TWM574332U - Light source system - Google Patents

Light source system Download PDF

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Publication number
TWM574332U
TWM574332U TW107211710U TW107211710U TWM574332U TW M574332 U TWM574332 U TW M574332U TW 107211710 U TW107211710 U TW 107211710U TW 107211710 U TW107211710 U TW 107211710U TW M574332 U TWM574332 U TW M574332U
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Taiwan
Prior art keywords
lens
light beam
source system
light source
light
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TW107211710U
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Chinese (zh)
Inventor
陳朝鐘
彭政偉
沈信民
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勤友光電股份有限公司
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Application filed by 勤友光電股份有限公司 filed Critical 勤友光電股份有限公司
Priority to TW107211710U priority Critical patent/TWM574332U/en
Priority to CN201821798971.5U priority patent/CN208969412U/en
Publication of TWM574332U publication Critical patent/TWM574332U/en

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Abstract

A light source system including a light emitting device, a first lens, and a second lens is provided. The light emitting device is adapted to provide a light beam. The first lens is disposed on a transmission path of the light beam. The second lens is disposed on the transmission path of the light beam. The first lens is located between the light emitting device and the second lens, wherein the light beam is transmitted in a first direction through the first lens, and the light beam is transmitted in a second direction by the reflection of the second lens. The first direction is different from the second direction.

Description

光源系統Light source system

本新型創作是有關於一種光學系統,且特別是有關於一種光源系統。 The novel creation is related to an optical system, and in particular to a light source system.

在目前製作半導體元件的技術中,由於半導體元件的尺寸逐漸變小,因此在製作過程中常使用暫時性接合製程,將半導體元件透過黏著層接合至暫時基板以方便半導體元件的製作。當半導體元件製作完成時,則對黏著層照射雷射光以進行半導體元件與暫時基板的分離製程。 In the current technology for fabricating a semiconductor device, since the size of the semiconductor device is gradually reduced, a temporary bonding process is often used in the fabrication process, and the semiconductor device is bonded to the temporary substrate through the adhesive layer to facilitate fabrication of the semiconductor device. When the fabrication of the semiconductor device is completed, the adhesive layer is irradiated with laser light to perform a separation process between the semiconductor device and the temporary substrate.

一般而言,提供雷射光的裝置必須配置平場透鏡組(F-Theta lenses)以使雷射光可順利照射至半導體元件處的一平面上。然而,這將使得提供雷射光的裝置體積無法縮小。若需要照射大面積的樣品,則將使得裝置體積過於龐大。除此之外,在尺寸較小的半導體元件中,目前雷射裝置的應用範圍也越來越受尺寸因素限制,例如是尺寸較小的半導體元件容易有翹曲的問題。因此,如何設計出可不需配置平場透鏡組以減少體積,且同時可避免半導體元件翹曲而降低精準度的光源裝置,是本領域技 術人員致力於研究的。 In general, devices that provide laser light must be equipped with F-Theta lenses so that the laser light can be smoothly illuminated onto a plane at the semiconductor component. However, this will make it impossible to reduce the volume of the device providing the laser light. If you need to illuminate a large area of the sample, it will make the device too bulky. In addition, in the semiconductor components having a small size, the application range of the current laser device is more and more limited by the size factor, for example, the semiconductor element having a small size is prone to warpage. Therefore, how to design a light source device that can eliminate the need to configure a flat field lens group to reduce the volume while avoiding the warpage of the semiconductor component and reducing the accuracy is The surgeon is committed to research.

本新型創作提供一種光源系統,可進行大面積照射而不需額外配置平場透鏡組,且能減少設備體積。 The novel creation provides a light source system that can perform large-area illumination without the need to additionally configure a flat field lens group, and can reduce the size of the device.

本新型創作的光源系統包括一發光裝置、一第一鏡頭以及一第二鏡頭。發光裝置適於提供一光束。第一鏡頭設置於光束的傳遞路徑上。第二鏡頭設置於光束的傳遞路徑上。第一鏡頭位在發光裝置與第二鏡頭之間,其中光束經第一鏡頭沿一第一方向傳遞,光束經第二鏡頭的反射而沿一第二方向傳遞。第一方向不同於第二方向。 The light source system created by the present invention comprises a light emitting device, a first lens and a second lens. The illumination device is adapted to provide a light beam. The first lens is disposed on the transmission path of the light beam. The second lens is disposed on the transmission path of the light beam. The first lens is located between the illuminating device and the second lens, wherein the light beam is transmitted through the first lens in a first direction, and the light beam is transmitted in a second direction through the reflection of the second lens. The first direction is different from the second direction.

在本新型創作的一實施例中,上述的第一方向垂直於第二方向。 In an embodiment of the novel creation, the first direction is perpendicular to the second direction.

在本新型創作的一實施例中,上述的發光裝置為雷射裝置。 In an embodiment of the present invention, the light emitting device is a laser device.

在本新型創作的一實施例中,上述的光束經第二鏡頭反射至一投影空間。 In an embodiment of the present invention, the light beam is reflected by a second lens to a projection space.

在本新型創作的一實施例中,上述的第一鏡頭調整光束在投影空間中水平方向的焦點位置。 In an embodiment of the novel creation, the first lens adjusts a focus position of the light beam in a horizontal direction in the projection space.

在本新型創作的一實施例中,上述的第二鏡頭調整光束在投影空間中垂直方向的焦點位置。 In an embodiment of the novel creation, the second lens adjusts a focus position of the light beam in a vertical direction in the projection space.

在本新型創作的一實施例中,上述的光源系統符合公式 (1)A>40B以及(2)2B>C>0,其中A為光束與投影空間中一參考面之間的距離,B為第一鏡頭與第二鏡頭之間的距離,C為投影空間中垂直於參考面的距離。 In an embodiment of the novel creation, the above light source system conforms to a formula (1) A>40B and (2)2B>C>0, where A is the distance between the beam and a reference plane in the projection space, B is the distance between the first lens and the second lens, and C is the projection space. The distance perpendicular to the reference plane.

在本新型創作的一實施例中,上述的第一鏡頭包括一聚焦鏡組,適於在光束的傳遞路徑上移動以調整光束的焦點位置。 In an embodiment of the novel creation, the first lens includes a focusing lens group adapted to move on a transmission path of the light beam to adjust a focus position of the light beam.

在本新型創作的一實施例中,上述的光源系統還包括一控制器,電性連接於第一鏡頭,適於控制聚焦鏡組在光束的傳遞路徑上移動。 In an embodiment of the present invention, the light source system further includes a controller electrically connected to the first lens and adapted to control the movement of the focusing lens group on the transmission path of the light beam.

在本新型創作的一實施例中,上述的第二鏡頭包括一第一反射裝置及一第二反射裝置,其中第一反射裝置適於沿第二方向轉動以調整光束的焦點位置,第二反射裝置適於沿第一方向轉動以調整光束的焦點位置。 In an embodiment of the present invention, the second lens includes a first reflecting device and a second reflecting device, wherein the first reflecting device is adapted to rotate in the second direction to adjust the focus position of the light beam, and the second reflection The device is adapted to rotate in a first direction to adjust a focus position of the beam.

在本新型創作的一實施例中,上述的光源系統還包括一控制器,電性連接於第二鏡頭,適於控制第一反射裝置沿第二方向轉動,以及控制第二反射裝置沿第一方向轉動。 In an embodiment of the present invention, the light source system further includes a controller electrically connected to the second lens, adapted to control the first reflecting device to rotate in the second direction, and to control the second reflecting device to be along the first The direction is rotated.

基於上述,在本新型創作的實施例中,發光裝置,適於所提供的光束藉由第一鏡頭沿第一方向傳遞,以及藉由第二鏡頭的反射而沿不同於第一方向的第二方向傳遞。因此,不需額外配置平場透鏡組,可進一步降低系統高度而減少設備體積,同時避免容易因系統過高而產生震動的問題。 Based on the above, in the embodiment of the present invention, the illumination device is adapted to transmit the provided light beam in the first direction by the first lens, and in the second direction different from the first direction by the reflection of the second lens Directional delivery. Therefore, there is no need to additionally configure the flat field lens group, which can further reduce the system height and reduce the size of the device, while avoiding the problem that the vibration is easily generated due to the system being too high.

為讓本新型創作的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the present invention will become more apparent and understood from the following description.

10‧‧‧目標物 10‧‧‧ Targets

50‧‧‧校正元件 50‧‧‧Correction component

60‧‧‧導光元件 60‧‧‧Light guiding elements

100‧‧‧電子裝置 100‧‧‧Electronic devices

110‧‧‧發光裝置 110‧‧‧Lighting device

120‧‧‧第一鏡頭 120‧‧‧ first shot

122‧‧‧外殼 122‧‧‧Shell

124‧‧‧聚焦鏡組 124‧‧‧ Focusing mirror

130‧‧‧第二鏡頭 130‧‧‧second lens

132‧‧‧第一反射裝置 132‧‧‧First reflection device

134‧‧‧第二反射裝置 134‧‧‧second reflector

D1、D2、D3‧‧‧距離 D1, D2, D3‧‧‧ distance

F1‧‧‧第一方向 F1‧‧‧ first direction

F2‧‧‧第二方向 F2‧‧‧second direction

L‧‧‧光束 L‧‧‧beam

S‧‧‧投影空間 S‧‧‧projection space

圖1為本新型創作一實施例的光源系統的示意圖。 1 is a schematic view of a light source system in accordance with an embodiment of the present invention.

圖2為圖1的第一鏡頭及第二鏡頭的側視示意圖。 2 is a side elevational view of the first lens and the second lens of FIG. 1.

圖3為圖1的第一鏡頭及第二鏡頭的立體示意圖。 3 is a perspective view of the first lens and the second lens of FIG. 1.

圖1為本新型創作一實施例的光源系統的示意圖。請參考圖1,在本實施例中,光源系統100適於提供一光束L,並控制光束L進行樣品定位、掃描偵測或是進行清除、分離等製程。以下將以進行分離製程為例說明,但本新型創作並不限於此。 1 is a schematic view of a light source system in accordance with an embodiment of the present invention. Referring to FIG. 1, in the embodiment, the light source system 100 is adapted to provide a light beam L, and control the light beam L for sample positioning, scanning detection, or cleaning, separation, and the like. The separation process will be described as an example below, but the novel creation is not limited thereto.

光源系統100包括一發光裝置110、一第一鏡頭120以及一第三鏡頭130。發光裝置110適於提供光束L,而第一鏡頭120及第二鏡頭130設置於光束L的傳遞路徑上,且第一鏡頭120位在發光裝置110與第二鏡頭130之間。換句話說,發光裝置110所提供的光束L依序傳遞通過第一鏡頭120及第二鏡頭130並由第二鏡頭130照射出光束L至一目標物上。 The light source system 100 includes a light emitting device 110, a first lens 120, and a third lens 130. The light emitting device 110 is adapted to provide the light beam L, and the first lens 120 and the second lens 130 are disposed on the transmission path of the light beam L, and the first lens 120 is located between the light emitting device 110 and the second lens 130. In other words, the light beam L provided by the illuminating device 110 is sequentially transmitted through the first lens 120 and the second lens 130 and the second lens 130 illuminates the light beam L onto a target.

具體而言,光源裝置100例如是配置於光學平台上,且還包括校正元件50、導光元件60等光學元件以輔助光源裝置100所提供光束L的品質。校正元件50例如是校準透鏡組、束流收集器或雷射功率衰減器等光學元件,其中雷射功率衰減器可進一步 用以調整雷射功率。導光元件60例如是分光鏡或反光鏡等光學元件。然而,本新型創作並不限於此。 Specifically, the light source device 100 is disposed, for example, on an optical table, and further includes optical elements such as the correction element 50 and the light guiding element 60 to assist the quality of the light beam L provided by the light source device 100. The correcting element 50 is, for example, an optical component such as a calibration lens group, a beam current collector or a laser power attenuator, wherein the laser power attenuator can further Used to adjust the laser power. The light guiding element 60 is, for example, an optical element such as a beam splitter or a mirror. However, the novel creation is not limited to this.

圖2為圖1的第一鏡頭及第二鏡頭的側視示意圖。請參考圖1至圖2,在本實施例中,發光裝置110例如為雷射裝置,以提供出雷射光束。光束L經第一鏡頭120沿一第一方向F1傳遞,光束L經第二鏡頭130的反射而沿一第二方向F2傳遞,而第一方向F1不同於第二方向F2。在本實施例中,第一方向F1垂直於第二方向F2。如此一來,可使光束L經第一鏡頭120傳遞至第二鏡頭130,再藉由第二鏡頭130投射並聚焦至目標物10上,進而進行照射而不需額外配置平場透鏡組而減少設備體積。 2 is a side elevational view of the first lens and the second lens of FIG. 1. Referring to FIG. 1 to FIG. 2, in the embodiment, the light emitting device 110 is, for example, a laser device to provide a laser beam. The light beam L is transmitted through the first lens 120 in a first direction F1, and the light beam L is transmitted through the second lens 130 in a second direction F2, and the first direction F1 is different from the second direction F2. In the present embodiment, the first direction F1 is perpendicular to the second direction F2. In this way, the light beam L can be transmitted to the second lens 130 via the first lens 120, and then projected and focused by the second lens 130 onto the object 10, thereby performing illumination without additional configuration of the flat field lens group to reduce the device. volume.

在本實施例中,光束L依序經過第一鏡頭120及第二鏡頭130後,由第二鏡頭130發出並聚焦至目標物10所在的一投影空間S中。目標物10例如是半導體元件,半導體元件例如是以黏著層黏合的晶圓和暫時基板,因此可利用光束L在目標物10上掃描照射黏著層以使晶圓與暫時基板分離,進而完成半導體元件的分離製程,但本新型創作並不限於此。所謂投影空間S是指光束L可進行聚焦產生實質效果的空間。第一鏡頭120適於調整光束L在投影空間S中垂直方向(即垂直於目標物10的延伸方向)的焦點位置,而第二鏡頭130適於調整光束L在投影空間S中垂直水平方向(即平行於目標物10的延伸方向)的焦點位置。 In this embodiment, the light beam L passes through the first lens 120 and the second lens 130 in sequence, and is emitted by the second lens 130 and focused into a projection space S where the object 10 is located. The target 10 is, for example, a semiconductor element. For example, the semiconductor element is a wafer and a temporary substrate bonded by an adhesive layer. Therefore, the light beam L can be used to scan the adhesive layer on the target 10 to separate the wafer from the temporary substrate, thereby completing the semiconductor element. Separation process, but the creation of this novel is not limited to this. The projection space S refers to a space in which the light beam L can be focused to produce a substantial effect. The first lens 120 is adapted to adjust a focus position of the light beam L in a vertical direction in the projection space S (ie, perpendicular to the extending direction of the object 10), and the second lens 130 is adapted to adjust the vertical direction of the light beam L in the projection space S ( That is, the focus position parallel to the extending direction of the object 10).

如此一來,由於第一鏡頭120可將光束L聚焦在投影空間S中垂直方向上的不同位置。因此,可適應於不同尺寸或不同 厚薄程度的目標物10,進一步提升對黏著層照射雷射光以進行晶圓與暫時基板的分離製程的精準度。除此之外,在結構較薄的半導體元件中,也可藉由第一鏡頭120對焦於黏著層中較靠近暫時基板的一側進行分離製程,以避免晶圓因照射到光束L而受損。 As such, since the first lens 120 can focus the light beam L at different positions in the vertical direction in the projection space S. Therefore, it can be adapted to different sizes or different The thickness of the target 10 further enhances the precision of the laser beam illuminating the adhesion layer to separate the wafer from the temporary substrate. In addition, in the thin semiconductor device, the first lens 120 can be focused on the side of the adhesive layer closer to the temporary substrate to prevent the wafer from being damaged by the irradiation of the light beam L. .

值得一提的是,在本實施例中,光源系統100中的第一鏡頭120、第二鏡頭130以及目標物10的相對位置互相相關。詳細而言,光源系統100符合公式:(1)A>40B以及(2)2B>C>0,其中A為光束L與投影空間S中一參考面E之間的距離D1(及光源系統100至目標物10的工作距離),B為第一鏡頭120與第二鏡頭130之間的距離D2,C為投影空間S中垂直於參考面E的距離D3。舉例而言,A例如為1164毫米、B例如為20毫米且C例如為30毫米或為10毫米。因此,在本實施例中,可依據目標物10及其所需進行照射空間(即投影空間S)而調整第一鏡頭120、第二鏡頭130以及目標物10的相對位置。 It is worth mentioning that in the present embodiment, the relative positions of the first lens 120, the second lens 130, and the object 10 in the light source system 100 are related to each other. In detail, the light source system 100 conforms to the formula: (1) A>40B and (2)2B>C>0, where A is the distance D1 between the light beam L and a reference plane E in the projection space S (and the light source system 100) The working distance to the target 10), B is the distance D2 between the first lens 120 and the second lens 130, and C is the distance D3 perpendicular to the reference plane E in the projection space S. For example, A is, for example, 1164 mm, B is, for example, 20 mm and C is, for example, 30 mm or 10 mm. Therefore, in the present embodiment, the relative positions of the first lens 120, the second lens 130, and the object 10 can be adjusted in accordance with the object 10 and its required illumination space (ie, the projection space S).

圖3為圖1的第一鏡頭及第二鏡頭的立體示意圖。請參考圖1至圖3,詳細而言,第一鏡頭120包括一外殼122及一聚焦鏡組124,聚焦鏡組124配置於外殼122內以使光束L進入第一鏡頭120內而通過聚焦鏡組124。因此,可藉由調整聚焦鏡組124在外殼122內沿光束L的傳遞路徑上前後位置,調整光束L在投影空間S中垂直方向的焦點位置。 3 is a perspective view of the first lens and the second lens of FIG. 1. Referring to FIG. 1 to FIG. 3 , in detail, the first lens 120 includes a housing 122 and a focusing lens set 124 . The focusing lens assembly 124 is disposed in the housing 122 to allow the light beam L to enter the first lens 120 and pass through the focusing mirror. Group 124. Therefore, the focus position of the light beam L in the vertical direction in the projection space S can be adjusted by adjusting the front and rear positions of the focusing mirror group 124 in the transmission path of the light beam L in the casing 122.

第二鏡頭130包括一第一反射裝置132及一第二反射裝置134,其中第一反射裝置132適於沿第二方向F2轉動以調整光 束L的焦點位置,而第二反射裝置134適於沿第一方向F1轉動以調整光束L的焦點位置。具體而言,第一反射裝置132及第二反射裝置134例如是反射鏡與馬達。因此,可藉由馬達驅動反射鏡以在一軸上旋轉,進而反射光束L。換句話說,在進行提供光束L時,實際上僅第二鏡頭130內的第一反射裝置132及第二反射裝置134高速移動。在本實施例中,光束L先經由第二反射裝置134的反射至第一反射裝置132,再經由第一反射裝置132反射至目標物10。 The second lens 130 includes a first reflecting device 132 and a second reflecting device 134, wherein the first reflecting device 132 is adapted to rotate in the second direction F2 to adjust the light. The focus position of the bundle L, and the second reflecting means 134 is adapted to rotate in the first direction F1 to adjust the focus position of the light beam L. Specifically, the first reflecting device 132 and the second reflecting device 134 are, for example, a mirror and a motor. Therefore, the mirror L can be rotated by the motor to drive the mirror to reflect the light beam L. In other words, when the light beam L is supplied, only the first reflecting means 132 and the second reflecting means 134 in the second lens 130 are actually moved at a high speed. In the present embodiment, the light beam L is first reflected by the second reflecting device 134 to the first reflecting device 132 and then reflected to the target 10 via the first reflecting device 132.

由於發光裝置110所發出的光束L可藉由第一鏡頭120的聚焦鏡組124調整投影空間S中垂直方向的焦點位置,以及藉由第一反射裝置132及第二反射裝置134調整投影空間S中水平方向的焦點位置。因此,發光裝置110所發出的光束L可在投影空間S中進行立體掃描或對焦。除此之外,由於不需額外配置平場透鏡組,因此可進一步降低系統高度而減少設備體積,同時避免容易因系統過高而產生震動的問題。 The light beam L emitted by the light-emitting device 110 can adjust the focus position in the vertical direction of the projection space S by the focusing mirror group 124 of the first lens 120, and adjust the projection space S by the first reflecting device 132 and the second reflecting device 134. The focus position in the horizontal direction. Therefore, the light beam L emitted from the light-emitting device 110 can be stereoscopically scanned or focused in the projection space S. In addition, since there is no need to additionally configure the flat field lens group, the system height can be further reduced to reduce the size of the device, and at the same time avoid the problem that the system is too high to generate vibration.

在一些實施例,光源系統100還可包括一控制器,電性連接於第一鏡頭120及第二鏡頭130,以使使用者透過控制器控制第一鏡頭120的聚焦鏡組124在光束L的傳遞路徑上移動,或控制第二鏡頭130的第一反射裝置132沿第二方向F2轉動,以及控制第二鏡頭130的第二反射裝置134沿第一方向F1轉動。因此,可藉由自動化的操作提高光源系統100對目標物進行掃描的效果。 In some embodiments, the light source system 100 further includes a controller electrically connected to the first lens 120 and the second lens 130 to enable the user to control the focusing lens group 124 of the first lens 120 in the light beam L through the controller. Moving on the transfer path, or controlling the first reflecting means 132 of the second lens 130 to rotate in the second direction F2, and controlling the second reflecting means 134 of the second lens 130 to rotate in the first direction F1. Therefore, the effect of the light source system 100 scanning the target can be improved by an automated operation.

綜上所述,在本新型創作的實施例中,發光裝置,適於 所提供的光束藉由第一鏡頭沿第一方向傳遞,以及藉由第二鏡頭的反射而沿不同於第一方向的第二方向傳遞。因此,不需額外配置平場透鏡組,可進一步降低系統高度而減少設備體積,同時避免容易因系統過高而產生震動的問題。 In summary, in the embodiment of the novel creation, the light-emitting device is suitable for The provided light beam is transmitted in a first direction by the first lens and in a second direction different from the first direction by reflection of the second lens. Therefore, there is no need to additionally configure the flat field lens group, which can further reduce the system height and reduce the size of the device, while avoiding the problem that the vibration is easily generated due to the system being too high.

雖然本新型創作已以實施例揭露如上,然其並非用以限定本新型創作,任何所屬技術領域中具有通常知識者,在不脫離本新型創作的精神和範圍內,當可作些許的更動與潤飾,故本新型創作的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the novel creation, and any person skilled in the art can make some changes without departing from the spirit and scope of the novel creation. Retouching, the scope of protection of this new creation is subject to the definition of the scope of the patent application attached.

Claims (11)

一種光源系統,包括:一發光裝置,適於提供一光束;一第一鏡頭,設置於該光束的傳遞路徑上;以及一第二鏡頭,設置於該光束的傳遞路徑上,該第一鏡頭位在該發光裝置與該第二鏡頭之間,其中該光束經該第一鏡頭沿一第一方向傳遞,該光束經該第二鏡頭的反射而沿一第二方向傳遞,該第一方向不同於該第二方向。 A light source system comprising: a light emitting device adapted to provide a light beam; a first lens disposed on the transmission path of the light beam; and a second lens disposed on the transmission path of the light beam, the first lens position Between the illuminating device and the second lens, wherein the light beam is transmitted through the first lens in a first direction, and the light beam is transmitted in a second direction by reflection of the second lens, the first direction being different The second direction. 如申請專利範圍第1項所述的光源系統,其中該第一方向垂直於該第二方向。 The light source system of claim 1, wherein the first direction is perpendicular to the second direction. 如申請專利範圍第1項所述的光源系統,其中該發光裝置為雷射裝置。 The light source system of claim 1, wherein the light emitting device is a laser device. 如申請專利範圍第1項所述的光源系統,其中該光束經該第二鏡頭反射至一投影空間。 The light source system of claim 1, wherein the light beam is reflected by the second lens to a projection space. 如申請專利範圍第4項所述的光源系統,其中該第一鏡頭調整該光束在該投影空間中水平方向的焦點位置。 The light source system of claim 4, wherein the first lens adjusts a focus position of the light beam in a horizontal direction in the projection space. 如申請專利範圍第4項所述的光源系統,其中該第二鏡頭調整該光束在該投影空間中垂直方向的焦點位置。 The light source system of claim 4, wherein the second lens adjusts a focus position of the light beam in a vertical direction in the projection space. 如申請專利範圍第4項所述的光源系統,其中該光源系統符合公式(1)A>40B以及(2)2B>C>0,其中A為該光束與該投影空間中一參考面之間的距離,B為該第一鏡頭與該第二鏡頭之間的距離,C為該投影空間中垂直於該參考面的距離。 The light source system of claim 4, wherein the light source system conforms to the formulas (1) A>40B and (2)2B>C>0, wherein A is between the light beam and a reference plane in the projection space. The distance between B is the distance between the first lens and the second lens, and C is the distance perpendicular to the reference surface in the projection space. 如申請專利範圍第1項所述的光源系統,其中該第一鏡頭包括一聚焦鏡組,適於在該光束的傳遞路徑上移動以調整該光束的焦點位置。 The light source system of claim 1, wherein the first lens comprises a focusing lens adapted to move on a transmission path of the light beam to adjust a focus position of the light beam. 如申請專利範圍第8項所述的光源系統,還包括:一控制器,電性連接於該第一鏡頭,適於控制該聚焦鏡組在該光束的傳遞路徑上移動。 The light source system of claim 8, further comprising: a controller electrically connected to the first lens, adapted to control the focusing mirror to move on the transmission path of the beam. 如申請專利範圍第1項所述的光源系統,其中該第二鏡頭包括一第一反射裝置及一第二反射裝置,其中該第一反射裝置適於沿該第二方向轉動以調整該光束的焦點位置,該第二反射裝置適於沿該第一方向轉動以調整該光束的焦點位置。 The light source system of claim 1, wherein the second lens comprises a first reflecting device and a second reflecting device, wherein the first reflecting device is adapted to rotate in the second direction to adjust the light beam In the focus position, the second reflecting means is adapted to rotate in the first direction to adjust the focus position of the light beam. 如申請專利範圍第10項所述的光源系統,還包括:一控制器,電性連接於該第二鏡頭,適於控制該第一反射裝置沿該第二方向轉動,以及控制該第二反射裝置沿該第一方向轉動。 The light source system of claim 10, further comprising: a controller electrically connected to the second lens, adapted to control the first reflecting device to rotate in the second direction, and to control the second reflection The device rotates in the first direction.
TW107211710U 2018-08-28 2018-08-28 Light source system TWM574332U (en)

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