TWI845776B - Vacuum pump apparatus - Google Patents
Vacuum pump apparatus Download PDFInfo
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- TWI845776B TWI845776B TW109135333A TW109135333A TWI845776B TW I845776 B TWI845776 B TW I845776B TW 109135333 A TW109135333 A TW 109135333A TW 109135333 A TW109135333 A TW 109135333A TW I845776 B TWI845776 B TW I845776B
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- side cover
- heater
- vacuum pump
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- rotor
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- 238000009413 insulation Methods 0.000 claims description 47
- 238000001816 cooling Methods 0.000 description 25
- 239000007789 gas Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 16
- 239000000463 material Substances 0.000 description 13
- 238000010586 diagram Methods 0.000 description 12
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 9
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 9
- 239000006227 byproduct Substances 0.000 description 9
- 239000012212 insulator Substances 0.000 description 8
- 239000000110 cooling liquid Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 229910001018 Cast iron Inorganic materials 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 5
- 101000827703 Homo sapiens Polyphosphoinositide phosphatase Proteins 0.000 description 4
- 102100023591 Polyphosphoinositide phosphatase Human genes 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 101100012902 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) FIG2 gene Proteins 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- -1 polytetrafluoroethylene Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 238000000859 sublimation Methods 0.000 description 2
- 230000008022 sublimation Effects 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
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Abstract
Description
本發明關於一種真空泵裝置,特別是關於適合用於對半導體元件、液晶、LED、太陽能電池等的製造中使用的製程氣體進行排氣的用途的真空泵裝置。 The present invention relates to a vacuum pump device, and in particular to a vacuum pump device suitable for exhausting process gases used in the manufacture of semiconductor elements, liquid crystals, LEDs, solar cells, etc.
在對半導體元件、液晶面板、LED、太陽能電池等進行製造的製造製程中,將製程氣體導入製程腔室內而進行蝕刻處理、CVD處理等各種處理。導入到製程腔室的製程氣體由真空泵裝置進行排氣。一般地,需要較高的清潔度的這些製造製程中使用的真空泵裝置是在氣體的流路內不使用油的、所謂的乾式真空泵裝置。作為這樣的乾式真空泵裝置的代表例,存在使配置在轉子室內的一對泵轉子相互向相反方向旋轉而移送氣體的容積式真空泵裝置。 In the manufacturing process of semiconductor components, liquid crystal panels, LEDs, solar cells, etc., process gases are introduced into the process chamber to perform various processes such as etching and CVD. The process gases introduced into the process chamber are exhausted by a vacuum pump device. Generally, the vacuum pump devices used in these manufacturing processes that require a higher degree of cleanliness are so-called dry vacuum pump devices that do not use oil in the gas flow path. As a representative example of such a dry vacuum pump device, there is a positive displacement vacuum pump device that transfers gas by rotating a pair of pump rotors arranged in a rotor chamber in opposite directions.
製程氣體有時包含昇華溫度較高的副生成物。若真空泵裝置的轉子室內的溫度較低,則有時副生成物在轉子室內固化,堆積於泵轉子、泵殼的內表面。固化的副生成物阻礙泵轉子的旋轉,引起泵轉子的速度降低,在最差的情況下引起真空泵裝置的運轉停止。因此,為了防止副生成物的固化,而在泵殼的外表面安裝加熱器來加熱轉子室。 Process gases sometimes contain byproducts with high sublimation temperatures. If the temperature inside the rotor chamber of the vacuum pump device is low, the byproducts sometimes solidify inside the rotor chamber and accumulate on the inner surface of the pump rotor and pump housing. The solidified byproducts hinder the rotation of the pump rotor, causing the pump rotor speed to decrease, and in the worst case, causing the vacuum pump device to stop operating. Therefore, in order to prevent the solidification of byproducts, a heater is installed on the outer surface of the pump housing to heat the rotor chamber.
另一方面,需要對驅動泵轉子的電動機、固定在泵轉子的旋轉軸的齒輪進行冷卻。因此,上述的真空泵裝置通常具備用於對電動機和齒輪進行冷卻的冷卻系統。冷卻系統例如構成為,藉由使冷卻液向在收容電動機的馬達殼內設置的冷卻管流通、以及向在收容齒輪的齒輪殼內設置的冷卻管流通而對電動機和齒輪進行冷卻。藉由這樣的冷卻系統,能夠防止電動機和齒輪的過熱,實現真空泵裝置的穩定的運轉。 On the other hand, it is necessary to cool the motor that drives the pump rotor and the gear fixed to the rotating shaft of the pump rotor. Therefore, the above-mentioned vacuum pump device usually has a cooling system for cooling the motor and the gear. The cooling system is configured, for example, to cool the motor and the gear by circulating the cooling liquid through the cooling pipe provided in the motor housing that accommodates the motor and the cooling pipe provided in the gear housing that accommodates the gear. Such a cooling system can prevent overheating of the motor and the gear, and realize stable operation of the vacuum pump device.
(先前技術文獻) (Prior technical literature)
(專利文獻) (Patent Literature)
專利文獻1:日本特開2003-35290號公報 Patent document 1: Japanese Patent Publication No. 2003-35290
專利文獻2:日本特開2012-251470號公報 Patent document 2: Japanese Patent Publication No. 2012-251470
然而,由加熱器加熱後的泵殼的熱容易傳遞給溫度較低的馬達殼和齒輪殼。作為這樣的熱傳導的結果,泵殼內的轉子室的溫度有時降低。特別是,由於轉子室的端面位於接近溫度較低的馬達殼或者齒輪殼的位置,因此轉子室的端面的溫度容易降低。結果為,製程氣體中包含的副生成物有可能在轉子室內固化。作為對策之一,考慮使用高輸出的加熱器,但這樣的加熱器需要更多的電力,無法實現真空泵裝置的節能運轉。 However, the heat of the pump housing heated by the heater is easily transferred to the motor housing and gear housing with lower temperatures. As a result of such heat conduction, the temperature of the rotor chamber in the pump housing sometimes decreases. In particular, since the end surface of the rotor chamber is located close to the motor housing or gear housing with lower temperatures, the temperature of the end surface of the rotor chamber is easy to decrease. As a result, by-products contained in the process gas may solidify in the rotor chamber. As one of the countermeasures, the use of a high-output heater is considered, but such a heater requires more electricity and cannot achieve energy-saving operation of the vacuum pump device.
在此,本發明提供一種真空泵裝置,能夠將泵殼的轉子室的內部維持在較高的溫度。 Here, the present invention provides a vacuum pump device capable of maintaining the interior of the rotor chamber of the pump housing at a relatively high temperature.
在一個態樣中,提供一種真空泵裝置,具備:泵殼,係在內部具有轉子室;泵轉子,係配置在前述轉子室內;旋轉軸,係固定有前述泵轉子;電動機,係與前述旋轉軸連結;側罩,係形成前述轉子室的端面;以及側加熱器,係配置在前述側罩內。 In one embodiment, a vacuum pump device is provided, comprising: a pump casing having a rotor chamber therein; a pump rotor disposed in the rotor chamber; a rotating shaft to which the pump rotor is fixed; a motor connected to the rotating shaft; a side cover forming an end surface of the rotor chamber; and a side heater disposed in the side cover.
在一個態樣中,前述側加熱器被配置為包圍前述旋轉軸。 In one embodiment, the side heater is configured to surround the rotation axis.
在一個態樣中,前述側罩具有:形成前述轉子室的端面的內側側罩、以及在前述旋轉軸的軸向上位於前述內側側罩的外側的外側側罩;前述側加熱器配置在前述內側側罩與前述外側側罩之間。 In one embodiment, the side cover comprises: an inner side cover forming the end surface of the rotor chamber, and an outer side cover located on the outer side of the inner side cover in the axial direction of the rotating shaft; the side heater is arranged between the inner side cover and the outer side cover.
側加熱器能夠加熱側罩本身,因此能夠使藉由側罩而形成端面的轉子室內成為高溫。 The side heater can heat the side cover itself, thus making the rotor chamber, whose end surface is formed by the side cover, hot.
1:轉子室 1: Rotor chamber
2:泵殼 2: Pump casing
2a:吸氣口 2a: Intake port
2b:排氣口 2b: Exhaust port
5:泵轉子 5: Pump rotor
7:旋轉軸 7: Rotation axis
8:電動機 8: Motor
8A:馬達轉子 8A: Motor rotor
8B:馬達定子 8B: Motor stator
10A,10B:側罩 10A, 10B: Side shields
12:軸承殼 12: Bearing housing
14:馬達殼 14: Motor shell
16:齒輪殼 16: Gear housing
17:軸承 17: Bearings
18:軸承 18: Bearings
20:齒輪 20: Gear
21,22:冷卻管 21,22: Cooling tube
25A,25B:隔熱構造體 25A, 25B: Thermal insulation structure
27,45:通孔 27,45:Through hole
31A,31B:內側側罩 31A,31B: Inner side cover
32A,32B:外側側罩 32A,32B: External side covers
41A,41B:隔熱構件(隔熱板) 41A, 41B: Insulation components (insulation boards)
42A,42B:隔熱構件(隔熱襯墊) 42A, 42B: Thermal insulation components (thermal insulation pads)
47:凹陷 47: Depression
55A,55B:側加熱器 55A, 55B: Side heater
56:槽 56: Slot
58:孔 58: Hole
圖1是表示真空泵裝置的一實施型態的剖視圖。 FIG1 is a cross-sectional view showing an embodiment of a vacuum pump device.
圖2是圖1的A-A線剖視圖。 Figure 2 is a cross-sectional view taken along line A-A of Figure 1.
圖3是表示將複數個側加熱器配置在側罩內的一實施型態的圖。 FIG3 is a diagram showing an embodiment in which a plurality of side heaters are arranged in a side cover.
圖4(a)是表示將側加熱器配置在側罩內的其他的實施型態的圖,圖4(b)是圖4(a)的B-B線剖視圖。 FIG4(a) is a diagram showing another embodiment in which the side heater is arranged in the side cover, and FIG4(b) is a cross-sectional view taken along the line B-B of FIG4(a).
圖5(a)是表示將側加熱器配置在側罩內的另一其他的實施型態的圖,圖5(b)是圖5(a)的C-C線剖視圖。 FIG5(a) is a diagram showing another embodiment in which the side heater is arranged in the side cover, and FIG5(b) is a cross-sectional view taken along the line C-C of FIG5(a).
圖6(a)是表示將側加熱器配置在側罩內的另一其他的實施型態的圖,圖6(b)是圖6(a)的D-D線剖視圖。 FIG6(a) is a diagram showing another embodiment in which the side heater is arranged in the side cover, and FIG6(b) is a cross-sectional view taken along the D-D line of FIG6(a).
圖7(a)是表示將側加熱器配置在側罩內的另一其他的實施型態的圖,圖7(b)是圖7(a)的E-E線剖視圖。 FIG7(a) is a diagram showing another embodiment in which the side heater is arranged in the side cover, and FIG7(b) is a cross-sectional view taken along the E-E line of FIG7(a).
圖8(a)是表示將側加熱器配置在側罩內的另一其他的實施型態的圖,圖8(b)是圖8(a)的F-F線剖視圖。 FIG8(a) is a diagram showing another embodiment in which the side heater is arranged in the side cover, and FIG8(b) is a cross-sectional view taken along the F-F line of FIG8(a).
圖9是表示真空泵裝置的其他的實施型態的剖視圖。 FIG9 is a cross-sectional view showing another embodiment of the vacuum pump device.
圖10是表示真空泵裝置的另一其他的實施型態的剖視圖。 FIG10 is a cross-sectional view showing another embodiment of the vacuum pump device.
圖11是表示圖10所示的側罩和複數個隔熱構件的分解立體圖。 FIG. 11 is an exploded perspective view showing the side cover and a plurality of heat insulation components shown in FIG. 10 .
圖12是圖10的G-G線剖視圖。 Figure 12 is a cross-sectional view taken along line G-G of Figure 10.
圖13是表示將複數個側加熱器配置在側罩內的一實施型態的圖。 FIG. 13 is a diagram showing an embodiment in which a plurality of side heaters are arranged in a side cover.
圖14是表示真空泵裝置的另一其他的實施型態的剖視圖。 FIG14 is a cross-sectional view showing another embodiment of the vacuum pump device.
圖15是表示具備多級泵轉子的真空泵裝置的一實施型態的剖視圖。 FIG15 is a cross-sectional view showing an embodiment of a vacuum pump device having a multi-stage pump rotor.
以下,參照附圖而對本發明的實施型態進行說明。 The following describes the implementation of the present invention with reference to the attached drawings.
圖1是表示真空泵裝置的一實施型態的剖視圖。以下說明的實施型態的真空泵裝置是容積式真空泵裝置。特別是,圖1所示的真空泵裝置是在氣體的流路內不使用油的、所謂的乾式真空泵裝置。乾式真空泵裝置中的氣化的油不會向上游側流動,因此乾式真空泵裝置能夠適合用於需要較高的清潔度的半導體元件的製造裝置。 FIG1 is a cross-sectional view showing an embodiment of a vacuum pump device. The vacuum pump device of the embodiment described below is a positive displacement vacuum pump device. In particular, the vacuum pump device shown in FIG1 is a so-called dry vacuum pump device that does not use oil in the gas flow path. The vaporized oil in the dry vacuum pump device does not flow upstream, so the dry vacuum pump device can be suitable for use in semiconductor device manufacturing equipment that requires higher cleanliness.
如圖1所示,真空泵裝置具備:在內部具有轉子室1的泵殼2、配置在轉子室1內的泵轉子5、固定有泵轉子5的旋轉軸7、以及與旋轉軸7連結的電動機8。泵轉子5和旋轉軸7也可以是一體構造物。在圖1中,僅描繪一個泵轉子5、一個旋轉軸7和一個電動機8,但一對泵轉子5配置在轉子室1內,分別固定於一對旋轉軸7。一對電動機8分別與一對旋轉軸7連結。
As shown in FIG1 , the vacuum pump device includes: a
本實施型態的泵轉子5是羅茨型泵轉子,但泵轉子5的類型不限於本實施型態。在一實施型態中,泵轉子5也可以是螺桿型泵轉子。並且,本實施型態的泵轉子5是單級泵轉子,但在一實施型態中,泵轉子5也可以是多級泵轉子。
The
真空泵裝置更具備:在旋轉軸7的軸向上位於泵殼2的外側的側罩10A、10B。側罩10A、10B設置在泵殼2的兩側,與泵殼2連接。在本實施型態中,側罩10A、10B藉由未圖示的螺紋件而固定在泵殼2的端面。在一實施型態中,側罩10A、10B也可以與泵殼2一體。
The vacuum pump device is further equipped with side covers 10A and 10B located on the outer side of the
轉子室1由泵殼2的內表面和側罩10A、10B的內表面形成。泵殼2具有吸氣口2a和排氣口2b。吸氣口2a與由應移送的氣體充滿的腔室(未圖示)連結。在一例中,吸氣口2a與半導體元件的製造裝置的製程腔室連結,真空泵裝置用於對導入到製程腔室的製程氣體進行排氣的用途。
The
真空泵裝置更具備:在旋轉軸7的軸向上位於側罩10A、10B的外側的作為外殼構造體的軸承殼12、馬達殼14和齒輪殼16。側罩10A位於泵殼2與齒輪殼16之間,側罩10B位於泵殼2與軸承殼12之間。軸承殼12位於側罩10B與馬達殼14之間。
The vacuum pump device is further equipped with a bearing
旋轉軸7由配置在軸承殼12內的軸承17和配置在齒輪殼16內的軸承18被支承為能夠旋轉。馬達殼14在其內部收容電動機8的馬達轉子8A和馬達定子8B。軸承殼12、馬達殼14和齒輪殼16是外殼構造體的例子,外殼構造體不限於本實施型態。
The
兩個電動機8(在圖1中僅表示一個電動機8)藉由未圖示的馬達驅動器而同步地向相反方向旋轉,能夠使一對旋轉軸7和一對泵轉子5同步地向相反方向旋轉。當藉由電動機8使泵轉子5旋轉時,氣體被從吸氣口2a吸入到泵殼2內。氣體藉由旋轉的泵轉子5而從吸氣口2a向排氣口2b移送。
Two motors 8 (only one
在齒輪殼16的內部配置有相互嚙合的一對齒輪20。此外,在圖1中僅描繪一個齒輪20。像上述那樣,一對泵轉子5藉由兩個電動機8而同步地旋轉,因此作為齒輪20的作用是防止由於突發的外在因素導致的泵轉子5的同步旋轉的失步。
A pair of
在齒輪殼16內埋設有冷卻管21。同樣,在馬達殼14中埋設有冷卻管22。冷卻管21在齒輪殼16的整個周壁延伸,冷卻管22在馬達殼14的整個周壁延伸。冷卻管21和冷卻管22與未圖示的冷卻液供給源連結。從冷卻液供給源向冷卻管21和冷卻管22供給冷卻液。在冷卻管21中流動的冷卻液對齒輪殼16進行冷卻,由此能夠對配置在齒輪殼16內的齒輪20和軸承18進行冷卻。在冷卻管22中流動的冷卻液對馬達殼14和軸承殼12進行冷卻,藉此能夠對配置在馬達殼14內的電動機8和配置在軸承殼12內的軸承17進行冷卻。
A cooling
真空泵裝置具備分別配置在側罩10A、10B內的側加熱器55A、55B。側加熱器55A、55B與轉子室1鄰接地配置。側罩10A具備:形成轉子室
1的端面的內側側罩31A、以及在旋轉軸7的軸向上位於內側側罩31A的外側的外側側罩32A。側加熱器55A配置在內側側罩31A與外側側罩32A之間。
The vacuum pump device includes
圖2是圖1的A-A線剖視圖。如圖2所示,內側側罩31A的外表面具有包圍供旋轉軸7插入的通孔27的槽56,側加熱器55A設置在槽56內。側加熱器55A是配置為包圍在通孔27中貫通的旋轉軸7的環狀加熱器。側加熱器55A的種類沒有特別限定,但能夠將電氣式的加熱器的一種即護套加熱器用於側加熱器55A。
FIG2 is a cross-sectional view taken along line A-A of FIG1. As shown in FIG2, the outer surface of the
側罩10A位於比泵殼2更接近設置有冷卻管21的齒輪殼16的位置,因此側罩10A的溫度與泵殼2相比容易降低。根據圖1與圖2所示的實施型態,在泵殼2與齒輪殼(外殼構造體)16之間設置有側加熱器55A。側加熱器55A能夠加熱側罩10A本身,因此能夠使藉由側罩10A形成端面的轉子室1內成為高溫。特別是,能夠利用在冷卻管21中流動的冷卻液對齒輪殼16進行冷卻,並且側加熱器55A能夠將轉子室1內維持在高溫。
The side cover 10A is located closer to the
由本實施型態的真空泵裝置處理的製程氣體有時包含伴隨著溫度的降低而固化的副生成物。在真空泵裝置的運轉中,製程氣體在藉由泵轉子5而從吸氣口2a向排氣口2b移送的過程中被壓縮。因此,藉由製程氣體的壓縮熱,轉子室1的內部成為高溫。並且,根據本實施型態,藉由側加熱器55A來加熱側罩10A,能夠將轉子室1的內部維持在高溫。因此,能夠可靠地防止副生成物的固化。
The process gas handled by the vacuum pump device of this embodiment sometimes contains by-products that solidify as the temperature decreases. During the operation of the vacuum pump device, the process gas is compressed in the process of being transferred from the
用於將側加熱器55A配置在側罩10A內的具體的結構不限於圖1與圖2所示的實施型態。例如,也可以藉由鑄造而形成具有供側加熱器55A配
置的孔的側罩10A,在該孔內插入側加熱器55A。在該情況下,在側罩10A中內側側罩31A和外側側罩32A也可以不分離。
The specific structure for configuring the
在一實施型態中,如圖3所示,也可以將複數個側加熱器55A配置在側罩10A內。在圖3所示的實施型態中,並列延伸的兩個側加熱器55A配置在側罩10A內。也可以配置三個以上的側加熱器55A。
In one embodiment, as shown in FIG. 3 , a plurality of
圖4(a)是表示將側加熱器55A配置在側罩10A內的其他的實施型態的圖,圖4(b)是圖4(a)的B-B線剖視圖。也可以如圖4(a)與圖4(b)所示,側加熱器55A為棒狀。在內側側罩31A的側面形成有槽56,側加熱器55A配置在這些槽56內。供旋轉軸7插入的通孔27位於這些側加熱器55A之間。因此,側加熱器55A被配置為包圍在通孔27內延伸的旋轉軸7。在本實施型態中,兩個槽56相互平行地形成在通孔27的上方和下方,在這些槽56內分別配置有兩個側加熱器55A。側加熱器55A也位於通孔27的上方和下方,相互平行。圖4(a)與圖4(b)所示的實施型態具有容易形成槽56、能夠降低製造成本這樣的優點。
Fig. 4(a) is a diagram showing another embodiment in which the
圖5(a)是表示將側加熱器55A配置在側罩10A內的另一其他的實施型態的圖,圖5(b)是圖5(a)的C-C線剖視圖。也可以如圖5(a)與圖5(b)所示,以包圍供旋轉軸7插入的通孔27的方式配置棒狀的側加熱器55A。在該實施型態中,兩個槽56相互平行地形成在通孔27的上方和下方,進一步地兩個槽56相互平行地形成在通孔27的兩側。該四個槽56形成在內側側罩31A的側面。四個側加熱器55A分別配置在四個槽56內。這些側加熱器55A也包圍通孔27(和旋轉軸7)。這樣配置的側加熱器55A能夠均勻地加熱轉子室1。也可以設置五個以上的側加熱器55A。
FIG. 5(a) is a diagram showing another embodiment in which the
圖6(a)是表示將側加熱器55A配置在側罩10A內的另一其他的實施型態的圖,圖6(b)是圖6(a)的D-D線剖視圖。也可以如圖6(a)與圖6(b)所示,側加熱器55A為棒狀。在內側側罩31A的內部形成有孔58,側加熱器55A配置在這些孔58內。供旋轉軸7插入的通孔27位於這些側加熱器55A之間。因此,側加熱器55A被配置為包圍旋轉軸7。在本實施型態中,兩個孔58相互平行地形成在通孔27的上方和下方,在這些孔58內分別配置有兩個側加熱器55A。這些側加熱器55A也位於通孔27的上方和下方,相互平行。圖6(a)與圖6(b)所示的實施型態具有容易形成孔58、能夠降低製造成本這樣的優點。
Fig. 6(a) is a diagram showing another embodiment in which the
圖7(a)是表示將側加熱器55A配置在側罩10A內的另一其他的實施型態的圖,圖7(b)是圖7(a)的E-E線剖視圖。也可以如圖7(a)與圖7(b)所示,以包圍供旋轉軸7插入的通孔27的方式配置棒狀的側加熱器55A。在內側側罩31A的內部形成有孔58,側加熱器55A配置在這些孔58內。在該實施型態中,兩個孔58相互平行地形成在通孔27的上方和下方,進一步地兩個孔58相互平行地形成在通孔27的兩側。四個側加熱器55A分別配置在四個孔58內。這些側加熱器55A也包圍通孔27(和旋轉軸7)。這樣配置的側加熱器55A能夠均勻地加熱轉子室1。也可以設置五個以上的側加熱器55A。
FIG. 7(a) is a diagram showing another embodiment in which the
圖8(a)是表示將側加熱器55A配置在側罩10A內的另一其他的實施型態的圖,圖8(b)是圖8(a)的F-F線剖視圖。也可以如圖8(a)與圖8(b)所示,側加熱器55A為片材狀的加熱器。該側加熱器55A安裝在內側側罩31A的側面。在本實施型態中,側加熱器55A為包圍供旋轉軸7插入的通孔27的環狀,但側加熱器55A的形狀不限於本實施型態。例如,也可以像參照圖4至圖7而
說明的那樣,側加熱器55A以包圍供旋轉軸7通過的通孔27的方式呈直線狀延伸。
FIG8(a) is a diagram showing another embodiment in which the
參照圖2至圖8而說明的實施型態的側加熱器55A都與轉子室1鄰接。參照圖4至圖8而說明的側加熱器55A的配置是例子,並不意味著本發明限定於這些實施型態。
The
如圖1所示,側加熱器55B也配置在側罩10B內。側罩10B具備:形成轉子室1的端面的內側側罩31B、以及在旋轉軸7的軸向上位於內側側罩31B的外側的外側側罩32B。內側側罩31B的外表面具有槽(未圖示),側加熱器55B設置在槽內。側加熱器55B是以包圍旋轉軸7的方式配置的環狀加熱器或者棒狀加熱器。參照圖1至圖8的側加熱器55A和側罩10A的說明也能夠應用於側加熱器55B和側罩10B,因此省略側加熱器55B和側罩10B的其他的說明。
As shown in FIG1 , the
圖9是表示真空泵裝置的其他的實施型態的剖視圖。沒有特別說明的本實施型態的結構與參照圖1至圖8而說明的實施型態相同,因此省略其重複的說明。 FIG9 is a cross-sectional view showing another embodiment of the vacuum pump device. The structure of this embodiment not specifically described is the same as the embodiment described with reference to FIG1 to FIG8, so the repeated description thereof is omitted.
在側罩10A與齒輪殼(外殼構造體)16之間夾著作為隔熱體的隔熱構造體25A。側罩10A與齒輪殼16相互分離(相互不接觸),隔熱構造體25A與側罩10A和齒輪殼16雙方接觸。該隔熱構造體25A位於泵殼2與齒輪殼16之間,具有降低從泵殼2通過側罩10A而朝向齒輪殼16的導熱的功能。
An insulating
隔熱構造體25A具有比側罩10A低的熱傳導率。更具體而言,隔熱構造體25A由與構成側罩10A的材料相比熱傳導率低的材料構成。在本實施型態中,形成轉子室1的泵殼2和側罩10A、10B由鑄鐵構成。軸承殼12、馬達
殼14和齒輪殼16由鋁構成。隔熱構造體25A由與側罩10A的材料相比熱傳導率低的樹脂構成。在一例中,隔熱構造體25A由氟樹脂的一種即聚四氟乙烯(PTFE)構成。聚四氟乙烯(PTFE)具有比鑄鐵低的熱傳導率,並且具有能夠耐受高溫的性質。但是,只要是與側罩10A的材料相比熱傳導率低的材料,則隔熱構造體25A的材料也可以是不銹鋼、鈦、球狀石墨系奧氏體鑄鐵(Ni-resist)等金屬。
The
也可以在側罩10A與齒輪殼16之間配置有軸承殼等其他的外殼構造體。在這樣的情況下,隔熱構造體25A夾在側罩10A與該外殼構造體之間。
Another outer shell structure such as a bearing shell may be arranged between the
隔熱構造體25A為環狀,配置為包圍旋轉軸7的外周面。隔熱構造體25A的內側面與側罩10A的外側面接觸,隔熱構造體25A的外側面與齒輪殼16的內側的端面接觸。該隔熱構造體25A具有連續不斷的環狀的形狀,隔熱構造體25A也作為將側罩10A與齒輪殼16之間的間隙密封的密封件發揮功能。
The
同樣,在側罩10B與軸承殼(外殼構造體)12之間夾著隔熱構造體25B。即,側罩10B與軸承殼12相互分離(相互不接觸),隔熱構造體25B與側罩10B和軸承殼12雙方接觸。該隔熱構造體25B位於泵殼2與軸承殼12之間,具有降低從泵殼2通過側罩10B而朝向軸承殼12的導熱的功能。
Similarly, a
隔熱構造體25B具有連續不斷的環狀的形狀,隔熱構造體25B也作為將側罩10B與軸承殼12之間的間隙密封的密封件發揮功能。即,隔熱構造體25B的內側面與側罩10B的外側面接觸,隔熱構造體25B的外側面與軸承殼12的內側的端面接觸。隔熱構造體25B具有比側罩10B低的熱傳導率。更具體而言,隔熱構造體25B由與構成側罩10B的材料相比熱傳導率低的材料構成。隔熱構造體25B的構造與隔熱構造體25A相同,因此省略其重複的說明。
The
也可以在側罩10B與軸承殼12之間配置有其他的外殼構造體。在這樣的情況下,隔熱構造體25B夾在側罩10B與該外殼構造體之間。並且,還存在有在側罩10B與馬達殼14之間不設置軸承殼12的情況。在這樣的情況下,隔熱構造體25B夾在側罩10B與馬達殼14之間。
Another outer shell structure may be arranged between the
圖10是表示真空泵裝置的其他的實施型態的剖視圖。沒有特別說明的本實施型態的結構與參照圖1至圖8而說明的實施型態相同,因此省略其重複的說明。在本實施型態中,在側罩10A內設置有作為隔熱體的複數個隔熱構件41A、42A。不設置隔熱構造體25A、25B。
FIG. 10 is a cross-sectional view showing another embodiment of the vacuum pump device. The structure of this embodiment not specifically described is the same as the embodiment described with reference to FIGS. 1 to 8 , so the repeated description thereof is omitted. In this embodiment, a plurality of
複數個隔熱構件41A、42A夾在內側側罩31A與外側側罩32A之間。即,內側側罩31A與外側側罩32A相互分離(相互不接觸)而於內側側罩31A與外側側罩32A之間具有空間,複數個隔熱構件41A、42A與內側側罩31A和外側側罩32A雙方接觸。作為該隔熱體的複數個隔熱構件41A、42A位於泵殼2與齒輪殼16之間,複數個隔熱構件41A、42A具有比側罩10A低的熱傳導率。因此,複數個隔熱構件41A、42A具有降低從泵殼2通過側罩10A而朝向齒輪殼16的導熱的功能。
The plurality of
圖11是表示圖10所示的側罩10A和複數個隔熱構件41A、42A的分解立體圖。複數個隔熱構件41A、42A包含:具有供旋轉軸7貫通的兩個通孔45的隔熱板41A、以及配置在隔熱板41A的周圍的複數個隔熱襯墊42A。在內側側罩31A的外表面形成有凹陷47,隔熱板41A配置在凹陷47內。在一實施型態中,也可以在外側側罩32A的內表面形成有凹陷47,隔熱板41A配置在外側側罩32A的凹陷47內。本實施型態的隔熱板41A是單一的構造體,但也可以分離為複數個構造體。在隔熱板41A與內側側罩31A之間、以及隔熱板41A與外側側罩32A之間配置有O型圈等密封件(未圖示)。
FIG. 11 is an exploded perspective view showing the
隔熱板41A和隔熱襯墊42A具有比側罩10A低的熱傳導率。因此,隔熱板41A和隔熱襯墊42A能夠降低從泵殼2通過側罩10A而朝向齒輪殼16的導熱,將轉子室1內維持在高溫。特別是,能夠利用在冷卻管21(參照圖10)中流動的冷卻液對齒輪殼16進行冷卻,並且隔熱板41A和隔熱襯墊42A能夠將轉子室1內維持在高溫。
The
隔熱板41A和隔熱襯墊42A由與構成側罩10A的材料相比熱傳導率低的材料構成。在本實施型態中,構成轉子室1的泵殼2和側罩10A、10B由鑄鐵構成。隔熱板41A和隔熱襯墊42A由與側罩10A的材料相比熱傳導率低的不銹鋼、鈦、或者球狀石墨系奧氏體鑄鐵(Ni-resist)等金屬構成。在本實施型態中,隔熱板41A和隔熱襯墊42A由不銹鋼構成。不銹鋼具有比鑄鐵低的熱傳導率。並且,不銹鋼的機械性的剛性較高,能夠在真空泵裝置的組裝時確保較高的尺寸精度。但是,只要與側罩10A的材料相比熱傳導率低、並且具有較高的機械性的剛性,則隔熱板41A和/或隔熱襯墊42A的材料也可以是樹脂等其他的材料。
The
隔熱板41A和隔熱襯墊42A的總截面積比側罩10A的截面積小。因此,熱傳導率和截面積較小的隔熱板41A和隔熱襯墊42A有助於降低從泵殼2朝向齒輪殼16的導熱。
The total cross-sectional area of the
如圖10所示,在另一個側罩10B內也同樣地設置有作為隔熱體的複數個隔熱構件41B、42B、即隔熱板41B和複數個隔熱襯墊42B。側罩10B具備:形成轉子室1的端面的內側側罩31B、以及在旋轉軸7的軸向上位於內側側罩31B的外側的外側側罩32B。
As shown in FIG10 , a plurality of
側罩10B、隔熱板41B和複數個隔熱襯墊42B的結構和配置係與側罩10A、隔熱板41A和複數個隔熱襯墊42A實質上相同。參照圖10與圖11的側罩10A、隔熱板41A和複數個隔熱襯墊42A的說明也能夠應用於側罩10B、隔熱板41B和複數個隔熱襯墊42B,因此省略它們的其他的詳細說明。
The structure and configuration of the
形成在側罩10B內的隔熱板41B和隔熱襯墊42B位於泵殼2與軸承殼12之間。隔熱板41B和隔熱襯墊42B具有比側罩10B低的熱傳導率。因此,隔熱板41B和隔熱襯墊42B具有降低從泵殼2通過側罩10B而朝向軸承殼12的導熱的功能。特別是,能夠利用在冷卻管22中流動的冷卻液對馬達殼14和軸承殼12進行冷卻,並且隔熱板41B和隔熱襯墊42B能夠將轉子室1內維持在高溫。
The
隔熱板41B和隔熱襯墊42B的總截面積比側罩10B的截面積小。因此,熱傳導率和截面積較小的隔熱板41B和隔熱襯墊42B有助於降低從泵殼2朝向軸承殼12的導熱。
The total cross-sectional area of the
圖12是圖10的G-G線剖視圖。如圖12所示,側加熱器55A被配置為包圍隔熱板41A。雖然未圖示,但側加熱器55B也同樣地配置為包圍隔熱板41B。也可以如圖13所示,將複數個側加熱器55A設置在側罩10A內。同樣,也可以將複數個側加熱器55B設置在側罩10B內。並且,參照圖4至圖8而說明的側加熱器55A和側罩10A的結構和配置也可以應用於圖10與圖11的實施型態的側加熱器55A和側罩10A和/或側加熱器55B和側罩10B。在該情況下也是,側加熱器55A被配置為包圍隔熱板41A,側加熱器55B被配置為包圍隔熱板41B。
FIG12 is a cross-sectional view taken along line G-G of FIG10. As shown in FIG12, the
圖14是表示真空泵裝置的另一其他的實施型態的剖視圖。沒有特別說明的本實施型態的結構與參照圖1至圖13而說明的實施型態相同,因此省略其重複的說明。在本實施型態中,如圖14所示,真空泵裝置具備隔熱構造體25A、25B和隔熱構件41A、42A、41B、42B雙方來作為隔熱體。根據本實施型態,藉由雙重的隔熱體25A、25B、41A、42A、41B、42B與側加熱器55A、55B的組合,能夠將轉子室1內維持在高溫。並且,能夠削減側加熱器55A、55B的運轉所需的電力。
FIG. 14 is a cross-sectional view showing another embodiment of the vacuum pump device. The structure of this embodiment that is not specifically described is the same as the embodiment described with reference to FIG. 1 to FIG. 13, so the repeated description thereof is omitted. In this embodiment, as shown in FIG. 14, the vacuum pump device has both the
在以上說明的各實施型態中,在轉子室1的兩側配置有側加熱器55A、55B,但本發明不限於這樣的配置。在一實施型態中,側加熱器也可以僅配置在轉子室1的一方側。例如,在齒輪殼16中沒有設置冷卻管21的情況下,也可以省略側加熱器55A。同樣,上述的隔熱體配置在轉子室1的兩側,但在一實施型態中,隔熱體也可以僅配置在轉子室1的一方側。
In each of the above-described embodiments,
圖15是表示具備多級泵轉子的真空泵裝置的一實施型態的剖視圖。沒有特別說明的本實施型態的結構與圖14所示的實施型態相同,因此省略其重複的說明。圖15所示的真空泵裝置具備具有複數個轉子5a~5e的多級泵轉子5。吸氣口2a位於泵殼2的齒輪側的端部,排氣口2b位於泵殼2的電動機側的端部。伴隨著多級泵轉子5的旋轉,氣體一邊被壓縮一邊被從吸氣口2a向排氣口2b移送。在氣體被壓縮時產生的壓縮熱在排氣口2b的附近最高。因此,轉子室1的排氣側的溫度比轉子室1的吸氣側的溫度高。
FIG15 is a cross-sectional view showing an embodiment of a vacuum pump device having a multi-stage pump rotor. The structure of this embodiment, which is not specifically described, is the same as that of the embodiment shown in FIG14, and therefore repeated descriptions thereof are omitted. The vacuum pump device shown in FIG15 has a
根據製程氣體的種類,有時包含昇華溫度比較低的副生成物。這樣的副生成物在轉子室1的吸氣側容易固化,另一方面,在轉子室1的排氣側不容易固化。因此,在這樣的情況下,也可以如圖15所示,真空泵裝置僅在齒輪
殼16與泵殼2之間具有側加熱器55A和/或隔熱構造體25A和/或隔熱構件41A、42A。
Depending on the type of process gas, byproducts with relatively low sublimation temperatures are sometimes included. Such byproducts are easily solidified on the air intake side of the
上述的實施型態是以本發明所屬的技術領域中的具有通常知識的人能夠實施本發明為目的而記載的。上述實施型態的各種變形例對於本領域技術人員來說是理所當然的,本發明的技術思想也能夠應用於其他的實施型態。因此,本發明不限於所記載的實施型態,而解釋為由本發明的申請專利範圍所定義的技術思想的最寬範圍。 The above-mentioned embodiments are recorded for the purpose of enabling people with ordinary knowledge in the technical field to which the present invention belongs to implement the present invention. Various variations of the above-mentioned embodiments are natural to those skilled in the art, and the technical concept of the present invention can also be applied to other embodiments. Therefore, the present invention is not limited to the described embodiments, but is interpreted as the widest scope of the technical concept defined by the scope of the patent application of the present invention.
1:轉子室 1: Rotor chamber
2:泵殼 2: Pump casing
2a:吸氣口 2a: Intake port
2b:排氣口 2b: Exhaust port
5:泵轉子 5: Pump rotor
7:旋轉軸 7: Rotation axis
8:電動機 8: Motor
8A:馬達轉子 8A: Motor rotor
8B:馬達定子 8B: Motor stator
10A,10B:側罩 10A, 10B: Side shields
12:軸承殼 12: Bearing housing
14:馬達殼 14: Motor shell
16:齒輪殼 16: Gear housing
17:軸承 17: Bearings
18:軸承 18: Bearings
20:齒輪 20: Gear
21,22:冷卻管 21,22: Cooling tube
31A,31B:內側側罩 31A,31B: Inner side cover
32A,32B:外側側罩 32A,32B: External side covers
55A,55B:側加熱器 55A, 55B: Side heater
Claims (5)
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JP2019-188808 | 2019-10-15 | ||
JP2019188808 | 2019-10-15 | ||
JP2020140632A JP2021063503A (en) | 2019-10-15 | 2020-08-24 | Vacuum pump device |
JP2020-140632 | 2020-08-24 |
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Publication Number | Publication Date |
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TW202138679A TW202138679A (en) | 2021-10-16 |
TWI845776B true TWI845776B (en) | 2024-06-21 |
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Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007262906A (en) | 2006-03-27 | 2007-10-11 | Nabtesco Corp | Two-stage type vacuum pump |
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007262906A (en) | 2006-03-27 | 2007-10-11 | Nabtesco Corp | Two-stage type vacuum pump |
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