M418512 五、新型說明： 【新型所屬之技術領域】 本創作係關於一種線路成形輔 裝置，尤指一種應用 於印刷電路板之線路曝光製程中， ‘ 可有效減少落塵算里物 對光源之鞋以輔助料正確^彡，# : 活動蓋式線路成形輔助裝置。 5正-立的 【先前技術】 如 利用曝 乾膜， 案化的 品置放 於平台 底部， 源投射 態投射 表面之 惟 ，會導 遮蔽， 經過後M418512 V. New description: [New technical field] This creation is about a line forming auxiliary device, especially in a line exposure process applied to printed circuit boards, which can effectively reduce the amount of dust falling into the light source shoes. Auxiliary material is correct ^彡,# : movable cover line forming auxiliary device. 5正-立 [Previous technique] If the exposed film is used, the cased product is placed on the bottom of the platform, and the source projection surface is projected, and the shadow is guided.
軟式印刷電路板…等製品之線路成形製程中，立传 光顯影手段將底片之線路圖㈣轉至製品上的光阻 接續經過姓刻手段等步驟，使製品的銅落層形成圖 線路。在前述曝光步驟中’其主要係將欲曝光的製 於曝光機的平台上，藉由真空吸附手段使製品固定 上’另將-具有線路圖案的底片安裝於一底片框架 並藉底片框架裝設於平台正上方，之後，令uv光 於底片框架上方的反射鏡，使uv光以平行光之型 於底片上，其中通過底片圖案的部分uv光使製品 光阻乾膜曝光而產生聚合反應。 别述曝光步驟中，曝光機機台内因氣流循環不佳時 致環境中落塵掉落於底片上方，對光源產生區域性 而衫響製品表面之光阻乾膜曝光聚合的品質，以致 々的敍刻步驟而成形線路後，易發生成形後線路c 斷路或缺口的情事。為此’本創作申請人先前曾提出—線 路成形輔助裝置新型申請案，其主要係利用一可固定於底 片框架上的環狀框架支撐一透光板，用以覆蓋於底片上方 3 M418512 ，藉由透光板阻隔落塵掉落在底片，纟uv光源投射於落 塵可產生繞射’降低落塵對& uv光源的遮蔽性，使uv 光源可確實完整的通過底片圖案，使後續線路钱刻成形後 ’使線路粗細形狀正破而無異常，而達成提升產品良率。 前述線路成形輔助裝置確可達成其預期功效斑目的， 但是該透缺H由環形框_心以㈣上而覆蓋 上，在曝光顯影作業中製品若 - 影鏡頭無法對位判別時，需要：!=?機台對位攝 線路成形辅助裝置之透光底時’因該 上，在底片位置調丄狀框架固定於广“框架 【新型内容】 β正邗某之刼作上較為不便。 本創作之主要目的在於提一 助F晉，备益^ 種活動蓋式線路成形輔 便詷軚6 解别述線路成形輔助裝置不 便凋整底片位置的問題。 不丑+ 為達成前揭目的，本創作 辅助裝置係包含： 权㈣盍式線路成形 —環形框體，係用以固定於一 ; 、底片框架之通孔外周圍 述通孔係固定於環形框體頂緣’ I用以覆蓋於所 之通孔之曝光區段正上方而未覆蓋所述通：：：所 -承載架，係用以固定於所述底片 2 “又’ 環形框體外側；以及 /、之通孔外圍與 —蓋板，係可活動的裝設於 於所述通孔之操作區段正上方。載系一閉的覆蓋 藉此活動蓋式線路成形輔助裝置設計，除利用_可固 M418512 定於底片框架上的環形框體支撐一透光板，用以 #的曝光區段上方’藉由透光板阻隔落塵掉落在二盍於底 光源投射於落塵可產生折射，降低落塵對：心源： 遮蔽性，使uv光源可確實完整的通過底片圖案，而；吏製 品上的光阻乾膜曝光而產生聚合反應，進而在後 刻成形後，使線路粗細形狀正確而無異常 作之活動蓋式線路成形辅助裝置，進一 側之可活動的蓋板設計，於作業中之製品位置稍=- 機：賴影：頭無法對位判別，需進行底片移動微調整 作％ %啟盍板’以顯露底片框架之通孔操作區段而呈 開啟狀態，讓操作者可伸入底片框架 荖，诂孤战π U Τ ;整底片位 置使對位攝衫鏡頭能對準製品，待底片位置調 = = ΓΓ通孔操作區段正上方之關閉狀態： *先4，如此，使底片的調整作業具有簡便性。 【實施方式】 辅助=I :圖3所示’係揭示本創作活動蓋式線路成形 架： —較佳貫施例結合於安裝有底片3之底片框 2〇之^圖，戶斤述底片框架2中具有一通孔2〇，通孔 片3、 +先區段與一操作區段’所述曝光區段相應於底 的曝光區，操作區段位於曝光區段之—側端，至 ^之活動蓋式線路成形輔助裝置,係包含—環形框體1〇 透光板11、—承載架12及一蓋板13，其中： 所逑環形框體1()係用以固定於底片框架2上表 I:大2=周圍：，環形框體1〇之高度依所欲改變落塵的 以及影響程度而設定，於本較佳實施例中，該環 形樞體10可為二相對側板部1〇1與二相對端板部1〇2接 合而成之矩形框體。 所述透光板11係固定於環形框體10頂緣且覆蓋於底 片框架2之通孔20曝光區段正上方而未覆蓋操作區段， 斤迷透光板可選用透明無色的素玻璃，透光板11之板 體厚度係以不產生曲面為原則，並依實際應用之底片大小 面積而作適當的調整，避免產生不利的光源散射現象且 透光板11也不宜過厚’避免透光板的透光度不足。 如圖1所示的較佳貫施例，所述環形框體1 〇頂部可 為平面之設計，透光板11固定於環形框體彳〇頂部平面上 ’或者，所述環形框體頂部内周緣亦可形成嵌槽，嵌槽底 部為支撐部’透光板嵌入於環形框體頂部的嵌槽中，並為 嵌槽底部之支撐部於透光板周邊支撐。 所述的承載架12係用以固定於底片框架2上表面且 至少位於通孔20之操作區段與環形框體1 〇的外圍，於本 較佳實施例中’承載架12包含有二相對設置之架板1 21， 該二側架板1 21自通孔20之操作區段外圍延伸至曝光區 段外圍之環形框體1 〇外側，該二側架板1 2 1内側面各設 有一滑槽122 ’滑槽1 22高於透光板11與環形框體1 〇頂 部。 所述蓋板1 3係可活動裝設於承載架彳2上且位於底片 框架2之通孔20操作區段正上方，所述蓋板可為掀蓋式 、滑蓋式或其他啟閉型式的蓋板，於本較佳實施例中，蓋 板1 3係以其兩側邊可滑移的組設於該二滑槽1 22中，使 蓋板彳3能自所述通孔20操作區段上方滑移至曝光區段之 •之〇〇12 透光板11上方’達到顯露通孔2Q操作區段之開啟狀態。 如圖4所示，本創作活動蓋式線路成形輔助裝置ί應 用於底片框架2後，蓋板13是處於覆蓋底片框架2之通 孔20操作區段上方之關閉狀態，於底片框架2之通孔2〇 底部預先裝設有具有線路圖案的底片3’再安裝於曝光機 中之平台5上方處’另將欲具有光阻乾膜的製品*定位置 敌於平纟5上，並藉由曝光機機台中之影像對位判斷裝置 判別製品是否正確對位，若正確對位，令υν光源6投射 ;機。的反射鏡7上’使Uv光折射並以平行光之型離向 下通過透光板1WU框架2中的通孔2Q而投射於以 上，其中通過底# 3、線路圖案的部分U 面之光阻乾膜曝光而產生聚合反應，於完成曝光 即可進行後續的線路蝕刻成形步驟。 本創作所。又。十之活動蓋式線路成形輔助裝置設計，如 圖5所不，是利用透光板q阻隔落塵ρ掉落在底片％In the circuit forming process of flexible printed circuit boards, etc., the vertical light developing means converts the circuit diagram (4) of the negative film to the photoresist on the product, and then passes through the steps of the surname to make the copper falling layer of the product form a pattern line. In the above-mentioned exposure step, it is mainly used to fix the product to be exposed on the platform of the exposure machine, and the article is fixed by vacuum adsorption means, and the film having the line pattern is mounted on a film frame and mounted on the film frame. Immediately above the platform, afterwards, the uv light is reflected on the mirror above the film frame, so that the uv light is formed on the film in parallel light, wherein a part of the uv light of the film pattern exposes the dry film of the product to cause a polymerization reaction. In the exposure step, when the circulation of the airflow in the exposure machine is not good, the dust in the environment will fall on the top of the film, and the quality of the light-sensitive dry film exposure polymerization of the surface of the product will be generated. After the step is formed and the line is formed, the line c is broken or notched after the forming. To this end, the applicant of the present invention has previously proposed a new application for a line forming auxiliary device, which mainly supports a light-transmitting plate by an annular frame which can be fixed on the film frame to cover the upper surface of the film 3 M418512, The light-transmissive plate blocks the falling dust from falling on the negative film, and the 纟uv light source is projected onto the dust to generate a diffractive 'lowering dust to the & uv light source, so that the uv light source can pass through the negative film pattern completely, so that the subsequent line can be formed. After 'making the line thickness shape broken without abnormality, and achieving product yield improvement. The above-mentioned line forming auxiliary device can achieve its intended efficacy, but the leakage H is covered by the ring frame _ heart (4), and in the exposure developing operation, if the product lens cannot be aligned, it needs:! =? When the machine is in the position of the light-transmitting bottom of the line-forming auxiliary device, it is inconvenient to fix the frame at the position of the film at the position of the film. The main purpose of this is to help F Jin, and to prepare for the activity of the cover line forming auxiliary 詷軚 6 to explain the inconvenience of the line forming auxiliary device to the position of the film. Not ugly + for the purpose of achieving the goal, this creation aid The device comprises: a right (four) 线路-type line forming-ring frame, which is used for fixing to a; the through-hole of the film frame is fixed around the top edge of the ring frame to cover the top of the ring frame The through-area of the aperture is not directly covered but does not cover the through::: carrier, which is used to be fixed to the outer side of the film 2 "and" outside the ring frame; and /, the periphery of the through hole and the cover plate, Active in The through-hole just above the operating section. The closed cover of the carrier is designed by the movable cover line forming auxiliary device, except that the ring frame supported on the film frame is supported by a transparent frame, which is used for the upper part of the exposure section. The light board blocks the falling dust from falling on the bottom light source and is projected on the falling dust to produce refraction, reducing the dust falling pair: the source: the shielding property, so that the uv light source can be surely passed through the negative film pattern; and the photoresist dry film on the enamel product After the exposure, the polymerization reaction is carried out, and after the post-forming, the movable cover line forming auxiliary device is made to have the correct thickness and no abnormality, and the movable cover plate on the side is designed, and the position of the product in the operation is slightly =- : Lai Ying: The head can not be misaligned, and the negative movement of the film is required to be made as a %% opening plate to open the through-hole operating section of the film frame, allowing the operator to extend into the film frame, 诂Battle π U Τ ; the entire film position enables the alignment lens to be aligned with the product, and the position of the film is adjusted = = 关闭 Closed position directly above the operation section of the through hole: * First 4, so that the adjustment work of the film Simplicity. [Embodiment] Auxiliary = I: Figure 3 shows the creation of the cover-type line forming frame: - a preferred embodiment is combined with the negative-framed frame 2 of the negative film 3, which is used to describe the negative frame. 2 has a through hole 2 〇, a through hole piece 3, a first section and an operation section 'the exposure section corresponds to the exposed area of the bottom, and the operation section is located at the side end of the exposure section, to The movable cover line forming auxiliary device comprises an annular frame body 1 〇 light-transmitting plate 11, a carrier 12 and a cover plate 13, wherein: the ring-shaped frame body 1 () is fixed to the film frame 2 Table I: Large 2 = Surrounding: The height of the annular frame 1〇 is set according to the desired degree of dust and the degree of influence. In the preferred embodiment, the annular body 10 can be two opposite side plates 1〇1. A rectangular frame formed by joining the opposite end plate portions 1〇2. The light-transmitting plate 11 is fixed on the top edge of the annular frame 10 and covers the upper portion of the through-hole 20 of the film frame 2 directly above the exposed section without covering the operation section, and the transparent light-transmissive plate may be made of transparent colorless glass. The thickness of the plate of the light-transmitting plate 11 is based on the principle of not generating a curved surface, and is appropriately adjusted according to the size of the film of the actual application to avoid unfavorable scattering of the light source and the light-transmitting plate 11 is not too thick to avoid light transmission. The transparency of the board is insufficient. As shown in the preferred embodiment of FIG. 1, the top of the annular frame 1 can be a flat design, and the transparent plate 11 is fixed on the top surface of the annular frame ' or the top of the annular frame The peripheral edge may also form a recessed groove, and the bottom of the insert groove is a support portion' the light-transmitting plate is embedded in the recessed groove at the top of the annular frame body, and is supported by the support portion of the bottom of the grooved groove at the periphery of the light-transmitting plate. The carrier 12 is fixed to the upper surface of the film frame 2 and at least at the operating portion of the through hole 20 and the periphery of the annular frame 1 . In the preferred embodiment, the carrier 12 includes two opposite sides. The two side frame plates 1 21 extend from the periphery of the operation section of the through hole 20 to the outer side of the annular frame body 1 at the periphery of the exposure section, and the inner side surfaces of the two side frame plates 1 2 1 are respectively provided with one The chute 122 'the chute 1 22 is higher than the translucent plate 11 and the top of the annular frame 1 . The cover plate 13 is movably mounted on the carrier frame 2 and directly above the operation section of the through hole 20 of the film frame 2, and the cover plate can be a clamshell type, a slide type or other opening and closing type. In the preferred embodiment, the cover plate 13 is disposed in the two sliding slots 1 22 so as to be slidable on both sides thereof, so that the cover cymbal 3 can be operated from the through hole 20 The upper portion of the segment slides to the top of the light-emitting plate 11 of the exposure section to reach the open state of the operation section of the exposed through-hole 2Q. As shown in FIG. 4, after the creative cover type line forming auxiliary device ί is applied to the film frame 2, the cover plate 13 is in a closed state above the operation section of the through hole 20 covering the film frame 2, and is passed through the film frame 2 The bottom of the hole 2〇 is pre-installed with a negative pattern 3' having a line pattern and then mounted on the platform 5 in the exposure machine, and the product* having the photoresist dry film is placed on the flat surface 5 by The image alignment determining device in the exposure machine determines whether the product is correctly aligned, and if it is correctly aligned, the υν light source 6 is projected; On the mirror 7, 'Uv light is refracted and projected in the above direction through the through hole 2Q in the light-transmitting plate 1WU frame 2 in the form of parallel light, wherein the light passing through the bottom surface of the portion of the U-plane of the line pattern 3 The dry film is exposed to a polymerization reaction, and the subsequent line etching forming step can be performed after the exposure is completed. This creative office. also. The design of the ten-shaped movable cover line forming auxiliary device, as shown in Figure 5, is to use the light-transmitting plate q to block the falling dust ρ falling on the negative film %
對/ut 6 &射於洛塵p藉由光線擾射，進而降低落塵P '先源6的遮蔽性，冑…光源可確實完整的通過 & θ ’而使製品4上的光阻乾膜曝光而產生聚人反應 2而在後續線路㈣成形後，使線路粗細形狀正：而 異丰。 如圖6所示’當曝光機機台中之影像對位判斷 對位攝景彡鏡頭無法對待製物進行對 ρ 〇 - ^ 』 南進仃調整底 微調整步驟，其中是將蓋板13自底片框竿2 之通孔20操作區段上方滑移至透光板n上方 9 0 r~ 上方’以顯露通 作區段而呈開啟狀態’如此’操作者即可伸入底片 框架2之通孔20中調 準製品，待…位置調整後:广位攝影鏡頭能對 之通孔20操作區 灸-板13移回至底片框架2 。 之關閉狀態’再進行曝光步驟 以上所述，僅是揭 創作作任何形式上的限'制^之較佳實施例，並非對本 知識者在不脫離本創作:接t何所屬技術領域中具有通常 本創作所揭示技的技術特徵的範圍内，利用 例，均仍屬於太：/所作出局部更動或修飾的等效實施 仍屬於本創作技術特徵的範圍内。 【圖式簡單說明】 施例、= 本:广？動蓋式線路成形輔助裝置之-較佳實 圖；t:有底片的底片框架上的平面示意圖。 例盘且有1二广所示μ蓋5^路成形輔助裝置較佳實施 …、有底片的底片框架的端視平面示意圖。 例與:有3底是::广？活動蓋式線路成_ 、有底片的底片框架的側視剖面示意圖。 例二4且是有V:示活動蓋式線路成形輔助裝置較佳實施 面=圖於具有底片的底月框架進行製品曝光步驟之側視剖 例结Α於：:1所不活動盍式線路成形辅助裝置較佳實施 落塵二I底片框架進行製品曝光步肆時，若有 塵掉洛透光板上的示意圖。 例二6= 所示活動蓋式線路成形輔助裝置較佳實施 作二=广“框架上，欲進行底片位置微調整 下業而開啟蓋板的示意圖。 M418512 【主要元件符號說明】 1活動蓋式線路成形 1 〇環形框體 102端板部 1 2承載架 122滑槽 2底片框架 3底片 5平台 7反射鏡 助裝置 1 01側板部 11透光板 121架板 13蓋板 20通孔 4製品 6 UV光源 P落塵The /ut 6 & shot on the dust p is disturbed by the light, thereby reducing the shielding of the dust P 'precursor 6, the light source can surely complete the light resistance on the product 4 by & θ ' The film is exposed to produce a concentrated reaction 2, and after the subsequent line (4) is formed, the thickness of the line is positive: and different. As shown in Fig. 6 'When the image alignment in the exposure machine is judged, the aligning position 彡 lens can not be treated with the object ρ 〇 - ^ 』 South 仃 adjust the bottom micro adjustment step, which is to cover the cover 13 from the film frame The upper portion of the through hole 20 of the 竿2 slides over the upper portion of the light-transmitting plate n to the upper surface of the light-transmitting plate n. The upper portion is opened to expose the open-ended portion. Thus, the operator can extend into the through-hole 20 of the negative-sheet frame 2. Adjust the standard product, after the position adjustment: the wide-position photographic lens can move the moxibustion-plate 13 to the film frame 2 to the through hole 20 operation zone. The closed state 're-exposure step' is described above, and is merely a preferred embodiment of any form of limitation. It is not for the knowledge of the person who does not deviate from the present invention: Within the scope of the technical features of the present disclosure, the use cases are still too: / the equivalent implementation of the local modifiers or modifications is still within the scope of the features of the present invention. [Simple description of the schema] Example, = Ben: Wide? A movable cover line forming aid - a preferred embodiment; t: a plan view of the backsheet frame having a backsheet. The example disk is a schematic view of the end surface of the film frame with the negative film. Example and: There are 3 bottoms:: wide? A side view of the movable cover line into a _, negative film back frame. Example 2: 4 and V: Shows the movable cover line forming auxiliary device. Preferred side view = side view of the product exposure step in the bottom moon frame with the negative film. The following is a summary of: 1 inactive 盍 line The forming auxiliary device preferably implements the falling dust II film frame for the product exposure step, and if there is dust, the schematic diagram of the light transmissive plate is removed. Example 2 6= The movable cover line forming auxiliary device is preferably implemented as a schematic diagram of the cover plate for the micro-adjustment of the negative position of the film. M418512 [Description of main components] 1 movable cover Line forming 1 〇 ring frame 102 end plate portion 1 2 carrier 122 slot 2 film frame 3 film 5 platform 7 mirror assist device 1 01 side plate portion 11 light transmitting plate 121 frame plate 13 cover plate 20 through hole 4 product 6 UV light source P dust