TWM247592U - Structure of electric conductive system for electroplating facility - Google Patents

Structure of electric conductive system for electroplating facility Download PDF

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Publication number
TWM247592U
TWM247592U TW92222849U TW92222849U TWM247592U TW M247592 U TWM247592 U TW M247592U TW 92222849 U TW92222849 U TW 92222849U TW 92222849 U TW92222849 U TW 92222849U TW M247592 U TWM247592 U TW M247592U
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Taiwan
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conductive
scope
patent application
item
system structure
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TW92222849U
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Chinese (zh)
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Wu-Chiuan Shiu
Chu-Rung Ye
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Applied Equipment Ltd
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Priority to TW92222849U priority Critical patent/TWM247592U/en
Publication of TWM247592U publication Critical patent/TWM247592U/en

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Description

M247592 四、創作說明(1) 【新型所屬之技術領域】 本創作係有關於一種電鍍設備,特別是與一種可不論 待鍍物體之大小尺寸,均可將其均勻電鍍以及減少污染之 電鑛設備導電糸統構造有關。 【先前技術】 按,『電鍍』是現今工業界中被廣泛使用的加工程序 ,其主要係利用電解的原理,將金、黃銅、鉻、鎳、鈹、 錫等有光澤的金屬,披覆在金屬加工零件或成品表面,使 該等加工零件或成品因此不同鍍層之色澤變化,獲得美麗 、防鏽、耐磨、導電等效果,藉以提供加工零件或成品之 使用品質。M247592 4. Creation Instructions (1) [Technical Field to which the New Type belongs] This creation relates to an electroplating equipment, especially an electro-mining equipment that can uniformly plate and reduce pollution regardless of the size and size of the object to be plated. The conductive system is related to the structure. [Previous technology] According to the press, "electroplating" is a widely used processing program in the industry today. It mainly uses the principle of electrolysis to coat gold, brass, chromium, nickel, beryllium, tin and other shiny metals. On the surface of metal processed parts or finished products, the color of these processed parts or finished products is changed due to different coatings to obtain beauty, rust prevention, abrasion resistance, electrical conductivity and other effects, so as to provide the used quality of processed parts or finished products.

在電解反應中,溶液中的金屬離子會在負極接受電子 而析出。電鍍就是利用這個原理,被鍍物品接在負極,把 所要鍍上的金屬作為正極,用含有要鍍上的金屬離子的溶 液做電鐘液。通電流後正極溶解成金屬離子,溶液中的金 屬離子析出在被鍍物體的表面,形成一層金屬薄膜,這就 是電鍍。以電路板的製程來說,係具有一電鍍銅之步驟, 其於電鍍時(請參閱第一圖及第二圖,係分別為習知電鍍 設備1之側面剖視圖以及前視圖),必須將電路板1 4架 設於各夾具1 3間,並將該夾具1 3掛於一掛架1 1上, 此掛架1 1之上端係設有掛勾1 1 1 ,可扣掛於一掛片1 2之上,藉之傳導電流,再將架設有電路板1 4之夾具1 3浸入電鍍槽2之電鍍液2 1中,利用極板2 2 、2 3連In the electrolytic reaction, metal ions in the solution will be deposited by accepting electrons at the negative electrode. Electroplating is based on this principle. The article to be plated is connected to the negative electrode, the metal to be plated is used as the positive electrode, and the solution containing the metal ions to be plated is used as the electric clock liquid. After the current is applied, the positive electrode is dissolved into metal ions, and the metal ions in the solution are deposited on the surface of the object to be plated to form a metal film. This is electroplating. In terms of the circuit board manufacturing process, there is a step of electroplating copper. When electroplating (see the first and second pictures, respectively, the side sectional view and the front view of the conventional electroplating equipment 1), the circuit must be The board 14 is set up in each of the clamps 13 and the clamp 13 is hung on a hanger 11. The upper end of the hanger 11 is provided with a hook 1 1 1 which can be buckled on a hanger 1 2 on the basis of conducting current, immerse the fixture 1 3 with the circuit board 1 4 immersed in the electroplating bath 2 1 of the plating tank 2 and use the electrode plates 2 2 and 2 3

第5頁 M247592 ^、創作說明(2) 接正極與掛片 架1 1完成電 扣掛於一掛片 作業。此設計 有下列缺點: 1 ·移動時產 該掛 與掛片1 1與掛片 電鍍槽2 2 ·易造成掛 掛勾 產生間隙 3 ·易造成電 由於 具的關係 ,使各夾 同,造成 4 ·使用壽命 由於 設備1之 之下,易 5 ·不適用較 由於 生之銅屑 架1 1為 2接觸作 1 2因接 之電鍍液 勾與掛片 1 1 1與 ,造成導 路板電鍍 各夾具1 ,將造成 具1 3夾 電路板電 短: 電鍍製程 所有銅製 生銅綠使 大尺寸之 各掛架1 1 2連接負極並以同一電源通電,並利用掛 鍍之動作。又,掛架1 1上端之掛勾1 1 1 1 2之上可帶動電路板1 4移動,執行後續 雖可提供電鍍且方便後續作業之執行,但含 將造成污染: 銅製,係藉同為銅製之掛勾1 1 1 為導電路徑,在移動時,掛勾1 1 觸摩擦而產生之銅屑將直接掉落至 2 1中,造成電鍍液2 1受污染。 之導電率下降·· 掛片1 2接觸摩擦時間一久,則易 電率下降。 不均勻: 3排列之順序以及其均為獨立之夾 各爽具13所導通之電量不盡相同 持之電路板部位得到之電量亦不相 鍍不均勻。 係在一極酸之環境下進行,該電鍍 元件均無遮蔽而直接暴露在此環境 整體導電率下降,減低使用壽命。 電路板: 11之尺寸固定,故夾具13之夾Page 5 M247592 ^, creation instructions (2) Connect the positive electrode and the hanging rack 1 1 Complete the electric buckle hanging on a hanging job. This design has the following disadvantages: 1 · The hanging and hanging piece is produced when moving 1 1 and hanging plate plating tank 2 2 · It is easy to cause gaps in the hanging hook 3 · It is easy to cause electricity due to the relationship between the clips, causing 4 · The service life is lower than the equipment 1, easy 5 · Not applicable. It is not suitable because the raw copper scrap frame 1 1 is 2 for contact 1 2 because of the plating solution hook and the hanging piece 1 1 1 and the electroplating of the circuit board. Fixture 1 will result in short circuit of the circuit board with 13 clips: All copper made of patina in the electroplating process makes the large-sized racks 1 1 2 connected to the negative electrode and powered by the same power supply, and uses the action of hanging plating. In addition, the hook 1 1 1 1 2 on the upper end of the hanger 11 can move the circuit board 14. Although the subsequent execution can provide electroplating and facilitate the subsequent operations, it will cause pollution: copper, which is the same as The copper hook 1 1 1 is a conductive path. When moving, the copper scraps caused by the friction of the hook 1 1 will fall directly into 2 1, causing the plating solution 2 1 to be contaminated. The conductivity decreases ... The susceptibility of the hanging sheet 12 to contact friction for a long time decreases. Non-uniformity: The order of the 3 arrangement and the independent clips are different. The amount of electricity conducted by each cooler 13 is not the same. The amount of electricity obtained by holding the circuit board is not uniform. It is carried out in a polar acid environment. The electroplated components are directly exposed to the environment without being shielded. The overall conductivity decreases, which reduces the service life. Circuit board: The size of 11 is fixed, so the clamp of 13

第6頁 M247592 四、創作說明(3) 持範圍亦固定,若欲電鍍一較大尺寸之電路板1 4時 ,則電路板邊緣處會因無夾具1 3夾持導電,使之導' 電效果差,故其不適用較大尺寸之電路板1 4。 有鑑於習知電鍍設備之缺憾,本創作人有感其未至臻 完善,遂竭盡心智,悉心研究克服,憑從事該項產業多年 之經驗累積,進而研發出一種電鍍設備之導電系統構造, 利用簡單的設計,可達到不論待鍍物體之大小尺寸,均可 將其均勻電鍍、減少污染以及增加使用壽命之功效者。 【新型内容】Page 6 M247592 4. Creation instructions (3) The holding range is also fixed. If a larger size circuit board 14 is to be plated, the edge of the circuit board will be conductive because there is no clamp 1 3 to make it conductive. The effect is poor, so it is not suitable for larger size circuit boards. In view of the shortcomings of the conventional electroplating equipment, the creator felt that it was not perfect, so he tried his best to study and overcome it. Based on the experience accumulated in the industry for many years, he developed a conductive system structure for electroplating equipment. The simple design can achieve the effect of uniformly plating, reducing pollution and increasing service life regardless of the size of the object to be plated. [New content]

爰是,本創作之主要目的即在於提供一種電鍍設備導 電系統構造,可達到不論待鍍物體之大小尺寸,均可將其 均勻電鍍之功效者。 本創作之另一目的即在於提供一種電鍍設備導電系統 構造,可達到減少污染之功效者。 本創作之又一目的即在於提供一種電鍍設備導電系統 構造,可達到增加使用壽命之功效者。 為達上述目的,根據本創作之一種電鍍設備導電系統 構造,至少包含:若干導電架板;若干夾具,係設於導電 架板之下端,可將待鍍物體夾固其下;若干導電載台,係 設於導電架板之上端;一導電板,其下方設有若干導電體 ,可置放於導電載台之上。 藉此,可達到不論待鍍物體之大小尺寸,均可將其均 勻電鍍以及減少污染之功效者。That is, the main purpose of this creation is to provide a conductive system structure for electroplating equipment, which can achieve the effect of uniform electroplating regardless of the size and size of the object to be plated. Another purpose of this creation is to provide a conductive system structure for electroplating equipment, which can achieve the effect of reducing pollution. Another purpose of this creation is to provide a conductive system structure for electroplating equipment that can increase the useful life. In order to achieve the above purpose, according to a conductive system structure of the electroplating equipment created by the present invention, at least: a plurality of conductive frame plates; a plurality of clamps, which are arranged at the lower end of the conductive frame plate, can clamp the object to be plated thereunder; It is arranged on the upper end of the conductive frame plate; a conductive plate is provided with a plurality of conductive bodies below it and can be placed on the conductive carrier. This can achieve the effect of uniformly plating and reducing pollution regardless of the size of the object to be plated.

第7頁 M247592 創作說明(4) 實 茲藉 做一 再請 圖以 電架 ,可 導電 電體 與一 之外 於該 1之 物體 ,該 一銅 第七 1以 施方式 為使 由下述 詳細說 請蒼閱 參閱第 及部分 本創作 板3 1 將待鍍 架板3 3 5, 電源線 側係設 導電架 上而滾 6執行 導電體 盒,且 請爹閱 圖,係 本創作 導線3 ] 貴審 具體 明, 第三 四圖 元件 電鍍 •’若 物體 1之 可置 7連 有遮 板3 動, 後續 3 5 該待 第六 為本 電鍍 6互 查委員 之實施 說明如 圖,係 及第五 俯視圖 設備導 干夾具 6夾固 上端; 放於導 接,作 件4, 1二側 協助導 之作業 可為一 鍍物體 圖,係 創作之 設備導 相串接 瞭解本 例,並 后: 為本創 圖,係 ,如圖 電糸統 3 2, 其下; 一導電 電載台 為電力 且遮件 面均設 電糸統 。其中 銅塊或 6可為 為本創 局部放 電系統 ,且該 創作之目的、特徵及功效, 配合所附之圖式,對本創作 作之部 為分別 所示: 3構造 係設於 若干導 板3 4 3 3之 之來源 4之内 有滾輪 3帶動 ,該導 電刷, 一電路 作之外 大俯視 3構造 導電板 分元件外觀示意圖, 為本創作之側面剖視 ,至 導電 電載 ,其 上, 。另 部設 3 7 於電 電板 該導 板。 觀示 圖, ,係 3 4 少包 架板 台3 下方 並使 於該 有導 ,可 鍍槽 3 4 電載 意圖 如圖 將各 係藉 含: 3 1 3, 設有 導電 導電 軌4 置於 5内 可為 台3 若干導 之下端 係設於 若干導 板3 4 系統3 1 ;又 導軌4 之待鍍 一銅排 3可為 ,再請參閱 所示: 導電架板3 由若干導線Page 7 M247592 Creative Instructions (4) Shizi repeatedly asked for a picture of the electric frame, which can conduct electricity and an object other than the one, and the one of the copper seventy-first is to use the method to explain in detail the following Please refer to the part and part of this creative board 3 1 The board to be plated 3 3 5, The power cord is provided with a conductive rack on the side and the conductor box 6 is rolled, and please read the drawing, this is the creative lead 3] Expensive Examination details, the third and fourth picture element plating • 'If the object 1 can be placed 7 with a shield 3 moving, the follow-up 3 5 should be the sixth embodiment of the implementation of the plating 6 mutual inspection committee as shown in the figure, the fifth and fifth The top view of the equipment guide dry clamp 6 clamps the upper end; Put it on the guide, and make the work on the side of the guide 4 and 1 to assist the guide. It can be a plated object diagram. The created equipment guide is connected in series to understand this example, and then: Create a picture, the system, as shown in Figure 3, below; a conductive electric platform is electric, and the shield surface is equipped with a system. Among them, the copper block or 6 can be the original partial discharge system of this invention, and the purpose, characteristics and effects of this creation, with the accompanying drawings, the parts of this creation are shown separately: 3 The structure is provided on several guide plates 3 The source of 4 3 3 is driven by the roller 3, the conductive brush, a circuit outside the top view 3 structure of the conductive plate sub-component appearance diagram, a side view of this creation, to the conductive electric load, on which . The other part is 3 7 for the electric board and the guide board. Viewing the diagram, the system 3 4 is provided below the pallet 3 and is guided, and the electroplating tank 3 4 is intended to borrow each system as shown below: 3 1 3, with conductive tracks 4 placed on Inside 5 can be the platform 3, some lower ends are set on several guide plates 3 4 system 3 1; and a copper bar 3 of the guide rail 4 to be plated can be, please refer to the illustration again: The conductive frame plate 3 consists of several wires

第8頁 M247592 四、創作說明(5) 3 8與各導電體3 5連接而形成導電迴路,各導電體3 5 係置放於導電載台3 3之上’而各導電載台3 3係设於各 導電架板31上方,於各導電架板31下方係設有夾具3 2 ,可將待鍍物體6夾固其下,至此,使得各導電板3 4 、導電體35 、導電載台33 、導電架板31 、夾具32 以及待鍍物體6形成一導電系統迴路,再配合將待鍍物體 6置入電鍍槽 < 如圖四所示 >中,通電完成將待鍍物體6 電鍍之作業。 藉由上述設計,可使本創作之電鍍設備導電系統3具有 下列優點: 1 ·減少污染: 由於導電系統3移動時,各導電載台3 3與各導 電體3 5雖會接觸摩擦,但其為非整體載重之摩擦, 其產生金屬碎屑輕微,且碎屑大部分會由導電載台3 3承接,而不致掉落至電鍍槽5中,減少污染。 2 ·使用壽命長: 導電系統3之外側設有遮件4 ,使之藉由遮件4 與外在極酸之環境隔離,較不易產生銅綠而降低導電 率,增加使用壽命。 3·適用各種尺寸之待鍍物體: 藉由若干導電架板3 1配合夾具3 2的整排設計 ,使得不論待鍍物體6尺寸大小,均可利用增減夾具 3 2來調整夾取範圍,不致發生因無夾具3 2可夾而 使導電效果差,故適用各種尺寸之待鍍物體6。Page 8 M247592 IV. Creative Instructions (5) 3 8 is connected to each conductive body 3 5 to form a conductive circuit. Each conductive body 3 5 is placed on the conductive stage 3 3 ′ and each conductive stage 3 3 series. It is provided above each conductive frame plate 31, and a jig 3 2 is arranged below each conductive frame plate 31, and the object 6 to be plated can be clamped thereunder, so that each conductive plate 3 4, the conductive body 35, and the conductive stage 33. The conductive rack plate 31, the fixture 32 and the object 6 to be plated form a conductive system circuit. Then, the object 6 to be plated is placed in a plating tank < as shown in Figure 4 > Homework. With the above design, the conductive system 3 of the electroplating equipment of the present invention can have the following advantages: 1. Reduce pollution: As the conductive system 3 moves, each conductive stage 3 3 and each conductive body 3 5 will contact and friction, but its It is non-integrative load friction, which produces slight metal debris, and most of the debris will be carried by the conductive stage 3 3 without falling into the electroplating tank 5 to reduce pollution. 2 · Long service life: A shield 4 is provided on the outer side of the conductive system 3, so that it is isolated from the external extremely acidic environment by the shield 4, which is less likely to produce patina, which reduces the conductivity and increases the service life. 3 · Applicable to various sizes of objects to be plated: With a number of conductive rack plates 3 1 combined with the entire row of fixtures 3 2 design, regardless of the size of the objects to be plated 6, the clamping range can be adjusted by increasing or decreasing the fixtures 3 2. It does not occur that the conductive effect is poor due to the lack of clamps 3 2, so it is suitable for objects 6 to be plated in various sizes.

M247592 創作說明(6) 4 ·可將待鑛·物體均勻電鑛· ' 由於各導電架板3 1間皆以導線3 6互相串接, 使各導電架板3 1之導電量一致,故可將待鍍物體6 均勻電鍍。 综前所述’由本創作一種電鑛設備導電糸統構造之設 計確實可行,且改善了習用技術之各種缺失,實為創新並 符合產業需求之高度創作,而且具有新穎性以及進步性, 完全符合新型專利之法定要件,爰依法提出新型專利申請 〇 以上所述僅為本創作之較佳實施例而已,並非用以限 定本創作之申請專利範圍;凡其他未脫離本創作所揭示之 精神下所完成之等效改變或修飾,均應包含在下述之申請 專利範圍内。M247592 Creative Instructions (6) 4 · The mine to be mined can be evenly electric-mined. · Since each of the conductive frame plates 31 is connected in series with wires 36, the conductive amounts of the conductive frame plates 31 are the same, so The object to be plated 6 is evenly plated. In summary, the design of the conductive system structure of an electrical and mining equipment created by the author is indeed feasible, and it improves the various shortcomings of conventional technology. It is a highly creative creation that meets the needs of the industry, and is novel and progressive. The statutory requirements of a new type of patent are based on the application for a new type of patent. The above is only a preferred embodiment of this creation, and is not intended to limit the scope of the patent application for this creation; all others do not depart from the spirit disclosed in this creation. Equivalent changes or modifications completed shall be included in the scope of patent application described below.

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M247592 圖式簡單說明 第一圖係為習知電鍍設備之側面剖視圖。 第二圖係為習知電鍍設備之前視圖。 第三圖係為本創作之部分元件外觀示意圖。 第四圖係為本創作之本創作之侧面剖視圖。 第五圖係為本創作之部分元件俯視圖。 第六圖係為本創作之外觀示意圖。 第七圖係為本創作之局部放大俯視圖。 說明】 • ••電鍍設備 .....掛勾 .....&具 • · · ·電鍍槽 .....才虽板 • · •導電糸統 .....A具 • · ••導電板 .....導線 .....#線 .....4執 • · •待鍍物體 IX 0A- ^4 IX 00 1± 0〇 VI · · · 111223333457 ••掛架 ••掛片 •電路板 •電鍍液 • •極板 導電架板 導電載台 •導電體 • ·滚輪 ••遮件 •電鍍槽 •電源線M247592 Brief Description of Drawings The first drawing is a side sectional view of a conventional plating equipment. The second figure is a front view of the conventional plating equipment. The third picture is a schematic diagram of the appearance of some components of this creation. The fourth picture is a side sectional view of the original creation of this creation. The fifth picture is a top view of some elements of this creation. The sixth picture is the appearance of this creation. The seventh picture is a partially enlarged top view of the creation. Description] • •• Electroplating equipment ..... Hook ..... & · •• Conductive plate ..... Wire ..... # 线 ..... 4 Hold • • • Object to be plated IX 0A- ^ 4 IX 00 1 ± 0〇VI · · · 111223333457 • Hang Shelf •• Hanging piece • Circuit board • Plating solution • • Electroplate conductive shelf plateConductive stage • Conductor • • Roller • • Shield • Plating tank • Power cord

第11頁Page 11

Claims (1)

M247592 五、申請專利範圍 1 · 一種電鍍設備導電系統構造,至少包含: ' 若干導電架板; 若干夾具,係設於導電架板之下端,可將待鍍物體夾 固其下; 若干導電載台,係設於導電架板之上端; 一導電板,其下方設有若干導電體,可置放於導電載 台之上。 2 ·如申請專利範圍第1項所述之電鍍設備導電系統構造 ,其中,該導電系統之外側係設有遮件。 3 ·如申請專利範圍第2項所述之電鍍設備導電系統構造 ,其中,該遮件之内部設有導執。 4 ·如申請專利範圍第1項所述之電鐘設備導電糸統構造 ,其中,該導電架板之側面係設有滚輪。 5 ·如申請專利範圍第1項所述之電鍍設備導電系統構造 ,其中,該導電板可為一銅排。 6 ·如申請專利範圍第1項所述之電鍍設備導電系統構造 ,其中,該導電體可為一銅塊或電刷。 7 ·如申請專利範圍弟1項所述之電鍛設備導電糸統構造M247592 5. Scope of patent application1. A conductive system structure of electroplating equipment, including at least: 'Several conductive rack boards; several clamps, which are set at the lower end of the conductive rack board, can clamp the object to be plated thereunder; several conductive carriers It is arranged on the upper end of the conductive frame plate; a conductive plate is provided with a plurality of conductive bodies below it and can be placed on the conductive carrier. 2 · The conductive system structure of electroplating equipment according to item 1 of the scope of patent application, wherein a shield is provided on the outer side of the conductive system. 3 · The conductive system structure of electroplating equipment as described in item 2 of the scope of patent application, wherein a guide is provided inside the shield. 4 · The conductive system structure of the electric clock device as described in item 1 of the scope of patent application, wherein the side of the conductive frame plate is provided with rollers. 5 · The conductive system structure of electroplating equipment as described in item 1 of the scope of patent application, wherein the conductive plate may be a copper bar. 6 · The conductive system structure of electroplating equipment as described in the first item of the patent application scope, wherein the conductor may be a copper block or a brush. 7 · Conductive system structure of electric forging equipment as described in item 1 of the scope of patent application 第12頁 M247592 五、申請專利範圍 ,其中,該導電載台可為一銅盒。 8 ·如申請專利範圍第1項所述之電鍍設備導電系統構造 ,其中,該待鍍物體可為一電路板。 9 ·如申請專利範圍第1項所述之電鍍設備導電系統構造 ,其中,該各導電架板係以導線互相串接。 1 0 ·如申請專利範圍第1項所述之電鍍設備導電系統構Page 12 M247592 5. Scope of patent application, where the conductive stage can be a copper box. 8 · The conductive system structure of electroplating equipment as described in item 1 of the scope of patent application, wherein the object to be plated may be a circuit board. 9 · The structure of the conductive system of the electroplating equipment as described in item 1 of the scope of the patent application, wherein the conductive frames are connected in series with each other by wires. 1 0 · Conductive system structure of electroplating equipment as described in item 1 of the scope of patent application 造,其中,該導電板係藉由若干導線與各導電體連 接而形成導電迴路。Wherein, the conductive plate is connected to each conductive body through a plurality of wires to form a conductive circuit. 第13頁Page 13
TW92222849U 2003-12-29 2003-12-29 Structure of electric conductive system for electroplating facility TWM247592U (en)

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