TWI837666B - Lighting board and lighting board manufacturing method - Google Patents

Lighting board and lighting board manufacturing method Download PDF

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TWI837666B
TWI837666B TW111118387A TW111118387A TWI837666B TW I837666 B TWI837666 B TW I837666B TW 111118387 A TW111118387 A TW 111118387A TW 111118387 A TW111118387 A TW 111118387A TW I837666 B TWI837666 B TW I837666B
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sintered
layer
nanometal
nanoparticles
substrate
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TW111118387A
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TW202329504A (en
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陳在宇
鄭鴻川
黃恒儀
何信政
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達方電子股份有限公司
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Abstract

A lighting board includes a substrate, a conductive trace, a sintered nano-metal layer, a soldering layer, and a light-emitting part. The conductive trace is located on the substrate and has a pad area. The sintered nano-metal layer is located on the pad area. The soldering layer is located on the sintered nano-metal layer. The light-emitting part is fixed on the soldering layer. A lighting board manufacturing method includes the following steps: providing a substrate, forming a conductive trace on the substrate, forming a sintered nano-metal layer on a pad area of the conductive trace, forming a layer of solder paste, disposing a light-emitting part on the layer of solder paste, and performing a reflow soldering on the layer of solder paste.

Description

燈板及燈板製作方法Light board and light board manufacturing method

本發明關於一種燈板及其製作方法,尤指一種使用燒結的奈米金屬層作為焊墊之燈板及其製作方法。The present invention relates to a lamp panel and a manufacturing method thereof, and more particularly to a lamp panel using a sintered nanometal layer as a solder pad and a manufacturing method thereof.

有些發光鍵盤使用柔性印刷電路板(Flexible Printed Circuit, FPC)承載發光二極體(Light-Emitting Diode, LED)以作為其背光光源。一般FPC製程是在高分子基材上形成銅線路,再將LED焊接到銅線路,以構成燈板。由於銅線路製程採濕式黃光蝕刻製程,製程工序複雜,造成製程與材料成本過高。Some illuminated keyboards use flexible printed circuits (FPC) to carry light-emitting diodes (LEDs) as their backlight source. The general FPC manufacturing process is to form copper lines on a polymer substrate, and then solder the LEDs to the copper lines to form a light board. Since the copper line manufacturing process uses a wet yellow light etching process, the process steps are complicated, resulting in high process and material costs.

鑑於先前技術中的問題,本發明之一目的在於提供一種燈板,於其焊墊區上使用燒結的奈米金屬層,有助於焊接層與焊墊區間之連接。In view of the problems in the prior art, one object of the present invention is to provide a lamp panel that uses a sintered nanometal layer on its pad area to facilitate the connection between the soldering layer and the pad area.

根據本發明之一燈板包含一基板、一導線、一燒結的奈米金屬層、一焊接層及一發光件。該導線位於該基板上並具有一焊墊區。該燒結的奈米金屬層位於該焊墊區上。該焊接層位於該燒結的奈米金屬層上。該發光件固定於該焊接層上。於實作上,透過選擇該燒結的奈米金屬層的材質,可使該焊接層包含其與該燒結的奈米金屬層的反應物,更有利於該燒結的奈米金屬層有助於焊接層與焊墊區間之連接。According to the present invention, a light panel comprises a substrate, a wire, a sintered nanometal layer, a welding layer and a light-emitting element. The wire is located on the substrate and has a welding pad area. The sintered nanometal layer is located on the welding pad area. The welding layer is located on the sintered nanometal layer. The light-emitting element is fixed on the welding layer. In practice, by selecting the material of the sintered nanometal layer, the welding layer can contain a reactant with the sintered nanometal layer, which is more conducive to the sintered nanometal layer to facilitate the connection between the welding layer and the welding pad area.

本發明之另一目的在於提供一種燈板製作方法,於其焊墊區上使用燒結的奈米金屬層,其能與錫膏穩固連接。Another object of the present invention is to provide a method for manufacturing a light panel, using a sintered nanometal layer on its pad area, which can be stably connected to the solder paste.

根據本發明之一燈板製作方法包含下列步驟:提供一基板;於該基板上形成一導線,該導線具有一焊墊區;於該焊墊區上形成一燒結的奈米金屬層;於該燒結的奈米金屬層上形成一錫膏層;將一發光件放置於該錫膏層上;以及對該錫膏層實施回焊。於實作上,透過選擇該燒結的奈米金屬層的材質,可使該錫膏層於回焊時與該燒結的奈米金屬層反應,更有利於由該錫膏層形成之焊接層與該燒結的奈米金屬層間之連接。According to a method for manufacturing a light panel of the present invention, the steps include: providing a substrate; forming a wire on the substrate, the wire having a solder pad area; forming a sintered nanometal layer on the solder pad area; forming a solder paste layer on the sintered nanometal layer; placing a light-emitting element on the solder paste layer; and reflowing the solder paste layer. In practice, by selecting the material of the sintered nanometal layer, the solder paste layer can react with the sintered nanometal layer during reflow, which is more conducive to the connection between the solder layer formed by the solder paste layer and the sintered nanometal layer.

關於本發明之優點與精神可以藉由以下的發明詳述及所附圖式得到進一步的瞭解。The advantages and spirit of the present invention can be further understood through the following detailed description of the invention and the attached drawings.

請參閱第1圖。根據一第一實施例之一燈板1包含一基板12、二導線14、二燒結的奈米金屬層16、二焊接層18及一發光件20。導線14位於基板12上。每一個導線14具有一焊墊區142。該二燒結的奈米金屬層16分別位於該二焊墊區142上。該二焊接層18分別位於該二燒結的奈米金屬層16上。發光件20 (例如但不限於發光二極體)固定於該二焊接層18上。透過該二導線14可提供電力發光件20,並控制其運作。於實際應用中,燈板1可應用至一發光鍵盤中,例如其背光光源以燈板1結構製作。Please refer to FIG. 1. A lamp panel 1 according to a first embodiment includes a substrate 12, two wires 14, two sintered nanometal layers 16, two welding layers 18 and a light-emitting element 20. The wires 14 are located on the substrate 12. Each wire 14 has a welding pad area 142. The two sintered nanometal layers 16 are respectively located on the two welding pad areas 142. The two welding layers 18 are respectively located on the two sintered nanometal layers 16. The light-emitting element 20 (for example but not limited to a light-emitting diode) is fixed on the two welding layers 18. The two wires 14 can provide power to the light-emitting element 20 and control its operation. In practical applications, the light board 1 can be applied to a light-emitting keyboard, for example, its backlight source is made of the light board 1 structure.

於本實施例中,導線14包含固化的銀漿,例如透過印刷銀漿於基板12,再加熱固化形成導線14,但實作上不以此為限。基板12可以是但不限於聚對苯二甲酸乙二酯(polyethylene terephthalate)(其可耐溫150攝氏度至170攝氏度)、聚醯亞胺(Polyimide)、雙馬來醯亞胺三嗪(bismaleimide triazine) 或聚甲基丙烯酸甲酯(polymethyl methacrylate)的高分子基板(polymer substrate)。基板12也可以是IC載板,例如BT樹脂(雙馬來醯亞胺三嗪樹脂)載板、類BT載板、ABF(Ajinomoto Build-up Film)載板、MIS(Molded Interconnect Substrate)載板等。於實作上,導線14的厚度可設計在2微米至30微米之範圍內。In the present embodiment, the wire 14 includes a cured silver paste, for example, the wire 14 is formed by printing the silver paste on the substrate 12 and then curing it by heating, but the practice is not limited thereto. The substrate 12 may be, but is not limited to, a polymer substrate of polyethylene terephthalate (which can withstand temperatures of 150 degrees Celsius to 170 degrees Celsius), polyimide, bismaleimide triazine or polymethyl methacrylate. The substrate 12 may also be an IC substrate, such as a BT resin (bismaleimide triazine resin) substrate, a BT-like substrate, an ABF (Ajinomoto Build-up Film) substrate, an MIS (Molded Interconnect Substrate) substrate, etc. In practice, the thickness of the conductive line 14 can be designed to be in the range of 2 micrometers to 30 micrometers.

燒結的奈米金屬層16包含燒結的複數個金屬奈米顆粒,例如但不限於複數個燒結的銀奈米顆粒、燒結的銅奈米顆粒、燒結的鎳奈米顆粒、燒結的金奈米顆粒或燒結的錫奈米顆粒。例如透過印刷金屬奈米顆粒的漿料於焊墊區142上,再低溫燒結形成燒結的奈米金屬層16,其中燒結的奈米金屬層16包含複數個燒結頸。燒結的奈米金屬層16可與導線14的焊墊區142有不錯的結合度。於實作上,例如,可選用金屬奈米顆粒的粒徑可落在10奈米至1000奈米之範圍內,又例如,可選用金屬奈米顆粒的平均粒徑在50奈米至800奈米之範圍內。燒結的奈米金屬層16的厚度可設計在0.5微米至30微米之範圍內。The sintered nanometal layer 16 includes a plurality of sintered metal nanoparticles, such as but not limited to a plurality of sintered silver nanoparticles, sintered copper nanoparticles, sintered nickel nanoparticles, sintered gold nanoparticles or sintered tin nanoparticles. For example, the sintered nanometal layer 16 is formed by printing a slurry of metal nanoparticles on the pad area 142 and then sintering at a low temperature, wherein the sintered nanometal layer 16 includes a plurality of sintered necks. The sintered nanometal layer 16 can have a good bonding with the pad area 142 of the wire 14. In practice, for example, the particle size of the metal nanoparticles can be in the range of 10 nm to 1000 nm, and for another example, the average particle size of the metal nanoparticles can be in the range of 50 nm to 800 nm. The thickness of the sintered nanometal layer 16 can be designed to be in the range of 0.5 μm to 30 μm.

焊接層18可由鍚膏回焊實現。透過適當選擇鍚膏及燒結的奈米金屬層16的成分,鍚膏於回焊時會與燒結的奈米金屬層16反應形成共化物,其可增加焊接層18與燒結的奈米金屬層16間之結合強度。於實作上,焊接層18可包含錫鉍共化物、錫鉍銀共化物或錫銀銅共化物。焊接層18的厚度可設計在2微米至50微米之範圍內。The soldering layer 18 can be realized by solder paste reflow. By properly selecting the composition of the solder paste and the sintered nanometal layer 16, the solder paste will react with the sintered nanometal layer 16 during reflow to form a copolymer, which can increase the bonding strength between the soldering layer 18 and the sintered nanometal layer 16. In practice, the soldering layer 18 can include tin-bismuth copolymer, tin-bismuth-silver copolymer, or tin-silver-copper copolymer. The thickness of the soldering layer 18 can be designed to be in the range of 2 microns to 50 microns.

請參閱第2圖,其顯示根據一第二實施例之燈板製作方法。為簡化說明,以製作前述燈板1為例說明;但於實作上,前述燈板1不限於以此燈板製作方法製作。關於前述燈板1各構件之相關說明,於此可適用者,亦有適用,不另贅述。如第2圖中步驟S100所示,該燈板製作方法提供一基板12,如第3圖所示。如步驟S102所示,該燈板製作方法於該基板上形成二導線14,如第4圖所示。其中,導線14具有一焊墊區142。於實作上,步驟S102可透過先使用銀漿(例如由銀或其化合物、助熔劑、粘合劑和稀釋劑配製而成)在基板12上形成銀漿線路(例如透過印刷,其中該銀漿線路的輪廓原則上與導線14輪廓相同),再固化該銀漿線路(例如但不限於以80~250攝氏度範圍內之溫度烘烤),進而於基板12上形成導線14而實現。Please refer to FIG. 2, which shows a lamp board manufacturing method according to a second embodiment. To simplify the explanation, the manufacturing of the aforementioned lamp board 1 is taken as an example; however, in practice, the aforementioned lamp board 1 is not limited to being manufactured using this lamp board manufacturing method. The relevant descriptions of the components of the aforementioned lamp board 1 are also applicable here and are not repeated here. As shown in step S100 in FIG. 2, the lamp board manufacturing method provides a substrate 12, as shown in FIG. 3. As shown in step S102, the lamp board manufacturing method forms two wires 14 on the substrate, as shown in FIG. 4. Among them, the wire 14 has a solder pad area 142. In practice, step S102 can be achieved by first using silver slurry (for example, prepared from silver or its compounds, flux, adhesive and diluent) to form a silver slurry circuit on the substrate 12 (for example, by printing, wherein the outline of the silver slurry circuit is in principle the same as the outline of the wire 14), and then curing the silver slurry circuit (for example, but not limited to, baking at a temperature in the range of 80 to 250 degrees Celsius), thereby forming the wire 14 on the substrate 12.

如第2圖中步驟S104所示,該燈板製作方法於焊墊區142上形成一燒結的奈米金屬層16,作為焊墊,如第5圖所示。其中,燒結的奈米金屬層16覆蓋整個對應的焊墊區142。於實作上,步驟S102可透過先使用金屬奈米顆粒的漿料於焊墊區142上塗覆一奈米金屬層(例如透過印刷,其中該奈米金屬層的輪廓原則上與燒結的奈米金屬層16輪廓相同),燒結該奈米金屬層(例如燒結的溫度可設定在100攝氏度至300攝氏度之範圍內),進而於焊墊區142上形成燒結的奈米金屬層16而實現。此外,於實作上,該奈米金屬層包含複數個金屬奈米顆粒,例如但不限於複數個銀奈米顆粒、銅奈米顆粒、鎳奈米顆粒、金奈米顆粒或錫奈米顆粒。於實作上,例如,可選用金屬奈米顆粒的粒徑可落在10奈米至1000奈米之範圍內,又例如,可選用金屬奈米顆粒的平均粒徑在50奈米至800奈米之範圍內。As shown in step S104 of FIG. 2 , the lamp panel manufacturing method forms a sintered nanometal layer 16 on the pad area 142 as a pad, as shown in FIG. 5 . The sintered nanometal layer 16 covers the entire corresponding pad area 142 . In practice, step S102 can be achieved by first using a slurry of metal nanoparticles to coat a nanometal layer on the pad area 142 (for example, by printing, wherein the outline of the nanometal layer is in principle the same as the outline of the sintered nanometal layer 16), sintering the nanometal layer (for example, the sintering temperature can be set in the range of 100 degrees Celsius to 300 degrees Celsius), and then forming a sintered nanometal layer 16 on the pad area 142. In addition, in practice, the nanometal layer includes a plurality of metal nanoparticles, such as but not limited to a plurality of silver nanoparticles, copper nanoparticles, nickel nanoparticles, gold nanoparticles or tin nanoparticles. In practice, for example, the particle size of the metal nanoparticles can be in the range of 10 nanometers to 1000 nanometers, and for another example, the average particle size of the metal nanoparticles can be in the range of 50 nanometers to 800 nanometers.

如第2圖中步驟S106所示,該燈板製作方法於該燒結的奈米金屬層16上形成一錫膏層19 (例如包含助焊劑與錫或錫合金粉末),如第6圖所示。接著,如第2圖中步驟S108所示,該燈板製作方法將一發光件20放置於該二燒結的奈米金屬層16的錫膏層19上,如第7圖所示。之後,如第2圖中步驟S110所示,該燈板製作方法對該二錫膏層(或謂整個燈板1半成品)實施回焊(例如回焊溫度可設定在100攝氏度至270攝氏度之範圍內)。回焊後,即完成燈板1成品(可參閱第1圖)。As shown in step S106 of FIG. 2, the lamp board manufacturing method forms a solder paste layer 19 (e.g., including flux and tin or tin alloy powder) on the sintered nanometal layer 16, as shown in FIG. 6. Next, as shown in step S108 of FIG. 2, the lamp board manufacturing method places a light-emitting element 20 on the solder paste layer 19 of the two sintered nanometal layers 16, as shown in FIG. 7. Thereafter, as shown in step S110 of FIG. 2, the lamp board manufacturing method performs reflow on the two solder paste layers (or the entire semi-finished lamp board 1) (e.g., the reflow temperature can be set within a range of 100 degrees Celsius to 270 degrees Celsius). After reflow, the lamp board 1 is completed (see Figure 1).

另外,請參閱第8圖,其為根據該燈板製作方法製作之燈板1部分的SEM圖。錫膏層19於回焊後形成焊接層18。透過適當選擇鍚膏及燒結的奈米金屬層16的成分,於回焊時,錫膏層19會與燒結的奈米金屬層16反應形成共化物(例如圖中的介面金屬共化物層182,例如錫銀銅共化物),其可增加焊接層18與燒結的奈米金屬層16之間的結合強度。In addition, please refer to FIG. 8, which is a SEM image of a portion of a lamp panel 1 manufactured according to the lamp panel manufacturing method. The solder paste layer 19 forms a solder layer 18 after reflow. By properly selecting the composition of the solder paste and the sintered nanometal layer 16, during reflow, the solder paste layer 19 will react with the sintered nanometal layer 16 to form a copolymer (such as the interface metal copolymer layer 182 in the figure, such as tin-silver-copper copolymer), which can increase the bonding strength between the solder layer 18 and the sintered nanometal layer 16.

如上述說明,於燈板1中,燒結的奈米金屬層16與導線14的焊墊區142有不錯的結合度,燒結的奈米金屬層16可作為焊墊,使得焊接層18可透過燒結的奈米金屬層16與導線14電性連接。藉此,燈板1的導線14可採用簡便的方式形成,例如印刷銀漿線路並固化之,此相對於目前以蝕刻製程制作FPC上的線路而言,具有製程簡單,製程與材料成本較低等優勢。 以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。 As described above, in the light board 1, the sintered nanometal layer 16 has a good bonding with the pad area 142 of the wire 14. The sintered nanometal layer 16 can be used as a pad, so that the welding layer 18 can be electrically connected to the wire 14 through the sintered nanometal layer 16. In this way, the wire 14 of the light board 1 can be formed in a simple way, such as printing a silver paste line and curing it. Compared with the current etching process for making the line on the FPC, this has the advantages of simple process, low process and material cost. The above is only a preferred embodiment of the present invention. All equal changes and modifications made according to the scope of the patent application of the present invention should be covered by the present invention.

1:燈板 12:基板 14:導線 142:焊墊區 16:燒結的奈米金屬層 18:焊接層 182:介面金屬共化物 19:錫膏層 20:發光件 S100、S102、S104、S106、S108、S110:實施步驟 1: Light board 12: Substrate 14: Wire 142: Solder pad area 16: Sintered nanometal layer 18: Solder layer 182: Interface metal co-compound 19: Solder paste layer 20: Light-emitting element S100, S102, S104, S106, S108, S110: Implementation steps

第1圖為根據一第一實施例之一燈板之剖面圖。 第2圖為根據一第二實施例之一燈板製作方法之流程圖。 第3圖為根據該燈板製作方法提供之基板之示意圖。 第4圖為根據該燈板製作方法於該基板上形成導線後之示意圖。 第5圖為根據該燈板製作方法於該導線的焊墊區上形成燒結的奈米金屬層後之示意圖。 第6圖為根據該燈板製作方法於該燒結的奈米金屬層上形成一錫膏層後之示意圖。 第7圖為根據該燈板製作方法於該錫膏層上放置發光件後之示意圖。 第8圖為根據該燈板製作方法於回焊後之SEM圖。 FIG. 1 is a cross-sectional view of a lamp panel according to a first embodiment. FIG. 2 is a flow chart of a lamp panel manufacturing method according to a second embodiment. FIG. 3 is a schematic diagram of a substrate provided according to the lamp panel manufacturing method. FIG. 4 is a schematic diagram after forming a wire on the substrate according to the lamp panel manufacturing method. FIG. 5 is a schematic diagram after forming a sintered nanometal layer on the pad area of the wire according to the lamp panel manufacturing method. FIG. 6 is a schematic diagram after forming a solder paste layer on the sintered nanometal layer according to the lamp panel manufacturing method. FIG. 7 is a schematic diagram after placing a light-emitting element on the solder paste layer according to the lamp panel manufacturing method. FIG. 8 is a SEM image of the lamp panel after reflow according to the lamp panel manufacturing method.

1:燈板 1: Light board

12:基板 12: Substrate

14:導線 14: Wire

142:焊墊區 142: Solder pad area

16:燒結的奈米金屬層 16: Sintered nanometal layer

18:焊接層 18: Welding layer

20:發光件 20: Luminous parts

Claims (19)

一種燈板,包含: 一基板; 一導線,位於該基板上,該導線具有一焊墊區; 一燒結的奈米金屬層,位於該焊墊區上; 一焊接層,位於該燒結的奈米金屬層上;以及 一發光件,固定於該焊接層上。 A light panel includes: a substrate; a wire located on the substrate, the wire having a pad area; a sintered nanometal layer located on the pad area; a soldering layer located on the sintered nanometal layer; and a light-emitting element fixed on the soldering layer. 如請求項1所述之燈板,其中該燒結的奈米金屬層包含燒結的銀奈米顆粒、燒結的銅奈米顆粒、燒結的鎳奈米顆粒、燒結的金奈米顆粒或燒結的錫奈米顆粒。The light panel as described in claim 1, wherein the sintered nanometal layer comprises sintered silver nanoparticles, sintered copper nanoparticles, sintered nickel nanoparticles, sintered gold nanoparticles or sintered tin nanoparticles. 如請求項1所述之燈板,其中該燒結的奈米金屬層包含燒結的複數個金屬奈米顆粒,該複數個金屬奈米顆粒的粒徑在10奈米至1000奈米之範圍內。A light panel as described in claim 1, wherein the sintered nanometal layer comprises a plurality of sintered metal nanoparticles, and the particle size of the plurality of metal nanoparticles is in the range of 10 nm to 1000 nm. 如請求項1所述之燈板,其中該燒結的奈米金屬層包含燒結的複數個金屬奈米顆粒,該複數個金屬奈米顆粒的平均粒徑在50奈米至800奈米之範圍內。A light panel as described in claim 1, wherein the sintered nanometal layer comprises a plurality of sintered metal nanoparticles, and the average particle size of the plurality of metal nanoparticles is in the range of 50 nm to 800 nm. 如請求項1所述之燈板,其中該燒結的奈米金屬層包含複數個燒結頸。A light panel as described in claim 1, wherein the sintered nanometal layer comprises a plurality of sintered necks. 如請求項1所述之燈板,其中該基板為聚對苯二甲酸乙二酯、聚醯亞胺、雙馬來醯亞胺三嗪或聚甲基丙烯酸甲酯的高分子基板。A light panel as described in claim 1, wherein the substrate is a polymer substrate of polyethylene terephthalate, polyimide, dimaleimide triazine or polymethyl methacrylate. 如請求項1所述之燈板,其中該基板為一IC載板。A light board as described in claim 1, wherein the substrate is an IC carrier. 如請求項1所述之燈板,其中該焊接層包含錫鉍共化物、錫鉍銀共化物或錫銀銅共化物。A lamp panel as described in claim 1, wherein the solder layer comprises a tin-bismuth copolymer, a tin-bismuth-silver copolymer or a tin-silver-copper copolymer. 如請求項1所述之燈板,其中該導線包含固化的銀漿。A light panel as described in claim 1, wherein the wire comprises solidified silver slurry. 如請求項1所述之燈板,其中該導線的厚度在2微米至30微米之範圍內。A light panel as described in claim 1, wherein the thickness of the wire is in the range of 2 microns to 30 microns. 如請求項10所述之燈板,其中該燒結的奈米金屬層的厚度在0.5微米至30微米之範圍內。A light panel as described in claim 10, wherein the thickness of the sintered nanometal layer is in the range of 0.5 microns to 30 microns. 如請求項11所述之燈板,其中該焊接層的厚度在2微米至50微米之範圍內。A lamp panel as described in claim 11, wherein the thickness of the welding layer is in the range of 2 microns to 50 microns. 一種燈板製作方法,包含下列步驟: (a) 提供一基板; (b) 於該基板上形成一導線,該導線具有一焊墊區; (c) 於該焊墊區上形成一燒結的奈米金屬層; (d) 於該燒結的奈米金屬層上形成一錫膏層; (e) 將一發光件放置於該錫膏層上;以及 (f) 對該錫膏層實施回焊。 A method for manufacturing a light panel comprises the following steps: (a) providing a substrate; (b) forming a wire on the substrate, the wire having a solder pad area; (c) forming a sintered nanometal layer on the solder pad area; (d) forming a solder paste layer on the sintered nanometal layer; (e) placing a light-emitting element on the solder paste layer; and (f) performing reflow on the solder paste layer. 如請求項13所述之燈板製作方法,其中步驟(b)由下列步驟實施: 使用銀漿以在該基板上形成一銀漿線路;以及 固化該銀漿線路以於該基板上形成該導線。 A method for manufacturing a light panel as described in claim 13, wherein step (b) is implemented by the following steps: Using silver slurry to form a silver slurry circuit on the substrate; and Curing the silver slurry circuit to form the conductor on the substrate. 如請求項13所述之燈板製作方法,其中步驟(c)由下列步驟實施: 於該焊墊區上塗覆一奈米金屬層;以及 燒結該奈米金屬層以形成該燒結的奈米金屬層。 The method for manufacturing a light panel as described in claim 13, wherein step (c) is implemented by the following steps: coating a nanometal layer on the pad area; and sintering the nanometal layer to form the sintered nanometal layer. 如請求項15所述之燈板製作方法,其中該燒結的溫度在100攝氏度至300攝氏度之範圍內。A method for manufacturing a light panel as described in claim 15, wherein the sintering temperature is in the range of 100 degrees Celsius to 300 degrees Celsius. 如請求項15所述之燈板製作方法,其中該奈米金屬層包含銀奈米顆粒、銅奈米顆粒、鎳奈米顆粒、金奈米顆粒或錫奈米顆粒。A method for manufacturing a light panel as described in claim 15, wherein the nanometal layer comprises silver nanoparticles, copper nanoparticles, nickel nanoparticles, gold nanoparticles or tin nanoparticles. 如請求項15所述之燈板製作方法,其中該奈米金屬層包含複數個金屬奈米顆粒,該複數個金屬奈米顆粒的粒徑在10奈米至1000奈米之範圍內。A method for manufacturing a light panel as described in claim 15, wherein the nanometal layer comprises a plurality of metal nanoparticles, and the particle size of the plurality of metal nanoparticles is in the range of 10 nanometers to 1000 nanometers. 如請求項15所述之燈板製作方法,其中該奈米金屬層包含複數個金屬奈米顆粒,該複數個金屬奈米顆粒的平均粒徑在50奈米至800奈米之範圍內。A method for manufacturing a light panel as described in claim 15, wherein the nanometal layer comprises a plurality of metal nanoparticles, and the average particle size of the plurality of metal nanoparticles is in the range of 50 nanometers to 800 nanometers.
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Citations (3)

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Publication number Priority date Publication date Assignee Title
TW201415486A (en) * 2012-09-05 2014-04-16 Hitachi Chemical Co Ltd Silver paste composition and semiconductor device using same
TW201440080A (en) * 2006-10-12 2014-10-16 Cambrios Technologies Corp Nanowire-based transparent conductors and applications thereof
TW202135232A (en) * 2020-03-12 2021-09-16 日商鎧俠股份有限公司 Wiring fabrication method, method for manufacturing semiconductor device, and semiconductor device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201440080A (en) * 2006-10-12 2014-10-16 Cambrios Technologies Corp Nanowire-based transparent conductors and applications thereof
TW201415486A (en) * 2012-09-05 2014-04-16 Hitachi Chemical Co Ltd Silver paste composition and semiconductor device using same
TW202135232A (en) * 2020-03-12 2021-09-16 日商鎧俠股份有限公司 Wiring fabrication method, method for manufacturing semiconductor device, and semiconductor device

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