M425387 五、新型說明： 【新型所屬之技術領域】 本創作係關於一種槽式濕製程設備’特別是關於—種可同 時操作複數個基板載具之槽式濕製程設備及用於該槽式濕製 程設備之處理槽(process tank)。 【先前技術】 應用於半導體、太陽能電池、硬碟片等之例如石夕晶圓 (silicon wafer)、石夕晶基板(silicon substrate)、玻璃基板、陶究基 板、塑膠基板 '樹酯基板(resin substrate)、金屬基板例如硬碟 片等，在製程中因為圖形化或|虫刻、清洗的需要，通常需進行 槽式濕製程。上述槽式濕製程，包含例如蝕刻或清洗等處理。 為了提高處理基板的速度，一般利用一基板载具(substrate earner ;也有稱為晶圓載具、晶舟盒、承載盒、花籃等等的情 況），基板載具可容納複數基板，再以該基板載具為一處理單 位，移動於各製程槽或處理槽(proems tank)之間。第一圖表示 一習知市㈣基板載具。如第—圖所示，基域具的左右側板 邊刀另i具有2個圓孔，機械手臂可藉由總共4個圓孔進行搬 送。第二圖表示根據先前技術的處理槽，其中該處理槽可容納 2個基板麟，而且並聯制（卿處_内複錄板排列形 成左右—排之排列方式）。第三圖表示根據先前技術的另一 處理槽，其中該處理槽可容納2個基板載具，而且串聯排列（亦 即處理才曰内複數基板排列开》成一長排之排列方式）。 M425387 成本。 本創作之目的之-在於提供一種槽式濕製程設備，因應槽 式濕製程的魏賊求，提供提高紐賴前的最終清^ 的潔淨度的方法。 根據本創作之-實補樣，揭露—種槽式賴程設備，包 含：使用可分離於設備之複數基板載具，用以承載複數被處理 物(即基板）’該基板載具上具有複數側板凹槽 之側板上方;一第一輸送裝置，具有複數第一承載部= 第-承載部係對應該基板載具之側板凹槽而設置，該輪送裝置 係藉由該複數第—承載部與該基域具之複數地凹槽相互 鉤合，最多可同時书掛及移動2個該複數基板載具；複^第— 處理槽，具有複數定位構件，藉由該定位構件，使該基板載具 能被該第-輸送裝置放置於該第—處理針—特定位置，該第 -處理槽衫可藉由該定位構件(於該特定位置)容置2個基板 载具；以及複數第二處理槽，具有複數定位構件，使該基板載 具能被該第-輸送裝置放置於—特定位置，該第二處理槽最多 可藉由該定位構件(於該特定位置)容置4個基域具，該, 基板載具-般而言係排列成矩陣狀（即排列成2x2矩陣）；其 中，該複數第-處理槽與該複數第二處理槽係依據設傷功能性 需求，混合配置於該槽式濕製程設備中。 於一實施例’上述槽式濕製程設備包含第二處理槽時，，亥 複數第二處理槽及該(複數)第—輸送I置配置於該槽式日濕製^ 5 M425387 設備的一第一段(一般而言所謂設備的前段)，且該複數第一處理 槽及該(複數)第一輸送裝置配置於該槽式濕製程設備的一第二 段(一般而言所謂設備的中段'後段），該第一段為設備起始端或 鄰接起始端而§亥弟二段與該第一段相連接。 於一實施例，上述槽式濕製程設備更包含：一第二輸送裝 置，具有複數第二承載部，該複數第二承載部係對應該基板載M425387 V. New description: [New technical field] This series is about a trough wet process equipment, especially for a trough wet process equipment capable of simultaneously operating a plurality of substrate carriers and for the trough wet The process tank of the process equipment. [Prior Art] It is applied to semiconductor wafers, solar cells, hard disks, etc., such as silicon wafers, silicon substrates, glass substrates, ceramic substrates, and plastic substrate 'street substrates (resin) Substrate), a metal substrate such as a hard disk, etc., in the process, because of the need for patterning or insect engraving, cleaning, a trough wet process is usually required. The above-described tank wet process includes processes such as etching or cleaning. In order to increase the speed of processing the substrate, a substrate carrier (also referred to as a wafer carrier, a boat cassette, a carrying case, a flower basket, etc.) is generally used, and the substrate carrier can accommodate a plurality of substrates, and then the substrate The carrier is a processing unit that moves between each process slot or proems tank. The first figure shows a conventional city (four) substrate carrier. As shown in the first figure, the left and right side plates of the base field have two round holes, and the robot arm can be transported by a total of four round holes. The second figure shows a processing tank according to the prior art, wherein the processing tank can accommodate two substrate linings, and is connected in parallel (the cleavage-inward recording boards are arranged to form a left-right-row arrangement). The third figure shows another processing tank according to the prior art, wherein the processing tank can accommodate two substrate carriers, and is arranged in series (i.e., the processing is such that the plurality of substrates are arranged in a long row). M425387 cost. The purpose of this creation is to provide a trough wet process equipment that provides a means of improving the cleanliness of the final cleaning before the Nilai Lai in response to the wet process of the trough wet process. According to the present invention, the present invention discloses a trough-type device, which comprises: using a plurality of substrate carriers separable from the device for carrying a plurality of processed objects (ie, substrates), the substrate carrier having a plurality of substrates Above the side plate of the side plate groove; a first conveying device having a plurality of first bearing portions=the first bearing portion is disposed corresponding to the side plate groove of the substrate carrier, wherein the plurality of first bearing portions are provided by the plurality of first bearing portions And the plurality of grooves of the base region are hooked together, and at most two of the plurality of substrate carriers can be simultaneously hung and moved; the plurality of processing grooves have a plurality of positioning members, and the substrate is made by the positioning member The carrier can be placed in the first processing device at the specific position of the first processing device, and the first processing slot can accommodate two substrate carriers by the positioning member (at the specific position); and the second plurality The processing tank has a plurality of positioning members, so that the substrate carrier can be placed in the specific position by the first conveying device, and the second processing groove can accommodate four base regions by the positioning member at the specific position With the substrate carrier - in general The arrays are arranged in a matrix (i.e., arranged in a 2x2 matrix); wherein the plurality of first processing tanks and the plurality of second processing tanks are mixed and disposed in the trough wet processing apparatus according to the functional requirements of the damage. In an embodiment, when the trough wet processing apparatus includes a second processing tank, the second processing tank and the (multiple) first conveying I are disposed in the first of the trough type humidifying apparatus 5 M425387 a section (generally referred to as the front section of the apparatus), and the plurality of first processing tanks and the (plural) first conveying device are disposed in a second section of the trough wet processing apparatus (generally referred to as the middle section of the apparatus) In the latter stage, the first segment is the beginning of the device or the adjacent starting end and the second segment is connected to the first segment. In one embodiment, the trough wet processing apparatus further includes: a second transporting device having a plurality of second carrying portions, the plurality of second carrying portions corresponding to the substrate carrying
具之側板凹槽而设置’該第二輸送裝置係藉由該複數第二承載 部與該基板載具之複數侧板凹槽相互鉤合，最多可同時吊掛及 移動4個該複數基板載具’―般而錢$個基板載具係排列成 矩陣狀（即排列成2x2矩陣）。Provided with the side plate recesses, the second conveying device is hooked to the plurality of side plate grooves of the substrate carrier by the plurality of second bearing portions, and at most four of the plurality of substrates can be suspended and moved at the same time. The 'substance and money' substrate carriers are arranged in a matrix (ie, arranged in a 2x2 matrix).
g丄钱裂程設備包含第二輸送裝置時， 該複數第二歧槽域(概)第二輸送裝置配置於該槽式濕 製程設備的-第-段(―般而謂謂設借的前段），且該複數第 處理槽及5亥(複數)第—輪送裝置配置於該槽式濕製程設備 第二段(-般而謂謂設備的幢 '後段），該第—段為設 備起始端_接_端而該第二段與該第—段相連接。 勺入根據本創作之另—實施態樣，揭露—種槽式濕製程設備， =數基板载具’用以承載複數被處理物(即基板)，該基 件載麵數側板㈣；複數處理槽，具有複數定位構 該特構件設置於處理槽中，可藉由該定位構件(於 置4個基板载Γ.基板載具容置於—特定位置，該處理槽可容 以及-輸送裝置’具有複數承載部，該複數 6 M425387 【實施方式】 有關本創作之耵述及其他技術内容、特點與功效，在以下 配合參考圖式之-較佳實施例的詳細說明巾，將可清楚的呈 現。以下實施例中所提到的方向用語，例如：上下左、右、 前或後等’僅是參考附加圖式的方向。因此，使用的方向用語 是用來說明並非用來限制本創作。 根據本創狀第-實絲樣，揭露―錢式濕製程設備， 第九圖表示-實施例之槽式濕製程設傷1〇〇的上視示意圖。槽 式濕製程設備100包含5個處理槽2⑻、複數基板載具以 及輸送裝置500。處理槽200可容置4個基板載具，且該4個 基板載具排列成2x2矩陣狀。 第六圖表示處理槽200的立體透視示意圖。於處理槽2〇〇的内 部底板上板面(彻底板面械理綱〃方向之㈣），具有複 數定位塊210。該蚊位塊21〇可將基板载具粒及容置於處 理槽200令的特定位置。雖然第九圖中，槽式濕製程設備觸 包含5個處理槽200，但本創作不限於±述例示，其係依據製 程需要’設置所需數目的處理槽2〇〇。複數種的處理液，例如 酸處理藥液、驗處理藥液、含有洗淨劑、界面活性劑等的水溶 液、去離子水等，分別可放入(不同個)處理槽200中，提供不 同功能性_抛。當然本創作之槽式難程設備励，可更 包含藥液加熱設備’分別設置於各處理槽2〇〇之槽内周圍，以 調整濕製程所需的操作溫度。 8 基板載具3〇0所承載之被處理物，例如為石夕晶圓(础_ wafer) '矽晶基、玻璃基板陶瓷基板塑 膠基板、樹酯基板(resin substrate)、金屬基板、硬碟片等的各 種基板。 定位塊210只要能定位及容置(how)基板载具可具有各 種形狀，例如可具有L字形或T字形截面形狀。 第四圖表示基板載具3〇〇的立體側視示意圖。在左右兩側 板面’分別具有2侧板凹槽310。基板載具的複數桿㈣)上 有複數齒型突出部（pin) 320，而複數基板是安置在複數齒型 突出部320之複數齒型突出部間隙⑦岀gap)中。 第七圖表示輸送裝置500的示意圖。輸送裝置5〇〇具有16個 承載部510 ’該承載部係對應側板凹槽31〇的位置而設置。輸 送裝置500藉由承載部510與側板凹槽31〇之組合，一次可吊 掛及移動4個基板載具。如第九圖所示，輸送裝置5〇〇可沿著 處理槽2〇0的排列方向，即依複數處理槽細製程順序㈣㈣ sequence)的移動方向，亦即圖面的左右方向(一般為槽式濕製 程設備的長軸方向，X轴)做移動，進行基板載具3〇〇的搬送； 而當欲從處理槽200中取出或放入基板載具3〇〇時，輸送裝置 500可上下（註：由於第九圖為上視圖，所謂上下係指進出紙 面的方向，亦即垂直於紙面的Z軸方向）移動。輸送裝置5〇〇， 可進行X-Z二軸的位置移動。 如第七圖所示，承載部510為前端寬之大頭針狀梢釘（kn〇b)， M425387 但本創作不限於上述例示，只要承載部510與側板凹槽的形狀 互相配合，機械強度及穩定度足以提起或放下基板載具即可。 根據本創作之第二實施態樣’揭露一種槽式濕製程設備， 第十圖表示根據一實施例之槽式濕製程設備101的上視示意 屬。第二實施態樣與第一實施態樣不同之處，在於第二實施態 樣包含2種處理槽’可容置2個基板載具之第一處理槽2〇〇以 及可容置4個基板載具300之第二處理槽4〇〇，以及輸送裝置 501為一次可同時吊掛及移動2個基板載具3〇〇之裝置。如第 十圖所示’槽式濕製程設備101包含3個第一處理槽2〇〇、3 個第二處理槽400、複數基板載具3〇〇以及輸送裝置5〇1。 第五圖表示處理槽400的立體側視示意圖。 第八圖表示根據輸送裝置501的示意圖。輸送裝置5〇1具有& 個承載部510 ’該承載部係對應側板凹槽31〇的位置而設置。 如第十圖所示’藉由使用輸送裝置501，一次同時吊掛及移動 2個基板載具300，第一處理槽200與第二處理槽4〇〇，可依 據製程功能性需求而混合設置，提供設備充分的靈活性，亦即 第一處理槽200與第二處理槽400之排列組合方式不限於第十 圖所示之例。再者，槽式濕製程設備101的其他構成要項與槽 式濕製程設備100相同，其變化亦如上述，在此不再贅述。 根據本創作之第三實施態樣，揭露一種槽式濕製程設備， 第十一圖表示根據一實施例之槽式濕製程設備1〇2的上視示 意圖。第二貫施態樣與第二實施態樣不同之處，在於第三實施 態樣包含2種輸送裝置，以進一步提高輸送處理速度。如第十 一圖所示，槽式濕製裎設備102包含3個第一處理槽2〇〇、3 個第二處理槽400、複數基板載具3〇〇、第一輸送裝置5〇1以 及第二輸送裝置500。槽式濕製程設備1〇2分為第一段1〇2& 與第_二磲l〇2b，第一處理槽2〇〇及第一赞送裝置5〇1配置於 該槽式濕製程設備的第二段l〇2b，且第二處理槽4〇〇及第二 輸运裝置500配置於該槽式濕製程設備的第一段1〇2a，該第 一段102a為濕製程起始端或鄰接濕製程起始端而該第二段 102b與該第一段l〇2a相連接。如此，第一輸送裝置5〇1進行 第二段102b的基域具之吊掛及移動，第二輸送裝置5〇〇進 行第一段的基板載具之吊掛及移動。再者，槽式濕製程設備 102的其他構成要項與槽式濕製程設備1〇1相同，其變化亦如 上述，在此不再贅述。 练上所述，根據本創作之槽式濕製程設備及處理槽配置方 法’可更進-步提高槽式濕製程產㊣，同時減少設備佔地，及 使用複數$處理槽以提高基板乾燥前的最終清洗潔淨度的 方法，以因應槽式濕製程降低生產成本之趨勢。 以上雖以特定實施例說明本創作，但並不因此限定本創作 之範圍〃要不脫離本創作之要旨，熟悉本技藝者瞭解在不脫 離本創作的輯及細下可進行各觀形或變更。另外本創作 的任Λ轭例或申請專利範圍不須達成本創作所揭露之全部 目的或優點或特點。此外，摘要部分和標題僅是用來輔助專利 M425387 文件搜尋之用，並非用來限制本創作之權利範圍。 【圖式簡單說明】 第一圖表示根據先前技術的基板載具的立體側視示意圖。 第二圖表示根據先前技術的一處理槽及其中基板載具的上視 不意圖。 第三圖表示根據先前技術的一處理槽及其中基板载具的上視 不意圖。 第四圖表示根據先鈾技術的一基板載具的立體側視示意圖。 第五圖表示根據先前技術的一處理槽的立體側視示意圖。 第六圖表示根據本創作一實施例之一處理槽的立體側視示意 圖。 第七圖表示根據本創作一實施例之輸送裝置的立體側視意圖。 第八圖表示根據先前技術的一輸送裝置的立體側視示意圖。 第九圖表示根據本創作一實施例之槽式濕製程設備的其中一 段的上視示意圖。 第十圖表示根據本創作一實施例之槽式濕製程設備的其中一 段的上視示意圖。 第十一圖表示根據本創作一實施例之槽式濕製程設備的其中 一段的上視示意圖。 弟十一圖表示根據先前技術的槽式濕製程設備的其中一段的 上視示意圖。 12 M425387 【主要元件符號說明】 100, 101，102, 103 :槽式濕製程設備 102a :第一段 102b :第二段 200,203 :處理槽（第一 4理槽） 400 :處理槽（第二處理槽） 210 :定位塊 300, 303 :基板載具 310 :侧板凹槽 320 :齒型突出部（pin) 500 :輸送裝置（第二輸送裝置） 501，503:輸送裝置（第一輸送裝置) 510 :承載部When the 丄 裂 裂 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 包含 第二 第二 第二 第二 第二 第二 第二 第二 第二 第二 第二 第二And the plurality of processing tanks and the 5th (complex) first-wheeling device are disposed in the second section of the trough wet processing equipment (the latter part of the building of the equipment), the first section is the equipment The beginning end is connected to the end and the second segment is connected to the first segment. According to another embodiment of the present invention, a trough type wet process equipment is disclosed, where a plurality of substrate carriers are used to carry a plurality of substrates (ie, substrates), and the number of side plates of the base member is four (four); The groove has a plurality of positioning members, and the special member is disposed in the processing tank, and the positioning member is disposed on the substrate. The substrate carrier is placed in a specific position, and the processing tank can accommodate and convey the device. Having a plurality of load-bearing portions, the plural number 6 M425387 [Embodiment] With regard to the description of the present invention and other technical contents, features and effects, the detailed description of the preferred embodiment with reference to the following drawings will be clearly presented. The directional terms mentioned in the following embodiments, for example, up and down left, right, front or back, etc. are only directions referring to the additional drawings. Therefore, the directional term used is used to illustrate that it is not intended to limit the creation. According to the first-solid silk sample of the present invention, the "money-type wet process equipment" is disclosed, and the ninth diagram shows a top view of the tank-type wet process set-up of the embodiment. The trough wet process equipment 100 includes 5 treatments. Slot 2 (8), complex The substrate carrier and the transport device 500. The processing tank 200 can accommodate four substrate carriers, and the four substrate carriers are arranged in a 2x2 matrix. The sixth figure shows a perspective perspective view of the processing tank 200. The inner surface of the crucible (the fourth board is in the direction of the board) (4), and has a plurality of positioning blocks 210. The mosquito unit 21 can hold the substrate carrier and the specific position of the processing tank 200. Although in the ninth figure, the trough type wet process equipment includes five processing tanks 200, the present creation is not limited to the description, which is to set a required number of processing tanks 2 according to the process requirements. For example, an acid treatment solution, a treatment solution, an aqueous solution containing a detergent, a surfactant, or the like, deionized water, or the like may be placed in the (different) treatment tanks 200 to provide different functionalities. The tank-type refractory equipment excitation of the present invention may further include a liquid chemical heating device disposed around the groove of each processing tank 2 to adjust the operating temperature required for the wet process. 8 substrate carrier 3〇0 The object to be treated, such as Shi Xijing Various substrates such as a circular substrate, a glass substrate, a resin substrate, a resin substrate, a metal substrate, and a hard disk. The positioning block 210 can be positioned and accommodated. The carrier may have various shapes, for example, may have an L-shaped or T-shaped cross-sectional shape. The fourth figure shows a schematic side view of the substrate carrier 3〇〇. The left and right side plates have respective two side plate grooves 310. The plurality of teeth (pins) 320 are provided on the plurality of rods (four) of the carrier, and the plurality of substrates are disposed in the plurality of toothed protrusion gaps 7 岀 gap) of the plurality of toothed projections 320. The seventh diagram shows a schematic view of the delivery device 500. The conveying device 5 has 16 bearing portions 510' which are disposed corresponding to the positions of the side plate grooves 31A. The transport device 500 can hang and move four substrate carriers at a time by a combination of the carrier portion 510 and the side plate recess 31〇. As shown in the ninth figure, the conveying device 5〇〇 can be along the direction of arrangement of the processing tanks 2〇0, that is, according to the moving direction of the complex processing sequence (four) (four) sequence, that is, the left and right direction of the drawing (generally the groove) The long axis direction of the wet processing equipment, the X axis) is moved to carry the substrate carrier 3〇〇, and when the substrate carrier 3 is to be taken out or placed in the processing tank 200, the conveying device 500 can be moved up and down. (Note: Since the ninth figure is the upper view, the so-called up and down refers to the direction of entering and exiting the paper surface, that is, perpendicular to the Z-axis direction of the paper surface). The conveyor 5 〇〇 can perform positional movement of the X-Z two axes. As shown in the seventh figure, the bearing portion 510 is a pin-shaped tip (kn〇b) of the front end width, M425387. However, the present invention is not limited to the above description, as long as the shape of the bearing portion 510 and the side plate groove cooperate with each other, mechanical strength and stability. It is enough to lift or lower the substrate carrier. According to a second embodiment of the present invention, a trough wet process apparatus is disclosed, and a tenth diagram shows a top view of a trough wet process apparatus 101 according to an embodiment. The second embodiment differs from the first embodiment in that the second embodiment includes two processing tanks, a first processing tank 2 accommodating two substrate carriers, and four substrates can be accommodated. The second processing tank 4 of the carrier 300 and the conveying device 501 are devices capable of simultaneously hoisting and moving two substrate carriers 3 at a time. As shown in Fig. 10, the trough wet process apparatus 101 includes three first processing tanks 2, three second processing tanks 400, a plurality of substrate carriers 3, and a conveying device 5〇1. The fifth figure shows a schematic side view of the processing tank 400. The eighth diagram shows a schematic view according to the conveying device 501. The conveying device 5〇1 has & bearing portions 510' which are disposed corresponding to the position of the side plate recess 31〇. As shown in the tenth figure, by using the transport device 501, two substrate carriers 300 are simultaneously suspended and moved, and the first processing tank 200 and the second processing tank 4 are mixed and set according to the process functional requirements. The device is provided with sufficient flexibility, that is, the arrangement of the first processing tank 200 and the second processing tank 400 is not limited to the example shown in the tenth figure. The other components of the trough wet processing apparatus 101 are the same as those of the trough wet processing apparatus 100, and the changes are also as described above, and are not described herein again. According to a third embodiment of the present invention, a trough wet process apparatus is disclosed, and an eleventh diagram shows an upper view of a trough wet process apparatus 1A according to an embodiment. The second embodiment differs from the second embodiment in that the third embodiment includes two types of conveying means to further increase the conveying processing speed. As shown in FIG. 11 , the trough wet mash apparatus 102 includes three first processing tanks 2 〇〇 , three second processing tanks 400 , a plurality of substrate carriers 3 〇〇 , a first conveying device 5 〇 1 , and Second delivery device 500. The trough type wet process equipment 1〇2 is divided into a first stage 1〇2& and a second stage l〇2b, and the first processing tank 2〇〇 and the first feeding device 5〇1 are disposed in the trough wet processing equipment The second stage l〇2b, and the second processing tank 4〇〇 and the second transport apparatus 500 are disposed in the first section 1〇2a of the trough wet processing apparatus, the first section 102a is a wet process start end or Adjacent to the wet process start end and the second segment 102b is coupled to the first segment l2a. In this manner, the first transport device 5〇1 hangs and moves the base region of the second segment 102b, and the second transport device 5 hangs and moves the substrate carrier of the first segment. Furthermore, the other constituent elements of the trough wet processing apparatus 102 are the same as those of the trough wet processing apparatus 101, and the changes are also as described above, and are not described herein again. According to the above description, the trough wet process equipment and the treatment tank configuration method of the present invention can further improve the production process of the trough wet process, reduce the equipment occupation, and use a plurality of treatment tanks to improve the drying of the substrate. The final cleanliness method is to reduce the production cost in response to the trough wet process. The present invention has been described above in terms of specific embodiments, but does not limit the scope of the present invention to the spirit of the present invention. Those skilled in the art will be able to make various changes or changes without departing from the scope of the present invention. . In addition, the yoke or patent application scope of this creation does not require the full purpose or advantages or features disclosed in this creation. In addition, the abstract sections and headings are only used to assist in the search for patent M425387 documents and are not intended to limit the scope of this creation. BRIEF DESCRIPTION OF THE DRAWINGS The first figure shows a schematic side view of a substrate carrier according to the prior art. The second figure shows a top view of a processing tank and its substrate carrier in accordance with the prior art. The third figure shows a top view of a processing tank and its substrate carrier according to the prior art. The fourth figure shows a schematic side view of a substrate carrier according to the prior uranium technology. The fifth figure shows a perspective side view of a processing tank according to the prior art. Figure 6 is a perspective, side elevational view of a processing tank in accordance with one embodiment of the present invention. The seventh figure shows a perspective side view of the delivery device according to an embodiment of the present invention. The eighth figure shows a perspective side view of a delivery device according to the prior art. Figure 9 is a top plan view showing one of the sections of the trough wet process apparatus according to an embodiment of the present invention. Figure 11 is a top plan view showing one of the sections of the trough wet process apparatus according to an embodiment of the present invention. Fig. 11 is a top plan view showing a section of a trough wet process apparatus according to an embodiment of the present invention. The eleventh diagram shows a top view of one of the sections of the trough wet process apparatus according to the prior art. 12 M425387 [Description of main component symbols] 100, 101, 102, 103: trough wet process equipment 102a: first section 102b: second section 200, 203: treatment tank (first 4 tank) 400: treatment tank (second treatment Slot) 210: positioning block 300, 303: substrate carrier 310: side plate groove 320: toothed pin 500: conveying device (second conveying device) 501, 503: conveying device (first conveying device) 510: Carrying part