TWM592604U - Sensing module and image capturing apparatus - Google Patents

Sensing module and image capturing apparatus Download PDF

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TWM592604U
TWM592604U TW108216627U TW108216627U TWM592604U TW M592604 U TWM592604 U TW M592604U TW 108216627 U TW108216627 U TW 108216627U TW 108216627 U TW108216627 U TW 108216627U TW M592604 U TWM592604 U TW M592604U
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photosensitive
light
layer
openings
shielding layer
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TW108216627U
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Chinese (zh)
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巫仁杰
王炯翰
李文政
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金佶科技股份有限公司
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Abstract

A sensing module including a sensing array, a first shielding layer, a second shielding layer, and a reflective layer is provided. The sensing array includes a plurality of light passing regions and a light receiving surface facing away from an object, and the sensing array is located between the first shielding layer having a plurality of first openings and the second shielding layer having a plurality of second openings. The second shielding layer is located between the sensing array and the reflective layer. The light beams reflected by the object sequentially pass through the first openings, the light passing regions, the second openings, and are then transmitted to the reflective layer. The light beams are reflected by the reflective layer and then pass through the second openings again to be transmitted to the light receiving surface of the sensing array. An image capturing apparatus is also provided.

Description

感光模組及取像裝置 Photosensitive module and imaging device

本新型是有關於一種光電模組及應用所述光電模組的光電裝置,且特別是有關於一種感光模組以及應用所述感光模組的取像裝置。 The present invention relates to a photoelectric module and a photoelectric device using the photoelectric module, and particularly relates to a photosensitive module and an imaging device using the photosensitive module.

生物辨識的種類包括臉部、聲音、虹膜、視網膜、靜脈、掌紋和指紋辨識等。依照感測方式的不同,生物特徵辨識裝置可分為光學式、電容式、超音波式及熱感應式。一般而言,光學式生物特徵辨識裝置包括光源、導光元件以及感測器。光源所發出的光束照射按壓於導光元件上的待測物,感測器接收被待測物反射的光束,以進行生物特徵的辨識。 Types of biometrics include facial, voice, iris, retina, vein, palmprint, and fingerprint identification. According to different sensing methods, biometrics recognition devices can be divided into optical, capacitive, ultrasonic, and thermal sensing types. Generally speaking, the optical biometric identification device includes a light source, a light guide element, and a sensor. The light beam emitted by the light source irradiates the object to be measured pressed on the light guide element, and the sensor receives the light beam reflected by the object to perform biological feature recognition.

以指紋辨識為例,當手指按壓於導光元件上時,指紋的凸部會接觸導光元件,而指紋的凹部不會接觸導光元件。因此,指紋的凸部會破壞光束在導光元件內的全反射,而使感測器取得對應凸部的暗紋。同時,指紋的凹部不會破壞光束在導光元件內的全反射,而使感測器取得對應凹部的亮紋。藉此,對應指紋的 凸部與凹部的光束會在感測器的光接收面上形成亮暗相間的條紋圖案。利用演算法計算對應指紋影像的資訊,便可進行使用者身份的辨識。 Taking fingerprint recognition as an example, when a finger is pressed on the light guide element, the convex portion of the fingerprint will contact the light guide element, and the concave portion of the fingerprint will not contact the light guide element. Therefore, the convex part of the fingerprint will destroy the total reflection of the light beam in the light guide element, so that the sensor acquires the dark lines corresponding to the convex part. At the same time, the concave part of the fingerprint will not destroy the total reflection of the light beam in the light guide element, but the sensor will obtain the bright lines corresponding to the concave part. By this, the corresponding fingerprint The light beams of the convex portion and the concave portion will form a light and dark stripe pattern on the light receiving surface of the sensor. Using the algorithm to calculate the information corresponding to the fingerprint image, the user's identity can be identified.

在感測器取像的過程中,被指紋反射的光束容易散亂地傳遞至感測器,而產生串擾(crosstalk)。此串擾會降低指紋圖案的暗紋區域與亮紋區域之間的對比度,造成取像品質不佳,影響辨識的精確度。雖然已有技術針對取像品質進行改善,然而現階段技術的改良仍難以有效改善該串擾問題。 During the imaging process of the sensor, the light beam reflected by the fingerprint is easily scattered to the sensor, causing crosstalk. This crosstalk will reduce the contrast between the dark and bright areas of the fingerprint pattern, resulting in poor acquisition quality and affecting the accuracy of identification. Although the existing technology improves the quality of the image acquisition, the improvement of the technology at this stage is still difficult to effectively improve the crosstalk problem.

本新型提供一種感光模組以及取像裝置,其可具有良好的辨識能力。 The present invention provides a photosensitive module and an image capturing device, which can have good identification capabilities.

本新型的一種感光模組包括感光陣列、第一遮蔽層、第二遮蔽層以及反射層。感光陣列具有多個光通過區以及背對待測物的光接收面。第一遮蔽層位於感光陣列與待測物之間且具有多個第一開口。第二遮蔽層與第一遮蔽層分別位於感光陣列的相對側且具有多個第二開口。反射層與感光陣列分別位於第二遮蔽層的相對側。多個第一開口讓被待測物反射的多個光束通過。多個光通過區讓通過多個第一開口的多個光束通過。多個第二開口讓通過多個光通過區的多個光束通過並傳遞至反射層。反射層將多個光束反射,使多個光束再一次通過多個第二開口並傳遞至感光陣列的光接收面。 A photosensitive module of the present invention includes a photosensitive array, a first shielding layer, a second shielding layer, and a reflective layer. The photosensitive array has multiple light-passing areas and a light-receiving surface facing away from the object to be measured. The first shielding layer is located between the photosensitive array and the object to be measured and has a plurality of first openings. The second shielding layer and the first shielding layer are respectively located on opposite sides of the photosensitive array and have a plurality of second openings. The reflective layer and the photosensitive array are respectively located on opposite sides of the second shielding layer. The plurality of first openings allows a plurality of light beams reflected by the object to be tested to pass through. The multiple light-passing regions allow multiple light beams to pass through the multiple first openings. The plurality of second openings allow a plurality of light beams passing through the plurality of light-passing regions to pass and pass to the reflective layer. The reflective layer reflects the multiple light beams, so that the multiple light beams again pass through the multiple second openings and pass to the light receiving surface of the photosensitive array.

在本新型的一實施例中,感光陣列包括多個感光元件。感光元件包括光接收面以及金屬層。感光元件的光接收面位於金屬層與反射層之間。 In an embodiment of the invention, the photosensitive array includes multiple photosensitive elements. The photosensitive element includes a light receiving surface and a metal layer. The light receiving surface of the photosensitive element is located between the metal layer and the reflective layer.

在本新型的一實施例中,感光模組更包括第三遮蔽層。第三遮蔽層位於第一遮蔽層與金屬層之間,且第三遮蔽層具有與多個光通過區重疊的多個第三開口。 In an embodiment of the present invention, the photosensitive module further includes a third shielding layer. The third shielding layer is located between the first shielding layer and the metal layer, and the third shielding layer has a plurality of third openings overlapping with the plurality of light passing regions.

在本新型的一實施例中,多個第一開口、多個第二開口及多個光通過區之間彼此錯位設置。 In an embodiment of the present invention, the plurality of first openings, the plurality of second openings, and the plurality of light-passing areas are arranged offset from each other.

在本新型的一實施例中,感光模組更包括基板以及透光黏著層。基板設置在第一遮蔽層與感光陣列之間。透光黏著層設置在感光陣列與第二遮蔽層之間。 In an embodiment of the present invention, the photosensitive module further includes a substrate and a light-transmitting adhesive layer. The substrate is disposed between the first shielding layer and the photosensitive array. The light-transmitting adhesive layer is disposed between the photosensitive array and the second shielding layer.

在本新型的一實施例中,感光模組更包括多個微透鏡。多個微透鏡分別設置在多個第一開口中。 In an embodiment of the present invention, the photosensitive module further includes a plurality of micro lenses. The plurality of microlenses are respectively disposed in the plurality of first openings.

本新型的一種取像裝置包括顯示面板以及感光模組。感光模組設置於顯示面板的一側且包括感光陣列、第一遮蔽層、第二遮蔽層以及反射層。感光陣列具有多個光通過區以及背對待測物的光接收面。第一遮蔽層位於感光陣列與待測物之間且具有多個第一開口。第二遮蔽層與第一遮蔽層分別位於感光陣列的相對側且具有多個第二開口。反射層與感光陣列分別位於第二遮蔽層的相對側。多個第一開口讓被待測物反射的多個光束通過。多個光通過區讓通過多個第一開口的多個光束通過。多個第二開口讓通過多個光通過區的多個光束通過並傳遞至反射層。反射層將多 個光束反射,使多個光束再一次通過多個第二開口並傳遞至感光陣列的光接收面。 An imaging device of the present invention includes a display panel and a photosensitive module. The photosensitive module is disposed on one side of the display panel and includes a photosensitive array, a first shielding layer, a second shielding layer, and a reflective layer. The photosensitive array has multiple light-passing areas and a light-receiving surface facing away from the object to be measured. The first shielding layer is located between the photosensitive array and the object to be measured and has a plurality of first openings. The second shielding layer and the first shielding layer are respectively located on opposite sides of the photosensitive array and have a plurality of second openings. The reflective layer and the photosensitive array are respectively located on opposite sides of the second shielding layer. The plurality of first openings allows a plurality of light beams reflected by the object to be tested to pass through. The multiple light-passing regions allow multiple light beams to pass through the multiple first openings. The plurality of second openings allow a plurality of light beams passing through the plurality of light-passing regions to pass and pass to the reflective layer. There will be more reflective layers The light beams are reflected to make the light beams pass through the second openings again and pass to the light receiving surface of the photosensitive array.

在本新型的一實施例中,取像裝置更包括黏著層。黏著層位於顯示面板與第一遮蔽層之間。 In an embodiment of the present invention, the imaging device further includes an adhesive layer. The adhesive layer is located between the display panel and the first shielding layer.

在本新型的一實施例中,多個微透鏡與顯示面板之間具有空氣間隙。 In an embodiment of the present invention, there is an air gap between the plurality of micro lenses and the display panel.

在本新型的一實施例中,在顯示面板與基板之間設置有帶通濾光層或者是在基板與反射層之間設置有帶通濾光層。 In an embodiment of the present invention, a band-pass filter layer is provided between the display panel and the substrate or a band-pass filter layer is provided between the substrate and the reflective layer.

基於上述,在本新型的實施例中,經由多個遮蔽層遮蔽(吸收)雜散光束,且經由多個遮蔽層的多個開口以及反射層將被待測物反射的光束傳遞至感光陣列背對待測物的光接收面。因此,感光模組可有效改善串擾問題,且感光模組及應用此感光模組的取像裝置可具有良好的辨識能力。 Based on the above, in the embodiment of the present invention, the stray light beam is shielded (absorbed) through the plurality of shielding layers, and the light beam reflected by the object to be measured is transmitted to the back of the photosensitive array through the plurality of openings of the plurality of shielding layers and the reflective layer The light receiving surface of the object to be measured. Therefore, the photosensitive module can effectively improve the crosstalk problem, and the photosensitive module and the imaging device using the photosensitive module can have a good identification ability.

為讓本新型的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 In order to make the above-mentioned features and advantages of the present invention more obvious and understandable, the embodiments are specifically described below and described in detail in conjunction with the accompanying drawings.

1、2、3‧‧‧取像裝置 1, 2, 3‧‧‧ acquisition device

10‧‧‧顯示面板 10‧‧‧Display panel

12、22、32‧‧‧感光模組 12, 22, 32 ‧‧‧ photosensitive module

13、33、125‧‧‧黏著層 13, 33, 125‧‧‧ Adhesive layer

120‧‧‧感光陣列 120‧‧‧Photosensitive array

121‧‧‧第一遮蔽層 121‧‧‧The first masking layer

122‧‧‧第二遮蔽層 122‧‧‧Second masking layer

123‧‧‧反射層 123‧‧‧Reflective layer

124‧‧‧基板 124‧‧‧ substrate

126‧‧‧第三遮蔽層 126‧‧‧The third masking layer

127‧‧‧微透鏡 127‧‧‧Microlens

1200‧‧‧感光元件 1200‧‧‧Photosensitive element

1202‧‧‧金屬層 1202‧‧‧Metal layer

D1、D2‧‧‧偏移量 D1, D2‧‧‧Offset

G‧‧‧空氣間隙 G‧‧‧Air gap

L、L1‧‧‧光束 L, L1‧‧‧beam

O‧‧‧待測物 O‧‧‧Object to be tested

O1‧‧‧第一開口 O1‧‧‧First opening

O2‧‧‧第二開口 O2‧‧‧Second opening

O3‧‧‧第三開口 O3‧‧‧The third opening

R120‧‧‧光通過區 R120‧‧‧Light passing area

S1‧‧‧顯示面 S1‧‧‧Display

S2‧‧‧底面 S2‧‧‧Bottom

S120、S1200‧‧‧光接收面 S120, S1200 ‧‧‧ light receiving surface

S123、S127‧‧‧表面 S123, S127‧‧‧surface

θ‧‧‧角度 θ‧‧‧angle

圖1至圖3分別是本新型第一實施例至第三實施例的取像裝置的局部剖面示意圖。 1 to 3 are partial cross-sectional schematic diagrams of the image capturing devices of the first to third embodiments of the present invention, respectively.

實施方式中所提到的方向用語,例如:「上」、「下」、「前」、 「後」、「左」、「右」等,僅是參考附圖的方向。因此,使用的方向用語是用來說明,而並非用來限制本新型。在附圖中,各圖式繪示的是特定示範實施例中所使用的方法、結構及/或材料的通常性特徵。然而,這些圖式不應被解釋為界定或限制由這些示範實施例所涵蓋的範圍或性質。舉例來說,為了清楚起見,各膜層、區域及/或結構的相對尺寸、厚度及位置可能縮小或放大。 Direction words mentioned in the embodiment, for example: "up", "down", "front", "Rear", "Left", "Right", etc. are only the directions with reference to the drawings. Therefore, the directional terms used are for illustration, not for limiting the new model. In the drawings, each drawing depicts general features of methods, structures, and/or materials used in particular exemplary embodiments. However, these drawings should not be construed as defining or limiting the scope or nature covered by these exemplary embodiments. For example, for clarity, the relative sizes, thicknesses, and positions of the various film layers, regions, and/or structures may be reduced or enlarged.

在實施方式中,相同或相似的元件將採用相同或相似的標號,且將省略其贅述。此外,不同示範實施例中的特徵在沒有衝突的情況下可相互組合,且依本說明書或申請專利範圍所作之簡單的等效變化與修飾,皆仍屬本專利涵蓋之範圍內。另外,本說明書或申請專利範圍中提及的「第一」、「第二」等用語僅用以命名分立(discrete)的元件或區別不同實施例或範圍,而並非用來限制元件數量上的上限或下限,也並非用以限定元件的製造順序或設置順序。 In the embodiments, the same or similar elements will use the same or similar reference numerals, and redundant descriptions thereof will be omitted. In addition, the features in the different exemplary embodiments can be combined with each other without conflict, and simple equivalent changes and modifications made in accordance with this specification or the scope of the patent application are still covered by this patent. In addition, the terms "first" and "second" mentioned in this specification or the scope of patent application are only used to name discrete components or distinguish different embodiments or ranges, not to limit the number of components. The upper limit or the lower limit is not intended to limit the manufacturing order or setting order of the components.

圖1至圖3分別是本新型第一實施例至第三實施例的取像裝置1至3的局部剖面示意圖。在本新型的實施例中,取像裝置1至3適於擷取待測物O的生物特徵。舉例而言,待測物O可以是使用者的手指、手掌、手腕或眼球,且對應的生物特徵可為指紋、掌紋、靜脈、瞳孔或虹膜等,但不以此為限。 1 to 3 are schematic partial cross-sectional views of the imaging devices 1 to 3 of the first to third embodiments of the present invention, respectively. In the embodiment of the present invention, the imaging devices 1 to 3 are adapted to capture the biological characteristics of the object O to be measured. For example, the object to be measured O may be a user's finger, palm, wrist, or eyeball, and the corresponding biological feature may be a fingerprint, palm print, vein, pupil, iris, etc., but not limited thereto.

請參照圖1,第一實施例的取像裝置1包括顯示面板10及感光模組12。顯示面板10具有顯示面S1以及與顯示面S1相對的底面S2。顯示面板10經由顯示面S1輸出影像光束(未繪示), 以讓使用者觀賞影像畫面。在本實施例中,顯示面板10的顯示面S2亦為生物特徵辨識面,也就是說,待測物O碰觸顯示面S2,以進行生物特徵辨識。 Please refer to FIG. 1, the imaging device 1 of the first embodiment includes a display panel 10 and a photosensitive module 12. The display panel 10 has a display surface S1 and a bottom surface S2 opposite to the display surface S1. The display panel 10 outputs an image beam (not shown) via the display surface S1, To allow users to view the image screen. In this embodiment, the display surface S2 of the display panel 10 is also a biometric recognition surface, that is, the object to be tested O touches the display surface S2 for biometric recognition.

顯示面板110可以是薄膜電晶體液晶顯示面板(Thin Film Transistor Liquid Crystal Display panel,TFT-LCD panel)、微型發光二極體顯示面板(Micro Light Emitting Diode display panel,Micro LED display panel)或有機發光二極體顯示面板(Organic Light Emitting Diode display panel,OLED display panel),但不以此為限。此外,顯示面板10也可以是帶有觸控電極的顯示面板。 The display panel 110 may be a thin film transistor liquid crystal display panel (TFT-LCD panel), a micro light emitting diode display panel (Micro Light Emitting Diode display panel, Micro LED display panel) or an organic light emitting diode Polar body display panel (Organic Light Emitting Diode display panel, OLED display panel), but not limited to this. In addition, the display panel 10 may be a display panel with touch electrodes.

顯示面板10所提供的影像光束(如可見光)的一部分可用於生物特徵辨識,但不以此為限。在另一實施例中,取像裝置1可進一步包括用於提供生物特徵辨識的光束的光源(未繪示)。所述光源所提供的光束的波長可不同於影像光束的波長(可見光的波長)。舉例來說,所述光源可以是非可見光光源,如紅外光光源,但不以此為限。此外,所述光源可以設置在顯示面板10之外或是整合於顯示面板10中。 Part of the image beam (such as visible light) provided by the display panel 10 can be used for biometric identification, but not limited to this. In another embodiment, the imaging device 1 may further include a light source (not shown) for providing a light beam for biometric identification. The wavelength of the light beam provided by the light source may be different from the wavelength of the image light beam (the wavelength of visible light). For example, the light source may be a non-visible light source, such as an infrared light source, but it is not limited thereto. In addition, the light source may be disposed outside the display panel 10 or integrated into the display panel 10.

感光模組12設置於顯示面板10的一側。舉例來說,感光模組12可透過黏著層或固定機構(未繪示)而固定在顯示面板10的底面S1上。 The photosensitive module 12 is disposed on one side of the display panel 10. For example, the photosensitive module 12 may be fixed on the bottom surface S1 of the display panel 10 through an adhesive layer or a fixing mechanism (not shown).

感光模組12包括感光陣列120、第一遮蔽層121、第二遮蔽層122以及反射層123。感光陣列120適於接收被待測物O反射的光束L(即帶有生物特徵的光),以進行生物特徵辨識。感 光陣列120具有多個光通過區R120以及背對待測物O的光接收面S120。詳細而言,感光陣列120包括排列成陣列的多個感光元件1200。各感光元件1200包括光接收面S1200。感光陣列120的光接收面S120為這些感光元件1200的多個光接收面S1200的集合。此外,各感光元件1200還包括金屬層1202。金屬層1202為感光元件1200的金屬電極。感光元件1200的光接收面S1200位於金屬層1202與反射層123之間,也就是說,感光元件1200的光接收面S1200面向反射層123且背對待測物O,使得感光陣列120的光接收面S120背對待測物O。 The photosensitive module 12 includes a photosensitive array 120, a first shielding layer 121, a second shielding layer 122, and a reflective layer 123. The photosensitive array 120 is adapted to receive the light beam L (ie, light with biological characteristics) reflected by the object to be measured O, so as to perform biological characteristic recognition. sense The light array 120 has a plurality of light passing regions R120 and a light receiving surface S120 facing away from the object O to be measured. In detail, the photosensitive array 120 includes a plurality of photosensitive elements 1200 arranged in an array. Each photosensitive element 1200 includes a light receiving surface S1200. The light-receiving surface S120 of the photosensitive array 120 is a collection of a plurality of light-receiving surfaces S1200 of these photosensitive elements 1200. In addition, each photosensitive element 1200 also includes a metal layer 1202. The metal layer 1202 is a metal electrode of the photosensitive element 1200. The light receiving surface S1200 of the photosensitive element 1200 is located between the metal layer 1202 and the reflective layer 123, that is, the light receiving surface S1200 of the photosensitive element 1200 faces the reflective layer 123 and faces away from the object to be measured O, so that the light receiving surface of the photosensitive array 120 S120 turns the object O to be tested.

由於金屬層1202本身不透光,因此各感光元件1200的金屬層1202可避免從待測物O直接射向感光元件1200的光束(如光束L1)被光接收面S1200接收。也就是說,各感光元件1200的金屬層1202的所在區域為感光陣列120的遮光區,而相鄰兩感光元件1200的金屬層1202之間的區域為光通過區R120。換句話說,光束可從相鄰兩感光元件1200之間通過,且感光陣列120的光通過區R120的大小由相鄰兩感光元件1200的金屬層1202之間的距離來界定。 Since the metal layer 1202 itself is opaque, the metal layer 1202 of each photosensitive element 1200 can prevent the light beam (such as the light beam L1) directly emitted from the object O to be directed to the photosensitive element 1200 from being received by the light receiving surface S1200. That is to say, the area where the metal layer 1202 of each photosensitive element 1200 is located is the light-shielding area of the photosensitive array 120, and the area between the metal layers 1202 of two adjacent photosensitive elements 1200 is the light passing area R120. In other words, the light beam can pass between two adjacent photosensitive elements 1200, and the size of the light passing area R120 of the photosensitive array 120 is defined by the distance between the metal layers 1202 of the two adjacent photosensitive elements 1200.

第一遮蔽層121位於感光陣列120與待測物O之間且具有讓光束通過的多個第一開口O1。第一遮蔽層121用以遮蔽或吸收雜散光束。舉例來說,第一遮蔽層121具有高吸收率以及低反射率,以降低傳遞至第一遮蔽層121的光束被第一遮蔽層121反射的比例以及光束被第一遮蔽層121反射的次數,進而有效降低 雜訊或串擾的光束被光接收面S120接收到的比例。第一遮蔽層121的材質可以是低反射率的油墨、光阻或碳化合物等,但不以此為限。 The first shielding layer 121 is located between the photosensitive array 120 and the object O and has a plurality of first openings O1 through which light beams pass. The first shielding layer 121 is used to shield or absorb stray light beams. For example, the first shielding layer 121 has a high absorption rate and a low reflectivity, so as to reduce the ratio of the light beam transmitted to the first shielding layer 121 to be reflected by the first shielding layer 121 and the number of times the light beam is reflected by the first shielding layer 121, To effectively reduce The ratio of the noise or crosstalk beam received by the light receiving surface S120. The material of the first shielding layer 121 may be ink with low reflectivity, photoresist, carbon compound, etc., but it is not limited thereto.

第二遮蔽層122與第一遮蔽層121分別位於感光陣列120的相對側且具有多個第二開口O2。第二遮蔽層122用以遮蔽或吸收雜散光束。舉例來說,第二遮蔽層122具有高吸收率以及低反射率,以降低傳遞至第二遮蔽層122的光束被第二遮蔽層122反射的比例以及光束被第二遮蔽層122反射的次數,進而有效降低雜訊或串擾的光束被光接收面S120接收到的比例。第二遮蔽層122的材質可以是低反射率的油墨、光阻或碳化合物等,但不以此為限。 The second shielding layer 122 and the first shielding layer 121 are respectively located on opposite sides of the photosensitive array 120 and have a plurality of second openings 02. The second shielding layer 122 is used to shield or absorb the stray light beam. For example, the second shielding layer 122 has a high absorption rate and a low reflectivity, so as to reduce the ratio of the light beam transmitted to the second shielding layer 122 being reflected by the second shielding layer 122 and the number of times the light beam is reflected by the second shielding layer 122, Furthermore, the ratio of noise or crosstalk beams received by the light receiving surface S120 is effectively reduced. The material of the second shielding layer 122 may be ink with low reflectivity, photoresist, carbon compound, etc., but it is not limited thereto.

反射層123與感光陣列120分別位於第二遮蔽層122的相對側。舉例來說,第二遮蔽層122可設置在反射層123面向感光陣列120的表面S123上。反射層123用以將帶有生物特徵的光束反射至光接收面S120。舉例來說,反射層123可以是選自鋁、銀、銅、鎳、鋅以及鉻的單一金屬層或金屬疊層,但不以此為限。在一實施例中,反射層123可以由載板(未繪示)以及設置於載板上的金屬層(未繪示)所組成。所述載板可以是可撓或不可撓的印刷電路板,且所述金屬層可以是經圖案化或未經圖案化的金屬層。 The reflective layer 123 and the photosensitive array 120 are respectively located on opposite sides of the second shielding layer 122. For example, the second shielding layer 122 may be disposed on the surface S123 of the reflective layer 123 facing the photosensitive array 120. The reflective layer 123 is used to reflect the biological beam to the light receiving surface S120. For example, the reflective layer 123 may be a single metal layer or a metal stack selected from aluminum, silver, copper, nickel, zinc, and chromium, but not limited thereto. In an embodiment, the reflective layer 123 may be composed of a carrier board (not shown) and a metal layer (not shown) disposed on the carrier board. The carrier board may be a flexible or non-flexible printed circuit board, and the metal layer may be a patterned or unpatterned metal layer.

第一遮蔽層121的多個第一開口O1讓被待測物O反射的光束L通過。感光陣列120的多個光通過區R120讓通過多個第 一開口O1的光束L通過。第二遮蔽層122的多個第二開口O2讓通過多個光通過區R120的光束L通過並將光束L傳遞至反射層123。反射層123將光束L反射,使光束L再一次通過多個第二開口O2並傳遞至感光陣列120的光接收面S120。在本實施例中,多個第一開口O1、多個第二開口O2及多個光通過區R120之間彼此錯位設置,以使被待測物O反射的光束L以特定入射角度(如角度θ)傳遞至反射層123,且在反射層123以與所述特定入射角度相同的反射角度(如角度θ)被反射層123反射並傳遞至感光陣列120的光接收面S120。所述特定入射角度(如角度θ)大於0度且小於90度。換句話說,被待測物O反射的光束L不是正向入射感光陣列120的光接收面S120,而是斜向地傳遞至反射層123,再經由反射層123的反射而傳遞至感光陣列120的光接收面S120。在此設計下,能被感光陣列120的光接收面S120接收的光束L主要是以特定入射角度依序通過多個第一開口O1、多個光通過區R120及多個第二開口O2而傳遞至反射層123,然後被反射層123以相同於所述特定入射角度的反射角度反射,而再次通過多個第二開口O2並傳遞至感光陣列120的光接收面S120。 The plurality of first openings O1 of the first shielding layer 121 allows the light beam L reflected by the object O to pass. The plurality of light passing regions R120 of the photosensitive array 120 pass the light beam L passing through the plurality of first openings O1. The plurality of second openings 02 of the second shielding layer 122 pass the light beam L passing through the plurality of light passing regions R120 and pass the light beam L to the reflective layer 123. The reflective layer 123 reflects the light beam L, so that the light beam L once again passes through the plurality of second openings 02 and is transmitted to the light receiving surface S120 of the photosensitive array 120. In this embodiment, the plurality of first openings O1, the plurality of second openings O2, and the plurality of light passing regions R120 are offset from each other, so that the light beam L reflected by the object to be measured O is at a specific angle of incidence (eg, angle θ ) is transferred to the reflective layer 123, and the reflective layer 123 is reflected by the reflective layer 123 at the same reflection angle (such as angle θ ) as the specific incident angle and transferred to the light receiving surface S120 of the photosensitive array 120. The specific incident angle (such as angle θ ) is greater than 0 degrees and less than 90 degrees. In other words, the light beam L reflected by the object O is not normally incident on the light-receiving surface S120 of the photosensitive array 120, but obliquely transmitted to the reflective layer 123, and then transmitted to the photosensitive array 120 through the reflection of the reflective layer 123的光RX面 S120. Under this design, the light beam L that can be received by the light-receiving surface S120 of the photosensitive array 120 is mainly transmitted in sequence through a plurality of first openings O1, a plurality of light-passing regions R120, and a plurality of second openings O2 at a specific incident angle To the reflective layer 123, it is then reflected by the reflective layer 123 at the same reflection angle as the specific incident angle, and then passes through the plurality of second openings 02 and is transferred to the light receiving surface S120 of the photosensitive array 120.

上述的錯位設置指的是多個第一開口O1、多個第二開口O2以及多個光通過區R120不是對齊的。舉例來說,第一開口O1、第二開口O2以及光通過區R120可具有相同的寬度,其中光通過區R120相對於第一開口O1的偏移量D1小於第一開口O1的寬度,且第二開口O2相對於光通過區R120的偏移量D2小於光通 過區R120的寬度。在一實施例中,第一開口O1、第二開口O2以及光通過區R120可具有不同的寬度。此外,偏移量D1及偏移量D2可不相同。 The above-mentioned misalignment setting means that the plurality of first openings O1, the plurality of second openings O2, and the plurality of light passing regions R120 are not aligned. For example, the first opening O1, the second opening O2, and the light passing region R120 may have the same width, wherein the offset D1 of the light passing region R120 relative to the first opening O1 is smaller than the width of the first opening O1, and the first The offset D2 of the two openings O2 relative to the light passing region R120 is smaller than the light flux The width of R120. In an embodiment, the first opening O1, the second opening O2, and the light passing region R120 may have different widths. In addition, the offset D1 and the offset D2 may be different.

依據不同的需求,感光模組12可進一步包括其他元件及/或膜層。舉例來說,感光模組12可進一步包括基板124以及黏著層125,其中基板124設置在第一遮蔽層121與感光陣列120之間,而黏著層125設置在感光陣列120與第二遮蔽層122之間。 According to different requirements, the photosensitive module 12 may further include other elements and/or films. For example, the photosensitive module 12 may further include a substrate 124 and an adhesive layer 125, wherein the substrate 124 is disposed between the first shielding layer 121 and the photosensitive array 120, and the adhesive layer 125 is disposed between the photosensitive array 120 and the second shielding layer 122 between.

詳細而言,基板124的相對兩面可分別用於承載第一遮蔽層121與感光陣列120。基板124可由透光材質製成,以讓光束通過。舉例來說,基板124可以是透光的玻璃基板、塑膠基板或透光的陶瓷基板等。玻璃基板可以是經化學強化或物理強化的玻璃基板,也可以是未經強化的玻璃基板。塑膠基板可以是聚碳酸酯(polycarbonate,PC)、聚對苯二甲酸乙二酯(polyethylene terephthalate,PET)、聚甲基丙烯酸甲酯(polymethylmethacrylate,PMMA)或聚醯亞胺(polyimide,PI)等,但不以此為限。 In detail, the two opposite sides of the substrate 124 can be used to carry the first shielding layer 121 and the photosensitive array 120, respectively. The substrate 124 may be made of a light-transmitting material to allow the light beam to pass through. For example, the substrate 124 may be a transparent glass substrate, a plastic substrate, or a transparent ceramic substrate. The glass substrate may be a chemically or physically strengthened glass substrate or an unreinforced glass substrate. The plastic substrate can be polycarbonate (PC), polyethylene terephthalate (PET), polymethylmethacrylate (PMMA) or polyimide (PI), etc. , But not limited to this.

黏著層125用以將設置有第二遮蔽層122的反射層123黏貼至設置有感光陣列120的基板124。黏著層125可由透光材質固化形成,以讓光束通過。舉例來說,黏著層125的材質可以是光學透明膠(Optically Clear Adhesive,OCA)、液態光學透明膠(Liquid Optical Clear Adhesive,LOCA)或芯片附著薄膜(Die Attach Film,DAF),但不以此為限。 The adhesive layer 125 is used to adhere the reflective layer 123 provided with the second shielding layer 122 to the substrate 124 provided with the photosensitive array 120. The adhesive layer 125 can be formed by curing a light-transmitting material to allow the light beam to pass through. For example, the material of the adhesive layer 125 may be Optically Clear Adhesive (OCA), Liquid Optical Clear Adhesive (LOCA), or Die Attach Film (DAF). Limited.

在另一實施例中,感光模組12可進一步包括更多的基 板、更多的黏著層或其他元件,於此便不再贅述。 In another embodiment, the photosensitive module 12 may further include more basic Boards, more adhesive layers or other components will not be repeated here.

依據不同的需求,取像裝置1也可進一步包括其他元件及/或膜層。舉例來說,取像裝置1可進一步包括黏著層13或固定機構(未繪示),以將顯示面板10及感光模組12固定在一起。當採用黏著層13來固定顯示面板10與感光模組12時,顯示面板10與感光模組12可以是全面貼合或部分貼合(例如周邊貼合而中心不貼合)。黏著層13的材質可以是光學透明膠、液態光學透明膠或芯片附著薄膜,但不以此為限。 According to different requirements, the imaging device 1 may further include other elements and/or film layers. For example, the imaging device 1 may further include an adhesive layer 13 or a fixing mechanism (not shown) to fix the display panel 10 and the photosensitive module 12 together. When the adhesive layer 13 is used to fix the display panel 10 and the photosensitive module 12, the display panel 10 and the photosensitive module 12 may be fully bonded or partially bonded (for example, the periphery is bonded but the center is not bonded). The material of the adhesive layer 13 may be optical transparent adhesive, liquid optical transparent adhesive or chip attachment film, but it is not limited thereto.

請參照圖2,第二實施例的取像裝置2與圖1的取像裝置1的主要差異如下所述。在取像裝置2中,感光模組22進一步包括第三遮蔽層126,其中第三遮蔽層126位於第一遮蔽層121與金屬層1202之間,且第三遮蔽層126具有與多個光通過區R120重疊的多個第三開口O3。多個光通過區R120與多個第三開口O3的設置關係為一對一,且各第三開口O3與對應的光通過區R120至少部分重疊。圖2繪示出各第三開口O3與對應的光通過區R120具有相同的寬度,且兩者完全重疊,但本新型不以此為限。 Please refer to FIG. 2. The main difference between the imaging device 2 of the second embodiment and the imaging device 1 of FIG. 1 is as follows. In the imaging device 2, the photosensitive module 22 further includes a third shielding layer 126, wherein the third shielding layer 126 is located between the first shielding layer 121 and the metal layer 1202, and the third shielding layer 126 has a plurality of light passing through A plurality of third openings O3 overlapping the region R120. The arrangement relationship between the plurality of light passing regions R120 and the plurality of third openings O3 is one-to-one, and each third opening O3 at least partially overlaps with the corresponding light passing region R120. FIG. 2 shows that each third opening O3 and the corresponding light passing region R120 have the same width, and the two completely overlap, but the present invention is not limited to this.

第三遮蔽層126用以遮蔽或吸收雜散光束。舉例來說,第三遮蔽層126具有高吸收率以及低反射率,以降低傳遞至第三遮蔽層126的光束(如光束L1)被第三遮蔽層126反射的比例以及光束被第三遮蔽層126反射的次數,進而有效降低雜訊或串擾的光束被光接收面S120接收到的比例。第三遮蔽層126的材質可以是低反射率的油墨、光阻或碳化合物等,但不以此為限。 The third shielding layer 126 is used to shield or absorb the stray light beam. For example, the third shielding layer 126 has a high absorption rate and a low reflectivity, so as to reduce the ratio of the light beam (such as the light beam L1) transmitted to the third shielding layer 126 being reflected by the third shielding layer 126 and the light beam being reflected by the third shielding layer The number of reflections of 126 effectively reduces the proportion of noise or crosstalk beams received by the light receiving surface S120. The material of the third shielding layer 126 may be low reflectance ink, photoresist, carbon compound, etc., but it is not limited thereto.

請參照圖3,第三實施例的取像裝置3與圖1的取像裝置1的主要差異如下所述。在取像裝置3中,感光模組32還包括多個微透鏡127。這些微透鏡127分別設置在多個第一開口O1中。多個微透鏡127與多個第一開口O1的設置關係例如為一對一,但不以此為限。每一個微透鏡127適於將朝反射層123傳遞的光束L準直化。舉例來說,每一個微透鏡127面向顯示面板10的表面S127為凸面,且所述凸面可以是球面或非球面,但不以此為限。此外,位於顯示面板10與第一遮蔽層121之間的黏著層33例如是將顯示面板10與第一遮蔽層121部分貼合(例如周圍貼合),使得多個微透鏡127與顯示面板10之間具有空氣間隙G。 Please refer to FIG. 3. The main difference between the imaging device 3 of the third embodiment and the imaging device 1 of FIG. 1 is as follows. In the imaging device 3, the photosensitive module 32 further includes a plurality of micro lenses 127. These microlenses 127 are respectively provided in the plurality of first openings O1. The arrangement relationship between the plurality of microlenses 127 and the plurality of first openings O1 is, for example, one-to-one, but not limited thereto. Each microlens 127 is adapted to collimate the light beam L transmitted toward the reflective layer 123. For example, the surface S127 of each microlens 127 facing the display panel 10 is a convex surface, and the convex surface may be spherical or aspherical, but not limited thereto. In addition, the adhesive layer 33 between the display panel 10 and the first shielding layer 121 is, for example, partially bonding (eg, surrounding) the display panel 10 and the first shielding layer 121 so that the plurality of micro lenses 127 and the display panel 10 There is an air gap G between them.

在本新型上述的任一實施例中,感光模組可進一步包括帶通濾光層(未繪示)。帶通濾光層可設置在顯示面板10與基板124之間或是設置在基板124與反射層123之間,以過濾用於生物特徵辨識以外的其他光束,避免環境光束或來自其他光源的光束傳遞至感光元件1200,進而提升取像裝置的辨識能力。舉例而言,帶通濾光層可為紅外帶通濾光層,其讓波長為800nm至900nm的光束通過,且過濾波長為800nm至900nm以外的光束。對應地,感光模組可進一步包括波長落在800nm至900nm的範圍內的紅外光源。在其他實施例中,帶通濾光層可選用讓波長為840nm至860nm的光束或波長為890nm至990nm的光束通過的帶通濾光層,且感光模組可進一步包括波長落在840nm至860nm或890nm至990nm的範圍內的紅外光源,但本新型並不限於此。 In any of the above embodiments of the present invention, the photosensitive module may further include a band-pass filter layer (not shown). The band-pass filter layer may be disposed between the display panel 10 and the substrate 124 or between the substrate 124 and the reflective layer 123 to filter other light beams than biometrics to avoid ambient light beams or light beams from other light sources It is transferred to the photosensitive element 1200 to further improve the recognition capability of the image capturing device. For example, the bandpass filter layer may be an infrared bandpass filter layer, which passes a light beam with a wavelength of 800 nm to 900 nm, and filters a light beam with a wavelength other than 800 nm to 900 nm. Correspondingly, the photosensitive module may further include an infrared light source whose wavelength falls within the range of 800 nm to 900 nm. In other embodiments, the band-pass filter layer may be a band-pass filter layer that passes a light beam with a wavelength of 840 nm to 860 nm or a light beam with a wavelength of 890 nm to 990 nm, and the photosensitive module may further include a wavelength falling between 840 nm and 860 nm Or an infrared light source in the range of 890nm to 990nm, but the present invention is not limited to this.

綜上所述,在本新型的實施例中,經由多個遮蔽層遮蔽(吸收)雜散光束,且經由多個遮蔽層的多個開口以及反射層將被待測物反射的光束傳遞至感光陣列背對待測物的光接收面。因此,感光模組可有效改善串擾問題,且感光模組及應用此感光模組的取像裝置可具有良好的辨識能力。在一實施例中,感光陣列中的各感光元件的金屬層上可進一步設置遮蔽層,以進一步降低串擾。在另一實施例中,感光模組還可包括分別設置在多個第一開口中的多個微透鏡,以將光束準直化。 In summary, in the embodiment of the present invention, the stray light beam is shielded (absorbed) through the plurality of shielding layers, and the light beam reflected by the object to be measured is transmitted to the photosensitive through the plurality of openings of the plurality of shielding layers and the reflective layer The array faces away from the light receiving surface of the object to be measured. Therefore, the photosensitive module can effectively improve the crosstalk problem, and the photosensitive module and the imaging device using the photosensitive module can have a good identification ability. In one embodiment, a shielding layer may be further provided on the metal layer of each photosensitive element in the photosensitive array to further reduce crosstalk. In another embodiment, the photosensitive module may further include a plurality of microlenses respectively disposed in the plurality of first openings to collimate the light beam.

雖然本新型已以實施例揭露如上,然其並非用以限定本新型,任何所屬技術領域中具有通常知識者,在不脫離本新型的精神和範圍內,當可作些許的更動與潤飾,故本新型的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed as above with examples, it is not intended to limit the present invention. Anyone who has ordinary knowledge in the technical field can make some changes and retouching without departing from the spirit and scope of the present invention. The scope of protection of this new model shall be subject to the scope defined in the appended patent application.

1‧‧‧取像裝置 1‧‧‧Acquisition device

10‧‧‧顯示面板 10‧‧‧Display panel

12‧‧‧感光模組 12‧‧‧Photosensitive module

13、125‧‧‧黏著層 13, 125‧‧‧ adhesive layer

120‧‧‧感光陣列 120‧‧‧Photosensitive array

121‧‧‧第一遮蔽層 121‧‧‧The first masking layer

122‧‧‧第二遮蔽層 122‧‧‧Second masking layer

123‧‧‧反射層 123‧‧‧Reflective layer

124‧‧‧基板 124‧‧‧ substrate

1200‧‧‧感光元件 1200‧‧‧Photosensitive element

1202‧‧‧金屬層 1202‧‧‧Metal layer

D1、D2‧‧‧偏移量 D1, D2‧‧‧Offset

L、L1‧‧‧光束 L, L1‧‧‧beam

O‧‧‧待測物 O‧‧‧Object to be tested

O1‧‧‧第一開口 O1‧‧‧First opening

O2‧‧‧第二開口 O2‧‧‧Second opening

R120‧‧‧光通過區 R120‧‧‧Light passing area

S1‧‧‧顯示面 S1‧‧‧Display

S2‧‧‧底面 S2‧‧‧Bottom

S120、S1200‧‧‧光接收面 S120, S1200 ‧‧‧ light receiving surface

S123‧‧‧表面 S123‧‧‧Surface

θ‧‧‧角度 θ‧‧‧angle

Claims (19)

一種感光模組,包括: A photosensitive module, including: 一感光陣列,具有多個光通過區以及背對待測物的一光接收面; A photosensitive array with multiple light-passing areas and a light-receiving surface facing away from the object to be measured; 一第一遮蔽層,位於該感光陣列與該待測物之間且具有多個第一開口; A first shielding layer, located between the photosensitive array and the object to be measured, and having a plurality of first openings; 一第二遮蔽層,與該第一遮蔽層分別位於該感光陣列的相對側且具有多個第二開口;以及 A second shielding layer located on the opposite side of the photosensitive array from the first shielding layer and having a plurality of second openings; and 一反射層,與該感光陣列分別位於該第二遮蔽層的相對側,其中該些第一開口讓被該待測物反射的多個光束通過,該些光通過區讓通過該些第一開口的該些光束通過,該些第二開口讓通過該些光通過區的該些光束通過並傳遞至該反射層,該反射層將該些光束反射,使該些光束再一次通過該些第二開口並傳遞至該感光陣列的該光接收面。 A reflective layer and the photosensitive array are respectively located on opposite sides of the second shielding layer, wherein the first openings allow a plurality of light beams reflected by the object to be tested to pass through, and the light passing regions allow the first openings to pass through The light beams pass through, and the second openings allow the light beams passing through the light-passing regions to pass through and pass to the reflective layer, which reflects the light beams so that the light beams pass through the second holes again. Open and transfer to the light receiving surface of the photosensitive array. 如申請專利範圍第1項所述的感光模組,其中該感光陣列包括多個感光元件,各該感光元件包括一光接收面以及一金屬層,且該感光元件的該光接收面位於該金屬層與該反射層之間。 The photosensitive module according to item 1 of the patent application scope, wherein the photosensitive array includes a plurality of photosensitive elements, each of the photosensitive elements includes a light receiving surface and a metal layer, and the light receiving surface of the photosensitive element is located on the metal Between the layer and the reflective layer. 如申請專利範圍第2項所述的感光模組,更包括: The photosensitive module as described in item 2 of the patent application scope further includes: 一第三遮蔽層,其中該第三遮蔽層位於該第一遮蔽層與該金屬層之間,且該第三遮蔽層具有與該些光通過區重疊的多個第三開口。 A third shielding layer, wherein the third shielding layer is located between the first shielding layer and the metal layer, and the third shielding layer has a plurality of third openings overlapping the light-passing regions. 如申請專利範圍第1項所述的感光模組,更包括: The photosensitive module as described in item 1 of the patent application scope further includes: 一基板,設置在該第一遮蔽層與該感光陣列之間;以及 A substrate disposed between the first shielding layer and the photosensitive array; and 一黏著層,設置在該感光陣列與該第二遮蔽層之間。 An adhesive layer is disposed between the photosensitive array and the second shielding layer. 如申請專利範圍第4項所述的感光模組,更包括: The photosensitive module as described in item 4 of the patent application scope further includes: 一帶通濾光層,位於一顯示面板與該基板之間,其中該基板位於該顯示面板與該反射層之間。 A band-pass filter layer is located between a display panel and the substrate, wherein the substrate is located between the display panel and the reflective layer. 如申請專利範圍第4項所述的感光模組,更包括: The photosensitive module as described in item 4 of the patent application scope further includes: 一帶通濾光層,位於該基板與該反射層之間。 A bandpass filter layer is located between the substrate and the reflective layer. 如申請專利範圍第1至4項中任一項所述的感光模組,其中該些第一開口、該些第二開口及該些光通過區之間彼此錯位設置。 The photosensitive module according to any one of items 1 to 4 of the patent application range, wherein the first openings, the second openings, and the light-passing areas are arranged in misalignment with each other. 如申請專利範圍第7項所述的感光模組,更包括: The photosensitive module as described in item 7 of the patent application scope further includes: 多個微透鏡,分別設置在該些第一開口中。 A plurality of microlenses are respectively disposed in the first openings. 如申請專利範圍第1至4項中任一項所述的感光模組,更包括: The photosensitive module according to any one of items 1 to 4 of the patent application scope, further including: 多個微透鏡,分別設置在該些第一開口中。 A plurality of microlenses are respectively disposed in the first openings. 一種取像裝置,包括: An imaging device, including: 一顯示面板;以及 A display panel; and 一感光模組,設置於該顯示面板的一側且包括: A photosensitive module is provided on one side of the display panel and includes: 一感光陣列,具有多個光通過區以及背對待測物的一光接收面; A photosensitive array with multiple light-passing areas and a light-receiving surface facing away from the object to be measured; 一第一遮蔽層,位於該感光陣列與該待測物之間且具有多個第一開口; A first shielding layer, located between the photosensitive array and the object to be measured, and having a plurality of first openings; 一第二遮蔽層,與該第一遮蔽層分別位於該感光陣列的相對側且具有多個第二開口;以及 A second shielding layer located on the opposite side of the photosensitive array from the first shielding layer and having a plurality of second openings; and 一反射層,與該感光陣列分別位於該第二遮蔽層的相對側,其中該些第一開口讓被該待測物反射的多個光束通過,該些光通過區讓通過該些第一開口的該些光束通過,該些第二開口讓通過該些光通過區的該些光束通過並傳遞至該反射層,該反射層將該些光束反射,使該些光束再一次通過該些第二開口並傳遞至該感光陣列的該光接收面。 A reflective layer and the photosensitive array are respectively located on opposite sides of the second shielding layer, wherein the first openings allow a plurality of light beams reflected by the object to be tested to pass through, and the light passing regions allow the first openings to pass through The light beams pass through, the second openings allow the light beams passing through the light passing regions to pass through and pass to the reflective layer, the reflective layer reflects the light beams so that the light beams pass through the second Open and transfer to the light receiving surface of the photosensitive array. 如申請專利範圍第10項所述的取像裝置,更包括: The imaging device as described in item 10 of the patent application scope further includes: 一黏著層,位於該顯示面板與該第一遮蔽層之間。 An adhesive layer is located between the display panel and the first shielding layer. 如申請專利範圍第10項所述的取像裝置,其中該感光陣列包括多個感光元件,各該感光元件包括一光接收面以及一金屬層,且該感光元件的該光接收面位於該金屬層與該反射層之間。 An imaging device as described in item 10 of the patent application range, wherein the photosensitive array includes a plurality of photosensitive elements, each of the photosensitive elements includes a light receiving surface and a metal layer, and the light receiving surface of the photosensitive element is located on the metal Between the layer and the reflective layer. 如申請專利範圍第12項所述的取像裝置,其中該感光模組更包括: The imaging device as described in item 12 of the patent application scope, wherein the photosensitive module further includes: 一第三遮蔽層,其中該第三遮蔽層位於該第一遮蔽層與該金屬層之間,且該第三遮蔽層具有與該些光通過區重疊的多個第三開口。 A third shielding layer, wherein the third shielding layer is located between the first shielding layer and the metal layer, and the third shielding layer has a plurality of third openings overlapping the light-passing regions. 如申請專利範圍第10項所述的取像裝置,其中該感光模組更包括: The imaging device as described in item 10 of the patent application scope, wherein the photosensitive module further includes: 一基板,設置在該第一遮蔽層與該感光陣列之間; A substrate disposed between the first shielding layer and the photosensitive array; 一黏著層,設置在該感光陣列與該第二遮蔽層之間。 An adhesive layer is disposed between the photosensitive array and the second shielding layer. 如申請專利範圍第14項所述的取像裝置,其中該感光模組更包括: The imaging device as described in item 14 of the patent application scope, wherein the photosensitive module further includes: 一帶通濾光層,位於該顯示面板與該基板之間。 A band-pass filter layer is located between the display panel and the substrate. 如申請專利範圍第14項所述的取像裝置,其中該感光模組更包括: The imaging device as described in item 14 of the patent application scope, wherein the photosensitive module further includes: 一帶通濾光層,位於該基板與該反射層之間。 A bandpass filter layer is located between the substrate and the reflective layer. 如申請專利範圍第10至14項中任一項所述的取像裝置,其中該感光模組更包括: The image capturing device according to any one of items 10 to 14 of the patent application range, wherein the photosensitive module further includes: 多個微透鏡,分別設置在該些第一開口中。 A plurality of microlenses are respectively disposed in the first openings. 如申請專利範圍第17項所述的取像裝置,其中該些微透鏡與該顯示面板之間具有一空氣間隙。 The imaging device as described in item 17 of the patent application range, wherein an air gap is provided between the microlenses and the display panel. 如申請專利範圍第10至14項中任一項所述的取像裝置,其中該些第一開口、該些第二開口及該些光通過區之間彼此錯位設置。 The image capturing device according to any one of the items 10 to 14 of the patent application range, wherein the first openings, the second openings, and the light-passing areas are arranged in misalignment with each other.
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