TWM545912U - Thin optical filter and image sensor comprising the same - Google Patents

Abstract

The object of the present invention is to provide a thin optical filter having a high toughness while maintaining optical characteristics. Provided is a thin optical filter, comprising an optical substrate; an adhesive layer; and an absorbing type near-infrared filtering glass, wherein the adhesive layer is disposed between the thin optical filter and the absorbing type near-infrared filtering glass, and the thickness of the thin optical filter is less than or equal to 150[mu]m. The invention further provides a method for fabricating the thin optical filter, and an image sensor comprising the thin optical filter as described above.

Description

Thin optical filter and image sensor

This creation is about an absorption near-infrared filter, especially for a thin optical filter that can be applied to an image sensor.

Generally, the visible light wavelength range that the human eye can feel is between about 400 nm and 700 nm. The invisible light includes infrared rays having a wavelength between 700 nm and 1200 nm, and ultraviolet rays having a wavelength between 10 nm and 400 nm. Infrared does not affect human visual color, but it is not the case for photographic devices such as cameras, cameras or cell phone cameras. A general photographic lens is provided with a plurality of optical lenses, filters and image sensing components, such as a charge coupled device (CCD) or a complementary metal oxide semiconductor (CMOS), in a lens mount. The image sensing component has high sensitivity. The light wave is in the range of 350 nm to 1200 nm and captures infrared light in invisible light. In order to avoid the influence of infrared light on the image, a filter or filter must be installed in front of the image sensing component to block the infrared light from entering the image sensing component to correct the color shift phenomenon of the image.

In recent years, in order to reduce the thickness and weight of a camera or a mobile phone, it is required to reduce the thickness of the near-infrared absorbing glass (for example, about 150 μm). general The near-infrared absorbing glass is obtained by melting a glass raw material, clarifying, homogenizing, casting, and then cooling, and then cutting, grinding, and polishing into a specific shape. However, since the near-infrared absorbing glass itself has insufficient toughness, it is easy to cause cracking or defecting in the process of thinning, which causes problems such as disadvantageous processing and poor bending strength.

In view of the above, the object of the present invention is to provide a thin optical filter which is thin, has high flexural strength and retains optical characteristics, and a method of manufacturing the thin optical filter.

The present invention provides a thin optical filter comprising: a transparent substrate having a full wavelength transmittance of 90% or more and a flexural strength of 0.5 kgf to 1.5 kgf; an adhesive layer formed on the transparent substrate And the adhesive layer has a viscosity of 200 cps to 480 cps; and an absorption near-infrared filter glass is disposed on the adhesive layer such that the adhesive layer is located between the transparent substrate and the absorption near-infrared filter glass, and The absorption near-infrared filter glass has a flexural strength of from 0.06 kgf to 0.21 kgf, and the thin optical filter has an overall thickness of less than or equal to 150 μm and a flexural strength of from 1.94 kgf to 5.21 kgf.

The present invention provides an image sensor comprising: a lens module comprising a lens and a thin optical filter of the present invention disposed on a light penetration path of the lens; and an image sensing component It is disposed on one side of the lens module such that the thin optical filter is located between the lens and the image sensing element.

This creation uses a layer of adhesive to absorb near-infrared absorbing glass and high resistance. The transparent substrate is combined to enhance the flexural strength of the composite after bonding. The composite material can be reduced in thickness by a general grinding and polishing method to less than or equal to 150 μm while still having high bending strength and retaining optical characteristics, for example, light transmittance at a wavelength of 680 nm to 730 nm without ghosting. The problem.

1, 2, 412‧‧‧ Thin optical filters

10‧‧‧Transparent substrate

20‧‧‧Adhesive layer

20’‧‧‧Materials

30‧‧‧Absorbing near-infrared filter glass

12‧‧‧Organic coating

14‧‧‧First multilayer membrane structure

16‧‧‧Second multilayer film structure

4‧‧‧Image sensor

40‧‧‧Substrate

41‧‧‧Lens module

410‧‧‧ inner casing

411‧‧‧ lens

42‧‧‧Image sensing components

43‧‧‧Outer casing

S1-S5‧‧‧ steps

1 is a schematic structural view of the thin optical filter of the present invention; FIG. 2 is another structural diagram of the thin optical filter of the present invention; and 3A to 3D are steps of a method for manufacturing a thin optical filter. FIG. 3E is a flow chart showing a method of manufacturing the thin optical filter of the present invention; FIG. 4 is a schematic structural view of the image sensor of the present invention; and FIG. 5A and FIG. 5B are diagrams showing the thin optical filter of the present invention. The light transmittance (T%) curve of the sheet and the simple blue glass.

The present invention is fully understood by reference to the following detailed description and exemplary embodiments, which are intended to illustrate non-limiting embodiments of the present invention.

It is to be understood that the structure, the proportions, the size and the like of the drawings are only used in conjunction with the disclosure of the specification for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the present invention. The qualifications, the modification of any structure, the change of the proportional relationship or the adjustment of the size, should not fall under the purpose of the creation and the purpose of the creation, should still fall within the technical content revealed by this creation. Within the scope of coverage. with Terms such as "first", "second", "upper" and "one" as used in this specification are for convenience only, and are not intended to limit the scope of implementation of this creation. Changes or adjustments in their relative relationship are considered to be within the scope of the creation of the creation of the product without substantial changes.

Referring to FIG. 1 , a thin optical filter 1 having a thickness of less than or equal to 150 μm according to one embodiment of the present invention includes: a transparent substrate 10; an adhesive layer 20; and an absorption near-infrared filter glass 30, The adhesive layer 20 is formed between the transparent substrate 10 and the absorption near-infrared filter glass 30.

In one embodiment of the present invention, the thickness of the transparent substrate 10 is 20 to 50 μm, the thickness of the adhesive layer 20 is 0.1 μm to 10 μm, and the thickness of the absorption near-infrared filter glass 30 is 50 μm to 100 μm.

In one embodiment of the present invention, the transparent substrate has a full wavelength transmittance of 90% or more and a flexural strength of 0.5 kgf to 1.5 kgf, and the transparent substrate is selected from glass (for example, white glass, boron). Glass, calcium soda glass, aluminum bismuth glass, alkaline earth bismuth glass, quartz glass or alkali-free glass), glass ceramic, crystal, transparent plastic (for example: optical plastic, such as the following thermoplastic polymer: polymethyl methacrylate (PMMA) ), cycloolefin polymer (COC), cycloolefin polymer (COP), polycarbonate (PC), plastic glass, nylon, ABS, methylpentene, polyetherimide, polystyrene, NAS and For the SAN, it is preferred to use a plastic which does not contain water or absorbs water or hardly absorbs water, such as COC and COP and transparent electro-optic ceramics.

In the thin optical filter of the present invention, the expansion coefficient of the absorption near-infrared filter glass used depends on the transparent substrate used. Preferably, the absorption near-infrared filter glass has a coefficient of thermal expansion (CTE) of 60×10 ^-7 /K to 70×10 ^-7 /K, and the transparent substrate has a thermal expansion coefficient of 7.2×10 ^-6 /K to 30 × 10 ^-6 /K.

In one embodiment of the present invention, the material of the absorption near-infrared filter glass is a fluorophosphate-based infrared filter glass or a phosphate-based infrared filter glass.

The phosphate-based infrared filter glass mainly contains P ₂ O ₅ , and the remaining components are, for example, Al ₂ O ₃ , CuO, SiO ₂ , MgO, CaO, K ₂ O, BaO, Li ₂ O, Nb ₂ O _{5 .} ZnO. In one embodiment, the phosphate-based infrared filter glass mainly comprises 40% to 75% P ₂ O ₅ , 10% to 28% Al ₂ O _{3 ,} and 3% to 8.5% CuO.

The fluorophosphate-based infrared filter glass further includes metal fluorides such as AlF ₃ , NaF, MgF ₂ , CaF ₂ , SrF ₂ and BaF ₂ . In one embodiment, the fluorophosphate-based infrared filter glass comprises P ₂ O ₅ , CuO, and at least one selected from the group consisting of AlF ₃ , NaF, MgF ₂ , CaF ₂ , SrF _{2 ,} and BaF ₂ . Fluoride. The absorption type near-infrared filter glass is subjected to processing procedures such as cutting, grinding, polishing, and cold working as needed.

The absorption near-infrared filter glass of the present invention can be called blue glass, such as the invention patent of the Republic of China No. 200920709 and the invention patent of the Republic of China No. 201200485, the blue glass itself has absorption and transmittance for red light wavelength. Lower characteristics.

In the present invention, the adhesive layer is cured by a crosslinking reaction and/or a polymerization reaction, and the adhesive layer may be selected from the group consisting of polyurethane resin, sol-gel compound, mixed polymer, and polyoxyn (via organic and/or Or inorganic cross-linking), phenolic tree At least one of the group consisting of a fat, an epoxide, a polyamine, a polyimine, an ethylene vinyl acetate (EVA), and a polyester resin. In addition, the compound as an adhesive layer is formulated so that the viscosity of the formed adhesive layer is 200 cps to 480 cps, and the transparent substrate and the absorbing near-infrared filter glass of the present invention are combined to achieve an overall thickness of the thin optical filter less than or When it is equal to 150 μm, it has a flexural strength of 1.94 kgf to 5.21 kgf.

In one embodiment of the present invention, the adhesive layer is an Ultraviolet Glue which cures under ultraviolet light.

2 is a thin optical filter 2 comprising: a transparent substrate 10; an adhesive layer 20; an absorption near-infrared filter glass 30; an organic coating 12; a multilayer film structure 14 and a second multilayer film structure 16 , wherein the transparent substrate 10 is disposed between the adhesive layer 20 and the second multilayer film structure 16 , and the adhesive layer 20 is disposed on the transparent substrate 10 and the absorption type near-infrared filter glass 30, the absorption type near-infrared filter glass 30 is disposed between the adhesive layer 20 and the organic coating layer 12, and the organic coating layer 12 is disposed in the absorption The near-infrared filter glass 30 is between the first multilayer film structure 14.

In the present invention, the organic coating can be formed on the surface of the absorption near-infrared filter glass by mixing an organic dye containing infrared absorption characteristics with a polymer. In operation, the polymer can be formulated into a coating liquid by dissolving or dispersing in a solvent, and an organic pigment is added thereto, and then the coating liquid is directly coated on the absorption near-infrared filter glass, and then dried. An organic coating is formed. Coating methods such as spin coating, gravure coating, spray coating, curtain coating, air knife coating, doctor coating Conventional coating methods such as a method, a reversible roll coating method, and the like. In one embodiment, the organic coating is formed by spin coating. Further, preferably, the thickness of the organic coating layer is from 0.1 μm to 10 μm, and more preferably, the thickness of the organic coating layer is 2 μm.

In a specific embodiment of the present invention, the organic coating layer comprises an organic pigment and a polymer, wherein the organic pigment is selected from the group consisting of an azo compound, a diimonium compound, a dithiophenol metal complex, and a silk flower. At least one of the group consisting of a cyanine compound, a squaraine cyanine compound, and a cyanine compound, and in addition, optical radiation of different wavelength ranges can be absorbed by selecting different organic pigments. The polymer of the organic coating must be capable of retaining the dissolved or dispersed organic pigment, and must also be a transparent material. The material of the polymer may be selected from the group consisting of polyester, polyacrylate, polyolefin, polycarbonate, polycycloolefin. At least one of the group consisting of polyurethane, polyether and polyvinyl butyral. Further, it is preferred to use a crosslinkable polymer, for example, to modify a polymer which is not originally crosslinkable, so that the polymer has a crosslinkable functional group to form a crosslinkable polymer. In another embodiment, the organic coating further comprises a curing agent, such as toluene diisocyanate (TDI), for example, the solidifying agent is present in an amount of 0.1% by weight based on the solid content of the organic coating.

The organic solvent of the coating liquid of the organic coating layer is not particularly limited as long as the organic dye and the polymer are uniformly dissolved or dispersed. Suitable solvents include, for example, alcohols. Isopropanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone and diacetone alcohol; esters such as ethyl acetate, butyl acetate, acetic acid Oxyethyl ester, ethyl acrylate and butyl acrylate; fluorinated alcohols, such as 2,2,3,3-tetrafluoropropanol; hydrocarbons such as hexane, benzene, toluene and xylene; chlorinated hydrocarbons such as dichloromethane, dichloroethane and chloroform. These organic solvents may be used singly or in combination.

In order to uniformly dissolve or disperse the organic dye and the above polymer in an organic solvent, a method of stirring, dispersing, pulverizing, or the like under heating may be employed.

After the coating liquid is applied, the curing is carried out by a conventional curing method such as ultraviolet curing or hot air curing, heater curing and baking. The curing temperature can be adjusted depending on the solvent. In a specific embodiment, it is recommended to use 100 ° C to 140 ° C (± 2 ° C), the curing temperature is preferably controlled within a range of ± 2 ° C with good precision, and the curing time can be determined by the solvent of the coating liquid or The amount of coating was adjusted, and in one aspect, the curing time was 30 minutes.

The multilayer film structure may be an infrared reflective multilayer film, an ultraviolet-infrared reflective multilayer film or an anti-reflective multilayer film. In production, optical characteristics such as spectral transmittance characteristics can be adjusted by designing different refractive indices, different number of layers, and thickness. For example, a multilayer film is formed by alternately laminating materials having a high refractive index and a low refractive index. Structurally, the number of laminated layers is usually 4 to 50 layers, that is, the first multilayer film structure 14 or the second multilayer film structure 16 each comprises a film of 10 to 30 layers, and the infrared reflective multilayer film or In the ultraviolet-infrared reflective multilayer film, the laminated thickness is from 0.2 μm to 5 μm, and in the case of the antireflection multilayer film, the laminated thickness is from 0.2 μm to 5 μm. Generally, the first multilayer film structure 14 and the second multilayer film structure 16 have a thicker, one thinner thickness, and the thin layer is preferably an antireflective multilayer film. Therefore, the thickness of the first multilayer film structure 14 can be greater or smaller than the second multilayer film The thickness of the structure 16 may vary depending on the properties formed, such as an infrared reflective multilayer film, an ultraviolet-infrared reflective multilayer film, or an antireflective multilayer film.

In a specific embodiment, the embodiment of the multilayer film structure is formed on the surface of the organic coating and/or the surface of the absorption near-infrared filter glass by a vapor phase film forming method, and the vapor phase film forming method can utilize various Conventional coating methods, for example, one of various vacuum coating methods such as sputtering, ionization evaporation, electron beam evaporation, and chemical vapor deposition, or a combination thereof, preferably with electron gun evaporation and ion source assist The film is formed into a film.

In one embodiment, the material of each of the layers forming the multilayer film is selected from the group consisting of TiO ₂ , SiO ₂ , Y ₂ O ₃ , MgF ₂ , Al ₂ O ₃ , Nb ₂ O ₅ , AlF ₃ , Bi _{2 .} At least one of the group consisting of O ₃ , Gd ₂ O ₃ , LaF ₃ , PbTe, Sb ₂ O ₃ , SiO, SiN, Ta ₂ Os, ZnS, ZnSe, ZrO ₂ and Na ₃ AlF ₆ . In one embodiment, a cross-stack of TiO ₂ and SiO ₂ is used.

In accordance with the foregoing description, in one embodiment, the first multilayer film structure 14 is an infrared reflective multilayer film or an ultraviolet-infrared reflective multilayer film, and the second multilayer film structure 16 is an antireflective multilayer film. Alternatively, the first multilayer film structure 14 is an anti-reflective multilayer film, and the second multilayer film structure 16 is an infrared reflective multilayer film or an ultraviolet-infrared reflective multilayer film.

In addition to the above layers, a moisture-proof layer, an antistatic layer, an electromagnetic wave sheet layer, a selective absorption filter layer, an undercoat layer or a protective layer, and combinations thereof may be further formed.

In order to obtain the thin optical filter of the present invention, the present invention also provides a method for manufacturing a thin optical filter, the steps of which include: forming an adhesive layer in a transparent manner Between the bright substrate and the absorbing near-infrared filter glass, so that the transparent substrate is combined with the absorbing near-infrared filter glass into a composite material; and the thickness of the absorbing near-infrared filter glass thinning the composite material So that the overall thickness of the composite material is less than or equal to 150 μm. For example, by grinding the surface of the absorbing near-infrared filter glass with respect to the surface of the absorbing near-infrared filter glass and the adhesive layer, the absorbing near-infrared ray of the composite material is thinned. The thickness of the filter glass. Further, the transparent substrate has a full wavelength transmittance of 90% or more and a bending strength of 0.5 kgf to 1.5 kgf.

Referring to Figures 3A to 3E, it is a schematic diagram of the steps of the method for fabricating a thin optical filter. First, as shown in step S1 of FIGS. 3A and 3E, the material 20' forming the adhesive layer is applied to a part of the surface of the absorption near-infrared filter glass 30, and then, as shown in FIGS. 3B and 3E. In step S2, the transparent substrate 10 is slightly bent so that the curved portion is in contact with the material 20', and the material 20' is placed between the absorption near-infrared filter glass 30 and the transparent substrate 10, and then As shown in step 3 of FIG. 3C and FIG. 3E, the contact area of the transparent substrate 10 and the material 20' is gradually increased. Finally, as shown in step 3 of FIG. 3D and FIG. 3E, the ultraviolet light curing material 20' is used to form the adhesive layer 20, so that the transparent substrate 10 is closely bonded to the absorption near-infrared filter glass 30 by the adhesive layer 20. Forming a composite material, and the surface of the absorption near-infrared filter glass 30 that is not in contact with the adhesive layer 20 is generally ground and polished to reduce the overall thickness of the composite material to less than or equal to 150 μm to obtain a thin shape of the present invention. Optical filter.

In a specific embodiment, the thin optical filter prepared by the method of the present invention has a thickness of 20 μm to 50 μm, and the thickness of the adhesive layer is 0.1 μm to 10 μm. The absorption type near infrared ray filter glass The thickness is from 50 μm to 100 μm.

As shown in step S5 of FIG. 3E, according to the manufacturing method of the thin optical filter of the present invention, the T50 is 630 nm to 680 nm, and the average transmittance (T _avg ) of the wavelength range of 700 nm to 725 nm is less than 8% of the organic coating material, the material is uniformly coated on the absorption near-infrared filter glass by spin coating, and the organic coating material is cured by heating at 140 ° C (± 2 ° C) for 30 minutes. An organic coating having a thickness of 2 μm was formed. Then, the first multilayer film structure is formed on the organic coating by electron gun evaporation and ion source auxiliary coating, and the second multilayer film structure is formed on the surface of the transparent substrate not in contact with the adhesive layer, wherein The first multilayer film structure is alternately vapor-deposited with TiO ₂ and SiO ₂ at a thickness of 10 nm to 200 nm to obtain a first multilayer film having a total layer number of 24 layers and a total thickness of 2600 nm, and the second multilayer film structure. The second multilayer film having a total thickness of 18 layers and a total thickness of 2300 nm was obtained by alternately vapor-depositing TiO ₂ and SiO ₂ with a thickness of 10 nm to 200 nm.

The present invention provides an image sensor. As shown in FIG. 4, the image sensor 4 includes a substrate 40, a lens module 41, an image sensing element 42, and an outer casing 43.

The lens module 41 includes an inner casing 410 and a lens 411 disposed in the inner casing 410 and the thin optical filter 412 of the present invention. The thin optical filter 412 is disposed on the lens 411. Light penetration path on. The image sensing component 42 is disposed on one side of the lens module 41, for example, wire bonding and electrically connected to the substrate 40, so that the thin optical filter is located at the lens and image sensing. Between components.

The following is a further description of the features of the present invention by way of specific embodiments, but is not intended to limit the scope of the present invention.

Example

First, a UV water-based glue is applied to a part of the surface of the blue glass so that the curved transparent substrate (white glass) is in contact with the UV water-based glue, so that the UV water-based glue is formed between the blue glass and the white glass, and then The contact area between the white glass and the UV water-based glue gradually increases, and finally the UV water-based glue is cured by ultraviolet light, so that the white glass is tightly combined with the blue glass into a composite material by the UV water-based glue. The surface of the blue glass which is not in contact with the UV water-based glue is subjected to general grinding and polishing to reduce the overall thickness of the composite material to less than or equal to 150 μm to obtain the thin optical filter of the present invention.

In the 150 μm thick thin optical filter prepared in this embodiment, the thickness of the white glass is 50 μm, the thickness of the adhesive layer is 10 μm, the thickness of the blue glass is 90 μm; and the thin optical filter of 120 μm thickness is used. The thickness of the white glass was 50 μm, the thickness of the adhesive layer was 10 μm, and the thickness of the blue glass was 60 μm.

Test case

The split light transmittance (T%) curve of the thin optical filter and the simple blue glass

Fig. 5A is a graph showing the transmittance data of the 150 μm original thin optical filter obtained in the above embodiment and the blue glass of the same thickness (150 μm) at different angles (0 degrees and 30 degrees); The 120 μm thin optical filter produced in the examples and the transmittance data of the same thickness (120 μm) of blue glass at different angles (0 degree and 30 degrees) were used. As can be seen from Figures 5A and 5B, both the thin optical filter and the blue glass of the present embodiment can reduce the average transmittance between 700 nm and 725 nm to 1%, wherein the 5A and 5B are shown. The pattern comprises an organic coating, a first multilayer film structure and a second multilayer film structure on the surface of the thin optical filter and the blue glass, the method comprising the steps of: T50 between 630 nm and 680 nm and a wavelength range of 700 nm The average transmittance (T _avg ) to 725 nm is less than 8% of the organic coating material, and the material is uniformly coated on the absorption near-infrared filter glass and blue glass by spin coating, and then at 140 ° C (±2 ° C) The organic coating material was heat-cured for 30 minutes to form an organic coating having a thickness of 2 μm. Then, the first multilayer film structure is formed on the organic coating by electron gun evaporation and ion source assist coating, and the second multilayer film structure is formed on the transparent substrate and the other side surface of the blue glass, wherein The first multilayer film structure is alternately vapor-deposited with TiO ₂ and SiO ₂ at a thickness of 10 to 200 nm to obtain a first multilayer film having a total layer number of 24 layers and a total thickness of 2600 nm, the second multilayer film. The structure was alternately vapor-deposited with TiO ₂ and SiO ₂ at a thickness of 10 nm to 200 nm to obtain a second multilayer film having a total layer number of 18 layers and a total thickness of 2300 nm.

Flexural strength test

The 150 μm and 120 μm original thin optical filters prepared in the above examples were each cut into three test pieces having a size of 7.2 mm×6.6 mm, and the flexural strength of the test pieces was measured. In addition, measure three thickness pairs It should be the flexural strength of 150 μm and 120 μm blue glass and recorded in Tables 1 and 2 below. The flexural strength can be measured according to the Ring-on-Ring method (ROR) of DIN 52292 or ENTWURF DIN 52300.

As is apparent from the results shown in Tables 1 and 2, the thin optical filter of the presently-created embodiment has a better flexural strength than the simple use of the blue glass.

It can be seen that the thin optical filter of the present invention has better flexural strength in addition to the optical properties of the conventional absorption type near-infrared filter, and overcomes the conventional absorption type near-infrared filter and cannot be processed. Problems such as poor bending strength.

The above embodiments are merely illustrative of the principle of the creation and its efficacy, rather than Used to limit this creation. Any person skilled in the art can modify and change the above embodiments without departing from the spirit and scope of the present invention. Therefore, the scope of protection of this creation should be as listed in the scope of the patent application described later.

1‧‧‧Slim optical filter

10‧‧‧Transparent substrate

20‧‧‧Adhesive layer

30‧‧‧Absorbing near-infrared filter glass

Claims (16)

A thin optical filter comprising: a transparent substrate having a full wavelength transmittance of 90% or more and a bending strength of 0.5 kgf to 1.5 kgf; an adhesive layer formed on the transparent substrate, and The viscosity of the adhesive layer is 200 cps to 480 cps; and the absorption near-infrared filter glass has a flexural strength of 0.06 kgf to 0.21 kgf and is disposed on the adhesive layer such that the adhesive layer is located on the transparent substrate and the absorption Between the near-infrared filter glass, and the thin optical filter has an overall thickness of less than or equal to 150 μm, and the flexural strength is between 1.94 kgf and 5.21 kgf. The thin optical filter according to claim 1, wherein the transparent substrate has a thickness of 20 μm to 50 μm, the adhesive layer has a thickness of 0.1 μm to 10 μm, and the thickness of the absorption near-infrared filter glass is 50 μm to 100 μm. The thin optical filter of claim 1, wherein the material of the transparent substrate comprises glass. The thin optical filter according to claim 1, wherein the absorption near-infrared filter glass comprises a fluorophosphate-based infrared filter glass or a phosphate-based infrared filter glass. The thin optical filter of claim 1, wherein the adhesive layer comprises an ultraviolet curing water-based adhesive. A thin optical filter as described in claim 1 of the patent application, comprising: An organic coating layer is formed on the absorption near-infrared filter glass, and the absorption near-infrared filter glass is interposed between the adhesive layer and the organic coating; the first multilayer film structure is formed on The organic coating layer is disposed between the absorption near-infrared filter glass and the first multilayer film structure; and the second multilayer film structure is formed on the transparent substrate, so that The transparent substrate is sandwiched between the adhesive layer and the second multilayer film structure. The thin optical filter according to claim 6, wherein the organic coating has a center wavelength (T50) of 630 nm to 680 nm and an average transmittance (T _avg ) of a wavelength range of 700 nm to 725 nm. Less than 8%. The thin optical filter of claim 6, wherein the first multilayer film structure is an infrared reflective multilayer film or an ultraviolet-infrared reflective multilayer film, and the second multilayer film structure is an antireflection multilayer membrane. An image sensor comprising: a lens module comprising a lens and a thin optical filter according to claim 1 in a light transmission path of the lens; and an image sensing element; The system is disposed on one side of the lens module such that the thin optical filter is located between the lens and the image sensing element. The image sensor according to claim 9, wherein the transparent substrate has a thickness of 20 μm to 50 μm, the adhesive layer has a thickness of 0.1 μm to 10 μm, and the thickness of the absorption near-infrared filter glass is obtained. It is 50 μm to 100 μm. The image sensor of claim 9, wherein the material forming the transparent substrate comprises glass. The image sensor according to claim 9, wherein the absorption near-infrared filter glass comprises a fluorophosphate-based infrared filter glass or a phosphate-based infrared filter glass. The image sensor of claim 9, wherein the adhesive layer comprises an ultraviolet curing water-based glue. The image sensor of claim 9, comprising: an organic coating formed on the absorption near-infrared filter glass, wherein the absorption near-infrared filter glass is sandwiched between the adhesive layer And between the organic coating; a first multilayer film structure is formed on the organic coating, and the organic coating is sandwiched between the absorption near-infrared filter glass and the first multilayer film structure And a second multilayer film structure formed on the transparent substrate such that the transparent substrate is sandwiched between the adhesive layer and the second multilayer film structure. The image sensor of claim 14, wherein the organic coating has a center wavelength (T50) of 630 nm to 680 nm, and an average transmittance (T _avg ) of the wavelength range of 700 nm to 725 nm is less than 8%. The image sensor of claim 14, wherein the first multilayer film structure is an infrared reflective multilayer film or an ultraviolet-infrared reflective multilayer film, and the second multilayer film structure is an antireflection multilayer film. .