TWM576171U - Fixing type cathode conductive device - Google Patents

Fixing type cathode conductive device Download PDF

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Publication number
TWM576171U
TWM576171U TW107216760U TW107216760U TWM576171U TW M576171 U TWM576171 U TW M576171U TW 107216760 U TW107216760 U TW 107216760U TW 107216760 U TW107216760 U TW 107216760U TW M576171 U TWM576171 U TW M576171U
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Taiwan
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conductive device
cathode conductive
electrode
mounting
mounting slider
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TW107216760U
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Chinese (zh)
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余泓儒
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億銘科技股份有限公司
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Priority to TW107216760U priority Critical patent/TWM576171U/en
Publication of TWM576171U publication Critical patent/TWM576171U/en

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Abstract

一種固定式陰極導電裝置,包括:導線部;鍍頭電極部,與導線部的前端電連接;剛性套管部,其末端具有安裝滑塊,安裝滑塊具有滑動凸緣,導線部受到剛性套管部包覆及固定,鍍頭電極部設置於剛性套管部的前端,安裝滑塊與導線部的後端電連接;安裝底座,其具有滑槽、限位擋片及彈性電極,安裝滑塊設置於滑槽,安裝滑塊的滑動凸緣限位於限位擋片,彈性電極電接觸安裝滑塊。A fixed cathode conductive device comprises: a wire portion; a plate head electrode portion electrically connected to a front end of the wire portion; a rigid sleeve portion having a mounting slider at an end thereof, the mounting slider has a sliding flange, and the wire portion is subjected to a rigid sleeve The tube portion is covered and fixed, the electrode portion of the plating head is disposed at the front end of the rigid sleeve portion, and the mounting slider is electrically connected to the rear end of the wire portion; the mounting base has a sliding groove, a limiting stopper and an elastic electrode, and the sliding is installed The block is disposed in the chute, and the sliding flange of the mounting slider is limited to the limiting baffle, and the elastic electrode electrically contacts the mounting slider.

Description

固定式陰極導電裝置Fixed cathode conductive device

本創作關於一種電鍍用的陰極導電裝置,更明確地說,關於一種用於滾鍍設備中的固定式陰極導電裝置。This creation relates to a cathode conducting device for electroplating, and more particularly to a fixed cathode conducting device for use in a barrel plating apparatus.

滾鍍係將一定數量的工作物(通常為多個小零件)置於滾筒內,基於電解原理加上滾筒的翻滾,於工作物上鍍上金屬層的製造方法。滾筒內裝有待鍍之工作物並使鍍槽中鍍液流入滾筒內,當通電時,受到電場作用使得金屬離子透過滾筒內的陰極導線及鍍液而於工作物上還原成金屬鍍層,藉著滾筒的滾動以確保多個工作物皆導通以形成鍍層。Barrel plating is a method in which a certain amount of work (usually a plurality of small parts) is placed in a drum, and a metal layer is plated on the work based on the principle of electrolysis plus the roll of the drum. The working object to be plated is placed in the drum and the plating solution in the plating tank flows into the drum. When energized, the electric field acts to cause the metal ions to pass through the cathode wire and the plating solution in the drum to be reduced to metal plating on the workpiece. Rolling of the rollers ensures that a plurality of workpieces are turned on to form a plating.

工作物在滾筒內不停的翻滾,工作物與陰極的接觸狀況,會影響滾鍍電流的傳輸穩定性,滾筒內的零件與陰極的距離會影響電流於小零件上的分佈,故可知陰極導電裝置之設計會於滾鍍系統中決定鍍層品質之重要因素之一。The workpiece is continuously tumbling in the drum, and the contact condition between the workpiece and the cathode affects the transmission stability of the barrel plating current. The distance between the part in the drum and the cathode affects the distribution of current on the small part, so that the cathode is electrically conductive. The design of the device is one of the important factors in determining the quality of the coating in the barrel plating system.

傳統之陰極導電裝置為一軟性導電線裝置,軟性導電裝置於滾鍍過程中,易因受鍍零件滾動造成陰極導電裝置無法固定,或因軟性導電線材質老化,造成陰極導電裝置位置於滾鍍過程中一直變異,因而造成電流產生變化(於定電流的狀況之下,會發生電壓忽高忽低的現象),影響鍍層品質。The conventional cathode conductive device is a soft conductive wire device. During the barrel plating process, the flexible conductive device is liable to be unable to fix the cathode conductive device due to rolling of the plated parts, or the position of the cathode conductive device is barrel-plated due to aging of the soft conductive material. The process has been mutated all the time, resulting in a change in current (under the condition of constant current, the phenomenon of voltage going up and down), affecting the quality of the coating.

有鑑於上述習知技術之缺憾,創作人有感其未臻於完善,遂竭其心智悉心研究克服,進而研發出一種固定式陰極導電裝置,可在滾鍍製程當中,提供穩定的陰極供電,以於工作物上產生均勻的鍍膜,提升滾鍍的品質。In view of the shortcomings of the above-mentioned prior art, the creator feels that he has not perfected it, exhausted his mind and researched and overcome it, and developed a fixed cathode conductive device, which can provide stable cathode power supply during the barrel plating process. In order to produce a uniform coating on the work, the quality of the barrel plating is improved.

本創作之一樣態的固定陰極導電裝置,包括:導線部;鍍頭電極部,與該導線部的前端電連接;剛性套管部,其末端具有安裝滑塊,該安裝滑塊具有滑動凸緣,該導線部受到該剛性套管部包覆及固定,該鍍頭電極部設置於該剛性套管部的前端,該安裝滑塊與該導線部的後端電連接;安裝底座,其具有滑槽、限位擋片及彈性電極,該安裝滑塊設置於該滑槽,該安裝滑塊的滑動凸緣限位於該限位擋片,該彈性電極電接觸該安裝滑塊。The fixed cathode conductive device of the present invention comprises: a wire portion; a plate head electrode portion electrically connected to a front end of the wire portion; and a rigid sleeve portion having a mounting slider at an end thereof, the mounting slider having a sliding flange The lead portion is covered and fixed by the rigid sleeve portion, the plating head electrode portion is disposed at a front end of the rigid sleeve portion, the mounting slider is electrically connected to a rear end of the lead portion, and the mounting base has a sliding The slot, the limiting block and the elastic electrode are disposed on the sliding slot, and the sliding flange of the mounting slider is limited to the limiting bracket, and the elastic electrode electrically contacts the mounting slider.

本創作之一樣態之固定式陰極導電裝置中,該滑槽的壁體具有緊固裝置以緊固該安裝滑塊於該滑槽與該限位擋片之間。In the fixed cathode conductive device of the same state, the wall of the sliding slot has fastening means for fastening the mounting slider between the sliding slot and the limiting bracket.

本創作之一樣態之固定式陰極導電裝置中,該彈性電極包括受載電極以及彈簧,該彈簧頂推該受載電極電接觸該安裝滑塊。In the same fixed cathode conductive device of the present invention, the elastic electrode includes a load carrying electrode and a spring, and the spring pushes the load carrying electrode to electrically contact the mounting slider.

本創作之一樣態之固定式陰極導電裝置中,該受載電極具有平面部以電接觸該安裝滑塊。In the fixed cathode conductive device of the same state of the present invention, the load carrying electrode has a flat portion to electrically contact the mounting slider.

本創作之一樣態之固定式陰極導電裝置中,該受載電極具有環形弧面以連接該平面部的周緣。In the same fixed cathode conductive device of the present invention, the load-bearing electrode has an annular curved surface to connect the circumference of the planar portion.

本創作之一樣態之固定式陰極導電裝置中,該限位擋片具有L形剖面形狀,該安裝滑塊的滑動凸緣由該限位擋片頂部的開口置入該滑槽並限位於該限位擋片內。In the fixed cathode conductive device of the same state, the limiting baffle has an L-shaped cross-sectional shape, and the sliding flange of the mounting slider is inserted into the chute from the opening of the top of the limiting baffle and is limited to the limit. Inside the block.

本創作之一樣態之固定式陰極導電裝置中,更包括一固定部連接於該安裝底座。In the fixed cathode conductive device of the same state, a fixing portion is further connected to the mounting base.

為充分瞭解本創作之目的、特徵及功效,茲藉由下述具體之實施例,並配合所附之圖式,對本創作做一詳細說明,說明如後:In order to fully understand the purpose, features and effects of this creation, the following specific examples, together with the attached drawings, provide a detailed description of the creation, as explained below:

圖1及圖3分別為本實施例之固定式陰極導電裝置10的分解示意圖及組合示意圖。如圖1及圖3所示,本實施例之固定式陰極導電裝置10包括:導線部14;鍍頭電極部16,其與導線部14的前端電連接;剛性套管部18,其末端具有安裝滑塊182,安裝滑塊182具有滑動凸緣1822,導線部14受到剛性套管部18包覆及固定,鍍頭電極部16設置於剛性套管部18的前端,安裝滑塊182與導線部14的後端電連接;安裝底座20,其具有滑槽264、限位擋片22及彈性電極24,安裝滑塊182設置於滑槽264,安裝滑塊182的滑動凸緣1822限位於限位擋片22(圖3),彈性電極24電接觸該安裝滑塊182。1 and 3 are respectively an exploded schematic view and a combined schematic view of the fixed cathode conductive device 10 of the present embodiment. As shown in FIG. 1 and FIG. 3, the fixed cathode conductive device 10 of the present embodiment includes: a lead portion 14; a plate head electrode portion 16 electrically connected to a front end of the lead portion 14; and a rigid sleeve portion 18 having an end portion thereof The slider 182 is mounted. The mounting slider 182 has a sliding flange 1822. The lead portion 14 is covered and fixed by the rigid sleeve portion 18. The plating head electrode portion 16 is disposed at the front end of the rigid sleeve portion 18, and the slider 182 and the wire are mounted. The rear end of the portion 14 is electrically connected; the mounting base 20 has a sliding slot 264, a limiting baffle 22 and an elastic electrode 24, the mounting slider 182 is disposed on the sliding slot 264, and the sliding flange 1822 of the mounting slider 182 is limited to the limit The position piece 22 (Fig. 3), the elastic electrode 24 electrically contacts the mounting slider 182.

導線部14係為條狀直線延伸,於前端連接至鍍頭電極部16,於後端連接至安裝滑塊182。本實施例中,剛性套管部18還具有截頭圓椎狀的保持部184,保持部184將鍍頭電極部16保持於剛性套管部18的前端,除了固定鍍頭電極部16之外,保持部184也提供了剛性套管部18及鍍頭電極部16之間的過渡形狀,以避免工作物擠壓造成鍍頭電極部16及剛性套管部18之間接合處的應力集中而使得鍍頭電極部16容易受損或脫落。剛性套管部18係由不易彎折或不易撓曲之中空管狀構件,於旋轉滾筒受到馬達驅動而旋轉時,即使鍍液及待鍍之工作物皆於旋轉滾筒中受到攪動而翻滾,固定式陰極導電裝置仍然維持在固定的位置,並不會隨著鍍液或工作物的翻滾而產生形變或是位移。The lead portion 14 is linearly extended in a strip shape, connected to the plating head electrode portion 16 at the front end, and connected to the mounting slider 182 at the rear end. In the present embodiment, the rigid sleeve portion 18 further has a truncated conical retaining portion 184 that holds the plating head electrode portion 16 at the front end of the rigid sleeve portion 18 except for the fixed plating head electrode portion 16. The holding portion 184 also provides a transition shape between the rigid sleeve portion 18 and the plate head electrode portion 16 to prevent stress concentration of the joint between the plating head electrode portion 16 and the rigid sleeve portion 18 due to the pressing of the workpiece. The plating head electrode portion 16 is easily damaged or peeled off. The rigid sleeve portion 18 is a hollow tubular member that is not easily bent or is not easily deflected. When the rotary drum is driven by the motor to rotate, even if the plating solution and the workpiece to be plated are both stirred and tumbling in the rotary drum, the fixed type The cathode conductive device is still maintained in a fixed position and does not deform or displace as the plating solution or the workpiece rolls over.

於本實施例中,鍍頭電極部16具有圓弧側邊,其有助於維持旋轉滾筒內的流動性,可使工作物於鍍液中翻轉時能夠順利於鍍頭電極部16周圍翻動,減少工作物受阻擋而影響工作物翻滾之情形。於其他實施例中,鍍頭電極部亦可為球狀或是其他形狀。In the present embodiment, the plating head electrode portion 16 has a circular arc side, which helps maintain the fluidity in the rotating drum, and can smoothly swing around the plating head electrode portion 16 when the working object is turned over in the plating solution. Reduce the situation where the work is blocked and affect the roll of the work. In other embodiments, the plating electrode portion may also be spherical or otherwise shaped.

安裝滑塊182的朝內側可具有接點,用於在安裝滑塊182安裝置安裝底座20時,與彈性電極24連接,並將來自彈性電極24的電流傳送至導線部14,進而傳送至鍍頭電極部16以於鍍液中產生反應。The mounting slider 182 may have contacts on the inner side for connecting to the elastic electrode 24 when the mounting slider 182 is mounted on the mounting base 20, and the current from the elastic electrode 24 is transmitted to the lead portion 14 for transfer to the plating The head electrode portion 16 generates a reaction in the plating solution.

於本實施例當中,導線部14受到剛性套管部18的包覆及固定,因此於滾鍍的過程當中,不會隨著鍍液或工作件的流動而形變或是移動,因而可提供穩定的滾鍍環境,並且有助於提高工作件的翻滾,進而達到均勻鍍覆,提高鍍層的品質。In the present embodiment, the lead portion 14 is covered and fixed by the rigid sleeve portion 18, so that it does not deform or move with the flow of the plating solution or the workpiece during the barrel plating process, thereby providing stability. The barrel plating environment helps to improve the tumbling of the workpiece, thereby achieving uniform plating and improving the quality of the coating.

此外,安裝滑塊182與安裝底座20的組合式配置,可使固定式陰極導電裝置10容易進行安裝或維護。於安裝或維護時,只要將安裝滑塊182沿著安裝底座20上的滑槽264放入定位即可,因此當前端的鍍頭電極部16或是導線部14因老化或損傷而需要更換時,可以由維護人員迅速地拆卸及組裝。In addition, the combined configuration of the mounting slider 182 and the mounting base 20 allows the stationary cathode conductive device 10 to be easily installed or maintained. In the installation or maintenance, the mounting slider 182 can be placed along the sliding slot 264 of the mounting base 20, so that the plating electrode portion 16 or the lead portion 14 of the current end needs to be replaced due to aging or damage. It can be quickly disassembled and assembled by maintenance personnel.

如圖1所示,於安裝底座20中,安裝底座20於兩側上具有凸起部26,滑槽264係於兩側的凸起部26之內側形成。凸起部26發揮了限位安裝滑塊182的作用,而滑槽264發揮了導引的作用,使得安裝滑塊182能夠順利地在滑槽264中滑動。於本實施例中,兩個限位擋片22設置於兩側的凸起部26上,於本實施例中限位擋片22與凸起部26為一體成形,但並不限於此,兩者間亦可為組裝結合。各限位擋片22分別具有L形剖面形狀。安裝滑塊182的滑動凸緣1822由限位擋片22頂部(此處係指圖中的上方,即靠近懸掛部122之處)的開口22o置入滑槽264並限位於限位擋片22內,以使安裝滑塊182到達定位,據此可使安裝作業更為省力,不需要過多調整定位作業,只要使安裝滑塊182沿著滑槽264進入定位時被限位擋片22擋住即可。As shown in FIG. 1, in the mounting base 20, the mounting base 20 has boss portions 26 on both sides, and the chutes 264 are formed on the inner sides of the boss portions 26 on both sides. The boss portion 26 functions as a limit mounting slider 182, and the chute 264 functions as a guide so that the mounting slider 182 can smoothly slide in the chute 264. In this embodiment, the two limiting baffles 22 are disposed on the convex portions 26 on both sides. In the embodiment, the limiting baffle 22 and the convex portion 26 are integrally formed, but are not limited thereto. It can also be assembled for assembly. Each of the limit stoppers 22 has an L-shaped cross-sectional shape. The sliding flange 1822 of the mounting slider 182 is placed in the sliding slot 264 by the opening 22o of the top of the limiting bracket 22 (here, in the upper part of the figure, that is, near the hanging portion 122) and is limited to the limiting bracket 22 In order to make the mounting slider 182 reach the positioning, the installation work can be made more labor-saving, and the positioning operation is not required to be adjusted too much, as long as the mounting slider 182 is positioned by the limiting bracket 22 when entering the positioning along the sliding slot 264. can.

於本實施例中的固定式陰極導電裝置10還包括固定部12,其連接於安裝底座20,固定部12係用於將固定式陰極導電裝置10裝載至滾鍍設備中。如圖1、3、5所示,於本實施例中,固定部12包括懸掛部122及基座部124,懸掛部122與基座部124之間連接為一體且於側面觀察時,兩者之間形成鈍角(如圖5)。基座部124位於安裝底座20的下方,安裝底座20可透過螺絲等方式固定於基座部124上。基座部124由兩側分別往上延伸出延伸壁1242於凸起部26的外側(圖3)。此外,懸掛部122可組裝至滾鍍設備1的頂部樑4上,此時因懸掛部122與基座部124之間所形成的鈍角使得剛性套管部18以特定的角度深入旋轉滾筒6當中(圖5)。相較於使用習知的軟式導線的做法,即僅自上方垂下軟性導線或是將軟性導線置於旋轉滾筒中任其不受控制地彎曲或移動,本實施例中的固定式陰極導電裝置可根據實際的製程條件來設計懸掛部122及基座部124之間的角度,以調整剛性套管部18的角度,使其以特定的角度深入於旋轉滾筒中,並且維持此狀態進行滾鍍。The fixed cathode conductive device 10 in this embodiment further includes a fixing portion 12 connected to the mounting base 20 for loading the fixed cathode conductive device 10 into the barrel plating apparatus. As shown in FIGS. 1 , 3 , and 5 , in the present embodiment, the fixing portion 12 includes a hanging portion 122 and a base portion 124 . When the hanging portion 122 and the base portion 124 are integrally connected and viewed from the side, both An obtuse angle is formed between them (see Figure 5). The base portion 124 is located below the mounting base 20, and the mounting base 20 is fixed to the base portion 124 by screws or the like. The base portion 124 extends upwardly from the two sides to the outside of the raised portion 26 (Fig. 3). Further, the suspension portion 122 can be assembled to the top beam 4 of the barrel plating apparatus 1 at which time the rigid sleeve portion 18 penetrates the rotary drum 6 at a specific angle due to the obtuse angle formed between the suspension portion 122 and the base portion 124. (Figure 5). Compared with the conventional flexible wire, that is, only the flexible wire is suspended from above or the flexible wire is placed in the rotating drum to be uncontrolledly bent or moved, the fixed cathode conductive device in this embodiment can be The angle between the suspension portion 122 and the base portion 124 is designed according to actual process conditions to adjust the angle of the rigid sleeve portion 18 so as to penetrate deep into the rotating drum at a specific angle, and to maintain this state for barrel plating.

如圖1及圖3所示,具有L形剖面形狀的限位擋片22分別於X-Y平面及X-Z平面上形成阻擋,因此可以限位安裝滑塊182。此外,位於兩側的限位擋片22之間形成的空間之寬度小於滑槽264之寬度。安裝滑塊182中於兩側滑動凸緣1822之間的部分厚度大於兩側滑動凸緣1822而形成中央突出部1824,因此將安裝滑塊182安裝到安裝底座20時,滑動凸緣1822限位於較寬的滑槽264中,而中央突出部1824限位於較窄的兩側限位擋片22之間,使得安裝滑塊更為穩固地定位。As shown in FIGS. 1 and 3, the limit stoppers 22 having an L-shaped cross-sectional shape form a barrier on the X-Y plane and the X-Z plane, respectively, so that the slider 182 can be mounted in a limited position. Further, the width of the space formed between the limit stops 22 on both sides is smaller than the width of the chute 264. The portion of the mounting slider 182 between the sliding flanges 1822 on both sides is thicker than the two side sliding flanges 1822 to form the central projection 1824, so when the mounting slider 182 is mounted to the mounting base 20, the sliding flange 1822 is limited In the wider chute 264, the central projection 1824 is positioned between the narrower side limit stops 22, so that the mounting slider is more stably positioned.

參考圖1及圖2。彈性電極24包括受載電極242及彈簧244(圖2)。當安裝滑塊182未定位至安裝底座20時,受載電極242受到彈簧244支撐,且受載電極242的一部分被頂推出至安裝底座20之外側。接著參考圖3及圖4,當安裝滑塊182定位至安裝底座20後,安裝滑塊182將受載電極242往安裝底座20內側擠壓,而受載電極242擠壓使得彈簧244壓縮,此時來自彈簧244的抗力使得受載電極242頂端的平面部242f能夠確實地與安裝滑塊182上的接點,也就是說,彈簧244頂推受載電極242電接觸安裝滑塊182。Refer to Figures 1 and 2. The resilient electrode 24 includes a load carrying electrode 242 and a spring 244 (Fig. 2). When the mounting slider 182 is not positioned to the mounting base 20, the loaded electrode 242 is supported by the spring 244, and a portion of the loaded electrode 242 is pushed up to the outside of the mounting base 20. 3 and FIG. 4, after the mounting slider 182 is positioned to the mounting base 20, the mounting slider 182 presses the loaded electrode 242 to the inside of the mounting base 20, and the loaded electrode 242 is pressed to compress the spring 244. The resistance from the spring 244 allows the planar portion 242f of the top end of the load-bearing electrode 242 to positively engage the contact on the mounting slider 182, that is, the spring 244 pushes the contact electrode 242 into electrical contact to mount the slider 182.

於本實施例當中,受載電極242的頂部為平坦的平面部242f,以穩定地電接觸安裝滑塊182。此外,如圖1-2所示,受載電極242具有環形弧面242c(或斜面)以連接該平面部242f的周緣,且於安裝滑塊182尚未組裝至安裝底座20時,環形弧面242c的一部分露出於安裝底座20的外側。因此當在將安裝滑塊182組裝至安裝底座20時,順著安裝滑塊182沿著滑槽264而推至定位的過程中,安裝滑塊182可沿著環形弧面242c將受載電極242推入安裝底座20中。而在取出/組裝時,由於安裝滑塊182可從設置於限位擋片22頂部的開口22o進出(參考圖1、3),因此不需要卸下限位擋片22即可進行組件的替換,進一步地提升了維護的便利性。In the present embodiment, the top of the load-bearing electrode 242 is a flat flat portion 242f for stably electrically contacting the mounting slider 182. In addition, as shown in FIG. 1-2, the load-bearing electrode 242 has an annular curved surface 242c (or a slope) to connect the circumference of the flat portion 242f, and when the mounting slider 182 has not been assembled to the mounting base 20, the annular curved surface 242c A part of it is exposed on the outside of the mounting base 20. Therefore, when the mounting slider 182 is assembled to the mounting base 20, the mounting slider 182 can move the loaded electrode 242 along the annular curved surface 242c as the mounting slider 182 is pushed along the sliding groove 264 to the positioning process. Push into the mounting base 20. In the case of the removal/assembly, since the mounting slider 182 can be accessed from the opening 22o provided at the top of the limiting stopper 22 (refer to FIGS. 1 and 3), the replacement of the component can be performed without removing the limiting stopper 22, The convenience of maintenance is further improved.

參考圖3。當安裝滑塊182順著滑槽至定位後,X方向上的位移受到滑槽264/限位擋片22(L形中長條部分)限制,Z方向上的位移也受到限位擋片22(L形中短條部分)限制。此時,於滑槽264的壁體可進一步地具有緊固裝置,以限制安裝滑塊182於安裝底座20時於Y方向上的位移,並且緊固安裝滑塊182於滑槽264與限位擋片22之間。於本實施例中,緊固裝置為來自兩側的螺絲2642。螺絲2642分別從設於兩側的延伸壁1242及凸起部26上的螺孔262並鎖入滑槽264的壁體內直到抵住滑塊凸緣1822。本實施例中如圖1及圖3所示,於兩側分別具有貫穿延伸壁1242及凸起部26的三道螺孔262,於本實施例中僅於兩側分別鎖入一個螺絲2642。螺絲2642與螺孔262的數量並無限制,可視所需而適度增減。Refer to Figure 3. When the mounting slider 182 is positioned along the chute, the displacement in the X direction is restricted by the chute 264/limit baffle 22 (the L-shaped middle strip portion), and the displacement in the Z direction is also received by the limit stop 22 (L-shaped short strip part) is limited. At this time, the wall of the sliding groove 264 may further have fastening means for restricting the displacement of the mounting slider 182 in the Y direction when the base 20 is mounted, and fastening the mounting slider 182 to the sliding groove 264 and the limit. Between the flaps 22. In the present embodiment, the fastening means are screws 2642 from both sides. The screws 2642 are respectively locked from the extending holes 1242 of the both sides and the screw holes 262 on the bosses 26 and locked into the wall of the sliding groove 264 until they abut against the slider flange 1822. In this embodiment, as shown in FIG. 1 and FIG. 3, there are three screw holes 262 extending through the extending wall 1242 and the protruding portion 26 on both sides. In the embodiment, only one screw 2642 is locked on both sides. The number of the screw 2642 and the screw hole 262 is not limited, and may be appropriately increased or decreased as needed.

以下,配合滾鍍設備1中的其他配置,來說明本案的固定式陰極導電裝置10如何發揮作用。請參考圖5,滾鍍設備1包括鍍槽2、複數個頂部樑4、複數個旋轉滾筒6、複數個旋轉傳動裝置G及複數個固定式陰極導電裝置10。沿著鍍槽2的長度方向配置複數個橫向延伸的頂部樑4,每條頂部樑4裝載兩個旋轉滾筒6,圖5即為其中一頂部樑4的橫向剖面示意圖。頂部樑4設置有用於乘載旋轉滾筒6及旋轉傳動裝置G的承載台42,如圖所示,乘載台42的剖面具有倒Y字形,其兩側分別具有一個旋轉滾筒6及一組旋轉傳動裝置G。固定式陰極導電裝置10透過固定部12固定於頂部樑4上。當組裝好固定式陰極導電裝置10於頂部樑4上之後,固定式陰極導電裝置10即以特定的角度深入旋轉滾筒6中,以此狀態下,旋轉滾筒6及固定式陰極導電裝置10藉著頂部樑4於鍍槽的高度方向上的移動而跟著移動。Hereinafter, how the fixed cathode conductive device 10 of the present invention functions will be described in conjunction with other configurations in the barrel plating apparatus 1. Referring to FIG. 5, the barrel plating apparatus 1 includes a plating tank 2, a plurality of top beams 4, a plurality of rotating drums 6, a plurality of rotating transmissions G, and a plurality of fixed cathode conductive devices 10. A plurality of laterally extending top beams 4 are disposed along the length of the plating tank 2, and each of the top beams 4 is loaded with two rotating drums 6, and FIG. 5 is a schematic transverse cross-sectional view of one of the top beams 4. The top beam 4 is provided with a carrying platform 42 for carrying the rotating drum 6 and the rotary transmission G. As shown, the cross section of the loading platform 42 has an inverted Y shape with a rotating drum 6 and a set of rotations on both sides thereof. Transmission G. The fixed cathode conductive device 10 is fixed to the top beam 4 through the fixing portion 12. After the fixed cathode conductive device 10 is assembled on the top beam 4, the fixed cathode conductive device 10 is deep into the rotating drum 6 at a specific angle. In this state, the rotating drum 6 and the stationary cathode conductive device 10 are The top beam 4 moves in the height direction of the plating tank and follows.

於本實施例中,旋轉傳動裝置G為具有第一齒輪G1、第二齒輪G2及傾斜配置的底座齒輪G3的傳動組合。旋轉滾筒6傾斜地固定於底座齒輪G3上,三個齒輪配置為互相連動,當受到馬達驅動時,依序牽動第一齒輪G1、第二齒輪G2及底座齒輪G3並使其旋轉,並且連帶地使配置於底座齒輪G3上的旋轉滾筒6旋轉。In the present embodiment, the rotary transmission G is a transmission combination having a first gear G1, a second gear G2, and a tilt-configured base gear G3. The rotary drum 6 is obliquely fixed to the base gear G3, and the three gears are disposed to interlock with each other. When driven by the motor, the first gear G1, the second gear G2, and the base gear G3 are sequentially rotated and rotated, and The rotary drum 6 disposed on the base gear G3 rotates.

於本實施例中,該旋轉滾筒6的側壁為濾網,鍍液經由濾網進入或是排出旋轉滾筒6。此外,該旋轉滾筒6的上方具有滾筒開口6o,固定式陰極導電裝置10從旋轉滾筒6的外側經由滾筒開口6o伸入該旋轉滾筒6中。工作物於旋轉滾筒6內的鍍液中滾動時,受到固定式陰極導電裝置10中鍍頭電極部16(參考圖1)導通而於工作物表面形成金屬鍍膜。In the present embodiment, the side wall of the rotary drum 6 is a sieve, and the plating solution enters or discharges the rotary drum 6 via the sieve. Further, the rotary drum 6 has a drum opening 6o above it, and the stationary cathode conductive device 10 projects into the rotary drum 6 from the outside of the rotary drum 6 via the drum opening 6o. When the workpiece rolls in the plating solution in the rotary drum 6, the plated electrode portion 16 (refer to FIG. 1) in the fixed cathode conductive device 10 is turned on to form a metal plating film on the surface of the workpiece.

固定式陰極導電裝置10由旋轉滾筒6的外側經由滾筒開口6o而深入旋轉滾筒6中。由於固定式陰極導電裝置10的剛性套管部18包覆並固定導線部14,因此可以確保其端部的鍍頭電極部16不會隨旋轉滾筒6而旋轉,於滾鍍過程中始終保持於既定的位置上,進一步地確保了穩定的滾鍍環境。The stationary cathode conductive device 10 is deeply penetrated into the rotary drum 6 by the outside of the rotary drum 6 via the drum opening 6o. Since the rigid sleeve portion 18 of the fixed cathode conductive device 10 covers and fixes the lead portion 14, it is ensured that the plated electrode portion 16 at the end thereof does not rotate with the rotating drum 6, and is always maintained during the barrel plating process. The stable position of the barrel is further ensured in the established position.

參考表1,實施例1為於定電流(17A)狀況下,如圖5所示之滾鍍設備中具有本創作之固定陰極導電裝置10;比較例1為於定電流(17A)狀況下,使用習知的軟性導線取代圖5滾鍍設備中的固定陰極導電裝置10,其餘條件同於實施例1。如表1所示,於使用本創作之固定陰極導電裝置10的實施例1中,獲得了較為穩定的電壓,壓差較小,因此能夠提供穩定電流分布之滾鍍環境,進而獲得較為均勻的鍍層。   [表1] <TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td> </td><td> 比較例1 </td><td> 實施例1 </td></tr><tr><td> 電流 </td><td> 17A </td><td> 17A </td></tr><tr><td> 電壓 </td><td> 6.2~7.1V </td><td> 6.3~6.6V </td></tr><tr><td> 壓差 </td><td> 0.9V </td><td> 0.3V </td></tr></TBODY></TABLE>Referring to Table 1, Embodiment 1 is in the case of constant current (17A), the barrel plating apparatus shown in FIG. 5 has the fixed cathode conductive device 10 of the present invention; in Comparative Example 1, in the case of constant current (17A), The fixed cathode conductive device 10 in the barrel plating apparatus of Fig. 5 was replaced with a conventional flexible wire, the same conditions as in the first embodiment. As shown in Table 1, in the first embodiment using the fixed cathode conductive device 10 of the present invention, a relatively stable voltage is obtained, and the pressure difference is small, so that a barrel plating environment for stabilizing current distribution can be provided, thereby obtaining a relatively uniform Plating. [Table 1]  <TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td> </td><td> Comparative Example 1 </td><td> Example 1 < /td></tr><tr><td> Current </td><td> 17A </td><td> 17A </td></tr><tr><td> Voltage </td>< Td> 6.2~7.1V </td><td> 6.3~6.6V </td></tr><tr><td> Pressure difference </td><td> 0.9V </td><td> 0.3 V </td></tr></TBODY></TABLE>

本創作在上文中已以較佳實施例揭露,然熟習本項技術者應理解的是,該實施例僅用於描繪本創作,而不應解讀為限制本創作之範圍。應注意的是,舉凡與該實施例等效之變化與置換,均應設為涵蓋於本創作之範疇內。因此,本創作之保護範圍當以申請專利範圍所界定者為準。The present invention has been disclosed in the above preferred embodiments, and it should be understood by those skilled in the art that the present invention is only intended to depict the present invention and should not be construed as limiting the scope of the present invention. It should be noted that variations and permutations equivalent to those of the embodiments are intended to be included within the scope of the present invention. Therefore, the scope of protection of this creation is subject to the definition of the scope of patent application.

1‧‧‧滾鍍設備1‧‧‧Rolling equipment

2‧‧‧鍍槽 2‧‧‧ plating tank

4‧‧‧頂部樑 4‧‧‧Top beam

6‧‧‧旋轉滾筒 6‧‧‧Rotating drum

6o‧‧‧滾筒開口 6o‧‧‧Roller opening

10‧‧‧固定式陰極導電裝置 10‧‧‧Fixed cathodic conductive device

12‧‧‧固定部 12‧‧‧ Fixed Department

122‧‧‧懸掛部 122‧‧‧ hanging section

124‧‧‧基座部 124‧‧‧Base section

1242‧‧‧延伸壁 1242‧‧‧Extension wall

14‧‧‧導線部 14‧‧‧Wire Department

16‧‧‧鍍頭電極部 16‧‧‧Headed electrode part

18‧‧‧剛性套管部 18‧‧‧Rigid casing

182‧‧‧安裝滑塊 182‧‧‧Installation slider

1822‧‧‧滑動凸緣 1822‧‧‧Sliding flange

1824‧‧‧中央突出部 1824‧‧‧Central Highlights

184‧‧‧保持部 184‧‧‧ Keeping Department

20‧‧‧安裝底座 20‧‧‧Installation base

22‧‧‧限位擋片 22‧‧‧Limited Blanks

22o‧‧‧開口 22o‧‧‧ openings

24‧‧‧彈性電極 24‧‧‧Elastic electrode

242‧‧‧受載電極 242‧‧‧Loaded electrodes

242c‧‧‧環形弧面 242c‧‧‧Circular curved surface

242f‧‧‧平面部 242f‧‧‧Flat Department

244‧‧‧彈簧 244‧‧ ‧ spring

26‧‧‧凸起部 26‧‧ ‧ raised parts

262‧‧‧螺孔 262‧‧‧ screw holes

264‧‧‧滑槽 264‧‧ ‧ chute

2642‧‧‧螺絲(緊固裝置) 2642‧‧‧ Screws (fastening device)

42‧‧‧乘載台 42‧‧‧Loading platform

G‧‧‧旋轉傳動裝置 G‧‧‧Rotary transmission

G1‧‧‧第一齒輪 G1‧‧‧First gear

G2‧‧‧第二齒輪 G2‧‧‧second gear

G3‧‧‧底座齒輪 G3‧‧‧ base gear

X、Y、Z‧‧‧方向 X, Y, Z‧‧ Direction

[圖1]係本創作一實施例之固定式陰極導電裝置的分解示意圖。 [圖2]係本創作一實施例之固定式陰極導電裝置中,於未組合狀態時的彈性電極的側面示意圖。 [圖3]係本創作一實施例之固定式陰極導電裝置的組合示意圖。 [圖4]係本創作一實施例之固定式陰極導電裝置中,於組合狀態時的彈性電極的側面示意圖。 [圖5]係本創作一實施例之固定式陰極導電裝置安裝於滾鍍設備中的示意圖。1 is an exploded perspective view of a fixed cathode conductive device according to an embodiment of the present invention. Fig. 2 is a side view showing the elastic electrode in an uncombined state in the fixed cathode conductive device of the embodiment. Fig. 3 is a schematic view showing the assembly of a fixed cathode conductive device according to an embodiment of the present invention. Fig. 4 is a side view showing the elastic electrode in a combined state in a fixed cathode conductive device according to an embodiment of the present invention. Fig. 5 is a schematic view showing the mounting of a fixed cathode conductive device according to an embodiment of the present invention in a barrel plating apparatus.

Claims (7)

一種固定式陰極導電裝置,包括:   導線部;   鍍頭電極部,與該導線部的前端電連接;   剛性套管部,其末端具有安裝滑塊,該安裝滑塊具有滑動凸緣,該導線部受到該剛性套管部包覆及固定,該鍍頭電極部設置於該剛性套管部的前端,該安裝滑塊與該導線部的後端電連接;   安裝底座,其具有滑槽、限位擋片及彈性電極,該安裝滑塊設置於該滑槽,該安裝滑塊的滑動凸緣限位於該限位擋片,該彈性電極電接觸該安裝滑塊。A fixed cathode conductive device comprises: a wire portion; a plate head electrode portion electrically connected to a front end of the wire portion; a rigid sleeve portion having a mounting slider at an end thereof, the mounting slider having a sliding flange, the wire portion Covered and fixed by the rigid sleeve portion, the plating head electrode portion is disposed at a front end of the rigid sleeve portion, and the mounting slider is electrically connected to a rear end of the lead portion; the mounting base has a sliding slot and a limit The sliding piece and the elastic electrode are disposed on the sliding slot, and the sliding flange of the mounting slider is limited to the limiting blocking piece, and the elastic electrode electrically contacts the mounting sliding block. 如請求項1所述之固定式陰極導電裝置,其中,該滑槽的壁體具有緊固裝置以緊固該安裝滑塊於該滑槽與該限位擋片之間。The fixed cathode conductive device of claim 1, wherein the wall of the chute has fastening means for fastening the mounting slider between the chute and the limiting baffle. 如請求項1所述之固定式陰極導電裝置,其中,該彈性電極包括受載電極以及彈簧,該彈簧頂推該受載電極電接觸該安裝滑塊。The fixed cathode conductive device of claim 1, wherein the elastic electrode comprises a load-bearing electrode and a spring that pushes the load-bearing electrode to electrically contact the mounting slider. 如請求項3所述之固定式陰極導電裝置,其中,該受載電極具有平面部以電接觸該安裝滑塊。The fixed cathode conductive device of claim 3, wherein the load-bearing electrode has a flat portion to electrically contact the mounting slider. 如請求項4所述之固定式陰極導電裝置,其中,該受載電極具有環形弧面以連接該平面部的周緣。The fixed cathode conductive device of claim 4, wherein the loaded electrode has an annular curved surface to connect the circumference of the planar portion. 如請求項1所述之固定式陰極導電裝置,其中,該限位擋片具有L形剖面形狀,該安裝滑塊的滑動凸緣由該限位擋片頂部的開口置入該滑槽並限位於該限位擋片內。The fixed cathode conductive device of claim 1, wherein the limiting baffle has an L-shaped cross-sectional shape, and the sliding flange of the mounting slider is placed in the chute by the opening at the top of the limiting baffle and is limited to Inside the limit stop. 如請求項1所述之固定式陰極導電裝置,其中,更包括一固定部連接於該安裝底座。The fixed cathode conductive device of claim 1, further comprising a fixing portion connected to the mounting base.
TW107216760U 2018-12-10 2018-12-10 Fixing type cathode conductive device TWM576171U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114790565A (en) * 2022-05-26 2022-07-26 江苏启威星装备科技有限公司 Conductive device and horizontal electroplating equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114790565A (en) * 2022-05-26 2022-07-26 江苏启威星装备科技有限公司 Conductive device and horizontal electroplating equipment

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