TWM549445U - Substrate processing device - Google Patents

Description

Substrate processing device

The present invention relates to a substrate processing apparatus, and more particularly to a processing apparatus for processing a substrate conveyed in a chamber formed in a device body by a processing liquid.

In the process of the liquid crystal display device or the semiconductor device, the substrate to be transported in the chamber formed in the device body is processed by the processing liquid, for example, the "processing device and processing method for the substrate" disclosed in Taiwan Patent No. I347865. The substrate processing apparatus includes: a device body formed with a chamber processed by the processing liquid; and a conveying roller that transports the substrate along a predetermined direction in the chamber; the main exhaust pipe is located above the substrate and along the substrate The conveying direction is disposed at a central portion in the width direction of the chamber intersecting the conveying direction of the substrate; and a plurality of exhaust pipes are one end connected to the main exhaust pipe and the other end being formed at a wide end end of the chamber The portion is configured to attract the suction port of the ambient gas in the chamber, and is disposed symmetrically in the width direction of the chamber centering on the main exhaust pipe.

In the part of the panel etching process, the protection of acid and acid gas involves personal safety and is one of the main design priorities of the device. However, the processing device of the above substrate is a single-layer protection design. If applied to the etching process, acid and acid are used. Gas may still be spilled and cause harm.

In summary, the creator feels that the above defects can be improved, and he has devoted himself to research and cooperates with the application of academics, and finally proposes a design that is reasonable in design and effective in improving the above defects.

The technical problem to be solved by the present invention is to provide a substrate processing device which adopts a double-layer cover design, and double protection can avoid the industrial safety event of acid and acid gas leakage.

In order to solve the above technical problem, the present invention provides a substrate processing apparatus, comprising: a device body having a chamber formed therein; at least one inner layer cover having a cover disposed at an upper end of the chamber, the at least one inner layer Forming a first exhaust passage under the cover; and at least one outer cover disposed at an upper end of the chamber, the at least one outer cover being disposed above the at least one inner cover, the at least one outer cover and the outer cover A second exhaust passage is formed between the at least one inner cover, and the device body can be evacuated through the first exhaust passage and the second exhaust passage.

Preferably, the method further includes at least one air guiding device, wherein the at least one air guiding device communicates with the first exhaust passage and the second exhaust passage to pass the first exhaust passage and the second exhaust passage And the at least one air guiding device performs pumping.

Preferably, the at least one air guiding device comprises an air guiding tube, and one end of the air guiding tube is provided with a first opening, the first opening is in communication with the first exhaust passage, and the air guiding tube is provided with a second opening. The second opening is in communication with the second exhaust passage. The air guiding tube has a tapered shape, and the diameter of the air guiding tube is expanded toward the chamber.

The beneficial effects of this creation:

The upper end of the chamber of the main body of the authoring device is covered with an inner layer cover and an outer layer cover to form a double-layer cover design, and the double protection can avoid the industrial safety event of acid and acid gas leakage. Furthermore, in addition to the pumping through the first exhaust passage, the interior of the chamber is additionally provided with a second exhaust passage between the inner cover and the outer cover for pumping to ensure that the acid gas does not overflow. .

In order to further understand the features and technical contents of the present invention, please refer to the following detailed description and drawings of the present invention. However, the drawings are only for reference and explanation, and are not intended to limit the creation.

1‧‧‧ device body

11‧‧‧ chamber

12‧‧‧ input port

13‧‧‧Outlet

14‧‧‧First exhaust passage

15‧‧‧Second exhaust passage

16‧‧‧ vent

2‧‧‧ inner cover

3‧‧‧ outer cover

4‧‧‧Gas guide

41‧‧‧ air duct

42‧‧‧ first opening

43‧‧‧second opening

44‧‧‧ pipe joint

45‧‧‧Exhaust gas adjustment mechanism

451‧‧‧ door panel

452‧‧‧rails

453‧‧‧ fixing screws

46‧‧‧Ventilation adjustment mechanism

461‧‧‧ Cover

462‧‧‧Locking screws

463‧‧ ‧ chute

1 is a perspective view of the substrate processing apparatus of the present invention.

2 is a perspective view showing a portion of an outer cover of a substrate processing apparatus of the present invention.

Fig. 3 is a side view of the substrate processing apparatus of the present invention.

4 is a cross-sectional view of the substrate processing apparatus of the present invention.

Fig. 5 is a perspective view (1) of the internal structure of the substrate processing apparatus of the present invention.

Fig. 6 is a perspective view (2) of the internal structure of the substrate processing apparatus of the present invention.

Fig. 7 is a plan view showing the internal structure of the substrate processing apparatus of the present invention.

Figure 8 is a perspective view of the creation of the pumping adjustment mechanism.

Figure 9 is a perspective view of the creation ventilation adjustment mechanism.

The embodiments of the present invention substrate processing apparatus will be described below by way of specific specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in the present specification. The present invention may also be implemented or applied by other specific examples. The details of the present specification may also be based on different viewpoints and applications, and various modifications and changes may be made without departing from the spirit of the present invention. The drawing of this creation is only a brief description, and is not depicted in actual size, that is, the actual size of the relevant composition is not reflected, which will be described first. The following embodiments further illustrate the views of the present work, but do not limit the scope of the creation by any point of view.

[First Embodiment]

Referring to FIG. 1 to FIG. 4 , the present invention provides a substrate processing apparatus, and more particularly to a processing apparatus for processing a substrate conveyed in a chamber formed in a device body by using a processing liquid, the substrate processing apparatus including a device body 1 , at least one The inner cover 2 and at least one outer cover 3.

The device body 1 is a hollow body. The inside of the device body 1 is formed with a chamber 11 , that is, a plurality of chambers 11 are formed in the substrate body 1 in the substrate conveying direction, and the upper ends of the chambers 11 are Form an opening. Moving along the substrate in the chamber 11 A transport mechanism (not shown) may be provided in the transport direction, and the transport mechanism may be a plurality of transport rollers provided at intervals, and the transport rollers may be rotationally driven to advance the transport substrate in the transport direction. A plurality of nozzles (not shown) may be provided in the chamber 11 to spray the treatment liquid onto the substrate for processing. The opposite sides of the device body 1 are respectively provided with a population 12 and an output port 13. The input port 12 and the output port 13 have an elongated opening for the substrate to pass through. The input port 12 and the output port 13 communicate with the chamber 11 to input the substrate to be processed into the interior of the chamber 11 via the input port 12, and the processed substrate is then outputted outward through the output port 13.

The inner cover 2 may be provided with one or more. In the embodiment, the inner cover 2 is provided in plurality so that the inner cover 2 can be separately opened and covered. The inner cover 2 may have a square cover. The shape of the inner cover 2 is not limited. The inner cover 2 is placed at the upper end of the chamber 11 to close the upper end of the chamber 11 to avoid the chamber 11. The acid and acid inside are overflowing. One or more first exhaust passages 14 may be formed below the inner cover 2, and the first exhaust passage 14 is located within the chamber 11.

The outer cover 3 may be provided with one or more. In the embodiment, the outer cover 3 is provided in plurality, so that the outer cover 3 can be separately opened and covered. The outer cover 3 may have a square cover. The shape of the outer cover 3 is not limited. The outer cover 3 is placed at the upper end of the chamber 11 to close the upper end of the chamber 11 to avoid acid in the chamber 11. Liquid and acid gas overflow. The outer cover 3 is disposed above the inner cover 2, and one or more second exhaust passages 15 are formed between the outer cover 3 and the inner cover 2. When the device body 1 is evacuated, the chamber 11 can be The acid solution and the acid gas are discharged through the first exhaust passage 14, and if the acid liquid or the acid gas in the chamber 11 overflows between the inner layer cover 2 and the outer layer cover 3, the second exhaust gas can be passed through the second exhaust gas. The passage 15 is discharged.

The inner cover 2 and the outer cover 3 may also be disposed in an inclined manner, that is, one side of the inner cover 2 and the outer cover 3 may form a high point, and the opposite side may form a low point to cause condensation to adhere to the inner layer. The liquid on the cover 2 or the outer cover 3 can flow to a low point to have a water guiding function, so that the outer cover 3 or the inner cover 2 can maintain transparency, so that the operator can observe the substrate processing condition inside the device outside the device.

The substrate processing apparatus of the present invention may further include at least one air guiding device 4, the air guiding device 4 is in communication with the first exhaust passage 14 and the second exhaust passage 15, and the air guiding device 4 is connectable to the air extracting device. So that the first exhaust passage 14, the second exhaust passage 15 and the air guiding device 4 are pumped, so that the acid and acid gas in the chamber 11 can pass through the air guiding device 4 along the first exhaust passage 14. And guiding to the factory side; further, if the acid and acid gas in the chamber 11 overflow to the inner cover 2 and the outer cover 3, the second exhaust passage 15 can be guided. Lead to the factory side.

Referring to FIG. 5 to FIG. 7 , in the embodiment, a plurality of air guiding devices 4 are disposed, and the air guiding devices 4 are disposed on the same side of the device body 1 , that is, the air guiding devices 4 can be disposed on the same. The apparatus body 1 is not provided with one side of the input port 12 and the output port 13. The air guiding device 4 includes an air guiding tube 41. The air guiding tube 41 is a hollow body. One end of the air guiding tube 41 is provided with a first opening 42. The first opening 42 communicates with the first exhaust passage 14, and the first opening 42 can be The square holes are formed, but the shape of the first opening 42 is not limited. The air guiding tube 41 is provided with a second opening 43, the second opening 43 is in communication with the second exhaust passage 15, and the second opening 43 is provided in plurality. The second openings 43 can be disposed at the top of the air guiding tube 41. The second opening 43 may have a circular hole, but the shape of the second opening 43 is not limited.

The air guiding tube 41 can be tapered, that is, the diameter of the air guiding tube 41 can be expanded toward the direction of the chamber 11, so that the air guiding tube 41 has a bell mouth shape, thereby making the gas flow smooth and without dead angle, and can increase the number The area of an opening 42 for improving the efficiency of the exhaust. The other end of the air guiding tube 41 can be connected to a suitable air suction device through a pipe joint 44 and a pipe.

The inner end cover 2 and the outer cover 3 are disposed at the upper end of the chamber 11 of the main body 1 of the authoring device to form a double-layer cover design, and the double protection can avoid the industrial safety event of acid and acid gas leakage. Furthermore, in the interior of the chamber 11 of the present invention, in addition to being evacuated through the first exhaust passage 14, a second exhaust passage 15 is additionally provided between the inner cover 2 and the outer cover 3 for pumping to ensure Acid gas will not overflow.

[Second embodiment]

Referring to FIG. 8 , the present invention can further provide an air suction adjusting mechanism 45 at the first opening 42 of the air guiding tube 41 , which can be used to adjust the ventilation amount of the first opening 42 . The air suction adjusting mechanism 45 can include a door panel 451 disposed at the first opening 42 of the air guiding tube 41. Both sides of the door panel 451 can be slidably fitted to the two sliding rails 452, so that the door panel 451 can move up and down. Adjustment, thereby adjusting the ventilation amount of the first opening 42, so that the pumping effect in the chamber 11 is more uniform. A fixing screw 453 is screwed to both sides of the door panel 451, and the door panel 451 can be fixed to the two rails 452 when the door panel 451 is adjusted.

[Third embodiment]

Referring to FIG. 9, the present invention may further include at least one vent 16 on one side of the device body 1 (as shown in FIGS. 1 and 2). In this embodiment, a plurality of vents 16 are provided, and the vents are provided. The mouth 16 is provided on the side of the apparatus body 1 opposite to the air guiding device 4, and a ventilation adjusting mechanism 46 may be provided at the venting port 16 for adjusting the ventilation amount of the venting port 16. The venting adjustment mechanism 46 can include a cover 461, and the cover 461 is movably disposed at the vent 16 . For example, the cover 461 can be fitted with a locking screw 462 on both sides thereof, and the two locking screws 462 are slidably engaged with The two sliding slots 463 of the device body 1 enable the cover plate 461 to be moved up and down to control the opening and closing of the venting opening 16 of the cover plate 461, and can also be used to adjust the ventilation of the venting opening 16 so that the chamber The pumping effect in 11 is better. When the adjustment of the cover 461 is completed, the cover 461 can be fixed by the tightening of the locking screw 462.

Finally, in another embodiment of the present invention, it is the same as that of FIG. 4, except that the first exhaust passage 14 and the second exhaust passage 15 are individually connected to the factory end by independent pipelines.

The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of patent protection of the present invention. Therefore, equivalent changes made by using the present specification and the contents of the drawings are all included in the scope of protection of the present invention. Inside.

1‧‧‧ device body

13‧‧‧Outlet

16‧‧‧ vent

2‧‧‧ inner cover

3‧‧‧ outer cover

4‧‧‧Gas guide

41‧‧‧ air duct

43‧‧‧second opening

44‧‧‧ pipe joint

Claims (10)

A substrate processing apparatus comprising: a device body having a chamber formed therein; at least one inner layer cover having a cover disposed at an upper end of the chamber, and a first exhaust passage formed below the at least one inner layer cover; And at least one outer cover, the cover is disposed at an upper end of the chamber, the at least one outer cover is disposed above the at least one inner cover, and the at least one outer cover and the at least one inner cover form a second The exhaust passage can pump the device body through the first exhaust passage and the second exhaust passage. The substrate processing apparatus of claim 1, further comprising at least one air guiding device, wherein the at least one air guiding device communicates with the first exhaust passage and the second exhaust passage to pass the first exhaust The passage, the second exhaust passage, and the at least one air guiding device perform pumping. The substrate processing apparatus of claim 2, wherein the at least one air guiding device comprises an air guiding tube, and one end of the air guiding tube is provided with a first opening, and the first opening is in communication with the first exhaust passage, the guiding A second opening is provided in the air pipe, and the second opening is in communication with the second exhaust passage. The substrate processing apparatus according to claim 3, wherein the air guiding tube has a tapered shape, and a diameter of the air guiding tube is expanded toward the chamber. The substrate processing apparatus of claim 3, wherein the second opening is provided in plurality, and the second openings are disposed on a top of the air guiding tube. The substrate processing apparatus of claim 3, wherein the first opening of the air guiding tube is provided with an air suction adjusting mechanism for adjusting the ventilation amount of the first opening. The substrate processing apparatus of claim 6, wherein the air suction adjusting mechanism comprises a door panel, the door panel is disposed at the first opening of the air guiding tube, and the two sides of the door panel are slidably coupled to the two sliding rails, the door panel The fixing screws are screwed on both sides to fix the door panel. The substrate processing apparatus according to claim 1, wherein one side of the apparatus body is provided There is at least one vent, and the at least one vent is provided with a ventilation adjusting mechanism for adjusting the ventilation of the at least one vent. The substrate processing apparatus of claim 8, wherein the ventilation adjustment mechanism comprises a cover plate, the cover plate is disposed at the at least one vent, and the two sides of the cover are fitted with two locking screws, the two The locking screw is slidably engaged with two corresponding sliding slots of the device body, and the cover plate can move the opening and closing of the at least one venting opening, and the cover plate can be fixed by the two locking screws. The substrate processing apparatus of claim 1, wherein the at least one inner layer cover and the at least one outer layer cover are disposed in an inclined shape.