M360094 五、新型說明： 【新型所屬之技術領域】 本創作係與-種生物、醫療設備有關，尤指一種用於 生物晶片或醫療工具之乾式清洗及表面處理設備。 【先前技術】 最大以來困擾生物科學家使用生物晶片做實驗的 最，問叙曰曰片需要事前的表面處理才能使用，但經過表 =處理的晶片有衰減現象’使用壽命很短，不能保存，往 在從工廠出貨至客戶時即產生衰退，而且在運送過程又有 =問題，令人困擾。如果改用在實驗室自製雖品質可以 但因設備成本會很高且生產時間也後長，所以不能 目前在市面一般使用於清理生 方法可分兩種··一種為心、主田1 木物的 法。ml t為料清理法；另外—種是乾式清洗 …洗法是使用化學藥品來回多次浸料洗晶片， 二絕大多數人在使用的方法，這種方法需要大 二予液體’包括有機溶劑及無機溶劑，甚至於強酸強 =更=易製造二次污染、或是在工作時產生毒物 更有回收廢棄化學溶劑等 度的地方，比如生物”、主、“ 在而要極度清潔 到遠日法就沒有辦法 7w h準，這使得使用者非常困擾，所以就產生 式清洗法。乾式這類的清洗法最常見的有兩 種一種疋電裝處理法，·另一種是使用uv清洗。這兩種 3 M360094 月先方法^使用在半導體製程上或抓玻璃基板的清洗 文果卓兩種方法都存在著設備儀器價格高昂、 。又備複雜、^作困難等缺點，例如—台小型電漿處理機的 生產成本很冋以致售價往往超過三萬美金，而且還需要 2 一又備來支杈’所以一直無法成為廉價儀器被一般實驗 室、、檢驗=或醫院廣泛使用。而且最重要的是：這兩種清 洗法句有嚴重的^洗死角問題。因為在半導體製程上或 TFT玻璃基板上清洗均為簡單的平面清洗，但醫療工具如 手術刀u要面清洗的物件，電漿清洗器及清洗機 均很難克服這個問題。尤其uv清洗法的uv燈管在高溫 的腔體内工作’壽命減少’而且危險。以上兩種方式均存 在操作複雜、維護不㈣缺點，使用者往往必須要受訓， 增加成本及浪費時間。 因此，吾人提出一種以化學蒸氣反應處理物體的表面 清洗裝置。如第一圖所示，其工作方式為由外部輸入不同 的化學反應氣體進人-封閉腔Mla内，再把待處理物（如 生物晶片）2a及反應氣體加熱至高溫，在封閉腔體^内氣 體會和待處理物2a產生氣相化學沉積（—v叩〇r deposition, CVD )效應。其中，化學反應物（如：兕騰、 Water)放在加熱瓶3a中，加熱瓶3a底部放置一小型加熱器 3〇a，化學反應物加熱後產生蒸氣，透過一導管3ι&而'將 蒸氣導入封閉腔體la中進行反應，即可對待處理物％進行 活化作用。 惟，由於其係把液態的化學反應化合物加熱成氣態後 4 M360094 2 腔體1_ ;這是現有的⑽觸伽所使用 所以'1、宿為报多化學反應藥劑在常溫下都是呈液體狀， 〈、加熱成蒸氣態才能參予化學反應。但這種方式有 、失’:氣體在導管31a中會冷卻而液化，甚至阻塞導 二為二：是半導體產業碰到的一大難題。而現有解決之 定㈣y· s 31a上缠繞加熱片（圖略），使化學反應物— 相對增加氣態下，但這也增加了製造成本’維護困難度也 有廉於此，本創作人係為改善並解決上述之缺失，乃 2潛心研究並配合學理之運用，終於提出—種設計合理且 有效改善上述缺失之本創作。 【新型内容】 本創作之主要目的，在於可提供—種用於生物晶片或 4療工具之乾式清洗及表面處理設備，其主要係為解決前 •逑之問題與缺失，避免被汽化後之化學反應物因冷卻而回 .设為液態，因而有阻塞管路之虞等，且無增加該設備之製 .造成本、維護容易度等問題。 、為了達成上述之目的，本創作係提供一種用於生物晶 片或醫療工具之乾式清洗及表面處理設備，包括一可密閉 I體 臭氧產生器、以及一流體輸送裝置；可密閉腔體 係用以供如生物晶片或醫療工具等待處理物置放，並設有 一可改變其内部溫度之加熱器，且可密閉腔體上設有排氣 孔與進氣孔，進氣孔即與臭氧產生器相連通，以對可密閉 M360094 月工體供-六氧，而流體輪送裝置則用以填充化學反應物， 並，於可密閉腔體外，且具有伸入可密閉腔體内之微量輸 运吕’其中’可密閉腔體内更設有一蒸發容器，所述流體 輸送裝置之微量輸送管則延伸至蒸發容器之相對處，以將 化學反應物注入蒸發容器内。 本創作係透過所述流體輪送裝置將化學反應物注入可 密閉腔體内後，再透過蒸發容器的承載而使化學反應物能 在可密閉腔體内始被加熱成為蒸氣，故不會有輸入過程中 ，回復液態的問題’也不會因為回復成液態而造成輸送管路 雜塞，更無須加裝加熱片，來維持化學反應物在輸入過 私中因而要維持氣體狀態而提供的加熱措施等。因此，可 有效解決以往的問題與缺失，同時亦無增加該設備之製造 成本或維護容易度等問題。 【實施方式】 〜為工使t審查委員能更進一步瞭解本創作之特徵及 技術内谷’睛參閱以下有關本創作之詳細說明與附圖，然 而所附圖式僅提供參考與說明用，並非用來對本創作加以 限制者。 請參閱第二圖，係為本創作之構造示意圖。本創作係 提供-種用於生物晶片或醫粒具之乾式清洗及表面處理 设備’包括-用以放置待處理物（如生物晶片或醫療工具 的可街閉腔體1、一臭氧產生器2、以及-流體輸送 裝置3 ;其中： 6 M360094 5玄可岔閉腔體1為放置待處理物4的地方，其上役有 一排氣孔11與一進氣孔12，其中之進氣孔12係與上述臭氧 產生器2相連通，以利臭氧（a)由該進入孔n進入、並 可由該排氣孔12排出，且該臭氧產生器2再外接一氧氣閥 2〇以提供氧氣（〇2)的輸入，並可控制輸入氧氣量的多寡 。因此，當氧氣閥20輸入的氧氣受激發而成臭氧，即可被 -導引至可密閉腔體i中，且為了加熱臭氧，在可密閉腔體 1内係設有一加熱器10，俾可改變其内部溫度以對臭氧施 •加熱量，用以提供高溫的臭氧流向待處理物4。、 本創作主要目的，即是由一位於可密閉腔體丨外部且 具^微量輸送管30之流體輸送裝置3，其内填充有所需之 化學反應物，而於該可密閉腔體丨内則設有一蒸發容器U ’俾令該流體輸送裝置3之微量輸送管3G係伸人可密閉腔 體1内，並延伸至蒸發容器13的相對處（如上方），以直 =透過該U墨輸送管3〇將化學反應物注入可密閉腔體丨之 • ^發m3。而上述加熱器1G也同時提供了反應所需的溫 —二’、故化學反應物於可密閉腔體1的蒸發容器13中即被加 -二f為蒸氣源。所述化學反應物被加熱成的氣體，可以是 1又有機或無機氣體，且若反應的化學反應物不只一種， 貝J可視實際需求而增加所述流體輸送裝置3之數量。 一、而在本劍作所舉之實施例中，該流體輸送裝置3係為 ^注射器，而所述微量輸送管30即為該注射器之針頭；另 浦^亥流體輪送褒置3亦可為一可控制微量流體輸送之泵 圖略）。此外，該流體輸送裝置3亦可透過一微電腦 M360094 控制器31提供所需注入的化學反應物的劑量。另，若CVD 反應的化學過程必須在低壓下進行，則可密閉腔體ι便需 要有真空的密閉需求，並可視需要而外加真空泵浦。 疋以，藉由上述之構造組成，即可得到本創作用於生 物晶片或醫療工具之乾式清洗及表面處理設備。 、 據此，在操作時，係先準備經預洗的生物晶片（即待 處理物4)’再將其放人可密閉腔體ι中。這時可設定力 熱器1〇的工作溫度，並打開臭氧產生器2及加入夕卜^氧^ 使六氧進入可费閉腔體1和鬲溫的生物晶片作氧化作用 ，俟設定的時間到達之後，即可停止臭氧進人可密閉腔體 1 ’並改變加熱H1G的工作溫度至化學反應物的反應溫度 ’再透過微電腦控制器31將填充於流體輸送裝置3内：： 學反應物，依所需之劑量注人可㈣腔體i内，以受可褒 閉腔體1之加熱㈣所設定的反應溫度而被加熱成為^ ，這時因在特定的化學氣體配方及溫度下，生物晶片的表 面會被活化或依實際需求而變化，待時間滿足即可停機= 卻後，取出該生物晶片。 〜 因此，藉由本創作用於生物晶片或醫療工具之乾式清 洗及表面處理設備，透過所述流體輸送裝置3將化學反: 物注入可密閉腔體！㈣’再透過蒸發容器13的承；而： 化學反應物能在可密閉腔體i内始被加熱成為蒸氣，如此 即不會有化學反應物於輸入過程中回復液態的問題，也不 會因為回復成液態而造成輸送管路的阻塞，更無須加裝加 熱月’來維持化學反應物在輸人過程中因f要維持氣體^ M360094 同時亦無需增加製造成本或影響 態而提供的加熱措施等 維護容易度等問題。 、·示上所述，賴作㈣何乡得 確可達到預期之使用_，而解決習知之缺失，二: =性及進步性，完全符合新型專利申請要件，爰依專^ 法提出Μ ’敬請詳查並賜准本案專利，以保障創作人之 權利。 惟以上所述僅為本創作之較佳可行實施例，非因此即 拘限本創作之專利範圍，故舉凡運用本創作說明書及圖式 内谷所為之等效結構變化，均同理皆包含於本創作之範圍 内’合予陳明。 【圖式簡單說明】 第一圖係習知以化學蒸氣反應處理物體的表面清洗 裝置之構造示意圖。 第二圖係本創作之構造示意圖。 【主要元件符號說明】 <習知> 封閉腔體la 待處理物 2a 3a 加熱瓶 M360094 31a 加熱器 30a 導管 <本創作> 可密閉腔體 1 加熱器 10 排氣孔 11 進氣孔 12 蒸發容器13 臭氧產生器 2 氧氣閥 20 流體輸送裝置3 微量輸送管30 電腦控制器31 待處理物 4M360094 V. New description: [New technical field] This creation is related to biological and medical equipment, especially a dry cleaning and surface treatment equipment for biochips or medical tools. [Prior Art] The biggest problem that has plagued bio-scientists using bio-wafers is that they need to be surface-treated beforehand, but the wafers processed by the table have attenuating phenomenon. The service life is very short and cannot be saved. There is a decline in shipments from the factory to the customer, and there are problems in the shipping process that are bothersome. If it is used in the laboratory, although the quality can be used, but the equipment cost will be high and the production time will be long, so it can not be used in the market. It can be divided into two types: one for the heart and one for the main field. Law. Ml t is the material cleaning method; the other is the dry cleaning method... The washing method is to use the chemical to wash the wafer multiple times, and the second method is used by most people. This method requires the sophomore liquid to include the organic solvent. And inorganic solvents, even strong acid = more = easy to create secondary pollution, or produce poison at work, more recycling of chemical solvents, such as biological ", the main", "to be extremely clean to the distant There is no way for the law to be 7w h, which makes the user very troubled, so the production cleaning method is produced. Dry type cleaning methods are most commonly used in two types of enamel electric processing, and the other is uv cleaning. Both of these 3 M360094 methods are used in semiconductor processes or in the cleaning of glass substrates. Both methods exist in the high cost of equipment. There are also shortcomings such as complicated and difficult to handle. For example, the production cost of a small plasma processor is so high that the price often exceeds 30,000 US dollars, and it also needs 2 and 1 to be supported. So it has not been able to become a cheap instrument. General laboratory, inspection = or hospital use. And the most important thing is that these two cleaning sentences have serious problems with washing corners. Because cleaning on a semiconductor process or on a TFT glass substrate is a simple planar cleaning, it is difficult to overcome this problem with medical tools such as scalpels, plasma cleaners, and cleaning machines. In particular, the uv lamp of the uv cleaning method works in a high temperature chamber and has a reduced life and is dangerous. Both of the above methods have complicated operations and no maintenance. (4) Disadvantages, users often have to be trained to increase costs and waste time. Therefore, we have proposed a surface cleaning device for treating an object by a chemical vapor reaction. As shown in the first figure, it works by externally inputting different chemical reaction gases into the closed cavity Mla, and then heating the object to be treated (such as biochip) 2a and the reaction gas to a high temperature in the closed cavity ^ The internal gas and the material to be treated 2a produce a vapor phase chemical deposition (CVD) effect. Wherein, chemical reactants (eg, water, water) are placed in the heating bottle 3a, a small heater 3〇a is placed at the bottom of the heating bottle 3a, and the chemical reactant is heated to generate steam, which is passed through a conduit 3ι & The reaction is carried out by introducing into the closed cavity la, and the % of the treated material can be activated. However, since it is a liquid chemical reaction compound heated to a gaseous state, 4 M360094 2 cavity 1_; this is the existing (10) touch gamma used, so the singular multi-chemical reaction agent is liquid at normal temperature. , <, heating into a vapor state to participate in the chemical reaction. However, there are some ways to lose the gas: the gas will be cooled and liquefied in the conduit 31a, and even the second is blocked: it is a big problem encountered by the semiconductor industry. However, the existing solution (4) y·s 31a is wound on the heating sheet (not shown), so that the chemical reactants are relatively increased in the gaseous state, but this also increases the manufacturing cost. The maintenance difficulty is also cheaper. The creator is Improving and solving the above-mentioned shortcomings is the result of two researches and the use of academics, and finally proposes a design that is reasonable in design and effective in improving the above-mentioned defects. [New content] The main purpose of this creation is to provide a dry cleaning and surface treatment equipment for biochips or 4 treatment tools, which is mainly to solve the problems and defects of the front and the back, to avoid the chemical after vaporization. The reactants are returned by cooling. They are set to be in a liquid state, and thus there is a problem that the piping is blocked, and the system is not increased, causing problems such as ease of maintenance and maintenance. In order to achieve the above objectives, the present invention provides a dry cleaning and surface treatment apparatus for a biochip or a medical tool, comprising a closable I ozone generator and a fluid delivery device; a closable cavity system for For example, the biochip or medical tool waits for the treatment to be placed, and has a heater that can change its internal temperature, and the closable cavity is provided with a venting hole and an air inlet hole, and the air inlet hole is connected with the ozone generator. The condensable M360094 monthly working body is supplied with hexa-oxygen, and the fluid transfer device is used to fill the chemical reactants, and is outside the closable cavity, and has a micro-transporting Lu's which extends into the closable cavity. The closable chamber is further provided with an evaporation container, and the micro-transport tube of the fluid delivery device extends to the opposite side of the evaporation container to inject the chemical reactant into the evaporation container. The creation of the chemical reactant into the closable cavity through the fluid transfer device, and then through the carrying of the evaporation container, the chemical reactant can be heated into a vapor in the closable cavity, so there is no During the input process, the problem of returning to the liquid state is not caused by the return of the liquid to the delivery line, and there is no need to install a heating piece to maintain the heating of the chemical reactants during the input and thus maintain the gas state. Measures, etc. Therefore, the problems and deficiencies in the past can be effectively solved, and the manufacturing cost or the ease of maintenance of the device are not increased. [Embodiment] ~ For the work of the review committee, you can learn more about the features and techniques of this creation. Please refer to the following detailed description and drawings for this creation. However, the drawings are for reference and explanation only, not Used to limit the creation of this creation. Please refer to the second figure, which is a schematic diagram of the structure of the creation. The present invention provides a dry cleaning and surface treatment apparatus for biochips or medical granules' including: a slab capable of placing a material to be treated (such as a biochip or a medical tool, an ozone generator) 2, and - fluid transport device 3; wherein: 6 M360094 5 Xuan Ke can close the cavity 1 is the place to be treated 4, which has a venting hole 11 and an air inlet hole 12, wherein the air inlet hole The 12 series is in communication with the ozone generator 2 described above, so that ozone (a) enters from the inlet hole n and can be discharged from the vent hole 12, and the ozone generator 2 is further connected to an oxygen valve 2 to supply oxygen ( 〇 2) input, and can control the amount of oxygen input. Therefore, when the oxygen input from the oxygen valve 20 is excited to form ozone, it can be guided into the closable cavity i, and in order to heat the ozone, The heater chamber 10 is provided with a heater 10, and the internal temperature of the crucible can be changed to apply a heating amount to the ozone to provide high-temperature ozone to the object to be treated 4. The main purpose of the present invention is to locate a fluid that can seal the outside of the chamber and has a micro-transport tube 30 The feeding device 3 is filled with a desired chemical reactant, and an evaporation container U' is disposed in the closable cavity 俾, so that the micro-transport tube 3G of the fluid conveying device 3 extends into the human closable cavity 1 and extending to the opposite side (e.g., above) of the evaporation container 13 to directly inject the chemical reactant into the closable cavity through the U ink delivery tube 3, and the heater 1G is also At the same time, the temperature required for the reaction is provided, so that the chemical reactant is added to the evaporation vessel 13 of the closable chamber 1 as a vapor source. The chemical reactant is heated into a gas, which may be 1 or an organic or inorganic gas, and if there is more than one chemical reactant, the amount of the fluid delivery device 3 can be increased according to actual needs. 1. In the embodiment of the present invention, the fluid delivery The device 3 is a syringe, and the micro-transport tube 30 is the needle of the syringe; the other pumping device 3 can also be a pump diagram for controlling micro-fluid transport). In addition, the fluid delivery device 3 can also provide a dose of chemical reactant to be injected through a microcomputer M360094 controller 31. In addition, if the chemical process of the CVD reaction must be carried out at a low pressure, the sealing of the cavity requires a vacuum tightness requirement, and vacuum pumping may be applied as needed. In view of the above construction, the dry cleaning and surface treatment equipment for biochips or medical tools can be obtained. Accordingly, in operation, the pre-washed bio-wafer (i.e., the object to be treated 4) is prepared and then placed in the closable cavity ι. At this time, the operating temperature of the heat heater can be set, and the ozone generator 2 is turned on and the oxygen gas is added to make the hexa-oxygen enter the biofilm of the closed cavity 1 and the enthalpy temperature for oxidation, and the time is reached after the set time. Thereafter, the ozone can be stopped to enter the human closable cavity 1 'and the operating temperature of the heated H1G is changed to the reaction temperature of the chemical reactants' and then filled into the fluid delivery device 3 through the microcomputer controller 31:: The required dose can be heated in the chamber (i) by the reaction temperature set by the heating (4) of the closable chamber 1. At this time, due to the specific chemical gas formula and temperature, the biochip The surface will be activated or changed according to actual needs. When the time is met, the machine can be stopped. Then, the biochip is taken out. ~ Thus, by means of the dry cleaning and surface treatment equipment for biochips or medical tools, the chemical reaction device 3 is injected into the closable cavity through the fluid delivery device 3! (4) 'Re-transmission through the evaporation vessel 13; and: The chemical reactant can be heated into a vapor in the closable cavity i, so that there is no problem that the chemical reactant returns to the liquid during the input process, and it is not because Reverting to a liquid state causes blockage of the conveying pipeline, and there is no need to install a heating month to maintain the chemical reactants in the process of inputting the gas to maintain the gas ^ M360094 without increasing the manufacturing cost or the heating state provided by the influence state, etc. Problems such as ease of maintenance. According to the above description, Lai Zuo (4) Hexiang can indeed achieve the expected use _, and solve the lack of conventional knowledge, two: = sex and progress, fully in line with the requirements of new patent applications, according to the special method proposed Μ ' Please check and grant the patent in this case to protect the rights of the creator. However, the above description is only a preferred and feasible embodiment of the present invention, and thus the scope of the patent of the creation is not limited thereby, so the equivalent structural changes made by the use of this creation specification and the inner valley of the drawing are all included in the same reason. Within the scope of this creation, 'combined with Chen Ming. BRIEF DESCRIPTION OF THE DRAWINGS The first figure is a schematic view showing the construction of a surface cleaning apparatus for treating an object by a chemical vapor reaction. The second picture is a schematic diagram of the construction of this creation. [Description of main component symbols] <General knowledge> Closed cavity la Treated object 2a 3a Heating bottle M360094 31a Heater 30a Catheter<This creation> Sealable cavity 1 Heater 10 Vent hole 11 Inlet hole 12 Evaporation container 13 Ozone generator 2 Oxygen valve 20 Fluid delivery device 3 Micro delivery tube 30 Computer controller 31 Objects to be processed 4
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