TW202321777A - Device for shaping a laser radiation - Google Patents
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本發明係關於如請求項1之通用術語的一種用於形成雷射輻射,特定言之用於形成雷射輻射之線形強度分佈的裝置,且係關於如請求項13之通用術語的用於在作業平面中產生雷射輻射之強度分佈,特定言之用於在作業平面中產生雷射輻射之線形強度分佈的雷射裝置。The present invention relates to a device for forming laser radiation in general terms according to
在用於形成雷射輻射之線形強度分佈之已知裝置(其包含具有透鏡陣列之兩個均勻器及傅立葉透鏡)中,線形強度分佈之長度L由以下關係產生: , 其中p為陣列之並列透鏡之中心間距離(間距), f H 為第二陣列之透鏡之焦距,且 f F 為第二均勻器後方的傅里葉透鏡之有效焦距。此等量在製造期間可自由選擇,但此後固定。因此,在製造之後,通常不再有可能影響作業平面中之雷射輻射的線長度或場大小。 In known devices for forming a linear intensity distribution of laser radiation comprising two homogenizers with a lens array and a Fourier lens, the length L of the linear intensity distribution results from the following relationship: , where p is the center-to-center distance (pitch) of the juxtaposed lenses of the array, f H is the focal length of the lenses of the second array, and f F is the effective focal length of the Fourier lens behind the second homogenizer. These quantities are freely selectable during manufacture, but fixed thereafter. Consequently, after production it is generally no longer possible to influence the line length or the field size of the laser radiation in the working plane.
自DE 10 2007 026 730 A1知曉上述類型之裝置及雷射裝置。本文中所描述之裝置包含具有透鏡陣列之第一均勻器載物台及具有兩個基板之第二均勻器載物台,該等基板中之每一者上配置透鏡陣列。進一步提供在作業平面中疊加自第二均勻器載物台出射之部分光束的透鏡,使得在此處產生雷射輻射之線形強度分佈。為了能夠調整線形強度分佈之線長度,第二均勻器載物台之兩個基板可相對於彼此移動使得可在光傳播方向上實現不同距離。A device of the aforementioned type and a laser device are known from DE 10 2007 026 730 A1. The devices described herein include a first homogenizer stage with a lens array and a second homogenizer stage with two substrates, each of which has a lens array disposed thereon. A lens is further provided for superimposing the partial beams emerging from the second homogenizer stage in the working plane, so that a linear intensity distribution of the laser radiation is produced there. In order to be able to adjust the line length of the linear intensity distribution, the two base plates of the second homogenizer stage can be moved relative to each other so that different distances can be achieved in the direction of light propagation.
由於第二均勻器載物台之兩個基板可相對於彼此移動,故裝置之光學有效性及作業平面中之強度分佈的均勻性受到影響。Since the two substrates of the second homogenizer stage can move relative to each other, the optical effectiveness of the device and the uniformity of the intensity distribution in the working plane are affected.
自此開始,本發明係基於製造在開始所提及之類型之裝置的問題,藉此可實現裝置之更多光學有效性及/或作業平面中之強度分佈的較佳均勻性。此外,將詳細說明具有此裝置之雷射裝置。From this beginning, the invention is based on the problem of producing a device of the type mentioned at the outset, whereby a greater optical effectiveness of the device and/or a better homogeneity of the intensity distribution in the working plane can be achieved. In addition, a laser device having this device will be described in detail.
根據本發明,此藉由在開始所提及的具有如請求項1之特性化特徵的類型之裝置及藉由在開始所提及的具有如請求項13之特性化特徵的類型之雷射裝置來實現。子請求項係關於本發明之較佳具體實例。According to the invention, this is achieved by a device of the type mentioned at the outset having the characterizing features of
根據請求項1,裝置包含安置於第二均勻器與透鏡裝置之間的第一稜鏡及一第二稜鏡,裝置經調適以使得穿過透鏡之第二陣列之雷射輻射在照射於透鏡裝置上之前依序穿過第一稜鏡及第二稜鏡。兩個稜鏡插入在第二均勻器與透鏡裝置之間對裝置之光學有效性及在作業平面中所產生之強度分佈的均勻性幾乎沒有或沒有影響。According to
特定言之,可規定稜鏡經設置以至少部分地減小或增加在第一方向上穿過該等稜鏡之雷射輻射的橫截面及/或發散度,特定言之其中藉由發散度之增加來實現線形強度分佈之長度的增加,且藉由發散度之減小來實現線形強度分佈之長度的減小。特定言之,線形強度分佈藉此在第一方向上延伸。In particular, it may be provided that the aperture is arranged to at least partially reduce or increase the cross-section and/or the divergence of the laser radiation passing through the aperture in a first direction, in particular wherein by means of the divergence The length of the linear intensity distribution is increased by increasing the divergence, and the length of the linear intensity distribution is decreased by reducing the divergence. In particular, the linear intensity distribution thereby extends in the first direction.
較佳地,稜鏡可經配置以將至少部分地在第一方向上穿過該等稜鏡之雷射輻射之發散度改變0.5與2.0之間的因數(factor),特定言之其中線形強度分佈之長度藉此改變0.5與2.0之間的因數。因此,稜鏡可用於在相對較大範圍內影響強度分佈之形狀、在作業平面中所產生的雷射線之長度。Preferably, the aperture may be configured to vary the divergence of the laser radiation passing through the aperture at least partially in a first direction by a factor between 0.5 and 2.0, in particular wherein the linear intensity The length of the distribution is thereby varied by a factor between 0.5 and 2.0. Therefore, it can be used to influence the shape of the intensity distribution, the length of the generated laser line in the working plane, over a relatively large range.
可能的係,第一陣列及第二陣列之透鏡各自彼此相鄰配置,特定言之其中第一陣列及第二陣列之透鏡彼此相鄰配置之方向對應於第一方向。就此而言,第一陣列及第二陣列之透鏡可為具有其彼此平行對準之柱狀軸線的柱狀透鏡,其中該等柱狀軸線在垂直於第一方向之第二方向上延伸。以此方式,透鏡可促進在縱向線方向上之均勻化。可設想在均勻器中針對垂直於橫向線方向提供另外柱狀透鏡,該等柱狀透鏡之柱狀軸線在第一方向上延伸。It is possible that the lenses of the first array and the second array are respectively arranged adjacent to each other, in particular the direction in which the lenses of the first array and the second array are arranged adjacent to each other corresponds to the first direction. In this regard, the lenses of the first and second arrays may be cylindrical lenses having their cylindrical axes aligned parallel to each other, wherein the cylindrical axes extend in a second direction perpendicular to the first direction. In this way, the lens can promote homogenization in the direction of the longitudinal lines. It is conceivable to provide further lenticular lenses in the homogenizer for a direction perpendicular to the transverse lines, the lenticular axes of which extend in the first direction.
可能的係,第一稜鏡係以使得穿過第二陣列之相鄰透鏡的雷射輻射之部分光束在進入第一稜鏡時至少在第一方向上尚未彼此重疊的方式配置於裝置中,以此方式,可與稜鏡分開形成已穿過個別透鏡之部分光束。Possibly, the first lens is arranged in the device in such a way that partial beams of the laser radiation passing through adjacent lenses of the second array do not yet overlap each other at least in the first direction when entering the first lens, In this way, partial beams that have passed through individual lenses can be formed separately from the beam.
可規定稜鏡中之至少一者,較佳地兩個稜鏡可移動,較佳地可圍繞軸線樞轉。藉此,至少一個稜鏡之移動(樞轉)可改變穿過稜鏡之雷射輻射之橫截面所改變的因數。特定言之,稜鏡中之至少一者,較佳地兩個稜鏡可圍繞其樞轉的軸線在第二方向上延伸。此設計使得其極容易影響雷射輻射在作業平面中之場大小或線長度。It may be provided that at least one of the bells, preferably both of the bells, is movable, preferably pivotable about an axis. Thereby, the movement (pivoting) of at least one of the canals can change the factor by which the cross-section of the laser radiation passing through the canal changes. In particular, the axis about which at least one, preferably both, of the shells is pivotable extends in the second direction. This design makes it extremely easy to influence the field size or line length of the laser radiation in the working plane.
有可能兩個稜鏡具有相同設計、相同大小及/或相同形狀。藉由此設計,可降低裝置之製造成本。It is possible that two fennels have the same design, same size and/or same shape. With this design, the manufacturing cost of the device can be reduced.
可規定,第一陣列之透鏡與第二陣列之透鏡之間的距離對應於第二陣列之至少一些透鏡,較佳地所有透鏡之焦距。此外,透鏡裝置可以傅立葉配置定位於裝置中,使得存在於第二陣列與透鏡裝置之間的角空間中之雷射輻射之分佈藉由透鏡裝置轉換成立體空間中之強度分佈。It may be provided that the distance between the lenses of the first array and the lenses of the second array corresponds to the focal length of at least some, preferably all, lenses of the second array. Furthermore, the lens arrangement can be positioned in the device in a Fourier configuration such that the distribution of laser radiation present in the angular space between the second array and the lens arrangement is transformed by the lens arrangement into an intensity distribution in volumetric space.
如請求項13之裝置,可規定用於形成雷射光束的裝置為根據本發明之裝置。As with the device of claim 13, it may be provided that the device for forming the laser beam is a device according to the invention.
可能的係,雷射裝置包含經配置以產生具有彼此不同屬性之雷射光束,例如具有彼此不同之發散度或光束輪廓之兩個雷射光源,其中雷射裝置經配置用於使得雷射光束照射於彼此相鄰的裝置上,且透鏡裝置在作業平面中疊加兩個雷射光束,特定言之在線形強度分佈中疊加兩個雷射光束。證明極其有利的係,傅立葉配置中之單個透鏡裝置在作業平面中,特定言之在作業平面中之線形強度分佈中疊加兩個可能極其不同的雷射光束,而同時線之長度可由稜鏡之對應位置指定。It is possible that the laser device comprises two laser sources configured to generate laser beams having mutually different properties, for example two divergence or beam profiles which are different from each other, wherein the laser device is configured such that the laser beams Irradiations are made on devices adjacent to each other, and the lens arrangement superimposes two laser beams in the working plane, in particular in a linear intensity distribution. It has proven to be extremely advantageous that a single lens arrangement in a Fourier configuration superimposes two possibly very different laser beams in the working plane, in particular in a linear intensity distribution in the working plane, while the length of the line can be given by Corresponding location designation.
出於此目的,可規定用於形成雷射光束之裝置包含四個稜鏡,該等稜鏡中之兩者經提供用於彼此不同的雷射光束中之每一者。For this purpose it may be provided that the means for forming the laser beams comprises four beams, two of which are provided for each of the mutually different laser beams.
替代地,可規定用於形成雷射光束之裝置包含兩個稜鏡,該等稜鏡經提供用於兩個彼此不同的雷射光束。Alternatively, provision may be made for the means for forming the laser beam to comprise two beams which are provided for two mutually different laser beams.
在該等圖式中,相同及功能上相同之部件提供相同的參考符號。在一些圖式中,為了更好地定向繪製笛卡爾(Cartesian)座標系。In the figures, identical and functionally identical parts are provided with the same reference symbols. In some drawings, a Cartesian coordinate system is drawn for better orientation.
圖1中所示的用於形成雷射光束之裝置的具體實例以本身已知之方式包含具有透鏡3之第一陣列2的第一均勻器1及具有透鏡6之第二陣列5的第二均勻器4。裝置經配置用於使得雷射光束7形成以依次穿過透鏡3之第一陣列2及透鏡6之第二陣列5。The specific example of a device for forming a laser beam shown in FIG. 1 comprises, in a manner known per se, a
透鏡3、6並排配置在第一方向x上。透鏡3、6為柱狀透鏡,其柱狀軸線在垂直於第一方向x之方向y上延伸,第二方向y延伸至圖1之平面之外。透鏡3、6因此作用於第一方向x。雷射光束7實質上在垂直於第一方向x及第二方向y之第三方向z上移動。The
當然有可能提供球面透鏡或不同形狀透鏡而非柱狀透鏡,其作用於第一方向x及第二方向y兩者。It is of course possible to provide spherical lenses or lenses of different shape instead of cylindrical lenses, which act both in the first direction x and in the second direction y.
在圖式中,第一陣列2配置於第一均勻器1之出口表面上,且第二陣列5配置於第二均勻器4之入口表面上。相當可能將陣列2、5兩者配置於入口表面或出口表面上,或將第一陣列2配置於第一均勻器1之入口表面上且將第二陣列5配置於第二均勻器4之出口表面上。此外,亦可規定僅提供單個透明基板,在該基板之入射表面上配置有第一陣列2且在該基板之出射表面上配置有第二陣列5。In the drawing, the
舉例而言,其他有可能的係,圖中未示之透鏡陣列配置於第一均勻器1之入射表面上及/或配置於第二均勻器4之出射表面上,該等透鏡作用於第二方向y上。舉例而言,此等透鏡可為其柱狀軸線在第一方向x上延伸之柱狀透鏡。For example, other possibilities are that a lens array not shown in the figure is arranged on the entrance surface of the
第二陣列5之所有透鏡6具有相同焦距。兩個陣列2、5之間的距離等於第二陣列5之透鏡6的焦距。All
圖1中所說明之裝置以本身已知之方式進一步包含透鏡裝置8,該透鏡裝置8在所說明之具體實例中以傅立葉配置形成為平凸透鏡8。透鏡裝置8以本身已知的方式在第一方向x上在作業平面中疊加自第二陣列5之透鏡6發出之雷射輻射7之部分光束,圖中未示。藉此,雷射輻射在角空間中之分佈在作業平面中轉換成立體空間中的分佈。The device illustrated in FIG. 1 further comprises, in a manner known per se, a
當然有可能提供其他形狀之透鏡,諸如雙凸透鏡。此外,亦可提供透鏡系統而非單個透鏡。It is of course possible to provide lenses of other shapes, such as bi-convex lenses. Furthermore, lens systems may also be provided instead of a single lens.
圖1中所說明之裝置進一步包含雷射輻射7依次穿過之在第二均勻器4與透鏡配置8之間的兩個稜鏡9、10。在所說明之具體實例實施例中,稜鏡9、10具有相同大小及相同形狀,且圖1中明顯的橫截面延續至圖1之延伸平面中。The device illustrated in FIG. 1 further comprises two
圖1中左側之第一稜鏡9以使得當雷射輻射7照射於第一稜鏡9之入射表面11上時,已穿過第二陣列5之相鄰透鏡6的雷射輻射7之部分光束在第一方向x上尚未彼此重疊的方式配置。The
藉由稜鏡9、10之合適對準,可實現自透鏡6中之每一者發出的部分光束之橫截面及/或發散度改變,特定言之針對部分光束中之每一者同等地改變。以下適用於改變:
D
in· F
in= D
out· F
out,
其中
D
in為在立體空間中在第一方向x上進入稜鏡9、10之部分輻射的範圍,
F
in為在角空間中在第一方向x上進入稜鏡9、10之部分輻射的範圍,
D
out為在立體空間中在第一方向x上離開稜鏡9、10之部分輻射的範圍,且
F
out為在角空間中在第一方向x上自稜鏡9、10出射之部分輻射的範圍。
By means of a suitable alignment of the
圖2a在左圖中分別展示在立體空間中在第一方向x上進入稜鏡9、10之部分輻射的橫截面12a及範圍Din。圖2a在右圖中分別展示在角空間中在第一方向x上進入稜鏡9、10之部分輻射的發散度13a、範圍Din。FIG. 2 a shows in the left figure a
圖2b及圖2c說明稜鏡9、10之兩個不同位置對自稜鏡出射之部分輻射的影響。Fig. 2b and Fig. 2c illustrate the influence of two different positions of the
藉此,圖2b在左圖中單獨展示在立體空間中在第一方向x上自稜鏡9、10出射之部分輻射之範圍D
out的橫截面12b。圖2b在右圖中單獨展示在角空間中在第一方向x上自稜鏡9、10出射之部分輻射外之範圍的發散度13b。可看出,發散度13b小於發散度13a。由透鏡裝置8將較小發散度13b或角空間中之較小擴展轉換為作業平面中之立體空間中的分佈,從而導致作業平面中之場在第一方向x上的較小擴展,特定言之線形強度分佈之較小長度。
FIG. 2b thus shows alone in the left figure a
圖2c在左圖中單獨展示在立體空間中在第一方向x上自稜鏡9、10出射之部分輻射的範圍D
out的橫截面12c。圖2c在右圖中單獨展示在角空間中在第一方向x上自稜鏡9、10出射之部分輻射外之範圍的發散度13c。可看出,發散度13c大於發散度13a。由透鏡裝置8將較大發散度13c或角空間之較大擴展轉換為作業平面中之立體空間中的分佈,從而導致作業平面中之場在第一方向x上的較大擴展,特定言之線形強度分佈之較大長度。
FIG. 2 c shows alone in the left figure a
在圖3a至4b中,此藉由用於形成作業平面中之雷射輻射之線形強度分佈14的裝置之特定具體實例實施例說明。In Figures 3a to 4b this is illustrated by a specific embodiment embodiment of a device for forming a
圖3a展示其中稜鏡9、10處於第一位置中之裝置。在此第一位置中,線形強度分佈14之長度略微大於700 mm,如自圖3b可見。Fig. 3a shows the device with the
圖4a展示與圖3a中相同之裝置。然而,在圖4a中,稜鏡9、10處於不同於第一位置之第二位置中。在此第二位置中,線形強度分佈14之長度為約500 mm,如圖4b中可見。Figure 4a shows the same device as in Figure 3a. However, in Fig. 4a, the
稜鏡9、10之不同位置可藉由圍繞在第二方向y上延伸的軸線樞轉個別稜鏡9、10而實現。舉例而言,在圖3a及4中所示之位置中,圖4a中之第一稜鏡9圍繞在第二方向y上延伸之對應軸線相對於圖3a中之稜鏡9順時針樞轉。此外,在圖3a及4中所示之位置中,圖4a中之第二稜鏡10圍繞在第二方向y上延伸之對應軸線相對於圖3a中之稜鏡9逆時針樞轉。The different positions of the
圖5展示根據本發明之裝置之具體實例,該裝置不同於圖1中之裝置,此係因為提供四個稜鏡9a、9b、10a、10b而非兩個稜鏡9、10。此處,兩個第一稜鏡9a、9b並排配置在第一方向x上。此外,兩個第二稜鏡10a、10b相互緊靠地配置在第一方向x上。Fig. 5 shows a specific example of a device according to the invention which differs from the device in Fig. 1 in that instead of two
例如藉由其發散度或光束輪廓而彼此不同之兩個雷射光束7a、7b照射於裝置上。第一雷射光束7a照射於圖5中之第一均勻器1的上部區域上,而第二雷射光束7b照射於圖5中之第一均勻器1的下部區域上。Two
藉此設置裝置以使得已穿過圖5中之上部第一稜鏡9a的雷射輻射7a隨後穿過圖5中之上部第二稜鏡10a,且此外,已穿過圖5中之下部第一稜鏡9b的雷射輻射7b隨後穿過圖5中之下部第二稜鏡10b。此外,設置裝置以使得已穿過第二稜鏡10a、10b之兩個雷射光束7a、7b一起穿過透鏡裝置8且在工作平面中,特定言之在線性強度分佈中由其疊加。The arrangement is thereby arranged such that the
證明極其有利的係,傅立葉配置中之單個透鏡裝置8在作業平面中,特定言之在作業平面中之線形強度分佈中疊加兩個可能極其不同的雷射光束7a、7b,而同時線之長度可由稜鏡9a、9b、10a、10b之對應位置預定。It has proven to be extremely advantageous that a
可規定,均勻器1、4具有用於不同雷射光束7a、7b之不同設計區,該等雷射光束7a、7b在第一方向x上彼此相鄰或間隔開。It can be provided that the
其他有可能的係,用於形成兩個不同雷射光束7a、7b之裝置不包含四個稜鏡,而僅包含兩個(圖中未示)稜鏡,該等稜鏡在此情況下經提供用於不同雷射光束7a、7b中之兩者。It is also possible that the means for forming the two
其他可能的係,在圖1、3a、4a及5中所說明之具體實例中,其他透鏡經提供用於將雷射輻射或該等雷射輻射聚焦至作業平面中及/或用於相對於第二方向y形成雷射輻射或該等雷射輻射。在適用情況下,出於清晰之原因而未展示此等透鏡。Other possibilities, in the embodiments illustrated in Figures 1, 3a, 4a and 5, other lenses are provided for focusing the laser radiation or the laser radiation into the working plane and/or for The second direction y forms the laser radiation or the laser radiation. Where applicable, such lenses have not been shown for reasons of clarity.
1:第一均勻器
2:第一陣列
3:透鏡
4:第二均勻器
5:第二陣列
6:透鏡
7:雷射光束
7a:雷射光束
7b:雷射光束
8:透鏡裝置
9:稜鏡
9a:稜鏡
9b:稜鏡
10:稜鏡
10a:稜鏡
10b:稜鏡
11:入射表面
12a:橫截面
12b:橫截面
12c:橫截面
13a:發散度
13b:發散度
13c:發散度
14:線形強度分佈
1: The first homogenizer
2: first array
3: Lens
4: Second homogenizer
5: second array
6: Lens
7:
本發明之其他特徵及優勢將參考隨附圖式自較佳具體實例之以下描述變得顯而易見。本文中展示: [圖1]為根據本發明之裝置之第一具體實例的示意性側視圖,其中已引入待形成之雷射輻射之光束; [圖2a]為示意性地說明在第二均勻器後方之雷射輻射在立體空間中及在角空間中之分佈的兩個圖; [圖2b]為示意性地說明在第二稜鏡後方之雷射輻射在立體空間中且在角空間中在兩個稜鏡的第一位置中之分佈的兩個圖; [圖2c]示意性地說明在第二稜鏡後方之雷射輻射在立體空間中且在角空間中在兩個稜鏡的第二位置中之分佈的兩個圖; [圖3a]為根據圖1之具體實例在兩個稜鏡之第一位置中的示意性側視圖; [圖3b]為其中相對於以mm為單位之線形強度分佈之線縱向方向上的空間座標以任意單位繪製作業平面中之雷射輻射之強度的圖,其中兩個稜鏡在圖3a中所示之第一位置中; [圖4a]為根據圖1之具體實例在兩個稜鏡之第二位置中的示意性側視圖; [圖4b]為其中相對於以mm為單位之線形強度分佈之線縱向方向上的空間座標以任意單位繪製作業平面中之雷射輻射之強度的圖,兩個稜鏡在圖4a中所示之第二位置中; [圖5]為根據本發明之裝置之第二具體實例的示意性側視圖,其中已引入待形成之雷射輻射之光束。 Other features and advantages of the present invention will become apparent from the following description of preferred embodiments with reference to the accompanying drawings. Shown in this article: [ FIG. 1 ] is a schematic side view of a first embodiment of the device according to the present invention, wherein a beam of laser radiation to be formed has been introduced; [Fig. 2a] are two diagrams schematically illustrating the distribution of the laser radiation behind the second homogenizer in three-dimensional space and in angular space; [ FIG. 2 b ] are two diagrams schematically illustrating the distribution of the laser radiation behind the second horn in the three-dimensional space and in the angular space in the first position of the two horns; [FIG. 2c] Two diagrams schematically illustrating the distribution of the laser radiation behind the second horn in solid space and in angular space in the second position of the two horns; [Fig. 3a] is a schematic side view according to the specific example of Fig. 1 in the first position of the two 稜鏡; [Fig. 3b] is a graph in which the intensity of the laser radiation in the working plane is plotted in arbitrary units with respect to the spatial coordinates in the line longitudinal direction of the linear intensity distribution in mm, wherein two of them are shown in Fig. 3a in the first position shown; [Fig. 4a] is a schematic side view according to the embodiment of Fig. 1 in the second position of the two 稜鏡; [Fig. 4b] is a graph in which the intensity of the laser radiation in the working plane is plotted in arbitrary units with respect to the spatial coordinates in the line longitudinal direction of the linear intensity distribution in mm, and the two beams are shown in Fig. 4a in the second position; [ FIG. 5 ] is a schematic side view of a second embodiment of the device according to the invention, in which a beam of laser radiation to be formed has been introduced.
1:第一均勻器 1: The first homogenizer
2:第一陣列 2: first array
3:透鏡 3: Lens
4:第二均勻器 4: Second homogenizer
5:第二陣列 5: second array
6:透鏡 6: Lens
7:雷射光束 7: Laser beam
8:透鏡裝置 8: Lens device
9:稜鏡 9: 稜鏡
10:稜鏡 10: 稜鏡
11:入射表面 11: Incident surface
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