TWI823262B - Gas purification device - Google Patents

Gas purification device Download PDF

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TWI823262B
TWI823262B TW111106318A TW111106318A TWI823262B TW I823262 B TWI823262 B TW I823262B TW 111106318 A TW111106318 A TW 111106318A TW 111106318 A TW111106318 A TW 111106318A TW I823262 B TWI823262 B TW I823262B
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gas
impeller
mentioned
casing
cleaning liquid
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TW111106318A
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TW202325386A (en
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今村啓志
原口秀夫
佐藤康弘
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日商康肯環保設備有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D46/00Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D47/00Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06Spray cleaning
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18Absorbing units; Liquid distributors therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77Liquid phase processes
    • B01D53/78Liquid phase processes with gas-liquid contact

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Treating Waste Gases (AREA)
  • Separation Of Particles Using Liquids (AREA)
  • Gas Separation By Absorption (AREA)
  • Incineration Of Waste (AREA)

Abstract

也就是說,本發明的氣體淨化裝置,具備有:殼罩(12)、葉輪(14)、噴嘴(16);上述殼罩(12),在底面開口有氣體吸入口(12a),在側面開口有氣體排出口(12b);上述葉輪(14),固定於在上述殼罩(12)內部沿著鉛直方向配置的旋轉軸(18),且繞上述旋轉軸(18)旋轉;上述噴嘴(16),將洗淨液(20)噴霧到上述葉輪(14)內。使上述葉輪(14)旋轉且經由上述氣體吸入口(12a)將處理對象的氣體(E)吸入到上述殼罩(12)內,以從上述噴嘴(16)噴霧的上述洗淨液(20)將上述氣體(E)淨化後,再從上述氣體排出口(12b)排出。具有內筒構件(12c),上述內筒構件(12c),從上述氣體吸入口(12a)的周緣朝鉛直方向上方突出,且其上端設置在不與上述葉輪(14)的下端部接觸的高度;在上述內筒構件(12c)與上述殼罩(12)的側壁內面部之間設置有儲液部(12d),上述儲液部(12d)用來將從上述噴嘴(16)所噴霧且通過上述葉輪(14)的洗淨液(20)暫時儲存。That is to say, the gas purification device of the present invention is equipped with: a casing (12), an impeller (14), and a nozzle (16); the casing (12) has a gas suction port (12a) opened on the bottom surface, and a gas suction port (12a) on the side. The opening has a gas discharge port (12b); the above-mentioned impeller (14) is fixed to a rotation axis (18) arranged along the vertical direction inside the above-mentioned casing (12), and rotates around the above-mentioned rotation axis (18); the above-mentioned nozzle (18) 16), spray the cleaning liquid (20) into the above-mentioned impeller (14). The impeller (14) is rotated and the gas (E) to be processed is sucked into the casing (12) through the gas inlet (12a), and the cleaning liquid (20) sprayed from the nozzle (16) is sprayed. After the above-mentioned gas (E) is purified, it is discharged from the above-mentioned gas discharge port (12b). It has an inner cylinder member (12c) that protrudes upward in the vertical direction from the periphery of the gas suction port (12a) and has an upper end disposed at a height that does not contact the lower end of the impeller (14). ; A liquid storage portion (12d) is provided between the inner cylinder member (12c) and the inner surface of the side wall of the housing (12). The liquid storage portion (12d) is used to spray and spray from the nozzle (16). The cleaning liquid (20) passing through the above-mentioned impeller (14) is temporarily stored.

Description

氣體淨化裝置Gas purification device

本發明關於一種氣體淨化裝置,不僅是廢氣,還將包括室內空氣等廣泛的氣體環境中存在的微細粉塵、氣體狀的空氣污染物質、病毒等(以下,簡稱為“粉塵等”),從該氣體環境中去除。The present invention relates to a gas purification device that includes not only exhaust gas but also fine dust, gaseous air pollutants, viruses, etc. (hereinafter, simply referred to as "dust, etc.") existing in a wide range of gas environments such as indoor air. Removed from gas environment.

在這種氣體淨化裝置,以往在下述的專利文獻1(國際公開第2020/183537號)記載有廢氣淨化裝置。該習知技術構造如下所述。具備有:具有廢氣吸入口及廢氣排出口的殼罩、配置於該殼罩內且以旋轉軸所支承的葉輪、及用來將洗淨液噴出到該葉輪內的噴嘴。使上述葉輪旋轉而經由上述廢氣吸入口將包含粉塵及洗淨液可溶性成分的廢氣吸入,從上述噴嘴噴出的洗淨液捕獲廢氣中的粉塵及洗淨液可溶性成分,而將廢氣中所包含的這些成分去除。上述旋轉軸配置於鉛直方向而讓上述葉輪朝水平方向旋轉,並且上述廢氣吸入口開設於上述殼罩的底面。Such a gas purification device has conventionally been described in the following Patent Document 1 (International Publication No. 2020/183537). The conventional technical structure is as follows. It is equipped with: a casing having an exhaust gas inlet and an exhaust gas discharge port, an impeller arranged in the casing and supported by a rotating shaft, and a nozzle for spraying cleaning liquid into the impeller. The impeller is rotated to inhale exhaust gas containing dust and cleaning liquid-soluble components through the exhaust gas inlet. The cleaning liquid sprayed from the nozzle captures the dust and cleaning liquid-soluble components in the exhaust gas, and removes the dust contained in the exhaust gas. These ingredients are removed. The rotation shaft is arranged in a vertical direction to rotate the impeller in a horizontal direction, and the exhaust gas inlet is opened on the bottom surface of the casing.

藉由上述習知技術,由於用來支承葉輪的旋轉軸配置於鉛直方向而讓上述葉輪朝水平方向旋轉,所以離開該葉輪的廢氣及洗淨液會進行氣液接觸且朝水平方向飛散,衝撞殼罩的內壁。接著,與該內壁的壁面衝撞的洗淨液、與洗淨液所捕獲的粉塵,藉由反覆進行上述衝撞讓其粒徑逐漸變大,結果因為重力而沿著內壁流下。同時洗淨液會讓洗淨液可溶性成分溶解且積存。而且由於在殼罩的底面開設有廢氣吸入口,所以在殼罩的內壁面積存的洗淨液、及洗淨液所捕獲的粉塵及洗淨液可溶性成分的大部分,會經由該廢氣吸入口排出到殼罩12之外。 [先前技術文獻] [專利文獻] With the above-mentioned conventional technology, since the rotating shaft used to support the impeller is arranged in the vertical direction and the impeller is rotated in the horizontal direction, the exhaust gas and cleaning liquid leaving the impeller will come into gas-liquid contact and scatter in the horizontal direction, colliding with each other. The inner wall of the shell. Then, the particle size of the cleaning liquid that collides with the inner wall surface and the dust captured by the cleaning liquid gradually increases through repeated collisions. As a result, the dust flows down along the inner wall due to gravity. At the same time, the cleaning fluid will dissolve and accumulate the soluble components of the cleaning fluid. Moreover, since there is an exhaust gas inlet on the bottom surface of the casing, most of the cleaning liquid stored on the inner wall of the casing, as well as the dust captured by the cleaning liquid and the soluble components of the cleaning liquid, will pass through the exhaust gas inlet. discharged out of the housing 12. [Prior technical literature] [Patent Document]

[專利文獻1] 國際公開第2020/183537號[Patent Document 1] International Publication No. 2020/183537

[發明欲解決的課題][Problem to be solved by the invention]

上述習知技術具有下述問題。也就是說,由於是在殼罩內讓葉輪旋轉的構造,所以為了不讓旋轉的葉輪與殼罩接觸,在兩者之間設置有餘隙。因此,在廢氣的淨化對象只有粉塵或洗淨液易溶成分的情況沒有問題,可是在該廢氣的淨化對象為需要對洗淨液溶解或洗淨液的捕獲需要某程度時間的氣體狀的空氣污染物質(例如NOx等)的情況,如果一部分廢氣不經過上述葉輪,而是直接從上述餘隙走捷徑至廢氣排出口,則可能存在廢氣的淨化效率降低的問題。尤其在廢氣吸入口周緣與葉輪下面部之間的餘隙較大的情況,較容易產生該問題。另外,當這種裝置不僅用於淨化廢氣,還用於減少室內空氣中的病毒量時,處理對象的氣體從上述餘隙直接走捷徑到廢氣排出口的情形會是很大的問題。The above-mentioned conventional technology has the following problems. In other words, since the impeller is rotated within the casing, a gap is provided between the rotating impeller and the casing so that the rotating impeller does not come into contact with the casing. Therefore, there is no problem when the purification target of the exhaust gas is only dust or components easily soluble in the cleaning liquid. However, it is not a problem when the purification target of the exhaust gas is gaseous air that requires a certain amount of time to dissolve the cleaning liquid or capture the cleaning liquid. In the case of pollutants (such as NOx, etc.), if part of the exhaust gas does not pass through the above-mentioned impeller, but directly takes a shortcut from the above-mentioned clearance to the exhaust gas outlet, there may be a problem of reduced exhaust gas purification efficiency. This problem is more likely to occur especially when the clearance between the periphery of the exhaust gas inlet and the lower surface of the impeller is large. In addition, when this device is used not only to purify exhaust gas but also to reduce the amount of viruses in indoor air, it is a big problem that the gas to be treated takes a shortcut from the above-mentioned gap directly to the exhaust gas outlet.

本發明的主要目的是要提供一種氣體淨化裝置,不僅是廢氣,也能將包含屋內空氣等的廣泛氣體環境中存在的細微粉塵或氣體狀的空氣污染物質或病毒等,從該氣體環境中有效地去除、減低。 [用以解決課題的手段] The main object of the present invention is to provide a gas purification device that can remove not only exhaust gas but also fine dust, gaseous air pollutants, viruses, etc. existing in a wide range of gas environments including indoor air, etc. from the gas environment. Effectively remove and reduce. [Means used to solve problems]

為了達成上述目的,本發明,如圖1及圖2所示,如下述構成氣體淨化裝置10。也就是說,本發明的氣體淨化裝置,具備有:殼罩12、葉輪14、噴嘴16;上述殼罩12,在底面開口有氣體吸入口12a,在側面開口有氣體排出口12b;上述葉輪14,固定於在上述殼罩12內部沿著鉛直方向配置的旋轉軸18,且繞上述旋轉軸18旋轉;上述噴嘴16,將洗淨液20噴霧到上述葉輪14內。使上述葉輪14旋轉且經由上述氣體吸入口12a將處理對象的氣體E吸入到上述殼罩12內,以從上述噴嘴16噴霧的上述洗淨液20將上述氣體E淨化後,再從上述氣體排出口12b排出。具有內筒構件12c,上述內筒構件12c,從上述氣體吸入口12a的周緣朝鉛直方向上方突出,且其上端設置在不與上述葉輪14的下端部接觸的高度;在上述內筒構件12c與上述殼罩12的側壁內面部之間設置有儲液部12d,上述儲液部12d用來將從上述噴嘴16所噴霧且通過上述葉輪14的洗淨液20暫時儲存。In order to achieve the above object, in the present invention, as shown in FIGS. 1 and 2 , the gas purification device 10 is configured as follows. That is to say, the gas purification device of the present invention is equipped with: a casing 12, an impeller 14, and a nozzle 16; the casing 12 has a gas suction port 12a opened on the bottom surface and a gas discharge port 12b opened on the side; and the impeller 14 , is fixed to the rotating shaft 18 arranged along the vertical direction inside the housing 12 and rotates around the rotating shaft 18; the nozzle 16 sprays the cleaning liquid 20 into the impeller 14. The impeller 14 is rotated and the gas E to be processed is sucked into the casing 12 through the gas inlet 12a. After the gas E is purified with the cleaning liquid 20 sprayed from the nozzle 16, the gas E is discharged from the gas inlet 12a. Discharge from outlet 12b. It has an inner cylindrical member 12c which protrudes upward in the vertical direction from the periphery of the gas suction port 12a and whose upper end is set at a height that does not contact the lower end of the impeller 14; between the inner cylindrical member 12c and A liquid storage portion 12d is provided between the inner surfaces of the side walls of the housing 12. The liquid storage portion 12d is used to temporarily store the cleaning liquid 20 sprayed from the nozzle 16 and passed through the impeller 14.

該發明例如可達成下述效果。由於具有內筒構件12c,上述內筒構件12c,從氣體吸入口12a的周緣朝鉛直方向上方突出,且其上端設置在不與葉輪14的下端部接觸的高度,所以可使氣體吸入口12a周緣與葉輪14下面部之間的餘隙狹窄化,能盡量減少經由該餘隙而走捷徑到氣體排出口12b的氣體E的量。由於在內筒構件12c與殼罩12的側壁內面部之間設置有儲液部12d,上述儲液部12d用來將從噴嘴16所噴霧且通過葉輪14的洗淨液20暫時儲存,所以通過內筒構件12c上端與葉輪14下面部之間的餘隙的氣體E也能某程度與洗淨液20進行氣液接觸。This invention can achieve the following effects, for example. Since the inner cylinder member 12c is provided, the inner cylinder member 12c protrudes upward in the vertical direction from the periphery of the gas suction port 12a, and its upper end is provided at a height that does not contact the lower end of the impeller 14. Therefore, the periphery of the gas suction port 12a can be By narrowing the clearance between the lower surface of the impeller 14 and the lower surface of the impeller 14, the amount of gas E that takes a shortcut to the gas discharge port 12b via the clearance can be reduced as much as possible. Since the liquid storage part 12d is provided between the inner cylinder member 12c and the inner surface of the side wall of the housing 12, the liquid storage part 12d is used to temporarily store the cleaning liquid 20 sprayed from the nozzle 16 and passed through the impeller 14, so through The gas E in the gap between the upper end of the inner cylinder member 12c and the lower surface of the impeller 14 can also come into gas-liquid contact with the cleaning liquid 20 to a certain extent.

在本發明,在上述葉輪14的側周面配設有除霧器22較佳。在該情況,可更促進以葉輪14所吸引的氣體E與洗淨液20的氣液接觸,能使洗淨液20達成的粉塵等的捕獲效率提升。而且藉由將除霧器22配置於葉輪14的側周面,能隨時讓離心力作用於該除霧器22。因此能有效預防氣體E中的粉塵導致該除霧器22產生堵塞情形。In the present invention, it is preferable to provide a demister 22 on the side peripheral surface of the impeller 14 . In this case, the gas-liquid contact between the gas E sucked by the impeller 14 and the cleaning liquid 20 can be further promoted, and the efficiency of capturing dust and the like by the cleaning liquid 20 can be improved. Moreover, by arranging the demister 22 on the side peripheral surface of the impeller 14, centrifugal force can act on the demister 22 at any time. Therefore, the dust in the gas E can be effectively prevented from clogging the mist eliminator 22 .

在本發明,使從上述氣體排出口12b排出到殼罩12外的氣體E的一部分再回到上述氣體吸入口12a較佳。在該情況,可讓氣體E的一部分反覆通過葉輪14,則可更提升氣體E中的粉塵等的去除率。In the present invention, it is preferable that a part of the gas E discharged from the gas discharge port 12b to the outside of the casing 12 is returned to the gas inlet 12a. In this case, a part of the gas E can be allowed to pass through the impeller 14 repeatedly, thereby further improving the removal rate of dust and the like in the gas E.

本發明附加有後述實施方式記載的特有構造較佳。 [發明效果] It is preferable that the present invention is added with a unique structure described in the embodiments described below. [Effects of the invention]

藉由本發明可提供一種氣體淨化裝置,不僅是廢氣,也能將包含屋內空氣等的廣泛氣體環境中存在的細微粉塵或氣體狀的空氣污染物質或病毒等,從該氣體環境中有效地去除、減低。The present invention can provide a gas purification device that can effectively remove not only exhaust gas, but also fine dust, gaseous air pollutants, viruses, etc. present in a wide range of gas environments including indoor air. , reduce.

以下根據圖1及圖2來說明本發明的一實施方式。圖1是顯示本發明的一實施方式的氣體淨化裝置10的概要的顯示圖。如該圖所示,本實施方式的氣體淨化裝置10,是在由不鏽鋼等的金屬所構成的氣密性且堅固的框體24內收容有:具有氣體吸入口12a及氣體排出口12b的殼罩12、配置於該殼罩12內並且以旋轉軸18所支承的葉輪14、及將洗淨液20噴出到該葉輪14內的噴嘴16。該框體24的形狀並未特別限定,也可為四角柱狀也可為圓柱狀。在圖示實施方式,框體24形成為四角柱狀,在構成其頂棚面的頂板26,在對角上互相分離的位置穿設有氣體導入口26a及氣體排出口26b。在氣體導入口26a嵌插有入口短管28,入口短管28連接著與處理對象的氣體環境(未圖示)連通的配管;在氣體排出口26b嵌插有出口雙重管30,出口雙重管30將處理完畢的氣體E排出到框體24外。後面詳細敘述該出口雙重管30。An embodiment of the present invention will be described below based on FIGS. 1 and 2 . FIG. 1 is a display diagram showing an outline of a gas purification device 10 according to an embodiment of the present invention. As shown in the figure, the gas purification device 10 of the present embodiment houses a housing having a gas inlet 12a and a gas discharge port 12b in an airtight and strong frame 24 made of metal such as stainless steel. The cover 12 , the impeller 14 disposed in the cover 12 and supported by the rotating shaft 18 , and the nozzle 16 that sprays the cleaning liquid 20 into the impeller 14 . The shape of the frame 24 is not particularly limited, and may be a square prism or a cylinder. In the illustrated embodiment, the frame 24 is formed in a quadrangular column shape, and a gas inlet 26a and a gas outlet 26b are drilled in the top plate 26 constituting the ceiling surface at diagonally spaced apart positions. An inlet short pipe 28 is inserted into the gas inlet 26a, and the inlet short pipe 28 is connected to a pipe communicating with the gas environment (not shown) of the processing object; an outlet double pipe 30 is inserted into the gas discharge port 26b, and the outlet double pipe 30 is inserted into the gas discharge port 26b. 30 discharges the processed gas E out of the frame 24. The outlet double pipe 30 will be described in detail later.

在頂板26的中央部設置開口26c,在該頂板26的中央的上部,配置有:在旋轉軸18插通於該開口26c的狀態使葉輪14旋轉驅動的馬達32。在該頂板26的中央下部,垂設有殼罩12的側壁也就是短圓筒狀的管壁34。因此在本實施方式,將框體24的頂板26的中央部分共用為殼罩12的頂板。在將後述的葉輪14收容於管壁34內之後,在上述管壁34的下端部安裝環狀的底板36而完成殼罩12,底板36在中央設置有作為氣體吸入口12a的開口。除此之外,在作為氣體吸入口12a的周緣的該底板36的內周緣,藉由焊接等方式水密性地安裝著內筒構件12c,內筒構件12c,朝鉛直方向上方突出,且其上端設置在不與葉輪14的下端部接觸的高度。因此,在該內筒構件12c與作為殼罩12的側壁內面部的管壁34的內周面之間形成有儲液部12d,儲液部12d用來將從噴嘴16所噴霧且通過葉輪14的洗淨液20暫時儲存。在作為殼罩12的側壁的管壁34的接近氣體排出口26b的位置,開口有氣體排出口12b,氣體排出口12b連通於上述出口雙重管30且用來將通過葉輪14的氣體E從殼罩12內排出。An opening 26 c is provided in the center of the top plate 26 , and a motor 32 for rotating and driving the impeller 14 with the rotating shaft 18 inserted into the opening 26 c is disposed above the center of the top plate 26 . At the lower center of the top plate 26, a short cylindrical tube wall 34, which is the side wall of the housing 12, hangs vertically. Therefore, in this embodiment, the central portion of the top plate 26 of the frame 24 is shared as the top plate of the housing 12 . After the impeller 14 (described later) is accommodated in the tube wall 34, an annular bottom plate 36 is installed on the lower end of the tube wall 34 to complete the casing 12. The bottom plate 36 is provided with an opening serving as the gas inlet 12a in the center. In addition, on the inner periphery of the bottom plate 36 serving as the periphery of the gas inlet 12a, an inner cylindrical member 12c is installed water-tightly by welding or the like. The inner cylindrical member 12c protrudes upward in the vertical direction, and its upper end It is installed at a height that does not contact the lower end of the impeller 14 . Therefore, a liquid storage portion 12d is formed between the inner cylinder member 12c and the inner peripheral surface of the tube wall 34 as the inner surface of the side wall of the housing 12. The liquid storage portion 12d is used for spraying from the nozzle 16 through the impeller 14 The cleaning solution 20 is temporarily stored. A gas discharge port 12b is opened in the tube wall 34 as the side wall of the casing 12 at a position close to the gas discharge port 26b. The gas discharge port 12b is connected to the above-mentioned outlet double pipe 30 and is used to discharge the gas E passing through the impeller 14 from the casing. discharged from the cover 12.

這裡針對與氣體排出口12b連通的出口雙重管30來說明,該出口雙重管30,具備有:第1管體30a、第2管體30b;第1管體30a是短管狀且嵌插於氣體排出口26b且在其側周面連通於氣體排出口12b;第2管體30b,其上部是以與第1管體30a相同口徑的管體所構成,經由漸縮管38縮小其下部的口徑,並且將縮徑的下部從第1管體30a的上側插入其內部,將第1管體30a的上端40氣密性地密閉。第2管體30b的下端42,是配置在:較氣體排出口12b的下端更下側,且較第1管體30a的下端44更上側的位置。因此,從氣體排出口12b排出的氣體E的一部分,從第2管體30b的下端42流入(回升)到第2管體30b內,而剩餘的部分(剩餘的氣體E與通過氣體排出口12b的洗淨液20)會因為重力影響而於第1管體30a流下而從其下端44回到框體24內。而通過葉輪14而從氣體排出口12b排出的氣體E之中要將多少量送到第2管體30b側,可以藉由適當設定:框體24的容量、使葉輪14旋轉的馬達32的轉數、第1管體30a及/或第2管體30b的長度或口徑等來加以調節。Here, the outlet double pipe 30 connected to the gas discharge port 12b is explained. The outlet double pipe 30 is provided with: a first pipe body 30a and a second pipe body 30b; the first pipe body 30a is a short tube shape and is inserted into the gas. The discharge port 26b is connected to the gas discharge port 12b on its side peripheral surface; the upper part of the second pipe body 30b is composed of a pipe body with the same diameter as the first pipe body 30a, and the diameter of the lower part is reduced through the reducer tube 38 , and insert the lower part of the reduced diameter into the inside of the first pipe body 30a from the upper side, and airtightly seal the upper end 40 of the first pipe body 30a. The lower end 42 of the second pipe body 30b is disposed below the lower end of the gas discharge port 12b and above the lower end 44 of the first pipe body 30a. Therefore, a part of the gas E discharged from the gas discharge port 12b flows (rises up) into the second pipe body 30b from the lower end 42 of the second pipe body 30b, and the remaining part (the remaining gas E and the gas E discharged from the gas discharge port 12b The cleaning liquid 20) will flow down the first tube 30a due to the influence of gravity and return to the frame 24 from its lower end 44. How much of the gas E discharged from the gas discharge port 12b through the impeller 14 is sent to the second pipe body 30b side can be determined by appropriately setting the capacity of the frame 24 and the rotation speed of the motor 32 that rotates the impeller 14. The number, length or diameter of the first tube body 30a and/or the second tube body 30b can be adjusted.

葉輪14具備有:圓盤狀的頂板46、在頂板46的周緣部的下面部相對於該頂板46的半徑方向以一定角度傾斜,且以預定間隔均等配置在該頂板46的外周部的葉片48、及將該葉片48的下端部彼此連結的環狀的底板50(參考圖2)。The impeller 14 is provided with a disk-shaped top plate 46 and blades 48 whose lower surface at the peripheral edge of the top plate 46 is inclined at a certain angle with respect to the radial direction of the top plate 46 and which are evenly arranged at predetermined intervals on the outer peripheral portion of the top plate 46 . , and an annular bottom plate 50 (see FIG. 2 ) that connects the lower ends of the blades 48 to each other.

在上述頂板46的中央部穿設有供旋轉軸18插通的軸孔46a,在該軸孔46a插通有旋轉軸18的葉輪14,如圖1所示,從旋轉軸18的前端側安裝固定構件52且將其固定於旋轉軸18。A shaft hole 46a through which the rotating shaft 18 is inserted is drilled through the center of the top plate 46. The impeller 14 of the rotating shaft 18 is inserted into the shaft hole 46a. As shown in FIG. 1, it is installed from the front end side of the rotating shaft 18. The member 52 is fixed and fixed to the rotating shaft 18 .

將上述葉片48的下端部彼此連結的環狀的底板50的內徑,設定成大於在殼罩12的底面開口的氣體吸入口12a的直徑。The inner diameter of the annular bottom plate 50 connecting the lower ends of the blades 48 is set to be larger than the diameter of the gas inlet 12 a opened on the bottom surface of the casing 12 .

在本實施方式的葉輪14,涵蓋於頂板46的外周緣與底板50的外周緣之間全周,架設有由不鏽鋼沖壓金屬所構成的透氣性壁材54,在其內側配設有除霧器22。所謂除霧器22是一種霧分離器,例如,將金屬線或樹脂細絲等以多層層疊作成墊子狀,以增加與流體的接觸表面並且具有較小的壓力損失,可因應需要安裝。本發明所使用的除霧器22的種類沒有特別限定,可以使用網狀除霧器、線狀除霧器等。In the impeller 14 of this embodiment, a breathable wall material 54 made of stainless steel stamped metal is installed covering the entire circumference between the outer periphery of the top plate 46 and the outer periphery of the bottom plate 50, and a demister is arranged inside the impeller 14. twenty two. The so-called mist eliminator 22 is a mist separator. For example, metal wires or resin filaments are laminated in multiple layers to form a mat shape to increase the contact surface with the fluid and have smaller pressure loss. It can be installed as needed. The type of demister 22 used in the present invention is not particularly limited, and a mesh demister, a linear demister, etc. can be used.

噴嘴16是一種噴霧噴嘴,是用來將洗淨液20噴霧到葉輪14內,其頭部配設於葉輪14的底部附近。從該噴嘴16噴出的洗淨液20,可因應處理對象的氣體E的種類適當設定。例如,在處理對象的氣體E是含有粉塵或氯氣(Cl 2)等水溶性成分的廢氣的情況下,主要採用水(淡水)作為洗淨液20。在處理對象的氣體E為含有NOx的廢氣的情況,適合以過氧化氫水溶液作為洗淨液20。此外,在處理對象的氣體E為室內空氣並且希望去除漂浮在空氣中的病毒的情況,適合以次氯水作為洗淨液20。在本實施方式的氣體淨化裝置10,從噴嘴16噴出的大部分洗淨液20會伴隨粉塵等而最後於框體24內流下,儲存於該框體24的底部。因此在框體24的底部安裝有排水管線56、或用於調整所儲存的洗淨液20的液位的配管系統58等。 The nozzle 16 is a spray nozzle used to spray the cleaning liquid 20 into the impeller 14 , and its head is arranged near the bottom of the impeller 14 . The cleaning liquid 20 sprayed from the nozzle 16 can be appropriately set according to the type of gas E to be processed. For example, when the gas E to be processed is waste gas containing water-soluble components such as dust or chlorine (Cl 2 ), water (fresh water) is mainly used as the cleaning liquid 20 . When the gas E to be processed is exhaust gas containing NOx, a hydrogen peroxide aqueous solution is suitably used as the cleaning liquid 20 . In addition, when the gas E to be processed is indoor air and it is desired to remove viruses floating in the air, hypochlorine water is suitable as the cleaning liquid 20 . In the gas purification device 10 of this embodiment, most of the cleaning liquid 20 sprayed from the nozzle 16 will flow down the frame 24 along with dust and the like, and be stored at the bottom of the frame 24 . Therefore, a drainage line 56 or a piping system 58 for adjusting the liquid level of the stored cleaning liquid 20 is installed at the bottom of the frame 24 .

接著,當使用如以上構造的本實施方式的氣體淨化裝置10時,首先將電力供給到馬達32使其進行動作,並且將洗淨液20從噴嘴16噴出。然後藉由讓葉輪14以預定的轉速(例如3000~4000rpm左右)高速旋轉,在殼罩12的氣體吸入口12a的附近產生負壓,並且在氣體排出口12b的附近產生朝向該氣體排出口12b的正壓,而在殼罩12內產生氣流。Next, when the gas purification device 10 of the present embodiment configured as above is used, electric power is first supplied to the motor 32 to operate, and the cleaning liquid 20 is sprayed from the nozzle 16 . Then, by causing the impeller 14 to rotate at a predetermined speed (for example, about 3000 to 4000 rpm) at a high speed, a negative pressure is generated near the gas inlet 12a of the casing 12, and a negative pressure is generated near the gas outlet 12b toward the gas outlet 12b. The positive pressure generates air flow in the housing 12.

接著雖然未圖示,使設置在較氣體排出口26b更靠近氣體通流方向的下游側的風扇等的吸氣手段進行動作,開始將處理對象也就是氣體E導入到氣體淨化裝置10。然後經由入口短管28導入到框體24內的氣體E,從成為負壓的氣體吸入口12a進入到殼罩12內,讓其與成為微粒的洗淨液20接觸且通過葉輪14,使其衝撞殼罩12的側壁也就是管壁34。在本實施方式的氣體淨化裝置10,由於在葉輪14的側周面配設有除霧器22,所以能更促進以葉輪14所吸引的氣體E與洗淨液20的氣液接觸,能使洗淨液20對粉塵等的去除效率提升。Next, although not shown in the figure, the suction means such as a fan provided on the downstream side of the gas discharge port 26b in the gas flow direction is operated to start introducing the gas E, which is the process target, into the gas purification device 10 . Then, the gas E introduced into the frame 24 through the inlet short pipe 28 enters the housing 12 from the gas suction port 12a that becomes a negative pressure, and is brought into contact with the cleaning liquid 20 that becomes particles and passes through the impeller 14. The side wall of the impact housing 12 is the tube wall 34 . In the gas purification device 10 of this embodiment, since the mist eliminator 22 is disposed on the side peripheral surface of the impeller 14, it is possible to further promote the gas-liquid contact between the gas E sucked by the impeller 14 and the cleaning liquid 20, thereby enabling The cleaning fluid 20 improves the removal efficiency of dust, etc.

接著,衝撞管壁34的壁面(以下也稱為「內壁面」)的洗淨液20及洗淨液20所捕獲的氣體E中的粉塵等,藉由反覆上述衝撞讓其粒徑逐漸變大,結果因為重力而沿著上述內壁面流下。而且在將洗淨液20與洗淨液20所捕獲的粉塵等,暫時儲存於殼罩12內的儲液部12d之後,越過內筒構件12c的上端溢出,使其經由氣體吸入口12a排出到殼罩12之外。Next, the cleaning liquid 20 that collides with the wall surface of the tube wall 34 (hereinafter also referred to as the “inner wall surface”) and the dust in the gas E captured by the cleaning liquid 20 gradually increase in particle size by repeating the above collision. , as a result, it flows down along the above-mentioned inner wall surface due to gravity. Furthermore, after the cleaning liquid 20 and the dust and the like captured by the cleaning liquid 20 are temporarily stored in the liquid storage portion 12d in the housing cover 12, they overflow over the upper end of the inner cylinder member 12c and are discharged to the gas suction port 12a through the gas suction port 12a. outside the housing 12.

另一方面,已將洗淨液20、粉塵等的大部分去除的氣體E,從氣體排出口12b排出到殼罩12之外。在本實施方式的氣體淨化裝置10,在氣體排出口26b裝備有上述出口雙重管30,所以能使從氣體排出口12b排出到殼罩12之外的氣體E的一部分再回到上述氣體吸入口12a。在該情況,可讓氣體E的一部分反覆通過葉輪14,則可更提升氣體E中的粉塵等的去除率。在圖1中,關於顯示氣體E的流動的箭頭,以實線記載表示未通過葉輪14的氣體E,以虛線記載的表示通過葉輪14後的氣體E。On the other hand, the gas E from which most of the cleaning liquid 20, dust, etc. have been removed is discharged to the outside of the casing 12 through the gas discharge port 12b. In the gas purification device 10 of this embodiment, the gas discharge port 26b is equipped with the outlet double pipe 30. Therefore, a part of the gas E discharged from the gas discharge port 12b to the outside of the casing 12 can be returned to the gas inlet. 12a. In this case, a part of the gas E can be allowed to pass through the impeller 14 repeatedly, thereby further improving the removal rate of dust and the like in the gas E. In FIG. 1 , regarding the arrows showing the flow of the gas E, the solid lines represent the gas E that has not passed through the impeller 14 , and the dashed lines represent the gas E that has passed through the impeller 14 .

而且將出口雙重管30的第2管體30b的下端42,配置在較氣體排出口12b的下端更下側,且配置在較第1管體30a的下端44更上側的位置,所以可減少從框體24內排出洗淨液20及粉塵等。在更需要減少從框體24內放出洗淨液20及粉塵的情況,則在出口雙重管30的第2管體30b的內部設置除霧器等較佳。In addition, the lower end 42 of the second pipe body 30b of the outlet double pipe 30 is disposed below the lower end of the gas discharge port 12b and above the lower end 44 of the first pipe body 30a, so that the number of leaks from the outlet double pipe 30 can be reduced. The cleaning liquid 20 and dust etc. are discharged from the frame 24 . If it is more necessary to reduce the release of cleaning liquid 20 and dust from the frame 24, it is better to provide a demister or the like inside the second pipe body 30b of the outlet double pipe 30.

以本實施方式的氣體淨化裝置10進行氣體淨化處理的氣體E,例如是從半導體製程排出的廢氣的情況,則與將氣體E中的溫室效果氣體成分(例如PFCs(全氟化合物)等)熱分解的分解爐組合組成廢氣去除裝置較佳。上述分解爐的熱源可以是任何熱源,只要能夠將爐內溫度升高到氣體E中的溫室效果氣體成分的熱分解溫度即可,例如,適合使用電熱式加熱器、火焰式燃燒器、非過渡型或過渡型電漿炬等。此外,如果熱分解爐是具有由多個小口徑配管組成的多管式熱交換器的高效型構造,則本實施方式的氣體淨化裝置10至少設置於該分解爐的前段(換言之是上游側)的話,如下所述可以使兩者的加乘效應更加顯著。也就是說,在本實施方式的氣體淨化裝置10,可以從氣體E中去除氣體E中的粉塵之中主要0.1μm至60μm程度的粉塵的95%以上,所以可防止多管式的熱交換器的配管堵塞,能長時間穩定使分解爐連續運轉。結果可使氣體E中的溫室效果氣體成分或空氣污染物質的去除效率顯著提升。If the gas E subjected to gas purification processing by the gas purification apparatus 10 of this embodiment is, for example, waste gas discharged from a semiconductor manufacturing process, the greenhouse effect gas components (such as PFCs (perfluorinated compounds), etc.) in the gas E will be heated. It is better to combine decomposed decomposition furnaces to form a waste gas removal device. The heat source of the above-mentioned decomposition furnace can be any heat source, as long as the temperature in the furnace can be raised to the thermal decomposition temperature of the greenhouse effect gas component in the gas E. For example, electric heaters, flame burners, non-transitional heaters, etc. are suitable for use. Type or transition type plasma torch, etc. In addition, if the thermal decomposition furnace has a high-efficiency structure including a multi-tube heat exchanger composed of a plurality of small-diameter pipes, the gas purification device 10 of this embodiment is installed at least in the front stage (in other words, the upstream side) of the decomposition furnace. If so, the additive effect of the two can be made more significant as described below. That is to say, in the gas purification device 10 of this embodiment, more than 95% of the dust in the gas E can be removed from the gas E, which is mainly about 0.1 μm to 60 μm. Therefore, the multi-tube heat exchanger can be prevented from being damaged. The pipes are blocked and the decomposition furnace can be operated stably and continuously for a long time. As a result, the removal efficiency of greenhouse effect gas components or air pollutants in the gas E can be significantly improved.

在上述實施方式,雖然顯示設置相對於頂板46的半徑方向傾斜一定角度的葉片48來作為葉輪14,而例如雖然未圖示,設置於葉輪14的葉片48的軸部也可與半徑方向一致。在該情況,使葉輪14高速旋轉時所產生的氣體E的吸引力是較上述實施方式更弱,所以在葉輪14的側周面配設有除霧器22的情況,可增加該除霧器22內的氣體E及洗淨液20的滯留時間及移動距離。這樣一來,在該除霧器22內可讓氣體E與洗淨液20充分氣液接觸,能使洗淨液20達成的粉塵等的捕獲效率提升,尤其能提升氣體狀的空氣污染物質或細微的病毒等的捕獲效率。In the above-described embodiment, the impeller 14 is shown to have blades 48 inclined at a certain angle with respect to the radial direction of the top plate 46. However, for example, although not shown, the shaft portion of the blades 48 provided in the impeller 14 may be aligned with the radial direction. In this case, the attraction force of the gas E generated when the impeller 14 is rotated at high speed is weaker than in the above embodiment. Therefore, if a demister 22 is provided on the side peripheral surface of the impeller 14, the number of demisters can be increased. The residence time and moving distance of gas E and cleaning liquid 20 in 22. In this way, the gas E can be fully in gas-liquid contact with the cleaning liquid 20 in the demister 22, which can improve the capture efficiency of dust and the like by the cleaning liquid 20, especially gaseous air pollutants or gaseous air pollutants. Capture efficiency of tiny viruses, etc.

在上述實施方式,作為嵌插於氣體排出口26b的出口雙重管30,是顯示以:在側周面與氣體排出口12b連通的短管狀的第1管體30a、及從該第1管體30a的上側插入其內部而將第1管體30a的上端40氣密性密閉的第2管體30b所構成,而例如也可如圖3所示,將出口雙重管30作成以:在側周面與氣體排出口12b連通的短管狀的第1管體30a、及配設於該第1管體30a的內部,其上端直接連結於氣體排出口12b,並且其下端42在較氣體排出口12b的下端更下側,且配置在較第1管體30a的下端44更上側的位置的彎頭形狀的第2管體30b所構成。在該情況,與上述實施方式同樣地,因此,從氣體排出口12b排出的氣體E的一部分,從第2管體30b的下端42排出後,直接回升到第1管體30a內,而剩餘的部分(剩餘的氣體E與通過氣體排出口12b的洗淨液20)會因為重力影響而於第1管體30a流下而從其下端44回到框體24內。In the above-mentioned embodiment, the outlet double pipe 30 inserted into the gas discharge port 26b is shown as a short tubular first pipe body 30a communicating with the gas discharge port 12b on the side peripheral surface, and a short pipe-shaped first pipe body 30a connected from the first pipe body The upper side of the pipe 30a is inserted into the second pipe body 30b to airtightly seal the upper end 40 of the first pipe body 30a. For example, as shown in Figure 3, the outlet double pipe 30 can be made so that: on the side circumference A short tubular first pipe body 30a whose surface communicates with the gas discharge port 12b is disposed inside the first pipe body 30a. Its upper end is directly connected to the gas discharge port 12b, and its lower end 42 is located farther than the gas discharge port 12b. The lower end of the first pipe body 30a is lower and is arranged above the lower end 44 of the first pipe body 30a. In this case, as in the above embodiment, a part of the gas E discharged from the gas discharge port 12b is discharged from the lower end 42 of the second pipe body 30b and then directly rises back into the first pipe body 30a, while the remaining gas E is discharged from the lower end 42 of the second pipe body 30b. Part (the remaining gas E and the cleaning liquid 20 passing through the gas discharge port 12b) will flow down the first tube 30a due to the influence of gravity and return to the frame 24 from its lower end 44.

在上述實施方式,雖然顯示在氣體淨化裝置10的較氣體排出口26b更靠近氣體通流方向的下游側設置用來輸送氣體E的風扇(未圖示)的情況,而該風扇可因應需要設置,其設置位置不限定於上述型態,例如也可設置在氣體淨化裝置10的較氣體導入口26a更靠近氣體通流方向的上游側。In the above embodiment, although it is shown that a fan (not shown) for transporting the gas E is provided on the downstream side in the gas flow direction of the gas purification device 10 than the gas discharge port 26b, the fan may be provided as needed. , its installation position is not limited to the above type, for example, it may also be installed on the upstream side of the gas inlet 26a of the gas purification device 10 in the gas flow direction.

其他當然可在本領域技術人員可以想像的範圍內做出各種改變。Of course, various other changes can be made within the scope that those skilled in the art can imagine.

10:氣體淨化裝置 12:殼罩 12a:氣體吸入口 12b:氣體排出口 12c:內筒構件 12d:儲液部 14:葉輪 16:噴嘴 18:旋轉軸 20:洗淨液 22:除霧器 E:氣體 10: Gas purification device 12: Shell cover 12a:Gas suction port 12b:Gas discharge port 12c: Inner cylinder component 12d: Liquid storage part 14: Impeller 16:Nozzle 18:Rotation axis 20:Cleaning liquid 22:demister E:gas

[圖1]是顯示本發明的一實施方式的氣體淨化裝置的概要的說明圖。 [圖2]是將本發明的一實施方式的葉輪的頂板的局部作成缺口的局部缺口俯視圖。 [圖3]是顯示本發明的其他實施方式的氣體淨化裝置的概要的說明圖。 [Fig. 1] is an explanatory diagram showing an outline of a gas purification device according to an embodiment of the present invention. 2 is a partially notched plan view of a top plate of an impeller according to an embodiment of the present invention, in which a portion of the top plate is notched. [Fig. 3] is an explanatory diagram showing an outline of a gas purification device according to another embodiment of the present invention.

10:氣體淨化裝置 10: Gas purification device

12:殼罩 12: Shell cover

12a:氣體吸入口 12a:Gas suction port

12b:氣體排出口 12b:Gas discharge port

12c:內筒構件 12c: Inner cylinder component

12d:儲液部 12d: Liquid storage part

14:葉輪 14: Impeller

16:噴嘴 16:Nozzle

18:旋轉軸 18:Rotation axis

20:洗淨液 20:Cleaning liquid

22:除霧器 22:demister

24:框體 24:Frame

26:頂板 26:top plate

26a:氣體導入口 26a:Gas inlet

26b:氣體排出口 26b:Gas discharge port

26c:開口 26c:Open your mouth

28:入口短管 28:Inlet short pipe

30:出口雙重管 30:Export double pipe

30a:第1管體 30a: 1st tube body

30b:第2管體 30b: 2nd tube body

32:馬達 32: Motor

34:管壁 34: Pipe wall

36:底板 36: Bottom plate

38:漸縮管 38:Reducing tube

40:上端 40: upper end

42:下端 42:lower end

44:下端 44:lower end

46:頂板 46:top plate

46a:軸孔 46a: Shaft hole

48:葉片 48:Blade

50:底板 50: base plate

52:固定構件 52: Fixed components

54:透氣性壁材 54: Breathable wall material

56:排水管線 56: Drainage line

58:配管系統 58:Piping system

E:氣體 E:gas

Claims (2)

一種氣體淨化裝置,具備有:殼罩(12)、葉輪(14)、噴嘴(16);上述殼罩(12),在底面開口有氣體吸入口(12a),在側面開口有氣體排出口(12b);上述葉輪(14),固定於在上述殼罩(12)內部沿著鉛直方向配置的旋轉軸(18),且繞上述旋轉軸(18)旋轉;上述噴嘴(16),將洗淨液(20)噴霧到上述葉輪(14)內;使上述葉輪(14)旋轉且經由上述氣體吸入口(12a)將處理對象的氣體(E)吸入到上述殼罩(12)內,以從上述噴嘴(16)噴霧的上述洗淨液(20)將上述氣體(E)淨化後,再從上述氣體排出口(12b)排出;其特徵為:具有內筒構件(12c);上述內筒構件(12c),從上述氣體吸入口(12a)的周緣朝鉛直方向上方突出,且其上端設置在不與上述葉輪(14)的下端部接觸的高度;在上述內筒構件(12c)與上述殼罩(12)的側壁內面部之間設置有儲液部(12d),上述儲液部(12d)用來將從上述噴嘴(16)所噴霧且通過上述葉輪(14)的洗淨液(20)暫時儲存;使從上述氣體排出口(12b)排出到上述殼罩(12)外的上述氣體(E)的一部分再回到上述氣體吸入口(12a)。 A gas purification device is provided with: a casing (12), an impeller (14), and a nozzle (16); the casing (12) has a gas suction port (12a) opened on the bottom surface and a gas discharge port (12a) opened on the side. 12b); the above-mentioned impeller (14) is fixed to the rotation axis (18) arranged along the vertical direction inside the above-mentioned casing (12), and rotates around the above-mentioned rotation axis (18); the above-mentioned nozzle (16) will clean the The liquid (20) is sprayed into the above-mentioned impeller (14); the above-mentioned impeller (14) is rotated and the gas (E) to be processed is inhaled into the above-mentioned casing (12) through the above-mentioned gas inlet (12a), so as to pass the above-mentioned gas suction port (12a). The above-mentioned cleaning liquid (20) sprayed by the nozzle (16) purifies the above-mentioned gas (E) and then discharges it from the above-mentioned gas discharge port (12b); it is characterized by: having an inner cylinder member (12c); the above-mentioned inner cylinder member (12c) 12c) protrudes upward in the vertical direction from the periphery of the gas inlet (12a), and its upper end is set at a height that does not contact the lower end of the impeller (14); between the inner cylinder member (12c) and the casing A liquid storage part (12d) is provided between the inner surfaces of the side walls of (12). The liquid storage part (12d) is used for the cleaning liquid (20) sprayed from the above-mentioned nozzle (16) and passed through the above-mentioned impeller (14). Temporarily store; a part of the gas (E) discharged from the gas discharge port (12b) to the outside of the casing (12) is returned to the gas inlet (12a). 如請求項1的氣體淨化裝置,其中,在上述葉輪(14)的側周面配設有除霧器(22)。 The gas purification device of claim 1, wherein a demister (22) is provided on the side peripheral surface of the impeller (14).
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