TWI837666B - Lighting board and lighting board manufacturing method - Google Patents
Lighting board and lighting board manufacturing method Download PDFInfo
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- TWI837666B TWI837666B TW111118387A TW111118387A TWI837666B TW I837666 B TWI837666 B TW I837666B TW 111118387 A TW111118387 A TW 111118387A TW 111118387 A TW111118387 A TW 111118387A TW I837666 B TWI837666 B TW I837666B
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 32
- 229910000679 solder Inorganic materials 0.000 claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 238000005476 soldering Methods 0.000 claims abstract description 11
- 239000002082 metal nanoparticle Substances 0.000 claims description 16
- 239000002105 nanoparticle Substances 0.000 claims description 16
- 238000003466 welding Methods 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 15
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 12
- 229910052709 silver Inorganic materials 0.000 claims description 12
- 239000004332 silver Substances 0.000 claims description 12
- 229920001577 copolymer Polymers 0.000 claims description 10
- 239000002002 slurry Substances 0.000 claims description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 5
- 238000005245 sintering Methods 0.000 claims description 5
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 claims description 3
- 229920000307 polymer substrate Polymers 0.000 claims description 3
- 229910000969 tin-silver-copper Inorganic materials 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 2
- 210000003739 neck Anatomy 0.000 claims description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 2
- -1 polyethylene terephthalate Polymers 0.000 claims description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 2
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000004020 conductor Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 abstract description 6
- 229910052751 metal Inorganic materials 0.000 abstract description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920003192 poly(bis maleimide) Polymers 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
Images
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- Manufacturing Of Printed Wiring (AREA)
- Led Device Packages (AREA)
- Fastening Of Light Sources Or Lamp Holders (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
本發明關於一種燈板及其製作方法,尤指一種使用燒結的奈米金屬層作為焊墊之燈板及其製作方法。The present invention relates to a lamp panel and a manufacturing method thereof, and more particularly to a lamp panel using a sintered nanometal layer as a solder pad and a manufacturing method thereof.
有些發光鍵盤使用柔性印刷電路板(Flexible Printed Circuit, FPC)承載發光二極體(Light-Emitting Diode, LED)以作為其背光光源。一般FPC製程是在高分子基材上形成銅線路,再將LED焊接到銅線路,以構成燈板。由於銅線路製程採濕式黃光蝕刻製程,製程工序複雜,造成製程與材料成本過高。Some illuminated keyboards use flexible printed circuits (FPC) to carry light-emitting diodes (LEDs) as their backlight source. The general FPC manufacturing process is to form copper lines on a polymer substrate, and then solder the LEDs to the copper lines to form a light board. Since the copper line manufacturing process uses a wet yellow light etching process, the process steps are complicated, resulting in high process and material costs.
鑑於先前技術中的問題,本發明之一目的在於提供一種燈板,於其焊墊區上使用燒結的奈米金屬層,有助於焊接層與焊墊區間之連接。In view of the problems in the prior art, one object of the present invention is to provide a lamp panel that uses a sintered nanometal layer on its pad area to facilitate the connection between the soldering layer and the pad area.
根據本發明之一燈板包含一基板、一導線、一燒結的奈米金屬層、一焊接層及一發光件。該導線位於該基板上並具有一焊墊區。該燒結的奈米金屬層位於該焊墊區上。該焊接層位於該燒結的奈米金屬層上。該發光件固定於該焊接層上。於實作上,透過選擇該燒結的奈米金屬層的材質,可使該焊接層包含其與該燒結的奈米金屬層的反應物,更有利於該燒結的奈米金屬層有助於焊接層與焊墊區間之連接。According to the present invention, a light panel comprises a substrate, a wire, a sintered nanometal layer, a welding layer and a light-emitting element. The wire is located on the substrate and has a welding pad area. The sintered nanometal layer is located on the welding pad area. The welding layer is located on the sintered nanometal layer. The light-emitting element is fixed on the welding layer. In practice, by selecting the material of the sintered nanometal layer, the welding layer can contain a reactant with the sintered nanometal layer, which is more conducive to the sintered nanometal layer to facilitate the connection between the welding layer and the welding pad area.
本發明之另一目的在於提供一種燈板製作方法,於其焊墊區上使用燒結的奈米金屬層,其能與錫膏穩固連接。Another object of the present invention is to provide a method for manufacturing a light panel, using a sintered nanometal layer on its pad area, which can be stably connected to the solder paste.
根據本發明之一燈板製作方法包含下列步驟:提供一基板;於該基板上形成一導線,該導線具有一焊墊區;於該焊墊區上形成一燒結的奈米金屬層;於該燒結的奈米金屬層上形成一錫膏層;將一發光件放置於該錫膏層上;以及對該錫膏層實施回焊。於實作上,透過選擇該燒結的奈米金屬層的材質,可使該錫膏層於回焊時與該燒結的奈米金屬層反應,更有利於由該錫膏層形成之焊接層與該燒結的奈米金屬層間之連接。According to a method for manufacturing a light panel of the present invention, the steps include: providing a substrate; forming a wire on the substrate, the wire having a solder pad area; forming a sintered nanometal layer on the solder pad area; forming a solder paste layer on the sintered nanometal layer; placing a light-emitting element on the solder paste layer; and reflowing the solder paste layer. In practice, by selecting the material of the sintered nanometal layer, the solder paste layer can react with the sintered nanometal layer during reflow, which is more conducive to the connection between the solder layer formed by the solder paste layer and the sintered nanometal layer.
關於本發明之優點與精神可以藉由以下的發明詳述及所附圖式得到進一步的瞭解。The advantages and spirit of the present invention can be further understood through the following detailed description of the invention and the attached drawings.
請參閱第1圖。根據一第一實施例之一燈板1包含一基板12、二導線14、二燒結的奈米金屬層16、二焊接層18及一發光件20。導線14位於基板12上。每一個導線14具有一焊墊區142。該二燒結的奈米金屬層16分別位於該二焊墊區142上。該二焊接層18分別位於該二燒結的奈米金屬層16上。發光件20 (例如但不限於發光二極體)固定於該二焊接層18上。透過該二導線14可提供電力發光件20,並控制其運作。於實際應用中,燈板1可應用至一發光鍵盤中,例如其背光光源以燈板1結構製作。Please refer to FIG. 1. A
於本實施例中,導線14包含固化的銀漿,例如透過印刷銀漿於基板12,再加熱固化形成導線14,但實作上不以此為限。基板12可以是但不限於聚對苯二甲酸乙二酯(polyethylene terephthalate)(其可耐溫150攝氏度至170攝氏度)、聚醯亞胺(Polyimide)、雙馬來醯亞胺三嗪(bismaleimide triazine) 或聚甲基丙烯酸甲酯(polymethyl methacrylate)的高分子基板(polymer substrate)。基板12也可以是IC載板,例如BT樹脂(雙馬來醯亞胺三嗪樹脂)載板、類BT載板、ABF(Ajinomoto Build-up Film)載板、MIS(Molded Interconnect Substrate)載板等。於實作上,導線14的厚度可設計在2微米至30微米之範圍內。In the present embodiment, the
燒結的奈米金屬層16包含燒結的複數個金屬奈米顆粒,例如但不限於複數個燒結的銀奈米顆粒、燒結的銅奈米顆粒、燒結的鎳奈米顆粒、燒結的金奈米顆粒或燒結的錫奈米顆粒。例如透過印刷金屬奈米顆粒的漿料於焊墊區142上,再低溫燒結形成燒結的奈米金屬層16,其中燒結的奈米金屬層16包含複數個燒結頸。燒結的奈米金屬層16可與導線14的焊墊區142有不錯的結合度。於實作上,例如,可選用金屬奈米顆粒的粒徑可落在10奈米至1000奈米之範圍內,又例如,可選用金屬奈米顆粒的平均粒徑在50奈米至800奈米之範圍內。燒結的奈米金屬層16的厚度可設計在0.5微米至30微米之範圍內。The sintered
焊接層18可由鍚膏回焊實現。透過適當選擇鍚膏及燒結的奈米金屬層16的成分,鍚膏於回焊時會與燒結的奈米金屬層16反應形成共化物,其可增加焊接層18與燒結的奈米金屬層16間之結合強度。於實作上,焊接層18可包含錫鉍共化物、錫鉍銀共化物或錫銀銅共化物。焊接層18的厚度可設計在2微米至50微米之範圍內。The
請參閱第2圖,其顯示根據一第二實施例之燈板製作方法。為簡化說明,以製作前述燈板1為例說明;但於實作上,前述燈板1不限於以此燈板製作方法製作。關於前述燈板1各構件之相關說明,於此可適用者,亦有適用,不另贅述。如第2圖中步驟S100所示,該燈板製作方法提供一基板12,如第3圖所示。如步驟S102所示,該燈板製作方法於該基板上形成二導線14,如第4圖所示。其中,導線14具有一焊墊區142。於實作上,步驟S102可透過先使用銀漿(例如由銀或其化合物、助熔劑、粘合劑和稀釋劑配製而成)在基板12上形成銀漿線路(例如透過印刷,其中該銀漿線路的輪廓原則上與導線14輪廓相同),再固化該銀漿線路(例如但不限於以80~250攝氏度範圍內之溫度烘烤),進而於基板12上形成導線14而實現。Please refer to FIG. 2, which shows a lamp board manufacturing method according to a second embodiment. To simplify the explanation, the manufacturing of the
如第2圖中步驟S104所示,該燈板製作方法於焊墊區142上形成一燒結的奈米金屬層16,作為焊墊,如第5圖所示。其中,燒結的奈米金屬層16覆蓋整個對應的焊墊區142。於實作上,步驟S102可透過先使用金屬奈米顆粒的漿料於焊墊區142上塗覆一奈米金屬層(例如透過印刷,其中該奈米金屬層的輪廓原則上與燒結的奈米金屬層16輪廓相同),燒結該奈米金屬層(例如燒結的溫度可設定在100攝氏度至300攝氏度之範圍內),進而於焊墊區142上形成燒結的奈米金屬層16而實現。此外,於實作上,該奈米金屬層包含複數個金屬奈米顆粒,例如但不限於複數個銀奈米顆粒、銅奈米顆粒、鎳奈米顆粒、金奈米顆粒或錫奈米顆粒。於實作上,例如,可選用金屬奈米顆粒的粒徑可落在10奈米至1000奈米之範圍內,又例如,可選用金屬奈米顆粒的平均粒徑在50奈米至800奈米之範圍內。As shown in step S104 of FIG. 2 , the lamp panel manufacturing method forms a sintered
如第2圖中步驟S106所示,該燈板製作方法於該燒結的奈米金屬層16上形成一錫膏層19 (例如包含助焊劑與錫或錫合金粉末),如第6圖所示。接著,如第2圖中步驟S108所示,該燈板製作方法將一發光件20放置於該二燒結的奈米金屬層16的錫膏層19上,如第7圖所示。之後,如第2圖中步驟S110所示,該燈板製作方法對該二錫膏層(或謂整個燈板1半成品)實施回焊(例如回焊溫度可設定在100攝氏度至270攝氏度之範圍內)。回焊後,即完成燈板1成品(可參閱第1圖)。As shown in step S106 of FIG. 2, the lamp board manufacturing method forms a solder paste layer 19 (e.g., including flux and tin or tin alloy powder) on the sintered
另外,請參閱第8圖,其為根據該燈板製作方法製作之燈板1部分的SEM圖。錫膏層19於回焊後形成焊接層18。透過適當選擇鍚膏及燒結的奈米金屬層16的成分,於回焊時,錫膏層19會與燒結的奈米金屬層16反應形成共化物(例如圖中的介面金屬共化物層182,例如錫銀銅共化物),其可增加焊接層18與燒結的奈米金屬層16之間的結合強度。In addition, please refer to FIG. 8, which is a SEM image of a portion of a
如上述說明,於燈板1中,燒結的奈米金屬層16與導線14的焊墊區142有不錯的結合度,燒結的奈米金屬層16可作為焊墊,使得焊接層18可透過燒結的奈米金屬層16與導線14電性連接。藉此,燈板1的導線14可採用簡便的方式形成,例如印刷銀漿線路並固化之,此相對於目前以蝕刻製程制作FPC上的線路而言,具有製程簡單,製程與材料成本較低等優勢。
以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。
As described above, in the
1:燈板 12:基板 14:導線 142:焊墊區 16:燒結的奈米金屬層 18:焊接層 182:介面金屬共化物 19:錫膏層 20:發光件 S100、S102、S104、S106、S108、S110:實施步驟 1: Light board 12: Substrate 14: Wire 142: Solder pad area 16: Sintered nanometal layer 18: Solder layer 182: Interface metal co-compound 19: Solder paste layer 20: Light-emitting element S100, S102, S104, S106, S108, S110: Implementation steps
第1圖為根據一第一實施例之一燈板之剖面圖。 第2圖為根據一第二實施例之一燈板製作方法之流程圖。 第3圖為根據該燈板製作方法提供之基板之示意圖。 第4圖為根據該燈板製作方法於該基板上形成導線後之示意圖。 第5圖為根據該燈板製作方法於該導線的焊墊區上形成燒結的奈米金屬層後之示意圖。 第6圖為根據該燈板製作方法於該燒結的奈米金屬層上形成一錫膏層後之示意圖。 第7圖為根據該燈板製作方法於該錫膏層上放置發光件後之示意圖。 第8圖為根據該燈板製作方法於回焊後之SEM圖。 FIG. 1 is a cross-sectional view of a lamp panel according to a first embodiment. FIG. 2 is a flow chart of a lamp panel manufacturing method according to a second embodiment. FIG. 3 is a schematic diagram of a substrate provided according to the lamp panel manufacturing method. FIG. 4 is a schematic diagram after forming a wire on the substrate according to the lamp panel manufacturing method. FIG. 5 is a schematic diagram after forming a sintered nanometal layer on the pad area of the wire according to the lamp panel manufacturing method. FIG. 6 is a schematic diagram after forming a solder paste layer on the sintered nanometal layer according to the lamp panel manufacturing method. FIG. 7 is a schematic diagram after placing a light-emitting element on the solder paste layer according to the lamp panel manufacturing method. FIG. 8 is a SEM image of the lamp panel after reflow according to the lamp panel manufacturing method.
1:燈板 1: Light board
12:基板 12: Substrate
14:導線 14: Wire
142:焊墊區 142: Solder pad area
16:燒結的奈米金屬層 16: Sintered nanometal layer
18:焊接層 18: Welding layer
20:發光件 20: Luminous parts
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TW201440080A (en) * | 2006-10-12 | 2014-10-16 | Cambrios Technologies Corp | Nanowire-based transparent conductors and applications thereof |
TW201415486A (en) * | 2012-09-05 | 2014-04-16 | Hitachi Chemical Co Ltd | Silver paste composition and semiconductor device using same |
TW202135232A (en) * | 2020-03-12 | 2021-09-16 | 日商鎧俠股份有限公司 | Wiring fabrication method, method for manufacturing semiconductor device, and semiconductor device |
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