TWI846846B - Dry films, hardened materials and electronic parts - Google Patents
Dry films, hardened materials and electronic parts Download PDFInfo
- Publication number
- TWI846846B TWI846846B TW109109916A TW109109916A TWI846846B TW I846846 B TWI846846 B TW I846846B TW 109109916 A TW109109916 A TW 109109916A TW 109109916 A TW109109916 A TW 109109916A TW I846846 B TWI846846 B TW I846846B
- Authority
- TW
- Taiwan
- Prior art keywords
- curable resin
- dry film
- inorganic filler
- light
- manufactured
- Prior art date
Links
- 239000000463 material Substances 0.000 title claims description 11
- 229920005989 resin Polymers 0.000 claims abstract description 93
- 239000011347 resin Substances 0.000 claims abstract description 93
- 239000003086 colorant Substances 0.000 claims abstract description 78
- 239000011256 inorganic filler Substances 0.000 claims abstract description 61
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 61
- 239000002245 particle Substances 0.000 claims abstract description 50
- 239000011342 resin composition Substances 0.000 claims abstract description 50
- 239000002952 polymeric resin Substances 0.000 claims abstract description 28
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 28
- 230000009477 glass transition Effects 0.000 claims abstract description 23
- 239000007787 solid Substances 0.000 claims description 36
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 claims description 9
- 229920006243 acrylic copolymer Polymers 0.000 claims description 5
- 238000005520 cutting process Methods 0.000 abstract description 16
- 230000007547 defect Effects 0.000 abstract description 12
- 239000010408 film Substances 0.000 description 95
- 239000003822 epoxy resin Substances 0.000 description 61
- 229920000647 polyepoxide Polymers 0.000 description 61
- 239000010410 layer Substances 0.000 description 60
- -1 acryl skeleton Chemical group 0.000 description 31
- 150000001875 compounds Chemical class 0.000 description 28
- 239000003973 paint Substances 0.000 description 24
- 239000000126 substance Substances 0.000 description 23
- 229920003986 novolac Polymers 0.000 description 22
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 21
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 19
- 239000002904 solvent Substances 0.000 description 19
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 18
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 17
- 239000006229 carbon black Substances 0.000 description 17
- 235000019241 carbon black Nutrition 0.000 description 17
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate group Chemical group [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 17
- 239000000203 mixture Substances 0.000 description 17
- 239000000047 product Substances 0.000 description 17
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 15
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 15
- 230000001681 protective effect Effects 0.000 description 15
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- FVCSARBUZVPSQF-UHFFFAOYSA-N 5-(2,4-dioxooxolan-3-yl)-7-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C(C(OC2=O)=O)C2C(C)=CC1C1C(=O)COC1=O FVCSARBUZVPSQF-UHFFFAOYSA-N 0.000 description 13
- 238000001723 curing Methods 0.000 description 12
- 239000000049 pigment Substances 0.000 description 11
- 239000006185 dispersion Substances 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 235000010290 biphenyl Nutrition 0.000 description 9
- 239000004305 biphenyl Substances 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 125000005439 maleimidyl group Chemical group C1(C=CC(N1*)=O)=O 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 238000002834 transmittance Methods 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical group [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 8
- 239000007822 coupling agent Substances 0.000 description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 238000004381 surface treatment Methods 0.000 description 8
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 7
- 150000004056 anthraquinones Chemical class 0.000 description 7
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 7
- 229920001971 elastomer Polymers 0.000 description 7
- 125000003700 epoxy group Chemical group 0.000 description 7
- 125000004185 ester group Chemical group 0.000 description 7
- 239000004848 polyfunctional curative Substances 0.000 description 7
- 239000005060 rubber Substances 0.000 description 7
- 238000004062 sedimentation Methods 0.000 description 7
- 238000011282 treatment Methods 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000005022 packaging material Substances 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 229920005992 thermoplastic resin Polymers 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- 239000003643 water by type Substances 0.000 description 6
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 5
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 239000003208 petroleum Substances 0.000 description 5
- 239000005011 phenolic resin Substances 0.000 description 5
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 5
- 229920002857 polybutadiene Polymers 0.000 description 5
- 235000013824 polyphenols Nutrition 0.000 description 5
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 4
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 4
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- 239000011324 bead Substances 0.000 description 4
- 229920006378 biaxially oriented polypropylene Polymers 0.000 description 4
- 239000011127 biaxially oriented polypropylene Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000013557 residual solvent Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N butadiene group Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 238000004040 coloring Methods 0.000 description 3
- 230000000295 complement effect Effects 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000002148 esters Chemical group 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000012948 isocyanate Substances 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine powder Natural products NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical class C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 239000005026 oriented polypropylene Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000001629 suppression Effects 0.000 description 3
- 239000012756 surface treatment agent Substances 0.000 description 3
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 2
- IPJGAEWUPXWFPL-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC(N2C(C=CC2=O)=O)=C1 IPJGAEWUPXWFPL-UHFFFAOYSA-N 0.000 description 2
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- CQOZJDNCADWEKH-UHFFFAOYSA-N 2-[3,3-bis(2-hydroxyphenyl)propyl]phenol Chemical compound OC1=CC=CC=C1CCC(C=1C(=CC=CC=1)O)C1=CC=CC=C1O CQOZJDNCADWEKH-UHFFFAOYSA-N 0.000 description 2
- XOSCKTQMAZSFBZ-UHFFFAOYSA-N 2-[[1-[[2,7-bis(oxiran-2-ylmethoxy)naphthalen-1-yl]methyl]-7-(oxiran-2-ylmethoxy)naphthalen-2-yl]oxymethyl]oxirane Chemical compound C1OC1COC(C=C1C=2CC=3C4=CC(OCC5OC5)=CC=C4C=CC=3OCC3OC3)=CC=C1C=CC=2OCC1CO1 XOSCKTQMAZSFBZ-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 2
- 239000004962 Polyamide-imide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000004220 aggregation Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 125000003368 amide group Chemical group 0.000 description 2
- 150000001408 amides Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- MYONAGGJKCJOBT-UHFFFAOYSA-N benzimidazol-2-one Chemical compound C1=CC=CC2=NC(=O)N=C21 MYONAGGJKCJOBT-UHFFFAOYSA-N 0.000 description 2
- 230000001588 bifunctional effect Effects 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 238000002296 dynamic light scattering Methods 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- NYGZLYXAPMMJTE-UHFFFAOYSA-M metanil yellow Chemical group [Na+].[O-]S(=O)(=O)C1=CC=CC(N=NC=2C=CC(NC=3C=CC=CC=3)=CC=2)=C1 NYGZLYXAPMMJTE-UHFFFAOYSA-M 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- KJFMBFZCATUALV-UHFFFAOYSA-N phenolphthalein Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)C2=CC=CC=C2C(=O)O1 KJFMBFZCATUALV-UHFFFAOYSA-N 0.000 description 2
- 229920006287 phenoxy resin Polymers 0.000 description 2
- 239000013034 phenoxy resin Substances 0.000 description 2
- 150000004714 phosphonium salts Chemical class 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920002312 polyamide-imide Polymers 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920001721 polyimide Chemical group 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- UOHMMEJUHBCKEE-UHFFFAOYSA-N prehnitene Chemical compound CC1=CC=C(C)C(C)=C1C UOHMMEJUHBCKEE-UHFFFAOYSA-N 0.000 description 2
- TVRGPOFMYCMNRB-UHFFFAOYSA-N quinizarine green ss Chemical compound C1=CC(C)=CC=C1NC(C=1C(=O)C2=CC=CC=C2C(=O)C=11)=CC=C1NC1=CC=C(C)C=C1 TVRGPOFMYCMNRB-UHFFFAOYSA-N 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000006228 supernatant Substances 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- DEQUKPCANKRTPZ-UHFFFAOYSA-N (2,3-dihydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1O DEQUKPCANKRTPZ-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 description 1
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- KTEFLEFPDDQMCB-UHFFFAOYSA-N 1,4-bis(4-butylanilino)-5,8-dihydroxyanthracene-9,10-dione Chemical compound C1=CC(CCCC)=CC=C1NC(C=1C(=O)C2=C(O)C=CC(O)=C2C(=O)C=11)=CC=C1NC1=CC=C(CCCC)C=C1 KTEFLEFPDDQMCB-UHFFFAOYSA-N 0.000 description 1
- OZQQAZPMNWJRDQ-UHFFFAOYSA-N 1,4-dihydroxy-5,8-bis(4-methylanilino)anthracene-9,10-dione Chemical compound C1=CC(C)=CC=C1NC(C=1C(=O)C2=C(O)C=CC(O)=C2C(=O)C=11)=CC=C1NC1=CC=C(C)C=C1 OZQQAZPMNWJRDQ-UHFFFAOYSA-N 0.000 description 1
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-dioxonaphthalene Natural products C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 1
- BOKGTLAJQHTOKE-UHFFFAOYSA-N 1,5-dihydroxynaphthalene Chemical compound C1=CC=C2C(O)=CC=CC2=C1O BOKGTLAJQHTOKE-UHFFFAOYSA-N 0.000 description 1
- LAVARTIQQDZFNT-UHFFFAOYSA-N 1-(1-methoxypropan-2-yloxy)propan-2-yl acetate Chemical compound COCC(C)OCC(C)OC(C)=O LAVARTIQQDZFNT-UHFFFAOYSA-N 0.000 description 1
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 1
- ZIKLJUUTSQYGQI-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxypropoxy)propane Chemical compound CCOCC(C)OCC(C)OCC ZIKLJUUTSQYGQI-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical class OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 description 1
- AUABZJZJXPSZCN-UHFFFAOYSA-N 2-(dimethylamino)phenol Chemical compound CN(C)C1=CC=CC=C1O AUABZJZJXPSZCN-UHFFFAOYSA-N 0.000 description 1
- DJOYTAUERRJRAT-UHFFFAOYSA-N 2-(n-methyl-4-nitroanilino)acetonitrile Chemical compound N#CCN(C)C1=CC=C([N+]([O-])=O)C=C1 DJOYTAUERRJRAT-UHFFFAOYSA-N 0.000 description 1
- IMSODMZESSGVBE-UHFFFAOYSA-N 2-Oxazoline Chemical compound C1CN=CO1 IMSODMZESSGVBE-UHFFFAOYSA-N 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- MEVBAGCIOOTPLF-UHFFFAOYSA-N 2-[[5-(oxiran-2-ylmethoxy)naphthalen-2-yl]oxymethyl]oxirane Chemical compound C1OC1COC(C=C1C=CC=2)=CC=C1C=2OCC1CO1 MEVBAGCIOOTPLF-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- YTTFFPATQICAQN-UHFFFAOYSA-N 2-methoxypropan-1-ol Chemical compound COC(C)CO YTTFFPATQICAQN-UHFFFAOYSA-N 0.000 description 1
- UBZVRROHBDDCQY-UHFFFAOYSA-N 20749-68-2 Chemical compound C1=CC(N2C(=O)C3=C(C(=C(Cl)C(Cl)=C3C2=N2)Cl)Cl)=C3C2=CC=CC3=C1 UBZVRROHBDDCQY-UHFFFAOYSA-N 0.000 description 1
- CMLFRMDBDNHMRA-UHFFFAOYSA-N 2h-1,2-benzoxazine Chemical compound C1=CC=C2C=CNOC2=C1 CMLFRMDBDNHMRA-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- MOSSLXZUUKTULI-UHFFFAOYSA-N 3-[3-(2,5-dioxopyrrol-3-yl)-4-methylphenyl]pyrrole-2,5-dione Chemical compound CC1=CC=C(C=2C(NC(=O)C=2)=O)C=C1C1=CC(=O)NC1=O MOSSLXZUUKTULI-UHFFFAOYSA-N 0.000 description 1
- 229940018563 3-aminophenol Drugs 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- FWTBRYBHCBCJEQ-UHFFFAOYSA-N 4-[(4-phenyldiazenylnaphthalen-1-yl)diazenyl]phenol Chemical compound C1=CC(O)=CC=C1N=NC(C1=CC=CC=C11)=CC=C1N=NC1=CC=CC=C1 FWTBRYBHCBCJEQ-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- NAMCDLUESQLMOZ-UHFFFAOYSA-N 6-ethyl-1,3,5-triazine-2,4-diamine Chemical compound CCC1=NC(N)=NC(N)=N1 NAMCDLUESQLMOZ-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N Benzoic acid Natural products OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- UJOOGYRIWTYTCY-UHFFFAOYSA-N Br.OC1=CC=CC=C1C=C Chemical compound Br.OC1=CC=CC=C1C=C UJOOGYRIWTYTCY-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 description 1
- PMPVIKIVABFJJI-UHFFFAOYSA-N Cyclobutane Chemical compound C1CCC1 PMPVIKIVABFJJI-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 241001050985 Disco Species 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- JZSSINHDNJHXOW-UHFFFAOYSA-N NC1(CC(=CC(=C1C)N)C1=NC=NC=N1)C Chemical compound NC1(CC(=CC(=C1C)N)C1=NC=NC=N1)C JZSSINHDNJHXOW-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- JPYHHZQJCSQRJY-UHFFFAOYSA-N Phloroglucinol Natural products CCC=CCC=CCC=CCC=CCCCCC(=O)C1=C(O)C=C(O)C=C1O JPYHHZQJCSQRJY-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Chemical group 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical compound N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- 241000779819 Syncarpia glomulifera Species 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- AHZMUXQJTGRNHT-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)propan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)(C)C1=CC=C(OC#N)C=C1 AHZMUXQJTGRNHT-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- 150000001241 acetals Chemical group 0.000 description 1
- NJYZCEFQAIUHSD-UHFFFAOYSA-N acetoguanamine Chemical compound CC1=NC(N)=NC(N)=N1 NJYZCEFQAIUHSD-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 150000003934 aromatic aldehydes Chemical class 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- WXBLLCUINBKULX-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1.OC(=O)C1=CC=CC=C1 WXBLLCUINBKULX-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- KXHPPCXNWTUNSB-UHFFFAOYSA-M benzyl(trimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)(C)CC1=CC=CC=C1 KXHPPCXNWTUNSB-UHFFFAOYSA-M 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- YLNJGHNUXCVDIX-UHFFFAOYSA-N bis(2-methylpropyl) perylene-3,9-dicarboxylate Chemical compound C=12C3=CC=CC2=C(C(=O)OCC(C)C)C=CC=1C1=CC=CC2=C1C3=CC=C2C(=O)OCC(C)C YLNJGHNUXCVDIX-UHFFFAOYSA-N 0.000 description 1
- ZFVMWEVVKGLCIJ-UHFFFAOYSA-N bisphenol AF Chemical compound C1=CC(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C=C1 ZFVMWEVVKGLCIJ-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 239000000038 blue colorant Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 150000001718 carbodiimides Chemical class 0.000 description 1
- 239000002134 carbon nanofiber Substances 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 125000005587 carbonate group Chemical group 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000006231 channel black Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- FCEOGYWNOSBEPV-FDGPNNRMSA-N cobalt;(z)-4-hydroxypent-3-en-2-one Chemical compound [Co].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O FCEOGYWNOSBEPV-FDGPNNRMSA-N 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- VVOLVFOSOPJKED-UHFFFAOYSA-N copper phthalocyanine Chemical compound [Cu].N=1C2=NC(C3=CC=CC=C33)=NC3=NC(C3=CC=CC=C33)=NC3=NC(C3=CC=CC=C33)=NC3=NC=1C1=CC=CC=C12 VVOLVFOSOPJKED-UHFFFAOYSA-N 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000011258 core-shell material Substances 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 230000002431 foraging effect Effects 0.000 description 1
- 239000006232 furnace black Substances 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000000040 green colorant Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical group 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- FRCAGVUKJQCWBD-UHFFFAOYSA-L iodine green Chemical compound [Cl-].[Cl-].C1=CC(N(C)C)=CC=C1C(\C=1C=CC(=CC=1)[N+](C)(C)C)=C/1C=C(C)C(=[N+](C)C)C=C\1 FRCAGVUKJQCWBD-UHFFFAOYSA-L 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- PXZQEOJJUGGUIB-UHFFFAOYSA-N isoindolin-1-one Chemical compound C1=CC=C2C(=O)NCC2=C1 PXZQEOJJUGGUIB-UHFFFAOYSA-N 0.000 description 1
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 239000006233 lamp black Substances 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 150000002632 lipids Chemical class 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- UQKAOOAFEFCDGT-UHFFFAOYSA-N n,n-dimethyloctan-1-amine Chemical compound CCCCCCCCN(C)C UQKAOOAFEFCDGT-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 description 1
- MNZMMCVIXORAQL-UHFFFAOYSA-N naphthalene-2,6-diol Chemical compound C1=C(O)C=CC2=CC(O)=CC=C21 MNZMMCVIXORAQL-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 239000001061 orange colorant Substances 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 125000003566 oxetanyl group Chemical group 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- KJOLVZJFMDVPGB-UHFFFAOYSA-N perylenediimide Chemical compound C=12C3=CC=C(C(NC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)NC(=O)C4=CC=C3C1=C42 KJOLVZJFMDVPGB-UHFFFAOYSA-N 0.000 description 1
- NAKOELLGRBLZOF-UHFFFAOYSA-N phenoxybenzene;pyrrole-2,5-dione Chemical compound O=C1NC(=O)C=C1.O=C1NC(=O)C=C1.C=1C=CC=CC=1OC1=CC=CC=C1 NAKOELLGRBLZOF-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- DGTNSSLYPYDJGL-UHFFFAOYSA-N phenyl isocyanate Chemical compound O=C=NC1=CC=CC=C1 DGTNSSLYPYDJGL-UHFFFAOYSA-N 0.000 description 1
- LYKRPDCJKSXAHS-UHFFFAOYSA-N phenyl-(2,3,4,5-tetrahydroxyphenyl)methanone Chemical compound OC1=C(O)C(O)=CC(C(=O)C=2C=CC=CC=2)=C1O LYKRPDCJKSXAHS-UHFFFAOYSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- QCDYQQDYXPDABM-UHFFFAOYSA-N phloroglucinol Chemical compound OC1=CC(O)=CC(O)=C1 QCDYQQDYXPDABM-UHFFFAOYSA-N 0.000 description 1
- 229960001553 phloroglucinol Drugs 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000011941 photocatalyst Substances 0.000 description 1
- 239000001739 pinus spp. Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 1
- BAZXQZYWJSBDRG-UHFFFAOYSA-N pyrrole-2,5-dione;toluene Chemical compound CC1=CC=CC=C1.O=C1NC(=O)C=C1.O=C1NC(=O)C=C1 BAZXQZYWJSBDRG-UHFFFAOYSA-N 0.000 description 1
- FYNROBRQIVCIQF-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole-5,6-dione Chemical compound C1=CN=C2C(=O)C(=O)N=C21 FYNROBRQIVCIQF-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000001062 red colorant Substances 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- LJFWQNJLLOFIJK-UHFFFAOYSA-N solvent violet 13 Chemical compound C1=CC(C)=CC=C1NC1=CC=C(O)C2=C1C(=O)C1=CC=CC=C1C2=O LJFWQNJLLOFIJK-UHFFFAOYSA-N 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000006234 thermal black Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- NNENFOSYDBTCBO-UHFFFAOYSA-M tributyl(hexadecyl)phosphanium;chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[P+](CCCC)(CCCC)CCCC NNENFOSYDBTCBO-UHFFFAOYSA-M 0.000 description 1
- QEXITCCVENILJI-UHFFFAOYSA-M tributyl(phenyl)azanium;chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)C1=CC=CC=C1 QEXITCCVENILJI-UHFFFAOYSA-M 0.000 description 1
- GLSQMJPVEVGXMZ-UHFFFAOYSA-N tributyl-(2,5-dihydroxyphenyl)phosphanium;bromide Chemical compound [Br-].CCCC[P+](CCCC)(CCCC)C1=CC(O)=CC=C1O GLSQMJPVEVGXMZ-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 229940036248 turpentine Drugs 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000001060 yellow colorant Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
乾薄膜(11)係具備由包含玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上的高分子樹脂、著色劑及無機填料之遮光性硬化性樹脂組成物所構成的硬化性樹脂層(12)。硬化性樹脂層(12)的厚度設為X(μm)時,無機填料之凝集粒子的最大粒徑為X/2(μm)以下。乾薄膜(11)係遮光性優異,翹曲被抑制,此外,可抑制切割時之毛邊或缺損。The dry film (11) has a hardening resin layer (12) composed of a light-shielding hardening resin composition including a polymer resin having a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more, a coloring agent, and an inorganic filler. When the thickness of the hardening resin layer (12) is set to X (μm), the maximum particle size of the aggregated particles of the inorganic filler is less than X/2 (μm). The dry film (11) has excellent light-shielding properties, and warping is suppressed. In addition, burrs or defects during cutting can be suppressed.
Description
本發明係有關乾薄膜、硬化物及電子零件。The present invention relates to a dry film, a hardened material and an electronic component.
以往,設置於電子機器等所使用之印刷配線板的阻焊劑或層間絕緣層等之保護膜或絕緣層之形成手段之一為利用乾薄膜(積層薄膜)(例如,專利文獻1)。乾薄膜具有將具有所期望特性之樹脂組成物塗佈於承載膜上後,經乾燥步驟所得的樹脂層,一般而言,於再積層為了保護與承載膜相反側面之保護薄膜的狀態,於市場上流通。將乾薄膜之樹脂層黏貼(以下也稱為「積層」)於基板後,藉由施予圖型化或硬化處理,可製造具有如上述保護膜或絕緣層的印刷配線板等。 先前技術文獻 專利文獻In the past, one of the means of forming a protective film or insulating layer such as a solder resist or an interlayer insulating layer provided on a printed wiring board used in electronic equipment, etc., was to use a dry film (laminated film) (for example, Patent Document 1). A dry film has a resin layer obtained by applying a resin composition having desired properties on a carrier film and then drying it. Generally, it is circulated in the market in a state where a protective film is laminated to protect the side opposite to the carrier film. After the resin layer of the dry film is pasted (hereinafter also referred to as "laminated") on a substrate, a printed wiring board having the above-mentioned protective film or insulating layer can be manufactured by applying a patterning or curing treatment. Prior art literature Patent literature
專利文獻1:日本特開2015-010179號公報Patent document 1: Japanese Patent Application Publication No. 2015-010179
發明所欲解決之課題Invent the problem you want to solve
乾薄膜也用於半導體晶片之封裝材料。使積層於半導體晶圓上之乾薄膜硬化,形成封裝材料後,使用例如刀片類型(blade type)之切斷機切割,切成個別的半導體晶片。此切割時,在封裝材料之切斷端部產生毛邊(burr),或封裝材料產生缺損的情形。又,半導體晶片封裝後,晶片上之封裝材料的膜厚變薄,但是即使這種的情形,也要求遮斷外部的光,保護半導體晶片用的遮光性。 又,光學感應器模組中之隔牆或使用微LED之顯示器中之RGB之各發光元件周圍所配置的材料,要求遮光性高的樹脂,但是目前為止之樹脂,遮光性不一定足夠。又,乾薄膜在黑色阻焊劑等之其他的用途中,有時也要求光之透過率低。 此外,乾薄膜為了使樹脂層與基板充分地密著,而要求在基板上使硬化時之翹曲少。Dry film is also used as a packaging material for semiconductor chips. After the dry film laminated on the semiconductor wafer is hardened to form a packaging material, it is cut into individual semiconductor chips using a blade-type cutter. During this cutting, burrs are generated at the cut ends of the packaging material, or defects are generated in the packaging material. In addition, after the semiconductor chip is packaged, the film thickness of the packaging material on the chip becomes thinner, but even in this case, it is required to block external light and protect the semiconductor chip. In addition, the partition wall in the optical sensor module or the material configured around each RGB light-emitting element in the display using micro LED requires a resin with high light-shielding properties, but the current resins may not have sufficient light-shielding properties. In addition, dry film is sometimes required to have low light transmittance in other applications such as black solder resist. In addition, dry film is required to have less warping on the substrate during curing in order to ensure that the resin layer and the substrate are sufficiently adhered.
因此,本發明之目的係提供遮光性優異,翹曲被抑制,及可抑制切割時之毛邊或缺損的乾薄膜、硬化物及電子零件。 用以解決課題之手段Therefore, the purpose of the present invention is to provide a dry film, hardened material, and electronic component that has excellent light-shielding properties, suppresses warping, and suppresses burrs or defects during cutting. Means for solving the problem
本發明人等為了解決上述課題,精心研究的結果,發現具備由包含玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上的高分子樹脂、著色劑及無機填料之遮光性硬化性樹脂組成物所構成的硬化性樹脂層的乾薄膜,藉由無機填料之凝集粒子的最大粒徑為硬化性樹脂層的厚度之一半,分散性優異,充分的遮光性,翹曲被抑制,可抑制切割時之毛邊或缺損。The inventors of the present invention have conducted intensive research to solve the above-mentioned problems and have found that a dry film having a curable resin layer composed of a light-shielding curable resin composition including a polymer resin having a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more, a coloring agent, and an inorganic filler has excellent dispersibility and sufficient light-shielding properties, and warping is suppressed, thereby suppressing burrs or defects during cutting.
亦即,本發明之乾薄膜,其特徵係具備由包含玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上的高分子樹脂、著色劑及無機填料之遮光性硬化性樹脂組成物所構成的硬化性樹脂層,前述硬化性樹脂層的厚度設為X(μm)時,前述無機填料之凝集粒子的最大粒徑為X/2(μm)以下。 本發明中,遮光性係指硬化性樹脂層之膜厚40μm中,光波長380-780nm之全波長範圍下,透過率未達0.5%。That is, the dry film of the present invention is characterized by having a curable resin layer composed of a light-shielding curable resin composition including a polymer resin with a glass transition temperature of less than 20°C and a weight average molecular weight of more than 10,000, a colorant, and an inorganic filler, and when the thickness of the curable resin layer is set to X (μm), the maximum particle size of the agglomerated particles of the inorganic filler is less than X/2 (μm). In the present invention, light-shielding property means that the transmittance of the curable resin layer in the full wavelength range of 380-780nm in the film thickness of 40μm is less than 0.5%.
本發明之乾薄膜,其無機填料之凝集粒子的最大粒徑,較佳為10μm以下,相對於前述遮光性硬化性樹脂組成物之固體成分,無機填料之調配量較佳為0.1~70質量%,相對於前述遮光性硬化性樹脂組成物之固體成分,著色劑之調配量較佳為0.3~20質量%,相對於前述遮光性硬化性樹脂組成物之固體成分,玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上之高分子樹脂之調配量,較佳為1~35質量%,硬化性樹脂層進一步包含液狀環氧樹脂為佳。In the dry film of the present invention, the maximum particle size of the aggregated particles of the inorganic filler is preferably 10 μm or less, the amount of the inorganic filler is preferably 0.1-70% by mass relative to the solid content of the light-shielding curable resin composition, the amount of the colorant is preferably 0.3-20% by mass relative to the solid content of the light-shielding curable resin composition, and the amount of the polymer resin having a glass transition temperature of 20° C. or less and a weight average molecular weight of 10,000 or more is preferably 1-35% by mass relative to the solid content of the light-shielding curable resin composition. The curable resin layer preferably further includes a liquid epoxy resin.
本發明之硬化物,其特徵係將前述乾薄膜的硬化性樹脂層進行硬化而得。The hardened material of the present invention is characterized by being obtained by hardening the hardening resin layer of the dry film.
本發明之電子零件,其特徵係具有前述硬化物。 發明效果The electronic component of the present invention is characterized by having the aforementioned hardened material. Effect of the invention
依據本發明時,可提供遮光性優異,翹曲被抑制,及可抑制切割時之毛邊或缺損的乾薄膜、硬化物及電子零件。According to the present invention, a dry film, a cured product, and an electronic component can be provided which have excellent light-shielding properties, are warped, and can suppress burrs or defects during cutting.
以下更具體說明本發明之乾薄膜、硬化物及電子零件。
圖1係本發明之一實施形態之乾薄膜11之示意的斷面圖。圖1所示之乾薄膜11係承載膜13上形成硬化性樹脂層12,積層有保護薄膜14的三層構造。乾薄膜11必要時,可在保護薄膜與硬化性樹脂層之間,或支撐薄膜與硬化性樹脂層之間,設置其他的樹脂層。The dry film, hardened material and electronic components of the present invention are described in more detail below.
FIG. 1 is a schematic cross-sectional view of a dry film 11 of one embodiment of the present invention. The dry film 11 shown in FIG. 1 is a three-layer structure in which a
<硬化性樹脂層> 本發明之乾薄膜係具備由包含玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上的高分子樹脂、著色劑及無機填料之遮光性硬化性樹脂組成物所構成的硬化性樹脂層,該硬化性樹脂層的厚度設為X(μm)時,無機填料之凝集粒子的最大粒徑為X/2(μm)以下。<Hardening resin layer> The dry film of the present invention has a curable resin layer composed of a light-shielding curable resin composition including a polymer resin having a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more, a coloring agent, and an inorganic filler. When the thickness of the curable resin layer is set to X (μm), the maximum particle size of the aggregated particles of the inorganic filler is less than X/2 (μm).
無機填料係抑制所得之硬化物的硬化收縮,可提高密著性、硬度、結合在絕緣層周圍之銅等的導體層與線膨脹係數(CTE)所得之龜裂耐性等諸特性。當然無機填料在調製遮光性硬化性樹脂組成物,形成油墨時,會凝聚。藉由本發明人等之研究,得知凝聚之無機填料的凝集粒子大時,容易產生切割時之毛邊或缺損。又,硬化物的遮光性(低透過率)係藉由在硬化性樹脂組成物中包含碳黑等的著色劑而提昇。由於本發明人等之研究,得知凝聚之無機填料的凝集粒子大時,在硬化物中,無機填料容易使光散射,不利於遮光性。因此,當硬化性樹脂層之厚度設為X(μm)時,無機填料之凝集粒子的最大粒徑為X/2(μm)以下,可抑制切割時之毛邊或缺損,又,在半導體晶片上之薄膜中,也可提高遮光性。Inorganic fillers inhibit the curing shrinkage of the resulting cured product, and can improve the adhesion, hardness, and crack resistance of the conductive layer such as copper bonded around the insulating layer and the coefficient of linear expansion (CTE). Of course, inorganic fillers will aggregate when the light-shielding curable resin composition is prepared to form ink. Through the research of the present inventors, it is known that when the aggregated particles of the agglomerated inorganic filler are large, burrs or defects are easily generated during cutting. In addition, the light-shielding property (low transmittance) of the cured product is improved by including a coloring agent such as carbon black in the curable resin composition. Through the research of the present inventors, it is known that when the aggregated particles of the agglomerated inorganic filler are large, the inorganic filler is likely to scatter light in the cured product, which is not conducive to light-shielding properties. Therefore, when the thickness of the curable resin layer is set to X (μm), the maximum particle size of the aggregated particles of the inorganic filler is less than X/2 (μm), which can suppress burrs or defects during cutting and improve light shielding properties in the thin film on the semiconductor chip.
又,硬化性樹脂層,藉由包含玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上的高分子樹脂,而抑制著色劑及無機填料之凝聚,提高著色劑及無機填料之分散性,可抑制沉降,特別是可同時提高遮光性與硬化性樹脂組成物之長期安定性。此外,可抑制硬化物之翹曲。 乾薄膜之硬化性樹脂層,一般稱為B階段狀態的狀態,由遮光性硬化性樹脂組成物所得者。以下說明各成分。In addition, the curable resin layer, by including a polymer resin having a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more, suppresses the aggregation of the colorant and the inorganic filler, improves the dispersibility of the colorant and the inorganic filler, and suppresses sedimentation, and in particular, can simultaneously improve the light-shielding property and the long-term stability of the curable resin composition. In addition, the warping of the cured product can be suppressed. The curable resin layer of the dry film is generally referred to as the state of the B stage state, which is obtained from the light-shielding curable resin composition. The following describes each component.
[玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上之高分子樹脂] 玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上之高分子樹脂的玻璃轉移溫度,較佳為-40~20℃,更佳為-15~15℃,特佳為-5~15℃。-5~15℃時,可良好地抑制硬化物之翹曲。 又,由於高分子樹脂之重量平均分子量越高,著色劑及無機填料之沉降防止效果越大,故較佳為10萬以上,更佳為20萬以上。上限值例如為100萬以下,較佳為50萬以下。[Polymer resin with a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more] The glass transition temperature of a polymer resin with a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more is preferably -40~20°C, more preferably -15~15°C, and particularly preferably -5~15°C. At -5~15°C, the warping of the cured product can be well suppressed. In addition, since the higher the weight average molecular weight of the polymer resin, the greater the effect of preventing the sedimentation of the colorant and inorganic filler, it is preferably 100,000 or more, and more preferably 200,000 or more. The upper limit is, for example, 1 million or less, and preferably 500,000 or less.
作為高分子樹脂,可列舉具有選自丁二烯骨架、醯胺骨架、醯亞胺骨架、縮醛骨架、碳酸酯骨架、酯骨架、胺基甲酸酯骨架、丙烯醯基骨架及矽氧烷骨架之1種以上之骨架的高分子樹脂等。例如,具有丁二烯骨架之高分子樹脂(日本曹達公司製「G-1000」、「G-3000」、「GI-1000」、「GI-3000」、出光興產公司製「R-45EPI」、DAICEL公司製「PB3600」、「Epofriend AT501」、cray valley公司製「Ricon130」、「Ricon142」、「Ricon150」、「Ricon657」、「Ricon130MA」),具有丁二烯骨架與聚醯亞胺骨架的高分子樹脂(日本特開2006-37083號公報記載者),具有丙烯醯基骨架的高分子樹脂(nagase chemtex公司製「SG-P3」、「SG-600LB」、「SG-280」、「SG-790」、「SG-K2」、根上工業公司製「SN-50」、「AS-3000E」、「ME-2000」)等。Examples of the polymer resin include polymer resins having one or more skeletons selected from a butadiene skeleton, an amide skeleton, an imide skeleton, an acetal skeleton, a carbonate skeleton, an ester skeleton, a urethane skeleton, an acryl skeleton, and a siloxane skeleton. For example, polymer resins having a butadiene skeleton ("G-1000", "G-3000", "GI-1000", "GI-3000" manufactured by Nippon Soda Co., Ltd., "R-45EPI" manufactured by Idemitsu Kosan Co., Ltd., "PB3600", "Epofriend AT501" manufactured by Daicel Co., Ltd., "Ricon130", "Ricon142", "Ricon150", "Ricon657", "Ricon130MA" manufactured by Cray Valley Co., Ltd.), polymer resins having a butadiene skeleton and a polyimide skeleton (described in Japanese Patent Publication No. 2006-37083), polymer resins having an acryl skeleton (nagase "SG-P3", "SG-600LB", "SG-280", "SG-790", "SG-K2" manufactured by Chemtex, "SN-50", "AS-3000E", "ME-2000" manufactured by Negami Industries, etc.
高分子樹脂,就硬化物之平坦性的觀點,較佳為玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上的丙烯酸共聚物。又,就抑制著色劑及無機填料之分散性與組成物之沉降的觀點,較佳為玻璃轉移溫度為20℃以下,且重量平均分子量為10萬~100萬的丙烯酸共聚物,更佳為玻璃轉移溫度為-5~15℃,且重量平均分子量為20萬~50萬的丙烯酸共聚物。The polymer resin is preferably an acrylic copolymer having a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more from the viewpoint of flatness of the cured product. Furthermore, from the viewpoint of suppressing the dispersibility of the colorant and the inorganic filler and the sedimentation of the composition, an acrylic copolymer having a glass transition temperature of 20°C or less and a weight average molecular weight of 100,000 to 1,000,000 is preferred, and an acrylic copolymer having a glass transition temperature of -5 to 15°C and a weight average molecular weight of 200,000 to 500,000 is more preferred.
丙烯酸酯共聚物也可具有官能基,作為官能基可列舉例如羧基、羥基、環氧基、醯胺基等。The acrylic acid ester copolymer may have a functional group, and examples of the functional group include a carboxyl group, a hydroxyl group, an epoxy group, and an amide group.
丙烯酸酯共聚物,較佳為具有環氧基,更佳為具有環氧基及醯胺基。具有環氧基,可抑制硬化物之翹曲。The acrylic ester copolymer preferably has an epoxy group, and more preferably has an epoxy group and an amide group. The epoxy group can suppress the warping of the cured product.
丙烯酸酯共聚物,可列舉nagase chemtex公司製之teisanresin SG-70L、SG-708-6、WS-023 EK30、SG-P3、SG-80H、SG-280 EK23、SG-600TEA、SG-790。丙烯酸酯共聚物也可合成得到,合成方法可列舉例如,日本特開2016-102200號公報記載之合成方法。Examples of the acrylic ester copolymer include Teisanresin SG-70L, SG-708-6, WS-023 EK30, SG-P3, SG-80H, SG-280 EK23, SG-600TEA, and SG-790 manufactured by Nagase Chemtex. The acrylic ester copolymer can also be synthesized, and the synthesis method can be, for example, the synthesis method described in Japanese Patent Application Publication No. 2016-102200.
高分子樹脂,可1種單獨使用或組合2種類以上使用。高分子樹脂之調配量係以組成物之固體成分全量基準,較佳為1~35質量%,更佳為1~30質量%。在上述範圍內時,可提高無機填料等之分散性或組成物之長期安定性。特別是高分子樹脂之調配量為5質量%以上時,可得到透過率低,抑制基板之翹曲的硬化膜。The polymer resin may be used alone or in combination of two or more. The amount of the polymer resin is preferably 1 to 35% by weight, more preferably 1 to 30% by weight, based on the total amount of the solid components of the composition. Within the above range, the dispersibility of the inorganic filler or the long-term stability of the composition can be improved. In particular, when the amount of the polymer resin is 5% by weight or more, a cured film with low transmittance and suppressed warping of the substrate can be obtained.
又,本說明書中,重量平均分子量(Mw)之值,可藉由凝膠滲透層析法(GPC)法(聚苯乙烯標準),例如以下述測定裝置、測定條件測定。 測定裝置:Waters製「Waters 2695」 檢測器:Waters製「Waters2414」、RI(示差折射率計) 管柱:Waters製「HSPgel Column,HR MB-L,3μm,6mm×150mm」×2+Waters製「HSPgel Column,HR1,3μm,6mm×150mm」×2 測定條件: 管柱溫度:40℃ RI檢測器設定溫度:35℃ 展開溶劑:四氫呋喃 流速:0.5mL/分鐘 樣品量:10μL 樣品濃度:0.7質量%In addition, in this specification, the value of weight average molecular weight (Mw) can be measured by gel permeation chromatography (GPC) method (polystyrene standard), for example, using the following measuring device and measuring conditions. Measuring device: "Waters 2695" manufactured by Waters Detector: "Waters 2414" manufactured by Waters, RI (differential refractometer) Column: "HSPgel Column, HR MB-L, 3μm, 6mm×150mm" manufactured by Waters × 2 + "HSPgel Column, HR1, 3μm, 6mm×150mm" manufactured by Waters × 2 Measuring conditions: Column temperature: 40℃ RI detector setting temperature: 35℃ Developing solvent: tetrahydrofuran Flow rate: 0.5mL/min Sample volume: 10μL Sample concentration: 0.7 mass%
[著色劑] 作為著色劑,只要是可得到遮光性硬化性樹脂組成物者時,無特別限定,可使用公知慣用之黑色著色劑。具體而言,可列舉碳黑、鈦黑、氧化鐵、氧化鈷、苝系黑色著色劑等,此等著色劑可單獨使用或組合複數種使用。 著色劑也可為苝系著色劑、該苝系著色劑與補色關係之著色劑之組合,藉由該組合呈現遮光性即可。 苝系著色劑有顯示綠色、黃色、橙色、紅色、紫色、黑色等之顏色者,可列舉如下述附有色彩索引(C.I.;The Society of Dyers and Colourists 公司發行)編號者。 - 綠色:Solvent Green 5 - 橙色:Solvent Orange 55 - 紅色:Solvent Red 135,179;Pigment Red 123,149,178,179,190,194,224 - 紫色:Pigment Violet 29 - 黑色:Pigment Black 31,32 也可使用上述以外的苝系著色劑,例如無色彩索引編號,但是作為近紅外線穿透黑色有機顏料為人所知之BASF公司的Lumogen(註冊商標)Black FK4280、Lumogen Black FK4281,作為集光性螢光染料為人所知之Lumogen F Yellow 083、Lumogen F Orange 240、Lumogen F Red305、Lumogen F Green850等,與其他的苝系化合物同樣,紫外線領域之吸收少,著色力高,故可適合使用。[Colorant] As a colorant, there is no particular limitation as long as it can obtain a light-shielding curable resin composition, and a well-known and commonly used black colorant can be used. Specifically, carbon black, titanium black, iron oxide, cobalt oxide, perylene-based black colorants, etc. can be listed, and these colorants can be used alone or in combination. The colorant can also be a perylene-based colorant, or a combination of the perylene-based colorant and a colorant related to a complementary colorant, and the light-shielding property can be exhibited by the combination. Perylene-based colorants have colors such as green, yellow, orange, red, purple, and black, and the following ones with a color index (C.I.; issued by The Society of Dyers and Colourists) number can be listed. - Green: Solvent Green 5 - Orange: Solvent Orange 55 - Red: Solvent Red 135, 179; Pigment Red 123, 149, 178, 179, 190, 194, 224 - Purple: Pigment Violet 29 - Black: Pigment Black 31, 32 Perylene-based colorants other than those listed above may also be used, such as BASF's Lumogen (registered trademark) Black FK4280 and Lumogen Black FK4281, which have no color index number but are known as near-infrared penetrating black organic pigments, and Lumogen F Yellow 083, Lumogen F Orange 240, Lumogen F Red 305, and Lumogen F Green850, like other perylene compounds, has low absorption in the ultraviolet region and high coloring power, so it is suitable for use.
本發明中,以下說明與苝系著色劑組合使用的補色著色劑。首先,說明本發明中之補色關係。 由於著色劑有不會呈現如色彩索引彩色之色彩的情形,故藉由JIS Z8729所規定的方法測定、顯示樹脂組成物之硬化塗膜之外觀色調,以座標軸(參照圖2)確認顯示L*a*b*顏色系統中之色彩之a*值及b*值,選擇與苝系著色劑之組合所得之硬化塗膜之(a*值,b*值)無限地接近(0,0)用的著色劑,作為補色關係的著色劑。在此,硬化塗膜之膜厚,無特別限定,例如為40μm。 又,無限地接近(0,0)的(a*值,b*值),其a值及b值分別在-5~+5之範圍,較佳為在-2~+2之範圍。又,補色關係的著色劑,也可為苝系著色劑,也可為苝系著色劑以外的著色劑。In the present invention, the coloring agent used in combination with the perylene coloring agent is described below. First, the coloring relationship in the present invention is described. Since the coloring agent may not present the color as the color index color, the appearance color tone of the cured coating of the resin composition is measured and displayed by the method specified in JIS Z8729, and the a* value and b* value of the color in the L*a*b* color system are confirmed and displayed with the coordinate axis (refer to Figure 2), and the coloring agent used for the cured coating obtained by combining with the perylene coloring agent and (a* value, b* value) infinitely close to (0, 0) is selected as the coloring agent of the coloring relationship. Here, the film thickness of the cured coating is not particularly limited, for example, 40μm. Moreover, the (a* value, b* value) infinitely close to (0, 0) has an a value and a b value in the range of -5 to +5, preferably in the range of -2 to +2. Furthermore, the coloring agent of the color-complementing relationship may be a perylene-based coloring agent or a coloring agent other than a perylene-based coloring agent.
苝系著色劑與補色關係的著色劑,藉由與苝系著色劑之組合,彼此之著色劑的顏色系統a*值及b*值,分別接近0者時,也可為任一的著色劑,可列舉以下的著色劑。
更佳之苝系著色劑與補色關係之著色劑的組合,例如Pigment Red 149,178,179與綠色蒽醌系著色劑(Solvent Green 3、Solvent Green 20、Solvent Green 28等)之組合,苝系著色劑彼此之混色(組合)時,紅色苝系著色劑(Pigment Red 149,178,179)與黑色苝系著色劑(Pigment Black 31、32)之組合與黑色苝系著色劑(Pigment Black 31、32)相同之黑色苝系著色劑(Lumogen(註冊商標)Black FK4280.4281)之組合。When the color system a* value and b* value of the color system of the perylene-based colorant and the colorant in the color complement relationship are close to 0, the colorant can be any colorant. The following colorants can be listed.
More preferred combinations of perylene colorants and colorants with complementary coloring agents include, for example, combinations of Pigment Red 149, 178, 179 and green anthraquinone colorants (
又,著色劑也可為黃色著色劑與紫色著色劑之組合、黃色著色劑與藍色著色劑與紅色著色劑之組合、綠色著色劑與紫色著色劑之組合、綠色著色劑與紅色著色劑之組合、黃色著色劑與紫色著色劑與藍色著色劑之組合、及綠色著色劑與紅色著色劑與藍色著色劑之組合群所選出之任一的組合,藉由該組合,樹脂組成物具有遮光性即可。其他,也可組合紫色著色劑、橙色著色劑、茶色著色劑等。Furthermore, the coloring agent may be any combination selected from the group consisting of a yellow coloring agent and a purple coloring agent, a yellow coloring agent, a blue coloring agent, and a red coloring agent, a green coloring agent and a purple coloring agent, a green coloring agent and a red coloring agent, a yellow coloring agent, a purple coloring agent, and a blue coloring agent, and a green coloring agent, a red coloring agent, and a blue coloring agent, and the resin composition may have light-shielding properties by using the combination. In addition, a purple coloring agent, an orange coloring agent, a brown coloring agent, etc. may also be used in combination.
藍色著色劑有酞菁系、蒽醌系等,有分類成顏料(Pigment)、溶劑(Solvent)的化合物等。以外也可使用金屬取代或無取代之酞菁化合物。 紅色著色劑有單偶氮系、雙偶氮系、偶氮色澱系、苯并咪唑酮系、苝系、二酮吡咯並吡咯系、縮合偶氮系、蒽醌系、喹吖啶酮系等。 黃色著色劑有單偶氮系、雙偶氮系、縮合偶氮系、苯并咪唑酮系、異吲哚啉酮系、蒽醌系等。 綠色著色劑有酞菁系、蒽醌系。除此之外,也可使用金屬取代或無取代之酞菁化合物。Blue colorants include phthalocyanine and anthraquinone, and there are compounds classified as pigments (pigment) and solvents (solvent). In addition, metal-substituted or unsubstituted phthalocyanine compounds can also be used. Red colorants include monoazo, disazo, azochromatin, benzimidazolone, perylene, diketopyrrolopyrrole, condensed azo, anthraquinone, and quinacridone. Yellow colorants include monoazo, disazo, condensed azo, benzimidazolone, isoindolinone, and anthraquinone. Green colorants include phthalocyanine and anthraquinone. In addition, metal-substituted or unsubstituted phthalocyanine compounds can also be used.
紫色著色劑、橙色著色劑、茶色著色劑,具體而言,可列舉Pigment Violet 19,23,29,32,36,38,42;Solvent Violet 13,36;C.I.顏料橙1、C.I.顏料橙5、C.I.顏料橙13、C.I.顏料橙14、C.I.顏料橙16、C.I.顏料橙17、C.I.顏料橙24、C.I.顏料橙34、C.I.顏料橙36、C.I.顏料橙38、C.I.顏料橙40、C.I.顏料橙43、C.I.顏料橙46、C.I.顏料橙49、C.I.顏料橙51、C.I.顏料橙61、C.I.顏料橙63、C.I.顏料橙64、C.I.顏料橙71、C.I.顏料橙73;C.I.顏料棕23、C.I.顏料棕25;C.I.顏料黑1、C.I.顏料黑7等。
著色劑之調配量,無特別限制,相對於組成物之固體成分全量,較佳為0.3~20質量份。藉由將調配量設為0.3質量份以上,可提高遮光性。藉由將調配量設為20質量份以下,可得到分散性優異的組成物。Purple colorant, orange colorant, brown colorant, specifically, Pigment Violet 19, 23, 29, 32, 36, 38, 42; Solvent Violet 13, 36; C.I.
碳黑係藉由在樹脂中分散可得到遮光性。碳黑可使用一般用於黑色著色劑用途的碳黑。碳黑可使用槽黑、爐黑、熱碳黑、燈黑等之公知碳黑之1種或2種以上。又,也可使用樹脂被覆碳黑。此外,也可使用碳奈米纖維、奈米碳管。 將碳黑調配於樹脂組成物時,可添加碳黑粉末,也可添加碳黑分散液。 碳黑之平均粒徑較佳為10nm以上500nm以下,更佳為10nm以上300nm以下,特佳為10nm以上100nm以下。又,平均粒徑係以電子顯微鏡觀察求得的算術平均徑。Carbon black can be dispersed in a resin to obtain light-shielding properties. Carbon black generally used for black coloring agents can be used. Carbon black can be one or more of the known carbon blacks such as channel black, furnace black, thermal black, and lamp black. In addition, resin-coated carbon black can also be used. In addition, carbon nanofibers and carbon nanotubes can also be used. When carbon black is mixed with a resin composition, carbon black powder can be added or a carbon black dispersion can be added. The average particle size of carbon black is preferably 10 nm to 500 nm, more preferably 10 nm to 300 nm, and particularly preferably 10 nm to 100 nm. In addition, the average particle size is the arithmetic mean diameter obtained by observation under an electron microscope.
碳黑之調配量係以遮光性硬化性樹脂組成物之固體成分全量基準,較佳為0.1~20質量%。碳黑之調配量為0.1質量%以上,可得到充分的遮光性,20質量%以下,可抑制龜裂之發生。 又,碳黑之調配量越多,該碳黑越容易沉降,但是藉由包含前述玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上之高分子樹脂,可抑制碳黑之沉降。在此,玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上之高分子樹脂之調配量與、碳黑之調配量,以質量比表示,較佳為1:1~100:1。The amount of carbon black blended is preferably 0.1 to 20% by mass based on the total amount of solid components of the light-shielding curable resin composition. A blending amount of carbon black of 0.1% by mass or more can obtain sufficient light-shielding properties, and a blending amount of 20% by mass or less can suppress the occurrence of cracks. In addition, the greater the blending amount of carbon black, the easier it is to precipitate, but by including the aforementioned polymer resin having a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more, the precipitation of carbon black can be suppressed. Here, the blending amount of the polymer resin having a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more and the blending amount of carbon black, expressed in terms of mass ratio, is preferably 1:1 to 100:1.
[無機填料] 硬化性樹脂層含有無機填料。藉由調配無機填料,而抑制所得之硬化物的硬化收縮,且可提高密著性、硬度、配合位於絕緣層周圍之銅等之導體層與CTE所致之龜裂耐性等的熱特性。無機填料可使用以往公知的無機填料,不限定於特定者,可列舉例如硫酸鋇、鈦酸鋇、非晶質二氧化矽、結晶性二氧化矽、熔融二氧化矽、球狀二氧化矽等之二氧化矽、滑石、黏土、二氧化矽(Neuburger Kieselerde)粒子、水鋁石、碳酸鎂、碳酸鈣、氧化鈦、氧化鋁、氫氧化鋁、氮化矽、氮化鋁、鋯酸鈣或銅、錫、鋅、鎳、銀、鈀、鋁、鐵、鈷、金、鉑等之金屬粉體。無機填料以球狀粒子為佳。其中,較佳為二氧化矽,抑制硬化性組成物之硬化物的硬化收縮,成為更低CTE,提高密著性、硬度等之特性。[Inorganic filler] The curable resin layer contains an inorganic filler. By adding the inorganic filler, the curing shrinkage of the obtained cured product can be suppressed, and the thermal properties such as adhesion, hardness, and crack resistance due to the combination with the conductive layer such as copper located around the insulating layer and CTE can be improved. The inorganic filler may be any conventionally known inorganic filler, but is not limited to any particular one. Examples of the inorganic filler include barium sulfate, barium titanate, amorphous silica, crystalline silica, fused silica, spherical silica, talc, clay, silica particles, alumina, magnesium carbonate, calcium carbonate, titanium oxide, aluminum oxide, aluminum hydroxide, silicon nitride, aluminum nitride, calcium zirconate, or metal powders such as copper, tin, zinc, nickel, silver, palladium, aluminum, iron, cobalt, gold, and platinum. Spherical particles are preferred for the inorganic filler. Among them, silicon dioxide is preferred, which can suppress the curing shrinkage of the hardened material of the curable composition, thereby achieving a lower CTE and improving properties such as adhesion and hardness.
無機填料可經表面處理。作為表面處理,可藉由偶合劑的表面處理或、氧化鋁處理等之未導入有機基的表面處理。無機填料之表面處理方法,無特別限定,使用公知慣用的方法即可,具有硬化性反應基之表面處理劑,例如以具有硬化性反應基作為有機基之偶合劑等處理無機填料的表面即可。The inorganic filler may be surface treated. The surface treatment may be surface treatment with a coupling agent or surface treatment without introducing an organic group such as alumina treatment. The surface treatment method of the inorganic filler is not particularly limited, and a conventionally known method may be used. The surface of the inorganic filler may be treated with a surface treatment agent having a curable reactive group, such as a coupling agent having a curable reactive group as an organic group.
無機填料之表面處理係藉由偶合劑之表面處理為佳。偶合劑可使用矽烷系、鈦酸酯系、鋁酸鹽系及鋁鋯(zircoaluminate)系等的偶合劑。其中,以矽烷系偶合劑為佳。此矽烷系偶合劑之例,可列舉乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、N-(2-胺基甲基)-3-胺基丙基甲基二甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-苯胺基丙基三甲氧基矽烷、3-縮水甘油氧基(Glycidyloxy)丙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二甲氧基矽烷、2-(3,4-環氧基環己基)乙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-巰基丙基三甲氧基矽烷等,此等可單獨使用或併用使用。此等之矽烷系偶合劑,預先藉由在無機填料表面吸附或反應被固定化為佳。在此,相對於無機填料100質量份,偶合劑的處理量,例如為0.5~10質量份。The surface treatment of the inorganic filler is preferably performed by using a coupling agent. The coupling agent may be a silane-based, titanate-based, aluminate-based, or zircoaluminate-based coupling agent. Among them, a silane-based coupling agent is preferred. Examples of the silane coupling agent include vinyl trimethoxysilane, vinyl triethoxysilane, N-(2-aminomethyl)-3-aminopropyl methyl dimethoxysilane, N-(2-aminoethyl)-3-aminopropyl trimethoxysilane, 3-aminopropyl triethoxysilane, 3-anilinopropyl trimethoxysilane, 3-glycidyloxypropyl trimethoxysilane, 3-glycidyloxypropyl methyl dimethoxysilane, 2-(3,4-epoxycyclohexyl)ethyl trimethoxysilane, 3-methacryloyloxypropyl trimethoxysilane, 3-butylenepropyl trimethoxysilane, etc. These can be used alone or in combination. The silane coupling agent is preferably immobilized in advance by adsorption or reaction on the surface of the inorganic filler. Here, the amount of the coupling agent to be used is, for example, 0.5 to 10 parts by weight relative to 100 parts by weight of the inorganic filler.
硬化性反應基係以熱硬化性反應基為佳。熱硬化性反應基,可列舉羥基、羧基、異氰酸酯基、胺基、亞胺基、環氧基、氧環丁基(oxetanyl)、巰基、甲氧基甲基、甲氧基乙基、乙氧基甲基、乙氧基乙基、噁唑啉基等。其中,以胺基及環氧基之至少任一種為佳。又,經表面處理的無機填料,除熱硬化性反應基外,也可具有光硬化性反應基。The curable reactive group is preferably a thermosetting reactive group. Examples of the thermosetting reactive group include hydroxyl, carboxyl, isocyanate, amino, imino, epoxy, oxetanyl, butyl, methoxymethyl, methoxyethyl, ethoxymethyl, ethoxyethyl, and oxazoline. Among them, at least one of amino and epoxy is preferred. In addition, the surface-treated inorganic filler may also have a photocurable reactive group in addition to the thermosetting reactive group.
又,經表面處理的無機填料,可以經表面處理的狀態包含於硬化性樹脂層中,形成硬化性樹脂層之硬化性樹脂組成物中,可各自調配無機填料與表面處理劑,在組成物中,無機填料可經表面處理,但是調配預先進行表面處理的無機填料為佳。藉由調配預先進行表面處理的無機填料,可防止各自調配時,可殘存未被表面處理消耗之表面處理劑所致之龜裂耐性等之降低。預先進行表面處理時,在溶劑或硬化性樹脂中調配預備分散了無機填料的預備分散液為佳,將進行了表面處理的無機填料預備分散於溶劑,將該預備分散液調配於組成物中,或將表面未處理之無機填料預備分散於溶劑時,充分地進行表面處理後,將該預備分散液調配於組成物中更佳。 無機填料可以粉體或固體狀態與硬化性樹脂組成物之其他成分調配,也可與溶劑或分散劑混合作為漿料後,與其他的成分調配。In addition, the surface-treated inorganic filler can be included in the hardening resin layer in a surface-treated state. In the hardening resin composition forming the hardening resin layer, the inorganic filler and the surface treatment agent can be separately prepared. In the composition, the inorganic filler can be surface-treated, but it is preferred to prepare the inorganic filler that has been surface-treated in advance. By preparing the inorganic filler that has been surface-treated in advance, it is possible to prevent the reduction of crack resistance and the like due to the surface treatment agent that is not consumed by the surface treatment remaining during the preparation. When the surface treatment is performed in advance, it is preferred to prepare a pre-dispersion liquid in which the inorganic filler is pre-dispersed in the solvent or the curable resin, and it is preferred to pre-disperse the surface-treated inorganic filler in the solvent and mix the pre-dispersion liquid in the composition, or it is preferred to pre-disperse the surface-untreated inorganic filler in the solvent and mix the pre-dispersion liquid in the composition after the surface treatment is performed sufficiently. The inorganic filler can be mixed with other components of the curable resin composition in a powder or solid state, or it can be mixed with a solvent or a dispersant as a slurry and then mixed with other components.
硬化性樹脂層之厚度設為X(μm)時,無機填料之凝集粒子的最大粒徑為X/2(μm)以下。藉由凝集粒子之最大粒徑為硬化性樹脂層之厚度之二分之一以下,在硬化性樹脂層中,可抑制因無機填料所致之光之散射,可得到充分的遮光性。又,包含無機填料,有利於抑制切割時之毛邊,但是凝集粒子之最大粒的粒徑大時,反而容易產生毛邊,而且,切割時,變得容易產生缺損。 無機填料之凝集粒子之最大粒徑,滿足與上述硬化性樹脂層之膜厚之關係,且10μm以下為佳。藉由無機填料之凝集粒子的最大粒徑為10μm以下,可更有效地抑制切割時之毛邊或缺損。上述玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上之高分子樹脂,可提高無機填料之分散性。因此,包含玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上之高分子樹脂的硬化性樹脂組成物,在油墨之狀態下,分散安定性優異,可抑制無機填料產生凝聚。因此,油墨,亦即即使將硬化性樹脂組成物長期保存後,也可將無機填料之凝集粒子之最大粒徑維持在10μm以下。When the thickness of the curable resin layer is set to X (μm), the maximum particle size of the agglomerated particles of the inorganic filler is less than X/2 (μm). By setting the maximum particle size of the agglomerated particles to less than half the thickness of the curable resin layer, the scattering of light caused by the inorganic filler can be suppressed in the curable resin layer, and sufficient light shielding can be obtained. In addition, the inclusion of inorganic fillers is beneficial for suppressing burrs during cutting, but when the maximum particle size of the agglomerated particles is large, burrs are more likely to occur, and defects are more likely to occur during cutting. The maximum particle size of the agglomerated particles of the inorganic filler satisfies the relationship with the film thickness of the curable resin layer mentioned above, and is preferably less than 10μm. By setting the maximum particle size of the agglomerated particles of the inorganic filler to less than 10μm, burrs or defects during cutting can be more effectively suppressed. The polymer resin having a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more can improve the dispersibility of the inorganic filler. Therefore, the curable resin composition including the polymer resin having a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more has excellent dispersion stability in the state of ink and can inhibit the aggregation of the inorganic filler. Therefore, the ink, that is, the curable resin composition, can maintain the maximum particle size of the aggregated particles of the inorganic filler below 10μm even after the long-term storage.
無機填料可使用單獨1種,也可以2種以上的混合物使用。以乾薄膜之硬化性樹脂層的固體成分全量基準下,無機填料之調配量,較佳為0.1~70質量%。無機填料之調配量為0.1質量%以上時,可抑制熱膨脹,提高耐熱性,而70質量%以下時,可抑制龜裂之發生。又,無機填料之調配量為20質量%以上時,可提高切割耐性,故較佳。The inorganic filler may be used alone or as a mixture of two or more. The amount of the inorganic filler to be added is preferably 0.1 to 70% by mass based on the total solid content of the curable resin layer of the dry film. When the amount of the inorganic filler is 0.1% by mass or more, thermal expansion can be suppressed and heat resistance can be improved, while when it is 70% by mass or less, cracking can be suppressed. In addition, when the amount of the inorganic filler is 20% by mass or more, cutting resistance can be improved, which is preferred.
[環氧樹脂] 遮光性硬化性樹脂組成物,可包含環氧樹脂。環氧樹脂為具有環氧基的樹脂,可使用以往公知者。可列舉分子中具有2個環氧基之2官能性環氧樹脂、分子中具有3個以上之環氧基的多官能環氧樹脂等。又,也可為氫化的環氧樹脂。環氧樹脂有固形環氧樹脂、液狀環氧樹脂、半固形環氧樹脂或結晶化環氧樹脂,其中至少包含液狀環氧樹脂為佳。固形環氧樹脂及液狀環氧樹脂,各自可單獨使用1種或組合2種類以上使用。本說明書中,固形環氧樹脂係指40℃下固體狀的環氧樹脂,而半固形環氧樹脂係指20℃下固體狀,40℃下液狀的環氧樹脂,液狀環氧樹脂係指20℃下液狀的環氧樹脂。液狀的判定係依據有關危險物之試驗及性狀的省令(平成元年自治省令第1號)之附件第2之「液狀的確認方法」來進行。例如以日本特開2016-079384號公報之段落23~25所記載的方法進行。又,結晶性環氧樹脂係指結晶性強的環氧樹脂,熔點以下的溫度時,高分子鏈正確規則性排列,雖為固形樹脂,但是熔融時,成為一般液狀樹脂之低黏度之熱硬化性的環氧樹脂。[Epoxy resin] The light-shielding curable resin composition may include an epoxy resin. The epoxy resin is a resin having an epoxy group, and any conventionally known epoxy resin may be used. Examples thereof include a bifunctional epoxy resin having two epoxy groups in the molecule, a polyfunctional epoxy resin having three or more epoxy groups in the molecule, and the like. In addition, a hydrogenated epoxy resin may be used. The epoxy resin includes a solid epoxy resin, a liquid epoxy resin, a semi-solid epoxy resin, or a crystallized epoxy resin, and it is preferred that at least a liquid epoxy resin is included. The solid epoxy resin and the liquid epoxy resin may be used alone or in combination of two or more. In this specification, solid epoxy resin refers to epoxy resin that is solid at 40°C, semi-solid epoxy resin refers to epoxy resin that is solid at 20°C and liquid at 40°C, and liquid epoxy resin refers to epoxy resin that is liquid at 20°C. The determination of liquid state is carried out in accordance with the "Method for Confirming Liquid State" in Annex 2 of the Ministerial Order on the Test and Properties of Dangerous Substances (Ministerial Order No. 1 of the First Year of Heisei). For example, it is carried out by the method described in paragraphs 23 to 25 of Japanese Patent Publication No. 2016-079384. In addition, crystalline epoxy resin refers to an epoxy resin with strong crystallinity. At a temperature below the melting point, the polymer chain is properly and regularly arranged. Although it is a solid resin, when melted, it becomes a low-viscosity thermosetting epoxy resin like a general liquid resin.
液狀環氧樹脂,可列舉雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚AF型環氧樹脂、苯酚酚醛清漆型環氧樹脂、tert-丁基-兒茶酚型環氧樹脂、縮水甘油基胺型環氧樹脂、胺基苯酚型環氧樹脂、脂環式環氧樹脂等。藉由包含液狀環氧樹脂,乾薄膜之可撓性優異。Examples of the liquid epoxy resin include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol AF type epoxy resin, phenol novolac type epoxy resin, tert-butyl-catechol type epoxy resin, glycidylamine type epoxy resin, aminophenol type epoxy resin, and lipid epoxy resin. By including the liquid epoxy resin, the dry film has excellent flexibility.
固形環氧樹脂,可列舉DIC公司製HP-4700(萘型環氧樹脂)、日本化藥公司製NC-7000(含有萘骨架之多官能固形環氧樹脂)等之萘型環氧樹脂;日本化藥公司製EPPN-502H(三苯酚環氧樹脂)等之酚類與具有酚性羥基之芳香族醛之縮合物的環氧化物(三苯酚型環氧樹脂);DIC公司製EPICLON HP-7200H(含有二環戊二烯骨架之多官能固形環氧樹脂)等之二環戊二烯芳烷基型環氧樹脂;日本化藥公司製NC-3000H(含有聯苯骨架之多官能固形環氧樹脂)等之聯苯基芳烷基型環氧樹脂;日本化藥公司製NC-3000L等之聯苯/苯酚酚醛清漆型環氧樹脂;DIC公司製EPICLON N660、EPICLON N690、N770、日本化藥公司製EOCN-104S等之酚醛清漆型環氧樹脂;NIPPON STEEL Chemical & Material公司製TX0712等之含磷環氧樹脂;日產化學公司製TEPIC等之三(2,3-環氧基丙基)異氰脲酸酯等。藉由包含固形環氧樹脂,故硬化物之玻璃轉移溫度變高,耐熱性優異。Solid epoxy resins include naphthalene-based epoxy resins such as HP-4700 (naphthalene-based epoxy resin) manufactured by DIC Corporation and NC-7000 (polyfunctional solid epoxy resin containing a naphthalene skeleton) manufactured by Nippon Kayaku Co., Ltd.; epoxides (triphenol-based epoxy resins) of condensates of phenols and aromatic aldehydes having phenolic hydroxyl groups such as EPPN-502H (triphenol-based epoxy resin) manufactured by Nippon Kayaku Co., Ltd.; EPICLON manufactured by DIC Corporation; HP-7200H (a multifunctional solid epoxy resin containing a dicyclopentadiene skeleton) and other dicyclopentadiene aralkyl epoxy resins; NC-3000H (a multifunctional solid epoxy resin containing a biphenyl skeleton) and other biphenyl aralkyl epoxy resins manufactured by Nippon Kayaku Co., Ltd.; NC-3000L and other biphenyl/phenol novolac epoxy resins manufactured by Nippon Kayaku Co., Ltd.; EPICLON N660, EPICLON N690, N770 manufactured by DIC Corporation, EOCN-104S and other novolac epoxy resins manufactured by Nippon Kayaku Co., Ltd.; NIPPON STEEL Chemical & Phosphorus-containing epoxy resins such as TX0712 manufactured by Material Co., Ltd.; tris(2,3-epoxypropyl)isocyanurate such as TEPIC manufactured by Nissan Chemical Co., Ltd. By including solid epoxy resin, the glass transition temperature of the cured product becomes higher and the heat resistance is excellent.
半固形環氧樹脂,較佳為選自由雙酚A型環氧樹脂、萘型環氧樹脂及苯酚酚醛清漆型環氧樹脂所構成群組中之至少1種。藉由包含半固形環氧樹脂,硬化物之玻璃轉移溫度(Tg)變高,CTE變低,龜裂耐性優異。 半固形環氧樹脂,可列舉DIC公司製EPICLON 860、EPICLON 900-IM、EPICLON EXA―4816、EPICLON EXA-4822、NIPPON STEEL Chemical & Material公司製 EPOTOHTOYD-134、Mitsubishi Chemical公司製jER834、jER872、住友化學公司製ELA-134等之雙酚A型環氧樹脂;DIC公司製EPICLON HP-4032等之萘型環氧樹脂;DIC公司製EPICLON N-740等之苯酚酚醛清漆型環氧樹脂等。The semi-solid epoxy resin is preferably at least one selected from the group consisting of bisphenol A type epoxy resin, naphthalene type epoxy resin and phenol novolac type epoxy resin. By including the semi-solid epoxy resin, the glass transition temperature (Tg) of the cured product becomes higher, the CTE becomes lower, and the crack resistance is excellent. Semi-solid epoxy resins include bisphenol A type epoxy resins such as EPICLON 860, EPICLON 900-IM, EPICLON EXA-4816, EPICLON EXA-4822 manufactured by DIC Corporation, EPOTOHTOYD-134 manufactured by NIPPON STEEL Chemical & Material Co., Ltd., jER834, jER872 manufactured by Mitsubishi Chemical Co., Ltd., and ELA-134 manufactured by Sumitomo Chemical Co., Ltd.; naphthalene type epoxy resins such as EPICLON HP-4032 manufactured by DIC Corporation; phenol novolac type epoxy resins such as EPICLON N-740 manufactured by DIC Corporation, etc.
結晶性環氧樹脂,可使用例如具有聯苯結構、硫(sulfide)結構、伸苯基結構、萘結構等的結晶性環氧樹脂。聯苯型的環氧樹脂,例如可提供Mitsubishi Chemical公司製jER YX4000、jER YX4000H、jER YL6121H、jER YL6640、jER YL6677。二苯硫醚型環氧樹脂,例如NIPPON STEEL Chemical & Material公司製 EPOTOHTOYSLV-120TE。伸苯基型環氧樹脂,例如 NIPPON STEEL Chemical & Material公司製EPOTOHTOYDC-1312。萘型環氧樹脂,可使用例如DIC公司製EPICLON HP-4032、EPICLON HP-4032D、EPICLON HP-4700。又,結晶性環氧樹脂,可使用NIPPON STEEL Chemical & Material公司製EPOTOHTOYSLV-90C、日產化學公司製TEPIC-S(三縮水甘油基異氰脲酸酯)。Crystalline epoxy resins that can be used include, for example, those having a biphenyl structure, a sulfide structure, a phenylene structure, a naphthalene structure, and the like. Biphenyl-type epoxy resins include, for example, jER YX4000, jER YX4000H, jER YL6121H, jER YL6640, and jER YL6677 manufactured by Mitsubishi Chemical. Diphenyl sulfide-type epoxy resins include, for example, EPOTOHTOYSLV-120TE manufactured by NIPPON STEEL Chemical & Material. Phenyl-type epoxy resins include, for example, EPOTOHTOYDC-1312 manufactured by NIPPON STEEL Chemical & Material. As the naphthalene type epoxy resin, for example, EPICLON HP-4032, EPICLON HP-4032D, and EPICLON HP-4700 manufactured by DIC Corporation can be used. As the crystalline epoxy resin, EPOTOHTOYSLV-90C manufactured by NIPPON STEEL Chemical & Material Co., Ltd. and TEPIC-S (triglycidyl isocyanurate) manufactured by Nissan Chemical Co., Ltd. can be used.
以組成物之固體成分全量基準,環氧樹脂之調配量係以合計,較佳為1~70質量%。在上述範圍內時,硬化物之耐熱性或可撓性或龜裂耐性優異。又,以環氧樹脂與硬化劑與硬化促進劑與上述高分子樹脂之合計固體成分全量基準,液狀環氧樹脂之調配量,較佳為5~60質量%。在上述範圍內時,乾薄膜之柔軟性優異。The amount of epoxy resin to be added is preferably 1-70% by weight based on the total solid content of the composition. When it is within the above range, the heat resistance, flexibility or crack resistance of the cured product is excellent. In addition, the amount of liquid epoxy resin to be added is preferably 5-60% by weight based on the total solid content of the epoxy resin, the hardener, the hardening accelerator and the above-mentioned polymer resin. When it is within the above range, the softness of the dry film is excellent.
遮光性硬化性樹脂組成物,在不損及本發明效果的範圍內,也可含有環氧樹脂以外的硬化性樹脂成分,例如可使用異氰酸酯化合物、嵌段異氰酸酯化合物、胺基樹脂、苯並噁嗪樹脂、碳二亞胺樹脂、環碳酸酯化合物、多官能氧環丁烷化合物、環硫化物樹脂等之公知慣用的熱硬化性樹脂。The light-shielding curable resin composition may contain curable resin components other than epoxy resins within a range not impairing the effects of the present invention. For example, known conventional thermosetting resins such as isocyanate compounds, blocked isocyanate compounds, amino resins, benzoxazine resins, carbodiimide resins, cyclocarbonate compounds, polyfunctional cyclobutane oxide compounds, and cyclosulfide resins may be used.
[硬化劑] 遮光性硬化性樹脂組成物,較佳為含有硬化劑。硬化劑可列舉具有酚性羥基之化合物、聚羧酸及其酸酐、具有氰酸酯基之化合物、具有活性酯基之化合物、具有馬來醯亞胺基之化合物、脂環式烯烴聚合物等。硬化劑可單獨使用1種或組合2種以上使用。[Hardener] The light-shielding curable resin composition preferably contains a hardener. Examples of the hardener include compounds having phenolic hydroxyl groups, polycarboxylic acids and their anhydrides, compounds having cyanate groups, compounds having active ester groups, compounds having maleimide groups, alicyclic olefin polymers, etc. The hardener may be used alone or in combination of two or more.
具有酚性羥基之樹脂,可使用苯酚酚醛清漆樹脂、烷基酚醛清漆樹脂、雙酚A酚醛清漆樹脂、二環戊二烯型酚樹脂、Xylok型酚樹脂、萜烯改質酚樹脂、甲酚/萘酚樹脂、聚乙烯基酚類、苯酚/萘酚樹脂、含有α-萘酚骨架之酚樹脂、含有三嗪骨架之甲酚醛清漆樹脂、聯苯基芳烷基型酚樹脂、Zilog型苯酚酚醛清漆樹脂等之以往公知者。 具有酚性羥基之樹脂,可列舉例如二環戊二烯骨架苯酚酚醛清漆樹脂(GDP系列、群榮化學公司製)、Zilog型苯酚酚醛清漆樹脂(MEH-7800、明和化成公司製)、聯苯基芳烷基型酚醛清漆樹脂(MEH-7851、明和化成公司製)、萘酚芳烷基型硬化劑(SN系列、NIPPON STEEL Chemical & Material公司製)、含有三嗪骨架之甲酚醛清漆樹脂(LA-3018-50P、DIC公司製)、含有三嗪骨架之苯酚酚醛清漆樹脂(LA-705N、DIC公司製)等。Resins having phenolic hydroxyl groups may include phenol novolac resins, alkyl novolac resins, bisphenol A novolac resins, dicyclopentadiene-type phenol resins, Xylok-type phenol resins, terpene-modified phenol resins, cresol/naphthol resins, polyvinylphenols, phenol/naphthol resins, phenol resins containing an α-naphthol skeleton, cresol novolac resins containing a triazine skeleton, biphenyl aralkyl-type phenol resins, Zilog-type phenol novolac resins, and other conventionally known resins. Examples of the resin having a phenolic hydroxyl group include dicyclopentadiene skeleton phenol novolac resins (GDP series, manufactured by Qun-Ei Chemical Co., Ltd.), Zilog type phenol novolac resins (MEH-7800, manufactured by Meiwa Chemicals Co., Ltd.), biphenyl aralkyl type novolac resins (MEH-7851, manufactured by Meiwa Chemicals Co., Ltd.), naphthol aralkyl type hardeners (SN series, manufactured by NIPPON STEEL Chemical & Material Co., Ltd.), cresol novolac resins containing a triazine skeleton (LA-3018-50P, manufactured by DIC Corporation), and phenol novolac resins containing a triazine skeleton (LA-705N, manufactured by DIC Corporation).
具有氰酸酯基之化合物係以一分子中具有2個以上之氰酸酯基(-OCN)的化合物為佳。具有氰酸酯基之化合物,可使用以往公知者。具有氰酸酯基之化合物,可列舉例如苯酚酚醛清漆型氰酸酯樹脂、烷基苯酚酚醛清漆型氰酸酯樹脂、二環戊二烯型氰酸酯樹脂、雙酚A型氰酸酯樹脂、雙酚F型氰酸酯樹脂、雙酚S型氰酸酯樹脂。又,也可為局部進行三嗪化的預聚物。The compound having a cyanate group is preferably a compound having two or more cyanate groups (-OCN) in one molecule. The compound having a cyanate group may be a conventionally known compound. Examples of the compound having a cyanate group include phenol novolac type cyanate resins, alkylphenol novolac type cyanate resins, dicyclopentadiene type cyanate resins, bisphenol A type cyanate resins, bisphenol F type cyanate resins, and bisphenol S type cyanate resins. In addition, the compound may be a partially triazine-treated prepolymer.
市售之具有氰酸酯基的化合物,可列舉苯酚酚醛清漆型多官能氰酸酯樹脂(Lonza Japan公司製、PT30S)、雙酚A二氰酸酯之一部分或全部經三嗪化之三聚物的預聚物(Lonza Japan公司製、BA230S75)、含有二環戊二烯結構之氰酸酯樹脂(Lonza Japan公司製、DT-4000、DT-7000)等。Commercially available compounds having a cyanate group include phenol novolac type multifunctional cyanate resin (PT30S manufactured by Lonza Japan Co., Ltd.), a prepolymer of a trimer in which part or all of bisphenol A dicyanate is triazine-modified (BA230S75 manufactured by Lonza Japan Co., Ltd.), and a cyanate resin containing a dicyclopentadiene structure (DT-4000, DT-7000 manufactured by Lonza Japan Co., Ltd.).
具有活性酯基之化合物係以一分子中具有2個以上之活性酯基的化合物為佳。具有活性酯基之化合物,一般可藉由羧酸化合物與羥基化合物之縮合反應而得到。其中,使用作為羥基化合物之苯酚化合物或萘酚化合物所得之具有活性酯基的化合物為佳。苯酚化合物或萘酚化合物,可列舉氫醌、間苯二酚、雙酚A、雙酚F、雙酚S、酚酞、甲基化雙酚A、甲基化雙酚F、甲基化雙酚S、苯酚、o-甲酚、m-甲酚、p-甲酚、兒茶酚、α-萘酚、β-萘酚、1,5-二羥基萘、1,6-二羥基萘、2,6-二羥基萘、二羥基二苯甲酮、三羥基二苯甲酮、四羥基二苯甲酮、間苯三酚、苯三醇、二環戊二烯基二酚、苯酚酚醛清漆等。又,具有活性酯基之化合物,可為萘二酚烷基/苯甲酸型。The compound having an active ester group is preferably a compound having two or more active ester groups in one molecule. The compound having an active ester group can generally be obtained by a condensation reaction of a carboxylic acid compound and a hydroxyl compound. Among them, the compound having an active ester group obtained by using a phenol compound or a naphthol compound as a hydroxyl compound is preferred. Examples of phenolic compounds or naphthol compounds include hydroquinone, resorcinol, bisphenol A, bisphenol F, bisphenol S, phenolphthalein, methylated bisphenol A, methylated bisphenol F, methylated bisphenol S, phenol, o-cresol, m-cresol, p-cresol, catechol, α-naphthol, β-naphthol, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dihydroxybenzophenone, trihydroxybenzophenone, tetrahydroxybenzophenone, phloroglucinol, benzenetriol, dicyclopentadienyldiphenol, phenol novolac, etc. In addition, the compound having an active ester group may be a naphthol alkyl/benzoic acid type.
市售之具有活性酯基之化合物,可列舉二環戊二烯型之二酚化合物,例如HPC8000-65T(DIC公司製)、HPC8100-65T(DIC公司製)、HPC8150-65T(DIC公司製)。Examples of commercially available compounds having an active ester group include dicyclopentadiene-type diphenol compounds, such as HPC8000-65T (manufactured by DIC Corporation), HPC8100-65T (manufactured by DIC Corporation), and HPC8150-65T (manufactured by DIC Corporation).
具有馬來醯亞胺基之化合物為具有馬來醯亞胺骨架之化合物,以往公知者皆可使用。具有馬來醯亞胺基之化合物係以具有2以上之馬來醯亞胺骨架為佳,更佳為N,N’-1,3-伸苯基二馬來醯亞胺、N,N’-1,4-伸苯基二馬來醯亞胺、N,N’-4,4-二苯基甲烷雙馬來醯亞胺、1,2-雙(馬來醯亞胺)乙烷、1,6-雙馬來醯亞胺己烷、1,6-雙馬來醯亞胺-(2,2,4-三甲基)己烷、2,2’-雙-[4-(4-馬來醯亞胺苯氧基)苯基]丙烷、3,3’-二甲基-5,5’-二乙基-4,4’-二苯基甲烷雙馬來醯亞胺、4-甲基-1,3-伸苯基雙馬來醯亞胺、雙(3-乙基-5-甲基-4-馬來醯亞胺苯基)甲烷、雙酚A二苯醚雙馬來醯亞胺、聚苯基甲烷馬來醯亞胺,及此等之寡聚物,及具有馬來醯亞胺骨架之二胺縮合物之中之至少任一種。寡聚物係藉由使上述具有馬來醯亞胺基之化合物中之單體之具有馬來醯亞胺基的化合物進行縮合所得之寡聚物。The compound having a maleimide group is a compound having a maleimide skeleton, and any of the conventionally known compounds can be used. The compound having a maleimide group preferably has two or more maleimide skeletons, and more preferably is N,N'-1,3-phenylene dimalienyl, N,N'-1,4-phenylene dimalienyl, N,N'-4,4-diphenylmethane dimaleimide, 1,2-bis(maleimide)ethane, 1,6-dimaleimidehexane, 1,6-dimaleimide-(2,2,4-trimethyl)hexane, 2,2'-bis-[4 [0013] The present invention relates to at least one of bis(4-maleimidephenoxy)phenyl]propane, 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane dimaleimide, 4-methyl-1,3-phenylene dimaleimide, bis(3-ethyl-5-methyl-4-maleimidephenyl)methane, bisphenol A diphenyl ether dimaleimide, polyphenylmethane maleimide, and oligomers thereof, and diamine condensates having a maleimide skeleton. The oligomer is obtained by condensing a maleimide group-containing monomer of the above-mentioned compounds having a maleimide group.
市售之具有馬來醯亞胺基的化合物,可列舉BMI-1000(4,4’-二苯基甲烷雙馬來醯亞胺、大和化成工業公司製)、BMI-2300(苯基甲烷雙馬來醯亞胺、大和化成工業公司製)、BMI-3000(m-伸苯基雙馬來醯亞胺、大和化成工業公司製)、BMI-5100(3,3’-二甲基-5,5’-二甲基-4,4’-二苯基甲烷雙馬來醯亞胺、大和化成工業公司製)、BMI-7000(4-甲基-1,3,-伸苯基雙馬來醯亞胺、大和化成工業公司製)、BMI-TMH((1,6-雙馬來醯亞胺-2,2,4-三甲基)己烷、大和化成工業公司製)等。Commercially available compounds having maleimide groups include BMI-1000 (4,4'-diphenylmethane bismaleimide, manufactured by Yamato Chemical Industries, Ltd.), BMI-2300 (phenylmethane bismaleimide, manufactured by Yamato Chemical Industries, Ltd.), BMI-3000 (m-phenylene bismaleimide, manufactured by Yamato Chemical Industries, Ltd.), BMI-5100 (3 ,3'-dimethyl-5,5'-dimethyl-4,4'-diphenylmethanebismaleimide, manufactured by Yamato Chemical Industries, Ltd.), BMI-7000 (4-methyl-1,3,-phenylenebismaleimide, manufactured by Yamato Chemical Industries, Ltd.), BMI-TMH ((1,6-bismaleimide-2,2,4-trimethyl)hexane, manufactured by Yamato Chemical Industries, Ltd.), etc.
硬化劑之調配量係相對於環氧樹脂100質量份,較佳為20~500質量份,更佳為25~500質量份。The amount of hardener to be mixed is relative to 100 parts by mass of epoxy resin, preferably 20 to 500 parts by mass, and more preferably 25 to 500 parts by mass.
以下,說明一例為以不包含光硬化性成分之熱硬化性樹脂組成物,形成遮光性硬化性樹脂組成物時,可包含上述成分以外的成分。Hereinafter, an example will be described in which a light-shielding curable resin composition is formed from a thermosetting resin composition that does not contain a photocurable component, and components other than the above components may be contained.
遮光性硬化性樹脂組成物,為了提高所得之硬化膜的機械強度,可再含有熱塑性樹脂。熱塑性樹脂可溶於溶劑者為佳。可溶於溶劑時,可提高乾薄膜之柔軟性,可抑制龜裂之發生或掉粉。熱塑性樹脂,可列舉熱塑性聚羥基聚醚樹脂或、環氧氯丙烷與各種2官能苯酚化合物的縮合物的苯氧基樹脂或存在於其骨架之羥醚部的羥基,使用各種酸酐或酸氯化物進行酯化的苯氧基樹脂、聚乙烯醇縮乙醛樹脂、聚醯胺樹脂、聚醯胺醯亞胺樹脂、嵌段共聚物等。熱塑性樹脂可單獨使用1種或組合2種以上使用。The light-shielding curable resin composition may further contain a thermoplastic resin in order to improve the mechanical strength of the obtained cured film. The thermoplastic resin is preferably soluble in a solvent. When soluble in a solvent, the flexibility of the dry film can be improved, and the occurrence of cracking or powdering can be suppressed. Examples of the thermoplastic resin include thermoplastic polyhydroxy polyether resins or phenoxy resins of condensates of epichlorohydrin and various bifunctional phenol compounds, or phenoxy resins in which the hydroxyl groups present in the hydroxy ether portion of the skeleton are esterified using various acid anhydrides or acid chlorides, polyvinyl alcohol acetal resins, polyamide resins, polyamide imide resins, block copolymers, and the like. The thermoplastic resin may be used alone or in combination of two or more.
以遮光性硬化性樹脂組成物的固體成分全量基準,熱塑性樹脂之調配量,較佳為0.5~20質量%,更佳為0.5~10質量%。熱塑性樹脂之調配量在上述範圍內時,容易得到均勻的粗化面狀態。The amount of the thermoplastic resin blended is preferably 0.5 to 20% by mass, more preferably 0.5 to 10% by mass, based on the total solid content of the light-shielding curable resin composition. When the amount of the thermoplastic resin blended is within the above range, a uniform roughened surface state can be easily obtained.
此外,遮光性硬化性樹脂組成物,必要時可含有橡膠狀粒子。這種橡膠狀粒子,可列舉聚丁二烯橡膠、聚異戊二烯(Isoprene)橡膠、胺基甲酸酯改性聚丁二烯橡膠、環氧基改性聚丁二烯橡膠、丙烯腈改性聚丁二烯橡膠、羧基改性聚丁二烯橡膠、以羧基或羥基改性的丙烯腈丁二烯橡膠、及彼等的交聯橡膠粒子、核殼型橡膠粒子等,可單獨使用1種或組合2種以上使用。此等橡膠狀粒子,可提高所得之硬化膜的柔軟性,或提高龜裂耐性,可藉由氧化劑之表面粗化處理,提高與銅箔等之密著強度而添加。In addition, the light-shielding curable resin composition may contain rubber particles if necessary. Such rubber particles include polybutadiene rubber, polyisoprene rubber, urethane-modified polybutadiene rubber, epoxy-modified polybutadiene rubber, acrylonitrile-modified polybutadiene rubber, carboxyl-modified polybutadiene rubber, acrylonitrile-butadiene rubber modified with carboxyl or hydroxyl groups, and their cross-linked rubber particles, core-shell rubber particles, etc., and one type may be used alone or two or more types may be used in combination. Such rubber particles can improve the softness of the resulting cured film or improve the crack resistance, and can be added by surface roughening treatment with an oxidizing agent to improve the adhesion strength with copper foil, etc.
橡膠狀粒子之平均粒徑,較佳為0.005~1μm之範圍,更佳為0.2~1μm之範圍。橡膠狀粒子之平均粒徑,可藉由雷射繞射式粒徑分布測定裝置與動態光散射法之測定裝置求得。藉由雷射繞射法之測定裝置,可列舉Microtrac-bel公司製之Microtrac MT3300EXII,藉由動態光散射法之測定裝置,可列舉Microtrac-bel公司製之Nanotrac WaveII UT151。The average particle size of the rubber-like particles is preferably in the range of 0.005 to 1 μm, and more preferably in the range of 0.2 to 1 μm. The average particle size of the rubber-like particles can be obtained by a laser diffraction particle size distribution measuring device and a dynamic light scattering measuring device. The measuring device by the laser diffraction method can be Microtrac MT3300EXII manufactured by Microtrac-bel, and the measuring device by the dynamic light scattering method can be Nanotrac WaveII UT151 manufactured by Microtrac-bel.
橡膠狀粒子之調配量係以遮光性硬化性樹脂組成物的固體成分全量基準,較佳為0.5~10質量%,更佳為1~5質量%。0.5質量%以上時,可得到龜裂耐性,可提高與導體圖型等之密著強度。10質量%以下時,熱膨脹係數(CTE)降低,玻璃轉移溫度(Tg)上昇,提高硬化特性。The amount of rubber particles is preferably 0.5-10% by mass, and more preferably 1-5% by mass, based on the total solid content of the light-shielding curable resin composition. When the amount is 0.5% by mass or more, crack resistance can be obtained, and the adhesion strength with the conductor pattern can be improved. When the amount is less than 10% by mass, the coefficient of thermal expansion (CTE) decreases, the glass transition temperature (Tg) increases, and the curing characteristics are improved.
遮光性硬化性樹脂組成物可含有硬化促進劑。硬化促進劑係促進熱硬化反應者,為了更提高密著性、耐藥品性、耐熱性等之特性而使用。這種硬化促進劑之具體例,可列舉咪唑及其衍生物;乙醯胍胺、苯並胍胺等之胍胺類;二胺基二苯基甲烷、m-苯二胺、m-二甲苯二胺、二胺基二苯基碸、雙氰胺、脲、脲衍生物、三聚氰胺、多鹼肼等之多胺類;此等之有機酸鹽及/或環氧基加成物;三氟化硼之胺錯合物;乙基二胺基-S-三嗪、2,4-二胺基-S-三嗪、2,4-二胺基-6-二甲苯基-S-三嗪等之三嗪衍生物類;三甲基胺、三乙醇胺、N,N-二甲基辛基胺、N-苄基二甲基胺、吡啶、N-甲基嗎啉、六(N-甲基)三聚氰胺、2,4,6-三(二甲基胺基苯酚)、四甲基胍、m-胺基苯酚等之胺類;聚乙烯基苯酚、聚乙烯基苯酚溴化物、苯酚酚醛清漆、烷基苯酚酚醛清漆等之多酚類;三丁基膦、三苯基膦、三-2-氰基乙基膦等之有機膦類;三-n-丁基(2,5-二羥基苯基)鏻溴化物、十六烷基三丁基鏻氯化物等之鏻鹽類;苄基三甲基銨氯化物、苯基三丁基銨氯化物等之四級銨鹽類;前述多元酸酐;二苯基錪四氟硼酸酯、三苯基鋶六氟銻酸鹽、2,4,6-三苯硫基嘧啶鎓六氟磷酸酯等之光陽離子聚合觸媒;苯乙烯-馬來酸酐樹脂;苯基異氰酸酯與二甲基胺之等莫耳反應物或、甲伸苯基二異氰酸酯、異佛爾酮二異氰酸酯等之有機聚異氰酸酯與二甲基胺之等莫耳反應物、金屬觸媒等之以往公知的硬化促進劑。硬化促進劑之中,就可得到BHAST耐性,較佳為鏻鹽類。The light-shielding curable resin composition may contain a curing accelerator. The curing accelerator is used to accelerate the heat curing reaction in order to improve the properties such as adhesion, chemical resistance and heat resistance. Specific examples of such curing accelerators include imidazole and its derivatives; guanamines such as acetoguanamine and benzoguanamine; polyamines such as diaminodiphenylmethane, m-phenylenediamine, m-xylenediamine, diaminodiphenylsulfone, cyanamide, urea, urea derivatives, melamine, polyhydrazine, etc.; organic acid salts and/or epoxy adducts thereof; amine complexes of boron trifluoride; ethyldiamino-S-triazine, 2- ,4-diamino-S-triazine, 2,4-diamino-6-xylyl-S-triazine and other triazine derivatives; trimethylamine, triethanolamine, N,N-dimethyloctylamine, N-benzyldimethylamine, pyridine, N-methylmorpholine, hexa(N-methyl)melamine, 2,4,6-tris(dimethylaminophenol), tetramethylguanidine, m-aminophenol and other amines; polyvinylphenol, poly Polyphenols such as vinylphenol bromide, phenol novolac, alkylphenol novolac, etc.; organic phosphines such as tributylphosphine, triphenylphosphine, tri-2-cyanoethylphosphine, etc.; phosphonium salts such as tri-n-butyl (2,5-dihydroxyphenyl) phosphonium bromide, hexadecyltributylphosphonium chloride, etc.; quaternary ammonium salts such as benzyltrimethylammonium chloride, phenyltributylammonium chloride, etc.; the aforementioned polyacid anhydrides; diphenyl iodide The photocatalysts for the photopolymerization of tetrafluoroborate, triphenylphosphine hexafluoroantimonate, 2,4,6-triphenylthiopyrimidinium hexafluorophosphate, etc.; styrene-maleic anhydride resin; equimolar reactants of phenylisocyanate and dimethylamine, equimolar reactants of organic polyisocyanates such as methylphenyl diisocyanate and isophorone diisocyanate and dimethylamine, and metal catalysts are conventionally known hardening accelerators. Among the hardening accelerators, phosphonium salts are preferred for obtaining BHAST resistance.
硬化促進劑可1種單獨使用或混合2種以上使用。硬化促進劑之使用非必須,但是特別是欲促進硬化時,相對於環氧樹脂100質量份,較佳為在0.01~5質量份之範圍內使用。金屬觸媒的情形,相對於具有氰酸酯基之化合物100質量份,以金屬換算,較佳為10~550ppm,更佳為25~200ppm。The curing accelerator may be used alone or in combination of two or more. The use of a curing accelerator is not essential, but when the curing is to be accelerated, it is preferably used in an amount of 0.01 to 5 parts by mass relative to 100 parts by mass of the epoxy resin. In the case of a metal catalyst, the amount is preferably 10 to 550 ppm, more preferably 25 to 200 ppm, relative to 100 parts by mass of the compound having a cyanate group, in terms of metal.
有機溶劑無特別限制,可列舉例如酮類、芳香族烴類、二醇醚類、乙二醇醚乙酸酯類、酯類、醇類、脂肪族烴、石油系溶劑等。具體而言,可列舉甲基乙基酮、環己酮、甲基丁基酮、甲基異丁基酮等之酮類;甲苯、二甲苯、四甲基苯等之芳香族烴類;溶纖劑(Cellosolve)、甲基溶纖劑、丁基溶纖劑、卡必醇、甲基卡必醇、丁基卡必醇、乙二醇單甲醚、乙二醇單乙醚、乙二醇單丁醚、丙二醇單甲醚、二丙二醇單甲醚、二丙二醇二乙醚、三乙二醇單乙醚等之二醇醚類;乙酸乙酯、乙酸丁酯、乙酸異丁酯、乙二醇單乙醚乙酸酯、二丙二醇甲醚乙酸酯、丙二醇甲醚乙酸酯、丙二醇乙醚乙酸酯、丙二醇丁醚乙酸酯等之酯類;乙醇、丙醇、2-甲氧基丙醇、n-丁醇、異丁基醇、異戊醇、乙二醇、丙二醇等之醇類;辛烷、癸烷等之脂肪族烴;石油醚、石油腦、氫化石油腦、溶劑石油腦等之石油系溶劑等,及N,N-二甲基甲醯胺(DMF)、四氯乙烯、松節油等。又,可使用丸善石油化學公司製Swasol 1000、Swasol 1500、三共化學公司製solvent#100、solvent#150、Shell Chemicals Japan公司製shellsol A100、shellsol A150、出光興產公司製Ipsol 100號、Ipsol 150號等之有機溶劑。有機溶劑可1種單獨使用,也可作為2種以上的混合物使用。The organic solvent is not particularly limited, and examples thereof include ketones, aromatic hydrocarbons, glycol ethers, glycol ether acetates, esters, alcohols, aliphatic hydrocarbons, petroleum-based solvents, and the like. Specifically, examples thereof include ketones such as methyl ethyl ketone, cyclohexanone, methyl butyl ketone, and methyl isobutyl ketone; aromatic hydrocarbons such as toluene, xylene, and tetramethylbenzene; glycol ethers such as Cellosolve, methyl Cellosolve, butyl Cellosolve, carbitol, methyl carbitol, butyl carbitol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol diethyl ether, and triethylene glycol monoethyl ether; ethyl acetate, butyl acetate; , isobutyl acetate, ethylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol butyl ether acetate, etc.; alcohols such as ethanol, propanol, 2-methoxypropanol, n-butanol, isobutyl alcohol, isoamyl alcohol, ethylene glycol, propylene glycol, etc.; aliphatic hydrocarbons such as octane and decane; petroleum solvents such as petroleum ether, petroleum naphtha, hydrogenated petroleum naphtha, solvent naphtha, etc.; and N,N-dimethylformamide (DMF), tetrachloroethylene, turpentine, etc. In addition, organic solvents such as Swasol 1000 and Swasol 1500 manufactured by Maruzen Petrochemical Co., Ltd., solvent #100 and solvent #150 manufactured by Sankyo Chemical Co., Ltd., shellsol A100 and shellsol A150 manufactured by Shell Chemicals Japan Co., Ltd., and Ipsol No. 100 and Ipsol No. 150 manufactured by Idemitsu Kosan Co., Ltd. can be used. The organic solvent may be used alone or as a mixture of two or more.
遮光性硬化性樹脂組成物中之殘留溶劑量係以0.5~7.0質量%為佳。殘留溶劑為7.0質量%以下時,抑制熱硬化時之突然沸騰,表面之平坦性變得更良好。又,可抑制熔融黏度降得過低,樹脂流動,且平坦性變得良好。殘留溶劑為0.5質量%以上時,積層時之流動性良好,且平坦性及埋入性變得更良好。The amount of residual solvent in the light-shielding curable resin composition is preferably 0.5 to 7.0 mass %. When the residual solvent is 7.0 mass % or less, sudden boiling during heat curing is suppressed, and the surface flatness becomes better. In addition, the melt viscosity can be suppressed from falling too low, the resin flows, and the flatness becomes better. When the residual solvent is 0.5 mass % or more, the fluidity during layering is good, and the flatness and embedding properties become better.
遮光性硬化性樹脂組成物,必要時,可使用酞菁藍、酞菁綠、碘綠、雙偶氮黃、結晶紫、氧化鈦、萘黑等之以往公知的著色劑、石棉、Orben、Bentonite、微粉二氧化矽等之以往公知的增黏劑、聚矽氧系、氟系、高分子系等之消泡劑及/或平坦劑、噻唑系、三唑系、矽烷偶合劑等之密著性賦予劑、難燃劑、鈦酸酯系、鋁系之以往公知的添加劑類。The light-shielding curable resin composition may contain, if necessary, conventionally known colorants such as phthalocyanine blue, phthalocyanine green, iodine green, disazo yellow, crystal violet, titanium oxide, naphthalene black, etc., conventionally known thickeners such as asbestos, orben, bentonite, micro powdered silica, etc., defoaming agents and/or leveling agents such as polysilicone, fluorine, and polymer, adhesion imparting agents such as thiazole, triazole, and silane coupling agents, flame retardants, and conventionally known additives such as titanium esters and aluminum.
使用由遮光性硬化性樹脂組成物所構成之乾薄膜之硬化性樹脂層的厚度,例如厚度為1~200μm即可。在此等厚度之範圍內,遮光性硬化性樹脂組成物中之無機填料之凝集粒子的最大徑為該硬化性樹脂層之厚度之二分之一以下。硬化性樹脂層之厚度大時,平坦性更優異,故例如厚度為30μm以上,50μm以上,及100μm以上可更適合使用。又,將硬化性樹脂層複數重疊,也可形成厚度超過200μm之硬化性樹脂層。此時,可使用輥積層機或真空積層機。The thickness of the hardening resin layer of the dry film composed of the light-shielding hardening resin composition may be, for example, 1 to 200 μm. Within this thickness range, the maximum diameter of the aggregated particles of the inorganic filler in the light-shielding hardening resin composition is less than half the thickness of the hardening resin layer. When the thickness of the hardening resin layer is large, the flatness is better, so, for example, a thickness of 30 μm or more, 50 μm or more, and 100 μm or more may be more suitable for use. In addition, by stacking multiple hardening resin layers, a hardening resin layer with a thickness exceeding 200 μm may be formed. At this time, a roll laminator or a vacuum laminator may be used.
[承載膜] 承載膜係指支撐乾薄膜之硬化性樹脂層者,形成該硬化性樹脂層時,塗佈遮光性硬化性樹脂組成物的薄膜。承載膜例如可使用聚對苯二甲酸乙二酯或聚萘二甲酸乙二酯等之聚酯薄膜、聚醯亞胺薄膜、聚醯胺醯亞胺薄膜、聚乙烯薄膜、聚四氟乙烯薄膜、聚丙烯薄膜、聚苯乙烯薄膜等之熱塑性樹脂所構成的薄膜、及進行表面處理的紙等。此等之中,就耐熱性、機械強度、使用性等的觀點,較佳為使用聚酯薄膜。承載膜之厚度,無特別限制,大概在10~150μm之範圍,依據用途適宜選擇。承載膜之設置硬化性樹脂層的面,可施予脫模處理。又,承載膜之設置硬化性樹脂層的面,也可濺鍍或形成極薄銅箔。[Carrier film] The carrier film refers to a film that supports the curable resin layer of the dry film. When the curable resin layer is formed, a light-shielding curable resin composition is applied to the film. Examples of the carrier film include polyester films such as polyethylene terephthalate or polyethylene naphthalate, polyimide films, polyamide imide films, polyethylene films, polytetrafluoroethylene films, polypropylene films, polystyrene films, and surface-treated paper. Among these, polyester films are preferably used from the perspectives of heat resistance, mechanical strength, and usability. The thickness of the carrier film is not particularly limited, and is generally in the range of 10 to 150 μm, and can be appropriately selected according to the intended use. The surface of the carrier film on which the curable resin layer is provided may be subjected to a mold release treatment. Furthermore, the surface of the carrier film on which the curable resin layer is provided can also be sputter-plated or formed with an extremely thin copper foil.
[保護薄膜] 保護薄膜係為了防止在乾薄膜之硬化性樹脂層的表面附著塵埃等,同時提高使用性為目的,被設置於與硬化性樹脂層之承載膜相反的面。保護薄膜使用2軸延伸聚丙烯薄膜(OPP)為佳。由於2軸延伸聚丙烯薄膜,可減少對硬化性樹脂層之積層後之冷卻收縮。保護薄膜不限定於2軸延伸聚丙烯薄膜者。保護薄膜之厚度,無特別限制,大概在10~100μm之範圍內,依據用途適宜選擇。保護薄膜之設置硬化性樹脂層的面,施予壓紋加工或電暈處理、微黏著處理等之提高密著性的處理或、脫模處理為佳。[Protective film] The protective film is placed on the opposite side of the carrier film of the curable resin layer to prevent dust from adhering to the surface of the curable resin layer of the dry film and to improve usability. It is preferably a biaxially oriented polypropylene film (OPP) as the protective film. Since the biaxially oriented polypropylene film is used, the cooling shrinkage of the curable resin layer after lamination can be reduced. The protective film is not limited to biaxially oriented polypropylene film. The thickness of the protective film is not particularly limited and is generally in the range of 10 to 100 μm and can be appropriately selected according to the application. The surface of the protective film on which the curable resin layer is placed is preferably subjected to embossing, corona treatment, micro-adhesion treatment, or other treatments to improve adhesion or mold release.
本發明之乾薄膜係積層於半導體晶圓等,藉由使硬化性樹脂層硬化作為硬化物,適合用於電子零件、特別是半導體裝置、印刷配線板或光學感應器模組之封裝材料或永久保護膜之形成。其中,適合半導體晶片用之封裝材料。使用本發明之乾薄膜,藉由貼合配線,也可形成配線板。The dry film of the present invention is laminated on a semiconductor wafer, etc., and the curable resin layer is cured to form a cured product, which is suitable for use in electronic parts, especially semiconductor devices, printed wiring boards, or the formation of permanent protective films for optical sensor modules. Among them, it is suitable for packaging materials for semiconductor chips. Using the dry film of the present invention, wiring boards can also be formed by bonding wiring.
本發明之遮光性硬化性樹脂組成物之硬化物、或使用本發明之乾薄膜之硬化物的電子零件,例如有半導體裝置、印刷配線板或光學感應器模組。此電子零件之製造方法,也可使用以往習知的方法。 實施例The cured product of the light-shielding curable resin composition of the present invention, or the electronic parts using the cured product of the dry film of the present invention, for example, include semiconductor devices, printed wiring boards, or optical sensor modules. The manufacturing method of this electronic part can also use the method known in the past. Example
以下顯示本發明之實施例及比較例,具體地說明本發明,本發明不限定於此等實施例者。又,以下「份」及「%」,無特別聲明時,全部為質量基準。The following are examples and comparative examples of the present invention to specifically illustrate the present invention, but the present invention is not limited to these examples. In addition, the following "parts" and "%" are all based on mass unless otherwise stated.
<遮光性硬化性樹脂組成物之調製> 將實施例及比較例之溶劑置入容器中,避免使溶劑揮發,邊加溫至50℃邊攪拌,接著分別加入樹脂成分及偶合劑。確認樹脂成分溶解後,加入實施例所記載之無機填料與著色劑,進行充分地攪拌。然後,以填充有二氧化鋯珠(zirconia beads)之珠磨機進行混練,調製遮光性硬化性樹脂組成物。珠磨機使用錐形(Conical type)K-8(Buehler公司製),在旋轉數1200rpm、吐出量20%、珠粒徑0.65mm、填充率88%的條件下混練。又,表中之數值,特別是無%之記載時,表示質量份,又,溶劑、高分子樹脂及奈米二氧化矽(nano silica)以外,表示固體成分量。<Preparation of light-shielding curable resin composition> Put the solvents of the examples and comparative examples in a container, heat to 50°C and stir to prevent the solvents from volatilizing, and then add the resin components and coupling agents respectively. After confirming that the resin components are dissolved, add the inorganic fillers and colorants described in the examples and stir thoroughly. Then, knead with a bead mill filled with zirconia beads to prepare a light-shielding curable resin composition. The bead mill uses a conical type K-8 (manufactured by Buehler) and kneads at a rotation speed of 1200 rpm, a discharge volume of 20%, a bead diameter of 0.65 mm, and a filling rate of 88%. In addition, the numerical values in the table, especially when there is no % description, represent the mass part, and except for the solvent, polymer resin and nano silica, represent the solid content.
<分散性> 將調製後的遮光性硬化性樹脂組成物依據JIS K5600-2-5分散度的方法,使用0-50μm的粒度計確認分散度。評價基準如下述。又,使用粒度計所得之凝集粒子之最大粒徑示於表中。 〇:以5粒值判斷的分散度為20μm以下 △:以5粒值判斷的分散度超過20μm未達30μm ×:以5粒值判斷的分散度超過30μm<Dispersibility> The prepared light-shielding curable resin composition was confirmed for dispersion using a 0-50μm particle size meter according to the JIS K5600-2-5 dispersion method. The evaluation criteria are as follows. In addition, the maximum particle size of the agglomerated particles obtained using the particle size meter is shown in the table. ○: The dispersion determined by the 5-particle value is 20μm or less △: The dispersion determined by the 5-particle value exceeds 20μm and does not reach 30μm ×: The dispersion determined by the 5-particle value exceeds 30μm
<組成物(油墨)之沉降抑制> 將調製後的遮光性硬化性樹脂組成物置入透明玻璃螺桿管中,在設定為23℃的恆溫槽中,進行12小時保管熟成處理。將遮光性硬化性樹脂組成物投入由螺桿管之底部至50mm。熟成後,取出遮光性硬化性樹脂組成物,由側面以目視觀察,確認遮光性硬化性樹脂組成物之沉降狀態。判斷基準如下述。 〇:未看到沉降。 △:由組成物之上部,確認未達1mm之透明的上澄液。 ×:由組成物之上部,確認20mm以上之透明的上澄液。<Inhibition of sedimentation of composition (ink)> The prepared light-shielding curable resin composition was placed in a transparent glass screw tube and stored in a constant temperature bath set at 23°C for 12 hours for aging. The light-shielding curable resin composition was poured from the bottom of the screw tube to 50 mm. After aging, the light-shielding curable resin composition was taken out and visually observed from the side to confirm the sedimentation state of the light-shielding curable resin composition. The judgment criteria are as follows. 0: No sedimentation was observed. △: A transparent supernatant less than 1 mm was confirmed from the upper part of the composition. ×: A transparent supernatant of more than 20 mm was confirmed from the upper part of the composition.
<乾薄膜之製作> 將調製後之遮光性硬化性樹脂組成物調整溶劑的量,使成為黏度0.5~20dPa・s(轉動黏度計5rpm、25℃),分別使用塗佈棒,塗佈於承載膜(PET薄膜;東洋紡公司製TN-200,厚度38μm、大小30cm×30cm),並使硬化性樹脂層之膜厚在乾燥後成為40μm。接著,以熱風循環式乾燥爐,於70~120℃(平均100℃)下乾燥5~10分鐘,使硬化性樹脂層之殘留溶劑成為0.5~2.5質量%,在承載膜上形成硬化性樹脂層。接著,製作後之乾薄膜的表面,使用設定為80℃之溫度的輥積層機,黏貼2軸延伸聚丙烯薄膜(OPP、alphan FG-201、Fish Aires、ojif-tex公司製),製作3層構造的乾薄膜。<Preparation of dry film> The amount of solvent in the prepared light-shielding curable resin composition was adjusted to a viscosity of 0.5~20dPa・s (rotational viscometer 5rpm, 25℃), and applied to a carrier film (PET film; TN-200 manufactured by Toyobo Co., Ltd., thickness 38μm, size 30cm×30cm) using a coating rod, and the film thickness of the curable resin layer was made to be 40μm after drying. Then, it was dried in a hot air circulation drying oven at 70~120℃ (average 100℃) for 5~10 minutes, so that the residual solvent in the curable resin layer was made to be 0.5~2.5% by mass, and a curable resin layer was formed on the carrier film. Next, a biaxially oriented polypropylene film (OPP, alphan FG-201, Fish Aires, ojif-tex) was laminated on the surface of the prepared dry film using a roll laminator set at 80°C to prepare a three-layer dry film.
<透過率> 將製得之3層構造之乾薄膜的保護薄膜剝離,使用真空積層機MVLP-500(名機製作所製)黏貼於厚度1mm的載玻片上。在條件為積層溫度80~110℃、壓力0.5MPa下進行。接著,剝離承載膜後,使用熱風循環式乾燥爐,在100℃×30min及200℃×60min的條件下使樹脂層硬化。所得之硬化物,使用紫外可見光近紅外分光光度計V-700(日本分光製),測定380nm~780nm下的透過率。評價基準如下述。 ◎:全波長範圍下,透過率未達0.1% ○:全波長範圍下,透過率0.1%以上,未達0.5% ×:全波長範圍下,透過率0.5%以上<Transmittance> The protective film of the obtained 3-layer dry film was peeled off and pasted on a 1mm thick slide using a vacuum laminator MVLP-500 (produced by Meiki Seisakusho). The lamination temperature was 80~110℃ and the pressure was 0.5MPa. Then, after peeling off the carrier film, the resin layer was cured in a hot air circulation drying oven at 100℃×30min and 200℃×60min. The obtained cured product was measured for transmittance at 380nm~780nm using a UV-visible near-infrared spectrophotometer V-700 (produced by JASCO Corporation). The evaluation criteria are as follows. ◎: Transmittance is less than 0.1% in the full wavelength range ○: Transmittance is above 0.1% and below 0.5% in the full wavelength range ×: Transmittance is above 0.5% in the full wavelength range
<切割耐性> 將製得之3層構造之乾薄膜的保護薄膜剝離,使用真空積層機MVLP-500(名機製作所製)黏貼於厚度700μm之8吋矽晶圓上。在條件為積層溫度80~110℃、壓力0.5MPa下進行。接著,剝離承載膜後,使用熱風循環式乾燥爐,在100℃×30min及200℃×60min的條件下使樹脂層硬化。接著,切割機DFD6240(DISCO公司製、裝設陶瓷刀片),評價硬化膜的切割耐性。在切割之條件為旋轉數10000rpm、輸送速度1mm/min下進行。評價基準如下述。 ◎:未發生硬化膜表面之毛邊、樹脂之缺損 〇:硬化膜表面發生的毛邊、樹脂之缺損的長度未達1.0mm ×:硬化膜表面發生的毛邊、樹脂之缺損的長度為1.0mm以上<Cutting resistance> The protective film of the obtained 3-layer dry film was peeled off and pasted on an 8-inch silicon wafer with a thickness of 700μm using a vacuum laminator MVLP-500 (manufactured by Meiki Manufacturing). The conditions were lamination temperature 80~110℃ and pressure 0.5MPa. Then, after peeling off the carrier film, the resin layer was cured at 100℃×30min and 200℃×60min using a hot air circulation drying furnace. Then, the cutting machine DFD6240 (manufactured by DISCO, equipped with a ceramic blade) was used to evaluate the cutting resistance of the cured film. The cutting conditions were rotation number 10000rpm and conveying speed 1mm/min. The evaluation criteria are as follows. ◎: No burrs or resin defects on the surface of the cured film ○: The length of burrs or resin defects on the surface of the cured film is less than 1.0 mm ×: The length of burrs or resin defects on the surface of the cured film is more than 1.0 mm
<基板之翹曲>
在銅厚12μm、板厚0.1mm之貼銅積層板(MCL-E-770G、日立化成公司製、尺寸10×10cm)上,以電鍍銅(atotech公司、電鍍後的表面粗糙度100nm以下)處理,銅厚合計為20μm。接著,進行前處理CZ-8101(1μm蝕刻、MEC公司製)。然後,將剝離OPP後之乾薄膜,使用2腔室式真空積層機CVP-600(nichigo-morton製)黏貼於基板上的單面。條件係積層、壓製各自為溫度80~110℃、壓力0.5MPa下進行。接著,剝離承載膜後,使用熱風循環式乾燥爐,在100℃×30min及200℃×60min之條件下,使樹脂層硬化。
接著,設定為波峰溫度280℃、275℃以上之曝露時間10秒以上之回焊處理進行5循環,以游標尺量測基板之4角的翹曲狀態(翹曲形狀皆為微笑)。評價基準如以下。
◎:無翹曲
〇:4角之中,翹曲最大部分的翹曲量未達10mm
△:4角之中,翹曲最大部分的翹曲量為10mm以上、未達30mm
×:4角之中,翹曲最大部分的翹曲量為30mm以上<Warp of substrate>
On a copper-laminated board with a copper thickness of 12μm and a board thickness of 0.1mm (MCL-E-770G, manufactured by Hitachi Chemical Co., Ltd.,
表1表示各成分之調配比例與評價結果。Table 1 shows the mixing ratio of each component and the evaluation results.
表1中之注釋*1~17係如下述。 *1:Mitsubishi Chemical公司製jER828、雙酚A型環氧樹脂、環氧當量189g/eq、液狀 *2:日本化藥公司製NC-3000H、聯苯基酚醛清漆型環氧化合物、環氧當量290g/eq、 *3:Lonza Japan公司製Primaset PT-30、酚醛清漆型氰酸酯樹脂、氰酸酯當量124g/eq、固體 *4:DIC公司製EPICLON HPC-8000、活性酯樹脂、活性當量223g/eq、固體 *5:明和化成公司製HF-1M、苯酚酚醛清漆樹脂 *6:四國化成公司製2E4MZ、2-乙基-4-甲基咪唑 *7:東京化成工業公司製乙醯丙酮鈷(II) *8:玻璃轉移溫度為20℃以下,且重量平均分子量為1萬以上之高分子樹脂,nagase chemtex公司製teisanresin SG-80H去除MEK的製品、固體成分18質量%、丙烯酸酯共聚樹脂(官能基:環氧基、醯胺基) *9:Mitsubishi Chemical公司製碳黑粉末MA77(平均粒徑23nm) *10:Paliogen Red K 3580、Pigment Red 149、BASF公司製、苝系著色劑 *11:Solvent Green 3、東京化成工業公司製、綠色蒽醌系著色劑 *12:Fastogen blue 5380、DIC公司製、酞菁藍 *13:Cromophtal(註冊商標)Red A2BN、BASF公司製、紅色蒽醌系著色劑 *14:Denka公司製二氧化矽微粒子FB-3SDC(D50= 3.1μm) *15:admatechs公司製二氧化矽微粒子SO-E1(D50= 0.2μm) *16:admatechs公司製奈米二氧化矽(D50=50nm)、固體成分30質量% *17:信越化學公司製環氧基矽烷偶合劑KBM-403Notes *1 to 17 in Table 1 are as follows. *1: jER828 manufactured by Mitsubishi Chemical, bisphenol A type epoxy resin, epoxy equivalent 189 g/eq, liquid *2: NC-3000H manufactured by Nippon Kayaku, biphenyl novolac type epoxy compound, epoxy equivalent 290 g/eq, *3: Primaset PT-30 manufactured by Lonza Japan, novolac type cyanate resin, cyanate equivalent 124 g/eq, solid *4: EPICLON manufactured by DIC HPC-8000, active ester resin, active equivalent 223g/eq, solid *5: HF-1M, phenol novolac resin, manufactured by Meiwa Chemicals *6: 2E4MZ, 2-ethyl-4-methylimidazole, manufactured by Shikoku Chemicals *7: Cobalt(II) acetylacetonate, manufactured by Tokyo Chemical Industry *8: Polymer resin with a glass transition temperature of 20°C or less and a weight average molecular weight of 10,000 or more, Teisanresin SG-80H manufactured by Nagase Chemtex, MEK-free product, solid content 18% by mass, acrylic copolymer resin (functional groups: epoxy, amide) *9: Carbon black powder MA77 manufactured by Mitsubishi Chemical (average particle size 23nm) *10: Paliogen Red K 3580, Pigment Red 149, BASF, perylene-based colorant *11: Solvent Green 3, Tokyo Chemical Industry, green anthraquinone-based colorant *12: Fastogen blue 5380, DIC, phthalocyanine blue *13: Cromophtal (registered trademark) Red A2BN, BASF, red anthraquinone-based colorant *14: Denka, silica particles FB-3SDC (D50 = 3.1μm) *15: admatechs, silica particles SO-E1 (D50 = 0.2μm) *16: admatechs, nanosilica (D50 = 50nm), solid content 30 mass% *17: Shin-Etsu Chemical, epoxy silane coupling agent KBM-403
由上述表1所示的結果得知,各實施例所示具備有由遮光性硬化性樹脂組成物所構成之硬化性樹脂層的乾薄膜,其分散性、油墨之沉降抑制性、光透過抑制性(換言之,遮光性)、切割耐性、基板之翹曲抑制性優異。From the results shown in Table 1 above, it can be seen that the dry film having a curable resin layer composed of a light-shielding curable resin composition shown in each embodiment is excellent in dispersibility, ink sedimentation suppression, light transmission suppression (in other words, light-shielding property), cutting resistance, and substrate warping suppression.
11:乾薄膜 12:硬化性樹脂層 13:承載膜 14:保護薄膜11: Dry film 12: Curable resin layer 13: Carrier film 14: Protective film
[圖1]示意地表示本發明之乾薄膜之一實施態樣之概略斷面圖。 [圖2]將著色劑之色彩以L*a*b*顏色系統(color system)中之a*值及b*值作為座標軸表示的圖。[Figure 1] is a schematic cross-sectional view of one embodiment of the dry film of the present invention. [Figure 2] is a diagram showing the color of the colorant using the a* value and b* value in the L*a*b* color system as coordinate axes.
Claims (8)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019059068 | 2019-03-26 | ||
JP2019-059068 | 2019-03-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202108362A TW202108362A (en) | 2021-03-01 |
TWI846846B true TWI846846B (en) | 2024-07-01 |
Family
ID=72611373
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109109916A TWI846846B (en) | 2019-03-26 | 2020-03-25 | Dry films, hardened materials and electronic parts |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2020195843A1 (en) |
KR (1) | KR20210145772A (en) |
CN (1) | CN113614153A (en) |
TW (1) | TWI846846B (en) |
WO (1) | WO2020195843A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115926576A (en) * | 2022-12-13 | 2023-04-07 | 东莞市毅联电子科技有限公司 | Shading coating for flexible circuit board and preparation method and use method thereof |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201348873A (en) * | 2012-04-23 | 2013-12-01 | Hitachi Chemical Co Ltd | Photosensitive resin composition, photosensitive film, permanent mask resist and method for manufacturing permanent mask resist |
JP2016050224A (en) * | 2014-08-29 | 2016-04-11 | 積水化成品工業株式会社 | Adhesive composition, adhesive sheet, adhesion method for adherend and composite material |
JP2017178990A (en) * | 2016-03-28 | 2017-10-05 | 日本ゼオン株式会社 | Resin composition and electronic component |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005238469A (en) * | 2004-02-24 | 2005-09-08 | Tosoh Corp | Laminate |
JP5624184B1 (en) | 2013-06-28 | 2014-11-12 | 太陽インキ製造株式会社 | Dry film and printed wiring board |
-
2020
- 2020-03-11 JP JP2021509008A patent/JPWO2020195843A1/ja active Pending
- 2020-03-11 WO PCT/JP2020/010575 patent/WO2020195843A1/en active Application Filing
- 2020-03-11 KR KR1020217033704A patent/KR20210145772A/en unknown
- 2020-03-11 CN CN202080024320.4A patent/CN113614153A/en active Pending
- 2020-03-25 TW TW109109916A patent/TWI846846B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW201348873A (en) * | 2012-04-23 | 2013-12-01 | Hitachi Chemical Co Ltd | Photosensitive resin composition, photosensitive film, permanent mask resist and method for manufacturing permanent mask resist |
JP2016050224A (en) * | 2014-08-29 | 2016-04-11 | 積水化成品工業株式会社 | Adhesive composition, adhesive sheet, adhesion method for adherend and composite material |
JP2017178990A (en) * | 2016-03-28 | 2017-10-05 | 日本ゼオン株式会社 | Resin composition and electronic component |
Also Published As
Publication number | Publication date |
---|---|
KR20210145772A (en) | 2021-12-02 |
CN113614153A (en) | 2021-11-05 |
TW202108362A (en) | 2021-03-01 |
JPWO2020195843A1 (en) | 2020-10-01 |
WO2020195843A1 (en) | 2020-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102689382B1 (en) | Dry film, cured product, and electronic component | |
JP7169076B2 (en) | Thermosetting resin composition, dry film, cured product, and electronic component | |
KR20160041788A (en) | Dry film, cured product and printed wiring board | |
KR102429729B1 (en) | Dry film, cured product and printed wiring board | |
WO2018142827A1 (en) | Dry film, cured product, printed wiring board, and method for manufacturing cured product | |
JP7505527B2 (en) | Resin composition | |
TW201307470A (en) | Thermocuring resin composition, dry film and printed wiring board | |
JP7133955B2 (en) | Thermosetting resin composition, dry film, cured product, and electronic component | |
JPWO2020158202A1 (en) | Curable resin compositions, dry films, cured products, and electronic components | |
TWI846846B (en) | Dry films, hardened materials and electronic parts | |
JP7300601B2 (en) | Thermosetting resin composition, dry film, cured product, and electronic component | |
KR102313172B1 (en) | Dry film, cured product, and electronic component | |
JP7511399B2 (en) | Curable resin composition, dry film, cured product, electronic parts | |
JP7263701B2 (en) | Resin sheet with support | |
TWI844644B (en) | Dry films, hardened materials and electronic parts for hollow devices | |
WO2024204710A1 (en) | Multi-chip module board | |
JP2020105399A (en) | Curable resin composition, dry film, cured product and electronic component | |
TWI851551B (en) | Dry film, hardened material and electronic parts | |
JP7454394B2 (en) | Dry film, cured product, electronic components, and dry film manufacturing method | |
JP2024117683A (en) | Resin composition | |
WO2022196696A1 (en) | Resin sheet |