TWM375083U - Horizontal electroplating machine structure - Google Patents

Horizontal electroplating machine structure Download PDF

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Publication number
TWM375083U
TWM375083U TW98216950U TW98216950U TWM375083U TW M375083 U TWM375083 U TW M375083U TW 98216950 U TW98216950 U TW 98216950U TW 98216950 U TW98216950 U TW 98216950U TW M375083 U TWM375083 U TW M375083U
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Taiwan
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cathode conductive
anode
area
horizontal
electric
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TW98216950U
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Chinese (zh)
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Zhen-Yi Yan
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Opulents Technology Co Ltd
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Priority to TW98216950U priority Critical patent/TWM375083U/en
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五、新型說明: 【新型所屬之技術領域】 本創作係有關一種水平電鍍機構造之設計,尤指一種採 水平式進料,自動夾點推進而將被鍍件導入電鑛液槽中,當 電鍍完成後自動送料堆積,且將電流傳導的電鍍機陰極導電 夾頭自動清洗’成為一高效能的水平電鍵機結構。 【先前技術】 電鍍,係指以電解還原反應在物體上鍍一層膜的方法, 其所使用之機器設備,因電鍍產品的不同而有所差異.,而無 論使用何種形式的機器設備,於電鍍區内皆設計有一可導電 的電極棒作為陽極,以使電鍍液中產生金屬離子的游離現 象,被鍍工件通常係設計為陰極,其電鍍時,則在陽極與陰 極間輸入電壓,令電鍍液因電解反應而析出金屬離子,且該 些金屬離子會沈積於陰極端,而在陰極還原後,以形成鍍著 於被鍍工件表面之金屬鍍層,因此電鍍時電鍍液内金屬離子 含量的穩定性以及陰、陽極距離之設計,對電鑛之品質是相 當重要的,故陰極導電夾對被鍍工件夾持穩定性,其較佳者 為採多點式的夾固方式,可因此進而大幅降低電阻值。 而一般對於電路板的電鍍銅自動電鍍設備,通常係包含 於電路板的孔洞、盲孔、板面電鍍處理設備及掛架鍍銅剝離 設備,使電路板以垂直狀態一片接一片排列方式於電鍍槽中 進行處理,再藉由掛架金屬剝離設備以硝酸去除掛架上所附 著之金屬,該習知之處理設備雖然可滿足品質之需求,但是 整體產能不佳’更需齡乡套之設備方軸補產能之不足。 且該鍍鋼剝離製程之硝酸存在一定之危險性,處理上儘量不 要以人工接觸較好,以避免產生危險。 有鑑於此,申請人創作出一種全自動化處理電鍍工作的 水平電鍍機’能使產能大λ提升’同時對於以猶去除掛架 上所附著之電鍍金屬全部採以自動化流程進行,毋需利用人 工接觸而能避免發生危險。 【新型内容】 本創作之主要目的,在提供一種水平電鍍機構造,採一 種水平式it料’自域絲進而將被鍍件導人魏液槽中, 當電鑛完成後自動送料堆積,且將電流導電的電職陰極導 電夾頭具自動清洗魏,整體為—種高效能的電鐘機。 本創作之另_目的,在提供_種水平電鑛機構造,整體 具有節省設備空間,同時當決定將㉟化層增厚時,更可以將 多數個電鎌槽以串_型式加長,使紐伽時間延長達 到錄化層厚度增加的目的’使電路板電扣作具有高效能的 優點。 α為達上述目的,本創作水平電鍍機構造主要設有進料 區、陽極電鍍區、出料區、陰極導電夾頭循環機構、多數個 陰極導電夾頭、清洗區及傳動系統所構成。該進料區設有多 數支水平輥#,使水平綠排舰上^兩不同高度平面可挟 夾輸送被鍍件薄板;而該陽極電鍍區緊接設著進料區之後, 具有多數個電破液槽,於陽極電鏟區内裝置有多數支等距軟 質的輥軸,防止被鍍件板面刮傷及卡板,各電鍍液槽上設有 陽極電流供應電線及接頭’使陽極電流導電於電鍍液槽中; 該出料區鄰接於陽極電鑛區之後方,具有多數支上下層串列 的輥軸,輥軸侧緣的被動傘齒輪與傳動系統上的傘齒輪相齒 合,該陰極導電夾頭循環機構其上附掛有多數支的陰極導電 夾頭,使陰極電流導電於陰極導電夾頭,.使循環機構裝設於 進料區、陽極電鍍區及出料區三者的侧邊;另設有清洗區, 設於陰極導電夾頭循環機構另一侧邊,與陽極電鑛區呈相反 的另一側面,該清洗區包含設有數個毛刷、空氣喷嘴及清水 洗條槽,整體藉由傳動系統所設連桿及多數個樞固於連桿上 的傘齒輪,使與進料區、陽極電鍍區、出料區輥軸側緣的被 動傘齒輪相齒合,達到帶動各輥軸旋轉而輸送被鑛件,各陰 極導電夾頭底端设有夾固部及夾掣板,可因定點設置的開合 導板而控制打開夾口,形成自動夾合被嫩牛進行電鑛之加工。 本創作之其他特點及具體實施例可於以下配合附圖之詳 細說明中,進一步瞭解。 【實施方式】 請參第1〜3圖所示,本創作所設計之水平電鍍機構 造,主要设有一進料區1〇、數個陽極電鑛區2 〇、一出料 區3 0、一陰極導電夾頭循環機構4 〇、多數個陰極導電夾 頭5 Ο、清洗區6〇及傳動系統80所構成β 該進料區1 Q設有錄支水伟軸丨i (如第2圖所 示),使水平輥軸1i排列成上下兩不同高度平面,於其上下 兩平面之間可挾夾輸送被鍍件薄銅板7.0(如第i圖所示)。 而電鍍機構造採一貫化流程,行程中緊接著進料區1〇 之後設置為陽極電鍍區2 0 ’於陽極電鍍區2 〇中設有硫酸 銅電鍍液槽2 1,以於電舰槽中盛滿有硫_液,多數個 電鍵液槽2 1可彼此串n同時於硫酸銅電舰槽裝置 有多數支軟質的輥軸2 2,各軟質的輥軸採等㈣設,而於 各電鍵液槽2 1的夕卜部设有硫酸銅液添力口槽^ 3,且於添力σ 槽2 3底部連設有過滤機2 4(如第3圖所示),而過據機底 部以管路2 5連接於-循環㈣2 6,使過紐之硫酸銅液 經由回水管路2 9而打回至紐賴2 1 +,於各電鍍液槽 21上設有陽極電流供應電線2 7及接頭2 8,使陽極電流 導電於電鍵液槽中;而傳動系統8 〇為由數支連桿8丄及多 數個樞固於連桿上的傘齒輪8 2所組合成,使傘齒輪8 2與 結合於軟質的輥軸2 2側緣的被動傘齒輪8 3相齒合,達到 ^動各輥軸2 2旋轉而輸送被鑛件銅板7 〇前進。 而出料區3 0鄰接於陽極電鍍區2 〇之後方,同樣具有 多數支上下層串列的輥軸31,可使得當被鍍件銅板7〇電 鍍完成後,輸送至此而進行產品後續自動堆疊。 請參第1、4圖所示,至於陰極導電夾頭循環機構4 〇 2附掛有多數支極導電摘5Q,使猶賴構裝設於 主n 0、陽極電舰2 G及出料區3 〇三者的側邊,而 研洗區6 〇設於與陽極電鍍區2 〇相反的另一侧面。 請附參第8、9圖所示,上述所提之陰極導電夹頭5 〇, 設有一基座5 1,其底部設有-概呈L形·f折之夾固部5丄 1 ’於夾ϋ部5 1 1表面設有-魏緣薄膜5 i 2,且於相 互夾合之貼觸面上設有—可供導電之夾合面5 i 3 (如第ι〇 圖所示),而基座5 1上方處設有上料塊5 2,而於基座5 1下方處設有下料塊53,使-活動桿54滑移設置於上 引導塊5 2及刊導塊5 3巾’活動桿的底部設有一夾掣板 5 41 ’可與基座1〇夾固部5 i工相對應作夹合,且該夹 掣板5 41表面亦包覆有—絕緣薄膜5 4 2,且於相互夾合 之貼觸面上設有-可供導電之夾合面5 4 3 (如第1〇 _ 示),於紐動桿5 4頂部樞設有-軸承5 5,該活動桿54 於上引導塊5 2下方處魏套财—彈簧5 6,使該活動桿 5 4呈上下彈性設置,且於常態下令彈簧5 6頂樓而保持炎 固部51 1與活動桿底部之夾掣板5 4 i之炎合面(5丄 3、5 4 3)呈失合之狀態(如第1〇圖所示)。 而於本實施例中其活動桿5 4之彈簧5 6的設置方式, 則於該彈簧5 6底部設置有一塾片$ 7,且於墊片下方處之 桿體上設有-插銷5 8 ’藉此使該彈簧5 6彈性壓縮設置於 上引導塊5 2下方與該插銷5 §間,令該活動桿5 4呈彈性 M375083 設置。 而於陰極導電夾頭5 Q上端設有-電極座5 9固設於基 座頂部後側,於電極座5 9底端設有一彈性導電塊5 9工, 使陰極導電夾頭5 〇組裝於電鑛機上時,彈性導電塊5 91 觸貼於陰極導電夾頭循環機構4 0上方的陰極導電槽41上 (如第4圖所示)’使帶負電之陰極電流傳導至該炎組上。 凊參第4、5圖所示’本創作中於陰極導電夾頭循環機 • 構4Q上方設有_合導板(42、4 3),該開合導板4 2 設於循環機構的進料區1⑽邊(如第1圖所示),而開合導 板4 3則攻於出料區3 〇的側邊(如第丄圖所示),其中各開 合導板(42,43)分別具有上坡面4 2丄、平面42 2及下坡面 4 2 3使件陰極導電夾頭5 0當被以螺絲4 2 4固定於移 動塊4 2 5上之後,移動塊4 2 5為固定於鏈條4 4上,而 鍊條4 4將受驅動馬達4 5帶動鍊輪4 2 6而引動旋轉達到 鲁鄕位移。請再附參第9圖所示,本創作所設之各陰極導電 夾頭5 0為剩環設於驗機相緣,使其電極座5 9底部 之導電塊5 9 1職魏機麵環設之陰極導電槽4丄相貼 觸,以將陰極電流傳導至該夾組,由於本創作電極座5 9之 導電塊5 9 1採雜設置,因此#該導電塊5 g i於磨耗後 亦可與陰極導電槽4 i緊密貼觸,使該夾組可得到相當穩定 且良好之電性接觸。而當陰極導電夹頭5〇被運行至開合導 板4 2之上坡面4 21時,將使活動桿5 4被向上推頂,使 8 iVU/^U«3 活動桿底部之夾掣板5 41呈開啟之狀態,待該軸承5 5橫 移至開合導板4 2中段平面4 2 2時,陰極導電夾頭5 0將 保持張開之情形而使被鍍件薄銅板7 0因輸送而進入其夾口 A中’該夾口處分別以炎合面(5 1 3、5 4 3 )之導電接點 接觸被鍍件’而當陰極導電夾頭5 〇再被運行至開合導板4 2之下坡面4 2 3時,活動桿5 4則受彈簧5 6之彈性回復 力而向下夾合’同時可夾住被鍍件薄銅板7〇進而將陰極電 流傳導至該被鍍件上,以便進入電鍍區進行電鍍作業。 請參第1、6圖所示,而當被鍍件薄銅板7 〇因夾合被 導入因極電流之後遂水平運行至陽極電鍍區2 0中,經過硫 酸銅電錢液槽21裡反應後,便可於被鍍件表面鍍化上一層 金屬錄層’其中本創作所設計的電鍍液槽21是可以選擇性 作串接的’即在運轉橫移速度相同的情況下欲鍍化較厚之金 屬鍛層時,則串接較長段的陽極電鍍區2◦,以使妹鍍件鍍 化的時間增長而產生較厚的金屬鍍層,於電鍍完成後,該夾 組同樣可利用出料區3 0旁側之開合導板4 3之上坡面4 3 1打開夾口A來脫離所夾持的已鍍件71,其中當上坡面4 31打開夾口a之後’陰極導電夾頭5 〇被循環機構4〇弧 線導向一側’而已鍍件71則被直線輸送帶往出料區3 〇作 堆疊。 再者’由於本創作陰極導電夾頭5 〇之夾固部511及 夹擎板5 4 1表面皆包覆有一絕緣薄膜(512、542),僅於夾 9 合之貼觸面上裸露有一可供導電之夾合面(513、543)(如第 10圖所示)’因此本創作之夾頭於失住被錄件7 〇進行電鍍之 過程時’帶正電之金麟子的電概,其金屬财會沉積於 該夾組之失固部51 1及夾掣板5 41表面,藉此可增長本 創作導電纽之朗壽命’同時亦可齡清洗液之使用量, 進行降低使用成本的耗費。 睛參第1、7圖所示,本創作於電鍍機的一侧,設有清 洗區60,該清洗區包含設有數個毛刷6丄、空氣喷嘴62 及清水洗騎6 3,使猪極導電夾頭5 G被運行至毛刷6 1時可藉刷拭*清洗殘留於炎σA上的硫酸銅電鍍液,且反 覆浸潤於清水_槽6 3中及反覆以毛刷6丄刷洗,可充份 將陰極導電_5 〇夾固部5 i i及夾掣板5 4 i表面的電 鑛液洗淨,最後再以高壓的空氣噴嘴6 2將央σΑ吹乾,以 便再運轉至進料區1 Q進行倾件7 Q的夾合,成為一種生 產效率高的水平電鍍機構造。 綜上所述,本創作的確可達到創作之預期目的,提供一 種電穩定、使用壽命長且具自動開合設計的水平電鑛機構 造’其具有生產效率高的伽,具有實用價值紐,爰依法 提出專利申請。 准以上所述者,僅為本創作之較佳實施例而已當不能 以此限疋本創作貫施n故,凡依本創作中請專利範圍 及創作說明書内谷所作之簡單的等效變化與修飾,皆應仍屬 M375083 本創作專利涵蓋之範圍内。 【圖式簡單說明】 第1圖為本創作之俯視示意圖。 第2圖為本創作局部之立體外觀示意圖。 第3圖為本創作之側視示意圖。 第4圖為本創作之陰極導電夾頭安裝示意圖。V. New description: [New technical field] This creation is related to the design of a horizontal plating machine structure, especially a horizontal feeding, automatic pinch advancement to introduce the plated parts into the electric ore tank, when After the electroplating is completed, the automatic feeding and stacking, and the current conduction electroplating machine cathode conductive chuck is automatically cleaned into a high-performance horizontal keying machine structure. [Prior Art] Electroplating refers to a method of plating a film on an object by electrolytic reduction. The equipment used varies depending on the plating product. Regardless of the type of machine used, An electroconductive electrode rod is designed as an anode in the electroplating zone to cause the phenomenon of metal ions to be released in the electroplating solution. The plated workpiece is usually designed as a cathode, and when electroplating, a voltage is input between the anode and the cathode to make electroplating. The liquid precipitates metal ions due to the electrolysis reaction, and the metal ions are deposited on the cathode end, and after the cathode is reduced, a metal plating layer is plated on the surface of the workpiece to be plated, so that the metal ion content in the plating solution is stabilized during plating. The design of the nature and the distance between the anode and the anode is very important to the quality of the electric ore. Therefore, the cathode conductive clip has a clamping stability to the workpiece to be plated, and the preferred one is a multi-point clamping method, which can Reduce the resistance value. Generally, the electroplating copper automatic plating equipment for the circuit board is usually included in the hole of the circuit board, the blind hole, the plate surface plating processing equipment and the copper plating stripping device of the rack, so that the circuit board is arranged in a vertical arrangement one by one. The tank is processed, and the metal attached to the rack is removed by nitric acid by a rack metal stripping device. Although the conventional processing equipment can meet the quality requirements, the overall capacity is not good. The shortage of shaft replenishment capacity. Moreover, the nitric acid in the stripping process of the steel plating has a certain risk, and it is better to avoid manual contact as much as possible to avoid danger. In view of this, the applicant has created a horizontal electroplating machine that fully automates the electroplating work, which can increase the production capacity by λ. At the same time, it is necessary to use an automated process for all the electroplating metals attached to the U.S. removal rack. Contact can avoid danger. [New content] The main purpose of this creation is to provide a horizontal electroplating machine structure, adopting a horizontal type of material 'self-domain wire and then guiding the plated parts into the Wei liquid tank, and automatically feeding and accumulating when the electric ore is completed, and The current-conducting electric service cathode conductive chuck has automatic cleaning Wei, and the whole is a high-performance electric clock machine. The other purpose of this creation is to provide a horizontal electro-metal mining machine structure, which saves equipment space as a whole. At the same time, when it is decided to thicken the 35-layer layer, it is possible to lengthen most of the electric shovel slots in series _ type. The gamma time is extended to achieve the purpose of increasing the thickness of the recording layer, which makes the circuit board electrically buckled with the advantage of high efficiency. For the above purpose, the design level of the electroplating machine is mainly composed of a feed zone, an anodizing zone, a discharge zone, a cathode conductive chuck circulation mechanism, a plurality of cathode conductive chucks, a cleaning zone and a transmission system. The feeding zone is provided with a plurality of horizontal rollers #, so that the two horizontal planes of the horizontal green row ship can transport the plated plate by two different height planes; and the anode plating zone has a plurality of electricity immediately after the feeding zone is provided. The liquid-breaking tank is equipped with a plurality of equally-spaced soft roller shafts in the anode electric shovel area to prevent the surface of the plated part from being scratched and the card plate. The electroplating liquid tank is provided with an anode current supply wire and a joint to make the anode current Conductive in the plating bath; the discharge zone is adjacent to the anode electro-minening zone, has a plurality of rollers arranged in the upper and lower layers, and the passive bevel gear on the side edge of the roller is meshed with the bevel gear on the transmission system. The cathode conductive chuck circulation mechanism has a plurality of cathode conductive chucks attached thereon, so that the cathode current is electrically conductive to the cathode conductive chuck, and the circulation mechanism is installed in the feeding zone, the anodizing zone and the discharging zone. Side of the side; another cleaning zone is provided on the other side of the cathode conductive chuck circulation mechanism, opposite to the anode electro-minening area, the cleaning zone comprises a plurality of brushes, air nozzles and water washing Slot, as a whole by the drive system The connecting rod and the plurality of bevel gears fixed on the connecting rod are configured to mesh with the passive bevel gears on the side edges of the feeding area, the anodizing area and the discharging area, so as to drive the rotating shafts to convey the being In the ore part, the bottom end of each cathode conductive chuck is provided with a clamping portion and a clamping plate, and the opening and closing guide can be controlled by the opening and closing guide plate set at a fixed point to form an automatic clamping and processing of the electric ore by the tender cattle. Other features and specific embodiments of the present invention can be further understood from the following detailed description in conjunction with the accompanying drawings. [Embodiment] Please refer to the figures 1~3. The horizontal electroplating machine structure designed by this creation mainly consists of a feeding zone 1〇, several anode electro-minening areas 2 〇, and a discharge area 30. The cathode conductive chuck circulation mechanism 4 〇, the plurality of cathode conductive chucks 5 Ο, the cleaning zone 6 〇 and the transmission system 80 constitute a β. The feeding zone 1 Q is provided with a water bearing axis (i (as shown in Fig. 2) Shown, the horizontal roller shaft 1i is arranged in two upper and lower different height planes, and the thinned copper plate 7.0 of the plated member can be conveyed between the upper and lower planes (as shown in Fig. i). The electroplating machine structure adopts a consistent process, and is set to an anodizing zone 2 0 ' immediately after the feed zone is 1 ' in the anodizing zone 2 〇 in the copper electroplating bath 2 1 in the electric ship tank Full of sulfur_liquid, a plurality of key tanks 2 1 can be connected to each other at the same time. In the copper sulfate electric ship trough device, there are a plurality of soft roller shafts 2 2, and each soft roller shaft is set (4), and each key is set. The outer portion of the liquid tank 2 1 is provided with a copper sulfate liquid addition port slot 3, and a filter 24 (as shown in Fig. 3) is connected to the bottom of the adding force σ groove 2 3, and the bottom of the machine is The pipe 2 5 is connected to the -cycle (4) 2 6, and the copper sulfate liquid of the bromine is returned to the Neuilly 2 1 + via the return water pipe 2 9 , and the anode current supply wire 27 is provided on each plating liquid tank 21 and The connector 2 8 makes the anode current conductive in the electric button liquid tank; and the transmission system 8 is composed of a plurality of connecting rods 8丄 and a plurality of bevel gears 8 2 pivotally fixed to the connecting rod, so that the bevel gear 8 2 The passive bevel gears 8 3 combined with the soft roller shafts 2 2 are engaged with each other, and the respective roller shafts 2 2 are rotated to transport the ore-welded copper plates 7 to advance. The discharge zone 30 is adjacent to the anode plating zone 2, and has a plurality of roller shafts 31 of a plurality of upper and lower layers, so that after the plated copper plate 7 is plated, the product is conveyed thereto for subsequent automatic stacking of the product. . Please refer to the figures 1 and 4, as for the cathode conductive chuck circulation mechanism 4 〇 2 attached with a majority of the pole-conducting pick 5Q, so that the structure is installed in the main n 0, the anode electric ship 2 G and the discharge area 3 The sides of the three, and the wash area 6 is located on the opposite side of the anodizing area 2 〇. Please refer to the figures 8 and 9 for the reference. The cathode conductive chuck 5 上述 mentioned above is provided with a base 5 1 and a bottom portion is provided with a substantially L-shaped and f-folded clamping portion 5丄1 ' The surface of the clamping portion 5 1 1 is provided with a -wei edge film 5 i 2 , and is provided on the contact surface sandwiched with each other - a conductive clamping surface 5 i 3 (as shown in FIG. A loading block 52 is disposed above the base 51, and a lowering block 53 is disposed below the base 51, so that the movable rod 54 is slidably disposed on the upper guiding block 52 and the guiding block 5 3 The bottom of the movable rod is provided with a clamping plate 5 41 'corresponding to the clamping portion 5 of the base 1 , and the surface of the clamping plate 5 41 is also covered with an insulating film 5 4 2 And on the contact surface of the mutual clamping, there is provided a conductive clamping surface 5 4 3 (as shown in FIG. 1), and a bearing 5 5 is pivoted on the top of the movable rod 5 4 , the activity The rod 54 is disposed at the bottom of the upper guiding block 5 2, and the spring 5-6 makes the movable rod 54 4 elastically arranged up and down, and in the normal state, the spring 56 is placed on the top floor to keep the sturdy portion 51 1 and the bottom of the movable rod. The sacral surface of the seesaw 5 4 i (5丄3, 5 4 3) is in a state of loss (eg FIG 1〇). In the embodiment, the spring 56 of the movable rod 54 is disposed in a manner that a bottom piece $7 is disposed at the bottom of the spring 56, and a pin 5 8' is disposed on the rod below the spacer. Thereby, the spring 56 is elastically compressed and disposed between the upper guiding block 52 and the pin 5, so that the movable rod 54 is disposed in the elastic M375083. The upper end of the cathode conductive chuck 5 Q is provided with an electrode holder 59 fixed to the rear side of the top of the base, and an elastic conductive block is disposed at the bottom end of the electrode holder 59 to assemble the cathode conductive chuck 5 On the electro-metal machine, the elastic conductive block 515 is in contact with the cathode conductive groove 41 above the cathode conductive collet circulation mechanism 40 (as shown in Fig. 4) to conduct the negatively charged cathode current to the inflammatory group. . As shown in Figures 4 and 5 of the ginseng, in this creation, a _ joint guide plate (42, 43) is provided above the cathode conductive chuck circulation machine 4Q, and the opening and closing guide 4 2 is set in the circulation mechanism. The material zone 1 (10) side (as shown in Figure 1), and the opening and closing guides 4 3 attack the side of the discharge zone 3 ( (as shown in the figure), wherein each opening and closing guide (42, 43) ) having an upslope surface 4 2 丄, a plane 42 2 and a downslope surface 4 2 3 respectively to move the block 4 2 5 after the cathode conductive chuck 50 is fixed to the moving block 4 2 5 with the screw 4 2 4 To be fixed to the chain 4 4, the chain 4 4 will be driven by the drive motor 4 5 to drive the sprocket 4 26 to rotate to a reckless displacement. Please refer to Figure 9 again. The cathode conductive chucks of this creation are 50. The remaining rings are set at the edge of the inspection machine, and the conductive blocks at the bottom of the electrode holders 5 9 are used. The cathode conductive slot 4 is placed in contact with the cathode to conduct the cathode current to the clip. Since the conductive block 519 of the electrode holder 59 is disposed, the conductive block 5 gi can be worn after being worn. It is in close contact with the cathode conductive groove 4 i so that the clip can obtain relatively stable and good electrical contact. When the cathode conductive chuck 5 is operated to the upper surface 4 21 of the opening and closing guide 4 2, the movable rod 54 is pushed up, so that the bottom of the 8 iVU/^U«3 movable rod is clamped. The plate 5 41 is in an open state. When the bearing 55 is traversed to the middle plane 4 2 2 of the opening and closing guide 4 2 , the cathode conductive chuck 50 will remain open to cause the plated copper plate 70 to be transported. And entering its jaw A, 'the contact point of the contact surface is contacted with the conductive contact of the flaming surface (5 1 3, 5 4 3) respectively, and when the cathode conductive chuck 5 〇 is operated to the opening and closing guide When the lower surface of the plate 4 2 is 4 2 3 , the movable rod 5 4 is clamped downward by the elastic restoring force of the spring 56. At the same time, the thin copper plate 7 of the plated member can be clamped to conduct the cathode current to the bead. Plated on the plate to enter the plating area for plating. Please refer to the first and sixth figures, and when the plated copper plate 7 is introduced into the anodizing zone 20 by the pole current due to the clamping, the copper plate 7 is reacted through the copper sulfate battery tank 21 , the surface of the plated part can be plated with a metal recording layer. The plating bath 21 designed by the present invention can be selectively connected in series, that is, the plating is thicker when the running traverse speed is the same. In the metal forging layer, a longer section of the anodizing zone is connected in series to increase the plating time of the sister plating member to produce a thicker metal plating layer. After the plating is completed, the clamping group can also utilize the discharging material. The upper surface of the opening and closing guide 4 3 on the side of the region 3 3 opens the jaw A to disengage the clamped plated member 71, wherein the cathode conductive clip is opened after the upper surface 4 31 opens the jaw a The head 5 〇 is guided to the side by the 4 〇 arc of the circulation mechanism, and the plated member 71 is stacked by the straight conveyor belt to the discharge zone 3 . Furthermore, since the surface of the clamping portion 511 and the clamping plate 511 of the cathode conductive chuck 5 包覆 is covered with an insulating film (512, 542), only one of the contact surfaces of the clip 9 is exposed. Conductive clamping surface (513, 543) (as shown in Figure 10) 'Therefore, the chuck of this creation is in the process of electroplating when the recorded object 7 is lost. The metal finance is deposited on the surface of the clamped portion 51 1 and the clamping plate 541 of the clip, thereby increasing the life of the creative conductive core and reducing the use cost by using the cleaning liquid. The cost. As shown in Figures 1 and 7, the creation is on one side of the electroplating machine, and there is a cleaning area 60, which comprises a plurality of brushes 6 丄, an air nozzle 62 and a water wash 6 3 to make the pig pole When the conductive chuck 5 G is run to the brush 6 1 , the copper sulfate plating solution remaining on the inflammatory σA can be cleaned by brushing, and repeatedly immersed in the clear water _ trough 6 3 and repeatedly brushed with the brush 6 ,, The electro-mineral liquid on the surface of the cathode conductive _5 〇 nip 5 ii and the clamping plate 5 4 i is fully washed, and finally the central σ Α is blown dry with a high-pressure air nozzle 62 to be re-run to the feeding zone. 1 Q The clamping of the pouring member 7 Q is a highly efficient horizontal plating machine construction. In summary, this creation can indeed achieve the intended purpose of creation, and provide a horizontal electric mining machine structure with electric stability, long service life and automatic opening and closing design, which has high production efficiency and has practical value. File a patent application according to law. The above-mentioned ones are only for the preferred embodiment of the present invention, and it is not possible to limit the scope of the creation, and the simple equivalent changes made by the patent scope and the creation specification in this creation. Modifications shall remain within the scope of this Creative Patent of M375083. [Simple description of the diagram] Figure 1 is a top view of the creation. Figure 2 is a schematic view of the three-dimensional appearance of the creation. Figure 3 is a side view of the creation. Figure 4 is a schematic view of the installation of the cathode conductive chuck of the present invention.

第5圖為本創作陰極導電夾頭之夾合動作示意圖。 第6圖為本創作陰極導電夾頭開合狀態之示意圖。 第7圖為本創作清洗區立體外觀示意圖。 第8圖為本創作陰極導電夾頭組合後立體外觀圖。 第9圖為本創作陰極導電夾頭之剖面視圖。 第10圖為本創作陰極導電夾頭夾合面構造示意圖 【主要元件符號說明】Fig. 5 is a schematic view showing the clamping action of the cathode conductive chuck. Figure 6 is a schematic view showing the opening and closing state of the cathode conductive chuck. Figure 7 is a schematic view of the three-dimensional appearance of the creative washing area. Figure 8 is a perspective view of the assembled cathode conductive chuck. Figure 9 is a cross-sectional view of the cathode conductive chuck of the present invention. Figure 10 is a schematic diagram of the construction of the sandwiching surface of the cathode conductive chuck. [Main component symbol description]

1 0..進料區 2 0..陽極電鍍區 2 2. 24. 2 6. 2 8. 3 0. 40. 輥軸 過濾機 循壤栗浦 接頭 出料區 11. 2 1. 2 3. 2 5. 27. 2 9. 3 1. 陰極導電爽頭循壤機構 水平輕轴 - 電鍍液靖 添加槽 管路 陽極電流供應電線 回水管路 輞i軸 4 1..陰極導電槽 42、43..開合導板 11 M3750831 0.. Feeding zone 2 0.. Anodizing zone 2 2. 24. 2 6. 2 8. 3 0. 40. Roller filter by the Lipu pump joint discharge zone 11. 2 1. 2 3. 2 5. 27. 2 9. 3 1. Cathode conductive head-sliding mechanism horizontal light shaft - electroplating liquid addition tank line anode current supply line return water line 辋i axis 4 1. Cathode conductive groove 42, 43. . Opening and closing guide 11 M375083

4 4..鏈條 4 2 1..上坡面 4 2 3..下坡面 4 2 5..移動塊 5 0..陰極導電夾頭 5 2..上引導塊 5 4..活動桿 5 6..彈簧 5 8..插銷 5 1 1..夾固部 5 1 3..夾合面 5 4 1..夾掣板 5 4 3..炎合面 5 9 1..導電塊 6 0..清洗區 6 2..空氣喷嘴 7 0..被鍍件薄銅板 8 0..傳動系統 8 2..傘齒輪 4 5..驅動馬達 4 2 2..平面 4 2 4..螺絲 4 2 6..鍊輪 5 1..基座 5 3..下引導塊 5 5..韩承 5 7..墊片 5 9..電極座 5 1 2..絕緣薄膜 5 4 2..絕緣薄膜 6 1..毛刷 6 3..清水洗務槽 7 1..已鍍件 8 1..連桿 8 3..被動傘齒輪 124 4.. Chain 4 2 1.. Uphill surface 4 2 3. Downhill surface 4 2 5. Moving block 5 0.. Cathode conductive chuck 5 2. Upper guiding block 5 4. Moving rod 5 6. Spring 5 8.. Pin 5 1 1.. Clamping part 5 1 3.. Clamping surface 5 4 1.. Clamping plate 5 4 3. Inflammatory surface 5 9 1. Conductive block 6 0 .. cleaning area 6 2. air nozzle 7 0.. plated copper plate 8 0.. transmission system 8 2. bevel gear 4 5. drive motor 4 2 2. plane 4 2 4. screw 4 2 6.. Sprocket 5 1.. Base 5 3. Lower guide block 5. 5. Han Cheng 5 7. Pad 5 9. Electrode holder 5 1 2. Insulation film 5 4 2. Insulation Film 6 1. Brush 6 3. Water washing tank 7 1. Plated part 1. 1. Connecting rod 3. 3. Passive bevel gear 12

Claims (1)

六、申請專利範圍: 1. -種水平電誠構造,主要設有進龍、陽極紐區、出 料區、陰極導電夾頭循環機構、多數個陰極導電爽頭、清 洗區及傳動系統所構成,其特徵在於: 該進料區設有多數支水平輥轴,使水平輥轴排列成上 下兩不同面度平©’於其上下^平面之間可挾夾輸送被鍛 件薄銅板; 該陽極電轉區緊接著進料區之後設置,於陽極電錢區 中設有電鍍液槽,於電鑛液槽裝置有多數支軟質的親轴, 各電鑛液槽上設有陽極電流供應電線及接頭,使陽極電流 導電於電鍍液槽中; 該出料區雜於陽極電舰之後方,具有多數支上下 層串列的錄,輥侧緣的被料錄與傳_統上的伞 齒輪相齒合; 該陰極導電夾頭循環機構其上附掛有多數支的陰極導 電夾頭’贿補顧設於義區、陽極t舰及出料區 三者的側邊; 該清洗區設於陰極導電夾頭循環機構另一侧邊,與陽 極電錢區呈減的另—側面,該清洗區包含設有數個毛 刷、空氣喷嘴及清水洗滌槽; 該傳動系統具有連桿及多數個樞固於連桿上的傘齒輪 所組成,使傘齒輪與陽極電鐘區之軟質的輕轴側緣的被動 13 傘齒=:?各_轉而輪一 -又4組合成—種採水平式進料,自動夹點 麵㈣’㈣啦錢自動送料堆 2 ^申她物她自罐功效。 2.如申"專糊第1項所述之水平電鑛機構造,其中該陽 極紐區可由多數個電鍍液槽彼此串連一起 3·^料利細第2項所述之水平電鍍機構造,於電鑛液 槽的外部設有硫酸銅液添加槽,且添加槽底部連設有過滅 機’過滤機底部以管路連接於一循環系浦,使過渡後之硫 酸銅液經由回水管路而打回至魏液槽中。 4·如申请專利範圍第!項所述之水平電職構造,該陰極導 電夾頭設有—基座,基絲部設有夾_,喊座上活動 設有一活動桿,活動桿的底部設有一夾掣板,夾掣板可愈 基座夾固部相對應作夾合,於該活動桿頂部_有一轴 承,該活動桿上壓縮套設有一彈簧,常態下炎固部與失擎 板之夾合面呈夾合狀態。 5.如申請專利範圍第4項所述之水平電職構造,其中該基 座底部之夹固部與活動桿底部之央掣板表面包覆有一絕緣 薄膜’於兩者夾合之貼觸面上則分別裸露有一可供導電之 夾合面。 6.如申凊專利範圍第1項所述之水平電賴構造,其中該於 陰極導電夾頭循環機構上方設有兩開合導板,其一開合導 M375083 板設於進料區側邊,而另一開合導板則設於出料區的側邊。 7.如申請專利範圍第1項所述之水平電鍍機構造,其中該陰 極導電夾頭循環機構設有驅動馬達,使驅動馬達帶動鍊輪 而引動一鍊條,一移動塊為固定於鏈條上,陰極導電夾頭 鎖固於移動塊上,因此陰極導電夾頭將受驅動馬達旋轉而 導動位移。Sixth, the scope of application for patents: 1. - A kind of horizontal electric construction, mainly consisting of Jinlong, anode button area, discharge area, cathode conductive chuck circulation mechanism, most cathode conductive cool head, cleaning area and transmission system The utility model is characterized in that: the feeding zone is provided with a plurality of horizontal roller shafts, so that the horizontal roller shafts are arranged in two upper and lower different planes, and the thin copper plate of the forged piece can be conveyed between the upper and lower planes; The area is arranged immediately after the feeding area, and a plating liquid tank is arranged in the anode electric money area, and a plurality of soft shafts are arranged in the electric ore tank device, and an anode current supply wire and a joint are arranged on each electric ore tank. The anode current is electrically conductive in the plating liquid tank; the discharge area is mixed behind the anode electric ship, and has a plurality of rows of upper and lower layers, and the side edges of the roller are coupled with the bevel gears on the transmission system. The cathode conductive chuck circulation mechanism is provided with a plurality of cathode conductive chucks attached to the side of the three zones: the anode zone, the anode t ship and the discharge zone; the cleaning zone is disposed on the cathode conductive clip The other side of the head loop mechanism, The anode electric money area is reduced to the other side, the cleaning area comprises a plurality of brushes, an air nozzle and a clean water washing tank; the transmission system has a connecting rod and a plurality of bevel gears fixed on the connecting rod, so that Passive 13 bevel gears on the side of the soft light shaft of the bevel gear and the anode electric clock zone =:? Each _ turn the wheel one-and four combined into a kind of horizontal feeding, automatic pinch surface (four) '(four) money Automatic feeding pile 2 ^ Shen she material her own pot effect. 2. For example, the horizontal electro-metal machine structure described in the first item, wherein the anode button area can be connected to each other by a plurality of electroplating liquid tanks. The structure is provided with a copper sulphate liquid addition tank outside the electric ore tank, and the bottom of the adding tank is connected with a sterilizer's bottom of the filter to connect the pipeline to a circulation system, so that the copper sulphate after the transition is returned. The water line is returned to the Wei tank. 4. If you apply for a patent scope! In the horizontal electric structure described in the item, the cathode conductive chuck is provided with a base, and the base wire portion is provided with a clamp _. The movable seat is provided with a movable rod, and the bottom of the movable rod is provided with a clamping plate and a clamping plate. The pedestal clamping portion is correspondingly clamped, and a bearing is arranged on the top of the movable rod. The compression sleeve of the movable rod is provided with a spring, and the clamping surface of the inflammatory portion and the slab is normally clamped. 5. The horizontal electric power structure according to claim 4, wherein the clamping portion at the bottom of the base and the surface of the bottom plate of the bottom of the movable rod are covered with an insulating film 'on the contact surface of the two. On the top, there is a sandwich surface for conducting electricity. 6. The horizontal electric galvanic structure according to claim 1, wherein the opening and closing guide of the cathode conductive chuck is provided with two opening and closing guides, and an opening and closing guide M375083 is disposed on the side of the feeding area. And another opening and closing guide is arranged on the side of the discharge area. 7. The horizontal plating machine structure according to claim 1, wherein the cathode conductive chuck circulation mechanism is provided with a driving motor, so that the driving motor drives the sprocket to drive a chain, and the moving block is fixed on the chain. The cathode conductive chuck is locked to the moving block, so the cathode conductive chuck will be guided by the rotation of the drive motor. 1515
TW98216950U 2009-10-23 2009-10-23 Horizontal electroplating machine structure TWM375083U (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113549988A (en) * 2021-07-28 2021-10-26 厦门海辰新能源科技有限公司 Conductive base film conveying device and coating machine
CN114164480A (en) * 2021-12-09 2022-03-11 江苏启威星装备科技有限公司 Automatic clamping device for electric conduction and application thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113549988A (en) * 2021-07-28 2021-10-26 厦门海辰新能源科技有限公司 Conductive base film conveying device and coating machine
CN114164480A (en) * 2021-12-09 2022-03-11 江苏启威星装备科技有限公司 Automatic clamping device for electric conduction and application thereof

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