TWI882036B - 攝像元件及攝像裝置 - Google Patents
攝像元件及攝像裝置 Download PDFInfo
- Publication number
- TWI882036B TWI882036B TW109139673A TW109139673A TWI882036B TW I882036 B TWI882036 B TW I882036B TW 109139673 A TW109139673 A TW 109139673A TW 109139673 A TW109139673 A TW 109139673A TW I882036 B TWI882036 B TW I882036B
- Authority
- TW
- Taiwan
- Prior art keywords
- shielding wall
- light
- incident light
- light shielding
- semiconductor substrate
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
- H10F39/8063—Microlenses
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/024—Manufacture or treatment of image sensors covered by group H10F39/12 of coatings or optical elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/803—Pixels having integrated switching, control, storage or amplification elements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
- H10F39/8053—Colour filters
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/806—Optical elements or arrangements associated with the image sensors
- H10F39/8067—Reflectors
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-210864 | 2019-11-21 | ||
| JP2019210864 | 2019-11-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202133457A TW202133457A (zh) | 2021-09-01 |
| TWI882036B true TWI882036B (zh) | 2025-05-01 |
Family
ID=75981598
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109139673A TWI882036B (zh) | 2019-11-21 | 2020-11-13 | 攝像元件及攝像裝置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20220406832A1 (https=) |
| JP (1) | JP7636339B2 (https=) |
| CN (1) | CN114556573B (https=) |
| TW (1) | TWI882036B (https=) |
| WO (1) | WO2021100298A1 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102598243B1 (ko) * | 2021-02-25 | 2023-11-03 | 동우 화인켐 주식회사 | 화상표시장치용 격벽, 이를 제조하는 방법 및 상기 격벽을 포함하는 화상표시장치 |
| CN115881738A (zh) * | 2021-09-26 | 2023-03-31 | 群创光电股份有限公司 | 光学感测装置 |
| US20240413179A1 (en) * | 2021-10-20 | 2024-12-12 | Sony Semiconductor Solutions Corporation | Imaging device |
| TW202333488A (zh) * | 2022-02-03 | 2023-08-16 | 日商索尼半導體解決方案公司 | 固態攝像元件及電子機器 |
| JP7425428B2 (ja) * | 2022-07-05 | 2024-01-31 | 国立大学法人 熊本大学 | 光学測定器用サンプルホルダおよび光学測定器 |
| WO2024187453A1 (en) * | 2023-03-16 | 2024-09-19 | Guangdong Oppo Mobile Telecommunications Corp., Ltd. | Imaging lens assembly, camera module, and imaging device |
| CN118214952B (zh) * | 2024-05-20 | 2024-08-02 | 浙江大华技术股份有限公司 | 图像采集方法、设备、电子设备和计算机可读存储介质 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11195655A (ja) * | 1998-01-06 | 1999-07-21 | Fuji Electric Co Ltd | 炭化けい素縦形fetの製造方法および炭化けい素縦形fet |
| JP2005294647A (ja) * | 2004-04-01 | 2005-10-20 | Matsushita Electric Ind Co Ltd | 固体撮像装置およびその製造方法 |
| JP2011119445A (ja) * | 2009-12-03 | 2011-06-16 | Toshiba Corp | 裏面照射型固体撮像装置 |
| JP2015065270A (ja) * | 2013-09-25 | 2015-04-09 | ソニー株式会社 | 固体撮像装置およびその製造方法、並びに電子機器 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009021415A (ja) * | 2007-07-12 | 2009-01-29 | Panasonic Corp | 固体撮像装置およびその製造方法 |
| JP2010239076A (ja) * | 2009-03-31 | 2010-10-21 | Sony Corp | 固体撮像装置とその製造方法、及び電子機器 |
| KR20120120669A (ko) * | 2011-04-25 | 2012-11-02 | 에스케이하이닉스 주식회사 | Cmos 이미지 센서 |
| TWI577001B (zh) * | 2011-10-04 | 2017-04-01 | 新力股份有限公司 | 固體攝像裝置、固體攝像裝置之製造方法及電子機器 |
| JP2014049575A (ja) * | 2012-08-30 | 2014-03-17 | Sony Corp | 撮像素子、撮像装置、製造装置および方法 |
| JP2015060855A (ja) * | 2013-09-17 | 2015-03-30 | ソニー株式会社 | 固体撮像装置およびその製造方法、並びに電子機器 |
| CN106068563B (zh) * | 2015-01-13 | 2022-01-14 | 索尼半导体解决方案公司 | 固态成像装置、固态成像装置的制造方法和电子设备 |
| US10818718B2 (en) * | 2016-07-20 | 2020-10-27 | Sony Corporation | Light receiving element, method of manufacturing light receiving element, imaging device, and electronic apparatus |
| WO2019215986A1 (ja) * | 2018-05-08 | 2019-11-14 | ソニーセミコンダクタソリューションズ株式会社 | 撮像素子および撮像素子の製造方法 |
-
2020
- 2020-09-15 WO PCT/JP2020/034929 patent/WO2021100298A1/ja not_active Ceased
- 2020-09-15 US US17/755,989 patent/US20220406832A1/en active Pending
- 2020-09-15 CN CN202080071501.2A patent/CN114556573B/zh active Active
- 2020-09-15 JP JP2021558186A patent/JP7636339B2/ja active Active
- 2020-11-13 TW TW109139673A patent/TWI882036B/zh active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11195655A (ja) * | 1998-01-06 | 1999-07-21 | Fuji Electric Co Ltd | 炭化けい素縦形fetの製造方法および炭化けい素縦形fet |
| JP2005294647A (ja) * | 2004-04-01 | 2005-10-20 | Matsushita Electric Ind Co Ltd | 固体撮像装置およびその製造方法 |
| JP2011119445A (ja) * | 2009-12-03 | 2011-06-16 | Toshiba Corp | 裏面照射型固体撮像装置 |
| JP2015065270A (ja) * | 2013-09-25 | 2015-04-09 | ソニー株式会社 | 固体撮像装置およびその製造方法、並びに電子機器 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202133457A (zh) | 2021-09-01 |
| WO2021100298A1 (ja) | 2021-05-27 |
| US20220406832A1 (en) | 2022-12-22 |
| CN114556573B (zh) | 2025-07-15 |
| CN114556573A (zh) | 2022-05-27 |
| JP7636339B2 (ja) | 2025-02-26 |
| JPWO2021100298A1 (https=) | 2021-05-27 |
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