TWI813829B - Alkali-developable photocurable thermosetting resin composition - Google Patents
Alkali-developable photocurable thermosetting resin composition Download PDFInfo
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- TWI813829B TWI813829B TW108146091A TW108146091A TWI813829B TW I813829 B TWI813829 B TW I813829B TW 108146091 A TW108146091 A TW 108146091A TW 108146091 A TW108146091 A TW 108146091A TW I813829 B TWI813829 B TW I813829B
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- TW
- Taiwan
- Prior art keywords
- alkali
- resin composition
- photopolymerization initiator
- resin
- composition
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 53
- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 14
- 229920005989 resin Polymers 0.000 claims abstract description 76
- 239000011347 resin Substances 0.000 claims abstract description 76
- 239000000203 mixture Substances 0.000 claims abstract description 71
- 239000003999 initiator Substances 0.000 claims abstract description 65
- -1 orthoester compound Chemical class 0.000 claims abstract description 36
- 239000003085 diluting agent Substances 0.000 claims abstract description 16
- PYOKUURKVVELLB-UHFFFAOYSA-N trimethyl orthoformate Chemical compound COC(OC)OC PYOKUURKVVELLB-UHFFFAOYSA-N 0.000 claims description 19
- GKASDNZWUGIAMG-UHFFFAOYSA-N triethyl orthoformate Chemical compound CCOC(OCC)OCC GKASDNZWUGIAMG-UHFFFAOYSA-N 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 8
- NDQXKKFRNOPRDW-UHFFFAOYSA-N 1,1,1-triethoxyethane Chemical compound CCOC(C)(OCC)OCC NDQXKKFRNOPRDW-UHFFFAOYSA-N 0.000 claims description 6
- FGWYWKIOMUZSQF-UHFFFAOYSA-N 1,1,1-triethoxypropane Chemical compound CCOC(CC)(OCC)OCC FGWYWKIOMUZSQF-UHFFFAOYSA-N 0.000 claims description 3
- HDPNBNXLBDFELL-UHFFFAOYSA-N 1,1,1-trimethoxyethane Chemical compound COC(C)(OC)OC HDPNBNXLBDFELL-UHFFFAOYSA-N 0.000 claims description 3
- ZGMNAIODRDOMEK-UHFFFAOYSA-N 1,1,1-trimethoxypropane Chemical compound CCC(OC)(OC)OC ZGMNAIODRDOMEK-UHFFFAOYSA-N 0.000 claims description 3
- UEVZIKFSVBYKAC-UHFFFAOYSA-N 1-(1,1-dibutoxyethoxy)butane Chemical compound CCCCOC(C)(OCCCC)OCCCC UEVZIKFSVBYKAC-UHFFFAOYSA-N 0.000 claims description 3
- JDQNNHFSSCEQPM-UHFFFAOYSA-N 1-(1,1-dipropoxyethoxy)propane Chemical compound CCCOC(C)(OCCC)OCCC JDQNNHFSSCEQPM-UHFFFAOYSA-N 0.000 claims description 3
- SGJBIFUEFLWXJY-UHFFFAOYSA-N 1-(dibutoxymethoxy)butane Chemical compound CCCCOC(OCCCC)OCCCC SGJBIFUEFLWXJY-UHFFFAOYSA-N 0.000 claims description 3
- RWNXXQFJBALKAX-UHFFFAOYSA-N 1-(dipropoxymethoxy)propane Chemical compound CCCOC(OCCC)OCCC RWNXXQFJBALKAX-UHFFFAOYSA-N 0.000 claims description 3
- JSPNRYDMYDINGQ-UHFFFAOYSA-N 1-butoxypropane-1,1-diol Chemical compound CCCCOC(O)(O)CC JSPNRYDMYDINGQ-UHFFFAOYSA-N 0.000 claims description 3
- FGGPMAFZNRKKSL-UHFFFAOYSA-N 1-propoxypropane-1,1-diol Chemical compound CCCOC(O)(O)CC FGGPMAFZNRKKSL-UHFFFAOYSA-N 0.000 claims description 3
- 238000003860 storage Methods 0.000 abstract description 10
- 230000015556 catabolic process Effects 0.000 abstract description 3
- 238000006731 degradation reaction Methods 0.000 abstract description 3
- 239000003822 epoxy resin Substances 0.000 description 38
- 229920000647 polyepoxide Polymers 0.000 description 38
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 37
- 239000003086 colorant Substances 0.000 description 27
- 238000000034 method Methods 0.000 description 26
- 150000001875 compounds Chemical class 0.000 description 25
- 230000000052 comparative effect Effects 0.000 description 23
- 238000000576 coating method Methods 0.000 description 21
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 19
- 239000011248 coating agent Substances 0.000 description 18
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 16
- 239000004848 polyfunctional curative Substances 0.000 description 16
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 14
- 239000003795 chemical substances by application Substances 0.000 description 13
- 239000002075 main ingredient Substances 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- 230000035945 sensitivity Effects 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 9
- 150000008065 acid anhydrides Chemical class 0.000 description 9
- 239000006229 carbon black Substances 0.000 description 9
- 239000007795 chemical reaction product Substances 0.000 description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 9
- 239000004593 Epoxy Substances 0.000 description 8
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 8
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 7
- 238000002161 passivation Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 230000000873 masking effect Effects 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 230000002411 adverse Effects 0.000 description 5
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 5
- 150000004056 anthraquinones Chemical class 0.000 description 5
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- 229920005862 polyol Polymers 0.000 description 5
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 230000001588 bifunctional effect Effects 0.000 description 4
- 239000004305 biphenyl Substances 0.000 description 4
- 235000010290 biphenyl Nutrition 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 4
- 150000003077 polyols Chemical class 0.000 description 4
- 229910000029 sodium carbonate Inorganic materials 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 4
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 3
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000001476 alcoholic effect Effects 0.000 description 3
- 125000002947 alkylene group Chemical group 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000038 blue colorant Substances 0.000 description 3
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 125000005442 diisocyanate group Chemical group 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- ZZSIDSMUTXFKNS-UHFFFAOYSA-N perylene red Chemical compound CC(C)C1=CC=CC(C(C)C)=C1N(C(=O)C=1C2=C3C4=C(OC=5C=CC=CC=5)C=1)C(=O)C2=CC(OC=1C=CC=CC=1)=C3C(C(OC=1C=CC=CC=1)=CC1=C2C(C(N(C=3C(=CC=CC=3C(C)C)C(C)C)C1=O)=O)=C1)=C2C4=C1OC1=CC=CC=C1 ZZSIDSMUTXFKNS-UHFFFAOYSA-N 0.000 description 3
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 3
- 150000007519 polyprotic acids Polymers 0.000 description 3
- 239000001062 red colorant Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 150000004292 cyclic ethers Chemical group 0.000 description 2
- 125000006841 cyclic skeleton Chemical group 0.000 description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 2
- 239000000040 green colorant Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- NYGZLYXAPMMJTE-UHFFFAOYSA-M metanil yellow Chemical group [Na+].[O-]S(=O)(=O)C1=CC=CC(N=NC=2C=CC(NC=3C=CC=CC=3)=CC=2)=C1 NYGZLYXAPMMJTE-UHFFFAOYSA-M 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920001955 polyphenylene ether Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- 230000036962 time dependent Effects 0.000 description 2
- 239000001060 yellow colorant Substances 0.000 description 2
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- LHENQXAPVKABON-UHFFFAOYSA-N 1-methoxypropan-1-ol Chemical compound CCC(O)OC LHENQXAPVKABON-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- UALAKBZSBJIXBP-UHFFFAOYSA-N 1-phenylethane-1,1,2,2-tetrol Chemical compound OC(O)C(O)(O)C1=CC=CC=C1 UALAKBZSBJIXBP-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- PTBDIHRZYDMNKB-UHFFFAOYSA-N 2,2-Bis(hydroxymethyl)propionic acid Chemical compound OCC(C)(CO)C(O)=O PTBDIHRZYDMNKB-UHFFFAOYSA-N 0.000 description 1
- JVYDLYGCSIHCMR-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)butanoic acid Chemical compound CCC(CO)(CO)C(O)=O JVYDLYGCSIHCMR-UHFFFAOYSA-N 0.000 description 1
- KJSATFDGRLXLPP-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)CO KJSATFDGRLXLPP-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- WMYINDVYGQKYMI-UHFFFAOYSA-N 2-[2,2-bis(hydroxymethyl)butoxymethyl]-2-ethylpropane-1,3-diol Chemical compound CCC(CO)(CO)COCC(CC)(CO)CO WMYINDVYGQKYMI-UHFFFAOYSA-N 0.000 description 1
- GTELLNMUWNJXMQ-UHFFFAOYSA-N 2-ethyl-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical class OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(CO)(CO)CO GTELLNMUWNJXMQ-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 1
- UJTRCPVECIHPBG-UHFFFAOYSA-N 3-cyclohexylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C2CCCCC2)=C1 UJTRCPVECIHPBG-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- FNQIYTUXOKTMDM-UHFFFAOYSA-N 3-phenoxypropane-1,2-diol Chemical compound OCC(O)COC1=CC=CC=C1 FNQIYTUXOKTMDM-UHFFFAOYSA-N 0.000 description 1
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 239000005058 Isophorone diisocyanate Substances 0.000 description 1
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
本發明的課題係提供一種即使是在較嚴苛的保存條件下亦能夠抑制性能降低的鹼顯影型硬化性樹脂組成物。 本發明的手段為一種鹼顯影型硬化性樹脂組成物,其係至少組成二液系的鹼顯影型硬化性樹脂組成物,至少含有(A)鹼可溶性樹脂、(B)具有肟鍵的光聚合起始劑、(C)反應性稀釋劑及(D)熱硬化性樹脂,且前述(B)具有肟鍵的光聚合起始劑摻合於與前述(A)鹼可溶性樹脂不同的組成物中,其特徵在於:至少1種的(E)原酸酯化合物與前述(B)具有肟鍵的光聚合起始劑一起摻合而成。An object of the present invention is to provide an alkali-developable curable resin composition that can suppress performance degradation even under relatively severe storage conditions. The means of the present invention is an alkali-developable curable resin composition, which is an alkali-developable curable resin composition that constitutes at least a two-component system and contains at least (A) an alkali-soluble resin and (B) a photopolymerized resin having an oxime bond. Initiator, (C) reactive diluent and (D) thermosetting resin, and the aforementioned (B) photopolymerization initiator having an oxime bond is blended in a composition different from the aforementioned (A) alkali-soluble resin , characterized in that at least one type of (E) orthoester compound is blended with the aforementioned (B) photopolymerization initiator having an oxime bond.
Description
本發明為關於一種鹼顯影型光硬化性熱硬化性樹脂組成物,以及將其硬化而得到的硬化物及具有該硬化物的電子零件。The present invention relates to an alkali-developable photocurable thermosetting resin composition, a cured product obtained by curing the composition, and an electronic component having the cured product.
一直以來,於印刷配線板中,防焊劑(solder resist)係被使用來作為配線板電路的保護材料,作為該材料組成物之一例,可舉出鹼顯影型的光硬化性熱硬化性樹脂組成物(以下亦簡稱為「硬化性樹脂組成物」)。 該硬化性樹脂組成物中,為了形成更精密的圖型,亦有使用感度更高的光聚合起始劑之情形,以增加曝光時的感度而能夠光硬化至塗膜的深部。 作為如此般的光聚合起始劑,例如提案著使用具有肟鍵的光聚合起始劑之技術(專利文獻1)。Solder resist has long been used as a protective material for circuits on printed wiring boards. An example of this material composition is an alkali-developable photocurable thermosetting resin composition. (hereinafter also referred to as "curable resin composition"). In the curable resin composition, in order to form a more precise pattern, a photopolymerization initiator with higher sensitivity is sometimes used to increase the sensitivity during exposure and enable photohardening to the deep part of the coating film. As such a photopolymerization initiator, for example, a technology using a photopolymerization initiator having an oxime bond is proposed (Patent Document 1).
然而另一方面,具有肟鍵的光聚合起始劑具有下述之情形:會因為與具有羧基的樹脂之接觸而導致其性能容易降低之性質,又,因與反應性稀釋劑之接觸而有增稠之疑慮。其結果,會有損及含有此者的組成物的品質之疑慮。 因此,該專利文獻1之技術,特徵在於:製成二液系組成之硬化性樹脂組成物,其係將具有肟鍵的光聚合起始劑與具有羧基的樹脂或反應性稀釋劑以個別的成分來進行摻合而成。藉由製成如此般的二液系,來提供保存穩定性為優異的硬化性樹脂組成物。 [先前技術文獻] [專利文獻]On the other hand, a photopolymerization initiator having an oxime bond has a property in which its performance is easily reduced due to contact with a resin having a carboxyl group, and also has a tendency to deteriorate due to contact with a reactive diluent. Doubts about thickening. As a result, the quality of the composition containing it may be impaired. Therefore, the technology of Patent Document 1 is characterized in that a two-component curable resin composition is prepared by combining a photopolymerization initiator having an oxime bond and a resin or reactive diluent having a carboxyl group in separate ingredients are blended. By creating such a two-liquid system, a curable resin composition with excellent storage stability can be provided. [Prior technical literature] [Patent Document]
[專利文獻1]國際公開第2004/048434號[Patent Document 1] International Publication No. 2004/048434
[發明所欲解決之課題][Problem to be solved by the invention]
然而,關於如上述具有肟鍵的光聚合起始劑般的含有光感受性為高的化合物的組成物,就發揮其穩定性能之觀點而言,期待在保存中的品質穩定性為更高。因此,即使是經過例如利用船舶的運送等的保管庫易為較高溫、且運送期間亦達長期般的較嚴苛的保存條件後,亦能夠提供具有穩定品質的硬化性樹脂組成物。若假設如此般的保存條件之情形時,係考量即使是以大約50℃持續經過5天以上後,亦儘可能地必須能維持硬化性樹脂組成物的性能。 關於此點,專利文獻1所記載之技術,如同上述般係藉由製成二液系,因而能夠抑制具有肟鍵的光聚合起始劑的性能降低等,進而亦能夠維持含有此者的硬化性樹脂組成物的性能。However, from the viewpoint of exerting its stable performance, a composition containing a compound with high photosensitivity such as the above-mentioned photopolymerization initiator having an oxime bond is expected to have higher quality stability during storage. Therefore, it is possible to provide a curable resin composition with stable quality even after passing through relatively stringent storage conditions, such as transportation by ship, where the temperature is likely to be relatively high, and the transportation period is long. If such storage conditions are assumed, it is considered that the performance of the curable resin composition must be maintained as much as possible even after a continuous period of more than 5 days at approximately 50°C. In this regard, the technology described in Patent Document 1 is a two-liquid system as described above. Therefore, it is possible to suppress the degradation of the performance of the photopolymerization initiator having an oxime bond and to maintain the hardening of the photopolymerization initiator containing this. properties of the resin composition.
然而,該技術係至少未假設到下述之情況:以50℃經5天以上之條件下來放置硬化性樹脂組成物。 因此,本發明的課題在於提供一種即使是在如此般較嚴苛的保存條件下亦能夠抑制性能降低的硬化性樹脂組成物。 [解決課題之手段]However, this technology does not at least assume the following situation: leaving the curable resin composition at 50° C. for more than 5 days. Therefore, an object of the present invention is to provide a curable resin composition that can suppress performance degradation even under such relatively severe storage conditions. [Means to solve the problem]
首先,對於含有具有肟鍵的光聚合起始劑的二液系的硬化性樹脂組成物進行以50℃經5天之條件下的經時試驗,但由於感度的降低,無法藉由曝光·顯影來形成圖型。First, a time-lapse test was conducted on a two-component curable resin composition containing a photopolymerization initiator having an oxime bond at 50°C for 5 days. However, due to the decrease in sensitivity, it could not be processed by exposure and development. to form a pattern.
因此,對於硬化性樹脂組成物中的具有肟鍵的光聚合起始劑之劣化機制重新進行調査研究,其結果發現下述之見解:該組成物中所含有的微量的水分,對於具有肟鍵的光聚合起始劑的化學構造中的肟鍵帶來不良影響。推測係由於該水分而導致肟鍵受到分解,其結果造成具有肟鍵的光聚合起始劑變得鈍化,亦對於硬化皮膜的形成帶來不佳的影響。然後,因該水分的存在而導致的不良影響係如上述般,即使是將具有肟鍵的光聚合起始劑與具有羧基的樹脂及反應性稀釋劑以個別的成分的二液系來進行摻合,亦無法充分避免該不良影響之產生。Therefore, the deterioration mechanism of the photopolymerization initiator having an oxime bond in the curable resin composition was re-investigated. As a result, the following findings were found: The trace amount of water contained in the composition has an oxime bond. The oxime bond in the chemical structure of the photopolymerization initiator brings adverse effects. It is presumed that this moisture decomposes the oxime bond, resulting in the photopolymerization initiator having the oxime bond becoming passivated, and adversely affecting the formation of the hardened film. Then, the adverse effects caused by the presence of moisture are as mentioned above, even if the photopolymerization initiator having an oxime bond, the resin having a carboxyl group, and the reactive diluent are mixed in a two-liquid system of separate components. combination, it is impossible to fully avoid the occurrence of such adverse effects.
基於該觀點,於二液系的硬化性樹脂組成物中摻合具有肟鍵的光聚合起始劑之際,嘗試一起摻合沸石或矽凝膠等的脫水劑。然而,反倒是會產生該等在組成物中的分散為困難之類的個別的課題,因而無法將其直接用於抑制具有肟鍵的光聚合起始劑之鈍化。From this viewpoint, when blending a photopolymerization initiator having an oxime bond into a two-component curable resin composition, an attempt has been made to blend a dehydrating agent such as zeolite or silica gel together with the photopolymerization initiator. However, they have individual problems such as difficulty in dispersing them in the composition, and therefore they cannot be directly used to suppress the passivation of the photopolymerization initiator having an oxime bond.
因此,進行更深入研究之結果發現,藉由將具有肟鍵的光聚合起始劑與鹼可溶性樹脂以個別的組成、且將特定的原酸酯化合物與該具有肟鍵的光聚合起始劑一起摻合於硬化性樹脂組成物中,即使是以50℃經5天保存之情形時,亦能有效地抑制具有肟鍵的光聚合起始劑的鈍化,藉此能夠提高該組成物的保存穩定性,進而完成本發明。Therefore, as a result of further research, it was found that by combining a photopolymerization initiator having an oxime bond with an alkali-soluble resin in separate compositions, and combining a specific orthoester compound with the photopolymerization initiator having an oxime bond When blended together into a curable resin composition, even when stored at 50°C for 5 days, the passivation of the photopolymerization initiator having an oxime bond can be effectively suppressed, thereby improving the storage of the composition. stability, and then complete the present invention.
即,發現藉由前述鹼顯影型硬化性樹脂組成物能夠解決本發明的目的,其係至少組成二液系的鹼顯影型硬化性樹脂組成物,至少含有(A)鹼可溶性樹脂、(B)具有肟鍵的光聚合起始劑、(C)反應性稀釋劑及(D)熱硬化性樹脂,且前述(B)具有肟鍵的光聚合起始劑與前述(A)鹼可溶性樹脂摻合於不同的組成物中,其特徵在於:至少1種的(E)原酸酯化合物與前述(B)具有肟鍵的光聚合起始劑一起摻合而成。That is, it was found that the object of the present invention can be solved by the alkali-developable curable resin composition, which is a two-component alkali-developable curable resin composition containing at least (A) an alkali-soluble resin, (B) A photopolymerization initiator having an oxime bond, (C) a reactive diluent and (D) a thermosetting resin, and the aforementioned (B) photopolymerization initiator having an oxime bond is blended with the aforementioned (A) alkali-soluble resin Among different compositions, it is characterized in that at least one type of (E) orthoester compound is blended with the aforementioned (B) photopolymerization initiator having an oxime bond.
又,本發明的鹼顯影型硬化性樹脂組成物中,(E)原酸酯化合物係較佳為選自由原甲酸三甲酯、原甲酸三乙酯、原甲酸三丙酯、原甲酸三丁酯、原乙酸三甲酯、原乙酸三乙酯、原乙酸三丙酯、原乙酸三丁酯、原丙酸三甲酯、原丙酸三乙酯、原丙酸丙酯及原丙酸丁酯所成之群組之至少1種,又較佳為選自由原甲酸三甲酯、原甲酸三乙酯及原乙酸三乙酯所成之群組之至少1種,最佳為原甲酸三乙酯。Furthermore, in the alkali-developable curable resin composition of the present invention, (E) the orthoester compound is preferably selected from the group consisting of trimethyl orthoformate, triethyl orthoformate, tripropyl orthoformate, and tributyl orthoformate. Ester, trimethyl orthoacetate, triethyl orthoacetate, tripropyl orthoacetate, tributyl orthoacetate, trimethyl orthopropionate, triethyl orthopropionate, propyl orthopropionate and butyl orthopropionate At least one species from the group of esters, preferably at least one species selected from the group consisting of trimethyl orthoformate, triethyl orthoformate and triethyl orthoacetate, preferably triethyl orthoformate. Ethyl ester.
又,本發明中亦提供將上述的鹼顯影型硬化性樹脂組成物硬化後而得到的硬化物及具有該硬化物的電子零件。 [發明的效果]Furthermore, the present invention also provides a cured product obtained by curing the above-mentioned alkali developable curable resin composition and an electronic component having the cured product. [Effects of the invention]
依據本發明能夠提供:「即使是至少以50℃經過5天後,其性能(例如感度)的降低亦能被有效地抑制的二液系的硬化性樹脂組成物」。 因此,適合於例如將該組成物利用船舶的運送等的較嚴苛的條件下之保存。According to the present invention, it is possible to provide "a two-component curable resin composition that can effectively suppress the decrease in performance (such as sensitivity) even after at least 50° C. for 5 days." Therefore, it is suitable for storage under relatively severe conditions such as transportation of the composition by ship.
[實施發明之最佳形態][The best way to implement the invention]
本發明的硬化性樹脂組成物中,將(B)具有肟鍵的光聚合起始劑與(A)鹼可溶性樹脂摻合於個別的組成物來組成至少二液系。 例如另外調製主劑組成物與硬化劑組成物,於使用時可藉由混合此等來使用。當然地,因應所需可將該等組成物進一步設為個別者,而製成3液系以上的組成亦可。 作為主劑組成物的成分,可舉例如鹼可溶性樹脂、反應性稀釋劑、溶劑、顏料及光聚合起始劑等。另一方面,作為硬化劑組成物的成分,可舉例如熱硬化性樹脂、溶劑及具有肟鍵的光聚合起始劑等。In the curable resin composition of the present invention, (B) the photopolymerization initiator having an oxime bond and (A) the alkali-soluble resin are blended into separate compositions to form at least a two-liquid system. For example, a main component composition and a hardener composition are separately prepared, and these can be mixed during use. Of course, these compositions can be further customized according to needs, and they can also be made into a three-liquid or higher composition. Examples of components of the main component composition include alkali-soluble resins, reactive diluents, solvents, pigments, and photopolymerization initiators. On the other hand, examples of the components of the curing agent composition include a thermosetting resin, a solvent, a photopolymerization initiator having an oxime bond, and the like.
然後,本發明中不僅是將(B)具有肟鍵的光聚合起始劑摻合於與(A)鹼可溶性樹脂為個別的組成物中,亦將(E)原酸酯化合物與(B)具有肟鍵的光聚合起始劑一起進行摻合。據此推測,可有效地抑制因組成物中的水分所導致的肟鍵的分解,意即,能夠維持其感度。 以如此般摻合而成的本發明的硬化性樹脂組成物,即使是至少以50℃經過5天後,亦能夠有效地抑制該性能的降低。 以下,對於各成分來進行說明。Then, in the present invention, not only (B) the photopolymerization initiator having an oxime bond is blended into a separate composition from (A) the alkali-soluble resin, but also (E) the orthoester compound and (B) Photopolymerization initiators having an oxime bond are blended together. Based on this, it is speculated that the decomposition of oxime bonds caused by moisture in the composition can be effectively suppressed, that is, the sensitivity can be maintained. The curable resin composition of the present invention blended in this way can effectively suppress the decrease in performance even after at least 50° C. has elapsed for 5 days. Each component is explained below.
[(A)鹼可溶性樹脂] (A)鹼可溶性樹脂係含有酚性羥基、硫醇基及羧基中之1種以上的官能基並可溶於鹼溶液中的樹脂,較佳可舉出:具有2個以上的酚性羥基的化合物、含有羧基的樹脂、具有酚性羥基及羧基的化合物、具有2個以上的硫醇基的化合物。作為(A)鹼可溶性樹脂係可使用含有羧基的樹脂或含有酚系羥基的樹脂,但較佳為含有羧基的樹脂。[(A) Alkali-soluble resin] (A) The alkali-soluble resin is a resin that contains one or more functional groups among a phenolic hydroxyl group, a thiol group, and a carboxyl group and is soluble in an alkali solution. Preferable examples include those having two or more phenolic hydroxyl groups. Compounds, resins containing carboxyl groups, compounds having phenolic hydroxyl groups and carboxyl groups, and compounds having two or more thiol groups. As (A) the alkali-soluble resin system, a carboxyl group-containing resin or a phenolic hydroxyl group-containing resin can be used, but a carboxyl group-containing resin is preferred.
含有羧基的樹脂,就光硬化性或耐顯影性之觀點而言,除了羧基以外,較佳為分子內具有乙烯性不飽和鍵,但亦可使用不具有乙烯性不飽和雙鍵的含有羧基的樹脂。作為乙烯性不飽和鍵,較佳為丙烯酸或者甲基丙烯酸或源自此等的衍生物者。含有羧基的樹脂之中,較佳為:具有共聚合構造的含有羧基的樹脂、具有胺基甲酸酯(urethane)構造的含有羧基的樹脂、將環氧樹脂作為起始原料的含有羧基的樹脂、將酚化合物作為起始原料的含有羧基的樹脂。作為含有羧基的樹脂的具體例,可舉出如下述所列舉般的化合物(寡聚物或聚合物皆可)。From the viewpoint of photocurability or development resistance, the carboxyl group-containing resin preferably has an ethylenically unsaturated bond in the molecule in addition to the carboxyl group, but a carboxyl group-containing resin that does not have an ethylenically unsaturated double bond may also be used. resin. As the ethylenically unsaturated bond, acrylic acid or methacrylic acid or derivatives thereof are preferred. Among the carboxyl group-containing resins, preferred are: a carboxyl group-containing resin having a copolymerized structure, a carboxyl group-containing resin having a urethane structure, and a carboxyl group-containing resin using an epoxy resin as a starting material. , a carboxyl group-containing resin using a phenolic compound as a starting material. Specific examples of the carboxyl group-containing resin include the compounds listed below (either an oligomer or a polymer).
(1)將2官能或其以上的多官能環氧樹脂與(甲基)丙烯酸進行反應,對存在於側鏈的羥基加成鄰苯二甲酸酐、四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐等的二元酸酐而得到的含有羧基的感光性樹脂。於此,2官能或其以上的多官能環氧樹脂係較佳為固體。(1) React bifunctional or more multifunctional epoxy resin with (meth)acrylic acid, and add phthalic anhydride, tetrahydrophthalic anhydride, or hexahydrophthalic anhydride to the hydroxyl groups present in the side chain. Photosensitive resin containing carboxyl groups obtained from dibasic acid anhydrides such as phthalic anhydride. Here, the bifunctional or more polyfunctional epoxy resin is preferably solid.
(2)將2官能環氧樹脂的羥基進而以表氯醇進行環氧化而得到多官能環氧樹脂,再將(甲基)丙烯酸與該多官能環氧樹脂進行反應,來對生成的羥基加成二元酸酐而得到的含有羧基的感光性樹脂。於此,2官能環氧樹脂係較佳為固體。(2) Epoxidize the hydroxyl groups of the bifunctional epoxy resin with epichlorohydrin to obtain a multifunctional epoxy resin, and then react (meth)acrylic acid with the multifunctional epoxy resin to add hydroxyl groups to the generated hydroxyl groups. A carboxyl group-containing photosensitive resin obtained from dibasic acid anhydride. Here, the bifunctional epoxy resin is preferably solid.
(3)將1分子中具有至少1個醇性羥基與1個酚性羥基的化合物及(甲基)丙烯酸等的含有不飽和基的單羧酸,對於1分子中具有2個以上的環氧基的環氧化合物進行反應而得到反應生成物,再以馬來酸酐、四氫鄰苯二甲酸酐、偏苯三甲酸酐、焦蜜石酸二酐、己二酸等的多元酸酐對於該反應生成物的醇性羥基進行反應,而得到的含有羧基的感光性樹脂。(3) Compounds having at least one alcoholic hydroxyl group and one phenolic hydroxyl group in one molecule and monocarboxylic acids containing unsaturated groups such as (meth)acrylic acid are used as compounds having two or more epoxy groups in one molecule. The reaction product is obtained by reacting an epoxy compound based on the base, and then polybasic acid anhydrides such as maleic anhydride, tetrahydrophthalic anhydride, trimellitic anhydride, pyromelite dianhydride, and adipic acid are used for the reaction to produce The photosensitive resin containing carboxyl groups is obtained by reacting with the alcoholic hydroxyl group of the substance.
(4)將雙酚A、雙酚F、雙酚S、酚醛(novolak)型酚樹脂、聚-p-羥基苯乙烯、萘酚與醛類的縮合物、二羥基萘與醛類的縮合物等的1分子中具有2個以上的酚性羥基的化合物及環氧乙烷、環氧丙烷等的環氧烷(alkylene oxide)進行反應而得到反應生成物,再將(甲基)丙烯酸等的含有不飽和基的單羧酸對於該反應生成物進行反應,來使多元酸酐與所得到的反應生成物反應而得到的含有羧基的感光性樹脂。(4) Combine bisphenol A, bisphenol F, bisphenol S, novolak phenol resin, poly-p-hydroxystyrene, condensates of naphthol and aldehydes, and condensates of dihydroxynaphthalene and aldehydes. A reaction product is obtained by reacting a compound having two or more phenolic hydroxyl groups in one molecule with an alkylene oxide such as ethylene oxide or propylene oxide, and then (meth)acrylic acid or the like A carboxyl group-containing photosensitive resin is obtained by reacting an unsaturated group-containing monocarboxylic acid with the reaction product and reacting a polybasic acid anhydride with the obtained reaction product.
(5)將1分子中具有2個以上的酚性羥基的化合物及碳酸伸乙酯、碳酸伸丙酯等的環狀碳酸酯化合物進行反應而得到反應生成物,再將含有不飽和基的單羧酸與該反應生成物進行反應,來使多元酸酐與所得到的反應生成物反應而得到的含有羧基的感光性樹脂。(5) A reaction product is obtained by reacting a compound having two or more phenolic hydroxyl groups in one molecule with a cyclic carbonate compound such as ethyl carbonate or propylene carbonate, and then adding the unsaturated group-containing monomer to the reaction product. A carboxyl group-containing photosensitive resin is obtained by reacting a carboxylic acid with the reaction product and reacting a polybasic acid anhydride with the obtained reaction product.
(6)藉由將脂肪族二異氰酸酯、分支脂肪族二異氰酸酯、脂環式二異氰酸酯、芳香族二異氰酸酯等的二異氰酸酯化合物,與聚碳酸酯系多元醇、聚醚系多元醇、聚酯系多元醇、聚烯烴系多元醇、丙烯酸系多元醇、雙酚A系環氧烷加成物二醇、具有酚性羥基及醇性羥基的化合物等的二醇化合物進行聚加成反應而得到胺基甲酸酯樹脂,再將酸酐與該胺基甲酸酯樹脂的末端反應而得到的含有末端羧基的胺基甲酸酯樹脂。(6) By combining diisocyanate compounds such as aliphatic diisocyanates, branched aliphatic diisocyanates, alicyclic diisocyanates, aromatic diisocyanates, and polycarbonate polyols, polyether polyols, polyester polyols, etc. A polyaddition reaction is performed on diol compounds such as polyols, polyolefin-based polyols, acrylic polyols, bisphenol A-based alkylene oxide adduct diols, and compounds having phenolic hydroxyl groups and alcoholic hydroxyl groups to obtain amines. The urethane resin is a urethane resin containing terminal carboxyl groups obtained by reacting an acid anhydride with the terminal end of the urethane resin.
(7)在將二異氰酸酯,與二羥甲基丙酸、二羥甲基丁酸等的含有羧基的二醇化合物及二醇化合物藉由聚加成反應來進行含有羧基的胺基甲酸酯樹脂的合成中,添加(甲基)丙烯酸羥基烷基酯等的分子中具有1個羥基與1個以上的(甲基)丙烯醯基的化合物,而得到的末端(甲基)丙烯酸化的含有羧基的胺基甲酸酯樹脂。(7) Carboxyl group-containing urethane is produced by polyaddition reaction between diisocyanate and carboxyl group-containing diol compounds such as dimethylol propionic acid and dimethylol butyric acid. In the synthesis of the resin, a compound having one hydroxyl group and one or more (meth)acrylyl groups in the molecule, such as hydroxyalkyl (meth)acrylate, is added to obtain a terminal (meth)acrylated compound containing Carboxylic urethane resin.
(8)在將二異氰酸酯,與含有羧基的二醇化合物及二醇化合物藉由聚加成反應來進行含有羧基的胺基甲酸酯樹脂的合成中,添加異佛酮二異氰酸酯與季戊四醇三丙烯酸酯的等莫耳反應物等的分子中具有1個異氰酸酯基與1個以上的(甲基)丙烯醯基的化合物,而得到的末端(甲基)丙烯酸化的含有羧基的胺基甲酸酯樹脂。(8) In the synthesis of carboxyl group-containing urethane resin by polyaddition reaction between diisocyanate, carboxyl group-containing diol compound and diol compound, isophorone diisocyanate and pentaerythritol triacrylic acid are added A terminal (meth)acrylated carboxyl group-containing urethane obtained from a compound having one isocyanate group and one or more (meth)acrylyl groups in the molecule of an equimolar reactant of an ester resin.
(9)藉由(甲基)丙烯酸等的不飽和羧酸與苯乙烯、α-甲基苯乙烯、(甲基)丙烯酸低級烷酯、異丁烯等的含有不飽和基的化合物之共聚合而得到的含有羧基的感光性樹脂。(9) Obtained by copolymerization of unsaturated carboxylic acids such as (meth)acrylic acid and unsaturated group-containing compounds such as styrene, α-methylstyrene, lower alkyl (meth)acrylate, isobutylene, etc. Photosensitive resin containing carboxyl groups.
(10)將己二酸、鄰苯二甲酸、六氫鄰苯二甲酸等的二羧酸與後述般的多官能氧雜環丁烷樹脂進行反應,對所生成的1級羥基加成二元酸酐而得到含有羧基的聚酯樹脂,再進一步加成(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸α-甲基縮水甘油酯等的1分子中具有1個環氧基與1個以上的(甲基)丙烯醯基的化合物而得到的含有羧基的感光性樹脂。(10) React a dicarboxylic acid such as adipic acid, phthalic acid, hexahydrophthalic acid, etc. with a polyfunctional oxetane resin as described below, and add a binary compound to the generated primary hydroxyl group. Acid anhydride is obtained to obtain a polyester resin containing carboxyl groups, and glycidyl (meth)acrylate, α-methylglycidyl (meth)acrylate, etc. are further added to have one epoxy group and one or more epoxy groups in one molecule. A carboxyl group-containing photosensitive resin obtained from a (meth)acrylyl compound.
(11)將上述的(1)~(10)中任一項之含有羧基的樹脂加成1分子中具有環狀醚基與(甲基)丙烯醯基的化合物而得到的含有羧基的感光性樹脂。(11) Carboxyl group-containing photosensitivity obtained by adding a compound having a cyclic ether group and a (meth)acrylyl group in one molecule to the carboxyl group-containing resin in any one of the above (1) to (10) resin.
尚,於此所謂的(甲基)丙烯酸酯,係指總稱丙烯酸酯、甲基丙烯酸酯及此等的混合物之用語,即使是以下其他類似用語表現亦為相同。Note that (meth)acrylate here is a term that collectively refers to acrylate, methacrylate, and mixtures thereof, and the same is true for other similar terms below.
含有羧基的樹脂的酸價,較佳為40~150 mgKOH/g。藉由將含有羧基的樹脂的酸價設為40mgKOH/g以上,使得鹼顯影成為良好。又,藉由將酸價設為150 mgKOH/g以下,可容易進行正常的阻劑圖型的描繪。又較佳為50~130mgKOH/g。The acid value of the resin containing carboxyl groups is preferably 40 to 150 mgKOH/g. By setting the acid value of the carboxyl group-containing resin to 40 mgKOH/g or more, alkali development becomes good. In addition, by setting the acid value to 150 mgKOH/g or less, normal resist pattern drawing can be easily performed. More preferably, it is 50~130mgKOH/g.
(A)鹼可溶性樹脂的質量平均分子量會依樹脂骨架而有所不同,較佳為1500~150000的範圍,又較佳為1500~100000的範圍。若質量平均分子量為1500以上之情形時,指觸乾燥(tack free)性能為良好,曝光後的塗膜的耐濕性為良好並抑制了顯影時的膜減少,故可抑制解析度的降低。另一方面,若質量平均分子量為150000以下之情形時,顯影性為良好且保存穩定性亦為優異。(A) The mass average molecular weight of the alkali-soluble resin varies depending on the resin skeleton, but is preferably in the range of 1,500 to 150,000, and more preferably in the range of 1,500 to 100,000. When the mass average molecular weight is 1500 or more, the tack free performance is good, the moisture resistance of the coating film after exposure is good, and film reduction during development is suppressed, so the decrease in resolution can be suppressed. On the other hand, when the mass average molecular weight is 150,000 or less, the developability is good and the storage stability is also excellent.
本發明中,相對於全組成物,(A)鹼可溶性樹脂的含有量較佳為10~60質量%,又較佳為20~50質量%。若為10~60質量%之情形時,塗膜強度為良好、組成物的黏性為適度,而可提升塗佈性等。In the present invention, the content of (A) alkali-soluble resin is preferably 10 to 60 mass%, and more preferably 20 to 50 mass%, relative to the entire composition. If it is 10 to 60% by mass, the coating film strength is good, the viscosity of the composition is moderate, and the coating properties can be improved.
該等的(A)鹼可溶性樹脂,可使用單獨1種或可組合2種以上來使用。These (A) alkali-soluble resins can be used individually by 1 type or in combination of 2 or more types.
[(B)具有肟鍵的光聚合起始劑] 作為(B)具有肟鍵的光聚合起始劑,可使用例如о-醯基肟酯化合物、磺酸肟酯化合物及酮肟醚化合物等的周知者。 作為市售品,可舉例如CGI-325、TOE-04-A3(日本化學工業股份有限公司)、Irgacure OXE01及Irgacure OXE02 (皆為BASF Japan股份有限公司)、以及N-1919及NCI-831 (皆為ADEKA股份有限公司)等,但不限定於該等。[(B) Photopolymerization initiator having an oxime bond] As the photopolymerization initiator having an oxime bond (B), for example, well-known ones such as о-acyl oxime ester compounds, sulfonate oxime ester compounds, and ketoxime ether compounds can be used. Examples of commercially available products include CGI-325, TOE-04-A3 (Nihon Chemical Industry Co., Ltd.), Irgacure OXE01 and Irgacure OXE02 (both BASF Japan Co., Ltd.), and N-1919 and NCI-831 ( All are ADEKA Co., Ltd.), etc., but are not limited to them.
相對於(A)鹼可溶性樹脂,(B)具有肟鍵的光聚合起始劑的含有量較佳為0.01~30質量%,又較佳為0.1~10質量%。若(B)具有肟鍵的光聚合起始劑的含有量為0.01質量%以上之情形時,於銅上的光硬化性為良好、塗膜不易剝離、耐藥品性等的塗膜特性為良好。另一方面,若(B)具有肟鍵的光聚合起始劑的含有量為30質量%以下之情形時,(B)具有肟鍵的光聚合起始劑的光吸收為良好,而深部硬化性會提升。The content of (B) the photopolymerization initiator having an oxime bond relative to (A) the alkali-soluble resin is preferably 0.01 to 30 mass %, and more preferably 0.1 to 10 mass %. If (B) the content of the photopolymerization initiator having an oxime bond is 0.01% by mass or more, the photocurability on copper will be good, the coating film will not peel off easily, and the coating film properties such as chemical resistance will be good. . On the other hand, when the content of (B) the photopolymerization initiator having an oxime bond is 30% by mass or less, the light absorption of the (B) photopolymerization initiator having an oxime bond is good and the deep hardening Sex will improve.
[(C)反應性稀釋劑] 本發明中所使用的(C)反應性稀釋劑係用於:為了調整組成物的黏度而使作業性提升之同時,提高交聯密度並得到具有密著性等的塗膜。作為如此般的(C)反應性稀釋劑係1分子中具有1個以上的不飽和雙鍵的化合物,可舉例如:(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸環己酯等的(甲基)丙烯酸烷基酯類;(甲基)丙烯酸-2-羥基乙酯、(甲基)丙烯酸-2-羥基丙酯等的(甲基)丙烯酸羥基烷基酯類;乙二醇、丙二醇、二乙二醇、二丙二醇等的環氧烷衍生物之單或二(甲基)丙烯酸酯類;己二醇、三羥甲基丙烷、季戊四醇、二三羥甲基丙烷、二季戊四醇、參羥基乙基異氰脲酸酯等的多元醇或該等的環氧乙烷或者環氧丙烷加成物之多元(甲基)丙烯酸酯類;苯氧基乙基(甲基)丙烯酸酯、雙酚A之聚乙氧基二(甲基)丙烯酸酯等的酚類之環氧乙烷或者環氧丙烷加成物之(甲基)丙烯酸酯類;甘油二縮水甘油醚、三羥甲基丙烷三甘油醚、三縮水甘油異氰脲酸酯等的甘油醚之(甲基)丙烯酸酯類;及三聚氰胺(甲基)丙烯酸酯等。該等之中,就反應性、稀釋性之方面而言,較佳為液狀者。[(C) Reactive diluent] The (C) reactive diluent used in the present invention is used to adjust the viscosity of the composition to improve workability, to increase the cross-linking density, and to obtain a coating film having adhesion and the like. Examples of the compound having one or more unsaturated double bonds in one molecule of the reactive diluent system (C) include: (meth)acrylic acid 2-ethylhexyl, (meth)acrylic acid cyclohexyl (meth)acrylic acid alkyl esters such as esters; (meth)acrylic acid hydroxyalkyl esters such as (meth)acrylic acid-2-hydroxyethyl ester and (meth)acrylic acid-2-hydroxypropyl ester; ethanol Mono- or di(meth)acrylates of alkylene oxide derivatives such as glycol, propylene glycol, diethylene glycol, dipropylene glycol, etc.; hexylene glycol, trimethylolpropane, pentaerythritol, ditrimethylolpropane, Polyhydric alcohols such as dipentaerythritol and hydroxyethyl isocyanurate or poly(meth)acrylates of such ethylene oxide or propylene oxide adducts; phenoxyethyl (methyl) Acrylates, polyethoxy di(meth)acrylate of bisphenol A and other phenols, (meth)acrylates of ethylene oxide or propylene oxide adducts; glyceryl diglycidyl ether, triglyceryl ether, etc. (meth)acrylate esters of glyceryl ethers such as hydroxymethylpropane triglyceryl ether and triglycidyl isocyanurate; and melamine (meth)acrylate, etc. Among these, liquid ones are preferred in terms of reactivity and dilution properties.
又,亦可將1分子中具有不飽和雙鍵,且進而具有羧基的化合物使用來作為(C)反應性稀釋劑。作為如此般的化合物,可使用飽和或不飽和二元酸酐與1分子中具有1個羥基的(甲基)丙烯酸酯類的反應物,例如,將琥珀酸酐、馬來酸酐、鄰苯二甲酸酐、四氫鄰苯二甲酸酐、六氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、甲基四氫鄰苯二甲酸酐、伊康酸酐、甲基內亞甲基四氫鄰苯二甲酸酐等的飽和或不飽和二元酸酐,與(甲基)丙烯酸羥基乙酯、(甲基)丙烯酸羥基丙酯、(甲基)丙烯酸羥基丁酯、聚乙二醇單(甲基)丙烯酸酯、甘油二(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、苯基甘油醚之(甲基)丙烯酸酯等的1分子中具有1個羥基的(甲基)丙烯酸酯類,以等莫耳比進行反應而得到的半酯類。該等的(C)反應性稀釋劑,可使用單獨或可組合2種以上來使用。Moreover, a compound which has an unsaturated double bond in one molecule and further has a carboxyl group can also be used as (C) a reactive diluent. As such a compound, a reaction product of a saturated or unsaturated dibasic acid anhydride and a (meth)acrylic acid ester having one hydroxyl group per molecule can be used. For example, succinic anhydride, maleic anhydride, and phthalic anhydride can be used. , tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, itaconic anhydride, methylendomethylenetetrahydrophthalic anhydride Saturated or unsaturated dibasic acid anhydrides such as phthalic anhydride, and hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, hydroxybutyl (meth)acrylate, polyethylene glycol mono(methyl) )acrylate, glyceryl di(meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol penta(meth)acrylate, phenylglyceryl ether Half-esters obtained by reacting (meth)acrylates such as (meth)acrylates with one hydroxyl group per molecule at an equal molar ratio. These (C) reactive diluents can be used alone or in combination of two or more types.
又,(C)反應性稀釋劑的含有量,就所形成的塗膜的性質及感度之觀點而言,相對於(A)鹼可溶性樹脂,較佳為大約2~60質量%的範圍,又較佳為10~40質量%的範圍。In addition, the content of (C) the reactive diluent is preferably in the range of approximately 2 to 60% by mass relative to the (A) alkali-soluble resin from the viewpoint of the properties and sensitivity of the formed coating film, and The preferred range is 10 to 40% by mass.
[(D)熱硬化性樹脂] 作為(D)熱硬化性樹脂,可舉例如多官能環氧化合物、多官能氧雜環丁烷化合物、環硫化物樹脂等分子中具有2個以上的環狀醚基及/或環狀硫醚基、聚異氰酸酯化合物、嵌段異氰酸酯化合物等1分子內具有2個以上的異氰酸酯基、或嵌段化異氰酸酯基的化合物、三聚氰胺樹脂、苯并胍胺樹脂等的胺樹脂與其衍生物、雙馬來醯亞胺、噁嗪、環碳酸酯化合物、碳二亞胺樹脂等的周知的熱硬化性樹脂。[(D) Thermosetting resin] Examples of (D) thermosetting resins include polyfunctional epoxy compounds, polyfunctional oxetane compounds, episulfide resins, and the like having two or more cyclic ether groups and/or cyclic thioethers in the molecule. groups, compounds having two or more isocyanate groups or blocked isocyanate groups in one molecule, such as polyisocyanate compounds and blocked isocyanate compounds, amine resins such as melamine resin and benzoguanamine resin and their derivatives, bismale Well-known thermosetting resins such as acyl imine, oxazine, cyclic carbonate compound, and carbodiimide resin.
作為環氧樹脂係可使用1分子中具有至少2個環氧基的周知慣用的多官能環氧樹脂。環氧樹脂係可為液狀、亦可為固體或半固體。作為多官能環氧樹脂,可舉出雙酚A型環氧樹脂;溴化環氧樹脂;酚醛型環氧樹脂;雙酚F型環氧樹脂;氫化雙酚A型環氧樹脂;縮水甘油胺型環氧樹脂;乙內醯脲型環氧樹脂;脂環式環氧樹脂;三羥基甲苯型環氧樹脂;聯二甲酚型或者聯苯型環氧樹脂或此等的混合物;雙酚S型環氧樹脂;雙酚A酚醛型環氧樹脂;四羥苯基乙烷型環氧樹脂;複素環式環氧樹脂;鄰苯二甲酸二縮水甘油酯樹脂;四縮水甘油基二甲苯基乙烷樹脂;萘基含有環氧樹脂;具有二環戊二烯骨架的環氧樹脂;縮水甘油甲基丙烯酸酯共聚合系環氧樹脂;環己基馬來醯亞胺與縮水甘油甲基丙烯酸酯的共聚合環氧樹脂;環氧改質的聚丁二烯橡膠衍生物;CTBN改質環氧樹脂等,但並非被限於該等中。作為環氧樹脂係較佳為雙酚A型或雙酚F型的酚醛型環氧樹脂、聯二甲酚型環氧樹脂、聯苯型環氧樹脂、聯苯酚醛型(聯苯基芳烷基型)環氧樹脂、萘型環氧樹脂或此等的混合物。As the epoxy resin system, a well-known and commonly used polyfunctional epoxy resin having at least two epoxy groups in one molecule can be used. Epoxy resins can be liquid, solid or semi-solid. Examples of polyfunctional epoxy resins include bisphenol A-type epoxy resin; brominated epoxy resin; novolac-type epoxy resin; bisphenol F-type epoxy resin; hydrogenated bisphenol A-type epoxy resin; and glycidylamine type epoxy resin; hydantoin type epoxy resin; alicyclic epoxy resin; trihydroxytoluene type epoxy resin; dixylenol type or biphenyl type epoxy resin or mixtures thereof; bisphenol S type epoxy resin; bisphenol A novolac epoxy resin; tetrahydroxyphenyl ethane type epoxy resin; complex cyclic epoxy resin; diglycidyl phthalate resin; tetraglycidyl xylyl ethane Alkane resin; naphthyl-containing epoxy resin; epoxy resin with dicyclopentadiene skeleton; glycidyl methacrylate copolymer epoxy resin; cyclohexyl maleimide and glycidyl methacrylate Copolymerized epoxy resin; epoxy modified polybutadiene rubber derivatives; CTBN modified epoxy resin, etc., but are not limited to these. As the epoxy resin system, preferred are bisphenol A type or bisphenol F type novolac type epoxy resin, dixylenol type epoxy resin, biphenyl type epoxy resin, biphenyl novolac type (biphenyl aralkane) base type) epoxy resin, naphthalene type epoxy resin or a mixture of these.
其中,就提升解析性·耐光性之觀點而言,較佳為具有氫化型環狀骨架的環氧樹脂。Among them, from the viewpoint of improving resolution and light resistance, an epoxy resin having a hydrogenated cyclic skeleton is preferred.
作為具有氫化型環狀骨架的環氧樹脂,可舉例如Mitsubishi Chemical製的YX-8000、YX-8034、YX-8040、新日鐵化學製的ST-3000、ST-4000D、ADEKA製的EP-4080等。Examples of the epoxy resin having a hydrogenated cyclic skeleton include YX-8000, YX-8034, and YX-8040 manufactured by Mitsubishi Chemical, ST-3000, ST-4000D manufactured by Nippon Steel Chemical, and EP- 4080 etc.
如以上說明般的(D)熱硬化性樹脂的含有量,相對於(A)鹼可溶性樹脂,較佳為大約30~90質量%的範圍,又較佳為40~70質量%的範圍。As explained above, the content of (D) thermosetting resin relative to (A) alkali-soluble resin is preferably in the range of about 30 to 90 mass %, and more preferably in the range of 40 to 70 mass %.
[(E)原酸酯化合物] 本發明中所發現的(E)原酸酯化合物,其不會與基材或印墨成分進行反應,且將含有此者的防焊組成物塗佈於基板上後,在最初的乾燥步驟中則會揮發,而不會殘留於組成物中。因此,不僅能夠抑制(B)具有肟鍵的光聚合起始劑的鈍化,亦具有下述之優點:「未有對於顯影性或硬化皮膜的特性帶來不良影響之虞慮」。 既如上述般般,本發明中,(E)原酸酯化合物與(B)具有肟鍵的光聚合起始劑係一起摻合至相同系內。[(E) Orthoester compound] The (E) orthoester compound discovered in the present invention does not react with the substrate or ink components, and after the solder resist composition containing it is coated on the substrate, in the initial drying step It will evaporate and will not remain in the composition. Therefore, not only can the passivation of (B) the photopolymerization initiator having an oxime bond be suppressed, but there is also the following advantage: "There is no concern about adversely affecting the developability or the characteristics of the cured film." As described above, in the present invention, (E) the orthoester compound and (B) the photopolymerization initiator system having an oxime bond are blended into the same system.
作為本發明中所使用的(E)原酸酯化合物,較佳為例如原甲酸三甲酯、原甲酸三乙酯、原甲酸三丙酯、原甲酸三丁酯、原乙酸三甲酯、原乙酸三乙酯、原乙酸三丙酯、原乙酸三丁酯、原丙酸三甲酯、原丙酸三乙酯、原丙酸丙酯、原丙酸丁酯。 其中,又較佳為原甲酸三甲酯、原甲酸三乙酯及原乙酸三乙酯,最佳為原甲酸三乙酯。Preferable examples of the (E) orthoester compound used in the present invention include trimethyl orthoformate, triethyl orthoformate, tripropyl orthoformate, tributyl orthoformate, trimethyl orthoacetate, and orthoformate. Triethyl acetate, tripropyl orthoacetate, tributyl orthoacetate, trimethyl orthopropionate, triethyl orthopropionate, propyl orthopropionate, butyl orthopropionate. Among them, trimethyl orthoformate, triethyl orthoformate, and triethyl orthoacetate are more preferred, and triethyl orthoformate is most preferred.
(E)原酸酯化合物,就有效率地發揮該性能之方面而言,二液系的組成物之中,相對於硬化劑組成物的總量,較佳以1~10質量%的範圍的量來含有(E)原酸酯化合物,又較佳為3~6質量%的範圍的量。(E) The orthoester compound is preferably in the range of 1 to 10% by mass relative to the total amount of the hardener composition in the two-component system in order to efficiently exhibit the performance. The amount of the (E) orthoester compound is preferably contained in an amount in the range of 3 to 6 mass %.
[著色劑] 作為著色劑能夠使用周知者。又,著色劑係可使用單獨1種、亦可組合2種以上來使用。[colorant] As the colorant, well-known ones can be used. Moreover, the colorant system may be used individually by 1 type, and may be used in combination of 2 or more types.
作為著色劑係可使用紅、藍、綠、黃、白、黑等的慣用周知的著色劑,亦可為顏料、染料、色素中之任意。更具體而言,作為著色劑,可舉出編列如下述般的色指數號碼(C.I.;染料及色彩師學會(The Society of Dyers and Colourists)發行)者。As the colorant, commonly known colorants such as red, blue, green, yellow, white, and black can be used, and any of pigments, dyes, and pigments can be used. More specifically, examples of colorants include those listed below with a color index number (C.I.; issued by The Society of Dyers and Colourists).
作為紅色著色劑係有單偶氮系、雙偶氮系、偶氮色澱系、苯并咪唑酮系、苝系、吡咯并吡咯二酮系、縮合偶氮系、蒽醌系、喹吖酮系等。作為藍色著色劑係有酞青素系、蒽醌系等,顏料系係可使用被分類成顏料(pigment)的化合物。除該等以外亦可使用金屬取代或者無取代的酞青素化合物。作為綠色著色劑係相同有酞青素系、蒽醌系、苝系。除該等以外,亦可使用金屬取代或者無取代的酞青素化合物。作為黃色著色劑係有單偶氮系、雙偶氮系、縮合偶氮系、苯并咪唑酮系、異吲哚啉酮系、蒽醌系等。作為白色著色劑可舉出金紅石型或銳鈦礦型二氧化鈦等。作為黑色著色劑係有碳黑系、黑鉛系、氧化鐵系、鈦黑、氧化鐵、蒽醌系、氧化鈷系、氧化銅系、錳系、氧化銻系、氧化鎳系、苝系、苯胺系、硫化鉬、硫化鉍等。其他,依調整色調之目的,亦可加入紫、橙、茶色等的著色劑。Red colorants include monoazo series, disazo series, azo lake series, benzimidazolone series, perylene series, diketopyrrolopyrrole series, condensed azo series, anthraquinone series, and quinacridone series Department etc. Examples of blue colorants include phthalocyanine-based and anthraquinone-based colorants. For pigment-based colorants, compounds classified as pigments can be used. In addition to these, metal-substituted or unsubstituted phthalocyanin compounds can also be used. Green colorants include phthalocyanin-based, anthraquinone-based, and perylene-based colorants. In addition to these, metal-substituted or unsubstituted phthalocyanin compounds may also be used. Examples of the yellow colorant system include monoazo system, disazo system, condensed azo system, benzimidazolone system, isoindolinone system, anthraquinone system, etc. Examples of the white colorant include rutile type or anatase type titanium dioxide. Black colorants include carbon black, black lead, iron oxide, titanium black, iron oxide, anthraquinone, cobalt oxide, copper oxide, manganese, antimony oxide, nickel oxide, perylene, Aniline series, molybdenum sulfide, bismuth sulfide, etc. In addition, depending on the purpose of adjusting the color tone, purple, orange, brown, etc. colorants can also be added.
若將本發明的硬化性樹脂組成物使用作為防焊組成物之情形時,著色劑的含有量,相對於本發明的硬化性樹脂組成物總量,以固成分換算為0.03~7質量%,又較佳為0.05質量%~5質量%。When the curable resin composition of the present invention is used as a solder resist composition, the content of the colorant is 0.03 to 7 mass % in terms of solid content relative to the total amount of the curable resin composition of the present invention. More preferably, it is 0.05% by mass to 5% by mass.
於此,由於本發明的硬化性樹脂組成物能夠抑制(B)具有肟鍵的光聚合起始劑的鈍化,故可適合用於使用高感度的光聚合起始劑的黑色遮蔽劑等中。 若將本發明的硬化性樹脂組成物使用作為黑色遮蔽劑等之情形時,著色劑的含有量,就提升硬化物的隠蔽性之觀點而言,相對於本發明的硬化性樹脂組成物總量,以固成分換算為5~50質量%來含有著色劑時,可兼具遮蔽性與解析性,故為較佳。又較佳為10質量%~30質量%。 若將本發明的硬化性樹脂組成物使用作為黑色遮蔽劑等之情形時,作為著色劑係較佳為包含碳黑,以併用碳黑與混色黑系著色劑為佳。特別是併用碳黑與混色黑系著色劑之情形時,碳黑對於硬化性樹脂組成物總量係較佳為:以固成分換算並將碳黑設為4~10質量%、且將混色黑系著色劑設為8~20質量%。Here, since the curable resin composition of the present invention can suppress the passivation of (B) the photopolymerization initiator having an oxime bond, it can be suitably used in black masking agents and the like using a highly sensitive photopolymerization initiator. When the curable resin composition of the present invention is used as a black masking agent, etc., the content of the colorant, from the viewpoint of improving the masking properties of the cured product, is greater than the total amount of the curable resin composition of the present invention. , when the colorant is contained at 5 to 50% by mass in terms of solid content, it is preferable because it can achieve both masking and analytical properties. More preferably, it is 10 mass % to 30 mass %. When the curable resin composition of the present invention is used as a black masking agent or the like, the colorant system preferably contains carbon black, and it is preferable to use carbon black and a mixed black colorant in combination. Especially when using carbon black and a mixed black colorant in combination, the total amount of carbon black in the curable resin composition is preferably 4 to 10% by mass in terms of solid content, and the mixed black is preferably The system colorant is set to 8 to 20% by mass.
尚,所謂的混色黑系著色劑,係表示為了成為黑色或接近黑色的顏色來混合紅色著色劑、藍色著色劑、綠色著色劑、黃色著色劑、紫色著色劑、橙色著色劑等的著色劑而所得到的著色劑。混色黑系著色劑係較佳為預先混合各著色劑後再添加於樹脂組成物中,亦可將構成混色黑系著色劑的各著色劑個別地添加於樹脂組成物中。Furthermore, the so-called mixed black colorant refers to a colorant in which a red colorant, a blue colorant, a green colorant, a yellow colorant, a purple colorant, an orange colorant, etc. are mixed in order to obtain black or a color close to black. And the colorant obtained. In the mixed black colorant system, it is preferable to mix each colorant in advance and then add it to the resin composition. Each colorant constituting the mixed black colorant may be added to the resin composition individually.
[其他的成分] 本發明的硬化性樹脂組成中,於不超出本發明目的之範圍內,因應所需當然能夠進而摻合添加劑來作為其他的成分。 作為如此般的成分,可舉例如除(B)具有肟鍵的光聚合起始劑以外的光聚合起始劑、溶劑、熱聚合抑制劑、紫外線吸收劑、偶合劑、可塑劑、阻燃劑、防靜電劑、防老化劑、抗菌·防黴劑、流平劑、增稠劑、密著性賦予劑、搖變減黏性質賦予劑、光起始助劑、增感劑、光鹼產生劑、熱可塑性樹脂、彈性體、胺基甲酸酯珠等的有機填充劑、無機填充劑、脫模劑、表面處理劑、分散劑、分散助劑、表面改質劑、穩定劑、螢光體、纖維素樹脂等。[Other ingredients] In the curable resin composition of the present invention, it is of course possible to further incorporate additives as other components as necessary within the scope of the purpose of the present invention. Examples of such components include photopolymerization initiators other than (B) the photopolymerization initiator having an oxime bond, solvents, thermal polymerization inhibitors, ultraviolet absorbers, coupling agents, plasticizers, and flame retardants. , antistatic agent, anti-aging agent, antibacterial and antifungal agent, leveling agent, thickener, adhesion imparting agent, thixotropic viscosity reducing property imparting agent, photoinitiating additive, sensitizer, photobase generator Organic fillers, inorganic fillers, release agents, surface treatment agents, dispersants, dispersion aids, surface modifiers, stabilizers, fluorescent agents, thermoplastic resins, elastomers, urethane beads, etc. body, cellulose resin, etc.
[硬化物] 使用本發明的硬化性組成物來形成硬化物時,將該組成物塗佈於基板上,將溶劑揮發乾燥後,對於所得到的樹脂層進行曝光(光照射),藉此來使曝光部(經光照射的部分)硬化。具體而言,依據接觸式或非接觸方式,藉由通過形成有圖型的光罩並利用選擇性的活性能量射線來進行曝光、或者使用雷射直接曝光機來進行直接圖型曝光,以鹼性水溶液(例如0.3~3質量%碳酸鈉水溶液)來將未曝光部進行顯影,從而形成阻劑圖型。進一步,藉由加熱至約100~180℃的溫度來使其熱硬化(後硬化),而可形成耐熱性、耐藥品性、耐吸濕性、密著性、電氣特性等的諸特性為優異的硬化皮膜(硬化物)。[hardened material] When forming a cured product using the curable composition of the present invention, the composition is applied on a substrate, and after the solvent is evaporated and dried, the obtained resin layer is exposed (light irradiation), whereby the exposed portion ( The part exposed to light) is hardened. Specifically, according to the contact or non-contact method, by forming a patterned mask and using selective active energy rays for exposure, or using a laser direct exposure machine for direct pattern exposure, with alkali Aqueous solution (such as 0.3~3% by mass sodium carbonate aqueous solution) is used to develop the unexposed parts to form a resist pattern. Furthermore, by heating to a temperature of about 100 to 180°C and thermally hardening (post-hardening), it is possible to develop excellent properties such as heat resistance, chemical resistance, moisture absorption resistance, adhesion, and electrical properties. Hardened film (hardened material).
[電子零件] 又,本發明亦提供具有上述硬化物的電子零件。 藉由使用本發明的硬化性樹脂組成物,從而可提供品質、耐久性及可靠性為高的電子零件。 尚,本發明中所謂的電子零件,係指電子電路中使用的零件之涵義,除印刷配線板、電晶體、發光二極體、雷射二極體等的主動零件之外,亦包含電阻、電容器、電感器、連接器等的被動零件。[Electronic parts] Furthermore, the present invention also provides electronic components having the above-mentioned hardened material. By using the curable resin composition of the present invention, electronic components with high quality, durability, and reliability can be provided. However, the so-called electronic components in the present invention refer to components used in electronic circuits. In addition to active components such as printed wiring boards, transistors, light-emitting diodes, laser diodes, etc., they also include resistors, Passive parts of capacitors, inductors, connectors, etc.
[本發明的硬化性樹脂組成物的製造及使用方法] 本發明的硬化性樹脂組成物,可藉由如下述般來進行調製:將分別的主劑組成物及硬化劑組成物的成分,以指定量,使用例如3輥磨機等來進行混合分散,而調製成該等的2種的組成物,然後,在使用時再混合該等2種的組成物。[Production and use methods of the curable resin composition of the present invention] The curable resin composition of the present invention can be prepared by mixing and dispersing the components of the main component composition and the curing agent composition in designated amounts using, for example, a three-roller mill, etc. The two types of compositions are prepared, and then the two types of compositions are mixed during use.
使用本發明的硬化性樹脂組成物來形成塗膜時,可藉由如下述般之進行來完成。 首先,將硬化性樹脂組成物塗佈於基板上,將溶劑揮發乾燥後,對於所得到的樹脂層進行曝光(光照射),藉此來使曝光部(經光照射的部分)硬化。具體而言,依據接觸式或非接觸方式,藉由通過形成有圖型的光罩並利用選擇性的活性能量射線來進行曝光、或者使用雷射直接曝光機來進行直接圖型曝光。之後,以鹼性水溶液(例如0.3~3質量%碳酸鈉水溶液)來將未曝光部進行顯影,從而形成阻劑圖型。進一步,藉由加熱至約100~180℃的溫度來使其熱硬化(後硬化),而可形成耐熱性、耐藥品性、耐吸濕性、密著性、電氣特性等的諸特性為優異的硬化皮膜。When forming a coating film using the curable resin composition of the present invention, it can be completed as follows. First, a curable resin composition is applied on a substrate, and after the solvent is evaporated and dried, the obtained resin layer is exposed (light irradiation) to harden the exposed portion (light irradiation portion). Specifically, according to the contact or non-contact method, exposure is performed by forming a patterned mask and using selective active energy rays, or direct pattern exposure is performed using a laser direct exposure machine. After that, the unexposed portion is developed with an alkaline aqueous solution (for example, 0.3 to 3 mass % sodium carbonate aqueous solution) to form a resist pattern. Furthermore, by heating to a temperature of about 100 to 180°C and thermally hardening (post-hardening), it is possible to develop excellent properties such as heat resistance, chemical resistance, moisture absorption resistance, adhesion, and electrical properties. Sclerotic membrane.
於此,本發明的硬化性樹脂組成物,例如,利用有機溶劑來調整成適合於塗佈方法的黏度,並藉由浸漬塗佈法、流動塗佈法、滾筒塗佈法、棒塗佈法、網版印刷法、簾塗型塗佈法等的方法塗佈於基材上後,以約60~100℃的溫度來使組成物中所包含的有機溶劑揮發乾燥(預乾燥),藉此亦可形成指觸乾燥的樹脂層。Here, the curable resin composition of the present invention is, for example, adjusted to a viscosity suitable for the coating method using an organic solvent, and the curable resin composition is prepared by a dip coating method, a flow coating method, a roller coating method, or a rod coating method. After coating on the substrate by methods such as screen printing, curtain coating, etc., the organic solvent contained in the composition is evaporated and dried (pre-drying) at a temperature of approximately 60 to 100°C. A resin layer that is dry to the touch can also be formed.
作為基材,除了預先藉由銅等來形成電路的印刷配線板或可撓性印刷配線板之外,亦可舉出使用苯酚紙、環氧紙、環氧玻璃布、玻璃聚醯亞胺、玻璃布/環氧不織布、玻璃布/環氧紙、環氧合成纖維、氟樹脂·聚乙烯·聚苯醚、聚苯醚·氰酸酯等的用於高周波電路用的貼銅層合板等的材質的全部等級(FR-4等)的貼銅層合板,其他可舉出金屬基板、聚醯亞胺薄膜、PET薄膜、聚萘二甲酸乙二酯(PEN)薄膜、玻璃基板、陶瓷基板、晶圓板等。As the base material, in addition to a printed wiring board or a flexible printed wiring board in which a circuit is formed with copper or the like in advance, phenol paper, epoxy paper, epoxy glass cloth, glass polyimide, Glass cloth/epoxy nonwoven fabric, glass cloth/epoxy paper, epoxy synthetic fiber, fluororesin, polyethylene, polyphenylene ether, polyphenylene ether, cyanate ester, etc. for copper-clad laminates for high-frequency circuits, etc. Copper-clad laminates of all grades of material (FR-4, etc.), and other examples include metal substrates, polyimide films, PET films, polyethylene naphthalate (PEN) films, glass substrates, ceramic substrates, Wafer board etc.
揮發乾燥或熱硬化係可使用例如熱風循環式乾燥爐、IR爐、加熱板、對流烤箱等(使用具備有藉由蒸氣之空氣加熱方式的熱源並使乾燥機內的熱風以對向流接觸之方法及藉由噴嘴吹附於支撐體之方式)來進行。For volatilization drying or thermal hardening, for example, hot air circulation drying ovens, IR ovens, hot plates, convection ovens, etc. can be used (using a heat source with an air heating method by steam and making the hot air in the dryer contact with counter flow) method and by blowing it onto the support through a nozzle).
作為使用於活性能量射線照射的曝光機,只要是搭載高壓水銀燈、超高壓水銀燈、金屬鹵素燈、水銀短弧燈等,並在350~450nm的範圍內來照射紫外線的裝置即可,進而亦可使用直接描繪裝置(例如藉由來自電腦的CAD數據並利用直接雷射來描繪圖像的雷射直接成像裝置)。作為直接描繪機的燈光源或雷射光源,最大波長只要是350~410nm的範圍內即可。用來形成圖像的曝光量會依膜厚等而有所不同,但一般為20~2000mJ/cm2 ,較佳可設為20~1500mJ/cm2 的範圍內。As an exposure machine used for active energy ray irradiation, any device equipped with a high-pressure mercury lamp, an ultra-high-pressure mercury lamp, a metal halide lamp, a mercury short-arc lamp, etc., and which irradiates ultraviolet rays in the range of 350 to 450 nm can be used. Use a direct rendering device (such as a laser direct imaging device that uses CAD data from a computer to draw an image using a direct laser). As the light source or laser light source of the direct drawing machine, the maximum wavelength only needs to be in the range of 350~410nm. The amount of exposure used to form an image varies depending on the film thickness, etc., but is generally 20~2000mJ/ cm2 , and preferably can be set within the range of 20~1500mJ/ cm2 .
作為顯影方法,可藉由浸漬法、冲洗法、噴霧法、刷式法等;作為顯影液,可使用氫氧化鉀、氫氧化鈉、碳酸鈉、碳酸鉀、磷酸鈉、矽酸鈉、氨、胺類等的鹼性水溶液。 [實施例]As a developing method, dipping method, rinsing method, spray method, brush method, etc. can be used; as a developing solution, potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium phosphate, sodium silicate, ammonia, Alkaline aqueous solutions of amines, etc. [Example]
以下為表示實施例及比較例來對於本發明進行具體的說明,本發明並不被限定於下述的實施例中係無須贅述。 尚,除非另有說明,所表示的「份」及「%」係基於質量而設定者。The present invention will be specifically described below by showing examples and comparative examples. However, the present invention is not limited to the following examples and there is no need to elaborate further. However, unless otherwise stated, the "parts" and "%" expressed are based on mass.
如同下述之方式來製作含有主劑組成物及硬化劑組成物的二液系的硬化性樹脂組成物。A two-component curable resin composition containing a main component composition and a curing agent composition is produced in the following manner.
實施例1 將鹼可溶性樹脂100份、光聚合起始劑7.2份、添加劑3.8份、反應性稀釋劑28.6份、溶劑A553.3份、碳黑10.0份、苝紅10.0份及酞青素藍10.0份利用3輥磨機進行混合分散,而得到實施例1的主劑組成物。 另一方面,將熱硬化性樹脂56.7份、具有肟鍵的光聚合起始劑A4.0份、溶劑B20.0份及原甲酸三甲酯4.0份利用3輥磨機進行混合分散,而得到實施例1的硬化劑組成物。Example 1 Utilize 100 parts of alkali-soluble resin, 7.2 parts of photopolymerization initiator, 3.8 parts of additives, 28.6 parts of reactive diluent, 3.3 parts of solvent A555, 10.0 parts of carbon black, 10.0 parts of perylene red and 10.0 parts of phthalocyanine blue 3 A roller mill was used for mixing and dispersion, and the main ingredient composition of Example 1 was obtained. On the other hand, 56.7 parts of thermosetting resin, 4.0 parts of photopolymerization initiator A having an oxime bond, 20.0 parts of solvent B, and 4.0 parts of trimethyl orthoformate were mixed and dispersed using a three-roller mill to obtain Hardener composition of Example 1.
實施例2 藉由與實施例1相同之方法來得到實施例2的主劑組成物。 另一方面,除了將原甲酸三甲酯更換為原甲酸三乙酯之外,其餘藉由與實施例1相同之方法來得到實施例2的硬化劑組成物。Example 2 The main ingredient composition of Example 2 was obtained by the same method as Example 1. On the other hand, the hardener composition of Example 2 was obtained by the same method as Example 1, except that trimethyl orthoformate was replaced with triethyl orthoformate.
實施例3 藉由與實施例1相同之方法來得到實施例3的主劑組成物。 另一方面,除了將原甲酸三甲酯更換為原乙酸三乙酯之外,其餘藉由與實施例1相同之方法來得到實施例3的硬化劑組成物。Example 3 The main ingredient composition of Example 3 was obtained by the same method as Example 1. On the other hand, the hardener composition of Example 3 was obtained by the same method as Example 1, except that trimethyl orthoformate was replaced with triethyl orthoacetate.
實施例4 藉由與實施例1相同之方法來得到實施例4的主劑組成物。 另一方面,除了將具有肟鍵的光聚合起始劑A更換為具有肟鍵的光聚合起始劑B之外,其餘藉由與實施例1相同之方法來得到實施例4的硬化劑組成物。Example 4 The main ingredient composition of Example 4 was obtained by the same method as Example 1. On the other hand, except that the photopolymerization initiator A having an oxime bond was replaced with the photopolymerization initiator B having an oxime bond, the hardener composition of Example 4 was obtained in the same manner as in Example 1. things.
實施例5 藉由與實施例1相同之方法來得到實施例5的主劑組成物。 另一方面,除了將具有肟鍵的光聚合起始劑A更換為具有肟鍵的光聚合起始劑B之外,其餘藉由與實施例2相同之方法來得到實施例5的硬化劑組成物。Example 5 The main ingredient composition of Example 5 was obtained by the same method as Example 1. On the other hand, except that the photopolymerization initiator A having an oxime bond was replaced with the photopolymerization initiator B having an oxime bond, the hardener composition of Example 5 was obtained in the same manner as in Example 2. things.
實施例6 藉由與實施例1相同之方法來得到實施例6的主劑組成物。 另一方面,除了將具有肟鍵的光聚合起始劑A更換為具有肟鍵的光聚合起始劑B之外,其餘藉由與實施例3相同之方法來得到實施例6的硬化劑組成物。Example 6 The main ingredient composition of Example 6 was obtained by the same method as Example 1. On the other hand, except that the photopolymerization initiator A having an oxime bond was replaced with the photopolymerization initiator B having an oxime bond, the hardener composition of Example 6 was obtained in the same manner as in Example 3. things.
實施例7 藉由與實施例1相同之方法來得到實施例6的主劑組成物。 另一方面,除了將原甲酸三乙酯更換為0.8份之外,其餘藉由與實施例2相同之方法來得到實施例7的硬化劑組成物。Example 7 The main ingredient composition of Example 6 was obtained by the same method as Example 1. On the other hand, the hardener composition of Example 7 was obtained by the same method as Example 2, except that triethyl orthoformate was replaced with 0.8 parts.
實施例8 藉由與實施例1相同之方法來得到實施例6的主劑組成物。 另一方面,除了將原甲酸三乙酯更換為9.0份之外,其餘藉由與實施例2相同之方法來得到實施例7的硬化劑組成物。Example 8 The main ingredient composition of Example 6 was obtained by the same method as Example 1. On the other hand, except that triethyl orthoformate was replaced with 9.0 parts, the hardener composition of Example 7 was obtained by the same method as Example 2.
比較例1 將鹼可溶性樹脂100份、光聚合起始劑7.2份、添加劑3.8份、反應性稀釋劑28.6份、溶劑A553.3份、碳黑10.0份、苝紅10.0份及酞青素藍10.0份利用3輥磨機進行混合分散,而得到比較例1的主劑組成物。 另一方面,將熱硬化性樹脂56.7份、具有肟鍵的光聚合起始劑A4.0份及溶劑B20.0份利用3輥磨機進行混合分散,而得到比較例1的硬化劑組成物。Comparative example 1 Utilize 100 parts of alkali-soluble resin, 7.2 parts of photopolymerization initiator, 3.8 parts of additives, 28.6 parts of reactive diluent, 3.3 parts of solvent A555, 10.0 parts of carbon black, 10.0 parts of perylene red and 10.0 parts of phthalocyanine blue 3 The mixture was mixed and dispersed using a roller mill to obtain the main ingredient composition of Comparative Example 1. On the other hand, 56.7 parts of the thermosetting resin, 4.0 parts of the photopolymerization initiator A having an oxime bond, and 20.0 parts of the solvent B were mixed and dispersed using a three-roll mill to obtain the hardener composition of Comparative Example 1. .
比較例2 藉由與比較例1相同之方法來得到比較例2的主劑組成物。 另一方面,除了將具有肟鍵的光聚合起始劑A的摻合量更換為8.0份之外,其餘藉由與比較例1相同之方法來得到比較例2的硬化劑組成物。Comparative example 2 The main ingredient composition of Comparative Example 2 was obtained by the same method as Comparative Example 1. On the other hand, the hardener composition of Comparative Example 2 was obtained in the same manner as Comparative Example 1, except that the blending amount of the photopolymerization initiator A having an oxime bond was changed to 8.0 parts.
比較例3 藉由與比較例1相同之方法來得到比較例3的主劑組成物。 另一方面,除了將具有肟鍵的光聚合起始劑A的摻合量更換為12.0份之外,其餘藉由與比較例1相同之方法來得到比較例3的硬化劑組成物。Comparative example 3 The main ingredient composition of Comparative Example 3 was obtained by the same method as Comparative Example 1. On the other hand, the hardener composition of Comparative Example 3 was obtained in the same manner as Comparative Example 1, except that the blending amount of the photopolymerization initiator A having an oxime bond was changed to 12.0 parts.
比較例4 藉由與比較例1相同之方法來得到比較例4的主劑組成物。 另一方面,除了將具有肟鍵的光聚合起始劑A更換為具有肟鍵的光聚合起始劑B之外,其餘藉由與比較例1相同之方法來得到比較例4的硬化劑組成物。Comparative example 4 The main ingredient composition of Comparative Example 4 was obtained by the same method as Comparative Example 1. On the other hand, the hardener composition of Comparative Example 4 was obtained by the same method as Comparative Example 1, except that the photopolymerization initiator A having an oxime bond was replaced with the photopolymerization initiator B having an oxime bond. things.
將該等實施例1~8及比較例1~4的組成表示於下述之表1中。 鹼可溶性樹脂:CyclomerP(ACA)Z250(Daicel股份有限公司)(具有脂環式骨架的含有羧基的丙烯酸共聚物) 光聚合起始劑:OmniradTPO(IGM Resins公司) 添加劑:BYK-361N(非離子系界面活性劑;BYK股份有限公司) 反應性稀釋劑:LR8863(EO改質三羥甲基丙烷三丙烯酸酯;BASF Japan股份有限公司) 溶劑A:Dowanol PM(丙二醇單甲基醚;Dow Chemical Japan股份有限公司) 碳黑:MA-100(碳黑,Mitsubishi Chemical股份有限公司) 苝紅(苝系紅色著色劑)(C.I.Pigment Red 149) 酞青素藍(酞青素系藍色著色劑)(C.I.Pigment Blue 15:3) 熱硬化性樹脂:YX-8034(氫化雙酚A型環氧樹脂;Mitsubishi Chemical股份有限公司) 具有肟鍵的光聚合起始劑A:TOE-04-A3(日本化學工業股份有限公司) 具有肟鍵的光聚合起始劑B:Irgacure OXE02(BASF Japan股份有限公司) 溶劑B:碳酸伸丙酯(Propylene Carbonate;關東化學股份有限公司)The compositions of Examples 1 to 8 and Comparative Examples 1 to 4 are shown in Table 1 below. Alkali-soluble resin: CyclomerP (ACA) Z250 (Daicel Co., Ltd.) (Carboxyl-containing acrylic copolymer with an alicyclic skeleton) Photopolymerization initiator: Omnirad TPO (IGM Resins) Additive: BYK-361N (nonionic system Surfactant; BYK Co., Ltd.) Reactive diluent: LR8863 (EO modified trimethylolpropane triacrylate; BASF Japan Co., Ltd.) Solvent A: Dowanol PM (propylene glycol monomethyl ether; Dow Chemical Japan Co., Ltd. Co., Ltd.) Carbon black: MA-100 (carbon black, Mitsubishi Chemical Co., Ltd.) Perylene red (perylene-based red colorant) (CIPigment Red 149) Phthalocyanine blue (phthalocyanin-based blue colorant) (CIPigment Blue 15:3) Thermosetting resin: YX-8034 (hydrogenated bisphenol A type epoxy resin; Mitsubishi Chemical Co., Ltd.) Photopolymerization initiator A with oxime bond: TOE-04-A3 (Nihon Chemical Industry Co., Ltd. Company) Photopolymerization initiator B having an oxime bond: Irgacure OXE02 (BASF Japan Co., Ltd.) Solvent B: Propylene Carbonate (Kanto Chemical Co., Ltd.)
試驗例 對於實施例1~8及比較例1~4的分別的硬化性樹脂組成物,由以50℃經放置7天前後的該等的樣品來製作塗膜,對於該等的塗膜進行關於感度之試驗,確認能以何種程度來抑制具有肟鍵的光聚合起始劑的鈍化。Test example For the respective curable resin compositions of Examples 1 to 8 and Comparative Examples 1 to 4, coating films were prepared from the samples left at 50°C for 7 days, and the sensitivity of the coating films was measured. A test was conducted to confirm to what extent the passivation of the photopolymerization initiator having an oxime bond can be suppressed.
試驗方法 <塗膜之製作> 將所得到的實施例1~8及比較例1~4的個別的主劑組成物與硬化劑組成物充分混合後,藉由塗佈機以乾燥後的膜厚成為10μm之方式塗佈於玻璃基板上,之後,於熱風循環式乾燥爐中以80℃使其乾燥30分鐘來製作分別的塗膜(初期)。 另一方面,另外準備個別的主劑組成物及硬化劑組成物並分別於恆溫槽內以50℃經放置7天,對於該等組成物亦藉由與上述相同之方法,以經過混合及乾燥來製作塗膜(50℃7天後)。Test method <Preparation of coating film> The respective main component compositions and hardener compositions of the obtained Examples 1 to 8 and Comparative Examples 1 to 4 were thoroughly mixed, and then applied to the glass with a coater so that the film thickness after drying became 10 μm. Then, they were dried in a hot air circulation drying oven at 80° C. for 30 minutes to form separate coating films (initial stage). On the other hand, separately prepare separate main agent compositions and hardener compositions and place them in a constant temperature bath at 50°C for 7 days. These compositions are also mixed and dried in the same way as above. to make a coating film (after 7 days at 50°C).
<感度> 將Step Tablet(Kodak No.2)密著於乾燥後的分別的塗膜上,並使用金屬鹵素燈的曝光機,以1000mJ/cm2 的曝光量來進行曝光,藉由1質量%碳酸鈉水溶液,在噴霧壓0.2MPa下以30℃進行顯影1分鐘後,依據從Step Tablet所得到的殘留段數及光澤段數來評估感度。將結果表示於下述表2。 <Sensitivity> Adhere Step Tablet (Kodak No.2) to each dried coating film, and use a metal halide lamp exposure machine to expose at an exposure dose of 1000mJ/cm 2. By 1 mass% After developing the sodium carbonate aqueous solution at 30°C for 1 minute at a spray pressure of 0.2MPa, the sensitivity was evaluated based on the number of remaining segments and the number of glossy segments obtained from the Step Tablet. The results are shown in Table 2 below.
[OD值] 將利用上述塗膜之製作而製成的玻璃基材(初期、50℃7天後)的皮膜側朝向測定器並安裝在透過濃度計(SAKATA INX ENG公司製,型號:X-Rite 361T,光源波長:400~800nm)上,來進行OD值評估。評估基準係如下述般。 ○···OD值為超過4 △···OD值為3以上4以下 ×···OD值為未滿3[OD value] The film side of the glass base material (initial stage, 50°C and 7 days later) produced by the above-mentioned coating film production is facing the measuring device and mounted on a transmission density meter (manufactured by SAKATA INX ENG Co., Ltd., model: X-Rite 361T, light source Wavelength: 400~800nm) to evaluate the OD value. The evaluation criteria are as follows. ○···OD value is more than 4 △···OD value is above 3 and below 4 ×···OD value is less than 3
<結果> 關於感度,可得知實施例1~8皆有效地抑制了從初期的殘留段數及光澤段數,至以50℃經過7天後的該等的數值的減少。此係認為是藉由摻合(E)原酸酯化合物,而有效地抑制了具有肟鍵的光聚合起始劑的經時性鈍化之緣故。如此般地,可確認得知本發明的硬化性樹脂組成物在較嚴苛的條件下的保存穩定性為優異。 又,關於OD值的評估結果,雖然省略了在表2中的記載,但實施例1~8的初期的OD值及以50℃經過7天後的OD值,皆顯示出超過4(評估基準:〇)。 關於比較例1~4的OD值的評估結果,相同地省略了在表2中的記載,雖然關於初期的OD值為顯示出超過4(評估基準:〇),但以50℃經過7天後卻無法製成塗膜,故無法進行評估。 如此般地,由於本發明的硬化性樹脂組成物有效地抑制了具有肟鍵的光聚合起始劑的經時性鈍化,故初期的OD值及以50℃經過7天後的OD值亦未變化,可適合使用作為黑色遮蔽劑。<Result> Regarding the sensitivity, it can be seen that Examples 1 to 8 effectively suppressed the decrease in the number of remaining stages and the number of glossy stages from the initial stage to the decrease in these values after 7 days at 50°C. This is considered to be because the blending of the (E) orthoester compound effectively suppresses the time-dependent passivation of the photopolymerization initiator having an oxime bond. In this way, it was confirmed that the curable resin composition of the present invention has excellent storage stability under relatively severe conditions. In addition, although the description of the evaluation results of the OD value in Table 2 is omitted, the initial OD value of Examples 1 to 8 and the OD value after 7 days at 50°C both exceeded 4 (evaluation standard :〇). Regarding the evaluation results of the OD values of Comparative Examples 1 to 4, the description in Table 2 is similarly omitted. Although the initial OD value showed more than 4 (evaluation standard: 0), after 7 days at 50°C, However, a coating film could not be formed, so evaluation could not be carried out. In this way, since the curable resin composition of the present invention effectively suppresses the time-dependent passivation of the photopolymerization initiator having an oxime bond, the initial OD value and the OD value after 7 days at 50° C. are also unchanged. Variation, may be suitable for use as a black masking agent.
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