TWI845791B - 在零部件上形成耐等離子體塗層的方法、零部件和等離子體處理裝置 - Google Patents

在零部件上形成耐等離子體塗層的方法、零部件和等離子體處理裝置 Download PDF

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Publication number
TWI845791B
TWI845791B TW109140623A TW109140623A TWI845791B TW I845791 B TWI845791 B TW I845791B TW 109140623 A TW109140623 A TW 109140623A TW 109140623 A TW109140623 A TW 109140623A TW I845791 B TWI845791 B TW I845791B
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TW
Taiwan
Prior art keywords
component
plasma
processing device
resistant coating
plasma processing
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TW109140623A
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English (en)
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TW202137278A (zh
Inventor
段蛟
孫祥
陳星建
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大陸商中微半導體設備（上海）股份有限公司
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Priority claimed from CN201911228894.9A external-priority patent/CN112908822B/zh
Application filed by 大陸商中微半導體設備（上海）股份有限公司 filed Critical 大陸商中微半導體設備（上海）股份有限公司
Publication of TW202137278A publication Critical patent/TW202137278A/zh
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Publication of TWI845791B publication Critical patent/TWI845791B/zh

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TW109140623A 2019-12-04 2020-11-19 在零部件上形成耐等離子體塗層的方法、零部件和等離子體處理裝置 TWI845791B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201911228894.9 2019-12-04
CN201911228894.9A CN112908822B (zh) 2019-12-04 2019-12-04 形成耐等离子体涂层的方法、零部件和等离子体处理装置

Publications (2)

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TW202137278A TW202137278A (zh) 2021-10-01
TWI845791B true TWI845791B (zh) 2024-06-21

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100119843A1 (en) 2008-11-10 2010-05-13 Applied Materials, Inc. Plasma resistant coatings for plasma chamber components

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100119843A1 (en) 2008-11-10 2010-05-13 Applied Materials, Inc. Plasma resistant coatings for plasma chamber components

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