M394847 五、新型說明： 【新型所屬之技術領域】 本創作係關於一種氣泡去除裝置，尤指一種可用來肖 除化學藥液内的氣泡，以確保該化學藥液對基板進行化學 反應時之效果的基板濕製程液體氣泡去除裝置。 【先前技術】 應用在電路板、玻璃基板或晶元等基板上，利用化學 - 藥液對該基板進行加工的基板濕製程，包含利用顯影劑在 φ 一基板上顯示出預設電路的保護層、利用蝕刻液對該基板 上未設有保護層的銅箔部位進行蝕刻，使該基板上的銅箱 呈現出電路的圖樣、以及利用清洗液洗淨該基板上的蝕刻 液…等，可使預設的電路形成在基板表面，以利後續元件 之裝配及電性連接。 參見圖3所示，為一現有技術中用來進行基板濕製程 的設備’其主要具有一混合液槽41、一第一泵浦42及一第 - —果浦4 3 鲁該混合液槽41上方架設有一集液槽44,該集液槽44 上方又進一步架設有複數輸送輪組45，待加工的基板46 即設置於該輸送輪組45之間受該輸送輪組45的帶動而移 動，該第一泵浦42經由一輸出管421與該混合液槽41相 連通’可抽取新鮮的化學藥液補充至該混合液槽41中，以 保持該化學樂液的濃度及加工效果；該第二泵浦設有一 輸入管431及二喷管432，該輸入管431與該混合液槽41 相連通，該二喷管432的出口端分別對應於該輸送輪組45 3 M394847 的上、下側， 藉此設計’利用該第二泵浦43抽取該混合液槽41内 的化學藥液並喷灑於該基板46的上、下兩側，使該基板46 上預設的電路得以顯影’而該噴灑於基板46後的化學藥液 在落下後會先集中在集液槽44内，再經由連通該集液槽44 與混合液槽41的一輸液管47流入該混合液槽41中。 然而’當該化學藥液在進行喷灑或是落入該集液槽44 或混合液槽41的過程中，經常會將空氣一併帶入，使該混 合液槽41内的化學藥液中產生氣泡，此時，當該化學藥液 再被該第二泵浦43抽取至對基板46喷灑時，由於其内所 含的氣泡部份不會對基板46進行任何的化學反應，因此將 會影響該化學藥液對基板46的顯影、蝕刻或清洗效果，故 現有技術之基板濕製程所使用的化學藥液在循環使用的過 程中會產生氣泡的問題實有待進一步解決β 【新型内容】 有鑑於前述現有技術的缺點，本創作提供一種基板濕 鲁 製程液趙氣泡去除裝置，希藉此設計解決在現有技術的基 板濕製程中用以對基板進行化學反應的液體在循環使用的 過程中會產生氣泡的缺點。 為了達到上述的創作目的，本創作所利用的技術手段 係使一基板濕製程液體氣泡去除裝置包括至少一氣泡濾 槽，其中，該氣泡濾槽内部設有一濾棉，該濾棉將該氣泡 濾槽内部分隔為一上部空間及一下部空間，該氣泡濾槽頂 部設有與該上部空間相通的的一液體輸入口，氣泡濾槽底 部設有與該底部空間相通的一液體輸出口。 4 M394847 所述基板濕製程液體氣泡去除裝置可進一步包含一沉 澱槽，該沉澱槽經由一輸出管與該氣泡濾槽的液體輸出口 相連通。 所述沉澱槽内可設有至少一隔板，該隔板在靠近沉澱 槽底部處設有一通孔。 所述之基板濕製程液體氣泡去除裝置可在該氣泡濾槽 與該沉澱槽間另設有另—氣泡濾槽，該二氣泡濾槽間以一 輸液管連通其中一氣泡濾槽的液體輸出口與另一氣泡濾槽 的液體輸入口。 • 所述氣泡濾槽頂部可進一步設有一氣泡排出口，該氣泡 排出口處設有一排出管。 使用時’該氣泡濾槽的液體輸入口可經由一輸入管與 一用以抽取混合液槽内之液體的泵浦相接，可用以對基板 喷灑液體的喷管則與該沉澱槽相連通。藉此設計，該氣泡 濾槽可先過濾掉該混合液槽内之液體所含的大部份氣泡， 接著再於該沉澱槽中使該液體内剩餘的氣泡自然上浮至液 _ 體表面，以令近乎無氣泡的液體經由喷管對基板進行喷 灑’確保該液體對基板的顯影、蝕刻或清洗…等效果不會 受到氣泡的影響。 【實施方式】 以下配合圖式及本創作之較佳實施例，進一步闡述本 創作為達成預定創作目的所採取的技術手段。 參見圖1所示，本創作之基板濕製程液體氣泡去除裝 置1係設置並連接於一用以抽取混合液槽31内之液體的泵 浦32以及兩喷管33之間，進一步參見圖2所示該基板 5 JVUy464/ 濕製程液體氣泡去除裝置1包括至少一氣泡濾槽10及-沉 殿槽20，其中： ，該氣泡遴槽10内部設有-濾棉11，該遽棉11將該氣 :包濾槽1 0内部分隔為-上部空1 〇1及一下部空間1 02， I氣泡濾槽1 〇頂部設有與該上部空間1 〇 1相通的的一液體 輸 1 2與-氣泡排出口 ] 3，於該氣泡滤槽]Q底部設有 與該下部空間102相通的一液體輸出口 14,該液體輸入口 1 2 A由 '"輸人管1 5與該果浦32相接，該氣泡排出口 1 3M394847 V. New description: [New technical field] This creation is about a bubble removal device, especially a bubble that can be used to remove the bubbles in the chemical solution to ensure the chemical reaction of the chemical solution on the substrate. The substrate wet process liquid bubble removing device. [Prior Art] A substrate wet process for processing a substrate by using a chemical-chemical liquid on a substrate such as a circuit board, a glass substrate or a wafer, and a protective layer for displaying a predetermined circuit on a φ substrate by using a developer Etching the copper foil portion on the substrate without a protective layer by using an etching solution, so that the copper box on the substrate presents a circuit pattern, and the etching liquid on the substrate is cleaned by a cleaning liquid, etc. A preset circuit is formed on the surface of the substrate to facilitate assembly and electrical connection of subsequent components. Referring to FIG. 3, it is a prior art apparatus for performing a wet process of a substrate, which mainly has a mixed liquid tank 41, a first pump 42, and a first-goal pump. An upper sump 44 is disposed on the upper slab, and a plurality of transporting wheels 45 are further disposed on the sump 44. The substrate 46 to be processed is disposed between the transporting wheel sets 45 and is moved by the transporting wheel set 45. The first pump 42 is in communication with the mixed liquid tank 41 via an output pipe 421. A fresh chemical liquid can be extracted and added to the mixed liquid tank 41 to maintain the concentration and processing effect of the chemical liquid. The second pump is provided with an input pipe 431 and a second nozzle 432. The input pipe 431 is in communication with the mixed liquid tank 41. The outlet ends of the two nozzles 432 correspond to the upper and lower sides of the transport wheel set 45 3 M394847, respectively. By using the second pump 43 to extract the chemical liquid in the mixed liquid tank 41 and spraying on the upper and lower sides of the substrate 46, the predetermined circuit on the substrate 46 is developed. The chemical liquid sprayed on the substrate 46 is concentrated in the sump 44 after falling. , The mixture was 41 and then into the sump tank 44 via a communication channel with a mixture of 47 of the infusion tube 41. However, when the chemical liquid is sprayed or dropped into the sump 44 or the mixed liquid tank 41, the air is often brought in together to make the chemical liquid in the mixed liquid tank 41. The bubble is generated. At this time, when the chemical liquid is further pumped by the second pump 43 to the substrate 46, since the bubble portion contained therein does not undergo any chemical reaction on the substrate 46, It will affect the development, etching or cleaning effect of the chemical liquid on the substrate 46. Therefore, the problem that the chemical liquid used in the wet process of the substrate in the prior art generates bubbles during the recycling process needs to be further solved. [New content] In view of the foregoing shortcomings of the prior art, the present invention provides a substrate wet process liquid bubble removing device, which is designed to solve the problem of recycling a liquid for chemically reacting a substrate in a prior art substrate wet process. The disadvantage of generating bubbles. In order to achieve the above-mentioned creative purpose, the technical means utilized in the present invention is that a substrate wet process liquid bubble removing device includes at least one bubble filter tank, wherein the bubble filter tank is internally provided with a filter cotton, and the filter cotton filters the bubble filter. The inside of the tank is divided into an upper space and a lower space. The top of the bubble filter is provided with a liquid input port communicating with the upper space, and the bottom of the bubble filter tank is provided with a liquid outlet connected to the bottom space. 4 M394847 The substrate wet process liquid bubble removing device may further comprise a precipitation tank communicating with the liquid output port of the bubble filter tank via an output pipe. At least one partition may be disposed in the sedimentation tank, and the partition is provided with a through hole near the bottom of the sedimentation tank. The substrate wet process liquid bubble removing device may further comprise another bubble filter tank between the bubble filter tank and the sedimentation tank, wherein the two bubble filter tanks are connected to the liquid outlet of one of the bubble filter tanks by an infusion tube. A liquid inlet with another bubble filter. • The top of the bubble filter tank may further be provided with a bubble discharge port, and a discharge pipe is arranged at the bubble discharge port. When in use, the liquid inlet of the bubble filter tank can be connected to a pump for extracting the liquid in the mixed liquid tank via an input pipe, and the nozzle for spraying the liquid to the substrate can be connected to the sedimentation tank. . According to the design, the bubble filter tank can first filter out most of the bubbles contained in the liquid in the mixed liquid tank, and then in the sedimentation tank, the remaining bubbles in the liquid are naturally floated to the surface of the liquid body to The near-bubble-free liquid is sprayed onto the substrate via a nozzle to ensure that the liquid is developed, etched or cleaned against the substrate, etc., without being affected by the bubbles. [Embodiment] The following is a description of the preferred embodiment of the present invention and the preferred embodiment of the present invention, further illustrating the technical means by which the creation is intended to achieve the intended purpose of creation. Referring to FIG. 1, the substrate wet process liquid bubble removing device 1 of the present invention is disposed and connected between a pump 32 for extracting the liquid in the mixed liquid tank 31 and the two nozzles 33, and further see FIG. The substrate 5 JVUy464/wet process liquid bubble removing device 1 includes at least one bubble filter tank 10 and a sinker tank 20, wherein: the bubble trap 10 is internally provided with a filter cotton 11 which is used for the gas The inner partition of the filter tank 10 is - the upper space 1 〇 1 and the lower space 1 02, and the top of the I bubble filter tank 1 is provided with a liquid input 1 2 and a bubble row communicating with the upper space 1 〇1. At the bottom of the bubble filter tank, Q is provided with a liquid outlet port 14 communicating with the lower space 102, and the liquid inlet port 1 2 A is connected to the fruit pump 32 by a '" , the bubble discharge port 1 3
f設有一排出管16,該排出管16設有開孔並可再連通至該 液槽31’另於該排出管16上可設置一可控制其内部液 體流動與否的控制閥； “儿澱槽20經由-輸出管2，與該氣泡濾槽，〇的液體 輸出14相連通’並與前述的噴管相連通。 在本創作之較佳實施例中，該基板濕製程液體氣泡去 、1係具有—氣泡濾槽]Q、撤，並以一輸液管】7連 通其中-氣泡遽槽10的液體輸出口 14肖另一氣泡滤槽 1〇A的液體輸入口 12A ; 而該沉殿槽20則經由一輸出管21與該氣泡濾槽佩 的液體輸出口 14A相連通’並與前述喷管33相連通’該沉 殿槽2〇内設有至少一隔板22，該隔板22將該沉澱槽20 内部分隔為一第一空間201 » 〇〇 弟工門201及-第二空間202，又該隔板 上靠近沉殿槽20底部處設有一通孔221，經由該通孔 二使該第一空間2〇1與第二空間2〇2相連通，而前述輸 目。則對應於該沉澱槽2〇的第一空間2〇1的上方位 置，前述喷管33則對應於該沉澱槽2〇的第二空間2〇2的 6 M394847 下方位置。 藉此設計’泵浦32所抽取的混合液槽31内之液體會 經由輸入管15導入該氣泡濾槽1 〇之上部空間1 〇1内時’ 該氣泡濾槽10内所設的濾棉11會將該液體内所含的大部 份氣泡隔絕在該氣泡濾槽1 〇的上部空間1 〇1中，胜使未含 氣泡或僅略含部份小型氣泡的液體藉由該濾棉1 1的過濾作 - 用流入該氣泡濾槽1 0的下部空間102内； 又’如本創作之較佳實施例，為了確實將氣泡從該液 _ 體中分離出來’還可利用二個以上相互串聯的氣泡濾槽 1 0、1 0A來重複過濾該液體中的氣泡，最後再將氣泡濾槽 1 0A之下部空間彳02中已大致除去氣泡的液體經由該輸出 管21導入該沉澱槽2〇内； 其中’當液體進入該沉澱槽20的第一空間201中時， 還可再進行進一步的靜置’使該液體内的氣泡自然上浮至 液體表面，如此一來，由該沉殿槽2〇之隔板22下方的通 孔221流至第二空間202的液體便可呈現近乎無氣泡的狀 _ 態，以便經由該喷管33對基板34進行喷灑； 此外，堆積在該氣泡濾槽10之上部空間1〇1内的氣泡 會隨著液體流入排出管16中，讓氣泡破裂時的氣體可由該 排出管16上所設的開孔逸散，而調整該排出管16上所設 的控制閥則可控制液體與氣泡流入該排出管16的流量，以 確保該液體可朝濾棉11設置處的方向流動；直到堆積在該 氣泡滤槽1 0之上部空間1 01内的氣泡達到一定量後便可 完全開啟該排出管16上所設的控制閥，讓液體帶動所有氣 泡經由該排出管16送回至混合液槽31重複泵浦&抽取以 7 M394847 及利用本創作之基板濕製程液體氣泡去除裝置徹底阻絕氣 泡的動作’以有效達到避免氣泡影響該液趙對基板％的加 工效果之目的。 以上所述僅是本創作的較佳實施例而已，並非對本創 作作任何形式上的限制，雖然本創作已以較佳實施例揭露 如士 ’然而並非用以限定本創作，任何熟悉本專業的技術 人貝，在不脫離本創作技術方案的範圍内，當可利用上述 揭示的技術内容作出些許更動或修飾為等同變化的等效實 施例，但凡是未脫離本創作技術方案的内容，依據本創 的技術實質對以上實施例所作的任何簡單微 f叫變化 /、修飾’均仍屬於本創作技術方案的範圍内。 【圖式簡單說明】 圖1為本創作於使用狀態之側視示意圖。 圖2為本創作之側視示意圖。 圖3為現有技術之側視示意圖。 【主要元件符號說明】 1基板濕製程液體氣泡去除裝置 1〇 ' 10A氣泡濾槽 101上部空間 102下部空間 11濾棉 12、12A液體輸入口 13氣泡排出口 14、14A液體輸出口 15輸入管 16排出管 17輸液管 20沉澱槽 201第一空間 202第二空間 21輸出管 8 M394847 22 隔板 221 通孔 31 混合液槽 32 泵浦 33 喷管 34 基板 41 混合液槽 42 第一泵浦 421 輸出管 43 第二泵浦 431 輸入管 432 喷管 44 集液槽 45 輸送輪組 46 基板 47 輸液管f is provided with a discharge pipe 16, the discharge pipe 16 is provided with an opening and can be connected to the liquid tank 31', and a control valve for controlling the flow of the liquid inside can be disposed on the discharge pipe 16; The trough 20 is in communication with the bubble trough, the liquid output 14 of the crucible through the -output tube 2 and is in communication with the aforementioned nozzle. In a preferred embodiment of the present invention, the substrate wet process liquid bubble goes, 1 Having a bubble filter Q, withdrawing, and connecting the liquid inlet port 12A of the bubble outlet 10 to the liquid inlet port 12A of the bubble channel 10 by an infusion tube 7; 20 is connected to the liquid outlet 14A of the bubble filter through an outlet tube 21 and communicates with the nozzle 33. The chamber groove 2 is provided with at least one partition 22, and the partition 22 The interior of the sedimentation tank 20 is partitioned into a first space 201 » 〇〇 工 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 201 The first space 2〇1 is in communication with the second space 2〇2, and the aforementioned input line corresponds to the first space of the sedimentation tank 2〇 In the upper position of 2〇1, the nozzle 33 corresponds to the position below the 6 M394847 of the second space 2〇2 of the sedimentation tank 2〇. By this, the liquid in the mixed liquid tank 31 extracted by the pump 32 is designed. When the bubble tube 1 is introduced into the upper space 1 〇1 via the inlet pipe 15, the filter 11 provided in the bubble filter 10 isolates most of the bubbles contained in the liquid from the bubble filter. In the upper space 1 〇1 of the tank 1 , the liquid which does not contain bubbles or only a part of the small bubbles is used for filtering by the filter 11 - into the lower space 102 of the bubble tank 10 And 'as in the preferred embodiment of the present invention, in order to surely separate the bubbles from the liquid body', it is also possible to repeatedly filter the bubbles in the liquid by using two or more bubble filter tanks 10, 10A connected in series with each other. Finally, the liquid having substantially removed the bubbles in the space 彳02 of the bubble filter tank 10A is introduced into the sedimentation tank 2 through the outlet pipe 21; wherein 'when the liquid enters the first space 201 of the sedimentation tank 20 , and can be further allowed to 'make the bubbles inside the liquid naturally To the surface of the liquid, the liquid flowing from the through hole 221 below the partition 22 of the sump 2 to the second space 202 can be rendered almost bubble-free, so that the liquid is passed through the nozzle 33. The substrate 34 is sprayed; further, the air bubbles accumulated in the upper space 1〇1 of the bubble filter tank 10 flow into the discharge pipe 16 with the liquid, and the gas when the bubble is broken can be opened by the discharge pipe 16. The orifice is dissipated, and adjusting the control valve provided on the discharge pipe 16 controls the flow of liquid and bubbles into the discharge pipe 16 to ensure that the liquid can flow in the direction in which the filter cotton 11 is disposed; until the bubble is accumulated in the bubble After the air bubbles in the upper space 101 of the filter tank 10 reach a certain amount, the control valve provided on the discharge pipe 16 can be completely opened, and the liquid is driven to send all the air bubbles back to the mixed liquid tank 31 through the discharge pipe 16 to repeat the pump. Pu & extracts 7 M394847 and uses the substrate wet process liquid bubble removal device of this creation to completely block the action of bubbles' to effectively avoid the effect of bubbles on the substrate. The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in any way. Although the present invention has been disclosed in the preferred embodiment, it is not intended to limit the creation, any familiarity with the subject matter. In the scope of the technical solution, the equivalents of the above-disclosed technical contents may be modified or modified to equivalent changes, but any content that does not deviate from the technical solution of the present invention is based on the present invention. Any simple changes in the above embodiments to the above embodiments are still within the scope of the present technical solution. [Simple description of the drawing] Fig. 1 is a side view showing the creation state in use. Figure 2 is a side view of the creation. Figure 3 is a side elevational view of the prior art. [Main component symbol description] 1 substrate wet process liquid bubble removing device 1〇' 10A bubble filter 101 upper space 102 lower space 11 filter cotton 12, 12A liquid input port 13 bubble discharge port 14, 14A liquid output port 15 input pipe 16 Discharge pipe 17 infusion pipe 20 sedimentation tank 201 first space 202 second space 21 output pipe 8 M394847 22 partition 221 through hole 31 mixed liquid tank 32 pump 33 nozzle 34 substrate 41 mixed liquid tank 42 first pump 421 output Tube 43 second pump 431 input tube 432 nozzle 44 sump 45 transport wheel set 46 substrate 47 infusion tube