TWI835728B - Optical films, polarizing plates, and image display devices - Google Patents

Optical films, polarizing plates, and image display devices Download PDF

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TWI835728B
TWI835728B TW107112247A TW107112247A TWI835728B TW I835728 B TWI835728 B TW I835728B TW 107112247 A TW107112247 A TW 107112247A TW 107112247 A TW107112247 A TW 107112247A TW I835728 B TWI835728 B TW I835728B
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film
substrate film
optical film
layer
acrylic resin
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TW201841727A (en
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茂手木佑輔
岸敦史
上野友德
平岡慎哉
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日商日東電工股份有限公司
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Abstract

本發明提供一種基材膜與表面處理層之密接性較高之光學膜。本發明之光學膜包含作為含有丙烯酸系樹脂之延伸膜之基材膜、及形成於基材膜之單側之表面處理層,且光學膜中之基材膜於在裁斷為10 cm×10 cm並經由黏著材貼合於玻璃板之狀態下在100℃下靜置120小時之時之尺寸變化率為-2.0%~0%。The present invention provides an optical film with high adhesion between a base film and a surface treatment layer. The optical film of the present invention includes a base film that is a stretched film containing an acrylic resin, and a surface treatment layer formed on one side of the base film, and the base film in the optical film is cut to 10 cm×10 cm. The dimensional change rate is -2.0%~0% when it is left standing at 100°C for 120 hours while being attached to the glass plate via an adhesive material.

Description

光學膜、偏光板、及圖像顯示裝置Optical film, polarizing plate, and image display device

本發明係關於一種光學膜、偏光板、及圖像顯示裝置。The present invention relates to an optical film, a polarizing plate, and an image display device.

近年來,已知有於包含丙烯酸系樹脂之基材膜之單側形成有硬塗層、防眩層、抗反射層等功能性層(表面處理層)之光學膜(專利文獻1)。表面處理層可藉由在基材膜之單側塗佈樹脂組合物並乾燥或硬化而形成。此種光學膜例如可用作偏光元件之保護膜、或圖像顯示裝置之前面板。 先前技術文獻 專利文獻 專利文獻1:日本專利特開2016-218478號公報In recent years, an optical film having a functional layer (surface treatment layer) such as a hard coating layer, an anti-glare layer, and an anti-reflection layer formed on one side of a substrate film comprising an acrylic resin has been known (Patent Document 1). The surface treatment layer can be formed by coating a resin composition on one side of a substrate film and drying or curing it. Such an optical film can be used, for example, as a protective film for a polarizing element or a front panel of an image display device. Prior Art Document Patent Document Patent Document 1: Japanese Patent Publication No. 2016-218478

[發明所欲解決之問題] 然而,如上所述之先前之光學膜於乾燥樹脂組合物之步驟中,存在基材膜因熱收縮產生褶皺而導致外觀不良之情形。於為了防止如上所述之熱收縮引起之異常而於低溫下使樹脂組合物乾燥之情形時,存在基材膜與表面處理層之密接性變得不充分之問題。 本發明係為了解決上述先前之課題而完成者,其主要目的在於提供一種基材膜與表面處理層之密接性較高之光學膜、具備此種光學膜之偏光板、及具備此種偏光板之圖像顯示裝置。 [解決問題之技術手段] 本發明之光學膜係包含作為含有丙烯酸系樹脂之延伸膜之基材膜、及形成於該基材膜之單側之表面處理層者,且上述光學膜中之基材膜於在裁斷為10 cm×10 cm並經由黏著材貼合於玻璃板之狀態下在100℃下靜置120小時之時之尺寸變化率為-2.0%~0%。 於一實施形態中,上述基材膜含有上述丙烯酸系樹脂與分散至上述丙烯酸系樹脂中之芯殼型粒子。 於一實施形態中,上述基材膜相對於上述丙烯酸系樹脂100重量份而含有上述芯殼型粒子5重量份~50重量份。 於一實施形態中,上述丙烯酸系樹脂具有選自由戊二醯亞胺單元、內酯環單元、順丁烯二酸酐單元、順丁烯二醯亞胺單元及戊二酸酐單元所組成之群中之至少一種。 於一實施形態中,上述表面處理層係塗佈於上述基材膜上之樹脂組合物之硬化層。 於一實施形態中,上述表面處理層係選自由硬塗層、防眩層及抗反射層所組成之群中之至少一種。 根據本發明之另一態樣,提供一種偏光板。該偏光板包含偏光元件及配置於上述偏光元件之單側之保護層,上述保護層為上述光學膜。 根據本發明之另一態樣,提供一種圖像顯示裝置。該圖像顯示裝置具備上述偏光板。 [發明之效果] 根據本發明,藉由使用上述尺寸變化率為-2.0%~0%之基材膜,可提供基材膜與表面處理層之密接性較高之光學膜、具備此種光學膜之偏光板、及具備此種偏光板之圖像顯示裝置。[Problem to be solved by the invention] However, in the step of drying the resin composition, the substrate film may be wrinkled due to heat shrinkage, resulting in a poor appearance. When the resin composition is dried at a low temperature to prevent the abnormality caused by heat shrinkage, there is a problem that the adhesion between the substrate film and the surface treatment layer becomes insufficient. The present invention is completed to solve the above-mentioned previous problems, and its main purpose is to provide an optical film with high adhesion between the substrate film and the surface treatment layer, a polarizing plate having such an optical film, and an image display device having such a polarizing plate. [Technical means for solving the problem] The optical film of the present invention comprises a substrate film as a stretched film containing an acrylic resin, and a surface treatment layer formed on one side of the substrate film, and the substrate film in the optical film has a dimensional change rate of -2.0% to 0% when it is cut into 10 cm×10 cm and bonded to a glass plate via an adhesive and left at 100°C for 120 hours. In one embodiment, the substrate film contains the acrylic resin and core-shell particles dispersed in the acrylic resin. In one embodiment, the substrate film contains 5 to 50 parts by weight of the core-shell particles relative to 100 parts by weight of the acrylic resin. In one embodiment, the acrylic resin has at least one selected from the group consisting of glutaric anhydride units, lactone ring units, maleic anhydride units, maleic anhydride units and glutaric anhydride units. In one embodiment, the surface treatment layer is a hardening layer of the resin composition coated on the substrate film. In one embodiment, the surface treatment layer is at least one selected from the group consisting of a hard coating layer, an anti-glare layer and an anti-reflection layer. According to another aspect of the present invention, a polarizing plate is provided. The polarizing plate includes a polarizing element and a protective layer disposed on one side of the polarizing element, and the protective layer is the optical film. According to another aspect of the present invention, an image display device is provided. The image display device has the above-mentioned polarizing plate. [Effect of the invention] According to the present invention, by using the above-mentioned substrate film with a dimensional change rate of -2.0% to 0%, an optical film with high adhesion between the substrate film and the surface treatment layer, a polarizing plate having such an optical film, and an image display device having such a polarizing plate can be provided.

以下,對本發明之實施形態進行說明,但本發明並不限定於該等實施形態。 A.光學膜之整體構成 1係本發明之一實施形態之光學膜之概略剖視圖。光學膜100包含基材膜10及形成於基材膜10之單側之表面處理層20。基材膜10係含有丙烯酸系樹脂之延伸膜。基材膜10於在裁斷為10 cm×10 cm並經由黏著材貼合於玻璃板之狀態下在100℃下靜置120小時時沿特定方向之尺寸變化率為 -2.0%~0%。基材膜10之形狀並無特別限定,例如於基材膜為長條狀或長方形狀之情形時,代表性而言,上述尺寸變化率可沿基材膜之長邊方向及短邊方向(與長邊方向正交之方向)將其裁斷為10 cm×10 cm而進行測定。上述特定方向代表性而言為沿裁斷為10 cm×10 cm之基材膜之各邊的方向。於一實施形態中,基材膜10含有丙烯酸系樹脂及分散至丙烯酸系樹脂中之芯殼型粒子。於該情形時,基材膜10較佳為相對於丙烯酸系樹脂100重量份而含有芯殼型粒子5重量份~50重量份。丙烯酸系樹脂較佳為具有選自由戊二醯亞胺單元、內酯環單元、順丁烯二酸酐單元、順丁烯二醯亞胺單元及戊二酸酐單元所組成之群中之至少一種。表面處理層20代表性而言為塗佈於基材膜10上之樹脂組合物之硬化層。表面處理層20較佳為選自由硬塗層、防眩層及抗反射層所組成之群中之至少一種。藉由上述光學膜,可抑制形成有表面處理層之狀態下之收縮(尤其是沿延伸方向之收縮)。其結果為,可提高基材膜10與表面處理層20之密接性。尤其於藉由將樹脂組合物塗佈於基材膜10上並將樹脂組合物加以乾燥使之硬化而形成表面處理層20之情形時,即使於使上述樹脂組合物低溫乾燥之情形時,亦可實現基材膜10與表面處理層20之充分之密接性。因此,可抑制因乾燥樹脂組合物時之熱而於基材膜產生褶皺之情況。 B.基材膜 B-1.基材膜之特性 基材膜如上所述係含有丙烯酸系樹脂之延伸膜,於在沿基材膜之長邊方向及其正交方向裁斷為10 cm×10 cm並經由黏著材貼合於玻璃板之狀態下在100℃下靜置120小時之時之尺寸變化率為-2.0%~2.0%。上述尺寸變化率較佳為-1.8%~1.0%,更佳為-1.0%~0.0%,尤佳為-0.5%~0.0%。於一實施形態中,基材膜含有丙烯酸系樹脂及分散至丙烯酸系樹脂中之芯殼型粒子。基材膜之厚度較佳為5 μm~150 μm,更佳為10 μm~100 μm。 基材膜較佳為實質上具有光學各向同性。於本說明書中,所謂「實質上具有光學各向同性」係指面內相位差Re(550)為0 nm~10 nm且厚度方向之相位差Rth(550)為-10 nm~+10 nm。面內相位差Re(550)更佳為0 nm~5 nm,進而較佳為0 nm~3 nm,尤佳為0 nm~2 nm。厚度方向之相位差Rth(550)更佳為-5 nm~+5 nm,進而較佳為-3 nm~+3 nm,尤佳為-2 nm~+2 nm。若基材膜之Re(550)及Rth(550)為此種範圍,則於將光學膜應用於圖像顯示裝置之情形時可防止對顯示特性之不良影響。再者,Re(550)係於23℃下利用波長550 nm之光所測得之膜之面內相位差。Re(550)可藉由式:Re(550)=(nx-ny)×d求出。Rth(550)係於23℃下利用波長550 nm之光所測得之膜之厚度方向之相位差。Rth(550)可藉由式:Rth(550)=(nx-nz)×d求出。此處,nx係面內之折射率成為最大之方向(即,遲相軸方向)之折射率,ny係面內與遲相軸正交之方向(即,進相軸方向)之折射率,nz係厚度方向之折射率,d係膜之厚度(nm)。 基材膜之厚度為30 μm時之380 nm下之光線透過率越高越好。具體而言,光線透過率較佳為85%以上,更佳為88%以上,進而較佳為90%以上。若光線透過率為此種範圍,則可確保所需之透明性。光線透過率例如可藉由依照ASTM-D-1003之方法而測定。 基材膜之霧度越低越好。具體而言,霧度較佳為5%以下,更佳為3%以下,進而較佳為1.5%以下,尤佳為1%以下。若霧度為5%以下,則可對膜賦予良好之透明感。進而,即使於將光學膜用作圖像顯示裝置之視認側偏光板之保護層之情形時,亦可良好地視認顯示內容。 基材膜之厚度為30 μm時之YI(Yellowness Index,黃度指數)較佳為1.27以下,更佳為1.25以下,進而較佳為1.23以下,尤佳為1.20以下。若YI超過1.3,則存在光學透明性變得不充分之情形。再者,YI例如可根據由使用高速積分球式分光透過率測定機(商品名DOT-3C:村上色彩技術研究所製造)之測定所獲得之顏色之三刺激值(X、Y、Z),藉由下式而求出。 YI=[(1.28X-1.06Z)/Y]×100 基材膜之厚度為30 μm時之b值(依照漢特(Hunter)表色系統之色相之尺度)較佳為未達1.5,更佳為1.0以下。於b值為1.5以上之情形時,存在出現並非所需之色調之情形。再者,b值例如可藉由將基材膜樣品裁斷為3 cm見方,使用高速積分球式分光透過率測定機(商品名DOT-3C:村上色彩技術研究所製造)測定色相,並依照漢特表色系統評價該色相而獲得。 基材膜之透濕度較佳為300 g/m2 ・24 hr以下,更佳為250 g/m2 ・24 hr以下,進而較佳為200 g/m2 ・24 hr以下,尤佳為150 g/m2 ・24 hr以下,最佳為100 g/m2 ・24 hr以下。若基材膜之透濕度為此種範圍,則於用作偏光元件之保護層之情形時,可獲得耐久性及耐濕性優異之偏光板。 基材膜之拉伸強度較佳為10 MPa以上且未達100 MPa,更佳為30 MPa以上且未達100 MPa。於未達10 MPa之情形時,存在無法表現出充分之機械強度之情形。若超過100 MPa,則有加工性變得不充分之虞。拉伸強度例如可依照ASTM-D-882-61T而測定。 基材膜之拉伸伸長率較佳為1.0%以上,更佳為3.0%以上,進而較佳為5.0%以上。拉伸伸長率之上限例如為100%。於拉伸伸長率未達1%之情形時,存在韌性變得不充分之情形。拉伸伸長率例如可依照ASTM-D-882-61T而測定。 基材膜之拉伸彈性模數較佳為0.5 GPa以上,更佳為1 GPa以上,進而較佳為2 GPa以上。拉伸彈性模數之上限例如為20 GPa。於拉伸彈性模數未達0.5 GPa之情形時,存在無法表現出充分之機械強度之情形。拉伸彈性模數例如可依照ASTM-D-882-61T而測定。 基材膜可視目的含有任意合適之添加劑。作為添加劑之具體例,可列舉:紫外線吸收劑;受阻酚系、磷系、硫系等之抗氧化劑;耐光穩定劑、耐候穩定劑、熱穩定劑等穩定劑;玻璃纖維、碳纖維等補強材;近紅外線吸收劑;磷酸三(二溴丙基)酯、磷酸三烯丙酯、氧化銻等阻燃劑;陰離子系、陽離子系、非離子系之界面活性劑等防靜電劑;無機顏料、有機顏料、染料等著色劑;有機填料或無機填料;樹脂改質劑;有機填充劑或無機填充劑;塑化劑;潤滑劑等。添加劑可於丙烯酸系樹脂之聚合時添加,亦可於膜形成時添加。添加劑之種類、數量、組合、添加量等可視目的適當地設定。 B-2.丙烯酸系樹脂 B-2-1.丙烯酸系樹脂之構成 作為丙烯酸系樹脂,可採用任意合適之丙烯酸系樹脂。丙烯酸系樹脂中,代表性而言,作為單體單元,含有(甲基)丙烯酸烷基酯作為主成分。於本說明書中,所謂「(甲基)丙烯酸」意指丙烯酸及/或甲基丙烯酸。作為構成丙烯酸系樹脂之主骨架之(甲基)丙烯酸烷基酯,可例示直鏈狀或支鏈狀之烷基之碳數為1~18者。該等可單獨使用或加以組合而使用。進而,可藉由共聚合對丙烯酸系樹脂導入任意合適之共聚合單體。此種共聚合單體之種類、數量、共聚合比等可視目的適當地設定。關於丙烯酸系樹脂之主骨架之構成成分(單體單元),以下參照通式(2)進行說明。 丙烯酸系樹脂較佳為具有選自戊二醯亞胺單元、內酯環單元、順丁烯二酸酐單元、順丁烯二醯亞胺單元及戊二酸酐單元中之至少一種。具有內酯環單元之丙烯酸系樹脂例如記載於日本專利特開2008-181078號公報中,該公報之記載係作為參考而引用至本說明書中。戊二醯亞胺單元較佳為以下述通式(1)表示: [化1]於通式(1)中,R1 及R2 分別獨立地表示氫原子或碳數1~8之烷基,R3 表示氫原子、碳數1~18之烷基、碳數3~12之環烷基、或碳數6~10之芳基。於通式(1)中,較佳為R1 及R2 分別獨立為氫原子或甲基,且R3 為氫原子、甲基、丁基或環己基。更佳為R1 為甲基,R2 為氫原子,且R3 為甲基。 上述(甲基)丙烯酸烷基酯代表性而言,以下述通式(2)表示: [化2]於通式(2)中,R4 表示氫原子或甲基,R5 表示氫原子、或者可經取代之碳數1~6之脂肪族或脂環式烴基。作為取代基,例如可列舉鹵素、羥基。作為(甲基)丙烯酸烷基酯之具體例,可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸氯甲酯、(甲基)丙烯酸2-氯乙酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸2,3,4,5,6-五羥基己酯及(甲基)丙烯酸2,3,4,5-四羥基戊酯。於通式(2)中,R5 較佳為氫原子或甲基。因此,尤佳之(甲基)丙烯酸烷基酯為丙烯酸甲酯或甲基丙烯酸甲酯。 上述丙烯酸系樹脂可僅含有單一之戊二醯亞胺單元,亦可含有上述通式(1)中之R1 、R2 及R3 不同之複數種戊二醯亞胺單元。 上述丙烯酸系樹脂中之戊二醯亞胺單元之含有比率較佳為2莫耳%~50莫耳%,更佳為2莫耳%~45莫耳%,進而較佳為2莫耳%~40莫耳%,尤佳為2莫耳%~35莫耳%,最佳為3莫耳%~30莫耳%。若含有比率少於2莫耳%,則有不會充分地發揮源自戊二醯亞胺單元而表現之效果(例如,較高之光學特性、較高之機械強度、與偏光元件之優異之接著性、薄型化)之虞。若含有比率超過50莫耳%,則有例如耐熱性、透明性變得不充分之虞。 上述丙烯酸系樹脂可僅含有單一之(甲基)丙烯酸烷基酯單元,亦可含有上述通式(2)中之R4 及R5 不同之複數種(甲基)丙烯酸烷基酯單元。 上述丙烯酸系樹脂中之(甲基)丙烯酸烷基酯單元之含有比率較佳為50莫耳%~98莫耳%,更佳為55莫耳%~98莫耳%,進而較佳為60莫耳%~98莫耳%,尤佳為65莫耳%~98莫耳%,最佳為70莫耳%~97莫耳%。若含有比率少於50莫耳%,則有不會充分地發揮源自(甲基)丙烯酸烷基酯單元而表現之效果(例如,較高之耐熱性、較高之透明性)之虞。若上述含有比率多於98莫耳%,則有樹脂變脆而容易開裂,無法充分地發揮出較高之機械強度,生產性差之虞。 上述丙烯酸系樹脂亦可含有戊二醯亞胺單元及(甲基)丙烯酸烷基酯單元以外之單元。 於一實施形態中,丙烯酸系樹脂可含有未參與下文所述之分子內醯亞胺化反應之不飽和羧酸單元例如0~10重量%。不飽和羧酸單元之含有比率較佳為0~5重量%,更佳為0~1重量%。若含量為此種範圍,則可維持透明性、滯留穩定性及耐濕性。 於一實施形態中,丙烯酸系樹脂可含有上述以外之可進行共聚合之乙烯系單體單元(其他乙烯系單體單元)。作為該其他乙烯系單體,例如可列舉:丙烯腈、甲基丙烯腈、乙基丙烯腈、烯丙基縮水甘油醚、順丁烯二酸酐、伊康酸酐、N-甲基順丁烯二醯亞胺、N-乙基順丁烯二醯亞胺、N-環己基順丁烯二醯亞胺、丙烯酸胺基乙酯、丙烯酸丙基胺基乙酯、甲基丙烯酸二甲胺基乙酯、甲基丙烯酸乙基胺基丙酯、甲基丙烯酸環己基胺基乙酯、N-乙烯基二乙基胺、N-乙醯基乙烯基胺、烯丙基胺、甲基烯丙基胺、N-甲基烯丙基胺、2-異丙烯基㗁唑啉、2-乙烯基㗁唑啉、2-丙烯醯基㗁唑啉、N-苯基順丁烯二醯亞胺、甲基丙烯酸苯基胺基乙酯、苯乙烯、α-甲基苯乙烯、對縮水甘油基苯乙烯、對胺基苯乙烯、2-苯乙烯基㗁唑啉等。該等可單獨使用,亦可併用。較佳為苯乙烯、α-甲基苯乙烯等苯乙烯系單體。其他乙烯系單體單元之含有比率較佳為0~1重量%,更佳為0~0.1重量%。若為此種範圍,則可抑制並非所需之相位差之表現及透明性之降低。 上述丙烯酸系樹脂中之醯亞胺化率較佳為2.5%~20.0%。若醯亞胺化率為此種範圍,則可獲得耐熱性、透明性及成形加工性優異之樹脂,可防止膜成形時之燒焦之產生或機械強度之降低。於上述丙烯酸系樹脂中,醯亞胺化率係以戊二醯亞胺單元與(甲基)丙烯酸烷基酯單元之比表示。該比例如可根據丙烯酸系樹脂之NMR(nuclear magnetic resonance,核磁共振)圖譜、IR(infrared,紅外線)圖譜等而獲得。於本實施形態中,醯亞胺化率可使用1 HNMR BRUKER AvanceIII(400 MHz),藉由樹脂之1 H-NMR測定而求出。更具體而言,將3.5至3.8 ppm附近之源自(甲基)丙烯酸烷基酯之O-CH3 質子之波峰面積設為A,將3.0至3.3 ppm附近之源自戊二醯亞胺之N-CH3 質子之波峰面積設為B,藉由下式而求出。 醯亞胺化率Im(%)={B/(A+B)}×100 上述丙烯酸系樹脂之酸值較佳為0.10 mmol/g~0.50 mmol/g。若酸值為此種範圍,則可獲得耐熱性、機械物性及成形加工性之平衡性優異之樹脂。若酸值過小,則存在產生因使用用以調整為所需酸值之改性劑引起之成本提高、因改性劑之殘存引起之凝膠狀物之產生等問題之情形。若酸值過大,則有變得容易引起膜成形時(例如,熔融擠出時)之發泡而導致成形品之生產性降低之傾向。關於上述丙烯酸系樹脂,酸值係該丙烯酸系樹脂中之羧酸單元及羧酸酐單元之含量。於本實施形態中,酸值例如可藉由WO2005/054311或日本專利特開2005-23272號公報所記載之滴定法而算出。 上述丙烯酸系樹脂之重量平均分子量較佳為1000~2000000,更佳為5000~1000000,進而較佳為10000~500000,尤佳為50000~500000,最佳為60000~150000。重量平均分子量例如可使用凝膠滲透層析儀(GPC系統,Tosoh製造),藉由聚苯乙烯換算而求出。再者,可使用四氫呋喃作為溶劑。 上述丙烯酸系樹脂之Tg(玻璃轉移溫度)較佳為110℃以上,更佳為115℃以上,進而較佳為120℃以上,尤佳為125℃以上,最佳為130℃以上。若Tg為110℃以上,則含有由此種樹脂獲得之基材膜之偏光板容易成為耐久性優異者。Tg之上限值較佳為300℃以下,更佳為290℃以下,進而較佳為285℃以下,尤佳為200℃以下,最佳為160℃以下。若Tg為此種範圍,則成形性會優異。 B-2-2.丙烯酸系樹脂之聚合 上述丙烯酸系樹脂例如可藉由以下之方法製造。該方法包括:(I)將與通式(2)所表示之(甲基)丙烯酸烷基酯單元相對應之(甲基)丙烯酸烷基酯單體與不飽和羧酸單體及/或其前驅物單體進行共聚合而獲得共聚物(a);及(II)利用醯亞胺化劑處理該共聚物(a),藉此進行該共聚物(a)中之(甲基)丙烯酸烷基酯單體單元與不飽和羧酸單體及/或其前驅物單體單元之分子內醯亞胺化反應,而將通式(1)所表示之戊二醯亞胺單元導入至共聚物中。 作為不飽和羧酸單體,例如可列舉:丙烯酸、甲基丙烯酸、丁烯酸、α-取代丙烯酸、α-取代甲基丙烯酸。作為其前驅物單體,例如可列舉:丙烯醯胺、甲基丙烯醯胺等。該等可單獨使用,亦可併用。較佳之不飽和羧酸單體為丙烯酸或甲基丙烯酸,較佳之前驅物單體為丙烯醯胺。 作為利用醯亞胺化劑對共聚物(a)進行處理之方法,可使用任意合適之方法。作為具體例,可列舉使用擠出機之方法、使用批次式反應槽(壓力容器)之方法。使用擠出機之方法包括使用擠出機將共聚物(a)加熱熔融,並利用醯亞胺化劑對其進行處理。於該情形時,作為擠出機,可使用任意合適之擠出機。作為具體例,可列舉:單軸擠出機、雙軸擠出機、多軸擠出機。使用批次式反應槽(壓力容器)之方法中可使用任意合適之批次式反應槽(壓力容器)。 作為醯亞胺化劑,只要可生成上述通式(1)所表示之戊二醯亞胺單元,則可使用任意合適之化合物。作為醯亞胺化劑之具體例,可列舉:甲胺、乙胺、正丙胺、異丙胺、正丁胺、異丁胺、第三丁胺、正己胺等含有脂肪族烴基之胺;苯胺、苄胺、甲苯胺、三氯苯胺等含有芳香族烴基之胺;環己胺等含有脂環式烴基之胺。進而,例如亦可使用藉由加熱而產生此種胺之脲系化合物。作為脲化合物,例如可列舉:脲、1,3-二甲基脲、1,3-二乙基脲、1,3-二丙基脲。醯亞胺化劑較佳為甲胺、氨、環己胺,更佳為甲胺。 於醯亞胺化中,除了上述醯亞胺化劑以外,亦可視需要添加閉環促進劑。 醯亞胺化中之醯亞胺化劑之使用量相對於共聚物(a)100重量份,較佳為0.5重量份~10重量份,更佳為0.5重量份~6重量份。若醯亞胺化劑之使用量少於0.5重量份,則未達成所需之醯亞胺化率之情形較多。其結果為,存在所獲得之樹脂之耐熱性變得極不充分,而誘發成形後之燒焦等外觀缺陷之情形。若醯亞胺化劑之使用量超過10重量份,則存在樹脂中殘存醯亞胺化劑,而由該醯亞胺化劑誘發成形後之燒焦等外觀缺陷或發泡之情形。 本實施形態之製造方法除了上述醯亞胺化以外視需要亦可包括利用酯化劑所進行之處理。 作為酯化劑,例如可列舉:碳酸二甲酯、2,2-二甲氧基丙烷、二甲基亞碸、原甲酸三乙酯、原乙酸三甲酯、原甲酸三甲酯、碳酸二苯酯、硫酸二甲酯、甲苯磺酸甲酯、三氟甲磺酸甲酯、乙酸甲酯、甲醇、乙醇、異氰酸甲酯、異氰酸對氯苯酯、二甲基碳二醯亞胺、二甲基第三丁基甲矽烷基氯、乙酸異丙烯酯、二甲基脲、氫氧化四甲基銨、二甲基二乙氧基甲矽烷、四正丁氧基甲矽烷、亞磷酸二甲酯(三甲基甲矽烷基)酯、亞磷酸三甲酯、磷酸三甲酯、磷酸三甲苯酯、重氮甲烷、環氧乙烷、環氧丙烷、環氧環己烷、2-乙基己基縮水甘油醚、苯基縮水甘油醚、苄基縮水甘油醚。該等中,就成本及反應性等觀點而言,較佳為碳酸二甲酯。 酯化劑之添加量可以丙烯酸系樹脂之酸值成為所需之值之方式設定。 B-2-3.其他樹脂之併用 於本發明之實施形態中,可將上述丙烯酸系樹脂與其他樹脂併用。即,可將構成丙烯酸系樹脂之單體成分與構成其他樹脂之單體成分進行共聚合,並將該共聚物供於下文B-4項所說明之膜形成;亦可將丙烯酸系樹脂與其他樹脂之摻合物供於膜形成。作為其他樹脂,例如可列舉:苯乙烯系樹脂、聚乙烯、聚丙烯、聚醯胺、聚苯硫醚、聚醚醚酮、聚酯、聚碸、聚苯醚、聚縮醛、聚醯亞胺、聚醚醯亞胺等其他熱塑性樹脂;酚系樹脂、三聚氰胺系樹脂、聚酯系樹脂、聚矽氧系樹脂、環氧系樹脂等熱硬化性樹脂。所併用之樹脂之種類及調配量可視目的及對所獲得之膜所期待之特性等而適當地設定。例如,苯乙烯系樹脂(較佳為丙烯腈-苯乙烯共聚物)可作為相位差控制劑而併用。 於將丙烯酸系樹脂與其他樹脂併用之情形時,丙烯酸系樹脂與其他樹脂之摻合物中之丙烯酸系樹脂之含量較佳為50重量%~100重量%,更佳為60重量%~100重量%,進而較佳為70重量%~100重量%,尤佳為80重量%~100重量%。於含量未達50重量%之情形時,有無法充分地反映出丙烯酸系樹脂本來具有之較高之耐熱性、較高之透明性之虞。 B-3.芯殼型粒子 於上述基材膜中,芯殼型粒子係相對於丙烯酸系樹脂100重量份,而調配較佳為5重量份~50重量份,更佳為5重量份~40重量份。藉此,可降低基材膜之尺寸變化率。其結果為,可抑制於形成有表面處理層之狀態下之收縮,可獲得基材膜與表面處理層之密接性較高之光學膜。 芯殼型粒子代表性而言具有包含橡膠狀聚合物之芯、及包含玻璃狀聚合物且被覆該芯之被覆層。芯殼型粒子具有一層以上包含玻璃狀聚合物之層作為最內層或中間層。 構成芯之橡膠狀聚合物之Tg較佳為20℃以下,更佳為-60℃~20℃,進而較佳為-60℃~10℃。若構成芯之橡膠狀聚合物之Tg超過20℃,則有丙烯酸系樹脂之機械強度之提高不充分之虞。構成被覆層之玻璃狀聚合物(硬質聚合物)之Tg較佳為50℃以上,更佳為50℃~140℃,進而較佳為60℃~130℃。若構成被覆層之玻璃狀聚合物之Tg低於50℃,則有丙烯酸系樹脂之耐熱性降低之虞。 芯殼型粒子中之芯之含有比率較佳為30重量%~95重量%,更佳為50重量%~90重量%。芯中之玻璃狀聚合物層之比率相對於芯之總量100重量%,為0~60重量%,較佳為0~45重量%,更佳為10重量%~40重量%。芯殼型粒子中之被覆層之含有比率較佳為5重量%~70重量%,更佳為10重量%~50重量%。 於一實施形態中,分散至丙烯酸系樹脂中之芯殼型粒子可具有扁平形狀。芯殼型粒子可藉由下文B-4項所說明之延伸而扁平化。經扁平化之芯殼型粒子之長度/厚度之比為7.0以下。長度/厚度之比較佳為6.5以下,更佳為6.3以下。另一方面,長度/厚度之比較佳為4.0以上,更佳為4.5以上,進而較佳為5.0以上。於本說明書中,所謂「長度/厚度之比」意指芯殼型粒子之俯視形狀之代表長度與厚度之比。此處,所謂「代表長度」,於俯視形狀為圓形之情形時指直徑,於橢圓形之情形時指長徑,於矩形或多邊形之情形時指對角線之長度。該比例如可按照以下之順序求出。利用穿透式電子顯微鏡(例如,加速電壓80 kV、RuO4 染色超薄切片法)對所獲得之膜剖面進行拍攝,自存在於所獲得之照片中之芯殼型粒子中較長者(獲得接近代表長度之剖面者)中依序選取30個,算出(長度之平均值)/(厚度之平均值),藉此可獲得該比。 構成芯殼型粒子之芯之橡膠狀聚合物、構成被覆層之玻璃狀聚合物(硬質聚合物)、該等之聚合方法、及其他構成之詳細內容例如記載於日本專利特開2016-33552號公報。該公報之記載係作為參考而引用至本說明書中。 B-4.基材膜之形成 本發明之實施形態之基材膜代表性而言可藉由包括將含有上述丙烯酸系樹脂(於併用其他樹脂之情形時為與該其他樹脂之摻合物)及芯殼型粒子之組合物形成膜之方法而形成。進而,形成基材膜之方法可包括將上述膜加以延伸。 用於膜形成之膜形成所使用之芯殼型粒子之平均粒徑較佳為1 nm~500 nm。芯之平均粒徑較佳為50 nm~300 nm,更佳為70 nm~300 nm。 作為形成膜之方法,可採用任意合適之方法。作為具體例,可列舉:流鑄塗敷法(例如,流延法)、擠出成形法、射出成形法、壓縮成形法、轉移成形法、吹塑成形法、粉末成形法、FRP(Fiber Reinforced Plastic,纖維強化塑膠)成形法、壓延成形法、熱壓法。較佳為擠出成形法或流鑄塗敷法。其原因在於:可提高所獲得之膜之平滑性,可獲得良好之光學均一性。尤佳為擠出成形法。其原因在於無需考慮因殘存溶劑引起之問題。其中,使用T模之擠出成形法就膜之生產性及以後之延伸處理之容易性之觀點而言較佳。成形條件可根據所使用之樹脂之組成或種類、對所獲得之膜所期待之特性等而適當設定。 作為延伸方法,可採用任意合適之延伸方法、延伸條件(例如,延伸溫度、延伸倍率、延伸速度、延伸方向)。作為延伸方法之具體例,可列舉自由端延伸、固定端延伸、自由端收縮、固定端收縮。該等可單獨使用,亦可同時使用,亦可依次使用。藉由在合適之延伸條件下對已適當調整芯殼型粒子相對於丙烯酸系樹脂之調配量之膜進行延伸,可降低所獲得之基材膜之尺寸變化率。其結果為,可抑制於形成有表面處理層之狀態下之收縮,可獲得基材膜與表面處理層之密接性較高之光學膜。 延伸方向可視目的而採用合適之方向。具體而言,可列舉:長度方向、寬度方向、厚度方向、斜方向。延伸方向可為一方向(單軸延伸),亦可為兩方向(雙軸延伸),亦可為三方向以上。於本發明之實施形態中,代表性而言,可採用長度方向之單軸延伸、長度方向及寬度方向之同時雙軸延伸、長度方向及寬度方向之依次雙軸延伸。較佳為雙軸延伸(同時或依次)。其原因在於:容易控制面內相位差,而容易實現光學各向同性。 延伸溫度可根據對基材膜所期待之光學特性、機械特性及厚度、所使用之樹脂之種類、所使用之膜之厚度、延伸方法(單軸延伸或雙軸延伸)、延伸倍率、延伸速度等而變化。具體而言,延伸溫度較佳為Tg~Tg+50℃,進而較佳為Tg+15℃~Tg+50℃,最佳為Tg+35℃~Tg+50℃。藉由在此種溫度下進行延伸,可獲得具有合適之特性之基材膜。具體之延伸溫度例如為110℃~200℃,較佳為120℃~190℃,進而較佳為150℃~190℃。若延伸溫度為此種範圍,則藉由適當地調整延伸倍率及延伸速度,於合適之延伸條件下延伸已適當地調整殼型粒子之調配量之膜,藉此可降低所獲得之基材膜之尺寸變化率。其結果為,可抑制於形成有表面處理層之狀態下之收縮,可獲得基材膜與表面處理層之密接性較高之光學膜。 又,延伸倍率亦與延伸溫度同樣地可根據光學特性、機械特性及厚度、所使用之樹脂之種類、所使用之膜之厚度、延伸方法(單軸延伸或雙軸延伸)、延伸溫度、延伸速度等而變化。於採用雙軸延伸之情形時,寬度方向(TD)之延伸倍率與長度方向(MD)之延伸倍率之比(TD/MD)較佳為1.0~1.5,更佳為1.0~1.4,進而較佳為1.0~1.3。又,採用雙軸延伸之情形時之面倍率(長度方向之延伸倍率與寬度方向之延伸倍率之積)較佳為2.0~6.0,更佳為3.0~5.5,進而較佳為3.5~5.2。若延伸倍率為此種範圍,則藉由適當調整延伸溫度及延伸速度,可降低所獲得之基材膜之尺寸變化率。其結果為,可抑制於形成有表面處理層之狀態下之收縮,可獲得基材膜與表面處理層之密接性較高之光學膜。 又,延伸速度亦與延伸溫度同樣地可根據光學特性、機械特性及厚度、所使用之樹脂之種類、所使用之膜之厚度、延伸方法(單軸延伸或雙軸延伸)、延伸溫度、延伸倍率等而變化。延伸速度較佳為3%/秒~20%/秒,更佳為3%/秒~15%/秒,進而較佳為3%/秒~10%/秒。於採用雙軸延伸之情形時,一方向之延伸速度與另一方向之延伸速度可相同亦可不同。若延伸速度為此種範圍,則藉由適當調整延伸溫度及延伸倍率,可降低所獲得之基材膜之尺寸變化率。其結果為,可抑制於形成有表面處理層之狀態下之收縮,可獲得基材膜與表面處理層之密接性較高之光學膜。 以上述方式可形成基材膜。 C.表面處理層 表面處理層係根據對光學膜所要求之功能而形成於基材膜之單側的任意合適之功能層。作為表面處理層之具體例,可列舉硬塗層、防眩層、及抗反射層等。表面處理層之厚度較佳為3 μm~20 μm,更佳為5 μm~15 μm。 表面處理層代表性而言為形成於基材膜上之樹脂組合物之硬化層。形成表面處理層之步驟可包括:於基材膜上塗佈表面處理層形成用之樹脂組合物而形成塗佈層;及將上述塗佈層加以乾燥使之硬化而製成表面處理層。將上述塗佈層加以乾燥使之硬化可包括加熱上述塗佈層。 作為樹脂組合物之塗佈方法,可採用任意合適之方法。例如可列舉:棒式塗佈法、輥式塗佈法、凹版塗佈法、桿式塗佈法、孔縫式塗佈法、淋幕式塗佈法、噴注式塗佈法、缺角輪塗佈法。就使塗佈變得容易之觀點而言,樹脂組合物較佳為含有稀釋用之溶劑。 塗佈層之加熱溫度可設定為對應於樹脂組合物之組成的任意合適之溫度,較佳為設定為基材膜所含之丙烯酸系樹脂之玻璃轉移溫度以下。若於基材膜所含之丙烯酸系樹脂之玻璃轉移溫度以下之溫度下進行加熱,則可獲得抑制了因加熱引起之變形的光學膜。塗佈層之加熱溫度例如為50℃~140℃,較佳為60℃~100℃。藉由在此種加熱溫度下進行加熱,可獲得基材膜與表面處理層之密接性優異之光學膜。 C-1.硬塗層 硬塗層係對基材膜之表面賦予耐擦傷性及耐化學品性等之層。硬塗層於鉛筆硬度試驗中具有較佳為H以上、更佳為3H以上之硬度。鉛筆硬度試驗可依照JIS K 5400而測定。硬塗層形成用之樹脂組合物例如可含有能夠藉由熱、光(紫外線等)或電子束等而硬化之硬化性化合物。硬塗層及硬塗層形成用之樹脂組合物之詳細內容例如記載於日本專利特開2014-240955號公報。該公報之全部記載係作為參考而引用至本說明書中。 C-2.防眩層 防眩層係用以藉由使光散射並反射而防止外界光之映入之層。防眩層形成用之樹脂組合物例如可含有能夠藉由熱、光(紫外線等)或電子束等而硬化之硬化性化合物。防眩層代表性而言於表面具有微細凹凸形狀。作為形成此種微細凹凸形狀之方法,例如可列舉使上述硬化性化合物含有微粒子之方法。防眩層及防眩層形成用之樹脂組合物之詳細內容例如記載於日本專利特開2017-32711號公報。該公報之全部記載係作為參考而引用至本說明書中。 C-3.抗反射層 抗反射層係用以防止外界光之反射之層。抗反射層形成用之樹脂組合物例如可含有能夠藉由熱、光(紫外線等)或電子束等而硬化之硬化性化合物。抗反射層可為僅由1層構成之單層,亦可為包含2層以上之複數層。抗反射層及抗反射層形成用之樹脂組合物之詳細內容例如記載於日本專利特開2012-155050號公報。該公報之全部記載係作為參考而引用至本說明書中。 D.偏光板 上述A至C項所記載之光學膜可應用於偏光板。因此,本發明亦包含使用此種光學膜之偏光板。代表性而言,偏光板具有偏光元件、及配置於偏光元件之單側之本發明之光學膜。對於光學膜,可將其基材膜側與偏光元件加以貼合,而作為偏光元件之保護層發揮功能。 作為偏光元件,可採用任意合適之偏光元件。例如,形成偏光元件之樹脂膜可為單層之樹脂膜,亦可為兩層以上之積層體。 作為包含單層樹脂膜之偏光元件之具體例,可列舉:對聚乙烯醇(PVA)系膜、部分縮甲醛化PVA系膜、乙烯-乙酸乙烯酯共聚物系部分皂化膜等親水性高分子膜實施利用碘或二色性染料等二色性物質之染色處理及延伸處理而成者;PVA之脫水處理物或聚氯乙烯之脫氯化氫處理物等多烯系配向膜等。就光學特性優異之方面而言,較佳為使用以碘將PVA系膜染色並單軸延伸而獲得之偏光元件。 上述利用碘之染色例如係藉由將PVA系膜浸漬於碘水溶液中而進行。上述單軸延伸之延伸倍率較佳為3~7倍。延伸可於染色處理後進行,亦可一邊染色一邊進行。又,亦可於延伸後進行染色。視需要對PVA系膜實施膨潤處理、交聯處理、洗淨處理、乾燥處理等。例如,藉由在染色前將PVA系膜浸漬於水中進行水洗,不僅可洗淨PVA系膜表面之污垢或抗黏連劑,而且可使PVA系膜膨潤而防止染色不均等。 作為使用積層體而獲得之偏光元件之具體例,可列舉使用樹脂基材與積層於該樹脂基材之PVA系樹脂層(PVA系樹脂膜)之積層體、或樹脂基材與塗佈形成於該樹脂基材之PVA系樹脂層之積層體而獲得之偏光元件。使用樹脂基材與塗佈形成於該樹脂基材之PVA系樹脂層之積層體而獲得之偏光元件例如可藉由以下方法製作:將PVA系樹脂溶液塗佈於樹脂基材,加以乾燥而於樹脂基材上形成PVA系樹脂層,從而獲得樹脂基材與PVA系樹脂層之積層體;將該積層體進行延伸及染色而將PVA系樹脂層製成偏光元件。於本實施形態中,延伸代表性而言包括將積層體浸漬於硼酸水溶液中進行延伸。進而,延伸可視需要進而包括於硼酸水溶液中之延伸前將積層體於高溫(例如,95℃以上)下進行空中延伸。所獲得之樹脂基材/偏光元件之積層體可直接使用(即,可將樹脂基材設為偏光元件之保護層),亦可將樹脂基材從樹脂基材/偏光元件之積層體剝離,於該剝離面積層符合目的之任意合適之保護層而使用。此種偏光元件之製造方法之詳細內容例如記載於日本專利特開2012-73580號公報。該公報之全部記載係作為參考而引用至本說明書中。 偏光元件之厚度例如為1 μm~80 μm。於一實施形態中,偏光元件之厚度較佳為1 μm~20 μm,進而較佳為3 μm~15 μm。 E.圖像顯示裝置 上述D項所記載之偏光板可應用於圖像顯示裝置。因此,本發明亦包含使用此種偏光板之圖像顯示裝置。作為圖像顯示裝置之代表例,可列舉:液晶顯示裝置、有機電致發光(EL)顯示裝置。圖像顯示裝置係採用業界所周知之構成,因此省略詳細之說明。 實施例 以下,藉由實施例對本發明進行具體說明,但本發明並不限定於該等實施例。各特性之測定方法如以下所述。再者,只要無特別明確記載,則實施例中之「份」及「%」為重量基準。 (1)基材膜之尺寸變化率 將基材膜沿其長邊方向及短邊方向裁斷為10 cm×10 cm而製成測定樣品。將上述測定樣品經由黏著材貼合於玻璃板,於100℃之環境試驗機內靜置120小時,使用Mitutoyo製造之QVA606-PRO-AE10測定基材膜之尺寸變化率。 測定樣品與玻璃板之貼合係使用含有丙烯酸丁酯95份、丙烯酸5份、丙烯酸2-羥基乙酯0.1份、及2-2偶氮二異丁腈0.05份之黏著劑。 再者,尺寸變化率係對於靜置於環境試驗機後之測定樣品,沿與裁斷面平行之方向(測定樣品之各邊)對內側距端部1 cm之位置進行尺寸測定,使用下述式計算尺寸變化率。分別測定與基材膜之長邊方向相對應之方向之尺寸變化率、及與其短邊方向相對應之方向之尺寸變化率。 尺寸變化率(%)=(100℃下120小時後之尺寸-初始尺寸)/初始尺寸×100 (2)密接性評價 依照JIS K-5400之柵格剝離試驗(柵格數:100個)對表面處理層對基材膜之密接性進行評價,藉由以下之指標加以判定。 :柵格剝離數為0個 Δ:柵格剝離數為1個以上且未達10個 ×:柵格剝離數為10個以上 <製造例1> 準備以下之組合物A~C作為表面處理層形成用之樹脂組合物。 (1)組合物A 將4-HBA(4-hydroxybutyl acrylate,丙烯酸4-羥基丁酯)(大阪有機化學工業股份有限公司製造)16重量份、NK低聚UA-53H-80BK(新中村化學工業股份有限公司製造)32重量份、Viscoat #300(大阪有機化學工業股份有限公司製造)48重量份、A-GLY-9E(新中村化學工業股份有限公司製造)4重量份、及IRGACURE 907(BASF製造)2.4重量份加以混合,分別藉由MIBK(methyl isobutyl ketone,甲基異丁基酮):PGM(Propylene glycol monomethylether,丙二醇單甲醚)=50:50之溶劑以固形物成分濃度成為42.0%之方式進行稀釋而獲得之UV硬化性樹脂。 (2)組合物B 將Viscoat #300(大阪有機化學工業股份有限公司製造)100重量份、及IRGACURE 907(BASF製造)2.4重量份加以混合,藉由MIBK:PGM=50:50之溶劑以固形物成分濃度成為42.0%之方式進行稀釋而獲得之UV硬化性樹脂。 (3)組合物C 4-HBA(大阪有機化學工業股份有限公司製造)20重量份、NK低聚UA-53H-80BK(新中村化學工業股份有限公司製造)40重量份、Viscoat #300(大阪有機化學工業股份有限公司製造)60重量份、IRGACURE 907(BASF製造)5重量份、及Techpolymer SSX-103DXE(積水化成品工業股份有限公司製造)0.5重量份加以混合,分別藉由甲苯:MEK(methyl ethyl ketone,甲基乙基酮)=70:30之溶劑以固形物成分濃度成為40.0%之方式進行稀釋而獲得之UV硬化性樹脂。 <實施例1> 1.基材膜之製作 藉由單甲基胺利用單甲基胺將MS樹脂(MS-200;甲基丙烯酸甲酯/苯乙烯(莫耳比)=80/20之共聚物,新日鐵化學股份有限公司製造)進行醯亞胺化(醯亞胺化率:5%)。所獲得之醯亞胺化MS樹脂具有通式(1)所表示之戊二醯亞胺單元(R1 及R3 為甲基,R2 為氫原子)、通式(2)所表示之(甲基)丙烯酸酯單元(R4 及R5 為甲基)、及苯乙烯單元。再者,上述醯亞胺化係使用口徑15 mm之嚙合型同方向旋轉式雙軸擠出機。將擠出機之各調溫區之設定溫度設為230℃,將螺桿轉速設為150 rpm,以2.0 kg/hr供給MS樹脂,單甲基胺之供給量係相對於MS樹脂100重量份而設為2重量份。從料斗投入MS樹脂,藉由捏合段使樹脂熔融及充滿後,從噴嘴注入單甲基胺。於反應區之末端裝入密封圈使樹脂充滿。將排氣口之壓力減壓為-0.08 MPa而將反應後之副產物及過量之甲基胺去除揮發物。以線料形式從設置於擠出機出口之模具排出之樹脂於水槽中冷卻後,藉由造粒機進行顆粒化。所獲得之醯亞胺化MS樹脂之醯亞胺化率為5.0%,酸值為0.5 mmol/g。 將上述所獲得之醯亞胺化MS樹脂100重量份與芯殼型粒子10重量份投入至單軸擠出機中進行熔融混合,通過T模而進行膜形成,藉此獲得擠出膜。將所獲得之擠出膜於延伸溫度160℃下沿長度方向及寬度方向分別同時雙軸延伸為2倍。延伸速度於長度方向及寬度方向均為10%/秒。 由此製作基材膜A。所獲得之基材膜A之厚度為40 μm。測定基材膜A之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 以硬化後之厚度成為6 μm之方式於上述基材膜A之單側塗佈組合物A而形成塗佈層。繼而,將上述塗佈層於70℃下加以乾燥,並且進行UV硬化,藉此獲得於基材膜A之單側形成有硬塗層之光學膜1。將上述光學膜1供於密接性評價。將結果示於表1。 <實施例2> 1.基材膜之製作 將上述所獲得之醯亞胺化MS樹脂100重量份與芯殼型粒子10重量份投入至單軸擠出機中進行熔融混合,通過T模而進行膜形成,藉此獲得擠出膜。將所獲得之擠出膜於延伸溫度160℃下沿長度方向及寬度方向分別同時雙軸延伸為2倍。延伸速度於長度方向及寬度方向均為10%/秒。 由此製作基材膜B。所獲得之基材膜B之厚度為35 μm。測定基材膜B之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜B以外,以與實施例1同樣之方式獲得於基材膜B之單側形成有硬塗層之光學膜2。將上述光學膜2供於密接性評價。將結果示於表1。 <實施例3> 1.基材膜之製作 將上述所獲得之醯亞胺化MS樹脂投入至單軸擠出機進行熔融混合,通過T模而進行膜形成,藉此獲得擠出膜。將所獲得之擠出膜於延伸溫度160℃下沿長度方向及寬度方向分別同時雙軸延伸為2倍。延伸速度於長度方向及寬度方向均為10%/秒。 由此製作基材膜C。所獲得之基材膜C之厚度為30 μm。測定基材膜C之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜C以外,以與實施例1同樣之方式獲得於基材膜C之單側形成有硬塗層之光學膜3。將上述光學膜3供於密接性評價。將結果示於表1。 <實施例4> 1.基材膜之製作 除了將芯殼型粒子之調配量設為10重量份以外,以與實施例3同樣之方式製作基材膜D。測定基材膜D之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜D以外,以與實施例1同樣之方式獲得於基材膜D之單側形成有硬塗層之光學膜4。將上述光學膜4供於密接性評價。將結果示於表1。 <實施例5> 於上述基材膜D之單側塗佈組合物B並加以乾燥使之硬化,藉此形成硬塗層,除此以外,以與實施例4同樣之方式獲得於基材膜D之單側形成有硬塗層之光學膜5。將上述光學膜5供於密接性評價。將結果示於表1。 <實施例6> 於上述基材膜D之單側塗佈組合物C並加以硬化,藉此形成防眩層,除此以外,以與實施例4同樣之方式獲得於基材膜D之單側形成有防眩層之光學膜6。將上述光學膜6供於密接性評價。將結果示於表1。 <實施例7> 1.基材膜之製作 將芯殼型粒子之調配量設為10重量份,並且將擠出膜之延伸溫度設為150℃,除此以外,以與實施例3同樣之方式製作基材膜E。測定基材膜E之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜E以外,以與實施例1同樣之方式獲得於基材膜E之單側形成有硬塗層之光學膜7。將上述光學膜7供於密接性評價。將結果示於表1。 <實施例8> 1.基材膜之製作 將芯殼型粒子之調配量設為15重量份,並且將擠出膜之延伸溫度設為152℃,除此以外,以與實施例3同樣之方式製作基材膜F。測定基材膜F之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜F以外,以與實施例1同樣之方式獲得於基材膜F之單側形成有硬塗層之光學膜8。將上述光學膜8供於密接性評價。將結果示於表1。 <實施例9> 1.基材膜之製作 除了將擠出膜之延伸溫度設為155℃以外,以與實施例3同樣之方式製作基材膜G。測定基材膜G之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜G以外,以與實施例1同樣之方式獲得於基材膜G之單側形成有硬塗層之光學膜9。將上述光學膜9供於密接性評價。將結果示於表1。 <實施例10> 1.基材膜之製作 將芯殼型粒子之調配量設為10重量份,並且將擠出膜之延伸溫度設為140℃,除此以外,以與實施例3同樣之方式製作基材膜H。測定基材膜H之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜H以外,以與實施例1同樣之方式獲得於基材膜H之單側形成有硬塗層之光學膜10。將上述光學膜10供於密接性評價。將結果示於表1。 <實施例11> 1.基材膜之製作 將芯殼型粒子之調配量設為23重量份,並且將擠出膜之延伸溫度設為152℃,除此以外,以與實施例3同樣之方式製作基材膜I。測定基材膜I之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜I以外,以與實施例1同樣之方式獲得於基材膜I之單側形成有硬塗層之光學膜11。將上述光學膜11供於密接性評價。將結果示於表1。 <實施例12> 1.基材膜之製作 將芯殼型粒子之調配量設為5重量份,並且將擠出膜之延伸溫度設為140℃,除此以外,以與實施例3同樣之方式製作基材膜J。測定基材膜J之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜J以外,以與實施例1同樣之方式獲得於基材膜J之單側形成有硬塗層之光學膜12。將上述光學膜12供於密接性評價。將結果示於表1。 <實施例13> 1.基材膜之製作 將芯殼型粒子之調配量設為23重量份,並且將擠出膜之延伸溫度設為140℃,除此以外,以與實施例3同樣之方式製作基材膜K。測定基材膜K之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜K以外,以與實施例1同樣之方式獲得於基材膜K之單側形成有硬塗層之光學膜13。將上述光學膜13供於密接性評價。將結果示於表1。 <實施例14> 1.基材膜之製作 除了將擠出膜之延伸溫度設為150℃以外,以與實施例3同樣之方式製作基材膜L。測定基材膜L之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜L以外,以與實施例1同樣之方式獲得於基材膜L之單側形成有硬塗層之光學膜14。將上述光學膜14供於密接性評價。將結果示於表1。 <比較例1> 1.基材膜之製作 除了將擠出膜之延伸溫度設為130℃以外,以與實施例3同樣之方式製作基材膜M。測定基材膜M之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜M以外,以與實施例1同樣之方式獲得於基材膜M之單側形成有硬塗層之光學膜15。將上述光學膜15供於密接性評價。將結果示於表1。 <比較例2> 1.基材膜之製作 除了將擠出膜之延伸溫度設為140℃以外,以與實施例3同樣之方式製作基材膜N。測定基材膜N之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜N以外,以與實施例1同樣之方式獲得於基材膜N之單側形成有硬塗層之光學膜16。將上述光學膜16供於密接性評價。將結果示於表1。 <比較例3> 於上述基材膜N之單側塗佈組合物B並加以乾燥使之硬化,藉此形成硬塗層,除此以外,以與比較例2同樣之方式獲得於基材膜N之單側形成有硬塗層之光學膜17。將上述光學膜17供於密接性評價。將結果示於表1。 <比較例4> 於上述基材膜N之單側塗佈組合物C並加以乾燥使之硬化,藉此形成防眩層,除此以外,以與比較例2同樣之方式獲得於基材膜N之單側形成有防眩層之光學膜18。將上述光學膜18供於密接性評價。將結果示於表1。 <比較例5> 1.基材膜之製作 將芯殼型粒子之調配量設為3重量份,並且將擠出膜之延伸溫度設為140℃,除此以外,以與實施例3同樣之方式製作基材膜O。測定基材膜O之長邊方向之尺寸變化率及短邊方向之尺寸變化率。將結果示於表1。 2.光學膜之製作 除了使用上述基材膜O以外,以與實施例1同樣之方式獲得於基材膜O之單側形成有硬塗層之光學膜19。將上述光學膜19供於密接性評價。將結果示於表1。 [表1] 根據表1可知,使用長邊方向之尺寸變化率及短邊方向之尺寸變化率為-2.0%~0%之基材膜的實施例1~14之光學膜中表面處理層對基材膜之密接性較高。 [產業上之可利用性] 本發明之光學膜可適宜地用作偏光元件之保護層。具有本發明之光學膜作為保護層之偏光板可適宜地用於圖像顯示裝置。如上所述之圖像顯示裝置可用於:攜帶型資訊終端(PDA,portable information terminal)、智慧型手機、行動電話、時鐘、數位相機、攜帶型遊戲機等攜帶型機器;電腦顯示器、筆記型電腦、影印機等OA機器;攝錄影機、電視、微波爐等家庭用電氣設備;後部監視器、汽車導航系統用監視器、汽車音響等車載用機器;數位標牌、商業店鋪用資訊用顯示器等展示機器;監視用監視器等警備機器;護理用監視器、醫療用監視器等護理、醫療機器等各種用途。The following describes the embodiments of the present invention, but the present invention is not limited to the embodiments. A. Overall structure of optical film 1 is a schematic cross-sectional view of an optical film of one embodiment of the present invention. The optical film 100 includes a substrate film 10 and a surface treatment layer 20 formed on one side of the substrate film 10. The substrate film 10 is a stretched film containing an acrylic resin. When the substrate film 10 is cut into 10 cm×10 cm and attached to a glass plate via an adhesive and left at 100°C for 120 hours, the dimensional change rate along a specific direction is -2.0%~0%. The shape of the substrate film 10 is not particularly limited. For example, when the substrate film is in the shape of a strip or rectangle, the dimensional change rate can be measured by cutting the substrate film into 10 cm×10 cm along the long side direction and the short side direction (direction perpendicular to the long side direction) of the substrate film. The specific direction is typically the direction along each side of the substrate film cut into 10 cm×10 cm. In one embodiment, the substrate film 10 contains an acrylic resin and core-shell particles dispersed in the acrylic resin. In this case, the substrate film 10 preferably contains 5 to 50 parts by weight of the core-shell particles relative to 100 parts by weight of the acrylic resin. The acrylic resin preferably has at least one selected from the group consisting of glutaric anhydride units, lactone ring units, maleic anhydride units, maleic anhydride units and glutaric anhydride units. The surface treatment layer 20 is typically a hardening layer of a resin composition coated on the substrate film 10. The surface treatment layer 20 is preferably at least one selected from the group consisting of a hard coating layer, an anti-glare layer and an anti-reflection layer. By means of the above-mentioned optical film, shrinkage (especially shrinkage along the extension direction) in a state where the surface treatment layer is formed can be suppressed. As a result, the adhesion between the substrate film 10 and the surface treatment layer 20 can be improved. In particular, when the surface treatment layer 20 is formed by applying the resin composition on the substrate film 10 and drying and hardening the resin composition, sufficient adhesion between the substrate film 10 and the surface treatment layer 20 can be achieved even when the resin composition is dried at a low temperature. Therefore, the generation of wrinkles on the substrate film due to the heat when the resin composition is dried can be suppressed. B. Substrate film B-1. Characteristics of substrate film As described above, the substrate film is a stretched film containing an acrylic resin, and the dimensional change rate when the substrate film is cut into 10 cm×10 cm along the long side direction and the orthogonal direction of the substrate film and attached to a glass plate via an adhesive and left at 100°C for 120 hours is -2.0% to 2.0%. The above-mentioned dimensional change rate is preferably -1.8%~1.0%, more preferably -1.0%~0.0%, and particularly preferably -0.5%~0.0%. In one embodiment, the substrate film contains an acrylic resin and core-shell particles dispersed in the acrylic resin. The thickness of the substrate film is preferably 5 μm~150 μm, more preferably 10 μm~100 μm. The substrate film is preferably substantially optically isotropic. In this specification, the so-called "substantially optically isotropic" means that the in-plane phase difference Re(550) is 0 nm~10 nm and the phase difference Rth(550) in the thickness direction is -10 nm~+10 nm. The in-plane phase difference Re(550) is more preferably 0 nm~5 nm, further preferably 0 nm~3 nm, and particularly preferably 0 nm~2 nm. The phase difference Rth(550) in the thickness direction is preferably -5 nm to +5 nm, further preferably -3 nm to +3 nm, and particularly preferably -2 nm to +2 nm. If the Re(550) and Rth(550) of the substrate film are in such a range, adverse effects on display characteristics can be prevented when the optical film is applied to an image display device. Furthermore, Re(550) is the in-plane phase difference of the film measured at 23°C using light with a wavelength of 550 nm. Re(550) can be calculated by the formula: Re(550)=(nx-ny)×d. Rth(550) is the phase difference in the thickness direction of the film measured at 23°C using light with a wavelength of 550 nm. Rth(550) can be calculated by the formula: Rth(550)=(nx-nz)×d. Here, nx is the refractive index in the direction where the in-plane refractive index becomes the maximum (i.e., the retardation axis direction), ny is the refractive index in the direction orthogonal to the retardation axis (i.e., the advance axis direction) in the plane, nz is the refractive index in the thickness direction, and d is the thickness of the film (nm). The higher the light transmittance at 380 nm when the thickness of the substrate film is 30 μm, the better. Specifically, the light transmittance is preferably 85% or more, more preferably 88% or more, and further preferably 90% or more. If the light transmittance is in this range, the required transparency can be ensured. The light transmittance can be measured, for example, by a method in accordance with ASTM-D-1003. The lower the haze of the substrate film, the better. Specifically, the haze is preferably less than 5%, more preferably less than 3%, further preferably less than 1.5%, and particularly preferably less than 1%. If the haze is 5% or less, the film can be given a good sense of transparency. Furthermore, even when the optical film is used as a protective layer for the visual side polarizer of an image display device, the display content can be well visualized. When the thickness of the substrate film is 30 μm, the YI (Yellowness Index) is preferably 1.27 or less, more preferably 1.25 or less, further preferably 1.23 or less, and particularly preferably 1.20 or less. If the YI exceeds 1.3, there is a situation where the optical transparency becomes insufficient. Furthermore, the YI can be obtained, for example, by the following formula based on the three stimulus values (X, Y, Z) of the color obtained by measurement using a high-speed integrating sphere spectroscopic transmittance meter (trade name DOT-3C: manufactured by Murakami Color Technology Laboratory). YI=[(1.28X-1.06Z)/Y]×100 When the thickness of the substrate film is 30 μm, the b value (the scale of hue according to the Hunter colorimetric system) is preferably less than 1.5, and more preferably less than 1.0. When the b value is greater than 1.5, there is a case where an undesirable color tone appears. In addition, the b value can be obtained by, for example, cutting the substrate film sample into 3 cm squares, measuring the hue using a high-speed integrating sphere spectroscopic transmittance meter (trade name DOT-3C: manufactured by Murakami Color Technology Laboratory), and evaluating the hue according to the Hunter colorimetric system. The moisture permeability of the substrate film is preferably 300 g/m 2・24 hr or less, more preferably 250 g/m 2・24 hr or less, further preferably 200 g/m 2・24 hr or less, particularly preferably 150 g/m 2・24 hr or less, and most preferably 100 g/m 2・24 hr or less. If the moisture permeability of the substrate film is within this range, a polarizing plate having excellent durability and moisture resistance can be obtained when used as a protective layer of a polarizing element. The tensile strength of the substrate film is preferably 10 MPa or more and less than 100 MPa, more preferably 30 MPa or more and less than 100 MPa. When it is less than 10 MPa, there is a possibility that sufficient mechanical strength cannot be exhibited. If it exceeds 100 MPa, there is a possibility that processability becomes insufficient. The tensile strength can be measured, for example, in accordance with ASTM-D-882-61T. The tensile elongation of the substrate film is preferably 1.0% or more, more preferably 3.0% or more, and further preferably 5.0% or more. The upper limit of the tensile elongation is, for example, 100%. When the tensile elongation is less than 1%, the toughness may be insufficient. The tensile elongation can be measured, for example, in accordance with ASTM-D-882-61T. The tensile modulus of the substrate film is preferably 0.5 GPa or more, more preferably 1 GPa or more, and further preferably 2 GPa or more. The upper limit of the tensile modulus is, for example, 20 GPa. When the tensile modulus of the film is less than 0.5 GPa, sufficient mechanical strength may not be exhibited. The tensile modulus of the film can be measured, for example, in accordance with ASTM-D-882-61T. The base film may contain any appropriate additives depending on the purpose. Specific examples of additives include: ultraviolet absorbers; antioxidants such as hindered phenol, phosphorus, and sulfur; stabilizers such as light stabilizers, weather stabilizers, and heat stabilizers; reinforcing materials such as glass fiber and carbon fiber; near-infrared absorbers; flame retardants such as tris(dibromopropyl) phosphate, triallyl phosphate, and antimony oxide; antistatic agents such as anionic, cationic, and non-ionic surfactants; colorants such as inorganic pigments, organic pigments, and dyes; organic fillers or inorganic fillers; resin modifiers; organic fillers or inorganic fillers; plasticizers; lubricants, etc. Additives can be added during the polymerization of the acrylic resin or during film formation. The type, amount, combination, and addition amount of the additive can be appropriately set depending on the purpose. B-2. Acrylic resin B-2-1. Composition of acrylic resin As the acrylic resin, any suitable acrylic resin can be used. Acrylic resins typically contain (meth) alkyl acrylate as a main component as a monomer unit. In this specification, "(meth) acrylic acid" means acrylic acid and/or methacrylic acid. As the (meth) alkyl acrylate constituting the main skeleton of the acrylic resin, examples include linear or branched alkyl groups with 1 to 18 carbon atoms. These can be used alone or in combination. Furthermore, any suitable copolymer monomer can be introduced into the acrylic resin by copolymerization. The type, amount, copolymerization ratio, etc. of such copolymer monomers can be appropriately set depending on the purpose. The constituent components (monomer units) of the main skeleton of the acrylic resin are described below with reference to general formula (2). The acrylic resin preferably has at least one selected from the group consisting of a glutarimide unit, a lactone ring unit, a maleic anhydride unit, a maleic anhydride unit, and a glutaric anhydride unit. Acrylic resins having a lactone ring unit are described, for example, in Japanese Patent Publication No. 2008-181078, the description of which is cited in this specification as a reference. The glutarimide unit is preferably represented by the following general formula (1): [Chemical 1] In the general formula (1), R1 and R2 are independently a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and R3 is a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, or an aryl group having 6 to 10 carbon atoms. In the general formula (1), it is preferred that R1 and R2 are independently a hydrogen atom or a methyl group, and R3 is a hydrogen atom, a methyl group, a butyl group, or a cyclohexyl group. It is more preferred that R1 is a methyl group, R2 is a hydrogen atom, and R3 is a methyl group. The above-mentioned alkyl (meth)acrylate is typically represented by the following general formula (2): [Chemical 2] In the general formula (2), R4 represents a hydrogen atom or a methyl group, and R5 represents a hydrogen atom, or an aliphatic or alicyclic alkyl group having 1 to 6 carbon atoms which may be substituted. Examples of the substituent include halogens and hydroxyl groups. Specific examples of the alkyl (meth)acrylate include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, n-butyl (meth)acrylate, tert-butyl (meth)acrylate, n-hexyl (meth)acrylate, cyclohexyl (meth)acrylate, chloromethyl (meth)acrylate, 2-chloroethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2,3,4,5,6-pentahydroxyhexyl (meth)acrylate, and 2,3,4,5-tetrahydroxypentyl (meth)acrylate. In the general formula (2), R 5 is preferably a hydrogen atom or a methyl group. Therefore, the most preferred (meth)acrylic acid alkyl ester is methyl acrylate or methyl methacrylate. The acrylic resin may contain only a single pentylimide unit, or may contain a plurality of pentylimide units with different R 1 , R 2 and R 3 in the general formula (1). The content ratio of the pentylimide unit in the acrylic resin is preferably 2 mol% to 50 mol%, more preferably 2 mol% to 45 mol%, further preferably 2 mol% to 40 mol%, particularly preferably 2 mol% to 35 mol%, and most preferably 3 mol% to 30 mol%. If the content ratio is less than 2 mol%, the effects derived from the pentylene imide unit (e.g., higher optical properties, higher mechanical strength, excellent adhesion of polarizing elements, and thinning) may not be fully exerted. If the content ratio exceeds 50 mol%, for example, heat resistance and transparency may become insufficient. The acrylic resin may contain only a single (meth) alkyl ester unit, or may contain a plurality of (meth) alkyl ester units in which R4 and R5 in the general formula (2) are different. The content ratio of the (meth) alkyl acrylate unit in the acrylic resin is preferably 50 mol% to 98 mol%, more preferably 55 mol% to 98 mol%, further preferably 60 mol% to 98 mol%, particularly preferably 65 mol% to 98 mol%, and most preferably 70 mol% to 97 mol%. If the content ratio is less than 50 mol%, there is a concern that the effects (e.g., higher heat resistance, higher transparency) derived from the (meth) alkyl acrylate unit may not be fully exerted. If the above content ratio is more than 98 mol%, there is a concern that the resin becomes brittle and easily cracks, and a higher mechanical strength cannot be fully exerted, resulting in poor productivity. The acrylic resin may also contain units other than the pentamethyleneimide unit and the (meth) alkyl acrylate unit. In one embodiment, the acrylic resin may contain, for example, 0 to 10% by weight of unsaturated carboxylic acid units that do not participate in the intramolecular imidization reaction described below. The content of the unsaturated carboxylic acid units is preferably 0 to 5% by weight, more preferably 0 to 1% by weight. If the content is within this range, transparency, retention stability, and moisture resistance can be maintained. In one embodiment, the acrylic resin may contain copolymerizable vinyl monomer units other than those described above (other vinyl monomer units). Examples of the other vinyl monomers include acrylonitrile, methacrylonitrile, ethacrylonitrile, allyl glycidyl ether, maleic anhydride, itaconic anhydride, N-methylmaleimide, N-ethylmaleimide, N-cyclohexylmaleimide, aminoethyl acrylate, propylaminoethyl acrylate, dimethylaminoethyl methacrylate, ethylaminopropyl methacrylate, cyclohexyl methacrylate, The monomers include aminoethyl ester, N-vinyldiethylamine, N-acetylvinylamine, allylamine, methylallylamine, N-methylallylamine, 2-isopropenyloxazoline, 2-vinyloxazoline, 2-acryloyloxazoline, N-phenylbutylene diimide, methacrylate phenylaminoethyl ester, styrene, α-methylstyrene, p-glycidylstyrene, p-aminostyrene, 2-phenylvinyloxazoline, etc. These monomers can be used alone or in combination. Preferred monomers are styrene monomers such as styrene and α-methylstyrene. The content of other vinyl monomer units is preferably 0 to 1% by weight, and more preferably 0 to 0.1% by weight. If it is within this range, the expression of undesired phase difference and the reduction of transparency can be suppressed. The imidization rate in the above-mentioned acrylic resin is preferably 2.5%~20.0%. If the imidization rate is in this range, a resin with excellent heat resistance, transparency and molding processability can be obtained, which can prevent the occurrence of scorching or reduction of mechanical strength during film formation. In the above-mentioned acrylic resin, the imidization rate is expressed as the ratio of the pentamethyleneimine unit to the (meth) alkyl acrylate unit. The ratio can be obtained, for example, based on the NMR (nuclear magnetic resonance) spectrum, IR (infrared) spectrum, etc. of the acrylic resin. In this embodiment, the imidization rate can be obtained by using 1 H-NMR measurement of the resin using 1 HNMR BRUKER AvanceIII (400 MHz). More specifically, the peak area of O-CH 3 protons derived from (meth) alkyl esters around 3.5 to 3.8 ppm is set as A, and the peak area of N-CH 3 protons derived from pentylene diimide around 3.0 to 3.3 ppm is set as B, and the following formula is used to calculate. Imidization rate Im(%) = {B/(A+B)}×100 The acid value of the above-mentioned acrylic resin is preferably 0.10 mmol/g~0.50 mmol/g. If the acid value is in this range, a resin with excellent balance of heat resistance, mechanical properties and molding processability can be obtained. If the acid value is too small, there are problems such as increased cost due to the use of a modifier for adjusting to the required acid value, and the generation of a gel-like substance due to the residue of the modifier. If the acid value is too large, it tends to cause foaming during film forming (for example, during melt extrusion) and thus reduce the productivity of the molded product. Regarding the above-mentioned acrylic resin, the acid value is the content of carboxylic acid units and carboxylic anhydride units in the acrylic resin. In this embodiment, the acid value can be calculated by the titration method described in WO2005/054311 or Japanese Patent Publication No. 2005-23272. The weight average molecular weight of the above-mentioned acrylic resin is preferably 1000~2000000, more preferably 5000~1000000, further preferably 10000~500000, particularly preferably 50000~500000, and most preferably 60000~150000. The weight average molecular weight can be determined, for example, by converting to polystyrene using a gel permeation chromatograph (GPC system, manufactured by Tosoh). Furthermore, tetrahydrofuran can be used as a solvent. The Tg (glass transition temperature) of the above-mentioned acrylic resin is preferably above 110°C, more preferably above 115°C, further preferably above 120°C, particularly preferably above 125°C, and optimally above 130°C. If Tg is above 110°C, a polarizing plate containing a substrate film obtained from such a resin tends to have excellent durability. The upper limit of Tg is preferably below 300°C, more preferably below 290°C, further preferably below 285°C, particularly preferably below 200°C, and optimally below 160°C. If Tg is within this range, the formability will be excellent. B-2-2. Polymerization of acrylic resin The acrylic resin can be produced, for example, by the following method. The method comprises: (I) copolymerizing an alkyl (meth)acrylate monomer corresponding to the alkyl (meth)acrylate unit represented by general formula (2) with an unsaturated carboxylic acid monomer and/or its precursor monomer to obtain a copolymer (a); and (II) treating the copolymer (a) with an imidizing agent to carry out an intramolecular imidization reaction of the alkyl (meth)acrylate monomer unit and the unsaturated carboxylic acid monomer and/or its precursor monomer unit in the copolymer (a), thereby introducing the pentylene imide unit represented by general formula (1) into the copolymer. Examples of the unsaturated carboxylic acid monomer include acrylic acid, methacrylic acid, crotonic acid, α-substituted acrylic acid, and α-substituted methacrylic acid. As its precursor monomer, for example, acrylamide, methacrylamide, etc. can be listed. These can be used alone or in combination. The preferred unsaturated carboxylic acid monomer is acrylic acid or methacrylic acid, and the preferred precursor monomer is acrylamide. As a method for treating the copolymer (a) with an imide agent, any suitable method can be used. As a specific example, a method using an extruder and a method using a batch reactor (pressure vessel) can be listed. The method using an extruder includes heating and melting the copolymer (a) using an extruder and treating it with an imide agent. In this case, any suitable extruder can be used as the extruder. As specific examples, there can be cited: a single-screw extruder, a double-screw extruder, and a multi-screw extruder. In the method using a batch reactor (pressure vessel), any suitable batch reactor (pressure vessel) can be used. As the imidizing agent, any suitable compound can be used as long as it can generate the pentamethylenediamine unit represented by the above general formula (1). As specific examples of the imidizing agent, there can be cited: amines containing aliphatic hydrocarbon groups such as methylamine, ethylamine, n-propylamine, isopropylamine, n-butylamine, isobutylamine, tert-butylamine, and n-hexylamine; amines containing aromatic hydrocarbon groups such as aniline, benzylamine, toluidine, and trichloroaniline; and amines containing alicyclic hydrocarbon groups such as cyclohexylamine. Furthermore, for example, urea compounds that generate such amines by heating can also be used. Examples of urea compounds include urea, 1,3-dimethylurea, 1,3-diethylurea, and 1,3-dipropylurea. The imidizing agent is preferably methylamine, ammonia, or cyclohexylamine, and more preferably methylamine. In the imidization, in addition to the above-mentioned imidizing agent, a ring-closing promoter can also be added as needed. The amount of the imidizing agent used in the imidization is preferably 0.5 to 10 parts by weight, and more preferably 0.5 to 6 parts by weight, relative to 100 parts by weight of the copolymer (a). If the amount of the imidizing agent used is less than 0.5 parts by weight, the desired imidization rate is often not achieved. As a result, the heat resistance of the obtained resin may be extremely insufficient, and appearance defects such as scorching may occur after molding. If the amount of the imidizing agent used exceeds 10 parts by weight, the imidizing agent may remain in the resin, and the imidizing agent may cause appearance defects such as scorching or foaming after molding. The production method of this embodiment may include treatment with an esterifying agent in addition to the above-mentioned imidization, if necessary. Examples of the esterifying agent include dimethyl carbonate, 2,2-dimethoxypropane, dimethyl sulfoxide, triethyl orthoformate, trimethyl orthoacetate, trimethyl orthoformate, diphenyl carbonate, dimethyl sulfate, methyl toluenesulfonate, methyl trifluoromethanesulfonate, methyl acetate, methanol, ethanol, methyl isocyanate, p-chlorophenyl isocyanate, dimethylcarbodiimide, dimethyl tert-butylsilyl Chlorine, isopropyl acetate, dimethyl urea, tetramethylammonium hydroxide, dimethyldiethoxysilane, tetra-n-butoxysilane, dimethyl (trimethylsilyl) phosphite, trimethyl phosphite, trimethyl phosphate, tricresyl phosphate, diazomethane, ethylene oxide, propylene oxide, hexyl oxide, 2-ethylhexyl glycidyl ether, phenyl glycidyl ether, benzyl glycidyl ether. Among them, dimethyl carbonate is preferred from the viewpoints of cost and reactivity. The amount of the esterifying agent added can be set in such a way that the acid value of the acrylic resin becomes the desired value. B-2-3. Concurrent use of other resins In the embodiment of the present invention, the above-mentioned acrylic resin can be used in combination with other resins. That is, the monomer components constituting the acrylic resin can be copolymerized with the monomer components constituting other resins, and the copolymer can be used for film formation as described in the following item B-4; or a blend of the acrylic resin and other resins can be used for film formation. Examples of other resins include: styrene resins, polyethylene, polypropylene, polyamide, polyphenylene sulfide, polyetheretherketone, polyester, polysulfone, polyphenylene ether, polyacetal, polyimide, polyetherimide and other thermoplastic resins; phenol resins, melamine resins, polyester resins, silicone resins, epoxy resins and other thermosetting resins. The type and amount of the resin used in combination can be appropriately set according to the purpose and the expected properties of the obtained film. For example, a styrene resin (preferably an acrylonitrile-styrene copolymer) can be used in combination as a phase difference control agent. When an acrylic resin is used in combination with other resins, the content of the acrylic resin in the blend of the acrylic resin and other resins is preferably 50% by weight to 100% by weight, more preferably 60% by weight to 100% by weight, further preferably 70% by weight to 100% by weight, and particularly preferably 80% by weight to 100% by weight. When the content is less than 50% by weight, there is a risk that the higher heat resistance and higher transparency of the acrylic resin itself cannot be fully reflected. B-3. Core-shell particles In the above-mentioned substrate film, the core-shell particles are preferably formulated at 5 to 50 parts by weight, and more preferably 5 to 40 parts by weight, relative to 100 parts by weight of the acrylic resin. Thereby, the dimensional change rate of the substrate film can be reduced. As a result, the shrinkage in the state where the surface treatment layer is formed can be suppressed, and an optical film with high adhesion between the substrate film and the surface treatment layer can be obtained. The core-shell particles typically have a core containing a rubber-like polymer, and a coating layer containing a glass-like polymer and coating the core. The core-shell particles have one or more layers containing a glass-like polymer as the innermost layer or the middle layer. The Tg of the rubbery polymer constituting the core is preferably below 20°C, more preferably -60°C to 20°C, and further preferably -60°C to 10°C. If the Tg of the rubbery polymer constituting the core exceeds 20°C, there is a possibility that the mechanical strength of the acrylic resin will not be sufficiently improved. The Tg of the glassy polymer (hard polymer) constituting the coating layer is preferably above 50°C, more preferably 50°C to 140°C, and further preferably 60°C to 130°C. If the Tg of the glassy polymer constituting the coating layer is lower than 50°C, there is a possibility that the heat resistance of the acrylic resin will be reduced. The content ratio of the core in the core-shell type particles is preferably 30% by weight to 95% by weight, and further preferably 50% by weight to 90% by weight. The ratio of the glassy polymer layer in the core is 0-60% by weight, preferably 0-45% by weight, and more preferably 10%-40% by weight, relative to the total amount of the core (100% by weight). The content ratio of the coating layer in the core-shell particles is preferably 5%-70% by weight, and more preferably 10%-50% by weight. In one embodiment, the core-shell particles dispersed in the acrylic resin may have a flat shape. The core-shell particles may be flattened by the extension described in item B-4 below. The length/thickness ratio of the flattened core-shell particles is 7.0 or less. The length/thickness ratio is preferably 6.5 or less, and more preferably 6.3 or less. On the other hand, the length/thickness ratio is preferably 4.0 or more, more preferably 4.5 or more, and further preferably 5.0 or more. In this specification, the so-called "ratio of length/thickness" means the ratio of the representative length of the top-view shape of the core-shell particle to the thickness. Here, the so-called "representative length" refers to the diameter when the top-view shape is circular, the major diameter when it is elliptical, and the length of the diagonal when it is rectangular or polygonal. The ratio can be calculated according to the following procedure. The obtained film cross section is photographed using a transmission electron microscope (for example, accelerating voltage 80 kV, RuO4 staining ultrathin section method), and 30 of the longer core-shell particles (those with cross sections close to the representative length) in the obtained photograph are selected in sequence, and the (average value of length)/(average value of thickness) is calculated to obtain the ratio. The rubbery polymer constituting the core of the core-shell type particles, the glassy polymer (hard polymer) constituting the coating layer, the polymerization method thereof, and other detailed contents of the composition are described, for example, in Japanese Patent Publication No. 2016-33552. The description of the publication is cited in this specification as a reference. B-4. Formation of substrate film The substrate film of the embodiment of the present invention can be formed by a method of forming a film of a composition containing the above-mentioned acrylic resin (when other resins are used in combination, it is a blend with the other resins) and core-shell type particles. Furthermore, the method of forming the substrate film may include extending the above-mentioned film. The average particle size of the core-shell particles used for film formation is preferably 1 nm to 500 nm. The average particle size of the core is preferably 50 nm to 300 nm, more preferably 70 nm to 300 nm. Any suitable method can be used as a method for forming a film. As specific examples, there can be listed: flow casting coating method (for example, cast film method), extrusion molding method, injection molding method, compression molding method, transfer molding method, blow molding method, powder molding method, FRP (Fiber Reinforced Plastic) molding method, calendering molding method, hot pressing method. Extrusion molding method or flow casting coating method is preferred. The reason is that the smoothness of the obtained film can be improved and good optical uniformity can be obtained. Extrusion molding method is particularly preferred. The reason is that there is no need to consider the problem caused by residual solvent. Among them, the extrusion molding method using a T-die is better from the viewpoint of the productivity of the film and the ease of subsequent stretching treatment. The molding conditions can be appropriately set according to the composition or type of the resin used, the expected properties of the obtained film, etc. As a stretching method, any appropriate stretching method and stretching conditions (for example, stretching temperature, stretching ratio, stretching speed, stretching direction) can be adopted. As specific examples of stretching methods, free end stretching, fixed end stretching, free end shrinkage, and fixed end shrinkage can be listed. These can be used alone, at the same time, or in sequence. By stretching a film in which the amount of core-shell particles relative to the acrylic resin has been appropriately adjusted under appropriate stretching conditions, the dimensional change rate of the obtained substrate film can be reduced. As a result, shrinkage in a state where a surface treatment layer is formed can be suppressed, and an optical film with high adhesion between the base film and the surface treatment layer can be obtained. The stretching direction can be an appropriate direction depending on the purpose. Specifically, it can be listed as: length direction, width direction, thickness direction, oblique direction. The stretching direction can be one direction (uniaxial stretching), two directions (biaxial stretching), or three or more directions. In the embodiment of the present invention, representatively, uniaxial stretching in the length direction, simultaneous biaxial stretching in the length direction and the width direction, and sequential biaxial stretching in the length direction and the width direction can be adopted. Biaxial stretching (simultaneously or sequentially) is preferred. The reason is that it is easy to control the in-plane phase difference and easy to achieve optical isotropy. The stretching temperature may vary according to the optical properties, mechanical properties and thickness expected of the substrate film, the type of resin used, the thickness of the film used, the stretching method (uniaxial stretching or biaxial stretching), the stretching ratio, the stretching speed, etc. Specifically, the stretching temperature is preferably Tg~Tg+50℃, more preferably Tg+15℃~Tg+50℃, and most preferably Tg+35℃~Tg+50℃. By stretching at such a temperature, a substrate film with suitable properties can be obtained. The specific stretching temperature is, for example, 110℃~200℃, preferably 120℃~190℃, and more preferably 150℃~190℃. If the stretching temperature is within this range, by appropriately adjusting the stretching ratio and the stretching speed, the film in which the amount of the shell-type particles is appropriately adjusted can be stretched under appropriate stretching conditions, thereby reducing the dimensional change rate of the obtained base film. As a result, the shrinkage in the state where the surface treatment layer is formed can be suppressed, and an optical film with high adhesion between the base film and the surface treatment layer can be obtained. In addition, the stretching ratio can also be changed according to the optical properties, mechanical properties and thickness, the type of resin used, the thickness of the film used, the stretching method (uniaxial stretching or biaxial stretching), the stretching temperature, the stretching speed, etc., just like the stretching temperature. When biaxial stretching is used, the ratio of the stretching ratio in the width direction (TD) to the stretching ratio in the length direction (MD) (TD/MD) is preferably 1.0 to 1.5, more preferably 1.0 to 1.4, and further preferably 1.0 to 1.3. In addition, the surface ratio (the product of the stretching ratio in the length direction and the stretching ratio in the width direction) when biaxial stretching is used is preferably 2.0 to 6.0, more preferably 3.0 to 5.5, and further preferably 3.5 to 5.2. If the stretching ratio is within this range, the dimensional change rate of the obtained substrate film can be reduced by appropriately adjusting the stretching temperature and the stretching speed. As a result, shrinkage in a state where a surface treatment layer is formed can be suppressed, and an optical film with a high degree of adhesion between the substrate film and the surface treatment layer can be obtained. In addition, the stretching speed can also vary according to the optical properties, mechanical properties and thickness, the type of resin used, the thickness of the film used, the stretching method (uniaxial stretching or biaxial stretching), the stretching temperature, the stretching ratio, etc., just like the stretching temperature. The stretching speed is preferably 3%/second to 20%/second, more preferably 3%/second to 15%/second, and further preferably 3%/second to 10%/second. When biaxial stretching is adopted, the stretching speed in one direction may be the same as or different from the stretching speed in the other direction. If the stretching speed is within this range, the dimensional change rate of the obtained substrate film can be reduced by appropriately adjusting the stretching temperature and the stretching ratio. As a result, shrinkage in a state where the surface treatment layer is formed can be suppressed, and an optical film with high adhesion between the substrate film and the surface treatment layer can be obtained. The substrate film can be formed in the above manner. C. Surface treatment layer The surface treatment layer is any suitable functional layer formed on one side of the substrate film according to the function required for the optical film. Specific examples of the surface treatment layer include a hard coating layer, an anti-glare layer, and an anti-reflection layer. The thickness of the surface treatment layer is preferably 3 μm to 20 μm, and more preferably 5 μm to 15 μm. The surface treatment layer is typically a hardened layer of a resin composition formed on the substrate film. The step of forming the surface treatment layer may include: coating a resin composition for forming the surface treatment layer on the substrate film to form the coating layer; and drying the coating layer to harden it to form the surface treatment layer. Drying the coating layer to harden it may include heating the coating layer. As a coating method of the resin composition, any suitable method may be adopted. For example, the following methods may be listed: rod coating method, roller coating method, gravure coating method, rod coating method, hole coating method, curtain coating method, spray coating method, and notch wheel coating method. From the viewpoint of facilitating coating, the resin composition preferably contains a solvent for dilution. The heating temperature of the coating layer can be set to any appropriate temperature corresponding to the composition of the resin composition, and is preferably set to a temperature below the glass transition temperature of the acrylic resin contained in the substrate film. If the heating is performed at a temperature below the glass transition temperature of the acrylic resin contained in the substrate film, an optical film in which deformation due to heating is suppressed can be obtained. The heating temperature of the coating layer is, for example, 50°C to 140°C, and preferably 60°C to 100°C. By heating at such a heating temperature, an optical film having excellent adhesion between the substrate film and the surface treatment layer can be obtained. C-1. Hard coating layer The hard coating layer is a layer that imparts abrasion resistance and chemical resistance to the surface of the base film. The hard coating layer preferably has a hardness of H or more, more preferably 3H or more in a pencil hardness test. The pencil hardness test can be measured in accordance with JIS K 5400. The resin composition used to form the hard coating layer may contain, for example, a curable compound that can be cured by heat, light (ultraviolet rays, etc.) or electron beams. The details of the hard coating layer and the resin composition used to form the hard coating layer are described, for example, in Japanese Patent Publication No. 2014-240955. All the contents of the publication are cited in this specification as a reference. C-2. Anti-glare layer The anti-glare layer is a layer used to prevent external light from being reflected by scattering and reflecting light. The resin composition used to form the anti-glare layer may contain, for example, a curable compound that can be cured by heat, light (ultraviolet rays, etc.) or electron beams. The anti-glare layer typically has a fine concave-convex shape on the surface. As a method for forming such a fine concave-convex shape, for example, a method of making the above-mentioned curable compound contain microparticles can be cited. The details of the anti-glare layer and the resin composition used to form the anti-glare layer are described in, for example, Japanese Patent Gazette No. 2017-32711. All the records in the gazette are cited in this specification as a reference. C-3. Anti-reflection layer The anti-reflection layer is a layer used to prevent the reflection of external light. The resin composition used to form the anti-reflection layer may contain, for example, a curable compound that can be cured by heat, light (ultraviolet rays, etc.) or electron beams, etc. The anti-reflection layer may be a single layer consisting of only one layer, or may be a plurality of layers including two or more layers. The details of the anti-reflection layer and the resin composition used to form the anti-reflection layer are described, for example, in Japanese Patent Gazette No. 2012-155050. All the records in the gazette are cited in this specification as a reference. D. Polarizing Plate The optical film described in Items A to C above can be applied to a polarizing plate. Therefore, the present invention also includes a polarizing plate using such an optical film. Typically, the polarizing plate has a polarizing element, and the optical film of the present invention disposed on one side of the polarizing element. For the optical film, the substrate film side thereof can be bonded to the polarizing element, and the film can function as a protective layer of the polarizing element. As the polarizing element, any suitable polarizing element can be used. For example, the resin film forming the polarizing element can be a single-layer resin film, or a laminate of two or more layers. Specific examples of polarizing elements including a single-layer resin film include: hydrophilic polymer films such as polyvinyl alcohol (PVA) films, partially formalized PVA films, and partially saponified films of ethylene-vinyl acetate copolymers, which are dyed and stretched using dichroic substances such as iodine or dichroic dyes; polyene-based alignment films such as dehydrated PVA films or dehydrochlorinated polyvinyl chloride films, etc. In terms of excellent optical properties, it is preferable to use a polarizing element obtained by dyeing a PVA film with iodine and uniaxially stretching it. The above-mentioned dyeing with iodine is performed, for example, by immersing the PVA film in an iodine aqueous solution. The stretching ratio of the above-mentioned uniaxial stretching is preferably 3 to 7 times. Stretching can be performed after the dyeing treatment, or it can be performed while dyeing. In addition, dyeing can also be performed after stretching. The PVA film is subjected to swelling treatment, crosslinking treatment, cleaning treatment, drying treatment, etc. as needed. For example, by immersing the PVA film in water and washing it before dyeing, not only can the dirt or anti-adhesion agent on the surface of the PVA film be washed, but the PVA film can also be swelled to prevent uneven dyeing. As specific examples of polarizing elements obtained using a laminate, there can be cited a laminate of a resin substrate and a PVA-based resin layer (PVA-based resin film) laminated on the resin substrate, or a laminate of a resin substrate and a PVA-based resin layer coated on the resin substrate. A polarizing element obtained by using a laminate of a resin substrate and a PVA-based resin layer coated on the resin substrate can be produced, for example, by the following method: a PVA-based resin solution is coated on the resin substrate, and the PVA-based resin layer is formed on the resin substrate by drying, thereby obtaining a laminate of the resin substrate and the PVA-based resin layer; the laminate is stretched and dyed to make the PVA-based resin layer into a polarizing element. In this embodiment, stretching typically includes immersing the laminate in a boric acid aqueous solution for stretching. Furthermore, stretching can further include stretching the laminate in the air at a high temperature (e.g., above 95° C.) before stretching in the boric acid aqueous solution, as needed. The obtained resin substrate/polarizing element laminate can be used directly (that is, the resin substrate can be set as a protective layer of the polarizing element), or the resin substrate can be peeled off from the resin substrate/polarizing element laminate and used on any suitable protective layer that meets the purpose on the peeled area layer. The details of the manufacturing method of such a polarizing element are described, for example, in Japanese Patent Publication No. 2012-73580. All the records in the publication are cited in this specification as a reference. The thickness of the polarizing element is, for example, 1 μm~80 μm. In one embodiment, the thickness of the polarizing element is preferably 1 μm~20 μm, and more preferably 3 μm~15 μm. E. Image display device The polarizing plate described in the above item D can be applied to an image display device. Therefore, the present invention also includes an image display device using such a polarizing plate. As representative examples of image display devices, there can be cited: a liquid crystal display device and an organic electroluminescent (EL) display device. The image display device adopts a structure well known in the industry, so a detailed description is omitted. Embodiments The present invention is specifically described below by using embodiments, but the present invention is not limited to these embodiments. The measurement method of each characteristic is described below. Furthermore, unless otherwise specifically stated, the "parts" and "%" in the embodiments are based on weight. (1) Dimensional change rate of substrate film The substrate film is cut into 10 cm×10 cm along its long side and short side directions to prepare a measurement sample. The above-mentioned test sample was bonded to a glass plate via an adhesive, placed in an environmental tester at 100°C for 120 hours, and the dimensional change rate of the substrate film was measured using QVA606-PRO-AE10 manufactured by Mitutoyo. The test sample and the glass plate were bonded using an adhesive containing 95 parts of butyl acrylate, 5 parts of acrylic acid, 0.1 parts of 2-hydroxyethyl acrylate, and 0.05 parts of 2-2-azobisisobutyronitrile. Furthermore, the dimensional change rate was measured for the test sample after being placed in the environmental tester, along a direction parallel to the cut surface (each side of the test sample) at a position 1 cm from the inner side of the end, and the dimensional change rate was calculated using the following formula. The dimensional change rate in the direction corresponding to the long side direction of the substrate film and the dimensional change rate in the direction corresponding to the short side direction were measured separately. Dimensional change rate (%) = (dimension after 120 hours at 100°C - initial dimension) / initial dimension × 100 (2) Evaluation of adhesion The adhesion of the surface treatment layer to the substrate film was evaluated according to the grid peeling test (grid number: 100) of JIS K-5400, and the following indexes were used to determine the adhesion. : Grid peeling number is 0 Δ: Grid peeling number is 1 or more and less than 10 ×: Grid peeling number is 10 or more <Production Example 1> The following compositions A to C were prepared as resin compositions for forming a surface treatment layer. (1) Composition A 16 parts by weight of 4-HBA (4-hydroxybutyl acrylate) (manufactured by Osaka Organic Chemical Industry Co., Ltd.), 32 parts by weight of NK oligomer UA-53H-80BK (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), 48 parts by weight of Viscoat #300 (manufactured by Osaka Organic Chemical Industry Co., Ltd.), 4 parts by weight of A-GLY-9E (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), and 2.4 parts by weight of IRGACURE 907 (manufactured by BASF) were mixed and diluted with a solvent of MIBK (methyl isobutyl ketone) and PGM (propylene glycol monomethylether) in a ratio of 50:50 to give a solid content concentration of 42.0% to obtain a UV curable resin. (2) Composition B 100 parts by weight of Viscoat #300 (manufactured by Osaka Organic Chemical Industry Co., Ltd.) and 2.4 parts by weight of IRGACURE 907 (manufactured by BASF) were mixed and diluted with a solvent of MIBK:PGM=50:50 to a solid content concentration of 42.0% to obtain a UV curable resin. (3) Composition C 20 parts by weight of 4-HBA (manufactured by Osaka Organic Chemical Industry Co., Ltd.), 40 parts by weight of NK oligomer UA-53H-80BK (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), 60 parts by weight of Viscoat #300 (manufactured by Osaka Organic Chemical Industry Co., Ltd.), 5 parts by weight of IRGACURE 907 (manufactured by BASF), and 0.5 parts by weight of Techpolymer SSX-103DXE (manufactured by Sekisui Chemicals Co., Ltd.) were mixed and diluted with a solvent of toluene:MEK (methyl ethyl ketone) = 70:30 to give a solid content concentration of 40.0% to obtain a UV curable resin. <Example 1> 1. Preparation of substrate film An MS resin (MS-200; copolymer of methyl methacrylate/styrene (molar ratio) = 80/20, manufactured by Nippon Steel Chemical Co., Ltd.) was imidized with monomethylamine (imidization rate: 5%). The imidized MS resin obtained has a pentylene imide unit represented by the general formula (1) (R 1 and R 3 are methyl groups, R 2 is a hydrogen atom), a (meth)acrylate unit represented by the general formula (2) (R 4 and R 5 are methyl groups), and a styrene unit. The imidization was carried out using a 15 mm diameter, unidirectional rotary double-spindle extruder. The set temperature of each temperature adjustment zone of the extruder is set to 230°C, the screw speed is set to 150 rpm, and the MS resin is supplied at 2.0 kg/hr. The supply amount of monomethylamine is set to 2 parts by weight relative to 100 parts by weight of MS resin. The MS resin is added from the hopper, and after the resin is melted and filled by the kneading section, monomethylamine is injected from the nozzle. A sealing ring is installed at the end of the reaction zone to fill the resin. The pressure of the exhaust port is reduced to -0.08 MPa to remove volatiles from the by-products and excess methylamine after the reaction. The resin discharged from the mold installed at the outlet of the extruder in the form of strands is cooled in a water tank and then granulated by a granulator. The imidization rate of the imidized MS resin obtained is 5.0%, and the acid value is 0.5 mmol/g. 100 parts by weight of the imidized MS resin obtained above and 10 parts by weight of the core-shell particles are put into a uniaxial extruder for melt mixing, and a film is formed through a T-die to obtain an extruded film. The extruded film obtained is biaxially stretched to 2 times in the length direction and the width direction at a stretching temperature of 160°C. The stretching speed is 10%/second in both the length direction and the width direction. Thus, a substrate film A is prepared. The thickness of the obtained substrate film A is 40 μm. The dimensional change rate in the long side direction and the dimensional change rate in the short side direction of the substrate film A are measured. The results are shown in Table 1. 2. Preparation of optical film Composition A is applied on one side of the substrate film A to form a coating layer in such a manner that the thickness after curing becomes 6 μm. Subsequently, the coating layer is dried at 70°C and UV cured to obtain an optical film 1 having a hard coating layer formed on one side of the substrate film A. The optical film 1 is subjected to adhesion evaluation. The results are shown in Table 1. <Example 2> 1. Preparation of substrate film 100 parts by weight of the imidized MS resin obtained above and 10 parts by weight of core-shell particles are put into a uniaxial extruder for melt mixing, and a film is formed by passing through a T-die to obtain an extruded film. The extruded film obtained was biaxially stretched to 2 times in both the length direction and the width direction at a stretching temperature of 160°C. The stretching speed was 10%/sec in both the length direction and the width direction. Thus, a substrate film B was prepared. The thickness of the obtained substrate film B was 35 μm. The dimensional change rate in the long side direction and the dimensional change rate in the short side direction of the substrate film B were measured. The results are shown in Table 1. 2. Preparation of optical film In addition to using the above-mentioned substrate film B, an optical film 2 having a hard coating layer formed on one side of the substrate film B was obtained in the same manner as in Example 1. The above-mentioned optical film 2 was provided for adhesion evaluation. The results are shown in Table 1. <Example 3> 1. Preparation of substrate film The imidized MS resin obtained above is put into a uniaxial extruder for melt mixing, and a film is formed through a T-die to obtain an extruded film. The extruded film obtained is biaxially stretched to 2 times in both the length direction and the width direction at a stretching temperature of 160°C. The stretching speed is 10%/sec in both the length direction and the width direction. In this way, a substrate film C is prepared. The thickness of the obtained substrate film C is 30 μm. The dimensional change rate in the long side direction and the dimensional change rate in the short side direction of the substrate film C are measured. The results are shown in Table 1. 2. Preparation of optical film Except for using the above-mentioned substrate film C, an optical film 3 having a hard coating layer formed on one side of the substrate film C is obtained in the same manner as in Example 1. The above-mentioned optical film 3 is provided for adhesion evaluation. The results are shown in Table 1. <Example 4> 1. Preparation of substrate film Except for setting the formulation amount of core-shell type particles to 10 parts by weight, a substrate film D is prepared in the same manner as in Example 3. The dimensional change rate in the long side direction and the dimensional change rate in the short side direction of the substrate film D are measured. The results are shown in Table 1. 2. Preparation of optical film Except for using the above-mentioned substrate film D, an optical film 4 having a hard coating layer formed on one side of the substrate film D is obtained in the same manner as in Example 1. The above-mentioned optical film 4 is provided for adhesion evaluation. The results are shown in Table 1. <Example 5> In the same manner as in Example 4, an optical film 5 having a hard coating layer formed on one side of the substrate film D was obtained except that the composition B was applied to one side of the substrate film D and dried to cure. The optical film 5 was subjected to an adhesiveness evaluation. The results are shown in Table 1. <Example 6> In the same manner as in Example 4, an optical film 6 having an anti-glare layer formed on one side of the substrate film D was obtained except that the composition C was applied to one side of the substrate film D and cured to form an anti-glare layer. The optical film 6 was subjected to an adhesiveness evaluation. The results are shown in Table 1. <Example 7> 1. Preparation of substrate film The amount of core-shell particles was set to 10 parts by weight, and the stretching temperature of the extruded film was set to 150°C. Substrate film E was prepared in the same manner as in Example 3. The dimensional change rate in the long side direction and the dimensional change rate in the short side direction of substrate film E were measured. The results are shown in Table 1. 2. Preparation of optical film In addition to using the above-mentioned substrate film E, an optical film 7 having a hard coating layer formed on one side of substrate film E was obtained in the same manner as in Example 1. The above-mentioned optical film 7 was subjected to adhesion evaluation. The results are shown in Table 1. <Example 8> 1. Preparation of substrate film A substrate film F is prepared in the same manner as Example 3, except that the amount of core-shell particles is set to 15 parts by weight and the stretching temperature of the extruded film is set to 152°C. The dimensional change rate in the long side direction and the dimensional change rate in the short side direction of the substrate film F are measured. The results are shown in Table 1. 2. Preparation of optical film An optical film 8 having a hard coating layer formed on one side of the substrate film F is obtained in the same manner as Example 1, except that the above-mentioned substrate film F is used. The above-mentioned optical film 8 is provided for adhesion evaluation. The results are shown in Table 1. <Example 9> 1. Preparation of substrate film A substrate film G is prepared in the same manner as Example 3, except that the stretching temperature of the extruded film is set to 155°C. The dimensional change rate of the substrate film G in the long side direction and the dimensional change rate in the short side direction were measured. The results are shown in Table 1. 2. Preparation of optical film An optical film 9 having a hard coating layer formed on one side of the substrate film G was obtained in the same manner as in Example 1 except that the above-mentioned substrate film G was used. The above-mentioned optical film 9 was subjected to adhesion evaluation. The results are shown in Table 1. <Example 10> 1. Preparation of substrate film A substrate film H was prepared in the same manner as in Example 3 except that the amount of core-shell particles was set to 10 parts by weight and the stretching temperature of the extruded film was set to 140°C. The dimensional change rate of the substrate film H in the long side direction and the dimensional change rate in the short side direction were measured. The results are shown in Table 1. 2. Preparation of optical film In addition to using the above-mentioned substrate film H, an optical film 10 having a hard coating layer formed on one side of the substrate film H is obtained in the same manner as in Example 1. The above-mentioned optical film 10 is provided for adhesion evaluation. The results are shown in Table 1. <Example 11> 1. Preparation of substrate film In addition to setting the formulation amount of core-shell particles to 23 parts by weight and setting the stretching temperature of the extruded film to 152°C, a substrate film I is prepared in the same manner as in Example 3. The dimensional change rate in the long side direction and the dimensional change rate in the short side direction of the substrate film I are measured. The results are shown in Table 1. 2. Preparation of optical film In addition to using the above-mentioned substrate film I, an optical film 11 having a hard coating layer formed on one side of the substrate film I is obtained in the same manner as in Example 1. The optical film 11 was subjected to an evaluation of adhesion. The results are shown in Table 1. <Example 12> 1. Preparation of substrate film The amount of core-shell particles was set to 5 parts by weight, and the stretching temperature of the extruded film was set to 140°C. A substrate film J was prepared in the same manner as in Example 3. The dimensional change rate in the long side direction and the dimensional change rate in the short side direction of the substrate film J were measured. The results are shown in Table 1. 2. Preparation of optical film An optical film 12 having a hard coating layer formed on one side of the substrate film J was obtained in the same manner as in Example 1, except that the substrate film J was used. The optical film 12 was subjected to an evaluation of adhesion. The results are shown in Table 1. <Example 13> 1. Preparation of substrate film A substrate film K is prepared in the same manner as Example 3, except that the amount of core-shell particles is set to 23 parts by weight and the stretching temperature of the extruded film is set to 140°C. The dimensional change rate in the long side direction and the dimensional change rate in the short side direction of the substrate film K are measured. The results are shown in Table 1. 2. Preparation of optical film An optical film 13 having a hard coating layer formed on one side of the substrate film K is obtained in the same manner as Example 1, except that the above-mentioned substrate film K is used. The above-mentioned optical film 13 is provided for adhesion evaluation. The results are shown in Table 1. <Example 14> 1. Preparation of substrate film A substrate film L is prepared in the same manner as Example 3, except that the stretching temperature of the extruded film is set to 150°C. The dimensional change rate of the substrate film L in the long side direction and the dimensional change rate in the short side direction were measured. The results are shown in Table 1. 2. Preparation of optical film An optical film 14 having a hard coating layer formed on one side of the substrate film L was obtained in the same manner as in Example 1 except that the above-mentioned substrate film L was used. The above-mentioned optical film 14 was provided for adhesion evaluation. The results are shown in Table 1. <Comparative Example 1> 1. Preparation of substrate film A substrate film M was prepared in the same manner as in Example 3 except that the stretching temperature of the extruded film was set to 130°C. The dimensional change rate of the substrate film M in the long side direction and the dimensional change rate in the short side direction were measured. The results are shown in Table 1. 2. Preparation of optical film Except for using the above-mentioned substrate film M, an optical film 15 having a hard coating layer formed on one side of the substrate film M is obtained in the same manner as in Example 1. The above-mentioned optical film 15 is provided for adhesion evaluation. The results are shown in Table 1. <Comparative Example 2> 1. Preparation of substrate film Except for setting the stretching temperature of the extruded film to 140°C, a substrate film N is prepared in the same manner as in Example 3. The dimensional change rate in the long side direction and the dimensional change rate in the short side direction of the substrate film N are measured. The results are shown in Table 1. 2. Preparation of optical film Except for using the above-mentioned substrate film N, an optical film 16 having a hard coating layer formed on one side of the substrate film N is obtained in the same manner as in Example 1. The above-mentioned optical film 16 is provided for adhesion evaluation. The results are shown in Table 1. <Comparative Example 3> In addition to forming a hard coating layer by coating composition B on one side of the above-mentioned substrate film N and drying and hardening it, an optical film 17 having a hard coating layer formed on one side of the substrate film N was obtained in the same manner as in Comparative Example 2. The optical film 17 was subjected to an adhesion evaluation. The results are shown in Table 1. <Comparative Example 4> In addition to forming an anti-glare layer by coating composition C on one side of the above-mentioned substrate film N and drying and hardening it, an optical film 18 having an anti-glare layer formed on one side of the substrate film N was obtained in the same manner as in Comparative Example 2. The optical film 18 was subjected to an adhesion evaluation. The results are shown in Table 1. <Comparative Example 5> 1. Preparation of substrate film The amount of core-shell particles was set to 3 parts by weight, and the stretching temperature of the extruded film was set to 140°C. In addition, a substrate film O was prepared in the same manner as in Example 3. The dimensional change rate in the long side direction and the dimensional change rate in the short side direction of the substrate film O were measured. The results are shown in Table 1. 2. Preparation of optical film In addition to using the above-mentioned substrate film O, an optical film 19 having a hard coating layer formed on one side of the substrate film O was obtained in the same manner as in Example 1. The above-mentioned optical film 19 was provided for adhesion evaluation. The results are shown in Table 1. [Table 1] According to Table 1, the optical films of Examples 1 to 14 using substrate films with a dimensional change rate in the long side direction and a dimensional change rate in the short side direction of -2.0% to 0% have a higher adhesion of the surface treatment layer to the substrate film. [Industrial Applicability] The optical film of the present invention can be suitably used as a protective layer of a polarizing element. A polarizing plate having the optical film of the present invention as a protective layer can be suitably used in an image display device. The image display device as described above can be used for: portable devices such as portable information terminals (PDAs), smart phones, mobile phones, clocks, digital cameras, portable game consoles, etc.; OA devices such as computer monitors, laptops, and copiers; home electrical appliances such as video recorders, televisions, and microwave ovens; vehicle-mounted devices such as rear monitors, monitors for car navigation systems, and car stereos; display devices such as digital signs and information displays for commercial stores; security devices such as surveillance monitors; nursing and medical devices such as nursing monitors and medical monitors, etc.

10‧‧‧基材膜20‧‧‧表面處理層100‧‧‧光學膜10‧‧‧Substrate film 20‧‧‧Surface treatment layer 100‧‧‧Optical film

圖1係本發明之一實施形態之光學膜之概略剖視圖。FIG. 1 is a schematic cross-sectional view of an optical film according to an embodiment of the present invention.

10‧‧‧基材膜 10‧‧‧Substrate film

20‧‧‧表面處理層 20‧‧‧Surface treatment layer

100‧‧‧光學膜 100‧‧‧Optical film

Claims (7)

一種光學膜,其係包含作為含有丙烯酸系樹脂之延伸膜之基材膜、及形成於該基材膜之單側之表面處理層者,上述光學膜中之基材膜於在裁斷為10cm×10cm並經由黏著材貼合於玻璃板之狀態下在100℃下靜置120小時之時之尺寸變化率為-2.0%~0%,且上述表面處理層係塗佈於上述基材膜上之樹脂組合物之硬化層。 An optical film, which includes a base film as a stretched film containing an acrylic resin, and a surface treatment layer formed on one side of the base film, wherein the base film in the optical film is cut to 10 cm× 10cm and attached to the glass plate through an adhesive material, the dimensional change rate when left to stand at 100°C for 120 hours is -2.0%~0%, and the above-mentioned surface treatment layer is coated on the above-mentioned base film Hardened layer of resin composition. 如請求項1之光學膜,其中上述基材膜含有上述丙烯酸系樹脂、及分散至該丙烯酸系樹脂中之芯殼型粒子。 The optical film of claim 1, wherein the base film contains the acrylic resin and core-shell particles dispersed in the acrylic resin. 如請求項2之光學膜,其中上述基材膜相對於上述丙烯酸系樹脂100重量份而含有上述芯殼型粒子5重量份~50重量份。 The optical film of claim 2, wherein the base film contains 5 to 50 parts by weight of the core-shell particles based on 100 parts by weight of the acrylic resin. 如請求項1至3中任一項之光學膜,其中上述丙烯酸系樹脂具有選自由戊二醯亞胺單元、內酯環單元、順丁烯二酸酐單元、順丁烯二醯亞胺單元及戊二酸酐單元所組成之群中之至少一種。 The optical film according to any one of claims 1 to 3, wherein the acrylic resin has a component selected from the group consisting of glutadiyl imine units, lactone ring units, maleic anhydride units, maleic imine units, and At least one of the group consisting of glutaric anhydride units. 如請求項1至3中任一項之光學膜,其中上述表面處理層係選自由硬塗層、防眩層及抗反射層所組成之群中之至少一種。 An optical film as claimed in any one of claims 1 to 3, wherein the surface treatment layer is at least one selected from the group consisting of a hard coating layer, an anti-glare layer and an anti-reflection layer. 一種偏光板,其包含偏光元件、及配置於該偏光元件之單側之保護 層,且上述保護層為如請求項1至5中任一項之光學膜。 A polarizing plate, which includes a polarizing element and a protection arranged on one side of the polarizing element. layer, and the above-mentioned protective layer is an optical film according to any one of claims 1 to 5. 一種圖像顯示裝置,其具備如請求項6之偏光板。 An image display device provided with the polarizing plate of claim 6.
TW107112247A 2017-04-10 2018-04-10 Optical films, polarizing plates, and image display devices TWI835728B (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016185722A1 (en) 2015-05-21 2016-11-24 株式会社日本触媒 Resin composition and film

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016185722A1 (en) 2015-05-21 2016-11-24 株式会社日本触媒 Resin composition and film

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