TWM639050U - Wafer cassette sampling device - Google Patents
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- TWM639050U TWM639050U TW111213854U TW111213854U TWM639050U TW M639050 U TWM639050 U TW M639050U TW 111213854 U TW111213854 U TW 111213854U TW 111213854 U TW111213854 U TW 111213854U TW M639050 U TWM639050 U TW M639050U
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Abstract
本創作關於一種晶圓盒採樣裝置,其包括一機台本體,包括一第一採樣部及一第二採樣部;一第一採樣模組,包括一氣體供應單元、一閥體、一第一時間控制單元及一第一採樣容器,該閥體連接於該第一採樣容器及供設置於該第一採樣部上之該晶圓盒之間,該第一時間控制單元電性連接該閥體;一第二採樣模組,包括一第二採樣容器、一採樣泵及一第二時間控制單元,該第二時間控制單元可驅動該採樣泵;及一控制單元,可控制該氣體供應單元提供一氣體及可驅動該採樣泵。This creation relates to a wafer box sampling device, which includes a machine body, including a first sampling part and a second sampling part; a first sampling module, including a gas supply unit, a valve body, and a first a time control unit and a first sampling container, the valve body is connected between the first sampling container and the wafer box provided on the first sampling part, the first time control unit is electrically connected to the valve body ; A second sampling module, including a second sampling container, a sampling pump and a second time control unit, the second time control unit can drive the sampling pump; and a control unit, can control the gas supply unit to provide A gas can drive the sampling pump.
Description
本創作係有關於一種晶圓盒採樣裝置。The invention relates to a wafer box sampling device.
按,晶圓盒的內部易於在運送及儲存的過程中,被氣態分子汙染物或顆粒物汙染,影響晶圓的良率。因此,檢測晶圓盒內有無被汙染就顯得相當重要。Press, the inside of the wafer box is prone to be polluted by gaseous molecular pollutants or particles during the process of transportation and storage, which affects the yield of wafers. Therefore, it is very important to detect whether there is contamination in the wafer cassette.
然而,晶圓盒係包覆有氣密的外殼,導致無法直接將採樣的管路伸入到晶圓盒內採樣以進行後續的檢測。However, the wafer box is covered with an airtight shell, so that it is impossible to directly extend the sampling pipeline into the wafer box for subsequent detection.
因此,有必要提供一種新穎且具有進步性之晶圓盒採樣裝置,以解決上述之問題。Therefore, it is necessary to provide a novel and progressive wafer cassette sampling device to solve the above problems.
本創作之主要目的在於提供一種晶圓盒採樣裝置,其利於收集晶圓盒內部的待採集目標。The main purpose of this creation is to provide a wafer box sampling device, which is beneficial to collect the objects to be collected inside the wafer box.
為達成上述目的,本創作提供一種晶圓盒採樣裝置,其包括一機台本體,其包括一第一採樣部及一第二採樣部;一第一採樣模組,其包括一氣體供應單元、一閥體、一第一時間控制單元及一第一採樣容器,該氣體供應單元提供一氣體供輸入至置於該第一採樣部上之一晶圓盒內並排出一第一待採集目標至該第一採樣容器,該閥體連接於該第一採樣容器及供設置於該第一採樣部上之該晶圓盒之間,該第一時間控制單元電性連接該閥體;一第二採樣模組,其包括一第二採樣容器、一採樣泵及一第二時間控制單元,該採樣泵供連接設置於該第二採樣部上之該晶圓盒及該第二採樣容器,該第二時間控制單元可驅動該採樣泵,該採樣泵供設置於該第二採樣部上之該晶圓盒內之一第二待採集目標輸入至該第二採樣容器內;及一控制單元,其可控制該氣體供應單元提供該氣體及可驅動該採樣泵。In order to achieve the above object, this creation provides a wafer cassette sampling device, which includes a machine body, which includes a first sampling part and a second sampling part; a first sampling module, which includes a gas supply unit, A valve body, a first time control unit and a first sampling container, the gas supply unit provides a gas for input into a wafer box placed on the first sampling part and discharges a first target to be collected to The first sampling container, the valve body is connected between the first sampling container and the wafer box provided on the first sampling part, the first time control unit is electrically connected to the valve body; a second Sampling module, which includes a second sampling container, a sampling pump and a second time control unit, the sampling pump is used to connect the wafer cassette and the second sampling container arranged on the second sampling part, the first Two time control units can drive the sampling pump, and the sampling pump is used to input a second object to be collected in the wafer cassette arranged on the second sampling part into the second sampling container; and a control unit, which The gas supply unit can be controlled to provide the gas and drive the sampling pump.
以下僅以實施例說明本創作可能之實施態樣,然並非用以限制本創作所欲保護之範疇,文中所提之名詞前冠以的「一」或「至少一」並非對數量進行限制,依據需求亦可為「複數」個,此數量上之變化亦為所欲保護之範圍,合先敘明。The following is only an example to illustrate the possible implementation of this creation, but it is not used to limit the scope of protection of this creation. The "one" or "at least one" before the nouns mentioned in the article does not limit the number. It can also be "plural" according to the needs, and the change in the number is also within the scope of protection, which will be described first.
請參考圖1至3,其顯示本創作之一較佳實施例,本創作之晶圓盒採樣裝置1包括一機台本體10、一第一採樣模組20、一第二採樣模組30及一控制單元40。Please refer to Fig. 1 to 3, it shows a preferred embodiment of this creation, the wafer cassette sampling device 1 of this creation comprises a
該機台本體10包括一第一採樣部11及一第二採樣部12。The
該第一採樣模組20包括一氣體供應單元21、一閥體22、一第一時間控制單元23及一第一採樣容器24,該氣體供應單元21提供一氣體供輸入至置於該第一採樣部11上之一晶圓盒2內並排出一第一待採集目標至該第一採樣容器24,該閥體22連接於該第一採樣容器24及供設置於該第一採樣部11上之該晶圓盒2之間,該第一時間控制單元23電性連接該閥體22。該閥體22能開啟以導通該第一採樣容器24及置於該第一採樣部11上之該晶圓盒2之內部或關閉不導通。該第一時間控制單元23能依據控制該閥體22的開啟時間,如瞬時(如1分鐘左右)取樣可獲取即時的該第一待採集目標。The
該氣體供應單元21另包括一流量控制件211及一供氣源212,該流量控制件211連接於該供氣源212及該置於該第一採樣部11上之該晶圓盒2內,該控制單元40控制該流量控制件211,以達到自動控制該流量控制件211,以調整該供氣源212提供至該晶圓盒2內的氣體流量。The
該第二採樣模組30包括一第二採樣容器31、一採樣泵32及一第二時間控制單元33,該採樣泵32供連接設置於該第二採樣部12上之該晶圓盒2及該第二採樣容器31,該第二時間控制單元33可驅動該採樣泵32,該採樣泵32供設置於該第二採樣部12上之該晶圓盒2內之一第二待採集目標輸入至該第二採樣容器31內。該第二時間控制單元33可控制該採樣泵32之驅動時間,如採樣時間為30分鐘,進行內循環長時採樣。The
該控制單元40可控制該氣體供應單元21提供該氣體及可驅動該採樣泵32。該氣體為壓縮乾燥氣體或乾燥乾淨氣體。該氣體供輸入該晶圓盒2內以提供一正壓,用以將該晶圓盒2內之該第一待採集目標帶出該晶圓盒2。The
藉此,利於收集晶圓盒2內部的該第一待採集目標(如汙染物)及該第二待採集目標(如汙染物),且該晶圓盒2可放置於不同的位置以進行不同的自動化採樣。進一步說明,可依據採樣需求將該晶圓盒2放置於該第一採樣部11或該第二採樣部12以進行不同的採樣(如採樣的目標物種不同、採樣的時間不同)。此外,該第一採樣部11及該第二採樣部12亦可同時放置一該晶圓盒2以同時進行採樣。Thereby, it is beneficial to collect the first object to be collected (such as pollutant) and the second object to be collected (such as pollutant) inside the
於本實施例中,該第一採樣部11包括複數第一導流單元111,該氣體供應單元21及該第一採樣容器24分別以該複數第一導流單元111供與設於該第一採樣部11之一晶圓盒2之內部連通;該第二採樣部12包括複數第二導流單元121,該第二採樣容器31及該採樣泵32分別以該複數第二導流單元121供與設於該第二採樣部12之該晶圓盒2之內部連通。具體地說,各該第一導流單元111及各該第二導流單元121分別包括一供流體通過之通口。In this embodiment, the
該第一採樣容器24為一採樣筒。於其他實施例中,該第一採樣容器可為一真空採樣筒,以真空的方式提供採樣的動力源。The
該第一採樣模組20另包括一逆止閥25,該逆止閥25連接於該閥體22及該第一採樣容器24之間,令該第一待採集目標僅能由該晶圓盒2往該第一採樣容器24方向流動,防止迴流。The
該第一採樣模組20另包括一出氣管路26及一開關閥27,該出氣管路26包括一第一出氣管路261及一第二出氣管路262,該第二出氣管路262連通該第一出氣管路261,該第一出氣管路261可供連接置於該第一採樣部11上之該晶圓盒2及該第一採樣容器24之間,該第二出氣管路262可供連接置於該第一採樣部11上之該晶圓盒2及一外界,該開關閥27設於該第二出氣管路262。如此,該氣體供應單元21提供該氣體至該晶圓盒2內後,可選擇朝該外界排出或至該第一採樣部11,或於該晶圓盒2及該第一採樣容器24之間進行內循環。較佳地,該第一採樣模組20另包括一第三時間控制單元37,該第三時間控制單元37電性連接該控制單元40,該第三時間控制單元37可控制該開關閥27;可控制該開關閥27於一時段中開啟以導通該外界及該晶圓盒2。The
該第二採樣容器31包括一衝擊瓶311及一緩衝瓶312,該衝擊瓶311內具有一吸收液,該第二採樣模組30另包括一進氣管路34及一排氣管路35,該進氣管路34供連接該緩衝瓶312及設置於該第二採樣部12上之該晶圓盒2內,該採樣泵32設於該進氣管路34,該排氣管路35供連接設置於該第二採樣部12上之該晶圓盒2內及該衝擊瓶311,該緩衝瓶312及該衝擊瓶311相連通。藉由該採樣泵32加壓於該晶圓盒2內使該第二待採集目標排出並溶於該衝擊瓶311中的吸收液內。該緩衝瓶312可防止流體回流,該流體如透過該採樣泵32輸入該晶圓盒2之氣體或在採樣過程中產生的水氣。於其他實施例中,該第二採樣容器亦可為一吸附管。The
該第二採樣模組30另包括一流量控制閥36,該流量控制閥36設於該進氣管路34,該控制單元40可控制該流量控制閥36;透過該流量控制閥36可控制於該進氣管路34中流體的流量。The
該晶圓盒採樣裝置1另包括一操作介面28,該操作介面28電性連接該控制單元40,該操作介面28可供一外部操作控制該控制單元40控制該氣體供應單元21及該採樣泵32至少一者;以操作該操作介面28以控制對設置於該第一採樣部11上之該晶圓盒2及設置於該第二採樣部12上之該晶圓盒2至少一者進行自動採樣。The wafer cassette sampling device 1 further includes an
進一步說明,該第一採樣容器24採樣的該第一待採集目標及該第二採樣容器31採樣的該第二待採集目標為不同性質的汙染物。舉例說明,該第一採樣部11供用以採樣該晶圓盒2中MC汙染物(凝結物)。該第二採樣部12供用以採樣該晶圓盒2中之MA汙染物(分子酸)、MB汙染物(分子鹼)。To further illustrate, the first target to be collected sampled by the
請參考圖4,其顯示本創作之另一較佳實施例,該第一採樣模組20設於該機台本體10,該機台本體10包括一組接部13,該組接部13包括一第一排放口131,該第一排放口131連通該第二出氣管路262且供該第一採樣容器24可拆卸地組接且相連通,具體地說,以一第一管體3連接於該第一排放口131與該第一採樣容器24之間;藉由供該第一採樣容器24快速拆、裝於該第一排放口131,以達到快速採樣及替換該第一採樣容器24。該第二採樣模組設於該機台本體10,該機台本體10設有一連接部14,該連接部14包括一排氣口141及一進氣口151,該進氣口151連通該進氣管路34,該排氣口141連通該排氣管路35,該進氣口151供該緩衝瓶312可拆卸地組接且相連通,該排氣口141供該衝擊瓶311可拆卸地組接且相連通。具體地說,以一第二管體4連接於該進氣口151及該緩衝瓶312之間,以一第三管體5連接於該排氣口141及該衝擊瓶311之間;藉由供該緩衝瓶312及該衝擊瓶311分別快速拆、裝於該進氣口151及該排氣口141,以達到快速採樣及替換。Please refer to FIG. 4, which shows another preferred embodiment of the present invention, the
1:晶圓盒採樣裝置 2:晶圓盒 3:第一管體 4:第二管體 5:第三管體 10:機台本體 11:第一採樣部 111:第一導流單元 12:第二採樣部 121:第二導流單元 13:組接部 131:第一排放口 14:連接部 141:排氣口 151:進氣口 20:第一採樣模組 21:氣體供應單元 211:流量控制件 212:供氣源 22:閥體 23:第一時間控制單元 24:第一採樣容器 25:逆止閥 26:出氣管路 261:第一出氣管路 262:第二出氣管路 27:開關閥 28:操作介面 30:第二採樣模組 31:第二採樣容器 311:衝擊瓶 312:緩衝瓶 32:採樣泵 33:第二時間控制單元 34:進氣管路 35:排氣管路 36:流量控制閥 37:第三時間控制單元 40:控制單元 1: Wafer box sampling device 2:Wafer box 3: The first tube body 4: Second tube body 5: The third pipe body 10: Machine body 11: The first sampling department 111: the first diversion unit 12: The second sampling department 121: the second diversion unit 13: Assembly part 131: the first discharge port 14: Connecting part 141: Exhaust port 151: air inlet 20: The first sampling module 21: Gas supply unit 211: flow control part 212: Air supply source 22: valve body 23: First Time Control Unit 24: First sampling container 25: check valve 26: Outlet pipeline 261: The first outlet pipeline 262: Second outlet pipeline 27: switch valve 28: Operation interface 30: Second sampling module 31: Second sampling container 311: impact bottle 312: buffer bottle 32: Sampling pump 33: Second time control unit 34: Intake pipeline 35: exhaust pipe 36: Flow control valve 37: The third time control unit 40: Control unit
圖1為本創作一較佳實施例之立體圖。 圖2為本創作一較佳實施例之配置示意圖。 圖3為本創作一較佳實施例之方塊圖。 圖4為本創作另一較佳實施例之示意圖。 Fig. 1 is a perspective view of a preferred embodiment of the invention. Fig. 2 is a schematic configuration diagram of a preferred embodiment of the invention. Fig. 3 is a block diagram of a preferred embodiment of the invention. Fig. 4 is a schematic diagram of another preferred embodiment of the present invention.
1:晶圓盒採樣裝置 1: Wafer box sampling device
2:晶圓盒 2:Wafer box
10:機台本體 10: Machine body
11:第一採樣部 11: The first sampling department
111:第一導流單元 111: the first diversion unit
12:第二採樣部 12: The second sampling department
121:第二導流單元 121: the second diversion unit
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TW111213854U TWM639050U (en) | 2022-12-15 | 2022-12-15 | Wafer cassette sampling device |
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TW111213854U TWM639050U (en) | 2022-12-15 | 2022-12-15 | Wafer cassette sampling device |
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