TWM490720U - Apparatus for thin filming resist layer - Google Patents
Apparatus for thin filming resist layerInfo
- Publication number
- TWM490720U TWM490720U TW103202159U TW103202159U TWM490720U TW M490720 U TWM490720 U TW M490720U TW 103202159 U TW103202159 U TW 103202159U TW 103202159 U TW103202159 U TW 103202159U TW M490720 U TWM490720 U TW M490720U
- Authority
- TW
- Taiwan
- Prior art keywords
- resist layer
- thin filming
- filming resist
- thin
- layer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013032915 | 2013-02-22 | ||
JP2013272594A JP2014187352A (ja) | 2013-02-22 | 2013-12-27 | レジスト層の薄膜化装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWM490720U true TWM490720U (en) | 2014-11-21 |
Family
ID=51834549
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103202159U TWM490720U (en) | 2013-02-22 | 2014-02-06 | Apparatus for thin filming resist layer |
Country Status (3)
Country | Link |
---|---|
JP (2) | JP2014187352A (zh) |
KR (1) | KR200487657Y1 (zh) |
TW (1) | TWM490720U (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI700559B (zh) * | 2015-10-08 | 2020-08-01 | 日商三菱製紙股份有限公司 | 阻擋層的薄膜化裝置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016119396A (ja) * | 2014-12-22 | 2016-06-30 | 日立化成株式会社 | レジストパターンの製造方法、配線パターンの製造方法及び配線基板 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3518676B2 (ja) * | 2000-05-11 | 2004-04-12 | 東京化工機株式会社 | プリント配線基板材の表面処理装置 |
US8546066B2 (en) | 2008-01-30 | 2013-10-01 | Mitsubishi Paper Mills Limited | Method for electroconductive pattern formation |
JP5444050B2 (ja) | 2010-03-12 | 2014-03-19 | 三菱製紙株式会社 | ソルダーレジストパターンの形成方法 |
JP5498886B2 (ja) | 2010-07-26 | 2014-05-21 | 三菱製紙株式会社 | ドライフィルムレジストの薄膜化処理方法 |
JP5444172B2 (ja) | 2010-09-06 | 2014-03-19 | 三菱製紙株式会社 | ドライフィルムレジストの薄膜化処理方法 |
CN103109588B (zh) | 2010-09-28 | 2016-09-07 | 三菱制纸株式会社 | 阻焊图案的形成方法 |
-
2013
- 2013-12-27 JP JP2013272594A patent/JP2014187352A/ja active Pending
-
2014
- 2014-02-06 TW TW103202159U patent/TWM490720U/zh not_active IP Right Cessation
- 2014-02-21 KR KR2020140001320U patent/KR200487657Y1/ko active IP Right Grant
-
2016
- 2016-08-29 JP JP2016004184U patent/JP3207408U/ja not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI700559B (zh) * | 2015-10-08 | 2020-08-01 | 日商三菱製紙股份有限公司 | 阻擋層的薄膜化裝置 |
Also Published As
Publication number | Publication date |
---|---|
JP2014187352A (ja) | 2014-10-02 |
KR20140004866U (ko) | 2014-09-01 |
JP3207408U (ja) | 2016-11-10 |
KR200487657Y1 (ko) | 2018-10-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4K | Annulment or lapse of a utility model due to non-payment of fees |