TWM556870U - Grayscale mask, substrate with concave-convex photoresist pattern - Google Patents

Abstract

A gray-scale reticle, a substrate having a concave-grained photoresist pattern, wherein the gray-scale reticle comprises: a reticle substrate; and a micro opaque layer formed on the reticle substrate, the micro opaque layer having a plurality of a set of micro-shielding patterns, each set of micro-shielding patterns is opaque, and a concave-convex texture resist structure can be formed on a photoresist layer of the substrate by an exposure and development process, and the concave-convex texture resist structure is cured a concave-convex texture resist pattern; wherein each of the micro-shaped light-shielding patterns is composed of a plurality of micro-shaped light-shielding portions, and the plurality of light-shielding portions form a plurality of light-transmitting regions, wherein the light-transmitting regions have at least one main light-transmitting region The region and the at least one light transmissive region have a maximum width; the microscopic light shielding portions are selected from the group consisting of a linear shape, a curved shape, a ring shape, an annular shape, or any combination thereof.

Description

Gray scale mask, substrate with concave and convex texture resist pattern

The present invention relates to a reticle, and more particularly to a gray scale reticle, a substrate having a textured texture pattern.

At present, smart devices such as smart phones, smart watches, smart medical devices, etc., are equipped with large screens for users to watch the information on the screen. In addition to their powerful functions, these devices with large screens are gradually becoming personalized and beautiful, including appearance, shape and color. These must be achieved through an impressive shell design and manufacturing.

For the patterning of the smart device housing, there are several methods: the first method: transfer technology. Transfer to the plane or surface of the target through the pre-made plan. The processing cost of such a method is low, but the processing speed is slow, the material cost is high, and the pattern resolution is poor. The second method: inkjet + laser engraving. The pigment is sprayed onto the plane or curved surface of the target by an inkjet method, and the pattern is carved by laser engraving. Such a method has high processing cost and slow processing speed, high equipment cost, and high material cost. The advantage is that the resolution is high, up to 20 um (micrometer).

The above techniques are limited to the planar micropatterning, that is, the pattern is represented only by the two-dimensional micropattern. If you want to make a fine texture with a bumpy texture (three-dimensional) The overall pattern of the pattern structure, there is currently a practice, nano imprint technology. The embossing is performed by a mold of a fine nano-pattern which is prepared in advance, and then a desired three-dimensional fine pattern is produced by exposure and development. The mold cost of such nano imprint technology is extremely high, and the surface of the photoresist material that may be generated after each imprinting is adhered to the mold, resulting in defects on the surface of the photoresist material, and causing mold contamination, so that the next time The sticky condition used is more serious. That is, nanoimprint technology has major drawbacks of high cost and low yield.

Therefore, how to develop a concave and convex fine pattern having both advantages of low processing cost, high processing speed, low material cost, and high resolution has become a development direction that smart device manufacturers are hoping for.

In order to achieve the above object, the present invention provides a gray scale mask, a substrate with a textured texture pattern and a manufacturing method thereof, and uses a gray scale mask and a diffraction effect to fabricate a substrate having a concave-grained photoresist pattern, which has a process Simple, low-cost, high-yield special technical effects.

The present invention provides a gray scale mask for fabricating a substrate having a textured texture pattern comprising: a mask substrate; and a micro light shielding layer formed on the mask substrate, the micro light shielding layer having a plurality of micro-shielding patterns, each set of micro-shielding patterns is opaque, and a concave-convex texture resist structure can be formed on a photoresist layer of the substrate by an exposure and development process, and the concave-convex texture resist structure is hardened The concave-convex texture resist pattern; wherein each of the micro-shaped light-shielding patterns is composed of a plurality of micro-shaped light-shielding portions, and the plurality of light-shielding portions form a plurality of light-transmissive regions, and the light-transmitting regions have at least one main light-transmissive region The light region and the at least one light transmitting region have a maximum width; the micro light shielding portions are selected from the group consisting of a linear shape, a curved shape, and a ring shape. Ring shape or any combination thereof.

The present invention further provides a gray scale mask for fabricating a substrate having a concave texture resist pattern, comprising: a mask substrate; and a micro light shielding layer formed on the mask substrate, the micro light shielding layer Having a complex array of micro-shielding patterns, each set of micro-shielding patterns is opaque and a concave-type textured photoresist structure can be formed on a photoresist layer of the substrate by an exposure and development process, after hardening the concave-type photoresist structure Forming the concave-type texture resist pattern; wherein each set of micro-shaped light-shielding patterns is composed of a plurality of micro-shaped light-shielding portions, and the plurality of light-shielding portions constitute a plurality of light-transmissive portions, and the micro-shaped light-shielding portions have at least one main The light shielding portion and the at least one light shielding portion have a maximum width; and the micro light shielding portions are selected from a linear shape, a curved shape, a ring shape, an annular shape, or any combination thereof.

The invention further provides a substrate with a concave-convex texture resist pattern produced by using the gray scale mask of the present invention, comprising: a substrate; and a concave-convex texture resist pattern permanently formed on the substrate, and the plurality of concave-convex texture lights Resistive structure.

The above and other objects, features, and advantages of the present invention will become more apparent and understood.

1, 3, 5, 7‧‧ ‧ grayscale mask

2,6,8‧‧‧ Partially enlarged grayscale reticle

9A, 9B, 9C, 9D‧‧‧ local

10‧‧‧Substrate

20‧‧‧Miniature shade layer

21, 22, 23‧‧‧ micro-shaped sunshade

30‧‧‧Miniature shade layer

31, 32, 33, 34‧‧‧ micro-shaped shading

40‧‧‧Micro-Shade Pattern

41, 42, 43, 44, 45, 46, 47, 48, 49, 50‧‧‧ micro-shaped shading

60‧‧‧Micro-Shade Pattern

61, 62‧‧‧ micro-shading pattern

70‧‧‧Miniature shade layer

71, 72, 73‧‧‧ micro-shaped shading

81, 82, 83, 84‧‧‧ micro-shaped shading

100A‧‧‧ convex surface texture resist pattern structure

100B‧‧‧ concave surface texture resist pattern structure

101‧‧‧Substrate

111, 112‧‧‧ photoresist layer

D1, D2, D3, D4, D5, D6, D7, D8, D9‧‧ Width

1A-1C is a cross-sectional view, an enlarged cross-sectional view, and a top view of an embodiment of the gray scale mask of the present invention.

1D, an embodiment of the gray scale mask of the present invention using the 1A-1C diagram, at a first light intensity The concave-convex texture resist structure produced underneath.

Fig. 1E shows a concave-convex texture resist structure produced at a second light intensity using the embodiment of the gray scale mask of the present invention in Figs. 1A-1C.

2A-2C is a cross-sectional view, a cross-sectional enlarged view and a top view of another embodiment of the gray scale mask of the present invention.

Fig. 2D is a plan view of a concave-grained photoresist structure produced at a second light intensity using an embodiment of the gray scale mask of the present invention in Figs. 2A-2C.

3A-3B is a partially enlarged plan view, partially enlarged cross-sectional view showing still another embodiment of the gray scale mask of the present invention.

Fig. 3C shows a concave-convex texture resist structure produced at a second light intensity using the embodiment of the gray scale mask of the present invention in Figs. 3A-3B.

4A is a partially enlarged plan view, partially enlarged cross-sectional view showing still another embodiment of the gray scale mask of the present invention.

Fig. 4B is a view showing a concave-convex texture resistive structure produced at a second light intensity using the embodiment of the gray scale mask of the present invention in Fig. 4A.

Fig. 5 is a flow chart showing the method of manufacturing a substrate having a textured texture pattern.

6A and 6B are diagrams showing an embodiment in which a circular arc-shaped concave surface structure can be produced.

Fig. 7 is a partial embodiment of a gray scale mask produced by using a curved micro-shield portion.

According to an embodiment of the present invention, the present invention re-uses the concept of diffraction phenomenon Define a gray scale mask, and by controlling the intensity of the exposure and the distance between the gray scale mask and the photoresist layer to be exposed to fabricate various types of concave and convex texture photoresist structures, after hardening, various types can be obtained. Type of textured texture resist pattern. The novel technology has the special technical effects of low cost, high yield, high resolution, etc., and can fully meet the purpose of future electronic products for surface preparation of various concave and convex textures.

Please refer to FIG. 1A-1C for a cross-sectional view, an enlarged cross-sectional view and a top view of an embodiment of the gray scale mask of the present invention. Hereinafter, the structure of the gray scale mask of the present invention will be described with reference to Figs. 1A-1C.

The gray scale mask 1 of the present invention is used for fabricating a substrate having a concave-convex texture resist pattern, comprising: a substrate 10; and a micro-shielding layer 20. The substrate 10 may be a translucent substrate such as a glass substrate or a plastic substrate. The micro opaque layer 20 is formed on the substrate 10, and the micro opaque layer 20 forms a multi-array micro-shielding pattern. Each set of micro-shielding patterns is opaque and can form a concave-convex texture resist on the substrate 10 by an exposure and development process. The structure forms a textured texture resist pattern after the hardened textured photoresist structure. Each set of micro-shaped light-shielding patterns comprises a plurality of light-transmissive regions between the plurality of micro-shaped light-shielding portions 21, 22, 23, and the light-transmitting regions have at least one main light-transmitting region and at least one light-transmitting region, and the main light-transmitting region The width is the largest. As shown in FIG. 1B, in the partially enlarged gray scale mask 2, the main light transmission area is defined by two micro-shaped light shielding portions 23 having a width D1, and the remaining secondary light transmission areas are respectively formed by the micro light shielding portion 22 The 23 and the micro-shielding portions 21 and 22 are defined by widths D2 and D3, respectively.

The micro-shielding portions are selected from the group consisting of a linear shape, a ring shape, an annular shape, a curved shape, or any combination thereof. In the embodiment of the first A-1C diagram, the micro-shielding portions 21, 22, and 23 are linear. Further, each set of the micro-shielding pattern is composed of two micro-shaped light-shielding portions 21, 22, and 23, that is, the range of the portion 9A of the first B and 1C.

Wherein, the width of the micro-shielding portion may be between 0.5 um and 500 um. In the embodiment of the 1A-1C diagram, the width of the micro-shielding portion 21 is the largest, which can be used as an interface of each set of micro-shielding patterns. The micro-shaped light-shielding part adopts a linear design (linear, ring-shaped, annular, curved, or any combination thereof), and further uses the slit diffraction principle of light to make the diffracted light of the main light-transmissive region having a wide width. The diffracted light with the sub-transmissive region overlaps each other to form a curved surface, or even a circular or spherical light distribution. Thus, by appropriate light intensity and appropriate spacing between the reticle and the substrate, a perfect curved, circular or spherical light distribution can be formed, thereby producing a curved, circular or spherical concave-convex texture resist. Pattern structure. The lower side of FIG. 1B is a circular arc-shaped convex-surface texture resist pattern structure 100A which may be fabricated by using the partially enlarged gray scale mask 2 above the first FIG. 1B, which is composed of the substrate 101 and the photoresist layer 111. In this configuration, the photoresist layer 111 has been exposed to the partially enlarged gray scale mask 2 so that the developed pattern has a circular arc shape.

In the embodiment of FIG. 1A-1C, there is at least one main light transmitting region and at least one second light transmitting region, wherein the width of the main light transmitting region is the largest, and the width of the second light transmitting region is farther from the main light transmitting region, and the width is smaller. . Alternatively, the light transmissive regions have at least one main light transmissive region and a plurality of sub-transparent regions, wherein the width of the main light transmissive region is the largest, and the width of the sub-transparent regions is inversely proportional to the distance of the main light transmissive region.

Wherein, the width of the main light transmission region is between 10 um and 500 um, and the width of the secondary light transmission region is between 0.5 um and 10 um.

Next, please refer to FIG. 1D, which is a photomicrograph of the concave-convex texture resist structure fabricated under the first light intensity (25%) using the embodiment of the gray scale mask of the present invention in FIG. 1A-1C. Figure. Referring to FIG. 1E, a photomicrograph of the textured texture resistive structure produced at the second light intensity (40%) using the embodiment of the gray scale mask of the present invention in FIG. 1A-1C. Comparing the 1D and 1E, it can be found that the surface of the 1E is a straight strip with a smoother and more circular arc effect. The surface; the 1D image presents a straight strip of surface with a jagged surface ripple. These two different structures allow the substrate with the textured photoresist pattern to have different visual effects. The key point is that through the gray scale mask and manufacturing method of the present invention, a high-resolution textured texture pattern can be completed with extremely low cost and process time.

Next, please refer to FIG. 2A-2C for a cross-sectional view, an enlarged cross-sectional view and a top view of another embodiment of the gray scale mask of the present invention. The gray scale mask 3 of the present invention is used for fabricating a substrate having an uneven texture resist pattern, comprising: a substrate 10 and a micro light shielding layer 30. The substrate 10 may be a translucent substrate such as a glass substrate or a plastic substrate. The micro opaque layer 30 is formed on the substrate 10, and the micro opaque layer 30 forms a complex array of micro-shielding patterns. Each set of micro-shielding patterns is opaque and can be formed on the substrate 10 by an exposure and development process. The structure forms a textured texture resist pattern after the hardened textured photoresist structure. Each of the micro-shaped light-shielding patterns is composed of a plurality of micro-shaped light-shielding portions 31, 32, 33, and 34, and the plurality of light-shielding portions 31, 32, 33, and 34 form a plurality of light-transmitting regions, and the light-transmitting regions have At least one main light transmissive region and at least one light transmissive region have a maximum width of the main light transmissive region, which can create a peak of each set of microscopic shading patterns. As shown in FIG. 1B, in the partially enlarged gray scale mask 2, the main light transmission area is defined by the micro light shielding portions 32, 33, and the width thereof is D4, and the remaining secondary light transmission areas are formed by the micro light shielding portion 31, 32, as defined by the micro-shields 33, 34, having a width D5.

In the embodiment of the second A-2C diagram, the micro-shielding portions 31, 32, 33, and 34 are linear. Further, each set of the micro-shielding pattern is composed of the micro-shielding portions 31, 32, 33, and 34, that is, the range shown by the partially enlarged gray-scale mask 4 of FIGS. 2B and 2C.

Next, referring to FIG. 2D, an uneven texture photoresist structure fabricated at a second light intensity (40%) using the embodiment of the gray scale mask of the present invention in FIG. 2A-2C. Compare 1E It can be found from the figure and the 2D figure that the surface of the 1E figure presents a smoother surface with a better arc effect, and the interface width between each arc surface is larger because it has a wider micro-shield portion. The configuration of 21, 28; the 2D figure also presents a smoother surface with better arc effect. These two different structures allow the substrate with the textured photoresist pattern to have different visual effects.

The two embodiments of the first 1A-1E and the second A-2D illustrate the fabrication of the straight-line concave-convex texture resist pattern by using the diffraction principle of the present invention. . Moreover, an arc-shaped concave-convex texture resist pattern can be realized by the minimum transmission area (one main light transmission area and the two first light transmission areas) of the 2A-2D figure. Each set of micro-shading patterns can be formed with a curved effect photoresist pattern by at least one main light-transmissive region and one second light-transmitting region. It should be noted that the photoresist pattern of the present invention is used for a permanent photoresist layer, that is, a photoresist pattern having a visual effect, and is not a photoresist pattern temporarily existing in a semiconductor process.

Next, the present invention will exemplify an embodiment to explain how to fabricate a spherical textured texture pattern.

Please refer to FIG. 3A-3B for a partially enlarged top view and a partial cross-sectional enlarged view of still another embodiment of the partially enlarged gray scale mask 6 of the present invention. It can be seen from Fig. 3A-3B that the novel design of the ring-shaped micro-shielding portions 41, 42, 43, 44, 45, 46, 47, 48, 49, 50 can realize point (center) and ring The resist pattern of the textured texture, as shown in Fig. 3C, is an uneven texture photoresist structure produced at a second light intensity using the embodiment of the gray scale mask of the present invention in Figs. 3A-3B.

Wherein, the width D6 of the main light transmission area is defined by the micro light shielding portions 41, 42; the remaining light transmission areas are defined by the micro light shielding portions 41, 43, the micro light shielding portions 42, 44, ... D6 is narrow. Wherein, the embodiment of FIGS. 4A and 4B is a design including a plurality of main light transmitting regions. That is, the micro-shielding portions 43, 44 are the second main light-transmitting regions, and the width thereof is also larger than the width of the other sub-transmissive regions. In other words, the same micro-shaped light-shielding pattern 40 may have a plurality of main light-transmissive regions, and the widths of each other may be different. But the same is that a main light transmission area will be provided with at least one secondary light transmission area. In this way, a smooth curved surface resistive photoresist structure can be produced by the light diffraction effect.

The first three embodiments illustrate the fabrication of a continuous line of textured textured structures and patterns. By using the novel technology, a non-linear concave-convex texture resist pattern such as a short line or a single point can be produced, which is also realized by applying the principle of slit diffraction.

Referring to FIG. 4A, a top view and a cross-sectional view of still another embodiment of the partially enlarged gray scale mask 8 of the present invention. The micro-shielding pattern 60 is formed by arranging the micro-shielding patterns 61 and 62, wherein the micro-shielding pattern 61 is a pattern formed by a wide central micro-shaped light-shielding portion and two micro-shaped light-shielding portions on both sides. . This results in two wider main light transmissive areas on both sides and two sub-transmission areas of decreasing width. The design of such a micro-shading pattern can produce a short-line groove texture structure as shown in FIG. 4B.

It can be seen from the above various embodiments that the concave-convex texture resistive structure that can be fabricated by the micro-shielding pattern of the present invention may be: a circular arc convex structure, a circular arc concave structure, a semi-spherical convex structure or a half circle. Spherical concave structure. These structures may be continuous or discontinuous, or interlaced, with each other. This is how the different micro-shading patterns are arranged relative to each other.

Therefore, the present invention can produce a substrate having a textured texture pattern comprising: a substrate; and a textured photoresist pattern permanently formed on the substrate and composed of a plurality of textured textured photoresist structures. The concave-convex texture resistive structure is selected from the group consisting of: a circular arc-shaped convex structure, a circular arc-shaped concave structure, a semi-spherical convex structure or a semi-spherical concave structure, and each structure may be a line shape, a curve or a short line. Among them, the minimum of the uneven texture photoresist structure The width is between 0.5um and 500um.

Next, please refer to FIG. 5, a flow chart of a method for manufacturing a substrate having a textured texture pattern.

Step 101: providing a substrate; any type of substrate, plastic substrate, glass substrate, metal substrate, curved substrate.

Step 102: Forming a negative photoresist layer on the substrate; and using the negative photoresist to form a permanent material layer after the exposure and development process, that is, the target of the concave and convex texture pattern effect which the present invention wants to produce.

Step 103: The gray-scale reticle of claim 1 is provided. The gray-scale reticle has a complex array of micro-shielding patterns, and each set of micro-shielding patterns can produce a concave-convex texture resist structure.

Step 104: Adjusting the spacing between the gray scale mask and the negative photoresist layer; the different pitches may also make the diffraction effects different, thereby fabricating the uneven texture photoresist structures of different shapes.

Step 105: Exposure; controlling the exposure intensity, the uneven texture photoresist structures of different shapes can be fabricated.

Step 106: Developing the negative photoresist to form a plurality of textured textured photoresist structures on the substrate.

Step 107: Harden the uneven textured photoresist structures to form a textured textured photoresist pattern on the substrate.

In summary, the substrate with the concave-convex texture resist pattern produced by the gray scale mask of the present invention has special technical effects such as low cost, high yield, high resolution, etc., and can fully satisfy the future electronic products for various bumps and the like. The purpose of the surface of the texture.

Next, please refer to FIGS. 6A and 6B, which is an embodiment of the present invention in which a concave arc-shaped concave structure can be produced. In FIG. 6A, the gray scale mask 5 of the present invention is used to fabricate a substrate having a concave-convex texture resist pattern, comprising: a substrate 10; and a micro-shielding layer 70. The substrate 10 may be a translucent substrate such as a glass substrate or a plastic substrate. The micro opaque layer 70 is formed on the substrate 10, and the micro opaque layer 70 forms a multi-array micro-shielding pattern. Each set of micro-shielding patterns is opaque and can be formed on the substrate 10 by an exposure and development process. The structure forms a textured texture resist pattern after the hardened textured photoresist structure. Each set of micro-shading patterns is formed by a plurality of light-transmissive regions between a plurality of micro-shaped light-shielding portions 71, 72, 73. In order to form the arcuate concave structure of FIG. 7B, the partially enlarged gray scale mask 5 is composed of a main micro-shaped light-shielding portion 71 and a sub-micro-shaped light-shielding portion 72, 73, and the concept thereof is 1A-1E. The opposite of the embodiment of the figure.

The width of the micro-shielding portions 71, 72, 73 may be between 0.5 um and 500 um. In the embodiment of Figs. 6A-6B, the micro-shielding portion 71 is a main shading portion having the largest width, and it is possible to create a trough of each group of micro-shielding patterns. The micro light-shielding portions 71 and 72 define a first light-transmitting portion, and the micro-light-shielding portions 72 and 73 define a second light-transmitting portion, and a third light-transmitting portion is defined between the two micro-shaped light-shielding portions 73. The width of the third light transmitting portion defines the width of the platform of the top end of the two concave curved surfaces.

Similarly, the micro-shaped light-shielding portion adopts a linear design (linear, ring-shaped, annular, curved, or any combination thereof), and then uses the slit diffraction principle of light to allow a wide width of the main light-transmissive region. The diffracted light and the diffracted light of the sub-transmissive region overlap each other to form a convex curved surface light distribution, thereby forming a concave curved texture resist pattern structure, as shown in the lower part of FIG. 6B, that is, a partial enlargement above the first FIG. The arc-shaped concave curved surface texture resist pattern structure 100B which may be fabricated by the gray scale mask 2 is composed of the substrate 101 and the photoresist layer 112, and the photoresist layer 112 has transmitted gray scale light. The exposure of the cover 5 is such that the developed pattern becomes a circular arc-shaped concave curved surface.

Next, please refer to FIG. 7, which is a partial 9D embodiment of the gray scale mask 7 produced by the curved micro-shielding portions 81, 82, 83, 84, which is a line corresponding to the 2Cth diagram. In the embodiment of the micro-shaped light-shielding portion, a curved convex photoresist structure can be fabricated. Similarly, by adjusting the light intensity, curved convex photoresist structures of different textures can be produced. The curved shape can also be applied to the corresponding embodiments of the 1A-1E, 3A, 3C, and 4A-4B drawings.

Although the technical content of the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the present invention, and any modifications and refinements made by those skilled in the art without departing from the spirit of the present invention should be encompassed by the present invention. Therefore, the scope of protection of this new type is subject to the definition of the scope of the patent application.

Claims (15)

A gray scale mask for fabricating a substrate having a textured texture pattern comprising: a mask substrate; and a micro light shielding layer formed on the mask substrate, the micro light shielding layer having a complex array a light-shielding pattern, each set of micro-shielding patterns is opaque, and a concave-convex texture resist structure can be formed on a photoresist layer of the substrate by an exposure and development process, and the concave-convex texture is formed after hardening the concave-convex texture resist structure a photoresist pattern; wherein each of the micro-shielding patterns is formed by a plurality of micro-shaped light-shielding portions, and the plurality of light-shielding portions form a plurality of light-transmitting regions, wherein the light-transmitting regions have at least one main light-transmitting region and The width of the main light transmission region is at least once, and the micro light shielding portions are selected from a linear shape, a curved shape, a ring shape, an annular shape, or any combination thereof. The gray-scale reticle of claim 1, wherein the width of the main light-transmissive region is between 10 um and 500 um, and the width of the second light-transmitting region is between 0.5 um and 10 um. The gray-scale reticle of claim 1, wherein the micro-shaped opaque portions have a width of between 0.5 um and 500 um. The gray-scale reticle of claim 1, wherein the light-transmitting regions have at least one main light-transmitting region and a plurality of light-transmitting regions, wherein the width of the main light-transmitting region is the largest, and the width of the light-transmitting regions The further away from the main light transmission area, the smaller the width. The gray-scale reticle of claim 1, wherein the light-transmitting regions have at least one main light-transmitting region and a plurality of light-transmitting regions, wherein the width of the main light-transmitting region is the largest, and the width of the light-transmitting regions It is inversely proportional to the distance of the main light transmitting region. The grayscale reticle of claim 1, wherein the exposure and development processes are further controlled by the micro The uneven texture resist structure is formed by the distance between the light shielding layer and the substrate. The gray scale mask of claim 1, wherein the exposure and development processes further fabricate the textured texture photoresist structure by controlling an exposure time of the micro light shielding layer and the substrate. The gray-scale reticle of claim 1, wherein the plurality of concave-grained photoresist structures are selected from the group consisting of: a circular arc convex structure, a circular arc concave structure, and a half spherical ball Convex structure or half sphere concave structure. A gray-scale reticle for fabricating a substrate having a concave texture resist pattern, comprising: a reticle substrate; and a micro opaque layer formed on the reticle substrate, the micro opaque layer having a complex array a light-shielding pattern, each set of micro-shielding patterns is opaque, and a concave-type texture resist structure can be formed on a photoresist layer of the substrate by an exposure and development process, and the concave-shaped grain resist structure is hardened to form the concave pattern The photoresist pattern is formed by arranging a plurality of micro-shaped light-shielding portions, and the plurality of light-shielding portions are formed with a plurality of light-transmissive portions, the micro-shaped light-shielding portions having at least one main light-shielding portion and at least The primary light shielding portion has a maximum width; the micro light shielding portions are selected from a linear shape, a curved shape, a ring shape, an annular shape, or any combination thereof. The gray-scale reticle of claim 9, wherein the micro-shaped opaque portions have a width of between 0.5 um and 500 um. The gray scale mask of claim 9, wherein the exposure and development processes further fabricate the concave texture photoresist structure by controlling a distance between the micro light shielding layer and the substrate. The gray scale mask of claim 9, wherein the exposure and development processes further fabricate the concave texture photoresist structure by controlling an exposure time of the micro light shielding layer and the substrate. A substrate having a textured texture resist pattern made by using a gray scale mask of claim 1 or 9, comprising: a substrate; and a concave-convex texture resist pattern permanently formed on the substrate, the plurality of concave-convex texture resists Structure. The substrate having a textured texture resist pattern according to claim 13, wherein the uneven textured photoresist structures are selected from the group consisting of: a circular arc convex structure, a circular arc concave structure, a semispherical convex structure, and a half circle Spherical concave structure. The substrate having the textured texture resist pattern according to claim 13, wherein the uneven texture photoresist structure has a minimum width of between 0.5 um and 500 um.