TWI821790B - Device for shaping a laser radiation - Google Patents
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Abstract
Description
本發明係關於如請求項1之通用術語的一種用於形成雷射輻射,特定言之用於形成雷射輻射之線形強度分佈的裝置,且係關於如請求項13之通用術語的用於在作業平面中產生雷射輻射之強度分佈,特定言之用於在作業平面中產生雷射輻射之線形強度分佈的雷射裝置。The present invention relates to a device for forming laser radiation, in particular to a linear intensity distribution of laser radiation, as in the general term of claim 1, and to a device for forming a linear intensity distribution of laser radiation as in the general term of claim 13. The intensity distribution of laser radiation is generated in the working plane, specifically a laser device used to generate the linear intensity distribution of laser radiation in the working plane.
在用於形成雷射輻射之線形強度分佈之已知裝置(其包含具有透鏡陣列之兩個均勻器及傅立葉透鏡)中,線形強度分佈之長度L由以下關係產生: , 其中p為陣列之並列透鏡之中心間距離(間距), f H 為第二陣列之透鏡之焦距,且 f F 為第二均勻器後方的傅里葉透鏡之有效焦距。此等量在製造期間可自由選擇,但此後固定。因此,在製造之後,通常不再有可能影響作業平面中之雷射輻射的線長度或場大小。 In known devices for forming a linear intensity distribution of laser radiation, which comprise two homogenizers with a lens array and a Fourier lens, the length L of the linear intensity distribution results from the following relationship: , where p is the distance (spacing) between the centers of the parallel lenses of the array, f H is the focal length of the lenses of the second array, and f F is the effective focal length of the Fourier lens behind the second homogenizer. This amount is freely selectable during manufacturing but is fixed thereafter. Therefore, after fabrication, it is generally no longer possible to influence the line length or field size of the laser radiation in the working plane.
自DE 10 2007 026 730 A1知曉上述類型之裝置及雷射裝置。本文中所描述之裝置包含具有透鏡陣列之第一均勻器載物台及具有兩個基板之第二均勻器載物台,該等基板中之每一者上配置透鏡陣列。進一步提供在作業平面中疊加自第二均勻器載物台出射之部分光束的透鏡,使得在此處產生雷射輻射之線形強度分佈。為了能夠調整線形強度分佈之線長度,第二均勻器載物台之兩個基板可相對於彼此移動使得可在光傳播方向上實現不同距離。Devices of the above type and laser devices are known from DE 10 2007 026 730 A1. The apparatus described herein includes a first homogenizer stage having a lens array and a second homogenizer stage having two substrates, each of which has a lens array disposed thereon. A lens is further provided for superimposing part of the light beam emitted from the second homogenizer stage in the working plane, so that a linear intensity distribution of the laser radiation is generated there. In order to be able to adjust the line length of the linear intensity distribution, the two substrates of the second homogenizer stage can be moved relative to each other so that different distances in the light propagation direction can be achieved.
由於第二均勻器載物台之兩個基板可相對於彼此移動,故裝置之光學有效性及作業平面中之強度分佈的均勻性受到影響。Since the two substrates of the second homogenizer stage can move relative to each other, the optical effectiveness of the device and the uniformity of the intensity distribution in the working plane are affected.
自此開始,本發明係基於製造在開始所提及之類型之裝置的問題,藉此可實現裝置之更多光學有效性及/或作業平面中之強度分佈的較佳均勻性。此外,將詳細說明具有此裝置之雷射裝置。From this beginning, the invention is based on the problem of producing a device of the type mentioned at the outset, whereby more optical effectiveness of the device and/or a better uniformity of the intensity distribution in the working plane can be achieved. In addition, a laser device having this device will be described in detail.
根據本發明,此藉由在開始所提及的具有如請求項1之特性化特徵的類型之裝置及藉由在開始所提及的具有如請求項13之特性化特徵的類型之雷射裝置來實現。子請求項係關於本發明之較佳具體實例。According to the invention, this is achieved by a device of the type mentioned at the beginning having the characterizing features of claim 1 and by a laser device of the type mentioned at the beginning having the characterizing features of claim 13 to achieve. The sub-claims relate to preferred embodiments of the present invention.
根據請求項1,裝置包含安置於第二均勻器與透鏡裝置之間的第一稜鏡及一第二稜鏡,裝置經調適以使得穿過透鏡之第二陣列之雷射輻射在照射於透鏡裝置上之前依序穿過第一稜鏡及第二稜鏡。兩個稜鏡插入在第二均勻器與透鏡裝置之間對裝置之光學有效性及在作業平面中所產生之強度分佈的均勻性幾乎沒有或沒有影響。According to claim 1, the device includes a first lens and a second lens arranged between the second homogenizer and the lens device, the device being adapted such that laser radiation passing through the second array of lenses impinges on the lens. The device passes through the first and second ridges in sequence. The insertion of two lenses between the second homogenizer and the lens arrangement has little or no effect on the optical effectiveness of the arrangement and on the uniformity of the resulting intensity distribution in the operating plane.
特定言之,可規定稜鏡經設置以至少部分地減小或增加在第一方向上穿過該等稜鏡之雷射輻射的橫截面及/或發散度,特定言之其中藉由發散度之增加來實現線形強度分佈之長度的增加,且藉由發散度之減小來實現線形強度分佈之長度的減小。特定言之,線形強度分佈藉此在第一方向上延伸。In particular, it may be provided that the pixels are arranged to at least partially reduce or increase the cross-section and/or divergence of the laser radiation passing through the pixels in the first direction, in particular wherein by the divergence By increasing, the length of the linear intensity distribution is increased, and by decreasing the divergence, the length of the linear intensity distribution is reduced. In particular, the linear intensity distribution thereby extends in a first direction.
較佳地,稜鏡可經配置以將至少部分地在第一方向上穿過該等稜鏡之雷射輻射之發散度改變0.5與2.0之間的因數(factor),特定言之其中線形強度分佈之長度藉此改變0.5與2.0之間的因數。因此,稜鏡可用於在相對較大範圍內影響強度分佈之形狀、在作業平面中所產生的雷射線之長度。Preferably, the laser beams may be configured to change the divergence of the laser radiation passing through the laser beams at least partially in the first direction by a factor between 0.5 and 2.0, in particular where the linear intensity The length of the distribution is thereby varied by a factor between 0.5 and 2.0. Therefore, the laser beam can be used to influence the shape of the intensity distribution and the length of the laser line generated in the working plane within a relatively large range.
可能的係,第一陣列及第二陣列之透鏡各自彼此相鄰配置,特定言之其中第一陣列及第二陣列之透鏡彼此相鄰配置之方向對應於第一方向。就此而言,第一陣列及第二陣列之透鏡可為具有其彼此平行對準之柱狀軸線的柱狀透鏡,其中該等柱狀軸線在垂直於第一方向之第二方向上延伸。以此方式,透鏡可促進在縱向線方向上之均勻化。可設想在均勻器中針對垂直於橫向線方向提供另外柱狀透鏡,該等柱狀透鏡之柱狀軸線在第一方向上延伸。It is possible that the lenses of the first array and the second array are arranged adjacent to each other. Specifically, the direction in which the lenses of the first array and the second array are arranged adjacent to each other corresponds to the first direction. In this regard, the lenses of the first and second arrays may be lenticular lenses having their cylindrical axes aligned parallel to each other, wherein the cylindrical axes extend in a second direction perpendicular to the first direction. In this way, the lens can promote homogenization in the longitudinal direction. It is conceivable to provide further cylindrical lenses in the homogenizer for the direction perpendicular to the transverse line, the cylindrical axes of which extend in the first direction.
可能的係,第一稜鏡係以使得穿過第二陣列之相鄰透鏡的雷射輻射之部分光束在進入第一稜鏡時至少在第一方向上尚未彼此重疊的方式配置於裝置中,以此方式,可與稜鏡分開形成已穿過個別透鏡之部分光束。Possibly, the first lens is arranged in the device in such a way that partial beams of laser radiation passing through adjacent lenses of the second array do not overlap each other at least in a first direction when entering the first lens, In this way, partial beams that have passed through individual lenses can be separated from each other.
可規定稜鏡中之至少一者,較佳地兩個稜鏡可移動,較佳地可圍繞軸線樞轉。藉此,至少一個稜鏡之移動(樞轉)可改變穿過稜鏡之雷射輻射之橫截面所改變的因數。特定言之,稜鏡中之至少一者,較佳地兩個稜鏡可圍繞其樞轉的軸線在第二方向上延伸。此設計使得其極容易影響雷射輻射在作業平面中之場大小或線長度。It may be provided that at least one of the handles, preferably both handles, is movable, preferably pivotable about an axis. Thereby, the movement (pivot) of at least one lens changes a factor by which the cross-section of the laser radiation passing through the lens changes. In particular, the axis about which at least one, preferably both, of the handles is pivotable extends in the second direction. This design makes it very easy to affect the field size or line length of laser radiation in the working plane.
有可能兩個稜鏡具有相同設計、相同大小及/或相同形狀。藉由此設計,可降低裝置之製造成本。It is possible for two pigeons to have the same design, the same size and/or the same shape. Through this design, the manufacturing cost of the device can be reduced.
可規定,第一陣列之透鏡與第二陣列之透鏡之間的距離對應於第二陣列之至少一些透鏡,較佳地所有透鏡之焦距。此外,透鏡裝置可以傅立葉配置定位於裝置中,使得存在於第二陣列與透鏡裝置之間的角空間中之雷射輻射之分佈藉由透鏡裝置轉換成立體空間中之強度分佈。It may be provided that the distance between the lenses of the first array and the lenses of the second array corresponds to the focal length of at least some, preferably all, lenses of the second array. Furthermore, the lens device may be positioned in the device in a Fourier configuration such that the distribution of laser radiation existing in the angular space between the second array and the lens device is converted by the lens device into an intensity distribution in the three-dimensional space.
如請求項13之裝置,可規定用於形成雷射光束的裝置為根據本發明之裝置。As with the device of claim 13, it may be provided that the device for forming the laser beam is a device according to the invention.
可能的係,雷射裝置包含經配置以產生具有彼此不同屬性之雷射光束,例如具有彼此不同之發散度或光束輪廓之兩個雷射光源,其中雷射裝置經配置用於使得雷射光束照射於彼此相鄰的裝置上,且透鏡裝置在作業平面中疊加兩個雷射光束,特定言之在線形強度分佈中疊加兩個雷射光束。證明極其有利的係,傅立葉配置中之單個透鏡裝置在作業平面中,特定言之在作業平面中之線形強度分佈中疊加兩個可能極其不同的雷射光束,而同時線之長度可由稜鏡之對應位置指定。It is possible that the laser device comprises a laser beam configured to generate laser beams with mutually different properties, for example two laser light sources with mutually different divergences or beam profiles, wherein the laser device is configured such that the laser beams The irradiation is on devices adjacent to each other, and the lens device superimposes two laser beams in the working plane, specifically in a linear intensity distribution. It proves extremely advantageous if a single lens in a Fourier configuration is arranged in the working plane, in particular two possibly very different laser beams are superposed in a linear intensity distribution in the working plane, while the length of the line can be determined by Corresponding location specified.
出於此目的,可規定用於形成雷射光束之裝置包含四個稜鏡,該等稜鏡中之兩者經提供用於彼此不同的雷射光束中之每一者。For this purpose, it may be provided that the means for forming the laser beam comprise four beams, two of which are provided for each of the laser beams being different from each other.
替代地,可規定用於形成雷射光束之裝置包含兩個稜鏡,該等稜鏡經提供用於兩個彼此不同的雷射光束。Alternatively, provision may be made for the means for forming the laser beam to comprise two beams provided for two mutually different laser beams.
在該等圖式中,相同及功能上相同之部件提供相同的參考符號。在一些圖式中,為了更好地定向繪製笛卡爾(Cartesian)座標系。In the drawings, identical and functionally identical components are provided with the same reference symbols. In some drawings, a Cartesian coordinate system is drawn for better orientation.
圖1中所示的用於形成雷射光束之裝置的具體實例以本身已知之方式包含具有透鏡3之第一陣列2的第一均勻器1及具有透鏡6之第二陣列5的第二均勻器4。裝置經配置用於使得雷射光束7形成以依次穿過透鏡3之第一陣列2及透鏡6之第二陣列5。The specific example of the device for forming a laser beam shown in FIG. 1 includes, in a manner known per se, a first homogenizer 1 with a first array 2 of lenses 3 and a second homogenizer 1 with a second array 5 of lenses 6 . Device 4. The device is configured for forming a laser beam 7 to pass through a first array 2 of lenses 3 and a second array 5 of lenses 6 in sequence.
透鏡3、6並排配置在第一方向x上。透鏡3、6為柱狀透鏡,其柱狀軸線在垂直於第一方向x之方向y上延伸,第二方向y延伸至圖1之平面之外。透鏡3、6因此作用於第一方向x。雷射光束7實質上在垂直於第一方向x及第二方向y之第三方向z上移動。The lenses 3 and 6 are arranged side by side in the first direction x. Lenses 3 and 6 are cylindrical lenses, the cylindrical axis of which extends in the direction y perpendicular to the first direction x, and the second direction y extends beyond the plane of FIG. 1 . The lenses 3, 6 therefore act in the first direction x. The laser beam 7 substantially moves in the third direction z perpendicular to the first direction x and the second direction y.
當然有可能提供球面透鏡或不同形狀透鏡而非柱狀透鏡,其作用於第一方向x及第二方向y兩者。It is of course possible to provide spherical lenses or lenses of different shapes instead of cylindrical lenses, which act in both the first direction x and the second direction y.
在圖式中,第一陣列2配置於第一均勻器1之出口表面上,且第二陣列5配置於第二均勻器4之入口表面上。相當可能將陣列2、5兩者配置於入口表面或出口表面上,或將第一陣列2配置於第一均勻器1之入口表面上且將第二陣列5配置於第二均勻器4之出口表面上。此外,亦可規定僅提供單個透明基板,在該基板之入射表面上配置有第一陣列2且在該基板之出射表面上配置有第二陣列5。In the figure, the first array 2 is arranged on the outlet surface of the first homogenizer 1 , and the second array 5 is arranged on the inlet surface of the second homogenizer 4 . It is possible to arrange both arrays 2 and 5 on the inlet surface or the outlet surface, or to arrange the first array 2 on the inlet surface of the first homogenizer 1 and the second array 5 on the outlet of the second homogenizer 4 On the surface. Furthermore, it may also be provided that only a single transparent substrate is provided, the first array 2 being arranged on the entrance surface of this substrate and the second array 5 being arranged on the exit surface of the substrate.
舉例而言,其他有可能的係,圖中未示之透鏡陣列配置於第一均勻器1之入射表面上及/或配置於第二均勻器4之出射表面上,該等透鏡作用於第二方向y上。舉例而言,此等透鏡可為其柱狀軸線在第一方向x上延伸之柱狀透鏡。For example, other possibilities are that a lens array (not shown in the figure) is arranged on the incident surface of the first homogenizer 1 and/or is arranged on the exit surface of the second homogenizer 4, and these lenses act on the second homogenizer. direction y. For example, these lenses may be cylindrical lenses whose cylindrical axis extends in the first direction x.
第二陣列5之所有透鏡6具有相同焦距。兩個陣列2、5之間的距離等於第二陣列5之透鏡6的焦距。All lenses 6 of the second array 5 have the same focal length. The distance between the two arrays 2 and 5 is equal to the focal length of the lens 6 of the second array 5 .
圖1中所說明之裝置以本身已知之方式進一步包含透鏡裝置8,該透鏡裝置8在所說明之具體實例中以傅立葉配置形成為平凸透鏡8。透鏡裝置8以本身已知的方式在第一方向x上在作業平面中疊加自第二陣列5之透鏡6發出之雷射輻射7之部分光束,圖中未示。藉此,雷射輻射在角空間中之分佈在作業平面中轉換成立體空間中的分佈。The device illustrated in Figure 1 further comprises, in a manner known per se, a lens arrangement 8, which in the particular example illustrated is formed as a plano-convex lens 8 in a Fourier configuration. The lens arrangement 8 superimposes, in a manner known per se, partial beams of laser radiation 7 emitted from the lenses 6 of the second array 5 in a first direction x in the working plane, not shown in the figure. Thereby, the distribution of laser radiation in the angular space is converted into the distribution in the three-dimensional space in the working plane.
當然有可能提供其他形狀之透鏡,諸如雙凸透鏡。此外,亦可提供透鏡系統而非單個透鏡。It is of course possible to provide lenses of other shapes, such as lenticular lenses. Additionally, lens systems may be provided instead of individual lenses.
圖1中所說明之裝置進一步包含雷射輻射7依次穿過之在第二均勻器4與透鏡配置8之間的兩個稜鏡9、10。在所說明之具體實例實施例中,稜鏡9、10具有相同大小及相同形狀,且圖1中明顯的橫截面延續至圖1之延伸平面中。The device illustrated in Figure 1 further comprises two lenses 9, 10 between the second homogenizer 4 and the lens arrangement 8 through which the laser radiation 7 passes in sequence. In the specific example embodiment illustrated, the handles 9, 10 have the same size and the same shape, and the cross-section apparent in Figure 1 continues into the extended plane of Figure 1 .
圖1中左側之第一稜鏡9以使得當雷射輻射7照射於第一稜鏡9之入射表面11上時,已穿過第二陣列5之相鄰透鏡6的雷射輻射7之部分光束在第一方向x上尚未彼此重疊的方式配置。The first lens 9 on the left side in Figure 1 is such that when the laser radiation 7 is irradiated on the incident surface 11 of the first lens 9, the part of the laser radiation 7 that has passed through the adjacent lens 6 of the second array 5 The beams are configured in such a way that they do not overlap each other in the first direction x.
藉由稜鏡9、10之合適對準,可實現自透鏡6中之每一者發出的部分光束之橫截面及/或發散度改變,特定言之針對部分光束中之每一者同等地改變。以下適用於改變: D in· F in= D out· F out, 其中 D in為在立體空間中在第一方向x上進入稜鏡9、10之部分輻射的範圍, F in為在角空間中在第一方向x上進入稜鏡9、10之部分輻射的範圍, D out為在立體空間中在第一方向x上離開稜鏡9、10之部分輻射的範圍,且 F out為在角空間中在第一方向x上自稜鏡9、10出射之部分輻射的範圍。 By suitable alignment of the lenses 9, 10, a change in the cross-section and/or divergence of the partial beams emitted from each of the lenses 6 can be achieved, in particular equally for each of the partial beams. . The following applies to the change: D in · F in = D out · F out , where D in is the range of the partial radiation entering the first direction x in the three-dimensional space, and F in is in the angular space The range of partial radiation entering the first direction x, D out is the range of the partial radiation leaving the first direction x, 10 in the three-dimensional space, and F out is the range in the angular space The range of the partial radiation emitted from the radiators 9 and 10 in the first direction x.
圖2a在左圖中分別展示在立體空間中在第一方向x上進入稜鏡9、10之部分輻射的橫截面12a及範圍Din。圖2a在右圖中分別展示在角空間中在第一方向x上進入稜鏡9、10之部分輻射的發散度13a、範圍Din。Figure 2a shows in the left figure respectively the cross-section 12a and the range Din of the partial radiation entering the holes 9 and 10 in the first direction x in the three-dimensional space. Figure 2a shows in the right figure respectively the divergence 13a and the range Din of the partial radiation entering the radiators 9 and 10 in the first direction x in the angular space.
圖2b及圖2c說明稜鏡9、10之兩個不同位置對自稜鏡出射之部分輻射的影響。Figures 2b and 2c illustrate the influence of two different positions of the casings 9 and 10 on the partial radiation emitted from the casings.
藉此,圖2b在左圖中單獨展示在立體空間中在第一方向x上自稜鏡9、10出射之部分輻射之範圍D out的橫截面12b。圖2b在右圖中單獨展示在角空間中在第一方向x上自稜鏡9、10出射之部分輻射外之範圍的發散度13b。可看出,發散度13b小於發散度13a。由透鏡裝置8將較小發散度13b或角空間中之較小擴展轉換為作業平面中之立體空間中的分佈,從而導致作業平面中之場在第一方向x上的較小擴展,特定言之線形強度分佈之較小長度。 2b shows separately in the left figure a cross section 12b of the range D out of the partial radiation emitted from the lenses 9 and 10 in the first direction x in the three-dimensional space. FIG. 2b shows separately in the right figure the divergence 13b in the angular space in the first direction x in the range outside the partial radiation emitted from the lenses 9, 10. It can be seen that the divergence 13b is smaller than the divergence 13a. The smaller divergence 13b or the smaller expansion in the angular space is converted by the lens device 8 into a distribution in the three-dimensional space in the working plane, resulting in a smaller spreading of the field in the working plane in the first direction x, in particular The smallest length of the linear intensity distribution.
圖2c在左圖中單獨展示在立體空間中在第一方向x上自稜鏡9、10出射之部分輻射的範圍D out的橫截面12c。圖2c在右圖中單獨展示在角空間中在第一方向x上自稜鏡9、10出射之部分輻射外之範圍的發散度13c。可看出,發散度13c大於發散度13a。由透鏡裝置8將較大發散度13c或角空間之較大擴展轉換為作業平面中之立體空間中的分佈,從而導致作業平面中之場在第一方向x上的較大擴展,特定言之線形強度分佈之較大長度。 FIG. 2 c shows a cross section 12 c of the range D out of the partial radiation emitted from the detectors 9 , 10 in the first direction x in three-dimensional space in the left figure alone. FIG. 2c shows separately in the right figure the divergence 13c in the angular space in the first direction x in the range outside the partial radiation emitted from the lenses 9, 10. It can be seen that the divergence 13c is greater than the divergence 13a. The lens device 8 converts a large divergence 13c or a large expansion of the angular space into a distribution in the three-dimensional space in the operating plane, thereby resulting in a large expansion of the field in the operating plane in the first direction x, in particular The maximum length of a linear intensity distribution.
在圖3a至4b中,此藉由用於形成作業平面中之雷射輻射之線形強度分佈14的裝置之特定具體實例實施例說明。In Figures 3a to 4b this is illustrated by a specific example embodiment of a device for forming a linear intensity distribution 14 of laser radiation in the working plane.
圖3a展示其中稜鏡9、10處於第一位置中之裝置。在此第一位置中,線形強度分佈14之長度略微大於700 mm,如自圖3b可見。Figure 3a shows the device with the handles 9, 10 in a first position. In this first position, the length of the linear intensity distribution 14 is slightly greater than 700 mm, as can be seen from Figure 3b.
圖4a展示與圖3a中相同之裝置。然而,在圖4a中,稜鏡9、10處於不同於第一位置之第二位置中。在此第二位置中,線形強度分佈14之長度為約500 mm,如圖4b中可見。Figure 4a shows the same device as in Figure 3a. However, in Figure 4a, the handles 9, 10 are in a second position different from the first position. In this second position, the length of the linear intensity distribution 14 is approximately 500 mm, as can be seen in Figure 4b.
稜鏡9、10之不同位置可藉由圍繞在第二方向y上延伸的軸線樞轉個別稜鏡9、10而實現。舉例而言,在圖3a及4中所示之位置中,圖4a中之第一稜鏡9圍繞在第二方向y上延伸之對應軸線相對於圖3a中之稜鏡9順時針樞轉。此外,在圖3a及4中所示之位置中,圖4a中之第二稜鏡10圍繞在第二方向y上延伸之對應軸線相對於圖3a中之稜鏡9逆時針樞轉。Different positions of the handles 9, 10 can be achieved by pivoting the individual handles 9, 10 about an axis extending in the second direction y. For example, in the position shown in Figures 3a and 4, the first housing 9 in Figure 4a pivots clockwise relative to the housing 9 in Figure 3a about a corresponding axis extending in the second direction y. Furthermore, in the position shown in Figures 3a and 4, the second housing 10 in Figure 4a pivots counterclockwise relative to the housing 9 in Figure 3a about a corresponding axis extending in the second direction y.
圖5展示根據本發明之裝置之具體實例,該裝置不同於圖1中之裝置,此係因為提供四個稜鏡9a、9b、10a、10b而非兩個稜鏡9、10。此處,兩個第一稜鏡9a、9b並排配置在第一方向x上。此外,兩個第二稜鏡10a、10b相互緊靠地配置在第一方向x上。Figure 5 shows a specific example of a device according to the invention, which device differs from the device in Figure 1 in that four cams 9a, 9b, 10a, 10b are provided instead of two cams 9, 10. Here, the two first beams 9a and 9b are arranged side by side in the first direction x. In addition, the two second frames 10a and 10b are arranged in close proximity to each other in the first direction x.
例如藉由其發散度或光束輪廓而彼此不同之兩個雷射光束7a、7b照射於裝置上。第一雷射光束7a照射於圖5中之第一均勻器1的上部區域上,而第二雷射光束7b照射於圖5中之第一均勻器1的下部區域上。For example, two laser beams 7a, 7b that differ from each other by their divergence or beam profile are illuminated on the device. The first laser beam 7a is irradiated on the upper area of the first homogenizer 1 in Figure 5, and the second laser beam 7b is irradiated on the lower area of the first homogenizer 1 in Figure 5.
藉此設置裝置以使得已穿過圖5中之上部第一稜鏡9a的雷射輻射7a隨後穿過圖5中之上部第二稜鏡10a,且此外,已穿過圖5中之下部第一稜鏡9b的雷射輻射7b隨後穿過圖5中之下部第二稜鏡10b。此外,設置裝置以使得已穿過第二稜鏡10a、10b之兩個雷射光束7a、7b一起穿過透鏡裝置8且在工作平面中,特定言之在線性強度分佈中由其疊加。The means are thereby arranged so that the laser radiation 7a which has passed through the upper first casing 9a in Figure 5 then passes through the upper second casing 10a in Figure 5 and, in addition, has passed through the lower first casing 9a in Figure 5 The laser radiation 7b of the first laser beam 9b then passes through the second lower laser beam 10b in Figure 5. Furthermore, the device is arranged so that the two laser beams 7a, 7b that have passed through the second lens 10a, 10b pass together through the lens device 8 and are superimposed by them in the working plane, in particular in a linear intensity distribution.
證明極其有利的係,傅立葉配置中之單個透鏡裝置8在作業平面中,特定言之在作業平面中之線形強度分佈中疊加兩個可能極其不同的雷射光束7a、7b,而同時線之長度可由稜鏡9a、9b、10a、10b之對應位置預定。It proves extremely advantageous that a single lens arrangement 8 in a Fourier configuration superimposes two possibly very different laser beams 7a, 7b in a linear intensity distribution in the working plane, while the length of the line It can be predetermined by the corresponding positions of the handles 9a, 9b, 10a, and 10b.
可規定,均勻器1、4具有用於不同雷射光束7a、7b之不同設計區,該等雷射光束7a、7b在第一方向x上彼此相鄰或間隔開。It can be provided that the homogenizers 1, 4 have different design areas for different laser beams 7a, 7b which are adjacent or spaced apart from each other in the first direction x.
其他有可能的係,用於形成兩個不同雷射光束7a、7b之裝置不包含四個稜鏡,而僅包含兩個(圖中未示)稜鏡,該等稜鏡在此情況下經提供用於不同雷射光束7a、7b中之兩者。In other possible systems, the device for forming two different laser beams 7a, 7b does not contain four laser beams, but only two (not shown in the figure) laser beams. In this case, these laser beams are Provision is made for two of the different laser beams 7a, 7b.
其他可能的係,在圖1、3a、4a及5中所說明之具體實例中,其他透鏡經提供用於將雷射輻射或該等雷射輻射聚焦至作業平面中及/或用於相對於第二方向y形成雷射輻射或該等雷射輻射。在適用情況下,出於清晰之原因而未展示此等透鏡。Other possibilities are that, in the specific examples illustrated in Figures 1, 3a, 4a and 5, other lenses are provided for focusing the laser radiation or such laser radiation into the working plane and/or for focusing relative to The second direction y forms laser radiation or such laser radiation. Where applicable, these lenses are not shown for reasons of clarity.
1:第一均勻器 2:第一陣列 3:透鏡 4:第二均勻器 5:第二陣列 6:透鏡 7:雷射光束 7a:雷射光束 7b:雷射光束 8:透鏡裝置 9:稜鏡 9a:稜鏡 9b:稜鏡 10:稜鏡 10a:稜鏡 10b:稜鏡 11:入射表面 12a:橫截面 12b:橫截面 12c:橫截面 13a:發散度 13b:發散度 13c:發散度 14:線形強度分佈 1: First homogenizer 2: First array 3: Lens 4: Second homogenizer 5: Second array 6: Lens 7:Laser beam 7a:Laser beam 7b:Laser beam 8: Lens device 9:稜顡 9a:稜顡 9b:稜顡 10:稜顡 10a:稜顡 10b:稜顡 11:Incidence surface 12a: Cross section 12b: Cross section 12c: Cross section 13a: Divergence 13b: Divergence 13c: Divergence 14: Linear intensity distribution
本發明之其他特徵及優勢將參考隨附圖式自較佳具體實例之以下描述變得顯而易見。本文中展示: [圖1]為根據本發明之裝置之第一具體實例的示意性側視圖,其中已引入待形成之雷射輻射之光束; [圖2a]為示意性地說明在第二均勻器後方之雷射輻射在立體空間中及在角空間中之分佈的兩個圖; [圖2b]為示意性地說明在第二稜鏡後方之雷射輻射在立體空間中且在角空間中在兩個稜鏡的第一位置中之分佈的兩個圖; [圖2c]示意性地說明在第二稜鏡後方之雷射輻射在立體空間中且在角空間中在兩個稜鏡的第二位置中之分佈的兩個圖; [圖3a]為根據圖1之具體實例在兩個稜鏡之第一位置中的示意性側視圖; [圖3b]為其中相對於以mm為單位之線形強度分佈之線縱向方向上的空間座標以任意單位繪製作業平面中之雷射輻射之強度的圖,其中兩個稜鏡在圖3a中所示之第一位置中; [圖4a]為根據圖1之具體實例在兩個稜鏡之第二位置中的示意性側視圖; [圖4b]為其中相對於以mm為單位之線形強度分佈之線縱向方向上的空間座標以任意單位繪製作業平面中之雷射輻射之強度的圖,兩個稜鏡在圖4a中所示之第二位置中; [圖5]為根據本發明之裝置之第二具體實例的示意性側視圖,其中已引入待形成之雷射輻射之光束。 Other features and advantages of the present invention will become apparent from the following description of preferred embodiments with reference to the accompanying drawings. Shown in this article: [Fig. 1] is a schematic side view of a first specific example of a device according to the present invention, in which a beam of laser radiation to be formed has been introduced; [Fig. 2a] are two diagrams schematically illustrating the distribution of laser radiation in three-dimensional space and in angular space behind the second homogenizer; [Fig. 2b] are two diagrams schematically illustrating the distribution of laser radiation behind the second lens in the three-dimensional space and in the angular space in the first position of the two lenses; [Fig. 2c] Two diagrams schematically illustrating the distribution of laser radiation behind the second lens in the three-dimensional space and in the angular space in the second position of the two lenses; [Fig. 3a] is a schematic side view of the specific example of Fig. 1 in the first position of the two handles; [Fig. 3b] is a diagram in which the intensity of laser radiation in the operating plane is plotted in arbitrary units with respect to the spatial coordinate in the longitudinal direction of the line of linear intensity distribution in mm, in which the two beams are shown in Fig. 3a Shown in the first position; [Fig. 4a] is a schematic side view of the specific example of Fig. 1 in the second position of the two handles; [Fig. 4b] is a diagram in which the intensity of laser radiation in the operating plane is plotted in arbitrary units with respect to the spatial coordinate in the longitudinal direction of the line of linear intensity distribution in mm, and two pixels are shown in Fig. 4a in the second position; [Fig. 5] is a schematic side view of a second specific example of the device according to the present invention, in which a beam of laser radiation to be formed has been introduced.
1:第一均勻器 1: First homogenizer
2:第一陣列 2: First array
3:透鏡 3: Lens
4:第二均勻器 4: Second homogenizer
5:第二陣列 5: Second array
6:透鏡 6: Lens
7:雷射光束 7:Laser beam
8:透鏡裝置 8: Lens device
9:稜鏡 9:稜顡
10:稜鏡 10:稜顡
11:入射表面 11:Incidence surface
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