CN207074654U - Electrostatic chuck - Google Patents
Electrostatic chuck Download PDFInfo
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- CN207074654U CN207074654U CN201720864105.0U CN201720864105U CN207074654U CN 207074654 U CN207074654 U CN 207074654U CN 201720864105 U CN201720864105 U CN 201720864105U CN 207074654 U CN207074654 U CN 207074654U
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- electrostatic chuck
- heating
- zone
- protection part
- base
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Abstract
The utility model provides a kind of electrostatic chuck; it includes base, be arranged on zone of heating on the base and the insulating barrier that is arranged on the zone of heating; between base and insulating barrier; and it is looped around on the periphery wall of zone of heating and is provided with ring protection part; the ring protection part is made using the elastomeric material of resisting plasma corrosion; and ring protection part is in compression state between base and insulating barrier, to realize that zone of heating is isolated with plasma.Electrostatic chuck provided by the utility model; its ring protection part has higher plasma etch resistance, and so as to strengthen the protective effect to zone of heating, and the ring protection part can realize periodic replacement; and zone of heating will not be damaged, so as to extend the service life of electrostatic chuck.
Description
Technical field
Technical field of manufacturing semiconductors is the utility model is related to, in particular it relates to a kind of electrostatic chuck.
Background technology
In integrated circuit (IC) process for making, particularly in plasma etching (ETCH) technique, in order to fixation,
Chip (Wafer) is supported, avoids chip from occurring mobile or inconsistent phenomenon in technical process, while realize the temperature control of chip
System, often using electrostatic chuck (Electro Static Chuck, ESC).
Fig. 1 is the structure chart of existing electrostatic chuck.As shown in figure 1, electrostatic chuck includes base 1, is arranged on base 1
Zone of heating 2 and the insulating barrier 3 that is arranged on zone of heating 2, also, on the periphery wall of zone of heating 2, coated with silica gel material 4,
The silica gel material 4 is between base 1 and insulating barrier 3, to protect zone of heating 2 not by plasma etching.
Above-mentioned electrostatic chuck is inevitably present problems with actual applications：
Silica gel material 4 is thinning by meeting after plasma etching, even disappears completely, and the protective effect to zone of heating 2 is lost
Effect, makes zone of heating 2 be directly exposed in plasma environment, it is easy to be corroded and produce particle, so as to reduce wafer quality.
Because silica gel material 4 is attached on the periphery wall of zone of heating 2 by the way of coating, if will gluing again, it is necessary to first residual
The silica gel material stayed is removed, then new silica gel material is coated up again, this not only processing difficulties, and easily damage heating
Layer 2, causes electrostatic chuck to damage.Therefore, the conventional practice is, when silica gel material 4 is thinned to a certain degree by plasma etching
Afterwards, the electrostatic chuck is not used, integral replacing is new electrostatic chuck.
Utility model content
The utility model is intended at least solve one of technical problem present in prior art, it is proposed that a kind of electrostatic card
Disk, its ring protection part are removably circumferentially positioned on the periphery wall of the zone of heating, can be directly individually replaced, and not
Zone of heating can be damaged, so as to extend the service life of electrostatic chuck.
To realize that the purpose of this utility model provides a kind of electrostatic chuck, including base, it is arranged on the base
Zone of heating and the insulating barrier being arranged on the zone of heating, the external diameter of the zone of heating be less than the base external diameter and it is described absolutely
The external diameter of edge layer, in addition to ring protection part, the ring protection part are removably circumferentially positioned at the zone of heating
On periphery wall.
Preferably, the ring protection part is flexible, and in compression between the base and the insulating barrier
Deformation state, to realize that the zone of heating and plasma are isolated.
Preferably, the ring protection part is when in uncompressed deformation state, in the axial direction of the electrostatic chuck
Cross sectional shape be rectangle, square, circle or ellipse.
Preferably, the cross sectional shape is the rectangle or square using round-corner transition.
Preferably, the span of the radius of the fillet is in 1~3mm.
Preferably, the cross sectional shape is circle；
The ring formed between the upper surface of periphery wall, the base and the lower surface of the insulating barrier in the zone of heating
Height of the shape space in the axial direction of the electrostatic chuck is less than the 90% of the diameter of the cross sectional shape.
Preferably, the cross sectional shape is rectangle or square；
The outer ring surface of the ring protection part is concave surface.
Preferably, the minimum thickness of the ring protection part diametrically is more than or equal to the ring protection part
The 80% of integral thickness diametrically.
Preferably, the concave surface includes arc-shaped concave, either inclined plane or zig zag plane；The zig zag plane is by edge
At least two planes composition of vertical direction connection, and form angle between adjacent two planes.
Preferably, the ring protection part includes annular body, the annular body be arranged on the base with it is described absolutely
Between edge layer, and it is looped around on the periphery wall of the zone of heating, and the annular body is in the base and the insulating barrier
Between be in compression state；
It is stacked on the periphery wall of the annular body formed with least one circular extent, the circular extent
On the periphery wall of the insulating barrier, and the upper end of the circular extent is less than the upper surface of the insulating barrier；And/or the ring
Shape extension is stacked on the periphery wall of the base.
Preferably, the material of the ring protection part includes FFKM.
The utility model has the advantages that：
Electrostatic chuck provided by the utility model, it by ring protection part by being removably circumferentially positioned at zone of heating
Periphery wall on, can directly be individually replaced, and zone of heating will not be damaged in Renewal process, so as to extend electrostatic chuck
Service life.
As a preferred scheme, above-mentioned ring protection part is flexible, and in pressure between base and insulating barrier
Compression deformation state, this can play the work sealed to gap of the ring protection part respectively between base and insulating barrier
With so as to realize that zone of heating is isolated with plasma, and then avoiding zone of heating because being directly exposed to plasma environment
In, the particle that is corroded and produces is caused, so as to improve wafer quality.
Brief description of the drawings
Fig. 1 is the structure chart of existing electrostatic chuck；
Fig. 2 is the partial sectional view for the electrostatic chuck that the utility model first embodiment provides；
Fig. 3 is the vertical view cutaway drawing for the electrostatic chuck that the utility model first embodiment provides；
Fig. 4 is the broken section for the electrostatic chuck that first variant embodiment of the utility model first embodiment provides
Figure；
Fig. 5 is the broken section for the electrostatic chuck that second variant embodiment of the utility model first embodiment provides
Figure；
Fig. 6 is the broken section for the electrostatic chuck that the 3rd variant embodiment of the utility model first embodiment provides
Figure；
Fig. 7 is the broken section for the electrostatic chuck that the 4th variant embodiment of the utility model first embodiment provides
Figure；
Fig. 8 is the partial sectional view for the electrostatic chuck that the 5th variant embodiment of the utility model first embodiment provides；
Fig. 9 is the partial sectional view for the electrostatic chuck that the utility model second embodiment provides；
Figure 10 is the broken section for the electrostatic chuck that first variant embodiment of the utility model second embodiment provides
Figure；
Figure 11 is the broken section for the electrostatic chuck that second variant embodiment of the utility model second embodiment provides
Figure.
Embodiment
To make those skilled in the art more fully understand the technical solution of the utility model, come below in conjunction with the accompanying drawings to this
The electrostatic chuck that utility model provides is described in detail.
Also referring to Fig. 2 and Fig. 3, electrostatic chuck includes base 5, the zone of heating 6 being arranged on the base 5 and is arranged on
Insulating barrier 7 on the zone of heating 6, wherein, heating element heater is provided with zone of heating 6, to provide heat, and passes through insulating barrier
7 are transferred to chip.Insulating barrier 7 uses such as Al2O3, AlN etc. ceramics or other insulating materials make.Also, in insulating barrier
DC electrode layer is provided with 7, electrostatic attraction is produced between the DC electrode layer and the chip being placed on insulating barrier 7, so as to reach
To the purpose of fixed wafer.
Also, electrostatic chuck also includes ring protection part 8, the ring protection part 8, which is removably circumferentially positioned at, to be added
On the periphery wall of thermosphere 6.It is so-called detachable, refer to that ring protection part 8 can be directly individually replaced, and in Renewal process not
Zone of heating can be damaged, and then extends the service life of electrostatic chuck.
Preferably, protect the heating of the inner side of ring-type guard block 8 once 6 not by plasma etching to preferably play
Effect, ring protection part 8 is flexible, and compression state is between base 5 and insulating barrier 7, to realize heating
Layer 6 is isolated with plasma.Using the elasticity of ring protection part 8, can realize removably simultaneously, by making ring-type
Guard block 8 is in compression state between base 5 and insulating barrier 7, i.e. is located at two using base 5 and the extruding of insulating barrier 7
Ring protection part 8 between person, is allowed to produce compression, can enable the ring protection part 8 and base 5 and insulation
Layer 7 is in close contact, and so as to play a part of sealing, and then can realize that zone of heating 6 is isolated with plasma, avoids adding
Thermosphere 6 causes the particle that is corroded and produces, so as to improve wafer quality because being directly exposed in plasma environment.
Preferably, the material of above-mentioned ring protection part 8 includes FFKM, and the FFKM is not only flexible, and
And by introducing fluorine atom in rubber, make FFKM that there is excellent heat resistance, inoxidizability, corrosion resistance and ageing-resistant
Property etc..
In the present embodiment, ring protection part 8 is when in uncompressed deformation state, in the axial direction of electrostatic chuck
Cross sectional shape is rectangle, as shown in Figure 2.Preferably, the cross sectional shape uses the transition of fillet 81, in order to install.It is further excellent
Choosing, the span of the radius of the fillet 81 is in 1~3mm, in order to install.Certainly, in actual applications, above-mentioned section shape
Shape can also be square.
On the basis of above-mentioned cross sectional shape is rectangular or square, it is preferred that the outer of ring protection part 8 can also be made
Anchor ring is concave surface, and this is advantageous to be avoided ring protection part 8 from contacting with peripheral component.Specifically, as shown in figure 4, the concave surface is wrapped
Bracket concave surface 82.Or as shown in figure 5, above-mentioned concave surface is inclined plane 83, in the present embodiment, plane 83 is towards having a down dip
Tiltedly.Certainly, in actual applications, plane 83 can also tilt upward.
On the basis of above-mentioned cross sectional shape is rectangular or square, as shown in fig. 6, above-mentioned concave surface can also be zig zag plane
84, the zig zag plane 84 is made up of two planes (841,842) vertically connecting, and two planes (841,842) it
Between form angle, the angle can be acute angle, right angle or obtuse angle.Or as shown in fig. 7, above-mentioned concave surface is zig zag plane 85, the song
Folding face 85 can also be made up of three planes (851,852,853) vertically connected, and between adjacent two planes
Angle is formed, the angle can be acute angle, right angle or obtuse angle.Certainly, in actual applications, above-mentioned zig zag plane can also be by four
Or the plane of more than five forms.
On the basis of the outer ring surface of ring protection part 8 is concave surface, it is preferred that ring protection part 8 is diametrically
Minimum thickness is more than or equal to the 80% of the integral thickness of ring protection part 8 diametrically, to ensure ring protection part 8
Sealing effectiveness.
It should be noted that in the present embodiment, ring protection part 8 is when in uncompressed deformation state, in electrostatic
Cross sectional shape in the axial direction of chuck is rectangle, and still, the utility model is not limited thereto, in actual applications, above-mentioned section
Face shape can also be circle.
When above-mentioned cross sectional shape is circular, it is preferred that the upper surface of periphery wall, base 5 in zone of heating 6 and insulating barrier
Height of the annular space formed between 7 lower surface in the axial direction of electrostatic chuck is less than the diameter of above-mentioned cross sectional shape
90%, to ensure its sealing effectiveness.In addition, in actual applications, the length of above-mentioned annular space in radial directions should be appropriate
More than diameter of the ring protection part 8 when in uncompressed deformation state, to ensure that compression change is occurring for ring protection part 8
Without departing from the outward flange of insulating barrier 7 or base 5 during shape.
Fig. 9 is the partial sectional view for the electrostatic chuck that the utility model second embodiment provides.Referring to Fig. 9, this implementation
Compared with above-mentioned first embodiment, its difference is the electrostatic chuck that example provides：Circular extent is additionally arranged, further to improve
The sealing effectiveness of ring protection part.
Specifically, in this embodiment, ring protection part includes annular body 10, the annular body 10 be arranged on base 5 with
Between insulating barrier 7, and it is looped around on the periphery wall of zone of heating 6, and annular body 10 is between base 5 and insulating barrier 7
Compression state, to play a part of sealing gap of the annular body 10 respectively between base 5 and insulating barrier 7,
So as to realize that zone of heating 6 and plasma are isolated, and then zone of heating 6 is avoided because being directly exposed to plasma environment
In, the particle that is corroded and produces is caused, so as to improve wafer quality.
Also, circular extent 11 is formed on the periphery wall of annular body 10, the circular extent 11 is stacked in insulation
On the periphery wall of layer 7, to strengthen the sealing function to the gap between annular body 10 and insulating barrier 7.Also, circular extent
11 upper end is less than the upper surface of insulating barrier 7, to avoid, when carrying out technique, having an impact the chip on insulating barrier 7.Ring-type
The length that extension 11 is stacked on 5 periphery walls of base can be 1~10mm.
Or as shown in Figure 10, circular extent 12 is also formed with the periphery wall of annular body 10, ring-type extension
Portion 12 is stacked on the periphery wall of insulating barrier 7 and base 5 respectively, with enhancing to annular body 10 respectively with base 5 and insulating barrier 7
Between the effect that is sealed of gap.
Or as shown in figure 11, circular extent 13, the circular extent 13 are formed on the periphery wall of annular body 10
It is stacked on 5 periphery walls of base, to strengthen the sealing function to the gap between annular body 10 and base 5.Ring-type extends
The length that portion 13 is stacked on 5 periphery walls of base can be 1~10mm.
From the foregoing, it will be observed that it can prolong on the periphery wall of annular body 10 formed with least one circular extent, the ring-type
Extending portion can be individually stacked on the periphery wall of insulating barrier 7, either can be individually stacked on the periphery wall of base 5 or be gone back
It can be stacked in respectively on the periphery wall of insulating barrier 7 and on the periphery wall of base 5.
In summary, the electrostatic chuck that the above-mentioned each embodiment of the utility model provides, it is by by ring protection part
Removably it is circumferentially positioned on the periphery wall of zone of heating, can be directly individually replaced ring protection part, and in Renewal process
In will not damage zone of heating, so as to extend the service life of electrostatic chuck.
It is understood that embodiment of above is merely to illustrate that principle of the present utility model and used exemplary
Embodiment, but the utility model is not limited thereto.For those skilled in the art, this is not being departed from
In the case of the spirit and essence of utility model, various changes and modifications can be made therein, and these variations and modifications are also considered as this reality
With new protection domain.
Claims (11)
1. a kind of electrostatic chuck, including base, the zone of heating that is arranged on the base and it is arranged on exhausted on the zone of heating
Edge layer, the external diameter of the zone of heating are less than the external diameter of the base and the external diameter of the insulating barrier, it is characterised in that also including ring
Shape guard block, the ring protection part are removably circumferentially positioned on the periphery wall of the zone of heating.
2. electrostatic chuck according to claim 1, it is characterised in that the ring protection part is flexible, and in institute
State and compression state is between base and the insulating barrier, to realize that the zone of heating and plasma are isolated.
3. electrostatic chuck according to claim 2, it is characterised in that the ring protection part is in uncompressed deformation
During state, the cross sectional shape in the axial direction of the electrostatic chuck is rectangle, square, circle or ellipse.
4. electrostatic chuck according to claim 3, it is characterised in that the cross sectional shape is the rectangle using round-corner transition
Or square.
5. electrostatic chuck according to claim 4, it is characterised in that the span of the radius of the fillet 1~
3mm。
6. electrostatic chuck according to claim 3, it is characterised in that the cross sectional shape is circle；
The annular formed between the upper surface of periphery wall, the base and the lower surface of the insulating barrier in the zone of heating is empty
Between height in the axial direction of the electrostatic chuck be less than the cross sectional shape diameter 90%.
7. electrostatic chuck according to claim 3, it is characterised in that the cross sectional shape is rectangle or square；
The outer ring surface of the ring protection part is concave surface.
8. electrostatic chuck according to claim 7, it is characterised in that the minimum of the ring protection part diametrically is thick
80% of degree more than or equal to the integral thickness of the ring protection part diametrically.
9. electrostatic chuck according to claim 7, it is characterised in that the concave surface includes arc-shaped concave, or inclined
Plane, or zig zag plane；The zig zag plane is made up of at least two planes vertically connected, and adjacent two planes
Between form angle.
10. electrostatic chuck according to claim 1, it is characterised in that the ring protection part includes annular body, described
Annular body is arranged between the base and the insulating barrier, and is looped around on the periphery wall of the zone of heating, and described
Annular body is in compression state between the base and the insulating barrier；
Formed with least one circular extent on the periphery wall of the annular body, the circular extent is stacked in described
On the periphery wall of insulating barrier, and the upper end of the circular extent is less than the upper surface of the insulating barrier；And/or the ring-type is prolonged
Extending portion is stacked on the periphery wall of the base.
11. according to the electrostatic chuck described in any one of claim 1 to 10, it is characterised in that the material of the ring protection part
Including FFKM.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720864105.0U CN207074654U (en) | 2017-07-17 | 2017-07-17 | Electrostatic chuck |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720864105.0U CN207074654U (en) | 2017-07-17 | 2017-07-17 | Electrostatic chuck |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207074654U true CN207074654U (en) | 2018-03-06 |
Family
ID=61522597
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720864105.0U Active CN207074654U (en) | 2017-07-17 | 2017-07-17 | Electrostatic chuck |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207074654U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107195578A (en) * | 2017-07-17 | 2017-09-22 | 北京北方华创微电子装备有限公司 | Electrostatic chuck |
| CN110890305A (en) * | 2018-09-10 | 2020-03-17 | 北京华卓精科科技股份有限公司 | Electrostatic chuck |
-
2017
- 2017-07-17 CN CN201720864105.0U patent/CN207074654U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107195578A (en) * | 2017-07-17 | 2017-09-22 | 北京北方华创微电子装备有限公司 | Electrostatic chuck |
| CN110890305A (en) * | 2018-09-10 | 2020-03-17 | 北京华卓精科科技股份有限公司 | Electrostatic chuck |
| CN110890305B (en) * | 2018-09-10 | 2022-06-14 | 北京华卓精科科技股份有限公司 | Electrostatic chuck |
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| GR01 | Patent grant | ||
| GR01 | Patent grant |