TWI803516B - System for single-stage and dual-stage dilution of a sample - Google Patents
System for single-stage and dual-stage dilution of a sample Download PDFInfo
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- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/38—Diluting, dispersing or mixing samples
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
- H01J49/0431—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for liquid samples
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
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- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/52—Containers specially adapted for storing or dispensing a reagent
- B01L3/523—Containers specially adapted for storing or dispensing a reagent with means for closing or opening
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01L3/56—Labware specially adapted for transferring fluids
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- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N30/00—Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography or field flow fractionation
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N35/00—Automatic analysis not limited to methods or materials provided for in any single one of groups G01N1/00 - G01N33/00; Handling materials therefor
- G01N35/10—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
- G01N35/1095—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices for supplying the samples to flow-through analysers
- G01N35/1097—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices for supplying the samples to flow-through analysers characterised by the valves
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- B01L2200/06—Fluid handling related problems
- B01L2200/0605—Metering of fluids
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- B01L2300/00—Additional constructional details
- B01L2300/02—Identification, exchange or storage of information
- B01L2300/024—Storing results with means integrated into the container
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01L2300/00—Additional constructional details
- B01L2300/04—Closures and closing means
- B01L2300/046—Function or devices integrated in the closure
- B01L2300/049—Valves integrated in closure
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
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- B01L2300/0803—Disc shape
- B01L2300/0806—Standardised forms, e.g. compact disc [CD] format
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- B01L2300/0861—Configuration of multiple channels and/or chambers in a single devices
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- B01L2300/00—Additional constructional details
- B01L2300/08—Geometry, shape and general structure
- B01L2300/0861—Configuration of multiple channels and/or chambers in a single devices
- B01L2300/0867—Multiple inlets and one sample wells, e.g. mixing, dilution
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L2400/00—Moving or stopping fluids
- B01L2400/04—Moving fluids with specific forces or mechanical means
- B01L2400/0475—Moving fluids with specific forces or mechanical means specific mechanical means and fluid pressure
- B01L2400/0487—Moving fluids with specific forces or mechanical means specific mechanical means and fluid pressure fluid pressure, pneumatics
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- B01L2400/04—Moving fluids with specific forces or mechanical means
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- B01L2400/00—Moving or stopping fluids
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N1/00—Sampling; Preparing specimens for investigation
- G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
- G01N1/38—Diluting, dispersing or mixing samples
- G01N2001/386—Other diluting or mixing processes
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- G01N35/10—Devices for transferring samples or any liquids to, in, or from, the analysis apparatus, e.g. suction devices, injection devices
- G01N2035/1027—General features of the devices
- G01N2035/1032—Dilution or aliquotting
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- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
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- H01J49/00—Particle spectrometers or separator tubes
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- H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
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Abstract
Description
本申請案係關於樣品製備系統及方法,且更特定言之係關於用於稀釋流體樣品之樣品製備系統及方法。 This application relates to sample preparation systems and methods, and more particularly to sample preparation systems and methods for diluting fluid samples.
感應耦合電漿(ICP)光譜測定法係通常用於判定液體樣品中之微量元素濃度及同位素比之一分析技術。ICP光譜測定法採用以電磁方式產生之部分電離氬電漿,其達到約7,000K之一溫度。當將一樣品被引入至電漿時,高溫導致樣品原子變得電離或發射光。由於各化學元素產生一特徵質量或發射光譜,所以量測所發射質量或光之光譜容許判定原始樣品之元素成分。 Inductively coupled plasma (ICP) spectrometry is one of the analytical techniques commonly used to determine the concentration and isotope ratio of trace elements in liquid samples. ICP spectroscopy employs an electromagnetically generated partially ionized argon plasma, which reaches a temperature of about 7,000K. When a sample is introduced into the plasma, the high temperature causes the sample atoms to become ionized or emit light. Since each chemical element produces a characteristic mass or emission spectrum, measuring the emitted mass or spectrum of light allows determination of the elemental composition of the original sample.
可採用樣品引入系統以將液體樣品引入至ICP光譜測定儀器(例如,一感應耦合電漿質量光譜儀(ICP/ICP-MS)、一感應耦合電漿原子發射光譜儀(ICP-AES)或類似物)中以進行分析。例如,一樣品引入系統可自一容器汲取一液體樣品之一等分(aliquot)且其後將該等分輸送至一噴霧器,該噴霧器將該等分轉換為適合於由ICP光譜測定儀器在電漿中電離之一多分散氣溶膠。在將等分輸送至噴霧器之前或期間,樣品等分可與氫化物產生試劑混合且被饋送至氫化物氣體/液體分離器中,該氫化物氣體/ 液體分離器將氫化物及/或樣品氣體導引至噴霧器中。接著在一噴霧室中分類由噴霧器產生之氣溶膠以移除較大氣溶膠粒子。在離開噴霧室之後,藉由ICP-MS或ICP-AES儀器之一電漿炬總成將氣溶膠引入至電漿中以進行分析。 A sample introduction system may be employed to introduce the liquid sample into the ICP spectrometry instrument (e.g., an inductively coupled plasma mass spectrometer (ICP/ICP-MS), an inductively coupled plasma atomic emission spectrometer (ICP-AES), or the like) in for analysis. For example, a sample introduction system may draw an aliquot of a liquid sample from a container and thereafter deliver the aliquot to a nebulizer, which converts the aliquot into an aliquot suitable for use by an ICP spectrometry instrument in an electronic One of the ionized polydisperse aerosols in the plasma. Before or during delivery of the aliquot to the nebulizer, the sample aliquot can be mixed with a hydride generating reagent and fed into a hydride gas/liquid separator which A liquid separator directs the hydride and/or sample gas into the nebulizer. The aerosol produced by the nebulizer is then classified in a spray chamber to remove larger aerosol particles. After leaving the spray chamber, the aerosol is introduced into the plasma by a plasma torch assembly of the ICP-MS or ICP-AES instrument for analysis.
本發明描述用於稀釋流體樣品之樣品製備系統及方法,其中在單級或多級稀釋程序中線上稀釋該等樣品以達成高稀釋因數之極限精確性(例如,10,000倍或更大之稀釋因數)。一種系統實施例包含但不限於:一第一泵,其經組態以驅動一載體流體;一第二泵,其經組態以驅動一稀釋液;及複數個選擇閥,其與該第一泵及該第二泵流體地耦合,該複數個選擇閥經組態以根據至少兩個操作模式引導來自該第一泵及該第二泵之流體流以根據一第一操作模式提供一單級樣品稀釋且根據一第二操作模式提供一雙級樣品稀釋。 The present invention describes sample preparation systems and methods for diluting fluid samples wherein the samples are diluted in-line in a single or multiple dilution procedure to achieve extreme precision for high dilution factors (e.g., dilution factors of 10,000-fold or greater) ). A system embodiment includes, but is not limited to: a first pump configured to drive a carrier fluid; a second pump configured to drive a diluent; and selector valves coupled to the first The pump and the second pump are fluidly coupled, the plurality of selector valves configured to direct fluid flow from the first pump and the second pump according to at least two modes of operation to provide a single stage according to a first mode of operation The sample is diluted and a two-stage sample dilution is provided according to a second mode of operation.
此[發明內容]經提供以依一簡化形式介紹下文在[實施方式]中進一步描述之一概念選擇。此[發明內容]並不旨在識別所主張標的物之關鍵特徵或本質特徵,亦並不旨在用於幫助判定所主張標的物之範疇。 This [Summary] is provided to introduce in a simplified form a selection of concepts that are further described below in the [Implementations]. This [Summary] is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used as an aid in determining the scope of the claimed subject matter.
1至11:埠 1 to 11: port
100:系統 100: system
102:注射泵 102:Syringe pump
104:第一注射泵 104: The first syringe pump
106:第二注射泵 106: Second syringe pump
108:第三注射泵 108: The third syringe pump
110:第一選擇閥 110: first selection valve
112:第二選擇閥 112: Second selection valve
114:第三選擇閥 114: the third selection valve
116:第四選擇閥 116: The fourth selection valve
118:噴霧器 118: Sprayer
120:流體管線 120: Fluid pipeline
122:第一保持管線 122: The first holding pipeline
124:第二保持管線 124: the second holding pipeline
126:流體管線 126: Fluid pipeline
128:流體管線 128: Fluid pipeline
130:流體管線 130: Fluid pipeline
132:第三保持管線 132: The third holding pipeline
134:流體管線 134: Fluid pipeline
135:流體管線 135: Fluid pipeline
136:流體管線 136: Fluid pipeline
138:樣品探測器 138: Sample detector
139:流體通道 139: Fluid channel
140:真空源 140: vacuum source
141:通道 141: channel
142:流體管線 142: Fluid pipeline
143:通道 143: channel
144:流體管線 144: Fluid pipeline
145:通道 145: channel
146:流體管線 146: Fluid pipeline
148:流體管線 148: Fluid pipeline
150:流體管線 150: Fluid pipeline
152:泵 152: pump
154:流體管線 154: Fluid pipeline
400:運算系統 400: Computing System
402:處理器 402: Processor
404:非暫時性載體媒體 404: Non-transitory Carrier Media
406:電腦可讀程式指令 406: Computer-readable program instructions
408:網路連接 408: Network connection
參考附圖描述[實施方式]。在描述及圖中之不同例項中使用相同元件符號可指示類似或相同項目。 [Embodiment] is described with reference to the drawings. The use of the same reference numbers in different instances in the description and drawings may indicate similar or identical items.
圖1係根據本發明之一實施例之在一第一樣品稀釋模式中操作之一樣品製備系統之一示意圖。 FIG. 1 is a schematic diagram of a sample preparation system operating in a first sample dilution mode according to an embodiment of the present invention.
圖2係根據本發明之一實施例之在一第二樣品稀釋模式之 一第一級中操作之一樣品製備系統之一示意圖。 Figure 2 is in a second sample dilution mode according to an embodiment of the present invention A schematic diagram of a sample preparation system operated in the first stage.
圖3係根據本發明之一實施例之在一第二樣品稀釋模式之一第二級中操作之一樣品製備系統之一示意圖。 3 is a schematic diagram of a sample preparation system operating in a second stage of a second sample dilution mode, according to an embodiment of the present invention.
圖4係一樣品製備系統(諸如參考圖1至圖3描述之(若干)樣品製備系統)之一控制協定之一示意圖。 4 is a schematic diagram of a control protocol for a sample preparation system, such as the sample preparation system(s) described with reference to FIGS. 1-3 .
本申請案主張2017年9月7日申請且標題為「SYSTEMS AND METHODS FOR INLINE,DUAL-STAGE SAMPLE DILUTION」之美國臨時申請案第62/555,323號之35 U.S.C.§119(e)之權利。美國臨時申請案第62/555,323號之全部內容以引用的方式併入本文中。 This application claims the rights of 35 U.S.C. §119(e) of U.S. Provisional Application No. 62/555,323, filed September 7, 2017 and titled "SYSTEMS AND METHODS FOR INLINE, DUAL-STAGE SAMPLE DILUTION." The entire contents of US Provisional Application No. 62/555,323 are incorporated herein by reference.
判定一樣品中之微量元素濃度或量可提供樣品之一純度指示或樣品用作一試劑、反應性組分或類似物之一可接受性。例如,在某些生產或製造程序(例如,採礦、冶金、半導體製造、藥物處理等)中,對雜質之容限可為非常嚴格的,例如,約十億分之幾。為精確量測高濃度樣品(例如,金屬礦石、冶金成分等)之微量元素成分,待量測之樣品通常需要稀釋以由ICP光譜測定儀器(一感應耦合電漿質量光譜儀(ICP/ICP-MS)、一感應耦合電漿原子發射光譜儀(ICP-AES)或類似物)進行分析。例如,若一樣品濃度過高,則樣品可使ICP光譜測定儀器之錐體飽和、在樣品之間夾帶(carry over)非所要背景或破壞儀器。然而,獲得精確稀釋因數可難以達成,尤其在手工技術通常涉及相對大液體體積(例如,50mL或更大)、易碎移液管或量瓶、需要頻繁認證之儀器、大量時間要求或類似物 的情況下。再者,對於大稀釋因數(例如,100倍稀釋及更大),可由一給定泵(例如,注射泵、蠕動泵等)之解析度限制一稀釋之精確性,其中此等泵可不具有足夠解析度來為多個樣品、標準或類似物提供一致且精確之稀釋。 Determining the concentration or amount of trace elements in a sample can provide an indication of the purity of the sample or the acceptability of the sample for use as a reagent, reactive component or the like. For example, in certain production or manufacturing processes (eg, mining, metallurgy, semiconductor fabrication, pharmaceutical processing, etc.), tolerances for impurities can be very tight, eg, on the order of parts per billion. In order to accurately measure the trace element composition of high-concentration samples (such as metal ores, metallurgical components, etc.), the sample to be measured usually needs to be diluted to be measured by an ICP spectrometer (an inductively coupled plasma mass spectrometer (ICP/ICP-MS ), an inductively coupled plasma atomic emission spectrometer (ICP-AES) or similar) for analysis. For example, if a sample concentration is too high, the sample can saturate the cone of an ICP spectrometry instrument, carry over unwanted background between samples, or damage the instrument. However, obtaining precise dilution factors can be difficult to achieve, especially where manual techniques often involve relatively large liquid volumes (e.g., 50 mL or greater), fragile pipettes or measuring bottles, instruments requiring frequent authentication, extensive time requirements, or the like in the case of. Furthermore, for large dilution factors (e.g., 100-fold dilution and greater), the accuracy of a dilution may be limited by the resolution of a given pump (e.g., syringe pump, peristaltic pump, etc.), which may not have sufficient resolution to provide consistent and precise dilutions for multiple samples, standards or the like.
因此,本發明係關於用於一樣品之線上、多級稀釋之系統及方法。該等系統及方法可利用多個獨立泵,該多個獨立泵流體連接至一閥系統以(例如,在電腦控制下)動態地更改一給定流體之一稀釋因數,其中稀釋因數及稀釋級數可在樣品、標準等之間變化。該等系統及方法精確控制載體、稀釋液及樣品流量以在系統中稀釋流體以由ICP光譜測定儀器進行分析,如下文進一步詳細論述。 Accordingly, the present invention relates to systems and methods for on-line, multi-stage dilution of a sample. The systems and methods may utilize multiple independent pumps fluidly connected to a valve system to dynamically change (e.g., under computer control) the dilution factor of a given fluid, wherein the dilution factor and dilution level Numbers can vary between samples, standards, etc. These systems and methods precisely control carrier, diluent, and sample flow rates to dilute fluids in the system for analysis by ICP spectrometry instruments, as discussed in further detail below.
圖1至圖3繪示根據本發明之各種實施例之一樣品製備系統(「系統100」),其中系統100包含促進樣品及標準之自動、線上稀釋以進行分析之泵、閥及控制邏輯組態。熟習此項技術者將瞭解,圖式中繪示及/或本文中描述之實施例可經修改或完全或部分組合以獲得額外實施例。因此,所繪示及描述之實施例應理解為說明性且並非本發明之限制。
1-3 illustrate a sample preparation system ("
系統100提供流體之單級及雙級稀釋之結構及功能性,其中系統100可在系統100之操作期間針對各種樣品或標準在操作模式之間切換。例如,系統100之一控制器可促進透過一單極稀釋操作根據一第一稀釋因數稀釋一第一樣品,其中控制器可促進透過一雙級稀釋操作根據一第二稀釋因數稀釋一第二樣品。圖1至圖3中展示例示性操作模式。例如,圖1繪示在併入一單級稀釋之一第一樣品稀釋模式中操作之系統100。圖2
及圖3繪示在併入雙級稀釋之一第二樣品稀釋模式中操作之系統100。額外操作模式包含(但不限於)用以將一樣品裝載至系統100中之樣品裝載模式、用以(例如,在稀釋模式之前、在稀釋模式之後等)將一清潔流體引入至系統100之流體管線中之清洗模式、用以自動建立校準曲線之校準模式或類似物。
在圖1至圖3中繪示之實施例中,系統100經展示為包含複數個注射泵102以驅動流體通過系統100之流體通路(例如,由彼此流體連通之流體管線、流體迴路或線圈、閥埠、閥通道等形成)。雖然系統100在例示性實施例中展示為具有注射泵,但系統100可併入用於驅動流體通過系統100之任何適合類型之泵,包含(但不限於)注射泵、蠕動泵、真空連接或類似物或其組合。例如,複數個注射泵102可包含:一第一注射泵104,其控制一注射器以驅動一載體流體通過系統100(例如,以推動一或多個樣品或標準通過系統100);一第二注射泵106,其控制一注射器以驅動一稀釋液流體(例如,去離子水、超純水等)通過系統100;及一第三注射泵108,其控制一注射器以驅動一內標通過系統100。複數個注射泵102可包含用以在系統100內驅動其他流體之額外注射泵,諸如用以驅動一清洗或清潔溶液、校準溶液、緩衝溶液、溶析溶液或類似物之一注射泵。複數個注射泵102中利用之注射器之大小可在各注射泵之間變化或可具有均勻大小。例如,注射器可具有介於0.5mL與20mL之間的體積以驅動相對小體積之流體通過系統以精確控制稀釋因數,同時避免需要相對大體積之液體(例如,50mL或更多)以提供所要稀釋。
In the embodiment depicted in FIGS. 1-3 , the
該複數個注射泵102流體地耦合至多埠閥(例如,自動化選擇/選擇器閥)以自系統100內之泵引導流體流。例如,如圖1至圖3中展
示,系統100包含一第一選擇閥110、一第二選擇閥112、一第三選擇閥114及一第四選擇閥116,其各者可在至少兩個流動組態之間切換(例如,經由不同閥埠之間的流動通道之連接,其中流動通道之定位在不同流動組態之間不同)。此外,第一選擇閥110、第二選擇閥112、第三選擇閥114及第四選擇閥116之各者直接或間接與複數個泵102之一或多個泵流體連通。
The plurality of syringe pumps 102 are fluidly coupled to multi-port valves (eg, automated selector/selector valves) to direct fluid flow from the pumps within the
第一選擇閥110可提供系統100與ICP光譜測定儀器或其他分析儀器之間的一介面以(例如,經由經由流體管線120而與第一選擇閥110流體連通之一噴霧器118)將一經稀釋樣品提供至ICP光譜測定儀器或其他分析儀器。第一選擇閥110經由第一選擇閥110之兩個埠(例如,圖1至圖3中之埠1及4)耦合至一第一保持管線122(例如,形成一流體保持迴路或線圈)。例如,系統100可採用保持管線以在一閥切換流動組態時保持該閥處之一流體。第一選擇閥110亦經由第一選擇閥110之兩個埠(例如,圖1至圖3中之埠6及9)耦合至一第二保持管線124(例如,形成一流體保持迴路或線圈)。第一選擇閥110亦與第二選擇閥112、第三選擇閥114及第四選擇閥116之各者流體連通。例如,第一選擇閥110可經由流體管線126而與第二選擇閥112流體連通,經由流體管線128而與第三選擇閥114流體連通且經由流體管線130而與第四選擇閥116流體連通。第二選擇閥112經由第二選擇閥112之兩個埠(例如,圖1至圖3中之埠1及4)耦合至一第三保持管線132(例如,形成一流體保持迴路或線圈)且與第三選擇閥114及第四選擇閥116流體連通。例如,第二選擇閥112可經由流體管線134、135及136而與第三選擇閥114流體連通且間接經由與第三選擇閥114耦合之流體管線而與第四選擇閥116流體連通。
第二選擇閥112亦可與一樣品源(諸如經組態用於自動選擇一特定樣品之一自動取樣器之一樣品探測器138)耦合以將一樣品汲取至系統100中以進行樣品製備(例如,稀釋、標準添加等)且由ICP光譜測定儀器進行分析。例如,第三選擇閥114可與一真空源140耦合以(例如,在與第三選擇閥114之埠1耦合時且在第二選擇閥112處於圖3中展示之一裝載組態(例如,埠1及6流體連通,且埠5及4流體連通)中時,經由流體管線136與第三選擇閥114之一流體通道139之流體連通)將樣品自樣品探測器138汲取至第三保持管線132中。替代地或另外,泵系統102之一泵可用於將一樣品裝載至第三保持管線132中。第三選擇閥114與第四選擇閥116流體連通。例如,第三選擇閥114可經由流體管線142及144而與第四選擇閥116流體連通。替代地或另外,系統100可接收一樣品或來自另一源(諸如來自另一樣品處置系統、遠端取樣系統或類似物之一流體傳送管線)之其他流體。
The
第四選擇閥116與複數個注射泵102耦合以將載體、稀釋液及內標流體接收至系統100中。例如,第四選擇閥116可與第一注射泵104流體連通以經由流體管線146接收載體流體,與第二注射泵106流體連通以經由流體管線148接收稀釋液流體,且與第三注射泵108流體連通以經由流體管線150接收內標流體。
A
系統100包含一旦一樣品裝載至第三保持管線132中便處理一樣品之至少兩個不同操作模式(上文提供一個可行裝載程序之一實例)。參考圖1展示一第一操作模式,其中在第二選擇閥112處發生一單級線上稀釋程序。參考圖2及圖3展示一第二操作模式,其中發生一雙級稀釋程序(例如,第二選擇閥112處之一第一級稀釋及第二選擇閥110處之一第二級
稀釋)。現將論述各操作模式。
The
參考圖1,在利用一單級稀釋之一例示性樣品稀釋模式中展示系統100。此樣品稀釋模式包含處於一施配組態中之第四選擇閥116以自第一注射泵104接收載體流體且將載體流體傳送至第三選擇閥114(其處於一施配組態中),其中第三選擇閥114容許載體流體流動至第二選擇閥112以推動樣品離開第三保持管線132以藉由組合液體流與自第四選擇閥116接收且透過第三選擇閥114傳送之稀釋液流體而(例如,在埠3處)進行稀釋。例如,透過第二注射泵106之作用由第二選擇閥112經由流體管線135(例如,耦合至埠7)自第三選擇閥114接收稀釋液,其中一通道141流體地耦合埠7與埠3以容許在載體流體自第三保持管線132推動樣品時在埠3處混合稀釋液與樣品。(由第一注射泵104及第二注射泵106促進之)載體流體及稀釋液流體之相對流速可指定樣品之稀釋因數。在一實施方案中,複數個注射泵102之各泵受電腦控制以精確控制各自流體流速以達到一樣品之一所要稀釋因數。將經稀釋樣品自第二選擇閥112傳送至第一選擇閥110,其中可經由藉由第四選擇閥116接收一可選內標且傳送至第一選擇閥110而(例如,在埠5處)添加內標(例如,在圖1中展示之一裝載組態中)。例如,經稀釋樣品通過流體管線126至埠11,其中一通道143流體地耦合埠11與埠5以混合經由流體管線130自第四選擇閥116接收之內標與經稀釋樣品。接著將經稀釋樣品引入至第一保持管線122。第一選擇閥110可接著過渡至一注入組態,其中埠3及4流體連通且埠1及2流體連通(例如,圖2中展示之第一選擇閥110之注入組態)以容許一泵152(例如,一蠕動泵)將經稀釋樣品自第一保持管線122推動至噴霧器118以由ICP光譜測定儀器進行分析。在一實施方案中,在系統100將在下文描述之雙級操作
模式下操作之前,單級稀釋操作模式提供多至約一百倍之稀釋因數。然而,此稀釋因數並非限制性且可利用其他稀釋因數,包含(但不限於)超過一百倍之稀釋因數。
Referring to FIG. 1 ,
參考圖2及圖3,在利用一雙級稀釋(例如,圖2中展示之一第一級及圖3中展示之一第二級)之一例示性樣品稀釋模式中展示系統100。第一級樣品稀釋包含處於一施配組態中以自第一注射泵104接收載體流體且將載體流體傳送至第三選擇閥114(其處於一施配組態中)之第四選擇閥116,其中第三選擇閥114容許載體流體(例如,經由流體管線134)流動至第二選擇閥112以推動樣品離開第三保持管線132以藉由組合液體流與自第四選擇閥116接收且透過第三選擇閥114傳送之稀釋液流體而(例如,在埠3處)進行稀釋。例如,透過第二注射泵106之作用由第二選擇閥112經由流體管線135(例如,耦合至埠7)自第三選擇閥114接收稀釋液,其中通道141流體地耦合埠7與埠3以容許在載體流體自第三保持管線132推動樣品時在埠3處混合稀釋液與樣品。(由第一注射泵104及第二注射泵106促進之)載體流體及稀釋液流體之相對流速可指定樣品在雙級稀釋期間的第一稀釋因數。在一實施方案中,複數個注射泵102之各泵受電腦控制以精確控制各自流體流速以達到一樣品之一所要稀釋因數。將經稀釋樣品自第二選擇閥112傳送至第一選擇閥110(例如,處於一注入組態中)且裝載至第二保持管線124中以進行保持直至系統100過渡至(圖3中展示之)雙級稀釋操作模式之第二級。
Referring to FIGS. 2 and 3 ,
參考圖3,系統100經展示為提供流徑組態以容許第二級稀釋。例如,第四選擇閥116處於施配組態中,第三選擇閥114處於裝載組態中,且第一選擇閥110處於裝載組態中。可繞開第二選擇閥112以促進清洗
與其相關聯之一或多個流體管線,將一新樣品裝載至第三保持管線132中或類似物或其組合。如展示,第四選擇閥116自第一注射泵104接收載體流體且將載體流體傳送至第三選擇閥114(其處於填充組態中),其中第三選擇閥114容許載體流體(例如,經由流體管線154)流動至第一選擇閥110以推動樣品離開第二保持管線124以藉由組合液體流與經由第四選擇閥(例如,經由流體管線144)自第三選擇閥114(例如,經由流體管線128)接收之稀釋液流體而(例如,在埠6處)進行稀釋。(由第一注射泵104及第二注射泵106促進之)載體流體及稀釋液流體之相對流速可指定樣品之第二稀釋因數。在一實施方案中,複數個注射泵102之各泵受電腦控制以精確控制各自流體流速以達到一樣品之一所要稀釋因數。可經由藉由第四選擇閥116接收一可選內標且(例如,經由流體管線130)傳送至第一選擇閥110而(例如,在埠5處)添加內標,其中第一選擇閥110可包含流體地連接埠6及5之一通道145。接著將經稀釋樣品引入至第一保持管線122。第一選擇閥110可接著過渡至一注入組態,其中埠3及4流體連通且埠1及2流體連通(例如,如圖2中展示)以容許一泵152(例如,一蠕動泵)將經稀釋樣品自第一保持管線122推動至噴霧器118以由ICP光譜測定儀器進行分析。在一實施方案中,雙級稀釋操作模式之各稀釋級可具有獨立稀釋因數或可具有相同稀釋因數。例如,在一實施方案中,針對多至約一萬倍之一最終稀釋因數,各稀釋級可具有多至約一百倍稀釋之一稀釋因數。然而,此等稀釋因數並非限制性且可利用其他稀釋因數,包含(但不限於)各稀釋級超過一百倍之稀釋因數。
Referring to FIG. 3,
電機裝置(例如,電馬達、伺服機、致動器或類似物)可與選擇閥、注射泵及其組合耦合或嵌入其中以促進經由嵌入系統100內或在
外部驅動系統100之控制邏輯之自動化操作。電機裝置可經組態以導致複數個閥根據一或多個操作模式(諸如本文中描述之操作模式)引導來自注射器104、106、108及來自其他注射器、流徑等之流體流。如圖4中展示,系統100可包含或受控於具有一處理器402之一運算系統400,該處理器402經組態以執行來自一非暫時性載體媒體404(例如,儲存媒體,諸如一快閃隨身碟、硬碟機、固態磁碟機、SD卡、光碟或類似物)之電腦可讀程式指令406(即,控制邏輯)。運算系統400可藉由直接連接或透過一或多個網路連接408(例如,區域網路(LAN)、無線區域網路(WAN或WLAN)、一或多個集線器連接(例如,USB集線器)等)連接至系統100之各種組件。例如,運算系統400可通信地耦合至樣品探測器138(或對應自動取樣器)、注射泵104、注射泵106、注射泵108及本文中描述之各種泵或選擇閥之任一者。當由處理器402執行時,程式指令406可導致運算系統400根據一或多個操作模式控制系統100(例如,控制泵及選擇閥),如本文中描述。在一實施方案中,運算系統400實施一樣品排程器以容許一使用者針對待連續分析之複數個樣品獨立地鍵入一所要稀釋因數。例如,一使用者可輸入一樣品之一所要最終稀釋因數且處理器402可判定一單級或雙級稀釋操作模式對於所要最終稀釋因數是否為較佳的。若一單級稀釋操作模式係足夠的(例如,稀釋因數不超過一臨限稀釋因數(例如,其中注射泵之解析度不足以用於一單級稀釋之一稀釋因數),諸如100倍稀釋),則運算系統400將自動控制系統以根據單級稀釋操作模式(例如,如圖1中展示)提供樣品稀釋。若一單級稀釋操作模式係不足的(例如,稀釋因素超過臨限稀釋因數),則運算系統400將自動控制系統100以根據雙級稀釋操作模式(例如,如圖2及圖3中展示)提供樣品稀釋。
An electromechanical device (e.g., an electric motor, servo, actuator, or the like) may be coupled to or embedded in a selector valve, a syringe pump, and combinations thereof to facilitate delivery via the embedded
應認識到,可由硬體、軟體或韌體之任何組合實施貫穿本發明描述之各種功能、控制操作、處理區塊或步驟。在一些實施例中,由以下項目之一或多者實施各種步驟或功能:電子電路、邏輯閘、多工器、一可程式化邏輯裝置、一特定應用積體電路(ASIC)、一控制器/微控制器或一運算系統。一運算系統可包含(但不限於)一個人運算系統、一行動運算裝置、主機運算系統、工作站、影像電腦、平行處理機或此項技術中已知之任何其他裝置。一般言之,術語「運算系統」經廣泛定義以涵蓋具有執行來自一載體媒體之指令之一或多個處理器之任何裝置。 It should be appreciated that the various functions, control operations, processing blocks or steps described throughout the present disclosure may be implemented by any combination of hardware, software or firmware. In some embodiments, the various steps or functions are performed by one or more of: an electronic circuit, a logic gate, a multiplexer, a programmable logic device, an application specific integrated circuit (ASIC), a controller / microcontroller or a computing system. A computing system may include, but is not limited to, a personal computing system, a mobile computing device, mainframe computing system, workstation, video computer, parallel processor, or any other device known in the art. In general, the term "computing system" is broadly defined to encompass any device having one or more processors that execute instructions from a carrier medium.
實施功能、控制操作、處理區塊或步驟之程式指令(諸如由本文中描述之實施例顯現之程式指令)可經由載體媒體傳輸或儲存於載體媒體上。載體媒體可為一傳輸媒體,諸如(但不限於)一導線、電纜或無線傳輸鏈路。載體媒體亦可包含一非暫時性信號承載媒體或儲存媒體,諸如(但不限於)一唯讀記憶體、一隨機存取記憶體、一磁碟或光碟、一固態或快閃記憶體裝置或一磁帶。 Program instructions implementing functions, controlling operations, processing blocks or steps, such as those embodied by the embodiments described herein, may be transmitted over or stored on a carrier medium. The carrier medium may be a transmission medium such as but not limited to a wire, cable or wireless transmission link. The carrier medium may also include a non-transitory signal bearing medium or storage medium such as, but not limited to, a read only memory, a random access memory, a magnetic or optical disk, a solid state or flash memory device or a tape.
此外,應理解,由隨附發明申請專利範圍定義本發明。儘管已繪示本發明之實施例,然應明白,熟習此項技術者可在不脫離本發明之範疇及精神的情況下做出各種修改。 Furthermore, it is to be understood that the invention is defined by the appended patent claims. Although an embodiment of the invention has been shown, it should be understood that various modifications can be made by those skilled in the art without departing from the scope and spirit of the invention.
1至11:埠 1 to 11: port
100:系統 100: system
102:注射泵 102:Syringe pump
104:第一注射泵 104: The first syringe pump
106:第二注射泵 106: Second syringe pump
108:第三注射泵 108: The third syringe pump
110:第一選擇閥 110: first selection valve
112:第二選擇閥 112: Second selection valve
114:第三選擇閥 114: the third selection valve
116:第四選擇閥 116: The fourth selection valve
118:噴霧器 118: Sprayer
120:流體管線 120: Fluid pipeline
122:第一保持管線 122: The first holding pipeline
124:第二保持管線 124: the second holding pipeline
126:流體管線 126: Fluid pipeline
128:流體管線 128: Fluid pipeline
130:流體管線 130: Fluid pipeline
132:第三保持管線 132: The third holding pipeline
134:流體管線 134: Fluid pipeline
135:流體管線 135: Fluid pipeline
136:流體管線 136: Fluid pipeline
138:樣品探測器 138: Sample detector
139:流體通道 139: Fluid channel
140:真空源 140: vacuum source
141:通道 141: channel
142:流體管線 142: Fluid pipeline
143:通道 143: channel
144:流體管線 144: Fluid pipeline
145:通道 145: channel
146:流體管線 146: Fluid pipeline
148:流體管線 148: Fluid pipeline
150:流體管線 150: Fluid pipeline
152:泵 152: pump
154:流體管線 154: Fluid pipeline
Claims (20)
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