TWM543250U - Electroplating equipment structure - Google Patents

Electroplating equipment structure Download PDF

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Publication number
TWM543250U
TWM543250U TW106202766U TW106202766U TWM543250U TW M543250 U TWM543250 U TW M543250U TW 106202766 U TW106202766 U TW 106202766U TW 106202766 U TW106202766 U TW 106202766U TW M543250 U TWM543250 U TW M543250U
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TW
Taiwan
Prior art keywords
partition
plating
tank
electroplating
plating tank
Prior art date
Application number
TW106202766U
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Chinese (zh)
Inventor
jun-qin Wang
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Falali Bath Boutique Co Ltd
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Application filed by Falali Bath Boutique Co Ltd filed Critical Falali Bath Boutique Co Ltd
Priority to TW106202766U priority Critical patent/TWM543250U/en
Publication of TWM543250U publication Critical patent/TWM543250U/en
Priority to CN201721583178.9U priority patent/CN207608652U/en

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Description

電鍍設備結構Plating equipment structure

本創作係有關於一種電鍍設備,尤指一種包括過濾以及製冷效果之電鍍設備結構。 This creation relates to an electroplating apparatus, and more particularly to an electroplating apparatus structure including filtration and cooling effects.

按,電鍍是利用電解的原理將導電體鋪上一層金屬的方法,其電鍍的主要用途包括防止金屬氧化(如鏽蝕)以及進行裝飾。不少硬幣的外層亦利用電鍍作業完成,但電鍍產生的污水(如失去效用的電解質)若未經處理,將會是水污染的重要來源,大幅危害周遭環境者。 Electroplating is a method of laying a layer of metal on the conductor by the principle of electrolysis. The main purposes of electroplating include preventing metal oxidation (such as rust) and decorating. The outer layers of many coins are also completed by electroplating, but the sewage generated by electroplating (such as the ineffective electrolyte) will be an important source of water pollution if it is not treated, which will greatly harm the surrounding environment.

有鑑於此,本創作人於多年從事相關產品之製造開發與設計經驗,針對上述之目標,詳加設計與審慎評估後,終得一確具實用性之本創作。 In view of this, the creator has been engaged in the manufacturing development and design experience of related products for many years. After detailed design and careful evaluation, the author has finally achieved a practical and practical creation.

本創作所欲解決之技術問題在於針對現有技術存在的上述缺失,提供一種電鍍設備結構。 The technical problem to be solved by the present invention is to provide a plating apparatus structure in view of the above-mentioned shortcomings existing in the prior art.

一種電鍍設備結構,其包含:一電鍍槽、一製冷裝置以及一過濾裝置,其中,該電鍍槽內部具有一藥液槽室,並設有至少一伸入藥液槽室內之陽極板,以及一跨設電鍍槽上方之陰極板,該製冷裝置具有一循環管,並將該循環管設置於藥液槽室內,該過濾裝置具有一抽水管以及一 出水管,該抽水管之一端係連接一濾芯,另一端則設置於藥液槽室的底部,該出水管之一端係與電鍍槽組接,另一端則與一抽水馬達之出水端連接,又該抽水馬達之抽水端則又設有一銜接管與濾芯連接,藉由上述結構,俾以構成一種電鍍設備結構。 An electroplating apparatus structure comprising: a plating tank, a refrigerating device, and a filtering device, wherein the electroplating tank has a liquid chemical tank chamber therein, and is provided with at least one anode plate extending into the liquid chemical tank chamber, and a A cathode plate is disposed across the plating tank, the refrigeration device has a circulation pipe, and the circulation pipe is disposed in the liquid medicine tank, the filtering device has a water pump pipe and a An outlet pipe, one end of the pumping pipe is connected to a filter core, and the other end is disposed at the bottom of the liquid medicine tank chamber, one end of the water outlet pipe is connected with the plating tank, and the other end is connected with the water outlet end of a pumping motor, and The pumping end of the pumping motor is further provided with a connecting tube connected to the filter element, and by the above structure, the crucible is configured to constitute a plating apparatus structure.

其中,該電鍍槽內部更設有第一隔板以及第二隔板,該第一隔板與該電鍍槽之外環壁同高,並對稱設有跨接部,以供製冷裝置之循環管卡接固定,而該第二隔板則低於第一隔板,且該第一、二隔板設有一流通槽口。 The first plating plate and the second partition plate are further disposed inside the plating tank, and the first partition plate is at the same height as the outer wall of the plating tank, and is symmetrically provided with a bridging portion for the circulation tube of the refrigeration device. The card is fixed, and the second partition is lower than the first partition, and the first and second partitions are provided with a flow slot.

其中,該電鍍槽上端部更設有二相對應之凹部,提供該陰極板的卡嵌固定。 Wherein, the upper end portion of the plating tank is further provided with two corresponding concave portions to provide the clamping and fixing of the cathode plate.

對照先前技術之功效:本創作之電鍍設備具有一電鍍槽並配置有一製冷裝置以及一過濾裝置,令電鍍作業時可透過該製冷裝置確保該電鍍液體處於最佳的作業溫度,大幅提升金屬物品的電鍍效果,且電鍍作業後所產生之汙水,則能再經過濾裝置過濾後再回收使用,避免汙水排放而導致水資源的污染,且回收後利用製冷裝置的降溫即可直接進行電鍍作業,不僅大幅增進作業效率,更是兼具環保效益者。 Compared with the efficacy of the prior art: the electroplating apparatus of the present invention has a plating tank and is provided with a refrigerating device and a filtering device, so that the electroplating operation can ensure that the electroplating liquid is at an optimal working temperature through the refrigerating device, and the metal articles are greatly improved. The electroplating effect, and the sewage generated after the electroplating operation, can be filtered and then recycled, so as to avoid the pollution of water resources caused by sewage discharge, and the electroplating can be directly performed by the cooling of the refrigerating device after recycling. It not only greatly enhances the efficiency of the work, but also has environmental benefits.

10‧‧‧電鍍槽 10‧‧‧ plating bath

11‧‧‧藥液槽室 11‧‧‧ drug solution chamber

111‧‧‧第一隔板 111‧‧‧First partition

112‧‧‧第二隔板 112‧‧‧Second partition

113‧‧‧跨接部 113‧‧‧ bridging department

114‧‧‧流通槽口 114‧‧‧Circulation slot

115‧‧‧凹部 115‧‧‧ recess

12‧‧‧陽極板 12‧‧‧Anode plate

13‧‧‧陰極板 13‧‧‧ cathode plate

20‧‧‧製冷裝置 20‧‧‧Refrigeration unit

21‧‧‧循環管 21‧‧‧Circulation tube

30‧‧‧過濾裝置 30‧‧‧Filter device

31‧‧‧抽水管 31‧‧‧Water pipes

32‧‧‧出水管 32‧‧‧Outlet

33‧‧‧濾芯 33‧‧‧ filter

34‧‧‧抽水馬達 34‧‧‧ pumping motor

341‧‧‧出水端 341‧‧‧ water outlet

342‧‧‧抽水端 342‧‧‧ pumping end

343‧‧‧銜接管 343‧‧‧Connecting tube

第1圖:係為本創作之立體圖。 Figure 1: This is a perspective view of the creation.

第2圖:係為本創作之分解圖。 Figure 2: This is an exploded view of the creation.

第3圖:係為本創作之電鍍作業示意圖。 Figure 3: This is a schematic diagram of the electroplating operation of this creation.

第4圖:係為本創作之過濾流程示意圖。 Figure 4: Schematic diagram of the filtering process for this creation.

為使 貴審查委員對本創作之目的、特徵及功效能夠有更進一步之瞭解與認識,以下茲請配合【圖式簡單說明】詳述如後: In order to enable your review committee to have a better understanding and understanding of the purpose, characteristics and efficacy of this creation, please refer to the following [Simplified Description of the Drawings] for details:

首先,先請參閱第1、2圖所示,一種電鍍設備結構,其包含:一電鍍槽10、一製冷裝置20以及一過濾裝置30,其中,該電鍍槽10內部具有一藥液槽室11,並設有二伸入藥液槽室11內之陽極板12,以及一跨設電鍍槽10上方之陰極板13,且該電鍍槽10內部更設有第一隔板111以及第二隔板112,該第一隔板111與該電鍍槽10之外環壁同高,並對稱設有跨接部113,而該第二隔板112則低於第一隔板111,且該第一、二隔板111、112皆設有一流通槽口114,又該電鍍槽10上端部更設有二相對應之凹部115,提供該陰極板13的卡嵌固定,該製冷裝置20具有一循環管21,該循環管21係卡接於第一隔板111及外環壁之跨接部113上,再延伸設置於藥液槽室11內,該過濾裝置30具有一抽水管31以及一出水管32,該抽水管31之一端係於電鍍槽10外連接一濾芯33,另一端則設置於電鍍槽10內之藥液槽室11底部,該出水管32之一端係組設於該電鍍槽10,並鄰近第一、二隔板111、112之,另一端則與一抽水馬達34之出水端341連接,又該抽水馬達34之抽水端342則又設有一銜接管343與濾芯33連接,藉由上述結構,俾以完成一種電鍍設備結構。 First, referring to FIGS. 1 and 2, an electroplating apparatus structure includes: a plating tank 10, a refrigerating apparatus 20, and a filtering device 30, wherein the plating tank 10 has a liquid chemical tank chamber 11 therein. And an anode plate 12 extending into the liquid chamber 11 and a cathode plate 13 spanning the plating tank 10, and the first plating plate 111 and the second partition are further disposed inside the plating tank 10. The first partition plate 111 is at the same height as the outer ring wall of the plating tank 10, and is symmetrically provided with a bridging portion 113, and the second partition plate 112 is lower than the first partition plate 111, and the first partition plate The two partition plates 111 and 112 are respectively provided with a flow-through slot 114. The upper end portion of the plating tank 10 is further provided with two corresponding recesses 115 for providing the locking and fixing of the cathode plate 13. The refrigeration device 20 has a circulation tube 21 The circulation pipe 21 is coupled to the first partition plate 111 and the bridging portion 113 of the outer ring wall, and is further disposed in the liquid chemical tank chamber 11. The filter device 30 has a water suction pipe 31 and an water outlet pipe 32. One end of the water suction pipe 31 is connected to a filter core 33 outside the plating tank 10, and the other end is disposed at the bottom of the liquid medicine tank chamber 11 in the plating tank 10. One end of the outlet pipe 32 is disposed in the plating tank 10, adjacent to the first and second partition plates 111, 112, and the other end is connected to the water outlet end 341 of a pumping motor 34, and the pumping end of the pumping motor 34 342 is further provided with a connecting tube 343 connected to the filter element 33, and by the above structure, a plating apparatus structure is completed.

其結構實際使用時,再請參閱第3、4圖所示,該電鍍槽10係於藥液槽室11內裝設有電鍍液體A,並使該二伸入藥液槽室11內之陽極板12受到電鍍液體A浸覆,再將欲電鍍上色之金屬物品B吊掛於陰極板13導電相接,並浸入電鍍液體A內,藉此通以直流電的電源後,該二陽極板12俾會釋放電子,而電鍍液體A的正離子則在陰極端還原,進而將陽極板12之金屬 電解附著於金屬物品B表面,達到電鍍上色之效果,且該電鍍槽10更搭配一製冷裝置20,並將該循環管21延伸至藥液槽室11內,提供電鍍液體A的降溫效果,使該電鍍液體A能保持在最佳的作業溫度,進而穩定地達到金屬物品B的電鍍效果,而電鍍後所產生之汙水,則再透過抽水馬達34由藥液槽室11底部逐漸抽出,並經由過濾裝置30之濾芯33將失去效用的電解質過濾附著,最後經由抽水馬達34以及出水管32導入電鍍槽10內,且過濾後之電鍍液體A導入藥液槽室11時,會再依序通過第一、二隔板112之流通槽口114而匯集,若有過濾後仍存有雜質時,即會因雜質比重大於電鍍液體A而沉底,進而將雜質存留於第一、二隔板111、112間,以確保電鍍液體A之純淨度。 When the structure is actually used, please refer to FIGS. 3 and 4 again. The plating tank 10 is provided with a plating liquid A in the chemical liquid chamber 11, and the second electrode is inserted into the anode of the liquid chamber 11 The plate 12 is immersed in the plating liquid A, and the metal object B to be electroplated is suspended from the cathode plate 13 to be electrically connected, and immersed in the plating liquid A, thereby passing the DC power supply, the two anode plates 12 The electrons are released, and the positive ions of the plating liquid A are reduced at the cathode end, and the metal of the anode plate 12 is further The electroplating is adhered to the surface of the metal article B to achieve the effect of electroplating, and the plating tank 10 is further matched with a refrigerating device 20, and the circulation pipe 21 is extended into the liquid chemical tank chamber 11 to provide a cooling effect of the plating liquid A. The plating liquid A can be maintained at an optimum working temperature, thereby stably achieving the plating effect of the metal article B, and the sewage generated after the plating is gradually extracted from the bottom of the liquid medicine chamber 11 through the pumping motor 34. And the filter electrolyte 33 of the filter device 30 is used to filter and remove the electrolyte that has lost its effect. Finally, it is introduced into the plating tank 10 via the pump motor 34 and the water outlet pipe 32, and the filtered plating liquid A is introduced into the drug solution chamber 11, and then sequentially The first and second separators 112 are collected by the flow notches 114. If there is any impurities after the filtration, the impurities are more than the plating liquid A, and the impurities are deposited in the first and second separators. 111, 112 to ensure the purity of the plating liquid A.

藉上述具體實施例之結構,可得到下述之效益:本創作之電鍍設備具有一電鍍槽10並配置有一製冷裝置20以及一過濾裝置30,令電鍍作業時可透過該製冷裝置20確保該電鍍液體A處於最佳的作業溫度,大幅提升金屬物品B的電鍍效果,且電鍍作業後所產生之汙水,則能再經過濾裝置30過濾後再回收使用,避免汙水排放而導致水資源的污染,且回收後利用製冷裝置20的降溫即可直接進行電鍍作業,不僅大幅增進作業效率,更是兼具環保效益者。 With the structure of the above specific embodiment, the following advantages can be obtained: the electroplating apparatus of the present invention has a plating tank 10 and is provided with a refrigerating device 20 and a filtering device 30, so that the electroplating can ensure the electroplating through the refrigerating device 20 during the plating operation. The liquid A is in the optimal working temperature, and the electroplating effect of the metal article B is greatly improved, and the sewage generated after the electroplating operation can be filtered and then recycled by the filtering device 30 to prevent the sewage from being discharged and causing water resources. Contamination, and after the recovery, the electroplating operation can be directly performed by the cooling of the refrigerating device 20, which not only greatly improves the work efficiency, but also has environmental benefits.

綜上所述,本創作確實已達突破性之結構設計,而具有改良之創作內容,同時又能夠達到產業上之利用性與進步性,且本創作未見於任何刊物,亦具新穎性,當符合專利法相關法條之規定,爰依法提出創作專利申請,懇請 鈞局審查委員授予合法專利權,至為感禱。 In summary, this creation has indeed achieved a breakthrough structural design, with improved creative content, while at the same time achieving industrial use and progress, and this creation has not been seen in any publication, but also novel, when In accordance with the provisions of the relevant laws and regulations of the Patent Law, the application for the creation of a patent shall be filed according to law, and the examination of the member of the Bureau shall be granted a legal patent right.

唯以上所述者,僅為本創作之一較佳實施例而已,當不能以之限定本創作實施之範圍;即大凡依本創作申請專利範圍所作之均等變化與修飾, 皆應仍屬本創作專利涵蓋之範圍內。 Only the above-mentioned ones are only preferred embodiments of the present invention, and the scope of the creation of the present invention cannot be limited thereto; that is, the equal changes and modifications made by the general applicants according to the scope of the patent application for the creation, All should remain within the scope of this creation patent.

10‧‧‧電鍍槽 10‧‧‧ plating bath

11‧‧‧藥液槽室 11‧‧‧ drug solution chamber

111‧‧‧第一隔板 111‧‧‧First partition

112‧‧‧第二隔板 112‧‧‧Second partition

113‧‧‧跨接部 113‧‧‧ bridging department

114‧‧‧流通槽口 114‧‧‧Circulation slot

115‧‧‧凹部 115‧‧‧ recess

12‧‧‧陽極板 12‧‧‧Anode plate

13‧‧‧陰極板 13‧‧‧ cathode plate

20‧‧‧製冷裝置 20‧‧‧Refrigeration unit

21‧‧‧循環管 21‧‧‧Circulation tube

30‧‧‧過濾裝置 30‧‧‧Filter device

31‧‧‧抽水管 31‧‧‧Water pipes

32‧‧‧出水管 32‧‧‧Outlet

33‧‧‧濾芯 33‧‧‧ filter

34‧‧‧抽水馬達 34‧‧‧ pumping motor

341‧‧‧出水端 341‧‧‧ water outlet

342‧‧‧抽水端 342‧‧‧ pumping end

343‧‧‧銜接管 343‧‧‧Connecting tube

Claims (3)

一種電鍍設備結構,其包含:一電鍍槽,該電鍍槽內部具有一藥液槽室,並設有至少一伸入藥液槽室內之陽極板,以及一跨設電鍍槽上方之陰極板;一製冷裝置,該製冷裝置具有一循環管,並將該循環管設置於藥液槽室內;一過濾裝置,該過濾裝置具有一抽水管以及一出水管,該抽水管之一端係連接一濾芯,另一端則設置於藥液槽室的底部,該出水管之一端係與電鍍槽組接,另一端則與一抽水馬達之出水端連接,又該抽水馬達之抽水端則又設有一銜接管與濾芯連接。 An electroplating apparatus structure comprising: a plating tank having a liquid chemical tank chamber therein; and at least one anode plate extending into the liquid chemical tank chamber; and a cathode plate spanning the plating tank; a refrigerating device, the refrigerating device has a circulation pipe, and the circulation pipe is disposed in the liquid chemical tank chamber; a filtering device having a water pumping pipe and an outlet pipe, one end of the water pipe is connected to a filter core, and the other One end is disposed at the bottom of the liquid medicine tank chamber, one end of the water outlet pipe is connected with the plating tank, the other end is connected with the water outlet end of a pumping motor, and the pumping end of the pumping motor is further provided with a connecting tube and a filter element. connection. 根據申請專利範圍第1項所述之電鍍設備結構,其中,該電鍍槽內部更設有第一隔板以及第二隔板,該第一隔板與該電鍍槽之外環壁同高,並對稱設有跨接部,以供製冷裝置之循環管卡接固定,而該第二隔板則低於第一隔板,且該第一、二隔板設有一流通槽口。 The electroplating apparatus structure according to the first aspect of the invention, wherein the electroplating tank is further provided with a first partition and a second partition, the first partition being at the same height as the outer wall of the plating tank, and The bridging portion is symmetrically disposed for the circulation tube of the refrigerating device to be snap-fitted, and the second partition is lower than the first partition, and the first and second partitions are provided with a flow slot. 根據申請專利範圍第1項所述之電鍍設備結構,其中,該電鍍槽上端部更設有二相對應之凹部,提供該陰極板的卡嵌固定。 The electroplating apparatus structure according to the first aspect of the invention, wherein the upper end portion of the plating tank is further provided with two corresponding recesses for providing the clamping and fixing of the cathode plate.
TW106202766U 2017-02-24 2017-02-24 Electroplating equipment structure TWM543250U (en)

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CN111254479A (en) * 2020-03-27 2020-06-09 京东方科技集团股份有限公司 Electrochemical deposition device
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