TWM549237U - Continuous deposition device - Google Patents

Abstract

A continuous deposition device comprises: a first fixing chamber having a first fixing unit disposed therein; a first pump coupled with the first fixing chamber to adjust the pressure in the first fixing chamber; a second fixing chamber having a second fixing unit disposed therein, wherein ends of a roll material are fix on the first fixing unit and second fixing unit, respectively; a second pump coupled with the second fixing chamber to adjust the pressure in the second fixing chamber; and a plurality of reaction chambers connected with each other, wherein the upstream of the reaction chambers couple with the first fixing chamber and the downstream of the reaction chambers couple with the second fixing chamber, so as the roll material may pass through the reaction chambers. The reaction chambers provide reactants to deposit on the roll material.

Description

Continuous deposition device

This creation relates to a deposition apparatus, and more particularly to a continuous deposition apparatus.

Vapor deposition processes are widely used in various fields. In chemical vapor deposition reactions, one or more different precursors are exposed to the surface of a substrate to produce a chemical reaction for deposition. Generally, In order to obtain a high-purity product, the pressure is adjusted in the deposition reaction to remove unwanted gases to avoid unnecessary reactions to obtain impurities, so in the process of different reactant deposition, it is often necessary to perform repeated pumping. Vacuum / vacuum breaking step. However, in the development of the deposition process, there is a need to perform a plurality of reactant deposition reactions on the same substrate. If the vacuum/vacuum step is repeated in the conventional method, it may take a lot of time, and the process will also be performed. The steps are complicated. Providing a device capable of performing a plurality of deposition processes in a continuous manner should be advantageous in terms of time cost savings and productivity.

The purpose of the present invention is to provide a continuous deposition apparatus for achieving a continuous process by combining a plurality of deposition chambers, thereby avoiding the need for repeated vacuuming/vacuum steps in a conventional process, thereby saving process time. Improve economic efficiency.

The present invention provides a continuous deposition apparatus comprising: a first holding chamber comprising a first holding member disposed in a first holding chamber; a first pump coupled to the first holding chamber for adjustment a second holding chamber, wherein the second holding chamber is disposed in the second holding chamber, wherein the two ends of the coil are respectively fixed to the first holding member and the second holding member; a second pump connected to the second holding chamber to adjust the pressure of the second holding chamber; a plurality of reaction chambers connected to each other, wherein the upstream side reaction chamber is connected to the first holding chamber, and the downstream side The reaction chamber is coupled to the second holding chamber such that the web continuously passes through the plurality of reaction chambers, and the plurality of reaction chambers respectively provide reactant deposition on the web.

In the following, the specific embodiments and the accompanying drawings are explained in detail, and it is easier to understand the purpose, technical content, characteristics and effects achieved by the present invention.

The various embodiments of the present invention will be described in detail below with reference to the drawings. In addition to the detailed description, the present invention may be widely practiced in other embodiments, and any alternatives, modifications, and equivalent changes of the described embodiments are included in the scope of the present invention. quasi. In the description of the specification, a number of specific details are provided for the reader to have a more complete understanding of the present invention; however, the present invention may be implemented without omitting some or all of the specific details. In addition, well-known steps or elements are not described in detail to avoid unnecessarily limiting the present invention. The same or similar elements in the drawings will be denoted by the same or similar symbols. It is to be noted that the drawings are for illustrative purposes only and do not represent the actual dimensions or quantities of the components. Some of the details may not be fully drawn in order to facilitate the simplicity of the drawings.

Referring to FIG. 1 , a continuous deposition apparatus 100 according to an embodiment of the present invention includes a first holding chamber 11 , a second holding chamber 12 , and a plurality of reaction chambers 30 . The first holding chamber 11 includes a first holding member 21 disposed therein, and the first holding chamber 11 is connected with the first pump 101 for adjusting the pressure of the first holding chamber 11 . The second holding chamber 12 includes a second holding member 22 disposed therein, and the second holding chamber 12 is coupled to the second pump 102 for adjusting the pressure of the second holding chamber 12. The two ends of the coil 40 are respectively fixed to the first holding member 21 and the second holding member 22, and the continuous deposition device 100 further includes at least one third holding member 23 in each of the reaction chambers 31, 32, 33 to support the coil passing through the reaction chamber. Wherein, the third holding member 23 is illustratively shown as a roller, but the creation is not limited thereto, and it may be any shape or element for supporting the coil.

The plurality of reaction chambers 30 may be connected to each other, wherein the reaction chamber 30 on the upstream side may be connected to the first holding chamber 11, and the reaction chamber 30 on the downstream side may be connected to the second holding chamber 12, so that The web 40 continuously passes through a plurality of reaction chambers 30. A plurality of reaction chambers are provided for separately providing reactants (not shown) on the web 40. In an embodiment of the present invention, a plurality of reaction chambers may be subjected to a chemical vapor deposition reaction or a physical vapor deposition reaction. It should be noted that, in the drawings, the reaction chambers are illustratively shown as three. However, the creation is not limited thereto, and the number of reaction chambers may be increased or decreased according to process requirements, and The adjustment of the number of reaction chambers will be described in detail later.

It should be noted that the coil may comprise natural fibers, rayon, non-woven fabric, strainer, synthetic leather, dermis, polyethylene terephthalate (PET), thermoplastic polyurethane. (Thermoplastic Polyurethane, TPU), polyvinyl chloride (PolyVinyl Chloride, PVC), polypropylene (PP), or polytetrafluoroethylene (PTFE), etc., which can be continuously A holding chamber is conveyed through the plurality of reaction chambers to the second holding chamber. For example, the web can be continuously conveyed through tracks, rollers, and the like. It is worth mentioning that the reaction chambers in the continuous deposition apparatus of the present invention are not individually closed but are in communication with each other, thereby being used for continuous deposition of strip materials.

In one embodiment of the present invention, at least one of the plurality of reaction chambers 30 can include a temperature adjustment unit 50 that can adjust the temperature of the web 40 as the web 40 is continuously passed through the reaction chamber 30. For example, the temperature adjustment unit 50 can be a heater or a condenser to heat or cool the web 40.

In the continuous deposition apparatus of the present invention, the reactants provided by the plurality of reaction chambers 30 may be different. For example, when different reactants need to be deposited on the web, the reaction chamber 31 can provide a first reactant on the web, and the reaction chamber 32 can provide a second reactant on the web, while the reaction chamber 33 may provide a third reactant on the web. In another embodiment of the present invention, the reactants provided by the plurality of reaction chambers 30 may be partially identical. For example, reaction chamber 31 can provide a first reactant on the web, reaction chamber 32 can provide a second reactant on the web, and reaction chamber 33 can provide a first reactant on the web. Here, the type of the reactant can be adjusted according to the needs of the user.

When the reactants provided by the adjacent reaction chambers are different, in order to prevent contamination between the reactants, at least one of the plurality of reaction chambers may include an exhaust port 301 disposed in each of the reaction chambers. The outlet end can be used to discharge reactants that are not deposited on the coil, avoiding cross-contamination or interfering with subsequent processes. On the other hand, when different reactants are deposited on the coil, the reaction conditions used may be different, so the continuous deposition apparatus of the present invention may further comprise a third pump 103, which can be connected to a plurality of reactions. At least one of the chambers is configured to adjust a pressure of at least one of the plurality of reaction chambers, and thus, the pressures of the plurality of reaction chambers may be the same, different, or partially identical.

In the continuous deposition apparatus of the present invention, the reaction chamber 30 may further include a connecting member 302, and each of the plurality of reaction chambers 30 may be detachably connected to the first holding chamber and the second holding chamber. Or another reaction chamber. By the arrangement of the above connecting members, the number of reaction chambers can be adjusted in a modular manner, thereby facilitating the increase or decrease of the reaction chamber according to the process requirements.

In the continuous deposition apparatus of the present invention, the first holding chamber 11 and the second holding chamber 12 may respectively include a pair of side members 303 to align the ends of the web 40 with each other, for example, The edge element 303 can include a contralateral eye; in addition, in the present continuous deposition apparatus, the first retention chamber 11 and the second retention chamber 12 each include a tension control element 304 to control the tension of the web 40.

In another embodiment of the present invention, the continuous deposition apparatus further includes at least one gate 305 between the first holding chamber 12 and the reaction chamber 31, between the second holding chamber 12 and the reaction chamber 33, or Between adjacent reaction chambers 31, 32, 33, and web 40 passes through at least one gate 305 and continuously passes through a plurality of reaction chambers 31, 32, 33. It should be noted that the gate 305 is not completely closed, but a gap is left to allow the web 40 to pass through, and by such a design, the effect of avoiding cross-contamination of reactants in different reaction chambers can be simultaneously achieved. In addition, the distance between the first holding chamber and the reaction chamber 31, the second holding chamber and the reaction chamber 33, or two adjacent gates 305 of the adjacent two reaction chambers may be adjusted according to requirements. As shown in Figure 2, it can be used as a buffer to prevent cross-contamination of reactants.

In another embodiment of the present creation, the continuous deposition apparatus 100 may further include a buffer chamber 60, see FIGS. 3A and 3B. The buffer chamber 60 may be disposed between each or any two reaction chambers, or the buffer chamber 60 may be disposed between the reaction chamber and the second holding chamber 12, which may be used to prevent cross-contamination or advantageous reactants. For cooling purposes. The buffer chamber 60 also includes a connector 302 that allows the buffer chamber 60 to be detachably coupled to the reaction chamber or the second holding chamber 11.

In summary, the continuous deposition apparatus of the present invention can perform a continuous deposition process of a plurality of reactants on the strip material, and the pressure of each chamber can be adjusted by pumping connected to each chamber, thereby eliminating the need for Repeated vacuum/vacuum steps allow for continuous deposition of multiple reactants, significantly reducing time costs and simplifying process flow and increasing economics. In addition, the continuous deposition device requested by the author can increase or decrease the number of chambers in a modular manner according to requirements, and can also improve the convenience of the process.

The embodiments described above are only for explaining the technical idea and characteristics of the present invention, and the purpose thereof is to enable those skilled in the art to understand the contents of the present invention and implement them according to the scope of the patent. That is, the equivalent changes or modifications made by the people in accordance with the spirit revealed by this creation should still be covered by the scope of the patent of this creation.

11‧‧‧First holding chamber
12‧‧‧Second holding chamber
21‧‧‧First holding element
22‧‧‧Second holding element
23‧‧‧ Third holding element
30, 31, 32, 33‧‧‧ reaction chamber
40‧‧‧ coil
50‧‧‧Temperature adjustment unit
60‧‧‧buffer chamber
100‧‧‧Continuous deposition apparatus
101‧‧‧First pump
102‧‧‧second pump
103‧‧‧ third pump
301‧‧‧Exhaust port
302‧‧‧Connecting parts
303‧‧‧ facing components
304‧‧‧Tension control element
305‧‧ ‧ gate

1 is a schematic view of a continuous deposition apparatus in accordance with an embodiment of the present invention. 2 is a partial schematic view of a continuous deposition apparatus in accordance with another embodiment of the present invention. 3A and 3B are schematic views of a continuous deposition apparatus according to another embodiment of the present creation.

11‧‧‧First holding chamber

12‧‧‧Second holding chamber

21‧‧‧First holding element

22‧‧‧Second holding element

23‧‧‧ Third holding element

30, 31, 32, 33‧‧‧ reaction chamber

40‧‧‧ coil

50‧‧‧Temperature adjustment unit

100‧‧‧Continuous deposition apparatus

101‧‧‧First pump

102‧‧‧second pump

103‧‧‧ third pump

301‧‧‧Exhaust port

302‧‧‧Connecting parts

303‧‧‧ facing components

304‧‧‧Tension control element

305‧‧ ‧ gate

Claims (13)

A continuous deposition apparatus comprising: a first holding chamber comprising a first holding member disposed in the first holding chamber; a first pump coupled to the first holding chamber, To adjust the pressure of the first holding chamber; a second holding chamber, comprising a second holding member disposed in the second holding chamber, wherein two ends of a coil are respectively fixed to the first holding An element and the second holding element; a second pump coupled to the second holding chamber to adjust a pressure of the second holding chamber; and a plurality of reaction chambers connected to each other, wherein the upstream side The reaction chamber is connected to the first holding chamber, and the reaction chamber on the downstream side is connected to the second holding chamber, so that the coil continuously passes through the plurality of reaction chambers, and the plurality of reaction chambers A reactant is separately deposited on the web. The continuous deposition apparatus of claim 1, wherein at least one of the plurality of reaction chambers comprises a temperature adjustment unit for adjusting the temperature of the coil. The continuous deposition apparatus of claim 1, further comprising: at least one third pump connected to at least one of the plurality of reaction chambers to adjust at least one of the plurality of reaction chambers One pressure. The continuous deposition apparatus of claim 1, wherein at least one of the plurality of reaction chambers comprises an exhaust port disposed at an outlet end of the reaction chamber. The continuous deposition apparatus of claim 1, further comprising: a buffer chamber connected to the reaction chamber and the second holding chamber between the plurality of reaction chambers or on the downstream side between. The continuous deposition apparatus of claim 1, wherein the reaction chamber comprises a connecting member, the reaction chamber being detachably connected to the first holding chamber, the second holding chamber or Another such reaction chamber. The continuous deposition apparatus of claim 1, wherein the reactants provided by the plurality of reaction chambers are different or partially identical. The continuous deposition apparatus of claim 1, wherein the plurality of reaction chambers are subjected to chemical vapor deposition or physical vapor deposition. The continuous deposition apparatus according to claim 1, wherein the coil comprises natural fibers, rayon, non-woven fabric, sieve, synthetic leather, dermis, polyethylene terephthalate (Polyethylene Terephthalate). , PET), thermoplastic polyurethane (TPU), polyvinyl chloride (PolyVinyl Chloride, PVC), polypropylene (PP), or polytetrafluoroethylene (PTFE) Ribbon material. The continuous deposition apparatus of claim 1, wherein the pressures of the plurality of reaction chambers are different or partially the same. The continuous deposition apparatus of claim 1, wherein the first holding chamber and the second holding chamber each include a pair of side members to align the ends of the web. The continuous deposition apparatus of claim 1, wherein the first holding chamber and the second holding chamber each comprise a force control element to control the tension of the web. The continuous deposition apparatus of claim 1, further comprising at least one gate between the first holding chamber and the reaction chamber, between the second holding chamber and the reaction chamber, or Between adjacent ones of the reaction chambers, the web passes through the plurality of reaction chambers continuously through the at least one gate.