TWI829385B - A positioning device and wire cutting machine for positioning crystal rods to be wire cut - Google Patents
A positioning device and wire cutting machine for positioning crystal rods to be wire cut Download PDFInfo
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- TWI829385B TWI829385B TW111138171A TW111138171A TWI829385B TW I829385 B TWI829385 B TW I829385B TW 111138171 A TW111138171 A TW 111138171A TW 111138171 A TW111138171 A TW 111138171A TW I829385 B TWI829385 B TW I829385B
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- adjustment
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- positioning
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- bearing platform
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- 239000013078 crystal Substances 0.000 title claims abstract description 128
- 238000005520 cutting process Methods 0.000 title claims description 19
- 239000011347 resin Substances 0.000 claims abstract description 29
- 229920005989 resin Polymers 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 abstract description 16
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 235000012431 wafers Nutrition 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 4
- 238000005563 spheronization Methods 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000002210 silicon-based material Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000009966 trimming Methods 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
- B28D5/045—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Abstract
本發明實施例公開了一種用於定位待被線切割的晶棒的定位裝置,該定位裝置包括:承載台;承載在該承載台上的樹脂板,該樹脂板用於黏接該晶棒;調節元件,該調節元件用於調節該樹脂板相對於該承載台的位置以調節黏接在該樹脂板上的該晶棒的晶相。通過上述調節元件能夠簡單、方便地對黏結後的晶棒進行晶相偏差補償,以獲得滿足製程要求的晶片,有效地提高了生產效率。 An embodiment of the present invention discloses a positioning device for positioning a crystal ingot to be wire-cut. The positioning device includes: a carrying platform; a resin plate carried on the carrying platform, and the resin plate is used to bond the crystal ingot; The adjusting element is used to adjust the position of the resin plate relative to the bearing platform to adjust the crystal phase of the crystal rod bonded to the resin plate. Through the above-mentioned adjustment components, the crystal phase deviation of the bonded crystal rod can be simply and conveniently compensated to obtain a wafer that meets the process requirements, effectively improving production efficiency.
Description
本發明屬於晶片製造領域,尤其關於一種線切割用晶相調整裝置和線切割機。 The invention belongs to the field of wafer manufacturing, and in particular relates to a crystal phase adjustment device for wire cutting and a wire cutting machine.
伴隨資訊化的全球發展,半導體矽材料為迄今為止應用最廣泛的半導體材料,在整個半導體材料的生產和使用中矽材料占95%左右,其主要通過將直拉(Czochralski)法拉制的單晶矽棒切片而製造出,直拉法的主要工序有晶棒拉制、滾圓、切割、拋光、清洗等。在上述工序中,晶棒切割是一道重要工序,一般採取正晶相切割,所謂的正向切割是指要求矽片表面儘量地接近於要求的結晶學平面而沒有偏離,以免晶相誤差影響器件特性,為了達到上述目的一般通過晶相控制技術實現。 With the global development of informatization, semiconductor silicon materials are by far the most widely used semiconductor materials. Silicon materials account for about 95% of the entire production and use of semiconductor materials. They are mainly made of single crystals drawn by the Czochralski method. It is manufactured by slicing silicon rods. The main processes of the Czochralski method include ingot drawing, rounding, cutting, polishing, cleaning, etc. Among the above processes, crystal ingot cutting is an important process, and normal crystal phase cutting is generally adopted. The so-called forward cutting means that the surface of the silicon wafer is required to be as close as possible to the required crystallographic plane without deviation, so as to avoid crystal phase errors affecting the device. Characteristics, in order to achieve the above purposes, are generally achieved through crystal phase control technology.
因為晶體成長時會依照籽晶的晶相方位成長,晶相控制技術主要是在拉晶過程中對籽晶本身作精度控制,然而籽晶本身的晶相存在一定偏差,所以完成晶體生長後會對晶棒的晶相角度做檢測,以免晶相偏差過大超出滾圓製程的修整範圍。晶棒的滾圓加工是通過偏心的方式對晶棒的晶相角度進行調整並定位後再開始滾圓加工,滾圓加工完成後即得到最終的矽棒晶相的結果,後續的晶相補正便只能通過對黏接的位置偏差進行補償來實現。 Because the crystal will grow according to the crystal phase orientation of the seed crystal when growing, the crystal phase control technology mainly controls the seed crystal itself accurately during the crystal pulling process. However, there is a certain deviation in the crystal phase of the seed crystal itself, so after the crystal growth is completed, Detect the crystal phase angle of the crystal rod to prevent the crystal phase deviation from being too large beyond the trimming range of the spheronization process. The spheronization process of the crystal ingot is to adjust and position the crystal phase angle of the crystal ingot eccentrically before starting the spheronization process. After the spheronization process is completed, the final crystal phase result of the silicon ingot is obtained, and subsequent crystal phase correction can only be performed. This is achieved by compensating the positional deviation of the bonding.
當晶棒進行黏接前會通過測量裝置測量晶棒的自身晶相偏差,然後將測量結果與產品需求做出對比後得到用於修正晶棒晶相偏差的黏接條件。上述晶相測量以及與需求對比的過程結束後,按照黏接條件將晶棒黏接在黏接設備上進行切割,上述黏接步驟是通過黏接膠將晶棒、樹脂板和承載台三者黏接在一起。黏接步驟完成後會將晶棒傳送至多線切割裝置進行切割,由於只有矽片完成切割後才能做矽片最終晶相的確認,所以當晶棒被黏接過後就已經初步確定了矽片的初步晶相,而矽片的最終晶相偏差是由晶棒的自身晶相偏差疊加晶棒黏接時的偏差以及多線切割時的偏差得到的,所以矽片的晶相偏差在黏接後就無法進行任何改善,當客戶產品的晶相需求大於黏接機台能力時便很難滿足客戶的產品需求。 Before the crystal rod is bonded, the crystal phase deviation of the crystal rod is measured by a measuring device, and then the measurement results are compared with the product requirements to obtain the bonding conditions used to correct the crystal phase deviation of the crystal rod. After the above process of crystal phase measurement and comparison with requirements is completed, the crystal rod is bonded to the bonding equipment for cutting according to the bonding conditions. The above bonding step is to use the bonding glue to combine the crystal rod, the resin plate and the carrying platform. Glued together. After the bonding step is completed, the crystal ingot will be transferred to the multi-wire cutting device for cutting. Since the final crystal phase of the silicon wafer can only be confirmed after the silicon wafer is cut, the crystal phase of the silicon wafer has been preliminarily determined after the crystal ingot is bonded. The preliminary crystal phase, and the final crystal phase deviation of the silicon wafer is obtained by superimposing the crystal phase deviation of the crystal rod itself with the deviation during bonding of the crystal rod and the deviation during multi-line cutting. Therefore, the crystal phase deviation of the silicon wafer changes after bonding. No improvement can be made. When the crystal phase demand of the customer's product is greater than the bonding machine's capacity, it will be difficult to meet the customer's product demand.
為解決上述技術問題,本發明實施例期望提供一種用於定位待被線切割的晶棒的定位裝置,該定位裝置通過能夠單獨調節晶棒水平位置和垂直位置的調節元件實現對晶棒的晶相偏差的補償。 In order to solve the above technical problems, embodiments of the present invention are expected to provide a positioning device for positioning a crystal rod to be wire-cut. The positioning device realizes the crystal positioning of the crystal rod through an adjustment element that can independently adjust the horizontal position and vertical position of the crystal rod. Compensation for phase deviation.
本發明的技術方案是這樣實現的:一種用於定位待被線切割的晶棒的定位裝置,該定位裝置包括:承載台;承載在該承載台上的樹脂板,該樹脂板用於黏接該晶棒;調節元件,該調節元件用於調節該樹脂板相對於該承載台的位置以調節黏接在該樹脂板上的該晶棒的晶相。 The technical solution of the present invention is implemented as follows: a positioning device for positioning a crystal rod to be wire-cut. The positioning device includes: a bearing platform; a resin plate carried on the bearing platform, and the resin plate is used for bonding The crystal rod; an adjusting element, the adjusting element is used to adjust the position of the resin plate relative to the bearing platform to adjust the crystal phase of the crystal rod bonded to the resin plate.
本發明實施例提供了一種用於定位待被線切割的晶棒的定位裝置,該定位裝置通過設置在承載台與樹脂板之間的調節元件調節黏接在樹脂板上的晶棒的晶相,以使得黏接後的晶棒的晶相偏差得到補償,滿足需求。該定位 裝置結構簡單,操作方便,在晶棒黏接之後也可以對晶棒的晶相進行調節,繼而提高切割後的晶片品質,提高生產效率。 Embodiments of the present invention provide a positioning device for positioning a crystal rod to be wire-cut. The positioning device adjusts the crystal phase of the crystal rod bonded to the resin plate through an adjustment element provided between the bearing platform and the resin plate. , so that the crystal phase deviation of the bonded crystal rod can be compensated and meet the needs. The positioning The device has a simple structure and is easy to operate. The crystal phase of the crystal rod can also be adjusted after the crystal rod is bonded, thereby improving the quality of the cut wafer and improving production efficiency.
1:調節板 1:Adjusting plate
2:晶棒 2:crystal rod
3:樹脂板 3: Resin board
4:承載台 4: Bearing platform
10:定位裝置 10: Positioning device
11:圓柱形插銷 11: Cylindrical pin
12:水平調節螺釘 12: Horizontal adjustment screw
12a:頭部 12a:Head
12b:桿部部分 12b: Rod part
13:連接片 13: Connecting piece
14:水平調節螺孔 14: Horizontal adjustment screw hole
15:豎向調節螺釘 15:Vertical adjustment screw
16:豎向調節螺孔 16: Vertical adjustment screw hole
17:墊塊 17: spacer
121:第一螺釘 121:First screw
122:第二螺釘 122:Second screw
153:第三螺釘 153:Third screw
154:第四螺釘 154:Fourth screw
L:長度 L: length
S11-S15:步驟 S11-S15: Steps
圖1為本發明實施例的用於定位待被線切割的晶棒的定位裝置的結構示意圖;圖2為圖1中定位裝置的左視圖,其中晶棒與樹脂板未示出;圖3為圖2中定位裝置的俯視圖,其中晶棒與樹脂板未示出;圖4為本發明實施例的用於定位待被線切割的晶棒的定位裝置的調節板的結構示意圖;圖5為本發明實施例的定位裝置的使用方法示意圖;圖6為調節本發明實施例的定位裝置的示意圖。 Figure 1 is a schematic structural diagram of a positioning device for positioning a crystal ingot to be wire-cut according to an embodiment of the present invention; Figure 2 is a left view of the positioning device in Figure 1, in which the crystal ingot and the resin plate are not shown; Figure 3 is Figure 2 is a top view of the positioning device, in which the crystal rod and the resin plate are not shown; Figure 4 is a structural schematic diagram of the adjustment plate of the positioning device for positioning the crystal rod to be wire-cut according to an embodiment of the present invention; Figure 5 is a schematic view of the positioning device of the present invention. A schematic diagram of the use method of the positioning device according to the embodiment of the invention; Figure 6 is a schematic diagram of adjusting the positioning device according to the embodiment of the invention.
為利 貴審查委員了解本發明之技術特徵、內容與優點及其所能達到之功效,茲將本發明配合附圖及附件,並以實施例之表達形式詳細說明如下,而其中所使用之圖式,其主旨僅為示意及輔助說明書之用,未必為本發明實施後之真實比例與精準配置,故不應就所附之圖式的比例與配置關係解讀、侷限本發明於實際實施上的申請範圍,合先敘明。 In order to help the review committee understand the technical features, content and advantages of the present invention and the effects it can achieve, the present invention is described in detail below in the form of embodiments with the accompanying drawings and attachments, and the drawings used therein are , its purpose is only for illustration and auxiliary description, and may not represent the actual proportions and precise configurations after implementation of the present invention. Therefore, the proportions and configuration relationships of the attached drawings should not be interpreted or limited to the actual implementation of the present invention. The scope shall be stated first.
在本發明實施例的描述中,需要理解的是,術語“長度”、“寬度”、“上”、“下”、“前”、“後”、“左”、“右”、“垂直”、“水平”、“頂”、“底”“內”、“外”等指示的方位或位置關係為基於附圖所示的方位 或位置關係,僅是為了便於描述本發明實施例和簡化描述,而不是指示或暗示所指的裝置或元件必須具有特定的方位、以特定的方位構造和操作,因此不能理解為對本發明的限制。 In the description of the embodiments of the present invention, it should be understood that the terms "length", "width", "upper", "lower", "front", "back", "left", "right", "vertical" The directions or positional relationships indicated by "horizontal", "top", "bottom", "inside", "outside", etc. are based on the directions shown in the accompanying drawings. or positional relationships are only for the convenience of describing the embodiments of the present invention and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. .
此外,術語“第一”、“第二”僅用於描述目的,而不能理解為指示或暗示相對重要性或者隱含指明所指示的技術特徵的數量。由此,限定有“第一”、“第二”的特徵可以明示或者隱含地包括一個或者更多個所述特徵。在本發明實施例的描述中,“多個”的含義是兩個或兩個以上,除非另有明確具體的限定。 In addition, the terms “first” and “second” are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or implicitly indicating the quantity of indicated technical features. Thus, features defined as “first” and “second” may explicitly or implicitly include one or more of the described features. In the description of the embodiments of the present invention, "plurality" means two or more than two, unless otherwise explicitly and specifically limited.
在本發明實施例中,除非另有明確的規定和限定,術語“安裝”、“相連”、“連接”、“固定”等術語應做廣義理解,例如,可以是固定連接,也可以是可拆卸連接,或成一體;可以是機械連接,也可以是電連接;可以是直接相連,也可以通過中間媒介間接相連,可以是兩個元件內部的連通或兩個元件的相互作用關係。對於本領域的具通常知識者而言,可以根據具體情況理解上述術語在本發明實施例中的具體含義。 In the embodiments of the present invention, unless otherwise expressly stipulated and limited, the terms "installation", "connection", "connection", "fixing" and other terms should be understood in a broad sense. For example, it can be a fixed connection or a removable connection. Disassembly and connection, or integration; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be an internal connection between two elements or an interaction between two elements. For those with ordinary knowledge in the art, the specific meanings of the above terms in the embodiments of the present invention can be understood according to specific circumstances.
下面將結合本發明實施例中的附圖,對本發明實施例中的技術方案進行清楚、完整地描述。 The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention.
參見附圖1所示,本發明實施例的用於定位待被線切割的晶棒的定位裝置能夠通過將黏接後的晶棒的晶相偏差與多線切割機的固有偏差結合做出計算後回饋至調節元件對晶棒的晶相偏差做出補償,定位裝置10包括:承載台4、樹脂板3以及用於調節該樹脂板3相對於該承載台4的位置的調節元件,該承載台4用於承載該定位裝置10的全部部件,該樹脂板3用於黏接待切割的晶棒2,該調節元件包括通過黏接的方式固定安裝在該樹脂板3遠離該晶棒的表面的調節 板1,該調節板1設置有用於調節該調節板1相對於該承載台4水平位置的水平調節螺釘12以及用於調節該調節板1相對於該承載台4垂直位置的豎向調節螺釘15,參見附圖6,水平調節螺釘12包括第一螺釘121和第二螺釘122,豎向調節螺釘15包括第三螺釘153和第四螺釘154。上述水平調節螺釘12和豎向調節螺釘15基於計算所得到的偏差對晶棒2的位置做出相應的調節,以實現對晶棒水平面內的偏差補償和垂直平面內的偏差補償,從而在晶棒2被黏接在樹脂板3後對晶棒2的晶相進行調節,提高切割晶片的品質,提高生產效率。 Referring to FIG. 1 , the positioning device for positioning the crystal rod to be wire-cut according to the embodiment of the present invention can be calculated by combining the crystal phase deviation of the bonded crystal rod with the inherent deviation of the multi-wire cutting machine. The feedback is fed back to the adjustment element to compensate for the crystal phase deviation of the crystal rod. The positioning device 10 includes: a bearing platform 4, a resin plate 3 and an adjustment element used to adjust the position of the resin plate 3 relative to the bearing platform 4. The bearing The stage 4 is used to carry all the components of the positioning device 10, and the resin plate 3 is used to bond the crystal rod 2 to be cut. The adjustment element includes a surface fixedly installed on the surface of the resin plate 3 away from the crystal rod through bonding. adjust The adjustment plate 1 is provided with a horizontal adjustment screw 12 for adjusting the horizontal position of the adjustment plate 1 relative to the bearing platform 4 and a vertical adjustment screw 15 for adjusting the vertical position of the adjustment plate 1 relative to the bearing platform 4 , referring to FIG. 6 , the horizontal adjustment screw 12 includes a first screw 121 and a second screw 122 , and the vertical adjustment screw 15 includes a third screw 153 and a fourth screw 154 . The above-mentioned horizontal adjustment screw 12 and vertical adjustment screw 15 make corresponding adjustments to the position of the crystal rod 2 based on the calculated deviation, so as to realize the deviation compensation in the horizontal plane and the deviation compensation in the vertical plane of the crystal rod, so as to adjust the crystal rod in the crystal rod 2. After the rod 2 is bonded to the resin plate 3, the crystal phase of the crystal rod 2 is adjusted to improve the quality of the cut wafers and improve production efficiency.
參見附圖2至3,本實施例中,該調節板1包括一圓柱形插銷11,該調節板1面向該承載台4的底面的中心位置設有上凹槽以部分地容置該插銷11而使得該插銷11突出該底面,該承載台4在與該調節板1相對的表面的中心位置處設有下凹槽,該下凹槽未完全容置該插銷11凸出該底面的部分,以使得該調節板1能夠以插銷11為定點在垂直平面內擺動,調整該調節板1在垂直平面內相對於該承載台4的位置,從而調整該晶棒2在垂直平面內的晶相方向。另外,該上凹槽與該下凹槽的內徑相同且大於該插銷11直徑,以使得該調節板能夠以插銷11為樞轉軸在水平面內轉動,調整該調節板1在水平面內相對於該承載台4的位置,從而調整該晶棒2在水平面內的晶相方向。 Referring to Figures 2 to 3, in this embodiment, the adjustment plate 1 includes a cylindrical latch 11, and an upper groove is provided at the center of the bottom surface of the adjustment plate 1 facing the bearing platform 4 to partially accommodate the latch 11. To make the latch 11 protrude from the bottom surface, the bearing platform 4 is provided with a lower groove at the center of the surface opposite to the adjustment plate 1. The lower groove does not fully accommodate the portion of the latch 11 that protrudes from the bottom surface. So that the adjusting plate 1 can swing in the vertical plane with the pin 11 as the fixed point, and the position of the adjusting plate 1 in the vertical plane relative to the bearing platform 4 is adjusted, thereby adjusting the crystal phase direction of the crystal rod 2 in the vertical plane. . In addition, the inner diameter of the upper groove and the lower groove are the same and larger than the diameter of the latch 11, so that the adjustment plate can rotate in the horizontal plane with the latch 11 as the pivot axis, and adjust the adjustment plate 1 in the horizontal plane relative to the The position of the carrying platform 4 is adjusted to adjust the crystal phase direction of the crystal rod 2 in the horizontal plane.
參見附圖2至3,在本實施例中,該承載台4形成有關於該承載台4中心對稱的兩個水平調節螺孔14,該兩個水平調節螺孔14沿著該晶棒2的軸向排列並且在水平面中沿著垂直於該晶棒2的方向延伸。參見附圖5,該兩個水平調節螺孔14以沿該晶棒2長度方向與該插銷11的距離為D的方式對稱地佈置在該插銷11兩側。參見附圖2,該調節板1上形成有兩個通孔,該通孔經構造成與該水平調節螺孔14同軸佈置。該兩個水平調節螺釘12的桿部部分12b穿過該通孔並且分別 與水平調節螺孔14配合,其中水平調節螺釘12的頭部12a的直徑大於穿過的通孔的孔徑,以使得通過旋扭水平調節螺釘12,使得水平調節螺釘12在水平調節螺孔14內做軸向運動,從而驅動該承載台4相對於水平調節螺釘12位移,因為水平調節螺釘12的頭部12a直徑大於通孔孔徑即使得該承載台4與該調節板1發生相對運動,也就是說,通過旋扭水平調節螺釘12驅動該調節板1以該插銷11為樞轉軸相對於該承載台4旋轉,進而調節該調節板1相對於該承載台4的相對位置並且在調整結束後將該調節板固定在水平面內,以此實現該晶棒2在水平面的偏差補償。可選地,該兩個水平調節螺孔14位於該承載台4的同一側。 Referring to FIGS. 2 to 3 , in this embodiment, the bearing platform 4 is formed with two horizontal adjustment screw holes 14 that are symmetrical with respect to the center of the bearing platform 4 . The two horizontal adjustment screw holes 14 are along the edge of the crystal rod 2 are arranged axially and extend in a horizontal plane in a direction perpendicular to the crystal rod 2 . Referring to FIG. 5 , the two horizontal adjustment screw holes 14 are symmetrically arranged on both sides of the plug 11 with a distance D from the plug 11 along the length direction of the crystal rod 2 . Referring to FIG. 2 , two through holes are formed on the adjustment plate 1 , and the through holes are configured to be coaxially arranged with the horizontal adjustment screw hole 14 . The stem portions 12b of the two horizontal adjustment screws 12 pass through the through holes and are respectively It cooperates with the horizontal adjustment screw hole 14 , wherein the diameter of the head 12 a of the horizontal adjustment screw 12 is larger than the diameter of the through hole, so that by twisting the horizontal adjustment screw 12 , the horizontal adjustment screw 12 is in the horizontal adjustment screw hole 14 Make axial movement, thereby driving the bearing platform 4 to move relative to the horizontal adjustment screw 12, because the diameter of the head 12a of the horizontal adjustment screw 12 is larger than the diameter of the through hole, which causes the bearing platform 4 to move relative to the adjustment plate 1, that is, That is, by twisting the horizontal adjustment screw 12, the adjusting plate 1 is driven to rotate relative to the bearing platform 4 with the latch 11 as the pivot axis, thereby adjusting the relative position of the adjusting plate 1 relative to the bearing platform 4, and after the adjustment is completed, the adjusting plate 1 is rotated relative to the bearing platform 4. The adjusting plate is fixed in the horizontal plane, thereby realizing the deviation compensation of the crystal rod 2 in the horizontal plane. Optionally, the two horizontal adjustment screw holes 14 are located on the same side of the bearing platform 4 .
在另一實施方式中,參見附圖2至3,該調節板1包括形成在側壁上的兩個連接片13,該兩個連接片13以沿該晶棒2長度方向與該插銷11的距離為D的方式對稱地佈置在該插銷11兩側,該連接片13由該調節板1向該承載台4延伸,上述通孔形成在該連接片13凸出該調節板1側壁的部分上,該通孔經構造成與該水平調節螺孔14同軸佈置。該水平調節螺釘12的桿部部分12b穿過該通孔,其頭部12a抵壓該連接片13,通過連接片13與該調節板1保持相對靜止。可選地,該連接片13與該調節板1一體成型。 In another embodiment, referring to FIGS. 2 to 3 , the adjustment plate 1 includes two connecting pieces 13 formed on the side walls. The two connecting pieces 13 are at a distance from the plug 11 along the length direction of the crystal rod 2 . The connecting piece 13 is symmetrically arranged on both sides of the plug 11 in the manner of D. The connecting piece 13 extends from the adjusting plate 1 to the bearing platform 4. The above-mentioned through hole is formed on the part of the connecting piece 13 that protrudes from the side wall of the adjusting plate 1. The through hole is configured to be coaxially arranged with the horizontal adjustment screw hole 14 . The rod portion 12b of the horizontal adjustment screw 12 passes through the through hole, and its head 12a presses against the connecting piece 13, and remains relatively stationary with the adjusting plate 1 through the connecting piece 13. Optionally, the connecting piece 13 and the adjusting plate 1 are integrally formed.
參見附圖2至3,在本實施例中,該調節板1上還形成有沿著該晶棒2的軸向排列並且沿著豎向延伸的兩個豎向調節螺孔16,該兩個豎向調節螺孔16關於該插銷11對稱地佈置在該調節板1的前後兩端,該兩個豎向調節螺孔16的距離為該調節板1的長度L,該調節元件還包括兩個豎向調節螺釘15,每個豎向調節螺釘15與單個該豎向調節螺孔16配合,通選旋扭該兩個豎向調節螺釘15穿過該豎向調節螺孔16的深度即可以該插銷11為支點微調該調節板1在垂直平面內相對於該承載台4的傾斜角度,並且在調整結束後能夠將該調節板1在垂直平面 內固定。可選地,該調節元件還包括在該承載台4上設置在與每個豎向調節螺釘15對應的位置處的墊塊17以保護該承載台4的表面。 Referring to Figures 2 to 3, in this embodiment, the adjustment plate 1 is also formed with two vertical adjustment screw holes 16 arranged along the axial direction of the crystal rod 2 and extending vertically. The vertical adjustment screw holes 16 are symmetrically arranged at the front and rear ends of the adjustment plate 1 with respect to the latch 11 . The distance between the two vertical adjustment screw holes 16 is the length L of the adjustment plate 1 . The adjustment element also includes two Vertical adjustment screws 15, each vertical adjustment screw 15 cooperates with a single vertical adjustment screw hole 16, and the depth of the two vertical adjustment screws 15 passing through the vertical adjustment screw hole 16 can be adjusted. The latch 11 serves as a fulcrum to fine-tune the inclination angle of the adjustment plate 1 relative to the bearing platform 4 in the vertical plane, and after the adjustment is completed, the adjustment plate 1 can be moved in the vertical plane. Internal fixation. Optionally, the adjustment element also includes a pad 17 provided on the bearing platform 4 at a position corresponding to each vertical adjustment screw 15 to protect the surface of the bearing platform 4 .
在另一實施方式中,該調節板1形成有沿著該晶棒2的軸向排列並且沿著豎向延伸的兩組豎向調節螺孔,該兩組豎向調節螺孔以間距為L的方式關於該調節板1的中心對稱,每組豎向調節螺孔都包括兩個分別位於該晶棒2兩側的兩個豎向調節螺孔,並且該調節元件還包括與單個該豎向調節螺孔配合的豎向調節螺釘。 In another embodiment, the adjustment plate 1 is formed with two sets of vertical adjustment screw holes arranged along the axial direction of the crystal rod 2 and extending in the vertical direction. The two sets of vertical adjustment screw holes are spaced at a distance of L. The way is symmetrical about the center of the adjustment plate 1, each set of vertical adjustment screw holes includes two vertical adjustment screw holes located on both sides of the crystal rod 2, and the adjustment element also includes a single vertical adjustment screw hole. Adjust the screw hole to match the vertical adjustment screw.
本發明的實施例提供一種線切割機,該線切割機包括上述實施例所提供的定位裝置10。 An embodiment of the present invention provides a wire cutting machine, which includes the positioning device 10 provided in the above embodiment.
參見附圖5,其示出了使用本發明的實施例的用於定位待被線切割的晶棒的定位裝置10使用方法,包括以下步驟:S11:使用晶相測量儀測得黏接至樹脂板的晶棒與標準晶相的偏差,獲得晶棒水平偏差H1,晶棒垂直偏差V1;S12:獲取線切割機台固定水平偏差H2,固定垂直偏差V2;S13:因切割後的晶相測量儀是開槽朝下與黏接時在相對位置,所以依據該晶棒水平偏差H1和該固定水平偏差H2獲得整體水平偏差H=H1-H2,依據該晶棒垂直偏差V1和該固定垂直偏差V2獲得整體垂直偏差V=V1-V2;S14:依據該整體水平偏差H和該整體垂直偏差V控制調節元件調節該樹脂板相對於承載台的相對位置;S15:切割該晶棒。 Referring to FIG. 5 , it shows a method of using the positioning device 10 for positioning the crystal rod to be wire-cut according to an embodiment of the present invention, including the following steps: S11: Use a crystal phase measuring instrument to measure the adhesion to the resin. The deviation of the crystal rod of the plate from the standard crystal phase is obtained by obtaining the horizontal deviation H1 of the crystal rod and the vertical deviation V1 of the crystal rod; S12: Obtaining the fixed horizontal deviation H2 and fixed vertical deviation V2 of the wire cutting machine; S13: Measurement of the crystal phase after cutting The instrument is slotted downward and in a relative position during bonding, so based on the horizontal deviation H1 of the crystal rod and the fixed horizontal deviation H2, the overall horizontal deviation H=H1-H2 is obtained, and based on the vertical deviation V1 of the crystal rod and the fixed vertical deviation V2 obtains the overall vertical deviation V=V1-V2; S14: controls the adjusting element to adjust the relative position of the resin plate relative to the bearing platform based on the overall horizontal deviation H and the overall vertical deviation V; S15: cuts the crystal rod.
在上述使用方法中,該S12獲取線切割機台固定水平偏差H2,固定垂直偏差V2具體是指: S121:獲取該線切割機台的m次切割後的晶片的水平偏差和垂直偏差,其中m為大於等於5的整數;S122:計算m個水平偏差和垂直偏差的平均值獲得該固定水平偏差H2和該固定垂直偏差V2。 In the above usage method, the S12 obtains the fixed horizontal deviation H2 of the wire cutting machine, and the fixed vertical deviation V2 specifically refers to: S121: Obtain the horizontal deviation and vertical deviation of the wafer after m cuts of the wire cutting machine, where m is an integer greater than or equal to 5; S122: Calculate the average of m horizontal deviations and vertical deviations to obtain the fixed horizontal deviation H2 and the fixed vertical deviation V2.
在上述使用方法中,參見附圖6,該S14依據該整體水平偏差H和該整體垂直偏差V控制調節元件調節該樹脂板3相對於承載台4的相對位置,具體是指:S141:當該整體水平偏差H為正數時,鬆開第二螺釘122,調整第一螺釘121的位移距離為X,其中X=TAN(H/180*PI())*D,扭緊該第二螺釘122;S142:當該整體水平偏差H為負數時,鬆開第一螺釘121,調整第二螺釘122的位移距離為X,其中X=TAN(H/180*PI())*D,扭緊該第一螺釘121;S143:當該整體垂直偏差V為正數時,鬆開第四螺釘154,調整第三螺釘153的位移距離為Z,其中Z=TAN(V/180*PI())*L/2,扭緊該第四螺釘154;S144:當該整體垂直偏差V為負數時,鬆開第三螺釘153,調整第四螺釘154的位移距離為Z,其中Z=TAN(V/180*PI())*L/2,扭緊該第三螺釘153。 In the above method of use, see Figure 6, S14 controls the adjustment element to adjust the relative position of the resin plate 3 relative to the bearing platform 4 based on the overall horizontal deviation H and the overall vertical deviation V, specifically referring to: S141: When the When the overall horizontal deviation H is a positive number, loosen the second screw 122, adjust the displacement distance of the first screw 121 to X, where X=TAN(H/180*PI())*D, and tighten the second screw 122; S142: When the overall horizontal deviation H is a negative number, loosen the first screw 121, adjust the displacement distance of the second screw 122 to X, where X=TAN(H/180*PI())*D, and tighten the first screw 121. One screw 121; S143: When the overall vertical deviation V is a positive number, loosen the fourth screw 154 and adjust the displacement distance of the third screw 153 to Z, where Z=TAN(V/180*PI())*L/ 2. Tighten the fourth screw 154; S144: When the overall vertical deviation V is a negative number, loosen the third screw 153 and adjust the displacement distance of the fourth screw 154 to Z, where Z=TAN(V/180*PI ())*L/2, tighten the third screw 153.
本發明實施例所提供的用於定位待被線切割的晶棒2的定位裝置10結構簡單,調節方便,不僅有效地降低了人力物力成本,同時在晶棒2被黏接後仍能夠針對晶片偏差實現調節補償,避免了脫膠拆卸晶棒2的步驟,防止對晶棒2造成二次損傷,通過上述定位裝置調節的晶棒在切割後能夠得到良好品質的晶片,並且可以有效提高生產效率,有效地解決了相關技術中的技術問題。 The positioning device 10 provided by the embodiment of the present invention for positioning the crystal rod 2 to be wire-cut has a simple structure and is easy to adjust. It not only effectively reduces the manpower and material costs, but also can still position the wafer after the crystal rod 2 is bonded. The deviation is adjusted and compensated, avoiding the step of degumming and disassembling the crystal rod 2, and preventing secondary damage to the crystal rod 2. The crystal rod adjusted by the above positioning device can obtain good quality wafers after cutting, and can effectively improve production efficiency. Effectively solve technical problems in related technologies.
需要說明的是:本發明實施例所記載的技術方案之間,在不衝突的情況下,可以任意組合。 It should be noted that the technical solutions recorded in the embodiments of the present invention can be combined arbitrarily as long as there is no conflict.
以上僅為本發明之較佳實施例,並非用來限定本發明之實施範圍,如果不脫離本發明之精神和範圍,對本發明進行修改或者等同替換,均應涵蓋在本發明申請專利範圍的保護範圍當中。 The above are only preferred embodiments of the present invention and are not intended to limit the implementation scope of the present invention. If the present invention is modified or equivalently substituted without departing from the spirit and scope of the present invention, the protection shall be covered by the patent scope of the present invention. within the range.
1:調節板 1:Adjusting plate
2:晶棒 2:crystal rod
3:樹脂板 3: Resin board
4:承載台 4: Bearing platform
10:定位裝置 10: Positioning device
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JPH11156849A (en) * | 1997-11-26 | 1999-06-15 | Nippei Toyama Corp | Device for cutting semiconductor ingot |
TWM549782U (en) * | 2017-06-28 | 2017-10-01 | 環球晶圓股份有限公司 | Ingot slicing apparatus and adjusting device thereof |
TW202116513A (en) * | 2019-10-18 | 2021-05-01 | 大陸商上海新昇半導體科技有限公司 | Ingot workpiece board, ingot slicing device and ingot slicing method |
CN215472273U (en) * | 2021-08-30 | 2022-01-11 | 浙江中晶科技股份有限公司 | Silicon rod crystal orientation angle adjusting device |
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