TWI766004B - Optical laminate, polarizing plate, and image display device - Google Patents

Optical laminate, polarizing plate, and image display device Download PDF

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TWI766004B
TWI766004B TW107112246A TW107112246A TWI766004B TW I766004 B TWI766004 B TW I766004B TW 107112246 A TW107112246 A TW 107112246A TW 107112246 A TW107112246 A TW 107112246A TW I766004 B TWI766004 B TW I766004B
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base film
surface treatment
layer
acrylic resin
treatment layer
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TW201843043A (en
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平岡慎哉
岸敦史
上野友德
茂手木佑輔
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日商日東電工股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/308Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/02Physical, chemical or physicochemical properties
    • B32B7/023Optical properties
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2270/00Resin or rubber layer containing a blend of at least two different polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/418Refractive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/40Properties of the layers or laminate having particular optical properties
    • B32B2307/42Polarizing, birefringent, filtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

本發明提供一種外觀可優異之光學積層體。本發明之光學積層體包含含有丙烯酸系樹脂之基材膜、及形成於基材膜之單側之表面處理層,且構成自基材膜側起沿表面處理層方向之深度3.0 μm之位置之成分中溶出至表面處理層之丙烯酸系樹脂之成分之比率為18%以上。The present invention provides an optical laminate having excellent appearance. The optical layered product of the present invention includes a base film containing an acrylic resin, and a surface treatment layer formed on one side of the base film, and constitutes a position at a depth of 3.0 μm in the direction of the surface treatment layer from the base film side. Among the components, the ratio of the components of the acrylic resin eluted to the surface treatment layer is 18% or more.

Description

光學積層體、偏光板、及圖像顯示裝置Optical laminate, polarizing plate, and image display device

本發明係關於一種光學積層體、偏光板、及圖像顯示裝置。The present invention relates to an optical laminate, a polarizing plate, and an image display device.

近年來,已知有於包含丙烯酸系樹脂之基材膜之單側形成有硬塗層、防眩層、抗反射層等功能性層(表面處理層)之光學積層體(專利文獻1)。此種光學積層體例如可用作偏光元件之保護膜、或圖像顯示裝置之前面板。 先前技術文獻 專利文獻In recent years, there has been known an optical laminate in which functional layers (surface treatment layers) such as a hard coat layer, an antiglare layer, and an antireflection layer are formed on one side of a base film containing an acrylic resin (Patent Document 1). Such an optical laminate can be used, for example, as a protective film of a polarizing element or a front panel of an image display device. Prior Art Documents Patent Documents

專利文獻1:日本專利特開2016-218478號公報Patent Document 1: Japanese Patent Laid-Open No. 2016-218478

[發明所欲解決之問題][Problems to be Solved by Invention]

然而,如上所述之先前之光學積層體於丙烯酸系樹脂膜產生損傷之情形時,存在因形成表面處理層導致該損傷明顯化之問題。此種現象即便在丙烯酸系樹脂膜上所產生之損傷微細至無法目視到之程度之情況下亦會發生,無法目視到之損傷於所獲得之光學積層體中可成為可目視到之外觀不良之原因。However, in the case where the acrylic resin film is damaged in the conventional optical laminate as described above, there is a problem that the damage becomes apparent due to the formation of the surface treatment layer. This phenomenon occurs even when the damage generated on the acrylic resin film is so small that it cannot be seen visually, and the unobservable damage can become a visually poor appearance in the optical laminate obtained. reason.

本發明係為了解決上述先前之課題而完成者,其主要目的在於提供一種外觀可優異之光學積層體、具備此種光學積層體之偏光板、及具備此種偏光板之圖像顯示裝置。 [解決問題之技術手段]The present invention has been accomplished in order to solve the aforementioned problems, and its main object is to provide an optical laminate having excellent appearance, a polarizing plate including such an optical laminate, and an image display device including such a polarizing plate. [Technical means to solve problems]

本發明之光學積層體包含含有丙烯酸系樹脂之基材膜、及形成於上述基材膜之單側之表面處理層,且構成自上述基材膜側起沿上述表面處理層方向之深度3.0 μm之位置之成分中溶出至表面處理層之丙烯酸系樹脂之成分之比率為18%以上。 於一實施形態中,於將上述基材膜之折射率設為R1,將上述表面處理層之折射率設為R2,將自上述基材膜側起沿上述表面處理層方向之深度3.0 μm之位置之折射率設為R3時,滿足R3≦0.18R1+0.82R2(其中,設為R1<R2)。 於一實施形態中,上述表面處理層之厚度為3 μm~20 μm。 於一實施形態中,上述基材膜含有上述丙烯酸系樹脂與分散至上述丙烯酸系樹脂中之芯殼型粒子。 於一實施形態中,上述基材膜相對於上述丙烯酸系樹脂100重量份而含有上述芯殼型粒子3重量份~50重量份。 於一實施形態中,上述丙烯酸系樹脂具有選自由戊二醯亞胺單元、內酯環單元、順丁烯二酸酐單元、順丁烯二醯亞胺單元及戊二酸酐單元所組成之群中之至少一種。 於一實施形態中,上述表面處理層為塗佈於上述基材膜上之樹脂之硬化層。 於一實施形態中,上述表面處理層係選自由硬塗層、防眩層及抗反射層所組成之群中之至少一種。 根據本發明之另一態樣,提供一種偏光板。該偏光板包含偏光元件及配置於上述偏光元件之單側之保護層,且上述保護層為上述光學積層體。 根據本發明之另一態樣,提供一種圖像顯示裝置。該圖像顯示裝置具備上述偏光板。 [發明之效果]The optical laminate of the present invention includes a base film containing an acrylic resin, and a surface treatment layer formed on one side of the base film, and has a depth of 3.0 μm in the direction of the surface treatment layer from the base film side The ratio of the component of the acrylic resin eluted to the surface treatment layer among the components at the position is 18% or more. In one embodiment, the refractive index of the base film is set to R1, the refractive index of the surface treatment layer is set to R2, and the depth from the base film side in the direction of the surface treatment layer is 3.0 μm. When the refractive index of the position is set to R3, R3≦0.18R1+0.82R2 (wherein, R1<R2) is satisfied. In one embodiment, the thickness of the surface treatment layer is 3 μm˜20 μm. In one Embodiment, the said base film contains the said acrylic resin and the core-shell type particle|grains dispersed in the said acrylic resin. In one Embodiment, the said base film contains 3 weight part - 50 weight part of said core-shell type particle|grains with respect to 100 weight part of said acrylic resins. In one embodiment, the acrylic resin is selected from the group consisting of a glutarimide unit, a lactone ring unit, a maleic anhydride unit, a maleimide unit and a glutaric anhydride unit. at least one of them. In one embodiment, the surface treatment layer is a hardened layer of the resin coated on the base film. In one embodiment, the surface treatment layer is at least one selected from the group consisting of a hard coat layer, an anti-glare layer, and an anti-reflection layer. According to another aspect of the present invention, a polarizing plate is provided. The polarizing plate includes a polarizing element and a protective layer disposed on one side of the polarizing element, and the protective layer is the optical laminate. According to another aspect of the present invention, an image display device is provided. This image display device includes the above-described polarizing plate. [Effect of invention]

根據本發明,藉由構成自基材膜側起沿表面處理層方向之深度3.0 μm之位置之成分中,溶出至表面處理層之丙烯酸系樹脂之成分為18%以上,而可提供一種外觀可優異之光學積層體、具備此種光學積層體之偏光板、及具備此種偏光板之圖像顯示裝置。According to the present invention, by constituting a component at a depth of 3.0 μm in the direction of the surface treatment layer from the base film side, the component of the acrylic resin eluted into the surface treatment layer is 18% or more, so that a good appearance can be provided. An excellent optical laminate, a polarizing plate provided with such an optical laminate, and an image display device provided with such a polarizing plate.

以下,對本發明之實施形態進行說明,但本發明並不限定於該等實施形態。Hereinafter, embodiments of the present invention will be described, but the present invention is not limited to these embodiments.

A.光學積層體之整體構成 圖1係本發明之一實施形態之光學積層體之概略剖視圖。光學積層體100包含基材膜10及形成於基材膜10之單側之表面處理層20。光學積層體100中,構成自基材膜10側起沿表面處理層20之方向3.0 μm深度之位置之成分中溶出至表面處理層之丙烯酸系樹脂之成分之比率為18%以上。所謂自基材膜側起沿表面處理層之方向3.0 μm深度之位置,代表性而言為自基材膜與表面處理層之界面起沿表面處理層側之方向離開3.0 μm之位置。上述「3 μm深度之位置」的丙烯酸系樹脂之成分之比率代表性而言為藉由下述方法導出。 丙烯酸系樹脂成分之算出位置(距表面處理側之位置)=表面處理層厚度(PET基材硬塗層厚度)-(3 μm) 例如,於(PET基材硬塗層厚度)為15 μm之情形時,測定距表面處理側12 μm位置之丙烯酸系樹脂成分之比率。表面處理層厚度(硬塗層厚度)代表性而言為藉由以下之順序導出。第一,使用PET基材(Toray公司製造,商品名:U48-3,折射率:1.60)作為基材膜,於塗佈層之加熱溫度70℃下加以乾燥並且進行UV硬化,藉此獲得形成有硬塗層之光學積層體。經由厚度20 μm之丙烯酸系黏著劑將黑色丙烯酸系樹脂板(Mitsubishi Rayon公司製造,厚度2 mm)貼著於所獲得之光學積層體之基材層側。繼而,使用瞬間多通道測光系統(大塚電子公司製造,商品名:MCPD3700),於以下之條件下測定硬塗層之反射圖譜。由於硬塗層形成用組合物不會滲透至該等積層體所使用之PET基材中,因此根據由積層體獲得之FFT(fast Fourier transform,快速傅立葉轉換)圖譜之波峰位置,測定出僅硬塗層之厚度。 ・反射圖譜測定條件 參考:反射鏡 演算法:FFT法 計算波長:450 nm~850 nm ・檢測條件 曝光時間:20 ms 燈增益(lamp gain):正常 累計次數:10次 ・FFT法 膜厚值之範圍:2~15 μm 膜厚分解能:24 nmA. Overall Configuration of Optical Laminate Figure 1 is a schematic cross-sectional view of an optical laminate according to an embodiment of the present invention. The optical laminate 100 includes a base film 10 and a surface treatment layer 20 formed on one side of the base film 10 . In the optical layered body 100 , the ratio of the component of the acrylic resin eluted to the surface treatment layer among the components constituting the position at a depth of 3.0 μm in the direction of the surface treatment layer 20 from the base film 10 side is 18% or more. The position with a depth of 3.0 μm in the direction of the surface treatment layer from the base film side is typically a position separated by 3.0 μm in the direction of the surface treatment layer from the interface between the base film and the surface treatment layer. The ratio of the components of the acrylic resin at the "position at the depth of 3 μm" is typically derived by the following method. Calculated position of the acrylic resin component (position from the surface treatment side) = thickness of the surface treatment layer (thickness of the PET substrate hard coat layer) - (3 μm) For example, when (the thickness of the PET substrate hard coat layer) is 15 μm In this case, the ratio of the acrylic resin component at a position of 12 μm from the surface treatment side was measured. The thickness of the surface treatment layer (thickness of the hard coat layer) is typically derived by the following procedure. First, a PET substrate (manufactured by Toray Corporation, trade name: U48-3, refractive index: 1.60) was used as a substrate film, dried at a heating temperature of 70° C. for the coating layer, and subjected to UV curing, thereby obtaining a formed Optical laminate with hard coat. A black acrylic resin plate (manufactured by Mitsubishi Rayon Co., Ltd., thickness 2 mm) was attached to the base material layer side of the obtained optical laminate via an acrylic adhesive with a thickness of 20 μm. Next, the reflection spectrum of the hard coat layer was measured under the following conditions using an instantaneous multi-channel photometric system (manufactured by Otsuka Electronics Co., Ltd., trade name: MCPD3700). Since the composition for forming a hard coat layer does not penetrate into the PET base material used for these laminates, it was determined from the peak positions of the FFT (fast Fourier transform) spectrum obtained from the laminates that only the hard coat layer was The thickness of the coating.・Reflectance spectrum measurement conditions reference: Mirror algorithm: FFT method calculation wavelength: 450 nm to 850 nm ・Detection conditions Exposure time: 20 ms Lamp gain: normal accumulation times: 10 times ・FFT method film thickness value Range: 2~15 μm Film Thickness Resolution: 24 nm

上述比率較佳為18%~30%,更佳為18.5%~25%。構成自基材膜10側起沿表面處理層20之方向3.0 μm深度之位置之成分中溶出至表面處理層之丙烯酸系樹脂之成分之比率例如可藉由稜鏡耦合法進行測定。具體而言,於將基材膜之折射率設為R1,將表面處理層之折射率設為R2,將藉由稜鏡耦合法測定之自基材膜側起沿表面處理層之方向3.0 μm深度之位置之折射率設為R3時,構成自基材膜側起沿表面處理層方向之深度3.0 μm之位置之成分中溶出至表面處理層之丙烯酸系樹脂之成分之比率X(%)係以如下之式表示。 X(%)=(R3-R2)×100/(R1-R2) 因此,光學積層體100與基材膜之折射率R1、表面處理層之折射率R2、及自基材膜側起沿表面處理層之方向3.0 μm深度之位置之折射率R3有關,較佳為滿足以下之不等式。 R3≦0.18R1+0.82R2 (R1<R2) 表面處理層之厚度較佳為3 μm~20 μm,更佳為5 μm~15 μm。於一實施形態中,基材膜10含有丙烯酸系樹脂及分散至丙烯酸系樹脂中之芯殼型粒子。於該情形時,基材膜10較佳為相對於丙烯酸系樹脂100重量份而含有芯殼型粒子3重量份~50重量份。丙烯酸系樹脂較佳為具有選自由戊二醯亞胺單元、內酯環單元、順丁烯二酸酐單元、順丁烯二醯亞胺單元及戊二酸酐單元所組成之群中之至少一種。表面處理層20代表性而言為塗佈於基材膜10上之樹脂組合物之硬化層。表面處理層20較佳為選自由硬塗層、防眩層及抗反射層所組成之群中之至少一種。先前之光學積層體存在因將長條狀之基材膜卷取於輥而沿長條方向產生之損傷因於基材膜形成表面處理層而明顯化之情形。與此相對,藉由本發明之光學積層體100,基材膜10所含之丙烯酸系樹脂向表面處理層20之溶出量充分地多。藉此,可抑制因於基材膜10形成表面處理層20引起之基材膜10損傷之明顯化。進而,可提高基材膜10與表面處理層20之密接性。The above ratio is preferably 18% to 30%, more preferably 18.5% to 25%. The ratio of the component of the acrylic resin eluted to the surface treatment layer among the components constituting the position of the 3.0 μm depth in the direction of the surface treatment layer 20 from the base film 10 side can be measured, for example, by the pyran coupling method. Specifically, let R1 be the refractive index of the base film, and R2 be the refractive index of the surface treatment layer, and set the direction of the surface treatment layer from the base film side to 3.0 μm as measured by the H-coupling method. When the refractive index at the depth position is set to R3, the ratio X (%) of the component of the acrylic resin eluted to the surface treatment layer among the components constituting the position at a depth of 3.0 μm in the direction of the surface treatment layer from the base film side is It is expressed as follows. X(%)=(R3−R2)×100/(R1−R2) Therefore, the refractive index R1 of the optical laminate 100 and the base film, the refractive index R2 of the surface treatment layer, and the surface along the surface from the base film side The index of refraction R3 at a depth of 3.0 μm in the direction of the treatment layer is related to preferably satisfy the following inequality. R3≦0.18R1+0.82R2 (R1<R2) The thickness of the surface treatment layer is preferably 3 μm to 20 μm, more preferably 5 μm to 15 μm. In one embodiment, the base film 10 contains an acrylic resin and core-shell particles dispersed in the acrylic resin. In this case, the base film 10 preferably contains 3 parts by weight to 50 parts by weight of the core-shell particles with respect to 100 parts by weight of the acrylic resin. The acrylic resin preferably has at least one selected from the group consisting of a glutarimide unit, a lactone ring unit, a maleic anhydride unit, a maleimide unit, and a glutaric anhydride unit. The surface treatment layer 20 is typically a hardened layer of the resin composition coated on the base film 10 . The surface treatment layer 20 is preferably at least one selected from the group consisting of a hard coat layer, an anti-glare layer and an anti-reflection layer. In the conventional optical layered product, the damage in the longitudinal direction caused by winding up the elongated base film on a roll may become apparent due to the formation of the surface treatment layer on the base film. On the other hand, according to the optical layered body 100 of the present invention, the elution amount of the acrylic resin contained in the base film 10 to the surface treatment layer 20 is sufficiently large. Thereby, the apparent damage of the base film 10 due to the formation of the surface treatment layer 20 on the base film 10 can be suppressed. Furthermore, the adhesiveness of the base film 10 and the surface treatment layer 20 can be improved.

B.基材膜 B-1.基材膜之特性 基材膜如上所述,含有丙烯酸系樹脂。於一實施形態中,基材膜含有丙烯酸系樹脂及分散至丙烯酸系樹脂中之芯殼型粒子。基材膜之厚度較佳為5 μm~150 μm,更佳為10 μm~100 μm。基材膜於形成下文所述之表面處理層時,丙烯酸系樹脂會溶出至表面處理層。藉由丙烯酸系樹脂溶出至表面處理層,構成自基材膜側起沿表面處理層方向之深度3.0 μm之位置之成分中丙烯酸系樹脂之成分之比率成為18%以上。B. Base film B-1. Characteristics of base film The base film contains an acrylic resin as described above. In one embodiment, the base film contains an acrylic resin and core-shell particles dispersed in the acrylic resin. The thickness of the base film is preferably 5 μm to 150 μm, more preferably 10 μm to 100 μm. When the surface treatment layer described below is formed on the base film, the acrylic resin is eluted to the surface treatment layer. When the acrylic resin is eluted into the surface treatment layer, the ratio of the acrylic resin component in the component constituting the position of the depth of 3.0 μm in the direction of the surface treatment layer from the base film side becomes 18% or more.

基材膜較佳為實質上具有光學各向同性。於本說明書中,所謂「實質上具有光學各向同性」係指面內相位差Re(550)為0 nm~10 nm且厚度方向之相位差Rth(550)為-10 nm~+10 nm。面內相位差Re(550)更佳為0 nm~5 nm,進而較佳為0 nm~3 nm,尤佳為0 nm~2 nm。厚度方向之相位差Rth(550)更佳為-5 nm~+5 nm,進而較佳為-3 nm~+3 nm,尤佳為-2 nm~+2 nm。若基材膜之Re(550)及Rth(550)為此種範圍,則於將光學積層體應用於圖像顯示裝置之情形時可防止對顯示特性之不良影響。再者,Re(550)係於23℃下利用波長550 nm之光所測得之膜之面內相位差。Re(550)可藉由式:Re(550)=(nx-ny)×d求出。Rth(550)係於23℃下利用波長550 nm之光所測得之膜之厚度方向之相位差。Rth(550)可藉由式:Rth(550)=(nx-nz)×d求出。此處,nx係面內之折射率成為最大之方向(即,遲相軸方向)之折射率,ny係面內與遲相軸正交之方向(即,進相軸方向)之折射率,nz係厚度方向之折射率,d係膜之厚度(nm)。The base film preferably has substantially optical isotropy. In this specification, "substantially optically isotropic" means that the in-plane retardation Re(550) is 0 nm to 10 nm and the thickness direction retardation Rth(550) is -10 nm to +10 nm. The in-plane retardation Re(550) is more preferably 0 nm to 5 nm, more preferably 0 nm to 3 nm, and particularly preferably 0 nm to 2 nm. The retardation Rth(550) in the thickness direction is more preferably -5 nm to +5 nm, further preferably -3 nm to +3 nm, particularly preferably -2 nm to +2 nm. If the Re(550) and Rth(550) of the base film are in such ranges, adverse effects on display characteristics can be prevented when the optical laminate is applied to an image display device. In addition, Re(550) is the in-plane retardation of a film measured by the light of wavelength 550nm at 23 degreeC. Re(550) can be obtained by the formula: Re(550)=(nx−ny)×d. Rth(550) is the retardation in the thickness direction of the film measured at 23°C with light with a wavelength of 550 nm. Rth(550) can be obtained by the formula: Rth(550)=(nx−nz)×d. Here, the refractive index in the direction in which the refractive index in the nx system becomes the largest (that is, the direction of the slow axis), and the refractive index in the direction of the ny system in the direction orthogonal to the slow axis (that is, the direction of the advance axis), nz is the refractive index in the thickness direction, and d is the thickness (nm) of the film.

基材膜之厚度40 μm時之380 nm下之光線透過率越高越好。具體而言,光線透過率較佳為85%以上,更佳為88%以上,進而較佳為90%以上。若光線透過率為此種範圍,則可確保所需之透明性。光線透過率例如可藉由依照ASTM-D-1003之方法而測定。When the thickness of the base film is 40 μm, the light transmittance at 380 nm should be as high as possible. Specifically, the light transmittance is preferably 85% or more, more preferably 88% or more, and still more preferably 90% or more. If the light transmittance is in this range, the required transparency can be ensured. The light transmittance can be measured, for example, by a method according to ASTM-D-1003.

基材膜之霧度越低越好。具體而言,霧度較佳為5%以下,更佳為3%以下,進而較佳為1.5%以下,尤佳為1%以下。若霧度為5%以下,則可對膜賦予良好之透明感。進而,即使於將光學積層體用作圖像顯示裝置之視認側偏光板之保護層之情形時,亦可良好地視認顯示內容。The lower the haze of the base film, the better. Specifically, the haze is preferably 5% or less, more preferably 3% or less, still more preferably 1.5% or less, and still more preferably 1% or less. When the haze is 5% or less, a favorable transparency can be imparted to the film. Furthermore, even when the optical layered body is used as a protective layer of a viewing-side polarizing plate of an image display device, the display content can be viewed favorably.

基材膜之厚度40 μm時之YI(Yellowness Index,黃度指數)較佳為1.27以下,更佳為1.25以下,進而較佳為1.23以下,尤佳為1.20以下。若YI超過1.3,則存在光學透明性變得不充分之情形。再者,YI例如可根據由使用高速積分球式分光透過率測定機(商品名DOT-3C:村上色彩技術研究所製造)之測定所獲得之顏色之三刺激值(X、Y、Z),藉由下式而求出。 YI=[(1.28X-1.06Z)/Y]×100The YI (Yellowness Index, yellowness index) when the thickness of the base film is 40 μm is preferably 1.27 or less, more preferably 1.25 or less, still more preferably 1.23 or less, particularly preferably 1.20 or less. When YI exceeds 1.3, optical transparency may become insufficient. In addition, YI can be based on, for example, the tristimulus values (X, Y, Z) of the color obtained by measurement using a high-speed integrating sphere spectroscopic transmittance measuring machine (trade name DOT-3C: manufactured by Murakami Color Technology Laboratory), It is calculated|required by the following formula. YI=[(1.28X-1.06Z)/Y]×100

基材膜之厚度40 μm時之b值(依照漢特(Hunter)表色系統之色相之尺度)較佳為未達1.5,更佳為1.0以下。於b值為1.5以上之情形時,存在出現並非所需之色調之情形。再者,b值例如可藉由將基材膜樣品裁斷為3 cm見方,使用高速積分球式分光透過率測定機(商品名DOT-3C:村上色彩技術研究所製造)測定色相,並依照漢特表色系統評價該色相而獲得。When the thickness of the base film is 40 μm, the b value (according to the scale of the hue of the Hunter color system) is preferably less than 1.5, more preferably 1.0 or less. In the case where the b value is 1.5 or more, an undesired color tone may occur. In addition, the b value can be measured, for example, by cutting a sample of the base film into a 3 cm square, measuring the hue using a high-speed integrating sphere type spectral transmittance measuring machine (trade name DOT-3C: manufactured by Murakami Color Technology Laboratory), and measuring the color according to the Chinese The characteristic color system is obtained by evaluating the hue.

基材膜之透濕度較佳為300 g/m2 ・24 hr以下,更佳為250 g/m2 ・24 hr以下,進而較佳為200 g/m2 ・24 hr以下,尤佳為150 g/m2 ・24 hr以下,最佳為100 g/m2 ・24 hr以下。若基材膜之透濕度為此種範圍,則於用作偏光元件之保護層之情形時,可獲得耐久性及耐濕性優異之偏光板。The moisture permeability of the base film is preferably 300 g/m 2 · 24 hr or less, more preferably 250 g/m 2 · 24 hr or less, more preferably 200 g/m 2 · 24 hr or less, particularly preferably 150 g/m 2 · 24 hr or less, preferably 100 g/m 2 · 24 hr or less. When the moisture permeability of the base film is in such a range, when used as a protective layer of a polarizing element, a polarizing plate excellent in durability and moisture resistance can be obtained.

基材膜之拉伸強度較佳為10 MPa以上且未達100 MPa,更佳為30 MPa以上且未達100 MPa。於未達10 MPa之情形時,存在無法表現出充分之機械強度之情形。若超過100 MPa,則有加工性變得不充分之虞。拉伸強度例如可依照ASTM-D-882-61T而測定。The tensile strength of the base film is preferably 10 MPa or more and less than 100 MPa, more preferably 30 MPa or more and less than 100 MPa. In the case where it is less than 10 MPa, there is a case where sufficient mechanical strength cannot be exhibited. If it exceeds 100 MPa, the workability may become insufficient. The tensile strength can be measured, for example, in accordance with ASTM-D-882-61T.

基材膜之拉伸伸長率較佳為1.0%以上,更佳為3.0%以上,進而較佳為5.0%以上。拉伸伸長率之上限例如為100%。於拉伸伸長率未達1%之情形時,存在韌性變得不充分之情形。拉伸伸長率例如可依照ASTM-D-882-61T而測定。The tensile elongation of the base film is preferably 1.0% or more, more preferably 3.0% or more, and still more preferably 5.0% or more. The upper limit of the tensile elongation is, for example, 100%. When the tensile elongation rate is less than 1%, the toughness may become insufficient. The tensile elongation can be measured, for example, in accordance with ASTM-D-882-61T.

基材膜之拉伸彈性模數較佳為0.5 GPa以上,更佳為1 GPa以上,進而較佳為2 GPa以上。拉伸彈性模數之上限例如為20 GPa。於拉伸彈性模數未達0.5 GPa之情形時,存在無法表現出充分之機械強度之情形。拉伸彈性模數例如可依照ASTM-D-882-61T而測定。The tensile modulus of elasticity of the base film is preferably 0.5 GPa or more, more preferably 1 GPa or more, and still more preferably 2 GPa or more. The upper limit of the tensile elastic modulus is, for example, 20 GPa. When the tensile modulus of elasticity is less than 0.5 GPa, there are cases where sufficient mechanical strength cannot be exhibited. The tensile modulus of elasticity can be measured, for example, in accordance with ASTM-D-882-61T.

基材膜可視目的含有任意合適之添加劑。作為添加劑之具體例,可列舉:紫外線吸收劑;受阻酚系、磷系、硫系等之抗氧化劑;耐光穩定劑、耐候穩定劑、熱穩定劑等穩定劑;玻璃纖維、碳纖維等補強材;近紅外線吸收劑;磷酸三(二溴丙基)酯、磷酸三烯丙酯、氧化銻等阻燃劑;陰離子系、陽離子系、非離子系之界面活性劑等防靜電劑;無機顏料、有機顏料、染料等著色劑;有機填料或無機填料;樹脂改質劑;有機填充劑或無機填充劑;塑化劑;潤滑劑等。添加劑可於丙烯酸系樹脂之聚合時添加,亦可於膜形成時添加。添加劑之種類、數量、組合、添加量等可視目的適當地設定。The base film may contain any suitable additives depending on the purpose. Specific examples of additives include: ultraviolet absorbers; antioxidants such as hindered phenols, phosphorus, and sulfur; stabilizers such as light-resistant stabilizers, weather-resistant stabilizers, and thermal stabilizers; reinforcing materials such as glass fibers and carbon fibers; Near-infrared absorbers; flame retardants such as tris(dibromopropyl) phosphate, triallyl phosphate, antimony oxide; antistatic agents such as anionic, cationic, and nonionic surfactants; inorganic pigments, organic Colorants such as pigments and dyes; organic fillers or inorganic fillers; resin modifiers; organic fillers or inorganic fillers; plasticizers; lubricants, etc. The additive may be added during the polymerization of the acrylic resin, or may be added during the film formation. The kind, quantity, combination, addition amount, etc. of the additives can be appropriately set depending on the purpose.

B-2.丙烯酸系樹脂 B-2-1.丙烯酸系樹脂之構成 作為丙烯酸系樹脂,可採用任意合適之丙烯酸系樹脂。丙烯酸系樹脂中,代表性而言,作為單體單元,含有(甲基)丙烯酸烷基酯作為主成分。於本說明書中,所謂「(甲基)丙烯酸」意指丙烯酸及/或甲基丙烯酸。作為構成丙烯酸系樹脂之主骨架之(甲基)丙烯酸烷基酯,可例示直鏈狀或支鏈狀之烷基之碳數為1~18者。該等可單獨使用或加以組合而使用。進而,可藉由共聚合對丙烯酸系樹脂導入任意合適之共聚合單體。此種共聚合單體之種類、數量、共聚合比等可視目的適當地設定。關於丙烯酸系樹脂之主骨架之構成成分(單體單元),以下參照通式(2)進行說明。B-2. Acrylic resin B-2-1. Configuration of acrylic resin As the acrylic resin, any appropriate acrylic resin can be used. The acrylic resin typically contains an alkyl (meth)acrylate as a main component as a monomer unit. In this specification, "(meth)acrylic acid" means acrylic acid and/or methacrylic acid. As the alkyl (meth)acrylate constituting the main skeleton of the acrylic resin, a linear or branched alkyl group having 1 to 18 carbon atoms can be exemplified. These can be used alone or in combination. Furthermore, any appropriate comonomer may be introduced into the acrylic resin by copolymerization. The kind, amount, copolymerization ratio, and the like of such copolymerized monomers can be appropriately set depending on the purpose. The constituent components (monomer units) of the main skeleton of the acrylic resin will be described below with reference to the general formula (2).

丙烯酸系樹脂較佳為具有選自戊二醯亞胺單元、內酯環單元、順丁烯二酸酐單元、順丁烯二醯亞胺單元及戊二酸酐單元中之至少一種。具有內酯環單元之丙烯酸系樹脂例如記載於日本專利特開2008-181078號公報中,該公報之記載係作為參考而引用至本說明書中。戊二醯亞胺單元較佳為以下述通式(1)表示:The acrylic resin preferably has at least one selected from the group consisting of a glutarimide unit, a lactone ring unit, a maleic anhydride unit, a maleimide unit, and a glutaric anhydride unit. The acrylic resin which has a lactone ring unit is described in Unexamined-Japanese-Patent No. 2008-181078, for example, and the description of this gazette is incorporated in this specification as a reference. The glutarimide unit is preferably represented by the following general formula (1):

[化1]

Figure 02_image001
[hua 1]
Figure 02_image001

於通式(1)中,R1 及R2 分別獨立地表示氫原子或碳數1~8之烷基,R3 表示氫原子、碳數1~18之烷基、碳數3~12之環烷基、或碳數6~10之芳基。於通式(1)中,較佳為R1 及R2 分別獨立為氫原子或甲基,且R3 為氫原子、甲基、丁基或環己基。更佳為R1 為甲基,R2 為氫原子,且R3 為甲基。In the general formula (1), R 1 and R 2 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, and R 3 represents a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, and an alkyl group having 3 to 12 carbon atoms. A cycloalkyl group or an aryl group having 6 to 10 carbon atoms. In the general formula (1), it is preferable that R 1 and R 2 are each independently a hydrogen atom or a methyl group, and R 3 is a hydrogen atom, a methyl group, a butyl group or a cyclohexyl group. More preferably, R 1 is a methyl group, R 2 is a hydrogen atom, and R 3 is a methyl group.

上述(甲基)丙烯酸烷基酯代表性而言,以下述通式(2)表示:The above-mentioned alkyl (meth)acrylate is typically represented by the following general formula (2):

[化2]

Figure 02_image003
[hua 2]
Figure 02_image003

於通式(2)中,R4 表示氫原子或甲基,R5 表示氫原子、或者可經取代之碳數1~6之脂肪族或脂環式烴基。作為取代基,例如可列舉鹵素、羥基。作為(甲基)丙烯酸烷基酯之具體例,可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸氯甲酯、(甲基)丙烯酸2-氯乙酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸3-羥基丙酯、(甲基)丙烯酸2,3,4,5,6-五羥基己酯及(甲基)丙烯酸2,3,4,5-四羥基戊酯。於通式(2)中,R5 較佳為氫原子或甲基。因此,尤佳之(甲基)丙烯酸烷基酯為丙烯酸甲酯或甲基丙烯酸甲酯。In the general formula (2), R 4 represents a hydrogen atom or a methyl group, and R 5 represents a hydrogen atom, or a substituted aliphatic or alicyclic hydrocarbon group having 1 to 6 carbon atoms. As a substituent, halogen and a hydroxyl group are mentioned, for example. Specific examples of alkyl (meth)acrylates include methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, n-butyl (meth)acrylate, 3-butyl (meth)acrylate, n-hexyl (meth)acrylate, cyclohexyl (meth)acrylate, chloromethyl (meth)acrylate, 2-chloroethyl (meth)acrylate, (meth)acrylate ) 2-hydroxyethyl acrylate, 3-hydroxypropyl (meth)acrylate, 2,3,4,5,6-pentahydroxyhexyl (meth)acrylate and 2,3,4 (meth)acrylate, 5-tetrahydroxypentyl ester. In the general formula (2), R 5 is preferably a hydrogen atom or a methyl group. Therefore, a particularly preferred alkyl (meth)acrylate is methyl acrylate or methyl methacrylate.

上述丙烯酸系樹脂可僅含有單一之戊二醯亞胺單元,亦可含有上述通式(1)中之R1 、R2 及R3 不同之複數種戊二醯亞胺單元。The above-mentioned acrylic resin may contain only a single glutarimide unit, or may contain a plurality of glutarimide units in which R 1 , R 2 and R 3 in the general formula (1) are different.

上述丙烯酸系樹脂中之戊二醯亞胺單元之含有比率較佳為2莫耳%~50莫耳%,更佳為2莫耳%~45莫耳%,進而較佳為2莫耳%~40莫耳%,尤佳為2莫耳%~35莫耳%,最佳為3莫耳%~30莫耳%。若含有比率少於2莫耳%,則有不會充分地發揮源自戊二醯亞胺單元而表現之效果(例如,較高之光學特性、較高之機械強度、與偏光元件之優異之接著性、薄型化)之虞。若含有比率超過50莫耳%,則有例如耐熱性、透明性變得不充分之虞。The content ratio of the glutarimide unit in the above-mentioned acrylic resin is preferably 2 mol % to 50 mol %, more preferably 2 mol % to 45 mol %, and more preferably 2 mol % to 2 mol %. 40 mol %, preferably 2 mol % to 35 mol %, and most preferably 3 mol % to 30 mol %. If the content ratio is less than 2 mol%, the effects derived from the glutarimide unit (for example, higher optical properties, higher mechanical strength, and excellent polarizing elements may not be fully exhibited) Adhesion and thinning). If the content ratio exceeds 50 mol %, for example, heat resistance and transparency may become insufficient.

上述丙烯酸系樹脂可僅含有單一之(甲基)丙烯酸烷基酯單元,亦可含有上述通式(2)中之R4 及R5 不同之複數種(甲基)丙烯酸烷基酯單元。The above-mentioned acrylic resin may contain only a single (meth)acrylic acid alkyl ester unit, or may contain plural (meth)acrylic acid alkyl ester units in which R 4 and R 5 in the general formula (2) are different.

上述丙烯酸系樹脂中之(甲基)丙烯酸烷基酯單元之含有比率較佳為50莫耳%~98莫耳%,更佳為55莫耳%~98莫耳%,進而較佳為60莫耳%~98莫耳%,尤佳為65莫耳%~98莫耳%,最佳為70莫耳%~97莫耳%。若含有比率少於50莫耳%,則有不會充分地發揮源自(甲基)丙烯酸烷基酯單元而表現之效果(例如,較高之耐熱性、較高之透明性)之虞。若上述含有比率多於98莫耳%,則有樹脂變脆而容易開裂,無法充分地發揮出較高之機械強度,生產性差之虞。The content ratio of the alkyl (meth)acrylate unit in the above-mentioned acrylic resin is preferably 50 mol % to 98 mol %, more preferably 55 mol % to 98 mol %, and more preferably 60 mol % Ear% to 98 mol%, preferably 65 mol% to 98 mol%, and most preferably 70 mol% to 97 mol%. If the content ratio is less than 50 mol %, there is a possibility that the effects (for example, higher heat resistance and higher transparency) derived from the alkyl (meth)acrylate unit may not be sufficiently exhibited. If the above-mentioned content ratio exceeds 98 mol %, the resin becomes brittle and easily cracks, and high mechanical strength cannot be sufficiently exhibited, resulting in poor productivity.

上述丙烯酸系樹脂亦可含有戊二醯亞胺單元及(甲基)丙烯酸烷基酯單元以外之單元。The said acrylic resin may contain the unit other than a glutarimide unit and an alkyl (meth)acrylate unit.

於一實施形態中,丙烯酸系樹脂可含有未參與下文所述之分子內醯亞胺化反應之不飽和羧酸單元例如0~10重量%。不飽和羧酸單元之含有比率較佳為0~5重量%,更佳為0~1重量%。若含量為此種範圍,則可維持透明性、滯留穩定性及耐濕性。In one embodiment, the acrylic resin may contain, for example, 0 to 10% by weight of unsaturated carboxylic acid units that do not participate in the intramolecular imidization reaction described below. The content ratio of the unsaturated carboxylic acid unit is preferably 0 to 5% by weight, more preferably 0 to 1% by weight. When the content is within such a range, transparency, retention stability, and moisture resistance can be maintained.

於一實施形態中,丙烯酸系樹脂可含有上述以外之可進行共聚合之乙烯系單體單元(其他乙烯系單體單元)。作為該其他乙烯系單體,例如可列舉:丙烯腈、甲基丙烯腈、乙基丙烯腈、烯丙基縮水甘油醚、順丁烯二酸酐、伊康酸酐、N-甲基順丁烯二醯亞胺、N-乙基順丁烯二醯亞胺、N-環己基順丁烯二醯亞胺、丙烯酸胺基乙酯、丙烯酸丙基胺基乙酯、甲基丙烯酸二甲胺基乙酯、甲基丙烯酸乙基胺基丙酯、甲基丙烯酸環己基胺基乙酯、N-乙烯基二乙基胺、N-乙醯基乙烯基胺、烯丙基胺、甲基烯丙基胺、N-甲基烯丙基胺、2-異丙烯基㗁唑啉、2-乙烯基㗁唑啉、2-丙烯醯基㗁唑啉、N-苯基順丁烯二醯亞胺、甲基丙烯酸苯基胺基乙酯、苯乙烯、α-甲基苯乙烯、對縮水甘油基苯乙烯、對胺基苯乙烯、2-苯乙烯基㗁唑啉等。該等可單獨使用,亦可併用。較佳為苯乙烯、α-甲基苯乙烯等苯乙烯系單體。其他乙烯系單體單元之含有比率較佳為0~1重量%,更佳為0~0.1重量%。若為此種範圍,則可抑制並非所需之相位差之表現及透明性之降低。In one embodiment, the acrylic resin may contain a copolymerizable vinyl monomer unit (other vinyl monomer unit) other than the above. Examples of the other vinyl monomers include acrylonitrile, methacrylonitrile, ethacrylonitrile, allyl glycidyl ether, maleic anhydride, itaconic anhydride, and N-methylmaleic acid. Imide, N-ethylmaleimide, N-cyclohexylmaleimide, aminoethyl acrylate, propylaminoethyl acrylate, dimethylaminoethyl methacrylate Esters, ethylaminopropyl methacrylate, cyclohexylaminoethyl methacrylate, N-vinyldiethylamine, N-acetylvinylamine, allylamine, methallyl Amine, N-Methallylamine, 2-Isopropenyloxazoline, 2-Vinyloxazoline, 2-Propenyloxazoline, N-Phenylmaleimide, Methyl Phenylaminoethyl acrylate, styrene, α-methylstyrene, p-glycidyl styrene, p-aminostyrene, 2-styryl oxazoline, etc. These may be used alone or in combination. Preferred are styrene-based monomers such as styrene and α-methylstyrene. The content ratio of other vinyl monomer units is preferably 0 to 1% by weight, more preferably 0 to 0.1% by weight. If it is such a range, the expression of an undesired phase difference and the fall of transparency can be suppressed.

上述丙烯酸系樹脂中之醯亞胺化率較佳為2.5%~20.0%。若醯亞胺化率為此種範圍,則可獲得耐熱性、透明性及成形加工性優異之樹脂,可防止膜成形時之燒焦之產生或機械強度之降低。於上述丙烯酸系樹脂中,醯亞胺化率係以戊二醯亞胺單元與(甲基)丙烯酸烷基酯單元之比表示。該比例如可根據丙烯酸系樹脂之NMR(nuclear magnetic resonance,核磁共振)圖譜、IR(infrared,紅外線)圖譜等而獲得。於本實施形態中,醯亞胺化率可使用1 HNMR BRUKER AvanceIII(400 MHz),藉由樹脂之1 H-NMR測定而求出。更具體而言,將3.5至3.8 ppm附近之源自(甲基)丙烯酸烷基酯之O-CH3 質子之波峰面積設為A,將3.0至3.3 ppm附近之源自戊二醯亞胺之N-CH3 質子之波峰面積設為B,藉由下式而求出。 醯亞胺化率Im(%)={B/(A+B)}×100The imidization rate in the above-mentioned acrylic resin is preferably 2.5% to 20.0%. When the imidization ratio is in this range, a resin excellent in heat resistance, transparency, and moldability can be obtained, and the occurrence of scorch and reduction in mechanical strength during film forming can be prevented. In the said acrylic resin, the imidization rate is represented by the ratio of a glutarimide unit and an alkyl (meth)acrylate unit. The ratio can be obtained from, for example, an NMR (nuclear magnetic resonance, nuclear magnetic resonance) spectrum, an IR (infrared, infrared) spectrum of the acrylic resin, and the like. In the present embodiment, the imidization rate can be determined by 1 H-NMR measurement of resin using 1 HNMR BRUKER AvanceIII (400 MHz). More specifically, let the peak area of the O-CH 3 proton derived from alkyl (meth)acrylate in the vicinity of 3.5 to 3.8 ppm be A, and let the peak area of glutarimide derived in the vicinity of 3.0 to 3.3 ppm be A. The peak area of the N-CH 3 proton is set as B, and is obtained by the following formula. Imidization rate Im(%)={B/(A+B)}×100

上述丙烯酸系樹脂之酸值較佳為0.10 mmol/g~0.50 mmol/g。若酸值為此種範圍,則可獲得耐熱性、機械物性及成形加工性之平衡性優異之樹脂。若酸值過小,則存在產生因使用用以調整為所需酸值之改性劑引起之成本提高、因改性劑之殘存引起之凝膠狀物之產生等問題之情形。若酸值過大,則有變得容易引起膜成形時(例如,熔融擠出時)之發泡而導致成形品之生產性降低之傾向。關於上述丙烯酸系樹脂,酸值係該丙烯酸系樹脂中之羧酸單元及羧酸酐單元之含量。於本實施形態中,酸值例如可藉由WO2005/054311或日本專利特開2005-23272號公報所記載之滴定法而算出。The acid value of the above-mentioned acrylic resin is preferably 0.10 mmol/g to 0.50 mmol/g. When the acid value is in such a range, a resin excellent in the balance of heat resistance, mechanical properties, and moldability can be obtained. If the acid value is too small, problems such as increase in cost due to use of a modifier for adjusting to a desired acid value, generation of gel-like substances due to residual modifier, and the like may occur. When the acid value is too large, foaming at the time of film formation (for example, at the time of melt extrusion) tends to easily occur, and the productivity of the formed product tends to decrease. Regarding the above-mentioned acrylic resin, the acid value is the content of the carboxylic acid unit and the carboxylic acid anhydride unit in the acrylic resin. In the present embodiment, the acid value can be calculated by, for example, the titration method described in WO2005/054311 or Japanese Patent Laid-Open No. 2005-23272.

上述丙烯酸系樹脂之重量平均分子量較佳為1000~2000000,更佳為5000~1000000,進而較佳為10000~500000,尤佳為50000~500000,最佳為60000~150000。重量平均分子量例如可使用凝膠滲透層析儀(GPC系統,Tosoh製造),藉由聚苯乙烯換算而求出。再者,可使用四氫呋喃作為溶劑。The weight average molecular weight of the acrylic resin is preferably 1,000-2,000,000, more preferably 5,000-1,000,000, further preferably 10,000-500,000, particularly preferably 50,000-500,000, and most preferably 60,000-150,000. The weight average molecular weight can be determined in terms of polystyrene using, for example, a gel permeation chromatography (GPC system, manufactured by Tosoh). Furthermore, tetrahydrofuran can be used as a solvent.

上述丙烯酸系樹脂之Tg(玻璃轉移溫度)較佳為110℃以上,更佳為115℃以上,進而較佳為120℃以上,尤佳為125℃以上,最佳為130℃以上。若Tg為110℃以上,則含有由此種樹脂獲得之基材膜之偏光板容易成為耐久性優異者。Tg之上限值較佳為300℃以下,更佳為290℃以下,進而較佳為285℃以下,尤佳為200℃以下,最佳為160℃以下。若Tg為此種範圍,則成形性會優異。The Tg (glass transition temperature) of the acrylic resin is preferably 110°C or higher, more preferably 115°C or higher, further preferably 120°C or higher, particularly preferably 125°C or higher, and most preferably 130°C or higher. When Tg is 110 degreeC or more, the polarizing plate containing the base material film obtained from such a resin tends to be excellent in durability. The upper limit of Tg is preferably 300°C or lower, more preferably 290°C or lower, further preferably 285°C or lower, particularly preferably 200°C or lower, and most preferably 160°C or lower. If Tg is in such a range, the formability will be excellent.

B-2-2.丙烯酸系樹脂之聚合 上述丙烯酸系樹脂例如可藉由以下之方法製造。該方法包括:(I)將與通式(2)所表示之(甲基)丙烯酸烷基酯單元相對應之(甲基)丙烯酸烷基酯單體與不飽和羧酸單體及/或其前驅物單體進行共聚合而獲得共聚物(a);及(II)利用醯亞胺化劑處理該共聚物(a),藉此進行該共聚物(a)中之(甲基)丙烯酸烷基酯單體單元與不飽和羧酸單體及/或其前驅物單體單元之分子內醯亞胺化反應,而將通式(1)所表示之戊二醯亞胺單元導入至共聚物中。B-2-2. Polymerization of acrylic resin The above acrylic resin can be produced, for example, by the following method. The method comprises: (1) combining the (meth)acrylic acid alkyl ester monomer corresponding to the (meth)acrylic acid alkyl ester unit represented by the general formula (2) with the unsaturated carboxylic acid monomer and/or its The precursor monomer is copolymerized to obtain the copolymer (a); and (II) the copolymer (a) is treated with an imidizing agent, whereby the alkyl (meth)acrylate in the copolymer (a) is carried out Intramolecular imidization reaction between the base ester monomer unit and the unsaturated carboxylic acid monomer and/or its precursor monomer unit, and the glutarimide unit represented by the general formula (1) is introduced into the copolymer middle.

作為不飽和羧酸單體,例如可列舉:丙烯酸、甲基丙烯酸、丁烯酸、α-取代丙烯酸、α-取代甲基丙烯酸。作為其前驅物單體,例如可列舉:丙烯醯胺、甲基丙烯醯胺等。該等可單獨使用,亦可併用。較佳之不飽和羧酸單體為丙烯酸或甲基丙烯酸,較佳之前驅物單體為丙烯醯胺。Examples of the unsaturated carboxylic acid monomers include acrylic acid, methacrylic acid, crotonic acid, α-substituted acrylic acid, and α-substituted methacrylic acid. Examples of the precursor monomers thereof include acrylamide, methacrylamide, and the like. These may be used alone or in combination. The preferred unsaturated carboxylic acid monomer is acrylic acid or methacrylic acid, and the preferred precursor monomer is acrylamide.

作為利用醯亞胺化劑對共聚物(a)進行處理之方法,可使用任意合適之方法。作為具體例,可列舉使用擠出機之方法、使用批次式反應槽(壓力容器)之方法。使用擠出機之方法包括使用擠出機將共聚物(a)加熱熔融,並利用醯亞胺化劑對其進行處理。於該情形時,作為擠出機,可使用任意合適之擠出機。作為具體例,可列舉:單軸擠出機、雙軸擠出機、多軸擠出機。使用批次式反應槽(壓力容器)之方法中可使用任意合適之批次式反應槽(壓力容器)。As a method of treating the copolymer (a) with an imidizing agent, any appropriate method can be used. As a specific example, the method of using an extruder, and the method of using a batch-type reaction tank (pressure vessel) are mentioned. The method of using an extruder includes heating and melting the copolymer (a) using the extruder, and treating it with an imidizing agent. In this case, as the extruder, any appropriate extruder can be used. Specific examples include a uniaxial extruder, a biaxial extruder, and a multiaxial extruder. Any suitable batch-type reaction tank (pressure vessel) can be used in the method using the batch-type reaction tank (pressure vessel).

作為醯亞胺化劑,只要可生成上述通式(1)所表示之戊二醯亞胺單元,則可使用任意合適之化合物。作為醯亞胺化劑之具體例,可列舉:甲胺、乙胺、正丙胺、異丙胺、正丁胺、異丁胺、第三丁胺、正己胺等含有脂肪族烴基之胺;苯胺、苄胺、甲苯胺、三氯苯胺等含有芳香族烴基之胺;環己胺等含有脂環式烴基之胺。進而,例如亦可使用藉由加熱而產生此種胺之脲系化合物。作為脲化合物,例如可列舉:脲、1,3-二甲基脲、1,3-二乙基脲、1,3-二丙基脲。醯亞胺化劑較佳為甲胺、氨、環己胺,更佳為甲胺。As the imidizing agent, any appropriate compound can be used as long as the glutarimide unit represented by the above-mentioned general formula (1) can be generated. Specific examples of the imidizing agent include amines containing aliphatic hydrocarbon groups such as methylamine, ethylamine, n-propylamine, isopropylamine, n-butylamine, isobutylamine, tert-butylamine, and n-hexylamine; aniline, Amines containing aromatic hydrocarbon groups such as benzylamine, toluidine, trichloroaniline; amines containing alicyclic hydrocarbon groups such as cyclohexylamine. Furthermore, for example, a urea-based compound which generates such an amine by heating can also be used. As a urea compound, urea, 1, 3- dimethyl urea, 1, 3- diethyl urea, and 1, 3- dipropyl urea are mentioned, for example. The imidizing agent is preferably methylamine, ammonia, and cyclohexylamine, more preferably methylamine.

於醯亞胺化中,除了上述醯亞胺化劑以外,亦可視需要添加閉環促進劑。In the imidization, in addition to the imidization agent described above, a ring-closure accelerator may also be added as required.

醯亞胺化中之醯亞胺化劑之使用量相對於共聚物(a)100重量份,較佳為0.5重量份~10重量份,更佳為0.5重量份~6重量份。若醯亞胺化劑之使用量少於0.5重量份,則未達成所需之醯亞胺化率之情形較多。其結果為,存在所獲得之樹脂之耐熱性變得極不充分,而誘發成形後之燒焦等外觀缺陷之情形。若醯亞胺化劑之使用量超過10重量份,則存在樹脂中殘存醯亞胺化劑,而由該醯亞胺化劑誘發成形後之燒焦等外觀缺陷或發泡之情形。The usage-amount of the imidizing agent in the imidization is preferably 0.5 to 10 parts by weight, more preferably 0.5 to 6 parts by weight relative to 100 parts by weight of the copolymer (a). If the usage-amount of the imidization agent is less than 0.5 parts by weight, there are many cases where the desired imidization rate is not achieved. As a result, the heat resistance of the obtained resin becomes extremely insufficient, and appearance defects such as burnt after molding may be induced. If the amount of the imidizing agent used exceeds 10 parts by weight, the imidizing agent may remain in the resin, and the imidizing agent may induce appearance defects such as burnt after molding or foaming.

本實施形態之製造方法除了上述醯亞胺化以外視需要亦可包括利用酯化劑所進行之處理。In addition to the above-mentioned imidization, the production method of the present embodiment may include, if necessary, a treatment with an esterification agent.

作為酯化劑,例如可列舉:碳酸二甲酯、2,2-二甲氧基丙烷、二甲基亞碸、原甲酸三乙酯、原乙酸三甲酯、原甲酸三甲酯、碳酸二苯酯、硫酸二甲酯、甲苯磺酸甲酯、三氟甲磺酸甲酯、乙酸甲酯、甲醇、乙醇、異氰酸甲酯、異氰酸對氯苯酯、二甲基碳二醯亞胺、二甲基第三丁基甲矽烷基氯、乙酸異丙烯酯、二甲基脲、氫氧化四甲基銨、二甲基二乙氧基甲矽烷、四正丁氧基甲矽烷、亞磷酸二甲酯(三甲基甲矽烷基)酯、亞磷酸三甲酯、磷酸三甲酯、磷酸三甲苯酯、重氮甲烷、環氧乙烷、環氧丙烷、環氧環己烷、2-乙基己基縮水甘油醚、苯基縮水甘油醚、苄基縮水甘油醚。該等中,就成本及反應性等觀點而言,較佳為碳酸二甲酯。Examples of the esterification agent include dimethyl carbonate, 2,2-dimethoxypropane, dimethyl sulfoxide, triethyl orthoformate, trimethyl orthoacetate, trimethyl orthoformate, dicarbonate Phenyl ester, dimethyl sulfate, methyl tosylate, methyl triflate, methyl acetate, methanol, ethanol, methyl isocyanate, p-chlorophenyl isocyanate, dimethylcarbodiamide Imine, dimethyl tert-butyl silyl chloride, isopropenyl acetate, dimethyl urea, tetramethyl ammonium hydroxide, dimethyl diethoxy silane, tetra-n-butoxy silane, phosphorous acid Dimethyl (trimethylsilyl) ester, trimethyl phosphite, trimethyl phosphate, tricresyl phosphate, diazomethane, ethylene oxide, propylene oxide, cyclohexane oxide, 2- Ethylhexyl glycidyl ether, phenyl glycidyl ether, benzyl glycidyl ether. Among these, from the viewpoints of cost, reactivity, etc., dimethyl carbonate is preferred.

酯化劑之添加量可以丙烯酸系樹脂之酸值成為所需之值之方式設定。The addition amount of the esterification agent can be set so that the acid value of an acrylic resin may become a desired value.

B-2-3.其他樹脂之併用 於本發明之實施形態中,可將上述丙烯酸系樹脂與其他樹脂併用。即,可將構成丙烯酸系樹脂之單體成分與構成其他樹脂之單體成分進行共聚合,並將該共聚物供於下文B-4項所說明之膜形成;亦可將丙烯酸系樹脂與其他樹脂之摻合物供於膜形成。作為其他樹脂,例如可列舉:苯乙烯系樹脂、聚乙烯、聚丙烯、聚醯胺、聚苯硫醚、聚醚醚酮、聚酯、聚碸、聚苯醚、聚縮醛、聚醯亞胺、聚醚醯亞胺等其他熱塑性樹脂;酚系樹脂、三聚氰胺系樹脂、聚酯系樹脂、聚矽氧系樹脂、環氧系樹脂等熱硬化性樹脂。所併用之樹脂之種類及調配量可視目的及對所獲得之膜所期待之特性等而適當地設定。例如,苯乙烯系樹脂(較佳為丙烯腈-苯乙烯共聚物)可作為相位差控制劑而併用。B-2-3. Combination of other resins In the embodiment of the present invention, the above-mentioned acrylic resins may be used in combination with other resins. That is, the monomer components constituting the acrylic resin and the monomer components constituting other resins may be copolymerized, and the copolymer may be used for the film formation described in the following item B-4; the acrylic resin may also be mixed with other resins. A blend of resins is used for film formation. Examples of other resins include styrene-based resins, polyethylene, polypropylene, polyamide, polyphenylene sulfide, polyether ether ketone, polyester, polysiloxane, polyphenylene ether, polyacetal, and polyamide Other thermoplastic resins such as amine and polyetherimide; thermosetting resins such as phenolic resins, melamine-based resins, polyester-based resins, polysiloxane-based resins, and epoxy-based resins. The type and compounding amount of the resin to be used in combination are appropriately set depending on the purpose, the properties expected for the film to be obtained, and the like. For example, a styrene-based resin (preferably an acrylonitrile-styrene copolymer) can be used in combination as a retardation control agent.

於將丙烯酸系樹脂與其他樹脂併用之情形時,丙烯酸系樹脂與其他樹脂之摻合物中之丙烯酸系樹脂之含量較佳為50重量%~100重量%,更佳為60重量%~100重量%,進而較佳為70重量%~100重量%,尤佳為80重量%~100重量%。於含量未達50重量%之情形時,有無法充分地反映出丙烯酸系樹脂本來具有之較高之耐熱性、較高之透明性之虞。When the acrylic resin is used together with other resins, the content of the acrylic resin in the blend of the acrylic resin and other resins is preferably 50% by weight to 100% by weight, more preferably 60% by weight to 100% by weight %, more preferably 70% by weight to 100% by weight, particularly preferably 80% by weight to 100% by weight. When the content is less than 50% by weight, the high heat resistance and high transparency inherent in the acrylic resin may not be sufficiently reflected.

B-3.芯殼型粒子 於上述基材膜中,芯殼型粒子係相對於丙烯酸系樹脂100重量份,而調配較佳為3重量份~50重量份,更佳為5重量份~25重量份,進而較佳為7重量份~15重量份。藉此,促進形成基材膜之丙烯酸系樹脂向表面處理層之溶出,其結果為,可於基材膜上形成丙烯酸系樹脂與構成表面處理層之組合物之均一性較高之相溶層。藉此,可抑制因於基材膜形成表面處理層導致之基材膜損傷之明顯化。進而,可提高基材膜與表面處理層之密接性。B-3. Core-Shell Particles In the above-mentioned base film, the core-shell particles are preferably 3 to 50 parts by weight, more preferably 5 to 25 parts by weight relative to 100 parts by weight of the acrylic resin. parts by weight, more preferably 7 parts by weight to 15 parts by weight. As a result, the elution of the acrylic resin forming the base film into the surface treatment layer is accelerated, and as a result, a compatible layer with high uniformity between the acrylic resin and the composition constituting the surface treatment layer can be formed on the base film. . Thereby, the apparent damage of the base film due to the formation of the surface treatment layer on the base film can be suppressed. Furthermore, the adhesiveness of a base film and a surface treatment layer can be improved.

芯殼型粒子代表性而言具有包含橡膠狀聚合物之芯、及包含玻璃狀聚合物且被覆該芯之被覆層。芯殼型粒子具有一層以上包含玻璃狀聚合物之層作為最內層或中間層。The core-shell type particle typically has a core containing a rubbery polymer, and a coating layer containing a glassy polymer and covering the core. The core-shell type particle has one or more layers containing a glassy polymer as the innermost layer or the middle layer.

構成芯之橡膠狀聚合物之Tg較佳為20℃以下,更佳為-60℃~20℃,進而較佳為-60℃~10℃。若構成芯之橡膠狀聚合物之Tg超過20℃,則有丙烯酸系樹脂之機械強度之提高不充分之虞。構成被覆層之玻璃狀聚合物(硬質聚合物)之Tg較佳為50℃以上,更佳為50℃~140℃,進而較佳為60℃~130℃。若構成被覆層之玻璃狀聚合物之Tg低於50℃,則有丙烯酸系樹脂之耐熱性降低之虞。The Tg of the rubber-like polymer constituting the core is preferably 20°C or lower, more preferably -60°C to 20°C, and still more preferably -60°C to 10°C. If the Tg of the rubbery polymer constituting the core exceeds 20° C., there is a possibility that the improvement of the mechanical strength of the acrylic resin will be insufficient. The Tg of the glassy polymer (hard polymer) constituting the coating layer is preferably 50°C or higher, more preferably 50°C to 140°C, and still more preferably 60°C to 130°C. When Tg of the glassy polymer which comprises a coating layer is lower than 50 degreeC, there exists a possibility that the heat resistance of an acrylic resin may fall.

芯殼型粒子中之芯之含有比率較佳為30重量%~95重量%,更佳為50重量%~90重量%。芯中之玻璃狀聚合物層之比率相對於芯之總量100重量%,為0~60重量%,較佳為0~45重量%,更佳為10重量%~40重量%。芯殼型粒子中之被覆層之含有比率較佳為5重量%~70重量%,更佳為10重量%~50重量%。The content ratio of the core in the core-shell type particle is preferably 30 to 95% by weight, more preferably 50 to 90% by weight. The ratio of the glassy polymer layer in the core is 0 to 60 wt %, preferably 0 to 45 wt %, and more preferably 10 to 40 wt % with respect to 100 wt % of the total core. The content ratio of the coating layer in the core-shell type particle is preferably 5 to 70% by weight, more preferably 10 to 50% by weight.

於一實施形態中,分散至丙烯酸系樹脂中之芯殼型粒子可具有扁平形狀。芯殼型粒子可藉由下文B-4項所說明之延伸而扁平化。經扁平化之芯殼型粒子之長度/厚度之比為7.0以下。長度/厚度之比較佳為6.5以下,更佳為6.3以下。另一方面,長度/厚度之比較佳為4.0以上,更佳為4.5以上,進而較佳為5.0以上。於本說明書中,所謂「長度/厚度之比」意指芯殼型粒子之俯視形狀之代表長度與厚度之比。此處,所謂「代表長度」,於俯視形狀為圓形之情形時指直徑,於橢圓形之情形時指長徑,於矩形或多邊形之情形時指對角線之長度。該比例如可按照以下之順序求出。利用穿透式電子顯微鏡(例如,加速電壓80 kV、RuO4 染色超薄切片法)對所獲得之膜剖面進行拍攝,自存在於所獲得之照片中之芯殼型粒子中較長者(獲得接近代表長度之剖面者)中依序選取30個,算出(長度之平均值)/(厚度之平均值),藉此可獲得該比。In one embodiment, the core-shell particles dispersed in the acrylic resin may have a flat shape. Core-shell particles can be flattened by stretching as described in item B-4 below. The length/thickness ratio of the flattened core-shell particles is 7.0 or less. The length/thickness ratio is preferably 6.5 or less, more preferably 6.3 or less. On the other hand, the ratio of length/thickness is preferably 4.0 or more, more preferably 4.5 or more, and still more preferably 5.0 or more. In this specification, "length/thickness ratio" means the ratio of the representative length and thickness of the top view shape of a core-shell particle. Here, the so-called "representative length" refers to the diameter in the case of a circular shape in plan view, the long diameter in the case of an ellipse, and the length of the diagonal in the case of a rectangle or a polygon. This ratio can be calculated|required by the following procedure, for example. The film sections obtained were photographed using a transmission electron microscope (eg, accelerating voltage of 80 kV, RuO4 - stained ultrathin sectioning), and the longer of the core-shell particles present in the obtained photographs (obtained close to 30 are selected in sequence from the cross-sections representing the length, and (average value of length)/(average value of thickness) are calculated, whereby the ratio can be obtained.

構成芯殼型粒子之芯之橡膠狀聚合物、構成被覆層之玻璃狀聚合物(硬質聚合物)、該等之聚合方法、及其他構成之詳細內容例如記載於日本專利特開2016-33552號公報。該公報之記載係作為參考而引用至本說明書中。Details of the rubber-like polymer constituting the core of the core-shell particle, the glass-like polymer (hard polymer) constituting the coating layer, the polymerization method of these, and other structures are described in, for example, Japanese Patent Laid-Open No. 2016-33552 Gazette. The description of this gazette is incorporated in this specification as a reference.

B-4.基材膜之形成 本發明之實施形態之基材膜代表性而言可藉由包括將含有上述丙烯酸系樹脂(於併用其他樹脂之情形時為與該其他樹脂之摻合物)及芯殼型粒子之組合物形成膜之方法而形成。進而,形成基材膜之方法可包括將上述膜加以延伸。B-4. Formation of base film The base film according to the embodiment of the present invention can be represented by including the above-mentioned acrylic resin (in the case of using other resin in combination, it is a blend with the other resin) And the composition of the core-shell particle is formed by the method of forming a film. Further, the method of forming the substrate film may include extending the above-described film.

膜形成所使用之芯殼型粒子之平均粒徑較佳為1 nm~500 nm。芯之平均粒徑較佳為50 nm~300 nm,更佳為70 nm~300 nm。The average particle diameter of the core-shell particles used for film formation is preferably 1 nm to 500 nm. The average particle size of the core is preferably 50 nm to 300 nm, more preferably 70 nm to 300 nm.

作為形成膜之方法,可採用任意合適之方法。作為具體例,可列舉:流鑄塗敷法(例如,流延法)、擠出成形法、射出成形法、壓縮成形法、轉移成形法、吹塑成形法、粉末成形法、FRP(Fiber Reinforced Plastic,纖維強化塑膠)成形法、壓延成形法、熱壓法。較佳為擠出成形法或流鑄塗敷法。其原因在於:可提高所獲得之膜之平滑性,可獲得良好之光學均一性。尤佳為擠出成形法。其原因在於無需考慮因殘存溶劑引起之問題。其中,使用T模之擠出成形法就膜之生產性及以後之延伸處理之容易性之觀點而言較佳。成形條件可根據所使用之樹脂之組成或種類、對所獲得之膜所期待之特性等而適當設定。As a method of forming the film, any appropriate method can be adopted. Specific examples include casting coating method (eg, casting method), extrusion molding method, injection molding method, compression molding method, transfer molding method, blow molding method, powder molding method, FRP (Fiber Reinforced) Plastic, fiber reinforced plastic) forming method, calendering method, hot pressing method. The extrusion molding method or the casting coating method is preferable. The reason is that the smoothness of the obtained film can be improved, and good optical uniformity can be obtained. Particularly preferred is the extrusion molding method. The reason for this is that there is no need to consider the problem caused by the residual solvent. Among them, the extrusion molding method using a T-die is preferable from the viewpoint of the productivity of the film and the ease of the subsequent stretching process. The molding conditions can be appropriately set according to the composition and type of the resin to be used, the desired properties of the film to be obtained, and the like.

作為延伸方法,可採用任意合適之延伸方法、延伸條件(例如,延伸溫度、延伸倍率、延伸速度、延伸方向)。作為延伸方法之具體例,可列舉自由端延伸、固定端延伸、自由端收縮、固定端收縮。該等可單獨使用,亦可同時使用,亦可依次使用。藉由在合適之延伸條件下對已適當調整芯殼型粒子相對於丙烯酸系樹脂之調配量之膜進行延伸,而促進丙烯酸系樹脂向表面處理層之溶出,其結果為,可於基材膜上形成丙烯酸系樹脂與構成表面處理層之組合物之均一性較高之相溶層。As the stretching method, any suitable stretching method and stretching conditions (eg, stretching temperature, stretching ratio, stretching speed, stretching direction) can be adopted. Specific examples of the stretching method include free-end stretching, fixed-end stretching, free-end shrinking, and fixed-end shrinking. These may be used individually, may be used simultaneously, or may be used sequentially. The elution of the acrylic resin to the surface treatment layer is accelerated by extending the film in which the amount of the core-shell particles to the acrylic resin has been appropriately adjusted under suitable stretching conditions. As a result, the substrate film can be A compatible layer with high uniformity between the acrylic resin and the composition constituting the surface treatment layer is formed thereon.

延伸方向可視目的而採用合適之方向。具體而言,可列舉:長度方向、寬度方向、厚度方向、斜方向。延伸方向可為一方向(單軸延伸),亦可為兩方向(雙軸延伸),亦可為三方向以上。於本發明之實施形態中,代表性而言,可採用長度方向之單軸延伸、長度方向及寬度方向之同時雙軸延伸、長度方向及寬度方向之依次雙軸延伸。較佳為雙軸延伸(同時或依次)。其原因在於:容易控制面內相位差,而容易實現光學各向同性。The extending direction may be an appropriate direction depending on the purpose. Specifically, a longitudinal direction, a width direction, a thickness direction, and an oblique direction are mentioned. The extension direction may be one direction (uniaxial extension), two directions (biaxial extension), or three or more directions. In the embodiment of the present invention, typically, uniaxial stretching in the longitudinal direction, simultaneous biaxial stretching in the longitudinal and width directions, and sequential biaxial stretching in the longitudinal and width directions can be employed. Biaxial extension (simultaneous or sequential) is preferred. The reason for this is that it is easy to control the in-plane retardation and to realize optical isotropy.

延伸溫度可根據對基材膜所期待之光學特性、機械特性及厚度、所使用之樹脂之種類、所使用之膜之厚度、延伸方法(單軸延伸或雙軸延伸)、延伸倍率、延伸速度等而變化。具體而言,延伸溫度較佳為Tg~Tg+50℃,進而較佳為Tg+15℃~Tg+50℃,最佳為Tg+35℃~Tg+50℃。藉由在此種溫度下進行延伸,可獲得具有合適之特性之基材膜。具體之延伸溫度例如為110℃~200℃,較佳為120℃~190℃。若延伸溫度為此種範圍,則藉由適當地調整延伸倍率及延伸速度,而促進丙烯酸系樹脂向表面處理層之溶出,其結果為,可於基材膜上形成丙烯酸系樹脂與構成表面處理層之組合物之均一性較高之相溶層。The stretching temperature can be determined according to the expected optical properties, mechanical properties and thickness of the base film, the type of resin used, the thickness of the film used, the stretching method (uniaxial stretching or biaxial stretching), the stretching ratio, and the stretching speed. etc. to change. Specifically, the stretching temperature is preferably Tg to Tg+50°C, more preferably Tg+15°C to Tg+50°C, and most preferably Tg+35°C to Tg+50°C. By extending at such a temperature, a base film having suitable properties can be obtained. The specific stretching temperature is, for example, 110°C to 200°C, preferably 120°C to 190°C. When the stretching temperature is in such a range, by appropriately adjusting the stretching ratio and the stretching speed, the elution of the acrylic resin to the surface treatment layer is accelerated, and as a result, the acrylic resin can be formed on the base film and the surface treatment can be formed. A compatible layer with higher composition uniformity of the layer.

又,延伸倍率亦與延伸溫度同樣地可根據光學特性、機械特性及厚度、所使用之樹脂之種類、所使用之膜之厚度、延伸方法(單軸延伸或雙軸延伸)、延伸溫度、延伸速度等而變化。於採用雙軸延伸之情形時,寬度方向(TD)之延伸倍率與長度方向(MD)之延伸倍率之比(TD/MD)較佳為1.0~1.5,更佳為1.0~1.4,進而較佳為1.0~1.3。又,採用雙軸延伸之情形時之面倍率(長度方向之延伸倍率與寬度方向之延伸倍率之積)較佳為2.0~6.0,更佳為3.0~5.5,進而較佳為3.5~5.2。若延伸倍率為此種範圍,則藉由適當調整延伸溫度及延伸速度,而促進丙烯酸系樹脂向表面處理層之溶出,其結果為,可於基材膜上形成丙烯酸系樹脂與構成表面處理層之組合物之均一性較高之相溶層。In addition, the stretching ratio, like the stretching temperature, can vary depending on the optical properties, mechanical properties and thickness, the type of resin used, the thickness of the film used, the stretching method (uniaxial stretching or biaxial stretching), the stretching temperature, the stretching speed, etc. In the case of biaxial stretching, the ratio (TD/MD) of the stretching ratio in the width direction (TD) to the stretching ratio in the longitudinal direction (MD) is preferably 1.0-1.5, more preferably 1.0-1.4, and more preferably is 1.0 to 1.3. In addition, the area magnification (the product of the stretching magnification in the longitudinal direction and the stretching magnification in the width direction) in the case of biaxial stretching is preferably 2.0 to 6.0, more preferably 3.0 to 5.5, and still more preferably 3.5 to 5.2. If the stretching ratio is in such a range, by appropriately adjusting the stretching temperature and the stretching speed, the elution of the acrylic resin to the surface treatment layer is accelerated, and as a result, the acrylic resin can be formed on the base film and the surface treatment layer can be formed The composition has a higher homogeneity of the compatible layer.

又,延伸速度亦與延伸溫度同樣地可根據光學特性、機械特性及厚度、所使用之樹脂之種類、所使用之膜之厚度、延伸方法(單軸延伸或雙軸延伸)、延伸溫度、延伸倍率等而變化。延伸速度較佳為3%/秒~20%/秒,更佳為3%/秒~15%/秒,進而較佳為3%/秒~10%/秒。於採用雙軸延伸之情形時,一方向之延伸速度與另一方向之延伸速度可相同亦可不同。若延伸速度為此種範圍,則藉由適當調整延伸溫度及延伸倍率,而促進丙烯酸系樹脂向表面處理層之溶出,其結果為,可於基材膜上形成丙烯酸系樹脂與構成表面處理層之組合物之均一性較高之相溶層。In addition, the stretching speed, like the stretching temperature, may vary depending on the optical properties, mechanical properties and thickness, the type of resin used, the thickness of the film used, the stretching method (uniaxial stretching or biaxial stretching), the stretching temperature, the stretching magnification, etc. The extension speed is preferably 3%/sec to 20%/sec, more preferably 3%/sec to 15%/sec, and still more preferably 3%/sec to 10%/sec. In the case of biaxial extension, the extension speed in one direction and the extension speed in the other direction may be the same or different. When the stretching speed is in such a range, by appropriately adjusting the stretching temperature and the stretching ratio, the elution of the acrylic resin to the surface treatment layer is accelerated, and as a result, the acrylic resin can be formed on the base film and the surface treatment layer can be formed The composition has a higher homogeneity of the compatible layer.

以上述方式可形成基材膜。The base film can be formed in the above-described manner.

C.表面處理層 表面處理層係根據對光學積層體要求之功能而形成於基材膜之單側的任意合適之功能層。作為表面處理層之具體例,可列舉硬塗層、防眩層、及抗反射層等。表面處理層之厚度較佳為3 μm~20 μm,更佳為5 μm~15 μm。C. Surface treatment layer The surface treatment layer is any appropriate functional layer formed on one side of the base film according to the function required for the optical laminate. As a specific example of a surface treatment layer, a hard-coat layer, an anti-glare layer, an antireflection layer, etc. are mentioned. The thickness of the surface treatment layer is preferably 3 μm to 20 μm, more preferably 5 μm to 15 μm.

表面處理層代表性而言為形成於基材膜上之樹脂組合物之硬化層。形成表面處理層之步驟可包括:於基材膜上塗佈表面處理層形成用之樹脂組合物而形成塗佈層;及將上述塗佈層加以乾燥使之硬化而製成表面處理層。將上述塗佈層加以乾燥使之硬化可包括加熱上述塗佈層。The surface treatment layer is typically a hardened layer of the resin composition formed on the base film. The step of forming the surface treatment layer may include: coating the resin composition for forming the surface treatment layer on the base film to form a coating layer; and drying and curing the coating layer to form the surface treatment layer. Drying and hardening the coating layer may include heating the coating layer.

作為樹脂組合物之塗佈方法,可採用任意合適之方法。例如可列舉:棒式塗佈法、輥式塗佈法、凹版塗佈法、桿式塗佈法、孔縫式塗佈法、淋幕式塗佈法、噴注式塗佈法、缺角輪塗佈法。就使塗佈變得容易之觀點而言,樹脂組合物較佳為含有稀釋用之溶劑。As a coating method of the resin composition, any appropriate method can be adopted. For example, bar coating method, roll coating method, gravure coating method, bar coating method, slot coating method, curtain coating method, spray coating method, corner coating method Wheel coating method. From the viewpoint of facilitating coating, the resin composition preferably contains a solvent for dilution.

塗佈層之加熱溫度可設定為對應於樹脂組合物之組成的任意合適之溫度,較佳為設定為基材膜所含之丙烯酸系樹脂之玻璃轉移溫度以下。若於基材膜所含之丙烯酸系樹脂之玻璃轉移溫度以下之溫度下進行加熱,則可獲得加熱引起之變形得以抑制之光學積層體。塗佈層之加熱溫度例如為50℃~140℃,較佳為60℃~100℃。藉由在此種加熱溫度下進行加熱,可獲得基材膜與表面處理層之密接性優異之光學積層體。The heating temperature of the coating layer can be set to any appropriate temperature corresponding to the composition of the resin composition, and it is preferably set to be equal to or lower than the glass transition temperature of the acrylic resin contained in the base film. When heating is performed at a temperature lower than or equal to the glass transition temperature of the acrylic resin contained in the base film, an optical laminate in which deformation due to heating is suppressed can be obtained. The heating temperature of the coating layer is, for example, 50°C to 140°C, preferably 60°C to 100°C. By heating at such a heating temperature, the optical laminated body excellent in the adhesiveness of a base film and a surface treatment layer can be obtained.

C-1.硬塗層 硬塗層係對基材膜之表面賦予耐擦傷性及耐化學品性等之層。硬塗層於鉛筆硬度試驗中具有較佳為H以上、更佳為3H以上之硬度。鉛筆硬度試驗可依照JIS K 5400而測定。硬塗層形成用之樹脂組合物例如可含有能夠藉由熱、光(紫外線等)或電子束等而硬化之硬化性化合物。硬塗層及硬塗層形成用之樹脂組合物之詳細內容例如記載於日本專利特開2014-240955號公報。該公報之全部記載係作為參考而引用至本說明書中。C-1. Hard coat layer The hard coat layer is a layer that imparts scratch resistance and chemical resistance to the surface of the base film. The hard coat layer has a hardness of preferably H or more, more preferably 3H or more in a pencil hardness test. The pencil hardness test can be measured according to JIS K 5400. The resin composition for forming a hard coat layer may contain, for example, a curable compound that can be cured by heat, light (ultraviolet rays, etc.), electron beams, or the like. Details of the hard coat layer and the resin composition for forming the hard coat layer are described in, for example, Japanese Patent Laid-Open No. 2014-240955. The entire description of this gazette is incorporated herein by reference.

C-2.防眩層 防眩層係用以藉由使光散射並反射而防止外界光之映入之層。防眩層形成用之樹脂組合物例如可含有能夠藉由熱、光(紫外線等)或電子束等而硬化之硬化性化合物。防眩層代表性而言於表面具有微細凹凸形狀。作為形成此種微細凹凸形狀之方法,例如可列舉使上述硬化性化合物含有微粒子之方法。防眩層及防眩層形成用之樹脂組合物之詳細內容例如記載於日本專利特開2017-32711號公報。該公報之全部記載係作為參考而引用至本說明書中。C-2. Anti-glare layer The anti-glare layer is a layer for preventing reflection of external light by scattering and reflecting light. The resin composition for antiglare layer formation can contain, for example, a curable compound that can be cured by heat, light (ultraviolet rays, etc.), electron beams, or the like. The anti-glare layer typically has a fine concavo-convex shape on the surface. As a method of forming such a fine concavo-convex shape, for example, a method of containing fine particles in the above-mentioned curable compound can be mentioned. Details of the anti-glare layer and the resin composition for forming the anti-glare layer are described in, for example, Japanese Patent Laid-Open No. 2017-32711. The entire description of this gazette is incorporated herein by reference.

C-3.抗反射層 抗反射層係用以防止外界光之反射之層。抗反射層形成用之樹脂組合物例如可含有能夠藉由熱、光(紫外線等)或電子束等而硬化之硬化性化合物。抗反射層可為僅由1層構成之單層,亦可為包含2層以上之複數層。抗反射層及抗反射層形成用之樹脂組合物之詳細內容例如記載於日本專利特開2012-155050號公報。該公報之全部記載係作為參考而引用至本說明書中。C-3. Anti-reflection layer The anti-reflection layer is used to prevent the reflection of external light. The resin composition for antireflection layer formation may contain, for example, a curable compound that can be cured by heat, light (ultraviolet rays, etc.), electron beams, or the like. The antireflection layer may be a single layer composed of only one layer, or may be a plurality of layers including two or more layers. Details of the antireflection layer and the resin composition for forming the antireflection layer are described in, for example, Japanese Patent Laid-Open No. 2012-155050. The entire description of this gazette is incorporated herein by reference.

D.偏光板 上述A至C項所記載之光學積層體可應用於偏光板。因此,本發明亦包含使用此種光學積層體之偏光板。代表性而言,偏光板具有偏光元件及配置於偏光元件之單側之本發明之光學積層體。光學積層體係其基材膜側與偏光元件貼合,可作為偏光元件之保護層而發揮功能。D. Polarizing plate The optical laminates described in the above items A to C can be applied to polarizing plates. Therefore, the present invention also includes a polarizing plate using such an optical laminate. Typically, a polarizing plate has a polarizing element and the optical laminate of the present invention arranged on one side of the polarizing element. In the optical laminate system, the base film side is bonded to the polarizer, and can function as a protective layer of the polarizer.

作為偏光元件,可採用任意合適之偏光元件。例如,形成偏光元件之樹脂膜可為單層之樹脂膜,亦可為兩層以上之積層體。As the polarizing element, any suitable polarizing element can be used. For example, the resin film forming the polarizing element may be a single-layer resin film, or may be a laminate of two or more layers.

作為包含單層樹脂膜之偏光元件之具體例,可列舉:對聚乙烯醇(PVA)系膜、部分縮甲醛化PVA系膜、乙烯-乙酸乙烯酯共聚物系部分皂化膜等親水性高分子膜實施利用碘或二色性染料等二色性物質之染色處理及延伸處理而成者;PVA之脫水處理物或聚氯乙烯之脫氯化氫處理物等多烯系配向膜等。就光學特性優異之方面而言,較佳為使用以碘將PVA系膜染色並單軸延伸而獲得之偏光元件。Specific examples of polarizers including a single-layer resin film include hydrophilic polymers such as polyvinyl alcohol (PVA)-based films, partially formalized PVA-based films, and ethylene-vinyl acetate copolymer-based partially saponified films. The film is obtained by dyeing and stretching treatment with dichroic substances such as iodine or dichroic dyes; polyene-based alignment films such as dehydration products of PVA or dehydrochlorination products of polyvinyl chloride, etc. In terms of excellent optical properties, it is preferable to use a polarizing element obtained by uniaxially extending a PVA-based film by dyeing with iodine.

上述利用碘之染色例如係藉由將PVA系膜浸漬於碘水溶液中而進行。上述單軸延伸之延伸倍率較佳為3~7倍。延伸可於染色處理後進行,亦可一邊染色一邊進行。又,亦可於延伸後進行染色。視需要對PVA系膜實施膨潤處理、交聯處理、洗淨處理、乾燥處理等。例如,藉由在染色前將PVA系膜浸漬於水中進行水洗,不僅可洗淨PVA系膜表面之污垢或抗黏連劑,而且可使PVA系膜膨潤而防止染色不均等。The above-mentioned dyeing with iodine is performed, for example, by immersing the PVA-based film in an aqueous iodine solution. The stretching ratio of the above-mentioned uniaxial stretching is preferably 3 to 7 times. The stretching may be carried out after the dyeing treatment, or may be carried out while dyeing. Moreover, you may dye it after extending|stretching. The PVA-based film is subjected to swelling treatment, crosslinking treatment, washing treatment, drying treatment, and the like as necessary. For example, by immersing the PVA film in water and washing it before dyeing, not only the dirt and anti-blocking agent on the surface of the PVA film can be removed, but also the PVA film can be swelled to prevent uneven dyeing.

作為使用積層體而獲得之偏光元件之具體例,可列舉使用樹脂基材與積層於該樹脂基材之PVA系樹脂層(PVA系樹脂膜)之積層體、或樹脂基材與塗佈形成於該樹脂基材之PVA系樹脂層之積層體而獲得之偏光元件。使用樹脂基材與塗佈形成於該樹脂基材之PVA系樹脂層之積層體而獲得之偏光元件例如可藉由以下方法製作:將PVA系樹脂溶液塗佈於樹脂基材,加以乾燥而於樹脂基材上形成PVA系樹脂層,從而獲得樹脂基材與PVA系樹脂層之積層體;將該積層體進行延伸及染色而將PVA系樹脂層製成偏光元件。於本實施形態中,延伸代表性而言包括將積層體浸漬於硼酸水溶液中進行延伸。進而,延伸可視需要進而包括於硼酸水溶液中之延伸前將積層體於高溫(例如,95℃以上)下進行空中延伸。所獲得之樹脂基材/偏光元件之積層體可直接使用(即,可將樹脂基材設為偏光元件之保護層),亦可將樹脂基材從樹脂基材/偏光元件之積層體剝離,於該剝離面積層符合目的之任意合適之保護層而使用。此種偏光元件之製造方法之詳細內容例如記載於日本專利特開2012-73580號公報。該公報之全部記載係作為參考而引用至本說明書中。Specific examples of the polarizing element obtained by using the laminate include a laminate using a resin substrate and a PVA-based resin layer (PVA-based resin film) laminated on the resin substrate, or a resin substrate and coating formed on A polarizing element obtained by a laminate of PVA-based resin layers of the resin substrate. A polarizing element obtained by using a laminate of a resin substrate and coating a PVA-based resin layer formed on the resin substrate can be produced, for example, by the following method: apply a PVA-based resin solution to a resin substrate, dry it, and A PVA-based resin layer is formed on the resin substrate to obtain a laminate of the resin substrate and the PVA-based resin layer; the laminate is stretched and dyed to form the PVA-based resin layer into a polarizer. In the present embodiment, the stretching typically involves immersing the layered body in a boric acid aqueous solution for stretching. Further, the stretching may further include performing in-air stretching of the laminate at a high temperature (eg, 95° C. or higher) before stretching in a boric acid aqueous solution, if necessary. The obtained laminate of resin substrate/polarizer can be used as it is (that is, the resin substrate can be used as a protective layer of the polarizer), or the resin substrate can be peeled off from the laminate of resin substrate/polarizer, Any suitable protective layer suitable for the purpose of the peeling area layer is used. The details of the manufacturing method of such a polarizing element are described in, for example, Japanese Patent Laid-Open No. 2012-73580. The entire description of this gazette is incorporated herein by reference.

偏光元件之厚度例如為1 μm~80 μm。於一實施形態中,偏光元件之厚度較佳為2 μm~30 μm,進而較佳為3 μm~25 μm。The thickness of the polarizing element is, for example, 1 μm to 80 μm. In one embodiment, the thickness of the polarizing element is preferably 2 μm to 30 μm, and more preferably 3 μm to 25 μm.

E.圖像顯示裝置 上述D項所記載之偏光板可應用於圖像顯示裝置。因此,本發明亦包含使用此種偏光板之圖像顯示裝置。作為圖像顯示裝置之代表例,可列舉:液晶顯示裝置、有機電致發光(EL)顯示裝置。圖像顯示裝置係採用業界所周知之構成,因此省略詳細之說明。 實施例E. Image Display Device The polarizing plate described in the above item D can be applied to an image display device. Therefore, the present invention also includes an image display device using such a polarizing plate. Typical examples of the image display device include a liquid crystal display device and an organic electroluminescence (EL) display device. The image display device adopts a well-known structure in the industry, so detailed description is omitted. Example

以下,藉由實施例對本發明進行具體說明,但本發明並不限定於該等實施例。各特性之測定方法如以下所述。再者,只要無特別明確記載,則實施例中之「份」及「%」為重量基準。 (1)溶出至表面處理層之丙烯酸系樹脂之成分之比率 藉由使用三維光折射率/膜厚測定裝置稜鏡耦合器(Metricon公司製造,Metricon2010/M)之方法,測定溶出至表面處理層之丙烯酸系樹脂之成分之比率。使用稜鏡耦合器之折射率之測定係於以下之條件下實施。 ・測定條件 光源:594 nm 模式:TE(transverse electric,橫向電場) 掃描(Scan):300~-300 (1-1)基材膜之折射率R1 測量類型(Measurement type):塊體/基板(Bulk/Substrate) 藉由基材膜之測定檢測模式(稱為Knee)。將藉由測定獲得之折射率設為R1。 (1-2)表面處理層之折射率R2 Measurement type:單層膜(Single Film)(稜鏡耦合(Prism Couple)) 使用PET基材(Toray公司製造,商品名:U48-3,折射率:1.60)作為基材膜,將塗佈層之加熱溫度設為60℃,除此以外,以與各實施例同樣之方式,獲得與各實施例相同厚度之積層體。藉由以Single Film模式測定該積層體,而檢測出複數種模式。將藉由測定獲得之折射率設為R2。 (1-3)自基材膜側起沿表面處理層之方向3.0 μm深度之位置之折射率R3 Measurement type:Single Film(Prism Couple) 解析方法:折射率梯度(Index gradient) 於在光學積層體中折射率沿深度方向變化之情形時,藉由上述使用稜鏡耦合器之方法,可定量地求出相對於深度方向之折射率變化。 藉由光學積層體之測定,檢測出複數種模式,藉由Index gradient解析,算出相對於深度方向之折射率變化。基於以下之式確定自基材膜側起沿表面處理層之方向「3.0 μm深度之位置」,將所獲得之折射率設為R3。 「3.0 μm深度之位置」(距表面處理側之位置)=表面處理層厚度(PET基材硬塗層厚度)-(3 μm) (1-4)構成自基材膜側起沿表面處理層方向之深度3.0 μm之位置之成分中溶出至表面處理層之丙烯酸系樹脂之成分之比率X 根據以下之式,算出構成自基材膜側起沿表面處理層方向之深度3.0 μm之位置之成分中溶出至表面處理層之丙烯酸系樹脂之成分之比率X(%)。 X(%)=(R3-R2)×100/(R1-R2) (2)外觀評價 關於實施例及比較例中獲得之光學積層體,藉由目視確認外觀不良(源自形成於基材膜之損傷之外觀不良)之有無,藉由以下之指標加以判定。 ○:目視到損傷痕跡 ×:未目視到損傷痕跡 (3)密接性評價 依照JIS K-5400之柵格剝離試驗(柵格數:100個)對表面處理層對基材膜之密接性進行評價,藉由以下之指標加以判定。 〇:柵格剝離數為0個 ×:柵格剝離數為1個以上Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited to these examples. The measurement method of each characteristic is as follows. In addition, unless otherwise specified, "parts" and "%" in the examples are based on weight. (1) The ratio of the components of the acrylic resin eluted into the surface-treated layer The elution to the surface-treated layer was measured by a method using a three-dimensional optical refractive index/film thickness measuring device and a coupler (manufactured by Metricon, Metricon 2010/M). The ratio of the composition of the acrylic resin. The measurement of the refractive index using the halide coupler was carried out under the following conditions.・Measurement conditions Light source: 594 nm Mode: TE (transverse electric, transverse electric field) Scan: 300~-300 (1-1) Refractive index R1 of the substrate film Measurement type: Bulk/substrate ( Bulk/Substrate) is detected by the detection mode of the substrate film (called Knee). Let the refractive index obtained by measurement be R1. (1-2) Refractive index R2 of the surface treatment layer Measurement type: Single Film (Prism Couple) PET substrate (manufactured by Toray, trade name: U48-3, refractive index: 1.60) Except having set the heating temperature of the coating layer to 60° C. as a base film, in the same manner as in each example, a laminate having the same thickness as in each example was obtained. By measuring the laminate in the Single Film mode, a plurality of modes are detected. Let the refractive index obtained by measurement be R2. (1-3) Refractive index R3 at a depth of 3.0 μm in the direction of the surface treatment layer from the base film side Measurement type: Single Film (Prism Couple) Analysis method: Index gradient in the optical laminate In the case where the refractive index changes in the depth direction, the change in the refractive index with respect to the depth direction can be quantitatively obtained by using the above-mentioned method using a halide coupler. A plurality of modes are detected by the measurement of the optical laminate, and the change in refractive index with respect to the depth direction is calculated by the Index gradient analysis. Based on the following formula, "the position of the depth of 3.0 μm" in the direction of the surface treatment layer from the base film side was determined, and the obtained refractive index was set as R3. "Position at a depth of 3.0 μm" (position from the surface treatment side) = thickness of the surface treatment layer (thickness of the PET substrate hard coat layer) - (3 μm) (1-4) constitutes the surface treatment layer from the base film side The ratio X of the components of the acrylic resin eluted to the surface treatment layer among the components at the depth of 3.0 μm in the direction The components constituting the position of the depth of 3.0 μm in the direction of the surface treatment layer from the base film side were calculated according to the following formula. The ratio X (%) of the components of the acrylic resin eluted in the surface treatment layer. X(%)=(R3-R2)×100/(R1-R2) (2) Appearance evaluation Regarding the optical laminates obtained in the examples and comparative examples, poor appearance (derived from the formation on the base film) was visually confirmed The presence or absence of damage (defective appearance) is judged by the following indicators. ○: Damage marks are visually observed ×: No damage marks are visually observed (3) Adhesion evaluation The adhesion of the surface treatment layer to the base film was evaluated in accordance with the grid peeling test of JIS K-5400 (number of grids: 100) , judged by the following indicators. 〇: The number of grid peeling is 0 ×: The number of grid peeling is 1 or more

<實施例1> 1.基材膜之製作 利用單甲基胺將MS樹脂(MS-200;甲基丙烯酸甲酯/苯乙烯(莫耳比)=80/20之共聚物,新日鐵化學股份有限公司製造)進行醯亞胺化(醯亞胺化率:5%)。所獲得之醯亞胺化MS樹脂具有通式(1)所表示之戊二醯亞胺單元(R1 及R3 為甲基,R2 為氫原子)、通式(2)所表示之(甲基)丙烯酸酯單元(R4 及R5 為甲基)、及苯乙烯單元。再者,上述醯亞胺化係使用口徑15 mm之嚙合型同方向旋轉式雙軸擠出機。將擠出機之各調溫區之設定溫度設為230℃,將螺桿轉速設為150 rpm,以2.0 kg/hr供給MS樹脂,單甲基胺之供給量係相對於MS樹脂100重量份而設為2重量份。從料斗投入MS樹脂,藉由捏合段使樹脂熔融及充滿後,從噴嘴注入單甲基胺。於反應區之末端裝入密封圈使樹脂充滿。將排氣口之壓力減壓為-0.08 MPa而將反應後之副產物及過量之甲基胺去除揮發物。以線料形式從設置於擠出機出口之模具排出之樹脂於水槽中冷卻後,藉由造粒機進行顆粒化。所獲得之醯亞胺化MS樹脂之醯亞胺化率為5.0%,酸值為0.5 mmol/g。 將上述所獲得之醯亞胺化MS樹脂100重量份與芯殼型粒子5重量份投入至單軸擠出機中進行熔融混合,通過T模而進行膜形成,藉此獲得擠出膜。將所獲得之擠出膜於延伸溫度140℃下沿長度方向及寬度方向分別同時雙軸延伸為2倍。延伸速度於長度方向及寬度方向均為10%/秒。 由此製作厚度30 μm之基材膜A。 2.光學積層體之製作 以硬化後之厚度成為6 μm之方式,於上述基材膜A之單側塗佈UV硬化性樹脂(將4-HBA(4-hydroxybutyl acrylate,丙烯酸4-羥基丁酯)(大阪有機化學工業股份有限公司製造)16重量份、NK低聚UA-53H-80BK(新中村化學工業股份有限公司製造)32重量份、Viscoat #300(大阪有機化學工業股份有限公司製造)48重量份、A-GLY-9E(新中村化學工業股份有限公司製造)4重量份、及IRGACURE 907(BASF製造)2.4重量份加以混合,分別藉由MIBK(methyl isobutyl ketone,甲基異丁基酮):PGM(Propylene glycol monomethylether,丙二醇單甲醚)=50:50之溶劑以固形物成分濃度成為42.0%之方式稀釋而成者)而形成塗佈層。繼而,將上述塗佈層於70℃下加以乾燥,並且進行UV硬化,藉此獲得於基材膜A之單側形成有硬塗層之光學積層體1。將上述光學積層體1供於各評價。將結果示於表1。<Example 1> 1. Preparation of base film MS resin (MS-200; copolymer of methyl methacrylate/styrene (mol ratio) = 80/20, Nippon Steel Chemicals) was prepared using monomethylamine. Co., Ltd. product) imidization was performed (imidation rate: 5%). The obtained imidized MS resin has glutarimide units represented by the general formula (1) (R 1 and R 3 are methyl groups, R 2 is a hydrogen atom), and ( Meth)acrylate units (R 4 and R 5 are methyl groups), and styrene units. In addition, the above-mentioned imidization was carried out using a meshing type co-rotating twin-screw extruder with a diameter of 15 mm. The set temperature of each tempering zone of the extruder was set to 230° C., the screw speed was set to 150 rpm, and the MS resin was supplied at 2.0 kg/hr. The supply amount of monomethylamine was based on 100 parts by weight of the MS resin. 2 parts by weight. The MS resin was injected from the hopper, and after the resin was melted and filled by the kneading stage, monomethylamine was injected from the nozzle. A sealing ring was installed at the end of the reaction zone to fill the resin. The pressure of the exhaust port was reduced to -0.08 MPa to remove the by-products and excess methylamine after the reaction to remove volatiles. The resin discharged from the die set at the outlet of the extruder in the form of strands is cooled in a water tank, and then pelletized by a pelletizer. The imidization rate of the obtained imidized MS resin was 5.0%, and the acid value was 0.5 mmol/g. 100 parts by weight of the imidized MS resin obtained above and 5 parts by weight of the core-shell particles were put into a uniaxial extruder, melt-mixed, and film-formed through a T-die to obtain an extruded film. The obtained extruded film was simultaneously biaxially stretched by 2 times in the longitudinal direction and the width direction at a stretching temperature of 140°C. The extension speed was 10%/sec in both the longitudinal direction and the width direction. Thus, a base film A having a thickness of 30 μm was produced. 2. Fabrication of the optical laminate In such a way that the thickness after curing becomes 6 μm, a UV curable resin (4-HBA (4-hydroxybutyl acrylate, 4-hydroxybutyl acrylate) is coated on one side of the above-mentioned base film A. ) (manufactured by Osaka Organic Chemical Industry Co., Ltd.) 16 parts by weight, NK oligo UA-53H-80BK (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) 32 parts by weight, Viscoat #300 (manufactured by Osaka Organic Chemical Industry Co., Ltd.) 48 parts by weight, 4 parts by weight of A-GLY-9E (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), and 2.4 parts by weight of IRGACURE 907 (manufactured by BASF) were mixed with MIBK (methyl isobutyl ketone, methyl isobutyl ketone). ketone): PGM (Propylene glycol monomethyl ether, propylene glycol monomethyl ether) = 50:50 solvent diluted so that the solid content concentration becomes 42.0%) to form a coating layer. Then, the said coating layer was dried at 70 degreeC, and UV hardening was performed, and the optical laminated body 1 which formed the hard-coat layer on one side of the base film A was obtained. The above-mentioned optical layered body 1 was used for each evaluation. The results are shown in Table 1.

<實施例2> 1.基材膜之製作 將芯殼型粒子之調配量設為10重量份,並且將擠出膜之延伸溫度設為150℃,除此以外,以與實施例1同樣之方式製作基材膜B。 2.光學積層體之製作 除了使用上述基材膜B以外,以與實施例1同樣之方式獲得於基材膜B之單側形成有硬塗層之光學積層體2。將上述光學積層體2供於各評價。將結果示於表1。<Example 2> 1. Preparation of base film The same procedure as in Example 1 was carried out, except that the blending amount of the core-shell particles was set to 10 parts by weight, and the stretching temperature of the extruded film was set to 150° C. The base film B was produced in the same manner. 2. Production of optical laminate An optical laminate 2 having a hard coat layer formed on one side of the substrate film B was obtained in the same manner as in Example 1, except that the above-mentioned base film B was used. The above-mentioned optical layered body 2 was used for each evaluation. The results are shown in Table 1.

<實施例3> 1.基材膜之製作 將芯殼型粒子之調配量設為10重量份,並且將擠出膜之延伸溫度設為160℃,除此以外,以與實施例1同樣之方式製作基材膜C。 2.光學積層體之製作 除了使用上述基材膜C以外,以與實施例1同樣之方式獲得於基材膜C之單側形成有硬塗層之光學積層體3。將上述光學積層體3供於各評價。將結果示於表1。<Example 3> 1. Preparation of base film The same procedure as in Example 1 was carried out, except that the blending amount of the core-shell particles was set to 10 parts by weight, and the stretching temperature of the extruded film was set to 160° C. The base film C was produced by the method. 2. Production of optical laminate An optical laminate 3 having a hard coat layer formed on one side of the substrate film C was obtained in the same manner as in Example 1, except that the aforementioned base film C was used. The above-mentioned optical layered body 3 was used for each evaluation. The results are shown in Table 1.

<實施例4> 1.基材膜之製作 將芯殼型粒子之調配量設為13重量份,並且將擠出膜之延伸溫度設為152℃,除此以外,以與實施例1同樣之方式製作基材膜D。 2.光學積層體之製作 除了使用上述基材膜D以外,以與實施例1同樣之方式獲得於基材膜D之單側形成有硬塗層之光學積層體4。將上述光學積層體4供於各評價。將結果示於表1。<Example 4> 1. Preparation of base film The same procedure as in Example 1 was carried out, except that the blending amount of the core-shell particles was 13 parts by weight, and the stretching temperature of the extruded film was 152° C. The base film D was produced by the method. 2. Preparation of optical layered body An optical layered body 4 having a hard coat layer formed on one side of the substrate film D was obtained in the same manner as in Example 1, except that the above-mentioned base film D was used. The above-mentioned optical layered body 4 was used for each evaluation. The results are shown in Table 1.

<實施例5> 1.基材膜之製作 將上述所獲得之醯亞胺化MS樹脂100重量份與芯殼型粒子15重量份投入至單軸擠出機進行熔融混合,通過T模而進行膜形成,藉此獲得擠出膜。將所獲得之擠出膜於延伸溫度152℃下沿長度方向及寬度方向分別同時雙軸延伸為2倍。延伸速度於長度方向及寬度方向均為10%/秒。 由此製作厚度40 μm之基材膜E。 2.光學積層體之製作 除了使用上述基材膜E以外,以與實施例1同樣之方式獲得於基材膜E之單側形成有硬塗層之光學積層體5。將上述光學積層體5供於各評價。將結果示於表1。<Example 5> 1. Preparation of base film 100 parts by weight of the imidized MS resin obtained above and 15 parts by weight of core-shell particles were put into a uniaxial extruder, melt-mixed, and passed through a T-die. A film is formed, whereby an extruded film is obtained. The obtained extruded film was simultaneously biaxially stretched by 2 times in the longitudinal direction and the width direction at a stretching temperature of 152°C. The extension speed was 10%/sec in both the longitudinal direction and the width direction. Thus, a base film E having a thickness of 40 μm was produced. 2. Preparation of Optical Laminated Body An optical layered body 5 having a hard coat layer formed on one side of the base film E was obtained in the same manner as in Example 1 except that the above-described base film E was used. The above-mentioned optical layered body 5 was used for each evaluation. The results are shown in Table 1.

<實施例6> 1.基材膜之製作 將芯殼型粒子之調配量設為23重量份,並且將擠出膜之延伸溫度設為137℃,除此以外,以與實施例1同樣之方式製作基材膜F。 2.光學積層體之製作 除了使用上述基材膜F以外,以與實施例1同樣之方式獲得於基材膜F之單側形成有硬塗層之光學積層體6。將上述光學積層體6供於各評價。將結果示於表1。<Example 6> 1. Preparation of base film The same procedure as in Example 1 was carried out, except that the blending amount of the core-shell particles was 23 parts by weight, and the stretching temperature of the extruded film was 137° C. The base film F was produced by the method. 2. Production of optical laminate An optical laminate 6 having a hard coat layer formed on one side of the base film F was obtained in the same manner as in Example 1, except that the above-mentioned base film F was used. The above-mentioned optical layered body 6 was used for each evaluation. The results are shown in Table 1.

<實施例7> 1.基材膜之製作 將上述所獲得之醯亞胺化MS樹脂100重量份與芯殼型粒子23重量份投入至單軸擠出機進行熔融混合,通過T模而進行膜形成,藉此獲得擠出膜。將所獲得之擠出膜於延伸溫度152℃下沿長度方向及寬度方向分別同時雙軸延伸為2倍。延伸速度於長度方向及寬度方向均為10%/秒。 由此製作厚度20 μm之基材膜G。 2.光學積層體之製作 除了使用上述基材膜G以外,以與實施例1同樣之方式獲得於基材膜G之單側形成有硬塗層之光學積層體7。將上述光學積層體7供於各評價。將結果示於表1。<Example 7> 1. Preparation of base film 100 parts by weight of the imidized MS resin obtained above and 23 parts by weight of core-shell particles were put into a uniaxial extruder, melt-mixed, and passed through a T-die. A film is formed, whereby an extruded film is obtained. The obtained extruded film was simultaneously biaxially stretched by 2 times in the longitudinal direction and the width direction at a stretching temperature of 152°C. The extension speed was 10%/sec in both the longitudinal direction and the width direction. Thus, a base film G with a thickness of 20 μm was produced. 2. Production of optical laminate An optical laminate 7 in which a hard coat layer was formed on one side of the substrate film G was obtained in the same manner as in Example 1, except that the aforementioned base film G was used. The above-mentioned optical layered body 7 was used for each evaluation. The results are shown in Table 1.

<實施例8> 1.基材膜之製作 將芯殼型粒子之調配量設為10重量份,並且將擠出膜之延伸溫度設為160℃,除此以外,以與實施例1同樣之方式製作基材膜H。 2.光學積層體之製作 使用上述基材膜H,將乾燥後之膜厚設為15 μm,除此以外,以與實施例1同樣之方式獲得於基材膜H之單側形成有硬塗層之光學積層體8。將上述光學積層體8供於各評價。將結果示於表1。<Example 8> 1. Preparation of base film The same procedure as in Example 1 was carried out, except that the blending amount of the core-shell particles was set to 10 parts by weight, and the stretching temperature of the extruded film was set to 160° C. The base film H was produced by the method. 2. Preparation of Optical Layered Product A hard coat was formed on one side of the base film H in the same manner as in Example 1, except that the base film H was used and the film thickness after drying was set to 15 μm. Optical laminate 8 of layers. The above-mentioned optical layered body 8 was used for each evaluation. The results are shown in Table 1.

<比較例1> 1.基材膜之製作 將上述所獲得之醯亞胺化MS樹脂投入至單軸擠出機進行熔融混合,通過T模而進行膜形成,藉此獲得擠出膜。將所獲得之擠出膜於延伸溫度130℃下沿長度方向及寬度方向分別同時雙軸延伸為2倍。延伸速度於長度方向及寬度方向均為10%/秒。 由此製作厚度40 μm之基材膜I。 2.光學積層體之製作 除了使用上述基材膜I以外,以與實施例1同樣之方式獲得於基材膜I之單側形成有硬塗層之光學積層體9。將上述光學積層體9供於各評價。將結果示於表1。<Comparative Example 1> 1. Preparation of base film An extruded film was obtained by injecting the imidized MS resin obtained above into a uniaxial extruder, melt mixing, and film formation through a T die. The obtained extruded film was simultaneously biaxially stretched by 2 times in the longitudinal direction and the width direction at a stretching temperature of 130°C. The extension speed was 10%/sec in both the longitudinal direction and the width direction. Thus, the base film I with a thickness of 40 μm was produced. 2. Preparation of Optical Laminated Body An optical layered body 9 having a hard coat layer formed on one side of the base film 1 was obtained in the same manner as in Example 1, except that the above-mentioned base film 1 was used. The above-mentioned optical layered body 9 was used for each evaluation. The results are shown in Table 1.

<比較例2> 1.基材膜之製作 除了不調配芯殼型粒子以外,以與實施例1同樣之方式製作基材膜J。 2.光學積層體之製作 除了使用上述基材膜J以外,以與實施例1同樣之方式獲得於基材膜J之單側形成有硬塗層之光學積層體10。將上述光學積層體10供於各評價。將結果示於表1。<Comparative example 2> 1. Production of base film A base film J was produced in the same manner as in Example 1, except that the core-shell particles were not prepared. 2. Production of Optical Laminated Body An optical layered body 10 having a hard coat layer formed on one side of the base film J was obtained in the same manner as in Example 1 except that the above-described base film J was used. The above-mentioned optical layered body 10 was used for each evaluation. The results are shown in Table 1.

<比較例3> 1.基材膜之製作 不調配芯殼型粒子,並且將擠出膜之延伸溫度設為160℃,除此以外,以與實施例1同樣之方式製作基材膜K。 2.光學積層體之製作 除了使用上述基材膜K以外,以與實施例1同樣之方式獲得於基材膜K之單側形成有硬塗層之光學積層體11。將上述光學積層體11供於各評價。將結果示於表1。<Comparative Example 3> 1. Production of base film A base film K was produced in the same manner as in Example 1, except that the core-shell particles were not prepared and the stretching temperature of the extruded film was set to 160°C. 2. Production of optical laminate An optical laminate 11 having a hard coat layer formed on one side of the substrate film K was obtained in the same manner as in Example 1, except that the aforementioned base film K was used. The above-mentioned optical layered body 11 was used for each evaluation. The results are shown in Table 1.

[表1]

Figure 107112246-A0304-0001
[Table 1]
Figure 107112246-A0304-0001

根據表1可知,使用構成自基材膜側起沿表面處理層方向之深度3.0 μm之位置之成分中溶出至表面處理層之上述丙烯酸系樹脂之成分之比率為18%以上的基材膜之實施例1~8之光學積層體之外觀及密接性優異。 [產業上之可利用性]As can be seen from Table 1, the ratio of the components of the acrylic resin eluted to the surface treatment layer in the components constituting the position at a depth of 3.0 μm in the surface treatment layer direction from the base film side was 18% or more. The optical laminates of Examples 1 to 8 were excellent in appearance and adhesiveness. [Industrial Availability]

本發明之光學積層體可適宜地用作偏光元件之保護層。具有本發明之光學積層體作為保護層之偏光板可適宜地用於圖像顯示裝置。如上所述之圖像顯示裝置可用於:攜帶型資訊終端(PDA,portable information terminal)、智慧型手機、行動電話、時鐘、數位相機、攜帶型遊戲機等攜帶型機器;電腦顯示器、筆記型電腦、影印機等OA機器;攝錄影機、電視、微波爐等家庭用電氣設備;後部監視器、汽車導航系統用監視器、汽車音響等車載用機器;數位標牌、商業店鋪用資訊用顯示器等展示機器;監視用監視器等警備機器;護理用監視器、醫療用監視器等護理、醫療機器等各種用途。The optical laminate of the present invention can be suitably used as a protective layer of a polarizing element. The polarizing plate which has the optical laminated body of this invention as a protective layer can be used suitably for an image display apparatus. The image display device as described above can be used for portable devices such as portable information terminals (PDAs), smart phones, mobile phones, clocks, digital cameras, and portable game consoles; computer monitors, notebook computers, etc. OA equipment such as photocopiers; home electrical equipment such as camcorders, televisions, microwave ovens; rear monitors, monitors for car navigation systems, car audio and other in-vehicle equipment; digital signage, information displays for commercial stores, etc. Equipment; security equipment such as monitoring monitors; nursing care and medical equipment such as nursing care monitors and medical monitors.

10‧‧‧基材膜20‧‧‧表面處理層100‧‧‧光學積層體10‧‧‧Substrate film20‧‧‧Surface treatment layer100‧‧‧Optical laminate

圖1係本發明之一實施形態之光學積層體之概略剖視圖。FIG. 1 is a schematic cross-sectional view of an optical laminate according to an embodiment of the present invention.

10‧‧‧基材膜 10‧‧‧Substrate film

20‧‧‧表面處理層 20‧‧‧Surface treatment layer

100‧‧‧光學積層體 100‧‧‧Optical Laminate

Claims (10)

一種光學積層體,其包含含有丙烯酸系樹脂之基材膜、及形成於該基材膜之單側之表面處理層,且構成自上述基材膜側起沿上述表面處理層方向之深度3.0μm之位置之成分中溶出至上述表面處理層之上述丙烯酸系樹脂之成分之比率為18%以上。 An optical laminate comprising a base film containing an acrylic resin, and a surface treatment layer formed on one side of the base film, and having a depth of 3.0 μm in the direction of the surface treatment layer from the base film side The ratio of the component of the said acrylic resin eluted to the said surface treatment layer among the components of the position is 18% or more. 如請求項1之光學積層體,其中於將上述基材膜之折射率設為R1,將上述表面處理層之折射率設為R2,將自上述基材膜側起沿上述表面處理層方向之深度3.0μm之位置之折射率設為R3時,滿足R3≦0.18R1+0.82R2(其中,設為R1<R2)。 The optical laminate according to claim 1, wherein the refractive index of the base film is R1, the refractive index of the surface treatment layer is R2, and the direction of the surface treatment layer from the base film side is When the refractive index of the position with a depth of 3.0 μm is set to R3, R3≦0.18R1+0.82R2 (wherein, R1<R2) is satisfied. 如請求項1或2之光學積層體,其中上述表面處理層之厚度為3μm~20μm。 The optical laminate according to claim 1 or 2, wherein the thickness of the surface treatment layer is 3 μm to 20 μm. 如請求項1或2之光學積層體,其中上述基材膜含有上述丙烯酸系樹脂、及分散至該丙烯酸系樹脂中之芯殼型粒子。 The optical laminate according to claim 1 or 2, wherein the base film contains the acrylic resin and core-shell particles dispersed in the acrylic resin. 如請求項4之光學積層體,其中上述基材膜相對於上述丙烯酸系樹脂100重量份而含有上述芯殼型粒子3重量份~50重量份。 The optical laminate according to claim 4, wherein the base film contains 3 parts by weight to 50 parts by weight of the core-shell particles with respect to 100 parts by weight of the acrylic resin. 如請求項1或2之光學積層體,其中上述丙烯酸系樹脂具有選自由戊 二醯亞胺單元、內酯環單元、順丁烯二酸酐單元、順丁烯二醯亞胺單元及戊二酸酐單元所組成之群中之至少一種。 The optical laminate according to claim 1 or 2, wherein the above-mentioned acrylic resin has a compound selected from the group consisting of pentyl At least one of the group consisting of diimide unit, lactone ring unit, maleic anhydride unit, maleimide unit and glutaric anhydride unit. 如請求項1或2之光學積層體,其中上述表面處理層係塗佈於上述基材膜上之樹脂之硬化層。 The optical laminate according to claim 1 or 2, wherein the surface treatment layer is a hardened layer of a resin coated on the base film. 如請求項1或2之光學積層體,其中上述表面處理層係選自由硬塗層、防眩層及抗反射層所組成之群中之至少一種。 The optical laminate according to claim 1 or 2, wherein the surface treatment layer is at least one selected from the group consisting of a hard coat layer, an antiglare layer, and an antireflection layer. 一種偏光板,其包含偏光元件、及配置於該偏光元件之單側之保護層,且上述保護層係如請求項1至8中任一項之光學積層體。 A polarizing plate comprising a polarizing element and a protective layer disposed on one side of the polarizing element, wherein the protective layer is the optical laminate according to any one of claims 1 to 8. 一種圖像顯示裝置,其具備如請求項9之偏光板。An image display device including the polarizing plate as claimed in claim 9.
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