TWI804668B - Fluid Sterilization Device - Google Patents
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Abstract
本發明提供一種流體殺菌裝置,包括流路收容室、光源收容室及冷卻水路。流路收容室收容流路部,所述流路部具有用於流通流體的流路管及設置於流路管的外周朝流路管反射紫外線的反射板。光源收容室收容朝流路管內照射紫外線的光源。冷卻水路設置於光源收容室的周圍,流動冷卻水。而且,流路收容室具有用於從外部流通乾燥流體的連接口。而且,光源收容室具有用於從外部流通乾燥流體的連接口。本發明使零件的更換變得容易。The invention provides a fluid sterilizing device, which includes a flow channel storage room, a light source storage room and a cooling water channel. The flow path housing chamber accommodates a flow path portion having a flow path tube through which fluid flows and a reflection plate provided on an outer periphery of the flow path tube to reflect ultraviolet light toward the flow path tube. The light source housing chamber accommodates a light source for irradiating ultraviolet rays into the channel tube. The cooling water channel is arranged around the light source containing chamber, and flows cooling water. Furthermore, the flow channel storage chamber has a connection port through which the drying fluid flows from the outside. Furthermore, the light source housing chamber has a connection port through which a drying fluid flows from the outside. The invention facilitates replacement of parts.
Description
本發明是有關於一種流體殺菌裝置。The invention relates to a fluid sterilizing device.
已知有一種對流體進行殺菌的流體殺菌裝置,所述流體殺菌裝置藉由向流動有例如水、氣體等流體的流路構件的流路內照射作為光源的發光元件所發出的紫外線。在此種流體殺菌裝置中,存在形成有收容作為光源的發出紫外線的發光二極體(Light Emitting Diode,LED)的光源收容室及光源收容室的周圍的用於抑制LED的發熱的冷卻水路者。 [現有技術文獻] [專利文獻]There is known a fluid sterilizing device for sterilizing fluid by irradiating ultraviolet light emitted from a light emitting element as a light source into a flow path of a flow path member in which fluid such as water or gas flows. In such a fluid sterilizing device, there are a light source housing chamber that accommodates a light emitting diode (Light Emitting Diode, LED) that emits ultraviolet light as a light source, and a cooling water channel around the light source housing room for suppressing heat generation of the LED. . [Prior art literature] [Patent Document]
[專利文獻1]日本專利特開2014-233646號公報[Patent Document 1] Japanese Patent Laid-Open No. 2014-233646
[發明所欲解決之課題][Problem to be Solved by the Invention]
然而,在與光源收容室相比,流經冷卻水路的流體或要殺菌的流體的溫度低的情況下,存在於光源收容室或對流體進行殺菌的處理室中產生結露的可能性。因此,擔心光源的故障或處理室的殺菌性能劣化。However, if the temperature of the fluid flowing through the cooling water path or the fluid to be sterilized is lower than that of the light source housing chamber, dew condensation may occur in the light source housing chamber or the treatment chamber for sterilizing the fluid. Therefore, there is concern about failure of the light source or deterioration of the sterilization performance of the processing chamber.
本發明所要解決的課題是提供一種可維持殺菌性能的流體殺菌裝置。 [解決課題之手段]The problem to be solved by the present invention is to provide a fluid sterilizing device capable of maintaining sterilizing performance. [Means to solve the problem]
實施方式的流體殺菌裝置包括流路收容室、光源收容室及冷卻水路。所述流路收容室收容流路部,所述流路部具有用於流通流體的流路管及設置於所述流路管的外周朝所述流路管反射紫外線的反射板。所述光源收容室收容朝所述流路管內照射紫外線的光源。所述冷卻水路設置於所述光源收容室的周圍,並流動冷卻水。而且所述流路收容室具有用於從外部流通乾燥流體的連接口。A fluid sterilizing device according to an embodiment includes a flow channel storage room, a light source storage room, and a cooling water channel. The flow path housing chamber accommodates a flow path portion, and the flow path portion has a flow path tube through which fluid flows and a reflection plate provided on the outer periphery of the flow path tube to reflect ultraviolet rays toward the flow path tube. The light source housing chamber accommodates a light source for irradiating ultraviolet rays into the flow channel tube. The cooling water channel is arranged around the light source accommodation chamber, and flows cooling water. In addition, the flow channel storage chamber has a connection port through which the drying fluid flows from the outside.
另一實施方式的流體殺菌裝置包括流路收容室、光源收容室及冷卻水路。所述流路收容室收容流路部,所述流路部具有用於流通流體的流路管及設置於所述流路管的外周朝所述流路管反射紫外線的反射板。所述光源收容室收容朝所述流路管內照射紫外線的光源。所述冷卻水路設置於所述光源收容室的周圍,並流動冷卻水。而且,所述光源收容室具有用於從外部流通乾燥流體的連接口。Another embodiment of a fluid sterilizing device includes a flow channel storage room, a light source storage room, and a cooling water channel. The flow path housing chamber accommodates a flow path portion, and the flow path portion has a flow path tube through which fluid flows and a reflection plate provided on the outer periphery of the flow path tube to reflect ultraviolet rays toward the flow path tube. The light source housing chamber accommodates a light source for irradiating ultraviolet rays into the flow channel tube. The cooling water channel is arranged around the light source accommodation chamber, and flows cooling water. Furthermore, the light source housing chamber has a connection port through which a drying fluid flows from the outside.
在所述流體殺菌裝置中,所述冷卻水路與所述流路管連通。而且,在所述流體殺菌裝置中,包括:連通管,使所述流路收容室與所述光源收容室連通。而且,在所述流體殺菌裝置中,包括:感測器,設置於流動所述乾燥流體的流路,用於測量所述乾燥流體的壓力。而且,在所述流體殺菌裝置中,包括:控制部,基於所述感測器的測量結果來控制流動所述乾燥流體的路徑上所設置的開閉閥。 [發明的效果]In the fluid sterilizing device, the cooling water channel is in communication with the flow channel tube. Furthermore, in the fluid sterilizing device, a communication pipe is included to communicate the flow path storage chamber with the light source storage chamber. Moreover, in the fluid sterilizing device, a sensor is provided in the flow path where the drying fluid flows, and is used to measure the pressure of the drying fluid. Furthermore, the fluid sterilizing device may include a control unit configured to control an on-off valve provided on a path through which the dry fluid flows based on a measurement result of the sensor. [Effect of the invention]
根據本發明,可維持殺菌性能。According to the present invention, bactericidal performance can be maintained.
以下所說明的實施方式的流體殺菌裝置1、流體殺菌裝置1A包括流路收容室20、光源收容室30及冷卻水路35。流路收容室20收容流路部21,所述流路部21具有用於流通流體的流路管22及設置於流路管22的外周朝流路管22反射紫外線的反射板23。光源收容室30收容朝流路管22內照射紫外線的光源31。冷卻水路35設置於光源收容室30的周圍,並流動冷卻水。流路收容室20及光源收容室30分別具有用於從外部流通乾燥流體的連接口C1、連接口C2。The fluid sterilizing
而且,以下所說明的實施方式的流體殺菌裝置1、流體殺菌裝置1A中,冷卻水路35與流路管22連通。Furthermore, in the fluid sterilizing
而且,以下所說明的實施方式的流體殺菌裝置1、流體殺菌裝置1A包括:連通管40,使流路收容室20與光源收容室30連通。Furthermore, the fluid sterilizing
而且,以下所說明的實施方式的流體殺菌裝置1、流體殺菌裝置1A包括:感測器Sc,設置於流動乾燥流體的流路,用於測量乾燥流體的壓力。Furthermore, the fluid sterilizing
而且,以下所說明的實施方式的流體殺菌裝置1、流體殺菌裝置1A包括:控制部50,基於感測器Sc的測量結果來控制流動乾燥流體的路徑上所設置的開閉閥V1、開閉閥V2。Furthermore, the
(第1實施方式)
以下,參照隨附圖式對第1實施方式的流體殺菌裝置1進行說明。在實施方式中對具有同一種功能的構成賦予同一符號,並省略重複的說明。而且,以下對流體為液體的情況進行說明,但流體也可以是氣體。而且,以下,針對在流體殺菌裝置1中進行殺菌的流體,有時記載為處理流體。(first embodiment)
Hereinafter, the fluid sterilizing
首先,使用圖1對第1實施方式的流體殺菌裝置1的概要進行說明。圖1是表示第1實施方式的流體殺菌裝置1整體的示意圖。如圖1所示,流體殺菌裝置1經由上游側流路構件4而與供水槽2連接,並且經由下游側流路構件5而與回收槽7連接。First, an outline of a fluid sterilizing
即,流體殺菌裝置1將從供水槽2供給的液體殺菌,並供給至回收槽7。上游側流路構件4的一端連接於供水槽2,另一端連接於流體殺菌裝置1。That is, the
泵3承擔將儲存於供水槽2的液體經由上游側流路構件4而輸送至流體殺菌裝置1的作用。下游側流路構件5的一端連接於流體殺菌裝置1,另一端連接於回收槽7,並且設置有的流量調整機構6,調整從流體殺菌裝置1向回收槽7輸送液體的流量。The
圖2是表示第1實施方式的流體殺菌裝置1的主要部分的剖面示意圖。如圖2所示,流體殺菌裝置1包括流路收容室20、光源收容室30、連通管40、控制部50及感測器Sc。FIG. 2 is a schematic cross-sectional view showing main parts of the fluid sterilizing
而且,流體殺菌裝置1包括連接於流路部21的一端的第一連接構件10、連接於流路部21的另一端的第二連接構件11及連結第一連接構件10與第二連接構件11的框體24。Moreover, the fluid sterilizing
流路收容室20為收容流路部21的空間,形成於流路部21與框體24之間。而且,流路收容室20包括用於從外部流通乾燥流體的連接口C1。The
流路部21包括流動流體的流路管22及設置於流路管22的外周向流路管22內反射紫外線的反射板23。The
流路管22優選由紫外線的透過率高、紫外線引起的劣化受到抑制的材料來形成。在本實施方式中,作為流路管22,使用了透明的石英管,在石英管的整個外周面上使用作為紫外線反射率高的反射面的反射板23。The flow pipe 22 is preferably formed of a material that has a high transmittance of ultraviolet rays and suppresses deterioration due to ultraviolet rays. In the present embodiment, a transparent quartz tube is used as the channel tube 22, and the
反射板23將光源31向流路管22內的處理室25照射的紫外線反射至處理室25內。例如,反射板23使用了鋁製的板材。由此,可使從光源31出射的紫外線效率良好地返回至處理室25。即,能夠效率良好地對流體進行殺菌。The
另外,反射板23也可以使用在石英管的整個外周面上形成作為紫外線反射率高的反射面的反射膜而成者。反射膜例如使用有二氧化矽膜。而且,反射膜並不限於二氧化矽膜,也可以是鋁蒸鍍膜。而且,流路管22並不限於透明的石英管,也可以由高反射率的聚四氟乙烯(polytetrafluoroethylene:PTFE、四氟乙烯的聚合物)等的氟樹脂來形成。而且,反射膜也可以形成於流路管22的內周面而非形成於流路管22的外周面。In addition, the
光源收容室30例如配置於流路管22的下游側的端部,收容光源31,並且具有連接於外部的連接口C2。而且,在光源收容室30的流路管22側設置蓋體32。蓋體32例如是由玻璃材形成的紫外線透過構件,承擔使紫外線透過並且保護光源31免受流體影響的作用。The light
光源31是設置於未圖示的基板上,發出紫外線的發光元件即發光二極體(Light Emitting Diode,LED)。光源31發出具有殺菌作用高的300 nm以下的波長的紫外線。另外,作為光源31,優選在275 nm附近具有峰值波長者,但只要是發揮殺菌作用的波長範圍即可,並不限定紫外線的波長。The
而且,在光源收容室30的周圍設置冷卻水路35。在冷卻水路35中流動用於對光源31進行冷卻的冷卻水。由此,可將光源31或載置光源31的基板冷卻。Furthermore, a cooling
另外,在圖2所示的例子中,表示冷卻水路35與處理室25連通的情況。即,表示處理流體兼作流經冷卻水路35的冷卻水的情況。由此,無需另行準備冷卻水,所以能夠效率良好地將光源31冷卻。另外,冷卻水路35與處理室25未必需要連通,也可以分別單獨來設置冷卻水路35與處理室25。In addition, in the example shown in FIG. 2, the case where the cooling
而且,如圖2所示,在本實施方式中,在流路收容室20及光源收容室30中分別設置用於從外部流通乾燥流體的連接口C1及連接口C2。Furthermore, as shown in FIG. 2 , in the present embodiment, the connection port C1 and the connection port C2 for passing the drying fluid from the outside are respectively provided in the flow
具體而言,流路收容室20的連接口C1與流路構件60a連接,光源收容室30的連接口C2與流路構件60b連接。在流路構件60a、流路構件60b中分別設置開閉閥V1、開閉閥V2。Specifically, the connection port C1 of the flow
而且,流路收容室20及光源收容室30藉由連通管40而連通。由此,能夠在流路收容室20與光源收容室30兩者間共用乾燥氣體。另外,以下,將乾燥流體所通過的流路記載為乾燥流路。Furthermore, the flow
例如,在流路構件60a的開閉閥V1的外側配置送出乾燥流體的鋼瓶(Bombe)或泵,並通過乾燥流路,從流路構件60b的開閉閥V2送出。另外,也可以從開閉閥V2側流入乾燥流體,並從開閉閥V1側使乾燥流體排出。For example, a cylinder (Bombe) or a pump for sending dry fluid is arranged outside the on-off valve V1 of the
此處,乾燥流體是從空氣中去除了水蒸氣的乾燥氣體,也可以是矽油等的具有絕緣性的液體。另外,在乾燥流體為液體的情況下,優選使用紫外線透過率高者。而且,乾燥流體的溫度優選為流體殺菌裝置1的周圍的空氣的露點溫度以下。更詳細而言,流路收容室20中流通的乾燥流體的溫度優選為流經處理室25的處理流體的溫度以下,光源收容室30中流通的乾燥流體的溫度優選為流經冷卻水路35的冷卻水的溫度以下。Here, the dry fluid is a dry gas from which water vapor has been removed from the air, and may be an insulating liquid such as silicone oil. In addition, when the drying fluid is a liquid, it is preferable to use one with a high ultraviolet transmittance. Furthermore, the temperature of the drying fluid is preferably equal to or lower than the dew point temperature of the air around the
由此,能夠抑制流路收容室20及光源收容室30中結露的產生。而且,在此情況下,也可以藉由乾燥流體來對光源31進行冷卻。另外,乾燥流體的溫度並不限於所述例子,在產生了結露的情況下,也可以設定為促進結露的蒸發的溫度。Accordingly, it is possible to suppress the occurrence of dew condensation in the flow
控制部50基於感測器Sc的測量結果,來控制開閉閥V1及開閉閥V2。感測器Sc是設置於乾燥氣體的流路,用於對乾燥流體的壓力進行測量的感測器。例如,感測器Sc為壓力感測器,但若是測量乾燥流體的流速的流速感測器等能夠換算為壓力的感測器,則也可以是其他感測器。The control unit 50 controls the on-off valve V1 and the on-off valve V2 based on the measurement result of the sensor Sc. The sensor Sc is installed in the flow path of the dry gas to measure the pressure of the dry fluid. For example, the sensor Sc is a pressure sensor, but other sensors may be used as long as it is a sensor that can be converted into pressure, such as a flow rate sensor that measures the flow rate of dry fluid.
而且,在圖2所示的例子中,示出了將感測器Sc設置於流路收容室20的情況。然而,並不限定於此,也可以將感測器Sc設置於光源收容室30或流路構件60a、流路構件60b,或者也可以設置於開閉閥V1及開閉閥V2。Moreover, in the example shown in FIG. 2, the case where the sensor Sc was installed in the flow
開閉閥V1及開閉閥V2分別是由電磁閥或電動閥進行開閉控制的閥。開閉閥V1及開閉閥V2分別由控制部50的控制來控制開閉動作。由此,可調整流路構件60a或流路構件60b中流動的乾燥流體的流量。The on-off valve V1 and the on-off valve V2 are valves controlled to open and close by solenoid valves or electric valves, respectively. The opening and closing operations of the on-off valve V1 and the on-off valve V2 are controlled by the control unit 50 , respectively. Thereby, the flow rate of the drying fluid flowing in the
具體而言,控制部50基於感測器Sc的測量結果,以使流路收容室20或光源收容室30內總是成為正壓的方式來控制開閉閥V1及開閉閥V2。換言之,以使流路收容室20或光源收容室30內充分地充滿乾燥流體的方式來控制開閉閥V1及開閉閥V2。Specifically, the control unit 50 controls the on-off valve V1 and the on-off valve V2 based on the measurement result of the sensor Sc so that the inside of the flow
更詳細而言,控制部50例如可在乾燥流路內的壓力已下降的情況下,藉由將開閉閥V1打開,使更多的乾燥流體流入至乾燥流路內,或藉由將開閉閥V2關閉,將乾燥氣體截留至乾燥流路的內部。In more detail, for example, when the pressure in the drying flow path has dropped, the control unit 50 can allow more drying fluid to flow into the drying flow path by opening the on-off valve V1, or by opening the on-off valve V1. V2 is closed, and the drying gas is trapped inside the drying flow path.
由此,可使乾燥流體填充至乾燥流路內,所以能夠抑制結露的產生。另外,在圖2中,對流體殺菌裝置1包括開閉閥V1及開閉閥V2的兩個開閉閥的情況進行了說明,但開閉閥也可以是一個。而且,在圖2中,針對流體殺菌裝置1中流路收容室20與光源收容室30藉由連通管40連通的情況進行了說明,但也可以是流路收容室20與光源收容室30未連通的構成。Thereby, since the drying fluid can be filled in the drying flow path, generation|occurrence|production of dew condensation can be suppressed. In addition, in FIG. 2 , the case where the
如此,實施方式的流體殺菌裝置1藉由向流路收容室20及光源收容室30填充乾燥流體,而能夠抑制流路收容室20及光源收容室30中結露的產生。In this way, the
即,在流路收容室20中,可抑制在流路管22的外周面或反射板23的內周面發生的結露的產生,所以能夠抑制流路管22或反射板23的劣化。而且,在光源收容室30中,可抑制由結露引起的光源31或載置光源31的基板的故障。即,可維持流體殺菌裝置1的殺菌性能。That is, in the flow
如上所述,實施方式的流體殺菌裝置1包括流路收容室20、光源收容室30及冷卻水路35。流路收容室20收容流路部21,所述流路部21具有用於流通流體的流路管22及設置於流路管22的外周朝流路管22反射紫外線的反射板23。光源收容室30收容朝流路管22內照射紫外線的光源31。冷卻水路35設置於光源收容室30的周圍,並流動冷卻水。流路收容室20及光源收容室30分別具有用於從外部流通乾燥流體的連接口C1、連接口C2。因此,根據實施方式的流體殺菌裝置1,可維持殺菌性能。As described above, the
然而,在所述實施方式中,對流路管22為單重管結構的情況進行了說明,但流路管22也可以是雙重管結構以上的多重管結構。其次,使用圖3對第2實施方式的流體殺菌裝置1A進行說明。圖3是表示第2實施方式的流體殺菌裝置1A的主要部分的剖面示意圖。另外,在圖3中,省略圖2中所示的開閉閥V1、開閉閥V2或控制部50等的記載來表示。However, in the above-mentioned embodiment, the case where the channel tube 22 has a single tube structure has been described, but the channel tube 22 may have a multiple tube structure of a double tube structure or more. Next, 1 A of fluid disinfection apparatuses of 2nd Embodiment are demonstrated using FIG. 3. FIG. Fig. 3 is a schematic cross-sectional view showing a main part of a fluid sterilizing device 1A according to a second embodiment. In addition, in FIG. 3, description of the on-off valve V1, the on-off valve V2, the control part 50, etc. shown in FIG. 2 is omitted and shown.
而且,如圖3所示,第2實施方式的流體殺菌裝置1A與第1實施方式的流體殺菌裝置1的主要不同是流路部21的流路管22的構成。具體而言,如圖3所示,在第2實施方式的流體殺菌裝置1A中,流路部21a具有第一流路管22-1及第二流路管22-2。Furthermore, as shown in FIG. 3 , the main difference between the fluid sterilizing device 1A of the second embodiment and the
而且,如圖3所示,第一流路管22-1與第二流路管22-2中,處理流體的流動朝向不同。即,在流體殺菌裝置1A中,流路管是內側與外側的處理流體的流動朝向不同的多重管結構。Moreover, as shown in FIG. 3 , the flow directions of the treatment fluid are different in the first flow pipe 22 - 1 and the second flow pipe 22 - 2 . That is, in the fluid sterilizing device 1A, the channel tube has a multi-tube structure in which the flow directions of the treatment fluid on the inner side and the outer side are different.
如圖3所示,從上游側流路構件4流入的處理流體經過在第一流路管22-1的內周形成的第一處理室25-1,在包括第二連接構件11-1的冷卻水路35-1中折返,並經由藉由第一流路管22-1及第二流路管22-2所形成的第二處理室25-2,而從下游側流路構件5排出。As shown in FIG. 3 , the processing fluid flowing in from the upstream
即,在第2實施方式的流體殺菌裝置1A中,藉由將流路管設為多重管結構,能夠縮短流體殺菌裝置1A的總長。另外,此處,對流路管為雙重管結構的多重管的情況進行了說明,但流路管也可以是三重管結構以上的多重管結構。That is, in 1 A of fluid sterilizing apparatuses of 2nd Embodiment, the total length of 1 A of fluid sterilizing apparatuses can be shortened by making a flow path pipe into a multi-pipe structure. In addition, here, the case where the flow channel tube is a multi-tube structure with a double-tube structure has been described, but the flow channel tube may have a multi-tube structure with a triple-tube structure or higher.
雖然對本發明的實施方式進行了說明,但此實施方式是作為例子所提示者,並不意圖對發明的範圍進行限定。此實施方式能夠以其他各種形態來實施,在不脫離發明的主旨的範圍內,可進行各種省略、替換、變更。與包含在發明的範圍或主旨中同樣地,此實施方式或其變形包含在權利要求書中所記載的發明及其均等的範圍內。Although the embodiment of the present invention has been described, this embodiment is presented as an example and is not intended to limit the scope of the invention. This embodiment can be implemented in other various forms, and various omissions, substitutions, and changes can be made without departing from the scope of the invention. This embodiment or its modifications are included in the invention described in the claims and its equivalent scope as well as being included in the scope or spirit of the invention.
1、1A:流體殺菌裝置
2:供水槽
3:泵
4:上游側流路構件
5:下游側流路構件
6:流量調整機構
7:回收槽
10:第一連接構件
11、11-1:第二連接構件
20:流路收容室
21、21a:流路部
22:流路管
22-1:第一流路管
22-2:第二流路管
23:反射板
24:框體
25:處理室
25-1:第一處理室
25-2:第二處理室
30:光源收容室
31:光源
32:蓋體
35、35-1:冷卻水路
40:連通管
50:控制部
60a、60b:流路構件
C1、C2:連接口
Sc:感測器
V1、V2:開閉閥1. 1A: Fluid sterilization device
2: Water supply tank
3: pump
4: Upstream side flow path member
5: Downstream flow path member
6: Flow adjustment mechanism
7: Recovery tank
10: The first connecting
圖1是表示第1實施方式的流體殺菌裝置整體的示意圖。 圖2是表示第1實施方式的流體殺菌裝置的主要部分的剖面示意圖。 圖3是表示第2實施方式的流體殺菌裝置的主要部分的剖面示意圖。FIG. 1 is a schematic diagram showing the whole of a fluid sterilizing device according to a first embodiment. Fig. 2 is a schematic cross-sectional view showing main parts of the fluid sterilizing device according to the first embodiment. Fig. 3 is a schematic cross-sectional view showing main parts of a fluid sterilizing device according to a second embodiment.
1:流體殺菌裝置 1: Fluid sterilization device
4:上游側流路構件 4: Upstream side flow path member
5:下游側流路構件 5: Downstream flow path member
10:第一連接構件 10: The first connecting member
11:第二連接構件 11: The second connecting member
20:流路收容室 20: Fluid containment chamber
21:流路部 21: Flow path department
22:流路管 22: Flow tube
23:反射板 23: reflector
24:框體 24: frame
25:處理室 25: Processing room
30:光源收容室 30:Light Source Containment Room
31:光源 31: light source
32:蓋體 32: cover body
35:冷卻水路 35: Cooling water circuit
40:連通管 40: connecting pipe
50:控制部 50: Control Department
60a、60b:流路構件 60a, 60b: flow path member
C1、C2:連接口 C1, C2: connection port
Sc:感測器 Sc: sensor
V1、V2:開閉閥 V1, V2: opening and closing valve
Claims (6)
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JP7512799B2 (en) * | 2020-09-28 | 2024-07-09 | 東芝ライテック株式会社 | Fluid Sterilization Device |
US20240109794A1 (en) * | 2021-02-04 | 2024-04-04 | Korea Water Partnership | Ultraviolet disinfection device and method |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08257554A (en) * | 1995-03-27 | 1996-10-08 | Shinko Pantec Co Ltd | Ultraviolet irradiation apparatus and water treatment apparatus |
JP2012061413A (en) * | 2010-09-15 | 2012-03-29 | Toshiba Corp | Ultraviolet irradiation device |
JP2015139712A (en) * | 2014-01-27 | 2015-08-03 | スタンレー電気株式会社 | Apparatus for liquid cleaning |
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JP4812850B2 (en) * | 2009-03-19 | 2011-11-09 | 有限会社共栄コントロールズ | UV irradiation equipment |
JP6224492B2 (en) * | 2014-03-14 | 2017-11-01 | 日機装株式会社 | Light irradiation device |
JP6755772B2 (en) * | 2016-10-27 | 2020-09-16 | メタウォーター株式会社 | Water treatment equipment |
JP6798327B2 (en) * | 2017-01-24 | 2020-12-09 | 東芝ライテック株式会社 | Fluid sterilizer |
JP6891537B2 (en) * | 2017-02-28 | 2021-06-18 | 東芝ライテック株式会社 | Fluid sterilizer |
JP6829182B2 (en) * | 2017-12-04 | 2021-02-10 | 日機装株式会社 | Ultraviolet light sterilizer |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08257554A (en) * | 1995-03-27 | 1996-10-08 | Shinko Pantec Co Ltd | Ultraviolet irradiation apparatus and water treatment apparatus |
JP2012061413A (en) * | 2010-09-15 | 2012-03-29 | Toshiba Corp | Ultraviolet irradiation device |
JP2015139712A (en) * | 2014-01-27 | 2015-08-03 | スタンレー電気株式会社 | Apparatus for liquid cleaning |
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TW202023957A (en) | 2020-07-01 |
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