M362507 五、新型說明： 【新型所屬之技術領域】 本創作係涉及一種晶 結合傳送腔體、旋轉平移 盤容置腔體所構成之創新 先前技術】 按 圓（晶 儲放區 之載盤 習 來達到 價成本 在困難 實仍舊 處。 是 問題點 待相關 有 與設計 終得一 ’晶圓片）共 域，秋 、 »\\\ 輪送至 知晶圓 傳送晶 曰由cp責， 不便與 欠缺經 (晶片）於 同放置於一 後透過預定 後續加工區 載盤傳送機 圓載盤之目 且只能承载 費用昂貴之 濟效益，確 以’針對上述習知 ，如何開發一種更 業者再 鍛於此 級驗， 確具實 加以努力研 ，創作人本 針對上述之 用性之本創 圓載盤傳送機構，特別是指一種 傳送座以及升降作動式之晶 結構空間型態設計者。 5程中，通常會將預定數量的晶 栽盤上，再將所述載盤疊置於一 之傳送機構將置有晶圓（晶片 域。 」 構設計上，通常係採用真空手臂 的，然而，由於所述真空手 輕荷重，日後保養維修方 k 問題點，如此對於使用者=2存 有再進-步加以探討改良創i之 晶圓載盤傳送機構結構所^ 具理想實用性之創新結構，2之 發突破之目標及方向。、有 於多年從事相關產品之韌 目；^上、，丄,、^開發 目糕，砰加設計與審慎* 作。 一f估後’ 【新型内容】 匐作之主要目的，係在提供一種晶圓 :::欲解決之問題點，係針 二傳送 養維修困難…費用昂貴等諸多問題點加 M362507 本創作解決問題之技術特點，主要在於所述 傳达機構包含·· 一傳送腔體，其内部具一傳送作 一周壁，該周壁設定方位設有晶圓載盤輸入口及 輸出’凝轉平移傳送座，組設於傳送腔體之 空間中，該旋轉平移傳送座包括一旋轉基座及平 該旋轉基座可於傳送腔體中進行旋轉並可定位於 位置’ 3亥平移頂座則可於旋轉基座上作往復平移 -該平移頂座頂面具有晶圓載盤置放部；至少一晶 置腔體，設於傳送腔體周壁所設晶圓載盤輸入口 對應位置處，該晶圓載盤容置腔體具一開口與該 籲輸入口相通，該晶圓載盤容置腔體内部具有複數 盤置放層架，又該晶圓載盤容置腔體並包括一升 置以驅使晶圓載盤置放層架升降作動；藉此創新 ，使得本創作所述晶圓載盤傳送機構將可透過的 移以及升降等簡易機械式結構來達到傳送晶圓載 ，其相較於採用真空手臂之習知傳送結構而言， 機具設置成本大幅降低、傳送效率倍増以及保養 簡易方便等諸多實用進少性及較佳產業利用效益 • 【實施方式】 ^ 請參閱第1〜5圖所承，係本創作晶圓載盤傳 較佳實施例，惟此等實施例僅供說明之用，在專 並不受此結構之限制。所述晶圓載盤傳送機構A 送晶圓載盤05之用，該晶圓載盤傳送機構A係包 成： ' 一傳送腔體1〇，其内部界定形成有一傳送作 -以及一周壁12，該周壁丨2之設定方位設有至少一 輸入口 13以及至少—晶圆載盤輸出口 14，所述傳 間11及周壁12可設為圓形遙樣者； 晶圓载盤 動空間及 晶圓載盤 傳送作動 移頂座， 設定角度 運動，又 圓载盤容 之外側相 晶圓載盤 個晶圓載 降驅動裝 獨特設計 旋轉、平 盤之目的 將玎達到 維修更加 送機構之 利申請上 係藉以傳 含下述構 動空間11 晶圓載盤 送作動空 4 M362507 —旋轉 作動空間11 以及〜平移 進行360 。 員座22則可 移運動，又 ^ 呈升降 忒傳送腔體 位置處，該 體10周壁12 &體3〇内部 數量的晶圓 其中， 間係可設為 爽角斜應關 其中， 才反私’透過 30形成開口 設於該傳 座20係包 21係可於 於設定角 一橫向直 之頂面具有晶圓 載盤容置 曰曰 晶圓载盤輸入口 腔體30具有一開 輸入口 圓載盤 放者。 輸入口 角對應 13相通， 置放層架 括 平移傳 中，該 頂座22 自由旋 於該旋 該平移 作動式 10周壁 晶圓載 所設晶 具有複 載盤05 所述晶 互成90 係之型 該晶圓 該活動 ，以便 送座20 旋轉平 ’該旋 轉，並 轉基座 頂座22 的至少 所設 盤容置 圓載盤 數個晶 排列置 圓載盤 °之夾 癌者。 载盤容 門板34 於操作 ，係組 移傳送 轉基座 可定位 21上沿 圓 旋 該傳送 度位置 線路經 載盤置 腔體30 13之外 口 31與 s亥晶圓 32，藉 W之傳送 轉基座21 腔體10中 ’該平移 作往復平 放部23 ; ，係設於 側相對應 該傳送腔 載盤容置 以供預定 13與晶圓载盤輸出口 η之 關係，或者亦可設成其他 置腔體30之外側並具有一活動門 之開啟以令該晶圓載盤容置腔體 者置入或取出晶圓載盤05。 由上述之 施例之使 第2圖所 05之作動 圓載盤05 轉動至該 及晶圓載 著透過該 平移動作 腔體30内 籍 結構實 如 H1栽盤 置有晶 基座21 口 13以 I ’接 之伸縮 知容置 結構：、 用作動 示，所 步驟， 的前提 平移頂 盤容置 平移頂 (如箭 部之晶 組成設 情形說 述晶圓 是在該 下，令 座22之 腔體30 座22朝 號L1所 圓載盤 計，茲 明如下 載盤傳 晶圓載 該旋轉 平移方 所設開 該晶圓 示）， 05抓取 就本創作第1圖所揭 送機構A藉 盤容置腔體 平移傳送座 向與該晶圓 口 31相對齊 載盤容置腔 以將儲置於 至該傳送腔 以傳送晶 30内部儲 20之旋轉 載盤輸入 之角度位 體30内部 該晶圓載 體10之傳 5 M362507 送作動空間11内。 接著如第3圖所示，令該旋轉平移傳送座2〇之旋轉基 座21順向轉動90 ° (如箭號L2所示）至該平移頂座22之平 移方向與該晶圓载盤輸出口 14相對齊之角度位置，接著如 第4圖所示，再透過該平移頂座22朝該晶圓載盤輸出口 14 外部之伸細平移動作（如箭號L3所示），即可將該晶圓載 盤05傳达置放於一後續加工位置（如第4圖之w所指區域 -)’至此而完成一次晶圓載盤05之傳送動作。 另如第5圖所示，該晶圓載盤容置腔體30並包括有一 升降驅動裝置33 ’所述升降驅動裝置33可為設置於該晶圓 _載盤容置腔體30底部之一伺服馬達331以及一導螺桿332 所構成’藉以駆使所述晶圓載盤置放層架32產生升降定位 動作（如前號L4所示）’藉此令所述晶圓載盤置放層架32 可為多數組上、下間隔疊置之結構型態，復透過升降作動 方式控制各該晶圓载盤置放層架32與該開口 31之對位狀態 者。 再如第6圖所示，係為該傳送腔體1〇周壁12相對18〇 。位置設有二晶圓栽盤輸入口 13 ' 13β且對應設置有二組 晶圓載盤容置腔體3〇之實施型態，藉此，該旋轉平移傳送 #座20於兩個轉動角度位置均可進行取料動作，可進—步提 昇晶圓載盤05之傳送效率。 ' 又如第7圖所示，該晶圓載盤容置腔體3〇内部並可設 有複數個上、下間隔設置的橫向導動凸條35，以使各該= 圓載盤置放層架32係滑設於各該導動凸條35上呈可滑^ = 動狀態（如箭號L5所示），俾可供拉出外部或内推呈收置 •狀態’藉此以便於操作者置入或取出晶圓載盤〇5。 功效說明： 本創作所揭「晶圓載盤傳送機構」主要藉由所述 腔體、旋轉平移傳送座、晶圓載盤容置腔體之創新獨特^ 6 M362507 ϊ ί:Ϊ J設；鶫使得本創作所述晶圓載盤傳 晶圓載盤之H t移以及升降等簡易機械式結構 臂之習知傳、、，L ’其相較於【先前技術】所提 、傳送效率構而言，將可達到機具設置成 步性及較#二二以及保養維修更加簡易方便等 权仏產業利用效益。 上述你 •雖透過特：施例所揭示者係藉以具體說明本創 之專利範2的術語進行說明，當不能以此限定 之精神鱼Ξ，熟悉此項技術領域之人士當可在 •此等變更邀ΐ後對其進行變更與修改而達到等 定之範疇;改，皆應涵蓋於如后所述申請專 送機構將可 來達到傳送 採用真空手 本大幅降低 諸多實用進 作，且文中 本新型創作 瞭解本創作 效目的，而 利範圍所界M362507 V. New Description: [New Technology Field] This creation involves an innovative prior art consisting of a crystal-bonded transfer cavity and a rotating translation disk accommodating cavity. The cost of reaching the price is still difficult in the old days. It is the problem that needs to be related to the design and the end of a 'wafer film' common domain, autumn, » \ \ round to know the wafer transfer crystal 曰 by cp responsibility, inconvenience and lack After the (wafer) is placed in the same place and then through the predetermined subsequent processing area, it can only carry the cost of the carrier. It is true that, in view of the above, how to develop a more professional and then forge it. At the same time, the creators have made great efforts to research, and the creators have created a circular carrier transport mechanism for the above-mentioned usefulness, especially a kind of transfer seat and a crystal structure type designer of lifting and lowering. In the 5th process, a predetermined number of crystal plates are usually placed on the disk, and then the carrier is stacked on a transfer mechanism to be placed on the wafer (wafer field.) The design is usually a vacuum arm. Because of the light weight of the vacuum hand, the problem of maintenance and repair in the future, so that the user = 2 exists to further explore the improved structure of the wafer carrier transmission mechanism of the innovation, the ideal structure of the practicality, 2 The goal and direction of the breakthrough. It has been engaged in the toughness of related products for many years; ^Up,,丄,,^ Develop the cake, add design and prudent*. After the evaluation of f] [new content] 匐The main purpose is to provide a kind of wafer::: the problem to be solved, the needle two transmission and maintenance difficulties... expensive and many other problems plus M362507 The technical characteristics of this creation to solve the problem, mainly in the communication The mechanism comprises: a transfer cavity, the inside of which has a wall for transmission, the peripheral wall is provided with a wafer carrier input port and an output 'condensing translation transfer seat, which is arranged in a space of the transfer cavity, the rotation The transfer base includes a rotating base and the flat rotating base is rotatable in the transfer cavity and can be positioned at a position. The 3D panning seat can be reciprocally translated on the rotating base - the top surface of the panning top Having a wafer carrier placement portion; at least one crystal cavity disposed at a corresponding position of the wafer carrier input port disposed on the peripheral wall of the transfer cavity, the wafer carrier cavity having an opening communicating with the call input port The wafer carrier accommodating cavity has a plurality of disk placement shelves, and the wafer carrier accommodates the cavity and includes an lift to drive the wafer carrier placement shelf to move up and down; thereby innovating to make the creation The wafer carrier transport mechanism achieves a transfer of the wafer carrier by a simple mechanical structure such as permeable movement and lifting, which is significantly lower in equipment installation cost and transmission efficiency than the conventional transmission structure using the vacuum arm. Simple and convenient maintenance, and many other practical and better industrial utilization benefits. [Embodiment] ^ Please refer to Figures 1 to 5, which is a preferred embodiment of the present wafer carrier transmission, but these embodiments For the purpose of illustration, the specificity is not limited by this structure. The wafer carrier transport mechanism A is used for feeding the wafer carrier 05, and the wafer carrier transport mechanism A is packaged as: 'a transfer chamber 1〇, The interior defines a transmission-and a peripheral wall 12. The peripheral wall 2 is provided with at least one input port 13 and at least a wafer carrier output port 14. The space 11 and the peripheral wall 12 can be set as a circle. Shaped teleporter; wafer carrier moving space and wafer carrier transfer actuation top set, set angle movement, and round load capacity outside the wafer carrier wafer carrier load drive with unique design rotation, flat purpose The application for the maintenance of the 更加 更加 送 机构 传 传 传 传 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 4 4 4 4 4 4 The member 22 can be moved and moved to the position of the lifting and lowering chamber. The body 10 of the wall 10 and the body 3 of the internal number of wafers can be set to be refreshed and closed. The private 'through 30 forming opening is provided in the transposing 20 series package 21 can be placed on the top surface of the horizontally straight top surface with the wafer carrier accommodating wafer carrier input cavity 30 having an open input circular tray By. The input port angle corresponds to 13-way communication, and the placement layer includes a translational transmission. The top seat 22 is freely rotated on the rotation. The translational actuation mode is performed on the peripheral wall of the wafer. The crystal is provided with a reset disk 05. The activity of the wafer is such that the holder 20 rotates flat 'the rotation, and the at least one of the trays of the pedestal top seat 22 accommodates a plurality of wafers arranged in a circular carrier. The carrier tray door 34 is operated, and the group transfer transfer base can be positioned on the position 21 to circulate the transfer position line through the tray 31 and the outer wafer 31 and the wafer 34. In the cavity 10 of the rotating base 21, the translation is performed as a reciprocating flat portion 23; and is disposed on the side corresponding to the transfer chamber carrier for the relationship between the predetermined 13 and the wafer carrier output port η, or may be set The other side of the other cavity 30 has a movable door open to allow the wafer carrier receiving cavity to insert or remove the wafer carrier 05. According to the above embodiment, the movable circular carrier 05 of FIG. 2 is rotated until the wafer is carried through the translational movement chamber 30. The structure is as shown in the H1 tray. The structure of the telescopic locking structure is: used as the moving indicator, the premise of the step, the translation of the top plate accommodates the translational top (such as the crystal composition of the arrow, the wafer is below the cavity, the cavity 30 of the seat 22 Block 22 is directed to the circle of the L1, and it is shown that the wafer is loaded with the wafer and the wafer is rotated. The 05 is captured by the agency A. The body translation transfer holder is disposed opposite the wafer port 31 to the disk receiving cavity to store the wafer carrier 10 inside the angular body 30 that is stored in the transfer cavity to transfer the rotating carrier input 20 of the crystal 30. The 5 M362507 is sent to the action space 11. Then, as shown in FIG. 3, the rotary base 21 of the rotary translation transfer base 2 is rotated 90° in the direction (as indicated by the arrow L2) to the translation direction of the translational top seat 22 and the wafer carrier output. The angular position of the port 14 is aligned, and then as shown in FIG. 4, through the translational opening of the translating top 22 toward the outside of the wafer tray output port 14 (as indicated by arrow L3), the The wafer carrier 05 is placed in a subsequent processing position (as indicated by the w in Fig. 4). Thus, the transfer operation of the wafer carrier 05 is completed. As shown in FIG. 5, the wafer carrier accommodating cavity 30 includes a lifting drive device 33. The lifting drive device 33 can be a servo disposed at the bottom of the wafer _ carrier accommodating cavity 30. The motor 331 and a lead screw 332 are configured to "make the wafer carrier placement shelf 32 generate a lifting and positioning operation (as shown in the first letter L4)" thereby making the wafer carrier placement shelf 32 The multi-array structure structure is arranged on the upper and lower intervals, and the alignment state of each of the wafer carrier placement shelves 32 and the opening 31 is controlled by a complex lifting operation. Further, as shown in Fig. 6, the peripheral wall 12 of the transfer chamber 1 is opposed to 18 。. The position is provided with two wafer tray input ports 13' 13β and correspondingly arranged with two sets of wafer carrier receiving cavities 3,, whereby the rotary translation transfer #座20 is at both rotational angle positions The reclaiming action can be performed, and the transfer efficiency of the wafer carrier 05 can be further improved. As shown in FIG. 7 , the wafer carrier accommodating cavity 3 〇 can be internally disposed and can be provided with a plurality of laterally extending ribs 35 spaced apart from each other so that each of the slabs is placed on the shelf. The 32-slide is disposed on each of the guiding ribs 35 so as to be slidable (as indicated by an arrow L5), and the cymbal can be pulled out to the outside or pushed in a retracted state. Place or remove the wafer carrier 〇5. Efficacy Description: The "Powder Carrier Transfer Mechanism" disclosed in this creation mainly uses the cavity, the rotary translation transfer seat, and the wafer carrier accommodation cavity to be innovative and unique. ^ 6 M362507 ϊ ί:ΪJ The conventional mechanical transmission arm of the Ht shifting and lifting of the wafer carrier wafer carrier is created, and L' is comparable to the prior art and the transmission efficiency is Achieve the use of machine tools in a step-by-step manner and compared with #二二 and maintenance and repair is more convenient and convenient, etc. The above-mentioned you, though through the special case, are explained by the terminology of Patent 2 of this patent, when it is not possible to limit the spirit of the fish, people familiar with the technical field can do so. After the invitation is changed, it will be changed and modified to achieve the same scope; the change should be covered as follows. The application for the delivery agency will be able to reach the transmission. The vacuum manual will greatly reduce many practical works, and the new Creative understanding of the purpose of this creation, and the scope of profit
7 M362507 【圖式簡單說明】 第1圖：本創作較佳實施例之立體圖。 第2圖：本創作之實施作動平面俯視圖一。 第3圖：本創作之實施作動平面俯視圖二。 第4圖：本創作之實施作動平面俯視.圖三。 第5圖：本創作之晶圓載盤置放層架可升降作動之平面示 意圖。 -第6圖：本創作之傳送腔體設有二晶圓載盤輸入口且對應 設置有二組晶圓載盤容置腔體之實施例圖。 第7圖：本創作之晶圓載盤置放層架可滑移型態例圖。 【主要元件符號說明】 A 晶圓載盤傳送機構 0 5 晶圓載盤 1012 1 3 B2 07 M362507 [Simple description of the drawings] Fig. 1 is a perspective view of a preferred embodiment of the present invention. Figure 2: The top view of the implementation of this creation. Figure 3: The implementation of this creation is a plan view of the second. Figure 4: The implementation of this creation is a plan view. Figure 3. Figure 5: The planar display of the wafer carrier placement shelf of this creation can be lifted and lowered. - Figure 6: The transmission chamber of the present invention is provided with two wafer carrier input ports and correspondingly arranged with two sets of wafer carrier receiving cavities. Figure 7: An example of the slip-on type of the wafer carrier placement shelf of the present invention. [Main component symbol description] A Wafer carrier transfer mechanism 0 5 Wafer carrier 1012 1 3 B2 0
3 0 3 23 0 3 2
4 傳送腔體 周壁 晶圓載盤輸入口 旋轉平移傳送座 旋轉基座 晶圓載盤置放部 晶圓載盤容置腔體 晶圓載盤置放層架 伺服馬達 活動門板 11 傳送作動空間 13 晶圓載盤輸入口 14 晶圓載盤輸出口 2 2 平移頂座 3 1 開口 3 3 升降驅動裝置 332 導螺桿 3 5 導動凸條 84 Transfer cavity peripheral wall wafer carrier input port rotation translation transfer seat rotation base wafer carrier placement wafer carrier accommodating cavity wafer carrier placement shelf servo motor movable door panel 11 transfer operation space 13 wafer carrier input Port 14 wafer carrier output 2 2 translation top 3 3 opening 3 3 lifting drive 332 lead screw 3 5 guide rib 8