TWM545912U - Thin optical filter and image sensor comprising the same - Google Patents
Thin optical filter and image sensor comprising the same Download PDFInfo
- Publication number
- TWM545912U TWM545912U TW106205910U TW106205910U TWM545912U TW M545912 U TWM545912 U TW M545912U TW 106205910 U TW106205910 U TW 106205910U TW 106205910 U TW106205910 U TW 106205910U TW M545912 U TWM545912 U TW M545912U
- Authority
- TW
- Taiwan
- Prior art keywords
- multilayer film
- glass
- thin optical
- optical filter
- adhesive layer
- Prior art date
Links
Landscapes
- Optical Filters (AREA)
- Laminated Bodies (AREA)
Abstract
Description
本創作係有關於一種吸收式近紅外線濾光片,尤係關於一種可應用於影像感測器之薄型光學濾光片。 This creation is about an absorption near-infrared filter, especially for a thin optical filter that can be applied to an image sensor.
一般人眼可感受之可見光波長範圍約在400nm至700nm之間。不可見光包含波長介於700nm至1200nm間的紅外線,以及波長在10nm至400nm間的紫外線。紅外線對人類的視覺顏色不產生影響,但對於攝影裝置如攝影機、照相機或手機相機而言則非如此。一般攝影鏡頭係在一鏡頭座內部設置複數光學鏡片、濾光片及影像感測元件,例如:電荷耦合裝置(CCD)或互補式金屬氧化半導體(CMOS),影像感測元件敏感度高,對光波的感應範圍為波長350nm至1200nm,可捕捉到不可見光中的紅外線。為避免紅外線影響畫面的呈現,則須在影像感測元件前加裝濾光片或濾鏡以阻隔紅外線進入影像感測元件,以修正影像的色偏現象。 Generally, the visible light wavelength range that the human eye can feel is between about 400 nm and 700 nm. The invisible light includes infrared rays having a wavelength between 700 nm and 1200 nm, and ultraviolet rays having a wavelength between 10 nm and 400 nm. Infrared does not affect human visual color, but it is not the case for photographic devices such as cameras, cameras or cell phone cameras. A general photographic lens is provided with a plurality of optical lenses, filters and image sensing components, such as a charge coupled device (CCD) or a complementary metal oxide semiconductor (CMOS), in a lens mount. The image sensing component has high sensitivity. The light wave is in the range of 350 nm to 1200 nm and captures infrared light in invisible light. In order to avoid the influence of infrared light on the image, a filter or filter must be installed in front of the image sensing component to block the infrared light from entering the image sensing component to correct the color shift phenomenon of the image.
近年來,以相機、手機之薄型化或輕量化為目的,而要求近紅外線吸收玻璃之薄型化(例如150μm左右)。一般 近紅外線吸收玻璃係藉由以下方式獲得:將玻璃原料熔融,經過澄清、均質化後進行澆鑄成形,緩冷後利用切斷、研磨及拋光加工成特定形狀。然而,由於近紅外線吸收玻璃本身的韌性不足,極易在薄型化的過程產生破裂或缺損等現象,導致其不利於加工且抗折強度差等問題。 In recent years, in order to reduce the thickness and weight of a camera or a mobile phone, it is required to reduce the thickness of the near-infrared absorbing glass (for example, about 150 μm). general The near-infrared absorbing glass is obtained by melting a glass raw material, clarifying, homogenizing, casting, and then cooling, and then cutting, grinding, and polishing into a specific shape. However, since the near-infrared absorbing glass itself has insufficient toughness, it is easy to cause cracking or defecting in the process of thinning, which causes problems such as disadvantageous processing and poor bending strength.
有鑑於此,本創作之目的在於提供一種薄型化、具有高抗折强度又可保有光學特性之薄型光學濾光片,以及該薄型光學濾光片之製造方法。 In view of the above, the object of the present invention is to provide a thin optical filter which is thin, has high flexural strength and retains optical characteristics, and a method of manufacturing the thin optical filter.
本創作提供一種薄型光學濾光片,係包括:透明基板,係具有90%以上之全波長穿透率和介於0.5kgf至1.5kgf之抗折強度;黏著層,係形成於該透明基板上,且該黏著層的黏度係200cps至480cps;以及吸收式近紅外線濾光玻璃,係設於該黏著層上,使該黏著層位於該透明基板與該吸收式近紅外線濾光玻璃之間,且該吸收式近紅外線濾光玻璃具有介於0.06kgf至0.21kgf之抗折強度,而令該薄型光學濾光片之整體厚度小於或等於150μm和抗折強度介於1.94kgf至5.21kgf。 The present invention provides a thin optical filter comprising: a transparent substrate having a full wavelength transmittance of 90% or more and a flexural strength of 0.5 kgf to 1.5 kgf; an adhesive layer formed on the transparent substrate And the adhesive layer has a viscosity of 200 cps to 480 cps; and an absorption near-infrared filter glass is disposed on the adhesive layer such that the adhesive layer is located between the transparent substrate and the absorption near-infrared filter glass, and The absorption near-infrared filter glass has a flexural strength of from 0.06 kgf to 0.21 kgf, and the thin optical filter has an overall thickness of less than or equal to 150 μm and a flexural strength of from 1.94 kgf to 5.21 kgf.
本創作復提供一種影像感測器,係包括:鏡頭模組,係包括透鏡及設於該透鏡之光穿透路徑上之本創作所述之薄型光學濾光片;以及影像感測元件,係設於該鏡頭模組之一側,以令該薄型光學濾光片位於該透鏡和影像感測元件之間。 The present invention provides an image sensor comprising: a lens module comprising a lens and a thin optical filter of the present invention disposed on a light penetration path of the lens; and an image sensing component It is disposed on one side of the lens module such that the thin optical filter is located between the lens and the image sensing element.
本創作透過黏著層將近紅外線吸收玻璃與高抗折强 度之透明基板結合,以提升結合後複合材料之抗折强度。該複合材料可利用一般研磨、拋光方式,降低其厚度至小於或等於150μm,同時仍具有高抗折强度且保有光學特性,例如:波長在680nm至730nm之光穿透率,且無產生鬼影之問題。 This creation uses a layer of adhesive to absorb near-infrared absorbing glass and high resistance. The transparent substrate is combined to enhance the flexural strength of the composite after bonding. The composite material can be reduced in thickness by a general grinding and polishing method to less than or equal to 150 μm while still having high bending strength and retaining optical characteristics, for example, light transmittance at a wavelength of 680 nm to 730 nm without ghosting. The problem.
1、2、412‧‧‧薄型光學濾光片 1, 2, 412‧‧‧ Thin optical filters
10‧‧‧透明基板 10‧‧‧Transparent substrate
20‧‧‧黏著層 20‧‧‧Adhesive layer
20’‧‧‧材料 20’‧‧‧Materials
30‧‧‧吸收式近紅外線濾光玻璃 30‧‧‧Absorbing near-infrared filter glass
12‧‧‧有機塗層 12‧‧‧Organic coating
14‧‧‧第一多層膜結構 14‧‧‧First multilayer membrane structure
16‧‧‧第二多層膜結構 16‧‧‧Second multilayer film structure
4‧‧‧影像感測器 4‧‧‧Image sensor
40‧‧‧基板 40‧‧‧Substrate
41‧‧‧鏡頭模組 41‧‧‧Lens module
410‧‧‧內殼體 410‧‧‧ inner casing
411‧‧‧透鏡 411‧‧‧ lens
42‧‧‧影像感測元件 42‧‧‧Image sensing components
43‧‧‧外殼體 43‧‧‧Outer casing
S1-S5‧‧‧步驟 S1-S5‧‧‧ steps
第1圖係本創作薄型光學濾光片之結構示意圖;第2圖係本創作薄型光學濾光片之另一結構示意圖;第3A至3D圖為本創作薄型光學濾光片之製造方法之步驟示意圖,其中,第3E圖係顯示本創作薄型光學濾光片之製造方法流程圖;第4圖係本創作影像感測器之結構示意圖;以及第5A和5B圖係顯示本創作薄型光學濾光片及單純藍玻璃之分光穿透率(T%)曲線。 1 is a schematic structural view of the thin optical filter of the present invention; FIG. 2 is another structural diagram of the thin optical filter of the present invention; and 3A to 3D are steps of a method for manufacturing a thin optical filter. FIG. 3E is a flow chart showing a method of manufacturing the thin optical filter of the present invention; FIG. 4 is a schematic structural view of the image sensor of the present invention; and FIG. 5A and FIG. 5B are diagrams showing the thin optical filter of the present invention. The light transmittance (T%) curve of the sheet and the simple blue glass.
本創作可藉由參照下列詳細說明與例示性實施例而充分了解本創作,該等說明及實施例係用於舉例說明本創作之非限制性具體實施例。 The present invention is fully understood by reference to the following detailed description and exemplary embodiments, which are intended to illustrate non-limiting embodiments of the present invention.
須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本創作可實施之限定條件,任何結構之修飾、比例關係之改變或大小之調整,在不影響本創作所能產生之功效及所能達成之目的下,均應仍落在本創作所揭示之技術內容得能涵蓋之範圍內。同 時,本說明書中所引用之如「第一」、「第二」、「上」及「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本創作可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本創作可實施之範疇。 It is to be understood that the structure, the proportions, the size and the like of the drawings are only used in conjunction with the disclosure of the specification for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the present invention. The qualifications, the modification of any structure, the change of the proportional relationship or the adjustment of the size, should not fall under the purpose of the creation and the purpose of the creation, should still fall within the technical content revealed by this creation. Within the scope of coverage. with Terms such as "first", "second", "upper" and "one" as used in this specification are for convenience only, and are not intended to limit the scope of implementation of this creation. Changes or adjustments in their relative relationship are considered to be within the scope of the creation of the creation of the product without substantial changes.
參閱第1圖,係為本創作之一實施態樣的薄型光學濾光片1,其厚度小於或等於150μm,係包括:透明基板10;黏著層20;以及吸收式近紅外線濾光玻璃30,其中,該黏著層20係形成於該透明基板10與該吸收式近紅外線濾光玻璃30之間。 Referring to FIG. 1 , a thin optical filter 1 having a thickness of less than or equal to 150 μm according to one embodiment of the present invention includes: a transparent substrate 10; an adhesive layer 20; and an absorption near-infrared filter glass 30, The adhesive layer 20 is formed between the transparent substrate 10 and the absorption near-infrared filter glass 30.
於本創作之一實施態樣中,該透明基板10之厚度為20至50μm,該黏著層20之厚度為0.1μm至10μm,該吸收式近紅外線濾光玻璃30之厚度為50μm至100μm。 In one embodiment of the present invention, the thickness of the transparent substrate 10 is 20 to 50 μm, the thickness of the adhesive layer 20 is 0.1 μm to 10 μm, and the thickness of the absorption near-infrared filter glass 30 is 50 μm to 100 μm.
於本創作之一實施態樣中,該透明基板具有90%以上之全波長穿透率及介於0.5kgf至1.5kgf抗折強度,該透明基板係選自於玻璃(例如:白玻璃、硼矽玻璃、鈣鈉玻璃、鋁矽玻璃、鹼土矽玻璃、石英玻璃或無鹼玻璃)、玻璃陶瓷、晶體、透明塑膠(例如:光學塑膠,如以下熱塑性聚合物:聚甲基丙烯酸甲酯(PMMA)、環烯烴聚合物(COC)、環烯烴聚合物(COP)、聚碳酸酯(PC)、塑膠玻璃、耐綸、ABS、甲基戊烯、聚醚醯亞胺、聚苯乙烯、NAS及SAN,較佳亦可採用不含水或者不吸水或幾乎不吸水的塑膠,如COC及COP及透明電光陶瓷所組成的群組。 In one embodiment of the present invention, the transparent substrate has a full wavelength transmittance of 90% or more and a flexural strength of 0.5 kgf to 1.5 kgf, and the transparent substrate is selected from glass (for example, white glass, boron). Glass, calcium soda glass, aluminum bismuth glass, alkaline earth bismuth glass, quartz glass or alkali-free glass), glass ceramic, crystal, transparent plastic (for example: optical plastic, such as the following thermoplastic polymer: polymethyl methacrylate (PMMA) ), cycloolefin polymer (COC), cycloolefin polymer (COP), polycarbonate (PC), plastic glass, nylon, ABS, methylpentene, polyetherimide, polystyrene, NAS and For the SAN, it is preferred to use a plastic which does not contain water or absorbs water or hardly absorbs water, such as COC and COP and transparent electro-optic ceramics.
本創作之薄型光學濾光片中,使用之吸收式近紅外線濾光玻璃之膨脹係數取決於所用之透明基板。較佳地,該 吸收式近紅外線濾光玻璃之熱膨脹係數(CTE)為60×10-7/K至70×10-7/K,該透明基板之熱膨脹係數為7.2×10-6/K至30×10-6/K。 In the thin optical filter of the present invention, the expansion coefficient of the absorption near-infrared filter glass used depends on the transparent substrate used. Preferably, the absorption near-infrared filter glass has a coefficient of thermal expansion (CTE) of 60×10 -7 /K to 70×10 -7 /K, and the transparent substrate has a thermal expansion coefficient of 7.2×10 -6 /K to 30 × 10 -6 /K.
於本創作中之一實施態樣中,吸收式近紅外線濾光玻璃之材質係氟磷酸鹽系紅外線濾光玻璃或磷酸鹽系紅外線濾光玻璃。 In one embodiment of the present invention, the material of the absorption near-infrared filter glass is a fluorophosphate-based infrared filter glass or a phosphate-based infrared filter glass.
磷酸鹽系紅外線濾光玻璃主要包含P2O5,其餘成分舉例而言,如:Al2O3、CuO、SiO2、MgO、CaO、K2O、BaO、Li2O、Nb2O5、ZnO。於一具體實施例中,該磷酸鹽系紅外線濾光玻璃主要包含40%至75%之P2O5、10%至28%之Al2O3以及3%至8.5%之CuO。 The phosphate-based infrared filter glass mainly contains P 2 O 5 , and the remaining components are, for example, Al 2 O 3 , CuO, SiO 2 , MgO, CaO, K 2 O, BaO, Li 2 O, Nb 2 O 5 . ZnO. In one embodiment, the phosphate-based infrared filter glass mainly comprises 40% to 75% P 2 O 5 , 10% to 28% Al 2 O 3 , and 3% to 8.5% CuO.
氟磷酸鹽系紅外線濾光玻璃則復包括金屬氟化物,如:AlF3、NaF、MgF2、CaF2、SrF2及BaF2。於一具體實施例中,該氟磷酸鹽系紅外線濾光玻璃係包含P2O5、CuO及選自AlF3、NaF、MgF2、CaF2、SrF2及BaF2所組成群組之至少一者的氟化物。該吸收式近紅外線濾光玻璃視需要經過切割、研磨、拋光、冷加工等加工程序。 The fluorophosphate-based infrared filter glass further includes metal fluorides such as AlF 3 , NaF, MgF 2 , CaF 2 , SrF 2 and BaF 2 . In one embodiment, the fluorophosphate-based infrared filter glass comprises P 2 O 5 , CuO, and at least one selected from the group consisting of AlF 3 , NaF, MgF 2 , CaF 2 , SrF 2 , and BaF 2 . Fluoride. The absorption type near-infrared filter glass is subjected to processing procedures such as cutting, grinding, polishing, and cold working as needed.
本創作之吸收式近紅外線濾光玻璃可稱為藍玻璃,如第200920709號中華民國發明專利及第201200485號中華民國發明專利所揭露者,藍玻璃本身材質具有對紅光波長吸收、穿透率較低之特性。 The absorption near-infrared filter glass of the present invention can be called blue glass, such as the invention patent of the Republic of China No. 200920709 and the invention patent of the Republic of China No. 201200485, the blue glass itself has absorption and transmittance for red light wavelength. Lower characteristics.
於本創作中,該黏著層透過交聯反應及/或聚合反應固化,該黏著層可選自聚胺甲酸酯樹脂、溶膠-凝膠化合物、混合聚合物、聚矽氧(經過有機及/或無機交聯)、酚醛樹 脂、環氧化物、聚醯胺、聚醯亞胺、乙烯乙酸乙烯酯(EVA)及聚酯樹脂所組成群組之至少一者。此外,調配作為黏著層的化合物,使形成之黏著層的黏度係為200cps至480cps,且搭配本創作之透明基板和吸收式近紅外線濾光玻璃,以達到薄型光學濾光片之整體厚度小於或等於150μm時,具有介於1.94kgf至5.21kgf之抗折強度。 In the present invention, the adhesive layer is cured by a crosslinking reaction and/or a polymerization reaction, and the adhesive layer may be selected from the group consisting of polyurethane resin, sol-gel compound, mixed polymer, and polyoxyn (via organic and/or Or inorganic cross-linking), phenolic tree At least one of the group consisting of a fat, an epoxide, a polyamine, a polyimine, an ethylene vinyl acetate (EVA), and a polyester resin. In addition, the compound as an adhesive layer is formulated so that the viscosity of the formed adhesive layer is 200 cps to 480 cps, and the transparent substrate and the absorbing near-infrared filter glass of the present invention are combined to achieve an overall thickness of the thin optical filter less than or When it is equal to 150 μm, it has a flexural strength of 1.94 kgf to 5.21 kgf.
於本創作之一實施態樣中,該黏著層為紫外線固化水性膠(Ultraviolet Glue),其在紫外光的照射下會固化。 In one embodiment of the present invention, the adhesive layer is an Ultraviolet Glue which cures under ultraviolet light.
參閱第2圖,係為本創作之另一實施態樣,一種薄型光學濾光片2,係包括:透明基板10;黏著層20;吸收式近紅外線濾光玻璃30;有機塗層12;第一多層膜結構14以及第二多層膜結構16,其中,該透明基板10係設置於該黏著層20及該第二多層膜結構16之間,該黏著層20係設置於該透明基板10與該吸收式近紅外線濾光玻璃30之間,該吸收式近紅外線濾光玻璃30係設置於該黏著層20及該有機塗層12之間,以及該有機塗層12係設置於該吸收式近紅外線濾光玻璃30與該第一多層膜結構14之間。 2 is a thin optical filter 2 comprising: a transparent substrate 10; an adhesive layer 20; an absorption near-infrared filter glass 30; an organic coating 12; a multilayer film structure 14 and a second multilayer film structure 16 , wherein the transparent substrate 10 is disposed between the adhesive layer 20 and the second multilayer film structure 16 , and the adhesive layer 20 is disposed on the transparent substrate 10 and the absorption type near-infrared filter glass 30, the absorption type near-infrared filter glass 30 is disposed between the adhesive layer 20 and the organic coating layer 12, and the organic coating layer 12 is disposed in the absorption The near-infrared filter glass 30 is between the first multilayer film structure 14.
於本創作中,該有機塗層可藉由將含有紅外線吸收特性之有機色素與聚合物混合,並成膜於該吸收式近紅外線濾光玻璃之表面上。操作時,該聚合物可藉由溶解或分散於溶劑以調配成塗覆液,並於其中添加有機色素,再於該塗覆液直接塗覆於吸收式近紅外線濾光玻璃上後,予以乾燥而形成有機塗層。塗覆方法例如旋轉塗佈法、凹槽輥塗覆法、噴霧塗覆法、簾幕塗覆法、氣刀塗覆法、刮刀塗覆 法、可逆輥塗覆法等習知塗覆方法。於一具體實施例中,係利用旋轉塗佈法形成該有機塗層。此外,較佳地,該有機塗層之厚度為0.1μm至10μm,更佳地,該有機塗層之厚度為2μm。 In the present invention, the organic coating can be formed on the surface of the absorption near-infrared filter glass by mixing an organic dye containing infrared absorption characteristics with a polymer. In operation, the polymer can be formulated into a coating liquid by dissolving or dispersing in a solvent, and an organic pigment is added thereto, and then the coating liquid is directly coated on the absorption near-infrared filter glass, and then dried. An organic coating is formed. Coating methods such as spin coating, gravure coating, spray coating, curtain coating, air knife coating, doctor coating Conventional coating methods such as a method, a reversible roll coating method, and the like. In one embodiment, the organic coating is formed by spin coating. Further, preferably, the thickness of the organic coating layer is from 0.1 μm to 10 μm, and more preferably, the thickness of the organic coating layer is 2 μm.
於本創作之一具體實施例中,有機塗層係含有有機色素及聚合物,其中,所述有機色素係選自偶氮基化合物、二亞銨化合物、二硫酚金屬錯合物、酞花青類化合物、方酸青類化合物及花青類化合物所組成群組之至少一者,此外,藉由選擇不同有機色素可吸收不同波長範圍之光輻射。該有機塗層之聚合物必須能保持被溶解或分散的有機色素,同時也必須是透明材料,該聚合物的材料可選自聚酯、聚丙烯酸酯、聚烯烴、聚碳酸酯、聚環烯烴、聚氨酯、聚醚及聚乙烯縮丁醛所組成群組之至少一者。此外,較佳係選用可交聯之聚合物,例如改質原先無法交聯之聚合物,使該聚合物具有可交聯之官能基,而形成可交聯之聚合物。於另一具體實施例中,該有機塗層復包含固化劑,如甲苯二異氰酸酯(TDI),例如以該有機塗層之固含量計,固化劑之含量係0.1wt%。 In a specific embodiment of the present invention, the organic coating layer comprises an organic pigment and a polymer, wherein the organic pigment is selected from the group consisting of an azo compound, a diimonium compound, a dithiophenol metal complex, and a silk flower. At least one of the group consisting of a cyanine compound, a squaraine cyanine compound, and a cyanine compound, and in addition, optical radiation of different wavelength ranges can be absorbed by selecting different organic pigments. The polymer of the organic coating must be capable of retaining the dissolved or dispersed organic pigment, and must also be a transparent material. The material of the polymer may be selected from the group consisting of polyester, polyacrylate, polyolefin, polycarbonate, polycycloolefin. At least one of the group consisting of polyurethane, polyether and polyvinyl butyral. Further, it is preferred to use a crosslinkable polymer, for example, to modify a polymer which is not originally crosslinkable, so that the polymer has a crosslinkable functional group to form a crosslinkable polymer. In another embodiment, the organic coating further comprises a curing agent, such as toluene diisocyanate (TDI), for example, the solidifying agent is present in an amount of 0.1% by weight based on the solid content of the organic coating.
在有機塗層之塗覆液之有機溶劑選擇上,並無特別限制,只要是可使上述有機色素及上述聚合物均勻溶解或分散者即可,適用的溶劑舉例而言,包括醇類,如異丙醇;酮類,如丙酮、甲基乙基酮、甲基異丁基酮、環戊酮、環己酮及二丙酮醇等;酯類,如乙酸乙酯、乙酸丁酯、乙酸甲氧基乙酯、丙烯酸乙酯及丙烯酸丁酯;氟化醇類,如 2,2,3,3-四氟丙醇;烴類,如己烷、苯、甲苯及二甲苯;氯化烴類,如二氯甲烷、二氯乙烷及氯仿。該等有機溶劑可單獨或混合使用。 The organic solvent of the coating liquid of the organic coating layer is not particularly limited as long as the organic dye and the polymer are uniformly dissolved or dispersed. Suitable solvents include, for example, alcohols. Isopropanol; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone and diacetone alcohol; esters such as ethyl acetate, butyl acetate, acetic acid Oxyethyl ester, ethyl acrylate and butyl acrylate; fluorinated alcohols, such as 2,2,3,3-tetrafluoropropanol; hydrocarbons such as hexane, benzene, toluene and xylene; chlorinated hydrocarbons such as dichloromethane, dichloroethane and chloroform. These organic solvents may be used singly or in combination.
為使有機色素及上述聚合物均勻溶解或分散於有機溶劑中,可採用在加溫下攪拌、分散、粉碎等的方法。 In order to uniformly dissolve or disperse the organic dye and the above polymer in an organic solvent, a method of stirring, dispersing, pulverizing, or the like under heating may be employed.
塗覆塗覆液後,係進行固化,固化方法可採用藉由紫外光固化或熱風固化、加熱器固化及烘烤等習知固化方法。固化溫度可視不同溶劑而調整。於一具體實施例中,建議以100℃至140℃(±2℃)較佳,固化溫度以良好精度進行溫度控制於±2℃之範圍內較佳,固化時間可視塗覆液之溶劑或其塗覆量而予以調整,於一態樣中,固化時間係30分鐘。 After the coating liquid is applied, the curing is carried out by a conventional curing method such as ultraviolet curing or hot air curing, heater curing and baking. The curing temperature can be adjusted depending on the solvent. In a specific embodiment, it is recommended to use 100 ° C to 140 ° C (± 2 ° C), the curing temperature is preferably controlled within a range of ± 2 ° C with good precision, and the curing time can be determined by the solvent of the coating liquid or The amount of coating was adjusted, and in one aspect, the curing time was 30 minutes.
所述多層膜結構可以係紅外線反射多層膜、紫外線-紅外線反射多層膜或抗反射多層膜。製作上,可藉由設計不同折射率、不同層數和厚度調整其分光穿透率特性等光學特性,舉例而言,利用高折射率及低折射率之材料交互層積,就一多層膜結構而言,所述層積層數通常係4至50層,亦即該第一多層膜結構14或第二多層膜結構16係各自包含10至30層之膜,就紅外線反射多層膜或紫外線-紅外線反射多層膜而言,該層積厚度為0.2μm至5μm,就抗反射多層膜而言,該層積厚度為0.2μm至5μm。通常,所述第一多層膜結構14及第二多層膜結構16係具有一者較厚、一者較薄之厚度,薄層較佳係抗反射多層膜。因此,第一多層膜結構14之厚度可大於或小於第二多層膜 結構16之厚度,其厚度可根據所形成的性質,例如紅外線反射多層膜、紫外線-紅外線反射多層膜或抗反射多層膜而定。 The multilayer film structure may be an infrared reflective multilayer film, an ultraviolet-infrared reflective multilayer film or an anti-reflective multilayer film. In production, optical characteristics such as spectral transmittance characteristics can be adjusted by designing different refractive indices, different number of layers, and thickness. For example, a multilayer film is formed by alternately laminating materials having a high refractive index and a low refractive index. Structurally, the number of laminated layers is usually 4 to 50 layers, that is, the first multilayer film structure 14 or the second multilayer film structure 16 each comprises a film of 10 to 30 layers, and the infrared reflective multilayer film or In the ultraviolet-infrared reflective multilayer film, the laminated thickness is from 0.2 μm to 5 μm, and in the case of the antireflection multilayer film, the laminated thickness is from 0.2 μm to 5 μm. Generally, the first multilayer film structure 14 and the second multilayer film structure 16 have a thicker, one thinner thickness, and the thin layer is preferably an antireflective multilayer film. Therefore, the thickness of the first multilayer film structure 14 can be greater or smaller than the second multilayer film The thickness of the structure 16 may vary depending on the properties formed, such as an infrared reflective multilayer film, an ultraviolet-infrared reflective multilayer film, or an antireflective multilayer film.
於一具體實施例中,該多層膜結構之實施方式係以氣相製膜法形成於有機塗層上及/或吸收式近紅外線濾光玻璃之表面上,該氣相製膜法可利用各種習知鍍膜方式,舉例而言,如濺鍍、離子化蒸鍍、電子束蒸鍍及化學蒸鍍等各種真空鍍膜方法之一者或其方法組合,較佳係以電子槍蒸鍍搭配離子源輔助鍍膜方式成膜。 In a specific embodiment, the embodiment of the multilayer film structure is formed on the surface of the organic coating and/or the surface of the absorption near-infrared filter glass by a vapor phase film forming method, and the vapor phase film forming method can utilize various Conventional coating methods, for example, one of various vacuum coating methods such as sputtering, ionization evaporation, electron beam evaporation, and chemical vapor deposition, or a combination thereof, preferably with electron gun evaporation and ion source assist The film is formed into a film.
於一具體實施例中,形成多層膜之各該層之膜的材質係選自TiO2、SiO2、Y2O3、MgF2、Al2O3、Nb2O5、AlF3、Bi2O3、Gd2O3、LaF3、PbTe、Sb2O3、SiO、SiN、Ta2Os、ZnS、ZnSe、ZrO2及Na3AlF6所組成群組之至少一者。於一具體實施例中,係使用TiO2和SiO2交錯層積而成。 In one embodiment, the material of each of the layers forming the multilayer film is selected from the group consisting of TiO 2 , SiO 2 , Y 2 O 3 , MgF 2 , Al 2 O 3 , Nb 2 O 5 , AlF 3 , Bi 2 . At least one of the group consisting of O 3 , Gd 2 O 3 , LaF 3 , PbTe, Sb 2 O 3 , SiO, SiN, Ta 2 Os, ZnS, ZnSe, ZrO 2 and Na 3 AlF 6 . In one embodiment, a cross-stack of TiO 2 and SiO 2 is used.
根據前述之說明,於一具體實施例中,該第一多層膜結構14係紅外線反射多層膜或紫外線-紅外線反射多層膜,且該第二多層膜結構16係抗反射多層膜。或者,該第一多層膜結構14係抗反射多層膜,且該第二多層膜結構16係紅外線反射多層膜或紫外線-紅外線反射多層膜。 In accordance with the foregoing description, in one embodiment, the first multilayer film structure 14 is an infrared reflective multilayer film or an ultraviolet-infrared reflective multilayer film, and the second multilayer film structure 16 is an antireflective multilayer film. Alternatively, the first multilayer film structure 14 is an anti-reflective multilayer film, and the second multilayer film structure 16 is an infrared reflective multilayer film or an ultraviolet-infrared reflective multilayer film.
除上述層之外,亦可更進一步形成防溼層、抗靜電層、電磁波薄片層、選擇吸收過濾層、底塗層或保護層及其組合。 In addition to the above layers, a moisture-proof layer, an antistatic layer, an electromagnetic wave sheet layer, a selective absorption filter layer, an undercoat layer or a protective layer, and combinations thereof may be further formed.
為得到本創作之薄型光學濾光片,本創作亦提供薄型光學濾光片之製造方法,其步驟包括:將黏著層形成於透 明基板與吸收式近紅外線濾光玻璃之間,以使透明基板藉由黏著層與吸收式近紅外線濾光玻璃結合成一複合材料;以及薄化該複合材料之吸收式近紅外線濾光玻璃之厚度,以令該複合材料整體厚度小於或等於150μm。例如,藉由研磨該複合材料中,相對於該吸收式近紅外線濾光玻璃與該黏著層接觸之表面之該吸收式近紅外線濾光玻璃的表面,以薄化該複合材料之吸收式近紅外線濾光玻璃之厚度。此外,該透明基板係具有90%以上之全波長穿透率且介於0.5kgf至1.5kgf之抗折強度。 In order to obtain the thin optical filter of the present invention, the present invention also provides a method for manufacturing a thin optical filter, the steps of which include: forming an adhesive layer in a transparent manner Between the bright substrate and the absorbing near-infrared filter glass, so that the transparent substrate is combined with the absorbing near-infrared filter glass into a composite material; and the thickness of the absorbing near-infrared filter glass thinning the composite material So that the overall thickness of the composite material is less than or equal to 150 μm. For example, by grinding the surface of the absorbing near-infrared filter glass with respect to the surface of the absorbing near-infrared filter glass and the adhesive layer, the absorbing near-infrared ray of the composite material is thinned. The thickness of the filter glass. Further, the transparent substrate has a full wavelength transmittance of 90% or more and a bending strength of 0.5 kgf to 1.5 kgf.
參閱第3A至3E圖,係為本創作薄型光學濾光片之製造方法之步驟示意圖。首先,如第3A圖和第3E圖之步驟S1所示,將形成黏著層之材料20’施加至吸收式近紅外線濾光玻璃30之部分表面上,接著,如第3B圖和第3E圖之步驟S2所示,再令透明基板10略為彎曲,使其彎曲處與材料20’接觸,而令該材料20’置於吸收式近紅外線濾光玻璃30及透明基板10之間,之後,如第3C圖和第3E圖之步驟S3所示,使透明基板10與材料20’的接觸面積逐漸增大。最後,如第3D圖和第3E圖之步驟S4所示,利用紫外光固化材料20’以形成黏著層20,俾使透明基板10藉由黏著層20與吸收式近紅外線濾光玻璃30緊密結合成一複合材料,並將吸收式近紅外線濾光玻璃30之未與黏著層20接觸之表面利用一般研磨、拋光方式,降低該複合材料之整體厚度至小於或等於150μm,以製得本創作之薄型光學濾光片。 Referring to Figures 3A to 3E, it is a schematic diagram of the steps of the method for fabricating a thin optical filter. First, as shown in step S1 of FIGS. 3A and 3E, the material 20' forming the adhesive layer is applied to a part of the surface of the absorption near-infrared filter glass 30, and then, as shown in FIGS. 3B and 3E. In step S2, the transparent substrate 10 is slightly bent so that the curved portion is in contact with the material 20', and the material 20' is placed between the absorption near-infrared filter glass 30 and the transparent substrate 10, and then As shown in step 3 of FIG. 3C and FIG. 3E, the contact area of the transparent substrate 10 and the material 20' is gradually increased. Finally, as shown in step 3 of FIG. 3D and FIG. 3E, the ultraviolet light curing material 20' is used to form the adhesive layer 20, so that the transparent substrate 10 is closely bonded to the absorption near-infrared filter glass 30 by the adhesive layer 20. Forming a composite material, and the surface of the absorption near-infrared filter glass 30 that is not in contact with the adhesive layer 20 is generally ground and polished to reduce the overall thickness of the composite material to less than or equal to 150 μm to obtain a thin shape of the present invention. Optical filter.
於一具體實施例中,本創作製造方法所製得之薄型光學濾光片,該透明基板之厚度為20μm至50μm,該黏著層之厚度為0.1μm至10μm,該吸收式近紅外線濾光玻璃之厚度為50μm至100μm。 In a specific embodiment, the thin optical filter prepared by the method of the present invention has a thickness of 20 μm to 50 μm, and the thickness of the adhesive layer is 0.1 μm to 10 μm. The absorption type near infrared ray filter glass The thickness is from 50 μm to 100 μm.
如第第3E圖之步驟S5所示,根據本創作之薄型光學濾光片之製造方法,復可將T50介於630nm至680nm,波長範圍700nm至725nm之平均穿透率(Tavg)係小於8%之有機塗層材料,藉由旋塗法將該材料均勻地塗覆在吸收式近紅外線濾光玻璃上,再以140℃(±2℃)加熱固化該有機塗層材料30分鐘,以形成厚度為2μm之有機塗層。接著,利用電子槍蒸鍍搭配離子源輔助鍍膜方式形成第一多層膜結構於有機塗層上,以及形成第二多層膜結構於該透明基板之未與黏著層接觸之表面上,其中,所述第一多層膜結構係利用TiO2及SiO2以10nm至200nm之厚度交替蒸鍍以得到總層數24層,總厚度為2600nm之第一多層膜,所述第二多層膜結構係利用TiO2及SiO2以10nm至200nm之厚度交替蒸鍍以得到總層數18層,總厚度為2300nm之第二多層膜。 As shown in step S5 of FIG. 3E, according to the manufacturing method of the thin optical filter of the present invention, the T50 is 630 nm to 680 nm, and the average transmittance (T avg ) of the wavelength range of 700 nm to 725 nm is less than 8% of the organic coating material, the material is uniformly coated on the absorption near-infrared filter glass by spin coating, and the organic coating material is cured by heating at 140 ° C (± 2 ° C) for 30 minutes. An organic coating having a thickness of 2 μm was formed. Then, the first multilayer film structure is formed on the organic coating by electron gun evaporation and ion source auxiliary coating, and the second multilayer film structure is formed on the surface of the transparent substrate not in contact with the adhesive layer, wherein The first multilayer film structure is alternately vapor-deposited with TiO 2 and SiO 2 at a thickness of 10 nm to 200 nm to obtain a first multilayer film having a total layer number of 24 layers and a total thickness of 2600 nm, and the second multilayer film structure. The second multilayer film having a total thickness of 18 layers and a total thickness of 2300 nm was obtained by alternately vapor-depositing TiO 2 and SiO 2 with a thickness of 10 nm to 200 nm.
本創作復提供一種影像感測器,如第4圖所示,該影像感測器4係包括基板40、鏡頭模組41、影像感測元件42及外殼體43。 The present invention provides an image sensor. As shown in FIG. 4, the image sensor 4 includes a substrate 40, a lens module 41, an image sensing element 42, and an outer casing 43.
該鏡頭模組41係包括內殼體410及組設於該內殼體410中之透鏡411及本創作之薄型光學濾光片412,其中,該薄型光學濾光片412係設於該透鏡411之光穿透路徑 上。該影像感測元件42,係設於該鏡頭模組41之一側,例如以打線方式結合並電性連接於該基板40上,以令該吸薄型光學濾光片位於該透鏡和影像感測元件之間。 The lens module 41 includes an inner casing 410 and a lens 411 disposed in the inner casing 410 and the thin optical filter 412 of the present invention. The thin optical filter 412 is disposed on the lens 411. Light penetration path on. The image sensing component 42 is disposed on one side of the lens module 41, for example, wire bonding and electrically connected to the substrate 40, so that the thin optical filter is located at the lens and image sensing. Between components.
以下係藉由特定之具體實施例進一步說明本創作之特點之功效,但非用於限制本創作之範疇。 The following is a further description of the features of the present invention by way of specific embodiments, but is not intended to limit the scope of the present invention.
實施例Example
首先,將UV水性膠施加至藍玻璃之部分表面上,使彎曲的透明基板(白玻璃)其彎曲處與該UV水性膠接觸,使UV水性膠形成於藍玻璃及白玻璃之間,接著使白玻璃與UV水性膠的接觸面積逐漸增大,最後藉由紫外光固化UV水性膠,以使白玻璃藉由UV水性膠與藍玻璃緊密結合成一複合材料。將藍玻璃之未與UV水性膠接觸之表面利用一般研磨、拋光方式,降低該複合材料之整體厚度至小於或等於150μm,以製得本創作之薄型光學濾光片。 First, a UV water-based glue is applied to a part of the surface of the blue glass so that the curved transparent substrate (white glass) is in contact with the UV water-based glue, so that the UV water-based glue is formed between the blue glass and the white glass, and then The contact area between the white glass and the UV water-based glue gradually increases, and finally the UV water-based glue is cured by ultraviolet light, so that the white glass is tightly combined with the blue glass into a composite material by the UV water-based glue. The surface of the blue glass which is not in contact with the UV water-based glue is subjected to general grinding and polishing to reduce the overall thickness of the composite material to less than or equal to 150 μm to obtain the thin optical filter of the present invention.
本實施例所製得之150μm厚的薄型光學濾光片中,該白玻璃之厚度為50μm,該黏著層之厚度為10μm,該藍玻璃之厚度為90μm;120μm厚的薄型光學濾光片中,該白玻璃之厚度為50μm,該黏著層之厚度為10μm,該藍玻璃之厚度為60μm。 In the 150 μm thick thin optical filter prepared in this embodiment, the thickness of the white glass is 50 μm, the thickness of the adhesive layer is 10 μm, the thickness of the blue glass is 90 μm; and the thin optical filter of 120 μm thickness is used. The thickness of the white glass was 50 μm, the thickness of the adhesive layer was 10 μm, and the thickness of the blue glass was 60 μm.
測試例Test case
本創作薄型光學濾光片及單純藍玻璃之分光穿透率(T%)曲線 The split light transmittance (T%) curve of the thin optical filter and the simple blue glass
第5A圖測量上述實施例製得之150μm本創作薄型光學濾光片以及單純使用相同厚度(150μm)之藍玻璃在不同 角度(0度及30度)的穿透率數據;第5B圖測量上述實施例製得之120μm的本創作薄型光學濾光片以及單純使用相同厚度(120μm)之藍玻璃在不同角度(0度及30度)的穿透率數據。由第5A及5B圖可知,本創作實施例之薄型光學濾光片與藍玻璃,都可將700nm至725nm之間的平均穿透率降低至1%,其中,第5A和5B圖所示之圖譜在薄型光學濾光片與藍玻璃之表面上,復包括形成有機塗層、第一多層膜結構和第二多層膜結構,其方法係包括將T50介於630nm至680nm,波長範圍700nm至725nm之平均穿透率(Tavg)係小於8%之有機塗層材料,藉由旋塗法將該材料均勻地塗覆在吸收式近紅外線濾光玻璃和藍玻璃上,再以140℃(±2℃)加熱固化該有機塗層材料30分鐘,以形成厚度為2μm之有機塗層。接著,利用電子槍蒸鍍搭配離子源輔助鍍膜方式形成第一多層膜結構於有機塗層上,以及形成第二多層膜結構於該透明基板上和藍玻璃之另一側表面上,其中,所述第一多層膜結構係利用TiO2及SiO2以10至200nm之厚度交替蒸鍍以得到總層數24層,總厚度為2600nm之第一多層膜,所述第二多層膜結構係利用TiO2及SiO2以10nm至200nm之厚度交替蒸鍍以得到總層數18層,總厚度為2300nm之第二多層膜。 Fig. 5A is a graph showing the transmittance data of the 150 μm original thin optical filter obtained in the above embodiment and the blue glass of the same thickness (150 μm) at different angles (0 degrees and 30 degrees); The 120 μm thin optical filter produced in the examples and the transmittance data of the same thickness (120 μm) of blue glass at different angles (0 degree and 30 degrees) were used. As can be seen from Figures 5A and 5B, both the thin optical filter and the blue glass of the present embodiment can reduce the average transmittance between 700 nm and 725 nm to 1%, wherein the 5A and 5B are shown. The pattern comprises an organic coating, a first multilayer film structure and a second multilayer film structure on the surface of the thin optical filter and the blue glass, the method comprising the steps of: T50 between 630 nm and 680 nm and a wavelength range of 700 nm The average transmittance (T avg ) to 725 nm is less than 8% of the organic coating material, and the material is uniformly coated on the absorption near-infrared filter glass and blue glass by spin coating, and then at 140 ° C (±2 ° C) The organic coating material was heat-cured for 30 minutes to form an organic coating having a thickness of 2 μm. Then, the first multilayer film structure is formed on the organic coating by electron gun evaporation and ion source assist coating, and the second multilayer film structure is formed on the transparent substrate and the other side surface of the blue glass, wherein The first multilayer film structure is alternately vapor-deposited with TiO 2 and SiO 2 at a thickness of 10 to 200 nm to obtain a first multilayer film having a total layer number of 24 layers and a total thickness of 2600 nm, the second multilayer film. The structure was alternately vapor-deposited with TiO 2 and SiO 2 at a thickness of 10 nm to 200 nm to obtain a second multilayer film having a total layer number of 18 layers and a total thickness of 2300 nm.
抗折強度測試 Flexural strength test
將上述實施例製得之150μm和120μm的本創作薄型光學濾光片各自裁切為三片尺寸為7.2mmX6.6mm之試片,並測量該等試片之抗折强度。此外,測量三片厚度對 應為150μm和120μm之藍玻璃之抗折强度,並記錄於下表1和2。抗折强度可依據DIN 52292或ENTWURF DIN 52300之Ring-on-Ring法(ROR)測量。 The 150 μm and 120 μm original thin optical filters prepared in the above examples were each cut into three test pieces having a size of 7.2 mm×6.6 mm, and the flexural strength of the test pieces was measured. In addition, measure three thickness pairs It should be the flexural strength of 150 μm and 120 μm blue glass and recorded in Tables 1 and 2 below. The flexural strength can be measured according to the Ring-on-Ring method (ROR) of DIN 52292 or ENTWURF DIN 52300.
由表1和2所示結果可知,本創作實施例之薄型光學濾光片相較於單純使用藍玻璃具有較佳的抗折强度。 As is apparent from the results shown in Tables 1 and 2, the thin optical filter of the presently-created embodiment has a better flexural strength than the simple use of the blue glass.
由此可知,本創作之薄型光學濾光片除了具有一般習知吸收式近紅外線濾光片之光學性質,亦具有較佳的抗折强度,克服習知吸收式近紅外線濾光片無法加工且抗折強度差等問題。 It can be seen that the thin optical filter of the present invention has better flexural strength in addition to the optical properties of the conventional absorption type near-infrared filter, and overcomes the conventional absorption type near-infrared filter and cannot be processed. Problems such as poor bending strength.
上述實施例僅例示說明本創作之原理及其功效,而非 用於限制本創作。任何熟習此項技藝之人士均可在不違背本創作之精神及範疇下,對上述實施例進行修飾與改變。因此,本創作之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are merely illustrative of the principle of the creation and its efficacy, rather than Used to limit this creation. Any person skilled in the art can modify and change the above embodiments without departing from the spirit and scope of the present invention. Therefore, the scope of protection of this creation should be as listed in the scope of the patent application described later.
1‧‧‧薄型光學濾光片 1‧‧‧Slim optical filter
10‧‧‧透明基板 10‧‧‧Transparent substrate
20‧‧‧黏著層 20‧‧‧Adhesive layer
30‧‧‧吸收式近紅外線濾光玻璃 30‧‧‧Absorbing near-infrared filter glass
Claims (16)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW106205910U TWM545912U (en) | 2017-04-27 | 2017-04-27 | Thin optical filter and image sensor comprising the same |
CN201720603006.7U CN206804911U (en) | 2017-04-27 | 2017-05-27 | Thin optical filter and image sensor |
JP2017003195U JP3212936U (en) | 2017-04-27 | 2017-07-13 | Thin optical filter and image sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW106205910U TWM545912U (en) | 2017-04-27 | 2017-04-27 | Thin optical filter and image sensor comprising the same |
Publications (1)
Publication Number | Publication Date |
---|---|
TWM545912U true TWM545912U (en) | 2017-07-21 |
Family
ID=60037839
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106205910U TWM545912U (en) | 2017-04-27 | 2017-04-27 | Thin optical filter and image sensor comprising the same |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3212936U (en) |
CN (1) | CN206804911U (en) |
TW (1) | TWM545912U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI681341B (en) * | 2018-01-03 | 2020-01-01 | 虹光精密工業股份有限公司 | Portable image capture device and system using the same thereof |
TWI695990B (en) * | 2019-04-08 | 2020-06-11 | 澤米科技股份有限公司 | Anti-biometric lens |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI676853B (en) * | 2018-07-25 | 2019-11-11 | 白金科技股份有限公司 | Optical filter |
CN110806612A (en) * | 2018-08-06 | 2020-02-18 | 张家港康得新光电材料有限公司 | Optical filter and image sensor with same |
KR20240009425A (en) * | 2021-05-17 | 2024-01-22 | 니혼 이타가라스 가부시키가이샤 | Light absorbers, articles having light absorbers, and light absorbing compositions |
-
2017
- 2017-04-27 TW TW106205910U patent/TWM545912U/en unknown
- 2017-05-27 CN CN201720603006.7U patent/CN206804911U/en active Active
- 2017-07-13 JP JP2017003195U patent/JP3212936U/en active Active
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI681341B (en) * | 2018-01-03 | 2020-01-01 | 虹光精密工業股份有限公司 | Portable image capture device and system using the same thereof |
US10684536B2 (en) | 2018-01-03 | 2020-06-16 | Avision Inc. | Portable image capture device having handle assembly disposed on main body and portable image capture system using such portable image capture device |
TWI695990B (en) * | 2019-04-08 | 2020-06-11 | 澤米科技股份有限公司 | Anti-biometric lens |
Also Published As
Publication number | Publication date |
---|---|
JP3212936U (en) | 2017-10-12 |
CN206804911U (en) | 2017-12-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3206578U (en) | Absorption near-infrared filter and image sensor | |
TWM545912U (en) | Thin optical filter and image sensor comprising the same | |
JP3213654U (en) | Absorption near-infrared filter and image sensor | |
US10416365B2 (en) | Optical arrangement for camera modules, camera modules with optical arrangements, and method of manufacture | |
JP6619828B2 (en) | Infrared cut filter, imaging device, and method of manufacturing infrared cut filter | |
JP6317875B2 (en) | Infrared cut filter, imaging device, and method of manufacturing infrared cut filter | |
WO2015099060A1 (en) | Optical filter | |
JP2022115885A (en) | Optical filter and imaging device | |
US11971565B2 (en) | Absorption type near infrared filter | |
WO2020004641A1 (en) | Optical filter and information acquisition device | |
JP6479863B2 (en) | Infrared cut filter, imaging device, and method of manufacturing infrared cut filter | |
KR101853263B1 (en) | Infrared cut off film, film type infrared cut off filter using the same and the manufacturing method theeby | |
KR101866104B1 (en) | Optical product for using an infrared cut-off filter included in a camera module and infrared cut-off filter including the optical product | |
KR20170115005A (en) | Film type infrared cut off filter and the manufacturing method thereby | |
JP2019109526A (en) | Infrared cut filter, imaging apparatus and method of manufacturing infrared cut filter | |
KR101853261B1 (en) | Infrared cut off film, film type infrared cut off filter using the same and the manufacturing method theeby | |
JP7415815B2 (en) | optical filter | |
WO2019026675A1 (en) | Photoelectric conversion element and adhesive | |
CN219320521U (en) | Optical filter and camera module | |
WO2024048511A1 (en) | Optical filter | |
CN116097133A (en) | Infrared cut-off filter, infrared cut-off lens and camera module | |
KR20180094502A (en) | Infrared cut off film, film type infrared cut off filter using the same and the manufacturing method theeby | |
KR101853256B1 (en) | Infrared cut off film, film type infrared cut off filter using the same and the manufacturing method theeby | |
KR20180095474A (en) | Infrared cut off film, film type infrared cut off filter using the same and the manufacturing method theeby | |
KR20210151649A (en) | Near-infrared ray absorbing article and an Optical apparatus comprising the same |