TWI838337B - Layered body and method for producing multilayered body with concave part utilizing layered body - Google Patents

Layered body and method for producing multilayered body with concave part utilizing layered body Download PDF

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TWI838337B
TWI838337B TW107120320A TW107120320A TWI838337B TW I838337 B TWI838337 B TW I838337B TW 107120320 A TW107120320 A TW 107120320A TW 107120320 A TW107120320 A TW 107120320A TW I838337 B TWI838337 B TW I838337B
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layer
bonding
bonding force
bonding layer
laminate
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TW107120320A
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TW201906727A (en
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伊藤弘幸
立川智之
谷口貴久
村上由夏
井上真邦
內田寬明
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日商大日本印刷股份有限公司
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Abstract

The present disclosure provides a layered body comprising at least a first layer, a first adhesive layer, and a pattern-shaped structure body in this order, wherein an adhesive force of the first adhesive layer changes after subjected to an adhesive force adjusting treatment.

Description

積層體及使用其之附凹部多層體之製造方法Multilayer body and method for manufacturing multilayer body with recessed portion using the same

本發明係關於一種能夠容易地轉印圖案狀之構造體之積層體。The present invention relates to a laminated body capable of easily transferring a patterned structure.

於配置於構件上之圖案狀之構造體難以直接形成於成為配置對象之面上之情形時、或欲一次地配置於複數個部位之情形等時,藉由轉印法轉印配置於對象面上。作為圖案狀之構造體,例如可列舉配線基板等中之配線圖案、於醫療領域等中用於活體組織或器官等之細胞圖案、於配線圖案之形成過程或立體結構之電子零件之製造過程等中局部地配置於需要保護之部位之保護構件等。When the pattern-shaped structure to be arranged on the component is difficult to form directly on the surface to be arranged, or when it is desired to be arranged on multiple locations at once, it is arranged on the target surface by transfer method. Examples of pattern-shaped structures include wiring patterns in wiring boards, cell patterns used in living tissues or organs in the medical field, and protective components that are locally arranged at locations that need to be protected during the formation of wiring patterns or the manufacturing process of three-dimensional electronic parts.

作為將圖案狀之構造體轉印至被轉印體之方法,例如使用如下方法:使用配置有圖案狀之構造體之承載膜,使承載膜上之構造體與被轉印體之一面接著,其後將承載膜剝離。再者,於專利文獻1中揭示有一種附承載膜之保護膜,其於在電路基板等之製造中為了保護電路等而轉印配置保護層時,能夠防止於保護層中產生皺褶。保護層由於被轉印至電路上,因此相當於構造體,但並非圖案狀。 [先前技術文獻] [專利文獻]As a method for transferring a pattern-like structure to a transfer object, for example, the following method is used: a carrier film on which a pattern-like structure is arranged is used, the structure on the carrier film is brought into contact with one surface of the transfer object, and then the carrier film is peeled off. Furthermore, Patent Document 1 discloses a protective film with a carrier film, which can prevent wrinkles from being generated in the protective layer when the protective layer is transferred to protect the circuit in the manufacture of a circuit substrate, etc. The protective layer is equivalent to a structure because it is transferred to the circuit, but it is not in a pattern. [Prior Art Document] [Patent Document]

[專利文獻1]日本專利第5647593號公報 [專利文獻2]日本專利特開平8-37378號公報[Patent Document 1] Japanese Patent No. 5647593 [Patent Document 2] Japanese Patent Publication No. 8-37378

[發明所欲解決之問題][The problem the invention is trying to solve]

配置有構造體之承載膜於轉印前需要將構造體與承載膜以一定程度之強度而接著。然而,若構造體與承載膜之間之接著力過高,則存在如下等問題:難以將構造體一次地轉印至被轉印體、因構造體之機械強度等而於轉印時容易產生破損等。進而,根據構造體之種類,存在殘存於構造體上之承載膜之接著劑成分對構造體之功能或物性造成不良影響之問題。The support film on which the structure is arranged needs to be bonded to the support film with a certain degree of strength before transfer. However, if the bonding strength between the structure and the support film is too high, there are problems such as difficulty in transferring the structure to the transfer object at one time, and the structure is easily damaged during transfer due to the mechanical strength of the structure. Furthermore, depending on the type of structure, there is a problem that the adhesive components of the support film remaining on the structure have an adverse effect on the function or physical properties of the structure.

本發明係鑒於上述實際情況而完成者,主要目的在於提供一種能夠容易地將圖案狀之構造體轉印至被轉印體之積層體、及使用其之附凹部多層體之製造方法。 [解決問題之技術手段]The present invention is completed in view of the above-mentioned actual situation, and its main purpose is to provide a multilayer body that can easily transfer a pattern-shaped structure to a transferred body, and a method for manufacturing a multilayer body with concave portions using the same. [Technical means to solve the problem]

本發明提供一種積層體,其至少依序具有第1層、第1接著層、及圖案狀之構造體,且上述第1接著層接受接著力調整處理而使接著力發生變化。The present invention provides a laminated body, which at least sequentially comprises a first layer, a first bonding layer, and a patterned structure, and the first bonding layer is subjected to bonding force adjustment treatment to change the bonding force.

又,本發明提供一種附凹部多層體之製造方法,其係使用上述積層體之於多層體之一面具備具有開口之凹部的附凹部多層體之製造方法,且該方法包括如下步驟:接觸步驟,其係使上述積層體之上述構造體直接接觸第2層之一面或經由上述第2接著層間接地接觸第2層之一面;接著力調整步驟,其係藉由上述接著力調整處理使上述第1接著層之接著力降低;轉印步驟,其係至少將上述第1層剝離,並將至少包含上述構造體之圖案部呈圖案狀轉印至上述第2層;積層步驟,其係於上述第2層之具有上述圖案部之側之面積層1層以上之其他層;劃分步驟,其係將上述圖案部及上述1層以上之其他層劃分成包含上述圖案部及俯視下與上述圖案部處於重疊位置之上述其他層之第1區域、及除此以外之第2區域;及凹部形成步驟,其係將上述第1區域剝離去除,而形成上述凹部。 [發明之效果]Furthermore, the present invention provides a method for manufacturing a multilayer body with a concave portion, which is a method for manufacturing a multilayer body with a concave portion having an opening on one surface of the multilayer body using the above-mentioned laminate, and the method includes the following steps: a contacting step, which is to make the above-mentioned structure of the laminate directly contact one surface of the second layer or indirectly contact one surface of the second layer via the above-mentioned second bonding layer; a bonding force adjusting step, which is to reduce the bonding force of the above-mentioned first bonding layer by the above-mentioned bonding force adjusting treatment; a transfer step, which is to transfer at least the above-mentioned first bonding layer to the second bonding layer; The invention further comprises a step of peeling off the first layer and transferring the pattern portion including at least the structure to the second layer in the form of a pattern; a step of laminating the second layer on the side of the second layer having the pattern portion and the other layers above one layer; a step of dividing the pattern portion and the other layers above one layer into a first region including the pattern portion and the other layers overlapping the pattern portion in a top view, and a second region other than the first region; and a step of forming a concave portion by peeling off the first region to form the concave portion. [Effect of the invention]

本發明之積層體係藉由第1接著層接受接著力調整處理使接著力發生變化,而發揮能夠容易地將圖案狀之構造體一次地轉印至被轉印體,可抑制上述構造體之破損或於上述構造體側產生糊劑殘留之效果。又,根據本發明之附凹部多層體之製造方法,藉由使用上述積層體,而發揮能夠於多層體表面容易地形成凹部之效果。The laminate of the present invention is capable of easily transferring a patterned structure to a transfer object at one time by changing the bonding force of the first bonding layer through the bonding force adjustment treatment, thereby suppressing damage to the structure or the generation of paste residue on the side of the structure. In addition, according to the manufacturing method of the multilayer with concave portions of the present invention, by using the laminate, the effect of easily forming concave portions on the surface of the multilayer is achieved.

於本說明書中,於某構件或某區域等某構成處於其他構件或其他區域等其他構成「上(或下)」之情形時,只要無特別限定,其不僅包含處於其他構成之正上方(或正下方)之情況,還包含處於其他構成之上方(或下方)之情況,即,亦包含如下情況:於其他構成之上方(或下方)當中包含有其他構成要素。In this specification, when a certain component or a certain region is "on (or below)" another component or another region or other structure, unless otherwise specified, it not only includes the situation where it is directly above (or directly below) other structures, but also includes the situation where it is above (or below) other structures, that is, it also includes the following situation: other components are included above (or below) other structures.

本發明將積層體及附凹部多層體之製造方法包含於實施形態中。以下,一面參照圖式等一面說明本發明之實施形態。但是,本發明能夠以大量不同之態樣而實施,並不限定於以下所例示之實施形態之記載內容而進行解釋。又,關於圖式,為了更明確地進行說明,存在較實施態樣而言針對各部之寬度、厚度、形狀等模式性地表示之情況,但只不過為一例,並不限定本發明之解釋。又,於本說明書及各圖中,存在如下情況:對與關於已經出現之圖於上文所述者相同之要素附相同之符號,並適當省略詳細之說明。又,為了說明之方便起見,存在使用上方或下方之詞語進行說明之情況,上下方向亦可倒轉。The present invention includes a method for manufacturing a multilayer body and a multilayer body with recessed portions in an implementation form. Hereinafter, the implementation form of the present invention will be described with reference to drawings and the like. However, the present invention can be implemented in a large number of different forms, and is not limited to the description of the implementation forms illustrated below. Furthermore, regarding the drawings, in order to explain more clearly, there are cases where the width, thickness, shape, etc. of each part are schematically represented compared to the implementation form, but this is only an example and does not limit the explanation of the present invention. Furthermore, in this specification and each drawing, there is the following situation: the same symbols are attached to the same elements as those described above with respect to the already-appeared drawings, and the detailed description is appropriately omitted. In addition, for the sake of convenience of explanation, there are cases where the words "upper" or "lower" are used for explanation, and the up and down directions may also be reversed.

I.積層體 本發明之積層體至少依序具有第1層、第1接著層、及圖案狀之構造體,且上述第1接著層接受接著力調整處理而使接著力發生變化。I. Laminated body The laminated body of the present invention has at least a first layer, a first bonding layer, and a patterned structure in sequence, and the first bonding layer is subjected to bonding force adjustment treatment to change the bonding force.

圖1係表示本發明之積層體之一例之概略俯視圖,圖2係圖1之X-X線剖視圖。本發明之積層體10至少依序具有第1層1、第1接著層2、及圖案狀之構造體3,且第1接著層2接受接著力調整處理而使接著力發生變化。再者,於圖2中,將接著力調整處理前之第1接著層2與第1層1之間之接著力設為N1 ,將接著力調整處理後之第1接著層2與第1層1之間之接著力設為N1 ',將接著力調整處理前之第1接著層2與構造體3之間之接著力設為N2 ,將接著力調整處理後之第1接著層2與構造體3之間之接著力設為N2 '。Fig. 1 is a schematic top view showing an example of the laminate of the present invention, and Fig. 2 is a cross-sectional view taken along line XX of Fig. 1. The laminate 10 of the present invention has at least a first layer 1, a first bonding layer 2, and a patterned structure 3 in sequence, and the first bonding layer 2 undergoes bonding force adjustment processing to change the bonding force. Furthermore, in FIG2 , the bonding force between the first bonding layer 2 and the first layer 1 before the bonding force adjustment treatment is set to N 1 , the bonding force between the first bonding layer 2 and the first layer 1 after the bonding force adjustment treatment is set to N 1 ', the bonding force between the first bonding layer 2 and the structure 3 before the bonding force adjustment treatment is set to N 2 , and the bonding force between the first bonding layer 2 and the structure 3 after the bonding force adjustment treatment is set to N 2 '.

圖3(a)~(c)係對使用本發明之積層體之構造體之轉印方法之一例進行說明的步驟圖。作為使用本發明之積層體將構造體轉印至被轉印體(第2層)之方法,首先,使本發明之積層體10之構造體3直接接觸第2層11之一面或經由第2接著層間接地接觸第2層11之一面(圖3(a),接觸步驟)。繼而,藉由接著力調整處理T使第1接著層2之接著力降低(圖3(b),接著力調整步驟)。其後,至少將第1層1剝離(圖3(c),轉印步驟)。圖3(c)中,係將第1層1及第1接著層2剝離。藉此,於第2層11,將至少包含構造體3之圖案部20呈圖案狀一次性轉印至第2層11。再者,於圖3中,將構造體與第2層之間之接著力設為N4 。除此以外,關於在圖3中未說明之符號,與圖2相同。Figures 3(a) to (c) are step diagrams for explaining an example of a method for transferring a structure using the laminate of the present invention. As a method for transferring a structure to a transfer object (second layer) using the laminate of the present invention, first, the structure 3 of the laminate 10 of the present invention is directly contacted with one surface of the second layer 11 or indirectly contacted with one surface of the second layer 11 via the second bonding layer (Figure 3(a), contact step). Then, the bonding force of the first bonding layer 2 is reduced by bonding force adjustment treatment T (Figure 3(b), bonding force adjustment step). Thereafter, at least the first layer 1 is peeled off (Figure 3(c), transfer step). In FIG. 3( c ), the first layer 1 and the first bonding layer 2 are peeled off. Thus, the pattern portion 20 including at least the structure 3 is transferred to the second layer 11 in a pattern form at one time. In FIG. 3 , the bonding force between the structure and the second layer is set to N 4 . Other symbols not explained in FIG. 3 are the same as those in FIG. 2 .

作為將圖案狀之構造體轉印至被轉印體之方法,例如有使用配置有圖案狀之構造體之承載膜之方法。配置有構造體之承載膜於轉印前需要構造體與承載膜以一定程度之強度而接著。然而,若構造體與承載膜之間之接著力過高,則存在如下等問題:難以將構造體一次地轉印至被轉印體、因構造體之機械強度等而於轉印時產生破損等。進而,根據構造體之種類,存在殘存於構造體上之承載膜之接著劑成分對構造體之功能或物性造成不良影響之問題。As a method of transferring a patterned structure to a transfer object, for example, there is a method of using a carrier film provided with a patterned structure. The carrier film provided with the structure requires that the structure and the carrier film be bonded to a certain degree of strength before transfer. However, if the bonding force between the structure and the carrier film is too high, there are the following problems: it is difficult to transfer the structure to the transfer object at one time, and damage occurs during transfer due to the mechanical strength of the structure. Furthermore, depending on the type of structure, there is a problem that the adhesive components of the carrier film remaining on the structure have an adverse effect on the function or physical properties of the structure.

對於此種問題,本發明者等人以圖案狀之構造體之轉印用積層體之形式開發了本發明之積層體,其係於接著力會因接著力調整處理而降低之接著力可變型之接著層上配置圖案狀之構造體,從而解決上述問題。即,根據本發明之積層體,藉由於接著力會因接著力調整處理而降低之第1接著層上配置圖案狀之構造體,於接著力調整處理前,第1接著層具有較高之接著力從而能夠保持構造體,另一方面,於接著力調整處理後,第1接著層相對於構造體之接著力降低,因此構造體能夠容易地剝離。藉此,本發明之積層體能夠將構造體一次地轉印至被轉印體。又,本發明之積層體之第1接著層能夠藉由接著力調整處理之程度使接著力充分地降低,因此本發明之積層體不論構造體之機械強度或種類等如何均能夠實現高轉印性,且能夠抑制轉印時之構造體之破損或於構造體側之糊劑殘留之產生。In view of this problem, the inventors of the present invention have developed a laminated body in the form of a transfer laminated body for a patterned structure, which solves the above problem by arranging a patterned structure on a bonding layer whose bonding force is variable and whose bonding force is reduced by bonding force adjustment treatment. That is, according to the laminated body of the present invention, by arranging a patterned structure on a first bonding layer whose bonding force is reduced by bonding force adjustment treatment, before the bonding force adjustment treatment, the first bonding layer has a higher bonding force and can hold the structure, and on the other hand, after the bonding force adjustment treatment, the bonding force of the first bonding layer relative to the structure is reduced, so that the structure can be easily peeled off. Thus, the laminate of the present invention can transfer the structure to the transfer object at one time. In addition, the first bonding layer of the laminate of the present invention can sufficiently reduce the bonding force by adjusting the degree of bonding force, so the laminate of the present invention can achieve high transferability regardless of the mechanical strength or type of the structure, and can suppress the damage of the structure during transfer or the generation of paste residues on the side of the structure.

此處,所謂「圖案狀」,係指於供構造體配置之層之被黏著面具有設置有構造體之部分、及未設置有構造體之部分的狀態。又,有時將藉由本發明之積層體而轉印至被轉印體之至少包含構造體之轉印體稱為「圖案部」。圖案部可呈圖案狀轉印至被黏著體。所謂轉印、或被轉印至被轉印體,係指轉印、或被轉印至被轉印體之一面上。進而,有時將供藉由本發明之積層體轉印包含構造體之圖案部的被轉印體稱為「第2層」進行說明。以下,針對本發明之積層體,逐個構成地進行說明。Here, the so-called "pattern state" refers to a state in which the adhered surface of the layer for arranging the structure has a part where the structure is provided and a part where the structure is not provided. In addition, the transfer body that at least includes the structure and is transferred to the transferred body by the laminate of the present invention is sometimes called the "pattern part". The pattern part can be transferred to the adhered body in a pattern state. The so-called transfer or being transferred to the transferred body refers to transfer or being transferred to one side of the transferred body. Furthermore, the transferred body to which the pattern part including the structure is transferred by the laminate of the present invention is sometimes referred to as the "second layer" for explanation. In the following, the laminate of the present invention is explained one by one.

A.第1接著層 本發明之積層體之第1接著層係接受接著力調整處理而使接著力發生變化之層。第1接著層於接著力調整處理前具有接著性及/或黏著性。A. First Adhesive Layer The first adhesive layer of the laminate of the present invention is a layer that undergoes adhesive force adjustment treatment to change the adhesive force. The first adhesive layer has adhesiveness and/or adhesion before the adhesive force adjustment treatment.

1.第1接著層之態樣 第1接著層接受接著力調整處理而使接著力發生變化。此處,所謂「接受接著力調整處理而使接著力發生變化」,可接受接著力調整處理而使接著力較接受接著力調整處理之前上升,亦可接受接著力調整處理而使接著力較接受接著力調整處理之前降低。其中,於本發明中,較佳為接受接著力調整處理而使接著力降低,更佳為接受接著力調整處理而使接著力消失。1. Aspects of the first bonding layer The first bonding layer undergoes bonding force adjustment processing to change the bonding force. Here, the so-called "element of bonding force adjustment processing to change the bonding force" may be subjected to bonding force adjustment processing to increase the bonding force compared to before the bonding force adjustment processing, or may be subjected to bonding force adjustment processing to reduce the bonding force compared to before the bonding force adjustment processing. Among them, in the present invention, it is preferred that the bonding force is reduced by the bonding force adjustment processing, and it is more preferred that the bonding force is eliminated by the bonding force adjustment processing.

第1接著層具有適合於接著力調整處理之種類之組成。作為接著力調整處理,較佳為可使第1接著層之接著力降低之處理,例如可列舉加熱處理或冷卻處理之熱處理、能量線照射處理、電場施加處理或無電場處理之電場處理等。The first bonding layer has a composition suitable for bonding force adjustment treatment. As bonding force adjustment treatment, it is preferred to use treatment that can reduce the bonding force of the first bonding layer, such as heat treatment of heating treatment or cooling treatment, energy beam irradiation treatment, electric field application treatment or electric field treatment without electric field treatment.

即,第1接著層可大致分為接受加熱處理或冷卻處理而使接著力降低之感溫性接著層的第1態樣、接受能量線照射處理而使接著力降低之能量線響應性接著層的第2態樣、接受電場施加處理或無電場處理而使接著力降低之電氣響應性接著層的第3態樣。以下,針對第1接著層,逐個態樣地進行說明。That is, the first bonding layer can be roughly divided into a first aspect of a temperature-sensitive bonding layer that receives a heating treatment or a cooling treatment to reduce bonding strength, a second aspect of an energy-ray responsive bonding layer that receives an energy-ray irradiation treatment to reduce bonding strength, and a third aspect of an electrical-responsive bonding layer that receives an electric field application treatment or an electric field-free treatment to reduce bonding strength. The first bonding layer is described below in terms of each aspect.

(1)第1態樣 本態樣之第1接著層為接受加熱處理或冷卻處理作為接著力調整處理而使接著力降低的感溫性接著層。感溫性接著層為與溫度變化對應地重複接著性與非接著性的接著層,於本發明之積層體中,可為藉由加熱處理而使接著力降低的加熱剝離型,亦可為藉由冷卻處理而使接著力降低的冷卻剝離型。(1) First Aspect The first bonding layer of this aspect is a temperature-sensitive bonding layer that receives a heat treatment or a cooling treatment as a bonding force adjustment treatment to reduce the bonding force. The temperature-sensitive bonding layer is a bonding layer that repeats bonding and non-bonding in response to temperature changes. In the laminate of the present invention, it can be a heat-peelable type in which the bonding force is reduced by a heat treatment, or it can be a cooling-peelable type in which the bonding force is reduced by a cooling treatment.

(a)加熱剝離型感溫性接著層 加熱剝離型感溫性接著層係藉由於特定之開關溫度以上進行加熱,而使接著力降低從而能夠進行剝離。開關溫度可視加熱剝離型感溫性接著層之組成或其熔點等而適當設定,例如可設為30℃以上且200℃以下之範圍內,其中較佳為40℃以上且90℃以下之範圍內。其原因在於:藉由將開關溫度設定於上述範圍內,能夠確保於常溫下之作業性。(a) Thermal peelable temperature-sensitive adhesive layer The thermal peelable temperature-sensitive adhesive layer is heated above a specific switching temperature to reduce the adhesive force and enable peeling. The switching temperature can be appropriately set depending on the composition of the thermal peelable temperature-sensitive adhesive layer or its melting point, for example, it can be set to a range of 30°C to 200°C, preferably 40°C to 90°C. The reason is that by setting the switching temperature within the above range, it is possible to ensure workability at room temperature.

再者,於本發明之積層體於伴隨熱之步驟中使用之情形時,開關溫度較佳為高於伴隨熱之步驟之溫度。所謂伴隨熱之步驟,例如可列舉下文所述之附凹部多層體之製造中之阻焊劑等之燒成步驟(例如120℃左右)、回焊步驟(例如260℃左右)等。Furthermore, when the multilayer body of the present invention is used in a step accompanied by heat, the switch temperature is preferably higher than the temperature of the step accompanied by heat. The so-called step accompanied by heat includes, for example, the calcination step of the solder resist (e.g., about 120°C) and the reflow step (e.g., about 260°C) in the manufacture of the multilayer body with recessed portions described below.

作為加熱剝離型感溫性接著層之組成,只要能夠表現出所需物性,則並無特別限定,例如可列舉至少包含接著劑及發泡劑或膨脹劑之組成(組成A)、至少包含接著劑及側鏈晶質聚合物之組成(組成B)等。組成A藉由接受加熱處理使發泡劑發泡、或使膨脹劑膨脹,接觸面積物理性地減少,藉此能夠實現接著力之降低,從而能夠容易地剝離。又,關於組成B,若藉由加熱處理於側鏈晶質聚合物之熔點以上之溫度下進行加熱,則側鏈晶質聚合物之物性因相變化而變化從而進行流動,能夠使感溫性接著層之黏著力充分地降低,從而能夠容易地剝離。The composition of the heat-peelable temperature-sensitive adhesive layer is not particularly limited as long as it can exhibit the desired physical properties, and examples thereof include a composition containing at least an adhesive and a foaming agent or an expansion agent (composition A), a composition containing at least an adhesive and a side-chain crystalline polymer (composition B), etc. Composition A is subjected to a heat treatment to foam the foaming agent or expand the expansion agent, and the contact area is physically reduced, thereby achieving a reduction in the adhesive force, thereby enabling easy peeling. In addition, regarding composition B, if the heat treatment is performed at a temperature above the melting point of the side-chain crystalline polymer, the physical properties of the side-chain crystalline polymer change due to phase change and flow, and the adhesion of the temperature-sensitive adhesive layer can be sufficiently reduced, thereby enabling easy peeling.

(i)組成A 加熱剝離型感溫性接著層之組成A至少包含接著劑及發泡劑或膨脹劑。(i) Composition A Composition A of the heat-peelable temperature-sensitive adhesive layer comprises at least an adhesive and a foaming agent or an expanding agent.

接著劑包含具有黏著性之聚合物。作為上述接著劑,例如可列舉:天然橡膠接著劑;合成橡膠接著劑;苯乙烯/丁二烯乳膠基質接著劑;嵌段共聚物型之熱塑性橡膠;丁基橡膠;聚異丁烯;丙烯酸系接著劑;乙烯醚共聚物等。具體而言,可列舉日本專利特開2008-13590號公報、日本專利第3853247號公報等所揭示之接著劑。The adhesive includes a polymer having adhesive properties. Examples of the adhesive include natural rubber adhesives, synthetic rubber adhesives, styrene/butadiene latex-based adhesives, block copolymer-type thermoplastic rubbers, butyl rubbers, polyisobutylene, acrylic adhesives, vinyl ether copolymers, etc. Specifically, adhesives disclosed in Japanese Patent Publication No. 2008-13590 and Japanese Patent Publication No. 3853247 can be cited.

作為發泡劑或膨脹劑,可使用接受加熱處理會使發泡劑發泡、或使膨脹劑膨脹的材料。發泡劑可為化學發泡劑,亦可為物理發泡劑。作為發泡劑或膨脹劑,具體而言,可使用日本專利特開2008-13590號公報所揭示之發泡劑、日本專利第3853247號公報所揭示之熱膨脹性微球等。發泡劑或膨脹劑進行發泡或膨脹之溫度、加熱剝離型感溫性接著層中之發泡劑或膨脹劑之含量可適當設定,具體而言,可設為與日本專利特開2008-13590號公報、日本專利第3853247號公報等所揭示之發泡或膨脹之溫度、含量相同。As the foaming agent or swelling agent, a material that foams the foaming agent or expands the swelling agent when subjected to heat treatment can be used. The foaming agent can be a chemical foaming agent or a physical foaming agent. Specifically, the foaming agent disclosed in Japanese Patent Publication No. 2008-13590, the thermal expansion microsphere disclosed in Japanese Patent Publication No. 3853247, etc. can be used. The temperature at which the foaming agent or the expanding agent foams or expands, and the content of the foaming agent or the expanding agent in the heat-peelable temperature-sensitive adhesive layer can be appropriately set. Specifically, they can be set to the same foaming or expanding temperature and content as disclosed in Japanese Patent Publication No. 2008-13590 and Japanese Patent Publication No. 3853247.

上述組成A可進而包含側鏈晶質聚合物。側鏈晶質聚合物由於若於熔點以上之溫度下進行加熱則會流動從而能夠使感溫性接著層之黏著力充分地降低,因此能夠減少感溫性接著層中之發泡劑之含量,從而能夠進行感溫性接著層之減薄。關於側鏈晶質聚合物,由於會於「(ii)組成B」中進行說明,故而此處省略說明。上述組成A中之側鏈晶質聚合物之含量並無特別限定,可適當設定。The above-mentioned composition A may further include a side-chain crystalline polymer. Since the side-chain crystalline polymer will flow when heated at a temperature above the melting point, the adhesion of the temperature-sensitive adhesive layer can be sufficiently reduced. Therefore, the content of the foaming agent in the temperature-sensitive adhesive layer can be reduced, thereby thinning the temperature-sensitive adhesive layer. The side-chain crystalline polymer will be explained in "(ii) composition B", so the explanation is omitted here. The content of the side-chain crystalline polymer in the above-mentioned composition A is not particularly limited and can be set appropriately.

(ii)組成B 加熱剝離型感溫性接著層之組成B至少包含接著劑及側鏈晶質聚合物。關於接著劑,由於可設為與組成A相同,因此此處省略說明。(ii) Composition B Composition B of the heat-peelable temperature-sensitive adhesive layer contains at least an adhesive and a side-chain crystalline polymer. The adhesive can be the same as that of composition A, so its description is omitted here.

側鏈晶質聚合物係於未達熔點之溫度下結晶化且於熔點以上之溫度下表現出流動性之聚合物,且係能夠與溫度變化對應地可逆地產生結晶狀態及流動狀態的聚合物。作為側鏈晶質聚合物,例如可列舉包含具有直鏈狀烷基之(甲基)丙烯酸酯、具有烷基之丙烯酸酯或甲基丙烯酸酯、及極性單體的聚合物等。具體而言,可列舉日本專利特開2008-13590號公報所揭示之側鏈晶質聚合物。上述組成B中之側鏈晶質聚合物之含量並無特別限定,可適當設定對於使加熱剝離型感溫性接著層表現出如下特性而言充分之量:於設定溫度以上之溫度下,大致為非黏著性,又,於設定溫度以下之溫度下為黏著性。例如,可設為日本專利特開2008-13590號公報所揭示之含量。A side-chain crystalline polymer is a polymer that crystallizes at a temperature below the melting point and exhibits fluidity at a temperature above the melting point, and is a polymer that can reversibly generate a crystal state and a fluid state in response to temperature changes. Examples of side-chain crystalline polymers include polymers containing (meth)acrylates having a linear alkyl group, acrylates or methacrylates having an alkyl group, and polar monomers. Specifically, the side-chain crystalline polymer disclosed in Japanese Patent Laid-Open No. 2008-13590 can be cited. The content of the side chain crystalline polymer in the composition B is not particularly limited, and can be appropriately set to a sufficient amount for the heat-peelable temperature-sensitive adhesive layer to exhibit the following characteristics: being substantially non-adhesive at a temperature above a set temperature, and being adhesive at a temperature below the set temperature. For example, the content can be set to the content disclosed in Japanese Patent Publication No. 2008-13590.

(iii)其他 再者,作為包含上述組成A之加熱剝離型感溫性接著層,例如可列舉日本專利第3853247號公報所揭示之加熱剝離型黏著片之熱膨脹性層。又,作為包含上述組成B之加熱剝離型感溫性接著層,例如可列舉日本專利特開2008-13590號公報所揭示之黏著片之黏著劑層。(iii) Others Furthermore, as the heat-peelable temperature-sensitive adhesive layer including the above-mentioned composition A, for example, the heat-expandable layer of the heat-peelable adhesive sheet disclosed in Japanese Patent No. 3853247 can be cited. Also, as the heat-peelable temperature-sensitive adhesive layer including the above-mentioned composition B, for example, the adhesive layer of the adhesive sheet disclosed in Japanese Patent Laid-Open No. 2008-13590 can be cited.

(b)冷卻剝離型感溫性接著層 冷卻剝離型感溫性接著層藉由於特定之開關溫度以下進行冷卻,而使接著力降低從而能夠進行剝離。開關溫度可視冷卻剝離型感溫性接著層之組成或其熔點等適當設定,例如較佳為10℃以上。又,開關溫度可設為70℃以下,其中較佳為20℃以下。其原因在於:藉由將開關溫度設定於上述範圍內,冷卻剝離型感溫性接著層能夠容易地進行於常溫下之貼附及於冷卻環境下之剝離。(b) Cooling-peelable temperature-sensitive adhesive layer The cooling-peelable temperature-sensitive adhesive layer is cooled below a specific switching temperature to reduce the adhesion force and thus can be peeled off. The switching temperature can be appropriately set according to the composition of the cooling-peelable temperature-sensitive adhesive layer or its melting point, for example, preferably above 10°C. In addition, the switching temperature can be set below 70°C, preferably below 20°C. The reason is that by setting the switching temperature within the above range, the cooling-peelable temperature-sensitive adhesive layer can be easily attached at room temperature and peeled off in a cooling environment.

作為冷卻剝離型感溫性接著層之組成,只要能夠表現出所需物性,則並無特別限定,例如可列舉包含將以16以上之直鏈狀烷基為側鏈之丙烯酸烷基酯及/或甲基丙烯酸烷基酯作為構成成分之側鏈可結晶化之聚合物的組成。The composition of the cold peelable thermosensitive adhesive layer is not particularly limited as long as it can exhibit the desired physical properties. For example, a composition including a side-chain crystallizable polymer having an alkyl acrylate and/or an alkyl methacrylate having a linear alkyl group of 16 or more as a side chain can be cited.

作為以16以上之直鏈狀烷基為側鏈之丙烯酸酯及/或甲基丙烯酸酯(亦總稱為(甲基)丙烯酸酯),例如可列舉(甲基)丙烯酸十六烷基酯、(甲基)丙烯酸硬脂酯、(甲基)丙烯酸二十二烷基酯等具有碳數16~22之直鏈烷基之(甲基)丙烯酸酯。Examples of acrylates and/or methacrylates having a linear alkyl group with 16 or more carbon atoms as side chains (also collectively referred to as (meth)acrylates) include (meth)acrylates having a linear alkyl group with 16 to 22 carbon atoms, such as hexadecyl (meth)acrylate, stearyl (meth)acrylate, and behenyl (meth)acrylate.

作為側鏈可結晶化之聚合物,並無特別限定,例如亦可使用含有烷基之碳數為1~6之丙烯酸烷基酯及/或甲基丙烯酸烷基酯40重量%~60重量%之範圍內、含羧基乙烯性不飽和單體2重量%~10重量%之範圍內、及烷基之碳數為16~22之丙烯酸烷基酯及/或甲基丙烯酸烷基酯20重量%~60重量%之範圍內的單體聚合物。The side chain crystallizable polymer is not particularly limited, and for example, a monomer polymer containing 40% to 60% by weight of an alkyl acrylate and/or alkyl methacrylate having an alkyl group with a carbon number of 1 to 6, 2% to 10% by weight of a carboxyl group-containing ethylenic unsaturated monomer, and 20% to 60% by weight of an alkyl acrylate and/or alkyl methacrylate having an alkyl group with a carbon number of 16 to 22 can be used.

側鏈可結晶化之聚合物較佳為熔點(亦稱為第1次熔融轉移)為0℃以上且70℃以下之範圍內,其中尤佳為約15℃以上且55℃以下之範圍內。又,側鏈可結晶化之聚合物較佳為於低於約35℃、較佳為低於約25℃之相對較窄之溫度範圍內產生熔融。側鏈可結晶化之聚合物之量並無特別限定,可適當設定對於使冷卻剝離型感溫性接著層表現出如下特性而言充分之量:於設定溫度以下之溫度下,大致為非黏著性,又,於設定溫度以上之溫度下為黏著性。The side chain crystallizable polymer preferably has a melting point (also called the first melting transition) in the range of 0°C to 70°C, and more preferably in the range of about 15°C to 55°C. In addition, the side chain crystallizable polymer preferably melts in a relatively narrow temperature range of less than about 35°C, preferably less than about 25°C. The amount of the side chain crystallizable polymer is not particularly limited, and can be appropriately set to an amount sufficient for the cold peel type thermosensitive adhesive layer to exhibit the following characteristics: substantially non-adhesive at a temperature below a set temperature, and adhesive at a temperature above the set temperature.

再者,作為包含上述組成之冷卻剝離型感溫性接著層,例如可使用日本專利特開2000-351951號公報所揭示之黏著、接著層。Furthermore, as the cold peelable temperature-sensitive adhesive layer including the above-mentioned composition, for example, the adhesive layer disclosed in Japanese Patent Laid-Open No. 2000-351951 can be used.

(2)第2態樣 本態樣之第1接著層係接受能量線照射處理作為接著力調整處理而使接著力降低的能量線響應性接著層。能量線響應性接著層係藉由能量線之照射使接著層硬化及收縮,藉此因接著力之降低及於被黏著面之剪力之產生等而能夠剝離。(2) Second Aspect The first bonding layer of this aspect is an energy ray responsive bonding layer that receives energy ray irradiation treatment as bonding force adjustment treatment to reduce bonding force. The energy ray responsive bonding layer is hardened and shrunk by energy ray irradiation, thereby enabling peeling due to the reduction of bonding force and the generation of shear force on the bonded surface.

作為能量線照射處理所使用之能量線,只要為能夠使第1接著層之反應產生者即可,可視能量線響應性接著層之組成而適當選擇。作為能量線,例如可列舉:遠紫外線、紫外線、近紫外線、紅外線等光線、X射線、電子束、γ射線等電磁波、質子線、中子射線等各種游離輻射。其中,較佳為紫外線、電子束。The energy beam used in the energy beam irradiation treatment can be any energy beam that can cause the first bonding layer to react, and can be appropriately selected depending on the composition of the bonding layer that is energy beam responsive. Examples of energy beams include: far ultraviolet, ultraviolet, near ultraviolet, infrared, and other light, X-rays, electron beams, gamma-rays, and other electromagnetic waves, proton beams, neutron beams, and other ionizing radiations. Among them, ultraviolet and electron beams are preferred.

關於能量線響應性接著層之組成,只要藉由能量線照射處理能夠硬化,則無特別限定。作為能量線響應性接著層之組成,例如可列舉含有丙烯酸系聚合物、能量線聚合性之低聚物或單體、聚合起始劑、及交聯劑的組成。再者,於本發明中,「丙烯酸」中可亦包含「甲基丙烯酸」。The composition of the energy ray responsive adhesive layer is not particularly limited as long as it can be cured by energy ray irradiation. The composition of the energy ray responsive adhesive layer includes, for example, an acrylic polymer, an energy ray polymerizable oligomer or monomer, a polymerization initiator, and a crosslinking agent. In the present invention, "acrylic acid" may also include "methacrylic acid".

作為丙烯酸系聚合物,例如可列舉作為主要單體之丙烯酸酯與含有可與上述丙烯酸酯共聚之官能基之丙烯酸系單體之共聚物即丙烯酸酯共聚物。作為含有官能基之丙烯酸系單體之官能基,例如可列舉羥基、羧基、環氧基等、異氰酸酯基、胺基等。關於構成丙烯酸系聚合物之丙烯酸酯及含有官能基之單體,例如可使用日本專利特開2012-31316號公報、日本專利特開2004-158812號公報等中揭示之丙烯酸酯及單體。又,上述丙烯酸系聚合物例如可設為上述公報所揭示之質量平均分子量(Mw)。Examples of acrylic polymers include copolymers of acrylic esters as main monomers and acrylic monomers containing functional groups copolymerizable with the acrylic esters, i.e., acrylic ester copolymers. Examples of functional groups of acrylic monomers containing functional groups include hydroxyl groups, carboxyl groups, epoxy groups, isocyanate groups, and amine groups. For example, acrylic esters and monomers disclosed in Japanese Patent Laid-Open No. 2012-31316 and Japanese Patent Laid-Open No. 2004-158812 can be used as acrylic esters and monomers constituting acrylic polymers. Furthermore, the acrylic polymers can be set to, for example, the mass average molecular weight (Mw) disclosed in the above-mentioned publications.

作為能量線聚合性之低聚物或單體,只要為藉由能量線之照射可進行聚合者,則並無特別限定,例如可列舉光自由基聚合性、光陽離子聚合性、光陰離子聚合性等之低聚物或單體。具體而言,可使用日本專利特開2012-31316號公報、日本專利特開2004-158812號公報等中揭示之能量線聚合性低聚物或單體。能量線聚合性之低聚物或單體例如可設為上述公報所揭示之質量平均分子量(Mw)及含量。As the energy-ray polymerizable oligomer or monomer, there is no particular limitation as long as it can be polymerized by irradiation with energy rays, and examples thereof include oligomers or monomers that are photo-radical polymerizable, photo-cation polymerizable, and photo-cation polymerizable. Specifically, energy-ray polymerizable oligomers or monomers disclosed in Japanese Patent Laid-Open No. 2012-31316 and Japanese Patent Laid-Open No. 2004-158812 can be used. The energy-ray polymerizable oligomer or monomer can be set to, for example, the mass average molecular weight (Mw) and content disclosed in the above-mentioned publications.

作為聚合起始劑,例如可列舉IRGACURE754(BASF JAPAN公司製造)、IRGACURE2959(BASF JAPAN公司製造)、日本專利特開2004-158812號公報等中所揭示之光聚合起始劑等。又,作為交聯劑,例如可使用異氰酸酯系交聯劑、環氧系交聯劑等,具體而言,可使用日本專利特開2012-31316號公報中揭示之交聯劑。Examples of the polymerization initiator include IRGACURE 754 (manufactured by BASF JAPAN), IRGACURE 2959 (manufactured by BASF JAPAN), and photopolymerization initiators disclosed in Japanese Patent Laid-Open No. 2004-158812. Examples of the crosslinking agent include isocyanate crosslinking agents, epoxy crosslinking agents, and the like. Specifically, the crosslinking agent disclosed in Japanese Patent Laid-Open No. 2012-31316 can be used.

能量線響應性接著層可進而包含氣體產生劑。其原因在於:氣體產生劑因能量線照射而產生氣體,且氣體轉移至接著層與被黏著體之間之界面,藉此變得更容易剝離。作為氣體產生劑,並無特別限定,例如可使用偶氮化合物、疊氮化合物。具體而言,可列舉日本專利特開2004-158812號公報所揭示之偶氮化合物、疊氮化合物。關於氣體產生劑之含量,只要能夠發揮所需功能,則並無特別限定,例如可設為日本專利特開2004-158812號公報所揭示之量。The energy-beam-responsive bonding layer may further include a gas generator. The reason is that the gas generator generates gas due to energy-beam irradiation, and the gas is transferred to the interface between the bonding layer and the adherend, thereby becoming easier to peel off. There is no particular limitation on the gas generator, and for example, azo compounds and azide compounds can be used. Specifically, the azo compounds and azide compounds disclosed in Japanese Patent Publication No. 2004-158812 can be cited. As for the content of the gas generator, there is no particular limitation as long as it can exert the required function, and for example, it can be set to the amount disclosed in Japanese Patent Publication No. 2004-158812.

再者,作為能量線響應性接著層,例如可使用日本專利特開2012-31316號公報、日本專利特開2004-158812號公報等所揭示之黏著、接著層。Furthermore, as the energy line responsive adhesive layer, for example, the adhesive layer or bonding layer disclosed in Japanese Patent Application Laid-Open No. 2012-31316 and Japanese Patent Application Laid-Open No. 2004-158812 can be used.

(3)第3態樣 本態樣之第1接著層係接受電場施加處理或無電場處理作為接著力調整處理而使接著力降低的電氣響應性接著層。所謂電氣響應性接著層,係與電場之施加之有無對應地重複接著性及非接著性的接著層。於本發明之積層體中,電氣響應性接著層可為於無電場中表現出接著力、藉由電場施加而使接著力降低的電剝離性接著層,亦可為藉由電場施加表現出接著力、於無電場中接著力降低的電接著性接著層。其中,較佳為藉由電場施加使接著力降低之電剝離性接著層。其原因在於:能夠於通常環境下實施轉印作業或製程。(3) The third aspect of the sample The first bonding layer of this aspect is an electrically responsive bonding layer that receives an electric field application treatment or an electric field-free treatment as a bonding force adjustment treatment to reduce the bonding force. The so-called electrically responsive bonding layer is a bonding layer that repeats bonding and non-bonding properties in accordance with the presence or absence of an electric field application. In the laminate of the present invention, the electrically responsive bonding layer may be an electrically exfoliative bonding layer that exhibits bonding force in the absence of an electric field and reduces the bonding force by applying an electric field, or an electrically adhesive bonding layer that exhibits bonding force by applying an electric field and reduces the bonding force in the absence of an electric field. Among them, an electrically exfoliative bonding layer that reduces the bonding force by applying an electric field is preferred. The reason is that the transfer operation or process can be carried out in a normal environment.

若本態樣之第1接著層為電剝離性接著層,則接著力調整處理稱係指對無電場下之第1接著層施加電場之電場施加處理。即,於本態樣之第1接著層為電剝離性接著層之情形時,藉由將本發明之積層體置於無電場下,第1接著層能夠具有接著性。另一方面,於將包含構造體之圖案部轉印至第2層時,藉由於第2層配置有本發明之積層體之狀態下置於電場下作為電場施加處理,受到電場施加之第1接著層之接著力降低,至少第1層能夠進行剝離。If the first bonding layer of the present embodiment is an electrically exfoliative bonding layer, the bonding force adjustment treatment refers to an electric field application treatment of applying an electric field to the first bonding layer in the absence of an electric field. That is, in the case where the first bonding layer of the present embodiment is an electrically exfoliative bonding layer, by placing the laminate of the present invention in the absence of an electric field, the first bonding layer can have bonding properties. On the other hand, when the pattern portion including the structure is transferred to the second layer, by placing the laminate of the present invention in an electric field as an electric field application treatment in a state where the second layer is configured with the laminate of the present invention, the bonding force of the first bonding layer to which the electric field is applied is reduced, and at least the first layer can be peeled off.

作為此種電剝離性接著層之組成,例如可列舉包含丙烯酸系接著劑或聚酯接著劑及電解液之組成。構成丙烯酸系接著劑之丙烯酸系聚合物並無特別限定,就接著性之觀點而言,例如可使用具有1萬~500萬之範圍之重量平均分子量之丙烯酸系聚合物。關於重量平均分子量之算出方法、以及構成此種丙烯酸系聚合物之丙烯酸系單體及聚合起始劑之具體例,可設為與日本專利特開2010-037354號公報所揭示之算出方法及材料相同。As the composition of such an electrolytically strippable adhesive layer, for example, a composition including an acrylic adhesive or a polyester adhesive and an electrolyte can be cited. The acrylic polymer constituting the acrylic adhesive is not particularly limited. From the perspective of adhesiveness, for example, an acrylic polymer having a weight average molecular weight in the range of 10,000 to 5,000,000 can be used. The calculation method of the weight average molecular weight and the specific examples of the acrylic monomer and polymerization initiator constituting such an acrylic polymer can be the same as the calculation method and materials disclosed in Japanese Patent Publication No. 2010-037354.

關於電解液,只要能夠表現出所需離子導電率,則並無特別限定,例如可列舉包含作為電解質之四級銨鹽或鹼金屬鹽、及有機溶劑之混合物。關於電解液之離子導電率及其測定方法、以及電解液之具體組成,可設為與日本專利特開2010-37354號公報所揭示之離子導電率及測定方法、以及電解液之組成相同。The electrolyte is not particularly limited as long as it can exhibit the required ionic conductivity, and an example thereof may include a mixture of a quaternary ammonium salt or an alkaline metal salt as an electrolyte and an organic solvent. The ionic conductivity of the electrolyte, the method for determining the ionic conductivity, and the specific composition of the electrolyte may be the same as those disclosed in Japanese Patent Publication No. 2010-37354.

另一方面,若本態樣之第1接著層為電接著性接著層,則接著力調整處理係指停止第1接著層之電場施加而設為無電場之無電場處理。即,於本態樣之第1接著層為電接著性接著層之情形時,藉由對第1接著層施加電場,第1接著層能夠具有所需接著力。另一方面,於將包含構造體之圖案部轉印至第2層時,藉由停止對第1接著層之電場施加作為無電場處理,第1接著層之接著力降低,於與和第1接著層鄰接之層之所需界面能夠進行剝離。On the other hand, if the first bonding layer of the present embodiment is an electrically bonded bonding layer, the bonding force adjustment process refers to a no-electric field process in which the application of an electric field to the first bonding layer is stopped to provide a no-electric field. That is, when the first bonding layer of the present embodiment is an electrically bonded bonding layer, the first bonding layer can have a desired bonding force by applying an electric field to the first bonding layer. On the other hand, when the pattern portion including the structure is transferred to the second layer, the bonding force of the first bonding layer is reduced by stopping the application of an electric field to the first bonding layer as a no-electric field process, and peeling can be performed at a desired interface with a layer adjacent to the first bonding layer.

作為此種電接著性接著層之組成,例如可列舉於樹脂交聯體分散有電流變粒子(ER粒子)之電流變凝膠(ER凝膠)。再者,作為電接著性接著層,例如亦可使用如日本專利特開2013-049820號公報所揭示之電黏著片,具體而言,將具有黏彈性之矽凝膠、胺基甲酸酯橡膠、或丁二烯橡膠組合於積層有2層之多孔片材而成的片材。As the composition of such an electrically adhesive bonding layer, for example, an electrorheological gel (ER gel) in which electrorheological particles (ER particles) are dispersed in a resin crosslinker can be cited. Furthermore, as the electrically adhesive bonding layer, for example, an electric adhesive sheet disclosed in Japanese Patent Publication No. 2013-049820 can also be used, specifically, a sheet formed by combining viscoelastic silicone gel, urethane rubber, or butadiene rubber with a two-layered porous sheet.

對第1接著層施加電場之方法可使用公知之方法。例如可列舉將端子連接於導電性之第1層及構造體並對端子間施加電壓之方法、使端子與導電性之第1層及第1接著層接觸並對端子間施加電壓之方法等。作為導電性之第1層,例如可使用銅箔、鋁箔等金屬箔等。又,施加條件並無特別限定,例如可於電場5 V~50 V之範圍內、施加時間10秒~120秒之範圍內進行設定。The method of applying an electric field to the first bonding layer can be a known method. For example, a method of connecting a terminal to the first conductive layer and the structure and applying a voltage between the terminals, a method of bringing the terminal into contact with the first conductive layer and the first bonding layer and applying a voltage between the terminals, etc. As the first conductive layer, for example, a metal foil such as copper foil or aluminum foil can be used. In addition, the application conditions are not particularly limited, and can be set, for example, within the range of 5 V to 50 V for the electric field and within the range of 10 seconds to 120 seconds for the application time.

(4)其他 各態樣之第1接著層可視需要而包含其他任意之添加劑。作為任意之添加劑,例如可列舉:著色劑、顏料等之粉體、界面活性劑、塑化劑、黏著賦予劑、低分子量聚合物、表面潤滑劑、調平劑、抗氧化劑、防腐蝕劑、光穩定劑、紫外線吸收劑、聚合抑制劑、矽烷偶合劑、無機或有機之填充劑、金屬粉、粒子狀、箔狀物等。(4) Others The first bonding layer of each embodiment may contain other optional additives as needed. Examples of the optional additives include: colorants, pigment powders, surfactants, plasticizers, adhesion promoters, low molecular weight polymers, surface lubricants, leveling agents, antioxidants, corrosion inhibitors, light stabilizers, ultraviolet absorbers, polymerization inhibitors, silane coupling agents, inorganic or organic fillers, metal powders, particles, foils, etc.

2.其他 第1接著層較佳為於接著力調整處理前後表現出所需接著力。接著力調整處理前之第1接著層之接著力亦取決於接著層之組成、厚度,例如為0.1 N/25 mm以上且10 N/25 mm以下之範圍內,較佳為0.5 N/25 mm以上且5 N/25 mm以下之範圍內,更佳為1 N/25 mm以上且3 N/25 mm以下之範圍內。又,接著力調整處理後之第1接著層之接著力只要低於接著力調整處理前即可,其中,較佳為第1接著層能夠對第1層或構造體表現出易剝離性或非接著性。作為接著力調整處理後之第1接著層之接著力,例如可設為5 N/25 mm以下、較佳為0.05 N/25 mm以上且2 N/25 mm以下之範圍內,更佳為0.05 N/25 mm以上且0.5 N/25 mm以下之範圍內。再者,所謂非接著性,係指實質上不具有接著力之物性,又,所謂易剝離性,係指具有黏性、能夠與第1層及構造體接著、且能夠容易地自第1層或構造體剝離之物性。2. Others The first bonding layer preferably exhibits the required bonding force before and after the bonding force adjustment treatment. The bonding force of the first bonding layer before the bonding force adjustment treatment also depends on the composition and thickness of the bonding layer, for example, it is within the range of 0.1 N/25 mm or more and 10 N/25 mm or less, preferably within the range of 0.5 N/25 mm or more and 5 N/25 mm or less, and more preferably within the range of 1 N/25 mm or more and 3 N/25 mm or less. In addition, the bonding force of the first bonding layer after the bonding force adjustment treatment only needs to be lower than that before the bonding force adjustment treatment, wherein it is preferred that the first bonding layer can exhibit easy peelability or non-bonding to the first layer or the structure. The adhesion of the first adhesive layer after the adhesion adjustment treatment can be set, for example, to be 5 N/25 mm or less, preferably to be within the range of 0.05 N/25 mm or more and 2 N/25 mm or less, and more preferably to be within the range of 0.05 N/25 mm or more and 0.5 N/25 mm or less. Furthermore, the so-called non-adhesiveness refers to the physical property of not having adhesion in substance, and the so-called easy peelability refers to the physical property of having viscosity, being able to adhere to the first layer and the structure, and being able to be easily peeled off from the first layer or the structure.

接著力調整處理前後之第1接著層之接著力可依據JIS Z0237-2009進行測定。測定係以如下方式而進行:準備利用厚度50 μm之PET(polyethylene terephthalate,聚對苯二甲酸乙二酯)膜對第1接著層(寬度25 mm,長度150 mm)進行襯底之試片,將該試片之第1接著層貼合於SUS304BA板,利用2 kg之輥來回壓合2次,並於溫度20℃~28℃、濕度30%RH~60%RH之條件下放置1小時~24小時,其後,使用拉伸試驗機(例如A&D(股)製造,Tensilon萬能試驗機RTF-1150H)於依據JIS Z0237-2009之條件(剝離角:180°方向;拉伸速度:300 mm/min;剝離距離:50 mm)進行剝離。於對接著力調整處理後之第1接著力之接著力進行測定之情形時,將利用上述方法所準備之試片之第1接著層貼合於SUS304BA板,利用2 kg之輥來回壓合2次並於上述條件下進行放置,其後,進行接著力調整處理,對處理後之試片使用拉伸試驗機於依據上述JIS Z0237-2009之條件下進行剝離而進行測定。The adhesion of the first adhesive layer before and after the adhesion adjustment process can be measured according to JIS Z0237-2009. The measurement is carried out as follows: a test piece with a PET (polyethylene terephthalate) film having a thickness of 50 μm as the first adhesive layer (width 25 mm, length 150 mm) is prepared, the first adhesive layer of the test piece is bonded to a SUS304BA plate, and the plate is pressed back and forth twice using a 2 kg roller, and is placed under conditions of a temperature of 20°C to 28°C and a humidity of 30%RH to 60%RH for 1 hour to 24 hours, and then a tensile tester (e.g., A&D (stock) manufactured, Tensilon universal tester RTF-1150H) is used under conditions in accordance with JIS Z0237-2009 (peel angle: 180° direction; tensile speed: 300 mm/min; peel distance: 50 In the case of measuring the adhesion of the first adhesion after the adhesion adjustment treatment, the first adhesion layer of the test piece prepared by the above method is attached to the SUS304BA plate, and is pressed back and forth twice by a 2 kg roller and placed under the above conditions. Thereafter, the adhesion adjustment treatment is performed, and the test piece after the treatment is peeled and measured using a tensile testing machine under the conditions of the above JIS Z0237-2009.

第1接著層之厚度只要為於接著力調整處理前後於與第1層或構造體之間能夠表現出所需接著力之厚度,則並無特別限定,可適當設定,例如可設為1 μm以上且500 μm以下之範圍內,較佳為5 μm以上且300 μm以下之範圍內。第1接著層可為膜狀,亦可為片狀。The thickness of the first bonding layer is not particularly limited as long as it can exhibit the required bonding strength with the first layer or the structure before and after the bonding strength adjustment process, and can be appropriately set, for example, it can be set to a range of 1 μm or more and 500 μm or less, preferably 5 μm or more and 300 μm or less. The first bonding layer can be in the form of a film or a sheet.

第1接著層可如圖2所示般配置於第1層1之一面之整個面,亦可如圖4所示般配置成與構造體3相同之圖案狀。於第1接著層為與構造體相同之圖案狀之情形時,於接著力調整處理後之第1層與第1接著層之間會產生剝離,藉此能夠將具有構造體及上述構造體上之第1層之圖案部轉印至第2層之一面。The first bonding layer can be arranged on the entire surface of one side of the first layer 1 as shown in FIG2, or can be arranged in the same pattern as the structure 3 as shown in FIG4. When the first bonding layer is in the same pattern as the structure, peeling occurs between the first layer after the bonding force adjustment treatment and the first bonding layer, thereby enabling the structure and the pattern portion of the first layer on the structure to be transferred to one side of the second layer.

第1接著層可視本發明之積層體之使用環境而選擇其態樣。例如於在加熱步驟等施加熱之步驟中使用之情形時,較好為加熱剝離型之感溫性接著層以外,其中基於操作簡便而言,更佳為電氣響應性接著層。又,於在進行紫外線照射之步驟中使用之情形時,較好為能量線響應性接著層以外,其中較佳為感溫性接著層。The first bonding layer can be selected according to the use environment of the laminate of the present invention. For example, when used in a step of applying heat such as a heating step, it is preferably a heat-stripping type temperature-sensitive bonding layer, and in particular, an electrically responsive bonding layer is more preferred for ease of operation. Furthermore, when used in a step of ultraviolet irradiation, it is preferably an energy-ray-responsive bonding layer, and in particular, a temperature-sensitive bonding layer is more preferred.

B.第1層 本發明之積層體之第1層為支持上述第1接著層及構造體之層。第1層係使本發明之積層體與第2層接觸並對第1接著層進行接著力調整處理之後進行剝離去除的層,且視本發明之積層體之用途,為成為剝離層或基材之層。B. First layer The first layer of the laminate of the present invention is a layer that supports the first bonding layer and the structure. The first layer is a layer that makes the laminate of the present invention contact with the second layer and performs bonding force adjustment on the first bonding layer before being peeled off and removed. Depending on the use of the laminate of the present invention, it is a layer that becomes a peeling layer or a base material.

第1層可使用可與接著力調整處理前之第1接著層接著且可使第1接著層表現出所需接著力者。作為第1層,例如可列舉樹脂層、金屬箔等金屬層、於樹脂層之一或兩面具有金屬膜之蒸鍍膜、脫模紙等紙、該等材料之複合材等。The first layer can be made of a material that can be bonded to the first bonding layer before the bonding force adjustment treatment and can make the first bonding layer show the required bonding force. Examples of the first layer include a resin layer, a metal layer such as a metal foil, a vapor-deposited film having a metal film on one or both sides of the resin layer, a paper such as a release paper, and a composite material of these materials.

作為樹脂層,並無特別限定,例如可列舉包含聚對苯二甲酸乙二酯、聚萘二甲酸乙二酯等聚酯、聚碳酸酯、聚甲基丙烯酸甲酯等丙烯酸系樹脂、聚乙烯、聚丙烯等烯烴、聚醯亞胺、環狀聚烯烴、三乙醯纖維素等樹脂之層。The resin layer is not particularly limited, and examples thereof include layers containing polyesters such as polyethylene terephthalate and polyethylene naphthalate, acrylic resins such as polycarbonate and polymethyl methacrylate, olefins such as polyethylene and polypropylene, polyimide, cyclic polyolefins, and triacetyl cellulose.

又,作為金屬箔,例如可列舉銅箔、鋁箔等。作為銅箔,可使用包含銅之單金屬之箔,亦可使用包含銅與其他金屬(例如,錫、鉻、銀、鎂、鎳、鋯、矽、鈦等)之合金之箔。In addition, examples of metal foil include copper foil, aluminum foil, etc. As the copper foil, a foil of a single metal including copper can be used, and a foil of an alloy including copper and other metals (for example, tin, chromium, silver, magnesium, nickel, zirconium, silicon, titanium, etc.) can also be used.

其中,第1層較佳為樹脂層。如下文所述,於將接著力調整處理後之剝離位置設定於第1接著層與構造體之間之情形時,第1層較佳為樹脂層。其原因在於能夠提高第1接著層與接著力調整處理後之第1層之間之接著力。作為此種情形時之第1層,具體而言,較佳為包含PET等聚酯、聚醯亞胺、聚丙烯、聚乙烯等之樹脂層。Among them, the first layer is preferably a resin layer. As described below, when the peeling position after the adhesion adjustment treatment is set between the first adhesion layer and the structure, the first layer is preferably a resin layer. The reason is that the adhesion between the first adhesion layer and the first layer after the adhesion adjustment treatment can be improved. As the first layer in this case, specifically, it is preferably a resin layer containing polyester such as PET, polyimide, polypropylene, polyethylene, etc.

關於第1層,可對與第1接著層相接之側之面實施表面處理。其原因在於:能夠提高與接著力調整處理前後之第1接著層、尤其是接著力調整處理後之第1接著層之間之接著力,能夠使接著力調整處理後之第1接著層與第1層之間不易剝離。對第1層之第1接著層側之面進行表面處理之方法可視構成第1層之材料之種類適當選擇,例如可列舉氧化法、凹凸化法等公知之方法。Regarding the first layer, the surface on the side in contact with the first bonding layer can be subjected to surface treatment. The reason for this is that the bonding force between the first bonding layer before and after the bonding force adjustment treatment, especially the first bonding layer after the bonding force adjustment treatment, can be improved, and the first bonding layer after the bonding force adjustment treatment can be prevented from being easily peeled off from the first layer. The method for surface treatment of the surface on the side of the first bonding layer of the first layer can be appropriately selected depending on the type of material constituting the first layer, and for example, known methods such as oxidation method and embossing method can be listed.

第1層之厚度並無特別限制,較佳為可獲得至少能夠支持第1接著層及構造體之程度之強度的厚度,例如可設為5 μm以上且1000 μm以下之範圍內。第1層可為膜狀,亦可為片狀。其中,就剝離之觀點而言,較佳為膜狀。The thickness of the first layer is not particularly limited, but is preferably a thickness that can at least provide strength to support the first connecting layer and the structure, for example, it can be set within a range of 5 μm to 1000 μm. The first layer can be in the form of a film or a sheet. In particular, from the perspective of peeling, a film is preferred.

第1層可具有透光性,亦可不具有透光性。於第1接著層為能量線響應性接著層之情形時,第1層較佳為具有能量線透過性。其原因在於:自第1層側照射能量線,能夠使第1接著層之接著力容易地降低。第1層之能量線透過性可視照射之能量線之種類、構成第1層之材料相對於能量線之感度而適當設定。例如,若能量線為光線,則較佳為第1層之400 nm以下之透光率為60%以上。再者,透光率可使用市售之分光光度計(例如,島津製作所公司製造之MPC2200)進行測定。The first layer may or may not be light-transmissive. When the first bonding layer is an energy-ray responsive bonding layer, the first layer is preferably energy-ray transparent. The reason is that irradiating the energy ray from the side of the first layer can easily reduce the bonding strength of the first bonding layer. The energy-ray transmittance of the first layer can be appropriately set according to the type of irradiated energy ray and the sensitivity of the material constituting the first layer to the energy ray. For example, if the energy ray is light, it is preferred that the transmittance of the first layer below 400 nm is 60% or more. Furthermore, the transmittance can be measured using a commercially available spectrophotometer (for example, MPC2200 manufactured by Shimadzu Corporation).

又,於第1接著層為加熱剝離型感溫性接著層之情形時,第1層較佳為具有耐熱性。其原因在於:於藉由加熱處理使第1接著層之接著力降低時,能夠防止第1層之熱劣化,能夠容易地進行剝離。第1層較佳為具有可耐加熱剝離型感溫性接著層之加熱處理溫度的耐熱性,具體而言,較佳為第1層之熔點高於加熱處理溫度。In addition, when the first adhesive layer is a heat-peelable thermosensitive adhesive layer, the first layer is preferably heat-resistant. The reason is that when the adhesion of the first adhesive layer is reduced by heat treatment, thermal degradation of the first layer can be prevented and peeling can be easily performed. The first layer is preferably heat-resistant enough to withstand the heat treatment temperature of the heat-peelable thermosensitive adhesive layer. Specifically, it is preferred that the melting point of the first layer is higher than the heat treatment temperature.

C.構造體 本發明之積層體中之構造體係配置於上述第1接著層之與上述第1層側為相反側的構件。藉由直接轉印或經由其他層呈圖案狀轉印至第2層之一面,而具有適合於用途之功能。於本發明之積層體中,於第1接著層之與第1層相反之側呈圖案狀配置有1個以上構造體。C. Structure The structure in the laminate of the present invention is a component disposed on the side of the first connecting layer opposite to the first layer. It has a function suitable for the application by directly transferring or transferring in a pattern through other layers to one side of the second layer. In the laminate of the present invention, one or more structures are disposed in a pattern on the side of the first connecting layer opposite to the first layer.

構造體可具有適合於本發明之積層體之用途之形狀,例如可設為片材或薄膜等層狀、球(ball)狀、立方體、長方體等立體狀等形狀。層狀之構造體可為單層,亦可具有積層構造。構造體之大小或厚度可視構造體之功能或形態、本發明之積層體之用途而適當設定。The structure may have a shape suitable for the use of the laminate of the present invention, for example, it may be a layered shape such as a sheet or film, a sphere, a cube, a cuboid or other three-dimensional shape. The layered structure may be a single layer or may have a layered structure. The size or thickness of the structure may be appropriately set depending on the function or shape of the structure and the use of the laminate of the present invention.

作為構造體之材料,可視本發明之實施態樣之積層體之用途、構造體之功能或物性而選擇,例如可列舉樹脂、金屬、細胞等。The material of the structure can be selected according to the purpose of the laminate of the embodiment of the present invention, the function or physical properties of the structure, and examples thereof include resin, metal, cells, etc.

構造體本身可具有接著性,亦可不具有接著性。於構造體具有接著性之情形時,本發明之積層體能夠不另行經由接著層等將包含構造體之圖案部直接轉印至第2層。此處,所謂構造體具有接著性,除包含構造體於常溫下具有黏性(黏著性)以外,亦包含藉由加壓或加熱表現出黏性。The structure itself may or may not have adhesiveness. When the structure has adhesiveness, the laminate of the present invention can directly transfer the pattern portion including the structure to the second layer without passing through an adhesive layer or the like. Here, the structure having adhesiveness includes not only that the structure has viscosity (adhesiveness) at room temperature, but also that the structure exhibits viscosity by applying pressure or heat.

作為構造體具有接著性之情形時之接著力,只要能夠與作為被轉印體之第2層充分地接著,則並無特別限定,例如可設為0.1 N/25 mm以上且5 N/25 mm以下之範圍內,較佳為0.5 N/25 mm以上且1 N/25 mm以下之範圍內。構造體之接著力可依據JIS Z0237-2009進行測定。測定方法之詳細情況與「A.第1接著層」之項中所說明之接著力之測定方法相同。The adhesive force when the structure has adhesiveness is not particularly limited as long as it can fully adhere to the second layer as the transfer body, and can be set, for example, in the range of 0.1 N/25 mm or more and 5 N/25 mm or less, preferably in the range of 0.5 N/25 mm or more and 1 N/25 mm or less. The adhesive force of the structure can be measured in accordance with JIS Z0237-2009. The details of the measurement method are the same as the measurement method of the adhesive force described in the item "A. First Adhesive Layer".

另一方面,於構造體不具有接著性之情形時,藉由於構造體之與第1接著層側為相反側具有下文所述之第2接著層,本發明之積層體能夠將包含構造體及第2接著層之圖案部轉印至第2層。即,構造體可經由第2接著層間接地轉印至第2層。On the other hand, when the structure has no adhesiveness, the laminate of the present invention can transfer the pattern portion including the structure and the second adhesive layer to the second layer by having the second adhesive layer described below on the side of the structure opposite to the first adhesive layer. That is, the structure can be indirectly transferred to the second layer via the second adhesive layer.

構造體可除上述接著性以外視構造體之種類、本發明之積層體之用途等而具有所需功能或物性。作為構造體所要求之物性,例如可列舉耐熱性、耐化學品性等。In addition to the above-mentioned adhesion, the structure may have required functions or properties depending on the type of structure, the application of the laminate of the present invention, etc. Examples of the properties required of the structure include heat resistance and chemical resistance.

以下,針對本發明之構造體,有條理地進一步詳細地說明本發明之實施態樣之積層體之用途例。The following is a detailed and methodical description of examples of uses of the multilayer structure of the present invention.

(用途例1) 用途例1為將本發明之積層體用作轉印用載片之例,例如可用於附凹部多層體之製造。具體而言,藉由將構成多層體之一構件作為第2層,並使用本發明之積層體將包含構造體之圖案部轉印至上述第2層,進而於上述構造體上配置多層體之構成構件,可於多層體之製造中將圖案狀之構造體配置於所需位置。並且,藉由根據構造體之配置位置對多層體進行劃分之後將俯視下與構造體重疊之劃分區域剝離去除,可於多層體形成凹部。關於用途例1,由於會於下文所述之「B.附凹部多層體之製造方法」之項中詳細地進行說明,因此,此處省略說明。(Application Example 1) Application Example 1 is an example of using the laminate of the present invention as a transfer carrier, for example, it can be used to manufacture a multilayer body with a recessed portion. Specifically, by using one of the components constituting the multilayer body as the second layer, and using the laminate of the present invention to transfer the pattern portion containing the structure to the above-mentioned second layer, and then arranging the components constituting the multilayer body on the above-mentioned structure, the patterned structure can be arranged at a desired position during the manufacture of the multilayer body. In addition, by dividing the multilayer body according to the arrangement position of the structure, and then peeling off and removing the divided area that overlaps with the structure in a top view, a recessed portion can be formed in the multilayer body. Regarding Application Example 1, since it will be described in detail in the section "B. Manufacturing method of multi-layer body with recessed portions" described below, the description is omitted here.

於用途例1中,構造體可設為構成多層體之構件。例如,若於用途例1中用於附凹部多層配線板之製造之情形時,作為上述構造體,可使用適合於使用上述積層體之步驟之構件,具體而言,可列舉保護層、配線圖案、焊球等。其中,作為上述構造體,可較佳地使用保護層。In Application Example 1, the structure can be a member constituting a multilayer body. For example, when used in Application Example 1 for manufacturing a multilayer wiring board with a recess, as the structure, a member suitable for the step of using the multilayer body can be used, specifically, a protective layer, a wiring pattern, a solder ball, etc. Among them, as the structure, a protective layer can be preferably used.

於用途例1中,構造體之材料可適當選擇表現出適合於使用積層體之步驟之物性之材料。例如,若上述構造體為保護層,則作為構造體之材料,可列舉樹脂。又,若上述構造體為配線圖案,則作為構造體之材料,可列舉一般用於配線之金屬、導電性材料等。In Application Example 1, the material of the structure can be appropriately selected to exhibit physical properties suitable for the step in which the laminate is used. For example, if the structure is a protective layer, resin can be listed as the material of the structure. Also, if the structure is a wiring pattern, metals generally used for wiring, conductive materials, etc. can be listed as the material of the structure.

於用途例1中,構造體可視用途而具有所需物性。於此情形時,構造體之材料可視物性而適當選擇。例如,構造體可具有接著性。作為具有接著性之構造體之材料,例如可列舉聚胺基甲酸酯、丁基橡膠、聚苯乙烯系彈性體等黏著性橡膠等。該等材料可使用1種或2種以上。In the application example 1, the structure may have required physical properties depending on the application. In this case, the material of the structure may be appropriately selected depending on the physical properties. For example, the structure may have adhesive properties. As the material of the structure having adhesive properties, for example, polyurethane, butyl rubber, polystyrene elastomer and other adhesive rubbers may be listed. One or more of these materials may be used.

又,於用途例1中,構造體可具有耐熱性。其原因在於能夠抑制因熱而產生之構造體之尺寸變化。尤其於上述構造體為保護層且於用途例1中用於附凹部多層配線板之製造之情形時,由於包含加熱之步驟、及需要形成較高之尺寸精度之凹部,因此對上述構造體要求高耐熱性。作為具有耐熱性之構造體之材料,例如可列舉:聚醯亞胺樹脂、聚對苯二甲酸乙二酯(PET)、聚萘二甲酸乙二酯(PEN)、聚對苯二甲酸丁二酯(PBT)等聚酯樹脂、聚烯烴樹脂、聚醯胺樹脂、聚醯亞胺樹脂、聚碳酸酯樹脂、丙烯酸系樹脂、聚氯乙烯樹脂、聚苯硫醚(PPS)樹脂等。該等樹脂可使用1種或2種以上。其中,聚苯硫醚(PPS)樹脂就亦具有下文所述之耐化學品性等之方面而言較佳。Furthermore, in Application Example 1, the structure can have heat resistance. This is because the dimensional change of the structure caused by heat can be suppressed. In particular, when the structure is a protective layer and is used for manufacturing a multi-layer wiring board with a recess in Application Example 1, since a heating step is included and a recess with high dimensional accuracy needs to be formed, high heat resistance is required for the structure. Examples of materials for the heat-resistant structure include polyester resins such as polyimide resin, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), and polybutylene terephthalate (PBT), polyolefin resins, polyamide resins, polyimide resins, polycarbonate resins, acrylic resins, polyvinyl chloride resins, and polyphenylene sulfide (PPS) resins. One or more of these resins may be used. Among them, polyphenylene sulfide (PPS) resin is preferred in terms of having chemical resistance as described below.

進而,於用途例1中,構造體亦可除耐熱性以外還具有耐久性、耐化學品性等。其原因在於:於在用途例1中用於附凹部多層配線板之製造之情形時,例如於進行藥液處理等之情形時,能夠抑制構造體及第2層因藥液而引起劣化。又,其原因在於:於剝離去除劃分區域時,能夠抑制糊劑殘留之產生。Furthermore, in Application Example 1, the structure can also have durability and chemical resistance in addition to heat resistance. The reason is that when used in the manufacture of a multi-layer wiring board with a recessed portion in Application Example 1, for example, when a chemical solution treatment is performed, the structure and the second layer can be prevented from being degraded by the chemical solution. Also, the reason is that when the partition area is removed by peeling, the generation of paste residue can be prevented.

於用途例1中,圖案狀之構造體係呈圖案狀配置1個以上構造體而成。關於構造體之每單元之俯視形狀,於在用途例1中用於附凹部多層配線板之製造之情形時,可使之與附凹部多層體之凹部之每單元之俯視形狀相當。又,構造體之配置圖案可設為與形成於多層體之凹部之配置圖案相同。In Application Example 1, the patterned structure is formed by arranging one or more structures in a pattern. When the structure is used for manufacturing a multi-layer wiring board with recesses in Application Example 1, the top view shape of each unit can be made equal to the top view shape of each unit of the recess of the multi-layer body with recesses. In addition, the arrangement pattern of the structure can be made the same as the arrangement pattern of the recesses formed in the multi-layer body.

(用途例2) 用途例2為將本發明之積層體用作細胞圖案轉印用積層體之例。即,藉由將活體組織、培養基板等作為第2層且使用本發明之積層體將包含構造體之圖案部轉印至第2層,可將細胞圖案移植至活體組織中。(Application Example 2) Application Example 2 is an example of using the laminate of the present invention as a laminate for transferring a cell pattern. That is, by using a living tissue, a culture substrate, etc. as the second layer and transferring the pattern portion including the structure to the second layer using the laminate of the present invention, the cell pattern can be transplanted into the living tissue.

於用途例2中,作為構造體,例如可列舉細胞片。細胞片為培養細胞集合並層狀化而成之薄片。作為構成細胞片之細胞,例如可列舉血球系細胞或淋巴系細胞等懸浮細胞、黏著性細胞等。具體而言,可列舉日本專利特開2007-014753號中揭示之細胞。In the second application example, a cell sheet can be cited as a structure. A cell sheet is a sheet formed by cultured cells being aggregated and layered. Cells constituting the cell sheet include, for example, suspended cells such as hemocyte cells or lymphocytes, and adhesive cells. Specifically, cells disclosed in Japanese Patent Laid-Open No. 2007-014753 can be cited.

於用途例2中,圖案狀之構造體係呈圖案狀配置1個以上構造體而成,且構造體之每單元之俯視形狀可與細胞圖案轉印用積層體中之細胞片之每單元之俯視形狀相當。又,構造體之配置圖案可設為與細胞圖案轉印用積層體中之細胞片之配置圖案相同。In Application Example 2, the patterned structure is formed by arranging one or more structures in a pattern, and the top view shape of each unit of the structure can be equal to the top view shape of each unit of the cell sheet in the cell pattern transfer laminate. In addition, the arrangement pattern of the structure can be the same as the arrangement pattern of the cell sheet in the cell pattern transfer laminate.

D.第2接著層 本發明之積層體於上述構造體之與上述第1接著層側為相反側可具有與上述第1接著層不同之組成之第2接著層。其原因在於:於構造體不具有接著性之情形時,藉由於構造體之與第1接著層側為相反側之面具有第2接著層,可經由第2接著層將構造體轉印至第2層。此時,轉印至第2層之圖案部自第2層側至少依序具有第2接著層及構造體。 圖5係表示本發明之積層體之另一例之概略剖視圖,於構造體3之與第1接著層2側為相反側具有第2接著層4。再者,圖5中,將構造體3與第2接著層4之間之接著力設為N3 。除此以外,圖5中未說明之符號與圖1~圖3相同。D. Second Adhesion Layer The laminate of the present invention may have a second adhesion layer having a different composition from the first adhesion layer on the side of the structure opposite to the first adhesion layer. The reason is that when the structure does not have adhesion, the structure can be transferred to the second layer through the second adhesion layer by having the second adhesion layer on the surface of the structure opposite to the first adhesion layer. At this time, the pattern portion transferred to the second layer has at least the second adhesion layer and the structure in sequence from the second layer side. FIG5 is a schematic cross-sectional view showing another example of the laminate of the present invention, in which a second adhesion layer 4 is provided on the side of the structure 3 opposite to the first adhesion layer 2 side. In Fig. 5 , the bonding force between the structure 3 and the second bonding layer 4 is assumed to be N 3 . Other symbols not explained in Fig. 5 are the same as those in Figs. 1 to 3 .

第2接著層具有接著性及/或黏著性。第2接著層由於配置於構造體之與第1接著層側為相反側之面上,因此通常為具有與構造體相同形狀之圖案狀。The second bonding layer has bonding and/or adhesive properties. Since the second bonding layer is disposed on the surface of the structure that is opposite to the first bonding layer side, it is usually in a pattern shape having the same shape as the structure.

第2接著層具有與第1接著層不同之組成。所謂與第1接著層不同之組成,係指於受到對第1接著層之接著力調整處理時,接著力不易降低之組成。具體而言係指接著力調整處理後之第2接著層之接著力高於接著力調整處理後之第1接著層的組成。尤其第2接著層較佳為接著力不因各種接著力調整處理而降低之組成。The second bonding layer has a different composition from the first bonding layer. The so-called different composition from the first bonding layer refers to a composition whose bonding force is not easily reduced when the bonding force adjustment treatment is applied to the first bonding layer. Specifically, it refers to a composition in which the bonding force of the second bonding layer after the bonding force adjustment treatment is higher than that of the first bonding layer after the bonding force adjustment treatment. In particular, the second bonding layer is preferably a composition in which the bonding force is not reduced by various bonding force adjustment treatments.

第2接著層之組成只要能夠表現出所需接著力則並無特別限定,可列舉以熱塑性樹脂、硬化性樹脂等一般用於接著劑或黏著劑之樹脂為主成分之組成。作為上述樹脂,例如可列舉:丙烯酸系樹脂、環氧樹脂、橡膠、聚矽氧樹脂、聚酯樹脂等。該等樹脂可包含1種,亦可包含2種以上。其中,丙烯酸系樹脂就透明性、耐久性、耐熱性、成本優異之方面而言較佳。丙烯酸系樹脂並無特別限定,可使用先前公知之丙烯酸系單體或甲基丙烯酸系單體之聚合物。具體而言,可列舉日本專利特開2009-226621號公報所揭示之用於接著層之單體之聚合物。第2接著層亦可視需要包含「A.第1接著層」之項中所說明之添加劑。The composition of the second bonding layer is not particularly limited as long as it can exhibit the required bonding force, and a composition mainly composed of thermoplastic resins, curing resins, and other resins generally used in bonding agents or adhesives can be cited. Examples of the above-mentioned resins include: acrylic resins, epoxy resins, rubbers, silicone resins, polyester resins, and the like. The resins may include one or more. Among them, acrylic resins are preferred in terms of transparency, durability, heat resistance, and cost. The acrylic resin is not particularly limited, and a polymer of a previously known acrylic monomer or methacrylic monomer can be used. Specifically, the polymers of monomers used for the bonding layer disclosed in Japanese Patent Publication No. 2009-226621 can be cited. The second bonding layer may also contain the additives described in the section "A. First bonding layer" as needed.

第2接著層較佳為具有適合於本發明之積層體之用途之物性。例如,若為將本發明之積層體用於下文所述之附凹部多層體之製造方法之情形時,第2接著層較佳為具有耐熱性或耐化學品性。The second bonding layer preferably has properties suitable for the use of the laminate of the present invention. For example, when the laminate of the present invention is used in the method for manufacturing a multilayer body with recessed portions described below, the second bonding layer preferably has heat resistance or chemical resistance.

第2接著層較佳為對構造體及成為被轉印體之第2層之各者具有所需接著性。其原因在於:於接著力調整處理後將構造體自本發明之積層體剝離時,存在構造體與第2接著層之間產生剝離之情況,又,存在難以將構造體經由第2接著層轉印至第2層之情況。第2接著層之接著力例如可設為0.1 N/25 mm以上且5 N/25 mm以下之範圍內,較佳為0.5 N/25 mm以上且1 N/25 mm以下之範圍內。第2接著層之接著力可依據JIS Z0237-2009進行測定。測定方法之詳細情況與「A.第1接著層」之項中所說明之接著力之測定方法相同。The second bonding layer preferably has the required bonding properties to the structure and the second layer to be transferred. The reason is that when the structure is peeled off from the laminate of the present invention after the bonding force adjustment treatment, there is a possibility that the structure and the second bonding layer are peeled off, and there is a possibility that it is difficult to transfer the structure to the second layer through the second bonding layer. The bonding force of the second bonding layer can be set to, for example, a range of 0.1 N/25 mm or more and 5 N/25 mm or less, preferably a range of 0.5 N/25 mm or more and 1 N/25 mm or less. The bonding force of the second bonding layer can be measured in accordance with JIS Z0237-2009. The details of the measurement method are the same as the measurement method of adhesion described in "A. First Adhesion Layer".

第2接著層之厚度並無特別限定,可以能夠對構造體及第2層表現出所需接著力之方式適當進行設計,例如可設為1 μm~500 μm之範圍內,較佳為設為5 μm~50 μm之範圍內。The thickness of the second bonding layer is not particularly limited and can be appropriately designed in a manner that enables the structure and the second layer to exhibit the required bonding strength. For example, the thickness can be set in the range of 1 μm to 500 μm, preferably in the range of 5 μm to 50 μm.

E.任意之構成 若於本發明之積層體具有接著性之情形時,可於構造體之與第1層側為相反側具有剝離層。又,若於本發明之積層體具有第2接著層之情形時,可於第2接著層上具有剝離層。剝離層可為與構造體相同之圖案狀,亦可為俯視下覆蓋第1層之構造體之配置面之整個區域之形狀。剝離層可使用先前公知者。E. Arbitrary Structure If the laminate of the present invention has adhesiveness, a peeling layer may be provided on the side of the structure opposite to the first layer. Also, if the laminate of the present invention has a second adhesive layer, a peeling layer may be provided on the second adhesive layer. The peeling layer may have the same pattern as the structure, or may have a shape that covers the entire area of the arrangement surface of the structure of the first layer in a plan view. The peeling layer may be a previously known one.

F.其他 本發明之積層體可將至少包含構造體之1個以上之圖案部一次地轉印至第2層。圖案部係於第2層上呈圖案狀配置。F. Others The laminate of the present invention can transfer at least one or more pattern parts of the structure to the second layer at one time. The pattern parts are arranged in a pattern shape on the second layer.

1.第2層 第2層係自本發明之積層體轉印包含構造體之圖案部時之成為被轉印體的構件,作為任意之構成之剝離層除外。第2層可視本發明之積層體之用途而適當選擇。例如,若於將本發明之積層體用於下文所述之附凹部多層體之製造之情形時,第2層可設為構成多層體之構件之一。具體而言,若多層體為多層配線板,則作為第2層,可列舉配線層等金屬層、絕緣層或樹脂基板等樹脂層等。又,若為將本發明之積層體用作細胞圖案轉印用積層體之情形時,作為第2層,可列舉培養基板、活體組織等。1. The second layer The second layer is a member that becomes a transferred body when transferring a pattern portion including a structure from the laminate of the present invention, excluding a peeling layer as an arbitrary structure. The second layer can be appropriately selected depending on the purpose of the laminate of the present invention. For example, when the laminate of the present invention is used to manufacture a multilayer body with a recessed portion as described below, the second layer can be set as one of the members constituting the multilayer body. Specifically, if the multilayer body is a multilayer wiring board, as the second layer, metal layers such as wiring layers, insulating layers, or resin layers such as resin substrates can be listed. Furthermore, when the multilayer of the present invention is used as a multilayer for transferring a cell pattern, the second layer may be a culture substrate, a living tissue, or the like.

第2層可為與第1層相同之材質,亦可為不同之材質。但是,於構造體之一面與第1接著層相接且另一面與第2層相接之情形時,第2層之材質較佳為以如下方式進行選擇:於接著力調整處理前後,構造體與第2層之間之接著力與第1接著層與構造體之間之接著力不同。The second layer may be made of the same material as the first layer or a different material. However, when one surface of the structure is in contact with the first bonding layer and the other surface is in contact with the second layer, the material of the second layer is preferably selected in such a way that the bonding force between the structure and the second layer is different from the bonding force between the first bonding layer and the structure before and after the bonding force adjustment process.

2.層間接著力之關係 關於本發明之積層體,接著力調整處理前之第1接著層與第1層之間之接著力N1 、及接著力調整處理後之第1接著層與第1層之間之接著力N1 '可具有N1 >N1 '之關係,亦可具有N1 <N1 '之關係。又,接著力調整處理前之第1接著層與構造體之間之接著力N2 、及接著力調整處理後之第1接著層與構造體之間之接著力N2 '可具有N2 >N2 '之關係,亦可具有N2 <N2 '之關係。2. Relationship of inter-layer adhesive forces Regarding the laminate of the present invention, the adhesive force N 1 between the first adhesive layer and the first layer before the adhesive force adjustment process and the adhesive force N 1 ' between the first adhesive layer and the first layer after the adhesive force adjustment process may have a relationship of N 1 > N 1 ' or a relationship of N 1 < N 1 '. Furthermore, the adhesive force N 2 between the first adhesive layer and the structure before the adhesive force adjustment process and the adhesive force N 2 ' between the first adhesive layer and the structure after the adhesive force adjustment process may have a relationship of N 2 > N 2 ' or a relationship of N 2 < N 2 '.

於接著力調整處理前,接著力N1 及接著力N2 之大小關係並無特別限定,例如可具有N1 >N2 之關係。Before the bonding force adjustment process, the magnitude relationship between the bonding force N1 and the bonding force N2 is not particularly limited, and for example, the relationship may be N1 > N2 .

另一方面,於接著力調整處理後,接著力N1 '及接著力N2 '可具有N1 '>N2 '之關係,亦可具有N1 '<N2 '之關係,可視將包含構造體之圖案部轉印至第2層時之剝離位置適當設定。即,若為N1 '>N2 ',則於將圖案部轉印至第2層時,可使第1接著層與構造體之界面容易剝離,另一方面,若為N1 '<N2 ',則於將圖案部轉印至第2層時,可使第1接著層與第1層之界面容易剝離。On the other hand, after the bonding force adjustment process, the bonding force N 1 ' and the bonding force N 2 ' may have a relationship of N 1 '>N 2 ' or a relationship of N 1 '<N 2 ', and may be appropriately set according to the peeling position when the pattern portion including the structure is transferred to the second layer. That is, if N 1 '>N 2 ', the interface between the first bonding layer and the structure can be easily peeled when the pattern portion is transferred to the second layer. On the other hand, if N 1 '<N 2 ', the interface between the first bonding layer and the first layer can be easily peeled when the pattern portion is transferred to the second layer.

接著力處理前後之第1接著層與第1層之間之接著力N1 、N1 '不論第1層之材質或種類如何,均較佳為表現出所需大小。作為接著力N1 ,例如可設為0.05 N/25 mm以上,尤其可設為0.1 N/25 mm以上且0.5 N/25 mm以下之範圍內。接著力N1 之上限並無特別限定,可設為5 N/25 mm以下。另一方面,作為接著力N1 ',例如可設為5 N/25 mm以下,尤其可設為0.1 N/25 mm以上且1 N/25 mm以下之範圍內。The bonding forces N 1 and N 1 ' between the first bonding layer and the first layer before and after the bonding force treatment are preferably of a desired magnitude regardless of the material or type of the first layer. The bonding force N 1 can be set to, for example, 0.05 N/25 mm or more, and can be set to, for example, 0.1 N/25 mm or more and 0.5 N/25 mm or less. The upper limit of the bonding force N 1 is not particularly limited, and can be set to, for example, 5 N/25 mm or less, and can be set to, for example , 0.1 N/25 mm or more and 1 N/25 mm or less.

又,接著力處理前後之第1接著層與構造體之間之接著力N2 、N2 '不論構造體之材質之材質或種類如何,均較佳為表現出所需大小。作為接著力N2 ,例如可設為0.5 N/25 mm以上且10 N/25 mm以下之範圍內,尤其可設為1 N/25 mm以上且5 N/25 mm以下之範圍內。又,作為接著力N2 ',例如可設為0.05 N/25 mm以上且2 N/25 mm以下之範圍內,尤其可設為0.05 N/25 mm以上且0.5 N/25 mm以下之範圍內。Furthermore, the bonding forces N 2 and N 2 ' between the first bonding layer and the structure before and after the bonding force treatment preferably show a desired magnitude regardless of the material or type of the structure. The bonding force N 2 can be set, for example, in the range of 0.5 N/25 mm or more and 10 N/25 mm or less, and can particularly be set in the range of 1 N/25 mm or more and 5 N/25 mm or less. Furthermore, the bonding force N 2 ' can be set, for example, in the range of 0.05 N/25 mm or more and 2 N/25 mm or less, and can particularly be set in the range of 0.05 N/25 mm or more and 0.5 N/25 mm or less.

各接著力係將接著層分別轉印至PET基材,設為PET/接著層之構成,逐個被黏著體地進行測定。測定方法及測定條件可設為與「A.第1接著層 2.其他」之項中所說明之接著力之測定方法及測定條件相同。Each adhesive force is measured by transferring the adhesive layer to the PET substrate, setting the structure of PET/adhesive layer, and measuring each adherend. The measurement method and measurement conditions can be the same as the measurement method and measurement conditions of the adhesive force described in the item "A. 1st adhesive layer 2. Others".

於本發明之積層體中,於構造體具有接著性之情形時,如圖3(a)~(b)所示,本形式之積層體於構造體之與第1接著層側為相反側之面與第2層相接。再者,將構造體與第2層之間之接著力設為N4 。於構造體具有接著性之情形時,於接著力調整處理前,接著力N1 、接著力N2 、及接著力N4 之大小關係並無特別限定,例如可具有N1 >N2 >N4 之關係。In the laminate of the present invention, when the structure has adhesion, as shown in Fig. 3 (a) to (b), the laminate of this form is in contact with the second layer at the surface of the structure opposite to the first bonding layer. Furthermore, the bonding force between the structure and the second layer is set to N 4 . When the structure has adhesion, before the bonding force adjustment process, the magnitude relationship of the bonding force N 1 , the bonding force N 2 , and the bonding force N 4 is not particularly limited, and for example, the relationship of N 1 >N 2 >N 4 may be present.

另一方面,於接著力調整處理後,作為接著力N1 '、接著力N2 '、及接著力N4 之大小關係,較佳為接著力N4 最大,例如可具有N4 >N1 '>N2 '之關係,亦可具有N4 >N2 '>N1 '之關係。其原因在於:藉由接著力N1 、接著力N2 、及接著力N4 之間具有上述關係,於第1接著層與構造體之界面、或第1接著層與第1層之界面容易優先地產生剝離,因此能夠容易地將構造體轉印至第2層,且能夠以充分之接著力將構造體固定於第2層。On the other hand, after the bonding force adjustment process, the bonding force N 1 ', the bonding force N 2 ', and the bonding force N 4 preferably have the largest bonding force N 4 , for example, the bonding force N 4 > N 1 '> N 2 ', or the bonding force N 4 > N 2 '> N 1 '. The reason is that due to the above relationship between the bonding force N 1 , the bonding force N 2 , and the bonding force N 4 , the interface between the first bonding layer and the structure or the interface between the first bonding layer and the first layer is easily and preferentially peeled off, so that the structure can be easily transferred to the second layer, and the structure can be fixed to the second layer with sufficient bonding force.

又,於本發明之積層體於上述構造體之與上述第1接著層側為相反側具有上述第2接著層之情形時,本發明之積層體於上述第2接著層之與構造體側為相反側之面與第2層相接。關於本發明之積層體,於使上述第2接著層之與上述構造體側為相反側之面與第2層接觸時,可大致分為:第1形式,其於接著力調整處理前後,於上述第1接著層與上述構造體之間及上述第2接著層與上述第2層之間具有所需接著力之關係;及第2形式,其於上述第1層與上述第1接著層之間及上述第2接著層與上述第2層之間具有所需接著力之關係。以下,針對各形式進行說明。Furthermore, when the laminate of the present invention has the second bonding layer on the side of the structure opposite to the first bonding layer, the laminate of the present invention is in contact with the second layer on the side of the second bonding layer opposite to the structure. Regarding the laminate of the present invention, when the surface of the second bonding layer opposite to the structure side is brought into contact with the second layer, it can be roughly divided into: the first form, in which the first bonding layer and the structure and the second bonding layer and the second layer have a required bonding force relationship before and after the bonding force adjustment process; and the second form, in which the first layer and the first bonding layer and the second bonding layer have a required bonding force relationship. The following describes each form.

(a)第1形式 關於本形式之積層體,於使上述第2接著層之與上述構造體側為相反側之面與第2層接觸時,上述接著力調整處理前之上述第1接著層與上述構造體之間之接著力N2 為上述第2接著層與上述第2層之間之接著力N5 以上,且上述接著力調整處理後之上述第1接著層與上述構造體之間之接著力N2 '低於上述第2接著層與上述第2層之間之接著力N5(a) First Form Regarding the laminate of this form, when the surface of the second bonding layer opposite to the structure is brought into contact with the second layer, the bonding force N2 between the first bonding layer and the structure before the bonding force adjustment treatment is greater than the bonding force N5 between the second bonding layer and the second layer, and the bonding force N2 ' between the first bonding layer and the structure after the bonding force adjustment treatment is less than the bonding force N5 between the second bonding layer and the second layer.

圖6(a)~(c)係對使用本發明之積層體之第1形式將構造體轉印至第2層之步驟之另一例進行說明的模式圖,表示將包含構造體3及第2接著層4之圖案部20轉印至第2層11之例。於圖6中,將第2接著層4與第2層11之間之接著力設為N5 。除此以外,關於在圖6中未說明之符號,與圖1~圖5相同。Fig. 6 (a) to (c) are schematic diagrams for explaining another example of the step of transferring the structure to the second layer using the first form of the laminate of the present invention, showing an example of transferring the pattern portion 20 including the structure 3 and the second bonding layer 4 to the second layer 11. In Fig. 6, the bonding force between the second bonding layer 4 and the second layer 11 is set to N5 . Other symbols not explained in Fig. 6 are the same as those in Figs. 1 to 5.

根據本形式,藉由於接著力調整處理前後於第1接著層與構造體之間、及第2接著層與第2層之間分別具有特定之接著力之關係,如圖6(c)所示,於第1接著層與構造體之間因接著力調整處理而產生剝離,從而能夠將至少包含構造體之圖案部一次地轉印至第2層。轉印至第2層之圖案部可自第2層側具有第2接著層及構造體,且呈圖案狀配置於第2層上。再者,於本形式中,由於第1接著層會殘留於第1層側,因此第1接著層可覆蓋第1層之一面之整個區域,亦可為與構造體相同之圖案狀。According to this form, by having a specific bonding force relationship between the first bonding layer and the structure and between the second bonding layer and the second layer before and after the bonding force adjustment process, as shown in FIG6(c), the first bonding layer and the structure are peeled off due to the bonding force adjustment process, so that the pattern part including at least the structure can be transferred to the second layer at one time. The pattern part transferred to the second layer can have the second bonding layer and the structure from the second layer side, and be arranged on the second layer in a pattern. Furthermore, in this form, since the first bonding layer will remain on the first layer side, the first bonding layer can cover the entire area of one surface of the first layer, and can also be in the same pattern as the structure.

本形式較佳為於接著力調整處理前,接著力N2 及接著力N5 具有N2 ≧N5 之關係。又,於接著力調整處理前,接著力N1 、接著力N2 、及接著力N3 之大小關係並無特別限定,例如可具有N1 >N2 >N3 之關係。藉由於接著力N1 、接著力N2 、接著力N3 、及接著力N5 之間具有上述關係,能夠容易地進行再次之重貼及位置調整。另一方面,本形式較佳為於接著力調整處理後,接著力N2 '及接著力N5 具有N2 '<N5 之關係,更佳為於接著力N1 '、接著力N2 '、接著力N3 、及接著力N5 中,接著力N2 '最小。又,接著力N1 '與接著力N3 或接著力N5 之間之接著力之關係並無特別限定,例如可具有N3 ≧N1 '之關係、N5 >N1 '之關係。藉由於接著力調整處理前後分別具有上述關係,若為接著力調整處理前,則能夠進行位置之再調整,若為接著力調整處理後,則能夠將第1基材及第1接著層同時剝離。In this form, it is preferred that before the bonding force adjustment process, the bonding force N2 and the bonding force N5 have a relationship of N2N5 . Moreover, before the bonding force adjustment process, the magnitude relationship of the bonding force N1 , the bonding force N2 , and the bonding force N3 is not particularly limited, and for example, they may have a relationship of N1 > N2 > N3 . By having the above relationship among the bonding force N1 , the bonding force N2 , the bonding force N3 , and the bonding force N5 , reattachment and position adjustment can be easily performed. On the other hand, in this embodiment, after the bonding force adjustment process, the bonding force N2 ' and the bonding force N5 have a relationship of N2 '< N5 , and more preferably, the bonding force N2 ' is the smallest among the bonding force N1 ', the bonding force N2 ', the bonding force N3 , and the bonding force N5 . In addition, the bonding force relationship between the bonding force N1 ' and the bonding force N3 or the bonding force N5 is not particularly limited, and for example, the relationship may be N3N1 ' or N5N1 '. By having the above relationship before and after the bonding force adjustment process, if it is before the bonding force adjustment process, the position can be readjusted, and if it is after the bonding force adjustment process, the first substrate and the first bonding layer can be peeled off at the same time.

接著力N3 、接著力N5 之具體之值並無特別限定,可視構造體之材質或種類分別具有所需大小。The specific values of the adhesion force N 3 and the adhesion force N 5 are not particularly limited, and they can have required values depending on the material or type of the structure.

於本形式中,不論第2層及構造體之材質或種類如何,均較佳為接著力N2 '與接著力N5 之差Δ(N5 -N2 ')為0.1 N/25 mm以上且5.0 N/25 mm以下之範圍內,其中較佳為0.5 N/25 mm以上且2.0 N/25 mm以下之範圍內。其原因在於:藉由Δ(N5 -N2 ')處於上述範圍內,於轉印時,能夠容易使第1接著層與構造體之界面產生剝離。Δ(N5 -N2 ')係將第1接著層、第2接著層分別轉印至PET基材,設為PET/接著層之構成,逐個被黏著體地進行測定,並算出其差。測定方法及測定條件可設為與「A.第1接著層 2.此外」之項中所說明之接著力之測定方法及測定條件相同。In this embodiment, regardless of the material or type of the second layer and the structure, the difference Δ(N 5 -N 2 ') between the adhesion force N 2 ' and the adhesion force N 5 is preferably within the range of 0.1 N/25 mm or more and 5.0 N/25 mm or less, and more preferably within the range of 0.5 N/25 mm or more and 2.0 N/25 mm or less. The reason is that when Δ(N 5 -N 2 ') is within the above range, the interface between the first adhesion layer and the structure can be easily peeled off during transfer. Δ(N 5 -N 2 ') is measured for each adherend by transferring the first adhesion layer and the second adhesion layer to a PET substrate, respectively, and setting the structure of PET/adhesion layer, and calculating the difference. The measuring method and measuring conditions may be the same as the measuring method and measuring conditions of the bonding force described in the item "A. First bonding layer 2. Others".

本形式可不限於本發明之積層體之用途而進行應用,尤其較佳為作為用作細胞圖案轉印用積層體之情形之形式。其原因在於存在如下情況:若於細胞圖案上殘存第1接著層,則會阻礙細胞之功能。This form can be applied without being limited to the use of the laminate of the present invention, and is particularly preferably used as a laminate for transferring a cell pattern. The reason is that if the first bonding layer remains on the cell pattern, it will hinder the function of the cells.

(b)第2形式 關於本形式之上述積層體,於使上述第2接著層之與上述構造體側為相反側之面與第2層接觸時,較佳為上述接著力調整處理前之上述第1接著層與上述第1層之間之接著力N1 為上述第2接著層與上述第2層之間之接著力N5 以上,且上述接著力調整處理後之上述第1接著層與上述第1層之間之接著力N1 '低於上述第2接著層與上述第2層之間之接著力N5(b) Second Form Regarding the above-mentioned laminated body of this form, when the surface of the above-mentioned second bonding layer opposite to the above-mentioned structural body side is brought into contact with the second layer, it is preferred that the bonding force N1 between the above-mentioned first bonding layer and the above-mentioned first layer before the above-mentioned bonding force adjustment treatment is greater than the bonding force N5 between the above-mentioned second bonding layer and the above-mentioned second layer, and the bonding force N1 ' between the above-mentioned first bonding layer and the above-mentioned first layer after the above-mentioned bonding force adjustment treatment is lower than the bonding force N5 between the above-mentioned second bonding layer and the above-mentioned second layer.

圖7(a)~(c)係對使用本發明之積層體之第2形式將構造體轉印至第2層之步驟之另一例進行說明的模式圖,表示將接著力調整處理後之包含第1接著層2、構造體3、及第2接著層4之圖案部20轉印至第2層11之例。再者,關於在圖7中未說明之符號,與圖1~圖6相同。Fig. 7 (a) to (c) are schematic diagrams for explaining another example of the step of transferring the structure to the second layer using the second form of the laminate of the present invention, showing an example of transferring the pattern portion 20 including the first bonding layer 2, the structure 3, and the second bonding layer 4 after the bonding force adjustment process to the second layer 11. In addition, the symbols not explained in Fig. 7 are the same as those in Figs. 1 to 6.

根據本形式,藉由於接著力調整處理前後,於上述第1層與上述第1接著層之間及上述第2接著層與上述第2層之間具有上述接著力之關係,於第1層與第1接著層之間因接著力調整處理而產生剝離,從而能夠將至少包含構造體之圖案部一次地轉印至第2層。轉印至上述第2層之圖案部自上述第2層側依序具有第2接著層、構造體、及第1接著層,且上述圖案部呈圖案狀配置於上述第2層上。於本形式中,由於第1接著層會殘留於構造體側,因此上述第1接著層較佳為與構造體相同之圖案狀。According to this form, by having the above-mentioned bonding force relationship between the above-mentioned first layer and the above-mentioned first bonding layer and between the above-mentioned second bonding layer and the above-mentioned second layer before and after the bonding force adjustment process, the above-mentioned first layer and the above-mentioned first bonding layer are peeled off due to the bonding force adjustment process, so that the pattern part including at least the structure can be transferred to the second layer at one time. The pattern part transferred to the above-mentioned second layer has the second bonding layer, the structure, and the first bonding layer in order from the side of the above-mentioned second layer, and the above-mentioned pattern part is arranged on the above-mentioned second layer in a pattern shape. In this form, since the first bonding layer will remain on the side of the structure, the above-mentioned first bonding layer is preferably in the same pattern shape as the structure.

本形式較佳為於接著力調整處理前,接著力N1 及接著力N5 具有N1 ≧N5 之關係。又,於接著力調整處理前,接著力N1 、接著力N2 、及接著力N3 之大小關係並無特別限定,例如可設為N1 >N2 >N3 。另一方面,本形式較佳為於接著力調整處理後,接著力N1 '及接著力N5 具有N1 '<N5 之關係,更佳為接著力N1 '、接著力N2 '、接著力N3 、及接著力N5 中,接著力N1 '最小。其原因在於:藉由於接著力調整處理前後分別具有上述關係,能夠僅將第1層去除。In this form, it is preferred that before the bonding force adjustment process, the bonding force N1 and the bonding force N5 have a relationship of N1N5 . In addition, before the bonding force adjustment process, the magnitude relationship of the bonding force N1 , the bonding force N2 , and the bonding force N3 is not particularly limited, and can be, for example, N1 > N2 > N3 . On the other hand, in this form, it is preferred that after the bonding force adjustment process, the bonding force N1 ' and the bonding force N5 have a relationship of N1 '< N5 , and it is more preferred that among the bonding force N1 ', the bonding force N2 ', the bonding force N3 , and the bonding force N5 , the bonding force N1 ' is the smallest. The reason is that by having the above-mentioned relationship before and after the bonding force adjustment process, only the first layer can be removed.

本形式中之接著力N3 、接著力N5 與第1形式相同。The contact force N3 and contact force N5 in this form are the same as those in the first form.

於本形式中,不論第1層及第2層之材質或種類如何,均較佳為接著力N1 '與接著力N5 之差Δ(N5 -N1 ')為0.1 N/25 mm以上且5.0 N/25 mm以下之範圍內,尤其較佳為0.5 N/25 mm以上且2.0 N/25 mm以下之範圍內。其原因在於:藉由Δ(N5 -N1 ')處於上述範圍內,於轉印時,能夠容易使第1接著層與構造體之界面產生剝離。Δ(N5 -N1 ')之算出方法可設為與Δ(N5 -N2 ')之算出方法相同。In this embodiment, regardless of the material or type of the first layer and the second layer, the difference Δ(N 5 -N 1 ') between the bonding force N 1 ' and the bonding force N 5 is preferably within the range of 0.1 N/25 mm or more and 5.0 N/25 mm or less, and particularly preferably within the range of 0.5 N/25 mm or more and 2.0 N/25 mm or less. The reason is that when Δ(N 5 -N 1 ') is within the above range, the interface between the first bonding layer and the structure can be easily peeled off during transfer. The calculation method of Δ(N 5 -N 1 ') can be set to be the same as the calculation method of Δ(N 5 -N 2 ').

本形式可不限於本發明之積層體之用途而進行應用,尤其較佳為作為用於附凹部多層體之製造之情形時之形式。其原因在於:於使用本發明之積層體將構造體轉印至第2層之後使其他層積層於構造體上時,藉由殘存於第1接著層之接著力能夠將其他層暫時固定。This form can be applied without being limited to the use of the laminate of the present invention, and is particularly preferably used as a form for manufacturing a multi-layer body with a recessed portion. The reason is that when the laminate of the present invention is used to transfer the structure to the second layer and then other layers are laminated on the structure, the remaining bonding force in the first bonding layer can temporarily fix the other layers.

(c)其他 於本形式之積層體於第2接著層上具有剝離層之情形時,較佳為接著力調整處理前之接著力N1 、接著力N2 、接著力N3 高於第2接著層與剝離層之間之接著力N6(c) In other cases where the laminate of the present type has a peeling layer on the second bonding layer, it is preferred that the bonding force N 1 , bonding force N 2 , and bonding force N 3 before the bonding force adjustment process are higher than the bonding force N 6 between the second bonding layer and the peeling layer.

F.製造方法 作為本發明之積層體之製造方法,並無特別限定,可視用途適當選擇。例如可使用下述方法。F. Manufacturing method The manufacturing method of the laminate of the present invention is not particularly limited and can be appropriately selected depending on the application. For example, the following method can be used.

(1)第1例 作為本發明之積層體之製造方法之第1例,可列舉如下方法:將具有第1層及第1接著層之第1構件與包含配置於剝離層上之圖案狀之構造體之第2構件進行貼合,而於第1接著層上配置構造體。(1) First Example As a first example of the method for manufacturing a laminate of the present invention, the following method can be cited: a first member having a first layer and a first bonding layer and a second member including a structure having a pattern arranged on a peeling layer are bonded together, and the structure is arranged on the first bonding layer.

具體而言,首先於第1層上形成第1接著層,獲得第1構件。又,於剝離層上之整個面配置構造體形成用層,獲得第2構件。構造體形成用層係經圖案化而成為構造體者,構造體形成用層之材料與構造體相同。繼而,於剝離層上將構造體形成用層圖案化成所需形狀,形成圖案狀之構造體。可藉由將第2構件之與剝離層側為相反側之面與第1構件之第1接著層進行貼合,而獲得於第1接著層上配置有圖案狀之構造體的本發明之積層體。於構造體形成用層不具有接著性之情形時,第2構件設為於剝離層上依序配置第2接著層及構造體形成用層之構造,並於剝離層上將構造體形成用層及第2接著層圖案化成所需形狀,其後,與第1構件之第1接著層貼合。Specifically, first, a first connecting layer is formed on the first layer to obtain a first component. Furthermore, a structure-forming layer is arranged on the entire surface of the peeling layer to obtain a second component. The structure-forming layer is a structure formed by patterning, and the material of the structure-forming layer is the same as that of the structure. Then, the structure-forming layer is patterned into a desired shape on the peeling layer to form a patterned structure. The laminated body of the present invention in which a patterned structure is arranged on the first connecting layer can be obtained by bonding the surface of the second component opposite to the peeling layer side to the first connecting layer of the first component. When the structure-forming layer does not have adhesiveness, the second component is configured to have a structure in which a second adhesive layer and a structure-forming layer are sequentially arranged on a release layer, and the structure-forming layer and the second adhesive layer are patterned into desired shapes on the release layer, and then bonded to the first adhesive layer of the first component.

作為第1接著層之形成方法,可藉由於第1層之一面塗佈包含上述「A.第1接著層」之項中所說明之組成之接著劑組合物並將溶劑去除而形成。作為具體之塗佈方法,並無特別限定,例如可使用日本專利特開2015-108156號公報所揭示之方法。又,亦可使用包含上述「A.第1接著層」之項中所說明之組成之市售之膠帶作為第1接著層並貼附於第1層上而形成。第2接著層亦可藉由與第1接著層相同之方法於剝離層上形成。The first bonding layer can be formed by coating a bonding agent composition including the composition described in the above-mentioned "A. First bonding layer" on one side of the first layer and removing the solvent. The specific coating method is not particularly limited, and for example, the method disclosed in Japanese Patent Publication No. 2015-108156 can be used. Alternatively, a commercially available adhesive tape including the composition described in the above-mentioned "A. First bonding layer" can be used as the first bonding layer and attached to the first layer. The second bonding layer can also be formed on the release layer by the same method as the first bonding layer.

作為構造體形成用層之形成方法,並無特別限定,可視構造體之種類適當選擇。例如可列舉於剝離層上或第2接著層上塗佈構造體之材料之方法等。作為構造體形成用層之圖案化之方法,可視構造體之種類適當選擇,例如可使用沖裁、半切等公知之方法。將除成為構造體形成用層之構造體之區域以外之區域進行剝離去除。The method for forming the structure-forming layer is not particularly limited and can be appropriately selected depending on the type of the structure. For example, a method of coating the material of the structure on the peeling layer or the second bonding layer can be listed. The method for patterning the structure-forming layer can be appropriately selected depending on the type of the structure, for example, known methods such as punching and half-cutting can be used. The area other than the area of the structure to be the structure-forming layer is peeled and removed.

上述製造方法之例係將配置於剝離層上之整個面之構造體形成用層進行圖案化而形成構造體,亦可於剝離層上直接呈圖案狀形成構造體。作為於剝離層上形成構造體之方法,可視構造體之種類適當選擇,例如可列舉印刷法等。The above-mentioned manufacturing method is to pattern the structure-forming layer disposed on the entire surface of the release layer to form the structure, and the structure can also be formed directly on the release layer in a pattern. As a method for forming the structure on the release layer, it can be appropriately selected depending on the type of the structure, for example, a printing method can be listed.

(2)第2例 作為本發明之積層體之製造方法之第2例,可列舉如下方法:於第1層上形成第1接著層,並於第1接著層上直接呈圖案狀形成構造體。作為於第1接著層上直接形成構造體之方法,可視構造體之種類適當選擇,例如可列舉印刷法等。(2) Second Example As a second example of the method for manufacturing the laminate of the present invention, the following method can be cited: forming a first bonding layer on the first layer, and directly forming a structure in a pattern on the first bonding layer. As a method for directly forming a structure on the first bonding layer, it can be appropriately selected depending on the type of the structure, and for example, a printing method can be cited.

(3)第3例 作為本發明之積層體之製造方法之第3例,可列舉如下方法:如圖8所例示,準備至少依序積層有第1層1、第1接著層2及構造體形成用層3A之積層體50(圖8(a)),至少將構造體形成用層3A進行圖案化,形成圖案狀之構造體3(圖8(b))。作為構造體形成用層之圖案化方法,可設為與製造方法之第1例所述之方法相同。又,於將構造體形成用層進行圖案化時,第1接著層亦可一併進行圖案化。(3) Example 3 As a third example of the method for manufacturing a laminated body of the present invention, the following method can be cited: as shown in FIG8 , a laminated body 50 is prepared in which at least a first layer 1, a first connecting layer 2, and a structure-forming layer 3A are sequentially stacked ( FIG8(a) ), and at least the structure-forming layer 3A is patterned to form a patterned structure 3 ( FIG8(b) ). The method for patterning the structure-forming layer can be the same as the method described in the first example of the manufacturing method. Furthermore, when the structure-forming layer is patterned, the first connecting layer can also be patterned at the same time.

(4)第4例 作為本發明之積層體之製造方法之第4例,可列舉如下方法:準備至少依序積層有第1剝離層、第1接著層、構造體形成用層、及第2剝離層之積層體,至少將第1剝離層、第1接著層、及構造體形成用層進行圖案化,其後,將第1剝離層剝離並配置第1層。根據該方法,能夠於第1層上呈圖案狀形成包含構造體及第1接著層之圖案部。作為圖案化方法,可設為與製造方法之第1例所述之方法相同。(4) Example 4 As a fourth example of the method for manufacturing a laminate of the present invention, the following method can be cited: a laminate having at least a first peeling layer, a first bonding layer, a structure-forming layer, and a second peeling layer laminated in sequence is prepared, at least the first peeling layer, the first bonding layer, and the structure-forming layer are patterned, and then the first peeling layer is peeled off and the first layer is disposed. According to this method, a patterned portion including the structure and the first bonding layer can be formed on the first layer in a patterned manner. As a patterning method, it can be the same as the method described in the first example of the manufacturing method.

G.用途 本發明之積層體可視構造體所具有之功能等而用於需要圖案狀之構造體之轉印之各種用途。例如,本發明之積層體可製成轉印用載片。具體而言,本發明之積層體可製成如下保護層轉印用載片:第1層為基材、構造體為保護層,且具有:具有基材及第1接著層之承載膜、及圖案狀之保護層。藉由將本發明之積層體製成保護層轉印用載片,能夠將圖案狀之保護層轉印至第2層之所需位置。保護層轉印用載片於附凹部多層體之製造中可較佳地使用於凹部之形成。其中於附凹部多層體為附凹部多層配線板之情形時,藉由轉印保護層並覆蓋其他層之表面,能夠保護其他層免遭藥液等破壞。關於使用本發明之積層體之附凹部多層體之製造方法,於下文進行敍述。又,保護層轉印用載片亦可用作利用圖案狀之保護層遮蔽第2層之所需位置之遮蔽材。G. Applications The multilayer body of the present invention can be used for various applications that require the transfer of a structure in a pattern, depending on the function of the structure. For example, the multilayer body of the present invention can be made into a transfer carrier. Specifically, the multilayer body of the present invention can be made into a protective layer transfer carrier as follows: the first layer is a substrate, the structure is a protective layer, and has: a supporting film having a substrate and a first bonding layer, and a patterned protective layer. By making the multilayer body of the present invention into a protective layer transfer carrier, the patterned protective layer can be transferred to the desired position of the second layer. The protective layer transfer carrier can be preferably used for the formation of recesses in the manufacture of a multilayer body with recesses. In the case where the multilayer body with recessed portions is a multilayer wiring board with recessed portions, by transferring the protective layer and covering the surface of other layers, the other layers can be protected from being damaged by chemical solutions, etc. The manufacturing method of the multilayer body with recessed portions using the laminate of the present invention is described below. In addition, the protective layer transfer carrier can also be used as a masking material for masking the desired position of the second layer using the patterned protective layer.

又,本發明之積層體例如可製成如下細胞圖案轉印用積層體:第1層為基材、構造體為細胞片,且具有:具有基材及第1接著層之細胞支持層、及圖案狀之細胞片。藉由將本發明之積層體製成細胞圖案轉印用積層體,不論形狀或尺寸如何,均能夠將細胞圖案容易地直接轉印至細胞培養基板或活體組織等之第2層。又,藉由對第1接著層之種類進行選擇,能夠於不破壞細胞之情況下進行轉印。Furthermore, the laminate of the present invention can be made into a laminate for transferring a cell pattern, for example: the first layer is a substrate, the structure is a cell sheet, and has: a cell support layer having a substrate and a first connecting layer, and a cell sheet in a pattern. By making the laminate of the present invention into a laminate for transferring a cell pattern, the cell pattern can be easily and directly transferred to the second layer of a cell culture substrate or a living tissue, etc., regardless of the shape or size. Furthermore, by selecting the type of the first connecting layer, the transfer can be performed without destroying the cells.

II.附凹部多層體之製造方法 本發明之附凹部多層體之製造方法係使用上述積層體之於多層體之一面具備具有開口之凹部的附凹部多層體之製造方法,該方法包括如下步驟:接觸步驟,其係使上述積層體之上述構造體直接接觸上述第2層之一面或經由上述第2接著層間接地接觸上述第2層之一面;接著力調整步驟,其係藉由上述接著力調整處理使上述第1接著層之接著力降低;轉印步驟,其係至少將上述第1層剝離,並將至少包含上述構造體之圖案部呈圖案狀轉印至上述第2層;積層步驟,其係於上述第2層之具有上述圖案部之側之面積層1層以上之其他層;劃分步驟,其係將上述圖案部及上述1層以上之其他層劃分成包含上述圖案部及俯視下與上述圖案部處於重疊位置之上述其他層之第1區域、及除此以外之第2區域;及凹部形成步驟,其係將上述第1區域剝離去除,而形成上述凹部。II. Manufacturing method of multilayer body with concave portion The manufacturing method of multilayer body with concave portion of the present invention is a manufacturing method of multilayer body with concave portion using the above-mentioned multilayer body to provide a concave portion with an opening on one side of the multilayer body, and the method comprises the following steps: a contacting step, which is to make the above-mentioned structure of the above-mentioned multilayer body directly contact one side of the above-mentioned second layer or indirectly contact one side of the above-mentioned second bonding layer via the above-mentioned second bonding layer; a bonding force adjusting step, which is to reduce the bonding force of the above-mentioned first bonding layer by the above-mentioned bonding force adjusting treatment; a transfer step, which is to transfer at least the above-mentioned first layer to the above-mentioned second bonding layer; Peeling off and transferring the pattern portion including at least the above-mentioned structure to the above-mentioned second layer in the form of a pattern; a lamination step, which is on the area layer of the second layer having the side of the above-mentioned pattern portion and other layers above the above-mentioned 1 layer; a dividing step, which is to divide the above-mentioned pattern portion and the above-mentioned 1 layer and other layers into a first area including the above-mentioned pattern portion and the above-mentioned other layers in an overlapping position with the above-mentioned pattern portion when viewed from above, and a second area other than the first area; and a recess forming step, which is to peel off and remove the above-mentioned first area to form the above-mentioned recess.

圖9係表示本發明之附凹部多層體之製造方法之一例的步驟圖。再者,關於接觸步驟、接著力調整步驟及轉印步驟,由於在圖3、圖6、圖7中進行過說明,因此此處之圖示及說明省略。圖3係表示於接觸步驟中使上述積層體之上述構造體直接與上述第2層之一面接觸之情況,圖6、圖7係表示於接觸步驟中使上述積層體之上述構造體經由上述第2接著層間接地與上述第2層之一面接觸之情況。如圖3、圖6、圖7所圖示,於實施接觸步驟(圖3(a)、圖6(a)、圖7(a))、接著力調整步驟(圖3(b)、圖6(b)、圖7(b))、及轉印步驟(圖3(c)、圖6(c)、圖7(c))之後,於上述第2層11之具有上述圖案部20之側之面積層1層以上其他層12(12A~12C)(圖9(a),積層步驟)。繼而,於上述第2層11中,將上述圖案部20及上述1層以上其他層12A~12C劃分為包含上述圖案部20及俯視下處於與上述圖案部20重疊之位置之上述其他層12A~12C的第1區域51、及除此以外之第2區域52(圖9(b),劃分步驟)。其後,將上述第1區域51剝離去除,而形成凹部P(圖9(c),凹部形成步驟)。藉此獲得附凹部多層體30。FIG. 9 is a step diagram showing an example of a method for manufacturing a multilayer body with recessed portions of the present invention. In addition, since the contact step, the adhesion force adjustment step and the transfer step have been described in FIG. 3 , FIG. 6 and FIG. 7 , the drawings and descriptions thereof are omitted here. FIG. 3 shows a case where the structure of the laminated body is directly in contact with one surface of the second layer in the contact step, and FIG. 6 and FIG. 7 show a case where the structure of the laminated body is indirectly in contact with one surface of the second layer via the second adhesion layer in the contact step. As shown in Figures 3, 6 and 7, after implementing the contact step (Figure 3(a), Figure 6(a), Figure 7(a)), followed by the force adjustment step (Figure 3(b), Figure 6(b), Figure 7(b)), and the transfer step (Figure 3(c), Figure 6(c), Figure 7(c)), more than one other layer 12 (12A~12C) is formed on the area of the second layer 11 having the side of the pattern portion 20 (Figure 9(a), lamination step). Next, in the second layer 11, the pattern portion 20 and the other layers 12A to 12C are divided into a first region 51 including the pattern portion 20 and the other layers 12A to 12C overlapping the pattern portion 20 in a plan view, and a second region 52 other than the first region 51 (Fig. 9(b), dividing step). Thereafter, the first region 51 is peeled off to form a concave portion P (Fig. 9(c), concave portion forming step). Thus, a multilayer body 30 with concave portions is obtained.

例如,就包含軟性印刷配線板(FPC)之零件安裝多層配線板而言,正在推進採用於多層配線板之一表面設置具有開口之凹部並於上述凹部內載置晶片等零件的構造(參照專利文獻2)。根據上述構造,能夠將先前載置於多層配線板之表面之電子零件載置於凹部內,因此能夠謀求零件安裝多層配線板整體之薄型化或小型化。For example, in the case of a multi-layer wiring board for mounting components including a flexible printed wiring board (FPC), a structure is being promoted in which a recess having an opening is provided on one surface of the multi-layer wiring board and components such as a chip are placed in the recess (see Patent Document 2). According to the above structure, electronic components previously placed on the surface of the multi-layer wiring board can be placed in the recess, thereby achieving a thinner or smaller multi-layer wiring board for mounting components as a whole.

此處,作為於多層配線板等多層體形成凹部之方法,一般為藉由立銑刀等之切割加工或雷射加工等。然而,該等方法由於需要對欲設置凹部之部位逐個地進行加工,因此存在如下問題:無法容易地設置凹部、於加工時於凹部之形成位置產生偏移、其他層因凹部之形成位置偏移而受損傷等。Here, as a method for forming a recess in a multi-layer body such as a multi-layer wiring board, generally, a cutting process using a milling cutter or laser processing is used. However, since these methods require processing each location where the recess is to be provided, there are problems such as difficulty in providing the recess, displacement of the recess formation position during processing, and damage to other layers due to the displacement of the recess formation position.

對於此種問題,本發明者等人發現了如下方法作為於多層配線板形成凹部之方法:於製造多層體時,於上述多層體內配置成為上述剝離之起點之構造體,對俯視下與上述構造體重疊之多層體之區域藉由半切等進行劃分並進行剝離,藉此於多層體之所需位置容易地形成凹部。推測根據該方法,能夠於上述劃分區域之位置容易地形成凹部,且能夠抑制加工時之位置偏移或對其他層之損傷等。In order to solve this problem, the inventors have found the following method as a method for forming a recess in a multilayer wiring board: when manufacturing a multilayer body, a structure is arranged in the multilayer body as the starting point of the peeling, and the region of the multilayer body overlapping with the structure in a plan view is divided by half cutting or the like and peeled off, thereby easily forming a recess at a desired position of the multilayer body. It is estimated that according to this method, a recess can be easily formed at the position of the divided region, and positional deviation during processing or damage to other layers can be suppressed.

然而,上述方法存在如下情況:必須於多層體內根據欲設置凹部之位置分別配置上述構造體,不僅配置作業繁雜化,而且配置位置精度降低。又,上述構造體由於配置於多層體內且成為剝離之起點,因此要求厚度較薄、具有可撓性、尺寸較小等。尤其於上述多層體為多層配線板之情形時,對上述構造體之該等要求會提高。然而,若根據凹部之形成位置以成為圖案狀之方式分別配置此種構造體,則操作性較差,因此存在配置作業進一步繁雜化之問題。However, the above method has the following problems: the above structure must be arranged separately in the multi-layer body according to the position where the recess is to be set, which not only complicates the arrangement operation, but also reduces the accuracy of the arrangement position. In addition, since the above structure is arranged in the multi-layer body and becomes the starting point for peeling, it is required to be thin, flexible, and small in size. In particular, when the multi-layer body is a multi-layer wiring board, the above requirements for the structure will be increased. However, if such a structure is arranged separately in a pattern according to the formation position of the recess, the operability is poor, and there is a problem that the arrangement operation is further complicated.

又,作為於上述多層體內配置構造體之又一方法,亦可假定如下方法:於成為被黏著體之層(本發明之附凹部多層體之製造方法之第2層)上直接藉由圖案化形成上述構造體。然而,存在如下問題:步驟數增加、因圖案化之方法而對其他層造成不良影響等。As another method for arranging the structure in the multi-layer body, the following method can be assumed: the structure is directly formed by patterning on the layer to be adhered (the second layer of the method for manufacturing the multi-layer body with recessed portions of the present invention). However, there are the following problems: the number of steps increases, and the patterning method may have adverse effects on other layers.

因此,本發明者等人發現藉由使用「I.積層體」之項中所說明之積層體能夠利用更簡便之方法將構造體呈圖案狀配置於上述多層體內。即,若於使第2層與上述積層體接觸之狀態下進行上述接著力調整處理,則上述積層體之第1接著層之接著力降低,包含構造體之圖案部能夠容易地剝離。因此,能夠不限於上述構造體之形狀或厚度、尺寸等而將上述圖案部呈圖案狀一次地轉印至上述第2層之所需位置,且能夠提高轉印精度。並且,藉由於上述第2層之轉印有上述圖案部之面上積層其他層,而使上述圖案部呈圖案狀配置於多層體之內部,藉由於上述第2層上劃分具有上述圖案部之第1區域,以上述圖案部為起點,能夠將上述第1區域一次地剝離去除。藉此,能夠於多層體之一面側呈圖案狀一次地形成具有開口之凹部。此時,能夠結合上述圖案部之位置進行第1區域之劃分,因此能夠提高凹部之形成位置精度。 以下,針對發明之附凹部多層體之製造方法之各步驟進行說明。Therefore, the inventors of the present invention have found that by using the laminate described in the item "I. Laminated body", it is possible to arrange the structure in the above-mentioned multi-layer body in a pattern by a simpler method. That is, if the above-mentioned adhesion adjustment treatment is performed while the second layer is in contact with the above-mentioned laminate, the adhesion of the first adhesion layer of the above-mentioned laminate is reduced, and the pattern part including the structure can be easily peeled off. Therefore, the above-mentioned pattern part can be transferred to the desired position of the above-mentioned second layer in a pattern at one time without being limited to the shape, thickness, size, etc. of the above-mentioned structure, and the transfer accuracy can be improved. Furthermore, by laminating other layers on the surface of the second layer on which the pattern portion is transferred, the pattern portion is arranged in a pattern shape inside the multilayer body, and by dividing the first area having the pattern portion on the second layer, the first area can be peeled off and removed at one time starting from the pattern portion. In this way, a concave portion with an opening can be formed at one time in a pattern shape on one side of the multilayer body. At this time, the first area can be divided in combination with the position of the pattern portion, so that the position accuracy of the formation of the concave portion can be improved. The following is a description of each step of the manufacturing method of the multilayer body with a concave portion of the invention.

1.接觸步驟 本發明之接觸步驟係使上述積層體之上述構造體直接接觸上述第2層之一面或經由上述第2接著層間接地接觸上述第2層之一面的步驟。1. Contacting step The contacting step of the present invention is a step of making the structure of the laminate directly contact one surface of the second layer or indirectly contact one surface of the second layer via the second bonding layer.

(1)積層體 關於在本步驟中所使用之積層體,由於在上述「I.積層體」之項詳細地進行過說明,因此此處省略說明。(1) Laminated body The laminate used in this step has been described in detail in the above section "I. Laminated body", so its description is omitted here.

(2)第2層 於本步驟中所使用之第2層可視目標之附凹部多層體而適當選擇,例如可列舉於上述「I.積層體」之項所例示之構件。上述第2層可於與上述積層體側為相反側之面預先具有其他層。關於其他層,於下文進行敍述。(2) Second layer The second layer used in this step can be appropriately selected based on the target multi-layer body with recessed portion, and can be, for example, the components exemplified in the above-mentioned "I. Laminated body". The second layer may have other layers on the side opposite to the laminated body. The other layers will be described below.

(3)接觸方法 於本步驟中,使上述積層體具有之圖案狀之構造體直接接觸上述第2層之一面或經由上述第2接著層間接地接觸上述第2層之一面。於上述積層體之構造體具有接著性之情形時,可使上述積層體之構造體直接與上述第2層之一面接觸。又,於上述積層體於構造體之與上述第1接著層側為相反側具有第2接著層之情形時,可使上述構造體經由上述第2接著層間接地與上述第2層之一面接觸。作為使上述積層體之上述構造體與上述第2層之一面接觸之方法,並無特別限定,可使用普通之方法。例如可列舉單片方式、卷對卷方式等各種方法。(3) Contact method In this step, the patterned structure of the laminate is brought into direct contact with one surface of the second layer or is brought into indirect contact with one surface of the second layer via the second bonding layer. When the structure of the laminate has bonding properties, the structure of the laminate can be brought into direct contact with one surface of the second layer. Furthermore, when the laminate has a second bonding layer on the side of the structure opposite to the first bonding layer, the structure can be brought into indirect contact with one surface of the second layer via the second bonding layer. There is no particular limitation on the method for bringing the structure of the laminate into contact with one surface of the second layer, and a common method can be used. For example, there are various methods such as a single-wafer method and a roll-to-roll method.

2.接著力調整步驟 本發明之接著力調整步驟係藉由上述接著力調整處理使上述第1接著層之接著力降低之步驟。2. Adhesion force adjustment step The adhesion force adjustment step of the present invention is a step of reducing the adhesion force of the first adhesion layer by the adhesion force adjustment process.

上述接著力調整處理係為了使上述積層體之上述第1接著層之接著力降低而進行。上述接著力調整處理可視上述「I.積層體」之項中所說明之第1接著層之態樣進行選擇。以下,針對接著力調整處理而對第1接著層之態樣逐個地進行說明。The above-mentioned adhesion adjustment process is performed to reduce the adhesion force of the above-mentioned first adhesion layer of the above-mentioned laminate. The above-mentioned adhesion adjustment process can be selected according to the aspect of the first adhesion layer described in the above-mentioned "I. Laminated body". The following describes the aspects of the first adhesion layer one by one with respect to the adhesion adjustment process.

(1)第1態樣之第1接著層之情形 於上述第1接著層為第1態樣即感溫性接著層之情形時,本步驟係進行加熱處理或冷卻處理作為接著力調整處理。(1) Case of the first bonding layer of the first aspect When the first bonding layer is the first aspect, i.e., a temperature-sensitive bonding layer, this step is to perform a heating treatment or a cooling treatment as a bonding force adjustment treatment.

若本態樣之第1接著層為加熱剝離型感溫性接著層,則可藉由進行對上述第1接著層進行加熱之加熱處理作為接著力調整處理,而使上述第1接著層之接著力降低。作為此時之加熱溫度,可設為上述加熱剝離型感溫性接著層之開關溫度以上之溫度。作為加熱剝離型感溫性接著層之加熱方法,例如可列舉於烘箱內進行加熱之方法、於加熱板上進行加熱之方法、使用點式加熱器進行加熱之方法。作為加熱時間,可以加熱處理後之本態樣之第1接著層之接著力成為上述「I.積層體」之項中所說明之範圍內之方式適當設定。上述加熱處理之條件並無特別限定,例如可設為60℃且10分鐘。If the first bonding layer of the present embodiment is a heat-peelable temperature-sensitive bonding layer, the bonding force of the first bonding layer can be reduced by performing a heat treatment on the first bonding layer as a bonding force adjustment treatment. The heating temperature at this time can be set to a temperature higher than the switching temperature of the heat-peelable temperature-sensitive bonding layer. Examples of heating methods for the heat-peelable temperature-sensitive bonding layer include a method of heating in an oven, a method of heating on a heating plate, and a method of heating using a spot heater. The heating time can be appropriately set in such a manner that the bonding force of the first bonding layer of the present embodiment after the heat treatment becomes within the range described in the above-mentioned item "I. Laminated body". The conditions of the heat treatment are not particularly limited, and can be, for example, 60° C. and 10 minutes.

另一方面,若本態樣之第1接著層為冷卻剝離型感溫性接著層,則可藉由進行將上述第1接著層進行冷卻之冷卻處理作為上述接著力調整處理,而使上述第1接著層之接著力降低。作為此時之冷卻溫度,可設為上述冷卻剝離型感溫性接著層之開關溫度以下之溫度。作為冷卻剝離型感溫性接著層之冷卻方法,例如可列舉置於冰箱內進行冷卻之方法、於冷卻板上進行冷卻之方法。作為冷卻時間,可以冷卻處理後之本態樣之第1接著層之接著力成為上述「I.積層體」之項中所說明之範圍內之方式適當設定。上述冷卻處理之條件並無特別限定,例如可設為5℃且20分鐘。On the other hand, if the first adhesive layer of this embodiment is a cooling peelable thermosensitive adhesive layer, the bonding strength of the first adhesive layer can be reduced by cooling the first adhesive layer as the bonding strength adjustment treatment. The cooling temperature at this time can be set to a temperature below the switch temperature of the cooling peelable thermosensitive adhesive layer. As a cooling method for the cooling peelable thermosensitive adhesive layer, for example, a method of cooling in a refrigerator and a method of cooling on a cooling plate can be listed. The cooling time can be appropriately set so that the adhesion of the first adhesive layer of the present embodiment after the cooling treatment is within the range described in the above-mentioned "I. Laminated body". The conditions of the above-mentioned cooling treatment are not particularly limited, and can be set to 5°C and 20 minutes, for example.

(2)第2態樣之第1接著層之情形 於上述第1接著層為第2態樣即能量線響應性接著層之情形時,本步驟中,進行能量線照射處理作為接著力調整處理。於本步驟中,可藉由對上述第1接著層照射能量線作為上述能量線照射處理,而使第1接著層之接著力降低。(2) Case of the first bonding layer of the second aspect When the first bonding layer is the second aspect, i.e., the energy beam responsive bonding layer, in this step, an energy beam irradiation treatment is performed as the bonding force adjustment treatment. In this step, the bonding force of the first bonding layer can be reduced by irradiating the first bonding layer with energy beams as the energy beam irradiation treatment.

關於上述能量線,由於在上述「I.積層體」之項進行過說明,因此此處省略說明。能量線之光源只要能夠發出所需波長域之光則無特別限定。於使用紫外線作為能量線之情形時,例如可列舉發出150 nm~450 nm波長域之光之高壓水銀燈、超高壓水銀燈、碳弧燈、金屬鹵化物燈、氙氣燈、化學燈等。又,能量線之累計光量可以能量線照射後之本態樣之第1接著層成為上述「I.積層體」之項中所說明之範圍內之方式適當設定。The energy beam has been described in the above-mentioned "I. Laminated body" and therefore will not be described here. The light source of the energy beam is not particularly limited as long as it can emit light in the required wavelength range. When ultraviolet rays are used as the energy beam, examples include high-pressure mercury lamps, ultra-high-pressure mercury lamps, carbon arc lamps, metal halide lamps, xenon lamps, chemical lamps, etc. that emit light in the wavelength range of 150 nm to 450 nm. In addition, the accumulated light amount of the energy beam can be appropriately set in such a way that the first connecting layer of the present sample after irradiation with the energy beam becomes within the range described in the above-mentioned "I. Laminated body".

上述能量線可於上述接觸步驟後自上述積層體之第1層側照射,亦可自第2層側照射。尤其較佳為自上述積層體之第1層側照射。其原因在於:不論第2層之透光性之有無,均可對上述第1層進行能量線照射處理。The energy beam may be irradiated from the first layer side of the laminate after the contacting step, or from the second layer side. It is particularly preferred to irradiate from the first layer side of the laminate because the first layer can be irradiated with energy beams regardless of whether the second layer is light-transmissive or not.

(3)第3態樣之第1接著層之情形 於上述第1接著層為第3態樣即電氣響應性接著層之情形時,本步驟中進行電場施加處理或無電場處理作為接著力調整處理。(3) Case of the first bonding layer of the third aspect When the first bonding layer is the third aspect, i.e., the electrically responsive bonding layer, in this step, an electric field application treatment or a no-electric field treatment is performed as a bonding force adjustment treatment.

若本態樣之第1接著層為電剝離性接著層,則可藉由進行對上述第1接著層施加電場之電場施加處理作為接著力調整處理,而使上述第1接著層之接著力降低。作為對上述第1接著層之電場施加方法,並無特別限定,可使用上述「I.積層體」之項中所說明之方法。作為接著力調整處理之條件,例如若為藉由電場施加處理之剝離之情形時,可設為施加電場5 V~50 V之範圍內且10秒~120秒之範圍內。 定義電場之大小之施加電壓之大小及施加時間可以電場施加後之第1接著層之接著力成為所需值之方式適當設定。施加電壓之上限或施加時間之上限就剝離之觀點而言無特別規定,較佳為考慮電場施加裝置或對其他層之影響而進行設定。If the first bonding layer of this embodiment is an electrically exfoliative bonding layer, the bonding force of the first bonding layer can be reduced by applying an electric field to the first bonding layer as a bonding force adjustment treatment. There is no particular limitation on the method of applying an electric field to the first bonding layer, and the method described in the above-mentioned "I. Laminated body" can be used. As a condition for the bonding force adjustment treatment, for example, in the case of exfoliation by electric field application treatment, the applied electric field can be set to be in the range of 5 V to 50 V and in the range of 10 seconds to 120 seconds. The magnitude of the applied voltage that defines the magnitude of the electric field and the application time can be appropriately set in such a way that the bonding force of the first bonding layer after the electric field application becomes the desired value. The upper limit of the applied voltage or the upper limit of the application time is not particularly specified from the perspective of peeling, but is preferably set in consideration of the electric field application device or the influence on other layers.

另一方面,若本態樣之第1接著層為電接著性接著層,則可藉由進行停止對上述第1接著層之電場施加之無電場處理作為接著力調整處理,而使上述第1接著層之接著力降低。On the other hand, if the first bonding layer of this aspect is an electrically bonding bonding layer, the bonding force of the first bonding layer can be reduced by performing a no-electric-field treatment of stopping application of an electric field to the first bonding layer as a bonding force adjustment treatment.

3.轉印步驟 本發明之轉印步驟係至少將上述第1層剝離並將至少包含上述構造體之圖案部呈圖案狀轉印至上述第2層上的步驟。3. Transfer step The transfer step of the present invention is a step of peeling off at least the first layer and transferring at least the pattern portion including the structure onto the second layer in a patterned form.

本步驟中,藉由上述接著力調整步驟,上述第1接著層之接著力降低,因此於積層體中,使第1層於構成所包含之所需積層界面產生剝離。藉此,能夠將至少包含上述構造體之圖案部呈圖案狀一次地轉印至上述第2層上。In this step, the bonding force of the first bonding layer is reduced by the bonding force adjustment step, so that the first layer is peeled off at the desired layer interface included in the structure in the laminate. In this way, the pattern part including at least the structure can be transferred to the second layer in a patterned manner.

作為自上述積層體至少將上述第1層剝離之方法,只要為能夠於積層體之所需界面剝離之方法,則並無特別限定,可手動進行剝離,亦可利用機械進行剝離。作為具體之剝離方法,可列舉藉由吸附進行剝離之方法、附著黏著膜並藉由上述黏著膜之黏著力進行剝離之方法等。The method for peeling at least the first layer from the laminate is not particularly limited as long as it is a method capable of peeling at a desired interface of the laminate, and the peeling may be performed manually or mechanically. Specific peeling methods include a method of peeling by adsorption, a method of attaching an adhesive film and peeling by the adhesive force of the adhesive film, and the like.

於本步驟中,可視積層體之形式而決定藉由接著力調整處理之剝離界面,且可將具有適合於剝離位置之層構成之圖案部呈圖案狀一次地轉印至第2層。即,若上述積層體為上述「I.積層體 F.其他 2.關於層間接著力之關係」之項中所說明之第1形式,則會於第1接著層與構造體之界面產生剝離,從而能夠將第1層及第1接著層剝離。此時,轉印至第2層上之圖案部自第2層側依序具有第2接著層及構造體。 另一方面,若上述積層體為上述「I.積層體 F.其他 2.關於層間接著力之關係」之項中所說明之第2形式,則會於第1層與第1接著層之界面產生剝離,從而能夠將第1層剝離。此時,轉印至第2層上之圖案部自第2層側依序具有第2接著層、構造體、及第1接著層。In this step, the peeling interface to be processed by the adhesive force adjustment can be determined according to the form of the laminate, and the pattern portion having a layer structure suitable for the peeling position can be transferred to the second layer in a patterned manner. That is, if the laminate is the first form described in the above-mentioned "I. Laminated body F. Other 2. Relationship between interlayer adhesive forces", peeling will occur at the interface between the first adhesive layer and the structure, so that the first layer and the first adhesive layer can be peeled. At this time, the pattern portion transferred to the second layer has the second adhesive layer and the structure in order from the second layer side. On the other hand, if the laminate is the second form described in the above-mentioned "I. Laminated body F. Other 2. Relationship between interlayer adhesion", peeling will occur at the interface between the first layer and the first bonding layer, thereby being able to peel the first layer. At this time, the pattern portion transferred to the second layer has the second bonding layer, the structure, and the first bonding layer in order from the second layer side.

4.積層步驟 本發明之積層步驟係於上述第2層之具有上述圖案部之側之面積層1層以上其他層之步驟。4. Lamination Step The lamination step of the present invention is a step of forming at least one other layer on the area layer of the second layer having the side of the pattern portion.

藉由轉印步驟,於第2層之一面上呈圖案狀配置至少包含構造體之圖案部,其他層積層於第2層之具有上述圖案部之側之面。作為上述其他層,可視製造之附凹部多層體之種類適當選擇。例如,若為使用本發明之附凹部多層體之製造方法而製造附凹部多層配線板之情形時,作為上述其他層,一般使用構成多層配線板之層。具體而言,可列舉絕緣層、可撓性配線基板、剛性配線基板等配線基板等。By means of a transfer step, a pattern portion including at least a structure is arranged in a pattern on one surface of the second layer, and other layers are stacked on the surface of the second layer on the side having the pattern portion. As the above-mentioned other layers, it is possible to appropriately select the type of multi-layer body with recessed portion to be manufactured. For example, in the case of manufacturing a multi-layer wiring board with recessed portion using the manufacturing method of the multi-layer body with recessed portion of the present invention, as the above-mentioned other layers, layers constituting the multi-layer wiring board are generally used. Specifically, wiring substrates such as insulating layers, flexible wiring substrates, and rigid wiring substrates can be listed.

於上述第2層之具有上述圖案部之側之面,上述其他層可積層1層以上,且可視目標之附凹部多層體適當調整積層數。上述其他層之積層方法並無特別限定,例如可使用塗佈法、層壓法等進行積層。上述其他層可以覆蓋第2層之該面及上述圖案部之與第2層側為相反側之面之方式而形成。若為製造附凹部多層配線板之情形時,作為上述其他層之積層方法,可使用能夠實現導通之方法,例如可與經由導電性凸塊進行積層等一般將配線基板進行多層化時之積層方法相同。又,於積層時,可經由覆蓋層、預浸體、層間接著層、絕緣層等進行積層。再者,上述第2層於與具有上述圖案部之側之面相反之側之面上亦可積層1層以上其他層。On the surface of the second layer having the pattern portion, the other layers may be stacked more than one layer, and the number of stacked layers may be appropriately adjusted according to the target multi-layer body with recessed portions. The stacking method of the other layers is not particularly limited, and for example, a coating method, a lamination method, or the like may be used for stacking. The other layers may be formed in a manner covering the surface of the second layer and the surface of the pattern portion opposite to the side of the second layer. In the case of manufacturing a multi-layer wiring board with recessed portions, as the stacking method of the other layers, a method capable of achieving conduction may be used, for example, the same stacking method as when a wiring substrate is generally multi-layered, such as stacking through conductive bumps. Furthermore, during lamination, lamination may be performed via a cover layer, a prepreg, an interlayer, an insulating layer, etc. Furthermore, the second layer may be laminated with one or more other layers on the surface opposite to the surface having the pattern portion.

5.劃分步驟 本發明之劃分步驟係將上述圖案部及上述1層以上其他層劃分為包含上述圖案部及俯視下處於與上述圖案部重疊位置之上述其他層的第1區域、及除此以外之第2區域的步驟。配置於上述第2層之具有上述圖案部之側之面上的上述圖案部及上述1層以上其他層於俯視下被劃分為上述第1區域及上述第2區域,且於上述第2層上,各區域分離而獨立存在。5. Division step The division step of the present invention is a step of dividing the pattern portion and the one or more other layers into a first region including the pattern portion and the other layers overlapping the pattern portion in a plan view, and a second region other than the first region. The pattern portion and the one or more other layers disposed on the side of the second layer having the pattern portion are divided into the first region and the second region in a plan view, and each region on the second layer is separated and exists independently.

(1)劃分方法 作為對上述第2層上之上述圖案部及上述1層以上其他層進行劃分之方法,只要為能夠於上述第2層上劃分出上述第1區域之方法即可,可為機械方法,亦可為化學方法。(1) Division method As a method for dividing the pattern portion on the second layer and the other layers above the first layer, any method can be used as long as it can divide the first area on the second layer. It can be a mechanical method or a chemical method.

作為上述機械方法,例如可列舉沿著俯視下之上述圖案部之外周將上述第2層上之上述圖案部及上述1層以上其他層向積層方向(厚度方向)切斷而劃分出上述第1區域的半切。具體而言,可使用使安裝有切割刀之上模上下移動而進行切斷之方法、利用針筒型之旋切刀進行切斷之方法、藉由雷射加工手段實施熱處理的方法等進行半切。As the mechanical method, for example, the pattern portion on the second layer and the other layers above the first layer are cut in the stacking direction (thickness direction) along the outer periphery of the pattern portion in a top view to divide the first area into half cuts. Specifically, the half cuts can be performed by moving an upper mold equipped with a cutting knife up and down, by using a syringe-type rotary cutter, or by performing heat treatment by laser processing.

作為上述化學方法,例如可列舉沿著俯視下之上述圖案部之外周對上述第2層上之上述圖案部及上述1層以上其他層向積層方向(厚度方向)進行蝕刻而劃分出上述第1區域之半蝕刻。具體而言,可於包含配置於上述第2層之具有上述圖案部之側之面上的上述圖案部及上述1層以上其他層而成之積層體之表面形成與上述圖案部之外周形狀相應之抗蝕劑圖案,並藉由濕式蝕刻法或乾式蝕刻法進行半蝕刻。蝕刻後將上述抗蝕劑圖案去除。As the chemical method, for example, half etching can be cited, in which the pattern portion on the second layer and the one or more layers are etched in the stacking direction (thickness direction) along the outer periphery of the pattern portion in a top view to divide the first region. Specifically, an anti-etching pattern corresponding to the outer periphery of the pattern portion can be formed on the surface of a stacked body including the pattern portion on the side of the second layer having the pattern portion and the one or more layers, and half etching can be performed by wet etching or dry etching. After etching, the anti-etching pattern is removed.

作為劃分方法,尤其較佳為使用機械方法。其原因在於:能夠以較高之位置精度劃分出上述第1區域及上述第2區域。As a division method, a mechanical method is particularly preferred because the first area and the second area can be divided with higher position accuracy.

上述第2層上之上述圖案部及上述1層以上其他層係向厚度(積層)方向被切斷,且被劃分分離成第1區域及第2區域。將劃分分離上述積層體為第1區域及第2區域的切割線稱為劃分線。The pattern portion on the second layer and the one or more layers are cut in the thickness (laminate) direction and divided into the first region and the second region. The cutting line that divides the laminate into the first region and the second region is called a dividing line.

於上述劃分步驟中,劃分第1區域及第2區域之劃分線可如圖10(a)所示般形成於上述圖案部之俯視下之外周上,亦可如圖10(b)所示般形成於較上述圖案部之俯視下之外周更靠外側,還可如圖10(c)所示般形成於較上述圖案部之俯視下之外周更靠內側。又,劃分線之寬度並無特別限定,例如可如圖10(d)所示般以包含上述圖案部之俯視下之外周之內側及外側之寬度而形成。 圖10(a)~(d)係說明劃分線之位置之說明圖,左圖為概略俯視圖,右圖為左圖之X-X線剖視圖。又,於圖10中,線L表示劃分線。In the above-mentioned dividing step, the dividing line that divides the first area and the second area can be formed on the outer periphery of the above-mentioned pattern portion when viewed from above as shown in Figure 10(a), can also be formed on the outer side of the outer periphery of the above-mentioned pattern portion when viewed from above as shown in Figure 10(b), and can also be formed on the inner side of the outer periphery of the above-mentioned pattern portion when viewed from above as shown in Figure 10(c). In addition, the width of the dividing line is not particularly limited. For example, it can be formed with a width that includes the inner and outer sides of the outer periphery of the above-mentioned pattern portion when viewed from above as shown in Figure 10(d). Figures 10(a) to (d) are explanatory diagrams for explaining the position of the dividing line, the left figure is a schematic top view, and the right figure is an X-X line cross-sectional view of the left figure. In addition, in Figure 10, line L represents the dividing line.

關於上述劃分線,視劃分方法,於俯視下可連續亦可斷續。又,上述劃分線於俯視可為直線狀亦可為非直線狀。The dividing line may be continuous or discontinuous in a plan view, depending on the dividing method. Also, the dividing line may be straight or non-straight in a plan view.

上述劃分線較佳為於上述第2層之具有上述圖案部之側之面上貫通上述圖案部及俯視下與上述圖案部處於重疊位置之上述其他層。其原因在於:於下文所述之凹部形成步驟中,能夠容易地進行上述第1區域之剝離去除,且能夠使上述第1區域之一部分不易殘留於第2層之面上。再者,上述劃分線可形成於上述第2層之一部分。The dividing line is preferably formed on the side of the second layer having the pattern portion, passing through the pattern portion and the other layers overlapping the pattern portion in a top view. The reason is that in the recessed portion forming step described below, the first area can be easily peeled off and removed, and a part of the first area is not likely to remain on the surface of the second layer. Furthermore, the dividing line can be formed on a part of the second layer.

上述第1區域於上述第2層之具有上述圖案部之側之面上包含上述圖案部及俯視下與上述圖案部處於重疊位置之上述其他層。上述第1區域之俯視形狀可設為與上述圖案部之俯視形狀相同。又,關於上述第1區域之俯視之大小,根據劃分線之位置,可大於上述圖案部之俯視之大小,亦可小於上述圖案部之俯視之大小,還可相同。The first region includes the pattern portion and the other layers overlapping the pattern portion in a plan view on the side of the second layer having the pattern portion. The plan view shape of the first region can be the same as the plan view shape of the pattern portion. In addition, the plan view size of the first region can be larger than the plan view size of the pattern portion, smaller than the plan view size of the pattern portion, or the same as the plan view size of the pattern portion, depending on the position of the dividing line.

6.凹部形成步驟 本發明之凹部形成步驟係將上述第1區域剝離去除而形成上述凹部的步驟。6. Recess Forming Step The recess forming step of the present invention is a step of removing the first region to form the recess.

上述第1區域能夠以上述構造體為起點進行剝離。具體而言,於上述構造體與第2層之接觸界面產生剝離。剝離上述第1區域之方法並無特別限定,例如可列舉藉由吸附進行剝離之方法、附著黏著膜並藉由上述黏著膜之黏著力進行剝離之方法等。The first region can be peeled off starting from the structure. Specifically, the peeling occurs at the contact interface between the structure and the second layer. The method for peeling off the first region is not particularly limited, and examples thereof include a method for peeling off by adsorption, a method for peeling off by attaching an adhesive film and using the adhesive force of the adhesive film, and the like.

若將上述第1區域剝離去除,則可於多層體之一面形成具有開口之凹部。凹部係於多層體之一面於俯視呈圖案狀形成。上述凹部之俯視下之大小相當於上述第1區域之俯視下之大小。If the first region is peeled off, a concave portion with an opening can be formed on one surface of the multilayer body. The concave portion is formed on one surface of the multilayer body in a pattern shape when viewed from above. The size of the concave portion when viewed from above is equivalent to the size of the first region when viewed from above.

7.其他 本發明之附凹部多層體之製造方法可除上述步驟以外還包含任意之步驟。例如,於使用本發明之附凹部多層體之製造方法製造附凹部多層配線板之情形時,可包含表面處理步驟、蝕刻步驟、鍍覆步驟等步驟。7. Others The method for manufacturing a multilayer body with recessed portions of the present invention may include any steps in addition to the above steps. For example, when a multilayer wiring board with recessed portions is manufactured using the method for manufacturing a multilayer body with recessed portions of the present invention, the method may include a surface treatment step, an etching step, a plating step, and the like.

本發明之附凹部多層體之製造方法亦可於積層步驟中進而進行使用「I.積層體」之項中所說明之積層體之轉印步驟。其原因在於:能夠將任意之構造體轉印配置於上述其他層之積層層間。 又,本發明之附凹部多層體之製造方法可對第2層之兩面分別進行接觸步驟、接著力調整步驟、轉印步驟、積層步驟、劃分步驟及凹部形成步驟。其原因在於:能夠製造於第2層之兩面具有凹部之多層體。The method for manufacturing a multilayer body with recessed portions of the present invention can also further perform a transfer step of the laminated body described in the item "I. Laminated body" in the lamination step. The reason is that any structure can be transferred and arranged between the laminated layers of the above-mentioned other layers. In addition, the method for manufacturing a multilayer body with recessed portions of the present invention can perform a contact step, a bonding force adjustment step, a transfer step, a lamination step, a dividing step, and a recessed portion forming step on both sides of the second layer. The reason is that a multilayer body having recessed portions on both sides of the second layer can be manufactured.

8.附凹部多層體 藉由本發明之附凹部多層體之製造方法所獲得的附凹部多層體可視第2層及其他層之種類而例如用作附凹部多層配線板。根據本發明之附凹部多層體之製造方法,於多層配線板之製造過程中能夠容易且以較高之位置精度形成凹部,因此可獲得於上述凹部內安裝有零件之零件安裝多層配線板。8. Multilayer body with recesses The multilayer body with recesses obtained by the method for manufacturing the multilayer body with recesses of the present invention can be used as a multilayer wiring board with recesses, for example, depending on the types of the second layer and other layers. According to the method for manufacturing the multilayer body with recesses of the present invention, recesses can be easily formed with high positional accuracy during the manufacturing process of the multilayer wiring board, thereby obtaining a component-mounted multilayer wiring board in which components are mounted in the recesses.

III.其他 本發明係包含以下技術性事項者。 (1)一種積層體,其至少依序具有第1層、第1接著層、及圖案狀之構造體,且上述第1接著層接受接著力調整處理而使接著力發生變化。 (2)如(1)記載之積層體,其中上述第1接著層為接受加熱處理或冷卻處理作為上述接著力調整處理而使接著力降低的感溫性接著層。 (3)如(1)記載之積層體,其中上述第1接著層為接受能量線照射處理作為上述接著力調整處理而使接著力降低的能量線響應性接著層。 (4)如(1)記載之積層體,其中上述第1接著層為接受電場施加處理或無電場處理作為上述接著力調整處理而使接著力降低的電氣響應性接著層。 (5)如(1)至(4)中任一項記載之積層體,其中上述構造體具有接著性。 (6)如(1)至(4)記載之積層體,其於上述構造體之與上述第1接著層側為相反側具有與上述第1接著層不同之組成之第2接著層。 (7)如(1)至(6)中任一項記載之積層體,其中上述第1接著層為與上述構造體相同之圖案狀。 (8)如(6)或(7)記載之積層體,其中於使上述第2接著層之與上述構造體側為相反側之面與第2層接觸時,上述接著力調整處理前之上述第1接著層與上述構造體之間之接著力為上述第2接著層與上述第2層之間之接著力以上,且上述接著力調整處理後之上述第1接著層與上述構造體之間之接著力低於上述第2接著層與上述第2層之間之接著力。 (9)如(7)記載之積層體,其中於使上述第2接著層之與上述構造體側為相反側之面與第2層接觸時,上述接著力調整處理前之上述第1接著層與上述第1層之間之接著力為上述第2接著層與上述第2層之間之接著力以上,且上述接著力調整處理後之上述第1接著層與上述第1層之間之接著力低於上述第2接著層與上述第2層之間之接著力。III. Others The present invention includes the following technical matters. (1) A laminate having at least a first layer, a first bonding layer, and a patterned structure in sequence, wherein the first bonding layer undergoes a bonding force adjustment treatment to change the bonding force. (2) A laminate as described in (1), wherein the first bonding layer is a temperature-sensitive bonding layer that undergoes a heating treatment or a cooling treatment as the bonding force adjustment treatment to reduce the bonding force. (3) A laminate as described in (1), wherein the first bonding layer is an energy-beam-responsive bonding layer that undergoes an energy-beam-irradiation treatment as the bonding force adjustment treatment to reduce the bonding force. (4) A laminate as described in (1), wherein the first bonding layer is an electrically responsive bonding layer that receives an electric field application treatment or a no-electric field treatment as the bonding force adjustment treatment to reduce the bonding force. (5) A laminate as described in any one of (1) to (4), wherein the structure has bonding properties. (6) A laminate as described in (1) to (4), wherein the second bonding layer has a composition different from that of the first bonding layer on the side of the structure opposite to the first bonding layer. (7) A laminate as described in any one of (1) to (6), wherein the first bonding layer has the same pattern as that of the structure. (8) A laminate as described in (6) or (7), wherein when the surface of the second bonding layer opposite to the structure is brought into contact with the second layer, the bonding force between the first bonding layer and the structure before the bonding force adjustment treatment is greater than the bonding force between the second bonding layer and the second layer, and the bonding force between the first bonding layer and the structure after the bonding force adjustment treatment is less than the bonding force between the second bonding layer and the second layer. (9) A laminate as described in (7), wherein when the surface of the second bonding layer opposite to the structural body side is brought into contact with the second layer, the bonding force between the first bonding layer and the first layer before the bonding force adjustment treatment is greater than the bonding force between the second bonding layer and the second layer, and the bonding force between the first bonding layer and the first layer after the bonding force adjustment treatment is less than the bonding force between the second bonding layer and the second layer.

(10)一種附凹部多層體之製造方法,其係使用如(6)、(8)及(9)中任一項記載之積層體的於多層體之一面具備具有開口之凹部的附凹部多層體之製造方法,且該方法包括如下步驟:接觸步驟,其係使上述積層體之上述構造體直接接觸上述第2層之一面或經由上述第2接著層間接地接觸上述第2層之一面;接著力調整步驟,其係藉由上述接著力調整處理使上述第1接著層之接著力降低;轉印步驟,其係至少將上述第1層剝離,並將至少包含上述構造體之圖案部呈圖案狀轉印至上述第2層;積層步驟,其係於上述第2層之具有上述圖案部之側之面積層1層以上其他層;劃分步驟,其係將上述圖案部及上述1層以上其他層劃分成包含上述圖案部及俯視下與上述圖案部處於重疊位置之上述其他層之第1區域、及除此以外之第2區域;及凹部形成步驟,其係將上述第1區域剝離去除,而形成上述凹部。 (11)如(10)記載之附凹部多層體之製造方法,其中上述附凹部多層體為附凹部多層配線板。 (12)一種構造體之轉印方法,其係使用如(6)或(7)記載之積層體之將上述構造體轉印至第2層之構造體之轉印方法,且於使上述第2接著層之與上述構造體側為相反側之面與上述第2層接觸時,上述接著力調整處理前之上述第1接著層與上述構造體之間之接著力為上述第2接著層與上述第2層之間之接著力以上,且上述接著力調整處理後之上述第1接著層與上述構造體之間之接著力低於上述第2接著層與上述第2層之間之接著力。 (13)一種構造體之轉印方法,其係使用如(6)記載之積層體之將上述構造體轉印至第2層之構造體之轉印方法,且上述第1接著層為與上述構造體相同之圖案狀,於使上述第2接著層之與上述構造體側為相反側之面與上述第2層接觸時,上述接著力調整處理前之上述第1接著層與上述第1層之間之接著力為上述第2接著層與上述第2層之間之接著力以上,且上述接著力調整處理後之上述第1接著層與上述第1層之間之接著力低於上述第2接著層與上述第2層之間之接著力。 [實施例](10) A method for manufacturing a multilayer body with recessed portions, which is a method for manufacturing a multilayer body with recessed portions, using a laminate as described in any one of (6), (8) and (9) and having a recessed portion with an opening on one side of the multilayer body, and the method includes the following steps: a contacting step, in which the structure of the laminate is directly in contact with one side of the second layer or indirectly in contact with one side of the second layer via the second bonding layer; a bonding force adjusting step, in which the bonding force of the first bonding layer is reduced by the bonding force adjusting treatment; and a transfer step. (11) A method for manufacturing a multilayer body with a recess as described in (10), wherein the multilayer body with a recess is a multilayer wiring board with a recess. (12) A method for transferring a structure, which is a method for transferring the structure to a second layer using a layered structure as described in (6) or (7), and when the surface of the second bonding layer opposite to the structure is brought into contact with the second layer, the bonding force between the first bonding layer and the structure before the bonding force adjustment treatment is greater than the bonding force between the second bonding layer and the second layer, and the bonding force between the first bonding layer and the structure after the bonding force adjustment treatment is less than the bonding force between the second bonding layer and the second layer. (13) A method for transferring a structure, which is a method for transferring a structure to a second layer using a layered structure as described in (6), wherein the first bonding layer is in the same pattern as the structure, and when the surface of the second bonding layer opposite to the structure is brought into contact with the second layer, the bonding force between the first bonding layer and the first layer before the bonding force adjustment treatment is greater than the bonding force between the second bonding layer and the second layer, and the bonding force between the first bonding layer and the first layer after the bonding force adjustment treatment is less than the bonding force between the second bonding layer and the second layer. [Example]

以下,例示實施例及比較例,對本發明進一步詳細地進行說明。Hereinafter, the present invention will be described in further detail with reference to embodiments and comparative examples.

[實施例1] 1.積層體之準備 藉由以下方法準備積層體。[Example 1] 1. Preparation of a laminate A laminate was prepared by the following method.

(1)接著力可變型接著劑組合物之製備 對包含丙烯酸系聚合物(平均分子量65萬)及能量線聚合化合物(平均分子量65萬)之丙烯酸系黏著劑(E-TEC股份有限公司製造,E-306)100質量份分別添加作為能量線聚合性化合物之丙烯酸胺基甲酸酯(日本合成化學工業股份有限公司製造,商品名:UV-7600B)60質量份、作為9-氧硫系聚合起始劑之2,4-二乙基9-氧硫(日本化藥股份有限公司製造,商品名:KAYACURE DETX-S)0.2質量份、及異氰酸酯系交聯劑(交聯劑,Nippon Polyurethane Industry股份有限公司製造 商品名:Coronate L;固形物成分:75%)1.6質量份,並利用甲苯及甲基乙基酮之混合溶劑稀釋至25%,而製備接著力可變型接著劑組合物。(1) Preparation of adhesive composition with variable adhesive strength To 100 parts by weight of an acrylic adhesive (E-306 manufactured by E-TEC Co., Ltd.) containing an acrylic polymer (average molecular weight 650,000) and an energy ray polymerizable compound (average molecular weight 650,000), 60 parts by weight of urethane acrylate (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name: UV-7600B) as an energy ray polymerizable compound and 60 parts by weight of 9-oxysulfide as an energy ray polymerizable compound were added. 2,4-Diethyl 9-sulfoxide 0.2 parts by weight of KAYACURE DETX-S (manufactured by Nippon Kayaku Co., Ltd.) and 1.6 parts by weight of an isocyanate crosslinking agent (crosslinking agent, manufactured by Nippon Polyurethane Industry Co., Ltd., trade name: Coronate L; solid content: 75%) were added, and diluted to 25% with a mixed solvent of toluene and methyl ethyl ketone to prepare an adhesive composition with variable adhesiveness.

(2)接著片材A之製作 使用PET膜(TOYOBO製造 商品名:E5100;厚度50 μm)作為第1層,並使用敷料器以加熱乾燥後之塗佈厚度成為10 μm之方式將接著力可變型接著劑組合物塗佈於第1層,並進行乾燥而形成第1接著層。繼而,將具有聚矽氧脫模處理面之輕剝離PET分隔件(TOYOBO製造 商品名:E7006;厚度38 μm)之聚矽氧脫模處理面層壓於第1接著層之露出面,其後,於40℃下實施3天固化,而獲得接著片材A。(2) Preparation of Adhesive Sheet A A PET film (TOYOBO product name: E5100; thickness 50 μm) was used as the first layer, and the adhesive composition with variable adhesion was applied to the first layer using an applicator so that the coating thickness after heat drying was 10 μm, and dried to form the first adhesive layer. Then, a silicone release surface layer of a light-peel PET separator (TOYOBO product name: E7006; thickness 38 μm) having a silicone release surface was pressed onto the exposed surface of the first adhesive layer, and then cured at 40°C for 3 days to obtain an adhesive sheet A.

(3)構造體片材A之製作 使用依序具有聚醯亞胺膜、丙烯酸系黏著層、及剝離層之耐熱遮蔽膠帶(3M製造 商品名:7414),將聚醯亞胺膜及丙烯酸系黏著層於厚度方向上進行半切,並將聚醯亞胺膜及丙烯酸系黏著層劃分為圖案狀,其後,將無用之部分去除。藉此,於剝離層上配置有具有聚醯亞胺膜及丙烯酸系黏著層之圖案狀之構造體之構造體片材A。(3) Preparation of structural body sheet A A heat-resistant masking tape (3M product name: 7414) having a polyimide film, an acrylic adhesive layer, and a release layer in this order was used. The polyimide film and the acrylic adhesive layer were cut in half in the thickness direction and divided into a pattern. Thereafter, the unnecessary portion was removed. Thus, a structural body sheet A having a structure having a polyimide film and an acrylic adhesive layer in a pattern was arranged on the release layer.

(4)積層體A之製作 將接著片材A之輕剝離PET分隔件剝離,並以所露出之第1接著層之面與構造體片材A之聚醯亞胺膜相接之方式進行貼合,而獲得依序具有PET膜、第1接著層、圖案狀之構造體(自第1接著層側依序具有聚醯亞胺膜、丙烯酸系黏著層)、及構造體片材A之剝離層之積層體A。(4) Preparation of laminated body A The peelable PET separator of the bonding sheet A is peeled off, and the exposed surface of the first bonding layer is bonded to the polyimide film of the structural sheet A, thereby obtaining a laminated body A having, in sequence, a PET film, a first bonding layer, a patterned structural body (having, in sequence from the first bonding layer side, a polyimide film and an acrylic adhesive layer), and a peeling layer of the structural sheet A.

2.構造體之轉印 使用壓延銅箔(福田金屬製造 商品名:RCF-T5B-35)作為第2層,將積層體A之輕剝離PET分隔件剝離,並使所露出之丙烯酸系黏著層與第2層接觸,自積層體A之第1層側以500 mJ/cm2 (i射線)進行UV(ultraviolet,紫外線)照射。藉由UV照射,具有第1接著層及第1層之接著片材A能夠自第1接著層與聚醯亞胺膜之界面剝離,從而能夠將具有聚醯亞胺膜及丙烯酸系黏著層之圖案狀之構造體轉印至第2層上。2. Transfer of structure Using rolled copper foil (trade name: RCF-T5B-35 manufactured by Futian Metal Manufacturing Co., Ltd.) as the second layer, the light-peelable PET separator of the laminate A was peeled off, and the exposed acrylic adhesive layer was brought into contact with the second layer, and UV (ultraviolet) irradiation was performed at 500 mJ/cm 2 (i-ray) from the first layer side of the laminate A. By UV irradiation, the first adhesive layer and the adhesive sheet A of the first layer can be peeled off from the interface between the first adhesive layer and the polyimide film, so that the structure having the pattern of the polyimide film and the acrylic adhesive layer can be transferred to the second layer.

[實施例2] 1.積層體之準備 藉由以下方法準備積層體。[Example 2] 1. Preparation of a laminate A laminate was prepared by the following method.

(1)第2接著層用接著劑組合物之製備 設為丙烯酸系共聚物(綜研化學製造 商品名:SK Dyne 1811L)100質量份,並調配異氰酸酯系硬化劑(綜研化學製造 商品名:L-45;固形物成分45 wt%)3質量份,製備第2接著層用接著劑組合物。(1) Preparation of Adhesive Composition for Second Adhesive Layer An adhesive composition for second adhesive layer was prepared by mixing 100 parts by weight of an acrylic copolymer (SK Dyne 1811L, manufactured by Soken Chemical Industry Co., Ltd.) with 3 parts by weight of an isocyanate curing agent (L-45, manufactured by Soken Chemical Industry Co., Ltd.; solid content: 45 wt%).

(2)接著片材B之製作 於具有聚矽氧脫模處理面之重剝離型PET分隔件(TOYOBO製造 商品名:E7304;厚度38 μm)之聚矽氧脫模處理面,以乾燥後之厚度成為10 μm之方式使用敷料器塗佈第2接著層用接著劑組合物,其後進行乾燥,而形成第2接著層。繼而,將具有聚矽氧脫模處理面之輕剝離型PET分隔件(TOYOBO製造 商品名:E7006;厚度38 μm)之聚矽氧脫模處理面層壓於第2接著層之露出面,其後,於40℃下實施3天固化,獲得具有第2接著層之接著片材B。(2) Preparation of Adhesive Sheet B The adhesive composition for the second adhesive layer was applied to the silicone release-treated surface of a heavy-peel PET separator (TOYOBO product name: E7304; thickness 38 μm) using an applicator in such a manner that the thickness after drying would be 10 μm, and then dried to form a second adhesive layer. Next, a silicone release treated surface of a lightly peelable PET separator (TOYOBO product name: E7006; thickness 38 μm) was pressed onto the exposed surface of the second adhesive layer, and then cured at 40°C for 3 days to obtain an adhesive sheet B having a second adhesive layer.

(3)構造體片材B之製作 將接著片材B之輕剝離型PET分隔件剝離,並與聚醯亞胺膜(Toray・Dupont製造 商品名:Kapton 200h)貼合,將聚醯亞胺膜及第2接著層於厚度方向上呈圖案狀進行半切,其後,將無用之部分去除。藉此於重剝離型PET分隔件上配置有具有聚醯亞胺膜及第2接著層之圖案狀之構造體的構造體片材B。(3) Preparation of structural body sheet B The light-peelable PET separator of the bonding sheet B was peeled off and laminated with a polyimide film (Toray Dupont, trade name: Kapton 200h). The polyimide film and the second bonding layer were cut in half in a pattern in the thickness direction, and then the unnecessary portion was removed. Thus, a structural body sheet B having a structure having a polyimide film and a second bonding layer in a pattern was arranged on the heavy-peelable PET separator.

(4)積層體B之製作 將實施例1所製作之接著片材A之輕剝離PET分隔件剝離,並以所露出之第1接著層之面與構造體片材B之聚醯亞胺膜相接之方式進行貼合,而製作積層體B。(4) Preparation of laminate B The peelable PET separator of the bonding sheet A prepared in Example 1 was peeled off, and the exposed first bonding layer was bonded to the polyimide film of the structural sheet B to prepare the laminate B.

2.構造體之轉印 使用與實施例1相同之壓延銅箔作為第2層,將積層體B之重剝離型PET分隔件剝離,並使所露出之第2接著層與第2層接觸,自積層體B之第1層側以500 mJ/cm2 (i射線)進行UV照射。藉由UV照射,具有第1接著層及第1層之接著片材A能夠自第1接著層與聚醯亞胺膜之界面剝離,從而能夠將具有聚醯亞胺膜及第2接著層之圖案狀之構造體轉印至第2層上。2. Transfer of structure The same rolled copper foil as in Example 1 was used as the second layer, the releasable PET separator of the laminate B was peeled off, and the exposed second adhesive layer was brought into contact with the second layer, and UV irradiation was performed at 500 mJ/ cm2 (i-ray) from the first layer side of the laminate B. By UV irradiation, the adhesive sheet A having the first adhesive layer and the first layer can be peeled off from the interface between the first adhesive layer and the polyimide film, so that the structure having the pattern of the polyimide film and the second adhesive layer can be transferred to the second layer.

[實施例3] 1.積層體之準備 藉由以下方法準備積層體。[Example 3] 1. Preparation of a laminate A laminate was prepared by the following method.

(1)接著片材C之製作 使用具有聚矽氧脫模處理面之重剝離型PET分隔件(TOYOBO製造 商品名:7304;厚度50 μm),並使用敷料器將實施例1所製備之接著力可變型接著劑組合物以加熱乾燥後之塗佈厚度成為10 μm之方式塗佈於第1層之聚矽氧脫模處理面並進行乾燥而形成第1接著層。繼而,將具有聚矽氧脫模處理面之輕剝離型PET分隔件(TOYOBO製造 商品名:E7006;厚度38 μm)之聚矽氧脫模處理面層壓於第1接著層之露出面,其後,於40℃下實施3天固化而獲得接著片材C。(1) Preparation of Adhesive Sheet C A heavy-peel PET separator having a silicone release treatment surface (TOYOBO product name: 7304; thickness 50 μm) was used, and the adhesive composition with variable adhesion prepared in Example 1 was applied to the silicone release treatment surface of the first layer using an applicator in such a manner that the coating thickness after heat drying became 10 μm, and then dried to form a first adhesive layer. Next, a silicone release-treated surface of a light-peel PET separator (TOYOBO product name: E7006; thickness 38 μm) was pressed onto the exposed surface of the first adhesive layer, and then cured at 40°C for 3 days to obtain an adhesive sheet C.

(2)積層體C之製作 將接著片材C之輕剝離型PET分隔件剝離,並將所露出之第1接著層與聚醯亞胺膜(Toray・Dupont製造 商品名:Kapton 200h)之一面貼合,進而將實施例2所製作之接著片材B之重剝離型PET分隔件剝離,並將所露出之第2接著層與聚醯亞胺膜之另一面貼合。繼而,將接著片材B、聚醯亞胺膜、及第1接著層於厚度方向上呈圖案狀進行半切,其後,將無用之部分去除。藉此獲得於接著片材A之重剝離型PET分隔件上配置有依序具有接著片材B之輕剝離型PET分隔件、第2接著層、聚醯亞胺膜及第1接著層之圖案狀之構造體的構造體片材C。其後,將第1接著層側之輕剝離型PET分隔件剝離,並於所露出之第1接著層配置OPP(Oriented PolyPropylene,延伸聚丙烯)基材作為第1層,而獲得積層體C。(2) Preparation of laminate C The light-peelable PET separator of bonding sheet C was peeled off, and the exposed first bonding layer was bonded to one side of a polyimide film (Toray・Dupont, trade name: Kapton 200h). The heavy-peelable PET separator of bonding sheet B prepared in Example 2 was peeled off, and the exposed second bonding layer was bonded to the other side of the polyimide film. Then, bonding sheet B, the polyimide film, and the first bonding layer were cut in half in a pattern in the thickness direction, and then the unnecessary parts were removed. Thus, a structural sheet C is obtained in which a patterned structure having a light-peelable PET separator of a bonding sheet B, a second bonding layer, a polyimide film, and a first bonding layer is arranged on a heavy-peelable PET separator of a bonding sheet A. Then, the light-peelable PET separator on the first bonding layer side is peeled off, and an OPP (Oriented PolyPropylene) substrate is arranged as the first layer on the exposed first bonding layer, thereby obtaining a laminate C.

2.構造體之轉印 使用與實施例1相同之壓延銅箔作為第2層,將積層體C之輕剝離型PET分隔件剝離,使所露出之第2接著層與第2層接觸,自積層體C之第1層側以500 mJ/cm2 (i射線)進行UV照射。藉由UV照射,第1層能夠自第1層與第1接著層之界面剝離,從而成功將具有第1接著層、聚醯亞胺膜及第2接著層之圖案狀之構造體轉印至第2層上。2. Transfer of structure The same rolled copper foil as in Example 1 was used as the second layer, and the light-peelable PET separator of the laminate C was peeled off so that the exposed second adhesive layer was in contact with the second layer, and UV irradiation was performed at 500 mJ/cm 2 (i-ray) from the first layer side of the laminate C. By UV irradiation, the first layer was able to be peeled off from the interface between the first layer and the first adhesive layer, thereby successfully transferring the structure having the pattern of the first adhesive layer, the polyimide film, and the second adhesive layer to the second layer.

1‧‧‧第1層2‧‧‧第1接著層3‧‧‧構造體3A‧‧‧構造體形成用層4‧‧‧第2接著層10‧‧‧積層體11‧‧‧第2層12‧‧‧其他層12A‧‧‧其他層12B‧‧‧其他層12C‧‧‧其他層20‧‧‧圖案部30‧‧‧附凹部多層體50‧‧‧積層體51‧‧‧第1區域52‧‧‧第2區域L‧‧‧線N1‧‧‧接著力N1'‧‧‧接著力N2‧‧‧接著力N2'‧‧‧接著力N3‧‧‧接著力N4‧‧‧接著力N5‧‧‧接著力P‧‧‧凹部T‧‧‧接著力調整處理X-X‧‧‧線1‧‧‧1st layer 2‧‧‧1st bonding layer 3‧‧‧structure 3A‧‧‧structure forming layer 4‧‧‧2nd bonding layer 10‧‧‧laminated body 11‧‧‧2nd layer 12‧‧‧other layers 12A‧‧‧other layers 12B‧‧‧other layers 12C‧‧‧other layers 20‧‧‧pattern portion 30‧‧‧multilayer body with concave portion 50‧‧‧laminated body 51‧‧‧1st region 52‧‧‧2nd region L‧‧‧line N 1 ‧‧‧bonding force N 1 '‧‧‧bonding force N 2 ‧‧‧bonding force N 2 '‧‧‧bonding force N 3 ‧‧‧bonding force N 4 ‧‧‧bonding force N 5 ‧‧‧Adjustment force P‧‧‧Concave portion T‧‧‧Adjustment force processing XX‧‧‧Line

圖1係表示本發明之積層體之一例之概略俯視圖。 圖2係圖1之X-X線剖視圖。 圖3(a)~(c)係對使用本發明之積層體之構造體之轉印方法之一例進行說明的步驟圖。 圖4係表示本發明之積層體之另一例之概略剖視圖。 圖5係表示本發明之積層體之另一例之概略剖視圖。 圖6(a)~(c)係對使用本發明之積層體之構造體之轉印方法之另一例進行說明的步驟圖。 圖7(a)~(c)係對使用本發明之積層體之構造體之轉印方法之另一例進行說明的步驟圖。 圖8(a)、(b)係表示本發明之積層體之製造方法之一例的步驟圖。 圖9(a)~(c)係表示本發明之附凹部多層體之製造方法之一例的步驟圖。 圖10(a)~(d)係說明劃分步驟之劃分線之位置之說明圖。Fig. 1 is a schematic top view showing an example of a laminate of the present invention. Fig. 2 is a cross-sectional view taken along line X-X of Fig. 1. Fig. 3(a) to (c) are step diagrams for explaining an example of a method for transferring a structure using the laminate of the present invention. Fig. 4 is a schematic cross-sectional view showing another example of a laminate of the present invention. Fig. 5 is a schematic cross-sectional view showing another example of a laminate of the present invention. Fig. 6(a) to (c) are step diagrams for explaining another example of a method for transferring a structure using the laminate of the present invention. Fig. 7(a) to (c) are step diagrams for explaining another example of a method for transferring a structure using the laminate of the present invention. Fig. 8 (a) and (b) are step diagrams showing an example of a method for manufacturing a multilayer body of the present invention. Fig. 9 (a) to (c) are step diagrams showing an example of a method for manufacturing a multilayer body with a recessed portion of the present invention. Fig. 10 (a) to (d) are explanatory diagrams for explaining the positions of dividing lines of dividing steps.

1‧‧‧第1層 1‧‧‧Level 1

2‧‧‧第1接著層 2‧‧‧1st layer

3‧‧‧構造體 3‧‧‧Structure

10‧‧‧積層體 10‧‧‧Layered body

X-X‧‧‧線 X-X‧‧‧Line

Claims (11)

一種積層體,其至少依序具有第1層、第1接著層、及圖案狀之構造體,且於上述構造體之與上述第1接著層側為相反側具有與上述第1接著層不同之組成之第2接著層,上述第1接著層係接受接著力調整處理而使接著力發生變化者,上述構造體係包含樹脂者,上述構造體係不具接著性者。 A laminated body, which has at least a first layer, a first bonding layer, and a patterned structure in sequence, and a second bonding layer having a composition different from that of the first bonding layer on the side of the structure opposite to the first bonding layer, the first bonding layer undergoes bonding force adjustment treatment to change the bonding force, the structure contains resin, and the structure is non-adhesive. 如請求項1之積層體,其中上述第1接著層為接受加熱處理或冷卻處理作為上述接著力調整處理而使接著力降低的感溫性接著層。 The laminate of claim 1, wherein the first bonding layer is a temperature-sensitive bonding layer that is subjected to heating or cooling treatment as the bonding force adjustment treatment to reduce the bonding force. 如請求項1之積層體,其中上述第1接著層為接受能量線照射處理作為上述接著力調整處理而使接著力降低的能量線響應性接著層。 The laminate of claim 1, wherein the first bonding layer is an energy ray responsive bonding layer that receives energy ray irradiation treatment as the bonding force adjustment treatment to reduce the bonding force. 如請求項1之積層體,其中上述第1接著層為接受電場施加處理或無電場處理作為上述接著力調整處理而使接著力降低的電氣響應性接著層。 The laminate of claim 1, wherein the first bonding layer is an electrically responsive bonding layer that receives an electric field application treatment or a no-electric field treatment as the bonding force adjustment treatment to reduce the bonding force. 如請求項1至4中任一項之積層體,其中上述第1接著層為與上述構造體相同之圖案狀。 A layered body as claimed in any one of claims 1 to 4, wherein the first connecting layer is in the same pattern as the above-mentioned structure. 如請求項1之積層體,其中於使上述第2接著層之與上述構造體側為 相反側之面與第2層接觸時,上述接著力調整處理前之上述第1接著層與上述構造體之間之接著力為上述第2接著層與上述第2層之間之接著力以上,且上述接著力調整處理後之上述第1接著層與上述構造體之間之接著力低於上述第2接著層與上述第2層之間之接著力。 The laminated body of claim 1, wherein when the surface of the second bonding layer opposite to the structure is brought into contact with the second layer, the bonding force between the first bonding layer and the structure before the bonding force adjustment treatment is greater than the bonding force between the second bonding layer and the second layer, and the bonding force between the first bonding layer and the structure after the bonding force adjustment treatment is less than the bonding force between the second bonding layer and the second layer. 如請求項5之積層體,其中於使上述第2接著層之與上述構造體側為相反側之面與第2層接觸時,上述接著力調整處理前之上述第1接著層與上述第1層之間之接著力為上述第2接著層與上述第2層之間之接著力以上,且上述接著力調整處理後之上述第1接著層與上述第1層之間之接著力低於上述第2接著層與上述第2層之間之接著力。 The laminated body of claim 5, wherein when the surface of the second bonding layer opposite to the structure side is brought into contact with the second layer, the bonding force between the first bonding layer and the first layer before the bonding force adjustment treatment is greater than the bonding force between the second bonding layer and the second layer, and the bonding force between the first bonding layer and the first layer after the bonding force adjustment treatment is less than the bonding force between the second bonding layer and the second layer. 一種附凹部多層體之製造方法,其係使用如請求項1之積層體且於多層體之一面具備具有開口之凹部的附凹部多層體之製造方法,且該方法包括如下步驟:接觸步驟,其係使上述積層體之上述構造體直接接觸上述第2層之一面或經由上述第2接著層間接地接觸上述第2層之一面;接著力調整步驟,其係藉由上述接著力調整處理使上述第1接著層之接著力降低;轉印步驟,其係至少將上述第1層剝離,並將至少包含上述構造體之圖案部呈圖案狀轉印至上述第2層;積層步驟,其係於上述第2層之具有上述圖案部之側之面積層1層以 上之其他層;劃分步驟,其係將上述圖案部及上述1層以上之其他層劃分成包含上述圖案部及俯視下與上述圖案部處於重疊位置之上述其他層之第1區域、及除此以外之第2區域;及凹部形成步驟,其係將上述第1區域剝離去除,而形成上述凹部。 A method for manufacturing a multilayer body with concave portions, which uses a multilayer body as claimed in claim 1 and has a concave portion with an opening on one side of the multilayer body, and the method comprises the following steps: a contacting step, which is to make the structure of the multilayer body directly contact one side of the second layer or indirectly contact one side of the second layer via the second bonding layer; a bonding force adjusting step, which is to reduce the bonding force of the first bonding layer by the bonding force adjusting treatment; a transfer step, which is to transfer at least the first bonding layer to the bonding layer; The invention further comprises a step of peeling off the layers and transferring the pattern part including at least the structure to the second layer in the form of a pattern; a step of laminating the layer on the side of the second layer having the pattern part and the other layers above the first layer; a step of dividing the pattern part and the other layers above the first layer into a first region including the pattern part and the other layers overlapping the pattern part in a top view, and a second region other than the first region; and a step of forming a concave portion, which comprises peeling off and removing the first region to form the concave portion. 如請求項8之附凹部多層體之製造方法,其中上述附凹部多層體為附凹部多層配線板。 A method for manufacturing a multi-layer body with a recess as claimed in claim 8, wherein the multi-layer body with a recess is a multi-layer wiring board with a recess. 一種構造體之轉印方法,其係使用如請求項1之積層體且將上述構造體轉印至第2層之構造體之轉印方法,且於使上述第2接著層之與上述構造體側為相反側之面與上述第2層接觸時,上述接著力調整處理前之上述第1接著層與上述構造體之間之接著力為上述第2接著層與上述第2層之間之接著力以上,且上述接著力調整處理後之上述第1接著層與上述構造體之間之接著力低於上述第2接著層與上述第2層之間之接著力。 A method for transferring a structure, which is a method for transferring the structure to a second layer using a laminate as claimed in claim 1, and when the surface of the second bonding layer opposite to the structure is brought into contact with the second layer, the bonding force between the first bonding layer and the structure before the bonding force adjustment treatment is greater than the bonding force between the second bonding layer and the second layer, and the bonding force between the first bonding layer and the structure after the bonding force adjustment treatment is less than the bonding force between the second bonding layer and the second layer. 一種構造體之轉印方法,其係使用如請求項1之積層體且將上述構造體轉印至第2層之構造體之轉印方法,且上述第1接著層為與上述構造體相同之圖案狀,於使上述第2接著層之與上述構造體側為相反側之面與上述第2層接觸時, 上述接著力調整處理前之上述第1接著層與上述第1層之間之接著力為上述第2接著層與上述第2層之間之接著力以上,且上述接著力調整處理後之上述第1接著層與上述第1層之間之接著力低於上述第2接著層與上述第2層之間之接著力。 A method for transferring a structure, which is a method for transferring a structure using a laminate as claimed in claim 1 and transferring the structure to a second layer, wherein the first bonding layer is in the same pattern as the structure, and when the surface of the second bonding layer opposite to the structure is brought into contact with the second layer, the bonding force between the first bonding layer and the first layer before the bonding force adjustment treatment is greater than the bonding force between the second bonding layer and the second layer, and the bonding force between the first bonding layer and the first layer after the bonding force adjustment treatment is less than the bonding force between the second bonding layer and the second layer.
TW107120320A 2017-06-13 2018-06-13 Layered body and method for producing multilayered body with concave part utilizing layered body TWI838337B (en)

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JP2007152869A (en) 2005-12-08 2007-06-21 Sekisui Chem Co Ltd Adhesive tape with ultra thin metal foil

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007152869A (en) 2005-12-08 2007-06-21 Sekisui Chem Co Ltd Adhesive tape with ultra thin metal foil

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