TWM517015U - Dust filter installed in semiconductor waste gas treatment apparatus - Google Patents

Description

Dust filter installed in semiconductor exhaust gas treatment equipment

The present invention relates to the structural technology of a dust filter, and more particularly to a dust filter installed in a semiconductor exhaust gas treatment device.

It is known that harmful exhaust gases such as monohalogenane (SiH ₄ ), chlorine (Cl ₂ ), and perfluorinated compounds (PFC) are generated in the semiconductor process. In order to avoid environmental pollution and pollution, the exhaust gas must be first The harmful substances are purified and removed before they can be discharged into the outside atmosphere.

The conventional semiconductor process exhaust gas is treated by injecting the exhaust gas into the exhaust gas treatment device, first receiving high temperature flame combustion in the exhaust gas treatment device or combining with high temperature gas to form a high temperature exhaust gas, forcing harmful substances in the exhaust gas to undergo high temperature catalysis, and further Decomposed into harmless substances, and then the water-soluble harmful substances such as fluorine, chlorocarbons and the like in the exhaust gas are dissolved in water by a sprinkling device in the exhaust gas treating device, thereby converting the exhaust gas into a harmless gas while cooling the gas. Gas to facilitate discharge to the outside atmosphere without causing environmental pollution. Usually, before the gas is discharged to the outside atmosphere, it is necessary to filter the gas through a dust filter, thereby removing water molecules and dust contained in the gas.

In the prior art, the above-mentioned dust filter generally refers to a cyclone filter, which is a centrifugal force and inertia generated by vortexing and rotating a gas in a filter, and is composed of water molecules and dust contained in the gas. The principle that both the specific gravity is greater than the specific gravity of the gas, the water molecules in the gas and the dust are separated from the gas, thereby achieving the purpose of removing water molecules and dust in the gas.

However, due to the cyclone filter in order to obtain water in the filtered gas The better effect of molecules and dust must be equipped with a blower, and a vortex-type air guide channel with a more complicated structure is constructed, so as to force the gas to be driven back into the vortex air guide channel by the blower, thereby filtering the water in the gas. Molecules and dust; however, there are disadvantages in that the cyclone filter has a complicated structure and is difficult to clean.

In view of this, the purpose of the present invention is to improve the problem that the conventional dust filter structure is too complicated and difficult to clean.

In order to solve the above problems, the present invention provides a dust filter installed in a semiconductor exhaust gas treatment device, the technical means comprising: a casing, the inside of which forms a chamber for providing a gas containing water molecules and dust; And at least one filter box is implanted into the chamber in an extractable manner, wherein the filter box is provided with a plurality of capture rings and a filter cotton for filtering water molecules and dust in the gas, and the gas sequentially passes through the capture ring and filter sponge.

In further implementation, the novel also includes:

The trap ring has a loop shape and has an axial line. The ring wall of the trap ring extends in a direction of its axis to form a plurality of tongues. The tongue is wavy.

The plurality of trapping rings are arranged in a staggered array, and the axis lines of the plurality of trapping rings are parallel to each other. Wherein the majority of the capture rings are of a two-layer construction, and the axial lines of the majority of the capture rings are excluded from overlapping.

The filter box includes a first filter box and a second filter box, and the first filter box and the second filter box are disposed in the chamber at intervals. A partition is also fixed in the chamber, and the partition is located between the first filter box and the second filter box.

According to the above technical solution, the technical effect of the novel is that the harmless gas which has been dissolved in the water to remove harmful substances in the exhaust gas treatment device can directly receive the natural discharge pressure of the gas in the exhaust gas treatment device and pass through the dust filter. In addition, a blower is used to force the flow of the exhaust gas, and Moreover, the structure of the dust filter can be effectively simplified; in addition, the filter box of the present invention adopts a removable design to facilitate the removal of the filter box, the dust removal cleaning and cleaning of the capture ring and the filter cotton, and then the cleaning. The finished filter box is placed inside the shell to enhance the convenience of cleaning the filter.

In addition, the relevant technical details that can be implemented by the present invention will be explained in the following embodiments and drawings.

10‧‧‧ shell

11‧‧‧ chamber

12‧‧‧ intake end

13‧‧‧Exhaust end

14‧‧‧Drainage

15‧‧‧ openings

16‧‧‧Slide rails

17‧‧‧Clean dry air nozzle

18‧‧‧ Pressure Detector

20‧‧‧Filter box

21‧‧‧First filter box

22‧‧‧Second filter box

23‧‧‧Baffle

24‧‧‧ Cover

25‧‧‧Guide

30‧‧‧ capture ring

31‧‧‧Axis line

32‧‧‧Circle

33‧‧‧ tongue

40‧‧‧Filter cotton

50‧‧‧Exhaust gas treatment equipment

51‧‧‧air inlet

52‧‧‧Exhaust port

53‧‧‧heat decomposition zone

54‧‧‧First Washing Area

55‧‧‧Second Washing Area

61‧‧‧Exhaust

62‧‧‧ water

63‧‧‧ gas

1 is a perspective exploded view of a preferred embodiment of the present invention; FIG. 2 is a cross-sectional view of FIG. 1 in combination; FIG. 3 is a perspective view of the capture ring of the present invention; FIG. FIG. 5 is a schematic cross-sectional view of the present invention when applied to a semiconductor exhaust gas treatment device.

First, please refer to FIG. 1 and FIG. 2 together to disclose a preferred embodiment of the present invention, and illustrate a dust filter provided in the semiconductor exhaust gas treatment device, comprising a casing 10 and at least one Filter box 20; wherein:

The casing 10 may be formed by welding or welding a metal plate (such as a stainless steel plate). A cavity 11 is formed in the casing 10, and the inlet end 12 of the communication chamber 11 is formed on the surface of the casing 10, respectively. The outlet end 13 allows gas to enter the chamber 11 via the inlet end 12 and then exits the outlet end 13. In the present invention, the gas system refers to a harmless gas produced by the semiconductor process exhaust gas after being subjected to heating and water washing treatment.

The filter box 20 is in the chamber 11 of the implant housing 10. Further, an opening 15 is formed on one side of the housing 10, and the filter box 20 can be implanted into the chamber 11 by the opening 15, In a specific implementation, the housing 10 can be provided with a sliding rail 16 extending into the chamber 11 from the opening 15, and the two sides of the filtering box 20 are respectively formed with guiding grooves 25 corresponding to the sliding rails 16, and the filtering box 20 is The guide groove 25 receives the guide of the slide rail 16 and is implanted into the chamber 11 by the opening 15, in other words, through the above design, the filter housing 20 can be easily removed into the implantation chamber 11 or by The chamber 11 is taken out.

A cover plate 24 is fixed on one side of the filter box 20 , and the surface area of the cover plate 24 is larger than the area of the opening 15 . When the filter box 20 is implanted into the chamber 11 , the cover plate 24 covers the opening 15 . The gas can be prevented from flowing out through the gap formed between the opening 15 and the filter box 20. The cover 24 can be provided with a handle (not shown), and the filter box 20 can be implanted by holding the handle. It is taken into or taken out of the chamber 11.

The filter box 20 is internally disposed with a plurality of trap rings 30 and a filter cotton 40. The trap ring 30 and the filter cotton 40 form two channels for filtering water molecules and dust in the gas in the filter box 20. The filter material, when the gas passes through the filter box 20, can pass through the trap ring 30 and the filter cotton 40 to remove water molecules and dust from the gas.

Referring to FIG. 2 and FIG. 3 together, the trap ring 30 may be formed by bending a metal body. The trap ring 30 has an axial line 31 along the axis of the trap ring 40. Line 31 is formed with a flow path through which gas can be supplied. In a specific implementation, the ring wall 32 of the trap ring 30 is formed with a plurality of tongues 33 extending in the axial direction, and the tongues 33 can increase the contact surface of the trap ring 30 with the gas. 33 is a wavy appearance in its implementation. More specifically, the tabs 33 are embossed by the annular wall 32 of the trap ring 30, which is captured by a property in which water molecules adhere to the metal surface. Water molecules and dust.

Referring to FIG. 1 and FIG. 2 together, the plurality of trap rings 30 are arranged in a staggered array in the filter box 20, so that the axis lines 31 of the plurality of trap rings 30 are parallel to each other, that is, The flow passages in the trap ring 30 are in the same direction, allowing the gas to smoothly pass through the trap ring 30. Further, referring to FIG. 4, the majority of the capture ring 30 may be of a two-layer configuration, and the overlap between the axial lines 31 of the plurality of capture rings 30 is excluded, so that the capture ring 30 is The staggered shape is presented to further enhance the contact surface of the tongue 33 with the gas in the trap ring 30, thereby enhancing the effect of the trap ring 30 on trapping gas water molecules and dust.

The filter box 20 includes a first filter box 21 and a second filter box 22 . The first filter box 21 and the second filter box 22 are disposed in the chamber 11 and are transmitted through the chamber 11 . The first filter box 21 and the second filter box 22 are arranged to enhance the effect of water molecules and dust in the filtered gas. In a specific implementation, a partition 23 is further disposed in the chamber 11 between the first filter box 21 and the second filter box 22, and the partition 23 can increase the moving path of the gas when passing through the chamber 11 and Time, and the filter 23 can be provided with filter cotton, which can effectively improve the effect of water molecules and dust in the filtered gas.

In addition, after the trap ring 30 and the filter cotton 40 filter out water molecules and dust in the gas, the water molecules collected on the trap ring 30 and the filter cotton 40 condense into water and fall to the bottom of the chamber 11, It is necessary to prevent the water from overflowing to other locations due to excessive accumulation (for example, an exhaust gas treatment device), so it is necessary to provide a drain port 14 at the bottom of the casing 10 for drainage work. The casing 10 is provided with a clean dry air (CDA) nozzle 17 and a pressure detector 18 adjacent to the air outlet end 13, and the clean drying air nozzle 17 can release clean dry air and gas flowing to the air outlet end 13. In combination, the pressure detector 18 is used to detect the pressure value when the gas passes through the gas outlet end 13.

Referring to FIG. 5, the exhaust port 52 of the semiconductor process exhaust gas treatment device 50 is connected to the casing 10, and the exhaust gas treatment device 50 is sequentially provided with a heating decomposition zone 53, a first water washing zone 54, and a second water washing zone 55. The exhaust gas 61 is first injected into the exhaust gas treatment device 50 via the air inlet 51. When the exhaust gas 61 passes through the heating decomposition zone 53, the harmful substances in the exhaust gas 61 are forced to undergo high temperature catalysis by flame or hot air, thereby decomposing into harmless substances. Then, the exhaust gas 61 sequentially enters the first water washing zone 54 and the second water washing zone 55, and is uniformly sprayed by the water 62 in a water curtain shape, so that the water 62 is in full contact with the exhaust gas 61, and the exhaust gas 61 is soluble in water. The harmful substance of 62 is dissolved in the water 62, and the exhaust gas 61 is converted into a harmless gas 63, and then enters the casing 10 through the exhaust port 52. The filter tank 20 is passed through the casing 10 to reduce water molecules and dust contained in the gas 63, and finally discharged to the outside atmosphere.

The above embodiments are merely illustrative of the preferred embodiments of the present invention, but are not to be construed as limiting the scope of the present invention. Therefore, the present invention is subject to the content of the claims defined in the scope of the patent application.

10‧‧‧ shell

13‧‧‧Exhaust end

15‧‧‧ openings

16‧‧‧Slide rails

17‧‧‧Clean dry air nozzle

18‧‧‧ Pressure Detector

20‧‧‧Filter box

21‧‧‧First filter box

22‧‧‧Second filter box

23‧‧‧Baffle

24‧‧‧ Cover

25‧‧‧Guide

30‧‧‧ capture ring

40‧‧‧Filter cotton

Claims (8)

A dust filter installed in a semiconductor exhaust gas treatment device, comprising: a casing having a chamber for providing a gas containing a gas containing water molecules and dust; and at least one filter box for being capable of being extracted In the chamber, a plurality of trap rings for filtering water molecules and dust in the gas and a filter cotton are disposed in the filter box, and the gas sequentially passes through the trap ring and the filter cotton. A dust filter installed in a semiconductor exhaust gas treating apparatus according to claim 1, wherein the trap ring has a loop shape and has an axial line. A dust filter installed in a semiconductor exhaust gas treating apparatus according to the second aspect of the invention, wherein a ring wall of the trap ring extends in a direction of an axial direction thereof to form a plurality of tongues. A dust filter installed in a semiconductor exhaust gas treating apparatus according to claim 3, wherein the tongue is wavy. A dust filter installed in a semiconductor exhaust gas treating apparatus according to claim 2, wherein the plurality of trap rings are arranged in a staggered array, and the axis lines of the plurality of trap rings are parallel to each other . A dust filter installed in a semiconductor exhaust gas treating apparatus according to claim 5, wherein the plurality of trap rings are of a two-layer configuration, and the axial lines of the plurality of trap rings are excluded from overlapping. The dust filter installed in the semiconductor exhaust gas treating device according to the first aspect of the invention, wherein the filter box comprises a first filter box and a second filter box, the first filter box and the second filter box The spacing is configured in the chamber. A dust filter installed in a semiconductor exhaust gas treatment device according to claim 7, wherein a partition is also fixed in the chamber, and the partition is located between the first filter box and the second filter box. .