，M340483 八、新型說明： 【新型所屬之技術領域】 本創作係關於一種回位機構，尤指一種適用於曝光機曝光 基台之回位機構。 【先前技術】 請參閱第一圖，其係習知曝光機之立體圖，於圖式中顯示有 _一傳統之曝光機9，此曝光機9包括一曝光基台91，且此曝光基台 91包括一曝光平台911及一曝光上蓋912，於使用時，係使欲進行 曝光之電路板（圖未示）放置於曝光平台911上，並將吸附有底片 (圖未示）之曝光上蓋912對應向下蓋合於曝光平台911，並使曝光 平台911吸附於曝光上蓋912，之後，再使整個曝光基台91進入内 邛之曝光至（圖未示）並進行曝光作業，藉以將底片上之圖案（例如 線路）藉由曝光程序複製到電路板上。 .於上述之曝光作㈣程巾，曝織台91係不㈣回並更換不 同之電路才反卩將底片上之圖案藉由曝光程序複製到多個電路板 上。然而，於進行每一次的曝光作業時，皆需有所謂之回位裝置 以使曝光基口 91上之底片與電路板可位於相對正確位置，如此於 重複進行曝光作業時，才不會因位置之誤差而使 法正確複H到電路板上，但是每次回位都需要再次校正與調整， 因為曝光的片數增加，同樣的合 、 的曰拉長生產的時間，造成產能的下 滑’造成生產上極大的困擾。 5 M340483 圖係第 請同時參閱第一圖、第二圖及第三圖，其中之 圖曝光機曝光基台之剖面圖，第三圖係第一圖曝光機曝光基台之 俯視圖，於圖式中顯示傳統曝光基台耵之對位方 土 〇之 八1糸利用一升降 平口 92往上推升曝光平台911，並再利用複數個⑽攝影機（圖未 針對曝光平台911上對位孔進行影像操取，然後針對所掏取之影: .進行比對，例如擷取圓形孔之影像而以同心圓之方式進疒比對 藉以得知曝光平台911是否位於正確位置。 ^ 然而，如上所述，傳統之對位方式係利用升降平台犯往上推 升曝光平台911，但於每次往上推升去承接的過程之中，在下降過 程中都會需要調整對準並歸回起始位置，在回位過程中浪費太多 的時間在回位的校正，為了能讓曝光平台911都能回到起始位置， 目的是不會因為沒有歸位而造成下次曝光對位的誤差，再者因為 震動等因素會使曝光平台911產生微量之位移誤差，當位移誤差不 斷累積之下，後續之曝光作業便會產生極大之位移誤差。 此外，當曝光平台9Π脫離曝光上蓋912之吸附而向下回落至 升降平σ 92時，因為無緩衝結構之設計，相對會使曝光平台911於 向下回落時產生較大之震動，且並會因此使上述之位移誤差問題 變知更為嚴重’甚至會因為震動而造成曝光平台911之損害。 此外’上述傳統之對位方式係利用CCD攝影機以進行回位的方 式，於成本上亦較為耗費，實非十分理想。 6 M340483 【新型内容】 本創作之曝光機曝光基台之回位機構係搭配一曝光機使用， 此曝光機的基本架構包括一曝光基台以及一動力源，其中，動力 源係位於曝光基台下方並包括一承載部，曝光基台包括一曝光平 台以及一曝光上蓋，其中之曝光上蓋係對應向下蓋合於曝光平 台’且曝光平台包括一下表面。 此外，上述之回位機構包括複數個回位裝置，且每一對位妒 置包括一上導引塊、一下導引塊以及一緩衝件。其中，上導引塊 係設置於曝光平台之下表面’且上導引塊向下形成有—斜導引 面’上導引塊並上下貫設貫孔，此貫孔並對應連通曝光平台 之下表面0 另外，下導引塊係組設於動力源之承載部，且下導引塊向上 形成有另-斜導引面，此另—斜導引面並對應嵌合於上導引塊之 斜導引面。 ►再者’緩衝件包括一基座、一桿體、一 了頁抵塊以及—彈性件， 其中，基座係組設於下導引塊，桿體係由基座延伸並容置於上導 引塊之貫孔内’彈性件係組設於桿體，頂抵塊係滑設於桿體並以 彈性件之彈性力相對於曝光平台之下表面上下伸縮。 因此，藉由上述結構’可利用上導引塊之斜導引面與下導引 塊之另一斜導引面互相對岸嵌人 了應瓜口即可輕易地完成自動回位功 能，將可以大幅減少回位過程中的時間，亦可增加曝光作業之產 能0 7 M340483 此外，藉由緩衝件之設計，可緩衝曝光平台㈣之衝擊力， 亦p曝光平口不會因震動而產生位移誤差，且可以避免曝光平△ 因震動而發生損害之問題。 口 再者利用上述之回位機構，也可以降低曝光機台成本， 相對可增加產品的競爭力。 有關本創作之詳細内容及技術，茲就配合圖式說明如下： 【實施方式】 月先> 閲第一圖，本創作之曝光機曝光基台之回位機構係搭 配一曝光機1(如同第一圖所示之曝光機）使用。 睛同時參閱第-圖及第四圖，其中之第四圖係本創作一較佳 實施例之曝光基台之剖面目，上述之曝光機以括一曝光基台^以 及動力源13，其中之動力源13係位於曝光基台11下方，且此動 力源13包括一承載部131，同時於本實施例中，此動力源13係一氣 攀壓缸。 - 此外’曝光機1之曝光基台11包括一曝光平台ill以及一曝光 上蓋112,其中之曝光上蓋112係對應向下蓋合於曝光平台m，且 曝光平台111係會對應吸附於曝光上蓋i i 2，同時，此曝光平台u i 包括一下表面。 另外，上述之回位機構包括複數個回位裝置2(每一回位裝置2 之位置可參閱第三圖之校正回位結構91〇位置，亦即每一回位裝置 2可組設於原本傳統設置校正回位結構91〇之位置處，是故在本實 8 M340483 施例中是以四個回位裝置2來加以實施)，且每一回位裝置2包括一 上導引塊3、一下導引塊4以及一緩衝件。 圖式中之上導引塊3係設置於曝光平台m之下表面，且上導 引塊3向下形成有-斜導引面31，上導引塊3並上下貫設有一貫孔 32,此貫孔32並對應連通曝光平台lu之下表面。 此外，圖式中之下導引塊4係組設於動力源13之承载部131， 鲁且下導引塊4向上形成有另一斜導引面41 ’此另一斜導引面41並對 應喪合於上導引塊3之斜導引面31。 再者’圖式中之緩衝件包括一基座51、一桿體52、一頂抵塊 53以及-彈性件54 ’其中，基座51係組設於下導引塊4，桿體^係 由基座51延伸並容置於上導引塊3之貫孔32内，彈性件⑷系組設於 桿體52，頂抵塊53係滑設於桿體52並以彈性件54之彈性力相對於 曝光平台111之下表面上下伸縮。於本實施例中，上述緩衝件5之 g 彈性件54係一伸縮彈簧。 ' 請同時參閱第—圖、第四圖及第五圖，其中之第五圖係本創 .作一較佳實施例之曝光基台之作動示意圖，當曝光機丨完成每一次 曝光作業時，曝光上蓋112會解除對曝光平台U1之吸附，使得曝 光平台ill會因為自身之重力而向下掉落，此時，藉由上導引塊3 之斜導引面31與下導引塊4之另一斜導引面41之互相對應嵌合，亦 即上導引塊3之斜導引面31與下導引塊4之另一斜導引面41會因斜 面之没叶而互相導引嵌合，使得曝光平台lu可輕易地完成自動對 位功能，而不會使曝光平台U1產生位移誤差累積之問題，故如此 M340483 之產品良 之設計除了可縮短曝光作業時間外，亦可增加曝光作業 率。 此外，藉由上述緩衝件之設計，可藉以緩衝曝光平台⑴回落 之衝擊力，如第五圖所示，亦即曝光平台ιη不會因震動而產生位 移誤差，且可以避免曝光平台lu因震動而發生損害n 再者’利用上述之回位機構，亦可大幅降低成本，相對可 增加產品的競爭力。 限 雖然本創作已以-較佳實施例揭露如上，然其並非用以 疋本们作 <壬何熟習此技藝者，在不脫離本創作之精神和範圍 内曰可作各種之更動與潤飾，因此本創作之保護範圍當視後 附之申請專利範圍所界定者為準。 【圖式簡單說明】 為讓本創作之上述和丨他目&、特冑、優點與實施例能更 _明顯易懂，所附圖式之詳細說明如下·· 第一圖係習知曝光機之立體圖。 -第二圖係第一圖曝光機曝光基台之剖面圖。 第三圖係第一圖曝光機曝光基台之俯視圖。 第四圖係本創作—較佳實施例之曝光基台之剖面圖。 第五圖係本創作_較佳實施例之曝光基台之作動示意圖。 M340483 【主要元件符號說明】 1 曝光機 II 曝光基台 III 曝光平台 112 曝光上蓋 13 動力源 131 承載部 2 回位裝置 3 上導引塊 31 斜導引面 32 貫孔 4 下導引塊 41 另一斜導引面 51 基座 52 桿體 53 頂抵塊 54 彈性件 9 曝光機 91 曝光基台 910 校正回位結構 911 曝光平台 912 曝光上蓋 92 升降平台, M340483 VIII, new description: [New technical field] This creation is about a return mechanism, especially a return mechanism suitable for exposure base exposure. [Prior Art] Referring to the first drawing, which is a perspective view of a conventional exposure machine, a conventional exposure machine 9 is shown in the drawing, the exposure machine 9 includes an exposure base 91, and the exposure base 91 The invention comprises an exposure platform 911 and an exposure upper cover 912. In use, the circuit board (not shown) to be exposed is placed on the exposure platform 911, and the exposure upper cover 912 to which the negative film (not shown) is attached is corresponding. The exposure platform 911 is covered downward, and the exposure platform 911 is attracted to the exposure upper cover 912. Thereafter, the entire exposure base 91 is exposed to the inner surface (not shown) and exposed, so that the negative film is placed thereon. Patterns (such as lines) are copied to the board by an exposure program. In the above exposure (4), the exposure table 91 does not (four) return and replace the different circuits to reverse the pattern on the film to the multiple boards by the exposure program. However, in performing each exposure operation, a so-called return device is required to allow the film on the exposure base 91 to be positioned at a relatively correct position with respect to the circuit board, so that the position is not repeated when the exposure operation is repeated. The error causes the method to correctly reset H to the circuit board, but each time the return position needs to be corrected and adjusted again, because the number of exposures increases, the same combination, the length of production time, resulting in a decline in production capacity Great trouble. 5 M340483 Please refer to the first picture, the second picture and the third picture at the same time. The picture shows the profile of the exposure base of the exposure machine. The third picture is the top view of the exposure base of the first exposure machine. The display of the traditional exposure base 耵 对 方 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸 糸Take action and then take a picture of the captured image: . For comparison, for example, taking an image of a circular hole and making a concentric circle to find out if the exposure platform 911 is in the correct position. ^ However, as above As mentioned, the traditional alignment method uses the lifting platform to push up the exposure platform 911, but in the process of pushing up and going up each time, it is necessary to adjust the alignment and return to the starting position during the descending process. In the process of returning, waste too much time in the correction of the return position, in order to allow the exposure platform 911 to return to the starting position, the purpose is not to cause the error of the next exposure alignment because there is no returning, and Because of vibration The exposure platform 911 will generate a small amount of displacement error. When the displacement error is accumulated, the subsequent exposure operation will cause a great displacement error. In addition, when the exposure platform 9 Π is released from the exposure upper cover 912, it falls down to the lift. When the flat σ is 92, because of the design of the unbuffered structure, the exposure platform 911 will relatively vibrate when it falls back down, and the above-mentioned displacement error problem will become more serious, even due to vibration. The damage caused by the exposure platform 911. In addition, the above-mentioned traditional alignment method uses a CCD camera to perform the returning, and the cost is also relatively expensive. It is not very satisfactory. 6 M340483 [New content] Exposure exposure of the creation The base mechanism is used in conjunction with an exposure machine. The basic structure of the exposure machine includes an exposure base and a power source. The power source is located below the exposure base and includes a carrying portion. The exposure base includes a An exposure platform and an exposure cover, wherein the exposure upper cover is correspondingly closed to the exposure platform and the exposure platform comprises a In addition, the above-mentioned returning mechanism includes a plurality of returning devices, and each of the pair of positioning devices includes an upper guiding block, a lower guiding block and a buffering member, wherein the upper guiding block is disposed in the exposure The lower surface of the platform and the upper guiding block are formed with a guiding block on the oblique guiding surface and a through hole penetrating up and down, the through hole correspondingly connecting the lower surface of the exposure platform 0, and the lower guiding block The upper guiding block is formed on the bearing portion of the power source, and the lower guiding block is formed with a further oblique guiding surface, and the other oblique guiding surface is correspondingly fitted to the inclined guiding surface of the upper guiding block. The cushioning member comprises a base, a rod body, a sheet abutting block and an elastic member, wherein the base is assembled on the lower guiding block, and the rod system is extended by the base and accommodated in the upper guiding block. The elastic member in the hole is assembled on the rod body, and the top abutting block is slidably disposed on the rod body and is extended and contracted up and down with respect to the lower surface of the exposure platform by the elastic force of the elastic member. Therefore, by the above structure, the automatic returning function can be easily completed by embedding the oblique guiding surface of the upper guiding block and the other oblique guiding surface of the lower guiding block opposite to each other. Significantly reduce the time during the return process, and increase the productivity of the exposure operation. 0 7 M340483 In addition, the buffer member can be used to buffer the impact force of the exposure platform (4), and the p exposure flat opening will not cause displacement error due to vibration. Moreover, it is possible to avoid the problem that the exposure level Δ is damaged by vibration. In addition, by using the above-mentioned returning mechanism, the cost of the exposure machine can also be reduced, and the competitiveness of the product can be relatively increased. The details and technology of this creation are described as follows: [Embodiment] Months First > Read the first picture, the return mechanism of the exposure exposure base of this creation is matched with an exposure machine 1 (like The exposure machine shown in the first figure is used. Referring to both the first and fourth figures, wherein the fourth figure is a cross-sectional view of the exposure base of a preferred embodiment of the present invention, the exposure machine includes an exposure base and a power source 13, wherein The power source 13 is located below the exposure base 11, and the power source 13 includes a bearing portion 131. In the embodiment, the power source 13 is a gas climbing cylinder. In addition, the exposure base 11 of the exposure machine 1 includes an exposure platform ill and an exposure upper cover 112, wherein the exposure upper cover 112 is correspondingly closed to the exposure platform m, and the exposure platform 111 is correspondingly adsorbed to the exposure upper cover ii. 2, at the same time, this exposure platform ui includes the surface. In addition, the above-mentioned returning mechanism includes a plurality of returning devices 2 (the position of each of the returning devices 2 can be referred to the corrected returning structure 91〇 position of the third figure, that is, each of the returning devices 2 can be set in the original The conventional setting correction correction return structure 91 is located at the position of the actual 8 M340483 embodiment, and each of the returning devices 2 includes an upper guiding block 3, The guiding block 4 and a buffer member are next. The upper guiding block 3 is disposed on the lower surface of the exposure platform m, and the upper guiding block 3 is formed with an oblique guiding surface 31, and the upper guiding block 3 is provided with a consistent hole 32. The through hole 32 corresponds to the lower surface of the exposure exposure platform lu. In addition, the lower guiding block 4 is disposed on the bearing portion 131 of the power source 13 in the middle of the drawing, and the lower guiding block 4 is formed with another inclined guiding surface 41 'the other inclined guiding surface 41 Corresponding to the oblique guiding surface 31 of the upper guiding block 3. Furthermore, the buffer member in the drawing includes a base 51, a rod body 52, a top abutting block 53 and an elastic member 54. The base 51 is assembled to the lower guiding block 4, and the rod body is The base member 51 extends and is received in the through hole 32 of the upper guiding block 3, and the elastic member (4) is assembled on the rod body 52. The top abutting block 53 is slidably disposed on the rod body 52 and elasticized by the elastic member 54. The upper and lower sides are extended and contracted with respect to the lower surface of the exposure stage 111. In the present embodiment, the g elastic member 54 of the cushioning member 5 is a telescopic spring. Please also refer to the first, fourth and fifth figures, the fifth of which is the schematic diagram of the operation of the exposure base of a preferred embodiment. When the exposure machine completes each exposure operation, Exposing the upper cover 112 will release the adsorption of the exposure platform U1, so that the exposure platform ill will fall downward due to its own gravity. At this time, by the oblique guiding surface 31 of the upper guiding block 3 and the lower guiding block 4 The other oblique guiding surfaces 41 are correspondingly fitted to each other, that is, the inclined guiding surface 31 of the upper guiding block 3 and the other inclined guiding surface 41 of the lower guiding block 4 are guided by the leaves of the inclined surface. The fitting allows the exposure platform to easily perform the automatic alignment function without causing the displacement of the exposure platform U1 to be accumulated. Therefore, the design of the M340483 product can increase the exposure time and increase the exposure operation. rate. In addition, by the design of the buffering member, the impact force of the exposure platform (1) can be buffered, as shown in the fifth figure, that is, the exposure platform ιη does not cause displacement error due to vibration, and the exposure platform lu can be prevented from vibrating. In the event of damage, the use of the above-mentioned return mechanism can also significantly reduce costs and increase the competitiveness of products. Although the present invention has been disclosed above in the preferred embodiment, it is not intended to be used by those skilled in the art to make various changes and refinements without departing from the spirit and scope of the present invention. Therefore, the scope of protection of this creation is subject to the definition of the scope of the patent application attached. [Simple description of the schema] In order to make the above-mentioned and other features, features, advantages and embodiments of the creation more _ obvious and easy to understand, the detailed description of the drawings is as follows: Stereoscopic view of the machine. - The second figure is a cross-sectional view of the first exposure machine exposure base. The third figure is a top view of the exposure base of the first exposure machine. The fourth drawing is a cross-sectional view of the exposure base of the present preferred embodiment. The fifth figure is a schematic diagram of the operation of the exposure base of the present invention. M340483 [Main component symbol description] 1 Exposure machine II Exposure base III Exposure platform 112 Exposure cover 13 Power source 131 Carrying part 2 Return device 3 Upper guide block 31 Oblique guide surface 32 Through hole 4 Lower guide block 41 An inclined guiding surface 51 base 52 rod 53 abutting block 54 elastic member 9 exposure machine 91 exposure base 910 correction return structure 911 exposure platform 912 exposure upper cover 92 lifting platform