;第一鉑元素或鉑合金層,配置於鎳元素或鎳合金層上方;至少一耐磨層,配置於第一鉑元素或鉑合金層上方;以及第二鉑元素或鉑合金層,配置於耐磨層上方。耐磨層的維氏硬度(Vickers Hardness)範圍是HV400至HV900。耐磨層是標準電極電位序中具正電位的金屬。 The conductive terminal created by the present invention is suitable for electrical connectors. The conductive terminal has a connecting section for electrically abutting with a conductive terminal of another electrical connector. The butt section includes a base material and multi-layer electroplating layers arranged on the base material. The multi-layer electroplating layer includes: a copper layer arranged on the surface of the substrate; at least one nickel element or nickel alloy layer arranged on the copper layer; a first platinum element or platinum alloy layer arranged on the nickel element or nickel alloy layer above; at least one wear-resistant layer configured above the first platinum element or platinum alloy layer; and a second platinum element or platinum alloy layer configured above the wear-resistant layer. The Vickers Hardness of the wear-resistant layer ranges from HV400 to HV900. The wear layer is the metal with positive potential in the standard electrode potential series.
在本新型創作的一實施例中,上述多層電鍍層還包括多層金層,分別配置在至少一鎳元素或鎳合金層與第一鉑元素或鉑合金層之間,第一鉑元素或鉑合金層與至少一耐磨層之間,以及至少一耐磨層與第二鉑元素或鉑合金層之間。 In an embodiment of the new creation, the above-mentioned multi-layer electroplating layer also includes a multi-layer gold layer, which are respectively arranged between at least one nickel element or nickel alloy layer and the first platinum element or platinum alloy layer, and the first platinum element or platinum alloy layer layer and at least one wear-resistant layer, and between at least one wear-resistant layer and the second platinum element or platinum alloy layer.
在本新型創作的一實施例中,上述各金層的厚度是1μinch至40μinch。 In an embodiment of the present invention, the thickness of each gold layer is 1 μinch to 40 μinch.
在本新型創作的一實施例中,上述銅層的厚度是10μinch至80μinch,至少一鎳元素或鎳合金層的厚度是1μinch至600μinch,第一鉑元素或鉑合金層的厚度是1μinch至100μinch,至少一耐磨層的厚度是1μinch至600μinch,第二鉑元素或鉑合金層的厚度是1μinch至100μinch。 In an embodiment of the new creation, the thickness of the copper layer is 10 μinch to 80 μinch, the thickness of at least one nickel element or nickel alloy layer is 1 μinch to 600 μinch, and the thickness of the first platinum element or platinum alloy layer is 1 μinch to 100 μinch, The thickness of at least one wear-resistant layer is 1 μinch to 600 μinch, and the thickness of the second platinum element or platinum alloy layer is 1 μinch to 100 μinch.
在本新型創作的一實施例中,上述的至少一鎳元素或鎳 合金層是鎳鎢合金層、鎳磷合金層、鎳鈷合金層、鎳鈀合金層或鎳錫合金層,上述的至少一耐磨層是鉑族金屬層。 In one embodiment of the new creation, the above-mentioned at least one nickel element or nickel The alloy layer is a nickel-tungsten alloy layer, a nickel-phosphorus alloy layer, a nickel-cobalt alloy layer, a nickel-palladium alloy layer or a nickel-tin alloy layer, and at least one wear-resistant layer is a platinum group metal layer.
在本新型創作的一實施例中,上述的至少一一耐磨層是鉑層、鈀層、釕層、銠層或其合金層。 In an embodiment of the present invention, at least one wear-resistant layer mentioned above is a platinum layer, a palladium layer, a ruthenium layer, a rhodium layer or an alloy layer thereof.
在本新型創作的一實施例中,上述的導電端子是下料式端子、折彎式端子、彈簧針端子(pogo pin)或冠簧端子(crown spring terminal)。 In an embodiment of the present invention, the above-mentioned conductive terminals are blanking terminals, bent terminals, pogo pins or crown spring terminals.
在本新型創作的一實施例中,上述的基材的材質是銅或其合金。 In an embodiment of the present invention, the material of the above-mentioned base material is copper or its alloy.
在本新型創作的一實施例中,上述多層電鍍層還包括金層,配置在上述的第二鉑元素或鉑合金層上而成為上述的導電端子的外觀層。 In an embodiment of the present invention, the above-mentioned multi-layer electroplating layer further includes a gold layer, which is disposed on the above-mentioned second platinum element or platinum alloy layer to become the appearance layer of the above-mentioned conductive terminal.
在本新型創作的一實施例中,上述多層電鍍層還包括金層,配置在上述的鎳元素或鎳合金層與第一鉑元素或鉑合金層之間。 In an embodiment of the present invention, the above-mentioned multi-layer electroplating layer further includes a gold layer disposed between the above-mentioned nickel element or nickel alloy layer and the first platinum element or platinum alloy layer.
基於上述,導電端子的對接段從基材表面依序配置有銅層、至少一鎳元素或鎳合金層、第一鉑元素或鉑合金層、至少一耐磨層以及第二鉑元素或鉑合金層,除了簡化現有技術中多層電鍍層的結構特徵外,還進一步地以鎳元素或鎳合金層提供抗電解腐蝕及抗化學腐蝕的功能。 Based on the above, the butt section of the conductive terminal is sequentially configured with a copper layer, at least one nickel element or nickel alloy layer, a first platinum element or platinum alloy layer, at least one wear-resistant layer, and a second platinum element or platinum alloy layer from the surface of the substrate. layer, in addition to simplifying the structural features of the multi-layer electroplating layer in the prior art, the nickel element or nickel alloy layer is further provided with the functions of resisting electrolytic corrosion and chemical corrosion.
更進一步地說,耐磨層的維氏硬度範圍是HV400至HV900。耐磨層是標準電極電位序中具正電位的金屬。換句話說, 對接段因上述多層電鍍層的結構特性,而讓導電端子在具備足夠抗腐蝕特性的前提下,還能兼具耐磨性而足以承受因電連接器插拔所產生的頻繁摩擦。本新型創作以經過縮減層數後的金屬鍍層配置在基材上,即能使導電端子同時兼具所需的導電性質與耐腐蝕特性,尤其是耐磨性質。 Furthermore, the Vickers hardness of the wear-resistant layer ranges from HV400 to HV900. The wear layer is the metal with positive potential in the standard electrode potential series. in other words, Due to the structural characteristics of the above-mentioned multi-layer electroplating layer, the conductive terminal has sufficient corrosion resistance and wear resistance to withstand frequent friction caused by plugging and unplugging of the electrical connector. In the new creation, the metal plating layer with reduced number of layers is arranged on the base material, so that the conductive terminal can simultaneously have the required conductive properties and corrosion resistance properties, especially the wear resistance properties.
20、30:電連接器 20, 30: electrical connector
21、31:絕緣本體 21, 31: insulating body
22、32、100:導電端子 22, 32, 100: conductive terminal
110:基材 110: Substrate
120:銅層 120: copper layer
130:鎳元素或鎳合金層 130: nickel element or nickel alloy layer
140:金層 140: gold layer
150:第一鉑元素或鉑合金層 150: the first platinum element or platinum alloy layer
160:耐磨層 160: wear-resistant layer
170:第二鉑元素或鉑合金層 170: second platinum element or platinum alloy layer
180:金層 180: gold layer
311:內側面 311: inner side
A1、B1:銲接段 A1, B1: welding section
A2、B2:對接段 A2, B2: docking section
A21、B21:接觸區 A21, B21: contact area
A3、B3:連接段 A3, B3: connecting section
CT、CT1、CT2:多層電鍍層 CT, CT1, CT2: multi-layer plating
圖1是本新型創作一實施例的導電端子的鍍層結構示意圖。。 FIG. 1 is a schematic diagram of the plating structure of a conductive terminal according to an embodiment of the present invention. .
圖2是本新型創作一實施例的電連接器的示意圖。 FIG. 2 is a schematic diagram of an electrical connector according to an embodiment of the present invention.
圖3是圖2的電連接器的其中一端子的示意圖。 FIG. 3 is a schematic diagram of one terminal of the electrical connector of FIG. 2 .
圖4是本新型創作另一實施例的電連接器的示意圖。 Fig. 4 is a schematic diagram of an electrical connector according to another embodiment of the present invention.
圖5是圖4的電連接器的其中一端子的示意圖。 FIG. 5 is a schematic diagram of one terminal of the electrical connector of FIG. 4 .
圖6與圖7分別是不同實施例的鍍層結構示意圖。 FIG. 6 and FIG. 7 are schematic diagrams of coating structures of different embodiments, respectively.
圖1是本新型創作一實施例的導電端子的鍍層結構示意圖。請參考圖1,在本實施例中,導電端子100適用於電連接器,其包括基材110與配置其上的多層電鍍層CT,其中所述多層電鍍層CT是由基材110的表面開始依次配置且包括:銅層120、至少一鎳元素或鎳合金層130、第一鉑元素或鉑合金層150、至少一耐磨層160以及第二鉑元素或鉑合金層170。在此,所述銅層120
的厚度是10μinch至80μinch,所述至少一鎳元素或鎳合金層130的厚度是1μinch至600μinch,所述第一鉑元素或鉑合金層150的厚度是1μinch至100μinch,所述至少一耐磨層160的厚度是1μinch至600μinch,所述第二鉑元素或鉑合金層170的厚度是1μinch至100μinch。
FIG. 1 is a schematic diagram of a plating structure of a conductive terminal according to an embodiment of the present invention. Please refer to FIG. 1 , in this embodiment, a
詳細來說,導電端子100的基材110的材質是銅或其合金,且例如是金屬銅所製成的板材或其他外形的結構件,其依據導電端子100所適用的電連接器型式而定。再者,銅層120配置在基材110的表面,其用以初步對前述基材110提供表面填縫之用,且同時作為增進後續電鍍層附著強度之用。簡單來說,基材110需通過沖壓、彎折或鑄型等加工手段方能順利形成導電端子100的外形,因此在加工過程中容易因此對基材110的表面形成損傷,故而銅層120能先對基材110的表面提供初步修復的效果。
In detail, the material of the
接著,導電端子100以至少一鎳元素或鎳合金層130配置在前述銅層120上,所述至少一鎳元素或鎳合金層130是鎳磷合金層、鎳鈷合金層、鎳鈀合金層或鎳錫合金層。再進一步地說,本實施例的耐磨層160是鉑族金屬層,且特別是鉑層、鈀層、釕層、銠層或其合金層,除了用以對導電端子100的表面再次予以細緻化(降低表面粗糙度)之外,鎳元素或鎳合金層130所具有的抗腐蝕特性也能初步為被其所包覆的基材110與銅層120提供初步保護效果,也能為後續的電鍍層提供隔離效果,以避免基材110上的雜質影響後續電鍍層的鍍製製程及品質。更重要的是,耐
磨層160因上述硬度特性而具備抗磨特性,以此特徵得以讓導電端子100應付與對手端子(未繪示)的對接磨耗。在此所述標準電極電位序是以氫電極作為標準電極,也就是所謂的標準氫電極(standard hydrogen electrode,SHE),以構成在25℃標準電極電位(E0)基準的工作電極。
Next, the
接著,本實施例在鎳元素或鎳合金層130上依序配置第一鉑元素或鉑合金層150、至少一耐磨層160與第二鉑元素或鉑合金層170。第一鉑元素或鉑合金層150具備與鎳元素或鎳合金層130類似的效果,也就是對鎳元素或鎳合金層130的表面提供填縫與保護、隔離效果。除此之外,第一鉑元素或鉑合金層150也能提供導電端子100所需的耐腐蝕效果。再者,第二鉑元素或鉑合金層170作為導電端子100的最外層結構,也同樣提供導電端子100所需的耐(抗)腐蝕性。更重要的是,本實施例配置在第一鉑元素或鉑合金層150與第二鉑元素或鉑合金層170之間的第二鎳元素或鎳合金160,其能進一步地確保導電端子100的耐腐蝕及耐磨耗特性,同時也在維持上述特性的情形下有效降低製作成本。在此,所述至少一耐磨層160的維氏硬度範圍是HV400至HV900,且特別是標準電極電位序中具正電位的金。更進一步地說,本實施例的耐磨層160是用以如上述讓導電端子100應付與對手端子(未繪示)的對接磨耗。
Next, in this embodiment, a first platinum element or
還需提及的是,多層電鍍層CT還包括多層金層140,分別配置在至少一鎳元素或鎳合金層130與第一鉑元素或鉑合金層
150之間,第一鉑元素或鉑合金層150與至少一耐磨層160之間,以及至少一耐磨層160與第二鉑元素或鉑合金層170之間,其中各金層140的厚度是1μinch至40μinch。由於在不同層的電鍍層之間會存在一定的內應力,而內應力會進一步影響(降低)這些電鍍層之間的黏附力,故而通過這些金層140具有較好的延展性,可以減小電鍍層之間的內應力或是作為緩衝層之用。本實施例以這些金層140而提供不同電鍍層之間的接著能力,以有效地提高多層電鍍層CT的結構強度,避免鎳元素或鎳合金層以及鉑元素或鉑合金層過厚而導致電鍍層出現裂縫甚至脫落的情形發生。
It should also be mentioned that the multilayer electroplating layer CT also includes a
還需提及的是,本實施例雖以單層的鎳元素或鎳合金層130以及單層耐磨層160作為例示,然於另一未繪示的實施例中,設計者可依據所需(例如耐磨耗或耐腐蝕的需求)而提供如上述特性的多層耐磨層,且使其厚度總和小於或等於600μinch。
It should also be mentioned that although the present embodiment takes a single-layer nickel element or
另外,如圖1所示,本實施例的導電端子100的多層電鍍層CT還包括另一金層180,所述金層180的厚度是3μinch,其配置在第二鉑元素或鉑合金170上而成為導電端子100的外觀層,以增進美觀性。
In addition, as shown in FIG. 1 , the multi-layer electroplating layer CT of the
圖2是本新型創作一實施例的電連接器的示意圖。圖3是圖2的電連接器的其中一端子的示意圖。請同時參考圖2與圖3,本實施例是將前述電鍍層CT應用於電連接器20,如圖2所示,電連接器20包括絕緣本體21與配置其上的多個導電端子22,這些導電端子22例如是彎折式端子,且各導電端子22如圖3所示
進一步地區分為銲接段B1、對接段B2與連接段B3,其中電連接器20例如是插座連接器,而銲接段B1例如用以銲接在電路板(未繪示)上,連接段B3連接在銲接段B1與對接段B2之間,且連接段B3實質上穿置於絕緣本體21內。據此,本實施例的多層電鍍層CT適於配置在對接段B2的接觸區B21,也就是暴露出絕緣本體21的部分,以利於在與另一電連接器的另一導電端子對接時能讓接觸區B21在維持其電導通特性的前提下,還能因多層電鍍層CT而具備所需的抗磨性與抗腐蝕特性。
FIG. 2 is a schematic diagram of an electrical connector according to an embodiment of the present invention. FIG. 3 is a schematic diagram of one terminal of the electrical connector of FIG. 2 . Please refer to FIG. 2 and FIG. 3 at the same time. In this embodiment, the aforementioned electroplating layer CT is applied to the
圖4是本新型創作另一實施例的電連接器的示意圖。圖5是圖4的電連接器的其中一端子的示意圖。請同時參考圖4與圖5,本實施例的電連接器30例如是插座連接器,其包括絕緣本體31與多個導電端子32,這些導電端子32例如是下料式端子,且各導電端子32進一步區分為銲接段A1、對接段A2與連接段A3,連接段A3連接在銲接段A1與對接段A2之間,對接段A2具有暴露出絕緣本體31的內側面311的接觸區A21,以順利與另一電連接器的另一導電端子電性連接,故而本實施例的接觸區A21配置有前述的多層電鍍層CT,以讓導電端子32在接觸區A21具備抗磨性與耐腐蝕性。
Fig. 4 is a schematic diagram of an electrical connector according to another embodiment of the present invention. FIG. 5 is a schematic diagram of one terminal of the electrical connector of FIG. 4 . Please refer to FIG. 4 and FIG. 5 at the same time. The
除上述圖2至圖5所示實施例之外,本新型創作所揭露的多層電鍍層CT還能進一步地適用於彈簧針端子(pogo pin)或冠簧端子(crown spring terminal),也就是在所述端子的電性抵接區域配置有前述的多層電鍍層CT。 In addition to the above-mentioned embodiments shown in Figures 2 to 5, the multi-layer electroplating layer CT disclosed in this new creation can be further applied to pogo pins or crown spring terminals, that is, in The aforementioned multi-layer electroplating layer CT is disposed on the electrical contact area of the terminal.
圖6與圖7分別是不同實施例的鍍層結構示意圖。請先參考圖6並對照圖1,與前述實施例不同的是,在整體厚度的考量之下,本實施例的鍍層結構相當於是將圖1所示再予以進一步地精簡,也就是配置在基材110上的多層電鍍層CT1僅包括銅層120、鎳元素或鎳合金層130、第一鉑元素或鉑合金層150、耐磨層160與第二鉑元素或鉑合金層170。請參考圖7並對照圖1,與前述實施例不同的是,本實施例配置在基材110上的多層電鍍層CT2僅包括銅層120、鎳元素或鎳合金層130、金層140、第一鉑元素或鉑合金層150、耐磨層160、第二鉑元素或鉑合金層170與金層180。各鍍層與前述實施例相同者皆以相同符號標示,其對應特徵請參考前述實施例,在此不再贅述。
FIG. 6 and FIG. 7 are schematic diagrams of coating structures of different embodiments, respectively. Please refer to Figure 6 and compare it with Figure 1. The difference from the previous embodiments is that, in consideration of the overall thickness, the coating structure of this embodiment is equivalent to further simplifying that shown in Figure 1, that is, it is arranged on the base The multilayer electroplating layer CT1 on the
綜上所述,在本新型創作的上述實施例中,導電端子的對接段從基材表面依序配置有銅層、至少一鎳元素或鎳合金層、第一鉑元素或鉑合金層、至少一耐磨層以及第二鉑元素或鉑合金層,除了簡化現有技術中多層電鍍層的結構特徵外,還進一步地以鉑族金屬層提供抗電解腐蝕及抗化學腐蝕,尤其是抗磨性的功能。簡單地說,本新型創作的導電端子藉由耐磨層,且特別是配置在第一鉑元素或鉑合金層與第二鉑元素或鉑合金層之間的耐磨層,以讓導電端子能在電連接器的插拔過程中仍保持其導電性並兼具耐磨性。 In summary, in the above embodiments of the new creation, the butt section of the conductive terminal is sequentially arranged with a copper layer, at least one nickel element or nickel alloy layer, a first platinum element or platinum alloy layer, at least A wear-resistant layer and a second platinum element or platinum alloy layer, in addition to simplifying the structural features of the multilayer electroplating layer in the prior art, further provide electrolytic corrosion resistance and chemical corrosion resistance, especially wear resistance, with the platinum group metal layer Function. Simply put, the conductive terminal of the present invention uses a wear-resistant layer, especially a wear-resistant layer disposed between the first platinum element or platinum alloy layer and the second platinum element or platinum alloy layer, so that the conductive terminal can It still maintains its conductivity and wear resistance during the plugging and unplugging process of the electrical connector.
換句話說,對接段因上述多層電鍍層的結構特性,而讓導電端子具備足夠抗腐蝕特性且足以承受因插拔所在來的頻繁摩 擦。本新型創作以經過縮減層數後的金屬鍍層配置在基上,即能使導電端子同時兼具所需的導電性質與耐腐蝕特性,且特別是耐磨性。 In other words, due to the structural characteristics of the above-mentioned multi-layer electroplating layer, the conductive terminal has sufficient corrosion resistance and can withstand frequent friction due to plugging and unplugging. wipe. In the new creation, the metal plating layer with reduced number of layers is arranged on the base, so that the conductive terminal can simultaneously have the required conductive properties and corrosion resistance properties, especially wear resistance.
100:導電端子 100: Conductive terminal
110:基材 110: Substrate
120:銅層 120: copper layer
130:鎳元素或鎳合金層 130: nickel element or nickel alloy layer
140:金層 140: gold layer
150:第一鉑元素或鉑合金層 150: the first platinum element or platinum alloy layer
160:耐磨層 160: wear-resistant layer
170:第二鉑元素或鉑合金層 170: second platinum element or platinum alloy layer
180:金層 180: gold layer
CT:多層電鍍層 CT: multi-layer electroplating
Claims (10)
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CN202122914388.4U CN216529450U (en) | 2021-11-25 | 2021-11-25 | Conductive terminal |
CN202122914388.4 | 2021-11-25 |
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TWM639114U true TWM639114U (en) | 2023-04-01 |
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TW (1) | TWM639114U (en) |
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2021
- 2021-11-25 CN CN202122914388.4U patent/CN216529450U/en active Active
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