TWM612889U - Elastic seal ring for electrostatic chuck - Google Patents

Abstract

An elastic seal ring for an electrostatic chuck is mounted into a groove of the electrostatic chuck. The elastic seal ring comprises a primary sealing portion and a positioning portion; wherein the primary sealing portion has a first maximum vertical height larger than or equal to the vertical height of the groove; the positioning portion protrudes from the primary sealing portion toward the groove and has a second maximum vertical height equal to or smaller than the vertical height of the groove, and the first maximum vertical height is larger than the second maximum vertical height; in addition, the total length of the primary sealing portion and the positioning portion in radial direction is equal to the length of the groove in radial direction.

Description

Elastic sealing ring for electrostatic adsorption retainer

This creation is about a kind of sealing ring, especially about a kind of elastic sealing ring applied to the side wall of the electrostatic adsorption of the plasma etching equipment.

The prior art plasma etching equipment is shown in FIG. 1A, which mainly includes an electrostatic adsorption tray 10, the electrostatic adsorption tray 10 includes an upper element 11, a lower element 12, a connecting layer 13, and a fluid supply unit 14; wherein the connecting layer 13 connects the upper element 11 and the lower element 12, the fluid supply unit 14 is disposed inside the lower element 12, and can pass through the upper element 11 to the wafer 20 to be carried Provide a working fluid (not shown); the space formed by a side edge of the connecting layer 13, a part of the lower edge of the upper element 11, and a part of the upper edge of the lower element 12 is a groove 15, and The groove 15 is located between the upper element 11 and the lower element 12. In addition, the peripheral edge of the electrostatic adsorption chuck 10 is further provided with an extension element 16 extending and carrying the work piece. The inner side of the extension element 16 and the outer side of the lower element 12 maintain a distance R, and the distance R forms a ring shape. The gap is connected to the channel in the extension element 16 to allow access to the external environment.

Since the process plasma gas 120 is etched from top to bottom, when the etching process is performed, the process plasma gas 120 may erode the connection layer 13 or the components near it through the gaps and grooves 15 The surface of the electrostatic adsorption tray 10 is damaged, causing (micro) discharge (Micro-Arcing), or leakage, voltage abnormality, and air leakage. This situation is especially common in the 12-inch wafer (300 mm wafer) process ; The connecting layer 13 or its nearby components are corroded by the plasma gas 120 and the by-products generated after entering the plasma chamber will contaminate the plasma chamber. In order to solve this problem, the prior art usually fills the trench with permanent fillers such as epoxy resin and silicone; however, the aforementioned permanent fillers will still be etched by the plasma gas and be worn out; after long-term use, the aforementioned The permanent filler will not only lose the protection of the trench, and even the debris produced by etching will contaminate the process. Furthermore, the effective period of the permanent filler is difficult to estimate, and it is not easy to remove after being corroded, so that the industry cannot regularly reinforce or replace it, which has a negative impact on the overall wafer process yield.

In order to overcome the aforementioned problems, another solution is proposed, which is to insert a replaceable capsule sealing ring in the groove. However, please refer to FIG. 2, since the capsule-type sealing ring C usually presents an elliptical cross-section, the capsule-type sealing ring C only relies on the uppermost edge and the lowermost edge part and the wall surface of the groove 15 (that is, the upper part). The lower edge of the element 11 and the upper edge of the lower element 12) are in contact with each other, and the stopping effect is limited. It is obvious that the groove 15 cannot be significantly filled. Therefore, the plasma by-products will accumulate in the groove 15 and the capsule sealing ring. In the gap of C, it is still possible to contaminate the process, which also has a negative impact on the overall process yield. Furthermore, the capsule-type sealing ring C is not easy to position, which not only presents difficulties during assembly or replacement, but once it is not properly installed, the capsule-type sealing ring C still cannot exert its original protective effect.

In view of the shortcomings and deficiencies of the existing technology, the purpose of this creation is to provide a sealing ring that is convenient for regular replacement, so that engineers can replace the sealing ring in time before the sealing ring is damaged or air leakage occurs, so that the plasma etching process is more stable and safe. .

In order to achieve the above-mentioned creative purpose, the technical means used in this creation is to provide an elastic sealing ring for an electrostatic adsorption holder, which is set in an electrostatic adsorption holder, wherein the electrostatic adsorption holder includes an upper element and a lower part. Element and a connecting layer, the connecting layer connects the upper element and the lower element, and a groove is formed on a side edge of the connecting layer, a part of the lower edge of the upper element and a part of the upper edge of the lower element; Wherein, the elastic sealing ring used for the electrostatic adsorption bearing plate includes: A main sealing part and a fixed part; Wherein, the main sealing portion has a first maximum vertical thickness, and the first maximum vertical thickness is greater than or equal to the vertical height of the groove; The fixing portion is formed by protruding from the main sealing portion toward the groove, and the fixing portion has a second maximum vertical thickness. The second maximum vertical thickness is equal to or less than the vertical height of the groove, and the The first maximum vertical thickness is greater than the second maximum vertical thickness; and The total length of the main sealing part and the fixed part in the radial direction is equal to the length of the groove in the radial direction.

In this creation, due to the vertical direction (that is, the axial direction defined by the center point of the elastic sealing ring) of the fixed part whose thickness is equal to or less than the vertical height of the groove, the elastic sealing ring can be easily inserted into the groove during installation. In the groove, in order to achieve the effect of rapid positioning, and because the main sealing portion has a first maximum vertical height greater than or equal to the vertical height of the groove, the main sealing portion can be tightly connected to the groove Fit to the ground to achieve the effect of sealing. In addition, this creation limits the total length of the main sealing part and the fixed part in the radial direction to be equal to the length of the groove in the radial direction, which can enhance the sealing effect during use and help technicians to replace the elasticity. When sealing the ring, the old elastic sealing ring can be easily removed, wherein the radial direction is defined by the center point of the elastic sealing ring. Because if the total length of the main sealing part and the fixed part in the radial direction is shorter than the length of the groove in the radial direction, the elastic sealing ring may be pushed too far into the groove during installation, which will cause difficulty in positioning. Exposing the upper and lower walls of the groove to the process environment will easily cause the uncertainty of the accumulation of process products. After use, it will be difficult to remove the old elastic seal ring because it is easy to push the old elastic seal ring into the groove during the removal process; on the contrary, if the main seal The total length in the radial direction of the part and the fixed part is longer than the length of the groove in the radial direction, which may cause the main sealing part to fail to completely block the groove, and the sealing effect is poor. According to this, the elastic sealing ring for the electrostatic adsorption retainer of this creation is easy to install, which can make the plasma etching process more stable and safe, and further improve the product yield of the final product including the wafer.

In some embodiments, the side of the fixing portion facing the groove has two corners, and the two corners are chamfers. With the aforementioned chamfered design, the elastic sealing ring can be placed in the groove more smoothly.

In some embodiments, at least one corner is formed at the junction of the main sealing portion and the fixed portion, and the at least one corner may be a chamfer. In other embodiments, the at least one corner is rounded. When the main sealing part and the bottom of the fixed part are connected and are on the same vertical height horizontal plane, the joint angle formed by the junction of the main sealing part and the fixed part is located at the top of the main sealing part and the fixed part Conversely, when the top of the main sealing part and the top of the fixed part are connected and are on a horizontal plane of the same vertical height, the joint angle formed by the junction of the main sealing part and the fixed part is It is located at the junction of the bottom of the main sealing part and the bottom of the fixed part. In addition, if the top of the main sealing part and the top of the fixing part are not on the same vertical height horizontal plane, and the bottom of the main sealing part and the fixing part are not on the same vertical height horizontal plane, the main sealing part and Two joint corners are formed where the fixed part meets. For example, the two corners may be chamfered, but it is not limited thereto.

In some embodiments, the ratio of the first maximum vertical thickness of the main sealing portion to the second maximum vertical thickness of the fixing portion is 1:0.75 to 1:0.97. Preferably, the ratio of the first maximum vertical thickness of the main sealing portion to the second maximum vertical thickness of the fixing portion is 1:0.8 to 1:0.96. In some embodiments, the first maximum vertical thickness of the main sealing portion is less than 1.15 times the vertical height of the groove. More preferably, the first maximum vertical thickness of the main sealing portion is greater than 1.03 times the vertical height of the groove and less than 1.12 times the vertical height of the groove.

In some embodiments, the elastic sealing ring may further include at least one rib protruding from the surface of the main sealing part. Specifically, the elastic sealing ring may further include a first rib protruding from the main sealing part in a vertical direction, and the first rib is connected to the upper side of the main sealing part. In other embodiments, the elastic sealing ring may further include a second rib protruding from the main sealing part in a vertical direction, and the second rib is connected to the lower side of the main sealing part. In other embodiments, the elastic sealing ring may have the first rib and the second rib at the same time. Since the first rib and the second rib are each of a single wave crest shape, the maximum vertical thickness of the first rib is the peak height of the first rib; similarly, the second rib The maximum vertical thickness is the peak height of the second rib. Since the first maximum vertical thickness of the main sealing portion is higher than or equal to the vertical height of the groove, when the elastic sealing ring has the first rib and/or the second rib, the elastic sealing ring is vertical The height in the direction will be greater than the height of the groove, although it will increase the frictional resistance of the elastic sealing ring with the wall surface of the upper element and/or the lower element when inserted into the groove, but due to the peak area of the rib It is not large, so it can still be installed smoothly, and it can be more closely connected with the wall surface of the upper element and/or the lower element after installation, so a better protection effect can be achieved.

Preferably, the ratio of the maximum vertical thickness of the first rib to the first maximum vertical thickness of the main sealing portion is 1:10 to 1:50. Preferably, the ratio of the maximum vertical thickness of the second rib to the first maximum vertical thickness of the main sealing portion is 1:10 to 1:50. Preferably, the ratio of the maximum vertical thickness of the first rib to the maximum vertical thickness of the second rib is 2:1 to 1:5.

Since the first maximum vertical thickness of the main sealing part is greater than the second maximum vertical thickness of the fixing part, in some embodiments, in order to connect the main sealing part and the fixing part, the top of the main sealing part and / Or the bottom is connected with a slope. That is to say, the cross section of the main sealing part is a trapezoid, and the trapezoid has a bottom side parallel to each other (that is, formed by the outer side of the main sealing part facing away from the groove) and an upper bottom side (that is, The main sealing part and the fixed part are formed at the junction) and two opposite waist lines connecting the upper bottom side and the lower bottom side; wherein the length of the upper bottom side is less than the length of the lower bottom side, and the upper bottom side Is connected with the fixing part, and the length of the lower bottom side is the first maximum vertical thickness of the main sealing part.

Preferably, the trapezoid formed by the cross section of the main sealing portion is an isosceles trapezoid.

Preferably, the length of the upper bottom side is the second maximum vertical thickness of the fixing portion.

In some embodiments, the ratio of the length of the main sealing portion in the radial direction to the length of the fixing portion in the radial direction is 1:0.5 to 1:2, but it is not limited thereto.

According to the present creation, the electrostatic adsorption tray further includes an extension element that surrounds the upper element and the lower element, and the inner side of the extension element and the outer side of the lower element maintain a distance; in some embodiments, the The elastic sealing ring may further include an extension, which is protrudingly formed from the main sealing part in a direction away from the groove, and the extension is located in the aforementioned spacing, and the extension has at least one perpendicular to the vertical The wing portion in the direction, that is, due to the wing portion, the total height of the extension portion in the vertical direction will be greater than the first maximum vertical height of the main sealing portion. Specifically, in some embodiments, the extension portion has an upper wing portion, and the inner edge of the upper wing portion is in contact with the outer edge of the upper element. In other embodiments, the extension portion has a lower wing portion, and the inner edge of the lower wing portion is in contact with the outer edge of the lower element. In other embodiments, the extension part may have the upper wing part and the lower wing part at the same time.

Preferably, the length of the extension part of the elastic sealing ring in the radial direction is less than the length of the spacing, so as to facilitate the installation of the extension element and at the same time extend the protection range of the elastic sealing ring, so that the elastic sealing ring of the present invention can be more This effectively prevents the plasma gas from entering the trench and causing damage to the connection layer.

Preferably, the ratio of the maximum vertical height of the upper wing portion to the maximum vertical height of the lower wing portion is 1:1 to 1:5.

In some embodiments, the upper wing portion facing away from the groove (that is, the side of the upper wing portion facing the extension element) has a chamfer, but it is not limited to this.

In some embodiments, the lower wing portion has a right angle toward the side away from the groove, but it is not limited thereto. When the extension part has only the lower wing part, preferably, the extension part has a chamfer toward the side away from the groove. When the extension part has the upper wing part and the lower wing part at the same time, preferably, the upper wing part has a chamfer facing away from the groove.

In some embodiments, the elastic sealing ring further includes a third rib that is connected to the outer side of the extension (ie the side facing the extension element) and is located in the gap, and is connected to The inner side of the extension element of the electrostatic adsorption chuck is in contact with each other. Preferably, the sum of the length of the third rib in the radial direction and the length of the extension in the radial direction is equivalent to the length of the spacing.

According to the present invention, all the components of the elastic sealing ring can be integrally formed, or some of the components can be integrally formed with each other and then joined with other partial components. Preferably, the elastic sealing ring is composed of a main sealing part and a fixing part, and the main sealing part and the fixing part are integrally formed. In this aspect, all components are integrally formed, but it is not limited to this.

Preferably, the material of the elastic sealing ring includes Fluoro-elastomer (FKM), Perfluoro-elastomer (FFKM) or Fluorosilicone Rubber (FVMQ), but not limited to this.

According to this creation, the material of the upper element usually includes a ceramic dielectric material, but it is not limited to this. In addition, an electrode may be provided inside the upper element, and the material of the electrode is usually a metal such as copper or tungsten, but is not limited thereto.

According to this creation, in addition to the fluid supply unit provided inside the lower component, a temperature control system can also be provided to stabilize the temperature of the electrostatic adsorption tray, thereby preventing the temperature change of the electrostatic adsorption tray from affecting the etching rate of the wafer. In addition, the working fluid supplied by the fluid supply unit is usually helium gas, but is not limited thereto; the working fluid can transfer the thermal energy of the wafer, thereby adjusting the temperature of the wafer and controlling the etching rate.

In the following, please cooperate with the drawings and the preferred embodiments of this creation to further explain the technical means adopted by this creation to achieve the predetermined purpose.

The elastic sealing ring used for the electrostatic adsorption retainer of this invention can be applied to the electrostatic adsorption retainer 10 of the existing plasma etching equipment as shown in FIG. 1A and FIG. 1B. The electrostatic adsorption tray 10 includes an upper element 11, a lower element 12, a connecting layer 13, a fluid supply unit 14, and an extension element 16. The connecting layer 13 connects the upper element 11 and the lower element 12, and a groove 15 is formed on one side edge 131 of the connecting layer 13 and part of the lower edge 111 of the upper element and part of the upper edge 121 of the lower element. , And the groove 15 is located between the upper element 11 and the lower element 12. The upper element 11 can be used to carry a wafer 20, and the fluid supply unit 14 is provided inside the lower element 12, and supplies a helium gas as a working fluid to the wafer 20 through the upper element 11 (not shown) . In addition, the inner side of the extension element 16 and the outer side of the lower element 12 maintain a distance R, and the distance R forms an annular gap. The gap is connected to the channel in the extension element 16 and can be connected to the outside. surroundings.

Please refer to Figure 3, Figure 4A, Figure 4B and Figure 4C. Figure 3 is a top view of the elastic sealing ring 30A used for the electrostatic adsorption retainer according to the first embodiment of the creation, and Figure 4A is shown in Figure 3, according to The cross-sectional view of the elastic sealing ring 30A for the electrostatic adsorption retainer shown in the "BB cross section", and Figure 4B is the elastic sealing ring 30A for the electrostatic adsorption retainer that is not completely inserted into the groove of the electrostatic adsorption retainer 10. 4C is a schematic diagram of the elastic sealing ring 30A used for the electrostatic adsorption retainer being completely inserted into the groove 15 of the electrostatic adsorption retainer 10. The elastic sealing ring 30A for the electrostatic adsorption retainer includes: a main sealing portion 31 and a fixing portion 32, and the fixing portion 32 is formed by protruding from the main sealing portion 31 toward the direction of the groove 15, that is, the The fixing portion 32 is formed to protrude from the main sealing portion 31 toward the side edge 131 of the connecting layer 13, and the main sealing portion 31 and the fixing portion 32 are integrally formed. To define the center point of the elastomeric seal ring 30A, the upper seal ring 30A of the elastic in the radial direction, of the main sealing portion of the length L ₁ 31, the fixing portion 32 of a length L _2, and L ₁ and L ₂ The sum is equal to _{the length L g of the groove 15.} Defined by the center point of the elastic sealing ring 30A, in the axial direction of the elastic sealing ring 30A, the main sealing portion 31 has a first maximum vertical thickness H ₁ , and the first maximum vertical thickness H _{1 is} greater than the The vertical height H _{g of the} trench 15; the fixing portion 32 has a second maximum vertical thickness H ₂ , and the second maximum vertical thickness H ₂ is equal to the vertical height H _{g of} the trench 15. The ratio of H ₁ to H ₂ is 1:0.93.

In addition, the fixing portion 32 has two corners 321 on the side facing the groove 15. The two corners 321 are two chamfers. The arrangement of the chamfers makes it easier to install the elastic sealing ring 30A for the electrostatic adsorption retainer in the groove. In the groove 15 to seal the groove 15. Section of the main seal portion 31 approximately a rectangular shape, approximately parallel to the top and bottom, and the top and the bottom is the distance H _1; but due to the main seal portion 31 is larger than the fixed section H ₁ of H ₂ 32, and thus Two joint corners 311 are formed at the junction of the main sealing portion 31 and the fixed portion 32, and the two joint corners 311 are all chamfered.

Please refer to FIGS. 5A and 5B. FIG. 5A is a three-dimensional schematic diagram of the elastic sealing ring 30B for the electrostatic adsorption retainer according to the second embodiment of the creation, and FIG. 5B is the elastic sealing ring 30B for the electrostatic adsorption retainer set on the electrostatic Schematic diagram of the groove 15 of the suction tray 10 The elastic sealing ring 30B for the electrostatic adsorption retainer of the second embodiment may include the same parts as the elastic sealing ring 30A for the electrostatic adsorption retainer of the first embodiment, and the same parts will be denoted by the same reference numerals below. More details. The main difference between the elastic sealing ring 30B for the electrostatic adsorption chuck of the second embodiment and the elastic sealing ring 30A for the electrostatic adsorption chuck of the first embodiment is that in order to connect the main sealing portion 31 and the fixing portion 32, The elastic sealing ring 30B for the electrostatic adsorption retainer connects the main sealing portion 31 and the fixing portion 32 with the upper and lower inclined surfaces 311 ′, respectively. That is to say, the cross section of the main sealing portion 31 is a trapezoid, and the trapezoid has a lower bottom edge (that is, the main sealing portion 31 facing the outer side 312 away from the groove 15) and an upper bottom edge (that is, the The main sealing portion 31 and the fixed portion 32 are formed at the junction) and the two opposite waist lines connecting the upper and lower bottom edges; wherein the length of the lower bottom edge is the first maximum vertical thickness H of the main sealing portion 31 _1. The length of the upper bottom side is the second maximum vertical thickness H _{2 of} the fixing portion 32, _{and the ratio of H 1} to H ₂ is 1:0.93; the first maximum vertical thickness H _{1 is} greater than the vertical height of the groove 15 H _g , the second maximum vertical thickness H _{2 is} less than the vertical height H _{g of} the trench 15.

Please refer to FIGS. 6A and 6B. FIG. 6A is a cross-sectional view of the elastic sealing ring 30C for the electrostatic adsorption retainer according to the third embodiment of the creation, and FIG. 6B is the third embodiment of the creation for the electrostatic adsorption retainer. A schematic diagram of the elastic sealing ring 30C of which is set in the groove 15 of the electrostatic adsorption retainer 10. The elastic sealing ring 30C for the electrostatic adsorption retainer includes: a main sealing part 31, a fixing part 32, a first rib 33 and a second rib 34, the main sealing part 31, the fixing part 32, The first rib 33 and the second rib 34 are integrally formed. The fixing portion 32 is formed by protruding from the main sealing portion 31 toward the groove 15, the first rib 33 is connected to the upper side of the main sealing portion 31, and the second rib 34 is connected to the main sealing portion 31. The lower side of the seal is connected, and the first rib 33 and the second rib 34 are located on opposite sides of the main sealing portion 31. The fixing portion 32 has two corners 321 facing the groove 15, and the two corners 321 are two chamfers. To the radial direction, _1, the length L of the main seal portion 31 of the fixing portion 32 of the L _2, L ₁ and L ₂ is equal to the sum of the length L _g 15 with the groove, the ratio of L ₁ and L ₂ is It is 1:1. In the axial direction, the main sealing portion 31 has a first maximum vertical thickness H ₁ , and the first maximum vertical thickness H _{1 is} equal to the vertical height H _{g of} the groove 15; the fixing portion 32 has a second maximum The vertical thickness H ₂ , the second maximum vertical thickness H _{2 is} smaller than the vertical height H _{g of} the trench 15; _{the ratio of H 1} to H ₂ is 1:0.88. The maximum vertical thickness of the first rib 33 H _3, the second rib of the maximum vertical thickness H 34 _4, H ₃ and H ₁ is the ratio of 1:20; and H ₁ H ₄ ratio was 1:20. Since the first maximum vertical thickness H _{1 of} the main sealing portion 31 is equal to the H _{g of} the groove 15, and the elastic sealing ring 30C for electrostatic adsorption of the retainer has a first rib 33 and a second rib 34, the electrostatic The total height of the elastic sealing ring 30C for the suction retainer in the vertical direction is the sum of H ₁ , H ₃ and H ₄ , which is greater than the H _{g of the} groove 15; due to the maximum vertical thickness H _{3 of the first rib 33} When the maximum vertical thickness H ₄ of the second rib 34 is small relative to the first maximum vertical thickness H _{1 of} the main sealing portion 31, when the elastic sealing ring 30C for the electrostatic adsorption retainer is completely inserted into the groove 15. The elastic first rib 33 and the second rib 34 will sink into the main sealing part 31, and the main sealing part 31 will still contact the lower edge 111 of the upper element and part of the upper edge 121 of the lower element. The first rib 33 and the second rib 34 can provide a locally enhanced sealing effect. Therefore, the elastic sealing ring 30C for the electrostatic adsorption retainer when inserted into the groove 15 is better than the elastic sealing for the electrostatic adsorption retainer mentioned above. The ring 30A suffers from a relatively large friction force, which comes from the lower edge 111 of the upper element and the upper edge 121 of the lower element; however, since the peak areas of the first rib 33 and the second rib 34 are not large, the static electricity The elastic sealing ring 30C for the suction retainer can still be installed in the groove 15 smoothly, and after installation, it can be more closely connected with the walls of the lower edge 111 of the upper element and the upper edge 121 of the lower element, so better protection can be achieved effect.

Please refer to FIGS. 7A and 7B. FIG. 7A is a three-dimensional schematic diagram of the elastic sealing ring 30D for the electrostatic adsorption retainer according to the fourth embodiment of the creation, and FIG. 7B is the elastic sealing ring 30D for the electrostatic adsorption retainer set on the electrostatic A schematic view of the groove 15 of the suction support plate 10. The elastic sealing ring 30D for the electrostatic adsorption retainer includes: a main sealing portion 31, a fixing portion 32, and an extension portion 35. The fixing portion 32 is protruded from the main sealing portion 31 toward the groove 15 After forming, the extension part 35 is formed by the main sealing part 31 protruding away from the groove 15 and is located in the distance R. The extension portion 35 has an upper wing portion 351, and the inner edge of the upper wing portion 351 is in contact with the outer edge of the upper element 11; the main sealing portion 31, the fixing portion 32, and the extension portion 35 are integrally formed .

The fixing portion 32 has two corners 321 facing the groove 15, and the two corners 321 are two chamfers. To the radial direction, _1, the length L of the main seal portion 31 of the fixing portion 32 of the L _2, L ₁ and L ₂ is equal to the sum of the length L _g 15 with the groove. In the axial direction, the main sealing portion 31 has a first maximum vertical thickness H ₁ , the first maximum vertical thickness H _{1 is} greater than the vertical height H _{g of} the groove 15; the fixing portion 32 has a second maximum vertical thickness H g The thickness H ₂ , the second maximum vertical thickness H _{2 is} less than the vertical height H _{g of} the groove 15; _{the ratio of H 1} to H ₂ is 1:0.93; the section of the main sealing portion 31 is approximately a rectangle, and the top It is almost parallel to the bottom, and the distance between the top and the bottom is H ₁ ; in the radial direction, the length L _{3 of} the extension 35 is smaller than the distance R between the inner side of the extension element 16 and the outer side of the lower element 12. In addition, a corner 3511 of the upper wing portion of the upper wing portion 351 facing away from the groove 15 is a chamfer.

Please refer to FIG. 8. FIG. 8 is a schematic diagram of the elastic sealing ring 30E for the electrostatic adsorption support plate set in the groove 15 of the electrostatic adsorption support plate 10 according to the fifth embodiment of the creation. The elastic sealing ring 30E for the electrostatic adsorption retainer of the fifth embodiment may include the same parts as the elastic sealing ring 30D for the electrostatic adsorption retainer of the fourth embodiment, and the same parts will be denoted by the same reference numerals below. More details. The main difference between the elastic sealing ring 30E for the electrostatic adsorption retainer of the fifth embodiment and the elastic sealing ring 30D for the electrostatic adsorption retainer of the fourth embodiment is that the elastic sealing ring 30E for the electrostatic adsorption retainer is more than The lower two inclined surfaces 311' connect the main sealing portion 31 and the fixing portion 32, that is, the cross section of the main sealing portion 31 is a trapezoid, and the trapezoid has a bottom side parallel to each other (that is, the main sealing portion 31). The outer side 312 facing away from the groove 15), the upper bottom edge (that is, the junction between the main sealing portion 31 and the fixing portion 32), and the two opposite waist lines connecting the upper and lower bottom edges; therefore, electrostatic adsorption The elastic sealing ring 30E for the retainer does not have two joints 311; in addition, the extension 35 does not have an upper wing portion, but a lower wing portion 352, the inner edge of the lower wing portion 352 and the lower element 12 When the outer edges are in contact, a corner 3521 of the lower wing portion of the lower wing portion 352 facing away from the groove 15 is a right angle, and the extending portion 35 has a chamfer 353 facing the side away from the groove 15.

Please refer to FIG. 9. FIG. 9 is a schematic diagram of the elastic sealing ring 30F for the electrostatic adsorption support plate set in the groove 15 of the electrostatic adsorption support plate 10 according to the sixth embodiment of the creation. The elastic sealing ring 30F for the electrostatic adsorption retainer of the sixth embodiment may include the same parts as the elastic sealing ring 30E for the electrostatic adsorption retainer of the fifth embodiment, and the same parts will be denoted by the same reference numerals below. More details. The main difference between the elastic sealing ring 30F for the electrostatic adsorption retainer of the sixth embodiment and the elastic sealing ring 30E for the electrostatic adsorption retainer of the fifth embodiment is that the extension portion 35 not only has a lower wing portion 352, but also There is an upper wing portion 351, the inner edge of the upper wing portion 351 is in contact with the outer edge of the upper element 11; the upper wing portion 351 faces away from the groove 15 and the upper wing portion corner 3511 is an inverted angle. Further, in the axial direction, the maximum height H of the vertical portion 351 of the upper wing ₅ and the ratio of the maximum vertical height of the lower wing 352 H ₆ is 1: 2.

Since the elastic sealing rings 30D, 30E, and 30F for the electrostatic adsorption retainer have extensions, the elastic sealing rings 30D, 30E, and 30F for the electrostatic adsorption retainer are more able to withstand the impact and erosion of plasma gas, and are more effective Prevent the plasma gas from entering the trench 15 through the spacing R to cause damage to the connection layer 13; in addition, since the length of the extension 35 in the radial direction is slightly narrower than the width of the spacing R, the Installation of extension components.

Please refer to FIG. 10. FIG. 10 is a schematic diagram of the elastic sealing ring 30G for the electrostatic adsorption holder set in the groove 15 of the electrostatic adsorption holder 10 according to the seventh embodiment of the creation. The elastic sealing ring 30G for the electrostatic adsorption retainer of the seventh embodiment may include the same parts as the elastic sealing ring 30F for the electrostatic adsorption retainer of the sixth embodiment, and the same parts will be denoted by the same reference numerals below. More details. The main difference between the elastic sealing ring 30G for the electrostatic adsorption retainer of the seventh embodiment and the elastic sealing ring 30F for the electrostatic adsorption retainer of the sixth embodiment is that the elastic sealing ring 30G for the electrostatic adsorption retainer except In addition to the main sealing portion 31, the fixing portion 32, and the extension portion 35, the third rib portion 36 is connected to the outside of the extension portion 35 and is located in the distance R, and is connected to the outer side of the extension portion 35. The inner side of the extension element 16 of the electrostatic adsorption chuck 10 is in contact with each other. Thus, in the radial direction, the length L is equal to the total length of the length L ₄ of the third rib 36 and the extending portion 35 and the pitch of ₃ to R.

Although this creation is disclosed in the foregoing several preferred embodiments, it is not intended to limit this creation. It should be understood that any person with ordinary knowledge in the technical field can make some changes, substitutions and modifications without departing from the spirit and scope of this creation.

10: Electrostatic adsorption tray 11: Upper element 111: Lower edge of upper element 12: Lower element 121: Upper edge of lower element 13: Connecting layer 131: Side edge 14: Fluid supply unit 15: Groove 16: Extension element 120: Process Plasma gas 30A, 30B, 30C, 30D, 30E, 30F, 30G: elastic sealing ring for electrostatic adsorption plate 31: main sealing part 311: corner 311': inclined surface 312: outer side 32: fixed part 321: corner 33: First rib 34: Second rib 35: Extension 351: Upper wing 3511: Upper wing corner 352: Lower wing 3521: Lower wing corner 353: Chamfer 36: Third rib A: Enlarged part R: Spacing C: Capsule type sealing ring BB line: Section line H ₁ : The first maximum vertical thickness H ₂ : The second maximum vertical thickness H ₃ : The maximum vertical thickness of the first rib H ₄ : No. The maximum vertical thickness of the two ribs H ₅ : the maximum vertical height of the upper wing H ₆ : the maximum vertical height of the lower wing H _g : the vertical height of the groove L ₁ : the length of the main seal part L ₂ : the length of the fixed part L ₃ : the length of the extension L ₄ : the length of the third rib L _g : the length of the groove

Figure 1A is a schematic diagram of a prior art plasma etching equipment; Fig. 1B is a schematic cross-sectional view of enlarged part A in Fig. 1A; Fig. 2 is a schematic cross-sectional view of the groove in Fig. 1B provided with a capsule sealing ring; Figure 3 is a top view of the elastic sealing ring used for the electrostatic adsorption retainer of the first embodiment; 4A is a cross-sectional view of the elastic sealing ring used for the electrostatic adsorption retainer of the first embodiment according to the section line B-B in FIG. 3; 4B is a schematic cross-sectional view of the elastic sealing ring used for the electrostatic adsorption retainer of the first embodiment not being completely inserted into the groove; 4C is a schematic cross-sectional view of the elastic sealing ring for the electrostatic adsorption bearing plate of the first embodiment completely inserted into the groove; 5A is a perspective view of the elastic sealing ring used for the electrostatic adsorption retainer of the second embodiment; 5B is a schematic cross-sectional view of the groove in FIG. 1B provided with the elastic sealing ring for the electrostatic adsorption bearing plate of the second embodiment; 6A is a cross-sectional view of the elastic sealing ring used for the electrostatic adsorption retainer of the third embodiment; 6B is a schematic cross-sectional view of the groove in FIG. 1B provided with the elastic sealing ring for the electrostatic adsorption bearing plate of the third embodiment; Fig. 7A is a three-dimensional schematic diagram of the elastic sealing ring used for the electrostatic adsorption retainer of the fourth embodiment; FIG. 7B is a schematic cross-sectional view of the groove in FIG. 1B provided with the elastic sealing ring for the electrostatic adsorption bearing plate of the fourth embodiment; 8 is a schematic cross-sectional view of the groove in FIG. 1B provided with the elastic sealing ring for the electrostatic adsorption bearing plate of the fifth embodiment; 9 is a schematic cross-sectional view of the groove in FIG. 1B provided with the elastic sealing ring for the electrostatic adsorption bearing plate of the sixth embodiment; 10 is a schematic cross-sectional view of the groove in FIG. 1B provided with the elastic sealing ring for the electrostatic adsorption retainer of the seventh embodiment.

11: Upper element

111: Lower edge of upper element

12: Lower element

121: Upper edge of lower element

13: Connection layer

131: Side Edge

15: groove

30A: Elastic sealing ring for electrostatic adsorption retainer

31: Main seal

32: Fixed part

H ₁ : The first maximum vertical thickness

H ₂ : The second largest vertical thickness

L ₁ : The length of the main seal

L ₂ : The length of the fixed part

Claims (26)

An elastic sealing ring for an electrostatic adsorption support plate, which is arranged in an electrostatic adsorption support plate, wherein the electrostatic adsorption support plate includes an upper element, a lower element, and a connecting layer, and the connecting layer connects the upper element and the A lower element, and a side edge of the connecting layer, a part of the lower edge of the upper element and a part of the upper edge of the lower element jointly form a groove; wherein the elastic sealing ring includes: A main sealing part and a fixed part; Wherein, the main sealing portion has a first maximum vertical thickness, and the first maximum vertical thickness is greater than or equal to the vertical height of the groove; The fixing portion is formed by protruding from the main sealing portion toward the groove, and the fixing portion has a second maximum vertical thickness. The second maximum vertical thickness is equal to or less than the vertical height of the groove, and the The first maximum vertical thickness is greater than the second maximum vertical thickness; and The total length of the main sealing part and the fixed part in the radial direction is equal to the length of the groove in the radial direction. The elastic sealing ring according to claim 1, wherein the side of the fixing portion facing the groove has two corners, and the corners are two chamfers. The elastic sealing ring according to claim 1, wherein at least one corner is formed at the junction of the main sealing portion and the fixed portion, and the at least one corner is a chamfer. The elastic sealing ring according to claim 3, wherein the at least one joint is two joints, and the joints are all chamfers. The elastic sealing ring according to any one of claims 1 to 4, wherein the main sealing part and the fixing part are integrally formed. The elastic seal ring according to any one of claims 1 to 4, wherein the ratio of the first maximum vertical thickness of the main sealing portion to the second maximum vertical thickness of the fixed portion is 1:0.75 to 1:0.97. The elastic sealing ring according to any one of claims 1 to 4, wherein the elastic sealing ring further comprises a first rib connected to the upper side of the main sealing part. The elastic sealing ring according to claim 7, wherein the elastic sealing ring further comprises a second rib connected to the lower side of the main sealing part and located on the opposite side to the first rib . The elastic sealing ring according to claim 1, wherein the cross-section of the main sealing portion is a trapezoid, and the trapezoid has an upper base and a lower base that are parallel to each other, and connects the upper base and the lower base The two opposite waist lines; wherein the length of the upper base is less than the length of the lower base, the upper base is connected to the fixed portion, and the length of the lower base is the first maximum vertical thickness of the main sealing portion . The elastic sealing ring according to claim 9, wherein the trapezoid of the cross section of the main sealing portion is an isosceles trapezoid. The elastic sealing ring according to claim 9, wherein the length of the upper bottom side is the second maximum vertical thickness of the fixing portion. The elastic seal ring according to any one of claims 9 to 11, wherein the ratio of the length of the main sealing portion in the radial direction to the length of the fixed portion in the radial direction is 1:0.5 to 1:2 . The elastic sealing ring according to any one of claims 9 to 11, wherein the main sealing part and the fixing part are integrally formed. The elastic sealing ring according to any one of claims 1 to 4, wherein the electrostatic adsorption retainer further includes an extension element, the extension element surrounds the upper element and the lower element, and the inner side of the extension element is connected to the The outer side of the lower element maintains a distance; wherein, the elastic sealing ring further has an extension part, the extension part is formed from the main sealing part toward the direction away from the groove and is located in the distance; the extension part has a The upper wing part, the inner edge of the upper wing part is in contact with the outer edge of the upper element. The elastic sealing ring according to any one of claims 1 to 4, wherein the electrostatic adsorption retainer further includes an extension element, the extension element surrounds the upper element and the lower element, and the inner side of the extension element is connected to the The outer side of the lower element maintains a distance; wherein, the elastic sealing ring further has an extension part, the extension part is formed from the main sealing part in a direction away from the groove and is located in the distance; the extension part has a lower wing The inner edge of the lower wing is in contact with the outer edge of the lower element. The elastic sealing ring according to claim 14, wherein the extension portion further has a lower wing portion, and the inner edge of the lower wing portion is in contact with the outer edge of the lower element. The elastic sealing ring according to any one of claims 9 to 11, wherein the electrostatic adsorption retainer further includes an extension element, the extension element surrounds the upper element and the lower element, and the inner side of the extension element and the The outer side of the lower element maintains a distance; wherein, the elastic sealing ring further has an extension part, the extension part is formed from the main sealing part toward the direction away from the groove and is located in the distance; the extension part has a The upper wing part, the inner edge of the upper wing part is in contact with the outer edge of the upper element. The elastic sealing ring according to any one of claims 9 to 11, wherein the electrostatic adsorption retainer further includes an extension element, the extension element surrounds the upper element and the lower element, and the inner side of the extension element and the The outer side of the lower element maintains a distance; wherein, the elastic sealing ring further has an extension part, the extension part is formed from the main sealing part in the direction away from the groove and is located in the distance; the extension part has a lower part Wing part, the inner edge of the lower wing part is in contact with the outer edge of the lower element. The elastic sealing ring according to claim 17, wherein the extension portion further has a lower wing portion, and the inner edge of the lower wing portion is in contact with the outer edge of the lower element. The elastic sealing ring according to claim 19, wherein the ratio of the maximum vertical height of the upper wing portion to the maximum vertical height of the lower wing portion is 1:1 to 1:5. The elastic sealing ring according to claim 17, wherein the upper wing portion has a chamfer on the side away from the groove. The elastic sealing ring according to claim 18, wherein the lower wing portion has a right angle toward the side away from the groove. The elastic sealing ring according to claim 19, wherein the upper wing portion has a chamfer on the side away from the groove, and the lower wing portion has a right angle on the side away from the groove. The elastic sealing ring according to claim 22, wherein the extension portion has a chamfer on a side away from the groove. The elastic sealing ring according to claim 19, wherein the length of the extension in the radial direction is less than the length of the spacing. The elastic sealing ring according to claim 19, wherein the elastic sealing ring further includes a third rib connected to the outer side of the extension and located in the distance, and the third rib is connected to The inner side of the extension element of the electrostatic adsorption retainer is in contact with each other, and the sum of the length of the third rib in the radial direction and the length of the extension in the radial direction is equivalent to the length of the pitch.

Images