TWM577372U - Overprinting plates alignment and measurement guide tool for various plates - Google Patents

Abstract

The present invention provides a different type of overprint lithographic alignment and measurement guide that can easily measure the error amount at different positions on the layout surface as a correction error amount on the process. The technical means is characterized in that: the alignment and measurement guide comprises a reference, a registration and a detection pattern; the reference pattern comprises a main line; the alignment pattern comprises first and second scales of equal width setting, and The first and second sub-scales, the first scale portion is disposed on one side of the main line, the second scale portion is disposed on the other side of the main line and corresponds to the first scale portion, and the first sub-scale portion is disposed at the first The scale portion is away from one side of the main line and is offset from the center of the object to be tested, and the second sub-scale portion is disposed on a side of the second scale portion away from the main line and is offset from the center of the object to be tested. And corresponding to the first sub-scale portion; the detection pattern includes at least one detection line that can be overprinted on the alignment pattern.

Description

Different layout overprint aligning and measuring guides

The invention relates to the field of printing technology, in particular to a different type of overprint lithographic alignment and measurement guide.

Anti-counterfeiting printing is an area in the printing industry. It involves items such as banknotes, passports, tamper-evident labels, securities, stamps and identity cards. The main purpose of anti-counterfeiting printing is to prevent counterfeiting, alteration and counterfeit currency manufacturing.

At present, many technologies are applied to the anti-counterfeiting printing industry. The application of a single technology is not safe. Therefore, among the many technologies, it is necessary to select technologies that can be used in conjunction with the application. Currently, most of them are lithographically plus gravure printing or letterpress printing. Or the cooperation of screen printing, constitutes anti-counterfeiting printing, and achieves the anti-counterfeiting ability of security documents.

The paper passes through the feeder of the lithographic printing machine, and the printing unit to the delivery table are all in a flat state. However, when passing through other stencil printing machines, the paper is affected by various factors, which causes the deviation to occur when overprinting the lithographic plate. .

When cooperating with gravure printing, the ink in the pocket can be smoothly transferred to the paper due to the need to increase the pressure of the paper. This pressure often causes the paper to expand and contract, and causes problems with overprinting of the lithographic printing.

When printing in letterpress lithography, the paper is printed as a lithographically printed stream After the process, the size of the telescopic phenomenon will occur, and the pressure during the printing of the letterpress is very easy to produce the overprinting.

When the screen printing is lithographically printed, the problem of inaccurate overprinting often occurs due to the inconsistency of the material of the screen and the pressure during the squeegee printing.

At present, it is judged whether the overprinting is inaccurate, mainly by means of manual judgment, holding the ruler and checking the error amount of different positions on the paper, and the overall efficiency is poor and inaccurate.

In view of this, how to solve the above problems can be easily judged and measured to obtain the error amount of different positions on the layout, and can also refer to the different layout imprint aligning and measuring guides as the subsequent process correction values, which becomes the present A new type of problem to be improved.

The purpose of the present invention is to provide a different type of overprint lithography alignment and measurement guide which can easily measure the error amount at different positions on the layout surface as a correction error amount on the process.

In order to achieve the above object, the present invention provides a different type of overprint lithographic alignment and measurement guide, characterized in that the alignment and measurement guide (100) can be used for visually detecting the test object of the experience overprinting. (200), comprising at least one reference pattern (1) prepared by lithography on a surface of the object to be tested (200); at least one alignment printed on the reference pattern (1) by lithography a pattern (2); and at least one inspection pattern (3) overprinted on the reference pattern (1) and the alignment pattern (2) by another type of printing; the reference pattern (1) including Main line (11); the alignment pattern (2) includes a first scale portion (21), a second scale portion (22), and a first sub-scale portion (23) having equal width settings And a second sub-scale (24), the first scale portion (21) is disposed on a side of the main line (11), and the second scale portion (22) is disposed on the main line (11) Side and corresponding to the first scale portion (21), the first sub-scale portion (23) is disposed at the first scale portion (21) away from One side of the main line (11) is offset from the center of the object to be tested (200), and the second sub-scale (24) is disposed at the second scale (22) away from the main line (11) One side of the object (200) is offset from the center of the object to be tested (200) and corresponds to the first sub-scale (23); the detection pattern (3) includes at least one that can be overprinted The detection line (31) on the alignment pattern (2).

Preferably, the first scale portion (21), the second scale portion (22), the first sub-scale portion (23), and the second sub-scale portion (24) further include a plurality of lines, etc. The scale line (A) set at intervals.

Preferably, the alignment pattern (2) further includes a central alignment line (25) disposed between the first scale portion (21) and the second scale portion (22), the center The alignment line (25) can be overprinted on the corresponding main line (11) and/or the sub-line (12).

Preferably, the scale ranges of the first scale portion (21), the second scale portion (22), the first sub-scale portion (23), and the second sub-scale portion (24) are both 0.5 Mm.

Preferably, the first sub-scale portion (23) and the second sub-scale portion (24), both of which are away from the side of the main line (11), are respectively provided with a corresponding scale range for prompting The label portion (26) used.

Preferably, the reference pattern (1) is lithographically printed as 4-color black; the alignment pattern (2) is lithographically printed in magenta; the detection pattern (3) is printed Made in green.

Preferably, the alternative lithographic printing is one of the following: gravure printing, letterpress printing, screen printing.

Preferably, the reference pattern (1) further includes a main line disposed on the main line (11) one side, a sub-line (12) for alignment, and the detection pattern (3) further comprising a side disposed on the detection line (31) to match the sub-line (12) The secondary detection line (32) used.

Compared with the prior art, the effect of the present invention is as follows: in the present invention, by the cooperation of the reference pattern (1), the alignment pattern (2) and the detection pattern (3), not only the offset generated by different processes can be obtained. And the setting of the alignment and measuring guide (100) can be combined with the normal process and placed in the position of the printing center line, the angle line and the cutting line. The visual inspection is matched with human vision or machine vision. It can easily and correctly judge whether the measured object (200) is overprinted offset, has very high practicability, and has the functions of printing color sequence homing calibration and overprinting offset data measurement.

1‧‧‧ benchmark pattern

11‧‧‧Main lines

12‧‧‧Sub lines

2‧‧‧ alignment pattern

21‧‧‧ first scale

22‧‧‧Second scale

23‧‧‧First Deputy Scale

24‧‧‧Second sub-scale

25‧‧‧Central alignment line

3‧‧‧Detection pattern

31‧‧‧Test line

32‧‧‧Subtest line

A‧‧‧ tick

10‧‧‧ Machine Vision

20‧‧‧ Human Eye Vision

100‧‧‧ alignment and measuring guide

200‧‧‧Measured objects

Figure 1: Schematic diagram of the first embodiment of the present invention.

Fig. 2 is a schematic view showing the application of the first embodiment of the present invention.

3 to 5: Schematic diagram of the deviation state of the first embodiment of the present invention.

Figure 6 is a schematic view of the second embodiment of the present invention.

Figure 7 is a schematic view showing the application of the second embodiment of the present invention.

Fig. 8 is a schematic view showing the state of deviation of the second embodiment of the present invention.

Figure 9 is a schematic view of the third embodiment of the present invention.

Fig. 10 is a schematic view showing the application of the third embodiment of the present invention.

Figure 11 is a schematic view showing the state of deviation of the third embodiment of the present invention.

Fig. 12 is a schematic view showing the combined application of the first, second and third embodiments of the present invention.

Figure 13: Incorporating machine vision to detect the implementation intention of the first embodiment.

Figure 14: Intent of the implementation of the second embodiment of the present invention in conjunction with machine vision.

Fig. 15 is a view showing the implementation intention of the third embodiment of the present invention in conjunction with machine vision inspection.

Figure 16: Implementation intentions in conjunction with human visual inspection.

In order to enable a person skilled in the art to better understand the present invention, the technical solutions in the novel embodiments will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. It is obvious that the described embodiments are only It is an embodiment of the present invention, and not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative efforts should fall within the scope of the present invention.

It should be noted that the description of the present invention and the scope of the claims and the terms "first", "second" and the like in the above drawings are used to distinguish similar items, and are not necessarily used to describe a specific order or order; It is to be understood that the materials so used are interchangeable where appropriate, so that the embodiments of the present invention described herein can be implemented in a sequence other than those illustrated or described herein; in addition, the terms "including" and "having" and Any variations that are intended to cover non-exclusive inclusions, for example, a process, method, system, product, or device that comprises a series of steps or units, are not necessarily limited to those steps or units that are clearly listed, but may include Other steps or units listed or inherent to such processes, methods, products or equipment.

As shown in FIG. 1 to FIG. 11 , the first, second and third embodiments of the present invention are disclosed, which are a different type of overprint lithographic alignment and measurement guide, characterized in that: the alignment and the measurement a guide (100), which can be used for visually detecting an empirical overprinted object (200), comprising at least one reference pattern (1) prepared by lithography on the surface of the object to be tested (200); at least one pass The lithographic printing is prepared by overprinting the alignment pattern (2) on the reference pattern (1); and at least one is overprinted on the reference pattern (1) and the alignment pattern (2) by another stencil printing preparation Detecting a pattern (3); the reference pattern (1) comprising a main line (11); the alignment pattern (2) comprising a first scale portion (21) having a constant width setting, a second scale portion (22), a first sub-scale portion (23), and a second sub-scale portion (24), the first scale portion (21) being disposed on the side of the main line (11), The second scale portion (22) is disposed on the other side of the main line (11) and corresponds to the first scale portion (21), and the first sub-scale portion (23) is disposed on the first scale portion ( 21) away from the side of the main line (11) and offset toward the center of the object (200), the second sub-scale (24) is disposed at the second scale (22) away from the One side of the main line (11) is offset from the center of the object to be tested (200) and corresponds to the first sub-scale (23); the detection pattern (3) includes at least one A detection line (31) that can be overprinted on the alignment pattern (2).

Among them, through the cooperation of the reference pattern (1), the alignment pattern (2) and the detection pattern (3), it is not only easy to visually judge, but also the amount of deviation can be calculated by machine vision, and the offset generated by different overprinting processes is obtained, the most important. The main line (11) can be placed in the printing center line, the corner line and the cutting line, and can be directly replaced, and has the functions of printing color sequence homing calibration and overprinting offset data measurement.

Next, the main line (11) clearly provides a reference judgment portion, which cooperates with the first scale portion (21), the second scale portion (22), the first sub-scale portion (23), and the second sub-scale portion ( After 24), it is possible to clearly distinguish areas of tolerance, calibrate a reference range, and reduce the difficulty of judgment. After matching with the detection line (31), the overall identification is very intuitive and the offset is offset. The judgment is more convenient.

Furthermore, after the alignment and measurement guide (100) is matched with the object to be tested (200), the offset can be quickly determined regardless of the type of printing preparation, and the industrial application is high, which is beneficial to the printing industry. development of.

In addition, in the first embodiment, the second embodiment, or the third embodiment, the implementation manners are the same, and the second, seventh, and tenth drawings are referred to for ease of application.

As shown in Figures 13 to 15, the alignment and measurement guide (100) is applied to the object to be tested (200), and with machine vision (10), it is easy to judge whether the overprint is offset and quickly Calculate the amount of deviation to pass the error amount and make the basis for subsequent adjustment.

As shown in Fig. 16, the alignment and measurement guide (100) is applied to the object to be tested (200) to match the human eye (20), although it is also easy to judge whether the offset is offset or the amount of deviation is calculated. The same adjustment can be made according to the amount of error, but it is only suitable for small production or sampling.

Referring to FIGS. 1 , 6 , and 9 , the first scale portion ( 21 ), the second scale portion ( 22 ), the first sub-scale portion ( 23 ), and the first portion are disclosed. The two sub-scales (24) also include a plurality of scale lines (A) arranged at equal intervals.

Among them, the use of the scale line (A) to form each scale portion facilitates visual judgment, and facilitates rapid detection of the amount of offset, so that the offset check can be quickly performed.

Referring to FIG. 1 , FIG. 6 and FIG. 9 , the alignment pattern ( 2 ) further includes a first scale portion ( 21 ) and a second scale portion ( 22 ). A central alignment line (25) between the central alignment lines (25) can be overprinted on the corresponding main line (11) and/or the sub-line (12).

Among them, the application of the central alignment line (25) can easily determine whether the alignment pattern (2) is correctly printed to the correct position, thereby avoiding the problem of misjudgment of the offset.

Referring to FIGS. 1 , 6 , and 9 , the first scale portion ( 21 ), the second scale portion ( 22 ), the first sub-scale portion ( 23 ), and the first portion are disclosed. The scale range of the two sub-scales (24) is 0.5 mm.

Here, by the cooperation of the first scale portion (21), the second scale portion (22), the first sub-scale portion (23), and the second sub-scale portion (24), a size range can be clearly defined. After matching the detection pattern (3), it can be beneficial to visually determine whether to accept, shorten the overall judgment time, and avoid the possibility of erroneous judgment.

Referring to FIGS. 1 , 6 , and 9 , the first sub-scale portion ( 23 ) and the second sub-scale portion ( 24 ) are separated from the main line ( 11 ). On one side, each is also provided with a label portion (26) for prompting the corresponding scale range.

Among them, the application of the label portion (26) can facilitate the quick determination of the offset, without taking extra time to confirm the offset reference value, shortening the working hours, and facilitating cost control.

In the above, the reference pattern (1) is lithographically printed as 4-color black; the alignment pattern (2) is lithographically printed in magenta; and the detection pattern (3) is printed. It is green.

Among them, the reference pattern (1) is implemented in black, that is, the so-called printing center line, or the angle line, or the cutting line, which can be easily identified; the alignment pattern (2) can be implemented in magenta, not only With the reference pattern (1), it can also highlight its location so that it can be detected quickly; the detection pattern (3) can be implemented in green, which can be easily defined with the reference pattern (1) and the alignment pattern (2). Whether it is offset, the amount of offset, whether it is within the tolerance range, shorten the judgment time consumed.

Referring to Figures 2, 7, and 10, the alternative layout is disclosed as one of the following: gravure, letterpress, screen printing.

Among them, through the application of the new alignment and measuring guide (100), it is possible to cooperate with the above-mentioned several types of printing, without worrying that it is difficult to judge, whether the problem of offset occurs, and is beneficial to practical applications.

Referring to Figures 1 and 9, the reference pattern (1) is further included, which further includes a sub-line (12) disposed on one side of the main line (11) for alignment. The detection pattern (3) further includes a sub-detection line (32) disposed on one side of the detection line (31) for matching the sub-line (12).

Among them, for the application demand, the sub-line (12) or the sub-detection line (32) is added to smoothly apply the new alignment and measurement guide (100).

Embodiment 1:

In one embodiment of the deviation state of the first embodiment of the present invention, as shown in (a) of FIG. 3, the detection line (31) and the auxiliary detection line can be clearly seen by the alignment and measurement guide (100) in the horizontal direction. (32) Displaced from the main line (11) and the sub-line (12), it is known that the overprint offset has been found, and the first scale portion (21) can be used to know that the upward offset is 0.5 mm, and the alignment in the vertical direction is matched. And the measuring guide (100), it can be clearly seen that the detecting line (31), the auxiliary detecting line (32) and the main line (11), the sub-line (12) are staggered, and it is found that the overprint offset has been found, with the second scale The part (22) can know that it is offset to the left by 0.5 mm.

In the second embodiment of the present embodiment, the second example of the deviation state is as shown in (b) of FIG. 3, and the detection line (31) of the alignment guide and the measuring guide (100) is matched with the reference pattern (1). And right Bit pattern (2), it can be clearly seen that the detection line (31) is offset from the first scale portion (21), the detection line (31), and the auxiliary detection line (32), and it is found that the overprint offset has been found, with the first moment The degree portion (21) can know that the upward displacement is 0.5 mm, and the vertical alignment and the measurement guide (100) can clearly see the detection line (31), the auxiliary detection line (32) and the main line. (11), the sub-line (12) is not wrong, and it can be known that the overprint has no offset.

In the third embodiment of the present embodiment, the third example of the deviation state is as shown in (c) of FIG. 3, and the alignment line (31) of the alignment guide and the measuring guide (100) is matched with the reference pattern (1). And the alignment pattern (2), it can be clearly seen that the detection line (31) is offset from the first scale portion (21), the detection line (31), and the sub-detection line (32), and it is found that the overprint offset has been found. A scale portion (21) can be known to be offset by 0.5 mm upward, and with the alignment and measurement guide (100) in the vertical direction, the detection line (31) and the auxiliary detection line (32) can be clearly seen. The main line (11) and the sub-line (12) are staggered, and it is known that the overprint offset has been found, and the first scale portion (21) can be used to know that the offset is 0.5 mm to the right.

In the fourth embodiment of the present embodiment, as shown in (a) of FIG. 4, the detection line (31) and the sub-detection line can be clearly seen by the alignment and measurement guides (100) in the horizontal direction. (32) There is no staggering with the main line (11) and the sub-line (12), and it is quick to know that the overprint has no offset, and the vertical alignment and the measuring guide (100) can clearly see the detection line (31). ), the sub-detection line (32) is shifted from the main line (11) and the sub-line (12), and it is found that the overprint offset has been found, and the second scale portion (22) can be used to know that the offset is 0.5 mm to the left.

In the fifth embodiment of the first embodiment of the deviation state, as shown in (b) of FIG. 4, the detection line (31) and the auxiliary detection line can be clearly seen through the alignment and measurement guides (100) in the horizontal direction. (32) There is no staggering with the main line (11) and the sub-line (12), and it is quick to know that the overprint has no offset, and the vertical alignment and the measuring guide (100) can clearly see the detection line (31). ), the secondary detection line (32) and the main line (11), the sub-line (12) is not wrong, and it can be known that the overprint has no offset.

In the first embodiment of the first embodiment of the deviation state, as shown in (c) of FIG. 4, the detection line (31) and the auxiliary detection line can be clearly seen through the alignment and measurement guides (100) in the horizontal direction. (32) There is no staggering with the main line (11) and the sub-line (12), and it is quick to know that the overprint has no offset, and the vertical alignment and the measuring guide (100) can clearly see the detection line (31). ), the sub-detection line (32) is staggered from the main line (11) and the sub-line (12), and it is known that the overprint offset has been found, and the first scale portion (21) can be known to be offset to the right by 0.5 mm.

In the first embodiment of the present invention, the seventh example of the deviation state is as shown in (a) of FIG. 5, and the detection line (31) of the alignment guide and the measuring guide (100) is matched with the reference pattern (1). And the alignment pattern (2), it can be clearly seen that the detection line (31) is offset from the first scale portion (21), the detection line (31), and the sub-detection line (32), and it is found that the overprint offset has been found. The two-scale portion (22) can know that the downward offset is 0.5 mm, and the vertical alignment and the measurement guide (100) can clearly see the detection line (31), the secondary detection line (32) and the main The line (11) and the sub-line (12) are staggered, and it is known that the overprint offset has been found, and the second scale portion (22) can be used to know that the offset is 0.5 mm to the left.

In the first embodiment of the first embodiment of the deviation state, as shown in (b) of FIG. 5, the alignment line of the horizontal direction and the detection line (31) of the measuring and guiding tool (100) are matched with the reference pattern (1). And the alignment pattern (2), it can be clearly seen that the detection line (31) is offset from the first scale portion (21), the detection line (31), and the sub-detection line (32), and it is found that the overprint offset has been found. The two-scale portion (22) can know that the downward offset is 0.5 mm, and the vertical alignment and the measurement guide (100) can clearly see the detection line (31), the secondary detection line (32) and the main The line (11) and the sub-line (12) are not staggered, and it can be known that the overprint has no offset.

In the first embodiment of the present embodiment, the ninth example of the deviation state is as shown in (c) of FIG. After the alignment in the horizontal direction and the detection line (31) of the measuring guide (100), with the reference pattern (1) and the alignment pattern (2), the detection line (31) and the first scale can be clearly seen. The portion (21), the detecting line (31), and the auxiliary detecting line (32) are staggered, and it is found that the overprint offset has been found, and the second scale portion (22) can be used to know that the downward offset is 0.5 mm, and the vertical direction is matched. The position and the measuring guide (100) can clearly see that the detecting line (31), the auxiliary detecting line (32) are staggered from the main line (11) and the sub line (12), and it is found that the overprint offset has been found, and the first The scale (21) can be known to be offset to the right by 0.5 mm.

Embodiment 2:

One of the examples of the deviation state of the second embodiment of the present invention, as shown in (a) of FIG. 8, can clearly see that the detection line (31) is staggered from the main line (11) by the alignment and measurement guide (100). Quickly know the offset of the overprint, and the second scale (22) can be used to know that the upward offset is 0.5 mm.

In the second embodiment of the second embodiment of the deviation state, as shown in (b) of FIG. 8, the alignment line and the measurement guide (100) can clearly see that the detection line (31) and the main line (11) are absent. Staggered and quickly learned that there is no overprint offset.

In the third embodiment of the second embodiment of the deviation state, as shown in (c) of FIG. 8, it can be clearly seen that the detection line (31) is staggered from the main line (11) by the alignment and measurement guide (100). Quickly know the offset of the overprint, and the first scale portion (21) can be used to know that the offset is 0.5 mm downward.

Embodiment 3:

One of the examples of the deviation state of the third embodiment of the present invention, as shown in (a) of Fig. 11, through the two sets of alignment and measurement guides (100), the detection line (31) and the main line (11) can be clearly seen. ) Staggered, quickly know the offset of the overprint, and the first scale (21) can be used to know that the offset is 0.5mm to the left.

In the third embodiment of the present embodiment, the second example of the deviation state is as shown in (b) of FIG. Through the two sets of alignment and measurement guides (100), it can be clearly seen that the detection line (31) and the main line (11) are not staggered, and it is quickly known that there is no overprint offset.

In the third embodiment of the third embodiment of the present invention, as shown in (c) of FIG. 11, the detection line (31) and the main line (11) can be clearly seen through the two sets of alignment and measurement guides (100). ) Staggered, quickly know the offset of the overprint, and the second scale (22) can be used to know that the offset is 0.5mm to the right.

In addition, the judgments of the first embodiment to the third embodiment are based on the drawings, and the error directions of the first to third embodiments are actually determined by the actual drawing. As shown in FIG. 12, according to the embodiment, Different to judge.

The structure, features and effects of the present invention are described in detail above with reference to the embodiments shown in the drawings. However, the above description is only a preferred embodiment of the present invention, but the present invention does not limit the scope of implementation as shown in the drawings. Modification changes consistent with the meaning of the present invention are intended to fall within the scope of the present invention as long as they are within the scope of equal effect.

Claims (8)

A different type of overprint lithography alignment and measurement guide, characterized in that: the alignment and measurement guide (100) can be used for visually detecting an empirical overprinted object (200), which includes at least one a reference pattern (1) prepared on the surface of the object to be tested (200) by lithography; at least one alignment pattern (2) overprinted on the reference pattern (1) by lithography; and at least one pass Another type of printing preparation is overprinted on the reference pattern (1) and the detection pattern (3) on the alignment pattern (2); the reference pattern (1) includes a main line (11); the pair a bit pattern (2) comprising a first scale portion (21) having a constant width setting, a second scale portion (22), a first sub-scale portion (23), and a second sub-scale portion ( 24) The first scale portion (21) is disposed on a side of the main line (11), and the second scale portion (22) is disposed on the other side of the main line (11) and corresponds to the first moment a portion (21), the first sub-scale portion (23) is disposed on a side of the first scale portion (21) away from the main line (11), and is offset from a center of the object to be tested (200) Moving, the second sub-scale (24) is located in the first The second scale portion (22) is away from the side of the main line (11) and is offset toward the center of the object to be tested (200), and corresponds to the first sub-scale portion (23); the detection pattern (3), comprising at least one detection line (31) that can be overprinted on the alignment pattern (2). The different layout imprint aligning and measuring guide according to claim 1, wherein the first scale portion (21), the second scale portion (22), and the first sub-scale portion (23) And the second sub-scale portion (24) further includes a plurality of scale lines (A) arranged at equal intervals. The different layout imprint aligning and measuring guides according to claim 2, wherein the alignment pattern (2) further comprises a first scale portion (21) and the second scale A central alignment line (25) between the portions (22), the central alignment line (25) can be overprinted on the corresponding reference pattern (1). The different layout imprint aligning and measuring guide according to claim 3, wherein the first scale portion (21), the second scale portion (22), and the first sub-scale portion (23) And the scale range of the second sub-scale (24) is 0.5 mm. The different layout imprint aligning and measuring guides according to claim 4, wherein the first sub-scale portion (23) and the second sub-scale portion (24) are both away from the main line ( On one side of 11), each of them is provided with a label portion (26) for prompting the corresponding scale range. The different layout imprint aligning and measuring guide according to claim 5, wherein the reference pattern (1) is lithographically printed as 4 colors black; the alignment pattern (2) is lithographically The print is printed in magenta; the test pattern (3) is printed in green. The different layout imprint aligning and measuring guides according to claim 6, wherein the alternative typographic printing is one of the following: gravure printing, letterpress printing, screen printing. The different layout imprint aligning and measuring guide according to claim 7, wherein the reference pattern (1) further comprises a side disposed on the main line (11) for alignment The sub-line (12); the detection pattern (3) further includes a sub-detection line (32) disposed on one side of the detection line (31) for matching the sub-line (12).