TWI820138B - Method for manufacturing metal foil with resin and metal foil with resin - Google Patents
Method for manufacturing metal foil with resin and metal foil with resin Download PDFInfo
- Publication number
- TWI820138B TWI820138B TW108118227A TW108118227A TWI820138B TW I820138 B TWI820138 B TW I820138B TW 108118227 A TW108118227 A TW 108118227A TW 108118227 A TW108118227 A TW 108118227A TW I820138 B TWI820138 B TW I820138B
- Authority
- TW
- Taiwan
- Prior art keywords
- metal foil
- resin
- manufacturing
- resin layer
- group
- Prior art date
Links
- 229920005989 resin Polymers 0.000 title claims abstract description 176
- 239000011347 resin Substances 0.000 title claims abstract description 176
- 239000011888 foil Substances 0.000 title claims abstract description 137
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 136
- 239000002184 metal Substances 0.000 title claims abstract description 136
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 58
- 238000000034 method Methods 0.000 title description 32
- 229920000642 polymer Polymers 0.000 claims abstract description 114
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 claims abstract description 88
- 239000000843 powder Substances 0.000 claims abstract description 87
- 239000006185 dispersion Substances 0.000 claims abstract description 42
- 239000002904 solvent Substances 0.000 claims abstract description 23
- 238000002844 melting Methods 0.000 claims abstract description 20
- 238000003860 storage Methods 0.000 claims abstract description 20
- 230000008018 melting Effects 0.000 claims abstract description 16
- 239000007789 gas Substances 0.000 claims description 41
- 239000000178 monomer Substances 0.000 claims description 18
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- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 14
- 239000001301 oxygen Substances 0.000 claims description 14
- 229910052760 oxygen Inorganic materials 0.000 claims description 14
- 125000000524 functional group Chemical group 0.000 claims description 13
- 238000010304 firing Methods 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims description 11
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- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 claims description 8
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- 229920002313 fluoropolymer Polymers 0.000 abstract description 12
- 239000004811 fluoropolymer Substances 0.000 abstract description 12
- 230000001747 exhibiting effect Effects 0.000 abstract description 5
- 239000010410 layer Substances 0.000 description 94
- 239000010408 film Substances 0.000 description 23
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
- 150000001875 compounds Chemical class 0.000 description 18
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- 230000001737 promoting effect Effects 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/082—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising vinyl resins; comprising acrylic resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0366—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2327/00—Polyvinylhalogenides
- B32B2327/12—Polyvinylhalogenides containing fluorine
- B32B2327/18—PTFE, i.e. polytetrafluoroethylene
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
Abstract
本發明提供一種具備電特性及機械強度且有用於製造印刷基板的附樹脂之金屬箔之有效率的製造方法及該附樹脂之金屬箔,該附樹脂之金屬箔具有包含氟聚合物之高均質性的樹脂層且不易翹曲。 一種附樹脂之金屬箔之製造方法,係金屬箔表面具有樹脂層的附樹脂之金屬箔之製造方法,該製造方法如下: 將包含四氟乙烯系聚合物粉末與溶劑的粉末分散液塗佈於金屬箔表面上,該四氟乙烯系聚合物粉末所具展現0.1~5.0MPa之儲存彈性模數之溫度區域在260℃以下且熔點超過260℃, 將金屬箔保持在前述溫度區域內之溫度, 進一步在超過前述溫度區域之溫度下燒成四氟乙烯系聚合物,而於金屬箔表面形成包含四氟乙烯系聚合物之樹脂層。The present invention provides an efficient manufacturing method of a resin-attached metal foil that has electrical properties and mechanical strength and is useful for manufacturing printed circuit boards. The resin-attached metal foil has high homogeneity containing a fluoropolymer and the resin-attached metal foil. The resin layer is durable and not easy to warp. A method of manufacturing a resin-attached metal foil, which is a method of manufacturing a resin-attached metal foil with a resin layer on the surface of the metal foil. The manufacturing method is as follows: A powder dispersion containing tetrafluoroethylene polymer powder and a solvent is coated on the surface of the metal foil. The temperature range of the tetrafluoroethylene polymer powder exhibiting a storage elastic modulus of 0.1 to 5.0 MPa is below 260°C. And the melting point exceeds 260℃, Keep the metal foil at a temperature within the aforementioned temperature zone, The tetrafluoroethylene polymer is further fired at a temperature exceeding the aforementioned temperature range to form a resin layer containing the tetrafluoroethylene polymer on the surface of the metal foil.
Description
本發明涉及一種附樹脂之金屬箔之製造方法及附樹脂之金屬箔。The present invention relates to a method for manufacturing a resin-attached metal foil and a resin-attached metal foil.
發明背景 金屬箔表面具有絕緣樹脂層的附樹脂之金屬箔可以蝕刻等加工金屬箔而作為印刷基板使用。 針對用來傳輸高頻訊號的印刷基板,係講求傳輸特性優異。所以為了提高傳輸特性,印刷基板之絕緣樹脂層必須使用相對介電常數及介電正切低的樹脂。相對介電常數及介電正切小的樹脂,已知有聚四氟乙烯(PTFE)等氟聚物。 針對可形成具有包含氟聚物之樹脂層的附樹脂之金屬箔的材料,有文獻提議一種溶劑中分散有氟聚物粉末的粉末分散液(參照專利文獻1及2)。 該粉末分散液摻混其他絕緣樹脂及其清漆時,具有可任意調整製得之附樹脂之金屬箔的各項物性的優點。而且該粉末分散液還具有僅塗佈乾燥於金屬箔表面即可形成附樹脂之金屬箔的優點。Background of the invention The resin-attached metal foil having an insulating resin layer on the surface of the metal foil can be used as a printed circuit board by processing the metal foil such as etching. For printed circuit boards used to transmit high-frequency signals, excellent transmission characteristics are required. Therefore, in order to improve transmission characteristics, the insulating resin layer of the printed circuit board must use resin with low relative dielectric constant and dielectric tangent. As resins with small relative permittivity and dielectric tangent, fluoropolymers such as polytetrafluoroethylene (PTFE) are known. As a material capable of forming a resin-attached metal foil having a resin layer containing a fluoropolymer, a powder dispersion in which a fluoropolymer powder is dispersed in a solvent is proposed (see Patent Documents 1 and 2). When the powder dispersion is mixed with other insulating resins and varnishes thereof, it has the advantage of being able to arbitrarily adjust various physical properties of the metal foil with resin. Furthermore, the powder dispersion also has the advantage of being able to form a resin-attached metal foil by simply coating and drying it on the surface of the metal foil.
先前技術文獻 專利文獻 專利文獻1:國際公開第2017/222027號 專利文獻2:國際公開第2016/159102號Prior technical literature patent documents Patent Document 1: International Publication No. 2017/222027 Patent Document 2: International Publication No. 2016/159102
發明概要 發明欲解決之課題 就印刷基板之製造態樣而言,有於包含氟聚合物之樹脂層(絕緣樹脂層)表面積層其他基板(預浸體等)而將附樹脂之金屬箔多層化之態樣,或是於前述樹脂層之表面積層其他基板(覆蓋薄膜等)進行封裝之態樣。此時,從印刷基板之電特性及生產性的觀點來看,必須以不使附樹脂之金屬箔翹曲的方式來積層前述樹脂層與其他基板。 周知有一種將具有包含氟聚合物之樹脂層的附樹脂之金屬箔供於表面處理(電漿處理、電暈處理、電子射線處理等)而控制前述樹脂層翹曲的方法,但該方法必須另外將附樹脂之金屬箔供於表面處理。而且,表面處理有時會引發前述樹脂層歷時性的改質及形狀變化等而損傷前述樹脂層之均質性。Summary of the invention The problem to be solved by the invention In terms of manufacturing methods of printed circuit boards, there are methods in which another substrate (prepreg, etc.) is laminated on the surface of a resin layer (insulating resin layer) containing a fluoropolymer to multi-layer metal foil with resin, or in which The surface of the aforementioned resin layer is laminated with other substrates (covering films, etc.) for encapsulation. At this time, from the viewpoint of the electrical characteristics and productivity of the printed circuit board, it is necessary to laminate the resin layer and other substrates in such a manner that the metal foil with resin is not warped. It is known that a resin-attached metal foil having a resin layer containing a fluoropolymer is subjected to surface treatment (plasma treatment, corona treatment, electron beam treatment, etc.) to control the warpage of the resin layer. However, this method requires In addition, metal foil with resin is used for surface treatment. Furthermore, surface treatment may cause temporal modification and shape change of the resin layer, thereby damaging the homogeneity of the resin layer.
本發明人等為了從包含氟聚合物粉末之粉末分散液製造一種具有包含氟聚合物之高均質性的樹脂層且不易翹曲的附樹脂之金屬箔而努力研討。其結果發現,藉由調整氟聚合物之物性與附樹脂之金屬箔的製造條件,可有效率地製造所述附樹脂之金屬箔。 本發明提供一種具備電特性及機械強度且有用於製造印刷基板的附樹脂之金屬箔及其有效率的製造方法,該附樹脂之金屬箔具有包含氟聚合物之高均質性的樹脂層且不易翹曲。The present inventors have made efforts to produce a resin-attached metal foil that has a highly homogeneous resin layer containing a fluoropolymer and is less likely to warp from a powder dispersion containing a fluoropolymer powder. As a result, they found that by adjusting the physical properties of the fluoropolymer and the manufacturing conditions of the resin-attached metal foil, the resin-attached metal foil can be efficiently produced. The present invention provides a resin-attached metal foil that has electrical properties and mechanical strength and is useful for manufacturing printed circuit boards, and an efficient manufacturing method thereof. The resin-attached metal foil has a highly homogeneous resin layer containing a fluoropolymer and is not easily warping.
用以解決課題之手段 本發明具有下述態樣。 [1]一種附樹脂之金屬箔之製造方法,係金屬箔表面具有樹脂層的附樹脂之金屬箔之製造方法,該製造方法如下: 將包含四氟乙烯系聚合物粉末與溶劑的粉末分散液塗佈於金屬箔表面上,該四氟乙烯系聚合物粉末所具展現0.1~5.0MPa之儲存彈性模數之溫度區域在260℃以下且熔點超過260℃, 將金屬箔保持在前述溫度區域內之溫度, 進一步在超過前述溫度區域之溫度下燒成四氟乙烯系聚合物,而於金屬箔表面形成包含四氟乙烯系聚合物之樹脂層。means to solve problems The present invention has the following aspects. [1] A method of manufacturing a resin-attached metal foil, which is a method of manufacturing a resin-attached metal foil having a resin layer on the surface of the metal foil. The manufacturing method is as follows: A powder dispersion containing tetrafluoroethylene polymer powder and a solvent is coated on the surface of the metal foil. The temperature range of the tetrafluoroethylene polymer powder exhibiting a storage elastic modulus of 0.1 to 5.0 MPa is below 260°C. And the melting point exceeds 260℃, Keep the metal foil at a temperature within the aforementioned temperature zone, The tetrafluoroethylene polymer is further fired at a temperature exceeding the aforementioned temperature range to form a resin layer containing the tetrafluoroethylene polymer on the surface of the metal foil.
[2]如[1]記載之製造方法,其中附樹脂之金屬箔的翹曲率為7%以下。 [3]如[1]或[2]記載之製造方法,其中金屬箔之厚度為2~40μm。 [4]如[1]~[3]中任一項記載之製造方法,其中樹脂層之厚度為1~50μm。 [5]如[1]~[4]中任一項記載之製造方法,其中金屬箔之厚度為2~20μm,樹脂層之厚度為1μm以上且小於10μm。 [6]如[1]~[5]中任一項記載之製造方法,其中粉末之體積基準累積50%粒徑為0.05~6.0μm。 [7]如[1]~[6]中任一項記載之製造方法,其中四氟乙烯系聚合物係一包含下述單元之聚合物: 以四氟乙烯為主體之單元;及 以選自於由全氟(烷基乙烯基醚)、六氟丙烯及氟烷基乙烯所構成群組中之至少1種單體為主體之單元。[2] The manufacturing method according to [1], wherein the warpage rate of the resin-coated metal foil is 7% or less. [3] The manufacturing method according to [1] or [2], wherein the thickness of the metal foil is 2 to 40 μm. [4] The manufacturing method according to any one of [1] to [3], wherein the thickness of the resin layer is 1 to 50 μm. [5] The manufacturing method according to any one of [1] to [4], wherein the thickness of the metal foil is 2 to 20 μm, and the thickness of the resin layer is 1 μm or more and less than 10 μm. [6] The manufacturing method according to any one of [1] to [5], wherein the volume-based cumulative 50% particle size of the powder is 0.05 to 6.0 μm. [7] The manufacturing method according to any one of [1] to [6], wherein the tetrafluoroethylene polymer is a polymer containing the following units: Units based on tetrafluoroethylene; and A unit mainly composed of at least one monomer selected from the group consisting of perfluoro(alkyl vinyl ether), hexafluoropropylene and fluoroalkylethylene.
[8]如[1]~[7]中任一項記載之製造方法,其中四氟乙烯系聚合物具有:選自於由含羰基之基團、羥基、環氧基、醯胺基、胺基及異氰酸酯基所構成群組中之至少1種官能基。 [9]如[1]~[8]中任一項記載之製造方法,其中粉末分散液包含聚合物狀多元醇。 [10]如[1]~[9]中任一項記載之製造方法,其將金屬箔保持在前述溫度區域之時間為30秒~5分鐘。 [11]如[1]~[10]中任一項記載之製造方法,其將金屬箔保持在前述溫度區域時之氣體環境為含氧氣之氣體環境。 [12]如[1]~[11]中任一項記載之製造方法,其燒成四氟乙烯系聚合物時之溫度超過320℃。[8] The production method according to any one of [1] to [7], wherein the tetrafluoroethylene polymer has: a group selected from the group consisting of a carbonyl group, a hydroxyl group, an epoxy group, a amide group, and an amine group. At least one functional group in the group consisting of a group and an isocyanate group. [9] The production method according to any one of [1] to [8], wherein the powder dispersion contains a polymeric polyol. [10] The manufacturing method according to any one of [1] to [9], wherein the metal foil is maintained in the aforementioned temperature range for 30 seconds to 5 minutes. [11] The manufacturing method according to any one of [1] to [10], wherein the gas environment when maintaining the metal foil in the aforementioned temperature range is a gas environment containing oxygen. [12] The manufacturing method according to any one of [1] to [11], wherein the temperature when firing the tetrafluoroethylene polymer exceeds 320°C.
[13]一種附樹脂之金屬箔,係於厚度2~20μm之金屬箔表面具有厚度為1μm以上且小於10μm之樹脂層,前述樹脂層含有包含下述單元之聚合物: 以四氟乙烯為主體之單元;及 以選自於由全氟(烷基乙烯基醚)、六氟丙烯及氟烷基乙烯所構成群組中之至少1種單體為主體之單元; 並且,該附樹脂之金屬箔的翹曲率為7%以下。 [14]如[13]記載之附樹脂之金屬箔,其翹曲率為5%以下。 [15]一種印刷基板之製造方法,係以如前述[1]~[12]中任一項記載之製造方法製造附樹脂之金屬箔後,蝕刻前述金屬箔而形成圖案電路。[13] A metal foil with resin, which has a resin layer with a thickness of 1 μm or more and less than 10 μm on the surface of a metal foil with a thickness of 2 to 20 μm. The resin layer contains a polymer containing the following units: Units based on tetrafluoroethylene; and A unit mainly composed of at least one monomer selected from the group consisting of perfluoro(alkyl vinyl ether), hexafluoropropylene and fluoroalkylethylene; Furthermore, the warpage rate of the resin-coated metal foil is 7% or less. [14] The resin-coated metal foil described in [13] has a warpage rate of 5% or less. [15] A method of manufacturing a printed circuit board, which includes manufacturing a resin-coated metal foil using the manufacturing method described in any one of [1] to [12] above, and then etching the metal foil to form a pattern circuit.
發明效果 根據本發明,可有效率地製造一種具備電特性及機械強度且有用於製造印刷基板的附樹脂之金屬箔,該附樹脂之金屬箔具有包含氟聚合物之高均質性的樹脂層且不易翹曲。Invention effect According to the present invention, a resin-attached metal foil having electrical properties and mechanical strength and useful for manufacturing printed circuit boards can be efficiently produced. The resin-attached metal foil has a highly homogeneous resin layer containing a fluoropolymer and is not prone to warping. song.
用以實施發明之形態 以下用語具有下列意義。 「粉末之D50」係利用雷射繞射散射法求得粉末之體積基準累積50%粒徑。即,利用雷射繞射散射法測定粉末之粒度分布,令其粒子群之總體積為100%求出累積曲線後,於該累積曲線上累積體積為50%之點的粒徑。 「粉末之D90」係利用雷射繞射散射法求得粉末之體積基準累積90%粒徑。即,利用雷射繞射散射法測定粉末之粒度分布,令其粒子群之總體積為100%求出累積曲線後,於該累積曲線上累積體積為90%之點的粒徑。 「聚合物之儲存彈性模數」係按ISO 6721-4:1994(JIS K7244-4:1999)進行測定所得之值。 「聚合物之熔點」係指與示差掃描熱量測定(DSC)法測得之熔解峰之最大值對應的溫度。 「附樹脂之金屬箔的翹曲率」係從附樹脂之金屬箔裁切出180mm四方的四角試驗片,針對試驗片按JIS C6471:1995(對應國際規格IEC 249-1:1982)中規定之測定方法進行測定所得之值。 「附樹脂之金屬箔的尺寸變化率」係按下述所求得之值。將附樹脂之金屬箔裁切出150mm四方,用0.3mm之鑽頭於四隅開孔後,以三維測定器測定孔的位置。以蝕刻去除附樹脂之金屬箔的金屬箔後,在130℃下乾燥30分鐘。以三維測定器測定開在四隅的孔的位置。從蝕刻前後之孔的位置之差算出尺寸變化率。 「算術平均粗度Ra」係根據JIS B0601:2013(ISO4287:1997,Amd.1:2009)進行測定所得之算術平均粗度。求算Ra時,粗度曲線用的基準長度lr(截止值λc)係設為0.8mm。 「耐熱性樹脂」意指熔點為280℃以上之高分子化合物,或是JIS C4003:2010(IEC 60085:2007)所規定之最高連續使用溫度為121℃以上的高分子化合物。 「(甲基)丙烯酸酯」為丙烯酸酯及甲基丙烯酸酯之總稱。Form used to implement the invention The following terms have the following meanings. "Powder D50" uses the laser diffraction and scattering method to determine the volume-based cumulative 50% particle size of the powder. That is, the particle size distribution of the powder is measured using the laser diffraction scattering method, and the total volume of the particle group is 100%. After the accumulation curve is calculated, the particle size at the point where the cumulative volume is 50% on the accumulation curve. "Powder D90" uses the laser diffraction and scattering method to determine the volume-based cumulative 90% particle size of the powder. That is, the particle size distribution of the powder is measured using the laser diffraction scattering method, and the total volume of the particle group is 100%. After the accumulation curve is calculated, the particle size at the point where the cumulative volume is 90% on the accumulation curve. "Storage elastic modulus of polymer" is a value measured in accordance with ISO 6721-4: 1994 (JIS K7244-4: 1999). "Melting point of polymer" refers to the temperature corresponding to the maximum value of the melting peak measured by differential scanning calorimetry (DSC). "The warpage rate of resin-coated metal foil" is measured by cutting a 180mm square corner test piece from the resin-coated metal foil according to JIS C6471:1995 (corresponding to the international standard IEC 249-1:1982). The value obtained by measuring the method. "Dimensional change rate of metal foil with resin" is a value determined as follows. Cut the metal foil with resin into 150mm squares, use a 0.3mm drill bit to make holes at the four corners, and use a three-dimensional measuring device to measure the position of the holes. After removing the metal foil of the resin-attached metal foil by etching, it was dried at 130° C. for 30 minutes. Use a three-dimensional measuring device to measure the positions of the holes at the four corners. The dimensional change rate was calculated from the difference in hole positions before and after etching. "Arithmetic mean roughness Ra" is the arithmetic mean roughness measured in accordance with JIS B0601:2013 (ISO4287:1997, Amd.1:2009). When calculating Ra, the reference length lr (cutoff value λc) used for the thickness curve is set to 0.8 mm. "Heat-resistant resin" means a polymer compound with a melting point of 280°C or higher, or a polymer compound with a maximum continuous use temperature of 121°C or higher as specified in JIS C4003:2010 (IEC 60085:2007). "(Meth)acrylate" is the general term for acrylate and methacrylate.
本發明之製造方法係將特定粉末分散液塗佈於金屬箔表面,在特定的溫度環境下將該金屬箔階段性地加熱保持,而於金屬箔表面形成包含特定四氟乙烯系聚合物(以下亦表記為「TFE系聚合物」)之樹脂層的方法。另,使用之粉末分散液係TFE系聚合物粉末呈粒狀分散的分散液。The manufacturing method of the present invention is to apply a specific powder dispersion on the surface of a metal foil, heat and maintain the metal foil in stages under a specific temperature environment, and form a specific tetrafluoroethylene polymer (hereinafter) on the surface of the metal foil. Also referred to as "TFE-based polymer") resin layer method. In addition, the powder dispersion used is a dispersion in which TFE polymer powder is dispersed in a granular form.
根據本發明製得之附樹脂之金屬箔具有均質性優異且包含TFE系聚合物的樹脂層(以下亦表記為「F樹脂層」)且不易翹曲之原因雖尚不明確,惟吾等以為如下。 本發明之TFE系聚合物具有預定熔融性(具有超過260℃之熔點)及預定彈性(所具展現0.1~5.0MPa之儲存彈性模數的溫度區域在260℃以下),並在前述溫度區域下形成一定的彈性狀態。吾等認為,將包含該TFE系聚合物粉末之分散液塗佈於金屬箔表面並保持在前述溫度區域內之溫度時,前述粉末因源自彈性之黏著性而不易缺損,從而形成緊密充填之被膜狀態。吾等認為在本發明中,係於形成該被膜狀態後在超過前述溫度區域下燒成TFE系聚合物而形成F樹脂層,因此可直接形成均質性高且緻密的F樹脂層,從而製得了不易翹曲的附樹脂之金屬箔。Although the reason why the resin-attached metal foil produced according to the present invention has a resin layer (hereinafter also referred to as "F resin layer") containing a TFE-based polymer that is excellent in homogeneity and is not prone to warping is not yet clear, we believe that it is as follows. The TFE-based polymer of the present invention has predetermined meltability (having a melting point exceeding 260°C) and predetermined elasticity (having a storage elastic modulus of 0.1 to 5.0 MPa in a temperature range below 260°C), and under the aforementioned temperature range Form a certain elastic state. We believe that when a dispersion containing the TFE-based polymer powder is applied to the surface of a metal foil and maintained at a temperature within the aforementioned temperature range, the aforementioned powder will not be easily damaged due to the adhesiveness derived from elasticity, thereby forming a tightly packed structure. membrane state. We believe that in the present invention, the F resin layer is formed by firing the TFE-based polymer at a temperature exceeding the above-mentioned temperature range after forming the film state. Therefore, a highly homogeneous and dense F resin layer can be directly formed, thereby producing Resin-coated metal foil that is not easily warped.
本發明之附樹脂之金屬箔於金屬箔之至少一表面具有F樹脂層。亦即,附樹脂之金屬箔可僅於金屬箔單面具有F樹脂層,亦可於金屬箔兩面具有F樹脂層。 附樹脂之金屬箔的翹曲率宜為7%以下,5%以下尤佳。翹曲率之下限通常為0%。此時,將附樹脂之金屬箔加工至印刷基板時的處置性及製得之印刷基板的傳輸特性優異。 附樹脂之金屬箔的尺寸變化率宜為±1%以下,±0.2%以下尤佳。此時,容易將從附樹脂之金屬箔製得之印刷基板進行多層化。The metal foil with resin of the present invention has an F resin layer on at least one surface of the metal foil. That is, the metal foil with resin may have the F resin layer only on one side of the metal foil, or may have the F resin layer on both sides of the metal foil. The warpage rate of the resin-coated metal foil is preferably 7% or less, preferably 5% or less. The lower limit of warpage is usually 0%. In this case, the handleability when processing the resin-attached metal foil to a printed circuit board and the resulting printed circuit board are excellent in transmission characteristics. The dimensional change rate of metal foil with resin should be ±1% or less, preferably ±0.2% or less. In this case, it is easy to multi-layer the printed circuit board made of the resin-coated metal foil.
本發明之金屬箔的材質可舉銅、銅合金、不鏽鋼、鎳、鎳合金(亦含42合金)、鋁、鋁合金、鈦、鈦合金等。 金屬箔可舉軋延銅箔、電解銅箔等。亦可於金屬箔表面形成有防鏽層(鉻酸鹽等之氧化物皮膜等)、耐熱層等。The metal foil of the present invention may be made of copper, copper alloy, stainless steel, nickel, nickel alloy (including 42 alloy), aluminum, aluminum alloy, titanium, titanium alloy, etc. Examples of metal foil include rolled copper foil, electrolytic copper foil, and the like. An anti-rust layer (oxide film such as chromate, etc.), a heat-resistant layer, etc. may also be formed on the surface of the metal foil.
金屬箔表面的十點平均粗度宜為0.2~1.5μm。此時,其與F樹脂層之接著性即良好,容易製得傳輸特性優異的印刷基板。 金屬箔之厚度只要是可在附樹脂之金屬箔用途上發揮功能之厚度即可,宜為2μm以上,3μm以上尤佳。而且金屬箔之厚度宜為40μm以下,20μm以下較佳,15μm以下尤佳。金屬箔之厚度的具體態樣可舉2~40μm、2~20μm、2~15μm等態樣。 金屬箔表面可經矽烷耦合劑處理,可以是金屬箔表面整體經矽烷耦合劑處理,亦可為部分金屬箔表面經矽烷耦合劑處理。The ten-point average roughness of the metal foil surface should be 0.2~1.5μm. In this case, the adhesion with the F resin layer is good, and a printed circuit board with excellent transmission characteristics can be easily produced. The thickness of the metal foil is sufficient as long as it can function in the application of metal foil with resin, and it is preferably 2 μm or more, especially 3 μm or more. Moreover, the thickness of the metal foil is preferably 40 μm or less, preferably 20 μm or less, and especially 15 μm or less. The specific thickness of the metal foil can be 2~40μm, 2~20μm, 2~15μm, etc. The surface of the metal foil can be treated with the silane coupling agent. The entire surface of the metal foil can be treated with the silane coupling agent, or a part of the surface of the metal foil can be treated with the silane coupling agent.
本發明之F樹脂層係藉由本發明之製造方法從本發明之粉末分散液形成之包含TFE系聚合物的樹脂層。The F resin layer of the present invention is a resin layer containing a TFE-based polymer formed from the powder dispersion of the present invention by the manufacturing method of the present invention.
F樹脂層表面之水接觸角宜為70~100°,70~90°尤佳。前述範圍只要在上限以下,F樹脂層與其他基材之接著性便更佳。前述範圍只要在下限以上,F樹脂層之電特性(低介電損耗及低介電常數)便更佳。F The water contact angle on the surface of the resin layer should be 70~100°, especially 70~90°. As long as the aforementioned range is below the upper limit, the adhesion between the F resin layer and other base materials will be better. As long as the aforementioned range is above the lower limit, the electrical characteristics (low dielectric loss and low dielectric constant) of the F resin layer will be better.
F樹脂層之厚度宜為1μm以上,2μm以上較佳,5μm以上尤佳。而且F樹脂層之厚度宜為50μm以下,15μm以下較佳,小於10μm尤佳。在該範圍內,可易使印刷基板之傳輸特性及抑制附樹脂之金屬箔翹曲平衡。附樹脂之金屬箔於金屬箔兩面具有F樹脂層時,從可抑制附樹脂之金屬箔翹曲的觀點來看,各F樹脂層之組成及厚度宜分別相同。 F樹脂層之厚度的具體態樣可舉1~50μm,舉例如1~15μm、1μm以上且小於10μm、5~15μm等之態樣。 本發明之金屬箔之厚度與F樹脂層之厚度的適當態樣,可舉前者為2~20μm且後者為1μm以上且小於10μm的態樣。在本發明之製造方法中,如同上述可形成均質性高且緻密的F樹脂層,因此即使是這類薄構成的附樹脂之金屬箔,依舊可抑制翹曲。The thickness of the F resin layer is preferably 1 μm or more, preferably 2 μm or more, and especially 5 μm or more. Moreover, the thickness of the F resin layer is preferably 50 μm or less, preferably 15 μm or less, and particularly preferably less than 10 μm. Within this range, it is possible to easily balance the transmission characteristics of the printed circuit board and suppress the warpage of the resin-coated metal foil. When the metal foil with resin has F resin layers on both sides of the metal foil, from the viewpoint of suppressing warpage of the metal foil with resin, the composition and thickness of each F resin layer are preferably the same. Specific embodiments of the thickness of the F resin layer include 1 to 50 μm, such as 1 to 15 μm, 1 μm or more and less than 10 μm, 5 to 15 μm, and the like. Appropriate aspects of the thickness of the metal foil and the thickness of the F resin layer of the present invention include the former being 2 to 20 μm and the latter being 1 μm or more and less than 10 μm. In the manufacturing method of the present invention, a highly homogeneous and dense F-resin layer can be formed as described above. Therefore, even with such a thin resin-attached metal foil, warping can be suppressed.
F樹脂層之相對介電常數宜為2.0~3.5,2.0~3.0較佳。此時,F樹脂層之電特性及接著性兩者皆優異,適合將附樹脂之金屬箔用於要求低介電常數的印刷基板等。 F樹脂層表面之Ra小於F樹脂層之厚度,宜為2.2~8μm。在該範圍內,容易使其與其他基板之接著性與加工性平衡。The relative dielectric constant of the F resin layer should be 2.0~3.5, preferably 2.0~3.0. In this case, the F resin layer is excellent in both electrical properties and adhesion, and is suitable for use of resin-coated metal foil in printed circuit boards and the like that require low dielectric constants. Ra on the surface of the F resin layer is smaller than the thickness of the F resin layer and should be 2.2~8μm. Within this range, it is easy to balance the adhesion and processability with other substrates.
本發明之包含TFE系聚合物的粉末(以下亦表記為「F粉末」)可在不損及本發明效果之範圍內包含有TFE系聚合物以外的成分,惟宜以TFE系聚合物為主成分。F粉末之TFE系聚合物的含量宜為80質量%以上,且100質量%尤佳。 F粉末之D50宜為0.05~6.0μm,0.1~3.0μm較佳,0.2~3.0μm尤佳。在該範圍內,F粉末之流動性與分散性便良好,而且最容易顯現附樹脂之金屬箔中TFE系聚合物之電特性(低介電常數等)及耐熱性。 F粉末之D90宜為8μm以下,6μm以下較佳,5μm以下尤佳。粉末之D90宜為0.3μm以上,0.8μm以上尤佳。在該範圍內,F粉末之流動性與分散性便良好,而且最容易顯現F樹脂層之電特性(低介電常數等)及耐熱性。 F粉末之鬆裝體密度宜為0.05g/mL以上,0.08~0.5g/mL尤佳。 F粉末之緊密裝填體密度宜為0.05g/mL以上,0.1~0.8g/mL尤佳。The powder containing the TFE-based polymer of the present invention (hereinafter also referred to as "F powder") may contain components other than the TFE-based polymer within the range that does not impair the effect of the present invention, but it is preferable to mainly use the TFE-based polymer. Element. The content of the TFE-based polymer in the F powder is preferably 80% by mass or more, and particularly preferably 100% by mass. The D50 of F powder should be 0.05~6.0μm, preferably 0.1~3.0μm, especially 0.2~3.0μm. Within this range, the fluidity and dispersibility of the F powder are good, and the electrical characteristics (low dielectric constant, etc.) and heat resistance of the TFE-based polymer in the resin-attached metal foil are most easily demonstrated. The D90 of F powder should be below 8 μm, preferably below 6 μm, and especially below 5 μm. The D90 of the powder should be above 0.3μm, especially above 0.8μm. Within this range, the fluidity and dispersibility of the F powder will be good, and the electrical characteristics (low dielectric constant, etc.) and heat resistance of the F resin layer will most easily appear. The bulk density of F powder should be above 0.05g/mL, especially 0.08~0.5g/mL. The densely packed density of F powder should be above 0.05g/mL, especially 0.1~0.8g/mL.
F粉末之製造方法並無特別限定,可採用國際公開第2016/017801號之段落[0065]~[0069]中記載之方法。另,市面上若有符合期望的粉末,F粉末亦可用之。 本發明之TFE系聚合物的熔點超過260℃,宜為260~320℃,275~320℃尤佳,295~310℃最佳。在該情況下,TFE系聚合物可保持源自其彈性之黏著性之同時被燒成,而更容易形成細緻的F樹脂層。The manufacturing method of F powder is not particularly limited, and the method described in paragraphs [0065] to [0069] of International Publication No. 2016/017801 can be used. In addition, if there is a powder on the market that meets your expectations, F powder can also be used. The melting point of the TFE polymer of the present invention exceeds 260°C, and is preferably 260~320°C, especially 275~320°C, and most preferably 295~310°C. In this case, the TFE-based polymer can be fired while maintaining the adhesiveness derived from its elasticity, making it easier to form a fine F-resin layer.
本發明之TFE系聚合物所具展現0.1~5.0MPa之儲存彈性模數的溫度區域在260℃以下。譬如,TFE聚合物在260℃下之儲存彈性模數為0.1~5.0MPa。 TFE系聚合物展現之儲存彈性模數宜為0.2~4.4MPa,0.5~3.0MPa尤佳。而且,TFE系聚合物展現該儲存彈性模數蜘溫度區域宜為180~260℃之範圍,且200~260℃之範圍尤佳。此時,在前述溫度區域中F粉末容易有效展現源自彈性之黏著性。The TFE-based polymer of the present invention exhibits a storage elastic modulus of 0.1 to 5.0 MPa in a temperature range below 260°C. For example, the storage elastic modulus of TFE polymer at 260°C is 0.1~5.0MPa. The storage elastic modulus exhibited by TFE-based polymers is preferably 0.2~4.4MPa, especially 0.5~3.0MPa. Furthermore, the temperature range for the TFE-based polymer to exhibit the storage elastic modulus is preferably in the range of 180 to 260°C, and particularly preferably in the range of 200 to 260°C. At this time, the F powder easily exhibits adhesiveness derived from elasticity in the aforementioned temperature range.
TFE系聚合物係包含以四氟乙烯(TFE)為主體之單元(TFE單元)的聚合物。TFE系聚合物可為TFE之均聚物,亦可為TFE及可與TFE共聚之其他單體(以下亦表記為共聚單體)的共聚物。TFE系聚合物宜相對於聚合物中所含總單元包含75~100莫耳%之TFE單元,且包含0~25莫耳%之以共聚單體為主體之單元。 TFE系聚合物可舉:聚四氟乙烯(PTFE)、TFE與乙烯之共聚物、TFE與丙烯之共聚物、TFE與全氟(烷基乙烯基醚)(PAVE)之共聚物(PFA)、TFE與六氟丙烯(HFP)之共聚物(HFP)、TFE與氟烷基乙烯(FAE)之共聚物、TFE與氯三氟乙烯之共聚物。TFE-based polymers are polymers containing units (TFE units) mainly composed of tetrafluoroethylene (TFE). The TFE-based polymer may be a homopolymer of TFE or a copolymer of TFE and other monomers copolymerizable with TFE (hereinafter also referred to as comonomers). The TFE-based polymer preferably contains 75 to 100 mol% of TFE units relative to the total units contained in the polymer, and 0 to 25 mol% of units based on comonomers. Examples of TFE polymers include polytetrafluoroethylene (PTFE), copolymers of TFE and ethylene, copolymers of TFE and propylene, copolymers of TFE and perfluoro(alkyl vinyl ether) (PAVE) (PFA), Copolymer of TFE and hexafluoropropylene (HFP), copolymer of TFE and fluoroalkylethylene (FAE), copolymer of TFE and chlorotrifluoroethylene.
PAVE可舉CF2 =CFOCF3 、CF2 =CFOCF2 CF3 、CF2 =CFOCF2 CF2 CF3 (PPVE)、CF2 =CFOCF2 CF2 CF2 CF3 、CF2 =CFO(CF2 )8 F。 FAE可舉CH2 =CH(CF2 )2 F、CH2 =CH(CF2 )3 F、CH2 =CH(CF2 )4 F、CH2 =CF(CF2 )3 H、CH2 =CF(CF2 )4 H。 TFE系聚合物之理想態樣亦可舉包含TFE單元與以選自於由PAVE、HFP及FAE所構成群組中之至少1種單體為主體之單元(以下亦表記為「共聚單體單元F」)的聚合物。PAVE can enumerate CF 2 =CFOCF 3 , CF 2 =CFOCF 2 CF 3 , CF 2 =CFOCF 2 CF 2 CF 3 (PPVE), CF 2 =CFOCF 2 CF 2 CF 2 CF 3 , CF 2 =CFO(CF 2 ) 8F . Examples of FAE include CH 2 =CH(CF 2 ) 2 F, CH 2 =CH(CF 2 ) 3 F, CH 2 =CH(CF 2 ) 4 F, CH 2 =CF(CF 2 ) 3 H, CH 2 = CF(CF 2 ) 4H . An ideal aspect of the TFE-based polymer also includes a TFE unit and a unit mainly composed of at least one monomer selected from the group consisting of PAVE, HFP, and FAE (hereinafter also referred to as "comonomer unit"). F") polymer.
前述聚合物宜相對於聚合物中所含總單元包含90~99莫耳%之TFE單元,且包含1~10莫耳%之共聚單體單元F。前述聚合物可僅由TFE單元與共聚單體單元F構成,更可包含有其他單元。The aforementioned polymer preferably contains 90 to 99 mol% of TFE units and 1 to 10 mol% of comonomer units F relative to the total units contained in the polymer. The aforementioned polymer may only be composed of TFE units and comonomer units F, and may also include other units.
TFE系聚合物之理想態樣亦可舉包含具有選自於由含羰基之基團、羥基、環氧基、醯胺基、胺基及異氰酸酯基所構成群組中之至少1種官能基(以下亦表記為「官能基」)之TFE單元的聚合物(以下亦表記為「聚合物F1」) 官能基可含在TFE系聚合物中之單元上,亦可含在聚合物F1之主鏈的末端基上。後者的聚合物可舉具有將官能基作為源自聚合引發劑、鏈轉移劑等之末端基的聚合物。 聚合物F1宜為包含具有官能基之單元與TFE單元的聚合物。而此時的聚合物F1宜更包含其他單元,且尤宜包含共聚單體單元F。 從F樹脂層與金屬箔之接著性的觀點來看,官能基宜為含羰基之基團。含羰基之基團可舉碳酸酯基、羧基、鹵代甲醯基、烷氧羰基、酸酐殘基(-C(O)OC(O)-)、脂肪酸殘基等,且以羧基及酸酐殘基為宜。An ideal embodiment of the TFE-based polymer also includes at least one functional group selected from the group consisting of a carbonyl group-containing group, a hydroxyl group, an epoxy group, a amide group, an amine group, and an isocyanate group ( A polymer of TFE units (hereinafter also referred to as "functional group") (hereinafter also referred to as "polymer F1") The functional group may be contained in the unit in the TFE-based polymer, or may be contained in the terminal group of the main chain of polymer F1. Examples of the latter polymer include polymers having functional groups as terminal groups derived from a polymerization initiator, a chain transfer agent, and the like. Polymer F1 is preferably a polymer containing a unit having a functional group and a TFE unit. At this time, the polymer F1 preferably further contains other units, and particularly preferably contains the comonomer unit F. From the viewpoint of the adhesion between the F resin layer and the metal foil, the functional group is preferably a group containing a carbonyl group. Groups containing carbonyl groups include carbonate groups, carboxyl groups, haloformyl groups, alkoxycarbonyl groups, acid anhydride residues (-C(O)OC(O)-), fatty acid residues, etc., and carboxyl groups and acid anhydride residues The base is appropriate.
具有官能基之單元宜為以具有官能基之單體為主體的單元,較宜為以具有含羰基之基團之單體為主體的單元、以具有羥基之單體為主體的單元、以具有環氧基之單體為主體的單元及以具有異氰酸酯基之單體為主體的單元,尤宜為以具有含羰基之基團之單體為主體的單元。 具有含羰基之基團之單體宜為:具有酸酐殘基之環狀單體、具有羧基之單體、乙烯基酯或(甲基)丙烯酸酯,且以具有酸酐殘基之環狀單體尤佳。 前述環狀單體宜為:伊康酸酐、檸康酸酐、5-降莰烯-2,3-二羧酸酐(別名:納迪克酸酐,以下亦表記為「NAH」)或馬來酸酐。 聚合物F1宜為包含具有官能基之單元、TFE單元與PAVE單元或HFP單元的聚合物。該聚合物F1之具體例可舉國際公開第2018/16644號中記載之聚合體(X)。The unit having a functional group is preferably a unit mainly composed of a monomer having a functional group, preferably a unit mainly composed of a monomer having a carbonyl group-containing group, a unit mainly composed of a monomer having a hydroxyl group, or a unit mainly composed of a monomer having a hydroxyl group. The unit mainly composed of a monomer having an epoxy group and the unit mainly composed of a monomer having an isocyanate group is particularly preferably a unit mainly composed of a monomer having a carbonyl group-containing group. The monomer having a carbonyl group-containing group is preferably: a cyclic monomer having an acid anhydride residue, a monomer having a carboxyl group, vinyl ester or (meth)acrylate, and a cyclic monomer having an acid anhydride residue. Excellent. The aforementioned cyclic monomer is preferably: itaconic anhydride, citraconic anhydride, 5-norbornene-2,3-dicarboxylic anhydride (alias: nadic anhydride, also referred to as "NAH" below) or maleic anhydride. Polymer F1 is preferably a polymer containing units having functional groups, TFE units and PAVE units or HFP units. Specific examples of the polymer F1 include the polymer (X) described in International Publication No. 2018/16644.
聚合物F1中之TFE單元的比率宜在聚合物F1中所含之總單元中為90~99莫耳%。 聚合物F1中之PAVE單元的比率宜在聚合物F1中所含之總單元中為0.5~9.97莫耳%。 聚合物F1中之具有官能基之單元的比率宜在聚合物F1中所含之總單元中為0.01~3莫耳%。The ratio of TFE units in polymer F1 is preferably 90 to 99 mole % of the total units contained in polymer F1. The ratio of PAVE units in polymer F1 is preferably 0.5 to 9.97 mol% based on the total units contained in polymer F1. The ratio of units having functional groups in polymer F1 is preferably 0.01 to 3 mol% of the total units contained in polymer F1.
本發明之溶劑為分散媒,在25℃下為液態之非活性且不與F粉末起反應的溶劑化合物,宜為沸點比粉末分散液中所含之溶劑以外的成分更低且可藉加熱等揮發去除的溶劑化合物。 溶劑化合物可舉:水、醇(甲醇、乙醇、異丙醇等)、含氮化合物(N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯啶酮等)、含硫化合物(二甲亞碸等)、醚(二乙基醚、二烷等)、酯(乳酸乙酯、乙酸乙酯等)、酮(甲基乙基酮、甲基異丙基酮、環戊酮、環己酮等)、甘醇醚(乙二醇單異丙基醚等)、賽璐蘇(甲賽璐蘇、乙賽璐蘇等)等。溶劑化合物可單獨使用1種亦可將2種以上併用。 溶劑化合物以不會瞬間揮發之溶劑為宜,且以沸點80~275℃之溶劑化合物為佳,沸點125~250℃之溶劑化合物尤佳。在該範圍中,由塗佈於金屬箔表面之粉末分散液形成的濕膜(含溶劑之膜)的穩定性高。 濕膜中之溶劑會在TFE系聚合物之燒成結束前被去除。溶劑從濕膜的氣化散逸可在達到展現前述特定儲存彈性模數之溫度區域之前產生,亦可在保持於展現前述特定儲存彈性模數之溫度區域之狀態下產生。視情況,亦可在燒成TFE系聚合物時產生。理想係使用上述沸點範圍之溶劑,在將TFE系聚合物保持於展現前述特定儲存彈性模數之溫度區域的狀態下,使濕膜中之溶劑之至少一部分氣化散逸。 溶劑化合物宜為有機化合物,較宜為環己烷(沸點:81℃)、2-丙醇(沸點:82℃)、1-丙醇(沸點:97℃)、1-丁醇(沸點:117℃)、1-甲氧基-2-丙醇(沸點:119℃)、N-甲基吡咯啶酮(沸點:202℃)、γ-丁內酯(沸點:204℃)、環己酮(沸點:156℃)及環戊酮(沸點:131℃),尤宜為N-甲基吡咯啶酮、γ-丁內酯、環己酮及環戊酮。The solvent of the present invention is a dispersion medium. It is a liquid, inactive solvent compound that does not react with F powder at 25°C. It is preferable that the boiling point is lower than the components other than the solvent contained in the powder dispersion and it can be heated, etc. Solvent compounds removed by evaporation. Examples of solvent compounds include: water, alcohol (methanol, ethanol, isopropyl alcohol, etc.), nitrogen-containing compounds (N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl- 2-pyrrolidinone, etc.), sulfur-containing compounds (dimethyltrisoxide, etc.), ethers (diethyl ether, dimethyl ether, etc.) Alkanes, etc.), esters (ethyl lactate, ethyl acetate, etc.), ketones (methyl ethyl ketone, methyl isopropyl ketone, cyclopentanone, cyclohexanone, etc.), glycol ethers (ethylene glycol monoisopropyl ketone, etc.) Propyl ether, etc.), cellulose (cellulose A, cellulose B, etc.), etc. The solvent compound may be used individually by 1 type or in combination of 2 or more types. The solvent compound is preferably a solvent that does not volatilize instantly, and a solvent compound with a boiling point of 80 to 275°C is preferred, and a solvent compound with a boiling point of 125 to 250°C is particularly preferred. Within this range, the stability of the wet film (solvent-containing film) formed from the powder dispersion applied to the surface of the metal foil is high. The solvent in the wet film will be removed before the firing of the TFE-based polymer is completed. The vaporization and dissipation of the solvent from the wet film may occur before reaching the temperature range exhibiting the specific storage elastic modulus, or may occur while maintaining the temperature range exhibiting the specific storage elastic modulus. Depending on the situation, it may be generated when the TFE-based polymer is fired. Ideally, a solvent in the above boiling point range is used, and at least part of the solvent in the wet film is vaporized and dissipated while the TFE polymer is maintained in a temperature range exhibiting the specific storage elastic modulus. The solvent compound is preferably an organic compound, preferably cyclohexane (boiling point: 81°C), 2-propanol (boiling point: 82°C), 1-propanol (boiling point: 97°C), and 1-butanol (boiling point: 117 ℃), 1-methoxy-2-propanol (boiling point: 119℃), N-methylpyrrolidone (boiling point: 202℃), γ-butyrolactone (boiling point: 204℃), cyclohexanone ( Boiling point: 156°C) and cyclopentanone (boiling point: 131°C), especially N-methylpyrrolidone, γ-butyrolactone, cyclohexanone and cyclopentanone.
粉末分散液中之F粉末的比率宜為5~60質量%,35~50質量%尤佳。在該範圍內,便容易控制壓低F樹脂層之相對介電常數及介電正切。而且粉末分散液的均勻分散性高,F樹脂層之機械強度優異。 粉末分散液中之溶劑的比率宜為15~65質量%,25~50質量份尤佳。在該範圍內,粉末分散液之塗佈性即佳,且樹脂層不易產生外觀不良。The ratio of F powder in the powder dispersion is preferably 5 to 60 mass %, and 35 to 50 mass % is particularly preferred. Within this range, it is easy to control the relative dielectric constant and dielectric tangent of the F resin layer. Furthermore, the powder dispersion has high uniform dispersion and the F resin layer has excellent mechanical strength. The ratio of the solvent in the powder dispersion is preferably 15 to 65 parts by mass, especially 25 to 50 parts by mass. Within this range, the coating properties of the powder dispersion are good, and the resin layer is less likely to have poor appearance.
本發明之粉末分散液可在不損及本發明效果之範圍內含有其他材料。其他材料可溶於粉末分散液,亦可不溶於粉末分散液。 若從提升粉末分散液之分散穩定性的觀點來看,粉末分散劑宜包含分散劑。若從對F樹脂層之表面性狀賦予接著性的觀點來看,分散劑以具有疏水部位與親水部位之化合物(界面活性劑)尤佳。 粉末分散液包含分散劑時,粉末分散液中之分散劑的比率宜為0.1~30質量%,5~10質量份尤佳。在該範圍內,便容易使F粉末的均勻分散性與F樹脂層表面之親水性及電特性平衡。The powder dispersion of the present invention may contain other materials within the scope that does not impair the effects of the present invention. Other materials may or may not be soluble in the powder dispersion. From the viewpoint of improving the dispersion stability of the powder dispersion, the powder dispersant preferably contains a dispersant. From the viewpoint of imparting adhesiveness to the surface properties of the F resin layer, the dispersant is particularly preferably a compound (surfactant) having a hydrophobic portion and a hydrophilic portion. When the powder dispersion contains a dispersant, the proportion of the dispersant in the powder dispersion is preferably 0.1 to 30 parts by mass, especially 5 to 10 parts by mass. Within this range, it is easy to balance the uniform dispersion of the F powder with the hydrophilicity and electrical characteristics of the surface of the F resin layer.
本發明之分散劑宜為多元醇、聚氧伸烷基二醇、聚己內醯胺及聚合物狀多元醇,且聚合物狀多元醇較佳。 聚合物狀多元醇意指具有以具碳-碳不飽和雙鍵之單體為主體的單元與2個以上羥基的聚合物。聚合物狀多元醇尤宜為聚乙烯醇、聚乙烯醇縮丁醛及氟多元醇,氟多元醇最佳。惟,氟多元醇並非TFE系聚合物,而是具有羥基與氟原子的聚合物。又,氟多元醇亦可以部分羥基經化學修飾、改質。The dispersant of the present invention is preferably polyol, polyoxyalkylene glycol, polycaprolactam and polymeric polyol, and polymeric polyol is preferred. Polymeric polyol means a polymer having units mainly composed of monomers having carbon-carbon unsaturated double bonds and two or more hydroxyl groups. Polymeric polyols are particularly preferably polyvinyl alcohol, polyvinyl butyral and fluoropolyols, with fluoropolyols being the most preferred. However, fluoropolyol is not a TFE-based polymer, but a polymer containing hydroxyl groups and fluorine atoms. In addition, fluoropolyols may also be chemically modified or modified by chemically modifying part of the hydroxyl groups.
氟多元醇以具有聚氟烷基或聚氟烯基之(甲基)丙烯酸酯(以下亦表記為「(甲基)丙烯酸酯F」)與具有聚氧伸烷基單元醇基之(甲基)丙烯酸酯(以下亦表記為「(甲基)丙烯酸酯AO」)的共聚物(以下亦表記為「分散聚合物F」)尤佳。 (甲基)丙烯酸酯F宜為以式CH2 =CR1 C(O)O-X1 -RF 表示之化合物。 R1 表示氫原子或甲基。 X1 表示-(CH2 )2 -、-(CH2 )3 -、-(CH2 )4 -、-(CH2 )2 NHC(O)-、-(CH2 )3 NHC(O)-或-CH2 CH(CH3 )NHC(O)-。 RF 表示-OCF(CF3 )(C(CF(CF3 )2 )(=C(CF3 )2 )、-OC(CF3 )(=C(CF(CF3 )2 )(CF(CF3 )2 )、-OCH(CH2 OCH2 CH2 (CF2 )4 F)2 、 -OCH(CH2 OCH2 CH2 (CF2 )6 F)2 、-(CF2 )4 F或-(CF2 )6 F。 (甲基)丙烯酸酯AO宜為以式CH2 =CR2 C(O)O-Q2 -OH表示之化合物。 R2 表示氫原子或甲基。 Q2 表示-(CH2 )m (OCH2 CH2 )n -、-(CH2 )m (OCH2 CH(CH3 ))n -或-(CH2 )m (OCH2 CH2 CH2 CH2 )n -(m表示1~4之整數,n表示2~100之整數,n宜為2~20之整數)。The fluoropolyol is composed of a (meth)acrylate having a polyfluoroalkyl group or a polyfluoroalkenyl group (hereinafter also referred to as "(meth)acrylate F") and a (methyl)ol group having a polyoxyalkylene unit alcohol group. A copolymer (hereinafter also referred to as "dispersed polymer F") of ) acrylate (hereinafter also referred to as "(meth)acrylate AO") is particularly preferred. The (meth)acrylate F is preferably a compound represented by the formula CH 2 =CR 1 C(O)OX 1 -RF. R 1 represents a hydrogen atom or a methyl group. X 1 represents -(CH 2 ) 2 -, -(CH 2 ) 3 -, -(CH 2 ) 4 -, -(CH 2 ) 2 NHC(O)-, -(CH 2 ) 3 NHC(O)- or -CH 2 CH(CH 3 )NHC(O)-. R F represents -OCF(CF 3 )(C(CF(CF 3 ) 2 )(=C(CF 3 ) 2 ), -OC(CF 3 )(=C(CF(CF 3 ) 2 )(CF(CF 3 ) 2 ), -OCH(CH 2 OCH 2 CH 2 (CF 2 ) 4 F) 2 , -OCH(CH 2 OCH 2 CH 2 (CF 2 ) 6 F) 2 , -(CF 2 ) 4 F or - (CF 2 ) 6 F. (Meth)acrylate AO is preferably a compound represented by the formula CH 2 =CR 2 C(O)OQ 2 -OH. R 2 represents a hydrogen atom or a methyl group. Q 2 represents -(CH 2 ) m (OCH 2 CH 2 ) n -, -(CH 2 ) m (OCH 2 CH(CH 3 )) n -or-(CH 2 ) m (OCH 2 CH 2 CH 2 CH 2 ) n -(m represents an integer from 1 to 4, n represents an integer from 2 to 100, and n is preferably an integer from 2 to 20).
(甲基)丙烯酸酯F之具體例可舉CH2 =CHCOO(CH2 )4 OCF(CF3 )(C(CF(CF3 )2 )(=C(CF3 )2 )、CH2 =CHCOO(CH2 )4 OC(CF3 )(=C(CF(CF3 )2 )(CF(CF3 )2 )、CH2 =C(CH3 )COO(CH2 )2 NHCOOCH(CH2 OCH2 CH2 (CF2 )6 F)2 、CH2 =C(CH3 )COO(CH2 )2 NHCOOCH(CH2 OCH2 CH2 (CF2 )4 F)2 、CH2 =C(CH3 )COO(CH2 )2 NHCOOCH(CH2 OCH2 (CF2 )6 F)2 、CH2 =C(CH3 )COO(CH2 )2 NHCOOCH(CH2 OCH2 (CF2 )4 F)2 、CH2 =C(CH3 )COO(CH2 )3 NHCOOCH(CH2 OCH2 (CF2 )6 F)2 、CH2 =C(CH3 )COO(CH2 )3 NHCOOCH(CH2 OCH2 (CF2 )4 F)2 。 (甲基)丙烯酸酯AO之具體例可舉CH2 =CHCOO(CH2 CH2 O)8 OH、CH2 =CHCOO(CH2 CH2 O)10 OH、CH2 =CHCOO(CH2 CH2 O)12 OH、CH2 =C(CH3 )COO(CH2 CH(CH3 )O)8 OH、CH2 =C(CH3 )COO(CH2 CH(CH3 )O)12 OH、CH2 =C(CH3 )COO(CH2 CH(CH3 )O)16 OH。Specific examples of (meth)acrylate F include CH 2 =CHCOO(CH 2 ) 4 OCF(CF 3 )(C(CF(CF 3 ) 2 )(=C(CF 3 ) 2 ), CH 2 =CHCOO (CH 2 ) 4 OC(CF 3 )(=C(CF(CF 3 ) 2 )(CF(CF 3 ) 2 ), CH 2 =C(CH 3 )COO(CH 2 ) 2 NHCOOCH(CH 2 OCH 2 CH 2 (CF 2 ) 6 F) 2 , CH 2 =C(CH 3 )COO(CH 2 ) 2 NHCOOCH(CH 2 OCH 2 CH 2 (CF 2 ) 4 F) 2 , CH 2 =C(CH 3 ) COO(CH 2 ) 2 NHCOOCH(CH 2 OCH 2 (CF 2 ) 6 F) 2 , CH 2 =C(CH 3 )COO(CH 2 ) 2 NHCOOCH(CH 2 OCH 2 (CF 2 ) 4 F) 2 , CH 2 =C(CH 3 )COO(CH 2 ) 3 NHCOOCH(CH 2 OCH 2 (CF 2 ) 6 F) 2 , CH 2 =C(CH 3 )COO(CH 2 ) 3 NHCOOCH(CH 2 OCH 2 ( CF 2 ) 4 F) 2. Specific examples of (meth)acrylate AO include CH 2 =CHCOO(CH 2 CH 2 O) 8 OH, CH 2 =CHCOO(CH 2 CH 2 O) 10 OH, CH 2 =CHCOO(CH 2 CH 2 O) 12 OH, CH 2 =C(CH 3 )COO(CH 2 CH(CH 3 )O) 8 OH, CH 2 =C(CH 3 )COO(CH 2 CH(CH 3 )O) 12 OH, CH 2 =C(CH 3 )COO(CH 2 CH(CH 3 )O) 16 OH.
相對於分散聚合物F中所含之總單元,以(甲基)丙烯酸酯F為主體之單元的比率宜為20~60莫耳%,20~40莫耳%尤佳。 相對於分散聚合物F中所含之總單元,以(甲基)丙烯酸酯AO為主體之單元的比率宜為40~80莫耳%,60~80莫耳%尤佳。 分散聚合物F可僅由以(甲基)丙烯酸酯AO為主體之單元與以(甲基)丙烯酸酯AO為主體之單元構成,更可進一步包含有其他單元。 分散聚合物F之氟含量宜為10~45質量%,15~40質量%尤佳。 分散聚合物F宜為非離子性。 分散聚合物F之質量平均分子量宜為2000~80000,6000~20000尤佳。Relative to the total units contained in the dispersion polymer F, the ratio of units mainly composed of (meth)acrylate F is preferably 20 to 60 mol%, and particularly preferably 20 to 40 mol%. Relative to the total units contained in the dispersion polymer F, the ratio of units mainly composed of (meth)acrylate AO is preferably 40 to 80 mol%, and particularly preferably 60 to 80 mol%. The dispersion polymer F may be composed only of units mainly composed of (meth)acrylate AO and units mainly composed of (meth)acrylate AO, and may further contain other units. The fluorine content of the dispersion polymer F is preferably 10 to 45% by mass, and particularly preferably 15 to 40% by mass. The dispersion polymer F is preferably nonionic. The mass average molecular weight of the dispersed polymer F is preferably 2,000 to 80,000, especially 6,000 to 20,000.
本發明之粉末分散液更可包含有該分散劑以外的其他材料。所述其他材料可為非硬化性樹脂,亦可為硬化性樹脂。 非硬化性樹脂可舉熱熔融性樹脂、非熔融性樹脂。熱熔融性樹脂可舉熱塑性聚醯亞胺等。非熔融性樹脂可舉硬化性樹脂之硬化物等。 硬化性樹脂可舉:具有反應性基之聚合物、具有反應性基之寡聚物、低分子化合物、具有反應性基之低分子化合物等。反應性基可舉如含羰基之基團、羥基、胺基、環氧基等。The powder dispersion of the present invention may further contain other materials besides the dispersant. The other materials may be non-hardening resin or hardening resin. Examples of the non-hardening resin include heat-melting resin and non-melting resin. Examples of the heat-melting resin include thermoplastic polyimide and the like. Examples of the non-melting resin include cured products of curable resins. Examples of the curable resin include polymers having reactive groups, oligomers having reactive groups, low molecular compounds, low molecular compounds having reactive groups, etc. Examples of reactive groups include carbonyl-containing groups, hydroxyl groups, amine groups, epoxy groups, and the like.
硬化性樹脂可舉:環氧樹脂、熱硬化性聚醯亞胺、聚醯亞胺前驅物之聚醯胺酸、熱硬化性丙烯酸樹脂、苯酚樹脂、熱硬化性聚酯樹脂、熱硬化性聚烯烴樹脂、熱硬化性改質聚苯醚樹脂、多官能氰酸酯樹脂、多官能馬來醯亞胺-氰酸酯樹脂、多官能性馬來醯亞胺樹脂、乙烯基酯樹脂、脲樹脂、酞酸二烯丙酯樹脂、三聚氰胺樹脂、胍胺樹脂、三聚氰胺-脲共縮合樹脂。其中,從有用於印刷基板用途的觀點來看,熱硬化性樹脂以熱硬化性聚醯亞胺、聚醯亞胺前驅物、環氧樹脂、熱硬化性丙烯酸樹脂、雙馬來醯亞胺樹脂及熱硬化性聚苯醚樹脂為佳,環氧樹脂及熱硬化性聚苯醚樹脂尤佳。Examples of curable resins include: epoxy resin, thermosetting polyimide, polyamide precursor of polyimide, thermosetting acrylic resin, phenol resin, thermosetting polyester resin, thermosetting polyamide Olefin resin, thermosetting modified polyphenylene ether resin, multifunctional cyanate ester resin, multifunctional maleimide-cyanate ester resin, multifunctional maleimide resin, vinyl ester resin, urea resin , diallyl phthalate resin, melamine resin, guanamine resin, melamine-urea co-condensation resin. Among them, thermosetting resins include thermosetting polyimide, polyimide precursor, epoxy resin, thermosetting acrylic resin, and bismaleimide resin from the viewpoint of their use in printed circuit boards. and thermosetting polyphenylene ether resin are preferred, and epoxy resin and thermosetting polyphenylene ether resin are particularly preferred.
環氧樹脂之具體例可舉:萘型環氧樹脂、甲酚酚醛型環氧樹脂、雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、脂環式環氧樹脂、脂肪族鏈狀環氧樹脂、甲酚酚醛型環氧樹脂、苯酚酚醛型環氧樹脂、烷基苯酚酚醛型環氧樹脂、芳烷基型環氧樹脂、聯酚型環氧樹脂、二環戊二烯型環氧樹脂、參羥苯基甲烷型環氧化合物、苯酚與具有苯酚性羥基之芳香族醛的縮合物之環氧化物、雙酚之二環氧丙基醚化物、萘二醇之二環氧丙基醚化物、苯酚之環氧丙基醚化物、醇之二環氧丙基醚化物、三聚異氰酸三環氧丙酯等。 雙馬來醯亞胺樹脂可舉日本專利特開平7-70315號公報中所記載之併用雙酚A型氰酸酯樹脂與雙馬來醯亞胺化合物的樹脂組成物(BT樹脂),或如國際公開第2013/008667號中記載之發明及其發明背景中記載之物。 聚醯胺酸通常具有可與聚合物F1之官能基起反應的反應性基。 形成聚醯胺酸之二胺、多元羧酸二酐可舉如:日本專利第5766125號公報之段落[0020]、日本專利第5766125號公報之段落[0019]、日本專利特開2012-145676號公報之段落[0055]、[0057]等中記載之物。其中,又以由4,4’-二胺基二苯基醚、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷等芳香族二胺與1,2,4,5-苯四甲酸二酐、3,3’,4,4’-聯苯四甲酸二酐、3,3’,4,4’-二苯基酮四甲酸二酐等芳香族多元羧酸二酐之組合所構成的聚醯胺酸為佳。Specific examples of epoxy resins include: naphthalene type epoxy resin, cresol novolac type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, alicyclic type Epoxy resin, aliphatic chain epoxy resin, cresol novolak type epoxy resin, phenol novolac type epoxy resin, alkylphenol novolac type epoxy resin, aralkyl type epoxy resin, biphenol type epoxy resin , dicyclopentadiene type epoxy resin, hydroxyphenylmethane type epoxy compound, epoxide of the condensate of phenol and aromatic aldehyde with phenolic hydroxyl group, bisphenol diepoxypropyl etherate, Diglycidyl etherate of naphthalenediol, glycidyl etherate of phenol, diglycidyl etherate of alcohol, tripoxypropyl isocyanate, etc. Examples of the bismaleimide resin include a resin composition (BT resin) in which a bisphenol A-type cyanate ester resin and a bismaleimide compound are used together as described in Japanese Patent Application Laid-Open No. 7-70315, or a resin composition such as The invention described in International Publication No. 2013/008667 and the matter described in the background of the invention. Polyamides generally have reactive groups that can react with the functional groups of polymer F1. Examples of diamines and polycarboxylic dianhydrides that form polyamic acid include: paragraph [0020] of Japanese Patent No. 5766125, paragraph [0019] of Japanese Patent No. 5766125, and Japanese Patent Application Laid-Open No. 2012-145676 Things described in paragraphs [0055], [0057], etc. of the Gazette. Among them, aromatic diamines such as 4,4'-diaminodiphenyl ether, 2,2-bis[4-(4-aminophenoxy)phenyl]propane and 1,2,4 , 5-pyromellitic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-diphenylkettracarboxylic dianhydride and other aromatic polycarboxylic acids Polyamic acid composed of a combination of dianhydrides is preferred.
熱熔融性之樹脂可舉熱塑性聚醯亞胺等熱塑性樹脂、硬化性樹脂之熱熔融性硬化物。 熱塑性樹脂可舉:聚酯樹脂、聚烯烴樹脂、苯乙烯樹脂、聚碳酸酯、熱塑性聚醯亞胺、聚芳酯、聚碸、聚芳基碸、芳香族聚醯胺、芳香族聚醚醯胺、聚伸苯硫、聚芳基醚酮、聚醯胺醯亞胺、液晶性聚酯、聚苯醚等,以熱塑性聚醯亞胺、液晶性聚酯及聚苯醚為宜。Examples of the heat-melting resin include thermoplastic resins such as thermoplastic polyimide and heat-melting cured products of curable resins. Examples of thermoplastic resins include: polyester resin, polyolefin resin, styrene resin, polycarbonate, thermoplastic polyimide, polyarylate, polyurethane, polyarylethylene, aromatic polyamide, aromatic polyetheramide Amine, polyphenylene sulfide, polyaryl ether ketone, polyamide imine, liquid crystalline polyester, polyphenylene ether, etc., with thermoplastic polyimide, liquid crystalline polyester and polyphenylene ether being suitable.
此外,本發明之粉末分散液中可包含之其他材料還可舉:黏結劑、觸變性賦予劑、消泡劑、無機填料、反應性烷氧矽烷、脫水劑、塑化劑、耐候劑、抗氧化劑、熱穩定劑、滑劑、抗靜電劑、增白劑、著色劑、導電劑、脫模劑、表面處理劑、黏度調節劑、阻燃劑等。 本發明之粉末分散液若包含黏結劑,於形成F樹脂層時可抑制F粉末從金屬箔脫落(掉粉)。黏結劑可舉熱塑性有機黏結劑或熱硬化性有機黏結劑。黏結劑宜為可在燒成TFE系聚合物之溫度區域內分解、揮發的化合物。這類黏結劑可舉丙烯酸系樹脂黏結劑、纖維素系樹脂黏結劑、乙烯醇系樹脂黏結劑、蠟系樹脂黏結劑、明膠等。黏結劑可單獨使用1種亦可將2種以上併用。In addition, other materials that can be included in the powder dispersion of the present invention include: binders, thixotropy imparting agents, defoaming agents, inorganic fillers, reactive alkoxysilane, dehydrating agents, plasticizers, weathering agents, anti-foaming agents, etc. Oxidants, heat stabilizers, lubricants, antistatic agents, whitening agents, colorants, conductive agents, release agents, surface treatment agents, viscosity regulators, flame retardants, etc. If the powder dispersion of the present invention contains a binder, it can prevent the F powder from falling off the metal foil when forming the F resin layer. The binder may be a thermoplastic organic binder or a thermosetting organic binder. The binder is preferably a compound that decomposes and volatilizes within the temperature range in which the TFE-based polymer is fired. Examples of such adhesives include acrylic resin adhesives, cellulose resin adhesives, vinyl alcohol resin adhesives, wax resin adhesives, gelatin, and the like. One type of binder may be used alone or two or more types may be used in combination.
在本發明中,係將粉末分散液塗佈於金屬箔表面。 塗佈方法只要是可於塗佈後之金屬箔表面形成由粉末分散液構成且穩定之濕膜的方法即可,可舉:噴塗法、輥塗法、旋塗法、凹版塗佈法、微凹版塗佈法、凹版平板法、刮刀塗佈法、接觸塗佈法、棒塗法、模塗法、噴泉式繞線棒(fountain meyer bar)法、狹縫式模塗法等。 另外,將金屬箔供於TFE系聚合物展現0.1~5.0MPa之儲存彈性模數的溫度區域之前,亦可在低於前述溫度區域之溫度下加熱金屬箔來調整濕膜之狀態。另,調整係以溶劑不完全揮發之程度進行,通常是進行到使50質量%以下之溶劑揮發的程度。In the present invention, the powder dispersion is applied to the surface of the metal foil. The coating method is any method as long as it can form a stable wet film composed of a powder dispersion on the surface of the coated metal foil. Examples include: spray coating, roller coating, spin coating, gravure coating, and micro coating. Gravure coating method, gravure flat plate method, blade coating method, contact coating method, rod coating method, die coating method, fountain meyer bar method, slit die coating method, etc. In addition, before supplying the metal foil to a temperature range where the TFE-based polymer exhibits a storage elastic modulus of 0.1 to 5.0 MPa, the metal foil can also be heated at a temperature lower than the aforementioned temperature range to adjust the state of the wet film. In addition, the adjustment is performed to the extent that the solvent is not completely volatilized, and is usually performed to the extent that 50% by mass or less of the solvent is volatilized.
在本發明中,將粉末分散液塗佈於金屬箔表面之後,係以TFE系聚合物展現0.1~5.0MPa之儲存彈性模數的溫度區域內之溫度(以下亦表示為「保持溫度」)保持金屬箔。保持溫度表示氣體環境之溫度。 保持可以1階段實施,亦可在不同溫度下實施2階段以上。 保持方法可舉:使用烘箱之方法、使用通風乾燥爐之方法、照射紅外線等熱射線之方法等。 保持之氣體環境可為常壓下、減壓下中之任一狀態。又,前述保持之氣體環境可為氧化性氣體(氧氣等)環境、還原性氣體(氫氣等)環境、非活性氣體(氦氣、氖氣、氬氣、氮氣等)環境中之任一者。 若從提升F樹脂層之接著性的觀點來看,保持之氣體環境宜為含氧氣之氣體環境。 含氧氣之氣體環境中之氧氣濃度(體積基準)宜為1×102 ~3×105 ppm,0.5×103 ~1×104 ppm尤佳。在該範圍內,容易使F樹脂層之接著性及抑制金屬箔氧化平衡。 保持溫度宜為150~260℃,200~260℃尤佳。 保持在保持溫度的時間宜為0.1~10分鐘,0.5~5分鐘尤佳。In the present invention, after the powder dispersion is applied to the surface of the metal foil, it is maintained at a temperature in a temperature range in which the TFE-based polymer exhibits a storage elastic modulus of 0.1 to 5.0 MPa (hereinafter also referred to as "maintenance temperature") Metal foil. The holding temperature represents the temperature of the gas environment. Maintenance can be implemented in one stage, or more than two stages at different temperatures. Examples of maintenance methods include: using an oven, using a ventilated drying oven, irradiating heat rays such as infrared rays, etc. The gas environment to be maintained can be either under normal pressure or under reduced pressure. In addition, the gas environment to be maintained may be any one of an oxidizing gas (oxygen, etc.) environment, a reducing gas (hydrogen, etc.) environment, and an inactive gas (helium, neon, argon, nitrogen, etc.) environment. From the perspective of improving the adhesion of the F resin layer, the gas environment maintained is preferably an oxygen-containing gas environment. The oxygen concentration (volume basis) in an oxygen-containing gas environment is preferably 1×10 2 ~3×10 5 ppm, especially 0.5×10 3 ~1×10 4 ppm. Within this range, it is easy to balance the adhesion of the F resin layer and suppress the oxidation of the metal foil. The maintenance temperature should be 150~260℃, especially 200~260℃. The time to maintain the temperature should be 0.1 to 10 minutes, especially 0.5 to 5 minutes.
在本發明中,是進一步在超過前述溫度區域之溫度(以下亦表記為「燒成溫度」)下燒成TFE系聚合物而於金屬箔表面形成F樹脂層。燒成溫度表示氣體環境之溫度。在本發明中,是在F粉末緊密充填之狀態下進行TFE系聚合物之熔接,因此可形成均質性優異的F樹脂層,且附樹脂之金屬箔不易翹曲。另,粉末分散液只要包含熱熔融性樹脂,便可形成由TFE系聚合物與溶解性樹脂之混合物構成的F樹脂層,粉末分散液只要包含熱硬化性樹脂,即可形成由TFE系聚合物與熱硬化性樹脂之硬化物構成的F樹脂層。 加熱方法可舉:使用烘箱之方法、使用通風乾燥爐之方法、照射紅外線等熱射線之方法等。為了提高F樹脂層表面之平滑性,亦可以加熱板、加熱輥等加壓。從可短時間燒成、遠紅外線爐相較精簡的觀點來看,加熱方法宜為照射遠紅外線之方法。加熱方法亦可組合紅外線加熱與熱風加熱。 從可促進TFE系聚合物均質熔接的觀點來看,遠紅外線之有效波長帶宜為2~20μm,3~7μm較佳。In the present invention, the TFE-based polymer is further fired at a temperature exceeding the aforementioned temperature range (hereinafter also referred to as "firing temperature") to form an F-resin layer on the surface of the metal foil. The firing temperature represents the temperature of the gas environment. In the present invention, the TFE-based polymer is welded in a state where the F powder is densely packed. Therefore, an F resin layer with excellent homogeneity can be formed, and the metal foil with the resin is less likely to warp. In addition, as long as the powder dispersion contains a thermofusible resin, it can form an F-resin layer composed of a mixture of TFE-based polymer and soluble resin. As long as the powder dispersion contains a thermosetting resin, it can form an F-resin layer composed of a TFE-based polymer. F resin layer composed of hardened material of thermosetting resin. Heating methods include: using an oven, using a ventilated drying furnace, irradiating heat rays such as infrared rays, etc. In order to improve the smoothness of the surface of the F resin layer, pressure can also be applied with a heating plate, heating roller, etc. From the viewpoint that it can be fired in a short time and the far-infrared furnace is relatively simple, the heating method is preferably a method of irradiating far-infrared rays. The heating method can also combine infrared heating and hot air heating. From the perspective of promoting homogeneous welding of TFE-based polymers, the effective wavelength band of far-infrared rays is preferably 2 to 20 μm, and 3 to 7 μm is preferred.
燒成之氣體環境可為常壓下、減壓下中之任一狀態。又,前述燒成之氣體環境可為氧化性氣體(氧氣等)氣體環境、還原性氣體(氫氣等)氣體環境、非活性氣體(氦氣、氖氣、氬氣、氮氣等)氣體環境中之任一者,若從可分別抑制金屬箔、所形成之F樹脂層的氧化劣化之觀點來看,宜為還原性氣體環境或非活性氣體環境。 燒成之氣體環境宜為由非活性氣體構成且氧氣濃度低的氣體環境,並以由氮氣構成且氧氣濃度(體積基準)低於500ppm之氣體環境為佳。氧氣濃度(體積基準)在300ppm以下尤佳。又,氧氣濃度(體積基準)通常為1ppm以上。The gas environment for firing can be either under normal pressure or under reduced pressure. In addition, the gas environment for the aforementioned firing may be an oxidizing gas (oxygen, etc.) gas environment, a reducing gas (hydrogen, etc.) gas environment, or an inactive gas (helium, neon, argon, nitrogen, etc.) gas environment. Either way, from the viewpoint of suppressing oxidative deterioration of the metal foil and the formed F resin layer, a reducing gas environment or an inert gas environment is preferable. The gas environment for firing is preferably a gas environment composed of inert gas and with a low oxygen concentration, and preferably a gas environment composed of nitrogen with an oxygen concentration (volume basis) of less than 500 ppm. The oxygen concentration (volume basis) is preferably 300 ppm or less. In addition, the oxygen concentration (volume basis) is usually 1 ppm or more.
燒成溫度宜超過320℃,330~380℃尤佳。在該情況下,TFE系聚合物更容易形成緻密的F樹脂層。 保持在燒成溫度的時間宜為30秒~5分鐘,1~2分鐘尤佳。 附樹脂之金屬箔中之樹脂層為習知之絕緣材料(聚醯亞胺等熱硬化性樹脂之硬化物)時,必須長時間加熱以使熱硬化性樹脂硬化。另一方面,在本發明中,可藉由TFE系聚合物之熔接以短時間之加熱形成樹脂層。另,粉末分散液包含熱硬化性樹脂時,可降低燒成溫度。如此一來,本發明之製造方法係於附樹脂之金屬箔形成樹脂層時對金屬箔之熱負荷小的方法,即對金屬箔破壞小的方法。The firing temperature should exceed 320℃, especially 330~380℃. In this case, the TFE-based polymer forms a dense F-resin layer more easily. The time to maintain the firing temperature should be 30 seconds to 5 minutes, especially 1 to 2 minutes. When the resin layer in the metal foil with resin is a conventional insulating material (hardened product of thermosetting resin such as polyimide), it must be heated for a long time to harden the thermosetting resin. On the other hand, in the present invention, the resin layer can be formed by welding the TFE-based polymer and heating for a short time. In addition, when the powder dispersion contains a thermosetting resin, the firing temperature can be lowered. In this way, the manufacturing method of the present invention is a method that imposes a small thermal load on the metal foil when the resin layer is formed on the metal foil with resin, that is, a method that causes less damage to the metal foil.
於本發明之附樹脂之金屬箔,為了控制F樹脂層之線膨脹係數、或進一步改善F樹脂層之接著性,亦可對F樹脂層之表面進行表面處理。 對F樹脂層表面進行之表面處理方法可舉:退火處理、電暈放電處理、大氣壓電漿處理、真空電漿處理、UV臭氧處理、準分子處理、化學蝕刻、矽烷耦合處理、微粗面化處理等。 退火處理之溫度宜為80~190℃,120~180℃尤佳。 退火處理之壓力宜為0.001~0.030MPa,0.005~0.015MPa尤佳。 退火處理時間宜為10~300分鐘,30~120分鐘尤佳。 電漿處理之電漿照射裝置可舉:高頻感應方式、電容耦合型電極方式、電暈放電電極-電漿噴射方式、平行板型、遠程電漿型、大氣壓電漿型、ICP型高密度電漿型等。 電漿處理使用之氣體可舉氧氣、氮氣、稀有氣體(氬等)、氫氣、氨氣等,且宜為稀有氣體或氮氣。電漿處理使用之氣體的具體例可舉氬氣;氫氣與氮氣之混合氣體;氫氣、氮氣與氬氣之混合氣體。 電漿處理之氣體環境宜為稀有氣體或氮氣之體積分率為70體積%以上的氣體環境,100體積%之氣體環境尤佳。在該範圍內,將F樹脂層之表面之Ra調整至2.0μm以下,容易於F樹脂層表面形成微細凹凸。In the metal foil with resin of the present invention, in order to control the linear expansion coefficient of the F resin layer or further improve the adhesion of the F resin layer, the surface of the F resin layer may also be surface treated. Surface treatment methods for the surface of the F resin layer include: annealing treatment, corona discharge treatment, atmospheric pressure plasma treatment, vacuum plasma treatment, UV ozone treatment, excimer treatment, chemical etching, silane coupling treatment, micro-roughening processing etc. The temperature of annealing treatment should be 80~190℃, especially 120~180℃. The pressure of annealing treatment should be 0.001~0.030MPa, especially 0.005~0.015MPa. The annealing treatment time should be 10 to 300 minutes, especially 30 to 120 minutes. Plasma irradiation devices for plasma treatment include: high-frequency induction method, capacitive coupling electrode method, corona discharge electrode-plasma jet method, parallel plate type, remote plasma type, atmospheric pressure plasma type, and ICP type high density Plasma type etc. Gases used in plasma treatment include oxygen, nitrogen, rare gases (argon, etc.), hydrogen, ammonia, etc., and are preferably rare gases or nitrogen. Specific examples of gases used in plasma processing include argon gas; a mixed gas of hydrogen and nitrogen; and a mixed gas of hydrogen, nitrogen and argon. The gas environment for plasma treatment should be a gas environment with a volume fraction of rare gas or nitrogen of more than 70% by volume, and a gas environment of 100% by volume is particularly preferred. Within this range, adjusting the Ra of the surface of the F resin layer to 2.0 μm or less makes it easier to form fine unevenness on the surface of the F resin layer.
以本發明製得之附樹脂之金屬箔的F樹脂層表面均質性優異、不易翹曲,因此可輕易地與其他基板積層。 其他基板可舉耐熱性樹脂薄膜、屬纖維強化樹脂板之前驅物的預浸體、具有耐熱性樹脂薄膜層之積層體、具有預浸體層之積層體等。 預浸體係使強化纖維(玻璃纖維、碳纖維等)之基材(纖維束、織布等)浸潤熱硬化性樹脂或熱塑性樹脂後的片狀基板。 耐熱性樹脂薄膜係包含1種以上耐熱性樹脂之薄膜,可為單層薄膜亦可為多層薄膜。 耐熱性樹脂可舉聚醯亞胺、聚芳酯、聚碸、聚芳基碸、芳香族聚醯胺、芳香族聚醚醯胺、聚伸苯硫、聚芳基醚酮、聚醯胺醯亞胺、液晶性聚酯等。The F-resin layer of the resin-attached metal foil produced by the present invention has excellent surface homogeneity and is not prone to warping, so it can be easily laminated with other substrates. Examples of other substrates include a heat-resistant resin film, a prepreg that is a precursor of a fiber-reinforced resin board, a laminate having a heat-resistant resin film layer, a laminate having a prepreg layer, and the like. The prepreg system is a sheet-like substrate in which a base material (fiber bundle, woven fabric, etc.) of reinforced fiber (glass fiber, carbon fiber, etc.) is impregnated with thermosetting resin or thermoplastic resin. The heat-resistant resin film is a film containing one or more types of heat-resistant resin, and may be a single-layer film or a multi-layer film. Examples of heat-resistant resins include polyimide, polyarylate, polystyrene, polyaryl sulfide, aromatic polyamide, aromatic polyether amide, polyphenylene sulfide, polyaryl ether ketone, and polyamide amide. imine, liquid crystalline polyester, etc.
於本發明之附樹脂之金屬箔的F樹脂層表面積層其他基材的方法,可舉將附樹脂之金屬箔與其他基板熱壓之方法。 其他基板為預浸體時的加壓溫度宜為TFE系聚合物之熔點以下,120~300℃較佳,160~220℃尤佳。在該範圍內,可抑制預浸體之熱劣化,同時可將F樹脂層與預浸體牢固接著。 基板為耐熱性樹脂薄膜時的加壓溫度宜為310~400℃。在該範圍內,可抑制耐熱性樹脂薄膜之熱劣化,同時可將F樹脂層與耐熱性樹脂薄膜牢固接著。A method of laminating other base materials on the surface of the F resin layer of the resin-attached metal foil of the present invention may include a method of hot pressing the resin-attached metal foil and other substrates. When other substrates are prepregs, the pressing temperature should be below the melting point of the TFE polymer, preferably 120 to 300°C, and especially 160 to 220°C. Within this range, thermal deterioration of the prepreg can be suppressed, and the F resin layer and the prepreg can be firmly bonded. When the substrate is a heat-resistant resin film, the pressing temperature is preferably 310 to 400°C. Within this range, thermal deterioration of the heat-resistant resin film can be suppressed, and the F resin layer and the heat-resistant resin film can be firmly bonded.
熱壓宜在減壓環境下進行,且在20kPa以下之真空度下進行尤佳。在該範圍內,可抑制氣泡混入積層體之F樹脂層、基板、金屬箔之各個界面,從而可抑制因氧化而劣化。 而且,熱壓時宜在到達前述真空度後進行升溫。若在到達前述真空度之前升溫,F樹脂層就會在已軟化之狀態、亦即在具有一定程度流動性、密著性之狀態下被壓接,而形成氣泡。 熱壓之壓力宜為0.2MPa以上。而壓力之上限宜為10MPa以下。在該範圍內,可抑制基板破損,同時可使F樹脂層與基板牢固密著。Hot pressing should be carried out in a reduced pressure environment, especially under a vacuum degree below 20kPa. Within this range, air bubbles can be suppressed from being mixed into each interface of the F resin layer, the substrate, and the metal foil of the laminate, thereby suppressing deterioration due to oxidation. Furthermore, during hot pressing, it is preferable to raise the temperature after reaching the aforementioned vacuum degree. If the temperature is raised before reaching the aforementioned vacuum degree, the F resin layer will be pressed and bonded in a softened state, that is, in a state with a certain degree of fluidity and adhesion, and bubbles will be formed. The pressure of hot pressing should be above 0.2MPa. The upper limit of pressure should be below 10MPa. Within this range, damage to the substrate can be suppressed and firm contact between the F resin layer and the substrate can be achieved.
本發明之附樹脂之金屬箔及其積層體可作為撓性覆銅積層板或剛性覆銅積層板用於製造印刷基板。 譬如,使用下列方法即可從本發明之附樹脂之金屬箔製造印刷基板:利用蝕刻等將本發明之附樹脂之金屬箔的金屬箔加工成預定圖案之導體電路(圖案電路)的方法,或是用電鍍法(半加成法(SAP法)、改良半加成法(MSAP法)等)將本發明之附樹脂之金屬箔加工成圖案電路的方法。 在製造印刷基板時,亦可於形成圖案電路後,於圖案電路上形成層間絕緣膜,並於層間絕緣膜上進一步形成圖案電路。層間絕緣膜譬如可藉由本發明之粉末分散液形成。 製造印刷基板時亦可於圖案電路上積層防焊層。防焊層譬如可藉由本發明之粉末分散液形成。 在製造印刷基板時,亦可於圖案電路上積層覆蓋薄膜。覆蓋薄膜譬如可藉由本發明之粉末分散液形成。 實施例The resin-attached metal foil and its laminate of the present invention can be used as a flexible copper-clad laminated board or a rigid copper-clad laminated board for manufacturing printed circuit boards. For example, a printed circuit board can be produced from the metal foil with resin of the present invention using the following method: a method of processing the metal foil of the metal foil with resin of the present invention into a conductor circuit (pattern circuit) of a predetermined pattern by etching or the like; or It is a method of processing the resin-attached metal foil of the present invention into a patterned circuit using an electroplating method (semi-additive method (SAP method), modified semi-additive method (MSAP method), etc.). When manufacturing a printed circuit board, an interlayer insulating film may be formed on the pattern circuit after the pattern circuit is formed, and the pattern circuit may be further formed on the interlayer insulating film. The interlayer insulating film can be formed, for example, from the powder dispersion of the present invention. When manufacturing a printed circuit board, a solder mask layer can also be laminated on the pattern circuit. The solder mask layer can be formed, for example, by the powder dispersion of the present invention. When manufacturing a printed circuit board, a cover film can also be laminated on the pattern circuit. The covering film can be formed, for example, from the powder dispersion of the present invention. Example
以下,以實施例詳細說明本發明,惟本發明不受該等限定。 各種測定方法顯示如下。Hereinafter, the present invention will be described in detail using examples, but the present invention is not limited thereto. Various assay methods are shown below.
<聚合物之熔點> 使用示差掃描熱量計(Seiko Instruments Inc.製,DSC-7020),在10℃/分鐘之速度下使TFE系聚合物升溫並進行測定。 <聚合物之儲存彈性模數> 根據ISO 6721-4:1994(JIS K7244-4:1999),使用動態黏彈性測定裝置(DMS6100,SII NanoTechnology Inc.製),在頻率10Hz、靜力0.98N、動態位移0.035%之條件下,以2℃/分鐘之速度使溫度從20℃上升,並測定在260℃下之儲存彈性模數。 <粉末之D50及D90> 使用雷射繞射・散射式粒度分布測定裝置(堀場製作所公司製,LA-920測定器),使粉末分散於水中後進行測定。<Melting point of polymer> Using a differential scanning calorimeter (DSC-7020, manufactured by Seiko Instruments Inc.), the temperature of the TFE-based polymer was increased at a rate of 10° C./min and measured. <Storage elastic modulus of polymer> According to ISO 6721-4: 1994 (JIS K7244-4: 1999), a dynamic viscoelasticity measuring device (DMS6100, manufactured by SII NanoTechnology Inc.) was used under the conditions of frequency 10Hz, static force 0.98N, and dynamic displacement 0.035%. The temperature was raised from 20°C at a speed of 2°C/min, and the storage elastic modulus at 260°C was measured. <Powder D50 and D90> Using a laser diffraction/scattering particle size distribution measuring device (LA-920 measuring device manufactured by Horiba Manufacturing Co., Ltd.), the powder was dispersed in water and then measured.
<樹脂層之均質性> 從斜上方目測經光照射後之樹脂層,並按下述基準做評估。 ○:未確認到圖樣。 △:確認到橘皮圖樣。 ×:確認到橘皮圖樣,且在端部確認到中心有樹脂脫落。 <附樹脂之金屬箔的翹曲率> 從附樹脂之金屬箔裁切出180mm四方的四角試驗片,針對試驗片按JIS C6471:1995中規定之測定方法進行測定。 ○:附樹脂之金屬箔的翹曲率為5%以下。 △:附樹脂之金屬箔的翹曲率超過5%且在7%以下。 ×:附樹脂之金屬箔的翹曲率超過7%。<Homogeneity of resin layer> Visually observe the resin layer after light irradiation from diagonally above, and make an evaluation based on the following criteria. ○: The pattern has not been confirmed. △: Orange peel pattern is confirmed. ×: An orange peel pattern was observed, and resin peeling was observed in the center at the ends. <Warp rate of metal foil with resin> Cut out a 180 mm square test piece with four corners from the resin-coated metal foil, and measure the test piece according to the measurement method specified in JIS C6471:1995. ○: The warpage rate of resin-coated metal foil is 5% or less. △: The warpage rate of the metal foil with resin exceeds 5% and is less than 7%. ×: The warpage rate of the resin-coated metal foil exceeds 7%.
[TFE系聚合物] 聚合物1:以97.9莫耳%、0.1莫耳%、2.0莫耳%依序包含以TFE為主體之單元、以NAH為主體之單元及以PPVE為主體之單元的共聚物,熔點為300℃,且260℃下之儲存彈性模數為1.1MPa的聚合物。 聚合物2:以98莫耳%、2莫耳%依序包含以TFE為主體之單元及以PPVE為主體之單元的共聚物,熔點為310℃,且260℃下之儲存彈性模數為4.8MPa的聚合物。 聚合物3:以82莫耳%、18莫耳%依序包含以TFE為主體之單元及以HFP為主體之單元的共聚物,熔點為265℃,且260℃下之儲存彈性模數為0.5MPa的聚合物。 聚合物4:包含99.5莫耳%以上之以TFE為主體之單元的聚合物,熔點超過320℃,且260℃下之儲存彈性模數大於5.0MPa的聚合物。[TFE polymer] Polymer 1: A copolymer containing units based on TFE, units based on NAH, and units based on PPVE in order of 97.9 mol%, 0.1 mol%, and 2.0 mol%. The melting point is 300°C. , and a polymer with a storage elastic modulus of 1.1MPa at 260°C. Polymer 2: A copolymer containing TFE as the main unit and PPVE as the main unit in order of 98 mol% and 2 mol%, the melting point is 310°C, and the storage elastic modulus at 260°C is 4.8 MPa polymer. Polymer 3: A copolymer containing TFE as the main unit and HFP as the main unit in order of 82 mol% and 18 mol%, the melting point is 265°C, and the storage elastic modulus at 260°C is 0.5 MPa polymer. Polymer 4: A polymer containing more than 99.5 mol% of TFE-based units, a polymer with a melting point exceeding 320°C, and a storage elastic modulus at 260°C greater than 5.0MPa.
[分散劑] 分散劑1:具有全氟烯基之丙烯酸酯與具有聚氧伸乙基及醇性羥基之丙烯酸酯的共聚物(非離子性界面活性劑)。 [金屬箔] 銅箔1:厚度12μm的低粗化銅箔(表面之十點平均粗度0.6μm)。[Dispersant] Dispersant 1: Copolymer (nonionic surfactant) of an acrylate having a perfluoroalkenyl group and an acrylate having a polyoxyethylene group and an alcoholic hydroxyl group. [metal foil] Copper foil 1: Low-roughened copper foil with a thickness of 12 μm (average roughness at ten points on the surface: 0.6 μm).
[粉末] 粉末1:D50為1.7μm且D90為3.8μm之聚合物1的粉末(鬆裝體密度0.269g/mL,緊密裝填體密0.315g/mL)。 粉末2:D50為2.4μm且D90為5.5μm之聚合物2的粉末。 粉末3:D50為3.1μm且D90為5.9μm之聚合物3的粉末。 粉末4:D50為0.3μm且D90為0.6μm之聚合物4的粉末。[powder] Powder 1: Powder of polymer 1 with D50 of 1.7 μm and D90 of 3.8 μm (loose bulk density: 0.269 g/mL, tightly packed bulk density: 0.315 g/mL). Powder 2: Powder of polymer 2 with D50 of 2.4 μm and D90 of 5.5 μm. Powder 3: Powder of polymer 3 with D50 of 3.1 μm and D90 of 5.9 μm. Powder 4: Powder of polymer 4 with D50 of 0.3 μm and D90 of 0.6 μm.
[例1] 混合50質量份之粉末1、5質量份之分散劑1、45質量份之N-甲基吡咯啶酮而調製出分散液1。 使用模塗機將分散液1塗佈於銅箔1之表面後,使銅箔1通過通風乾燥爐(氣體環境溫度:260℃,環境氣體:氧氣濃度8000ppm之氮氣)並保持1分鐘後,再通過遠紅外線爐(溫度:340℃,氣體:氧氣濃度低於100ppm之氮氣)並保持1分鐘,而製得於銅箔1之表面具有聚合物1之樹脂層(厚度5μm)的附樹脂之銅箔。將關於樹脂層之均質性、附樹脂之金屬箔之翹曲率的評估結果列於下表1。[example 1] Dispersion 1 was prepared by mixing 50 parts by mass of powder 1, 5 parts by mass of dispersant 1, and 45 parts by mass of N-methylpyrrolidone. After applying the dispersion 1 on the surface of the copper foil 1 using a die coater, the copper foil 1 is passed through a ventilated drying furnace (gas ambient temperature: 260°C, ambient gas: nitrogen with an oxygen concentration of 8000 ppm) and held for 1 minute, and then Pass the far-infrared furnace (temperature: 340°C, gas: nitrogen with an oxygen concentration lower than 100 ppm) for 1 minute to prepare resin-attached copper with a resin layer (thickness 5 μm) of polymer 1 on the surface of copper foil 1 foil. The evaluation results regarding the homogeneity of the resin layer and the warpage rate of the metal foil with resin are listed in Table 1 below.
[例2~5] 除了變更粉末、通風乾燥爐之氣體環境溫度以外,以與例1同樣方式製得附樹脂之銅箔,並分別評估。將結果統整列於下表1。 [表1] [Examples 2 to 5] Except for changing the powder and the gas ambient temperature of the ventilation drying furnace, resin-coated copper foils were produced in the same manner as Example 1, and evaluated separately. The results are summarized in Table 1 below. [Table 1]
產業上之可利用性 本發明之製造方法係適合製造附樹脂之金屬箔的方法且有用於製造印刷基板等,該附樹脂之金屬箔具有包含氟聚合物之高均質性的樹脂層且不易翹曲。 另,在此係援引已於2018年05月30日提申之日本專利申請案2018-104010號之說明書、申請專利範圍及摘要之全部內容,並納入作為本發明說明書之揭示。industrial availability The manufacturing method of the present invention is a method suitable for manufacturing a resin-attached metal foil that has a highly homogeneous resin layer containing a fluoropolymer and is difficult to warp and is useful for manufacturing printed circuit boards and the like. In addition, the entire contents of the specification, patent scope and abstract of Japanese Patent Application No. 2018-104010 filed on May 30, 2018 are quoted here and incorporated into the disclosure of the specification of the present invention.
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